九州大学 研究者情報
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基本情報 研究活動 教育活動 社会活動
白谷 正治(しらたに まさはる) データ更新日:2019.08.26



主な研究テーマ
プラズマ農業
キーワード:低温プラズマ,発芽率向上,成長促進
2010.04~2028.06.
第三世代超高効率太陽電池の研究
キーワード:第三世代太陽電池, 多重励起子
2008.10.
次世代LSI用低誘電率層間絶縁膜形成技術の開発
キーワード:低誘電率層間絶縁膜
2002.01.
次世代LSI用銅配線技術の開発
キーワード:銅配線
1998.01.
プラズマ・カーボン壁相互作用による微粒子形成機構の研究
キーワード:プラズマ・壁相互作用,核融合
2001.01.
プロセスプラズマ中の微粒子成長機構の解明と成長制御の研究
キーワード:プロセスプラズマ,微粒子
1987.01.
高品質太陽光発電材料の高速製造技術の研究
キーワード:アモルファスシリコン
1987.01.
従事しているプロジェクト研究
プラズマを用いた次世代LSI用低誘電率層間絶縁膜の作成
2008.03~2012.03, 代表者:秋山守人, 独立行政法人産業技術総合研究所 生産計測技術研究センター, 独立行政法人産業技術総合研究所(日本).
レーザ吸収を用いた反応性プラズマの診断
2010.11~2011.09, 代表者:白谷正治, 九州大学, 九州大学,ジョセフフーリエ大学(フランス),名古屋大学.
プラズマを用いたナノシステム構築法の研究
2009.03~2013.03, 代表者:白谷正治, 九州大学, 九州大学,ルール大学(ドイツ).
太陽光発電システム未来技術研究開発
2007.02~2010.03, 代表者:竹内良昭, 三菱重工業, 三菱重工業,九州大学,大阪大学
本研究は,九州大学,三菱重工,大阪大学が共同で行うものであり,全体としては,薄膜シリコン系スタック型太陽電池において、従来トップセル材料として用いられてきたアモルファスシリコンが持つ光劣化の問題を根本的に解決すし、それを用いた低コスト高効率太陽電池製造技術を確立し、モジュールコストを50円/W以下を可能とする指針を得ることを目的としている.
 九州大学の分担内容は,九州大学プラズマ研究室で開発したSiナノ粒子成長制御法と微ナノ観測技術をもとに,上述の薄膜シリコン系スタック型太陽電池を作製する際に必要となるトップセルの光劣化の基礎現象解明を行うことを目的としている..
革新的次世代太陽光発電システム技術研究開発
2000.06~2003.03, 代表者:松田彰久, 産業技術総合研究所, 産業技術総合研究所,九州大学,凸版印刷,スタンレー電気,日本板硝子
本研究は,九州大学,産業技術総合研究所,凸版印刷,スタンレー電気,日本板硝子が共同で行うものであり,全体としては,薄膜シリコン系スタック型太陽電池において、従来トップセル材料として用いられてきたアモルファスシリコンが持つ光劣化の問題を根本的に解決する革新的材料、ナノ構造制御シリコンを開発し、それを用いた低コスト高効率太陽電池製造技術を確立し、モジュールコストを50円/W以下を可能とする指針を得ることを目的としている.
 九州大学の分担内容は,九州大学プラズマ研究室で開発したSi微粒子成長制御法と微粒子観測技術をもとに,上述のナノ構造制御シリコン太陽電池を作製する際に必要となるナノ構造制御シリコン材料の開発を行うことを目的としている..
研究業績
主要著書
1. Bharti Arora, Eun Ha Choi, Masaharu Shiratani, and Pankaj Attri, Cellulose: A Smart Material for Water Purification (Smart Materials for Waste Water Applications), Scrivener Publishing, 2016.02.
2. 古閑一憲, 白谷正治, 節原裕一, 関根誠, 堀勝, プラズマ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜 (特集 革新的プラズマ科学の新潮流), 化学工業, 63,12,908-912, 2012.12.
3. 内田儀一郎, 古閑一憲, 白谷正治, ダブルマルチホロー放電プラズマCVDによる窒化シリコンナノ粒子の生成と量子ドット増感型太陽電池への応用 (高効率太陽電池 化合物・集光型・量子ドット型・Si・有機系・その他新材料), 株式会社エヌ・ティー・エス, 第3章, 2, 2012.05, [URL].
4. 古閑一憲、内田儀一郎、白谷正治、布村正太、渡辺征夫, プロセスプラズマ中の微粒子の凝集と輸送 (「プラズマと微粒子」研究の諸分野における進展), プラズマ・核融合学会誌, プラズマ・核融合学会誌,87,2,99-104, 2011.02.
5. Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 20, pp.247-257, 2010.05, [URL].
6. Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani, Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 31, pp.377-383, 2010.05, [URL].
7. 白谷正治, 節原裕一, 関根誠, 堀勝, 研究開発の効率を飛躍的に高めるコンビナトリアルプラズマ解析装置 (特集 プラズマ技術の新しい挑戦), 化学工業, 61,5,371-375, 2010.05.
8. 白谷正治, 古閑一憲, 光劣化しない革新的アモルファスシリコン太陽電池の作製をめざして (次世代シリコン太陽電池製造のためのプラズマ技術), プラズマ・核融合学会誌, プラズマ・核融合学会誌,86,1,33-36, 2010.01.
主要原著論文
1. S. Toko, R. Katayama, K. Koga, E. Leal-Quiros, M. Shiratani , Dependence of CO2 Conversion to CH4 on CO2 Flow Rate in Helicon Discharge Plasma, Sci. Adv. Mater., 10.1166/sam.2018.3141, 10, 5, 655-659, 2018.05, [URL].
2. M. Ito, Jun-Seok Oh, T. Ohta, M. Shiratani, M. Hori, Current Status and Future Prospect of Agricultural Applications using Atmospheric-Pressure Plasma Technologies, Plasma Processes & Polymers, 10.1002/ppap.201700073, 15, 2, 1700073, 2018.02, [URL].
3. H. Seo, D. Sakamoto, H. Chou, N. Itagaki, K. Koga, M. Shiratani , Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction, Progress in Photovoltaics: Research and Applications, 10.1002/pip.2961, 26, 2, 145-150, 2018.02, [URL].
4. 徐鉉雄, 板垣奈穂, 古閑一憲, 白谷正治, 色素増感太陽電池のポリマー対向電極における触媒反応の活性化, 信学技報 (IEICE Technical Report), 117, 334, 27-29, 2017.12.
5. 武田秀俊, 土肥俊郎, 金聖祐, 會田英雄, 白谷正治, プラズマ融合CMPによる大型ダイヤモンド基板の高効率加工とその加工メカニズム, 信学技報 (IEICE Technical Report), 117, 334, 1-6, 2017.12.
6. T. Kawasaki, G. Kuroeda, R. Sei, M. Yamaguchi, R. Yoshinaga, R. Yamashita, H. Tasaki, K. Koga, M. Shiratani, Transportation of reactive oxygen species in a tissue phantom after plasma irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.57.01AG01, 57, 1S, 01AG01, 2017.11, [URL].
7. S. Tanami, D. Ichida, S. Hashimoto, H. Seo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition, Thin Solid Films , 10.1016/j.tsf.2017.02.067 , 641, 59-64, 2017.11, [URL].
8. J. G. Han, L. Martinu, M. Shiratani, Preface - Surface Engineering at the International Vacuum Congress-20, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.08.029, 326, Part B, 367, 2017.10.
9. S. Toko, K. Keya, Y. Torigoe, T. Kojima, H. Seo, N. Itagaki, K. Koga, M. Shiratani , Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.01.034, 326, Part B, 388-394, 2017.10, [URL].
10. P. Attri, M. Kim, E. H. Choi, A. E. Cho, K. Koga, M. Shiratani, Impact of an ionic liquid on protein thermodynamics in the presence of cold atmospheric plasma and gamma rays, Phys. Chem. Chem. Phys., 10.1039/c7cp04083k, 19, 37, 25277-25288, 2017.10, [URL].
11. H. Seo, C. V.V.M. Gopi, H.-J. Kim, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst, Electrochimica Acta, 10.1016/j.electacta.2017.08.030, 249, 337-342, 2017.09, [URL].
12. P. Attri, M. Kim, T. Sarinont, E. H. Choi, H. Seo, A. E. Cho, K. Koga, M. Shiratani, The protective action of osmolytes on the deleterious effects of gamma rays and atmospheric pressure plasma on protein conformational changes, Scientific Reports, 10.1038/s41598-017-08643-1, 7, 8698, 2017.08, [URL].
13. K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body , ECS Transactions, 10.1149/07703.0017ecst, 77, 3, 17-24, 2017.05, [URL].
14. 古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用, 信学技報 (IEICE Technical Report), 117, 8, 5-8, 2017.04.
15. 山崎直樹, 土肥俊郎, 曾田英雄, 金聖祐, 大山幸希, 黒河周平, 佐野泰久, 白谷正治, 山西陽子, GaN基板のプラズマ融合CMP技術 : エタノールバブリング・Arプラズマを用いたプラズマ融合CMP特性とその評価, 信学技報 (IEICE Technical Report), 117, 7, 19-23, 2017.04.
16. H.-J. Kim, G.-C. Xu, C. V.V.M. Gopi, H. Seo, M. Venkata-Haritha, M. Shiratani, Enhanced light harvesting and charge recombination control with TiO2/PbCdS/CdS based quantum dot-sensitized solar cells, Journal of Electroanalytical Chemistry, 10.1016/j.jelechem.2017.02.005, 788, 131-136, 2017.03, [URL].
17. T. Sarinont, R. Katayama, Y. Wada, K. Koga, M. Shiratani, Plant Growth Enhancement of Seeds Immersed in Plasma Activated Water, MRS Advances, 10.1557/adv.2017.178, 2, 18, 995-1000, 2017.02, [URL].
18. K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Densities and surface reaction probabilities of oxygen and nitrogen atoms during sputter deposition of ZnInON on ZnO, IEEE Trans. Plasma Science, 10.1109/TPS.2016.2632124, 45, 2, 323-327, 2017.01, [URL].
19. 山崎直樹, 土肥俊郎, 曾田英雄, 金聖祐, 大山幸希, 白谷正治, 山西陽子, 難加工材料のプラズマ融合CMPプロセスの開発, 精密工学会学術講演会講演論文集, 2017S, 537-538, 2017.01.
20. L. P. Lingamdinne, Y. Chang, J.-K. Yang, J. Singh, E. H. Choi, M. Shiratani, J. R. Koduru, P. Attri, Biogenic reductive preparation of magnetic inverse spinel iron oxide nanoparticles for the adsorption removal of heavy metals, Chemical Engineering Journal, 10.1016/j.cej.2016.08.067, 307, 74-84, 2017.01, [URL].
21. T. Sarinont, Y. Wada, K. Koga, M. Shiratani, Response of Silkworm Larvae to Atmospheric Pressure Non-thermal Plasma Irradiation, Plasma Medicine, 10.1615/PlasmaMed.2017019137 , 6, 3-4, 2017.01, [URL].
22. K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki , Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization, MRS Advances, 10.1557/adv.2016.617, 2, 5, 265-270, 2016.12, [URL].
23. K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Blue Photoluminescence of (ZnO)0.92(InN)0.08, MRS Advances, 10.1557/adv.2016.625P, 2, 5, 277-282, 2016.12, [URL].
24. G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara, Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water, J. Appl. Phys., 10.1063/1.4968568, 120, 20, 203302-1 - 203302-9, 2016.11, [URL].
25. M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga , Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication, Materials Science Forum, 10.4028/www.scientific.net/MSF.879.1772, 879, 1772-1777 , 2016.11, [URL].
26. J. H. Park, M. Kim, M. Shiratani, Art. E. Cho, E. Choi & P. Attri, Variation in structure of proteins by adjusting reactive oxygen and nitrogen species generated from dielectric barrier discharge jet, Scientific Reports, 10.1038/srep35883, 6, 35883, 2016.10, [URL].
27. P. Attri, M. Yusupov, J. H. Park, L. P. Lingamdinne, J. R. Koduru, M. Shiratani, E. Choi & A. Bogaerts, Mechanism and comparison of needle-type non-thermal direct and indirect atmospheric pressure plasma jets on the degradation of dyes, Scientific Reports, 10.1038/srep34419, 6, 34419, 2016.10, [URL].
28. S. Toko, Y. Kanemitsu, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.13233, 16, 10, 10753-10757, 2016.10, [URL].
29. T. Sarinont, T. Amano, P. Attri, K. Koga, N. Hayashi, M. Shiratani, Effects of plasma irradiation using various feeding gases on growth of Raphanus sativus L. , Arch. Biochem. Biophys., 10.1016/j.abb.2016.03.024 , 605, 129-140, 2016.09, [URL].
30. H. Seo, M. K. Son, S. Hashimoto, T. Takasaki, N. Itagaki, K. Koga, M. Shiratani, Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells, Electrochimica Acta, 10.1016/j.electacta.2016.06.020, 210, 880-887, 2016.08, [URL].
31. H. Seo, S. H. Nam, N. Itagaki, K. Koga, M. Shiratani, and J.-H. Boo, Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells, Electron. Mater. Lett., 10.1007/s13391-016-4018-8, 12, 4, 530-536, 2016.07, [URL].
32. K. Keya, T. Kojima, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.07LE03, 55, 7S2, 07LE03, 2016.07, [URL].
33. B. B. Sahu, Y. Yin, J. G. Han, M. Shiratani , Low temperature synthesis of silicon quantum dots with plasma chemistry control in dual frequency non-thermal plasmas, Phys. Chem. Chem. Phys., 10.1039/c6cp01856d, 18, 23, 2016.06, [URL].
34. C. V. V. M. Gopi, M. V. Haritha, H. Seo, S. Singh, S.-K. Kim, M. Shiratani, H. Kim, Improving the performance of quantum dot sensitized solar cells through CdNiS quantum dots with reduced recombination and enhanced electron life time, Dalton Trans., 10.1039/C6DT00283H , 45, 20, 8447-8457, 2016.05, [URL].
35. T. Kawasaki, S. Kusumegi, A. Kudo, T. Sakanoshita, T. Tsurumaru, A. Sato, G. Uchida, K. Koga and M. Shiratani, Effects of irradiation distance on supply of reactive oxygen species to the bottom of a Petri dish filled with liquid by an atmospheric O2/He plasma jet, J. Appl. Phys., 10.1063/1.4948430, 119, 173301, 2016.05, [URL].
36. H. Seo, D. Ichida, S. Hashimoto, N. Itagaki, K. Koga, M. Shiratani, S. H. Nam and J. H. Boo , Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12210, 16, 5, 4875-4879, 2016.05, [URL].
37. H. Seo, M. Shiratani, K. Seneekatima, R. Pornprasertsuk , Catalytic Improvement on Counter Electrode of Dye-Sensitized Solar Cells Using Electrospun Pt Nano-Fibers, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12294, 16, 4, 3332-3337, 2016.04, [URL].
38. M. Shiratani, T. Sarinont, K. Koga and N. Hayashi, R&D status of agricultural applications of high voltage and plasma in Japan, Proc. Workshop on Application of Advanced Plasma Technologies in CE Agriculture, 29-30, 2016.04.
39. D. Punnoose, CH. S. S. P. Kumar, A. E. Reddy, S. S. Rao, C. V. Tulasivarma, S.-K. Kim, H. Seo, M. Shiratani, S.-H. Chung, H. Kim , Reduced recombination with an optimized barrier layer on TiO2 in PbS/CdS core shell quantum dot sensitized solar cells, New J. Chem., 10.1039/C5NJ02947C, 4, 40, 3423-3431, 2016.04, [URL].
40. H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani , Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition, Sci. Adv. Mater., 10.1166/sam.2016.2520, 8, 3, 636-639, 2016.03, [URL].
41. H. Seo, M.-K. Son, N. Itagaki, K. Koga, M. Shiratani, Polymer Counter Electrode of Poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) Containing TiO2 Nano-particles for Dye-sensitized Solar Cells, Journal of Power Sources, 10.1016/j.jpowsour.2015.12.112, 307, 25-30, 2016.03, [URL].
42. K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering, MRS Advances, 10.1557/adv.2015.59, 1, 2, 115-119, 2016.01, [URL].
43. T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Production of In, Au, and Pt nanoparticles by discharge plasmas in water for assessment of their bio-compatibility and toxicity, MRS Advances, 10.1557/adv.2016.41, 1, 18, 1301-1306, 2016.01, [URL].
44. M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga, Plant Growth Response to Atmospheric Air Plasma Treatments of Seeds of 5 Plant Species, MRS Advances, 10.1557/adv.2016.37, 1, 18, 1265-1269, 2016.01, [URL].
45. 白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価, 九州大学超顕微解析研究センター報告, 39, 116-117, 2015.12.
46. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, N. Hayashi, M. Shiratani, Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.), Appl. Phys. Express, 10.7567/APEX.9.016201, 9, 016201, 2015.12, [URL].
47. P. Attri, T. Sarinont, M. Kim, T. Amano, K. Koga, A. E. Cho, E. Choi, M. Shiratani, Influence of ionic liquid and ionic salt on protein against the reactive species generated using dielectric barrier discharge plasma , Scientific Reports, 10.1038/srep17781, 5, 17781 , 2015.12, [URL].
48. G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the discharge characteristics of a plasma jet impinging onto the liquid surface, IEEE Trans. Plasma Science, 10.1109/TPS.2015.2488619, 43, 12, 4081-4087, 2015.12, [URL].
49. S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Effects of Gas Flow Rate on Deposition Rate and Amount of Si Clusters Incorporated into a-Si:H Films, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA19, 55, 1S, 01AA19, 2015.12, [URL].
50. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA11, 55, 1S, 01AA11, 2015.11, [URL].
51. T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Synthesis of Indium-Containing Nanoparticles in Aqueous Suspension Using Plasmas in Water for Evaluating Their Kinetics in Living Body, J. Nanosci. Nanotechnol., 10.1166/jnn.2015.11427, 15, 11, 9298-9302, 2015.11, [URL].
52. H. Seo, S. Hashimoto, D. Ichida, N. Itagaki, K. Koga and M. Shiratani , Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode, Electrochimica Acta, 10.1016/j.electacta.2015.04.105, 179, 206-210, 2015.10, [URL].
53. M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani, Attraction during binary collision of fine particles in Ar plasma, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.18, 2015.10, [URL].
54. T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki, Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.49, 2015.10, [URL].
55. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.145, 2015.10, [URL].
56. S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.149, 2015.10, [URL].
57. T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.150, 2015.10, [URL].
58. S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.152, 2015.10, [URL].
59. K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.154, 2015.10, [URL].
60. T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.155, 2015.10, [URL].
61. R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group, Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.101, 2015.10, [URL].
62. D. Yamashita, M. Soejima, T. Ito, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Laser trapped single fine particle as a probe of plasma parameters, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.104, 2015.10, [URL].
63. Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of electrode structure on characteristics of multi-hollow discharges, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.129, 2015.10, [URL].
64. K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.132, 2015.10, [URL].
65. S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.133, 2015.10, [URL].
66. T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani, Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.136, 2015.10, [URL].
67. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.143, 2015.10, [URL].
68. T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka, Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.158, 2015.10, [URL].
69. Y. Setsuhara, G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Discharge characteristics and hydrodynamics behaviors of atmospheric plasma jets produced in various gas flow patterns, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.58, 2015.10, [URL].
70. G. Uchida, A. Nakajima, T. Kawasaki, K. Koga, K. Takenaka, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, TF1.2, 2015.10, [URL].
71. M. Tateishi, K. Koga, R. Katayama, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experiment Group, Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances, J. Nucl. Mater. , 10.1016/j.jnucmat.2014.10.049, 463, 865–868, 2015.08, [URL].
72. S. Toko, Y. Torigoe, W. Chen, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability, Thin Solid Films, 10.1016/j.tsf.2015.02.052 , 587, 126-131, 2015.07, [URL].
73. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.40.123, 40, 2, 123-128, 2015.07, [URL].
74. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of ZnInON/ZnO multi-quantum well solar cells, Thin Solid Films, 10.1016/j.tsf.2015.01.012, 587, 106-111, 2015.07, [URL].
75. A. Nakajima, G. Uchida, T. Kawasaki, K. Koga, T. Sarinont, T. Amano, K. Takenaka, M. Shiratani, Y. Setsuhara, Effects of gas flow on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation, J. Appl. Phys., 10.1063/1.4927217, 118, 4, 043301, 2015.07, [URL].
76. N. Hayashi, R. Ono, M. Shiratani, A. Yonesu, Antioxidative activity and growth regulation of Brassicaceae induced by oxygen radical irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.06GD01, 54, 6S2, 06GD01, 2015.06, [URL].
77. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.248, 1741, aa09-10, 2015.03, [URL].
78. N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, ZnO-based semiconductors with tunable band gap for solar sell applications, Proc. SPIE photonics west 2015, 10.1117/12.2078114, 9364, 93640P, 2015.03, [URL].
79. T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.87, 1741, aa09-12, 2015.02, [URL].
80. A. Tanaka, M. Hirata, N. Matsumura, K. Koga, M. Shiratani, Y. Kiyohara, Comparative Study on the Pulmonary Toxicity of Indium Hydroxide, Indium-Tin Oxide, and Indium Oxide Following Intratracheal Instillations into the Lungs of Rats, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.21, 1723, g02-03, 2015.02, [URL].
81. T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Air Plasma Irradiation to Seeds of Radish Sprouts on Chlorophyll and Carotenoids Concentrations in their Leaves, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.39, 1723, g02-04, 2015.02, [URL].
82. T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Multigeneration Effects of Plasma Irradiation to Seeds of Arabidopsis Thaliana and Zinnia on Their Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.12, 1723, g03-04, 2015.01, [URL].
83. H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.01AD02, 54, 1S, 01AD02, 2015.01, [URL].
84. 内田儀一郎, 市田大樹, 徐鉉雄, 古閑一憲, 白谷正治, 反応性微粒子プラズマプロセスを用いたゲルマニウム結晶ナノ粒子含有膜の堆積と量子ドット太陽電池への応用, スマートプロセス学会誌, 4, 1, 6-11, 2015.01.
85. N. Itagaki, K. Matsushima, D. Yamashia, H. Seo, K. Koga, M. Shiratani, Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap, Mater. Res. Express, 10.1088/2053-1591/1/3/036405, 1, 3, 036405, 2014.09, [URL].
86. I. Suhariadi, M. Shiratani, N. Itagaki, Growth mechanism of ZnO deposited by nitrogen mediated crystallization, Mater. Res. Express, 10.1088/2053-1591/1/3/036403, 1, 3, 036403, 2014.09, [URL].
87. H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.39.321, 39, 3, 321-324, 2014.09, [URL].
88. N. Itagaki, K. Kuwahara, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method, Opt. Engineering, 10.1117/1.OE.53.8.087109, 53, 8, 087109, 2014.08, [URL].
89. S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Dust Hour Glass in a Capacitive RF Discharge , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2343975 , 42, 10, 2672-2673, 2014.08, [URL].
90. M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara, SiC Nanoparticle Composite Anode for Li-Ion Batteries, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2014.742, 1678, n08-58, 2014.07, [URL].
91. S. Kitazaki, T. Sarinont, K. Koga, N. Hayashi, M. Shiratani, Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas, Curr. Appl. Phys., 10.1016/j.cap.2013.11.056, 14, 2, S149–S153, 2014.07, [URL].
92. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, T. Shimizu, G. Uchida, K. Koga, M. Shiratani, Visualization of the Distribution of Oxidizing Substances in an Atmospheric Pressure Plasma Jet , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2325038, 42, 10, 2482-2483, 2014.06, [URL].
93. D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012002, 518, 1, 012002, 2014.06, [URL].
94. Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012007, 518, 1, 012007, 2014.06, [URL].
95. S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012008, 518, 1, 012008, 2014.06, [URL].
96. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group, Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012009, 518, 1, 012009, 2014.06, [URL].
97. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori, Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence , J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012010, 518, 1, 012010, 2014.06, [URL].
98. T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani, Plasma etching of single fine particle trapped in Ar plasma by optical tweezers, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012014, 518, 1, 012014, 2014.06, [URL].
99. I. Yoshida, T. Matsui, H. Sai, T. Suezaki, H. Katayama, M. Matsumoto, S. Sugiyama, T. Masuda, M. Ushijima, S. Nonomura, M. Shiratani, M. Konagai, K. Saito, M. Kondo, M. Tanaka, S. Niki, Development and Progress in Thin Film Si Photovoltaic Technologies by Photovoltaic Power Generation Technology Research Association, Proc. 40th IEEE PVSC, 10.1109/PVSC.2014.6925520 , 2832 - 2835 , 2014.06, [URL].
100. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Control of the area irradiated by the sheet-type plasma jet in atmospheric pressure, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012016, 518, 1, 012016, 2014.06, [URL].
101. T. Sarinont, T. Amano, S. Kitazaki, K. Koga, G. Uchida, M. Shiratani and N. Hayashi, Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012017, 518, 1, 012017, 2014.06, [URL].
102. K. Koga, X. Dong, S. Iwashita, U. Czarnetzki and M. Shiratani, Formation of carbon nanoparticle using Ar+CH4 high pressure nanosecond discharges, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012020, 518, 1, 012020, 2014.06, [URL].
103. P. Chewchinda, K. Hayashi, D. Ichida, H. Seo, G. Uchida, M. Shiratani, O. Odawara and H. Wada, Preparation of Si nanoparticles by laser ablation in liquid and their application as photovoltaic material in quantum dot sensitized solar cell, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012023, 518, 1, 012023, 2014.06, [URL].
104. M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, and K. Kamataki, Nanostructure Control of Si and Ge Quantum Dots Based Solar Cells Using Plasma Processes, Materials Science Forum, 10.4028/www.scientific.net/MSF.783-786.2022, 783-786, 2022-2027, 2014.05, [URL].
105. H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance dependence of Si quantum dot-sensitized solar cells on counter electrode, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FZ01, 53, 5S1, 05FZ01, 2014.05, [URL].
106. N. Hayashi, Y, Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of the surfaces of agricultural products using active oxygen species generated by atmospheric plasma and UV light, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FR03 , 53, 5S1, 05FR03 , 2014.05, [URL].
107. H. Seo, M. Son, S. Park, M. Jeong, H. Kim, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell, Thin Solid Films, 10.1016/j.tsf.2013.08.103, 554, 122-126, 2014.03, [URL].
108. H. Seo, M. Son, H. Kim, M. Shiratani, The enhancement of dye adsorption in dye-sensitized solar module by an electrical adsorption method, Thin Solid Films, 10.1016/j.tsf.2013.05.153, 554, 118-121, 2014.03, [URL].
109. N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization, Proc. SPIE photonics west 2014, 10.1117/12.2041081 , 8987, 89871A, 2014.03, [URL].
110. G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015080, 1, 015080, 2014.03, [URL].
111. M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga, Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015083, 1, 015083, 2014.03, [URL].
112. G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015082, 1, 015082, 2014.03, [URL].
113. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015020, 1, 015020, 2014.03, [URL].
114. S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, and M. Shiratani, Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015069, 1, 015069, 2014.03, [URL].
115. X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori, Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015072, 1, 015072, 2014.03, [URL].
116. I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, and N. Itagaki, Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015064, 1, 015064, 2014.03, [URL].
117. T. Sarinont, K. Koga, S. Kitazaki, G. Uchida, N. Hayashi, M. Shiratani, Effects of Atmospheric Air Plasma Irradiation on pH of Water, JPS Conf. Proc., 10.7566/JPSCP.1.015078, 1, 015078, 2014.03, [URL].
118. H. Seo, D. Ichida, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells, Int. J. Precision Eng. Manuf., 10.1007/s12541-014-0343-8, 15, 2, 339-343, 2014.02, [URL].
119. S. Komatsu and M. Shiratani, Formation of microcones accompanied with ripple patterns in laser-activated plasma CVD of sp(3)-bonded BN films, J. Mater. Res., 10.1557/jmr.2014.7, 29, 4, 485-491, 2014.02, [URL].
120. Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P35, 2014.02.
121. S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P32, 2014.02.
122. Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P36, 2014.02.
123. D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P33, 2014.02.
124. Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P37, 2014.02.
125. Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S02-P10, 2014.02.
126. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P02, 2014.02.
127. S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P17, 2014.02.
128. K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P07, 2014.02.
129. T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-SPD-P01, 2014.02.
130. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori, Pressure dependence of carbon film deposition using H-assisted plasma CVD, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P14, 2014.02.
131. D. Yamashita, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Raman spectroscopy of a fine particle optically trapped in plasma, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P23, 2014.02.
132. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Spatial profile of flux of dust particles in hydrogen helicon plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P21, 2014.02.
133. R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P03, 2014.02.
134. I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P05, 2014.02.
135. A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida, Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S2-P35, 2014.02.
136. M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida, A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 4B-PM-O1, 2014.02.
137. T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S08-P10, 2014.02.
138. G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani, Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries, Proc. 8th Int. Conf. Reactive Plasmas, 4C-PM-O1, 2014.02.
139. H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Quantum characterization and photovoltaic application of Si nano-particles fabricated by multi-hollow plasma discharge chemical vapor deposition, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S11-P36, 2014.02.
140. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-14, 2014.02.
141. T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P19, 2014.02.
142. K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A4, 2014.02.
143. N. Hayashi, Y. Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of agricultural products using active oxygen species generated by plasma and UV light (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A2, 2014.02.
144. T. Sarinont, K. Koga, S. Kitazaki, M. Shiratani, N. Hayashi, Effects of growth enhancement by plasma irradiation to seeds in water, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P32, 2014.02.
145. T. Amano, T. Sarinont, S. Kitazaki, N. Hayashi, K. Koga, M. Shiratani, Long term growth of radish sprouts after atmospheric pressure DBD plasma irradiation to seeds, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P33, 2014.02.
146. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Visualization of oxidizing substances generated by atmospheric pressure non-thermal plasma jet with water, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S09-P25, 2014.02.
147. M. Shiratani, Fluctuation and Nanotechology, Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-15, 2014.02.
148. M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, G. Uchida, H. Seo, and N. Itagaki, Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010201, 53, 1, 010201, 2014.01, [URL].
149. S. Komatsu, M. Shiratani, Self-organized formation of hierarchically-ordered structures in laser-activated plasma CVD of sp(3)-bonded BN films , Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010202, 53, 1, 010202 , 2014.01, [URL].
150. G. Uchida, Y. Wang, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA05, 52, 11NA05, 2013.11, [URL].
151. Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani, Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si and SiH, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA07, 52, 11NA07, 2013.11, [URL].
152. K. Koga, M. Tateishi, K. Nishiyama, G. Uchida, K. Kamataki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, Akiko Sagara, the LHD Experimental Group, Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA08, 52, 11NA08, 2013.11, [URL].
153. H. Seo, Y. Wang, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, S. Nam, J. Boo, Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO2, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM02, 52, 11NM02, 2013.11, [URL].
154. K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 eV to 3.3 eV on ZnO Templates, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM06, 52, 11NM06, 2013.11, [URL].
155. H. Seo, Y. Wang, M. Sato, G. Uchida, K. Koga, N. Itagaki, K. Kamataki, M. Shiratani, The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si, Thin Solid Films, 10.1016/j.tsf.2013.04.073, 546, 284-288, 2013.11, [URL].
156. I. Suhariadi, K. Oshikawa, K. Kuwahara, K. Matsushima, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NB03, 52, 11NB03, 2013.11, [URL].
157. H. Seo, M. Son, H. Kim, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys., 10.7567/JJAP.52.10MB07, 57, 10MB07(5pages) , 2013.10, [URL].
158. G. Uchida, M. Sato, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells, Thin Solid Films, 10.1016/j.tsf.2013.04.111, 544, 93-98, 2013.10, [URL].
159. 白谷正治, 古閑一憲, 内田儀一郎, Hyunwoong Seo, 板垣奈穂, 岩下伸也, ナノ材料のプラズマプロセシングの研究の現状と将来 , 表面科学, 34, 10, 520, 2013.10, [URL].
160. O. Kaneko, H. Yamada, S. Inagaki, M. Jakubowski, S. Kajita, S. Kitajima, Kobayashi, K. Koga, T. Morisaki, S. Morita, T. Mutoh, S. Sakakibara, Y. Suzuki, H. Takahashi, K. Tanaka, K. Toi, Y. Yoshimura, T. Akiyama, Y. Asahi, N. Ashikawa, H. Chikaraishi, A. Cooper, D.S. Darrow, E. Drapiko, P. Drewelow, X. Du, A. Ejiri, M. Emoto, T. Evans N. Ezumi, K. Fujii, T. Fukuda, H. Funaba, M. Furukawa, D.A. Gates, M. Goto, T. Goto, W. Guttenfelder, S. Hamaguchi, M. Hasuo, T. Hino, Y. Hirooka, K. Ichiguchi, K. Ida, H. Idei, T. Ido, H. Igami, K. Ikeda, S. Imagawa, T. Imai, M. Isobe, M. Itagaki, T. Ito, K. Itoh, S. Itoh, A. Iwamoto, K. Kamiya, T. Kariya, H. Kasahara, N. Kasuya, D. Kato, T. Kato, K. Kawahata, F. Koike, S. Kubo, R. Kumazawa, D. Kuwahara, S. Lazerson, H. Lee, S. Masuzaki, S. Matsuoka, H. Matsuura, A. Matsuyama, C. Michael, D. Mikkelsen, O. Mitarai, T. Mito, J. Miyazawa, G. Motojima, K. Mukai, A. Murakami, I. Murakami, S. Murakami, T. Muroga, S. Muto, K. Nagaoka, K. Nagasaki, Y. Nagayama, N. Nakajima, H. Nakamura, Y. Nakamura, H. Nakanishi, H. Nakano, T. Nakano, K. Narihara, Y. Narushima, K. Nishimura, S. Nishimura, M. Nishiura, Y.M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, N. Ohno, N. Ohyabu, T. Oishi, M. Okamoto, A. Okamoto, M. Osakabe, Y. Oya1, T. Ozaki, N. Pablant, B.J. Peterson, A. Sagara, K. Saito, R. Sakamoto, H. Sakaue, M. Sasao2, K. Sato, M. Sato, K. Sawada, R. Seki, T. Seki, V. Sergeev, S. Sharapov, I. Sharov, A. Shimizu, T. Shimozuma, M. Shiratani, M. Shoji, S. Sudo, H. Sugama, C. Suzuki, K. Takahata, Y. Takeiri, Y. Takemura, M. Takeuchi9, H. Tamura, N. Tamura, H. Tanaka, T. Tanaka, M. Tingfeng, Y. Todo, M. Tokitani, K. Tokunaga, T. Tokuzawa, H. Tsuchiya, K. Tsumori, Y. Ueda, L. Vyacheslavov, K.Y. Watanabe, T. Watanabe, T.H. Watanabe, B. Wieland, I. Yamada, S. Yamada, S. Yamamoto, N. Yanagi, R. Yasuhara, M. Yokoyama, N. Yoshida, S. Yoshimura, T. Yoshinaga, M. Yoshinuma and A. Komori, Extension of operation regimes and investigation of three-dimensional currentless plasmas in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/53/10/104015, 53, 10, 104015, 2013.10, [URL].
161. 白谷正治, 研究生産性の向上 , 表面科学, 34, 10, 519, 2013.10, [URL].
162. Y. Kim, T. Matsunaga, K. Nakahara, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.04.029, 228, 1, S550–S553, 2013.08, [URL].
163. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Mass density control of carbon films deposited by H-assisted plasma CVD method, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.10.002, 228, 1, S15–S18, 2013.08, [URL].
164. K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, and H. Kersten, Discharge power dependence of carbon dust flux in a divertor simulator, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.169, 438, S788–S791, 2013.07, [URL].
165. K. Koga, K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.154, 438, S727–S730, 2013.07, [URL].
166. Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Observation of nanoparticle growth process using a high speed camera, ISPC 21 Proceedings, 2013.07, [URL].
167. S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Transport control of dust particles via the Electrical Asymmetry Effect: experiment, simulation, and modeling, J. Phys. D: Appl. Phys., 46, 245202, 2013.06, [URL].
168. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Growth control of ZnO nano-rod with various seeds and photovoltaic application, J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012029, 441, 1, 012029, 2013.06, [URL].
169. K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori, Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine , J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012001, 441, 1, 012001, 2013.06, [URL].
170. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells, Electrochimica Acta, 10.1016/j.electacta.2013.02.026, 95, 1, 43-47, 2013.04, [URL].
171. S. Bornholdt, N. Itagaki, K. Kuwahara, H. Wulff, M. Shiratani and H. Kersten, Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films , Plasma Sources Sci. Technol., 10.1088/0963-0252/22/2/025019, 22 , 2, 025019, 2013.04, [URL].
172. Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, Plasma interactions with aminoacid (L-alanine) as a basis of fundamental processes in plasma medicine, Current Applied Physics, 10.1016/j.cap.2013.01.030, 13, 1, S59–S63, 2013.03, [URL].
173. N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 84-87, 2013.03, [URL].
174. K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Control of Deposition Profile and Properties of Plasma CVD Carbon Films, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 136-139, 2013.03, [URL].
175. M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 100-103, 2013.03, [URL].
176. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell, Electrochimica Acta, 10.1016/j.electacta.2012.09.087, 87, 1, 213-217, 2013.01, [URL].
177. S. Iwashita, K. Nishiyama, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Dust particle formation due to interaction between graphite and helicon deuterium plasmas, Fusion Engineering and Design, 10.1016/j.fusengdes.2012.10.002, 88, 1, 28-32, 2013.01, [URL].
178. H. Seo, Y. Wang, M. Sato, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD05, 52, 1, 01AD05(5pages), 2013.01, [URL].
179. Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, M. Shiratani, High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD01, 52, 1, 01AD01(4pages), 2013.01, [URL].
180. I. Suhariadi, K. Matsushima, K. Kuwahara, K. Oshikawa, D. Yamashita, H. Seo, G. Uchida, K. Kamtaki, K. Koga, M. Shiratani, S. Bornholdt, H. Kersten, Harm Wulff, N. Itagaki, Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AC08, 52, 1, 01AC08(5pages), 2013.01, [URL].
181. T. Urakawa, R. Torigoe, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, K. Takeda, M. Sekine, M. Hori, H-2/N-2 plasma etching rate of carbon films deposited by H-assisted plasma CVD, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AB01, 52, 1, 01AB01(4pages), 2013.01, [URL].
182. Y. Kim, T. Matsunaga, K. Nakahara ,G. Uchida, K. Kamataki , N. Itagaki, H. Seo, K. Koga, M. Shiratani , Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD , Thin Solid Films, 10.1016/j.tsf.2012.06.023, 523, 29-33, 2012.11, [URL].
183. K. Kamataki, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage, Thin Solid Films, 10.1016/j.tsf.2012.07.059, 523, 76-79, 2012.11, [URL].
184. H. Seo, Min-Kyu Son, Songyi Park, Hee-Je Kim, M. Shiratani, The Blocking Effect of Charge Recombination by sputtered and acid-treated ZnO Thin Film in Dye-sensitized Solar Cells, J. Photochem. Photobiol., A : Chemistry, 10.1016/j.jphotochem.2012.08.016, 248, 50-54, 2012.11, [URL].
185. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Control of Dry Yeast Using Scalable Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.11PJ02, 51, 11, 11PJ02(5pages), 2012.11, [URL].
186. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation, Thin Solid Films, 10.1016/j.tsf.2012.05.061, 523, 15-19, 2012.11, [URL].
187. T. Shirafuji, Y. Setsuhara, M. Shiratani, T. Kaneko, T. Watanabe, N. Ohtake, The 24th Symposium on Plasma Science for Materials (SPSM-24) Preface, Thin Solid Films, 10.1016/j.tsf.2012.10.002, 523, 1-1, 2012.11, [URL].
188. N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors (Invited), Proc. International Symposium on Dry Process, 34, 97-98, 2012.11.
189. H. Seo, M. K. Son, M. Shiratani, H. J. Kim, Improvement on the long-term stability of dye-sensitized solar module by structural alternation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.10NE21, 51, 10, 10NE21(4pages), 2012.10, [URL].
190. K. Shibata, K. Suenaga, K. Watanabe, F. Horikiri, T. Mishima, M. Shiratani , Evaluation of Crystal Orientation for (K, Na)NbO3 Films Using X-ray Diffraction Reciprocal Space Map and Relationship between Crystal Orientation and Piezoelectric Coefficient, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.075502, 51, 7, 075502(6pages), 2012.07, [URL].
191. I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani, ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.37.165, 37, 2, 165-168, 2012.06, [URL].
192. A. Tanaka, M. Hirata, M. Shiratani, K. Koga, Y. Kiyohara, Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats, Journal of Occupational Health, 10.1539/joh.11-0164-OA, 54, 3, 187-195, 2012.06, [URL].
193. S. Iwashita, G. Uchida, J. Schulze, E. Sch¨ungel, P. Hartmann, M. Shiratani, Zolt´an Donk´o and U. Czarnetzki, Sheath-to-sheath transport of dust particles in a capacitively coupled discharge, Plasma Sources Sci. Technol., 10.1088/0963-0252/21/3/032001, 21, 3, 032001(5pages), 2012.06, [URL].
194. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers, Thin Solid Films, 10.1016/j.tsf.2011.10.136, 520, 14, 4674-4677, 2012.05, [URL].
195. K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki , In situ analysis of size dispersion of nano-particles in reactive plasma using two dimentional laser light scattering method, Journal of Instrumentation, 10.1088/1748-0221/7/04/C04017, 7, 4, C04017, 2012.04, [URL].
196. M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.1245, 1426, 377-382, 2012.04, [URL].
197. Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.839, 1426, 307-311, 2012.04, [URL].
198. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.890, 1426, 313-318, 2012.04, [URL].
199. Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga and M. Shiratani, Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.970, 1469, ww06-10, 2012.04, [URL].
200. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.969, 1469, ww06-08, 2012.04, [URL].
201. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.966, 1469, ww02-08, 2012.04, [URL].
202. K. Koga, K. Nakahara, Y. Kim, T. Matsunaga, D.Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD03, 51, 1, 01AD03(4pages), 2012.01, [URL].
203. G. Uchida, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD01, 51, 1, 01AD01(5pages), 2012.01, [URL].
204. K. Koga, T. Matsunaga, Y. Kim, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, and M. Shiratani, Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD02, 51, 1, 01AD02(4pages), 2012.01, [URL].
205. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Enhancement of Radish Sprouts Induced by Low Pressure O2 Radio Frequency Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AE01, 51, 1, 01AE01(4pages), 2012.01, [URL].
206. S. Komatsu, M. Shiratani, Electron field emission from SP3-bonded bn microcones as a nonlinear cooperative phenomenon, Far East Journal of Dynamical Systems, 18, 1, 33-52, 2012.01, [URL].
207. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Irradiations with Ions and Photons in UV-VUV Regions on Nano-Surface of Polymers Exposed to Plasma, Jpn. J. Appl. Phys,, 10.1143/JJAP.51.01AJ02, 51, 1, 01AJ02(5pages), 2012.01, [URL].
208. 趙研, 節原裕一, 竹中弘祐, 白谷正治, 関根誠, 堀勝, フレキシブルデバイス創製に向けたプラズマ—ソフトマテリアル相互作用の解析 , 高温学会誌 , 10.7791/jhts.37.289, 37, 6, 289-297 , 2011.11, [URL].
209. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering, Proc. Plasma Conf. 2011, 24G16, 2011.11.
210. N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization, Proc. PVSEC-21, 4D-2P-10, 2011.11.
211. Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste, Proc. PVSEC-21, 3D-5P-09, 2011.11.
212. Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer, Proc. Intern. Symp. on Dry Process, 33, 133-134, 2011.11, [URL].
213. K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure, Proc. Plasma Conf. 2011, 23G03, 2011.11.
214. Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD, Proc. Plasma Conf. 2011, 23P013-O, 2011.11.
215. M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD, Proc. Plasma Conf. 2011, 24G06, 2011.11.
216. K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free a-Si:H films using cluster eliminating filter, Proc. Plasma Conf. 2011, 24P010-O, 2011.11.
217. Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD, Proc. Plasma Conf. 2011, 24P011-O, 2011.11.
218. K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten, Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage, Proc. Plasma Conf. 2011, 24P094-O, 2011.11.
219. K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD, Proc. Plasma Conf. 2011, 24P014-O, 2011.11.
220. T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition, Proc. Plasma Conf. 2011, 24P015-O, 2011.11.
221. K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method, Proc. Plasma Conf. 2011, 24P016-O, 2011.11.
222. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H., G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films, Proc. Plasma Conf. 2011, 24P008-O, 2011.11.
223. Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd, Proc. PVSEC-21, 3D-2P-09, 2011.11.
224. K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-20, 2011.11.
225. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers, Proc. PVSEC-21, 4D-2P-11, 2011.11.
226. T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films, Proc. PVSEC-21, 4D-2P-16, 2011.11.
227. M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga, M. Shiratani, Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges, Proc. PVSEC-21, 3D-5P-12, 2011.11.
228. H. Seo, Min-Kyu Son, M. Shiratani, Hee-Je Kim, The improvement on the long-term stability of dye-sensitized solar module by structural alternation, Proc. PVSEC-21, 3D-5P-03, 2011.11.
229. M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga and M. Shiratani, Deposition of FeSi2 nano-particle film, Proc. Plasma Conf. 2011, 24P009-O, 2011.11.
230. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon, Proc. Intern. Symp. on Dry Process, 33, 123-124, 2011.11, [URL].
231. N. Hayashi, Y. Akiyoshi, S. Kitazaki, K. Koga, M. Shiratani, Influence of active oxygen species produced by atmospheric torch plasma on plant growth, Proc. Intern. Symp. on Dry Process, 33, 135-136, 2011.11, [URL].
232. K. Hatozaki, K. Nakahara, G. Uchida, K. Koga, M. Shiratani, Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-18, 2011.11.
233. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of plasma interactions with organic semiconductors for fabrication of flexible electronics devices, Proc. Intern. Symp. on Dry Process, 33, 69-70 , 2011.11, [URL].
234. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation, Proc. Plasma Conf. 2011, 23P018-O, 2011.11.
235. T. Mieno, K. Koga, M. Shiratani, Production Process of Carbon Nanotube Coagulates, Proc. Plasma Conf. 2011, 24F08, 2011.11.
236. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor, Proc. Plasma Conf. 2011, 24P007-O, 2011.11.
237. G. Uchida, S. Iwashita, J. Schungel, M. Shiratani, U. Czarnetzki, Transport of dust particles in multi-frequency capacitively coupled radio frequency discharges, Proc. Plasma Conf. 2011, 25E01, 2011.11.
238. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, M. Shiratani, Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasma, Appl. Phys. Express, 10.1143/APEX.4.105001, 4, 10, 105001(3pages), 2011.10, [URL].
239. K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method, Physica Status Solidi (c), 10.1002/pssc.201100229, 8, 10, 3013-3016, 2011.10, [URL].
240. G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD, Physica Status Solidi (c), 10.1002/pssc.201001230, 8, 10, 3017-3020, 2011.10, [URL].
241. G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye, Physica Status Solidi (c), 10.1002/pssc.201100166, 8, 10, 3021-3024, 2011.10, [URL].
242. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma , Proc. of International Conference on Phenomena in Ionized Gases(ICPIG) 2011 Conference, D13-318, 2011.09.
243. K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film, Thin Solid Films, 10.1016/j.tsf.2011.01.408, 519, 20, 6896-6898, 2011.08, [URL].
244. N. Hayashi, A. Nakahigashi, M. Goto, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge, Jpn. J. Appl. Phys., 10.1143/JJAP.50.08JF04, 50, 8, 08JF04, 2011.08, [URL].
245. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Plasma processing of soft materials for development of flexible devices , Thin Solid Films, 10.1016/j.tsf.2011.04.091, 519, 20, 6721-6726, 2011.08, [URL].
246. K. Cho, Y. Setsuhara, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers, Thin Solid Films, 10.1016/j.tsf.2011.04.060, 519, 20, 6810-6814, 2011.08, [URL].
247. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial analyses of plasma-polymer interactions, Surf. Coat. Technol., 10.1016/j.surfcoat.2011.04.083, 205, 2, S484-S489, 2011.07, [URL].
248. Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry (ISPC20), POL08, 2011.07.
249. T. Urakawa, T. Nomura, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry (ISPC20), POL02, 2011.07.
250. M. Shiratani, K. Koga, S. Iwashita, G. Uchida, N. Itagaki, K. Kamataki, Nano-factories in plasma: present status and outlook, J. Phys. D: Appl. Phys., 10.1088/0022-3727/44/17/174038 , 44, 17, 174038, 2011.05, [URL].
251. K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics, International Conference on Advances in Condensed and Nano Materials (ICACNM), 10.1063/1.3653600, 1393, 27-30, 2011.02, [URL].
252. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase, Appl. Phys. Express, 10.1143/APEX.4.011101, 4, 1, 011101-011101-3 , 2011.01, [URL].
253. W. M. Nakamura, H. Matsuzaki, H. Sato, Y. Kawashima, K. Koga, M. Shiratani, High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.07.081, 205, 1, S241-S245 , 2010.12, [URL].
254. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Low-damage plasma processing of polymers for development of organic-inorganic flexible devices, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.08.031, 205, 1, S355-S359, 2010.12, [URL].
255. 内田儀一郎, 古閑一憲, 白谷正治, マルチホロー放電プラズマCVDによる量子ドット増感太陽電池用シリコンナノ結晶粒子の作製, ケミカルエンジニヤリング, 55, 12, 947-954, 2010.12, [URL].
256. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5685920, XII-XVI , 2010.11, [URL], プラズマナノテクノロジーで最重要課題となっている揺らぎの制御に関する現状と将来を展望した論文。.
257. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686456, 1943-1947, 2010.11, [URL].
258. G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686704, 2199-2201, 2010.11, [URL].
259. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686686, 2216-2218, 2010.11, [URL].
260. T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686679 , 2219-2212, 2010.11, [URL].
261. H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles, Proc. of International Symposium on Dry Process, P1-A17, 2010.11.
262. G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges , Proc. of MNC2010, 12D-11-66 , 2010.11.
263. Y. Akiyoshi, A. Nakahigashi, N. Hayashi, S. Kitazaki, Takuro Iwao, K. Koga, M. Shiratani, Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686467, 1957-1959, 2010.11, [URL].
264. S. Kitazaki, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Growth Stimulation of Radish Sprouts Using Discharge Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686474, 1960-1963, 2010.11, [URL].
265. T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686688, 2213-2215, 2010.11, [URL].
266. Y. Kawashima, K. Yamamoto, M. Sato, T. Matsunaga, K. Nakahara, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686677, 2222-2224, 2010.11, [URL].
267. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photo-Irradiations in VUV and UV Regions on Chemical Bonding States of Polymers during Plasma Exposure, Proc. of International Symposium on Dry Process, P1-B5, 2010.11.
268. Y. Setsuhara, K. Takenaka, K. Cho, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Soft Material Processing, Proc. of International Symposium on Dry Process, P1-B6, 2010.11.
269. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00087, 2010.10.
270. T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00089, 2010.10.
271. G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00093, 2010.10.
272. H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group , Carbon dust particles generated due to H2 plasma-carbon wall interaction, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00114, 2010.10.
273. A. Nakahigashi, Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, KWP.00008, 2010.10.
274. T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Plasma parameter measurements of Ar+H2+C7H8 plasma in H-assisted plasma CVD reactor, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, DTP.00173, 2010.10.
275. M. Shiratani, Academic Roadmap of Plasma Process Technologies, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, FT.00004, 2010.10.
276. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photoemissions in UV and VUV Regions on Nano-Surface Strucures of Soft Materials during Plasma Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00115, 2010.10.
277. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Investigation of Plasma Interactions with Soft Materials via Combinatorial Plasma-Process Analyzer for Plasma Nano Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, TF2.00006, 2010.10.
278. Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Quantum dot-sensitized solar cells using Si nanoparticles, Trans. Mater. Res. Soc. Jpn., 35, 3, 597-599, 2010.09, [URL].
279. Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzer, Thin Solid Films, 10.1016/j.tsf.2010.03.055, 518, 22, 6320-6324, 2010.09, [URL].
280. Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials, Thin Solid Films, 10.1016/j.tsf.2010.01.057, 518, 22, 6492-6495, 2010.09, [URL].
281. K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Development of a Combinatorial Plasma Process Analyzer for Advanced R&D of Next Generation Nanodevice Fabrications, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch40, 219, 279-284, 2010.09, [URL].
282. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch27, 219, 183-188, 2010.09, [URL].
283. K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy, Japanese Journal of Applied Physics, 10.1143/JJAP.49.08JA02, 49, 8, 08JA02, 2010.08, [URL].
284. 白谷正治, プラズマ・プロセス技術, 応用物理, 79, 8, 717-719, 2010.08, [URL].
285. Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5617205, 3347-3351, 2010.07, [URL].
286. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616514, 3722-3755, 2010.07, [URL].
287. K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616502, 3718-3721, 2010.07, [URL].
288. M. C. Sung, Keiko Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Etching characteristics of organic low-k films interpreted by internal parameters employing a combinatorial plasma process in an inductively coupled H2/N2 plasma, J. Appl. Phys. , 10.1063/1.3415535, 107, 11, 113310, 2010.06, [URL].
289. C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Surface loss probabilities of H and N radicals on different materials in afterglow plasma employing H2 and N2 mixture gases, J. Appl. Phys. , 10.1063/1.3372750, 107, 10, 103310, 2010.05, [URL].
290. Y. Setsuhara, C. Ken, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasma sustained via RF inductive coupling with low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.038, 518, 13, 3555-3560, 2010.04, [URL].
291. Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasma driven by multiple low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.045, 518, 13, 3561-3565, 2010.04, [URL].
292. A. Tanaka, M. Hirata, Y. Kiyohara, M. Nakano, K. Omae, M. Shiratani, K. Koga, Review of pulmonary toxicity of indium compounds to animals and humans, Thin Solid Films, 10.1016/j.tsf.2009.10.123, 518, 11, 2934-2936, 2010.03, [URL].
293. C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, High performance of compact radical monitoring probe in H2/N2 mixture plasma, J. Vac. Sci. Technol., B, 10.1116/1.3327926 , 28, 2, 17-20, 2010.03, [URL].
294. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, Proc. of the 27th symposium on plasma processing, A5-06, 91-92, 2010.02.
295. Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD, Proc. of the 27th symposium on plasma processing, B5-05, 101-102, 2010.02.
296. H. Sato, Y. Kawashima, K. Nakahara, K. Koga, M. Shiratani, Measurement of electron density in multi-hollow discharges with magnetic field, Proc. of the 27th symposium on plasma processing, A6-01, 105-106, 2010.02.
297. S. Iwashita, H. Miyata, YasuY. Yamada, H. Matsuzaki, K. Koga, M. Shiratani, Observation of nano-particle transport in capacitively coupled radio frequency discharge plasma, Proc. of the 27th symposium on plasma processing, P1-13, 153-154, 2010.02.
298. H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD Experimental Group, In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasma and Inner Wall in LHD, Proc. of the 27th symposium on plasma processing, P1-14, 155-156, 2010.02.
299. T. Nomura, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor, Proc. of the 27th symposium on plasma processing, P1-39, 205-206, 2010.02.
300. T. Mieno, GuoDong Tan, S. Usuba, K. Koga, M. Shiratani, In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity), Proc. of the 27th symposium on plasma processing, P2-17, 257-258, 2010.02.
301. M. Hori, C. S. Moon, M. Sekine, K. Takeda, Y. Setushara, M. Shiratani, A Low Pressure Combinatorial Plasma Process Employing an Integrated Monitoring, Proc. of the 27th symposium on plasma processing, T-02, 7-8, 2010.02.
302. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Advanced Polymer Nano-Processing with Density-Inclination Plasma, Proc. of the 27th symposium on plasma processing, B5-01, 93-94, 2010.02.
303. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, X-Ray Photoelectron Spectroscopy Analysis of Plasma Interactions with Polymers for Development of Low-Damage and Low-Temperature Plasma Processes, Proc. of the 27th symposium on plasma processing, P2-33, 289-290, 2010.02.
304. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1210-Q07-10 , 1210, Q07-10, 217-222, 2010.01, [URL].
305. T. Nomura, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition Profile Control of Carbon Films on Patterned Substrates using a Hydrogen-assited Plasma CVD Method, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1222-DD05-16, 1222, DD05-16, 203-207 , 2010.01, [URL].
306. Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Plasma surface treatment of polymers with inductivity-coupled RF plasma driven by low-inductance antenna units , Thin Solid Films, 10.1016/j.tsf.2009.07.161, 518, 3, 1006-1011 , 2009.12, [URL].
307. Y. Setsuhara, K. Nagao, M. Shiratani, M. Sekine, M. Hori, Development of density-inclination plasma for analysis of plasma nano-processes via combinatorial method , Thin Solid Films, 10.1016/j.tsf.2009.07.162, 518, 3, 1020-1023, 2009.12, [URL].
308. A. Komori, H. Yamada, S. Sakakibara, O. Kaneko, K. Kawahata, T. Mutoh, N. Ohyabu, S. Imagawa, K. Ida, Y. Nagayama, T. Shimozuma, K.Y. Watanabe, T. Mito, M. Kobayashi, K. Nagaoka, R. Sakamoto, N. Yoshida, S. Ohdachi, N. Ashikawa, Y. Feng, T. Fukuda, H. Igami, S. Inagaki, H. Kasahara, S. Kubo, R. Kumazawa, O. Mitarai, S. Murakami, Y. Nakamura, M. Nishiura, T. Hino, S. Muzaki, K. Tanaka, K. Toi, A. Weller, M. Yoshinuma, Y. Narushima, N. Ohno, T. Okamura, N. Tamura, K. Saito, T. Seki, S. Sudo, H. Tanaka, T. Tokuzawa, N. Yanagi, M. Yokoyama, Y. Yoshimura, T. Akiyama, H. Chikaraishi, M. Chowdhuri, M. Emoto, N. Ezumi, H. Funaba, L. Garcia, P. Goncharov, M. Goto, K. Ichiguchi, M. Ichimura, H. Idei, T. Ido, S. Iio, K. Ikeda, M. Irie, A. Isayama, T. Ishigooka, M. Isobe, T. Ito, K. Itoh, A. Iwamae, S. Hamaguchi, T. Hamajima, S. Kitajima, S. Kado, D. Kato, T. Kato, S. Kobayashi, K. Kondo, S. Mamune, Y. Matsumoto, N. Matsunami, T. Minami, C. Michael, H. Miura, J. Miyazawa, N. Mizuguchi, T. Morisaki, S. Morita, G. Motojima, I. Murakami, S. Muto, K. Nagasaki, N. Nakajima, Y. Nakamura, H. Nakanishi, H. Nakano, K. Narihara, A. Nishimura, H. Nishimura, K. Nishimura, S. Nishimura, N. Nishino, T. Notake1, T. Obana, K. Ogawa, Y. Oka, T. Ohishi, H. Okada, K. Okuno, K. Ono, M. Osakabe, T. Osako, T. Ozaki, B.J. P.son, H. Sakaue, M. Sasao, S. Satake, K. Sato, M. Sato, A. Shimizu, M. Shiratani, M. Shoji, H. Sugama, C. Suzuki, Y. Suzuki, K. Takahata, H. Takahashi, Y. Takase, Y. Takeiri, H. Takenaga, S. Toda, Y. Todo, M. Tokitani, H. Tsuchiya, K. Tsumori, H. Urano, E. Veshchev, F. Watanabe, T. Watanabe, T.H. Watanabe, I. Yamada, S. Yamada, O. Yamagishi, S. Yamaguchi, S. Yoshimura, T. Yoshinaga and O. Motojima, Development of net-current free heliotron plasma in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/49/10/104015, 49, 10, 104015, 2009.10, [URL].
309. H. Miyahara, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Detection of nano-particles formed in cvd plasma using a two-dimensional photon-counting laser-light-scattering method, J. Plasma Fusion Res., 8, 700-704, 2009.09, [URL].
310. S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD experimental group, A comparison of dust particles produced due to interaction between graphite and plasma: LHD vs helicon discharges, J. Plasma Fusion Res., 8, 308-311, 2009.09, [URL].
311. S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles, J. Plasma Fusion Res., 8, 582-586, 2009.09, [URL].
312. W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, J. Umetsu, H. Miyahara, H. Matsuzaki, K. Koga, M. Shiratani, Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition, J. Plasma Fusion Res., 8, 736-739, 2009.09, [URL].
313. H. Sato, Y. Kawashima, M. Tanaka, K. Koga, W. M. Nakamura, M. Shiratani , Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method, J. Plasma Fusion Res., 8, 1435-1438, 2009.09, [URL].
314. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches, J. Plasma Fusion Res., 8, 1443-1446, 2009.09, [URL].
315. C. S. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Combinatorial Plasma Etching Process, Applied Physics Express , 10.1143/APEX.2.096001, 2, 9, 096001(3pages), 2009.09, [URL].
316. M. Shiratani, K. Koga, Toward plasma nano-factories, Proc. of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I), 86, 2009.09.
317. H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, Dust Particles formed owing to interactions between H2 or D2 helicon plasma, graphite, Proc. of 2009 International Symposium on Dry Process, 33, 2009.09.
318. S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation, Proc. of 2009 International Symposium on Dry Process, 99, 2009.09.
319. T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD, Proc. of 2009 International Symposium on Dry Process, 101, 2009.09.
320. Y. Kawashima, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD, Proc. of 2009 International Symposium on Dry Process, 107, 2009.09.
321. H. Sato, Y. Kawashima, K. Koga, M. Shiratani, Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer, Proc. of 2009 International Symposium on Dry Process, 113, 2009.09.
322. K. Nakahara, Y. Kawashima, H. Sato, K. Koga, M. Shiratani, Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe, Proc. of 2009 International Symposium on Dry Process, 163, 2009.09.
323. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama, Plasma CVD of Nano-particle Composite Porous SiOCH Films, Proc. of 19th International Symposium on Plasma Chemistry, 2009.07, [URL].
324. K. Koga, S. Iwashita, S. Kiridoshi, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Characterization of Dust Particles Ranging in Size from 1 nm to 10 m Collected in LHD, Plasma and Fusion Research, 10.1585/pfr.4.034 , 4, 034-034, 2009.04, [URL].
325. K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method, Proc. of PSS2009/SPP26, 2009.02.
326. Nakamura W. M., Sato H., Koga K., Shiratani M., Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells
, Proc. of PSS2009/SPP26, 2009.02.
327. S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, A. Sagara, K. Nisimura , Characteristics of dust particles produced due to interaction between hydrogen plasma, graphite
, Proc. of PSS2009/SPP26, 2009.02.
328. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile of toluene plasma CVD carbon films in trenches, Proc. of PSS2009/SPP26, 2009.02.
329. K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, Proc. of PSS2009/SPP26, 2009.02.
330. S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode, Proc. of PSS2009/SPP26, 2009.02.
331. S. I. Krasheninnikov, R. D. Smirnov,Y. Tanaka,T. K. Soboleva, D. A. Mendis, D. L. Rudakov, W. P. West, C. H. Skinner, B. Lipschultz, R. S. Granetz, N. Ohno, S. Muzaki, M. Shiratani, R. Kumazawa, T. Nakano, R. Maqueda, A. Y. Pigarov, M. Rosenberg, D. J. Benson, T. D. Rognlien, B. D. Bray, J. H. Yu, A. L. Roquemore, J. L. Terry, A. Bader, C. S. Pitcher, S. Takamura, N. Ashikawa, M. Tokitani, N. Asakura, A. M. Litnovsky, Recent progress in understanding the behavior of dust in fusion devices, Plasma Physics and Controlled Fusion, 10.1088/0741-3335/50/12/124054, 50, 12, 124054, 2008.12, [URL].
332. S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa, Proc. of 30th International Symposium on Dry Process, 115, 2008.12.
333. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Deposition profile of plasma CVD carbon films in trenches, Proc. of 30th International Symposium on Dry Process, 35, 2008.12.
334. S. Iwashita, K. Koga, M. Morita, M. Shiratani, Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062006, 100, 6, p. 062006, 2008.08, [URL].
335. J. Umetsu, K. Koga, K. Inoue, M. Shiratani, Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062007, 100, 6, p. 062007, 2008.08, [URL].
336. W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani, Cluster incorporation control for a-Si:H film deposition, J. Phys. : Conference Series, 10.1088/1742-6596/100/8/082018, 100, 8, p. 082018, 2008.08, [URL].
337. S. Iwashita, Michihito Morita, H. Matsuzaki, K. Koga, and M. Shiratani, Temperature dependence of dielectric constant of nano-particle composite porous low-k films fabricated by pulse rf discharges with amplitude modulation, Jpn. J. Appl. Phys., 10.1143/JJAP.47.6875, 47, 8, 6875-6878, 2008.08, [URL].
338. S. Nunomura, K. Koga, Y. Watanabe, M. Shiratani, M. Kondo, Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasma, Phys. Plasma, 10.1063/1.2972162, 15, 8, p. 080703, 2008.08, [URL].
339. J. Umetsu, K. Koga, K. Inoue, H. Matzuzaki, K. Takenaka, M. Shiratani, Discharge power dependence of Ha intensity asn electron density of Ar+H2 discharges in H-assisted plasma CVD reactor, Surf. Coat. Technol., 10.1016/j.surfcoat.2008.06.108, 202, 22-23, 5659-5662, 2008.08, [URL].
340. W. M. Nakamura, H. Miyahara, K. Koga, M. Shiratani, Two dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD, IEEE Trans. Plasma Science, 10.1109/TPS.2008.923830, 36, 4, 888-889, 2008.08, [URL].
341. M. Shiratani, W. M. Nakamura, H. Miyahara, K. Koga, Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films, Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08), 69, 2008.07.
342. M. Shiratani, S. Iwashita, K. Koga, S. Nunomura, Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage, Faraday Discussions, 10.1039/B704910B , 137, 127-138, 2008.01, [URL].
343. K. Koga, W. M. Nakamura, and M. Shiratani, VHF discharge sustained in a small hole, Proc. 28th Intern. Conf. on Phenomena in Ionized Gases , 1987-1989, 2007.07.
344. K. Koga, S. Iwashita, M. Shiratani, Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage, J. Phys. D: Appl. Phys., 10.1088/0022-3727/40/8/S05, 40, 8, 2267-2271, 2007.04, [URL].
345. M. Shiratani, K. Koga, S. Ando, T. Inoue, Y. Watanabe, S. Nunomura, M. Kondo, Single step process to deposit Si quantum dot films using H2+SiH4 VHF discharges and electron mobility in a Si quantum dot solar cell, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.012, 201, 9-11, 5468-5471, 2007.02, [URL].
346. S. Iwashita, K. Koga, M. Shiratani, A device for trapping nano-particles formed in processing plasma for reduction of nano-waste, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.060, 201, 9-11, 5701-5704, 2007.02, [URL].
347. S. Iwashita, K. Koga, M. Shiratani, Transport of nano-particles in pulsed AM RF discharges, Proc. the 24th Symp. on Plasma Processing, 103-104, 2007.01.
348. M. Shiratani, S. Kiridoshi, K. Koga, S. Iwashita, N. Ashikawa, K. NIshimura, A. Sagara, A. Komori, LHD Experimental Group, In-situ sampling of dust generated in LHD and its analysis, Proc. the 24th Symp. on Plasma Processing, 371-372, 2007.01.
349. K. Koga, W. M. Nakamura, D. Shimokawa, M. Shiratani, Stability of a-Si:H deposited using multi-hollow plasma CVD, Proc. the 24th Symp. on Plasma Processing, 189-190, 2007.01.
350. M. Shiratani, K. Koga, N. Kaguchi, K. Bando,and Y. Watanabe, Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.015, 506-507, 17-21, 2006.05, [URL].
351. T. Kakeya, K. Koga, M. Shiratani, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-clusters using pulsed H2+SiH4 VHF discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.090, 506-507, 288-291, 2006.05, [URL].
352. K. Koga, Y. Kitaura, M. Shiratani, Y. Watanabe, and A. Komori, Nano-particle formation due to interaction between H2 plasma and carbon wall, Thin Solid Films, 10.1016/j.tsf.2005.08.062, 506-507, 656-659, 2006.05, [URL].
353. K. Takenaka, K. Koga, M. Shiratani, Y. Watanabe, and T. Shingen, Mechanism of Cu deposition from Cu(EDMDD)2 using H-assisted plasma CVD, Thin Solid Films, 10.1016/j.tsf.2005.08.028, 506-507, 197-201, 2006.05, [URL].
354. S. Nunomura, M. Kita,, K. Koga, M. Shiratani, and Y. Watanabe, In situ simple method for measuring size and density of nanoparticles in reactive plasma, J. Appl. Phys., 10.1063/1.2189951 , 99, 8, 083302(7pages), 2006.04, [URL].
355. S. Komatsu, D. Kazami, Norihoro Tanaka, Y. Moriyoshi, M. Shiratani, KatsuY. Okada, BN micro-fibers grown by plasma-assisted laser chemical vapor deposition without a metal catalyst, Appl. Phys. Express, 10.1063/1.2188381, 88, 151914(3pages), 2006.04, [URL].
356. S. Nunomura, K. Koga, M. Shiratani, Y. Watanabe, Y. Morisada, N. Matsuki, and S. Ikeda, Fabrication of nanoparticle composite porous films having ultra-low dielectric constant, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1509, 44, 50, L1509-L1511, 2005.12, [URL].
357. K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1430, 44, 48, L1430-L1432, 2005.11, [URL].
358. K. Koga, N. Kaguchi, K. Bando, and M. Shiratani, Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma CVD, Rev. Sci. Instrum. , 10.1063/1.2126572, 76, 11, 113501(4pages), 2005.11, [URL].
359. Y. Watanabe, M. Shiratani, and K. Koga, Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects, Trans. Mater. Res. Soc. Jpn., 30, 1, 267-272, 2005.03.
360. M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-particles using VHF discharges and their properties, Trans. Mater. Res. Soc. Jpn., 30, 1, 307-310, 2005.03.
361. K. Takenaka, M. Shiratani, M. Takeshita, M. Kita, K. Koga, and Y. Watanabe, Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition, Pure Appl. Chem. , 10.1351/pac200577020391, 77, 2, 391-398, 2005.01, [URL].
362. S. Komatsu, A. Okudo, D. Kazami, D. Golberg, Y. Li, Y. Moriyoshi, M. Shiratani, K. Okada, Electron field emission from self-organized microemitters of sp3-bonded 5H boron nitride with very high current density at low electric field, J. Phys. Chem. B, 10.1021/jp0493475, 108, 17, 5182-5184, 2004.10, [URL].
363. K. Takenaka, M. Kita,, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition, J. Vac. Sci. Technol., A, 10.1116/1.1738663, 22, 4, 1903-1907, 2004.07, [URL].
364. K. Koga, N. Kaguchi, M. Shiratani, and Y. Watanabe, Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H2 bonds in the films, J. Vac. Sci. Technol., A, 10.1116/1.1763905 , 22, 4, 1536-1539, 2004.07, [URL].
365. K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori, Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall, IEEE Trans. Plasma Science, 10.1109/TPS.2004.828129 , 32, 2, 405-409, 2004.02, [URL].
366. S, Komatsu, K. Kurashima, Y.shimizu, Y. Moriyoshi, M. Shiratani, K. Okada, Condensation of sp 3-Bonded Boron Nitride through a Highly Nonequilibrium Fluid State, J. Phys. Chem. B, 10.1021/jp0364452, 108, 1, 205-211, 2004.01, [URL].
367. 白谷正治, 古閑一憲, 尾形隆則, 掛谷知秀, 鹿口直斗, 渡辺征夫, シランプラズマ中のクラスタ成長と薄膜形成, 信学技報, 103, 6, 35-39, 2003.04, [URL].
368. M. Shiratani, K. Koga, A. Harikai, T. Ogata, and Y. Watanabe, Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges, MRS Symp. Proc., 10.1557/PROC-762-A9.5, 762, A9.5.1-9.5.6, 2003.04, [URL].
369. K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches, MRS Symp. Proc., 10.1557/PROC-766-E3.8, 766, E3.8.1-3.8.6, 2003.04, [URL].
370. K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe, Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition, Matr. Sci. Semiconductor Processing, 10.1016/S1369-8001(02)00108-7, 5, 2, 301-304, 2003.02, [URL].
371. KS Kim, DJ Kim, JH Yoon, JY Park, Y Watanabe, M Shiratani, The changes of particle charge distribution during rapid growth of partilcles in the plasma reactor, J. Colloid Interface Sci., 10.1016/S0021-9797(02)00049-8, 257, 2, 195-207, 2003.02, [URL].
372. M. Shiratani, M. Kai, K. Koga, and Y. Watanabe, Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films, Thin Solid Films, 10.1016/S0040-6090(02)01171-9, 427, 1-2, 1-5, 2003.01, [URL].
373. S. Komatsu, K. Kurashima, H. Kanada, K. Okada, M. Mitomo, Y. Moriyoshi, Y. Shimizu, M. Shiratani, T. Nakano, S. Samukawa, Highly crystalline 5H-polytype of sp3-bonded boron nitride prepared by plasma-packets-assisted pulsed-laser deposition: an ultraviolet light-emitter at 225nm, Appl. Phys. Lett., 10.1063/1.1527987, 81, 24, 4547-4549, 2002.12, [URL].
374. 白谷正治, 古閑一憲, 渡辺征夫, ナノクラスタ制御プラズマCVDと高品質,光安定a-Si:H太陽電池への応用, アモルファスセミナーテキスト, 95-100, 2002.11.
375. M. Shiratani, K. Koga, Y. Watanabe, Formation of nano-particles in microgravity plasma, Journal of Japan Society of Microgravity Application, 19, 69, 2002.10, [URL].
376. K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of copper by plasma CVD method, Proc. Intern. Symp. on Dry Process, 221-226, 2002.10.
377. Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited lecture paper), Plasma Sources Sci. Technol., 10.1088/0963-0252/11/3A/334, 11, A229-A233, 2002.08, [URL].
378. 白谷正治, 反応性プラズマと材料プロセスの基礎, プラズマ・核融合学会サマースクールテキスト, 50-62, 2002.07.
379. K. Koga, R. Uehara, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasma and carbon wall, Proc. ESCANPIG16/ICRP5 Joint Meeting, I173--I174, 2002.07.
380. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2, Proc. ESCANPIG16/ICRP5 Joint Meeting, II173--II174, 2002.07.
381. M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films, Proc. ESCANPIG16/ICRP5 Joint Meeting, II323--II324, 2002.07.
382. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of Cu with H-assisted plasma CVD, Proc. ESCANPIG16/ICRP5 Joint Meeting, II199--II200, 2002.07.
383. K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 227-232, 2002.05.
384. K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 238-243, 2002.05.
385. Y. Watanabe, A. Harikai, K. Koga, M. Shiratani, Clustering phenomena in low-pressure reactive plasma: basis and applications (invited lecture paper), Pure Appl. Chem. , 10.1351/pac200274030483, 74, 3, 483-487, 2002.03, [URL].
386. K. Koga, M. Kai, M. Shiratani, Y. Watanabe, N. Shikatani, Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films, Jpn. J. Appl. Phys., 10.1143/JJAP.41.L168, 41, 2B, L168-L170, 2002.02, [URL].
387. M. Shiratani, K. Koga, Y. Watanabe, Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges, Proc. Nano-technology Workshop, 7-12, 2002.02.
388. K. Koga, M. Shiratani, Y. Watanabe, In-situ measurement of size and density of particles in sub-nm to nm size range, Proc. Nano-technology Workshop, 13-20, 2002.02.
389. 白谷正治, 古閑一憲, 渡辺征夫, プロセスプラズマ中のクラスタ - アモルファスシリコン太陽電池製造用プラズマ中のクラスター, Bulletin of Cluster Sci. Technol., 5, 13-18, 2002.01.
390. 白谷正治, CVDにおける今後の動向を考える, 応用物理, 71, 1, 106-107, 2002.01.
391. 渡辺征夫, 古閑一憲, 白谷正治, クラスタ制御プラズマCVD法によるSi薄膜の高品質化, シリコンテクノロジー, 37, 21-26, 2002.01.
392. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2, Proc. Intern. Symp. on Dry Process, 169-174, 2001.11.
393. M. Shiratani, K. Koga, Y. Watanabe, Cluster-less plasma CVD reactor and its application to a-Si:H film deposition, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-664-A5.6, A5.6.1-A5.6.6, 2001.07, [URL].
394. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, Development of H-assisted plasma CVD reactor for Cu interconnects, Proc. Intern. Conf. on Phenomena in Ionized Gases, 147-148, 2001.07.
395. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 153-154, 2001.07.
396. Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited), Proc. Intern. Conf. on Phenomena in Ionized Gases, 15-16, 2001.07.
397. K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, Proc. Intern. Conf. on Phenomena in Ionized Gases, 39-40, 2001.07.
398. Y. Watanabe, M. Shiratani, K. Koga, Clustering phenomena in low-pressure reactive plasma: base and applications (invited), Proc. Intern. Symp. on Plasma Chemistry, 726-730, 2001.07.
399. Y. Watanabe, M. Shiratani, T. Fukuzawa, H. Kawasaki, Y. Ueda, S. Singh, H. Ohkura, Contribution of short lifetime radicals to growth of particles in SiH4 HF discharges and effects of particles on deposited films, J. Vac. Sci. Technol., A, 10.1116/1.580069, 14, 3, 995-1001, 2001.05, [URL].
400. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration, Sci. Technol. Adv. Mater., 10.1016/S1468-6996(01)00131-0, 2, 3-4, 505-515, 2001.04, [URL].
401. Y. Watanabe, M. Shiratani, H. Kawasaki, S. Singh, T. Fukuzawa, Y. Ueda, H. Ohkura, Growth processes of particles in high frequency silane plasma, J. Vac. Sci. Technol., A, 10.1116/1.580141, 14, 2, 540-545, 2001.03, [URL].
402. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, In-situ polarization-sensitive laser-light scattering method for simultaneous measurements of two dimensional spatial size and density distributions of particles in plasma, J. Vac. Sci. Technol., A, 10.1116/1.580152, 14, 2, 603-607, 2001.03, [URL].
403. Y. Watanabe, M. Shiratani, K. Koga, Formation kinetics and control of dust particles in capacitively-coupled reactive plasma (invited), Phys. Scripta, 10.1238/Physica.Topical.089a00029, T89, 29-32, 2001.01, [URL].
404. J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, J. Guillon, Surface reaction probabilities and kinetics of H, SiH3, Si2H5, CH3 and C2H5 during deposition of a-Si:H and a-C:H from H2, SiH4 and CH4 discharges, J. Vac. Sci. Technol., A, 10.1116/1.580983, 16, 1, 278-289, 2001.01, [URL].
405. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H assisted control of quality and conformality in Cu film deposition using plasma CVD method, Proc. Advanced Metallization Conf. 2000, 271-278, 2001.01.
406. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 393-394, 2001.01.
407. M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Measurements of surface reaction probability of SiH3, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 419-420, 2001.01.
408. M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe, Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 421-422, 2001.01.
409. M. Shiratani, K. Koga, Y. Watanabe, Plasma CVD method for Cu interconnects in ULSI (invited), Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 751-754, 2001.01.
410. K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasma, Proc. Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 385-386, 2001.01.
411. K. Koga, Y. Matsuoka, M. Shiratani, Y. Watanabe, In situ observation of nucleation and subsequent growth of clusters in silane rf discharges, Appl. Phys. Lett., 77, 2, 196-198, 2000.07.
412. M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, Methods of suppressing cluster growth in silane rf discharges, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-609-A5.6, A5.6.1-A5.6.6, 2000.07, [URL].
413. H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-612-D9.2.1, D9.2.1-D9.2.6, 2000.07, [URL].
414. H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source, Res. Rep. ISEE Kyushu Univ., 5, 1, 57-61, 2000.03.
415. Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga, Growth processes of particles up to nanometer size in high-frequency SiH4 plasma, Jour. Technical Phys., 41, 1, 505-519, 2000.01.
416. M. Shiratani, S. Maeda, K. Koga, Y. Watanabe, Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.39.287, 39, 1, 287-293, 2000.01, [URL].
417. T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth of Particles in Cluster-size Range in Low Pressure and Low Power SiH4 RF Discharges, J. Appl. Phys., 10.1063/1.371256, 86, 7, 3543-3549, 1999.10, [URL].
418. M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle Growth Kinetics in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4542, 38, 7B, 4542-4549, 1999.07, [URL].
419. H. Jin, M. Shiratani, Y. Nakatake, T. Fukuzawa, T. Kinoshita, Y. Watanabe, M. Toyofuku, Conformal Deposition of High-Purity Copper Using Plasma Reactor, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4492, 38, 7B, 4492-4495, 1999.07, [URL].
420. Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of Gas Flow on Particle Growth in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4556, 38, 7B, 4556-4560, 1999.07, [URL].
421. 白谷正治, 渡辺征夫, フォトンカウンティングレーザ散乱法によるプラズマ中の微粒子計測, 応用物理, 68, 5, 553-554, 1999.05.
422. 白谷正治, 渡辺征夫, 水素ラジカル源付プラズマCVD装置による高品質銅薄膜の形成, 応用物理, 68, 3, 299-303, 1999.03, [URL].
423. 渡辺征夫, 白谷正治, CVDプラズマにおけるクラスター成長, プラズマ材料科学第153委員会第42回研究会テキスト, 1-7, 1999.03.
424. H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on initial growth of particles in low-pressure and low-power GeH4 rf discharges using the high-sensitivity photon-counting laser-light-scattering method, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L1264, 37, 10B, L1264-1267, 1998.10, [URL].
425. H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Transition of particle growth region in SiH4 rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.5757, 37, 10, 5757-5762, 1998.10, [URL].
426. H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on particle formation in germane rf discharges by photon-counting laser-light-scattering method, Proc. 4th Intern. Conf. on Reactive Plasma, 59-60, 1998.10.
427. Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of gas flow on particle growth in silane rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 61-62, 1998.10.
428. Y. Watanabe, A. Hatae, T. Fukuzawa, M. Shiratani, Trajectory of particle injected from plasma reactor wall, Proc. 4th Intern. Conf. on Reactive Plasma, 63-64, 1998.10.
429. T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth mechanism of particles in cluster-size range in SiH4 rf discharges using threshold photoemission method, Proc. 4th Intern. Conf. on Reactive Plasma, 67-68, 1998.10.
430. S. Maeda, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for size and density measurements of nano-particles in processing plasma, Proc. 4th Intern. Conf. on Reactive Plasma, 69-70, 1998.10.
431. H. J. Jin, M. Shiratani, T. Fukuzawa, Y. Watanabe, Trench filling and deposition of high quality Cu thin films using CVD plasma reactor with H radical source, Proc. 4th Intern. Conf. on Reactive Plasma, 95-96, 1998.10.
432. M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle formation in rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 169-170, 1998.10.
433. M. Shiratani, A. Minemoto, T. Fukuzawa, Y. Watanabe, Density profile of SiH3 in SiH4 rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 197-198, 1998.10.
434. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, A study on the time evolution of SiH3 surface loss probability on hydrogenated amorphous silicon films in SiH4 rf discharges using infrared diode-laser absorption spectroscopy, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/31/7/004, 31, 7, 776-780, 1998.07, [URL].
435. H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on growth processes of particles in germane radio frequency discharges using laser light scattering and scanning electron microscopic methods, J. Appl. Phys. , 10.1063/1.36742, 83, 11, 5665-5669, 1998.06, [URL].
436. M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for detection of nano-particles fromed in CVD plasma, Rev. Laser Eng., 10.2184/lsj.26.449, 26, 6, 449-452, 1998.06, [URL].
437. H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Similarities in spatial distributions of absolute GeH2 density, radical producition rate and particle amount in GeH4 discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L475, 37, 4B, L457-L477, 1998.04, [URL].
438. 福澤 剛, 宮原 弘臣, 串間 真二, 川崎 仁晴, 白谷正治, 渡辺征夫, シラン高周波放電中の微小微粒子のサイズと密度その場測定法の開発, システム情報科学研究科報告, 3, 1, 117-124, 1998.03, [URL].
439. 白谷正治, 渡辺征夫, 小特集 ダストプラズマの現状と課題 5.プラズマプロセスにおける微粒子現象, プラズマ・核融合学会, 73, 11, 1240-1245, 1997.11.
440. M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface Reaction Kinetics of CH3 in CH4 RF Discharge Studied by Time-Resolved Threshold Ionization Mass Spectrometry, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4752, 36, 7B, 4752-4755, 1997.07, [URL].
441. H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Roles of SiH3 and SiH2 radicals in particle growth in rf silane plasma, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4985, 36, 7B, 4985-4988, 1997.07, [URL].
442. H. Videlot, M. Shiratani, J. Jolly, J. Perrin, Effects of H2 dilution on surface loss probability of CH3 on a-C:H in CH4+H2 rf discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 3, 293-294, 1997.02.
443. Y. Watanabe, T. Fukuzawa, H. Kawasaki, M. Shiratani, Particle Formation in High Frequency CVD Plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 225-226, 1997.01.
444. M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface reaction kinetics of CH3 in CH4 RF discharges studied by time-resolved Ms spectroscopy, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 293-294, 1997.01.
445. T. Fukuzawa, H. Miyahara, K. Nishimura, H. Kawasaki, M. Shiratani, Y. Watanabe, Growth and behavior of particles below nanometer in size in silane plasma using threshold photoemission method, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 349-350, 1997.01.
446. H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Study on growth processes of particles in rf SiH4 plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 351-352, 1997.01.
447. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Diagnostic of plasma for metal-organic chemical vapour deposition of Cu and fabrication of Cu thin films using the plasma, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/29/11/005, 29, 1, 2754-2758, 1996.11, [URL].
448. T. Fukuzawa, K. Obata, H. Kawasaki, M. Shiratani, Y. Watanabe, Detection of particles in rf silane plasma using photoemission method, J. Appl. Phys. , 10.1063/1.363273, 80, 6, 3202-3207, 1996.09, [URL].
449. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Production of size-controlled Si fine particules using pulsed rf dischange, Surf. Rev. Lett., 10.1142/S0218625X96000176 , 3, 1, 75-78, 1996.08, [URL].
450. M. Shiratani, N. Kishigaki, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Two-dimensional spatial profiles of size and density of particulates grown in RF silane plasmas, IEEE Trans. Plasma Science, 10.1109/27.491731, 24, 1, 99-100, 1996.02, [URL].
451. M. Shiratani, H. Kawasaki, T. Fukuzawa, T. Yoshioka, Y. Ueda, S. Singh, Y. Watanabe, Simultaneous in-situ measurements of properties of particulates in rf silane plasma using a polarization-sensitive laser-light-scattering method, J. Appl. Phys. , 10.1063/1.360916, 79, 1, 104-109, 1996.01, [URL].
452. M. Shiratani, T. Fukuzawa, K. Eto, Y. Watanabe, Detection of Negative Ions in a Helium-Silane RF Plasma, Jpn. J. Appl. Phys. Pt. 2, Letters, 10.1143/JJAP.31.L1791, 31, 12, 1791-1793, 1992.12, [URL].
主要総説, 論評, 解説, 書評, 報告書等
主要学会発表等
1. 白谷正治, 方トウジュン, 山木健司, 徐鉉雄, 板垣奈穂, 古閑一憲, カーボン薄膜の選択プラズマCVD, 平成30年電気学会全国大会, 2018.03.
2. M. Shiratani, H. Seo, N. Itagaki, K. Koga, IoT-oriented solar cells fabricated using plasma-based nanotechnology (Invited), 10th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 11th International Conference on Plasma Nanotechnology and Science (ISPlasma2018/IC-PLANTS2018), 2018.03.
3. M. Shiratani, K. Koga, H. Seo, N. Itagaki, Thin film deposition using low temperature plasmas: past, present, and future (Plenary), 4th International Workshop on Advanced Plasma Technology and Applications (The 4th IWAPTA workshop), 2018.02.
4. M. Shiratani, Plasma Application on Agriculture and Food/Plasma applications in waste to energy (Tutorial), 4th International Workshop on Advanced Plasma Technology and Applications (The 4th IWAPTA workshop), 2018.02.
5. M. Shiratani, T. Fang, K. Yamaki, K. Koga, D. Yamashita, H. Seo, N. Itagaki, K. Takenaka, Y. Setsuhara, Plasma CVD of a-C:H films as protective layers for solar cells (Invited), 5th Korea-Japan Joint Symposium on Advanced Solar Cells 2018, 2nd International Symposium on Energy Research and Application, 2018.02.
6. M. Shiratani, Challenge for big data analytics in semiconductor fabrication, Joint workshop btw SKKU and Kyushu University Emerging materials and devices, 2018.01.
7. M. Shiratani, K. Koga, Fine Particle Plasma and Plasma Process (Invited), 18th Workshop on Fine Particle Plasmas, 2017.12.
8. M. Shiratani, K. Koga, Impact of Plasma Processing of Agricautural Food on Taste and Food Quality (Invited), The 10th EU-Japan Joint Symposium on Plasma Processing (JSPP2017), 2017.12.
9. M. Shiratani, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, K. Koga, Growth Enhancement of Sorghum by Plasma Irradiation to The Seeds, The 2nd Asian Applied Physics Conference (Asian-APC), 2017.12.
10. 白谷正治, 古閑一憲, 未来の食を支えるプラズマ農業技術への挑戦(シンポジウム講演), Plasma Conference 2017, 2017.11.
11. M. Shiratani, K. Koga, H. Seo, N. Itagaki, Nanoparticle Composite Films: Fabrication and Functions (Invited), The 4th International Symposium on Hybrid Materials and Processing (HyMaP 2017) , 2017.11.
12. M. Shiratani, Spatiotemporal Non-uniformity of CVD Plasmas and Film Qualities (Invited), American Vacuum Society 64th International Symposium and Exhibition (AVS64), 2017.10.
13. M. Shiratani, K. Koga, H. Seo, N. Itagaki, Novel Fabrication Methods of Thin Films using Low Temperature Plasmas (Invited), Taiwan Association for Coating and Thin Film Technology (TACT) 2017, 2017.10.
14. 白谷正治, 微粒子プラズマの揺動解析(招待講演), H29年度東北大学電気通信研究所共同プロジェクト研究会 微粒子-流体混成系がもたらす多様な機能性 ~ 基礎物理から、メタマテリアル効果、熱応答性、種々の新現象 ~ , 2017.09.
15. M. Shiratani, Summary of 2017AAPPS-DPP applied plasma physics sessions (Plenary), 1st Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2017), 2017.09.
16. M. Shiratani, H. Ohtomo, K. Mori, D. Yamashita, H. Seo, N. Itagaki, K. Koga , Local Fluctuations of Plasma Detected with an Optically Trapped Fine Particle , 1st Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2017), 2017.09.
17. M. Shiratani, H. Seo, N. Itagaki, K. Koga, Spatial Structure of Interactions between Nanoparticles and Low Pressure Plasmas (Invited), 11th Asian-European International Conference on Plasma Surface Engineering (AEPSE2017) , 2017.09.
18. 白谷正治, 小島尚, 都甲将, 田中和真, 徐鉉雄, 板垣奈穂, 古閑一憲, スペクトル解析によるプラズマ中クラスター挙動の分類, 第78回応用物理学会秋季学術講演会, 2017.09.
19. M. Shiratani, Effects of Air, N2, and CO2 Plasma Irradiation to Seeds of Radish Sprouts, Potato and Soybean , International Conference on Phenomena in Ionized Gases (ICPIG 2017), 2017.07.
20. M. Shiratani, T. Takasaki, H. Wang, K. Matsushima, H. Seo, K. Koga, K. Takeda, M. Hori, and N. Itagaki , Measurements of nitrogen and oxygen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, International Conference on Phenomena in Ionized Gases (ICPIG 2017), 2017.07.
21. M. Shiratani, K. Koga, Plasma-surface interactions in biomedical and agricultural applications of plasma (Invited), 2017 International Forum on Functional Materials (IFFM2017) , 2017.06.
22. 白谷正治, 田浪荘汰, 坂本大輔, 張博辰, 徐鉉雄, 山下大輔, 板垣奈穂, 古閑一憲, スパッタ支援層交換で作製したポリイミド基板上結晶Ge薄膜の膜質 , 第64回応用物理学会春季学術講演会, 2017.03.
23. M. Shiratani, T. Sarinont, Y. Wada, R. Katayama, Y. Oide, K. Koga, Effects of atmospheric pressure plasma to various plant families on plant growth enhancement, 第64回応用物理学会春季学術講演会, 2017.03.
24. 白谷正治, 片山龍, 北﨑訓, T. Sarinont, 大井手芳徳, 和田陽介, 古閑一憲, 山下大輔, 徐鉉雄, 板垣奈穂, Attri Pankaj, Eun Ha Choi, 田中昭代, 大気圧DBD装置の活性種照射量の放電電力密度依存性, 第64回応用物理学会春季学術講演会, 2017.03.
25. M. Shiratani, T. Sarinont, Y. Wada, K. Koga, Low Temperature Air Plasma Irradiation to Rice Seeds, 34th Symposium on Plasma Processing (SPP34) / The 29th Symposium on Plasma Science for Materials (SPSM29), 2017.01.
26. 白谷正治, 最近のプラズマプロセスにおける原子・分 子素過程 -原子から生体高分子まで-(招待講演), 「プラズマ科学における分光計測の高度化と原子分子過程研究の新展開」 「原子分子データ応用フォーラムセミナー」合同研究会, 2016.12.
27. M. Shiratani, T. Sarinont, P. Attri, K. Koga, Comparison of biological effects between plasma and gamma-ray radiation, 26th annual meeting of MRS-J, 2016.12.
28. M. Shiratani, X. Dong, H. Seo, N. Itagaki, K. Koga, Plasma anisotropic CVD of carbon films from toluene (Invited), 6th International Conference on Advanced Plasma Technologies (ICAPT-6), 2016.12.
29. M. Shiratani, T. Sarinont, K. Koga, Advantages of Plasma Agriculture, The First International Conference on Hybridized Agriculture(HA2016), 2016.10.
30. M. Shiratani, K. Koga, Plasma assisted plant growth enhancement for agricultural yield enhancement (Invited), The 6th International Conference on Microelectronics and Plasma Technology (ICMAP 2016) , 2016.09.
31. M. Shiratani, P. Attri, T. Sarinont, E. H. Choi, K. Koga, A comparative study for action of gamma and plasma irradiation dose on thermodynamics of protein, 6th International Conference on Plasma Medicine (ICPM6), 2016.09.
32. M. Shiratani, S. Toko, Y. Torigoe, K. Keya, T. Kojima, H. Seo, N. Itagaki and K. Koga , Time evolution of radical deposition rate and cluster amount (Invited), 20th International Vacuum Congress (IVC-20), 2016.08.
33. 白谷正治, 循環型社会システムのための太陽光発電とCO2の資源化 (招待講演), ビジネスショウ&エコフェア2016 Next Stage in KYUSHU, 2016.06.
34. M. Shiratani, R. Katayama, K. Koga, D. Yamashita, H. Seo, N. Itagaki, S. Masuzaki, N. Ashikawa, M. Tokitani, K. Nishimura, A. Sagara, DC biased parallel plates for reduction of dust accumulation on first mirror, International Conference on Plasma Surface Interactions in Controlled Fusion Devices (22nd PSI) , 2016.05.
35. M. Shiratani, K. Koga, Fluctuation of position and energy of a fine particle in plasma nanofabrication (Invited), Intl’ Conf. on Processing & Manufacturing of Advanced Materials (THERMEC’2016), 2016.05.
36. M. Shiratani, T. Sarinont, K. Koga, N. Hayashi, Plasma induced multigeneration effects on plant growth and crop yield (Invited), 1st International Workshop on Plasma Agriculture (IWOPA), 2016.05.
37. M. Shiratani, T. Sarinont, K. Koga, N. Hayashi, R&D status of agricultural applications of high voltage and plasma in Japan (Invited), Workshop on Application of Advanced Plasma Technologies in CE Agriculture, 2016.04.
38. 白谷正治, 片山龍, 古閑⼀憲, 山下大輔, 徐鉉雄, 板垣奈穂, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, LHD実験グループ, コンパクトドリフトチューブを用いたプラズマ生成ダスト捕集, 第63回応用物理学会春季学術講演会, 2016.03.
39. 白谷正治, 古閑⼀憲, 宇宙科学・⼯学とプラズマ (招待講演), 第63回応用物理学会春季学術講演会, 2016.03.
40. M. Shiratani, R. Katayama, K. Koga, D. Yamashita, H. Seo, N. Itagaki, S. Masuzaki, N. Ashikawa, M. Tokitani, K. Nishimura, A. Sagara, and the LHD Experimental Group, A compact drift tube: a novel in-situ dust measurement method, 8th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma Nanotechnology and Science (ISPlasma2016/IC-PLANTS2016), 2016.03.
41. M. Shiratani, Reduction of harvest period and increase in harvest yield of seed plants using plasmas (Invited), 東北大学電気通信研究所共同プロジェクト研究会"仙台プラズマフォーラム", 2016.01.
42. M. Shiratani, Special Lecture for JSPS153 Committee Plasma Materials Science Award Future Directions of Plasma Technology (Invited), 9th APSPT/28th SPSM, 2015.12.
43. M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga, Plasma Assisted Agriculture (Invited), 2015 MRS Fall Meeting, 2015.12.
44. 白谷正治, 古閑一憲, 林信哉, プラズマによる植物成長促進・食糧増産, 第32回プラズマ・核融合学会 年会, 2015.11.
45. M. Shiratani and K. Koga, Plasma assisted enhancement of agricultural yield (Invited), 25th International TOKI Conference (ITC-25), 2015.11.
46. M. Shiratani, Suppression of electron-hole recombination utilizing piezo-electirc field in quantum well solar cells (Invited), Workshop on Nanomaterials for Energy Applications, 2015.09.
47. M. Shiratani, T. Ide, K. Matsushima, T. Takasaki, H. Seo, K. Koga, N. Itagaki, Requirements Of Buffer Layer For Heteroepitaxy Of ZnO On Lattice-Mismatched Substrate By Sputtering, The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015), 2015.09.
48. 白谷正治, プラズマ中2体衝突ダスト間引力・斥力の検出, 平成27年度 東北大学電気通信研究所共同プロジェクト研究会「微粒子プラズマ物理に基づいた新規ナノ材料創成」, 2015.09.
49. M. Shiratani, M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, Position fluctuation of a fine particle optically trapped in Ar plasma, The XXXII edition of the International Conference on Phenomena in Ionized Gases (ICPIG2015), 2015.07.
50. M. Shiratani, T. Ito, K. Koga, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, T. Kobayashi, S. Inagaki, Bispectrum analysis of fluctuation of nanoparticle amount in amplitude modulated capacitively-coupled discharge plasmas, The XXXII edition of the International Conference on Phenomena in Ionized Gases (ICPIG2015), 2015.07.
51. M. Shiratani, K. Koga, H. Seo, N. Itagaki, Third Generation Photovoltaics (Invited), The 1st Asian Workshop on Advanced Plasma Technology and Application, 2015.07.
52. M. Shiratani, K. Koga, H. Seo, N. Itagaki, Second and Third Generation Photovoltaics (Invited), 2015 International Forum on Functional Materials (IFFM2015), 2015.06.
53. M. Shiratani, T. Sarinont, T. Amano, K. Koga, N. Hayashi, Improvement of Agricultural Productivity utilizing Plasmas, 2015 International Forum on Functional Materials (IFFM2015), 2015.06.
54. 白谷正治, プラズマを用いた植物の成長促進(シンポジウム講演), 第68回日本酸化ストレス学会学術集会, 2015.06.
55. 白谷正治, 都甲将, 鳥越祥宏, 毛屋公孝, 古閑一憲, クラスタ除去によるa-Si太陽電池の光劣化抑制(招待講演), 電子情報通信学会有機エレクトロニクス研究会, 2015.04.
56. M. Shiratani, X. Dong, K. Koga, N. Itagaki, H. Seo, G. Uchida, Site-selective Coating of Carbon Protective Layer on Sub-micron Trenches Using Plasma CVD, 42nd International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2015), 2015.04.
57. M. Shiratani, D. Ichida, H. Seo, N. Itagaki, K. Koga, Crystalline Ge film deposition between Au catalyst film and quartz glass substrate using magnetron sputtering, 2015 MRS Spring Meeting, 2015.04.
58. M. Shiratani, Plasma Processes in 21st Century (Plenary), 7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterial/8th International Conference on Plasma Nanotechnology and Science (ISPlasma2015/IC-PLANTS2015), 2015.03.
59. 白谷正治, 古閑一憲, プラズマによるナノ粒子の合成と凝集・輸送制御(招待講演), 第62回応用物理学会春季学術講演会, 2015.03.
60. 白谷正治, 未来を拓くプラズマ工学(特別講演), 甲午会設立総会, 2015.02.
61. 白谷正治, プラズマ異方性CVDによる基板形状選択性カーボン薄膜コーティング(招待講演), 第27回専門講習会「プラズマハードコーティングの基礎と応用」 , 2015.02.
62. 白谷正治, プロセスプラズマの生成と制御(招待講演), 学振153委員会 プラズマ材料科学スクール, 2015.01.
63. M. Shiratani, Recent advances in thin film Si solar cells using plasma processes (Invited), The 20th Workshop on Advanced Plasma Processes and Diagnostics & The 7th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, 2015.01.
64. M. Shiratani, Solar cells using group IV semiconductor nanoparticles (Invited), 7th International Symposium on Innovative Solar Cells (ISISC-7), 2015.01.
65. 白谷正治, プラズマ加工とその応用に関する最近の動向~最近の研究から~(招待講演), 学振136委員会 平成26年度第5回研究会, 2015.01.
66. M. Shiratani, Three kinds of nucleation of films using plasma processes for solar cell applications (Invited), 2015 Japan-Korea Joint Symposium on Advanced Solar Cells, 2015.01.
67. 白谷正治, 古閑一憲, 徐鉉雄, 板垣奈穂, プラズマナノプロセシングにおける揺らぎ抑制のための戦略, 第24回日本MRS年次大会, 2014.12.
68. 白谷正治, IT活用による半導体製造イノベーション(招待講演), 第15回九州大学-NTT技術交流会, 2014.12.
69. 白谷正治, プロセスプラズマにおけるナノ粒子の成長とその制御(招待講演), Plasma Conference 2014, 2014.11.
70. M. Shiratani, D. Ichida, H. Seo, N. Itagaki, K. Koga, Novel method of Ge crystalline thin film deposition on SiO2 by sputtering, 67th Annual Gaseous Electronics Conference, 2014.11.
71. M. Shiratani, T. Ito, M. Soejima, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, Single Fine Particle Trapped in Ar Plasma by Optical Tweezers (Invited), 15th Workshop on Fine Particle Plasmas, 2014.10.
72. M. Shiratani, K. Koga , Nanopartilce Composite Plasma CVD Films and Some Applications (Invited), 2014 ECS and SMEQ Joint International Meeting, 2014.10.
73. 白谷正治 , プラズマ化学の拓く新世界:半導体からバイオまで(展望講演), 化学工学会第46回秋季大会, 2014.09.
74. M. Shiratani, H. Seo, N. Itagaki, G. Uchida, K. Koga, Plasma CVD nanostructured films for energy applications (Invited), 12th Asia Pacific Conference on Plasma Science and Technology (APCPST) and 27th Symposium on Plasma Science for Materials (SPSM), 2014.09.
75. M. Shiratani, H. Seo, K. Koga, N. Itagaki, Stability of nanoparticle growth processes in reactive plasmas, 15th IUMRS-International Conference in Asia, 2014.08.
76. M. Shiratani, Plasma Life Sciences: Present and Future (Plenary), International Conference on Microelectronics and Plasma Technology 2014 (ICMAP2014), 2014.07.
77. M. Shiratani and K. Koga, Plasma agriculture: what plasma can do for agriculture (Invited), 19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, 2014.07.
78. 白谷正治 , プラズマナノテクノロジーの現状と展望 (招待講演), 第18回応用物理学会・プラズマエレクトロニクス分科会・プラズマ新領域研究会・プラズマ技術研究会・第4回新学術領域研究「プラズマとナノ界面の相互作用に関する学術基盤の創成」公開シンポジウム合同開催『プラズマが拓く新学術領域と今後の展開』, 2014.06.
79. M. Shiratani, T. Sarinont, T. Amano, K. Koga, S. Kitazaki, and N. Hayashi , Enhancement of food energy efficiency using plasmas (Invited), 5th International Conference on Plasma Medicine (ICPM5), 2014.05.
80. M. Shiratani, Plasma agriculture in Japan (Invited), 名城大学プラズマバイオ科学技術研究センター開所シンポジウム&第1回電気電子工学応用ワークショップ, 2014.05.
81. M. Shiratani, S. Toko, K. Koga, N. Itagaki, H. Seo, In-situ Measurements of Volume Fraction of cDusters in Films During Plasma CVD, International Conference on Metallurgical Coatings and Thin Films(ICMCTF 2014), 2014.05.
82. M. Shiratani, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, Si/SiC coreshell nanoparticle composite anode for Li ion batteries, 2014 MRS Spring Meeting, 2014.04.
83. M. Shiratani, High efficiency quantum dot solar cell (Plenary), The International Symposium on Plasma-Nano Materials and Processes, 2014.04.
84. 白谷正治, 古閑一憲, 森田康彦, 伊東鉄平, 内田儀一郎, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, ナノ粒子含有振幅変調放電プラズマ中のAr準安定原子密度, 日本物理学会 第69回年次大会, 2014.03.
85. 白谷正治 , プラズマ制御によるシリコンナノ粒子の合成 (招待講演), 日本物理学会 第69回年次大会, 2014.03.
86. 白谷正治, 古閑一憲, 内田儀一郎, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 反応性プラズマ中のナノ粒子成長とプラズマ揺らぎ, 2014年 第61回応用物理学会春季学術講演会, 2014.03.
87. M. Shiratani, Control of nanoparticle formation in reactive plasmas: model and experiments (Invited), プラズマ制御科学研究センター2013年度第2回研究会, 2014.03.
88. M. Shiratani, Characteristics of a-Si:H Cells Fabricated by Amplitude Modulated VHF Discharges (Invited), 6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterial/7th International Conference on Plasma Nanotechnology and Science (ISPlasma2014/IC-PLANTS2014), 2014.03.
89. M. Shiratani, Plasma Nanotechnology and Solar Cells (Invited), 2014 Japan-Korea Joint Symposium on Advanced Solar Cells, 2014.02.
90. M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida, A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
91. M. Shiratani, Fluctuation and Nanotechology, 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
92. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, H. Seo, K. Kamataki, Nanoparticle composite plasma CVD films Fundamental and applications (Invited), The 9th EU-Japan Joint Symposium on Plasma Processing, 2014.01.
93. 白谷正治, T. Sarinont, 天野孝昭, 古閑一憲, 北崎訓, 林信哉, 水中種子へのプラズマ照射の成長促進効果, プラズマ・核融合学会 九州・沖縄・山口支部第17回支部大会, 2013.12.
94. 白谷正治, プラズマのバイオ応用の現状と将来:農業応用を中心として (招待講演), 第26回専門講習会「プラズマの農業応用の現状と将来」, 2013.12.
95. M. Shiratani, K. Koga, Y. Morita, S. Iwashita, H. Seo, K. Kamataki, N. Itagaki, G. Uchida, Time evolution of spatial profile of nanoparticle amount in amplitude modulated capacitively coupled reactive plasmas, 23rd Annual Meeting of MRS-JAPAN 2013, 2013.12.
96. M. Shiratani, N. Itagaki., K. Matsushima, R. Shimizu, H. Seo, K. Koga, Novel metal oxinitride materials for optoelectronic applications (Invited), 2013 EMN Fall Meeting , 2013.12.
97. M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, K. Kamataki, Nanostructure control of Si-based solar cells using plasma CVD (Invited), THERMEC 2013, 2013.12.
98. M. Shiratani, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, Control of plasma CVD films containing group IV nanoparticles (Invited), International Conference on Surface Engineering (ICSE 2013), 2013.11.
99. 白谷正治, プラズマ気相粒子制御によるシリコン薄膜太陽電池の高効率化 (招待講演), 第5回薄膜太陽電池セミナー, 2013.11.
100. 白谷正治, ナノ界面プラズマの農業応用 (招待講演), ナノ界面プラズマプロセスとその医療・バイオ応用に関する研究会, 2013.10.
101. M. Shiratani, Impacts of global collaborationson plasma science and technology (Invited), The Global Research and Development Centers (GRDC) Symposium 2013, 2013.10.
102. M. Shiratani, Novel ZnNO thin film growth by a sputtering and applications (Invited), The Workshop of the Joint Institute for Plasma Nano Materials, 2013.10.
103. M. Shiratani, Y. Hashimoto, Y. Kanemitsu, H. Seo, G. Uchida, N. Itagaki, K. Koga, Cluster control plasma CVD for fabrication of stable a-Si:H solar cells, 66th Annual Gaseous Electronics Conference , 2013.10.
104. 白谷正治, 森田康彦, 岩下伸也, 古閑一憲, 内田儀一郎, 板垣奈穂, H. Seo, 鎌滝晋礼, ナノ粒子含有プラズマ系におけるナノ粒子成長, 日本物理学会2013年秋季大会, 2013.09.
105. M. Shiratani, D. Yamashita, K. Koga, K. Kamataki, N. Itagaki, G. Uchida, Plasma Etching of Single Fine Particle Trapped By Optical Tweezers, The 26th Symposium on Plasma Science for Materials (SPSM-26), 2013.09.
106. M. Shiratani, S. Kitazaki, T. Sarinont, K. Koga, G. Uchida, N. Hayashi, Combinatorial Method of Plasma Irradiation to Seeds of Raphanus sativus L., 2013 JSAP-MRS Joint Symposia, 2013.09.
107. 白谷正治, 日本の科学技術施策の動向, 平成25年度(第40回)西日本放電懇談会, 2013.09.
108. 白谷正治, 反応性プラズマ中ナノ粒子のサイズ分布制御, 平成25年度 東北大学電気通信研究所共同プロジェクト研究会「微粒子プラズマ物理に基づいた新規ナノ材料創成」, 2013.09.
109. M. Shiratani, Y. Morita, S. Iwashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, and K. Koga, Tuning Size Distribution of Nanoparticles Formed in Reactive Plasmas using Plasma Parameter Modulation, The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013), 2013.08.
110. M. Shiratani, K. Koga, A. Tanaka, M. Hirata, N. Hayashi, N. Itagaki, G. Uchida, Safety Issues on Plasma Life Sicences (Invited), The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013), 2013.08.
111. M. Shiratani, Y. Morita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, and K. Koga, Coreshell nanoparticles generated by plasma CVD and their applications to Li ion batteries, 21st International Symposium on Plasma Chemistry (ISPC21), 2013.08.
112. M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga, Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas, The 12th Asia Pacific Physics Conference (APPC12), 2013.07.
113. M. Shiratani, S. Kitazaki, T. Sarinont, K. Koga, G. Uchida, and N. Hayashi, Combinatorial Approach to Plasma Biosciences (Invited), 2013 International Forum on Functional Materials (IFFM2013), 2013.06.
114. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, H. Seo, and K. Kamataki, Control of nanostructure of plasma CVD Si thin films (Invited), Japan-Australia Workshop on Gaseous Electronics and Its Applications (JAWS25), 2013.06.
115. M. Shiratani, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, and K. Koga, Advanced plasma sources and processes for energy harvesting devices (Invited), The 17th International Workshop on Advanced Plasma Processing and Diagnostics, 2013.05.
116. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, H. Seo, K. Kamataki, Nanostructure of plasma CVD films containing nanoparticles (Invited), International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2013), 2013.04.
117. 白谷正治, ナノ界面プラズマとは:新しいプラズマ科学の潮流 (招待講演), 2013年第60回応用物理学会春季学術講演会, 2013.03.
118. 白谷正治, 半導体プロセス制御とビッグデータ, シンポジウム「情報多様性とビッグデータサイエンス」, 2013.03.
119. 白谷正治, ナノ界面プラズマの魅力, 新学術領域「プラズマとナノ界面の相互作用に関する学術基盤の創成」公開シンポジウム, 2013.02.
120. M. Shiratani, K. Kamataki, Y. Morita, K. Koga, G. Uchida, N. Itagaki, H. Seo, Fluctuation in Plasma Processes (Invited), 6th International Conference on Plasma Nanotechnology and Science (IC-PLANTS 2013), 2013.02.
121. M. Shiratani, K. Kamataki, Y. Morita, G. Uchida, H. Seo, N. Itagaki, K. Koga, Time evolution of nanoparticle size in reactive plasmas: comparison between theory and experiments, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.01.
122. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, H. Seo, K. Kamataki, Tuning nanostructures of plasma CVD films (Plenary), The 16th International Workshop on Advanced Plasma Processing and Diagnostics, 2013.01.
123. 白谷正治, 鎌滝晋礼, 森田康彦, 古閑一憲, 内田儀一郎, 板垣奈穂, 徐鉉雄, 反応性プラズマ中の微粒子成長速度の時空間相関, 第30回プラズマプロセシング研究会(SPP-30), 2013.01.
124. 白谷正治, 鎌滝晋礼, 森田康彦, 古閑一憲, 内田儀一郎, 板垣奈穂, 徐鉉雄, 反応性プラズマとナノ構造の相互作用の長距離相関モデル, プラズマ・核融合学会 九州・沖縄・山口支部第16回支部大会, 2012.12.
125. M. Shiratani, Y. Morita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga , A simplified model of a relationship between plasma fluctuation and size distribution of nanoparticles formed in reactive plasmas, 第13回微粒子プラズマ研究会, 2012.12.
126. 白谷正治, 北﨑訓, 古閑一憲, 林信哉, コンビナトリアルプラズマ照射による植物の成長促進, プラズマ・核融合学会 第29回年会, 2012.11.
127. 白谷正治, プラズマCVDと反応容器サイズ, 第12回プラズマ技術研究会講演会・第3回ミニマル3DICファブ開発研究会講演会, 2012.11.
128. M. Shiratani, K. Kamataki, Y. Morita, H. Seo, N. Itagaki, G. Uchida, K. Koga, Long-range correlation of nanoparticle growth in in low pressure reactive VHF discharge plasmas, 54th Annual Meeting of the APS Division of Plasma Physics (DPP), 2012.10.
129. M. Shiratani, K. Kamataki, Y. Morita, H. Seo, N. Itagaki, G. Uchida, K. Koga, Impacts of plasma fluctuation on growth of nanoparticles in low pressure reactive VHF discharge plasmas, 65th Annual Gaseous Electronics Conference (GEC), 2012.10.
130. M. Shiratani, K. Kamataki, Y. Morita, K. Koga, G. Uchida, H. Seo, D. Yamashita, N. Itagaki, Control of size distribution of nanoparticles produced in reactive plasmas, Asia-Pacific Conference on Plasma Science and Technology (11th APCPST), 2012.10.
131. M. Shiratani, Y. Morita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, A Theoretical Model of a Relationship between Plasma Fluctuation and Nanostructure Fluctuation, IUMRS‐ICEM 2012 , 2012.09.
132. M. Shiratani, K. Kamataki, Y. Morita, G. Uchida, H. Seo, N. Itagaki, K. Koga, In-situ Measurements of Size Distribution of Nanoparticles Formed in Reactive Plasmas Using a Laser Light Scattering Method, IUMRS‐ICEM 2012 , 2012.09.
133. M. Shiratani, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices (Plenary) , 13th International Conference on Plasma Surface Engineering (PSE2012), 2012.09.
134. M. Shiratani, S. Kitazaki, T. Sarinont, K. Koga, G. Uchida, N. Itagaki, H. Seo, K. Kamataki, N. Hayashi, Growth Enhancement of Plants by Combinatorial Plasma Irradiation, The 9th International Bioelectrics Symposium (BIOELECTRICS 2012) , 2012.09.
135. M. Shiratani, G. Uchida, K. Koga, R. Torigoe, T. Urakawa, Plasma CVD of hard carbon films on PMMA, 2012 International Conference on Flexible and Printed Electronics (ICFPE2012), 2012.09.
136. M. Shiratani, N. Itagaki, K. Koga, Uchida G., K. Kamataki, H. Seo, Nanostructure control of thin films depoisted by plasmas and its application to fabrication of green energy devices (Invited), (APT2012) The 2nd Advanced Plasma Technology for Green Energy and Biomedical Applications, 2012.08.
137. M. Shiratani, Plasma Induced Growth Enhancement of Plants (Invited), The 2nd International Symposium for Plasma Biosciences-2012 (ISPB-2012), 2012.08.
138. M. Shiratani, K. Kamataki, Y. Morita, K. Koga, G. Uchida, N. Itagaki, H. Seo, Impacts of plasma fluctuation on nanoparticle growth in reactive plasmas, IEEE ICOPS2012, 2012.07.
139. M. Shiratani, K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, 2012 MRS Spring Meeting, 2012.04.
140. 白谷正治, 鎌滝晋礼, 西山雄士, 森田康彦, 山下大輔, 内田儀一郎, 徐鉉雄, 板垣奈穂, 古閑一憲, プラズマ揺らぎとプラズマ生成ナノ粒子のサイズ分布実験と理論, 第59回応用物理学関係連合講演会, 2012.03.
141. M. Shiratani, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, Plasma fluctuation and plasma nanotechnologies (Invited), The 5th International Conference on Plasma Nanotechnology and Science (IC-PLANTS 2012), 2012.03.
142. M. Shiratani, K. Hatozaki, K. Nakahara, Y. Hashimoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, A-Si:H Schottky Cells with Quite Low Light Induced Degradation Fabricated by Multi-hollow Discharge Plasma CVD, 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2012), 2012.03.
143. M. Shiratani, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, Impacts of plasma fluctuation on nanostructure formation using plasmas (Invited), The Third International Symposium on Plasma Nanoscience (iPlasmaNano-III), 2012.02.
144. 白谷正治, 古閑一憲, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, プラズマとナノ界面の相互作用の制御, 東北大学電気通信研究所共同プロジェクト研究会, 仙台"プラズマフォーラム", 2012.02.
145. 白谷正治, プラズマの農業応用:何が求められているのか, 第3回プラズマ・核融合学会専門委員会「プラズマ科学の医療応用」および研究会, 2012.01.
146. M. Shiratani, Negative and positive feedback of nanoparticle growth in reactive plasmas (Special Lecture), 第8回日欧プラズマプロセス共同シンポジウム, 2012.01.
147. 白谷正治, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生, 新学術領域「プラズマとナノ界面の相互作用に関する学術基盤の創成」平成23年度第2回全体会議, 2012.01.
148. M. Shiratani, K. Koga, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, Recent progress in frontier science of interactions between plasmas and nano-interfaces (Invited), The 14th International Workshop on Advanced Plasma Processing and Diagnostics, 2012.01.
149. M. Shiratani, K. Nakahara, K. Hatozaki, H. Seo, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, Stable a-Si:H Schottky Cells Fabricated by Multi-hollow Discharge Plasma CVD, 第21回日本MRS学術シンポジウム, 2011.12.
150. 白谷正治, プラズマプロセスにおける揺らぎの制御 (依頼講演), プラズマ・核融合学会 第15回九州・沖縄・山口支部大会, 2011.12.
151. M. Shiratani, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, Control of size distribution of nanoparticles in reactive plasmas by using AM rf discharges, 12th Workshop on Fine Particle Plasmas (第12回 微粒子プラズマ研究会), 2011.11.
152. 白谷正治, 金淵元, 松永剛明, 徐鉉雄, 鎌滝晋礼, 内田儀一郎, 板垣奈穂, 古閑一憲, プラズマCVDで成膜したSi薄膜へのナノ粒子含有の効果, Plasma Conference 2011 (PLASMA2011), 2011.11.
153. M. Shiratani, T. Urakawa, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on trenched substrate by simultaneous plasma CVD and plasma etching, 64th Gaseous Electronics Conference , 2011.11.
154. M. Shiratani, Y. Kim, T. Matsunaga, K. Nakahara, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, Combinatorial Si Film Deposition by Multihollow Discharge Plasma CVD, 第15回薄膜国際会議 (ICTF-15), 2011.11.
155. M. Shiratani, G. Uchida, M. Sato, Y. Wang, K. Koga, N. Itagaki, Quantum dot sensitized solar cells using nanoparticles of Si compounds fabricated by multihollow discharge plasma CVD, AVS 58th International Symposium & Exhibition , 2011.11.
156. M. Shiratani, Recent development of Si thin film solar cells (Plenary), Topical Workshop on Green Plasma-Nano Technology, 2011.10.
157. 白谷正治, 高光安定a-Si太陽電池の開発, 第4回薄膜コンソ技術委員会, 2011.10.
158. 白谷正治, 新学術領域研究:プラズマとナノ界面の相互作用制御の新展開 (招待講演), プラズマエレクトロニクス分科会20周年(研究会創設25周年)記念特別シンポジウム, 2011.10.
159. M. Shiratani, Si solar cells: present status and future prospects (Invited), The Korean Physical Society (KPS) , 2011.10.
160. M. Shiratani, Si thin film solar cells: present and outlook (Invited), Seminar in Pusan National University, 2011.10.
161. M. Shiratani, K. Kamataki, K. Koga, G. Uchida, Two dimensional laser light scattering to deduce size and density of nanoparticles in plasmas (Invited), Laser Aided Plasma Diagnostic conference (LAPD15), 2011.10.
162. 白谷正治, 鎌滝晋礼, 西山雄士, 古閑一憲, 内田儀一郎, 板垣奈穂, 高周波放電のAM変調によるナノ粒子サイズ分布の制御, 平成23年度(第64回)電気関係学会九州支部連合大会, 2011.09.
163. M. Shiratani, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, Deposition of quantum dot thin films using Si nanoparticles with surface nitridation (Invited), The 8th Asian-European International Conference on Plasma Surface Engineering (AEPSE2011), 2011.09.
164. M. Shiratani, K. Koga, G. Uchida, Plasma CVD of nanoparticle composite films and their applications (Plenary), The 8th Asian-European International Conference on Plasma Surface Engineering (AEPSE2011), 2011.09.
165. M. Shiratani, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, Frontier science of interactions between plasmas and nano‐interfaces (Plenary), (ICPAT2011)4th International Conference on Advanced Plasma Technologies, 2011.09.
166. M. Shiratani, T. Urakawa, G. Uchida, K. Koga, Y. Setsuhara, M. Sekine, M. Hori, Carbon protective layer on top surface of trench substrate using H-assisted plasma CVD (Invited), Workshop on Plasma Synthesis and Application of Nanomaterials , 2011.09.
167. M. Shiratani, Micro hollow cathode discharge: Si deposition (Invited), the XXX International Conference on Phenomena in Ionized Gases(ICPIG) 2011 Conference, 2011.08.
168. M. Shiratani, Next generation plasma process and materials for solar cell (Invited), Asian Workshop on Advanced Plasma Technology for Green Energy and Biomedical Applications, 2011.08.
169. 白谷正治, 若手研究者海外派遣, 第38回西日本放電懇談会, 2011.08.
170. M. Shiratani, Control of nanostructure of plasma CVD films using nano-particles (Invited), The 20th International Symposium on Plasma Chemistry (ISPC20), 2011.07.
171. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, Innovative Si solar cells: new approaches and demonstration of devices (Invited), The 13th International Workshop on Advanced Plasma Processing and Diagnostics, 2011.07.
172. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control towards Ultimate Plasma Nanotechnologies (Keynote), 第24回プラズマ材料科学シンポジウム (SPSM-24), 2011.07.
173. M. Shiratani, Nanoparticles formed in reactive plasmas and their applications, Workshop of Advanced Plasma Technologies, 2011.07.
174. M. Shiratani, G. Uchida, K. Koga, Plasma Nanofactory, 2011 International Workshop on Advanced Electrical Engineering and Related Topics, 2011.07.
175. M. Shiratani, K. Koga, G. Uchida, Applications of nanoparticles formed in reactive plasmas: from solar cells to LSI (Invited), International Workshop on Plasmas and Particles, 2011.06.
176. 白谷正治, 古閑一憲, 板垣奈穂, 内田儀一郎, 高光安定a-Si太陽電池の開発, 第3回薄膜コンソ技術委員会, 2011.05.
177. M. Shiratani, K. Koga, Plasma nanofactories for constructing nanosystems in the third generation nanotechnology (Invited), 6th International Workshop on Microplasmas, 2011.04.
178. M. Shiratani, N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, Ultra Low Resistive NM Thick AZO Films Deposited by Magnetron Sputtering Using Solid Phase Crystallization, The 4th International Conference on Plasma-Nanotechnology & Science (IC-PLANTS 20) , 2011.03.
179. M. Shiratani and K. Koga, Fluctuation of charge on a nano-particle in plasmas and its conseuquences, 2nd International Workshop on Plasma Nano-Interfaces and Plasma Characterization (若手国際ワークショップ), 2011.03.
180. 白谷正治, 宮田大嗣, 西山雄士, 山下大輔, 鎌滝晋礼, 内田儀一朗, 板垣奈穂, 古閑一憲, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, LHD第一壁へのダストフラックスに対する壁電位の効果 , 核融合科学研究所一般共同研究成果報告会(NIFS), 2011.01.
181. 白谷正治, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生, 新学術領域全体会議, 2011.01.
182. M. Shiratani, An Introduction to center of plasma nano-interface engineering (CPNE) (Invited), The 12th International Workshop on Advanced Plasma Processing and Diagnostics, 2011.01.
183. M. Shiratani, Concept and strategy of Center of Plasma Nano-interface Engineering, 新学術領域研究公開シンポジウム兼プラズマナノ界面工学センターキックオフシンポジウム, 2011.01.
184. M. Shiratani, Plasma CVD of carbon films on patterned substrates using Ar+H2+C7H8, 第20回日本MRS学術シンポジウム, 2010.12.
185. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, A novel control method of nano-strucutre of oxide films using sputtering deposition (Keynote Speech), The Second International Symposium on Plasma Nanoscience (iPlasmaNano-II) , 2010.12.
186. 白谷正治, 太陽光発電の原理と最新の研究について, 福岡県高等学校物理部会研修会, 2010.11.
187. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies (Keynote Speech), International technical conference of IEEE Region 10, 2010.11.
188. M. Shiratani, H. Miyata, K. Nishiyama, S. Iwashita, D.Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, In-situ collection of dust particles produced due to interaction between helicon discharge plasmasand graphite on substrates with bias voltage, 11th Workshop on Fine Particle Plasmas 第11回 微粒子プラズマ研究会, 2010.11.
189. M. Shiratani, K. Koga, G.u Uchida, N. Itagaki, K. Kamataki, Manipulation of Nano-objects Uusing Plasmas for a Plasma Nano-factory (Invited), The 11th Asia Pacific Physics Conference (APPC11), 2010.11, 新しいボトムアッププロセスとしてナノ粒子の操作をプラズマを用いて行う新概念の提案とその実験的検証に関する報告を行った。.
190. 白谷正治, 新学術領域研究:プラズマとナノ界面の相互作用に関する研究, 第26回九州・山口プラズマ研究会, 2010.11.
191. M. Shiratani, Present status and issues of photovoltaics (Invited), GIFT Seminar on Green Technology, 2010.10.
192. M. Shiratani, K. Koga, T. Matsunaga, Y. Kawashima, W. M. Nakamura, G. Uchida, N. Itagaki, Combinatorial plasma CVD of Si thin films with a multihollow discharge plasma CVD reactor, AVS 57th International Symposium & Exhibition, 2010.10.
193. M. Shiratani, Academic Roadmap of Plasma Process Technologies (Invited), 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas (ICRP), 2010.10.
194. 白谷正治, プラズマCVDによる太陽電池用薄膜シリコン作製における耐光劣化・再現性向上技術(依頼講演), 薄膜シリコン太陽電池セミナー, 2010.09.
195. 白谷正治, 反応性プラズマの制御による先端太陽電池用シリコン薄膜形成, 第71回応用物理学会学術講演会, 2010.09.
196. M. Shiratani, An application of plasma technology: solar cells, SKKU Summer School, 2010.08.
197. M. Shiratani, Solar cells: present and future (Invited), 日本の新再生エネルギー技術の発展と応用事例に関する講演会, 2010.08.
198. 白谷正治, 放電・プラズマ関連研究の将来像と研究資金獲得法, 第37回西日本放電懇談会, 2010.08.
199. 白谷正治, 最先端プラズマ技術でつくる太陽電池, 第14回リフレッシュ理科教室, 2010.07.
200. M. Shiratani, G. Uchida, K. Koga, Evolution of green plasma nanotechnology for harvesting energy devices (Invited), The 11th International Workshop on Advanced Plasma Processing and Diagnostics, 2010.07.
201. M. Shiratani, Anisotropic deposition realized by plasma CVD (Invited), The 3rd International Conference on Advanced Plasma Technologies and 62nd IUVSTA Workshop on Plasma Synthesis and Modification of Nanomaterials, 2010.06.
202. 白谷正治, プラズマの産業応用の進展と今後の展望(依頼レビュー講演), 第8回核融合エネルギー連合講演会, 2010.06.
203. M. Shiratani, Plasma applications in the near future, 2010 International Workshop on Plasma Applications, 2010.06.
204. 白谷正治, プラズマナノ界面の学理と産業応用(招待講演), 日本学術振興会 プラズマ材料科学第153委員会 第96回研究会, 2010.05.
205. M. Shiratani, Research roadmap for plasma processing for next three decades (Invited), 2010 International Workshop on Environment and resources, 2010.05.
206. 白谷正治, 応用物理学の将来ビジョンーアカデミックロードマップと発展史マップープラズマ・プロセス技術(シンポジウム講演), 応用物理学会特別企画シンポジウム 応用物理学の将来ビジョン-アカデミックロードマップと発展史マップ, 2010.03.
207. 白谷正治, プラズマプロセス揺らぎの制御を目指して(シンポジウム講演), 春季第57回応用物理学関係連合講演会, 2010.03.
208. M. Shiratani, K. Koga, Frontier science of interactions between plasmas and nano-interfaces (Invited), The 3rd International Conference on Plasma Nanotechnology and Science (IC-PLANTS 2010), 2010.03.
209. M. Shiratani, K. Koga, Thin film silicon solar cells in the age of GW production lines (Invited), The Second International Symposium of Experiment-Integrated Computational Chemistry on Multiscale Fluidics (ECCMF2), 2010.02.
210. 白谷正治, プラズマプロセスの特長(依頼講演), 技術セミナー「プラズマ利用で新たな“ものづくり”を!」, 2010.02.
211. 白谷正治, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生, 新学術領域「プラズマとナノ界面の相互作用に関する学術基盤の創成」第1回全体会議兼第2回総括班会議, 2010.01.
212. M. Shiratani, Y. Kawashima, K. Nakahara, H. Sato, W. M. Nakamura, K. Koga, Towards the multiple exciton generation solar cells ? Si quantum-dot sensitized solar cells (Invited), The 10th International Workshop on Advanced Plasma Processing and Diagnostics(The 1st International Student Workshop on Electrical Engineering), 2010.01.
213. 白谷正治, 古閑一憲, プラズマ―バイオ融合科学:プラズマプロセスの観点から(招待講演), 第26回プラズマ・核融合学会年会, 2009.12.
214. M. Shiratani, Y. Kawashima, K. Koga, Application of Si nanoparticles to third generation photovoltaics, 2nd International Symposium on Innovative Solar Cells, 2009.12.
215. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, Carbon particle formation due to interaction between graphite, helicon plasmas, American Vacuum Society 56th International Symposium, 2009.11.
216. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, Manipulation of nanoparticles using plasmas, 10th Workshop on Fine Particle Plasmas, 2009.11.
217. M. Shiratani, K. Koga, Ultrahigh quality amorphous silicon film deposition for solar cell employing novel plasma enhanced CVD (Invited), 62nd Gaseous Electronics Conference, 2009.10.
218. M. Shiratani, K. Koga, Towards plasma nano-factories (Invited), 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I), 2009.10.
219. M. Shiratani, K. Koga, Production of Si nanoparticles in CVD plasmas for Si thin fillm solar cells of the third generation (Invited), Second International Conference on Microelectronics and Plasma Technology (ICMAP2009), 2009.09.
220. M. Shiratani, K. Koga, Plasma CVD for Si thin fillm solar cells (Invited), International Conference on Plasma Surface Engineering (AEPSE2009), 2009.09.
221. 白谷正治, 古閑一憲, プラズマ中ナノ結晶シリコン成長過程の診断(招待講演), 第70回応用物理学会学術講演会, 2009.09.
222. 白谷正治, 古閑一憲, シリコン太陽電池製造のためのプラズマ技術の現状と展望(特別招待講演), プラズマ科学のフロンティア研究会, 2009.09.
223. M. Shiratani, T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Sekine, M. Hori, Aspect ratio dependence of deposition profile of plasma CVD carbon films on trenched substrates, Seventh Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), 2009.09.
224. M. Shiratani, K. Koga, Detection, control of nano-clusters in CVD plasmas for a-Si thin film solar cells, Seventh Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), 2009.09.
225. M. Shiratani, K. Koga, Plasma CVD for Si thin film solar cells (Invited), Seventh Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), 2009.09.
226. M. Shiratani, K. Koga, Production of Si nano-particles in CVD plasmas for Si thin film solar cells of the third generation (Invited Talk), 2nd International Conference on Microelectronics, Plasma Technology (ICMAP 2009), 2009.09.
227. M. Shiratani, K. Koga, Thin film silicon solar cells: present, future (Invited), The 9th Korea-Japan Workshop, 2009.07.
228. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama, Plasma CVD of Nano-particle Composite Porous SiOCH Films, 19th International Symposium on Plasma Chemistry, 2009.07.
229. 白谷正治、古閑一憲, クラスタ抑制プラズマCVDを用いた高光安定水素化アモルファスシリコン薄膜の高速堆積, 第1回三菱PVコンファレンス, 2009.06.
230. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, M. Akiyama, Plasma manipulation of nano-blocks and its application to ULK film deposition (Invited), International Conference on Plasma Nano Technology & Science (IC-PLANTS2009), 2009.03.
231. M. Shiratani, J. Umetsu, T. Nomura, K. Inoue, K. Koga, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of plasma enhanced CVD carbon films in submicron wide trenches, 2nd International Conference on Plasma-Nano Technology & Science, 2009.01.
232. M. Shiratani, W. M. Nakamura, H. Sato, K. Koga, Design and controlling of plasma nano-processing for the third generation solar cell devices (Invited), 8th International Workshop of Advanced Plasma Processing and Diagnostics, 2009.01.
233. M. Shiratani, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, Deposition of Nano-particle Composite Porus Low-k Films Using Pulse RF Discharges with Amplitude Modulation, The IUMRS International Conference in Asia 2008, 2008.12.
234. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, Formation of Dust Particles due to Interaction between Graphite, Deuterium Helicon Plasmas, The IUMRS International Conference in Asia 2008, 2008.12.
235. M. Shiratani, J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile of plasma CVD hard carbon films on substrates with trenches, 61st Annual Gaseous Electronics Conference, 2008.10.
236. M. Shiratani, K. Koga, Deposition profile control of plasma CVD films on nano-patterned substrates (Invited), Interfinish 2008, 2008.06.
237. M. Shiratani, K. Koga, W. M. Nakamura, H. Sato, S. Nunomura, M. Kondo, Si thin films of second and third generation photovoltaics (Invited), International workshop on merging state-of-the-art plasma science into novel technologies, 2008.05.
238. M. Shiratani, K. Koga, S. Iwashita, S. Nunomura, M. Kondo, Plasma processes for developing nanosystems in the 3rd generation nanotechnology (Invited), 6th EU-Japan Joint Symposium on Plasma Processing, 2008.04.
239. M. Shiratani, K. Koga, Plasma engineering for third generation nanotechnology (Invited), International Conference on Plasma Nano Technology & Science 2008, 2008.03.
240. 白谷正治, 古閑一憲, ミー散乱法によるシリコン微粒子の測定(招待講演), 東北大学通研共同プロジェクト研究会「微粒子プラズマ科学の展開」, 2008.02.
241. M. Shiratani, K. Koga, High-quality amorphous Si formation by sophisticated plasma technology (Invited), 6th International Workshop of Advanced Plasma Processing and Diagnostics, 2008.01.
242. 白谷正治, 切通聡, 岩下伸也, 古閑一憲, 芦川直子, 西村清彦, 相良明男, LHD実験グループ, LHDにおけるダストのその場サンプリングと分析 (招待講演), 第5回LHDにおけるPWI共同研究・検討会, 2007.06.
243. M. Shiratani, W. M. Nakamura, D. Shimokawa, H. Miyahara , K. Koga, Control of nanostrucuture of plasma CVD films and its application to third generation photovoltaics (Invited), Fifth EU-Japan Joint Symposium on Plasma Processing, 2007.03.
244. M. Shiratani, K. Koga, S. Nunomura, M. Kondo, Nanocrystalline silicon/amorphous silicon composite material (Invited), International Workshop upon Thin Film Silicon Solar Cells, 2007.02.
245. M. Shiratani, S. Kiridoshi, K. Koga, N. Ahikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, In-situ sampling of dust in main and glow discharges in LHD and its analysis (Invited), Joint US-Japan Workshop on Dynamics of Dust Particles in Fusion Devices and Non-diffusive Plasma Transport and Its Statistics in Edge Plasmas of Fusion, 2007.01.
246. M. Shiratani, K. Koga, S. Iwashita, W. M. Nakamura, H. Miyahara, S. Nunomura, M. Kondo, Si thin film deposition process for the future solar cells (Invited), 4th International Workshop on Advanced Plasma Processing and Diagnostics & Thin Film Technology for Electronic Materials, 2006.12.
247. M. Shiratani, Control of nanostrucuture of plasma CVD films (Invited), 2006 Gordon Research Conference on Plasma Processing Science, 2006.08.
248. M. Shiratani, Anisotropic deposition of Cu film employing plasma enhanced CVD (Invited), Korea-Japan Workshop on Surface Engineering, 2006.04.
249. M. Shiratani, K. Koga, Y. Watanabe, S. Nunomura, and M. Kondo, Production of size-controlled Si nano-crystallites using SiH4+H2 discharges and its application to optoelectronic films (Invited), International Symposium on EcoTopia Science2005 (ISETS05), 2005.08.
250. 白谷正治, 古閑一憲, 渡辺征夫, プラズマプロセスによる結晶シリコンナノ粒子の生成 (招待講演), 第6回プラズマナノテクノロジ-研究会, 2003.12.
251. 白谷正治, 古閑一憲, 渡辺征夫, 革新的プラズマCVDを目指して (招待講演), 第3回インテリジェント・ナノプロセス研究会, 2003.12.
252. M. Shiratani, K. Takenaka, M. Takeshita, M. Kita, K. Koga, and Y. Watanabe, Anisotropic Cu Deposition using Plasma Chemical Vapor Deposition (Invited), American Vacuum Society 50th International Symposium, 2003.11.
253. 白谷正治, 古閑一憲, 渡辺征夫, VHFプラズマCVDによる結晶シリコンナノ粒子の生成と膜への取り込み (招待講演), 第30回アモルファスセミナー, 2003.11.
254. 白谷正治, プラズマプロセス開発のためのナノ分析 (招待講演), 第19回局所・表面分析懇話会, 2003.11.
255. 白谷正治, 竹中弘祐, 古閑一憲, 渡辺征夫, 銅のプラズマCVD におけるサブミクロントレンチへの成膜形状制御, 九州・山口プラズマ研究会, 2003.11.
256. M. Shiratani, T. Kakeya, K. Koga, and Y. Watanabe, Silicon nano-structure formation using plasma under micro-G and one G conditions (Invited), 56th Annual Gaseous Electronics Conference, 2003.10.
257. M. Shiratani, K. Takenaka, M. Takeshita, K. Koga, and Y. Watanabe, Copper plasma CVD (Invited), 37th IUVSTA Workshop on Plasma Deposition of Advanced Materials, 2003.09.
258. 白谷正治, 掛谷知秀, 古閑一憲, 渡辺征夫, プラズマを用いたSiナノ粒子の形成に対する重力の影響, 電気学会九州支部, 2003.09.
259. 白谷正治, LSI内配線と銅の異方性製膜 (招待講演), 第10回応用物理学会プラズマエレクトロニクス分科会サマースクール, 2003.08.
260. M. Shiratani, K. Koga, and Y. Watanabe, Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition (Invited), 16th International Symposium on Plasma Chemistry, 2003.06.
261. 白谷正治, プラズマCVDの新しい展開 (招待講演), 名古屋大学電気系21世紀COEシンポジウム, 2003.03.
262. M. Shiratani, R. Uehara, K. Koga, Y. Watanabe, Carbon particle formation due to interaction between H2 plasmas, carbon wall, Fine Particle Plasmas: Basis, Applications - Third Workshop on Fine Particle Plasmas, 2002.12.
263. M. Shiratani, M. Kai, K. Koga, Y. Watanabe, Silicon nano-particles formed under one-G, micro-gravity plasmas, Fine Particle Plasmas: Basis, Applications - Third Workshop on Fine Particle Plasmas, 2002.12.
264. M. Shiratani, K. Takenaka, M. Onishi, K. Koga, Y. Watanabe, T. Shingen, Conformal, anisotorpic deposition of Cu films using H-assisted plasma CVD, American Vaccum Society 49th International Symposium, 2002.11.
265. 白谷 正治, 古閑 一憲, 渡辺 征夫, ナノクラスタ制御プラズマCVDと高品質, 光安定a-Si:H太陽電池への応用, 第29回アモルファスセミナー, 2002.11.
266. 白谷 正治, 古閑 一憲, 渡辺 征夫, 水素原子アシストプラズマCVD法によるLSI用銅配線形成, 第18回九州・山口プラズマ研究会, 2002.11.
267. 白谷 正治, 甲斐 幹英, 古閑 一憲, 渡辺 征夫, 微重力プラズマ中のナノ粒子形成, 第18回日本マイクログラビティ応用学会学術講演会, 2002.10.
268. M. Shiratani, K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, Y. Watanabe, T. Shingen, Conformal deposition of ultra thin, smooth Cu films in trenches using Cu(EDMDD)2 by H-assisted plasma CVD, 2nd ECS International Semiconductor Technology Conference, 2002.09.
269. 白谷 正治, 古閑 一憲, 渡辺 征夫, プラズマを用いたSi新ナノ構造形成, 第62回応用物理学学術講演会, 2002.09.
270. M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Correlation between Si cluster amount in silane HF discharges, quality of a-Si:H films, Joint Meeting of 16th European Conference on Atomic, Molecular Physics of Ionized Gases, 5th International Conference on Reactive Plasmas, 2002.07.
271. M. Shiratani, K. Koga, Y. Watanabe, Cluster-supressed plasma CVD for deposition of high quality a-Si:H films (Invited), European Materials Research Society 2002 Spring Meeting, 2002.06.
272. 白谷 正治, 古閑 一憲, 渡辺 征夫, 低圧シランプラズマ中の微粒子成長機構, 北陸先端科学技術大学院大学材料科学研究科研究科フォーラム, 2002.03.
273. M. Shiratani, K. Koga, Y. Watanabe, Deposition of high quality Si films by suppressing cluster growth in SiH4 high-frequency discharges, Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
274. M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Cluster formation model in SiH4 plasmas, its application to deposition of high quality a-Si:H films, Fine Particle Plasmas: Basis, Applications - Second Workshop on Fine Particle Plasmas, 2001.12.
275. 白谷 正治, 古閑 一憲, 渡辺 征夫, シランプラズマ中のクラスタとシリコン系薄膜太陽電池, 第17回九州・山口プラズマ研究会, 2001.11.
276. 白谷 正治, 竹中 弘祐, 金 洪杰, 大西 将夫, 古閑 一憲, 渡辺 征夫, CuプラズマCVDと次世代配線への応用, 電気学会 電子・情報・システム部門大会, 2001.09.
277. 白谷 正治, 金 洪杰, 大西 将夫, 竹中 弘祐, 古閑 一憲, 渡辺 征夫, H原子源付プラズマCVD装置で堆積したCu薄膜中の不純物濃度分布, 第62回応用物理学学術講演会, 2001.09.
278. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath of electropositive, electronegative gas discharges, International Conference on Phenomena in Ionized Gases, 2001.07.
279. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, Development of H-assisted plasma CVD reactor for Cu interconnects, International Conference on Phenomena in Ionized Gases, 2001.07.
280. M. Shiratani, K. Koga, Y. Watanabe, Cluster-less plasma CVD reactor, its application to a-Si:H film deposition, 2001 MRS Spring Meeting, 2001.04.
281. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H-assisted plasma CVD using Cu(hfac)2, Cu(EDMDD)2, 2001 MRS Spring Meeting, 2001.04.
282. 白谷 正治, 金 洪杰, 竹中 弘祐, 古閑 一憲, 渡辺 征夫, H原子源付プラズマCVD装置による高品質Cu極薄膜の堆積, 第48回応用物理学関係連合講演会, 2001.03.
283. 白谷 正治, 古閑 一憲, 豊澤 聡大, 渡辺 征夫, イオンシースに注入した微粒子の軌跡, 第48回応用物理学関係連合講演会, 2001.03.
284. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath, Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
285. M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe, Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition, Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
286. M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Measurements of surface reaction probability of SiH3, Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
287. M. Shiratani, K. Koga, Y. Watanabe, Plasma CVD method for Cu interconnects in ULSI (invited), Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
288. 白谷 正治, 園田 剛士, 古閑 一憲, 渡辺 征夫, 鹿谷 昇, 高品質a-Si:H作製のためのクラスタ抑制プラズマCVD装置の開発, 平成12年度応用物理学会九州支部講演会, 2000.12.
289. 白谷 正治, 古閑 一憲, 渡辺 征夫, LSI内微細銅配線形成のためのプラズマCVD法の開発, 第16回九州・山口プラズマ研究会, 2000.11.
290. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, Y. Watanabe, H assisted control of quality, conformality in Cu film deposition using plasma CVD method, Advanced Metallization Conference 2000, 2000.10.
291. 白谷 正治, 園田 剛士, 鹿谷 昇, 古閑 一憲, 渡辺 征夫, D2+SiH4高周波放電で作製した微粒子とa-Si:H膜の組成, 第61回応用物理学学術講演会, 2000.09.
292. 白谷 正治, 古閑 一憲, 渡辺 征夫, 銅の高アスペクト比パターン埋め込みのためのラジカル表面反応制御(招待講演), 第61回応用物理学学術講演会シンポジウム「Feature Profile Evolutionのためのプラズマ物理化学」, 2000.09.
293. M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, Methods of suppressing cluster growth in silane rf discharges, 2000 MRS Spring Meeting, 2000.04.
294. M. Shiratani, H. J. Jin, Y. Nakatake, K. Koga, Y. Watanabe, Thin smooth Cu films deposited in deep submicron trench by plasma CVD reactor with H atom source, 2000 MRS Spring Meeting, 2000.04.
295. 白谷 正治, 前田 真一, 古閑 一憲, 渡辺 征夫, シラン高周波放電中ナノ微粒子の成長過程:基板の効果, 第47回応用物理学関係連合講演会, 2000.03.
296. M. Shiratani, H. J. Jin, Y. Nakatake, K. Koga, Y. Watanabe, Control of surface reactions for conformal deposition of Cu in fine trench structure (invited), 'International Workshop on Basic Aspects of Non-equilibrium Plasmas Interacting with Surfaces, 2000.01.
297. M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Surface reaction probability of radicals in CW, pulsed RF triode SiH4 discharges, International Workshop on Basic Aspects of Non-equilibrium Plasmas Interacting with Surfaces, 2000.01.
298. 白谷 正治, 古閑 一憲, 前田 真一, 渡辺 征夫, シラン高周波放電中ナノ微粒子成長に与える基板の影響, 第17回プラズマプロセシング研究会, 2000.01.
299. M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, A-Si:H Film Deposition Using Plasma CVD with Suppression of Cluster-Size Particles, 1999 American Vacuum Society International Symposium, 1999.10.
300. 白谷 正治, 中村 幸作, 園田 剛士, 古閑 一憲, 渡辺 征夫, H2+SiH4高周波放電中のH密度, 第60回応用物理学学術講演会, 1999.09.
301. 白谷 正治, 前田 真一, 古閑 一憲, 渡辺 征夫, シラン高周波放電中微粒子成長抑制条件下でのa-Si:H膜堆積, 第60回応用物理学学術講演会, 1999.09.
302. M. Shiratani, K. Koga, Y. Watanabe, Recent Advance in Understanding Formation of Particles in SiH4 RF Discharges (invited), 12th Symposium on Plasma Science, Materials, 1999.06.
特許出願・取得
特許出願件数  10件
特許登録件数  7件
その他の優れた研究業績
2012.03, Best Presentation Award of ISplasma 2012.
2012.03, 平成23年度高温学会論文賞.
2010.11, プラズマナノ界面工学センターのセンター長としてフランスのジョセフ・フーリエ大学名誉教授と国際共同研究を推進.
2009.01, プラズマナノ界面工学センターのセンター長としてドイツのルール大学教授と国際共同研究を推進.
学会活動
所属学会名
日本MRS
Materials Research Society
American Vacuum Society
応用物理学会
物理学会
電気学会
プラズマ・核融合学会
学協会役員等への就任
2016.04~2018.03, IUMRS-ICA, セッションオーガナイザー.
2016.04~2018.03, 日本MRS, セッションオーガナイザー.
2016.04~2018.03, Asian-European International Conference on Plasma Surface Engineering Asian Joint Committee, Vice Chair.
2017.06~2019.06, 日本MRS, 理事.
2017.04~2018.03, 日本表面科学会, 九州支部 平成29年度支部監査.
2016.04~2018.03, プラズマ・核融合学会, 九州・山口支部監事.
2016.04~2018.03, 応用物理学会, プラズマエレクトロニクス分科会 諮問委員.
2016.12~2017.11, 日本学術振興会, 科学研究費専門委員.
2016.04~2017.03, 応用物理学会, 業績賞選考委員.
2016.04~2018.03, 応用物理学会, 九州支部貢献賞選考委員長.
2016.04~2018.03, 日本MRS, 講演奨励賞選考委員長.
2016.04~2018.03, プラズマ材料科学, 賞選考委員長.
2014.06~2017.03, 応用物理学会, 九州支部貢献賞委員会委員長.
2011.04~2022.03, 応用物理学会, プラズマエレクトロニクス分科会諮問委員.
2016.04~2018.03, 応用物理学会, 九州支部監事.
2014.04~2018.03, 九州・山口プラズマ研究会, 代表.
2012.04~2015.03, 西日本放電懇談会, 会長.
2012.04~2018.03, 日本学術振興会第153委員会, 副委員長・学界委員・運営委員.
2013.01~2018.05, Plasma Physics under Asia Pacific Physical Societies, The Vice Chair of Division.
2016.06~2018.06, プラズマ・核融合学会, 副会長.
2013.01~2014.05, Plasma Physics under Asia Pacific Physical Societies, The Vice Chair of Division.
2009.05~2011.11, American Vacuum Society PSTD , Executive Committee.
2008.04~2018.03, 微粒子プラズマ研究会, 幹事.
2012.05~2012.11, Gaseous Electronics Conference Executive Committee, 委員.
2012.05~2015.05, American Physical Society, Division of Plasma Physics, Program Committee, 委員.
2012.04~2015.03, 日本学術振興会第153委員会, 学界委員.
2012.04~2015.03, 西日本放電懇談会, 会長.
2012.04~2014.03, 応用物理学会, 九州支部副支部長.
2011.04~2015.03, 応用物理学会, プラズマエレクトロニクス分科会諮問委員.
2014.06~2015.03, 応用物理学会, 九州支部貢献賞委員会委員長.
2015.08~2022.07, International Scientific Committee of ICPIG , 委員会委員.
2015.06~2015.07, 熊本大学外部評価委員会, 情報電気電子工学専攻テニュア外部評価委員.
2015.06~2015.11, 大阪大学接合科学研究所, 外部評価委員.
2015.05~2016.06, ISO/TC107, WG member.
2013.12~2016.05, オーストラリア, 科学研究費評価委員.
2013.12~2014.05, Netherlands Organisation for Scientific Research (NWO), オランダ科学研究費評価委員.
2011.06~2011.11, 大阪大学接合科学研究所, 外部評価委員.
2011.06~2012.05, National Research Foundation Grant Proposal, Singaporeの研究費審査委員.
2011.12~2012.11, 文部科学省, 科学研究費補助金審査委員.
2009.12~2010.11, 文部科学省, 科学研究費補助金審査委員.
2008.12~2009.03, 応用物理学会, プラズマエレクトロニクス賞審査副委員長.
2009.12~2010.11, Times Higher Education World University Rankings, 評価者.
2007.12~2008.11, 太陽光発電技術研究組合(PVTEC), 薄膜シリコン先導研究技術分科会委員.
2007.12~2009.11, 核融合科学研究所, 共同研究委員会委員.
2014.03~2016.06, Association of Asia Pacific Physical Societies-division of plasma physics(AAPPS-DPP), Vice Chair.
2012.06~2016.06, プラズマ・核融合学会, 九州支部長.
2014.04~2016.03, 応用物理学会, 九州支部長.
2014.04~2016.03, 応用物理学会, 理事.
2012.06~2016.06, プラズマ・核融合学会, 理事.
2011.10~2013.10, American Physical Society, Gaseous Electronics Conference Executive Committee.
2011.05~2013.03, マス・フォア・インダストリ研究所, サイエンス・アドバイザリー.
2011.05~2014.03, 応用物理学会プラズマエレクトロニクス分科会, 諮問委員.
2011.04~2013.03, 応用物理学会, 論文賞委員会委員.
2011.03~2011.11, Plasma Conference 2011 (略称: PLASMA2011)/プラズマ・核融合学会第28回年会/応用物理学会第29回プラズマプロセシング研究会/日本物理学会(領域2)2011年秋季大会, 組織委員, プログラム委員長.
2010.12~2012.03, Australian Research Council Assessor(オーストラリア学術会議評価者), 評価者.
2010.04~2014.03, 応用物理学会, 評議員.
2009.12~2011.03, 応用物理学会, プラズマエレクトロニクス賞審査委員.
2009.10~2011.11, AVS Plasma Science and Technology Division, Executive Committee.
2009.01~2011.03, プラズマ関連学協会連合組織, 運営委員.
2008.04~2012.03, プラズマ核融合学会, 九州支部理事.
2008.04~2011.03, 応用物理学会, 九州支部理事.
2008.03~2010.02, 応用物理学会, プラズマエレクトロニクス分科会幹事長.
2008.01~2012.03, QS World University Rankings 2011, 評価者.
2007.04~2016.03, 科学技術動向研究センター, 専門調査委員.
2006.04~2012.03, 物質・材料研究機構物質研究所, リサーチアドバイザー.
2006.04~2016.03, 核融合科学研究所, 共同研究員.
2005.04~2012.03, 応用物理学会, リフレッシュ理科教室実行委員.
2005.04~2016.03, 大阪大学接合科学研究所, 共同研究員.
2004.07~2012.03, プラズマ・核融合学会, 広報委員.
2004.04~2012.03, 応用物理学会, 幹事.
2003.04~2004.03, 応用物理学会, 代議員.
2002.04~2004.03, 応用物理学会, プラズマエレクトロニクス分科会副幹事長.
2001.12~2012.03, 微粒子プラズマ研究会, 世話役.
2001.01~2006.03, ドライプロセス国際シンポジウム, 論文委員.
2001.01~2012.03, 応用物理学会, 講演会世話人.
2000.04~2002.03, 応用物理学会, 編集委員会委員.
2000.04~2002.03, 応用物理学会, プラズマエレクトロニクス分科会幹事.
2000.01~2002.03, 電気学会, 編集専門第3部会委員.
2000.01~2002.03, 電気学会, 編集専門第2部会委員.
1999.01~2002.03, 電気学会, 活動推進委員.
1999.01~2001.03, 電気学会, ホームページ運用委員会委員.
1999.01~1999.12, 応用物理学会, 第17回プラズマプロセシング研究会現地実行委員.
1999.01~2002.03, 電気学会, 九州支部総務幹事.
1998.04~2012.03, フロンティアプロセス研究会, 幹事.
1998.04~2012.03, 微粒子プラズマ研究会, 幹事.
1993.04~1994.03, 応用物理学会, プラズマエレクトロニクス分科会サマースクール企画担当幹事.
1992.04~1994.03, 応用物理学会, プラズマエレクトロニクス分科会幹事.
1992.04~1992.12, 応用物理学会, 第9回プラズマプロセシング研究会現地実行委員.
学会大会・会議・シンポジウム等における役割
2017.09.18~2017.09.23, 1st Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2017), 座長(Chairmanship).
2017.07.09~2017.07.14, International Conference on Phenomena in Ionized Gases (ICPIG 2017), 座長(Chairmanship).
2017.01.16~2017.01.18, 第34回プラズマプロセシング研究会(SPP34)/ 第29回プラズマ材料科学シンポジウム(SPSM29), 座長(Chairmanship).
2016.12.17~2016.12.18, プラズマ・核融合学会九州・沖縄・山口支部 第20回支部大会, 座長(Chairmanship).
2016.10.21~2016.10.24, The First International Conference on Hybridized Agriculture, 座長(Chairmanship).
2016.09.04~2016.09.09, 6th International Conference on Plasma Medicine (ICPM6), 座長(Chairmanship).
2016.03.19~2016.03.22, 第63回応用物理学会春季学術講演会, 座長(Chairmanship).
2015.09.13~2015.09.16, 第76回応用物理学会秋季学術講演会, 座長(Chairmanship).
2015.06.24~2015.06.26, 2015 International Forum on Functional Materials (IFFM2015), 座長(Chairmanship).
2015.04.20~2015.04.24, The International Conference on Metallurgical Coatings and Thin Films (ICMCTF2015), 座長(Chairmanship).
2014.11.30~2014.12.05, 2014 MRS Fall Meeting, 座長(Chairmanship).
2014.11.02~2014.11.07, 67th Annual Gaseous Electronics Conference, 座長(Chairmanship).
2014.05.18~2014.05.23, 5th International Conference on Plasma Medicine (ICPM5), 座長(Chairmanship).
2014.03.17~2014.03.20, 2014年 第61回応用物理学会春季学術講演会, 座長(Chairmanship).
2013.12.21~2013.12.22, プラズマ・核融合学会 九州・沖縄・山口支部第17回支部大会, 座長(Chairmanship).
2013.12.09~2013.12.11, 23rd Annual Meeting of MRS-JAPAN 2013, 座長(Chairmanship).
2012.11~2012.11.16, The 34th International Symposium on Dry Process , 座長(Chairmanship).
2012.10~2012.10.26, 65th Annual Gaseous Electronics Conference, 座長(Chairmanship).
2012.10~2012.10.05, Asia-Pacific Conference on Plasma Science and Technology, 座長(Chairmanship).
2012.09~2012.09.28, IUMRS‐ICEM 2012 , 座長(Chairmanship).
2012.08~2012.08.14, The 2nd International Symposium for Plasma Biosciences-2012, 座長(Chairmanship).
2012.01.16~2012.01.18, 第8回日欧プラズマプロセス共同シンポジウム, 司会(Moderator).
2011.12.19~2011.12.21, 第21回日本MRS学術シンポジウム, 座長(Chairmanship).
2011.12.17~2011.12.18, プラズマ・核融合学会 第15回九州・沖縄・山口支部大会, 座長(Chairmanship).
2011.11.14~2011.11.18, 64th Gaseous Electronics Conference , 座長(Chairmanship).
2011.11.08~2011.11.11, (ICTF-15)第15回薄膜国際会議, 座長(Chairmanship).
2010.12.18~2010.12.19, プラズマ・核融合学会 九州・沖縄・山口支部 第14回 支部大会, 座長(Chairmanship).
2010.11.05~2010.11.06, 第26 回 九州・山口プラズマ研究会, 座長(Chairmanship).
2008.11.29~2008.11.30, 応用物理学会九州支部学術講演会, 座長(Chairmanship).
2008.06, Interfinish 2008, 座長(Chairmanship).
2006.11.28~2006.12.01, 第23回プラズマ・核融合学会年会, 座長(Chairmanship).
2005.08, International Symposium on EcoTopia Science2005 (ISETS05), 座長(Chairmanship).
2004.07, The 7th Asia Pacific Conference on Plasma Sicence and Technology and the 17th Symposium on Plasma Science for Materials, 座長(Chairmanship).
2017.09.14~2017.09.16, 1st global plasma life fair, Organizing committee member.
2017.09.11~2017.09.15, AEPSE 2017, International Program Committee.
2017.09.05~2017.09.08, 応用物理学会秋季学術講演会, 現地実行委員.
2016.10.21~2016.10.24, First International Conference on Hybridized Agriculture, nternational Advisory Committee Member.
2017.03.01~2017.03.05, ISPlasma2017, 組織委員・編集委員.
2016.11.21~2016.11.22, 38th International Dry Process Symposium(DPS2016), プログラム委員・出版委員.
2016.11.17~2016.11.18, 第7回薄膜太陽電池セミナー, 組織委員.
2015.11.05~2015.11.06, 37th International Symposium on Dry Process(DPS 2015), プログラム委員.
2015.12.02~2015.12.15, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9) and 28th Symposium on Plasma Science for Materials (SPSM-28), 現地実行委員.
2013.08.29~2013.08.30, 35th International Symposium on Dry Process(DPS2013), プログラム委員.
2014.11.27~2014.11.28, 36th International Symposium on Dry Process (DPS2014), プログラム委員・出版委員.
2015.09.20~2015.09.24, (AEPSE 2015)Asian-European International Conference on Plasma Surface Engineering, プログラム委員長.
2012.11.15~2012.11.16, 34th International Symposium on Dry Process(DPS2012), プログラム委員・出版委員.
2012.03.09~2012.03.10, (IC-PLANTS 2012)The 5th International Conference on Plasma-Nanotechnology & Science, 共同組織委員長.
2011.11.22~2011.11.25, Plasma Conference 2011 (PLASMA2011), 組織委員, プログラム委員長.
2011.11.10~2011.11.11, (DPS2011)33rd International Symposium on Dry Process , プログラム委員、出版委員.
2009.09.24~2009.09.25, International Dry Process Symposium 2009, 実行委員長・出版副委員長.
2011.10.24~2011.10.25, 第3回薄膜太陽電池セミナー, 組織委員.
2008.11.26~2008.11.28, International Dry Process SYmposium 2008, 副出版委員長.
2011.09.19~2011.09.22, (AEPSE 2011)Asian-European International Conference on Plasma Surface Engineering, 組織委員.
2007.11.13~2007.11.14, International Dry Process SYmposium 2007, 出版委員長.
2011.07.19~2011.07.20, (SPSM-24)第24回プラズマ材料科学シンポジウム, 運営委員会委員.
2007.12.07~2007.12.09, 2007 MRS-J, セッションチェア.
2011.07.04~2011.07.07, (ICMAP-2011)The 3rd International Conference on Microelectronics and Plasma Technology, International Organizing Committee.
2014.12.10~2014.12.12, 2014MRS-J , Session orgnizer.
2013.12.09~2013.12.11, 2013MRS-J, Session orgnizer.
2012.03.04~2012.03.08, ISPlasma2012(4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials), 委員(組織委員会、プログラム委員会).
2008.12.09~2008.12.13, IUMRS-ICA2008, セッションチェア.
2011.03.10~2011.03.12, (IC-PLANTS 2011)The 4th International Conference on Plasma-Nanotechnology & Science, 共同組織委員長.
2008.12.19~2008.12.20, AFI/TFI2008, 組織委員.
2011.03.06~2011.03.09, ISPlasma2011(3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials), 委員(組織委員会、プログラム委員会、編集委員会).
2013.12~2013.12, 14th Workshop on Fine Particle Plasma, Orgnizer.
2010.12.10~2010.12.10, 20th MRS-Japan Academic Symposium, Contact Chairperson(sessionA).
2010.09.14~2010.09.17, 2010応用物理学会秋季講演会, 現地実行委員.
2010.11.11~2010.11.12, (DPS2010)32rd International Symposium on Dry Process , 組織委員、出版委員.
2014.11.30~2014.12.05, 2014 MRS-Fall Meeting, Leading Orgnizer.
2010.10.17~2010.10.22, AVS 57th International Symposium & Exhibition , Executive Committee.
2014.02.03~2014.02.07, 8th International Conference on Reactive Plasmas(ICRP-8), 組織委員長.
2010.10.11~2010.10.14, (IWTFSSC-3)Third International Workshop on Thin Film Silicon Solar Cells, General Chair Person.
2015.04.20~2015.04.24, ICMCTF2015 , Session orgnizer.
2010.10.04~2010.10.08, (ICRP)63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas , 出版委員.
2013.02.02~2013.02.03, IC-PLANTS2013, 副組織委員長.
2010.01.08~2010.01.10, The 10th International Workshop of Advanced Plasma Processing and Diagnostics, Organizing Chairperson.
2010.11.21~2010.11.24, IEEE TENCON2010, 実行委員.
2009.12.07~2009.12.09, 2009 MRS-J Symposium, Contact Chairperson.
2008.09.08~2008.09.12, International Congress on Plasma Physics(ICPP2008), プログラム委員、現地実行委員.
2005.11, 5th International Symposium on Dry Process, Program Committee.
2010.03.07~2010.03.10, ISPlasma2010, プログラム委員.
2004.12~2005.11, The 15th Symposium of the Materials Research Society of Japan, Chairperson.
2013.01.28~2013.02.01, ISPlasma2013, 組織委員・プログラム委員・編集委員.
2004.11, 4th International Symposium on Dry Process, Program Committee.
2014.03.02~2014.03.06, ISPlasma2014, 組織委員・プログラム委員・編集委員.
2004.07, The 7th Asia Pacific Conference on Plasma Sicence and Technology and the 17th Symposium on Plasma Science for Materials, Local Organizing Commitee.
2015.03.26~2015.03.31, ISPlasma2015/IC-PLANTS2015, 組織委員・プログラム委員・編集委員.
2003.08~2004.07, フロンティアプロセス2003, 組織委員.
2016.03.06~2016.03.10, ISPlasma2016/IC-PLANTS2016, 組織委員.
2002.07~2003.06, フロンティアプロセス2002, 組織委員.
2014.08.24~2014.08.30, IUMRS-ICA2014 , Session orgnizer・シンポジウム現地実行委員.
2012.09.23~2012.09.28, IUMRS-ICEM2012, 組織委員.
2012.04.09~2012.04.13, 2012MRS-Spring Meeting Session WW orgnizer, Session WW orgnizer.
2012.10.02~2012.10.05, The 11th Asia Pacific Conference on Plasma Science and Technology(APCPST), Program Committee.
2013.07.14~2013.07.19, The 12th Asia-Pacific Physics Conference(APPC12), Program Committee.
2012.11.27~2012.11.30, プラズマ・核融合学会第29回年会, 実行委員長.
2013.09.23~2013.09.24, 第26回プラズマ材料科学シンポジウム(SPSM26), 運営委員長.
2016.08.22~2016.08.25, IEEE Nano 2016, 組織委員.
学会誌・雑誌・著書の編集への参加状況
2016.04~2018.03, Plasma Processes and Polymers特集号, 国際, 編集委員長.
2016.04~2018.03, Surface Coatings and Technology 特集号, 国際, 編集委員.
2016.04~2018.03, Journal of Physics D 特集号, 国内, 編集委員.
2016.04~2018.03, Plasma Medicine特集号, 国内, 編集委員.
2016.04~2018.03, Transaction of MRS-J特集号, 国内, 編集委員.
2016.04~2018.03, Japanese Journal Applied Physics特集号, 国内, 編集委員.
2016.04~2018.03, Reviews of Modern Plasma Physics, 国際, 編集委員.
2012.04~2014.03, Transactions of Materials Research Society of Japan, 国内, 編集委員.
2012.04~2014.03, Japanese Journal of Applied Physics 特集号, 国内, 編集委員.
2007.04~2011.03, Japanese Journal of Applied Physicst 特集号, 国内, 編集委員.
2005.04~2008.03, Japanese Journal of Applied Physics, 国内, 編集委員.
2000.04~2001.03, 電気学会誌, 国内, 編集委員.
2000.04~2002.03, 応用物理, 国内, 編集委員.
学術論文等の審査
年度 外国語雑誌査読論文数 日本語雑誌査読論文数 国際会議録査読論文数 国内会議録査読論文数 合計
2016年度
2015年度
2014年度 12  12 
2013年度 11  11 
2012年度
2004年度 20  20 
その他の研究活動
海外渡航状況, 海外での教育研究歴
Mount Holyoke College, UnitedStatesofAmerica, 2006.07~2006.07.
Institute of Physics, Belgrade, , 2007.03~2007.03.
PRIAM/ONERA, France, 1996.03~1997.01.
外国人研究者等の受入れ状況
2017.02~2017.05, 1ヶ月以上, University of Kiel, Germany, 学内資金.
2017.02~2017.02, 2週間未満, University of Kiel, Germany, 学内資金.
2016.11~2016.11, 2週間未満, Sungkyunkwan University(Korea), Korea, Sungkyunkwan University.
2016.05~2016.07, 1ヶ月以上, California State University, Fresno, UnitedStatesofAmerica, 学内資金.
2016.01~2016.11, 1ヶ月以上, Kwangwoon University, India, 日本学術振興会.
2015.09~2015.09, 2週間未満, University of Kiel, Germany, 学内資金.
2015.01~2015.01, 2週間未満, Sungkyunkwan University(Korea), Korea, 学内資金.
2014.08~2014.08, 2週間未満, University of Kiel, Germany, 学内資金.
2014.07~2014.08, 1ヶ月以上, Kwangwoon University(Korea), Korea, 学内資金.
2014.03~2014.03, 2週間以上1ヶ月未満, Indian Institute of Technology Madras, India, 日本学術振興会.
2011.08~2011.09, 2週間以上1ヶ月未満, University of Kiel, Germany, 学内資金.
2010.11~2010.12, 2週間未満, Université Joseph Fourier, France, 学内資金.
2010.08~2010.08, 2週間未満, Sungkyunkwan University(Korea), Korea, 文部科学省.
2004.07~2004.08, 1ヶ月以上, オルレアン大学(フランス), Algeria, 学内資金.
1998.01~1998.03, 2週間未満, Universidade Federal do Parana(ブラジル), Russia, 日本学術振興会.
1994.09~1996.10, 1ヶ月以上, インド国立プラズマ研究所, India, 日本学術振興会.
受賞
応用物理学会支部貢献賞, 応用物理学会九州支部, 2018.12.
第14回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2016.03.
第17回プラズマ材料科学賞基礎部門賞, 日本学術振興会プラズマ材料科学第153委員会, 2015.12.
ICMAP2014 Best Poster Presentation Award , International Conference of Microelectronics ans Plasma Technology 2014 (ICMAP2014), 2014.07.
第7回(2013年度)フェロー表彰, 応用物理学会, 2013.09.
The 9th Asian-European International Conference of Plasma Surface Engineering(AEPSE2013)/ Outstanding Poster Award, The 9th Asian-European International Conference on Plasma Surface Engineering , 2013.08.
平成24年度九州大学研究活動表彰, 九州大学, 2012.11.
Advanced Plasma Application Award, 11th Asia Pacific Conference on Plasma Science adn Technology (APCPST) & 25th Symposium on Plasma Science for Materials (SPSM), 2012.10.
ISPlasma2012 "Best Presentation Award", ISPlasma2012, 2012.03.
平成23年度高温学会論文賞, 社団法人高温学会, 2011.03.
平成22年九州大学研究活動表彰, 九州大学, 2010.05.
応用物理学会第8回APEX/JJAP編集貢献賞, 応用物理学会, 2010.04.
平成21年九州大学産学連携活動表彰, 九州大学, 2009.05.
Invited Presentation Award at Interfinish 2008, Interfinish 2008 World Congress and Exposition, 2008.06.
応用物理学会第3回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2005.03.
応用物理学会第2回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2004.03.
日本学術振興会第1回プラズマ材料科学賞, 日本学術振興会, 1998.01.
平成7年度電気学会論文発表賞A, 電気学会, 1996.03.
平成3年度電気学会論文発表賞B, 電気学会, 1992.04.
九州大学工学部電気工学教室宮崎賞 , 九州大学, 1983.03.
研究資金
科学研究費補助金の採択状況(文部科学省、日本学術振興会)
2016年度~2017年度, 挑戦的萌芽研究, 代表, 圧力可変マイクロプラズマによる異方性プラズマCVD.
2014年度~2014年度, 新学術領域研究, 代表, プラズマとナノ界面の相互作用に関する学術統合研究.
2014年度~2015年度, 挑戦的萌芽研究, 代表, コンパクトドリフトチューブ型ナノ粒子検出法の創成.
2014年度~2018年度, 基盤研究(A), 代表, プラズマを用いたナノ粒子精密配置制御の学術基盤創成.
2010年度~2011年度, 挑戦的萌芽研究, 代表, 細胞周期同期パルスプラズマ照射による細胞増殖加速.
2009年度~2013年度, 新学術領域研究, 代表, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生.
2009年度~2013年度, 新学術領域研究, 代表, プラズマとナノ界面の相互作用に関する総括研究.
2007年度~2008年度, 基盤研究(C), 分担, 炭素クラスターのアーク合成におけるクラスター径と密度の空間分布測定.
2008年度~2010年度, 基盤研究(B), 代表, ナノブロック輸送・配置の学術・技術基盤構築.
2007年度~2009年度, 基盤研究(B), 分担, インジウム新素材によるインジウム肺症の実験的研究.
2007年度~2009年度, 基盤研究(B), 分担, 微粒子プラズマによる臨界現象.
2006年度~2007年度, 萌芽研究, 代表, プラズマを用いたナノカプセルの創製と物質内包技術の開発.
2004年度~2006年度, 基盤研究(B), 代表, ナノ構造の新作製法としてのプラズマ異方性CVD.
2003年度~2004年度, 萌芽研究, 代表, 微重力反応性プラズマ中の微粒子成長.
1999年度~2000年度, 基盤研究(B), 分担, シランプラズマ中のSiクラスタの成長機構に関する研究.
1996年度~1997年度, 試験研究(B), 代表, 気相中微粒子の粒径・密度・屈折率の超高感度レーザ偏光散乱その場計測法の開発.
1995年度~1995年度, 奨励研究(A), 代表, プラズマCVD法による銅薄膜の選択形成に関する研究.
1994年度~1994年度, 奨励研究(A), 代表, プラズマCVDによる銅薄膜形成に関する研究.
1992年度~1992年度, 奨励研究(A), 代表, 微粒子プラズマに関する実験的研究.
1989年度~1989年度, 奨励研究(A), 代表, シランプラズマ中における微粒子発生機構に関する研究.
日本学術振興会への採択状況(科学研究費補助金以外)
1997年度~1999年度, 二国間交流, 分担, 反応性プラズマ中の微粒子成長機構に関する研究.
2000年度~2002年度, 二国間交流, 分担, プラズマCVD装置中のクラスタの成長と抑制.
競争的資金(受託研究を含む)の採択状況
2015年度~2016年度, JST「太陽系フロンティア開拓による人類の生存圏・ 活動領域拡大に向けたオープンイノベーションハブ」, 分担, プラズマ・触媒ナノ粒子複合反応場によるCO2資源化技術の開発.
2013年度~2014年度, NEDO, 分担, 高度秩序構造を有する薄膜多接合太陽電池の研究開発ー新概念新材料の検討ー(継続).
2012年度~2012年度, 地域イノベーション戦略支援プログラム(都市エリア型)可能性試験, 代表, リチウムイオン電池用Si系ナノ粒子含有ポーラス負極に関する研究開発.
2010年度~2014年度, NEDO, 分担, ナノ粒子制御によるアモルファスシリコンセルの高光安定化に関する研究.
2010年度~2010年度, 核融合科学研究所一般共同研究, 代表, 微粒子プラズマのフロンティア.
2010年度~2010年度, 核融合科学研究所一般共同研究, 代表, LHD第一壁へのダストフラックスに対する壁電位の効果.
2009年度~2009年度, 核融合科学研究所一般共同研究, 代表, LHD内壁へのダスト付着量の壁電位依存性に関する研究.
2008年度~2008年度, 核融合科学研究所一般共同研究, 代表, LHDダストとモデル実験装置ダストの比較.
2008年度~2014年度, NEDO, 分担, 高度秩序構造を有する薄膜多接合太陽電池の研究開発ー新概念新材料の検討ー.
2007年度~2011年度, 戦略的創造研究推進事業 (文部科学省), 分担, プラズマナノ科学創成によるプロセスナビゲーション構築とソフト材料加工.
2006年度~2007年度, 核融合科学研究所一般共同研究, 代表, LHDにおけるダストのその場サンプリングと分析.
2004年度~2005年度, NEDO, 代表, ナノ結晶シリコントップセル化技術開発.
共同研究、受託研究(競争的資金を除く)の受入状況
2013.06~2014.03, 代表, 高光安定a-Si太陽電池製作のためのガス流動・ナノ粒子制御技術に関する共同研究.
2012.05~2013.03, 代表, 高光安定a-Si太陽電池製作のためのガス流動・ナノ粒子制御技術に関する共同研究.
2007.01~2007.03, 分担, CIGSの経気道性曝露による生体影響に関する研究.
2007.02~2010.03, 代表, トップセルの光劣化の基礎現象解明.
2006.12~2009.03, 代表, シランプラズマ中のクラスタ量の制御法の開発.
2004.10~2005.03, 分担, 集積回路内配線形成に関する研究.
2004.10~2005.03, 分担, 多孔質低誘電率絶縁膜に関する研究.
寄附金の受入状況
2007年度, 高柳記念財団, 電子デバイス工学研究資金.
2003年度, 村田学術振興財団, 2段プラズマCVD法による超低誘電率層間絶縁膜に関する研究.

九大関連コンテンツ

pure2017年10月2日から、「九州大学研究者情報」を補完するデータベースとして、Elsevier社の「Pure」による研究業績の公開を開始しました。
 
 
九州大学知的財産本部「九州大学Seeds集」