| 白谷 正治（しらたに まさはる） | データ更新日：2024.03.21 |
教授 ／
システム情報科学研究院
情報エレクトロニクス部門
電子デバイス工学
| 1. | Y. Liu, Y. Nakatsu, H. Tanaka, K. Koga, K. Ishikawa, M. Shiratani, M. Hori , Effects of plasma-activated Ringer’s lactate solution on cancer cells: evaluation of genotoxicity, Genes Environ, 10.1186/s41021-023-00260-x, 45, 1, 1-10, 2023.01, [URL]. |
| 2. | P. Attri, K. Koga, H. Kurita, K. Ishikawa, M. Shiratani, Prospects of plasma generated species interaction with organic and inorganic materials, Frontiers in Physics, 10.3389/fphy.2022.1118018, 10, 1396, 2023.01, [URL]. |
| 3. | N. Yamashita, R. Mitsuishi, Y. Nakamura, K. Takeda, M. Hori, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, Role of insoluble atoms in the formation of a three-dimensional buffer layer in inverted Stranski–Krastanov mode, J. Mater. Res, 10.1557/s43578-022-00886-7, 1-8, 2023.01, [URL]. |
| 4. | D. Sakamoto, M. Shiratani, H. Seo, Near-infrared light harvesting of upconverting Y2O3: Er3+ nanoparticles and their photovoltaic application, Electrochim. Acta, 10.1016/j.electacta.2022.141407, 436, 141407, 2022.12, [URL]. |
| 5. | M. Shiratani, J. P. Verboncoeur, J. S. Wu, Guest Editorial: Emerging Plasma Nanotechnologies, IEEE Open Journal of Nanotechnology, 10.1109/OJNANO.2022.3224346, 3, 131-132, 2022.12, [URL]. |
| 6. | I. Nagao, K. Kamataki, A. Yamamoto, M. Otaka, Y. Yamamoto, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges, MRS Adv., 10.1557/s43580-022-00417-w, 7, 911-917, 2022.12, [URL]. |
| 7. | R. Narishige, N. Yamashita, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, H. Yabuta, N. Itagaki , Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates(Invited), J. Mater. Res., 10.1557/s43578-022-00827-4, 2022.11, [URL]. |
| 8. | T. Okumura, T. Anan, P. Attri, Y. Tsukada, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Y. Ishibashi, Plasma irradiation-introduced RONS amount into plant seeds and their response analysis, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 9. | S. Ono, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Process analysis of cracking aC: H/CNP/aC: H sandwich films under stress using nanoindentation, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 10. | M. Shiratani, D. Takahashi, N. Yamashita, N. Itagaki, Sputter epitaxy of Mg-doped ZnO films on sapphire substrates using inverted Stranski-Krastanov mode, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 11. | P. Attri, T. Okumura, K. Koga, K. Kamataki, N. Itagaki, M. Shiratani, N. Takeuchi, Plasma induced conversion of CO2 with water to useful compounds, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 12. | T. Anan, T. Nakao, T. Okumura, P. Attri, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effect of plasma irradiation on germination of lettuce seeds with fluctuating dormancy, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 13. | M. Shiratani, T. Anan, T. Nakao, T. Okumura, P. Attri, K. Koga, Reproducibility in plasma agriculture, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 14. | M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Pressure dependence on spatio-temporal distribution of excitation rates of Ar 2p1 and Ne 2p1 in Ar and Ar/Ne capacitively coupled plasmas, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 15. | A. M. Nurut, N. Yamashita, K. Kamataki, K. Koga, N. Itagaki, M. Shiratani, Control of magnetic transition of ZnO: Co grown by RF-sputter using post-annealing, ICIEE, 10.1109/ICIEE55596.2022.10010108, 2022.10, [URL]. |
| 16. | I. Nagao, A. Yamamoto, Y. Yamamoto, K. Kamataki, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulation discharge on behavior of oxygen ions in Ar/O2 capacitively coupled plasma studied by particle-in-cell/Monte Carlo collision model, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 17. | S. Toko, T. Hasegawa, T. Okumura, K. Kamataki, K. Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Relationship between vibrational temperature and CO2 methanation with plasma catalysis, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 18. | K. Kamataki, T. Sato, K. Tomita, P. Yimin, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Measurements of strength and fluctuation of 2D electric fields in plasmas using a fine particle trapped with laser tweezers, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 19. | K. Koga, P. Attri, T. Okumura, T. Anan, T. Nakao, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani, Role of short-lived nitrogen species generated at low-pressure RF plasma on the germination and seedling growth, Bull. Am. Phys. Soc., 2022.10, [URL]. |
| 20. | K. Abe, K. Kamataki, A. Yamamoto, I. Nagao, M. Otaka, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K . Koga, M. Shiratani, Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes:particle-in-cell/Monte Carlo collision model simulation, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac7626, 61, 10, 106003, 2022.09, [URL]. |
| 21. | K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma, AIP Adv., 10.1063/5.0097691, 12, 085220, 2022.08, [URL]. |
| 22. | V. Sirgedaitė-Šėžienė, I. Lučinskaitė, V. Mildažienė, A. Ivankov, K. Koga, M. Shiratani, K. Laužikė, V. Baliuckas, Changes in Content of Bioactive Compounds and Antioxidant Activity Induced in Needles of Different Half-Sib Families of Norway Spruce (Picea abies (L.) H. Karst) by Seed Treatment with Cold Plasma, Antioxidants, 10.3390/antiox11081558, 11, 8, 1558, 2022.08, [URL]. |
| 23. | K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma, AIP Adv, 10.1063/5.0097691, 12, 8, 085220, 2022.08, [URL]. |
| 24. | T. Okumura, P. Attri, K. Kamataki, N. Yamashita, Y. Tsukada, N. Itagaki, M. Shiratani, Y. Ishibashi, K. Kuchitsu, K. Koga, Detection of NO3− introduced in plasma-irradiated dry lettuce seeds using liquid chromatography-electrospray ionization quantum mass spectrometry (LC-ESI QMS), Sci. Rep., 10.1038/s41598-022-16641-1, 12, 12525, 2022.07, [URL]. |
| 25. | S. Ono, S. H. Hwang, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, J. S. Oh, S. Takabayashi, T. Nakatani, Raman spectral analysis of the as-deposited aC: H films prepared by CH4+ Ar plasma CVD, MRS Adv., 10.1557/s43580-022-00310-6, 7, 718–722, 2022.07, [URL]. |
| 26. | P. Attri, K. Koga, T. Okumura, F. L. Chawarambwa, T. E. Putri, Y. Tsukada, K. Kamataki, N. Itagaki, M. Shiratani, Treatment of organic wastewater by a combination of non-thermal plasma and catalyst: a review, Rev. Mod. Plasma Phys, 10.1007/s41614-022-00077-1, 6, 17, 2022.07, [URL]. |
| 27. | M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Spatio-temporal measurements Ar 2p1 excitation rates and optical emission spectroscopy by capacitively coupled Ar and Ne mixed gas plasma, MRS Adv., 10.1557/s43580-022-00306-2, 2022.07, [URL]. |
| 28. | I. Adamovich, S. Agarwal, E. Ahedo, L. L. Alves, S. Baalrud, N. Babaeva, A. Bogaert, A. Bourdon, P. J. Bruggeman, C. Canal, E. H. Choi, S. Coulombe, Z. Donkó, D. B. Graves, S. Hamaguchi, D. Hegemann, M. Hori, H-H. Kim, G. M. W. Kroesen, M. J. Kushner, A. Laricchiuta, X. Li, T. E. Magin, S. Mededovic Thagard, V. Miller, A. B. Murphy, G. S. Oehrlein, N. Puac, R. M. Sankaran, S. Samukawa, M. Shiratani, M. Šimek, N. Tarasenko, K. Terashima, E. Thomas. Jr, J. Trieschmann, S. Tsikata, M. M. Turne, I. J. van der Walt, M C M van de Sanden, T. von Woedtke, The 2022 Plasma Roadmap: low temperature plasma science and technology, J. Phys. D: Appl. Phys., 10.1088/1361-6463/ac5e1c, 55, 373001, 2022.07, [URL]. |
| 29. | J. Razzokov, S. Fazliev, A. Kodirov, P. Attri, Z. Chen, M. Shiratani, Mechanistic Insight into Permeation of Plasma-Generated Species from Vacuum into Water Bulk, Int. J. Mol. Sci., 10.3390/ijms23116330, 23, 11, 6330, 2022.06, [URL]. |
| 30. | Y. Nakamura, N. Yamashita, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, N. Itagaki, Growth of single crystalline ZnO films on 18%-lattice-mismatched sapphire substrates using buffer layers with three-dimensional islands, Cryst. Growth Des., 10.1021/acs.cgd.2c00145, 2022.05, [URL]. |
| 31. | T. E. Putri, F. L. Chawarambwa, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani , Performance comparison of nitrile-based liquid electrolytes on bifacial dye-sensitized solar cells under low-concentrated light, MRS Adv., 10.1557/s43580-022-00270-x, 7, 427-432, 2022.04, [URL]. |
| 32. | F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Effects of Spin-Coating Rate on Surface Roughness, Thickness, and Electrochemical Properties of a Pt Polymer Counter Electrode, Advanced Engineering Forum, 10.4028/p-6l16rl, 45, 1-13, 2022.04, [URL]. |
| 33. | D. Takahashi, N. Yamashita, D. Yamashita, T. Okumura, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of Zn1-xMgxO Films on Sapphire Substrates via Inverted Stranski-Krastanov Mode Using Magnetron Sputtering, MRS Adv., 10.1557/s43580-022-00234-1, 2022.02, [URL]. |
| 34. | P. Attri, T. Okumura, K. Koga, M. Shiratani, D. Wang, K. Takahashi, K. Takaki, Outcomes of Pulsed Electric Fields and Nonthermal Plasma Treatments on Seed Germination and Protein Functions, Agronomy 2022, 10.3390/agronomy12020482, 12, 2, 482, 2022.02, [URL]. |
| 35. | G. Uchida, K. Nagai, Y. Habu, J. Hayashi, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara , Nanostructured Ge and GeSn Films by Highpressure He Plasma Sputtering for High-capacity Li ion Battery Anodes, Sci. Rep., 10.1038/s41598-022-05579-z, 12, 1742 (2022), 2022.02, [URL]. |
| 36. | 白谷正治, 農業応用のための大気圧プラズマ源とその植物への効果 , 化学工業, 73, 2, 124-128, 2022.02, [URL]. |
| 37. | S. Toko, M. Ideguchi, T. Hasegawa, T. Okumura, K. Kamataki, K.Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Effect of gas flow rate and discharge volume on CO2 methanation with plasma catalysis, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac4822, 2022.01, [URL]. |
| 38. | F. L. Chawarambwa, T. E. Putri, A. Pankaj, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Performances of Carbon Black-Titanium nitrate and Carbon Black-Titanium/Triton X-100 Composite Polymer Counter Electrodes for Dye-Sensitized Solar Cells, Adv. Mater. Res., 10.4028/www.scientific.net/AMR.1168.35, 1168, 35-47, 2022.01, [URL]. |
| 39. | F. L. Chawarambwa, T. E. Putri, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, K. Koga, D. Nakamura. M. Shiratani, Improved luminescence performance of Yb3+-Er3+-Zn2+: Y2O3 phosphor and its application to solar cells, Optical Materials, 10.1016/j.optmat.2021.111928, 123, 111928, 2022.01, [URL]. |
| 40. | J.Hayashi, K. Nagai, Y.Habu, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara, G. Uchida, Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac2b7b, 61, SA, SA1002, 2021.12, [URL]. |
| 41. | P. Attri, T. Anan, R. Arita, T. Okumura, H. Tanaka, D. Yamashita, K. Matsuo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, K. Kuchitsu, Y. Ishibashi, Plasma Treatment Effect on the Paramagnetic Species of Barley Seed Radical’s Intensity: An EPR study, Plasma Medicine, 10.1615/PlasmaMed.2020036353, 10, 3, 159-168, 2021.12, [URL]. |
| 42. | T. E. Putri, F. L Chawarambwa, M. K. Son, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Performance Characteristics of Bifacial Dye-Sensitized Solar Cells with a V-Shaped Low-Concentrating Light System, ACS Appl. Energy Mater., 10.1021/acsaem.1c02774, 4, 12, 13410-13414, 2021.11, [URL]. |
| 43. | F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of concentrated light on the performance and stability of a quasi-solid electrolyte in dye-sensitized solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2021.138986, 781, 138986, 2021.10, [URL]. |
| 44. | K. Koga, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, Transport of Nanoparticles in Afterglow Region Using Multi-Hollow Discharge Plasma CVD, Bull. Am. Phys. Soc., 66, 7, 2021.10, [URL]. |
| 45. | D. Sakamoto, M. Shiratani, H. Seo, Synergetic effect of a polymer and metalloid composite on the electrocatalytic improvement of dye-sensitized solar cells, New J. Chem., 10.1039/D1NJ03643B , 45, 38, 18202-18207, 2021.09, [URL]. |
| 46. | P. Attri,H. Kurita, K. Koga, M. Shiratani, Impact of Reactive Oxygen and Nitrogen Species Produced by Plasma on Mdm2–p53 Complex, Int. J. Mol. Sci., 10.3390/ijms22179585, 22, 17, 9585, 2021.09, [URL]. |
| 47. | S. Nunomura, I. Sakata, A. Sato, M. Lozac’h, T. Misawa, N.Itagaki, M.Shiratani, Passivating antireflection coating of crystalline silicon using i/n a-Si:H/SiN trilayer , J Phys Chem Solids, 10.1016/j.jpcs.2021.110127, 156, 11027, 2021.09, [URL]. |
| 48. | S. Nunomura, I. Sakata, A. Sato, M. Lozac’h, T. Misawa, N.Itagaki, M.Shiratani, Passivating antireflection coating of crystalline silicon using i/n a-Si:H/SiN trilayer , J Phys Chem Solids, 10.1016/j.jpcs.2021.110127, 156, 11027, 2021.09, [URL]. |
| 49. | P.Attri, K. Koga, T. Okumura, N. Takeuchi, M. Shiratani, Green route for ammonium nitrate synthesis: fertilizer for plant growth enhancement, RSC Adv., 10.1039/D1RA04441A , 11, 46, 28521-28529, 2021.08, [URL]. |
| 50. | S. H. Hwang, R. Iwamoto, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani, Comparison between Ar+CH4 Cathode and Anode Coupled Capacitively Coupled Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Films, Thin Solid Films, 10.1016/j.tsf.2021.138701, 729, 138701, 2021.07, [URL]. |
| 51. | P.Attri, N. KumarKaushik, N. Kaushik, D. Hammerschmid, A. Privat-Maldonado, J. Backer, M. Shiratani, E. H. Choi, A. Bogaerts, Plasma treatment causes structural modifications in lysozyme, and increases cytotoxicity towards cancer cells, Int. J. Biol. Macromol., 10.1016/j.ijbiomac.2021.05.146, 182, 1724-1736, 2021.07, [URL]. |
| 52. | R. Narishige, N. Itagaki, M. Shiratani, Sputtering Growth of Metal Oxynitride Semiconductors for Excitonic Devices, 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM), 10.1109/EDTM50988.2021.9420921, 2021.05, [URL]. |
| 53. | F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Highly efficient and transparent counter electrode for application in bifacial solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2021.138369, 768, 138369, 2021.04, [URL]. |
| 54. | P.Attri, K. Koga, T.Okumura, M. Shiratani, Impact of atmospheric pressure plasma treated seeds on germination, morphology, gene expression and biochemical responses, Jpn. J. Appl. Phys., 10.35848/1347-4065/abe47d, 60, 4, 040502, 2021.03, [URL]. |
| 55. | F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura, Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells, J. Mol. Struct., 10.1016/j.molstruc.2020.129479, 1228, 129479, 2021.03, [URL]. |
| 56. | C. Suriyasak, K. Hatanaka, H. Tanaka, T. Okumura, D. Yamashita, P. Attri, K. Koga, M. Shiratani, N. Hamaoka, Y. Ishibashi, Alterations of DNA Methylation Caused by Cold Plasma Treatment Restore Delayed Germination of Heat-Stressed Rice (Oryza sativa L.) Seeds, ACS Agric. Sci. Technol., 10.1021/acsagscitech.0c00070, 1, 1, 5-10, 2021.02, [URL], プラズマ照射を用いることによって、悪影響が及んでいる高温障害イネの発芽を促進するメカニズムの解明に成功した。. |
| 57. | P. Attri, K. Ishikawa, T. Okumura, K. Koga, M. Shiratani, V. Mildaziene, Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture, Sci. Rep., 10.1038/s41598-021-81175-x, 11, 1, 1-10, 2021.01, [URL]. |
| 58. | P. Attri, K. Koga, M. Shiratani, Possible impact of plasma oxidation on the structure of C-terminal domain of SARS-CoV-2 spike protein: a computational study, Jpn. J. Appl. Phys., 10.35848/1882-0786/abd717, 14, 2, 2021.01, [URL]. |
| 59. | T. E. Putri, Y. Hao, F. L. Chawarambwa, H. Seo, Min-Kyu Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Activated Carbon Counter Electrode On Bifacial Dye Sensitized Solar Cells (DSSCs), Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.1016.863, 1016, 863-868, 2021.01, [URL]. |
| 60. | V. Sirgedaitė‐Šėžienė , V. Mildažienė, P. Žemaitis , A. Ivankov , K. Koga, M. Shiratani, V. Baliuckas, Long-term response of Norway spruce to seed treatment with cold plasma: dependence of the effects on the genotype, Plasma Process Polym, 10.1002/ppap.202000159, 2020.12, [URL]. |
| 61. | S. H. Hwang, K. Koga, Y. Hao, P. Attri, T. Okumura, K. Kamataki, N. Itagaki, M. Shiratani, J-S. Oh, S. Takabayashi, T. Nakatani, Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, Processes, 10.3390/pr9010002, 9, 1, 2, 2020.12, [URL]. |
| 62. | Naho Itagaki, Yuta Nakamura, Ryota Narishige, Keigo Takeda, Kunihiro Kamataki, Kazunori Koga, Masaru Hori, Masaharu Shiratani, Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition, Scientific reports, 10.1038/s41598-020-61596-w, 10, 1, 2020.12, [URL], Regarding crystalline film growth on large lattice-mismatched substrates, there are two primary modes by which thin films grow on a crystal surface or interface. They are Volmer-Weber (VW: island formation) mode and Stranski-Krastanov (SK: layer-plus-island) mode. Since both growth modes end up in the formation of three-dimensional (3D) islands, fabrication of single crystalline films on lattice-mismatched substrates has been challenging. Here, we demonstrate another growth mode, where a buffer layer consisting of 3D islands initially forms and a relaxed two-dimensional (2D) layer subsequently grows on the buffer layer. This 3D-2D mode transition has been realized using impurities. We observed the 3D-2D mode transition for the case of ZnO film growth on 18%-lattice-mismatched sapphire substrates. First, nano-sized 3D islands grow with the help of nitrogen impurities. Then, the islands coalesce to form a 2D layer after cessation of the nitrogen supply, whereupon an increase in the surface energy may provide a driving force for the coalescence. Finally, the films grow in 2D mode, forming atomically flat terraces. We believe that our findings will offer new opportunities for high-quality film growth of a wide variety of materials that have no lattice-matched substrates.. |
| 63. | P. Attri, J. H. Park, J. D. Backer, M. Kim, J. H. Yun, Y. Heo, S. Dewilde, M. Shiratani, E. H. Choi, W. Lee, A. Bogaerts, Structural modification of NADPH oxidase activator (Noxa 1) by oxidative stress: An experimental and computational study, Int. J. Biol. Macromol., 10.1016/j.ijbiomac.2020.09.120, 163, 2405-2414, 2020.11, [URL]. |
| 64. | T. Kawasaki, K. Koga, M. Shiratani, Experimental identification of the reactive oxygen species transported into a liquid by plasma irradiation, Jpn. J. Appl. Phys., 10.35848/1347-4065/abc3a1, 59, 11, 110502, 2020.11, [URL]. |
| 65. | F. L. Chawarambwa, T. E. Putri, M. K. Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Graphene-Si3N4 nanocomposite blended polymer counter electrode for low-cost dye-sensitized solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2020.137920, 758, 137920, 2020.11, [URL]. |
| 66. | S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition, Diam Relat Mater, 10.1016/j.diamond.2020.108050, 109, 108050, 2020.11, [URL]. |
| 67. | R. Narishige, K. Kaneshima, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Impact of surface morphologies of substrates on the epitaxial growth of magnetron sputtered (ZnO)x(InN)1-x films, Jpn. J. Appl. Phys., 10.35848/1347-4065/abba0c, 60, SA, SAAB02, 2020.10, [URL]. |
| 68. | S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani, Low stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition, Jpn. J. Appl. Phys. , 10.35848/1347-4065/abbb20, 59, 10, 100906, 2020.10, [URL]. |
| 69. | I. Tamošiūnė, D. Gelvonauskienė, P. Haimi, V. Mildažienė, K. Koga, M. Shiratani, D. Baniulis, Cold plasma treatment of sunflower seeds modulates plant-associated microbiome and stimulates root and lateral organ growth, Front. Plant Sci., 10.3389/fpls.2020.568924, 11, 1347, 2020.08, [URL]. |
| 70. | P. Attri, K. Ishikawa, T. Okumura, K. Koga, M. Shiratani, Plasma agriculture from laboratory to farm: A review, Processes, 10.3390/pr8081002, 8, 8, 1002, 2020.08, [URL]. |
| 71. | S. Nunomura, I. Sakata, H. Sakakita, K. Koga, M. Shiratani, Real-time monitoring of surface passivationof crystalline silicon during growth of amorphous and epitaxial silicon layer, J. Appl. Phys., 10.1063/5.0011563, 128, 3, 2020.07, [URL]. |
| 72. | P. Attri, S. Choi, M. Kim, M. Shiratani, A. E. Cho, W. Lee, Influence of alkyl chain substitution of ammonium ionic liquids on the activity and stability of tobacco etch virus protease , International Journal of Biological Macromolecules, 10.7567/1347-4065/ab656c, 155, 439-446, 2020.07, [URL]. |
| 73. | Pankaj Attri, Sooho Choi, Minsup Kim, Masaharu Shiratani, Art E. Cho, Weontae Lee, Influence of alkyl chain substitution of ammonium ionic liquids on the activity and stability of tobacco etch virus protease, International Journal of Biological Macromolecules, 10.1016/j.ijbiomac.2020.03.175, 155, 439-446, 2020.07, [URL], Ionic liquids (ILs) are known to provide stability to biomolecules. ILs are also widely used in the fields of chemical engineering, biological engineering, chemistry, and biochemistry because they facilitate enzyme catalyzed reactions and enhance their conversion rate. In this work, we have evaluated the influence of alkyl chain substitution of ammonium ILs such as diethylammonium dihydrogen phosphate (DEAP) and triethylammonium hydrogen phosphate (TEAP) for the stability and activity of the tobacco etch virus (TEV) protease. Further, we performed molecular dynamics (MD) simulations to calculate the RMSD (root mean square deviation) for TEV and TEV + ILs. Experimental and simulations results show that TEV is more stable in the presence of TEAP than DEAP. Whereas, TEV protease activity for the cleavage of fusion proteins is preserved in the presence of DEAP while lost in the presence of TEAP. Hence, DEAP IL can serve as alternative solvents for the stability of the TEV protease with preserved activity. To the best of our knowledge, this is first study to show that ILs can stabilize and maintain the TEV protease cleavage activity.. |
| 74. | I. Tamošiūnė, D. Gelvonauskienė, L. Ragauskaitė, K. Koga, M. Shiratani, D. Baniulis, Cold plasma treatment of Arabidopsis thaliana (L.) seeds modulates plant-associated microbiome composition, Applied Physics Express, 10.35848/1882-0786/ab9712, 13, 076001, 2020.05, [URL]. |
| 75. | M.K. Son, H. Seo, M. Watanabe, M. Shiratani, T. Ishihara, Characteristics of crystalline sputtered LaFeO3 thin films as photoelectrochemical water splitting photocathodes, Nanoscale, 10.1039/d0nr01762k, 12, 17, 9653-9660, 2020.05, [URL]. |
| 76. | Min Kyu Son, Hyunwoong Seo, Motonori Watanabe, Masaharu Shiratani, Tatsumi Ishihara, Characteristics of crystalline sputtered LaFeO3 thin films as photoelectrochemical water splitting photocathodes, Nanoscale, 10.1039/d0nr01762k, 12, 17, 9653-9660, 2020.05, [URL], Stable photoelectrochemical (PEC) operation is a critical issue for the commercialization of PEC water-splitting systems. Unfortunately, most semiconductor photocathodes generating hydrogen in these systems are unstable in aqueous solutions. This is a huge limitation for the development of durable PEC water-splitting systems. Lanthanum iron oxide (LaFeO3) is a promising p-type semiconductor to overcome this drawback because of its stability in an aqueous solution and its proper energy level for reducing water. In this study, we fabricated a crystalline LaFeO3 thin film by radio frequency magnetron sputtering deposition and a post-annealing process in air for use as a PEC photocathode. Based on the morphological, compositional, optical and electronic characterizations, we found that it was ideal for a visible light-responsive PEC photocathode and tandem PEC water-splitting system with a small band gap absorber behind it. Furthermore, it showed stable PEC performance in a strong alkaline solution during PEC operation without any protection layers. Therefore, the crystalline sputtered LaFeO3 thin film suggested in this study would be feasible to apply as a PEC photocathode for durable, simple and low-cost PEC water splitting.. |
| 77. | Toshiyuki Kawasaki, Keisuke Nishida, Giichiro Uchida, Fumiaki Mitsugi, Kosuke Takenaka, Kazunori Koga, Yuichi Setsuhara, Masaharu Shiratani, Effects of surrounding gas on plasma-induced downward liquid flow, Japanese Journal of Applied Physics, 10.35848/1347-4065/ab71dc, 59, SH, 2020.05, [URL], Understanding the mechanisms behind plasma-induced liquid flow is important for the transport of reactive species in liquid. In this study, we studied the effects of the surrounding gas compositions of a plasma-jet on the plasma-induced downward liquid flow using particle image velocimetry. Nitrogen (N2) and oxygen (O2) mixtures in different mixing ratios were supplied as surrounding gas around a helium (He) plasma jet at a constant flow rate. The results clearly indicated that O2 in the surrounding gas plays a key role in enhancing the downward flow. Increasing the O2 concentration increased the downward flow in the depth direction. An emission spectroscopy analysis suggested that reactive species related to excited atomic O were considered to be important for inducing downward flows. The relationship between the downward flows and oxidation reactions on a liquid target were discussed to determine the reasons responsible for the driving forces.. |
| 78. | Laima Degutytė-Fomins, Giedre&dot Paužaitė, Žūkienė Rasa, Vida Mildažienė, Kazunori Koga, Masaharu Shiratani, Relationship between cold plasma treatment-induced changes in radish seed germination and phytohormone balance, Japanese journal of applied physics, 10.7567/1347-4065/ab656c, 59, 2020.05, [URL], This study aimed to estimate the dependence of the effects of radish (Raphanus sativus) seed irradiation with atmospheric cold plasma (CP) on physiological seed condition or dormancy status. Seeds were treated for different durations with a scalable dielectric barrier discharge (DBD) device. The relationship between the effect of CP on germination kinetics with changes in the content of phytohormones in seeds stored for different periods of time after harvesting (1, 5, and 7 months) was estimated. CP treatment efficiently stimulated germination only in freshly harvested (not after-ripened seeds), and these changes correlated with a decrease in abscisic acid (ABA) and an increase in gibberellin (GA) content. CP treatment induced a fast decrease in ABA content and ABA/GA ratio in after-ripened seeds (5 months after harvesting) but did not stimulate germination. Primary evidence of direct ABA modification by the reactive compounds from the gaseous phase of CP was obtained.. |
| 79. | P. Attri, J. Razzokov, M. Yusupov, K. Koga, M. Shiratani, A. Bogaerts, Influence of osmolytes and ionic liquids on the Bacteriorhodopsin structure in the absence and presence of oxidative stress: A combined experimental and computational study, International Journal of Biological Macromolecules, 10.1016/j.ijbiomac.2020.01.179, 148, 657-665, 2020.04, [URL]. |
| 80. | Pankaj Attri, Jamoliddin Razzokov, Maksudbek Yusupov, Kazunori Koga, Masaharu Shiratani, Annemie Bogaerts, Influence of osmolytes and ionic liquids on the Bacteriorhodopsin structure in the absence and presence of oxidative stress A combined experimental and computational study, International Journal of Biological Macromolecules, 10.1016/j.ijbiomac.2020.01.179, 148, 657-665, 2020.04, [URL], Understanding the folding and stability of membrane proteins is of great importance in protein science. Recently, osmolytes and ionic liquids (ILs) are increasingly being used as drug delivery systems in the biopharmaceutical industry. However, the stability of membrane proteins in the presence of osmolytes and ILs is not yet fully understood. Besides, the effect of oxidative stress on membrane proteins with osmolytes or ILs has not been investigated. Therefore, we studied the influence of osmolytes and ILs as co-solvents on the stability of a model membrane protein (i.e., Bacteriorhodopsin in purple membrane of Halobacterium salinarum), using UV–Vis spectroscopy and molecular dynamics (MD) simulations. The MD simulations allowed us to determine the flexibility and solvent accessible surface area (SASA) of Bacteriorhodopsin protein in the presence and/or absence of co-solvents, as well as to carry out principal component analysis (PCA) to identify the most important movements in this protein. In addition, by means of UV–Vis spectroscopy we studied the effect of oxidative stress generated by cold atmospheric plasma on the stability of Bacteriorhodopsin in the presence and/or absence of co-solvents. This study is important for a better understanding of the stability of proteins in the presence of oxidative stress.. |
| 81. | N. Itagaki, Y. Nakamura, R. Narishige, K. Takeda, K. Kamataki, K. Koga, M. Hori, M. Shiratani, Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition, Sci. Rep., 10.1038/s41598-020-61596-w, 10, 4669, 2020.03, [URL]. |
| 82. | K. Koga, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene, Impact of radish sprouts seeds coat color on the electron paramagnetic resonance signals after plasma treatment, Jpn. J. Appl. Phys. , 10.35848/1347-4065/ab7698, 59, SH, SHHF01, 2020.03, [URL]. |
| 83. | T. Kawasaki, K. Nishida, G. Uchida, F. Mitsugi, K. Takenaka, K. Koga, Y. Setsuhara, M. Shiratani, Effects of surrounding gas on plasma-induced downward liquid flow, Jpn. J. Appl. Phys. , 10.35848/1347-4065/ab71dc, 59, SH, SHHF02, 2020.03, [URL]. |
| 84. | L. D. Fomins, G. Pauzaite, R. Zukiene, V. Mildaziene, K. Koga, M. Shiratani, Relationship between cold plasma treatment-induced changes in radish seed germination and phytohormone balance, Jpn. J. Appl. Phys. , 10.7567/1347-4065/ab656c, 59, SH1001, 2020.02, [URL]. |
| 85. | I. Suhariadi, N. Itagaki, M. Shiratani, Improved Nanoscale Al-doped ZnO with a ZnO Buffer Layer Fabricated by Nitrogen-mediated Crystallization for Flexible Optoelectronic Devices, ACS Appl. Nano Mater., 10.1021/acsanm.9b02571, 3, 2480-2490, 2020.02, [URL]. |
| 86. | Y. Kim, K. Koga, M. Shiratani, Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition, Curr. Appl. Phys., 10.1016/j.cap.2019.11.001, 20, 1, 191-195, 2020.01, [URL]. |
| 87. | Y. Kim, K. Koga, M. Shiratani, Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition, Curr. Appl. Phys., 10.1016/j.cap.2019.11.001, 20, 1, 191-195, 2020.01, [URL]. |
| 88. | Yeonwon Kim, Kazunori Koga, Masaharu Shiratani, Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition, Current Applied Physics, 10.1016/j.cap.2019.11.001, 20, 1, 191-195, 2020.01, [URL], We investigated the effect of hydrogen dilution on the Si cluster volume fraction of hydrogenated amorphous films by varying the hydrogen dilution ratio at 0.5 Torr and compared it to that obtained at pure silane discharge at 0.3, 0.4, and 0.5 Torr. The correlation between the plasma emission characteristic, deposition rate, and cluster volume fraction in the hydrogen dilution plasma was described. The cluster volume fractions of films under hydrogen dilution conditions were similar to those of the pure silane but showed a higher deposition rate. The results suggest that under hydrogen dilution conditions, it is possible to maintain a higher deposition rate with a lower cluster incorporation rate.. |
| 89. | Iping Suhariadi, Naho Itagaki, Masaharu Shiratani, Improved Nanoscale Al-Doped ZnO with a ZnO Buffer Layer Fabricated by Nitrogen-Mediated Crystallization for Flexible Optoelectronic Devices, ACS Applied Nano Materials, 10.1021/acsanm.9b02571, 2020.01, [URL], To achieve excellent semiconductor device performance, especially for low-temperature processing of semiconductors, the need to devise strategies to engineer the surface and interface and to develop characterization techniques to understand the cause-effect relationship of surface and interface of semiconductor devices remains to be a key issue. Here, we present a nucleation control method, termed nitrogen-mediated crystallization (NMC), to engineer the surface morphology of a ZnO buffer layer and analyze first- and second-degree statistical surfaces to reveal the morphological relationship between the buffer layer and the buffered AZO film. The surface parameter is generally understood as the surface roughness (roughness average or RMS roughness) or the surface height profile, and our experimental results suggest that the physical properties of the buffered AZO films are strongly influenced by the fractal geometry of the buffer layers and are insensitive to their surface roughness. We demonstrate that the NMC method promotes enhanced surface migration and effectively prevents the development of nonuniform fractal geometry in the ZnO buffer layer, enabling the stress relaxation in the buffered AZO films and mitigating the three-dimensional columnar growth. At a low thermally induced kinetic energy, a 90 nm thick AZO film with an ultralow resistivity of 4.4 × 10-4 ω·cm can be achieved, indicating its potential for the realization of high-efficiency flexible optoelectronic devices.. |
| 90. | Rasa Zukiene, Zita Nauciene, Irena Januskaitiene, Giedre Pauzaite, Vida Mildaziene, Kazunori Koga, Masaharu Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Applied Physics Express, 10.7567/1882-0786/ab5491, 12, 12, 2019.12, [URL], The aim of this study was to estimate the effects of treatment with atmospheric cold plasma (CP) on sunflower (Helianthus annuus) seeds on germination kinetics, content of seed phytohormones, early seedling growth, and photosynthetic activity. Seeds were treated with a scalable dielectric barrier discharge device for different durations. Differences in CP-induced changes in the seed phytohormone content in cases of positive or negative effects on germination and/or seedling growth were detected. The eustress response was related to the increased ratio between gibberellin (GA) and abscisic acid (ABA) contents, and the distress response was related to decreased GA/ABA and increased salicylic acid content.. |
| 91. | R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Appl. Phys. Express, 10.7567/1882-0786/ab5491, 12, 12, 126003, 2019.11, [URL]. |
| 92. | R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Appl. Phys. Express, 10.7567/1882-0786/ab5491, 12, 12, 126003, 2019.11, [URL]. |
| 93. | K. Tanaka, H. Hara, S. Nagaishi, L. Shi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD, Plasma Fusion Res., 10.1585/pfr.14.4406141, 14, 4406141, 2019.09, [URL]. |
| 94. | L. Shi, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films, Plasma Fusion Res., 10.1585/pfr.14.4406144, 14, 4406144, 2019.09, [URL]. |
| 95. | S. H. Hwang, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition, Plasma Fusion Res., 10.1585/pfr.14.4406115, 14, 4406115, 2019.09, [URL]. |
| 96. | R. Zhou, K. Kamataki, H. Ohtomo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma, Plasma Fusion Res., 10.1585/pfr.14.4406120, 14, 4406120, 2019.09, [URL]. |
| 97. | S. Nakano, M. Shiratani, Impact of heterointerface properties of crystalline germanium heterojunction solar cells, Thin Solid Films, 10.1016/j.tsf.2019.06.028, 685, 225-233, 2019.09, [URL]. |
| 98. | Shinya Nakano, Masaharu Shiratani, Impact of heterointerface properties of crystalline germanium heterojunction solar cells, Thin Solid Films, 10.1016/j.tsf.2019.06.028, 685, 225-233, 2019.09, [URL], We have previously reported that phosphine (PH3) surface treatment of a p-type crystalline germanium (c-Ge) substrate improves the c-Ge heterojunction solar cell performance. In this study, the effects of the heterointerface properties of the c-Ge heterojunction solar cell were investigated. We found that the deposition temperature of the heterojunction layer and O2 surface treatment before the PH3 surface treatment influence the interface phase structure and band structure. Consequently, a conversion efficiency of 7.61% with a high open-circuit voltage of 0.270 V was obtained.. |
| 99. | T. Kawasaki, F. Mitsugi, K. Koga, M. Shiratani, Local supply of reactive oxygen species into a tissue model by atmospheric-pressure plasma-jet exposure, J. Appl. Phys., 10.1063/1.5091740, 125, 21, 213303, 2019.06, [URL]. |
| 100. | N. Miyahara, S. Urakawa, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate, MRS Adv., 10.1557/adv.2019.17, 4, 27, 1551-1556, 1551-1556, 2019.01, [URL]. |
| 101. | S. Muraoka, L. Jiahao, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Effects of nitrogen impurity on zno crystal growth on Si substrates, MRS Adv., 10.1557/adv.2019.28, 4, 27, 1557-1563, 1557-1563, 2019.01, [URL]. |
| 102. | N. Miyahara, K. Iwasaki, D. Yamashita, D. Nakamura, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Photoluminescence of (ZnO)0.82 (InN)0.18 films: Incident light angle dependence, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2099, 941, 2099-2103, 2018.12, [URL]. |
| 103. | N. Itagaki, K. Takeuchi, N. Miyahara, K. Imoto, H. Seo, K. Koga, M. Shiratani, Effects of sputtering pressure on (ZnO)x(InN)1-x crystal film growth at 450ºC, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2093, 941, 2093-2098, 2018.12, [URL]. |
| 104. | R. Zhou, K. Mori, H. Ohtomo, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cross-correlation analysis of fluctuations of interactions between nanoparticles and low pressure reactive plasmas, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2104, 941, 2104-2108, 2018.12, [URL]. |
| 105. | P. Attri, F. Tochikubo, J. H. Park, E. H. Choi, K. Koga, M. Shiratani, Impact of Gamma rays and DBD plasma treatments on wastewater treatment, Scientific reports, 10.1038/s41598-018-21001-z, 8, 1, 2018.12, [URL], The rapid growth in world population brings with it the need for improvement in the current technology for water purification, in order to provide adequate potable water to everyone. Although an advanced oxidation process has been used to purify wastewater, its action mechanism is still not clear. Therefore, in the present study we treat dye-polluted water with gamma rays and dielectric barrier discharge (DBD) plasma. We study the wastewater treatment efficiency of gamma rays and DBD plasma at different absorbed doses, and at different time intervals, respectively. Methyl orange and methylene blue dyes are taken as model dyes. To understand the effects of environment and humidity on the decolorization of these dyes, we use various gas mixtures in the DBD plasma reactor. In the plasma reactor, we use the ambient air and ambient air + other gas (oxygen, nitrogen, and argon) mixtures, respectively, for the treatment of dyes. Additionally, we study the humidity effect on the decolorization of dyes with air plasma. Moreover, we also perform plasma simulation in different environment conditions, to understand which major radicals are generated during the plasma treatments, and determine their probable densities.. |
| 106. | Y. Kim, K. Koga, M. Shiratani, Particle behavior and its contribution to film growth in a remote silane plasma, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 10.1116/1.5037539, 36, 5, 2018.09, [URL]. |
| 107. | T. Fang, K. Yamaki, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka,Y. Setsuhara, The effect of the H2/(H2+Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition, Thin Solid Films, 10.1016/j.tsf.2018.02.035, 660, 891-898, 2018.08, [URL]. |
| 108. | Hee Je Kim, Jin Ho Bae, Hyunwoong Seo, Masaharu Shiratani, Chandu Venkata Veera Muralee Gopi, ZnS/SiO2 passivation layer for high-performance of TiO2/CuInS2 quantum dot sensitized solar cells, Energies, 10.3390/en11081931, 11, 8, 2018.08, [URL], Suppressing the charge recombination at the interface of photoanode/electrolyte is the crucial way to improve the quantum dot sensitized solar cells (QDSSCs) performance. In this scenario, ZnS/SiO2 blocking layer was deposited on TiO2/CuInS2 QDs to inhibit the charge recombination at photoanode/electrolyte interface. As a result, the TiO2/CuInS2/ZnS/SiO2 based QDSSCs delivers a power conversion efficiency (η) value of 4.63%, which is much higher than the TiO2/CuInS2 (2.15%) and TiO2/CuInS2/ZnS (3.23%) based QDSSCs. Impedance spectroscopy and open circuit voltage decay analyses indicate that ZnS/SiO2 passivation layer on TiO2/CuInS2 suppress the charge recombination at the interface of photoanode/electrolyte and enhance the electron lifetime.. |
| 109. | T. Kojima, S. Toko, K. Tanaka, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition, Plasma Fusion Res., 10.1585/pfr.13.1406082, 13, 1406082, 2018.06, [URL]. |
| 110. | S. Toko, R. Katayama, K. Koga, E. Leal-Quiros, M. Shiratani , Dependence of CO2 Conversion to CH4 on CO2 Flow Rate in Helicon Discharge Plasma, Sci. Adv. Mater., 10.1166/sam.2018.3141, 10, 5, 655-659, 2018.05, [URL]. |
| 111. | Iping Suhariadi, Masaharu Shiratani, Naho Itagaki, Morphology Evolution of ZnO Thin Films Deposited by Nitrogen Mediated Crystallization Method, 2nd International Joint Conference on Advanced Engineering and Technology, IJCAET 2017 and International Symposium on Advanced Mechanical and Power Engineering, ISAMPE 2017 MATEC Web of Conferences, 10.1051/matecconf/201815902031, 159, 2018.03, [URL], We study the surface morphology of ZnO thin films deposited by nitrogen mediated crystallization method utilizing atomic force microscopy as a function of nitrogen flow rates. Initially, the surface morphology of ZnO thin film deposited without nitrogen exhibits a bumpy surface with spiky grains where the skewness and kurtosis values were found to be 0.48 and 4.80, respectively. By addition of small amount of nitrogen, the skewness and kurtosis values of the films significantly decrease associated with a flatter topography. Further increase in nitrogen flow rate to 16 sccm has roughened the surface shown mainly by the increase in kurtosis value to be 3.30. These results indicate that the addition of small amount of nitrogen during deposition process has enhanced the adatoms migration on the surface resulting in a superior film with a larger grain size. Two-dimensional power spectral density analysis reveals that all the films have self-affine fractal geometry with total fractal values in the range of 2.14 to above 3.00.. |
| 112. | M. Gherardi, N. Puač, M. Shiratani, Special issue: Plasma and agriculture, Plasma Processes & Polymers, 10.1002/ppap.201877002, 15, 2, 1877002, 2018.02, [URL]. |
| 113. | N. Puač, M. Gherardi, M. Shiratani, Plasma agriculture: A rapidly emerging field, Plasma Processes & Polymers, 10.1002/ppap.201700174, 15, 2, 1700174, 2018.02, [URL]. |
| 114. | M. Ito, Jun-Seok Oh, T. Ohta, M. Shiratani, M. Hori, Current Status and Future Prospect of Agricultural Applications using Atmospheric-Pressure Plasma Technologies, Plasma Processes & Polymers, 10.1002/ppap.201700073, 15, 2, 1700073, 2018.02, [URL]. |
| 115. | H. Seo, D. Sakamoto, H. Chou, N. Itagaki, K. Koga, M. Shiratani , Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction, Progress in Photovoltaics: Research and Applications, 10.1002/pip.2961, 26, 2, 145-150, 2018.02, [URL]. |
| 116. | Takashi Kojima, Susumu Toko, Kazuma Tanaka, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition, Plasma and Fusion Research, 10.1585/PFR.13.1406082, 13, 2018.01, [URL], To deposit stable a-Si:H films at a high deposition rate (DR), we have studied time evolution of DR and amount of cluster incorporation (R) into films as a parameter of gas velocity, in the downstream region of a multi-hollow discharge plasma chemical vapor deposition reactor; because a-Si:H films containing less cluster incorporation show high stability. For a low gas velocity of 0.18m/s, clusters are trapped between the multihollow electrode and the substrate and the trapped clusters absorb clusters and such absorption suppresses the cluster incorporation into films. By utilizing this phenomenon, we have realized a quite low R = 1.3 at a high DR = 0.06 nm/s.. |
| 117. | Masao Ichinose, Masaharu Shiratani, Masaru Hori, Future outlooks in plasma medical science, Plasma Medical Science, 10.1016/B978-0-12-815004-7.00008-1, 419-423, 2018.01, [URL], Plasma medical research started late in Japan, but over the past 5 years has made truly remarkable progress, creating a flow of new research that leads the world. A foundation is steadily being built for the investigation of plasma’s effects on the body’s homeostatic mechanisms and therapeutic interventions in pathological conditions. As a result, we have reached the level of vigorous and detailed analyses of the effects of plasma on a diverse array of important life phenomena, including cell membrane transport, intracellular signaling systems, autophagy, apoptosis, and cell proliferation and differentiation. The results of these studies strongly suggest the possibility that plasma science will contribute not only to the resolution of major research questions in life science but also make unique contributions to the resolution of problems confronting modern clinical medicine, including wound healing, regenerative medicine, and cancer control. Among the series of findings that have been obtained in translational studies of plasma science and technology, one particularly worth noting is the concrete achievement of a practical plasma hemostasis device that allows less-invasive treatment. With a view toward medical applications, solid progress has also been made in investigations to improve the selectivity of plasma actions and control its biological effects, as well as investigations aimed at ensuring the safety of plasma medicine. From this series of research findings, one strongly feels not only the possibilities of plasma as a new option on the front lines of clinical medicine in the future, but also its development as a spectacular field of medical science that holds the potential to bring about far-reaching innovations.. |
| 118. | 徐鉉雄, 板垣奈穂, 古閑一憲, 白谷正治, 色素増感太陽電池のポリマー対向電極における触媒反応の活性化, 信学技報 (IEICE Technical Report), 117, 334, 27-29, 2017.12. |
| 119. | 武田秀俊, 土肥俊郎, 金聖祐, 會田英雄, 白谷正治, プラズマ融合CMPによる大型ダイヤモンド基板の高効率加工とその加工メカニズム, 信学技報 (IEICE Technical Report), 117, 334, 1-6, 2017.12. |
| 120. | T. Kawasaki, G. Kuroeda, R. Sei, M. Yamaguchi, R. Yoshinaga, R. Yamashita, H. Tasaki, K. Koga, M. Shiratani, Transportation of reactive oxygen species in a tissue phantom after plasma irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.57.01AG01, 57, 1S, 01AG01, 2017.11, [URL]. |
| 121. | S. Tanami, D. Ichida, S. Hashimoto, H. Seo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition, Thin Solid Films , 10.1016/j.tsf.2017.02.067 , 641, 59-64, 2017.11, [URL]. |
| 122. | Sota Tanami, Daiki Ichida, Shinji Hashimoto, Hyunwoong Seo, Daisuke Yamashita, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition, Thin Solid Films, 10.1016/j.tsf.2017.02.067, 641, 59-64, 2017.11, [URL], We report low temperature (100–170 °C) and rapid (10 min) formation of crystalline Ge films between Au catalyst film and quartz glass substrate using a radio frequency magnetron sputtering deposition. The formation rate of crystalline Ge films between Au catalyst film and quartz glass substrate is proportional to the deposition rate of Ge film, namely the flux of Ge atoms. To obtain insights on the formation mechanism of crystalline Ge films, we studied dependence of grain size of Au films on annealing temperature and Au film thickness. Crystalline Ge films formed below Au films have random crystalline orientation with in-plane grain size from below 1 μm. Small crystalline grain size of Au films is needed to form rapidly Au induced crystalline Ge films.. |
| 123. | S. Toko, K. Keya, Y. Torigoe, T. Kojima, H. Seo, N. Itagaki, K. Koga, M. Shiratani , Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.01.034, 326, Part B, 388-394, 2017.10, [URL]. |
| 124. | J. G. Han, L. Martinu, M. Shiratani, Preface - Surface Engineering at the International Vacuum Congress-20, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.08.029, 326, Part B, 367, 2017.10. |
| 125. | P. Attri, M. Kim, E. H. Choi, A. E. Cho, K. Koga, M. Shiratani, Impact of an ionic liquid on protein thermodynamics in the presence of cold atmospheric plasma and gamma rays, Phys. Chem. Chem. Phys., 10.1039/c7cp04083k, 19, 37, 25277-25288, 2017.10, [URL]. |
| 126. | H. Seo, C. V.V.M. Gopi, H.-J. Kim, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst, Electrochimica Acta, 10.1016/j.electacta.2017.08.030, 249, 337-342, 2017.09, [URL]. |
| 127. | P. Attri, M. Kim, T. Sarinont, E. H. Choi, H. Seo, A. E. Cho, K. Koga, M. Shiratani, The protective action of osmolytes on the deleterious effects of gamma rays and atmospheric pressure plasma on protein conformational changes, Scientific Reports, 10.1038/s41598-017-08643-1, 7, 8698, 2017.08, [URL]. |
| 128. | Y. Takeiri, T. Morisaki, M. Osakabe, M. Yokoyama, S. Sakakibara, H. Takahashi, Y. Nakamura, T. Oishi, G. Motojima, S. Murakami, K. Ito, A. Ejiri, S. Imagawa, S. Inagaki, M. Isobe, S. Kubo, S. Masamune, T. Mito, I. Murakami, K. Nagaoka, K. Nagasaki, K. Nishimura, M. Sakamoto, R. Sakamoto, T. Shimozuma, K. Shinohara, H. Sugama, K. Y. Watanabe, J. W. Ahn, N. Akata, T. Akiyama, N. Ashikawa, J. Baldzuhn, T. Bando, E. Bernard, F. Castejón, H. Chikaraishi, M. Emoto, T. Evans, N. Ezumi, K. Fujii, H. Funaba, M. Goto, T. Goto, D. Gradic, Y. Gunsu, S. Hamaguchi, H. Hasegawa, Y. Hayashi, C. Hidalgo, T. Higashiguchi, Y. Hirooka, Y. Hishinuma, R. Horiuchi, K. Ichiguchi, K. Ida, T. Ido, H. Igami, K. Ikeda, S. Ishiguro, R. Ishizaki, A. Ishizawa, A. Ito, Y. Ito, A. Iwamoto, S. Kamio, K. Kamiya, O. Kaneko, R. Kanno, H. Kasahara, D. Kato, T. Kato, K. Kawahata, G. Kawamura, M. Kisaki, S. Kitajima, W. H. Ko, M. Kobayashi, S. Kobayashi, T. Kobayashi, K. Koga, A. Kohyama, R. Kumazawa, J. H. Lee, D. López-Bruna, R. Makino, S. Masuzaki, Y. Matsumoto, H. Matsuura, O. Mitarai, H. Miura, J. Miyazawa, N. Mizuguchi, C. Moon, S. Morita, T. Moritaka, K. Mukai, T. Muroga, S. Muto, T. Mutoh, T. Nagasaka, Y. Nagayama, N. Nakajima, Y. Nakamura, H. Nakanishi, H. Nakano, M. Nakata, Y. Narushima, D. Nishijima, A. Nishimura, S. Nishimura, T. Nishitani, M. Nishiura, Y. Nobuta, H. Noto, M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, M. Ohno, N. Ohno, H. Ohtani, M. Okamoto, Y. Oya, T. Ozaki, B. J. Peterson, M. Preynas, S. Sagara, K. Saito, H. Sakaue, A. Sanpei, S. Satake, M. Sato, T. Saze, O. Schmitz, R. Seki, T. Seki, I. Sharov, A. Shimizu, M. Shiratani, M. Shoji, C. Skinner, R. Soga, T. Stange, C. Suzuki, Y. Suzuki, S. Takada, K. Takahata, A. Takayama, S. Takayama, Y. Takemura, Y. Takeuchi, H. Tamura, N. Tamura, H. Tanaka, K. Tanaka, M. Tanaka, T. Tanaka, Y. Tanaka, S. Toda, Y. Todo, K. Toi, M. Toida, M. Tokitani, T. Tokuzawa, H. Tsuchiya, T. Tsujimura, K. Tsumori, S. Usami, J. L. Velasco, H. Wang, T. H. Watanabe, T. Watanabe, J. Yagi, M. Yajima, H. Yamada, I. Yamada, O. Yamagishi, N. Yamaguchi, Y. Yamamoto, N. Yanagi, R. Yasuhara, E. Yatsuka, N. Yoshida, M. Yoshinuma, S. Yoshimura, Y. Yoshimura, Extension of the operational regime of the LHD towards a deuterium experiment, Nuclear Fusion, 10.1088/1741-4326/aa7fc2, 57, 10, 2017.08, [URL], As the finalization of a hydrogen experiment towards the deuterium phase, the exploration of the best performance of hydrogen plasma was intensively performed in the large helical device. High ion and electron temperatures, T i and T e, of more than 6 keV were simultaneously achieved by superimposing high-power electron cyclotron resonance heating onneutral beam injection (NBI) heated plasma. Although flattening of the ion temperature profile in the core region was observed during the discharges, one could avoid degradation by increasing the electron density. Another key parameter to present plasma performance is an averaged beta value . The high regime around 4% was extended to an order of magnitude lower than the earlier collisional regime. Impurity behaviour in hydrogen discharges with NBI heating was also classified with a wide range of edge plasma parameters. The existence of a no impurity accumulation regime, where the high performance plasma is maintained with high power heating >10 MW, was identified. Wide parameter scan experiments suggest that the toroidal rotation and the turbulence are the candidates for expelling impurities from the core region.. |
| 129. | K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body , ECS Transactions, 10.1149/07703.0017ecst, 77, 3, 17-24, 2017.05, [URL]. |
| 130. | 古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用, 信学技報 (IEICE Technical Report), 117, 8, 5-8, 2017.04. |
| 131. | 山崎直樹, 土肥俊郎, 曾田英雄, 金聖祐, 大山幸希, 黒河周平, 佐野泰久, 白谷正治, 山西陽子, GaN基板のプラズマ融合CMP技術 : エタノールバブリング・Arプラズマを用いたプラズマ融合CMP特性とその評価, 信学技報 (IEICE Technical Report), 117, 7, 19-23, 2017.04. |
| 132. | H.-J. Kim, G.-C. Xu, C. V.V.M. Gopi, H. Seo, M. Venkata-Haritha, M. Shiratani, Enhanced light harvesting and charge recombination control with TiO2/PbCdS/CdS based quantum dot-sensitized solar cells, Journal of Electroanalytical Chemistry, 10.1016/j.jelechem.2017.02.005, 788, 131-136, 2017.03, [URL]. |
| 133. | K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Densities and surface reaction probabilities of oxygen and nitrogen atoms during sputter deposition of ZnInON on ZnO, IEEE Trans. Plasma Science, 10.1109/TPS.2016.2632124, 45, 2, 323-327, 2017.02, [URL]. |
| 134. | T. Sarinont, R. Katayama, Y. Wada, K. Koga, M. Shiratani, Plant Growth Enhancement of Seeds Immersed in Plasma Activated Water, MRS Adv., 10.1557/adv.2017.178, 2, 18, 995-1000, 2017.02, [URL]. |
| 135. | T. Sarinont, Y. Wada, K. Koga, M. Shiratani, Response of Silkworm Larvae to Atmospheric Pressure Non-thermal Plasma Irradiation, Plasma Medicine, 10.1615/PlasmaMed.2017019137 , 6, 3-4, 2017.01, [URL]. |
| 136. | L. P. Lingamdinne, Y. Chang, J.-K. Yang, J. Singh, E. H. Choi, M. Shiratani, J. R. Koduru, P. Attri, Biogenic reductive preparation of magnetic inverse spinel iron oxide nanoparticles for the adsorption removal of heavy metals, Chemical Engineering Journal, 10.1016/j.cej.2016.08.067, 307, 74-84, 2017.01, [URL]. |
| 137. | 山崎直樹, 土肥俊郎, 曾田英雄, 金聖祐, 大山幸希, 白谷正治, 山西陽子, 難加工材料のプラズマ融合CMPプロセスの開発, 精密工学会学術講演会講演論文集, 2017S, 537-538, 2017.01. |
| 138. | Akira Yonesu, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi, Influence of plasma irradiation on silkworm, Plasma Medicine, 7, 4, 313-320, 2017.01, Silkworms have recently been proposed as an animal model for safety testing in basic research. We propose using silkworms for in vivo trials of direct plasma treatment. In this study, the influence of plasma irradiation on silkworms was investigated using a non-thermal atmospheric pressure plasma. Silkworm survival rate decreased with increasing low-frequency voltage and plasma irradiation period. Further investigation of the plasma-generated agents (oxygen related radicals, UV light, and charged particles), revealed that the contribution of charged particles significantly increases silkworm mortality.. |
| 139. | K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki , Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization, MRS Adv., 10.1557/adv.2016.617, 2, 5, 265-270, 2016.12, [URL]. |
| 140. | K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Blue Photoluminescence of (ZnO)0.92(InN)0.08, MRS Adv., 10.1557/adv.2016.625, 2, 5, 277-282, 2016.12, [URL]. |
| 141. | G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara, Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water, J. Appl. Phys., 10.1063/1.4968568, 120, 20, 203302-1 - 203302-9, 2016.11, [URL]. |
| 142. | M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga , Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication, Materials Science Forum, 10.4028/www.scientific.net/MSF.879.1772, 879, 1772-1777 , 2016.11, [URL]. |
| 143. | Masahiro Soejima, Kazunori Koga, Masaharu Shiratani, Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas, 16th IEEE International Conference on Nanotechnology - IEEE NANO 2016 16th International Conference on Nanotechnology - IEEE NANO 2016, 10.1109/NANO.2016.7751376, 671-673, 2016.11, [URL], We have analyzed inter-particle potential during binary collision of two fine particles suspended at the plasma/sheath boundary. For this analysis, we have employed a tracking analysis which gives time evolution of the particle position automatically from the movie of particle behavior. The fluctuation of inter-particle potential is originated from a major component of the plasma potential fluctuation and minor one of the particle charge fluctuation. The tracking analysis of fine particles is a promising method to provide fluctuation of plasma potential with ultrahigh sensitivity at a local position.. |
| 144. | Koichi Matsushima, Masaharu Shiratani, Naho Itagaki, Relationship between electric properties and surface flatness of (ZnO)x(InN)1-x films on ZnO templates, 16th IEEE International Conference on Nanotechnology - IEEE NANO 2016 16th International Conference on Nanotechnology - IEEE NANO 2016, 10.1109/NANO.2016.7751421, 674-675, 2016.11, [URL], We have studied effects of deposition temperature on electrical properties of (ZnO)x(InN)1-x (ZION) films on ZnO templates. With increasing the deposition temperature from RT to 450°C, the electron mobility decreases from 93 cm2/Vs to 70 cm2/Vs and the carrier density increases from 1.8×1019 cm-3 to 3.4×1019 cm-3. Furthermore, we found a correlation between electrical properties and root mean square (RMS) roughness of the films. These results suggest the surface flatness is an important parameter to determine electrical properties of ZION films.. |
| 145. | J. H. Park, M. Kim, M. Shiratani, Art. E. Cho, E. Choi & P. Attri, Variation in structure of proteins by adjusting reactive oxygen and nitrogen species generated from dielectric barrier discharge jet, Scientific Reports, 10.1038/srep35883, 6, 35883, 2016.10, [URL]. |
| 146. | P. Attri, M. Yusupov, J. H. Park, L. P. Lingamdinne, J. R. Koduru, M. Shiratani, E. Choi & A. Bogaerts, Mechanism and comparison of needle-type non-thermal direct and indirect atmospheric pressure plasma jets on the degradation of dyes, Scientific Reports, 10.1038/srep34419, 6, 34419, 2016.10, [URL]. |
| 147. | S. Toko, Y. Kanemitsu, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.13233, 16, 10, 10753-10757, 2016.10, [URL]. |
| 148. | T. Sarinont, T. Amano, P. Attri, K. Koga, N. Hayashi, M. Shiratani, Effects of plasma irradiation using various feeding gases on growth of Raphanus sativus L. , Arch. Biochem. Biophys., 10.1016/j.abb.2016.03.024 , 605, 129-140, 2016.09, [URL]. |
| 149. | H. Seo, M. K. Son, S. Hashimoto, T. Takasaki, N. Itagaki, K. Koga, M. Shiratani, Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells, Electrochimica Acta, 10.1016/j.electacta.2016.06.020, 210, 880-887, 2016.08, [URL]. |
| 150. | H. Seo, S. H. Nam, N. Itagaki, K. Koga, M. Shiratani, and J.-H. Boo, Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells, Electron. Mater. Lett., 10.1007/s13391-016-4018-8, 12, 4, 530-536, 2016.07, [URL]. |
| 151. | K. Keya, T. Kojima, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.07LE03, 55, 7S2, 07LE03, 2016.07, [URL]. |
| 152. | B. B. Sahu, Y. Yin, J. G. Han, M. Shiratani , Low temperature synthesis of silicon quantum dots with plasma chemistry control in dual frequency non-thermal plasmas, Phys. Chem. Chem. Phys., 10.1039/c6cp01856d, 18, 23, 2016.06, [URL]. |
| 153. | C. V. V. M. Gopi, M. V. Haritha, H. Seo, S. Singh, S.-K. Kim, M. Shiratani, H. Kim, Improving the performance of quantum dot sensitized solar cells through CdNiS quantum dots with reduced recombination and enhanced electron life time, Dalton Trans., 10.1039/C6DT00283H , 45, 20, 8447-8457, 2016.05, [URL]. |
| 154. | H. Seo, D. Ichida, S. Hashimoto, N. Itagaki, K. Koga, M. Shiratani, S. H. Nam and J. H. Boo , Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12210, 16, 5, 4875-4879, 2016.05, [URL]. |
| 155. | T. Kawasaki, S. Kusumegi, A. Kudo, T. Sakanoshita, T. Tsurumaru, A. Sato, G. Uchida, K. Koga and M. Shiratani, Effects of irradiation distance on supply of reactive oxygen species to the bottom of a Petri dish filled with liquid by an atmospheric O2/He plasma jet, J. Appl. Phys., 10.1063/1.4948430, 119, 173301, 2016.05, [URL]. |
| 156. | D. Punnoose, CH. S. S. P. Kumar, A. E. Reddy, S. S. Rao, C. V. Tulasivarma, S.-K. Kim, H. Seo, M. Shiratani, S.-H. Chung, H. Kim , Reduced recombination with an optimized barrier layer on TiO2 in PbS/CdS core shell quantum dot sensitized solar cells, New J. Chem., 10.1039/C5NJ02947C, 4, 40, 3423-3431, 2016.04, [URL]. |
| 157. | H. Seo, M. Shiratani, K. Seneekatima, R. Pornprasertsuk , Catalytic Improvement on Counter Electrode of Dye-Sensitized Solar Cells Using Electrospun Pt Nano-Fibers, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12294, 16, 4, 3332-3337, 2016.04, [URL]. |
| 158. | 白谷正治, プラズマ加工の現状と将来動向 (特集 プラズマ(加工)とその応用技術の現状と将来動向), 光技術コンタクト = Optical and electro-optical engineering contact, 54, 4, 3-8, 2016.04. |
| 159. | M. Shiratani, T. Sarinont, K. Koga and N. Hayashi, R&D status of agricultural applications of high voltage and plasma in Japan, Proc. Workshop on Application of Advanced Plasma Technologies in CE Agriculture, 29-30, 2016.04. |
| 160. | H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani , Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition, Sci. Adv. Mater., 10.1166/sam.2016.2520, 8, 3, 636-639, 2016.03, [URL]. |
| 161. | H. Seo, M.-K. Son, N. Itagaki, K. Koga, M. Shiratani, Polymer Counter Electrode of Poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) Containing TiO2 Nano-particles for Dye-sensitized Solar Cells, Journal of Power Sources, 10.1016/j.jpowsour.2015.12.112, 307, 25-30, 2016.03, [URL]. |
| 162. | K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering, MRS Advances, 10.1557/adv.2015.59, 1, 2, 115-119, 2016.01, [URL]. |
| 163. | S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Effects of Gas Flow Rate on Deposition Rate and Amount of Si Clusters Incorporated into a-Si:H Films, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA19, 55, 1S, 01AA19, 2016.01, [URL]. |
| 164. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA11, 55, 1S, 01AA11, 2016.01, [URL]. |
| 165. | T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Production of In, Au, and Pt nanoparticles by discharge plasmas in water for assessment of their bio-compatibility and toxicity, MRS Adv., 10.1557/adv.2016.41, 1, 18, 1301-1306, 2016.01, [URL]. |
| 166. | M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga, Plant Growth Response to Atmospheric Air Plasma Treatments of Seeds of 5 Plant Species, MRS Adv., 10.1557/adv.2016.37, 1, 18, 1265-1269, 2016.01, [URL]. |
| 167. | K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, N. Hayashi, M. Shiratani, Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.), Appl. Phys. Express, 10.7567/APEX.9.016201, 9, 1, 016201, 2015.12, [URL]. |
| 168. | 白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価, 九州大学超顕微解析研究センター報告, 39, 116-117, 2015.12. |
| 169. | P. Attri, T. Sarinont, M. Kim, T. Amano, K. Koga, A. E. Cho, E. Choi, M. Shiratani, Influence of ionic liquid and ionic salt on protein against the reactive species generated using dielectric barrier discharge plasma , Scientific Reports, 10.1038/srep17781, 5, 17781 , 2015.12, [URL]. |
| 170. | G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the discharge characteristics of a plasma jet impinging onto the liquid surface, IEEE Trans. Plasma Science, 10.1109/TPS.2015.2488619, 43, 12, 4081-4087, 2015.12, [URL]. |
| 171. | T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Synthesis of Indium-Containing Nanoparticles in Aqueous Suspension Using Plasmas in Water for Evaluating Their Kinetics in Living Body, J. Nanosci. Nanotechnol., 10.1166/jnn.2015.11427, 15, 11, 9298-9302, 2015.11, [URL]. |
| 172. | T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka, Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.158, 2015.10, [URL]. |
| 173. | S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.149, 2015.10, [URL]. |
| 174. | H. Seo, S. Hashimoto, D. Ichida, N. Itagaki, K. Koga and M. Shiratani , Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode, Electrochimica Acta, 10.1016/j.electacta.2015.04.105, 179, 206-210, 2015.10, [URL]. |
| 175. | K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.143, 2015.10, [URL]. |
| 176. | K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.132, 2015.10, [URL]. |
| 177. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.145, 2015.10, [URL]. |
| 178. | T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.150, 2015.10, [URL]. |
| 179. | K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.154, 2015.10, [URL]. |
| 180. | T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.155, 2015.10, [URL]. |
| 181. | D. Yamashita, M. Soejima, T. Ito, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Laser trapped single fine particle as a probe of plasma parameters, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.104, 2015.10, [URL]. |
| 182. | S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.133, 2015.10, [URL]. |
| 183. | Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of electrode structure on characteristics of multi-hollow discharges, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.129, 2015.10, [URL]. |
| 184. | T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani, Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.136, 2015.10, [URL]. |
| 185. | R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group, Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.101, 2015.10, [URL]. |
| 186. | T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki, Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.49, 2015.10, [URL]. |
| 187. | S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.152, 2015.10, [URL]. |
| 188. | M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani, Attraction during binary collision of fine particles in Ar plasma, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.18, 2015.10, [URL]. |
| 189. | G. Uchida, A. Nakajima, T. Kawasaki, K. Koga, K. Takenaka, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, TF1.2, 2015.10, [URL]. |
| 190. | Y. Setsuhara, G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Discharge characteristics and hydrodynamics behaviors of atmospheric plasma jets produced in various gas flow patterns, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.58, 2015.10, [URL]. |
| 191. | M. Tateishi, K. Koga, R. Katayama, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experiment Group, Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances, J. Nucl. Mater. , 10.1016/j.jnucmat.2014.10.049, 463, 865–868, 2015.08, [URL]. |
| 192. | K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of ZnInON/ZnO multi-quantum well solar cells, Thin Solid Films, 10.1016/j.tsf.2015.01.012, 587, 106-111, 2015.07, [URL]. |
| 193. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.40.123, 40, 2, 123-128, 2015.07, [URL]. |
| 194. | S. Toko, Y. Torigoe, W. Chen, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability, Thin Solid Films, 10.1016/j.tsf.2015.02.052 , 587, 126-131, 2015.07, [URL]. |
| 195. | A. Nakajima, G. Uchida, T. Kawasaki, K. Koga, T. Sarinont, T. Amano, K. Takenaka, M. Shiratani, Y. Setsuhara, Effects of gas flow on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation, J. Appl. Phys., 10.1063/1.4927217, 118, 4, 043301, 2015.07, [URL]. |
| 196. | N. Hayashi, R. Ono, M. Shiratani, A. Yonesu, Antioxidative activity and growth regulation of Brassicaceae induced by oxygen radical irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.06GD01, 54, 6S2, 06GD01, 2015.06, [URL]. |
| 197. | K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.248, 1741, aa09-10, 2015.03, [URL]. |
| 198. | N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, ZnO-based semiconductors with tunable band gap for solar sell applications, Proc. SPIE photonics west 2015, 10.1117/12.2078114, 9364, 93640P, 2015.03, [URL]. |
| 199. | T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.87, 1741, aa09-12, 2015.02, [URL]. |
| 200. | A. Tanaka, M. Hirata, N. Matsumura, K. Koga, M. Shiratani, Y. Kiyohara, Comparative Study on the Pulmonary Toxicity of Indium Hydroxide, Indium-Tin Oxide, and Indium Oxide Following Intratracheal Instillations into the Lungs of Rats, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.21, 1723, g02-03, 2015.02, [URL]. |
| 201. | T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Air Plasma Irradiation to Seeds of Radish Sprouts on Chlorophyll and Carotenoids Concentrations in their Leaves, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.39, 1723, g02-04, 2015.02, [URL]. |
| 202. | T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Multigeneration Effects of Plasma Irradiation to Seeds of Arabidopsis Thaliana and Zinnia on Their Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.12, 1723, g03-04, 2015.01, [URL]. |
| 203. | H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.01AD02, 54, 1S, 01AD02, 2015.01, [URL]. |
| 204. | 内田儀一郎, 市田大樹, 徐鉉雄, 古閑一憲, 白谷正治, 反応性微粒子プラズマプロセスを用いたゲルマニウム結晶ナノ粒子含有膜の堆積と量子ドット太陽電池への応用, スマートプロセス学会誌, 4, 1, 6-11, 2015.01. |
| 205. | N. Itagaki, K. Matsushima, D. Yamashia, H. Seo, K. Koga, M. Shiratani, Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap, Mater. Res. Express, 10.1088/2053-1591/1/3/036405, 1, 3, 036405, 2014.09, [URL]. |
| 206. | H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.39.321, 39, 3, 321-324, 2014.09, [URL]. |
| 207. | I. Suhariadi, M. Shiratani, N. Itagaki, Growth mechanism of ZnO deposited by nitrogen mediated crystallization, Mater. Res. Express, 10.1088/2053-1591/1/3/036403, 1, 3, 036403, 2014.09, [URL]. |
| 208. | N. Itagaki, K. Kuwahara, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method, Opt. Engineering, 10.1117/1.OE.53.8.087109, 53, 8, 087109, 2014.08, [URL]. |
| 209. | S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Dust Hour Glass in a Capacitive RF Discharge , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2343975 , 42, 10, 2672-2673, 2014.08, [URL]. |
| 210. | M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara, SiC Nanoparticle Composite Anode for Li-Ion Batteries, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2014.742, 1678, n08-58, 2014.07, [URL]. |
| 211. | S. Kitazaki, T. Sarinont, K. Koga, N. Hayashi, M. Shiratani, Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas, Curr. Appl. Phys., 10.1016/j.cap.2013.11.056, 14, 2, S149–S153, 2014.07, [URL]. |
| 212. | T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani, Plasma etching of single fine particle trapped in Ar plasma by optical tweezers, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012014, 518, 1, 012014, 2014.06, [URL]. |
| 213. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori, Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012010, 518, 1, 012010, 2014.06, [URL]. |
| 214. | Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012007, 518, 1, 012007, 2014.06, [URL]. |
| 215. | D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012002, 518, 1, 012002, 2014.06, [URL]. |
| 216. | S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012008, 518, 1, 012008, 2014.06, [URL]. |
| 217. | M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group, Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012009, 518, 1, 012009, 2014.06, [URL]. |
| 218. | T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, T. Shimizu, G. Uchida, K. Koga, M. Shiratani, Visualization of the Distribution of Oxidizing Substances in an Atmospheric Pressure Plasma Jet , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2325038, 42, 10, 2482-2483, 2014.06, [URL]. |
| 219. | P. Chewchinda, K. Hayashi, D. Ichida, H. Seo, G. Uchida, M. Shiratani, O. Odawara and H. Wada, Preparation of Si nanoparticles by laser ablation in liquid and their application as photovoltaic material in quantum dot sensitized solar cell, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012023, 518, 1, 012023, 2014.06, [URL]. |
| 220. | T. Sarinont, T. Amano, S. Kitazaki, K. Koga, G. Uchida, M. Shiratani and N. Hayashi, Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012017, 518, 1, 012017, 2014.06, [URL]. |
| 221. | K. Koga, X. Dong, S. Iwashita, U. Czarnetzki and M. Shiratani, Formation of carbon nanoparticle using Ar+CH4 high pressure nanosecond discharges, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012020, 518, 1, 012020, 2014.06, [URL]. |
| 222. | I. Yoshida, T. Matsui, H. Sai, T. Suezaki, H. Katayama, M. Matsumoto, S. Sugiyama, T. Masuda, M. Ushijima, S. Nonomura, M. Shiratani, M. Konagai, K. Saito, M. Kondo, M. Tanaka, S. Niki, Development and Progress in Thin Film Si Photovoltaic Technologies by Photovoltaic Power Generation Technology Research Association, Proc. 40th IEEE PVSC, 10.1109/PVSC.2014.6925520 , 2832 - 2835 , 2014.06, [URL]. |
| 223. | T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Control of the area irradiated by the sheet-type plasma jet in atmospheric pressure, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012016, 518, 1, 012016, 2014.06, [URL]. |
| 224. | 板垣奈穂、古閑一憲、白谷正治, スパッタリング成膜法による高品質酸化亜鉛薄膜の形成, 応用物理, 83, 5, 385-389, 2014.05. |
| 225. | H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance dependence of Si quantum dot-sensitized solar cells on counter electrode, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FZ01, 53, 5S1, 05FZ01, 2014.05, [URL]. |
| 226. | M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, and K. Kamataki, Nanostructure Control of Si and Ge Quantum Dots Based Solar Cells Using Plasma Processes, Materials Science Forum, 10.4028/www.scientific.net/MSF.783-786.2022, 783-786, 2022-2027, 2014.05, [URL]. |
| 227. | N. Hayashi, Y, Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of the surfaces of agricultural products using active oxygen species generated by atmospheric plasma and UV light, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FR03 , 53, 5S1, 05FR03 , 2014.05, [URL]. |
| 228. | I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, and N. Itagaki, Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015064, 1, 015064, 2014.03, [URL]. |
| 229. | M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015020, 1, 015020, 2014.03, [URL]. |
| 230. | N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization, Proc. SPIE photonics west 2014, 10.1117/12.2041081 , 8987, 89871A, 2014.03, [URL]. |
| 231. | H. Seo, M. Son, S. Park, M. Jeong, H. Kim, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell, Thin Solid Films, 10.1016/j.tsf.2013.08.103, 554, 122-126, 2014.03, [URL]. |
| 232. | G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015082, 1, 015082, 2014.03, [URL]. |
| 233. | S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, and M. Shiratani, Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015069, 1, 015069, 2014.03, [URL]. |
| 234. | X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori, Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015072, 1, 015072, 2014.03, [URL]. |
| 235. | M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga, Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015083, 1, 015083, 2014.03, [URL]. |
| 236. | G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015080, 1, 015080, 2014.03, [URL]. |
| 237. | H. Seo, M. Son, H. Kim, M. Shiratani, The enhancement of dye adsorption in dye-sensitized solar module by an electrical adsorption method, Thin Solid Films, 10.1016/j.tsf.2013.05.153, 554, 118-121, 2014.03, [URL]. |
| 238. | T. Sarinont, K. Koga, S. Kitazaki, G. Uchida, N. Hayashi, M. Shiratani, Effects of Atmospheric Air Plasma Irradiation on pH of Water, JPS Conf. Proc., 10.7566/JPSCP.1.015078, 1, 015078, 2014.03, [URL]. |
| 239. | Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P37, 2014.02. |
| 240. | A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida, Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S2-P35, 2014.02. |
| 241. | I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P05, 2014.02. |
| 242. | R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P03, 2014.02. |
| 243. | T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P19, 2014.02. |
| 244. | M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Spatial profile of flux of dust particles in hydrogen helicon plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P21, 2014.02. |
| 245. | D. Yamashita, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Raman spectroscopy of a fine particle optically trapped in plasma, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P23, 2014.02. |
| 246. | H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Quantum characterization and photovoltaic application of Si nano-particles fabricated by multi-hollow plasma discharge chemical vapor deposition, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S11-P36, 2014.02. |
| 247. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori, Pressure dependence of carbon film deposition using H-assisted plasma CVD, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P14, 2014.02. |
| 248. | T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-SPD-P01, 2014.02. |
| 249. | K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P07, 2014.02. |
| 250. | S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P17, 2014.02. |
| 251. | D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P33, 2014.02. |
| 252. | G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani, Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries, Proc. 8th Int. Conf. Reactive Plasmas, 4C-PM-O1, 2014.02. |
| 253. | K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P02, 2014.02. |
| 254. | T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S08-P10, 2014.02. |
| 255. | Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P36, 2014.02. |
| 256. | S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P32, 2014.02. |
| 257. | K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-14, 2014.02. |
| 258. | Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P35, 2014.02. |
| 259. | H. Seo, D. Ichida, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells, Int. J. Precision Eng. Manuf., 10.1007/s12541-014-0343-8, 15, 2, 339-343, 2014.02, [URL]. |
| 260. | Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S02-P10, 2014.02. |
| 261. | M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida, A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 4B-PM-O1, 2014.02. |
| 262. | T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Visualization of oxidizing substances generated by atmospheric pressure non-thermal plasma jet with water, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S09-P25, 2014.02. |
| 263. | N. Hayashi, Y. Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of agricultural products using active oxygen species generated by plasma and UV light (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A2, 2014.02. |
| 264. | K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A4, 2014.02. |
| 265. | T. Amano, T. Sarinont, S. Kitazaki, N. Hayashi, K. Koga, M. Shiratani, Long term growth of radish sprouts after atmospheric pressure DBD plasma irradiation to seeds, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P33, 2014.02. |
| 266. | S. Komatsu and M. Shiratani, Formation of microcones accompanied with ripple patterns in laser-activated plasma CVD of sp(3)-bonded BN films, J. Mater. Res., 10.1557/jmr.2014.7, 29, 4, 485-491, 2014.02, [URL]. |
| 267. | M. Shiratani, Fluctuation and Nanotechology, Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-15, 2014.02. |
| 268. | T. Sarinont, K. Koga, S. Kitazaki, M. Shiratani, N. Hayashi, Effects of growth enhancement by plasma irradiation to seeds in water, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P32, 2014.02. |
| 269. | M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, G. Uchida, H. Seo, and N. Itagaki, Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010201, 53, 1, 010201, 2014.01, [URL]. |
| 270. | S. Komatsu, M. Shiratani, Self-organized formation of hierarchically-ordered structures in laser-activated plasma CVD of sp(3)-bonded BN films , Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010202, 53, 1, 010202 , 2014.01, [URL]. |
| 271. | H. Seo, Y. Wang, M. Sato, G. Uchida, K. Koga, N. Itagaki, K. Kamataki, M. Shiratani, The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si, Thin Solid Films, 10.1016/j.tsf.2013.04.073, 546, 284-288, 2013.11, [URL]. |
| 272. | H. Seo, Y. Wang, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, S. Nam, J. Boo, Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO2, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM02, 52, 11S, 11NM02, 2013.11, [URL]. |
| 273. | K. Koga, M. Tateishi, K. Nishiyama, G. Uchida, K. Kamataki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, Akiko Sagara, the LHD Experimental Group, Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA08, 52, 11S, 11NA08, 2013.11, [URL]. |
| 274. | K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 eV to 3.3 eV on ZnO Templates, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM06, 52, 11S, 11NM06, 2013.11, [URL]. |
| 275. | I. Suhariadi, K. Oshikawa, K. Kuwahara, K. Matsushima, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NB03, 52, 11S, 11NB03, 2013.11, [URL]. |
| 276. | Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani, Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si and SiH, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA07, 52, 11S, 11NA07, 2013.11, [URL]. |
| 277. | G. Uchida, Y. Wang, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA05, 52, 11S, 11NA05, 2013.11, [URL]. |
| 278. | H. Seo, M. Son, H. Kim, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys., 10.7567/JJAP.52.10MB07, 52, 10S, 10MB07, 2013.10, [URL]. |
| 279. | G. Uchida, M. Sato, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells, Thin Solid Films, 10.1016/j.tsf.2013.04.111, 544, 93-98, 2013.10, [URL]. |
| 280. | 白谷正治, 古閑一憲, 内田儀一郎, Hyunwoong Seo, 板垣奈穂, 岩下伸也, ナノ材料のプラズマプロセシングの研究の現状と将来 , 表面科学, 34, 10, 520, 2013.10, [URL]. |
| 281. | O. Kaneko, H. Yamada, S. Inagaki, M. Jakubowski, S. Kajita, S. Kitajima, Kobayashi, K. Koga, T. Morisaki, S. Morita, T. Mutoh, S. Sakakibara, Y. Suzuki, H. Takahashi, K. Tanaka, K. Toi, Y. Yoshimura, T. Akiyama, Y. Asahi, N. Ashikawa, H. Chikaraishi, A. Cooper, D.S. Darrow, E. Drapiko, P. Drewelow, X. Du, A. Ejiri, M. Emoto, T. Evans N. Ezumi, K. Fujii, T. Fukuda, H. Funaba, M. Furukawa, D.A. Gates, M. Goto, T. Goto, W. Guttenfelder, S. Hamaguchi, M. Hasuo, T. Hino, Y. Hirooka, K. Ichiguchi, K. Ida, H. Idei, T. Ido, H. Igami, K. Ikeda, S. Imagawa, T. Imai, M. Isobe, M. Itagaki, T. Ito, K. Itoh, S. Itoh, A. Iwamoto, K. Kamiya, T. Kariya, H. Kasahara, N. Kasuya, D. Kato, T. Kato, K. Kawahata, F. Koike, S. Kubo, R. Kumazawa, D. Kuwahara, S. Lazerson, H. Lee, S. Masuzaki, S. Matsuoka, H. Matsuura, A. Matsuyama, C. Michael, D. Mikkelsen, O. Mitarai, T. Mito, J. Miyazawa, G. Motojima, K. Mukai, A. Murakami, I. Murakami, S. Murakami, T. Muroga, S. Muto, K. Nagaoka, K. Nagasaki, Y. Nagayama, N. Nakajima, H. Nakamura, Y. Nakamura, H. Nakanishi, H. Nakano, T. Nakano, K. Narihara, Y. Narushima, K. Nishimura, S. Nishimura, M. Nishiura, Y.M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, N. Ohno, N. Ohyabu, T. Oishi, M. Okamoto, A. Okamoto, M. Osakabe, Y. Oya1, T. Ozaki, N. Pablant, B.J. Peterson, A. Sagara, K. Saito, R. Sakamoto, H. Sakaue, M. Sasao2, K. Sato, M. Sato, K. Sawada, R. Seki, T. Seki, V. Sergeev, S. Sharapov, I. Sharov, A. Shimizu, T. Shimozuma, M. Shiratani, M. Shoji, S. Sudo, H. Sugama, C. Suzuki, K. Takahata, Y. Takeiri, Y. Takemura, M. Takeuchi9, H. Tamura, N. Tamura, H. Tanaka, T. Tanaka, M. Tingfeng, Y. Todo, M. Tokitani, K. Tokunaga, T. Tokuzawa, H. Tsuchiya, K. Tsumori, Y. Ueda, L. Vyacheslavov, K.Y. Watanabe, T. Watanabe, T.H. Watanabe, B. Wieland, I. Yamada, S. Yamada, S. Yamamoto, N. Yanagi, R. Yasuhara, M. Yokoyama, N. Yoshida, S. Yoshimura, T. Yoshinaga, M. Yoshinuma and A. Komori, Extension of operation regimes and investigation of three-dimensional currentless plasmas in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/53/10/104015, 53, 10, 104015, 2013.10, [URL]. |
| 282. | 白谷正治, 研究生産性の向上 , 表面科学, 34, 10, 519, 2013.10, [URL]. |
| 283. | Y. Kim, T. Matsunaga, K. Nakahara, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.04.029, 228, 1, S550–S553, 2013.08, [URL]. |
| 284. | T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Mass density control of carbon films deposited by H-assisted plasma CVD method, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.10.002, 228, 1, S15–S18, 2013.08, [URL]. |
| 285. | K. Koga, K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.154, 438, S727–S730, 2013.07, [URL]. |
| 286. | K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, and H. Kersten, Discharge power dependence of carbon dust flux in a divertor simulator, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.169, 438, S788–S791, 2013.07, [URL]. |
| 287. | Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Observation of nanoparticle growth process using a high speed camera, ISPC 21 Proceedings, 2013.07, [URL]. |
| 288. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Growth control of ZnO nano-rod with various seeds and photovoltaic application, J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012029, 441, 1, 012029, 2013.06, [URL]. |
| 289. | S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Transport control of dust particles via the Electrical Asymmetry Effect: experiment, simulation, and modeling, J. Phys. D: Appl. Phys., 46, 245202, 2013.06, [URL]. |
| 290. | K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori, Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine , J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012001, 441, 1, 012001, 2013.06, [URL]. |
| 291. | S. Bornholdt, N. Itagaki, K. Kuwahara, H. Wulff, M. Shiratani and H. Kersten, Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films , Plasma Sources Sci. Technol., 10.1088/0963-0252/22/2/025019, 22 , 2, 025019, 2013.04, [URL]. |
| 292. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells, Electrochimica Acta, 10.1016/j.electacta.2013.02.026, 95, 1, 43-47, 2013.04, [URL]. |
| 293. | N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 84-87, 2013.03, [URL]. |
| 294. | M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 100-103, 2013.03, [URL]. |
| 295. | K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Control of Deposition Profile and Properties of Plasma CVD Carbon Films, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 136-139, 2013.03, [URL]. |
| 296. | Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, Plasma interactions with aminoacid (L-alanine) as a basis of fundamental processes in plasma medicine, Current Applied Physics, 10.1016/j.cap.2013.01.030, 13, 1, S59–S63, 2013.03, [URL]. |
| 297. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell, Electrochimica Acta, 10.1016/j.electacta.2012.09.087, 87, 1, 213-217, 2013.01, [URL]. |
| 298. | H. Seo, Y. Wang, M. Sato, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD05, 52, 1S, 01AD05, 2013.01, [URL]. |
| 299. | Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, M. Shiratani, High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD01, 52, 1S, 01AD01, 2013.01, [URL]. |
| 300. | I. Suhariadi, K. Matsushima, K. Kuwahara, K. Oshikawa, D. Yamashita, H. Seo, G. Uchida, K. Kamtaki, K. Koga, M. Shiratani, S. Bornholdt, H. Kersten, Harm Wulff, N. Itagaki, Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AC08, 52, 1S, 01AC08, 2013.01, [URL]. |
| 301. | S. Iwashita, K. Nishiyama, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Dust particle formation due to interaction between graphite and helicon deuterium plasmas, Fusion Engineering and Design, 10.1016/j.fusengdes.2012.10.002, 88, 1, 28-32, 2013.01, [URL]. |
| 302. | T. Urakawa, R. Torigoe, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, K. Takeda, M. Sekine, M. Hori, H-2/N-2 plasma etching rate of carbon films deposited by H-assisted plasma CVD, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AB01, 52, 1, 01AB01(4pages), 2013.01, [URL]. |
| 303. | N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors (Invited), Proc. International Symposium on Dry Process, 34, 97-98, 2012.11. |
| 304. | Y. Kim, T. Matsunaga, K. Nakahara ,G. Uchida, K. Kamataki , N. Itagaki, H. Seo, K. Koga, M. Shiratani , Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD , Thin Solid Films, 10.1016/j.tsf.2012.06.023, 523, 29-33, 2012.11, [URL]. |
| 305. | K. Kamataki, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage, Thin Solid Films, 10.1016/j.tsf.2012.07.059, 523, 76-79, 2012.11, [URL]. |
| 306. | H. Seo, Min-Kyu Son, Songyi Park, Hee-Je Kim, M. Shiratani, The Blocking Effect of Charge Recombination by sputtered and acid-treated ZnO Thin Film in Dye-sensitized Solar Cells, J. Photochem. Photobiol., A : Chemistry, 10.1016/j.jphotochem.2012.08.016, 248, 50-54, 2012.11, [URL]. |
| 307. | T. Shirafuji, Y. Setsuhara, M. Shiratani, T. Kaneko, T. Watanabe, N. Ohtake, The 24th Symposium on Plasma Science for Materials (SPSM-24) Preface, Thin Solid Films, 10.1016/j.tsf.2012.10.002, 523, 1-1, 2012.11, [URL]. |
| 308. | K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation, Thin Solid Films, 10.1016/j.tsf.2012.05.061, 523, 15-19, 2012.11, [URL]. |
| 309. | S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Control of Dry Yeast Using Scalable Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.11PJ02, 51, 11, 11PJ02(5pages), 2012.11, [URL]. |
| 310. | H. Seo, M. K. Son, M. Shiratani, H. J. Kim, Improvement on the long-term stability of dye-sensitized solar module by structural alternation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.10NE21, 51, 10, 10NE21(4pages), 2012.10, [URL]. |
| 311. | K. Shibata, K. Suenaga, K. Watanabe, F. Horikiri, T. Mishima, M. Shiratani , Evaluation of Crystal Orientation for (K, Na)NbO3 Films Using X-ray Diffraction Reciprocal Space Map and Relationship between Crystal Orientation and Piezoelectric Coefficient, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.075502, 51, 7, 075502(6pages), 2012.07, [URL]. |
| 312. | I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani, ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.37.165, 37, 2, 165-168, 2012.06, [URL]. |
| 313. | A. Tanaka, M. Hirata, M. Shiratani, K. Koga, Y. Kiyohara, Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats, Journal of Occupational Health, 10.1539/joh.11-0164-OA, 54, 3, 187-195, 2012.06, [URL]. |
| 314. | S. Iwashita, G. Uchida, J. Schulze, E. Sch¨ungel, P. Hartmann, M. Shiratani, Zolt´an Donk´o and U. Czarnetzki, Sheath-to-sheath transport of dust particles in a capacitively coupled discharge, Plasma Sources Sci. Technol., 10.1088/0963-0252/21/3/032001, 21, 3, 032001(5pages), 2012.06, [URL]. |
| 315. | K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers, Thin Solid Films, 10.1016/j.tsf.2011.10.136, 520, 14, 4674-4677, 2012.05, [URL]. |
| 316. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.890, 1426, 313-318, 2012.04, [URL]. |
| 317. | Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.839, 1426, 307-311, 2012.04, [URL]. |
| 318. | K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki , In situ analysis of size dispersion of nano-particles in reactive plasma using two dimentional laser light scattering method, Journal of Instrumentation, 10.1088/1748-0221/7/04/C04017, 7, 4, C04017, 2012.04, [URL]. |
| 319. | M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.1245, 1426, 377-382, 2012.04, [URL]. |
| 320. | S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.966, 1469, ww02-08, 2012.04, [URL]. |
| 321. | Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga and M. Shiratani, Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.970, 1469, ww06-10, 2012.04, [URL]. |
| 322. | S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.969, 1469, ww06-08, 2012.04, [URL]. |
| 323. | G. Uchida, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD01, 51, 1, 01AD01, 2012.01, [URL]. |
| 324. | K. Koga, K. Nakahara, Y. Kim, T. Matsunaga, D.Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD03, 51, 1, 01AD03, 2012.01, [URL]. |
| 325. | K. Koga, T. Matsunaga, Y. Kim, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, and M. Shiratani, Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD02, 51, 1, 01AD02, 2012.01, [URL]. |
| 326. | S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Enhancement of Radish Sprouts Induced by Low Pressure O2 Radio Frequency Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AE01, 51, 1, 01AE01(4pages), 2012.01, [URL]. |
| 327. | S. Komatsu, M. Shiratani, Electron field emission from SP3-bonded bn microcones as a nonlinear cooperative phenomenon, Far East Journal of Dynamical Systems, 18, 1, 33-52, 2012.01, [URL]. |
| 328. | K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Irradiations with Ions and Photons in UV-VUV Regions on Nano-Surface of Polymers Exposed to Plasma, Jpn. J. Appl. Phys,, 10.1143/JJAP.51.01AJ02, 51, 1, 01AJ02(5pages), 2012.01, [URL]. |
| 329. | K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers, Proc. PVSEC-21, 4D-2P-11, 2011.11. |
| 330. | N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization, Proc. PVSEC-21, 4D-2P-10, 2011.11. |
| 331. | Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste, Proc. PVSEC-21, 3D-5P-09, 2011.11. |
| 332. | T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films, Proc. PVSEC-21, 4D-2P-16, 2011.11. |
| 333. | K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-20, 2011.11. |
| 334. | Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd, Proc. PVSEC-21, 3D-2P-09, 2011.11. |
| 335. | K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD, Proc. Plasma Conf. 2011, 24P014-O, 2011.11. |
| 336. | K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure, Proc. Plasma Conf. 2011, 23G03, 2011.11. |
| 337. | Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD, Proc. Plasma Conf. 2011, 24P011-O, 2011.11. |
| 338. | Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer, Proc. Intern. Symp. on Dry Process, 33, 133-134, 2011.11, [URL]. |
| 339. | N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering, Proc. Plasma Conf. 2011, 24G16, 2011.11. |
| 340. | T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition, Proc. Plasma Conf. 2011, 24P015-O, 2011.11. |
| 341. | M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD, Proc. Plasma Conf. 2011, 24G06, 2011.11. |
| 342. | K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H., G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films, Proc. Plasma Conf. 2011, 24P008-O, 2011.11. |
| 343. | Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD, Proc. Plasma Conf. 2011, 23P013-O, 2011.11. |
| 344. | K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method, Proc. Plasma Conf. 2011, 24P016-O, 2011.11. |
| 345. | K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free a-Si:H films using cluster eliminating filter, Proc. Plasma Conf. 2011, 24P010-O, 2011.11. |
| 346. | K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten, Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage, Proc. Plasma Conf. 2011, 24P094-O, 2011.11. |
| 347. | 趙研, 節原裕一, 竹中弘祐, 白谷正治, 関根誠, 堀勝, フレキシブルデバイス創製に向けたプラズマ—ソフトマテリアル相互作用の解析 , 高温学会誌 , 10.7791/jhts.37.289, 37, 6, 289-297 , 2011.11, [URL]. |
| 348. | H. Seo, Min-Kyu Son, M. Shiratani, Hee-Je Kim, The improvement on the long-term stability of dye-sensitized solar module by structural alternation, Proc. PVSEC-21, 3D-5P-03, 2011.11. |
| 349. | K. Hatozaki, K. Nakahara, G. Uchida, K. Koga, M. Shiratani, Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-18, 2011.11. |
| 350. | M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga, M. Shiratani, Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges, Proc. PVSEC-21, 3D-5P-12, 2011.11. |
| 351. | T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon, Proc. Intern. Symp. on Dry Process, 33, 123-124, 2011.11, [URL]. |
| 352. | K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of plasma interactions with organic semiconductors for fabrication of flexible electronics devices, Proc. Intern. Symp. on Dry Process, 33, 69-70 , 2011.11, [URL]. |
| 353. | N. Hayashi, Y. Akiyoshi, S. Kitazaki, K. Koga, M. Shiratani, Influence of active oxygen species produced by atmospheric torch plasma on plant growth, Proc. Intern. Symp. on Dry Process, 33, 135-136, 2011.11, [URL]. |
| 354. | G. Uchida, S. Iwashita, J. Schungel, M. Shiratani, U. Czarnetzki, Transport of dust particles in multi-frequency capacitively coupled radio frequency discharges, Proc. Plasma Conf. 2011, 25E01, 2011.11. |
| 355. | T. Mieno, K. Koga, M. Shiratani, Production Process of Carbon Nanotube Coagulates, Proc. Plasma Conf. 2011, 24F08, 2011.11. |
| 356. | S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation, Proc. Plasma Conf. 2011, 23P018-O, 2011.11. |
| 357. | T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor, Proc. Plasma Conf. 2011, 24P007-O, 2011.11. |
| 358. | M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga and M. Shiratani, Deposition of FeSi2 nano-particle film, Proc. Plasma Conf. 2011, 24P009-O, 2011.11. |
| 359. | G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD, Physica Status Solidi (c), 10.1002/pssc.201001230, 8, 10, 3017-3020, 2011.10, [URL]. |
| 360. | K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, M. Shiratani, Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasma, Appl. Phys. Express, 10.1143/APEX.4.105001, 4, 10, 105001, 2011.10, [URL]. |
| 361. | G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye, Physica Status Solidi (c), 10.1002/pssc.201100166, 8, 10, 3021-3024, 2011.10, [URL]. |
| 362. | K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method, Physica Status Solidi (c), 10.1002/pssc.201100229, 8, 10, 3013-3016, 2011.10, [URL]. |
| 363. | K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma , Proc. of International Conference on Phenomena in Ionized Gases（ICPIG） 2011 Conference, D13-318, 2011.09. |
| 364. | K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film, Thin Solid Films, 10.1016/j.tsf.2011.01.408, 519, 20, 6896-6898, 2011.08, [URL]. |
| 365. | N. Hayashi, A. Nakahigashi, M. Goto, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge, Jpn. J. Appl. Phys., 10.1143/JJAP.50.08JF04, 50, 8, 08JF04, 2011.08, [URL]. |
| 366. | Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Plasma processing of soft materials for development of flexible devices , Thin Solid Films, 10.1016/j.tsf.2011.04.091, 519, 20, 6721-6726, 2011.08, [URL]. |
| 367. | K. Cho, Y. Setsuhara, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers, Thin Solid Films, 10.1016/j.tsf.2011.04.060, 519, 20, 6810-6814, 2011.08, [URL]. |
| 368. | Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry （ISPC20）, POL08, 2011.07. |
| 369. | Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial analyses of plasma-polymer interactions, Surf. Coat. Technol., 10.1016/j.surfcoat.2011.04.083, 205, 2, S484-S489, 2011.07, [URL]. |
| 370. | T. Urakawa, T. Nomura, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry （ISPC20）, POL02, 2011.07. |
| 371. | M. Shiratani, K. Koga, S. Iwashita, G. Uchida, N. Itagaki, K. Kamataki, Nano-factories in plasma: present status and outlook, J. Phys. D: Appl. Phys., 10.1088/0022-3727/44/17/174038 , 44, 17, 174038, 2011.05, [URL]. |
| 372. | K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics, International Conference on Advances in Condensed and Nano Materials (ICACNM), 10.1063/1.3653600, 1393, 27-30, 2011.02, [URL]. |
| 373. | N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase, Appl. Phys. Express, 10.1143/APEX.4.011101, 4, 1, 011101-011101-3 , 2011.01, [URL]. |
| 374. | Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Low-damage plasma processing of polymers for development of organic-inorganic flexible devices, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.08.031, 205, 1, S355-S359, 2010.12, [URL]. |
| 375. | W. M. Nakamura, H. Matsuzaki, H. Sato, Y. Kawashima, K. Koga, M. Shiratani, High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.07.081, 205, 1, S241-S245 , 2010.12, [URL]. |
| 376. | 内田儀一郎, 古閑一憲, 白谷正治, マルチホロー放電プラズマＣＶＤによる量子ドット増感太陽電池用シリコンナノ結晶粒子の作製, ケミカルエンジニヤリング, 55, 12, 947-954, 2010.12, [URL]. |
| 377. | M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5685920, XII-XVI , 2010.11, [URL], プラズマナノテクノロジーで最重要課題となっている揺らぎの制御に関する現状と将来を展望した論文。. |
| 378. | G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686704, 2199-2201, 2010.11, [URL]. |
| 379. | K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686456, 1943-1947, 2010.11, [URL]. |
| 380. | T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686679 , 2219-2212, 2010.11, [URL]. |
| 381. | K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686686, 2216-2218, 2010.11, [URL]. |
| 382. | H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles, Proc. of International Symposium on Dry Process, 43-44, P1-A17, 2010.11. |
| 383. | G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges , Proc. of MNC2010, 12D-11-66 , 2010.11. |
| 384. | T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686688, 2213-2215, 2010.11, [URL]. |
| 385. | Y. Akiyoshi, A. Nakahigashi, N. Hayashi, S. Kitazaki, Takuro Iwao, K. Koga, M. Shiratani, Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686467, 1957-1959, 2010.11, [URL]. |
| 386. | Y. Kawashima, K. Yamamoto, M. Sato, T. Matsunaga, K. Nakahara, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686677, 2222-2224, 2010.11, [URL]. |
| 387. | S. Kitazaki, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Growth Stimulation of Radish Sprouts Using Discharge Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686474, 1960-1963, 2010.11, [URL]. |
| 388. | K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photo-Irradiations in VUV and UV Regions on Chemical Bonding States of Polymers during Plasma Exposure, Proc. of International Symposium on Dry Process, 61-62, P1-B5, 2010.11. |
| 389. | Y. Setsuhara, K. Takenaka, K. Cho, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Soft Material Processing, Proc. of International Symposium on Dry Process, 63-64, P1-B6, 2010.11. |
| 390. | G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00093, 2010.10. |
| 391. | K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00087, 2010.10. |
| 392. | T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00089, 2010.10. |
| 393. | H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group , Carbon dust particles generated due to H2 plasma-carbon wall interaction, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00114, 2010.10. |
| 394. | A. Nakahigashi, Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, KWP.00008, 2010.10. |
| 395. | T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Plasma parameter measurements of Ar+H2+C7H8 plasma in H-assisted plasma CVD reactor, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, DTP.00173, 2010.10. |
| 396. | Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Investigation of Plasma Interactions with Soft Materials via Combinatorial Plasma-Process Analyzer for Plasma Nano Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, TF2.00006, 2010.10. |
| 397. | K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photoemissions in UV and VUV Regions on Nano-Surface Strucures of Soft Materials during Plasma Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00115, 2010.10. |
| 398. | M. Shiratani, Academic Roadmap of Plasma Process Technologies, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, FT.00004, 2010.10. |
| 399. | Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials, Thin Solid Films, 10.1016/j.tsf.2010.01.057, 518, 22, 6492-6495, 2010.09, [URL]. |
| 400. | Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Quantum dot-sensitized solar cells using Si nanoparticles, Trans. Mateｒ. Res. Soc. Jpn., 35, 3, 597-599, 2010.09, [URL]. |
| 401. | K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch27, 219, 183-188, 2010.09, [URL]. |
| 402. | K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Development of a Combinatorial Plasma Process Analyzer for Advanced R&D of Next Generation Nanodevice Fabrications, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch40, 219, 279-284, 2010.09, [URL]. |
| 403. | Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzer, Thin Solid Films, 10.1016/j.tsf.2010.03.055, 518, 22, 6320-6324, 2010.09, [URL]. |
| 404. | 白谷正治, プラズマ・プロセス技術, 応用物理, 79, 8, 717-719, 2010.08, [URL]. |
| 405. | K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy, Japanese Journal of Applied Physics, 10.1143/JJAP.49.08JA02, 49, 8, 08JA02, 2010.08, [URL]. |
| 406. | Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5617205, 3347-3351, 2010.07, [URL]. |
| 407. | K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616514, 3722-3755, 2010.07, [URL]. |
| 408. | K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616502, 3718-3721, 2010.07, [URL]. |
| 409. | M. C. Sung, Keiko Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Etching characteristics of organic low-k films interpreted by internal parameters employing a combinatorial plasma process in an inductively coupled H2/N2 plasma, J. Appl. Phys. , 10.1063/1.3415535, 107, 11, 113310, 2010.06, [URL]. |
| 410. | C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Surface loss probabilities of H and N radicals on different materials in afterglow plasma employing H2 and N2 mixture gases, J. Appl. Phys. , 10.1063/1.3372750, 107, 10, 103310, 2010.05, [URL]. |
| 411. | Y. Setsuhara, C. Ken, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasma sustained via RF inductive coupling with low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.038, 518, 13, 3555-3560, 2010.04, [URL]. |
| 412. | Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasma driven by multiple low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.045, 518, 13, 3561-3565, 2010.04, [URL]. |
| 413. | A. Tanaka, M. Hirata, Y. Kiyohara, M. Nakano, K. Omae, M. Shiratani, K. Koga, Review of pulmonary toxicity of indium compounds to animals and humans, Thin Solid Films, 10.1016/j.tsf.2009.10.123, 518, 11, 2934-2936, 2010.03, [URL]. |
| 414. | C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, High performance of compact radical monitoring probe in H2/N2 mixture plasma, J. Vac. Sci. Technol., B, 10.1116/1.3327926 , 28, 2, 17-20, 2010.03, [URL]. |
| 415. | K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, X-Ray Photoelectron Spectroscopy Analysis of Plasma Interactions with Polymers for Development of Low-Damage and Low-Temperature Plasma Processes, Proc. of the 27th symposium on plasma processing, P2-33, 289-290, 2010.02. |
| 416. | Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD, Proc. of the 27th symposium on plasma processing, B5-05, 101-102, 2010.02. |
| 417. | S. Iwashita, H. Miyata, YasuY. Yamada, H. Matsuzaki, K. Koga, M. Shiratani, Observation of nano-particle transport in capacitively coupled radio frequency discharge plasma, Proc. of the 27th symposium on plasma processing, P1-13, 153-154, 2010.02. |
| 418. | H. Sato, Y. Kawashima, K. Nakahara, K. Koga, M. Shiratani, Measurement of electron density in multi-hollow discharges with magnetic field, Proc. of the 27th symposium on plasma processing, A6-01, 105-106, 2010.02. |
| 419. | H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD Experimental Group, In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasma and Inner Wall in LHD, Proc. of the 27th symposium on plasma processing, P1-14, 155-156, 2010.02. |
| 420. | T. Mieno, GuoDong Tan, S. Usuba, K. Koga, M. Shiratani, In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity), Proc. of the 27th symposium on plasma processing, P2-17, 257-258, 2010.02. |
| 421. | K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, Proc. of the 27th symposium on plasma processing, A5-06, 91-92, 2010.02. |
| 422. | T. Nomura, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor, Proc. of the 27th symposium on plasma processing, P1-39, 205-206, 2010.02. |
| 423. | Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Advanced Polymer Nano-Processing with Density-Inclination Plasma, Proc. of the 27th symposium on plasma processing, B5-01, 93-94, 2010.02. |
| 424. | M. Hori, C. S. Moon, M. Sekine, K. Takeda, Y. Setushara, M. Shiratani, A Low Pressure Combinatorial Plasma Process Employing an Integrated Monitoring, Proc. of the 27th symposium on plasma processing, T-02, 7-8, 2010.02. |
| 425. | K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1210-Q07-10 , 1210, Q07-10, 217-222, 2010.01, [URL]. |
| 426. | T. Nomura, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition Profile Control of Carbon Films on Patterned Substrates using a Hydrogen-assited Plasma CVD Method, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1222-DD05-16, 1222, DD05-16, 203-207 , 2010.01, [URL]. |
| 427. | Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Plasma surface treatment of polymers with inductivity-coupled RF plasma driven by low-inductance antenna units , Thin Solid Films, 10.1016/j.tsf.2009.07.161, 518, 3, 1006-1011 , 2009.12, [URL]. |
| 428. | Y. Setsuhara, K. Nagao, M. Shiratani, M. Sekine, M. Hori, Development of density-inclination plasma for analysis of plasma nano-processes via combinatorial method , Thin Solid Films, 10.1016/j.tsf.2009.07.162, 518, 3, 1020-1023, 2009.12, [URL]. |
| 429. | A. Komori, H. Yamada, S. Sakakibara, O. Kaneko, K. Kawahata, T. Mutoh, N. Ohyabu, S. Imagawa, K. Ida, Y. Nagayama, T. Shimozuma, K.Y. Watanabe, T. Mito, M. Kobayashi, K. Nagaoka, R. Sakamoto, N. Yoshida, S. Ohdachi, N. Ashikawa, Y. Feng, T. Fukuda, H. Igami, S. Inagaki, H. Kasahara, S. Kubo, R. Kumazawa, O. Mitarai, S. Murakami, Y. Nakamura, M. Nishiura, T. Hino, S. Muzaki, K. Tanaka, K. Toi, A. Weller, M. Yoshinuma, Y. Narushima, N. Ohno, T. Okamura, N. Tamura, K. Saito, T. Seki, S. Sudo, H. Tanaka, T. Tokuzawa, N. Yanagi, M. Yokoyama, Y. Yoshimura, T. Akiyama, H. Chikaraishi, M. Chowdhuri, M. Emoto, N. Ezumi, H. Funaba, L. Garcia, P. Goncharov, M. Goto, K. Ichiguchi, M. Ichimura, H. Idei, T. Ido, S. Iio, K. Ikeda, M. Irie, A. Isayama, T. Ishigooka, M. Isobe, T. Ito, K. Itoh, A. Iwamae, S. Hamaguchi, T. Hamajima, S. Kitajima, S. Kado, D. Kato, T. Kato, S. Kobayashi, K. Kondo, S. Mamune, Y. Matsumoto, N. Matsunami, T. Minami, C. Michael, H. Miura, J. Miyazawa, N. Mizuguchi, T. Morisaki, S. Morita, G. Motojima, I. Murakami, S. Muto, K. Nagasaki, N. Nakajima, Y. Nakamura, H. Nakanishi, H. Nakano, K. Narihara, A. Nishimura, H. Nishimura, K. Nishimura, S. Nishimura, N. Nishino, T. Notake1, T. Obana, K. Ogawa, Y. Oka, T. Ohishi, H. Okada, K. Okuno, K. Ono, M. Osakabe, T. Osako, T. Ozaki, B.J. P.son, H. Sakaue, M. Sasao, S. Satake, K. Sato, M. Sato, A. Shimizu, M. Shiratani, M. Shoji, H. Sugama, C. Suzuki, Y. Suzuki, K. Takahata, H. Takahashi, Y. Takase, Y. Takeiri, H. Takenaga, S. Toda, Y. Todo, M. Tokitani, H. Tsuchiya, K. Tsumori, H. Urano, E. Veshchev, F. Watanabe, T. Watanabe, T.H. Watanabe, I. Yamada, S. Yamada, O. Yamagishi, S. Yamaguchi, S. Yoshimura, T. Yoshinaga and O. Motojima, Development of net-current free heliotron plasma in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/49/10/104015, 49, 10, 104015, 2009.10, [URL]. |
| 430. | J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches, J. Plasma Fusion Res., 8, 1443-1446, 2009.09, [URL]. |
| 431. | W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, J. Umetsu, H. Miyahara, H. Matsuzaki, K. Koga, M. Shiratani, Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition, J. Plasma Fusion Res., 8, 736-739, 2009.09, [URL]. |
| 432. | H. Miyahara, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Detection of nano-particles formed in cvd plasma using a two-dimensional photon-counting laser-light-scattering method, J. Plasma Fusion Res., 8, 700-704, 2009.09, [URL]. |
| 433. | H. Sato, Y. Kawashima, M. Tanaka, K. Koga, W. M. Nakamura, M. Shiratani , Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method, J. Plasma Fusion Res., 8, 1435-1438, 2009.09, [URL]. |
| 434. | S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles, J. Plasma Fusion Res., 8, 582-586, 2009.09, [URL]. |
| 435. | C. S. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Combinatorial Plasma Etching Process, Applied Physics Express , 10.1143/APEX.2.096001, 2, 9, 096001(3pages), 2009.09, [URL]. |
| 436. | S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD experimental group, A comparison of dust particles produced due to interaction between graphite and plasma: LHD vs helicon discharges, J. Plasma Fusion Res., 8, 308-311, 2009.09, [URL]. |
| 437. | M. Shiratani, K. Koga, Toward plasma nano-factories, Proc. of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I), 86, 2009.09. |
| 438. | Y. Kawashima, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD, Proc. of 2009 International Symposium on Dry Process, 107, 2009.09. |
| 439. | T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD, Proc. of 2009 International Symposium on Dry Process, 101, 2009.09. |
| 440. | S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation, Proc. of 2009 International Symposium on Dry Process, 99, 2009.09. |
| 441. | H. Sato, Y. Kawashima, K. Koga, M. Shiratani, Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer, Proc. of 2009 International Symposium on Dry Process, 113, 2009.09. |
| 442. | K. Nakahara, Y. Kawashima, H. Sato, K. Koga, M. Shiratani, Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe, Proc. of 2009 International Symposium on Dry Process, 163, 2009.09. |
| 443. | H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, Dust Particles formed owing to interactions between H2 or D2 helicon plasma, graphite, Proc. of 2009 International Symposium on Dry Process, 33, 2009.09. |
| 444. | M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama, Plasma CVD of Nano-particle Composite Porous SiOCH Films, Proc. of 19th International Symposium on Plasma Chemistry, 2009.07, [URL]. |
| 445. | K. Koga, S. Iwashita, S. Kiridoshi, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Characterization of Dust Particles Ranging in Size from 1 nm to 10 m Collected in LHD, Plasma and Fusion Research, 10.1585/pfr.4.034 , 4, 034-034, 2009.04, [URL]. |
| 446. | S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode, Proc. of PSS2009/SPP26, 2009.02. |
| 447. | K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method, Proc. of PSS2009/SPP26, 2009.02. |
| 448. | Nakamura W. M., Sato H., Koga K., Shiratani M., Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells , Proc. of PSS2009/SPP26, 2009.02. |
| 449. | J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile of toluene plasma CVD carbon films in trenches, Proc. of PSS2009/SPP26, 2009.02. |
| 450. | K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, Proc. of PSS2009/SPP26, 2009.02. |
| 451. | S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, A. Sagara, K. Nisimura
, Characteristics of dust particles produced due to interaction between hydrogen plasma, graphite , Proc. of PSS2009/SPP26, 2009.02. |
| 452. | S. I. Krasheninnikov, R. D. Smirnov,Y. Tanaka,T. K. Soboleva, D. A. Mendis, D. L. Rudakov, W. P. West, C. H. Skinner, B. Lipschultz, R. S. Granetz, N. Ohno, S. Muzaki, M. Shiratani, R. Kumazawa, T. Nakano, R. Maqueda, A. Y. Pigarov, M. Rosenberg, D. J. Benson, T. D. Rognlien, B. D. Bray, J. H. Yu, A. L. Roquemore, J. L. Terry, A. Bader, C. S. Pitcher, S. Takamura, N. Ashikawa, M. Tokitani, N. Asakura, A. M. Litnovsky, Recent progress in understanding the behavior of dust in fusion devices, Plasma Physics and Controlled Fusion, 10.1088/0741-3335/50/12/124054, 50, 12, 124054, 2008.12, [URL]. |
| 453. | S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa, Proc. of 30th International Symposium on Dry Process, 115, 2008.12. |
| 454. | J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Deposition profile of plasma CVD carbon films in trenches, Proc. of 30th International Symposium on Dry Process, 35, 2008.12. |
| 455. | W. M. Nakamura, H. Miyahara, K. Koga, M. Shiratani, Two dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD, IEEE Trans. Plasma Science, 10.1109/TPS.2008.923830, 36, 4, 888-889, 2008.08, [URL]. |
| 456. | S. Iwashita, Michihito Morita, H. Matsuzaki, K. Koga, and M. Shiratani, Temperature dependence of dielectric constant of nano-particle composite porous low-k films fabricated by pulse rf discharges with amplitude modulation, Jpn. J. Appl. Phys., 10.1143/JJAP.47.6875, 47, 8, 6875-6878, 2008.08, [URL]. |
| 457. | S. Iwashita, K. Koga, M. Morita, M. Shiratani, Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062006, 100, 6, p. 062006, 2008.08, [URL]. |
| 458. | J. Umetsu, K. Koga, K. Inoue, M. Shiratani, Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062007, 100, 6, p. 062007, 2008.08, [URL]. |
| 459. | S. Nunomura, K. Koga, Y. Watanabe, M. Shiratani, M. Kondo, Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasma, Phys. Plasma, 10.1063/1.2972162, 15, 8, p. 080703, 2008.08, [URL]. |
| 460. | J. Umetsu, K. Koga, K. Inoue, H. Matzuzaki, K. Takenaka, M. Shiratani, Discharge power dependence of Ha intensity asn electron density of Ar+H2 discharges in H-assisted plasma CVD reactor, Surf. Coat. Technol., 10.1016/j.surfcoat.2008.06.108, 202, 22-23, 5659-5662, 2008.08, [URL]. |
| 461. | W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani, Cluster incorporation control for a-Si:H film deposition, J. Phys. : Conference Series, 10.1088/1742-6596/100/8/082018, 100, 8, p. 082018, 2008.08, [URL]. |
| 462. | M. Shiratani, W. M. Nakamura, H. Miyahara, K. Koga, Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films, Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08), 69, 2008.07. |
| 463. | M. Shiratani, S. Iwashita, K. Koga, S. Nunomura, Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage, Faraday Discussions, 10.1039/B704910B , 137, 127-138, 2008.01, [URL]. |
| 464. | K. Koga, W. M. Nakamura, and M. Shiratani, VHF discharge sustained in a small hole, Proc. 28th Intern. Conf. on Phenomena in Ionized Gases , 1987-1989, 2007.07. |
| 465. | K. Koga, S. Iwashita, M. Shiratani, Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage, J. Phys. D: Appl. Phys., 10.1088/0022-3727/40/8/S05, 40, 8, 2267-2271, 2007.04, [URL]. |
| 466. | M. Shiratani, K. Koga, S. Ando, T. Inoue, Y. Watanabe, S. Nunomura, M. Kondo, Single step process to deposit Si quantum dot films using H2+SiH4 VHF discharges and electron mobility in a Si quantum dot solar cell, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.012, 201, 9-11, 5468-5471, 2007.02, [URL]. |
| 467. | S. Iwashita, K. Koga, M. Shiratani, A device for trapping nano-particles formed in processing plasma for reduction of nano-waste, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.060, 201, 9-11, 5701-5704, 2007.02, [URL]. |
| 468. | S. Iwashita, K. Koga, M. Shiratani, Transport of nano-particles in pulsed AM RF discharges, Proc. the 24th Symp. on Plasma Processing, 103-104, 2007.01. |
| 469. | K. Koga, W. M. Nakamura, D. Shimokawa, M. Shiratani, Stability of a-Si:H deposited using multi-hollow plasma CVD, Proc. the 24th Symp. on Plasma Processing, 189-190, 2007.01. |
| 470. | M. Shiratani, S. Kiridoshi, K. Koga, S. Iwashita, N. Ashikawa, K. NIshimura, A. Sagara, A. Komori, LHD Experimental Group, In-situ sampling of dust generated in LHD and its analysis, Proc. the 24th Symp. on Plasma Processing, 371-372, 2007.01. |
| 471. | M. Shiratani, K. Koga, N. Kaguchi, K. Bando,and Y. Watanabe, Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.015, 506-507, 17-21, 2006.05, [URL]. |
| 472. | T. Kakeya, K. Koga, M. Shiratani, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-clusters using pulsed H2+SiH4 VHF discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.090, 506-507, 288-291, 2006.05, [URL]. |
| 473. | K. Koga, Y. Kitaura, M. Shiratani, Y. Watanabe, and A. Komori, Nano-particle formation due to interaction between H2 plasma and carbon wall, Thin Solid Films, 10.1016/j.tsf.2005.08.062, 506-507, 656-659, 2006.05, [URL]. |
| 474. | K. Takenaka, K. Koga, M. Shiratani, Y. Watanabe, and T. Shingen, Mechanism of Cu deposition from Cu(EDMDD)2 using H-assisted plasma CVD, Thin Solid Films, 10.1016/j.tsf.2005.08.028, 506-507, 197-201, 2006.05, [URL]. |
| 475. | S. Nunomura, M. Kita,, K. Koga, M. Shiratani, and Y. Watanabe, In situ simple method for measuring size and density of nanoparticles in reactive plasma, J. Appl. Phys., 10.1063/1.2189951 , 99, 8, 083302(7pages), 2006.04, [URL]. |
| 476. | S. Komatsu, D. Kazami, Norihoro Tanaka, Y. Moriyoshi, M. Shiratani, KatsuY. Okada, BN micro-fibers grown by plasma-assisted laser chemical vapor deposition without a metal catalyst, Appl. Phys. Express, 10.1063/1.2188381, 88, 151914(3pages), 2006.04, [URL]. |
| 477. | S. Nunomura, K. Koga, M. Shiratani, Y. Watanabe, Y. Morisada, N. Matsuki, and S. Ikeda, Fabrication of nanoparticle composite porous films having ultra-low dielectric constant, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1509, 44, 50, L1509-L1511, 2005.12, [URL]. |
| 478. | K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1430, 44, 48, L1430-L1432, 2005.11, [URL]. |
| 479. | K. Koga, N. Kaguchi, K. Bando, and M. Shiratani, Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma CVD, Rev. Sci. Instrum. , 10.1063/1.2126572, 76, 11, 113501(4pages), 2005.11, [URL]. |
| 480. | M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-particles using VHF discharges and their properties, Trans. Mateｒ. Res. Soc. Jpn., 30, 1, 307-310, 2005.03. |
| 481. | Y. Watanabe, M. Shiratani, and K. Koga, Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects, Trans. Mateｒ. Res. Soc. Jpn., 30, 1, 267-272, 2005.03. |
| 482. | K. Takenaka, M. Shiratani, M. Takeshita, M. Kita, K. Koga, and Y. Watanabe, Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition, Pure Appl. Chem. , 10.1351/pac200577020391, 77, 2, 391-398, 2005.01, [URL]. |
| 483. | S. Komatsu, A. Okudo, D. Kazami, D. Golberg, Y. Li, Y. Moriyoshi, M. Shiratani, K. Okada, Electron field emission from self-organized microemitters of sp3-bonded 5H boron nitride with very high current density at low electric field, J. Phys. Chem. B, 10.1021/jp0493475, 108, 17, 5182-5184, 2004.10, [URL]. |
| 484. | K. Koga, N. Kaguchi, M. Shiratani, and Y. Watanabe, Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H2 bonds in the films, J. Vac. Sci. Technol., A, 10.1116/1.1763905 , 22, 4, 1536-1539, 2004.07, [URL]. |
| 485. | K. Takenaka, M. Kita,, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition, J. Vac. Sci. Technol., A, 10.1116/1.1738663, 22, 4, 1903-1907, 2004.07, [URL]. |
| 486. | K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori, Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall, IEEE Trans. Plasma Science, 10.1109/TPS.2004.828129 , 32, 2, 405-409, 2004.02, [URL]. |
| 487. | S, Komatsu, K. Kurashima, Y.shimizu, Y. Moriyoshi, M. Shiratani, K. Okada, Condensation of sp 3-Bonded Boron Nitride through a Highly Nonequilibrium Fluid State, J. Phys. Chem. B, 10.1021/jp0364452, 108, 1, 205-211, 2004.01, [URL]. |
| 488. | M. Shiratani, K. Koga, A. Harikai, T. Ogata, and Y. Watanabe, Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges, MRS Symp. Proc., 10.1557/PROC-762-A9.5, 762, A9.5.1-9.5.6, 2003.04, [URL]. |
| 489. | K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches, MRS Symp. Proc., 10.1557/PROC-766-E3.8, 766, E3.8.1-3.8.6, 2003.04, [URL]. |
| 490. | 白谷正治, 古閑一憲, 尾形隆則, 掛谷知秀, 鹿口直斗, 渡辺征夫, シランプラズマ中のクラスタ成長と薄膜形成, 信学技報, 103, 6, 35-39, 2003.04, [URL]. |
| 491. | KS Kim, DJ Kim, JH Yoon, JY Park, Y Watanabe, M Shiratani, The changes of particle charge distribution during rapid growth of partilcles in the plasma reactor, J. Colloid Interface Sci., 10.1016/S0021-9797(02)00049-8, 257, 2, 195-207, 2003.02, [URL]. |
| 492. | K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe, Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition, Matr. Sci. Semiconductor Processing, 10.1016/S1369-8001(02)00108-7, 5, 2, 301-304, 2003.02, [URL]. |
| 493. | M. Shiratani, M. Kai, K. Koga, and Y. Watanabe, Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films, Thin Solid Films, 10.1016/S0040-6090(02)01171-9, 427, 1-2, 1-5, 2003.01, [URL]. |
| 494. | S. Komatsu, K. Kurashima, H. Kanada, K. Okada, M. Mitomo, Y. Moriyoshi, Y. Shimizu, M. Shiratani, T. Nakano, S. Samukawa, Highly crystalline 5H-polytype of sp3-bonded boron nitride prepared by plasma-packets-assisted pulsed-laser deposition: an ultraviolet light-emitter at 225nm, Appl. Phys. Lett., 10.1063/1.1527987, 81, 24, 4547-4549, 2002.12, [URL]. |
| 495. | 白谷正治, 古閑一憲, 渡辺征夫, ナノクラスタ制御プラズマCVDと高品質，光安定a-Si:H太陽電池への応用, アモルファスセミナーテキスト, 95-100, 2002.11. |
| 496. | M. Shiratani, K. Koga, Y. Watanabe, Formation of nano-particles in microgravity plasma, Journal of Japan Society of Microgravity Application, 19, 69, 2002.10, [URL]. |
| 497. | K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of copper by plasma CVD method, Proc. Intern. Symp. on Dry Process, 221-226, 2002.10. |
| 498. | Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited lecture paper), Plasma Sources Sci. Technol., 10.1088/0963-0252/11/3A/334, 11, A229-A233, 2002.08, [URL]. |
| 499. | 白谷正治, 反応性プラズマと材料プロセスの基礎, プラズマ・核融合学会サマースクールテキスト, 50-62, 2002.07. |
| 500. | M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films, Proc. ESCANPIG16/ICRP5 Joint Meeting, II323--II324, 2002.07. |
| 501. | K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2, Proc. ESCANPIG16/ICRP5 Joint Meeting, II173--II174, 2002.07. |
| 502. | K. Koga, R. Uehara, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasma and carbon wall, Proc. ESCANPIG16/ICRP5 Joint Meeting, I173--I174, 2002.07. |
| 503. | K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of Cu with H-assisted plasma CVD, Proc. ESCANPIG16/ICRP5 Joint Meeting, II199--II200, 2002.07. |
| 504. | K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 238-243, 2002.05. |
| 505. | K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 227-232, 2002.05. |
| 506. | Y. Watanabe, A. Harikai, K. Koga, M. Shiratani, Clustering phenomena in low-pressure reactive plasma: basis and applications (invited lecture paper), Pure Appl. Chem. , 10.1351/pac200274030483, 74, 3, 483-487, 2002.03, [URL]. |
| 507. | K. Koga, M. Kai, M. Shiratani, Y. Watanabe, N. Shikatani, Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films, Jpn. J. Appl. Phys., 10.1143/JJAP.41.L168, 41, 2B, L168-L170, 2002.02, [URL]. |
| 508. | K. Koga, M. Shiratani, Y. Watanabe, In-situ measurement of size and density of particles in sub-nm to nm size range, Proc. Nano-technology Workshop, 13-20, 2002.02. |
| 509. | M. Shiratani, K. Koga, Y. Watanabe, Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges, Proc. Nano-technology Workshop, 7-12, 2002.02. |
| 510. | 白谷正治, 古閑一憲, 渡辺征夫, プロセスプラズマ中のクラスタ - アモルファスシリコン太陽電池製造用プラズマ中のクラスター, Bulletin of Cluster Sci. Technol., 5, 13-18, 2002.01. |
| 511. | 白谷正治, CVDにおける今後の動向を考える, 応用物理, 71, 1, 106-107, 2002.01. |
| 512. | 渡辺征夫, 古閑一憲, 白谷正治, クラスタ制御プラズマCVD法によるSi薄膜の高品質化, シリコンテクノロジー, 37, 21-26, 2002.01. |
| 513. | K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2, Proc. Intern. Symp. on Dry Process, 169-174, 2001.11. |
| 514. | M. Shiratani, K. Koga, Y. Watanabe, Cluster-less plasma CVD reactor and its application to a-Si:H film deposition, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-664-A5.6, A5.6.1-A5.6.6, 2001.07, [URL]. |
| 515. | Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited), Proc. Intern. Conf. on Phenomena in Ionized Gases, 15-16, 2001.07. |
| 516. | M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, Development of H-assisted plasma CVD reactor for Cu interconnects, Proc. Intern. Conf. on Phenomena in Ionized Gases, 147-148, 2001.07. |
| 517. | K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, Proc. Intern. Conf. on Phenomena in Ionized Gases, 39-40, 2001.07. |
| 518. | Y. Watanabe, M. Shiratani, K. Koga, Clustering phenomena in low-pressure reactive plasma: base and applications (invited), Proc. Intern. Symp. on Plasma Chemistry, 726-730, 2001.07. |
| 519. | M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 153-154, 2001.07. |
| 520. | Y. Watanabe, M. Shiratani, T. Fukuzawa, H. Kawasaki, Y. Ueda, S. Singh, H. Ohkura, Contribution of short lifetime radicals to growth of particles in SiH4 HF discharges and effects of particles on deposited films, J. Vac. Sci. Technol., A, 10.1116/1.580069, 14, 3, 995-1001, 2001.05, [URL]. |
| 521. | M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration, Sci. Technol. Adv. Mater., 10.1016/S1468-6996(01)00131-0, 2, 3-4, 505-515, 2001.04, [URL]. |
| 522. | M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, In-situ polarization-sensitive laser-light scattering method for simultaneous measurements of two dimensional spatial size and density distributions of particles in plasma, J. Vac. Sci. Technol., A, 10.1116/1.580152, 14, 2, 603-607, 2001.03, [URL]. |
| 523. | Y. Watanabe, M. Shiratani, H. Kawasaki, S. Singh, T. Fukuzawa, Y. Ueda, H. Ohkura, Growth processes of particles in high frequency silane plasma, J. Vac. Sci. Technol., A, 10.1116/1.580141, 14, 2, 540-545, 2001.03, [URL]. |
| 524. | J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, J. Guillon, Surface reaction probabilities and kinetics of H, SiH3, Si2H5, CH3 and C2H5 during deposition of a-Si:H and a-C:H from H2, SiH4 and CH4 discharges, J. Vac. Sci. Technol., A, 10.1116/1.580983, 16, 1, 278-289, 2001.01, [URL]. |
| 525. | Y. Watanabe, M. Shiratani, K. Koga, Formation kinetics and control of dust particles in capacitively-coupled reactive plasma (invited), Phys. Scripta, 10.1238/Physica.Topical.089a00029, T89, 29-32, 2001.01, [URL]. |
| 526. | M. Shiratani, K. Koga, Y. Watanabe, Plasma CVD method for Cu interconnects in ULSI (invited), Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 751-754, 2001.01. |
| 527. | M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Measurements of surface reaction probability of SiH3, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 419-420, 2001.01. |
| 528. | M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H assisted control of quality and conformality in Cu film deposition using plasma CVD method, Proc. Advanced Metallization Conf. 2000, 271-278, 2001.01. |
| 529. | K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasma, Proc. Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 385-386, 2001.01. |
| 530. | M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe, Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 421-422, 2001.01. |
| 531. | M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 393-394, 2001.01. |
| 532. | M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, Methods of suppressing cluster growth in silane rf discharges, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-609-A5.6, A5.6.1-A5.6.6, 2000.07, [URL]. |
| 533. | K. Koga, Y. Matsuoka, M. Shiratani, Y. Watanabe, In situ observation of nucleation and subsequent growth of clusters in silane rf discharges, Appl. Phys. Lett., 77, 2, 196-198, 2000.07. |
| 534. | H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-612-D9.2.1, D9.2.1-D9.2.6, 2000.07, [URL]. |
| 535. | H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source, Res. Rep. ISEE Kyushu Univ., 5, 1, 57-61, 2000.03. |
| 536. | Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga, Growth processes of particles up to nanometer size in high-frequency SiH4 plasma, Jour. Technical Phys., 41, 1, 505-519, 2000.01. |
| 537. | M. Shiratani, S. Maeda, K. Koga, Y. Watanabe, Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.39.287, 39, 1, 287-293, 2000.01, [URL]. |
| 538. | T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth of Particles in Cluster-size Range in Low Pressure and Low Power SiH4 RF Discharges, J. Appl. Phys., 10.1063/1.371256, 86, 7, 3543-3549, 1999.10, [URL]. |
| 539. | M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle Growth Kinetics in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4542, 38, 7B, 4542-4549, 1999.07, [URL]. |
| 540. | Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of Gas Flow on Particle Growth in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4556, 38, 7B, 4556-4560, 1999.07, [URL]. |
| 541. | H. Jin, M. Shiratani, Y. Nakatake, T. Fukuzawa, T. Kinoshita, Y. Watanabe, M. Toyofuku, Conformal Deposition of High-Purity Copper Using Plasma Reactor, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4492, 38, 7B, 4492-4495, 1999.07, [URL]. |
| 542. | 白谷正治, 渡辺征夫, フォトンカウンティングレーザ散乱法によるプラズマ中の微粒子計測, 応用物理, 68, 5, 553-554, 1999.05. |
| 543. | 白谷正治, 渡辺征夫, 水素ラジカル源付プラズマCVD装置による高品質銅薄膜の形成, 応用物理, 68, 3, 299-303, 1999.03, [URL]. |
| 544. | 渡辺征夫, 白谷正治, CVDプラズマにおけるクラスター成長, プラズマ材料科学第153委員会第42回研究会テキスト, 1-7, 1999.03. |
| 545. | H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Transition of particle growth region in SiH4 rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.5757, 37, 10, 5757-5762, 1998.10, [URL]. |
| 546. | H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on initial growth of particles in low-pressure and low-power GeH4 rf discharges using the high-sensitivity photon-counting laser-light-scattering method, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L1264, 37, 10B, L1264-1267, 1998.10, [URL]. |
| 547. | H. J. Jin, M. Shiratani, T. Fukuzawa, Y. Watanabe, Trench filling and deposition of high quality Cu thin films using CVD plasma reactor with H radical source, Proc. 4th Intern. Conf. on Reactive Plasma, 95-96, 1998.10. |
| 548. | Y. Watanabe, A. Hatae, T. Fukuzawa, M. Shiratani, Trajectory of particle injected from plasma reactor wall, Proc. 4th Intern. Conf. on Reactive Plasma, 63-64, 1998.10. |
| 549. | H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on particle formation in germane rf discharges by photon-counting laser-light-scattering method, Proc. 4th Intern. Conf. on Reactive Plasma, 59-60, 1998.10. |
| 550. | M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle formation in rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 169-170, 1998.10. |
| 551. | T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth mechanism of particles in cluster-size range in SiH4 rf discharges using threshold photoemission method, Proc. 4th Intern. Conf. on Reactive Plasma, 67-68, 1998.10. |
| 552. | Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of gas flow on particle growth in silane rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 61-62, 1998.10. |
| 553. | S. Maeda, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for size and density measurements of nano-particles in processing plasma, Proc. 4th Intern. Conf. on Reactive Plasma, 69-70, 1998.10. |
| 554. | M. Shiratani, A. Minemoto, T. Fukuzawa, Y. Watanabe, Density profile of SiH3 in SiH4 rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 197-198, 1998.10. |
| 555. | M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, A study on the time evolution of SiH3 surface loss probability on hydrogenated amorphous silicon films in SiH4 rf discharges using infrared diode-laser absorption spectroscopy, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/31/7/004, 31, 7, 776-780, 1998.07, [URL]. |
| 556. | H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on growth processes of particles in germane radio frequency discharges using laser light scattering and scanning electron microscopic methods, J. Appl. Phys. , 10.1063/1.36742, 83, 11, 5665-5669, 1998.06, [URL]. |
| 557. | M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for detection of nano-particles fromed in CVD plasma, Rev. Laser Eng., 10.2184/lsj.26.449, 26, 6, 449-452, 1998.06, [URL]. |
| 558. | H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Similarities in spatial distributions of absolute GeH2 density, radical producition rate and particle amount in GeH4 discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L475, 37, 4B, L457-L477, 1998.04, [URL]. |
| 559. | 福澤 剛, 宮原 弘臣, 串間 真二, 川崎 仁晴, 白谷正治, 渡辺征夫, シラン高周波放電中の微小微粒子のサイズと密度その場測定法の開発, システム情報科学研究科報告, 3, 1, 117-124, 1998.03, [URL]. |
| 560. | 白谷正治, 渡辺征夫, 小特集 ダストプラズマの現状と課題 5.プラズマプロセスにおける微粒子現象, プラズマ・核融合学会, 73, 11, 1240-1245, 1997.11. |
| 561. | M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface Reaction Kinetics of CH3 in CH4 RF Discharge Studied by Time-Resolved Threshold Ionization Mass Spectrometry, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4752, 36, 7B, 4752-4755, 1997.07, [URL]. |
| 562. | H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Roles of SiH3 and SiH2 radicals in particle growth in rf silane plasma, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4985, 36, 7B, 4985-4988, 1997.07, [URL]. |
| 563. | H. Videlot, M. Shiratani, J. Jolly, J. Perrin, Effects of H2 dilution on surface loss probability of CH3 on a-C:H in CH4+H2 rf discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 3, 293-294, 1997.02. |
| 564. | M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface reaction kinetics of CH3 in CH4 RF discharges studied by time-resolved Ms spectroscopy, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 293-294, 1997.01. |
| 565. | H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Study on growth processes of particles in rf SiH4 plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 351-352, 1997.01. |
| 566. | Y. Watanabe, T. Fukuzawa, H. Kawasaki, M. Shiratani, Particle Formation in High Frequency CVD Plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 225-226, 1997.01. |
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| 568. | M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Diagnostic of plasma for metal-organic chemical vapour deposition of Cu and fabrication of Cu thin films using the plasma, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/29/11/005, 29, 1, 2754-2758, 1996.11, [URL]. |
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| 570. | M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Production of size-controlled Si fine particules using pulsed rf dischange, Surf. Rev. Lett., 10.1142/S0218625X96000176 , 3, 1, 75-78, 1996.08, [URL]. |
| 571. | M. Shiratani, N. Kishigaki, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Two-dimensional spatial profiles of size and density of particulates grown in RF silane plasmas, IEEE Trans. Plasma Science, 10.1109/27.491731, 24, 1, 99-100, 1996.02, [URL]. |
| 572. | M. Shiratani, H. Kawasaki, T. Fukuzawa, T. Yoshioka, Y. Ueda, S. Singh, Y. Watanabe, Simultaneous in-situ measurements of properties of particulates in rf silane plasma using a polarization-sensitive laser-light-scattering method, J. Appl. Phys. , 10.1063/1.360916, 79, 1, 104-109, 1996.01, [URL]. |
| 573. | M. Shiratani, T. Fukuzawa, K. Eto, Y. Watanabe, Detection of Negative Ions in a Helium-Silane RF Plasma, Jpn. J. Appl. Phys. Pt. 2, Letters, 10.1143/JJAP.31.L1791, 31, 12, 1791-1793, 1992.12, [URL]. |
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