| Kazunori Koga | Last modified date：2013.5.20 |
Associate Professor /
Department of Electronics
Department of Electronics
Faculty of Information Science and Electrical Engineering
Department of Electronics
Faculty of Information Science and Electrical Engineering
Graduate School
Undergraduate School
E-Mail
Homepage
[URL].
Fax
092-802-3717
Academic Degree
Doctor of Science
Field of Specialization
Plasma Engineering
Research
Research Interests
- Study on high rate deposition of high quality materials for solar cells
keyword : amorphous silicon
1999.04. - Forth generation plasma-bio technology
keyword : cell activation control
2009.04. - Study on formation mechanism and control of particles in processing plasmas
keyword : processing plasma, particle
1999.04. - Study on particle formation mechanism due to interaction between plasma and carbon wall
keyword : plasma wall interaction, nuclear fusion
2001.01. - Development of Cu interconnect in next generation LSI
keyword : Cu interconnect
1999.04. - Development of deposition of low-k dielectrics for next generation LSI
keyword : low-k dielectrics
2002.01.
Books
| 1. | Low Temperature Deposition of Hard Carbon Thin Films Using Plasma Anisotropic Chemical Vapor Deposition Method. |
| 2. | Coagulation and Transport of Fine Particles in Processing Plasmas. |
| 3. | Kazunori Koga, Masaharu Shiratani, Yukio Watanabe,Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges (Industrial Plasma Technology: Applications from Environmental to Energy Technologies),WILEY-VCH Verlag GmbH & Co,20, pp.247-257,2010.05. |
| 4. | Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani,Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation (Industrial Plasma Technology: Applications from Environmental to Energy Technologies),WILEY-VCH Verlag GmbH & Co,31, pp.377-383,2010.05. |
| 5. | Towards Revolutionary Amorphous Silicon Solar Cells without Light-Induced Degradation. |
Papers
| 1. | Giichiro Uchida, Muneharu Sato, Hyunwoong Seo, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Characteristics of Photocurrent Generation in the Near-Ultraviolet Region in Si Quantum-Dot Sensitized Solar Cells,Thin Solid Films,2013.05. |
| 2. | Hyunwoong Seo, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells,Electrochimica Acta,Vol.95,No.1,pp.43-47,2013.04. |
| 3. | Katsushi Nishiyama, Yasuhiko Morita, Giichiro Uchida, Daisuke Yamashita, Kunihiro Kamataki, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara, the LHD Experimental Group, Sven Bornholdt, and Holger Kersten,Discharge Power Dependence of Carbon Dust Flux in a Divertor Simulator,Journal of Nuclear Materials,2013.01. |
| 4. | Kazunori Koga, Katsushi Nishiyama, Yasuhiko Morita, Giichiro Uchida, Daisuke Yamashita, Kunihiro Kamataki, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara, and the LHD Experimental Group,Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device,Journal of Nuclear Materials,2013.01. |
| 5. | Hyunwoong Seo, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell,Electrochimica Acta,Vol.87,No.1,pp.213-217,2013.01. |
| 6. | Shinya Iwashita, Katsushi Nishiyama, Giichiro Uchida, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Dust particle formation due to interaction between graphite and helicon deuterium plasmas,Fusion Engineering and Design,Vol.88,No.1,pp.28-32,2013.01. |
| 7. | Hyunwoong Seo, Yuting Wang, Muneharu Sato, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells,Japanese Journal of Applied Physics,Vol.52,No.1,pp.01AD05(5pages),2013.01. |
| 8. | Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani,High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition,Japanese Journal of Applied Physics,Vol.52,No.1,pp.01AD01(4pages),2013.01. |
| 9. | Iping Suhariadi, Koichi Matsushima, Kazunari Kuwahara, Koichi Oshikawa, Daisuke Yamashita, Hyunwoong Seo, Giichiro Uchida, Kunihiro Kamtaki, Kazunori Koga, Masaharu Shiratani, Sven Bornholdt, Holger Kersten, Harm Wulff, Naho Itagaki,Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization,Japanese Journal of Applied Physics,Vol.52,No.1,pp.01AC08(5pages),2013.01. |
| 10. | Tatsuya Urakawa, Ryuhei Torigoe, Hidefumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Keigo Takeda, Makoto Sekine, Masaru Hori,H-2/N-2 plasma etching rate of carbon films deposited by H-assisted plasma CVD,Japanese Journal of Applied Physics,Vol.52,No.1,pp.01AB01(4pages),2013.01. |
| 11. | Kunihiro Kamataki, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani,Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage,Thin Solid Films,Vol.523,pp.76-79,2012.11. |
| 12. | Yeonwon Kim, Takeaki Matsunaga, Kenta Nakahara ,Giichiro Uchida, Kunihiro Kamataki , Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani ,Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD ,Thin Solid Films,Vol.523,pp.29-33,2012.11. |
| 13. | Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi,Growth Control of Dry Yeast Using Scalable Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation,Japanese Journal of Applied Physics,Vol.51,No.11,pp.11PJ02(5pages),2012.11. |
| 14. | Tatsuya Urakawa, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Mass density control of carbon films deposited by H-assisted plasma CVD method,Surface and Coatings Technology,2012.10. |
| 15. | Iping Suhariadi, Naho Itagaki, Kazunari Kuwahara, Koichi Oshikawa, Daisuke Yamashita, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Kenta Nakahara, Masaharu Shiratani,ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio,Transactions of the Materials Research Society of Japan,Vol.37,No.2,pp.165-168,2012.06. |
| 16. | Akiyo Tanaka, Miyuki Hirata, Masaharu Shiratani, Kazunori Koga, Yutaka Kiyohara,Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats,Journal of Occupational Health,Vol.54,No.3,pp.187-195,2012.06. |
| 17. | Kazunari Kuwahara, Naho Itagaki, Kenta Nakahara, Daisuke Yamashita, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani,High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers,Thin Solid Films,Vol.520,No.14,pp.4674-4677,2012.05. |
| 18. | Yeonwon Kim, Takeaki Matsunaga, Kenta Nakahara, Hyunwoong Seo, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD,Surface and Coatings Technology,2012.04. |
| 19. | Kunihiro Kamataki, Yasuhiko Morita, Masaharu Shiratani, Kazunori Koga, Giichiro Uchida, Naho Itagaki ,In situ analysis of size dispersion of nano-particles in reactive plasmas using two dimentional laser light scattering method,Journal of Instrumentation,Vol.7,No.4,pp.C04017,2012.04. |
| 20. | Masaharu Shiratani, Kosuke Hatozaki, Yuuji Hashimoto, Yeon-Won Kim, Hyunwoong Seo, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga,Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition,Materials Research Society Symposium Proceedings 2012 MRS Spring Meeting,Vol.1426,pp.377-382,2012.04. |
| 21. | Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Hyunwoong Seo, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances,Materials Research Society Symposium Proceedings 2012 MRS Spring Meeting,Vol.1426,pp.307-311,2012.04. |
| 22. | Hyunwoong Seo, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition,Materials Research Society Symposium Proceedings 2012 MRS Spring Meeting,Vol.1426,pp.313-318,2012.04. |
| 23. | Yusuke Akiyoshi, Nobuya Hayashi, Satoshi Kitazaki, Kazunori Koga and Masaharu Shiratani,Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth,Materials Research Society Symposium Proceedings 2012 MRS Spring Meeting,Vol.1469,pp.ww06-10,2012.04. |
| 24. | Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi,Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth,Materials Research Society Symposium Proceedings 2012 MRS Spring Meeting,Vol.1469,pp.ww06-08,2012.04. |
| 25. | Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi,Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation,Materials Research Society Symposium Proceedings 2012 MRS Spring Meeting,Vol.1469,pp.ww02-08,2012.04. |
| 26. | Kazunori Koga, Kenta Nakahara, Yeon-Won Kim, Takeaki Matsunaga, DaisukeYamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, and Masaharu Shiratani,Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD,Japanese Journal of Applied Physics,Vol.51,No.1,pp.01AD03(4pages),2012.01. |
| 27. | Giichiro Uchida, Kosuke Yamamoto, Muneharu Sato, Yuki Kawashima, Kenta Nakahara, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells,Japanese Journal of Applied Physics,Vol.51,No.1,pp.01AD01(5pages),2012.01. |
| 28. | Kazunori Koga, Takeaki Matsunaga, Yeonwon Kim, Kenta Nakahara, Daisuke Yamashita, Hidefumi Matsuzaki, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, and Masaharu Shiratani,Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition,Japanese Journal of Applied Physics,Vol.51,No.1,pp.01AD02(4pages),2012.01. |
| 29. | Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi,Growth Enhancement of Radish Sprouts Induced by Low Pressure O2 Radio Frequency Discharge Plasma Irradiation,Japanese Journal of Applied Physics,Vol.51,No.1,pp.01AE01(4pages),2012.01. |
| 30. | Yuting Wang, Muneharu Sato, Hyunwoong Seo, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer,Proceedings of The 33rd International Symposium on Dry Process,Vol.33,pp.133-134,2011.11. |
| 31. | Tatsuya Urakawa, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuuichi Setsuhara, Makoto Sekine, Masaru Hori,Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon,Proceedings of The 33rd International Symposium on Dry Process(DPS 2011),Vol.33,pp.123-124,2011.11. |
| 32. | Nobuya Hayashi, Yusuke Akiyoshi, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani,Influence of active oxygen species produced by atmospheric torch plasma on plant growth,Proceedings of The 33rd International Symposium on Dry Process(DPS 2011),Vol.33,pp.135-136,2011.11. |
| 33. | Kazunori Koga, Tatsuya Urakawa, Giichiro Uchida, Hyunwoong Seo, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Self-organized carbon mask formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.23G03,2011.11. |
| 34. | Yuting Wang, Muneharu Sato, Hyunwoong Seo, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.23P013-O,2011.11. |
| 35. | Masaharu Shiratani, Yeonwon Kim, Takeaki Matsunaga, Hyunwoong Seo, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga,Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24G06,2011.11. |
| 36. | Naho Itagaki, Kazunari Kuwahara, Kenta Nakahara, Daisuke Yamashita, Kunihiro Kamataki, Hyunwoong Seo, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24G16,2011.11. |
| 37. | Kenta Nakahara, Kosuke Hatozaki, Yuuji Hashimoto, Takeaki Matsunaga, Muneharu Sato, Daisuke Yamashita, Hidefumi Matsuzaki, Hyunwoong Seo, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Deposition of cluster-free a-Si:H films using cluster eliminating filter,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P010-O,2011.11. |
| 38. | Yeonwon Kim, Takeaki Matsunaga, Hyunwoong Seo, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P011-O,2011.11. |
| 39. | Katsushi Nishiyama, Yasuhiko Morita, Daisuke Yamashita, Kunihiro Kamataki, Giichiro Uchida, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten,Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasmas and carbon wall onto substrates by applying local DC bias voltage,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P094-O,2011.11. |
| 40. | Kunihiro Kamataki, Kazunori Koga, Giichiro Uchida, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani,Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P014-O,2011.11. |
| 41. | Takeaki Matsunaga, Yeonwon Kim, Kazunori Koga, Hyunwoong Seo, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani,Influence of nano-particles on multi-hollow discharge plasmas for microcrystalline silicon thin films deposition,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P015-O,2011.11. |
| 42. | Kosuke Hatozaki, Kenta Nakahara, Takeaki Matsunaga, Giichiro Uchida, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P016-O,2011.11. |
| 43. | Kazunari Kuwahara, Naho Itagaki, Kenta Nakahara, Daisuke Yamashita, Seo Hyunwoong, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani,Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P008-O,2011.11. |
| 44. | Yeonwon Kim, Takeaki Matsunaga, Daisuke Yamashita, Kunihiro Kamataki, Naho Itagaki, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.3D-2P-09,2011.11. |
| 45. | Kenta Nakahara, Kosuke Hatozaki, Muneharu Sato, Takeaki Matsunaga, Daisuke Yamashita, Hidefumi Matsuzaki, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.3D-2P-20,2011.11. |
| 46. | Yuting Wang, Muneharu Sato, Takeaki Matsunaga, Naho Itagaki, Hyunwoong Seo, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.3D-5P-09,2011.11. |
| 47. | Naho Itagaki, Kazunari Kuwahara, Daisuke Yamashita, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani,Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.4D-2P-10,2011.11. |
| 48. | Kazunari Kuwahara, Naho Itagaki, Kenta Nakahara, Daisuke Yamashita, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani,Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.4D-2P-11,2011.11. |
| 49. | Takeaki Matsunaga, Yeonwon Kim, Kazunori Koga, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani,Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.4D-2P-16,2011.11. |
| 50. | Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi,Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.23P018-O,2011.11. |
| 51. | Tetsu Mieno, Kazunori Koga, Masaharu Shiratani,Production Process of Carbon Nanotube Coagulates,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24F08,2011.11. |
| 52. | Tatsuya Urakawa, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuuichi Setsuhara, Makoto Sekine, Masaru Hori,Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P007-O,2011.11. |
| 53. | Muneharu Sato, Yuting Wang, Kenta Nakahara, Takeaki Matsunaga, Hyunwoong Seo, Giichiro Uchida, Kazunori Koga and Masaharu Shiratani,Deposition of FeSi2 nano-particle film,Proceedings of Plasma Conference 2011 (PLASMA2011) ,pp.24P009-O,2011.11. |
| 54. | Kosuke Hatozaki, Kenta Nakahara, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.3D-2P-18,2011.11. |
| 55. | Muneharu Sato, Yuting Wang, Kenta Nakahara, Takeaki Matsunaga, Hyunwoong Seo, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges,Proceedings of The 21st International Photovoltaic Science and Engineering Conference (PVSEC-21),pp.3D-5P-12,2011.11. |
| 56. | Kazunori Koga, Kenta Nakahara, Yeon-Won Kim, Yuki Kawashima, Takeaki Matsunaga, Muneharu Sato, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, and Masaharu Shiratani,Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method,Physica Status Solidi ©,Vol.8,No.10,pp.3013-3016,2011.10. |
| 57. | Giichiro Uchida, Kosuke Yamamoto, Yuki Kawashima, Muneharu Sato, Kenta Nakahara, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Michio Kondo, Masaharu Shiratani,Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD,Physica Status Solidi ©,Vol.8,No.10,pp.3017-3020,2011.10. |
| 58. | Giichiro Uchida, Yuki Kawashima, Kosuke Yamamoto, Muneharu Sato, Kenta Nakahara, Takeaki Matsunaga, Daisuke Yamashita, H. Matsuzaki, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Michio Kondo, Masaharu Shiratani,Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye,Physica Status Solidi ©,Vol.8,No.10,pp.3021-3024,2011.10. |
| 59. | Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Masaharu Shiratani,Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasmas,Applied Physics Express,Vol.4,No.10,pp.105001(3pages),2011.10. |
| 60. | Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani,Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasmas ,Proc. of International Conference on Phenomena in Ionized Gases（ICPIG） 2011 Conference,pp.D13-318,2011.09. |
| 61. | Kazunori Koga, Yuki Kawashima, Takeaki Matsunaga, Muneharu Sato, Kenta Nakahara, William Makoto Nakamura, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani,Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film,Thin Solid Films,Vol.519,No.20,pp.6896-6898,2011.08. |
| 62. | Nobuya Hayashi, Akari Nakahigashi, Masaaki Goto, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani,Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge,Japanese Journal of Applied Physics,Vol.50,No.8,pp.08JF04,2011.08. |
| 63. | Yeonwon Kim, Takeaki Matsunaga, Yuki Kawashima, Daisuke Yamashita, Kunihiro Kamataki, Naho Itagaki, Giichirou Uchida, Kazunori Koga, Masaharu Shiratani,Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD,Proceedings of The 20th International Symposium on Plasma Chemistry （ISPC20）,pp.POL08,2011.07. |
| 64. | Tatsuya Urakawa, Takuya Nomura, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuuichi Setsuhara, Makoto Sekine, Masaru Hori,Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD,Proceedings of The 20th International Symposium on Plasma Chemistry （ISPC20）,pp.POL02,2011.07. |
| 65. | Masaharu Shiratani, Kazunori Koga, Shinya Iwashita, Giichiro Uchida, Naho Itagaki, Kunihiro Kamataki,Nano-factories in plasma: present status and outlook,Journal of Physics D: Applied Physics,Vol.44,No.17,pp.174038,2011.05. |
| 66. | Kazunori Koga, Giichiro Uchida, Kosuke Yamamoto, Yuki Kawashima, Muneharu Sato, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani,Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics,International Conference on Advances in Condensed and Nano Materials (ICACNM),Vol.1393,pp.27-30,2011.02. |
| 67. | Naho Itagaki, Kazunari Kuwahara, Kenta Nakahara, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Highly Conducting Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase,Applied Physics Express,Vol.4,No.1,pp.011101-011101-3 ,2011.01. |
| 68. | William Makoto Nakamura, Hidefumi Matsuzaki, Hiroshi Sato, Yuuki Kawashima, Kazunori Koga, Masaharu Shiratani,High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells,Surface and Coatings Technology,Vol.205,No.1,pp.S241-S245 ,2010.12. |
| 69. | Hiroshi Miyata, Katsushi Nishiyama, Shinya Iwashita, Hidefumi Matsuzaki, Daisuke Yamashita, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles,Proceedings of International Symposium on Dry Process,pp.43-44,P1-A17,2010.11. |
| 70. | G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo,Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges,Proceedings of MNC2010 (第23回マイクロプロセス・ナノテクノロジー国際会議),pp.12D-11-66,2010.11. |
| 71. | Masaharu Shiratani, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Kunihiro Kamataki,Fluctuation Control for Plasma Nanotechnologies,IEEE Region 10 Conference on TENCON 2010 ,pp.XII-XVI ,2010.11. |
| 72. | Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichirou Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani,Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasmas,IEEE Region 10 Conference on TENCON 2010 ,pp.1943-1947,2010.11. |
| 73. | Giichiro Uchida, Shota Nunomutra, Hiroshi Miyata, Shinya Iwashita, Dsaisuke Yamashita, Hidefumi Matsuzaki, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge,IEEE Region 10 Conference on TENCON 2010 ,pp.2199-2201,2010.11. |
| 74. | Kenta Nakahara, Yuki Kawashima, Muneharu Sato, Takeaki Matsunaga, Kosuke Yamamoto, William Makoto Nakamura, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges,IEEE Region 10 Conference on TENCON 2010 ,pp.2216-2218,2010.11. |
| 75. | Takeaki Matsunaga, Yuki Kawashima, Kazunori Koga, Kenta Nakahara, William Makoto Nakamura, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani,Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD,IEEE Region 10 Conference on TENCON 2010 ,pp.2219-2212,2010.11. |
| 76. | Yusuke Akiyoshi, Akari Nakahigashi, Nobuya Hayashi, Satoshi Kitazaki, Takuro Iwao, Kazunori Koga, Masaharu Shiratani,Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma,IEEE Region 10 Conference on TENCON 2010 ,pp.1957-1959,2010.11. |
| 77. | Satoshi Kitazaki, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Growth Stimulation of Radish Sprouts Using Discharge Plasmas,IEEE Region 10 Conference on TENCON 2010 ,pp.1960-1963,2010.11. |
| 78. | Takuya Nomura, Tatsuya Urakawa, Yuki Korenaga, Daisuke Yamashita, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani,Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches,IEEE Region 10 Conference on TENCON 2010 ,pp.2213-2215,2010.11. |
| 79. | Yuki Kawashima, Kosuke Yamamoto, Muneharu Sato, Takeaki Matsunaga, Kenta Nakahara, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani,Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD,IEEE Region 10 Conference on TENCON 2010 ,pp.2222-2224,2010.11. |
| 80. | Kenta Nakahara, Yuki Kawashima, Muneharu Sato, Takeaki Matsunaga, Kosuke Yamamoto, William Makoto Nakamura, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method,Proceedings of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas,Vol.55,No.7,pp.CTP.00087,2010.10. |
| 81. | Takeaki Matsunaga, Yuki Kawashima, Kazunori Koga, William Makoto Nakamura, Kenta Nakahara, Hidefumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani,Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD,Proceedings of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas,Vol.55,No.7,pp.CTP.00089,2010.10. |
| 82. | Giichiro Uchida, Muneharu Sato, Yuuki Kawashima, Kenta Nakahara, Kosuke Yamamoto, Takeaki Matsunaga, Daisuke Yamashita, Hidefumi Matsuzaki, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges,Proceedings of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas,Vol.55,No.7,pp.CTP.00093,2010.10. |
| 83. | Hiroshi Miyata, Katsushi Nishiyama, Shinya Iwashita, Hidefumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Naho Itagaki, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara, LHD experimental group,Carbon dust particles generated due to H2 plasma-carbon wall interaction,Proceedings of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas,Vol.55,No.7,pp.CTP.00114,2010.10. |
| 84. | Akari Nakahigashi, Yusuke Akiyoshi, Nobuya Hayashi, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani,Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge,Proceedings of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas,Vol.55,No.7,pp.KWP.00008,2010.10. |
| 85. | Takuya Nomura, Tatsuya Urakawa, Yuki Korenaga, Daisuke Yamashita, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Plasma parameter measurements of Ar+H2+C7H8 plasmas in H-assisted plasma CVD reactor,Proceedings of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas,Vol.55,No.7,pp.DTP.00173,2010.10. |
| 86. | Yuki Kawashima, Kenta Nakahara, Hiroshi Sato, Kazunori Koga, Masaharu Shiratani, Michio Kondo,Quantum dot-sensitized solar cells using Si nanoparticles,Transactions of the Materials Research Society of Japan,Vol.35,No.3,pp.597-599,2010.09. |
| 87. | Yuki Kawashima, Kosuke Yamamoto, Muneharu Sato, Kenta Nakahara, Takeaki Matsunaga, William Makoto Nakamura, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Michio Kondo,Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD,35th IEEE Photovoltaic Specialists Conference ,pp.3347-3351,2010.07. |
| 88. | Kenta Nakahara, Yuki Kawashima, Muneharu Sato, Takeaki Matsunaga, Kosuke Yamamoto, William Makoto Nakamura, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani,Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method,35th IEEE Photovoltaic Specialists Conference ,pp.3722-3755,2010.07. |
| 89. | Kazunori Koga, Yuki Kawashima, Kenta Nakahara, Takeaki Matsunaga, William Makoto Nakamura, Masaharu Shiratani,Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition,35th IEEE Photovoltaic Specialists Conference ,pp.3718-3721,2010.07. |
| 90. | Akiyo Tanaka, Miyuki Hirata, Yutaka Kiyohara, Makiko Nakano, Kazuyuki Omae, Masaharu Shiratani, Kazunori Koga,Review of pulmonary toxicity of indium compounds to animals and humans,Thin Solid Films,Vol.518,No.11,pp.2934-2936,2010.03. |
| 91. | Kazunori Koga, Hiroshi Sato, Yuuki Kawashima, William Makoto Nakamura, Masaharu Shiratani,Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2,Proceedings of the 27th symposium on plasma processing,No.A5-06,pp.91-92,2010.02. |
| 92. | Yuki Kawashima, Kenta Nakahara, Hiroshi Sato, Kazunori Koga, Masaharu Shiratani, Michio Kondo,Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD,Proceedings of the 27th symposium on plasma processing,No.B5-05,pp.101-102,2010.02. |
| 93. | Hiroshi Sato, Yuuki Kawashima, Kenta Nakahara, Kazunori Koga, Masaharu Shiratani,Measurement of electron density in multi-hollow discharges with magnetic field,Proceedings of the 27th symposium on plasma processing,No.A6-01,pp.105-106,2010.02. |
| 94. | Shinya Iwashita, Hiroshi Miyata, Yasuyuki Yamada, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani,Observation of nano-particle transport in capacitively coupled radio frequency discharge plasmas,Proceedings of the 27th symposium on plasma processing,No.P1-13,pp.153-154,2010.02. |
| 95. | Hiroshi Miyata, Shinya Iwashita, Yasuyuki Yamada, Kazunori Koga, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara, LHD Experimental Group,In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasmas and Inner Wall in LHD,Proceedings of the 27th symposium on plasma processing,No.P1-14,pp.155-156,2010.02. |
| 96. | Takuya Nomura, Yuki Korenaga, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor,Proceedings of the 27th symposium on plasma processing,No.P1-39,pp.205-206,2010.02. |
| 97. | Tetsu Mieno, GuoDong Tan, Shu Usuba, Kazunori Koga, Masaharu Shiratani,In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity),Proceedings of the 27th symposium on plasma processing,No.P2-17,pp.257-258,2010.02. |
| 98. | Kazunori Koga, Hiroshi Sato, Yuuki Kawashima, William Makoto Nakamura, Masaharu Shiratani,High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD,Materials Research Society Symposium Proceedings 2009,Vol.1210,No.Q07-10,pp.217-222,2010.01. |
| 99. | Takuya Nomura, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Deposition Profile Control of Carbon Films on Patterned Substrates using a Hydrogen-assited Plasma CVD Method,Materials Research Society Symposium Proceedings 2009,Vol.1222,No.DD05-16,pp.203-207 ,2010.01. |
| 100. | Hiroomi Miyahara, Shinya Iwashita, Hiroshi Miyata, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani,Detection of nano-particles formed in cvd plasmas using a two-dimensional photon-counting laser-light-scattering method,Journal of Plasma and Fusion Research Series,Vol.8,pp.700-704,2009.09. |
| 101. | Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani, Naoko Ashikawa, Kiyohiko Nishimura, Akio Sagara, the LHD experimental group,A comparison of dust particles produced due to interaction between graphite and plasmas: LHD vs helicon discharges,Journal of Plasma and Fusion Research Series,Vol.8,pp.308-311,2009.09. |
| 102. | Shinya Iwashita, Hiroshi Miyata, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani,Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles,Journal of Plasma and Fusion Research Series,Vol.8,pp.582-586,2009.09. |
| 103. | William M. Nakamura, Yuuki Kawashima, Masatoshi Tanaka, Hiroshi Sato, Jun Umetsu, Hiroomi Miyahara, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani,Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition,Journal of Plasma and Fusion Research Series,Vol.8,pp.736-739,2009.09. |
| 104. | Hiroshi Sato, Yuuki Kawashima, Masatoshi Tanaka, Kazunori Koga, William M. Nakamura, Masaharu Shiratani ,Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method,Journal of Plasma and Fusion Research Series,Vol.8,pp.1435-1438,2009.09. |
| 105. | Jun Umetsu, Kazuhiko Inoue, Takuya Nomura, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches,Journal of Plasma and Fusion Research Series,Vol.8,pp.1443-1446,2009.09. |
| 106. | Hiroshi Miyata, Shinya Iwashita, Yasuyuki Yamada, Kazunori Koga, Masaharu Shiratani,Dust Particles formed owing to interactions between H2 or D2 helicon plasmas, graphite,Proceedings of 2009 International Symposium on Dry Process,pp.33,2009.09. |
| 107. | Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Hidefumi Matsuzaki, Masaharu Shiratani, Morito Akiyama,Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation,Proceedings of 2009 International Symposium on Dry Process,pp.99,2009.09. |
| 108. | Takuya Nomura, Yuki Korenaga, Jun Umetsu, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD,Proceedings of 2009 International Symposium on Dry Process,pp.101,2009.09. |
| 109. | Yuuki Kawashima, Hiroshi Sato, Kazunori Koga, Masaharu Shiratani, Michio Kondo,Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD,Proceedings of 2009 International Symposium on Dry Process,pp.107,2009.09. |
| 110. | Hiroshi Sato, Yuuki Kawashima, Kazunori Koga, Masaharu Shiratani,Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer,Proceedings of 2009 International Symposium on Dry Process,pp.113,2009.09. |
| 111. | Kenta Nakahara, Yuuki Kawashima, Hiroshi Sato, Kazunori Koga, Masaharu Shiratani,Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe,Proceedings of 2009 International Symposium on Dry Process,pp.163,2009.09. |
| 112. | Masaharu Shiratani, Kazunori Koga,Toward plasma nano-factories,Proceedings of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I),pp.86,2009.09. |
| 113. | Masaharu Shiratani, Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Hidefumi Matsuzaki, Morito Akiyama,Plasma CVD of Nano-particle Composite Porous SiOCH Films,Proc. of 19th International Symposium on Plasma Chemistry,2009.07. |
| 114. | Kazunori Koga, Shinya Iwashita, Satoru Kiridoshi, Masaharu Shiratani, Naoko Ashikawa, Kiyohiko Nishimura, Akio Sagara, Akio Komori, LHD Experimental Group,Characterization of Dust Particles Ranging in Size from 1 nm to 10 m Collected in LHD,Plasma and Fusion Research,Vol.4,pp.034-034,2009.04. |
| 115. | Kazunori Koga, William Makoto Nakamura, Hiroshi Sato, Masatoshi Tanaka, Hiroomi Miyahara, Masaharu Shiratani,High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method,Proceedings of PSS2009/SPP26,2009.02. |
| 116. | Nakamura William Makoto, Sato Hiroshi, Koga Kazunori, Shiratani Masaharu,Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells ,Proceedings of PSS2009/SPP26,2009.02. |
| 117. | Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani, Naoko Ashikawa, Akio Sagara, Kiyohiko Nisimura ,Characteristics of dust particles produced due to interaction between hydrogen plasmas, graphite ,Proceedings of PSS2009/SPP26,2009.02. |
| 118. | Jun Umetsu, Kazuhiko Inoue, Takuya Nomura, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori,Deposition profile of toluene plasma CVD carbon films in trenches,Proceedings of PSS2009/SPP26,2009.02. |
| 119. | Kazunori Koga, Yuuki Kawashima, William Makoto Nakamura, Hiroshi Sato, Masatosi Tanaka, Masaharu Shiratani, Michio Kondo,Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method,Proceedings of PSS2009/SPP26,2009.02. |
| 120. | Shinya Iwashita, Hiroshi Miyata, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani,Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode,Proceedings of PSS2009/SPP26,2009.02. |
| 121. | Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Hidefumi Matsuzaki, Masaharu Shiratani, Morihito Akiyama,Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa,Proceedings of 30th International Symposium on Dry Process,pp.115,2008.11. |
| 122. | Jun Umetsu, Kazuhiko Inoue, Takuya Nomura, Hidefumi Matsuzaki, Kazunori Koga, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori,Deposition profile of plasma CVD carbon films in trenches,Proceedings of 30th International Symposium on Dry Process,pp.35,2008.11. |
| 123. | William Makoto Nakamura, Hiroomi Miyahara, Kazunori Koga, Masaharu Shiratani,Two dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD,IEEE Transactions on Plasma Science,Vol.36,No.4,pp.888-889,2008.08. |
| 124. | Shinya Iwashita, Michihito Morita, Hidefumi Matsuzaki, Kazunori Koga, and Masaharu Shiratani,Temperature dependence of dielectric constant of nano-particle composite porous low-k films fabricated by pulse rf discharges with amplitude modulation,Japanese Journal of Applied Physics,Vol.47,No.8,pp.6875-6878,2008.08. |
| 125. | Jun Umetsu, Kazunori Koga, Kazuhiro Inoue, Hidefumi Matzuzaki, Kosuke Takenaka, Masaharu Shiratani,Discharge power dependence of Ha intensity asn electron density of Ar+H2 discharges in H-assisted plasma CVD reactor,Surface and Coatings Technology,Vol.202,No.22-23,pp.5659-5662,2008.08. |
| 126. | S. Iwashita, K. Koga, M. Morita, M. Shiratani,Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films,Journal of Physics: Conference Series,Vol.100,No.6,pp.p. 062006,2008.08. |
| 127. | J. Umetsu, K. Koga, K. Inoue, M. Shiratani,Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films,Journal of Physics: Conference Series,Vol.100,No.6,pp.p. 062007,2008.08. |
| 128. | W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani,Cluster incorporation control for a-Si:H film deposition,Journal of Physics: Conference Series,Vol.100,No.8,pp.p. 082018,2008.08. |
| 129. | S. Nunomura, K. Koga, Y. Watanabe, M. Shiratani, M. Kondo,Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasmas,Phys. Plasmas,Vol.15,No.8,pp.p. 080703,2008.08. |
| 130. | Masaharu Shiratani, William Makoto Nakamura, Hiroomi Miyahara, Kazunori Koga,Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films,Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08),pp.69,2008.07. |
| 131. | M. Shiratani, S. Iwashita, K. Koga, S. Nunomura,Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage,Faraday Discussions,Vol.137,pp.127-138,2008.01. |
| 132. | Kazunori Koga, William Makoto Nakamura, and Masaharu Shiratani,VHF discharge sustained in a small hole,Proceedings of 28th International Conference on Phenomena in Ionized Gases ,pp.1987-1989,2007.07. |
| 133. | Kazunori Koga, Shinya Iwashita, Masaharu Shiratani,Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage,Journal of Physics D,Vol.40,No.8,pp.2267-2271,2007.04. |
| 134. | Masaharu Shiratani, Kazunori Koga, Soichiro Ando, Toshihisa Inoue, Yukio Watanabe, Shota Nunomura, Michio Kondo,Single step process to deposit Si quantum dot films using H2+SiH4 VHF discharges and electron mobility in a Si quantum dot solar cell,Surface and Coatings Technology,Vol.201,No.9-11,pp.5468-5471,2007.02. |
| 135. | Shinya Iwashita, Kazunori Koga, Masaharu Shiratani,A device for trapping nano-particles formed in processing plasmas for reduction of nano-waste,Surface and Coatings Technology,Vol.201,No.9-11,pp.5701-5704,2007.02. |
| 136. | Shinya Iwashita, Kazunori Koga, Masaharu Shiratani,Transport of nano-particles in pulsed AM RF discharges,Proceedings of the 24th Symposium on Plasma Processing,pp.103-104,2007.01. |
| 137. | Masaharu Shiratani, Satoru Kiridoshi, Kazunori Koga, Shinya Iwashita, Naoko Ashikawa, Kiyohiko NIshimura, Akio Sagara, Akio Komori, LHD Experimental Group,In-situ sampling of dust generated in LHD and its analysis,Proceedings of the 24th Symposium on Plasma Processing,pp.371-372,2007.01. |
| 138. | Kazunori Koga, William Makoto Nakamura, Daiuke Shimokawa, Masaharu Shiratani,Stability of a-Si:H deposited using multi-hollow plasma CVD,Proceedings of the 24th Symposium on Plasma Processing,pp.189-190,2007.01. |
| 139. | M. Shiratani, K. Koga, N. Kaguchi, K. Bando,and Y. Watanabe,Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges,Thin Solid Films,Vol.506-507,pp.17-21,2006.05. |
| 140. | T. Kakeya, K. Koga, M. Shiratani, Y. Watanabe, and M. Kondo,Production of crystalline Si nano-clusters using pulsed H2+SiH4 VHF discharges,Thin Solid Films,Vol.506-507,pp.288-291,2006.05. |
| 141. | K. Koga, Y. Kitaura, M. Shiratani, Y. Watanabe, and A. Komori,Nano-particle formation due to interaction between H2 plasma and carbon wall,Thin Solid Films,Vol.506-507,pp.656-659,2006.05. |
| 142. | K. Takenaka, K. Koga, M. Shiratani, Y. Watanabe, and T. Shingen,Mechanism of Cu deposition from Cu(EDMDD)2 using H-assisted plasma CVD,Thin Solid Films,Vol.506-507,pp.197-201,2006.05. |
| 143. | Shota Nunomura, Makoto Kita, Kazunori Koga, Masaharu Shiratani, and Yukio Watanabe,In situ simple method for measuring size and density of nanoparticles in reactive plasmas,Journal of Applied Physics,Vol.99,No.8,pp.083302(7pages),2006.04. |
| 144. | Shota Nunomura, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Yoshinori Morisada, Nobuo Matsuki, and Shingo Ikeda,Fabrication of nanoparticle composite porous films having ultra-low dielectric constant,Japanese Journal of Applied Physics,Vol.44,No.50,pp.L1509-L1511,2005.12. |
| 145. | Kazunori Koga, Toshihisa Inoue, Kouki Bando, Shinya Iwashita, Masaharu Shiratani, and Yukio Watanabe,Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition,Japanese Journal of Applied Physics,Vol.44,No.48,pp.L1430-L1432,2005.11. |
| 146. | Kazunori Koga, Naoto Kaguchi, Kouki Bando, and Masaharu Shiratani,Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma CVD,Review of Scientific Instruments,Vol.76,No.11,pp.113501(4pages),2005.11. |
| 147. | Y. Watanabe, M. Shiratani, and K. Koga,Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects,Transactions of the Materials Research Society of Japan,Vol.30,No.1,pp.267-272,2005.03. |
| 148. | M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo,Production of crystalline Si nano-particles using VHF discharges and their properties,Transactions of the Materials Research Society of Japan,Vol.30,No.1,pp.307-310,2005.03. |
| 149. | K. Takenaka, M. Shiratani, M. Takeshita, M. Kita K. Koga, and Y. Watanabe,Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition,Pure and Applied Chemistry,Vol.77,No.2,pp.391-398,2005.01. |
| 150. | K. Takenaka, M. Kita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe,Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition,Journal of Vacuum Science and Technology A,Vol.22,No.4,pp.1903-1907,2004.07. |
| 151. | K. Koga, N. Kaguchi, M. Shiratani, and Y. Watanabe,Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H2 bonds in the films,Journal of Vacuum Science and Technology A,Vol.22,No.4,pp.1536-1539,2004.07. |
| 152. | K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori,Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall,IEEE Transaction of Plasma Science,Vol.32,No.2,pp.405-409,2004.02. |
| 153. | Growth of Clusters in Silane Plasmas and Their Relation to Deposition of Thin Films. |
| 154. | Masaharu Shiratani, Kazunori Koga, Atsushi Harikai, Takanori Ogata, and Yukio Watanabe,Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges,MRS Symp. Proc.,Vol.762,pp.A9.5.1-9.5.6,2003.04. |
| 155. | Kosuke Takenaka, Masao Onishi, Manabu Takeshita, Toshio Kinoshita, Kazunori Koga, Masaharu Shiratani, and Yukio Watanabe,Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches,MRS Symp. Proc.,Vol.766,pp.E3.8.1-3.8.6,2003.04. |
| 156. | K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe,Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition,Matr. Sci. Semiconductor Processing,Vol.5,No.2,pp.301-304,2003.02. |
| 157. | M. Shiratani, M. Kai, K. Koga, and Y. Watanabe,Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films,Thin Solid Films,Vol.427,No.1-2,pp.1-5,2003.01. |
| 158. | M. Shiratani, K. Koga, Y. Watanabe,Formation of nano-particles in microgravity plasmas,Journal of the Japan Society of Microgravity Application,Vol.19,pp.69,2002.10. |
| 159. | K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe,Anisotropic deposition of copper by plasma CVD method,Proc. of 24th International Symposium on Dry Process,pp.221-226,2002.10. |
| 160. | Y. Watanabe, M. Shiratani, K. Koga,Nucleation and subsequent growth of clusters in reactive plasmas (invited lecture paper),Plasma Sources Science & Technology,Vol.11,pp.A229-A233,2002.08. |
| 161. | K. Koga, R. Uehara, M. Shiratani, Y. Watanabe, A. Komori,Carbon nano-particles due to interaction between H2 plasmas and carbon wall,Proc. of ESCANPIG16/ICRP5 Joint Meeting,pp.I173--I174,2002.07. |
| 162. | K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen,Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2,Proc. of ESCANPIG16/ICRP5 Joint Meeting,pp.II173--II174,2002.07. |
| 163. | M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe,Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films,Proc. of ESCANPIG16/ICRP5 Joint Meeting,pp.II323--II324,2002.07. |
| 164. | K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe,Anisotropic deposition of Cu with H-assisted plasma CVD,Proc. of ESCANPIG16/ICRP5 Joint Meeting,pp.II199--II200,2002.07. |
| 165. | K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen,Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method,Proc. of International Workshop on Information and Electrical Engineering (IWIE2002),pp.227-232,2002.05. |
| 166. | K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe,Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films,Proc. of International Workshop on Information and Electrical Engineering (IWIE2002),pp.238-243,2002.05. |
| 167. | Y. Watanabe, A. Harikai, K. Koga, M. Shiratani,Clustering phenomena in low-pressure reactive plasmas: basis and applications (invited lecture paper),Pure and Applied Chemistry,Vol.74,No.3,pp.483-487,2002.03. |
| 168. | K. Koga, M. Kai, M. Shiratani, Y. Watanabe, N. Shikatani,Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films,Jpn. J. Appl. Phys.,Vol.41,No.2B,pp.L168-L170,2002.02. |
| 169. | M. Shiratani, K. Koga, Y. Watanabe,Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges,Proc. of Nano-technology Workshop,pp.7-12,2002.02. |
| 170. | K. Koga, M. Shiratani, Y. Watanabe,In-situ measurement of size and density of particles in sub-nm to nm size range,Proc. of Nano-technology Workshop,pp.13-20,2002.02. |
| 171. | K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe,Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2,Proceedings of International Symposium on Dry Process,pp.169-174,2001.11. |
| 172. | M. Shiratani, K. Koga, Y. Watanabe,Cluster-less plasma CVD reactor and its application to a-Si:H film deposition,Materials Research Society Symposium Proceedings,pp.A5.6.1-A5.6.6,2001.07. |
| 173. | Y. Watanabe, M. Shiratani, K. Koga,Clustering phenomena in low-pressure reactive plasmas: base and applications (invited),Proceedings of International Symposium on Plasma Chemistry,pp.726-730,2001.07. |
| 174. | M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe,Development of H-assisted plasma CVD reactor for Cu interconnects,Proceedings of International Conference on Phenomena in Ionized Gases,pp.147-148,2001.07. |
| 175. | M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe,Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges,Proceedings of International Conference on Phenomena in Ionized Gases,pp.153-154,2001.07. |
| 176. | Y. Watanabe, M. Shiratani, K. Koga,Nucleation and subsequent growth of clusters in reactive plasmas (invited),Proceedings of International Conference on Phenomena in Ionized Gases,pp.15-16,2001.07. |
| 177. | K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe,Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor,Proceedings of International Conference on Phenomena in Ionized Gases,pp.39-40,2001.07. |
| 178. | M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe,H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration,Sci. Technol. Adv. Mater.,Vol.2,No.3-4,pp.505-515,2001.04. |
| 179. | Y. Watanabe, M. Shiratani, K. Koga,Formation kinetics and control of dust particles in capacitively-coupled reactive plasmas (invited),Phys. Scripta,Vol.T89,pp.29-32,2001.01. |
| 180. | M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe,H assisted control of quality and conformality in Cu film deposition using plasma CVD method,Advanced Metallization Conference 2000,pp.271-278,2001.01. |
| 181. | K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe,Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasmas,Proceedings of Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing,pp.385-386,2001.01. |
| 182. | M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe,Behavior of a particle injected in ion sheath,Proceedings of Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing,pp.393-394,2001.01. |
| 183. | M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe,Measurements of surface reaction probability of SiH3,Proceedings of Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing,pp.419-420,2001.01. |
| 184. | M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe,Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition,Proceedings of Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing,pp.421-422,2001.01. |
| 185. | M. Shiratani, K. Koga, Y. Watanabe,Plasma CVD method for Cu interconnects in ULSI (invited),Proceedings of Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing,pp.751-754,2001.01. |
| 186. | K. Koga, Y. Matsuoka, M. Shiratani, Y. Watanabe,In situ observation of nucleation and subsequent growth of clusters in silane rf discharges,Appl. Phys. Lett.,Vol.77,No.2,pp.196-198,2000.07. |
| 187. | M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe,Methods of suppressing cluster growth in silane rf discharges,Materials Research Society Symposium Proceedings,pp.A5.6.1-A5.6.6,2000.07. |
| 188. | H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe,Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source,Materials Research Society Symposium Proceedings,pp.D9.2.1-D9.2.6,2000.07. |
| 189. | R. Ichiki, M. Shindo, S. Yoshimura, K. Koga, Y. Kawai,Propagation characteristics of ion acoustic waves in an Ar/SF6 plasma,Jour. Phys. Soc. Jpn.,Vol.69,No.6,pp.1925-1926,2000.06. |
| 190. | H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe,Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source,Res. Rep. ISEE Kyushu Univ.,Vol.5,No.1,pp.57-61,2000.03. |
| 191. | Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga,Growth processes of particles up to nanometer size in high-frequency SiH4 plasmas,Jour. Technical Phys.,Vol.41,No.1,pp.505-519,2000.01. |
| 192. | M. Shiratani, S. Maeda, K. Koga, Y. Watanabe,Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane rf discharges,Jpn. Jour. Appl. Phys.,Vol.39,No.1,pp.287-293,2000.01. |
| 193. | K. Koga, H. Naitou, Y. Kawai,Observation of Asymmetric Sheath Structure in Multi-Component Plasma Containing Negative Ions,J. Plasma and Fusion Research Series,Vol.2,pp.435-438,1999.12. |
| 194. | K. Koga, H. Naitou, Y. Kawai,Observation of Local Structures in Asymmetric Ion Sheath,Jour. Phys. Soc. Japan,Vol.68,No.5,pp.1578-1584,1999.05. |
| 195. | K. Koga, Y. Kawai,Behavior of the Ion Sheath Instability in a Negative Ion Plasma,Jpn. Jour. Appl. Phys.,Vol.38,No.3A,pp.1553-1557,1999.03. |
Presentations
| 1. | Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering. |
| 2. | Deposition of SiOx-CH3 nano-particles on fine pattern substrate. |
| 3. | Evaluation of the flux of carbon particles generated plasma-carbon wall interaction to substrates. |
| 4. | Current density-voltage characteristics of the sensitized solar cell using Si nanoparticles and Ru dye . |
| 5. | Fabrication of surface-nitrided Si particles by double multi-hollow discharges. |
| 6. | Conductivity of P-doped a-Si:H films deposited using multi-hollow plasma CVD. |
| 7. | Preparation of microcrystalline silicon films under high gas pressure condition. |
| 8. | Deposition of nano-particles onto micro trench substrates. |
| 9. | Mapping of crystallinity of ?c-Si thin films deposited under high gas pressure. |
| 10. | Deposition of B-doped a-Si:H using by SiH4+ B10H14 multi-hollow discharge plasma CVD. |
| 11. | Fabrication of surface nitrided Si particles applying double multi-hollow discharge plasma. |
| 12. | Surface nitridation of silicon particles by double multi-hollow discharges. |
| 13. | Dependence of deposition profile of plasma CVD carbon films on substrate temperature. |
| 14. | Deposition of B doped a-Si:H using SiH4+ B0H4 multi-hollow discharge plasma CVD. |
| 15. | 2-dimensional mapping of crysallinity of μc-Si films deposited under high gas pressure. |
| 16. | Growth rate enhancement of radish sprouts using oxygen plasma. |
| 17. | Effects of Discharge Power Fluctuation on Growth of Nano-Particles in Reactive Plasmas . |
| 18. | Effects of wall potential on flux of dust particles generated due to Interaction between H plasmas and graphite. |
| 19. | Light intensity dependence of photo current of nano-particle sensitized solar cells. |
| 20. | Transport of nanoparticlecloud having a fractional elementary charge by amplitude modulating pulse discharges. |
| 21. | Deposition of P doped a-Si:H in using SiH4+PH3 multi-hollow discharge plasma CVD . |
| 22. | Synthesis of Si nanoparticles using plasma CVD and their application for the third generation photovoltaics . |
| 23. | Mie scattering measurement of growing process of nanotube-clusters under convection-free arc discharge . |
| 24. | Oxidation of cystein using oxygen/water vapor RF plasma . |
| 25. | Electron density measurements of Ar+H2+C7H8 plasmas . |
| 26. | Influence of perturbation of discharge power on ion density . |
| 27. | In-situ sampling of dust particles in LHD using a polyhedral holder . |
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