九州大学 研究者情報
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古閑 一憲(こが かずのり) データ更新日:2019.03.25



主な研究テーマ
高品質太陽光発電材料の高速製造技術の研究
キーワード:アモルファスシリコン
1999.04.
第4世代プラズマバイオテクノロジーの創成
キーワード:細胞活性制御
2009.04.
プロセスプラズマ中の微粒子成長機構の解明と成長制御の研究
キーワード:プロセスプラズマ,微粒子
1999.04.
プラズマ・カーボン壁相互作用による微粒子形成機構の研究
キーワード:プラズマ・壁相互作用,核融合
2001.01.
次世代LSI用銅配線技術の開発
キーワード:銅配線
1999.04.
次世代LSI用低誘電率層間絶縁膜形成技術の開発
キーワード:低誘電率層間絶縁膜
2002.01.
従事しているプロジェクト研究
革新的次世代太陽光発電システム技術研究開発
2000.06~2001.03, 代表者:松田彰久, 産業技術総合研究所, 産業技術総合研究所,九州大学,凸版印刷,スタンレー電気,日本板硝子
本研究は,九州大学,産業技術総合研究所,凸版印刷,スタンレー電気,日本板硝子が共同で行うものであり,全体としては,薄膜シリコン系スタック型太陽電池において、従来トップセル材料として用いられてきたアモルファスシリコンが持つ光劣化の問題を根本的に解決する革新的材料、ナノ構造制御シリコンを開発し、それを用いた低コスト高効率太陽電池製造技術を確立し、モジュールコストを50円/W以下を可能とする指針を得ることを目的としている.
 九州大学の分担内容は,九州大学プラズマ研究室で開発したSi微粒子成長制御法と微粒子観測技術をもとに,上述のナノ構造制御シリコン太陽電池を作製する際に必要となるナノ構造制御シリコン材料の開発を行うことを目的としている..
研究業績
主要著書
1. 古閑一憲, 白谷正治, 節原裕一, 関根誠, 堀勝, プラズマ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜 (特集 革新的プラズマ科学の新潮流), 化学工業, 63,12,908-912, 2012.12.
2. 内田儀一郎, 古閑一憲, 白谷正治, ダブルマルチホロー放電プラズマCVDによる窒化シリコンナノ粒子の生成と量子ドット増感型太陽電池への応用 (高効率太陽電池 化合物・集光型・量子ドット型・Si・有機系・その他新材料), 株式会社エヌ・ティー・エス, 第3章, 2, 2012.05, [URL].
3. 芦川直子, 古閑一憲, ダスト(微粒子)を分析する~ミクロン・ナノメータの微細な世界~, 核融合科学研究所, 核融合科学研究所ニュース,2011年10月・2011年11月号,202, 2011.10, [URL].
4. 古閑一憲、内田儀一郎、白谷正治、布村正太、渡辺征夫, プロセスプラズマ中の微粒子の凝集と輸送 (「プラズマと微粒子」研究の諸分野における進展), プラズマ・核融合学会誌, プラズマ・核融合学会誌,87,2,99-104, 2011.02.
5. Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 20, pp.247-257, 2010.05, [URL].
6. Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani, Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 31, pp.377-383, 2010.05, [URL].
7. 白谷正治, 古閑一憲, 光劣化しない革新的アモルファスシリコン太陽電池の作製をめざして (次世代シリコン太陽電池製造のためのプラズマ技術), プラズマ・核融合学会誌, プラズマ・核融合学会誌,86,1,33-36, 2010.01.
主要原著論文
1. S. Toko, R. Katayama, K. Koga, E. Leal-Quiros, M. Shiratani , Dependence of CO2 Conversion to CH4 on CO2 Flow Rate in Helicon Discharge Plasma, Sci. Adv. Mater., 10.1166/sam.2018.3141, 10, 5, 655-659, 2018.05, [URL].
2. H. Seo, D. Sakamoto, H. Chou, N. Itagaki, K. Koga, M. Shiratani , Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction, Progress in Photovoltaics: Research and Applications, 10.1002/pip.2961, 26, 2, 145-150, 2018.02, [URL].
3. 徐鉉雄, 板垣奈穂, 古閑一憲, 白谷正治, 色素増感太陽電池のポリマー対向電極における触媒反応の活性化, 信学技報 (IEICE Technical Report), 117, 334, 27-29, 2017.12.
4. T. Kawasaki, G. Kuroeda, R. Sei, M. Yamaguchi, R. Yoshinaga, R. Yamashita, H. Tasaki, K. Koga, M. Shiratani, Transportation of reactive oxygen species in a tissue phantom after plasma irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.57.01AG01, 57, 1S, 01AG01, 2017.11, [URL].
5. S. Tanami, D. Ichida, S. Hashimoto, H. Seo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition, Thin Solid Films , 10.1016/j.tsf.2017.02.067 , 641, 59-64, 2017.11, [URL].
6. S. Toko, K. Keya, Y. Torigoe, T. Kojima, H. Seo, N. Itagaki, K. Koga, M. Shiratani , Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.01.034, 326, Part B, 388-394, 2017.10, [URL].
7. P. Attri, M. Kim, E. H. Choi, A. E. Cho, K. Koga, M. Shiratani, Impact of an ionic liquid on protein thermodynamics in the presence of cold atmospheric plasma and gamma rays, Phys. Chem. Chem. Phys., 10.1039/c7cp04083k, 19, 37, 25277-25288, 2017.10, [URL].
8. H. Seo, C. V.V.M. Gopi, H.-J. Kim, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst, Electrochimica Acta, 10.1016/j.electacta.2017.08.030, 249, 337-342, 2017.09, [URL].
9. P. Attri, M. Kim, T. Sarinont, E. H. Choi, H. Seo, A. E. Cho, K. Koga, M. Shiratani, The protective action of osmolytes on the deleterious effects of gamma rays and atmospheric pressure plasma on protein conformational changes, Scientific Reports, 10.1038/s41598-017-08643-1, 7, 8698, 2017.08, [URL].
10. K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body , ECS Transactions, 10.1149/07703.0017ecst, 77, 3, 17-24, 2017.05, [URL].
11. 古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用, 信学技報 (IEICE Technical Report), 117, 8, 5-8, 2017.04.
12. T. Sarinont, R. Katayama, Y. Wada, K. Koga, M. Shiratani, Plant Growth Enhancement of Seeds Immersed in Plasma Activated Water, MRS Advances, 10.1557/adv.2017.178, 2, 18, 995-1000, 2017.02, [URL].
13. K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Densities and surface reaction probabilities of oxygen and nitrogen atoms during sputter deposition of ZnInON on ZnO, IEEE Trans. Plasma Science, 10.1109/TPS.2016.2632124, 45, 2, 323-327, 2017.01, [URL].
14. T. Sarinont, Y. Wada, K. Koga, M. Shiratani, Response of Silkworm Larvae to Atmospheric Pressure Non-thermal Plasma Irradiation, Plasma Medicine, 10.1615/PlasmaMed.2017019137 , 6, 3-4, 2017.01, [URL].
15. K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki , Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization, MRS Advances, 10.1557/adv.2016.617, 2, 5, 265-270, 2016.12, [URL].
16. K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Blue Photoluminescence of (ZnO)0.92(InN)0.08, MRS Advances, 10.1557/adv.2016.625P, 2, 5, 277-282, 2016.12, [URL].
17. G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara, Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water, J. Appl. Phys., 10.1063/1.4968568, 120, 20, 203302-1 - 203302-9, 2016.11, [URL].
18. M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga , Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication, Materials Science Forum, 10.4028/www.scientific.net/MSF.879.1772, 879, 1772-1777 , 2016.11, [URL].
19. S. Toko, Y. Kanemitsu, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.13233, 16, 10, 10753-10757, 2016.10, [URL].
20. T. Sarinont, T. Amano, P. Attri, K. Koga, N. Hayashi, M. Shiratani, Effects of plasma irradiation using various feeding gases on growth of Raphanus sativus L. , Arch. Biochem. Biophys., 10.1016/j.abb.2016.03.024 , 605, 129-140, 2016.09, [URL].
21. H. Seo, M. K. Son, S. Hashimoto, T. Takasaki, N. Itagaki, K. Koga, M. Shiratani, Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells, Electrochimica Acta, 10.1016/j.electacta.2016.06.020, 210, 880-887, 2016.08, [URL].
22. H. Seo, S. H. Nam, N. Itagaki, K. Koga, M. Shiratani, and J.-H. Boo, Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells, Electron. Mater. Lett., 10.1007/s13391-016-4018-8, 12, 4, 530-536, 2016.07, [URL].
23. K. Keya, T. Kojima, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.07LE03, 55, 7S2, 07LE03, 2016.07, [URL].
24. T. Kawasaki, S. Kusumegi, A. Kudo, T. Sakanoshita, T. Tsurumaru, A. Sato, G. Uchida, K. Koga and M. Shiratani, Effects of irradiation distance on supply of reactive oxygen species to the bottom of a Petri dish filled with liquid by an atmospheric O2/He plasma jet, J. Appl. Phys., 10.1063/1.4948430, 119, 173301, 2016.05, [URL].
25. H. Seo, D. Ichida, S. Hashimoto, N. Itagaki, K. Koga, M. Shiratani, S. H. Nam and J. H. Boo , Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12210, 16, 5, 4875-4879, 2016.05, [URL].
26. M. Shiratani, T. Sarinont, K. Koga and N. Hayashi, R&D status of agricultural applications of high voltage and plasma in Japan, Proc. Workshop on Application of Advanced Plasma Technologies in CE Agriculture, 29-30, 2016.04.
27. H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani , Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition, Sci. Adv. Mater., 10.1166/sam.2016.2520, 8, 3, 636-639, 2016.03, [URL].
28. H. Seo, M.-K. Son, N. Itagaki, K. Koga, M. Shiratani, Polymer Counter Electrode of Poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) Containing TiO2 Nano-particles for Dye-sensitized Solar Cells, Journal of Power Sources, 10.1016/j.jpowsour.2015.12.112, 307, 25-30, 2016.03, [URL].
29. K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering, MRS Advances, 10.1557/adv.2015.59, 1, 2, 115-119, 2016.01, [URL].
30. T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Production of In, Au, and Pt nanoparticles by discharge plasmas in water for assessment of their bio-compatibility and toxicity, MRS Advances, 10.1557/adv.2016.41, 1, 18, 1301-1306, 2016.01, [URL].
31. M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga, Plant Growth Response to Atmospheric Air Plasma Treatments of Seeds of 5 Plant Species, MRS Advances, 10.1557/adv.2016.37, 1, 18, 1265-1269, 2016.01, [URL].
32. 白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価, 九州大学超顕微解析研究センター報告, 39, 116-117, 2015.12.
33. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, N. Hayashi, M. Shiratani, Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.), Appl. Phys. Express, 10.7567/APEX.9.016201, 9, 016201, 2015.12, [URL].
34. P. Attri, T. Sarinont, M. Kim, T. Amano, K. Koga, A. E. Cho, E. Choi, M. Shiratani, Influence of ionic liquid and ionic salt on protein against the reactive species generated using dielectric barrier discharge plasma , Scientific Reports, 10.1038/srep17781, 5, 17781 , 2015.12, [URL].
35. G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the discharge characteristics of a plasma jet impinging onto the liquid surface, IEEE Trans. Plasma Science, 10.1109/TPS.2015.2488619, 43, 12, 4081-4087, 2015.12, [URL].
36. S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Effects of Gas Flow Rate on Deposition Rate and Amount of Si Clusters Incorporated into a-Si:H Films, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA19, 55, 1S, 01AA19, 2015.12, [URL].
37. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA11, 55, 1S, 01AA11, 2015.11, [URL].
38. T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Synthesis of Indium-Containing Nanoparticles in Aqueous Suspension Using Plasmas in Water for Evaluating Their Kinetics in Living Body, J. Nanosci. Nanotechnol., 10.1166/jnn.2015.11427, 15, 11, 9298-9302, 2015.11, [URL].
39. H. Seo, S. Hashimoto, D. Ichida, N. Itagaki, K. Koga and M. Shiratani , Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode, Electrochimica Acta, 10.1016/j.electacta.2015.04.105, 179, 206-210, 2015.10, [URL].
40. M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani, Attraction during binary collision of fine particles in Ar plasma, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.18, 2015.10, [URL].
41. T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki, Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.49, 2015.10, [URL].
42. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.145, 2015.10, [URL].
43. S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.149, 2015.10, [URL].
44. T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.150, 2015.10, [URL].
45. S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.152, 2015.10, [URL].
46. K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.154, 2015.10, [URL].
47. T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.155, 2015.10, [URL].
48. R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group, Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.101, 2015.10, [URL].
49. D. Yamashita, M. Soejima, T. Ito, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Laser trapped single fine particle as a probe of plasma parameters, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.104, 2015.10, [URL].
50. Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of electrode structure on characteristics of multi-hollow discharges, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.129, 2015.10, [URL].
51. K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.132, 2015.10, [URL].
52. S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.133, 2015.10, [URL].
53. T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani, Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.136, 2015.10, [URL].
54. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.143, 2015.10, [URL].
55. T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka, Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.158, 2015.10, [URL].
56. Y. Setsuhara, G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Discharge characteristics and hydrodynamics behaviors of atmospheric plasma jets produced in various gas flow patterns, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.58, 2015.10, [URL].
57. G. Uchida, A. Nakajima, T. Kawasaki, K. Koga, K. Takenaka, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, TF1.2, 2015.10, [URL].
58. M. Tateishi, K. Koga, R. Katayama, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experiment Group, Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances, J. Nucl. Mater. , 10.1016/j.jnucmat.2014.10.049, 463, 865–868, 2015.08, [URL].
59. S. Toko, Y. Torigoe, W. Chen, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability, Thin Solid Films, 10.1016/j.tsf.2015.02.052 , 587, 126-131, 2015.07, [URL].
60. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.40.123, 40, 2, 123-128, 2015.07, [URL].
61. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of ZnInON/ZnO multi-quantum well solar cells, Thin Solid Films, 10.1016/j.tsf.2015.01.012, 587, 106-111, 2015.07, [URL].
62. A. Nakajima, G. Uchida, T. Kawasaki, K. Koga, T. Sarinont, T. Amano, K. Takenaka, M. Shiratani, Y. Setsuhara, Effects of gas flow on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation, J. Appl. Phys., 10.1063/1.4927217, 118, 4, 043301, 2015.07, [URL].
63. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.248, 1741, aa09-10, 2015.03, [URL].
64. N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, ZnO-based semiconductors with tunable band gap for solar sell applications, Proc. SPIE photonics west 2015, 10.1117/12.2078114, 9364, 93640P, 2015.03, [URL].
65. T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.87, 1741, aa09-12, 2015.02, [URL].
66. A. Tanaka, M. Hirata, N. Matsumura, K. Koga, M. Shiratani, Y. Kiyohara, Comparative Study on the Pulmonary Toxicity of Indium Hydroxide, Indium-Tin Oxide, and Indium Oxide Following Intratracheal Instillations into the Lungs of Rats, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.21, 1723, g02-03, 2015.02, [URL].
67. T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Air Plasma Irradiation to Seeds of Radish Sprouts on Chlorophyll and Carotenoids Concentrations in their Leaves, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.39, 1723, g02-04, 2015.02, [URL].
68. T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Multigeneration Effects of Plasma Irradiation to Seeds of Arabidopsis Thaliana and Zinnia on Their Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.12, 1723, g03-04, 2015.01, [URL].
69. H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.01AD02, 54, 1S, 01AD02, 2015.01, [URL].
70. 内田儀一郎, 市田大樹, 徐鉉雄, 古閑一憲, 白谷正治, 反応性微粒子プラズマプロセスを用いたゲルマニウム結晶ナノ粒子含有膜の堆積と量子ドット太陽電池への応用, スマートプロセス学会誌, 4, 1, 6-11, 2015.01.
71. N. Itagaki, K. Matsushima, D. Yamashia, H. Seo, K. Koga, M. Shiratani, Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap, Mater. Res. Express, 10.1088/2053-1591/1/3/036405, 1, 3, 036405, 2014.09, [URL].
72. H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.39.321, 39, 3, 321-324, 2014.09, [URL].
73. N. Itagaki, K. Kuwahara, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method, Opt. Engineering, 10.1117/1.OE.53.8.087109, 53, 8, 087109, 2014.08, [URL].
74. S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Dust Hour Glass in a Capacitive RF Discharge , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2343975 , 42, 10, 2672-2673, 2014.08, [URL].
75. M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara, SiC Nanoparticle Composite Anode for Li-Ion Batteries, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2014.742, 1678, n08-58, 2014.07, [URL].
76. S. Kitazaki, T. Sarinont, K. Koga, N. Hayashi, M. Shiratani, Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas, Curr. Appl. Phys., 10.1016/j.cap.2013.11.056, 14, 2, S149–S153, 2014.07, [URL].
77. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, T. Shimizu, G. Uchida, K. Koga, M. Shiratani, Visualization of the Distribution of Oxidizing Substances in an Atmospheric Pressure Plasma Jet , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2325038, 42, 10, 2482-2483, 2014.06, [URL].
78. D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012002, 518, 1, 012002, 2014.06, [URL].
79. Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012007, 518, 1, 012007, 2014.06, [URL].
80. S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012008, 518, 1, 012008, 2014.06, [URL].
81. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group, Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012009, 518, 1, 012009, 2014.06, [URL].
82. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori, Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence , J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012010, 518, 1, 012010, 2014.06, [URL].
83. T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani, Plasma etching of single fine particle trapped in Ar plasma by optical tweezers, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012014, 518, 1, 012014, 2014.06, [URL].
84. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Control of the area irradiated by the sheet-type plasma jet in atmospheric pressure, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012016, 518, 1, 012016, 2014.06, [URL].
85. T. Sarinont, T. Amano, S. Kitazaki, K. Koga, G. Uchida, M. Shiratani and N. Hayashi, Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012017, 518, 1, 012017, 2014.06, [URL].
86. K. Koga, X. Dong, S. Iwashita, U. Czarnetzki and M. Shiratani, Formation of carbon nanoparticle using Ar+CH4 high pressure nanosecond discharges, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012020, 518, 1, 012020, 2014.06, [URL].
87. M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, and K. Kamataki, Nanostructure Control of Si and Ge Quantum Dots Based Solar Cells Using Plasma Processes, Materials Science Forum, 10.4028/www.scientific.net/MSF.783-786.2022, 783-786, 2022-2027, 2014.05, [URL].
88. H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance dependence of Si quantum dot-sensitized solar cells on counter electrode, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FZ01, 53, 5S1, 05FZ01, 2014.05, [URL].
89. H. Seo, M. Son, S. Park, M. Jeong, H. Kim, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell, Thin Solid Films, 10.1016/j.tsf.2013.08.103, 554, 122-126, 2014.03, [URL].
90. N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization, Proc. SPIE photonics west 2014, 10.1117/12.2041081 , 8987, 89871A, 2014.03, [URL].
91. G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015080, 1, 015080, 2014.03, [URL].
92. M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga, Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015083, 1, 015083, 2014.03, [URL].
93. G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015082, 1, 015082, 2014.03, [URL].
94. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015020, 1, 015020, 2014.03, [URL].
95. S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, and M. Shiratani, Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015069, 1, 015069, 2014.03, [URL].
96. X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori, Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015072, 1, 015072, 2014.03, [URL].
97. I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, and N. Itagaki, Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015064, 1, 015064, 2014.03, [URL].
98. T. Sarinont, K. Koga, S. Kitazaki, G. Uchida, N. Hayashi, M. Shiratani, Effects of Atmospheric Air Plasma Irradiation on pH of Water, JPS Conf. Proc., 10.7566/JPSCP.1.015078, 1, 015078, 2014.03, [URL].
99. H. Seo, D. Ichida, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells, Int. J. Precision Eng. Manuf., 10.1007/s12541-014-0343-8, 15, 2, 339-343, 2014.02, [URL].
100. Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P35, 2014.02.
101. S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P32, 2014.02.
102. Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P36, 2014.02.
103. D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P33, 2014.02.
104. Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P37, 2014.02.
105. Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S02-P10, 2014.02.
106. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P02, 2014.02.
107. S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P17, 2014.02.
108. K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P07, 2014.02.
109. T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-SPD-P01, 2014.02.
110. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori, Pressure dependence of carbon film deposition using H-assisted plasma CVD, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P14, 2014.02.
111. D. Yamashita, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Raman spectroscopy of a fine particle optically trapped in plasma, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P23, 2014.02.
112. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Spatial profile of flux of dust particles in hydrogen helicon plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P21, 2014.02.
113. R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P03, 2014.02.
114. I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P05, 2014.02.
115. A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida, Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S2-P35, 2014.02.
116. M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida, A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 4B-PM-O1, 2014.02.
117. T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S08-P10, 2014.02.
118. G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani, Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries, Proc. 8th Int. Conf. Reactive Plasmas, 4C-PM-O1, 2014.02.
119. H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Quantum characterization and photovoltaic application of Si nano-particles fabricated by multi-hollow plasma discharge chemical vapor deposition, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S11-P36, 2014.02.
120. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-14, 2014.02.
121. T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P19, 2014.02.
122. K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A4, 2014.02.
123. T. Sarinont, K. Koga, S. Kitazaki, M. Shiratani, N. Hayashi, Effects of growth enhancement by plasma irradiation to seeds in water, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P32, 2014.02.
124. T. Amano, T. Sarinont, S. Kitazaki, N. Hayashi, K. Koga, M. Shiratani, Long term growth of radish sprouts after atmospheric pressure DBD plasma irradiation to seeds, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P33, 2014.02.
125. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Visualization of oxidizing substances generated by atmospheric pressure non-thermal plasma jet with water, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S09-P25, 2014.02.
126. M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, G. Uchida, H. Seo, and N. Itagaki, Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010201, 53, 1, 010201, 2014.01, [URL].
127. G. Uchida, Y. Wang, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA05, 52, 11NA05, 2013.11, [URL].
128. Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani, Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si and SiH, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA07, 52, 11NA07, 2013.11, [URL].
129. K. Koga, M. Tateishi, K. Nishiyama, G. Uchida, K. Kamataki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, Akiko Sagara, the LHD Experimental Group, Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA08, 52, 11NA08, 2013.11, [URL].
130. H. Seo, Y. Wang, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, S. Nam, J. Boo, Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO2, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM02, 52, 11NM02, 2013.11, [URL].
131. K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 eV to 3.3 eV on ZnO Templates, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM06, 52, 11NM06, 2013.11, [URL].
132. H. Seo, Y. Wang, M. Sato, G. Uchida, K. Koga, N. Itagaki, K. Kamataki, M. Shiratani, The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si, Thin Solid Films, 10.1016/j.tsf.2013.04.073, 546, 284-288, 2013.11, [URL].
133. I. Suhariadi, K. Oshikawa, K. Kuwahara, K. Matsushima, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NB03, 52, 11NB03, 2013.11, [URL].
134. H. Seo, M. Son, H. Kim, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys., 10.7567/JJAP.52.10MB07, 57, 10MB07(5pages) , 2013.10, [URL].
135. G. Uchida, M. Sato, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells, Thin Solid Films, 10.1016/j.tsf.2013.04.111, 544, 93-98, 2013.10, [URL].
136. 白谷正治, 古閑一憲, 内田儀一郎, Hyunwoong Seo, 板垣奈穂, 岩下伸也, ナノ材料のプラズマプロセシングの研究の現状と将来 , 表面科学, 34, 10, 520, 2013.10, [URL].
137. O. Kaneko, H. Yamada, S. Inagaki, M. Jakubowski, S. Kajita, S. Kitajima, Kobayashi, K. Koga, T. Morisaki, S. Morita, T. Mutoh, S. Sakakibara, Y. Suzuki, H. Takahashi, K. Tanaka, K. Toi, Y. Yoshimura, T. Akiyama, Y. Asahi, N. Ashikawa, H. Chikaraishi, A. Cooper, D.S. Darrow, E. Drapiko, P. Drewelow, X. Du, A. Ejiri, M. Emoto, T. Evans N. Ezumi, K. Fujii, T. Fukuda, H. Funaba, M. Furukawa, D.A. Gates, M. Goto, T. Goto, W. Guttenfelder, S. Hamaguchi, M. Hasuo, T. Hino, Y. Hirooka, K. Ichiguchi, K. Ida, H. Idei, T. Ido, H. Igami, K. Ikeda, S. Imagawa, T. Imai, M. Isobe, M. Itagaki, T. Ito, K. Itoh, S. Itoh, A. Iwamoto, K. Kamiya, T. Kariya, H. Kasahara, N. Kasuya, D. Kato, T. Kato, K. Kawahata, F. Koike, S. Kubo, R. Kumazawa, D. Kuwahara, S. Lazerson, H. Lee, S. Masuzaki, S. Matsuoka, H. Matsuura, A. Matsuyama, C. Michael, D. Mikkelsen, O. Mitarai, T. Mito, J. Miyazawa, G. Motojima, K. Mukai, A. Murakami, I. Murakami, S. Murakami, T. Muroga, S. Muto, K. Nagaoka, K. Nagasaki, Y. Nagayama, N. Nakajima, H. Nakamura, Y. Nakamura, H. Nakanishi, H. Nakano, T. Nakano, K. Narihara, Y. Narushima, K. Nishimura, S. Nishimura, M. Nishiura, Y.M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, N. Ohno, N. Ohyabu, T. Oishi, M. Okamoto, A. Okamoto, M. Osakabe, Y. Oya1, T. Ozaki, N. Pablant, B.J. Peterson, A. Sagara, K. Saito, R. Sakamoto, H. Sakaue, M. Sasao2, K. Sato, M. Sato, K. Sawada, R. Seki, T. Seki, V. Sergeev, S. Sharapov, I. Sharov, A. Shimizu, T. Shimozuma, M. Shiratani, M. Shoji, S. Sudo, H. Sugama, C. Suzuki, K. Takahata, Y. Takeiri, Y. Takemura, M. Takeuchi9, H. Tamura, N. Tamura, H. Tanaka, T. Tanaka, M. Tingfeng, Y. Todo, M. Tokitani, K. Tokunaga, T. Tokuzawa, H. Tsuchiya, K. Tsumori, Y. Ueda, L. Vyacheslavov, K.Y. Watanabe, T. Watanabe, T.H. Watanabe, B. Wieland, I. Yamada, S. Yamada, S. Yamamoto, N. Yanagi, R. Yasuhara, M. Yokoyama, N. Yoshida, S. Yoshimura, T. Yoshinaga, M. Yoshinuma and A. Komori, Extension of operation regimes and investigation of three-dimensional currentless plasmas in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/53/10/104015, 53, 10, 104015, 2013.10, [URL].
138. Y. Kim, T. Matsunaga, K. Nakahara, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.04.029, 228, 1, S550–S553, 2013.08, [URL].
139. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Mass density control of carbon films deposited by H-assisted plasma CVD method, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.10.002, 228, 1, S15–S18, 2013.08, [URL].
140. K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, and H. Kersten, Discharge power dependence of carbon dust flux in a divertor simulator, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.169, 438, S788–S791, 2013.07, [URL].
141. K. Koga, K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.154, 438, S727–S730, 2013.07, [URL].
142. Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Observation of nanoparticle growth process using a high speed camera, ISPC 21 Proceedings, 2013.07, [URL].
143. S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Transport control of dust particles via the Electrical Asymmetry Effect: experiment, simulation, and modeling, J. Phys. D: Appl. Phys., 46, 245202, 2013.06, [URL].
144. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Growth control of ZnO nano-rod with various seeds and photovoltaic application, J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012029, 441, 1, 012029, 2013.06, [URL].
145. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells, Electrochimica Acta, 10.1016/j.electacta.2013.02.026, 95, 1, 43-47, 2013.04, [URL].
146. N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 84-87, 2013.03, [URL].
147. K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Control of Deposition Profile and Properties of Plasma CVD Carbon Films, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 136-139, 2013.03, [URL].
148. M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 100-103, 2013.03, [URL].
149. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell, Electrochimica Acta, 10.1016/j.electacta.2012.09.087, 87, 1, 213-217, 2013.01, [URL].
150. S. Iwashita, K. Nishiyama, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Dust particle formation due to interaction between graphite and helicon deuterium plasmas, Fusion Engineering and Design, 10.1016/j.fusengdes.2012.10.002, 88, 1, 28-32, 2013.01, [URL].
151. H. Seo, Y. Wang, M. Sato, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD05, 52, 1, 01AD05(5pages), 2013.01, [URL].
152. Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, M. Shiratani, High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD01, 52, 1, 01AD01(4pages), 2013.01, [URL].
153. I. Suhariadi, K. Matsushima, K. Kuwahara, K. Oshikawa, D. Yamashita, H. Seo, G. Uchida, K. Kamtaki, K. Koga, M. Shiratani, S. Bornholdt, H. Kersten, Harm Wulff, N. Itagaki, Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AC08, 52, 1, 01AC08(5pages), 2013.01, [URL].
154. T. Urakawa, R. Torigoe, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, K. Takeda, M. Sekine, M. Hori, H-2/N-2 plasma etching rate of carbon films deposited by H-assisted plasma CVD, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AB01, 52, 1, 01AB01(4pages), 2013.01, [URL].
155. Y. Kim, T. Matsunaga, K. Nakahara ,G. Uchida, K. Kamataki , N. Itagaki, H. Seo, K. Koga, M. Shiratani , Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD , Thin Solid Films, 10.1016/j.tsf.2012.06.023, 523, 29-33, 2012.11, [URL].
156. K. Kamataki, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage, Thin Solid Films, 10.1016/j.tsf.2012.07.059, 523, 76-79, 2012.11, [URL].
157. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Control of Dry Yeast Using Scalable Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.11PJ02, 51, 11, 11PJ02(5pages), 2012.11, [URL].
158. N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors (Invited), Proc. International Symposium on Dry Process, 34, 97-98, 2012.11.
159. I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani, ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.37.165, 37, 2, 165-168, 2012.06, [URL].
160. A. Tanaka, M. Hirata, M. Shiratani, K. Koga, Y. Kiyohara, Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats, Journal of Occupational Health, 10.1539/joh.11-0164-OA, 54, 3, 187-195, 2012.06, [URL].
161. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers, Thin Solid Films, 10.1016/j.tsf.2011.10.136, 520, 14, 4674-4677, 2012.05, [URL].
162. K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki , In situ analysis of size dispersion of nano-particles in reactive plasma using two dimentional laser light scattering method, Journal of Instrumentation, 10.1088/1748-0221/7/04/C04017, 7, 4, C04017, 2012.04, [URL].
163. M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.1245, 1426, 377-382, 2012.04, [URL].
164. Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.839, 1426, 307-311, 2012.04, [URL].
165. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.890, 1426, 313-318, 2012.04, [URL].
166. Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga and M. Shiratani, Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.970, 1469, ww06-10, 2012.04, [URL].
167. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.969, 1469, ww06-08, 2012.04, [URL].
168. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.966, 1469, ww02-08, 2012.04, [URL].
169. K. Koga, K. Nakahara, Y. Kim, T. Matsunaga, D.Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD03, 51, 1, 01AD03(4pages), 2012.01, [URL].
170. G. Uchida, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD01, 51, 1, 01AD01(5pages), 2012.01, [URL].
171. K. Koga, T. Matsunaga, Y. Kim, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, and M. Shiratani, Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD02, 51, 1, 01AD02(4pages), 2012.01, [URL].
172. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Enhancement of Radish Sprouts Induced by Low Pressure O2 Radio Frequency Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AE01, 51, 1, 01AE01(4pages), 2012.01, [URL].
173. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering, Proc. Plasma Conf. 2011, 24G16, 2011.11.
174. N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization, Proc. PVSEC-21, 4D-2P-10, 2011.11.
175. Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste, Proc. PVSEC-21, 3D-5P-09, 2011.11.
176. Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer, Proc. Intern. Symp. on Dry Process, 33, 133-134, 2011.11, [URL].
177. K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure, Proc. Plasma Conf. 2011, 23G03, 2011.11.
178. Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD, Proc. Plasma Conf. 2011, 23P013-O, 2011.11.
179. M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD, Proc. Plasma Conf. 2011, 24G06, 2011.11.
180. K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free a-Si:H films using cluster eliminating filter, Proc. Plasma Conf. 2011, 24P010-O, 2011.11.
181. Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD, Proc. Plasma Conf. 2011, 24P011-O, 2011.11.
182. K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten, Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage, Proc. Plasma Conf. 2011, 24P094-O, 2011.11.
183. K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD, Proc. Plasma Conf. 2011, 24P014-O, 2011.11.
184. T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition, Proc. Plasma Conf. 2011, 24P015-O, 2011.11.
185. K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method, Proc. Plasma Conf. 2011, 24P016-O, 2011.11.
186. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H., G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films, Proc. Plasma Conf. 2011, 24P008-O, 2011.11.
187. Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd, Proc. PVSEC-21, 3D-2P-09, 2011.11.
188. K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-20, 2011.11.
189. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers, Proc. PVSEC-21, 4D-2P-11, 2011.11.
190. T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films, Proc. PVSEC-21, 4D-2P-16, 2011.11.
191. M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga, M. Shiratani, Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges, Proc. PVSEC-21, 3D-5P-12, 2011.11.
192. M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga and M. Shiratani, Deposition of FeSi2 nano-particle film, Proc. Plasma Conf. 2011, 24P009-O, 2011.11.
193. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon, Proc. Intern. Symp. on Dry Process, 33, 123-124, 2011.11, [URL].
194. N. Hayashi, Y. Akiyoshi, S. Kitazaki, K. Koga, M. Shiratani, Influence of active oxygen species produced by atmospheric torch plasma on plant growth, Proc. Intern. Symp. on Dry Process, 33, 135-136, 2011.11, [URL].
195. K. Hatozaki, K. Nakahara, G. Uchida, K. Koga, M. Shiratani, Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-18, 2011.11.
196. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation, Proc. Plasma Conf. 2011, 23P018-O, 2011.11.
197. T. Mieno, K. Koga, M. Shiratani, Production Process of Carbon Nanotube Coagulates, Proc. Plasma Conf. 2011, 24F08, 2011.11.
198. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor, Proc. Plasma Conf. 2011, 24P007-O, 2011.11.
199. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, M. Shiratani, Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasma, Appl. Phys. Express, 10.1143/APEX.4.105001, 4, 10, 105001(3pages), 2011.10, [URL].
200. K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method, Physica Status Solidi (c), 10.1002/pssc.201100229, 8, 10, 3013-3016, 2011.10, [URL].
201. G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD, Physica Status Solidi (c), 10.1002/pssc.201001230, 8, 10, 3017-3020, 2011.10, [URL].
202. G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye, Physica Status Solidi (c), 10.1002/pssc.201100166, 8, 10, 3021-3024, 2011.10, [URL].
203. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma , Proc. of International Conference on Phenomena in Ionized Gases(ICPIG) 2011 Conference, D13-318, 2011.09.
204. K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film, Thin Solid Films, 10.1016/j.tsf.2011.01.408, 519, 20, 6896-6898, 2011.08, [URL].
205. N. Hayashi, A. Nakahigashi, M. Goto, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge, Jpn. J. Appl. Phys., 10.1143/JJAP.50.08JF04, 50, 8, 08JF04, 2011.08, [URL].
206. Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry (ISPC20), POL08, 2011.07.
207. T. Urakawa, T. Nomura, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry (ISPC20), POL02, 2011.07.
208. M. Shiratani, K. Koga, S. Iwashita, G. Uchida, N. Itagaki, K. Kamataki, Nano-factories in plasma: present status and outlook, J. Phys. D: Appl. Phys., 10.1088/0022-3727/44/17/174038 , 44, 17, 174038, 2011.05, [URL].
209. K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics, International Conference on Advances in Condensed and Nano Materials (ICACNM), 10.1063/1.3653600, 1393, 27-30, 2011.02, [URL].
210. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase, Appl. Phys. Express, 10.1143/APEX.4.011101, 4, 1, 011101-011101-3 , 2011.01, [URL].
211. W. M. Nakamura, H. Matsuzaki, H. Sato, Y. Kawashima, K. Koga, M. Shiratani, High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.07.081, 205, 1, S241-S245 , 2010.12, [URL].
212. 内田儀一郎, 古閑一憲, 白谷正治, マルチホロー放電プラズマCVDによる量子ドット増感太陽電池用シリコンナノ結晶粒子の作製, ケミカルエンジニヤリング, 55, 12, 947-954, 2010.12, [URL].
213. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5685920, XII-XVI , 2010.11, [URL], プラズマナノテクノロジーで最重要課題となっている揺らぎの制御に関する現状と将来を展望した論文。.
214. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686456, 1943-1947, 2010.11, [URL].
215. G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686704, 2199-2201, 2010.11, [URL].
216. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686686, 2216-2218, 2010.11, [URL].
217. T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686679 , 2219-2212, 2010.11, [URL].
218. H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles, Proc. of International Symposium on Dry Process, P1-A17, 2010.11.
219. G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges , Proc. of MNC2010, 12D-11-66 , 2010.11.
220. Y. Akiyoshi, A. Nakahigashi, N. Hayashi, S. Kitazaki, Takuro Iwao, K. Koga, M. Shiratani, Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686467, 1957-1959, 2010.11, [URL].
221. S. Kitazaki, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Growth Stimulation of Radish Sprouts Using Discharge Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686474, 1960-1963, 2010.11, [URL].
222. T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686688, 2213-2215, 2010.11, [URL].
223. Y. Kawashima, K. Yamamoto, M. Sato, T. Matsunaga, K. Nakahara, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686677, 2222-2224, 2010.11, [URL].
224. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00087, 2010.10.
225. T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00089, 2010.10.
226. G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00093, 2010.10.
227. H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group , Carbon dust particles generated due to H2 plasma-carbon wall interaction, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00114, 2010.10.
228. A. Nakahigashi, Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, KWP.00008, 2010.10.
229. T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Plasma parameter measurements of Ar+H2+C7H8 plasma in H-assisted plasma CVD reactor, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, DTP.00173, 2010.10.
230. Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Quantum dot-sensitized solar cells using Si nanoparticles, Trans. Mater. Res. Soc. Jpn., 35, 3, 597-599, 2010.09, [URL].
231. Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5617205, 3347-3351, 2010.07, [URL].
232. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616514, 3722-3755, 2010.07, [URL].
233. K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616502, 3718-3721, 2010.07, [URL].
234. A. Tanaka, M. Hirata, Y. Kiyohara, M. Nakano, K. Omae, M. Shiratani, K. Koga, Review of pulmonary toxicity of indium compounds to animals and humans, Thin Solid Films, 10.1016/j.tsf.2009.10.123, 518, 11, 2934-2936, 2010.03, [URL].
235. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, Proc. of the 27th symposium on plasma processing, A5-06, 91-92, 2010.02.
236. Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD, Proc. of the 27th symposium on plasma processing, B5-05, 101-102, 2010.02.
237. H. Sato, Y. Kawashima, K. Nakahara, K. Koga, M. Shiratani, Measurement of electron density in multi-hollow discharges with magnetic field, Proc. of the 27th symposium on plasma processing, A6-01, 105-106, 2010.02.
238. S. Iwashita, H. Miyata, YasuY. Yamada, H. Matsuzaki, K. Koga, M. Shiratani, Observation of nano-particle transport in capacitively coupled radio frequency discharge plasma, Proc. of the 27th symposium on plasma processing, P1-13, 153-154, 2010.02.
239. H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD Experimental Group, In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasma and Inner Wall in LHD, Proc. of the 27th symposium on plasma processing, P1-14, 155-156, 2010.02.
240. T. Nomura, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor, Proc. of the 27th symposium on plasma processing, P1-39, 205-206, 2010.02.
241. T. Mieno, GuoDong Tan, S. Usuba, K. Koga, M. Shiratani, In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity), Proc. of the 27th symposium on plasma processing, P2-17, 257-258, 2010.02.
242. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1210-Q07-10 , 1210, Q07-10, 217-222, 2010.01, [URL].
243. T. Nomura, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition Profile Control of Carbon Films on Patterned Substrates using a Hydrogen-assited Plasma CVD Method, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1222-DD05-16, 1222, DD05-16, 203-207 , 2010.01, [URL].
244. H. Miyahara, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Detection of nano-particles formed in cvd plasma using a two-dimensional photon-counting laser-light-scattering method, J. Plasma Fusion Res., 8, 700-704, 2009.09, [URL].
245. S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD experimental group, A comparison of dust particles produced due to interaction between graphite and plasma: LHD vs helicon discharges, J. Plasma Fusion Res., 8, 308-311, 2009.09, [URL].
246. S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles, J. Plasma Fusion Res., 8, 582-586, 2009.09, [URL].
247. W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, J. Umetsu, H. Miyahara, H. Matsuzaki, K. Koga, M. Shiratani, Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition, J. Plasma Fusion Res., 8, 736-739, 2009.09, [URL].
248. H. Sato, Y. Kawashima, M. Tanaka, K. Koga, W. M. Nakamura, M. Shiratani , Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method, J. Plasma Fusion Res., 8, 1435-1438, 2009.09, [URL].
249. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches, J. Plasma Fusion Res., 8, 1443-1446, 2009.09, [URL].
250. M. Shiratani, K. Koga, Toward plasma nano-factories, Proc. of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I), 86, 2009.09.
251. H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, Dust Particles formed owing to interactions between H2 or D2 helicon plasma, graphite, Proc. of 2009 International Symposium on Dry Process, 33, 2009.09.
252. S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation, Proc. of 2009 International Symposium on Dry Process, 99, 2009.09.
253. T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD, Proc. of 2009 International Symposium on Dry Process, 101, 2009.09.
254. Y. Kawashima, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD, Proc. of 2009 International Symposium on Dry Process, 107, 2009.09.
255. H. Sato, Y. Kawashima, K. Koga, M. Shiratani, Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer, Proc. of 2009 International Symposium on Dry Process, 113, 2009.09.
256. K. Nakahara, Y. Kawashima, H. Sato, K. Koga, M. Shiratani, Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe, Proc. of 2009 International Symposium on Dry Process, 163, 2009.09.
257. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama, Plasma CVD of Nano-particle Composite Porous SiOCH Films, Proc. of 19th International Symposium on Plasma Chemistry, 2009.07, [URL].
258. K. Koga, S. Iwashita, S. Kiridoshi, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Characterization of Dust Particles Ranging in Size from 1 nm to 10 m Collected in LHD, Plasma and Fusion Research, 10.1585/pfr.4.034 , 4, 034-034, 2009.04, [URL].
259. K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method, Proc. of PSS2009/SPP26, 2009.02.
260. Nakamura W. M., Sato H., Koga K., Shiratani M., Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells
, Proc. of PSS2009/SPP26, 2009.02.
261. S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, A. Sagara, K. Nisimura , Characteristics of dust particles produced due to interaction between hydrogen plasma, graphite
, Proc. of PSS2009/SPP26, 2009.02.
262. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile of toluene plasma CVD carbon films in trenches, Proc. of PSS2009/SPP26, 2009.02.
263. K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, Proc. of PSS2009/SPP26, 2009.02.
264. S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode, Proc. of PSS2009/SPP26, 2009.02.
265. S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa, Proc. of 30th International Symposium on Dry Process, 115, 2008.12.
266. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Deposition profile of plasma CVD carbon films in trenches, Proc. of 30th International Symposium on Dry Process, 35, 2008.12.
267. S. Iwashita, K. Koga, M. Morita, M. Shiratani, Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062006, 100, 6, p. 062006, 2008.08, [URL].
268. J. Umetsu, K. Koga, K. Inoue, M. Shiratani, Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062007, 100, 6, p. 062007, 2008.08, [URL].
269. W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani, Cluster incorporation control for a-Si:H film deposition, J. Phys. : Conference Series, 10.1088/1742-6596/100/8/082018, 100, 8, p. 082018, 2008.08, [URL].
270. S. Iwashita, Michihito Morita, H. Matsuzaki, K. Koga, and M. Shiratani, Temperature dependence of dielectric constant of nano-particle composite porous low-k films fabricated by pulse rf discharges with amplitude modulation, Jpn. J. Appl. Phys., 10.1143/JJAP.47.6875, 47, 8, 6875-6878, 2008.08, [URL].
271. S. Nunomura, K. Koga, Y. Watanabe, M. Shiratani, M. Kondo, Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasma, Phys. Plasma, 10.1063/1.2972162, 15, 8, p. 080703, 2008.08, [URL].
272. J. Umetsu, K. Koga, K. Inoue, H. Matzuzaki, K. Takenaka, M. Shiratani, Discharge power dependence of Ha intensity asn electron density of Ar+H2 discharges in H-assisted plasma CVD reactor, Surf. Coat. Technol., 10.1016/j.surfcoat.2008.06.108, 202, 22-23, 5659-5662, 2008.08, [URL].
273. W. M. Nakamura, H. Miyahara, K. Koga, M. Shiratani, Two dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD, IEEE Trans. Plasma Science, 10.1109/TPS.2008.923830, 36, 4, 888-889, 2008.08, [URL].
274. M. Shiratani, W. M. Nakamura, H. Miyahara, K. Koga, Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films, Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08), 69, 2008.07.
275. M. Shiratani, S. Iwashita, K. Koga, S. Nunomura, Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage, Faraday Discussions, 10.1039/B704910B , 137, 127-138, 2008.01, [URL].
276. K. Koga, W. M. Nakamura, and M. Shiratani, VHF discharge sustained in a small hole, Proc. 28th Intern. Conf. on Phenomena in Ionized Gases , 1987-1989, 2007.07.
277. K. Koga, S. Iwashita, M. Shiratani, Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage, J. Phys. D: Appl. Phys., 10.1088/0022-3727/40/8/S05, 40, 8, 2267-2271, 2007.04, [URL].
278. M. Shiratani, K. Koga, S. Ando, T. Inoue, Y. Watanabe, S. Nunomura, M. Kondo, Single step process to deposit Si quantum dot films using H2+SiH4 VHF discharges and electron mobility in a Si quantum dot solar cell, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.012, 201, 9-11, 5468-5471, 2007.02, [URL].
279. S. Iwashita, K. Koga, M. Shiratani, A device for trapping nano-particles formed in processing plasma for reduction of nano-waste, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.060, 201, 9-11, 5701-5704, 2007.02, [URL].
280. S. Iwashita, K. Koga, M. Shiratani, Transport of nano-particles in pulsed AM RF discharges, Proc. the 24th Symp. on Plasma Processing, 103-104, 2007.01.
281. M. Shiratani, S. Kiridoshi, K. Koga, S. Iwashita, N. Ashikawa, K. NIshimura, A. Sagara, A. Komori, LHD Experimental Group, In-situ sampling of dust generated in LHD and its analysis, Proc. the 24th Symp. on Plasma Processing, 371-372, 2007.01.
282. K. Koga, W. M. Nakamura, D. Shimokawa, M. Shiratani, Stability of a-Si:H deposited using multi-hollow plasma CVD, Proc. the 24th Symp. on Plasma Processing, 189-190, 2007.01.
283. M. Shiratani, K. Koga, N. Kaguchi, K. Bando,and Y. Watanabe, Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.015, 506-507, 17-21, 2006.05, [URL].
284. T. Kakeya, K. Koga, M. Shiratani, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-clusters using pulsed H2+SiH4 VHF discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.090, 506-507, 288-291, 2006.05, [URL].
285. K. Koga, Y. Kitaura, M. Shiratani, Y. Watanabe, and A. Komori, Nano-particle formation due to interaction between H2 plasma and carbon wall, Thin Solid Films, 10.1016/j.tsf.2005.08.062, 506-507, 656-659, 2006.05, [URL].
286. K. Takenaka, K. Koga, M. Shiratani, Y. Watanabe, and T. Shingen, Mechanism of Cu deposition from Cu(EDMDD)2 using H-assisted plasma CVD, Thin Solid Films, 10.1016/j.tsf.2005.08.028, 506-507, 197-201, 2006.05, [URL].
287. S. Nunomura, M. Kita,, K. Koga, M. Shiratani, and Y. Watanabe, In situ simple method for measuring size and density of nanoparticles in reactive plasma, J. Appl. Phys., 10.1063/1.2189951 , 99, 8, 083302(7pages), 2006.04, [URL].
288. S. Nunomura, K. Koga, M. Shiratani, Y. Watanabe, Y. Morisada, N. Matsuki, and S. Ikeda, Fabrication of nanoparticle composite porous films having ultra-low dielectric constant, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1509, 44, 50, L1509-L1511, 2005.12, [URL].
289. K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1430, 44, 48, L1430-L1432, 2005.11, [URL].
290. K. Koga, N. Kaguchi, K. Bando, and M. Shiratani, Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma CVD, Rev. Sci. Instrum. , 10.1063/1.2126572, 76, 11, 113501(4pages), 2005.11, [URL].
291. Y. Watanabe, M. Shiratani, and K. Koga, Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects, Trans. Mater. Res. Soc. Jpn., 30, 1, 267-272, 2005.03.
292. M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-particles using VHF discharges and their properties, Trans. Mater. Res. Soc. Jpn., 30, 1, 307-310, 2005.03.
293. K. Takenaka, M. Shiratani, M. Takeshita, M. Kita, K. Koga, and Y. Watanabe, Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition, Pure Appl. Chem. , 10.1351/pac200577020391, 77, 2, 391-398, 2005.01, [URL].
294. K. Takenaka, M. Kita,, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition, J. Vac. Sci. Technol., A, 10.1116/1.1738663, 22, 4, 1903-1907, 2004.07, [URL].
295. K. Koga, N. Kaguchi, M. Shiratani, and Y. Watanabe, Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H2 bonds in the films, J. Vac. Sci. Technol., A, 10.1116/1.1763905 , 22, 4, 1536-1539, 2004.07, [URL].
296. K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori, Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall, IEEE Trans. Plasma Science, 10.1109/TPS.2004.828129 , 32, 2, 405-409, 2004.02, [URL].
297. 白谷正治, 古閑一憲, 尾形隆則, 掛谷知秀, 鹿口直斗, 渡辺征夫, シランプラズマ中のクラスタ成長と薄膜形成, 信学技報, 103, 6, 35-39, 2003.04, [URL].
298. M. Shiratani, K. Koga, A. Harikai, T. Ogata, and Y. Watanabe, Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges, MRS Symp. Proc., 10.1557/PROC-762-A9.5, 762, A9.5.1-9.5.6, 2003.04, [URL].
299. K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches, MRS Symp. Proc., 10.1557/PROC-766-E3.8, 766, E3.8.1-3.8.6, 2003.04, [URL].
300. K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe, Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition, Matr. Sci. Semiconductor Processing, 10.1016/S1369-8001(02)00108-7, 5, 2, 301-304, 2003.02, [URL].
301. M. Shiratani, M. Kai, K. Koga, and Y. Watanabe, Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films, Thin Solid Films, 10.1016/S0040-6090(02)01171-9, 427, 1-2, 1-5, 2003.01, [URL].
302. 白谷正治, 古閑一憲, 渡辺征夫, ナノクラスタ制御プラズマCVDと高品質,光安定a-Si:H太陽電池への応用, アモルファスセミナーテキスト, 95-100, 2002.11.
303. M. Shiratani, K. Koga, Y. Watanabe, Formation of nano-particles in microgravity plasma, Journal of Japan Society of Microgravity Application, 19, 69, 2002.10, [URL].
304. K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of copper by plasma CVD method, Proc. Intern. Symp. on Dry Process, 221-226, 2002.10.
305. Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited lecture paper), Plasma Sources Sci. Technol., 10.1088/0963-0252/11/3A/334, 11, A229-A233, 2002.08, [URL].
306. K. Koga, R. Uehara, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasma and carbon wall, Proc. ESCANPIG16/ICRP5 Joint Meeting, I173--I174, 2002.07.
307. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2, Proc. ESCANPIG16/ICRP5 Joint Meeting, II173--II174, 2002.07.
308. M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films, Proc. ESCANPIG16/ICRP5 Joint Meeting, II323--II324, 2002.07.
309. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of Cu with H-assisted plasma CVD, Proc. ESCANPIG16/ICRP5 Joint Meeting, II199--II200, 2002.07.
310. K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 227-232, 2002.05.
311. K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 238-243, 2002.05.
312. Y. Watanabe, A. Harikai, K. Koga, M. Shiratani, Clustering phenomena in low-pressure reactive plasma: basis and applications (invited lecture paper), Pure Appl. Chem. , 10.1351/pac200274030483, 74, 3, 483-487, 2002.03, [URL].
313. K. Koga, M. Kai, M. Shiratani, Y. Watanabe, N. Shikatani, Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films, Jpn. J. Appl. Phys., 10.1143/JJAP.41.L168, 41, 2B, L168-L170, 2002.02, [URL].
314. M. Shiratani, K. Koga, Y. Watanabe, Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges, Proc. Nano-technology Workshop, 7-12, 2002.02.
315. K. Koga, M. Shiratani, Y. Watanabe, In-situ measurement of size and density of particles in sub-nm to nm size range, Proc. Nano-technology Workshop, 13-20, 2002.02.
316. 白谷正治, 古閑一憲, 渡辺征夫, プロセスプラズマ中のクラスタ - アモルファスシリコン太陽電池製造用プラズマ中のクラスター, Bulletin of Cluster Sci. Technol., 5, 13-18, 2002.01.
317. 渡辺征夫, 古閑一憲, 白谷正治, クラスタ制御プラズマCVD法によるSi薄膜の高品質化, シリコンテクノロジー, 37, 21-26, 2002.01.
318. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2, Proc. Intern. Symp. on Dry Process, 169-174, 2001.11.
319. M. Shiratani, K. Koga, Y. Watanabe, Cluster-less plasma CVD reactor and its application to a-Si:H film deposition, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-664-A5.6, A5.6.1-A5.6.6, 2001.07, [URL].
320. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, Development of H-assisted plasma CVD reactor for Cu interconnects, Proc. Intern. Conf. on Phenomena in Ionized Gases, 147-148, 2001.07.
321. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 153-154, 2001.07.
322. Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited), Proc. Intern. Conf. on Phenomena in Ionized Gases, 15-16, 2001.07.
323. K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, Proc. Intern. Conf. on Phenomena in Ionized Gases, 39-40, 2001.07.
324. Y. Watanabe, M. Shiratani, K. Koga, Clustering phenomena in low-pressure reactive plasma: base and applications (invited), Proc. Intern. Symp. on Plasma Chemistry, 726-730, 2001.07.
325. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration, Sci. Technol. Adv. Mater., 10.1016/S1468-6996(01)00131-0, 2, 3-4, 505-515, 2001.04, [URL].
326. Y. Watanabe, M. Shiratani, K. Koga, Formation kinetics and control of dust particles in capacitively-coupled reactive plasma (invited), Phys. Scripta, 10.1238/Physica.Topical.089a00029, T89, 29-32, 2001.01, [URL].
327. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H assisted control of quality and conformality in Cu film deposition using plasma CVD method, Proc. Advanced Metallization Conf. 2000, 271-278, 2001.01.
328. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 393-394, 2001.01.
329. M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Measurements of surface reaction probability of SiH3, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 419-420, 2001.01.
330. M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe, Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 421-422, 2001.01.
331. M. Shiratani, K. Koga, Y. Watanabe, Plasma CVD method for Cu interconnects in ULSI (invited), Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 751-754, 2001.01.
332. K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasma, Proc. Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 385-386, 2001.01.
333. K. Koga, Y. Matsuoka, M. Shiratani, Y. Watanabe, In situ observation of nucleation and subsequent growth of clusters in silane rf discharges, Appl. Phys. Lett., 77, 2, 196-198, 2000.07.
334. M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, Methods of suppressing cluster growth in silane rf discharges, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-609-A5.6, A5.6.1-A5.6.6, 2000.07, [URL].
335. H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-612-D9.2.1, D9.2.1-D9.2.6, 2000.07, [URL].
336. R. Ichiki, M. Shindo, S. Yoshimura, K. Koga, Y. Kawai, Propagation characteristics of ion acoustic waves in an Ar/SF6 plasma, J. Phys. Soc. Jpn., 10.1143/JPSJ.69.1925, 69, 6, 1925-1926, 2000.06, [URL].
337. H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source, Res. Rep. ISEE Kyushu Univ., 5, 1, 57-61, 2000.03.
338. Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga, Growth processes of particles up to nanometer size in high-frequency SiH4 plasma, Jour. Technical Phys., 41, 1, 505-519, 2000.01.
339. M. Shiratani, S. Maeda, K. Koga, Y. Watanabe, Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.39.287, 39, 1, 287-293, 2000.01, [URL].
340. K. Koga, H. Naitou, Y. Kawai, Observation of Asymmetric Sheath Structure in Multi-Component Plasma Containing Negative Ions, J. Plasma Fusion Res., 2, 435-438, 1999.12, [URL].
341. K. Koga, H. Naitou, Y. Kawai, Observation of Local Structures in Asymmetric Ion Sheath, J. Phys. Soc. Jpn., 10.1143/JPSJ.68.1578, 68, 5, 1578-1584, 1999.05, [URL].
342. K. Koga, Y. Kawai, Behavior of the Ion Sheath Instability in a Negative Ion Plasma, Jpn. J. Appl. Phys., 10.1143/JJAP.38.1553, 38, 3A, 1553-1557, 1999.03, [URL].
主要学会発表等
1. 古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 水素原子源付プラズマCVD法に任意電圧波形を併用したa-C:H薄膜の堆積, 第65回応用物理学会春季学術講演会, 2018.03.
2. 古閑一憲, 和田陽介, 佐藤僚哉, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 大気圧空気誘電体バリア放電プラズマを照射したカイワレ種子の電子スピン共鳴分光, 第65回応用物理学会春季学術講演会, 2018.03.
3. 古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 任意電圧波形を用いたC7H8+Ar+H2プラズマ生成, 平成30年電気学会全国大会, 2018.03.
4. K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of RONS Dose on Plasma Induced Growth Enhancement of Radish Sprout, 2nd International Workshop On Plasma Agriculture (IWOPA2), 2018.03.
5. K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Plasma Enhanced Carbon Recycling for Large-Scale Introduction of Solar Cells to Energy Supply Chain, 5th Korea-Japan Joint Symposium on Advanced Solar Cells 2018, 2nd International Symposium on Energy Research and Application, 2018.02.
6. K. Koga, G. Uchida, M. Shiratani, Towards ultra-high capacity batteries, Joint workshop btw SKKU and Kyushu University Emerging materials and devices, 2018.01.
7. K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, A new insight into nanoparticle-plasma interactions (Invited), JP-KO dust workshop, 2017.12.
8. K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, Evaluation of coupling among interaction fluctuations in nanoparticle growth in reactive plasmas, 18th Workshop on Fine Particle Plasmas, 2017.12.
9. K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Number Density of Seeds on Plasma Induced Plant Growth Enhancement, 27th annual meeting of MRS-J, 2017.12.
10. K. Koga, T. Kojima, S. Toko, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Deposition of High Quality Silicon Thin Films Utilizing Nanoparticles Trapped in Plasmas, 27th annual meeting of MRS-J, 2017.12.
11. K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Gas Flow Velocity on Plant Growth of Radish Sprout, The 2nd Asian Applied Physics Conference (Asian-APC), 2017.12.
12. 古閑一憲, 白谷正治, 植物種子へのプラズマ照射効果による成長促進とその機序(シンポジウム講演), Plasma Conference 2017, 2017.11.
13. K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Development of a fine particle transport analyzer for processing plasmas, The 39th International Symposium on Dry Process (DPS 2017), 2017.11.
14. 古閑一憲, 反応性プラズマを用いた物質機能の初期階層形成, 第33回九州・山口プラズマ研究会, 2017.11.
15. K. Koga, S. Toko, S. Tanida, M. Shiratani, Surface-driven CH4 generation from CO2 in Low-pressure Non-thermal Plasma, American Vacuum Society 64th International Symposium and Exhibition (AVS64), 2017.10.
16. 古閑一憲, 都甲将, 谷田知史, 白谷正治, 細田聡史, 星野健, 火星上CO2のCH4資源化のための低温低圧プラズマ触媒プロセス, 第61回宇宙科学技術連合講演会, 2017.10.
17. 古閑一憲, 和田陽介, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, スケーラブルDBDプラズマのRONS照射量に対する空気流れの効果, 平成29年度(第70回)電気・情報関係学会九州支部連合大会, 2017.09.
18. K. Koga, S. Toko, M. Shiratani , Hysteresis in Plasma CVD: a new path for high quality film deposition, 11th Asian-European International Conference on Plasma Surface Engineering (AEPSE2017) , 2017.09.
19. 古閑一憲, 和田陽介, 徐鉉雄, 板垣奈穂, 白谷正治, 橋本昌隆, 小島昌治, プラズマ照射した種籾への催芽処理の効果, 第78回応用物理学会秋季学術講演会, 2017.09.
20. K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles Using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body (Invited), 231st Meeting of Electrochemical Society (ECS), 2017.05.
21. 古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用 , 電子情報通信学会有機エレクトロニクス研究会, 2017.04.
22. K. Koga, K. Mori, H. Seo, N. Itagaki, M. Shiratani, Corrational study of fluctuation of coupling between plasmas and nanoparticles, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
23. K. Koga, A. Tanaka, M. Hirata, T. Amano, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Long-term evaluation of In nanoparticle transport in living body, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
24. K. Koga, P. Attri, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Comparision of Gamma irradation and scalable DBD on the declorization of Dyes, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
25. 古閑一憲, 九州大学における反応性プラズマ精密制御CVD法の紹介(招待講演), 第1回産学共同研究検討会, 2017.01.
26. K. Koga, K. Mori, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Time evolution of cross-correlation between two fluctuations of couplings between plasmas and nanoparticles in amplitude modulated discharges , 17th Workshop on Fine Particle Plasmas and JAPAN-KOREA Workshop on Dust Particles 2016, 2016.12.
27. K. Koga, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, Dependence of amount of plasma activated water on growth enhancement of radish sprout, 26th annual meeting of MRS-J, 2016.12.
28. K. Koga, T. Amano, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, A. Tanaka, Y. Nakatsu, T. Kondo, Comparative study on death of cells irradiated by non-thermal plasma, X-ray, and UV, The 1st Asian Applied Physics Conference (Asian-APC), 2016.12.
29. 古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, 小型ダスト飛跡分析装置を用いたミラー上ダスト堆積抑制の検討, 第33回プラズマ・核融合学会年会, 2016.12.
30. 古閑一憲, 森研人, 徐鉉雄, 板垣奈穂, 白谷正治 , プラズマとナノ粒子の相互作用ゆらぎの2次元空間構造の時間発展, 第33回プラズマ・核融合学会年会, 2016.11.
31. 古閑一憲 , プラズマCVDを用いた高効率低劣化Si薄膜太陽電池の作製(招待講演), 第33回プラズマ・核融合学会年会, 2016.11.
32. 古閑一憲, プラズマ計測・診断 -反応性プラズマ中微粒子を中心として- (招待講演), 第27回プラズマエレクトロニクス講習会, 2016.11.
33. K. Koga, T. Sarinont, M. Shiratani, Control of Plant Growth by RONS Produced Using Nonthermal Atmospheric Air Plasma , American Vacuum Society 63rd International Symposium and Exhibition (AVS63), 2016.11.
34. K. Koga, R. Katayama, T. Sarinont, H. Seo, N. Itagaki, P. Attri, E. L. Quiros, .A. Tanaka, M. Shiratani, Comparative study of non-thermal atmospheric pressure discharge plasmas for life science applications, 69th Annual Gaseous Electronics Conference (GEC2016), 2016.10.
35. K. Koga, T. Amano, Y. Nakatsu, H. Seo, N. Itagaki, A. Tanaka, T. Kondo, M. Shiratani, Time development of response of cells irradiated by non-thermal atmospheric air plasma, 6th International Conference on Plasma Medicine (ICPM6), 2016.09.
36. 古閑一憲, 都甲将, 白谷正治, 火星上でのロケット燃料生成を目的とした低温低圧放電プラズマによるサバティエ反応, 第60回宇宙科学技術連合講演会, 2016.09.
37. K. Koga, T. Sarinont, P. Attri, M. Shiratani, Nitrite concentration of plants grown from seeds irradiated by air dielectric barrier discharge plasmas, 20th International Vacuum Congress (IVC-20), 2016.08.
38. 古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, LHD実験グループ, QCMを用いたLHD内ダスト堆積量のその場測定, 第11回核融合エネルギー連合講演会, 2016.07.
39. 古閑一憲, 添島雅大, 伊藤鉄平, 徐鉉雄, 板垣奈穂, 白谷正治, プラズマ中微粒子を用いたプラズマポテンシャルゆらぎの評価, 日本物理学会第71回年次大会, 2016.03.
40. 古閑一憲, 「プラズマ材料科学の未来を語る」(低圧非平衡プラズマプロセス) (招待講演), 第125回研究会 APSPT9-SPSM28サテライトミーティング『プラズマ材料科学の未来を語る』, 2016.02.
41. 古閑一憲, 振幅変調反応性高周波放電中のナノ粒子量のバイスペクトル解析, 応用力学研究所共同研究報告会, 2016.02.
42. 古閑一憲, 大気圧非平衡プラズマの基礎 (招待講演), プラズマ・核融合学会第28回専門講習会「プラズマ医療の現状と展望」, 2016.01.
43. K. Koga and M. Shiratani, Potential fluctuation evaluation using binary collision of fine particles suspended in plasmas (Invited), 第16回微粒子プラズマ研究会, 2015.12.
44. 古閑一憲, 天野孝昭, Thapanut Sarinont, 徐鉉雄, 板垣奈穂, 白谷正治, 中津可道, 平田美由紀, 田中昭代, 液中プラズマを用いたAuとPtナノ粒子の簡易作製法, 平成27年度応用物理学会九州支部学術講演会, 2015.12.
45. 古閑一憲,添島雅大,伊東鉄平,山下大輔,徐鉉雄,板垣奈穂,白谷正治,野口将之,内田誠一, プラズマ中のクーロン衝突微粒子間引力, 第32回プラズマ・核融合学会 年会, 2015.11.
46. 古閑一憲, 田浪荘汰, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 新しいプラズマプロセス技術を用いた薄膜堆積, 接合科学共同利用・共同研究拠点 大阪大学接合科学研究所 平成27年度 共同研究成果発表会, 2015.11.
47. K. Koga, T. Amano, T. Sarinont, T. Kondo, S. Kitazaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Interactions between spin trapping reagents and non-thermal air DBD plasmas, 37th International Symposium on Dry Process (DPS2015), 2015.11.
48. K. Koga, X. Dong, K. Yamaki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka ,Y. Setsuhara, Effects of Ion Energy on Chemical Bond Configuration in a-C:H Deposited using Ar + H2+ C7H8 Plasma CVD, 37th International Symposium on Dry Process (DPS2015), 2015.11.
49. 古閑一憲, プラズマ照射に対する生体応答の研究, 第31回 九州・山口プラズマ研究会, 2015.11.
50. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, M. Shiratani, Improving of Harvest Period and Crop Yield of Arabidopsis Thaliana L. using Nonthermal Atmospheric Air Plasma, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
51. K. Koga, T. Amano, T. Sarinont, T. Kawasaki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Y. Nakatsu, A. Tanaka, Two Dimentional Visualization of Oxidation Effect of Scalable DBD Plasma Irradiation using KI-starch Solution, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
52. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, ICRP9/GEC68/SPP33, 2015.10.
53. K. Koga, T. Amano, M. Hirata, A. Tanaka, M. Shiratani, In vivo kinetics of nanoparticles synthesized by plasma in water (Invited), The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, 2015.10.
54. K. Koga, M. Soejima, K. Tomita, T. Ito, H. Seo, N. Itagaki, M. Shiratani, In-situ laser Raman spectroscopy of an optically trapped fine particle, 17th International Symposium on Laser-Aided Plasma Diagnostics (LAPD17) , 2015.09.
55. K. Koga and M. Shiratani, Control Of Nanoprticle Transport And Their Deposition For Porous Low-k Films By Using Plasma Pertubation (Invited), The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015), 2015.09.
56. 古閑一憲, 添島雅大, 徐鉉雄, 板垣奈穂, 白谷正治, 内田誠一, アルゴンプラズマ中微粒子運動の画像解析によるプラズマパラメータ評価, 日本物理学会 2015年秋季大会, 2015.09.
57. 古閑一憲, 伊東鉄平, 徐鉉雄, 板垣奈穂, 白谷正治, 反応性プラズマ中ナノ粒子とラジカルの非線形結合成分の時空間解析, 日本物理学会 2015年秋季大会, 2015.09.
58. 古閑一憲, 大気圧非平衡プラズマ照射による液中ラジカル生成の相関解析(招待講演), 新学術領域研究 プラズマ・ナノマテリアル動態学の創成と安全安心医療科学の構築 第21回医工連携ゼミ, 2015.04.
59. 古閑一憲, 市田大樹, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 非平衡プラズマスパッタリングによる高速低温層交換結晶成長 , 日本物理学会第70回年次大会, 2015.03.
60. 古閑一憲, 都甲将, 鳥越祥宏, 毛屋公孝, 徐鉉雄, 板垣奈穂, 白谷 正治, 水素化アモルファスシリコン薄膜中Si-H2結合生成に対するクラスタ混入とラジカル表面反応の寄与, 第62回応用物理学会春季学術講演会, 2015.03.
61. 古閑一憲, 市田大樹, 橋本慎史, 徐鉉雄, 山下大輔, 板垣奈穂, 白谷正治, スパッタを用いた低温高速層交換Ge結晶成長に対する基板温度の効果, 第62回応用物理学会春季学術講演会, 2015.03.
62. 古閑一憲, 天野孝昭, 平田美由紀, 田中昭代, 白谷正治, ラットに皮下投与したInナノ粒子の体内輸送, 第62回応用物理学会春季学術講演会, 2015.03.
63. 古閑一憲, 内田儀一郎, 徐鉉雄, 白谷正治, プロセシングプラズマを用いたIV族半導体ナノ粒子の作製と太陽電池への応用(招待講演), 平成26年度 東北大学電気通信研究所共同プロジェクト研究会「プラズマナノバイオ・医療の基礎研究」, 2015.02.
64. K. Koga, T. Ito, H. Seo, N. Itagaki, and M. Shiratani, Temporal development of nonlinear coupling between radicals and nanoparticles in reactive plasmas (Invited), The 75th IUVSTA Workshop on Sheath Phenomena in Plasma Processing of Advanced Materials, 2015.01.
65. K. Koga, S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, M. Shiratani, Cluster suppressed deposition of a-Si:H films by employing non-linear phenomena in reactive plasmas (Invited), 2015 Japan-Korea Joint Symposium on Advanced Solar Cells, 2015.01.
66. 古閑一憲, サリノントタパナット, 天野孝昭, 白谷正治, 大気圧空気プラズマを照射したカイコの成長, 第24回日本MRS年次大会, 2014.12.
67. 古閑一憲, プラズマ技術の生体・環境分野への応用研究, 九州大学テクノロジーフォーラム2014, 2014.12.
68. 古閑一憲, サリノントタパナット, 北﨑訓, 林信哉, 白谷正治, プラズマ照射によるシロイヌナズナの植物成長促進の世代間伝搬, 第30回 九州・山口プラズマ研究会, 2014.11.
69. 古閑一憲, 伊東鉄平, 徐鉉雄, 板垣奈穂, 白谷正治, ラジカル密度摂動によるナノ粒子とラジカルのカップリング解析, Plasma Conference 2014, 2014.11.
70. K. Koga, T. Ito, K. Kamataki, H. Seo, N. Itagaki, and M. Shiratani, Effects of amplitude modulated VHF discharge on coupling between plasmas and nanoparticles, 24th International Toki Conference, 2014.11.
71. K. Koga, Y. Morita, T. Ito, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Spatiotemporal Analysis of Nanoparticle Growth in Amplitude Modulated Reactive Plasmas for Understanding Interactions between Plasmas and Nanomaterials (Invited), 15th IUMRS-International Conference in Asia, 2014.08.
72. 古閑一憲, 太陽電池開発の最前線, 2014年度先端サマーセミナー(第6回研究活動交流会), 2014.08.
73. K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Quartz crystal microbalance measurements for in-situ evaluation of dust inventory in fusion devices, 26th Symposium on Plasma Physics and Technology, 2014.06.
74. K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Real time mass measurement of dust particles deposited on vessel wall using quartz crystal microbalances in a divertor simulator, 21th International Conference on Plasma Surface Interactions (PSI2014), 2014.05.
75. K. Koga, T. Sarinont, T. Amano, and M. Shiratani, Effects of non-thermal air plasma irradiation to plant seeds on glucose concentration of plants, International Workshop on Diagnostics and Modelling for Plasma Medicine (DMPM2014), 2014.05.
76. 古閑一憲, コンビナトリアル細胞活性解析を用いた細胞超活性プラズマの創成 (招待講演), 第8回レーザー学会「レーザーバイオ医療」技術専門委員会, 2014.03.
77. 古閑一憲, プラズマプロセス技術の最近の応用展開 (招待講演), プラズマ・核融合学会九州・沖縄・山口支部 平成25年度第3回特別講演会, 2014.02.
78. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida and M. Shiratani, Coupling between radicals in plasmas and nanoparticle growth in initial growth phase in reactive plasmas with amplitude modulation, 18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics, 2014.02.
79. K. Koga, Y. Hashimoto, S. Toko, D. Yamashita, Y. Torigoe, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Fabrication of highly stable a-Si:H solar cells by suppressing cluster incorporation (Invited), 2014 Japan-Korea Joint Symposium on Advanced Solar Cells, 2014.02.
80. K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
81. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
82. 古閑一憲, プラズマ技術およびその応用可能性について (招待講演), 平成25年度次世代テクノロジーセミナー, 2014.01.
83. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Correlation between Plasma Fluctuation and Nanoparticle Amount in Initial Growth Phase in Reactive Plasmas with Amplitude Modulation, 14th Workshop on Fine Particle Plasmas, 2013.12.
84. K. Koga, G. Uchida, D. Ichida, S. Hashimoto, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Quantum dot sensitized solar cells using group IV semiconductor nanoparticles (Invited), 2013 EMN Fall Meeting , 2013.12.
85. 古閑一憲, 森田康彦, 岩下伸也, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, ナノ粒子成長に対するプラズマ摂動周波数の効果, プラズマ・核融合学会 第30回年会, 2013.12.
86. K. Koga, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Deposition of Ge Nanoparticle Films and Their Application to Ge Quantum-dot Sensitized Solar Cells, The 23rd International Photovoltaic Science and Engineering Conference, 2013.11.
87. K. Koga, S. Iwashita, G. Uchida, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, U. Czarnetzki, Carbon Nanostructure formed by high pressure methane plasmas, The 26th Symposium on Plasma Science for Materials (SPSM-26), 2013.09.
88. K. Koga, A. Tanaka, M. Hirata, N. Hayashi, N. Itagaki and G. Uchida, Comparative Acute Pulmonary Toxicity of Different Types of Indium-Tin Oxide Following Intermittent Intratracheal Instillation to the Lung of Rats, 2013 JSAP-MRS Joint Symposia, 2013.09.
89. 古閑一憲, 橋本優史, 金淵元, 都甲将, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, クラスタ抑制法を用いた高光安定アモルファスシリコンPIN太陽電池の作製, プラズマ研究会, 2013.09.
90. K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, H. Seo, M. Shiratani and U. Czarnetzki, Formation of self-organized nanostructures using high pressure CH4+Ar plasmas, The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013), 2013.08.
91. K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, K. Kamataki, M. Shiratani, U. Czarnetzki, High Pressure Nonthermal Methane Plasmas for Nanoparticle Production, The 12th Asia Pacific Physics Conference (APPC12), 2013.07.
92. 古閑一憲, 森田康彦, 内田儀一郎, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 白谷正治, 振幅変調放電プラズマ中のナノ粒子成長初期におけるナノ粒子量の時空間分布, 2013年第60回応用物理学会春季学術講演会, 2013.03.
93. K. Koga, D. Yamashita, G. Uchida, M. Shiratani, U. Czarnetzki, Characteristics of high pressure Ar+CH4 nanosecond discharge plasmas for producing nanoparticles, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.02.
94. K. Koga, D. Yamashita, G. Uchida, M. Shiratani, Single particle trapping in plasmas using laser for studying interaction between a fine particle and palsams, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.01.
95. K. Koga, Time and space profiles of laser-light scattering intensity from nano-particles and optical emission intensity in amplitude modurated high frequency discharge plasmas, The International LIGLR Workshop on Plasma Science & Technology, 2013.01.
96. 古閑一憲, 西山雄士, 立石瑞樹, 白谷正治, H. Wulff, S. Bornholdt, H. Kersten, プラズマ-壁相互作用によるナノ粒子生成に対する壁へのプラズマ流入角度の効果, 第30回プラズマプロセシング研究会(SPP-30), 2013.01.
97. 古閑一憲, 岩下伸也, 西山雄士, 立石瑞樹, 森田康彦, 山下大輔, 鎌滝晋礼, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 重水素ヘリコンプラズマとグラファイト壁の相互作用により発生したダストの捕集, プラズマ・核融合学会 九州・沖縄・山口支部第16回支部大会, 2012.12.
98. K. Koga, Y. Wang, D. Ichida, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Deposition of Si nanoparticle composite films for C-Si/Si QDs/organic Solar Cells, 第13回微粒子プラズマ研究会, 2012.12.
99. 古閑一憲, 岩下伸也, 西山雄士, 山下大輔, 鎌滝晋礼, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, グラファイトと重水素プラズマの相互作用で発生したダスト捕集, プラズマ・核融合学会 第29回年会, 2012.11.
100. 古閑一憲, 岩下伸也, 山下大輔, 内田儀一郎, 白谷正治, Czarnetzki U., 高気圧Ar+CH4ナノ秒放電を用いた薄膜堆積とナノ粒子生成, プラズマ・核融合学会 第29回年会, 2012.11.
101. K. Koga, Plasma Chemical Vapor Deposition for Solar Cells (Invited), 2012 Workshop on Advanced Surface and Material Technologies, 2012.11.
102. 古閑一憲, 岩下伸也, 内田儀一郎, J. Schulze, E. Schungel, P. Hartmann, 白谷正治, Z. Donko, U. Czarnetzki, Electrical Asymmetry Effectを用いた微粒子のシース間輸送, 九州山口プラズマ研究会、応物新領域研究会, 2012.11.
103. K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Control of Dust Flux in LHD and in a Divertor Simulator, 24th Fusion Energy Conference (IAEA) , 2012.10.
104. K. Koga, S. Iwashita, M. Shiratani, U. Czarnetzki, Formation of Nanoparticles in High Pressure Reactive Nanosecond Discharges, Asia-Pacific Conference on Plasma Science and Technology (11th APCPST), 2012.10.
105. K. Koga, D. Yamashita, S. Kitazaki, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Optical Trapping of Single Fine Particle in Plasmas for study of interactions between a fine particle and plasmas, NANOSMAT 2012, 2012.09.
106. K. Koga, T. Urakawa, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile and properties of plasma CVD carbon films, 13th International Conference on Plasma Surface Engineering (PSE2012), 2012.09.
107. K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Effects of Substrate DC Bias Voltage on Dust Collection Efficiency in Large Helical Device, 20th International Conference on Plasma Surface Interactions 2012 (PSI2012), 2012.05.
108. K. Koga, K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Effects of incorporation of clusters generated in the plasma ignition phase on Schottky cell performance of amorphous silicon films, The Fourth International Workshop on Thin-Film Silicon Solar Cells (IWTFSSC-4), 2012.03.
109. K. Koga, K. Kamataki, S. Nunomura, S. Iwashita, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, U. Czarnetzki, Three growth modes of nanoparticles generated in reactive plasmas, DPG Spring Meeting of the Section AMOP (SAMOP), 2012.03.
110. 古閑一憲, 浦川達也, 内田儀一郎, 徐鉉雄, 鎌滝晋礼, 板垣奈穂, 白谷正治, 節原裕一, 関根誠, 堀勝, 低温プラズマ異方性CVDを用いた微細トレンチ上面への自己組織カーボンマスク形成, Plasma Conference 2011 (PLASMA2011) , 2011.11.
111. 古閑一憲, プロセスプラズマ中の微粒子挙動研究とその応用(特別講演), プラズマ科学のフロンティア2011研究会, 2011.09.
112. 古閑一憲, CVDプラズマ中ナノ粒子の制御とその応用 (招待講演), AIST計測・診断システム研究協議会 第8回プラズマ技術研究会, 2011.08.
113. 古閑一憲, 基板バイアスによるダスト捕集の検討, 第9回LHDにおけるPWI共同研究・検討会, 2011.07.
114. K. Koga, G. Uchida, M. Sato, Y. Wang, K. Nakahara, K. Kamataki, N. Itagaki, M. Shiratani, Effects of surface treatment on performance of Si nano-particle quantum dot solar cells, The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011), 2011.07.
115. 古閑一憲, 野村卓也, 浦川達也, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, 節原裕一, 関根誠, 堀勝, Deposition of carbon films on top surface of fine trenches at 100℃ using a plasma anisotropic CVD method, 第58回応用物理学関係連合講演会, 2011.03.
116. 古閑一憲、西山雄士、白谷正治, Transport Control of Carbon Nanoparticles in H2 Helicon Discharges by Biasing Wall, NIFSダスト研「次世代核融合装置に向けたダスト問題に関する研究会」, 2011.03.
117. K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics (Invited), International Conference on Advances in Condensed and Nano Materials-2011(ICACNM-2011), 2011.02.
118. K. Koga, T. Matsunaga, Y. Kawashima, Y. Kim, K. Nakahara, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Radical flux evaluation of high pressure silane plasma CVD using multi-hollow discharges (Invited), The 12th International Workshop on Advanced Plasma Processing and Diagnostics, 2011.01.
119. 古閑一憲, 宮田大嗣, 西山雄士, 岩下伸也, 山下大輔, 松崎秀文, 内田儀一郎, 板垣奈穂, 鎌滝晋礼, 白谷正治, 微細パターン基板へのSiOx-CH3ナノ粒子堆積, 第27回プラズマ・核融合学会年会, 2010.12.
120. 古閑一憲, 宮田大嗣, 西山雄士, 岩下伸也, 山下大輔, 松崎秀文, 内田儀一郎, 板垣奈穂, 鎌滝晋礼, 白谷正治, 芦川直子, 増﨑貴, 西村清彦, 相良明男, LHD実験グループ, プラズマ-カーボン壁相互作用で発生したカーボン微粒子の基板へのフラックス評価, 第27回プラズマ・核融合学会年会, 2010.11.
121. K. Koga, T. Nomura, G. Uchida, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on the surface of fine structures using plasma CVD (Invited), The 1st Korean-Japan Symposium on Surface Technology, 2010.11.
122. K. Koga, H. Miyata, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD Experimental Group, Deposition of Nanoparticles using Substrate Bias Voltage, 第23回マイクロプロセス・ナノテクノロジー国際会議(MNC 2010), 2010.11.
123. 古閑一憲, 北﨑訓, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマ-細胞相互作用による細胞活性制御, 第26回九州・山口プラズマ研究会, 2010.11.
124. K. Koga, K. Nakahara, T. Matsunaga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, High speed deposition of highly stable a-Si:H films using pure silane multi-hollow discharges, Third International Workshop on Thin Film Silicon Solar Cells (IWTFSSC3) , 2010.10.
125. K. Koga, G. Uchida, Y. Kawashima, M. Sato, K. Yamamoto, K. Nakahara, T. Matsunaga, K. Kamataki, N. Itagaki, M. Shiratani, Si quantum dot-sensitized solar cells using Si nanoparticles produced by multi-hollow discharge, 3rd International Symposium on Innovative Solar Cells, 2010.10.
126. K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between Si thin films with and without incorporating nanoparticles into the film, 10th Asia Pacific Conference on Plasma Science and Technology (APCPST), 2010.07.
127. K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for a-Si:H film deposition, 35th IEEE Photovoltaic Specialists Conference (PVSC), 2010.06.
128. 古閑一憲, 宮田大嗣, 白谷正治, へリコンプラズマーカーボン壁相互作用で発生したカーボンダストの電場による収集, 第8回LHDにおけるPWI共同研究・検討会, 2010.06.
129. K. Koga, Plasma CVD for Si thin film solar cells, 2010 International Workshop on Plasma Applications, 2010.06.
130. K. Koga, S. Iwashita, H. Miyata, M. Shiratani, 振幅変調パルス放電による部分帯電ナノ粒子雲の輸送, 日本地球惑星科学連合年会, 2010.05.
131. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, 第27回プラズマプロセシング研究会(SPP-27), 2010.02.
132. 古閑一憲, 岩下伸也, 宮田大嗣, 山田泰之, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, LHDの第一壁へのダストフラックスの評価, 第2回PWI合同研究会, 2009.12.
133. 古閑一憲, 佐藤宙, 中村ウィリアム誠, 宮原弘臣, 松崎秀文, 白谷正治, シランホロ―放電に対する水素希釈の効果, プラズマ・核融合学会 九州・沖縄・山口支部 第12回支部大会, 2009.12.
134. K. Koga, H. Sato, Y. Kawashima, M. Shiratani, High Rate Deposition of Cluster-suppressed Amorphous Silicon Films Deposited Using a Multi-hollow Discharge Plasma CVD, 2009 MRS Fall Meeting, 2009.12.
135. K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma Treatment of Indium Compounds to Reduce Their Adverse Health Effects, 2009 MRS Fall Meeting, 2009.12.
136. 古閑一憲, 川嶋勇毅, 佐藤宙, 白谷正治, マルチホロ―放電を用いたa-Si:H製膜中の基板温度, 19th Academic Symposium of MRS-Japan 2009, 2009.12.
137. K. Koga, Y. Kawashima, K. Nakahara, H. Sato, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for third generation solar cells (Invited), 10th Workshop on Fine Particle Plasmas, 2009.11.
138. 古閑一憲, 佐藤 宙, 川嶋勇毅, 白谷正治, マイクロ波共振プローブを用いたH2+SiH4マルチホロー放電の電子密度計測, 第70回応用物理学会学術講演会, 2009.09.
139. K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma treatment of CIGS to reduce toxicity, Seventh Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), 2009.09.
140. 古閑一憲, 白谷正治, プラズマCVDを用いた微細構造への製膜形状制御(招待講演), 西日本放電懇談会, 2009.08.
141. 古閑一憲, プラズマCVDの基礎 (Invited), TEL University, 2009.07.
142. 古閑一憲, 岩下伸也, 宮田大嗣, 白谷正治、芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, LHDとモデル実験装置のダストの比較, 第7回LHDにおけるPWI共同研究・検討会, 2009.06.
143. 古閑一憲、佐藤宙、川嶋勇毅、中村誠ウィリアム、白谷正治, 高品質光安定a-Si:H薄膜作製用マルチホロー放電における電子密度の空間分布, 電気学会プラズマ研究会, 2009.06.
144. K. Koga, T. Nomura, M. Shiratani, M. Sekine, Y. Setsuhara, M. Hori, Anisotropic deposition in narrow trenches using hydrogen assisted plasma CVD method, Memorial Symposium for the Retirement of Professor Tachibana “Toward the Next Generation of Plasma Science, Technology”, 2009.05.
145. K. Koga, Deposition profile control of carbon films in trenches using a plasma CVD method (Invited), The 7th EU-Japan Joint Symposium on Plasma Processing, 2009.04.
146. 古閑一憲, 高品質a-Si堆積用マルチホロー放電プラズマ, 太陽電池製造用新規プラズマ源に関する研究会, 2009.03.
147. K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani,, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会, 2009.02.
148. K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara,, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method
, プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会, 2009.02.
149. 古閑一憲, プラズマプロセスにおける揺らぎの抑制と増幅 (招待講演), プラズマ・核融合学会「プラズマ-バイオ融合科学への新展開」第2回専門委員会, 2009.01.
150. 古閑一憲, 佐藤宙, 中村ウィリアム誠, 宮原弘臣, 松崎秀文, 白谷正治, シランホロー放電に対する水素希釈の効果, プラズマ・核融合学会 第12回九州・沖縄・山口支部大会, 2008.12.
151. K. Koga, S. Iwashita, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Dust Particles in Size Range from 1 nm to 10 μm Sampled in LHD, 9th Workshop on Fine Particle Plasmas, 2008.12.
152. K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Improvement in deposition rate of a-Si:H films using a low pressure multi-hollow discharge plasma CVD method, ICPP2008 Satellite Meeting on Plasma Physics, Advanced Applications in Aso, 2008.09.
153. 古閑一憲, 中村ウィリアム誠, 佐藤 宙, 宮原弘臣, 白谷正治, 水素希釈シラン有磁場マルチホロー放電を用いた高光安定a-Si:H膜の堆積, 2008年秋季第69回応用物理学会学術講演会, 2008.09.
154. 古閑一憲, プラズマCVDを用いたナノ粒子含有多孔質低誘電率膜の作製, 平成20年度西日本放電懇談会, 2008.08.
155. K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki,, M. Shiratani , Deposition of highly stable a-Si:H films using hydrogen diluted silane hollow discharge, The 3rd International School of Advanced Plasma Technology, 2008.07.
156. K. Koga, Nano-structure formation using Plasma (Invited), レノバセミナー, 2008.04.
157. K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Effects of hydrogen dilution on a-Si:H deposition using silane hollow discharges, 第25回プラズマプロセシング研究会, 2008.01.
158. K. Koga, M. Shiratani, Control of deposition profile of Cu in trenches using ion-enhanced surface reaction (Invited), The 5th International Symposium on Advanced Plasma Processing, Diagnostics, The 1st International Symposium on Flexible Electronics Technology, 2007.04.
159. K. Koga, M. Shiratani, Y. Watanabe, Cluster-suppressed plasma CVD method employing VHF discharges, Fine Particle Plasmas: Basis, Applications - Third Workshop on Fine Particle Plasmas, 2002.12.
160. 古閑 一憲, 甲斐 幹英, 白谷 正治, 渡辺 征夫, プラズマスパッタリングによるSiナノ構造の自己組織的形成, 電気学会 プラズマ研究会, 2002.12.
161. K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Correlation between cluster amount, qualities of a-Si:H films for SiH4 plasma CVD, American Vaccum Society 49th International Symposium, 2002.11.
162. 古閑 一憲, 白谷 正治, 古閑 一憲, 渡辺 征夫, クラスター抑制プラズマCVD法による高品質a-Si:H堆積, 第18回九州・山口プラズマ研究会, 2002.11.
163. 古閑 一憲, 今別府 謙吾, 白谷 正治, 渡辺 征夫, クラスタ抑制プラズマCVD法を用いて堆積したa-Si:H膜の膜質に及ぼす放電周波数の影響, 平成14年度応用物理学会九州支部講演会, 2002.11.
164. 古閑 一憲, 甲斐 幹英, 白谷 正治, 渡辺 征夫, シラン高周波放電を用いたナノ結晶シリコンクラスタの生成, 第62回応用物理学学術講演会, 2002.09.
165. 古閑 一憲, 白谷 正治, 渡辺 征夫, アモルファスシリコン作製になぜ放電周波数を高周波化するか?, 西日本放電懇談会, 2002.08.
166. K. Koga, R. Ueharaa, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasmas, carbon wall, Joint Meeting of 16th European Conference on Atomic, Molecular Physics of Ionized Gases, 5th International Conference on Reactive Plasmas, 2002.07.
167. K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges, their application to deposition of super high quality a-Si:H films, International Workshop on Information, Electrical Engineering (IWIE2002), 2002.05.
168. 古閑 一憲, 甲斐 幹英, 今別府 謙吾, 白谷 正治, 渡辺 征夫, クラスタ抑制PECVD法により作製したa-Si:H薄膜の膜質とクラスタ量の相関, 第49回応用物理学関係連合講演会, 2002.03.
169. 古閑 一憲, 針貝 篤史, 白谷 正治, 渡辺 征夫, シランプラズマ中のクラスタ量と電子エネルギー分布への放電周波数の影響, 第49回応用物理学関係連合講演会, 2002.03.
170. 古閑 一憲, 上原 龍児, 白谷 正治, 渡辺 征夫, 小森 彰夫, 水素プラズマとカーボン壁の相互作用による微粒子形成, 第49回応用物理学関係連合講演会, 2002.03.
171. K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in sub-nm size range, Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
172. K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in subnm size range (Invited), The Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
173. K. Koga, M. Shiratani, Y. Watanabe, Preliminary experiments on dust particles formation due to interaction between plasma, graphite wall, Fine Particle Plasmas: Basis, Applications - Second Workshop on Fine Particle Plasmas, 2001.12.
174. 古閑 一憲, 白谷 正治, 古閑 一憲, 渡辺 征夫, LSI内微細銅配線形用プラズマCVD, 第17回九州・山口プラズマ研究会, 2001.11.
175. 古閑 一憲, 徳安 達郎, 上原 龍児, 白谷 正治, 渡辺 征夫, ダイバータ壁とプラズマの相互作用による微粒子形成機構研究用装置の試作, 第18回プラズマ・核融合学会年会, 2001.11.
176. 古閑 一憲, 針貝 篤史, 白谷 正治, 渡辺 征夫, 渡邉 剛, シラン高周波放電中のクラスタ成長に関する水素希釈と励起周波数の効果, 第62回応用物理学学術講演会, 2001.09.
177. K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, International Conference on Phenomena in Ionized Gases, 2001.07.
178. 古閑 一憲, 園田 剛士, 鹿谷 昇, 白谷 正治, 渡辺 征夫, クラスタ抑制プラズマCVD装置による高品質a-Si:H作製, 第48回応用物理学関係連合講演会, 2001.03.
179. 古閑 一憲, 田中 健一, 白谷 正治, 渡辺 征夫, 水素希釈シラン高周波放電中の電子密度及びイオン密度, 第48回応用物理学関係連合講演会, 2001.03.
180. K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution, excitation frequency on initial growth of clusters in silane plasmas, Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
181. 古閑 一憲, 徳安 達郎, 白谷 正治, 渡辺 征夫, シランプラズマ中に発生する微粒子の表面付着確率, 平成12年度応用物理学会九州支部講演会, 2000.12.
182. 古閑 一憲, 田中 健一, 徳安 達郎, 白谷 正治, 渡辺 征夫, シランプラズマ中のSinHxクラスタ核のその場計測と成長制御, プラズマ・核融合学会九州地区第4回研究発表講演会, 2000.12.
183. K. Koga, K. Tanaka, T. Tokuyasu, M. Shiratani, Y. Watanabe, Initial growth of clusters in silane rf discharges, 53rd Annual Gaseous Electronics Conference, 2000.10.
184. 古閑 一憲, 田中 健一, 白谷 正治, 渡辺 征夫, シランプラズマ中のクラスタ成長に対する水素希釈・放電周波数の効果, 第61回応用物理学学術講演会, 2000.09.
185. 古閑 一憲, 徳安 達郎, 白谷 正治, 渡辺 征夫, シラン高周波放電中クラスタの表面付着確率, 第61回応用物理学学術講演会, 2000.09.
186. 古閑 一憲, 松岡 泰弘, 田中 健一, 白谷 正治, 渡辺 征夫, シラン高周波放電中のクラスタのサイズ・密度測定, 第47回応用物理学関係連合講演会, 2000.03.
187. 古閑 一憲, 松岡 泰弘, 田中 健一, 白谷 正治, 渡辺 征夫, プラズマ中のクラスタの新計測法, 第17回プラズマプロセシング研究会, 2000.01.
188. 古閑 一憲, 前田 真一, 白谷 正治, 渡辺 征夫, シランプラズマ中の微粒子成長の基板材料依存性, 平成11年度応用物理学会九州支部講演会, 1999.12.
189. 古閑 一憲, 前田 真一, 松岡 泰弘, 田中 健一, 白谷 正治, 渡辺 征夫, 反応性プラズマにおける微粒子発生, プラズマ・核融合学会九州地区第3回研究発表講演会, 1999.12.
190. 古閑 一憲, 松岡 泰弘, 田中 健一, 白谷 正治, 渡辺 征夫, 水素希釈によるシラン高周波放電中微小微粒子の抑制効果, 第60回応用物理学学術講演会, 1999.09.
191. 古閑 一憲, シラン高周波放電における微小微粒子の抑制, 西日本放電懇談会, 1999.08.
192. K. Koga, H. Naitou, Y. Kawai, Characteristics of Asymmetric Ion Sheath in a Negative Ion Plasma, 2nd International Conference on the Physics of Dusty Plasmas, 1999.05.
193. 古閑 一憲, 内藤 裕志, 河合 良信, イオンシース不安定性と非対称イオンシース構造, プラズマ・核融合学会九州地区第2回研究発表講演会, 1999.02.
特許出願・取得
特許出願件数  10件
特許登録件数  4件
学会活動
所属学会名
応用物理学会
日本生化学会
American Vaccum Society
Materials Research Society
プラズマ・核融合学会
電気学会
応用物理学会プラズマエレクトロニクス分科会
学協会役員等への就任
2018.04~2020.03, 応用物理学会 プラズマ・エレクトロニクス分科会, 副幹事長.
2018.01~2018.12, DryProcessSymposium2018, 論文委員.
2017.04~2018.03, DryProcessSymposium2017, 論文委員.
2017.04~2021.03, 応用物理学会, プログラム編集委員.
2017.02~2019.01, 応用物理学会, 代議員.
2017.01~2018.12, Americal Vacuum Society, Plasma Science and Technology Division, Treasurer.
2016.04~2017.03, 4th Japan-Korea Joint Symposium on Advance Solar Cells 2017 and International Symposium on Energy Research and Application 2017, Organizing Committee.
2016.04~2018.12, DPS40周年記念事業委員会, 委員.
2016.04~2017.03, DryProcessSymposium2016, 論文委員.
2015.06~2016.06, 27th Symposium on Plasma Physics and Technology, Czech Republic, Programme committee member.
2013.04~2015.03, プラズマ・核融合学会, 「プラズマ理工学と医学・農学の融合科学」専門委員.
2013.04~2015.03, 応用物理学会プラズマ・エレクトロニクス分科会, 幹事.
2003.04~2005.03, プラズマ・核融合学会, 学会誌モニター.
2006.04~2008.03, 応用物理学会プラズマ・エレクトロニクス分科会, 幹事.
学会大会・会議・シンポジウム等における役割
2017.03.14~2017.03.17, 2017年第64回応用物理学会春季学術講演会(パシフィコ横浜), 座長(Chairmanship).
2015.03.11~2015.03.14, 2015年第62回応用物理学会春季学術講演会(東海大), 座長(Chairmanship).
2013.12.21~2013.12.22, プラズマ・核融合学会 九州・沖縄・山口支部第17回支部大会, 座長(Chairmanship).
2010.03.17~2008.03.20, 2010年春季第57回応用物理学関係連合講演会(東海大), 座長(Chairmanship).
2009.11.21~2009.11.22, 応用物理学会九州支部学術講演会講演会, 座長(Chairmanship).
2009.09.08~2009.09.11, 第70回応用物理学会学術講演会 , 座長(Chairmanship).
2008.08.22~2008.08.23, フロンティアプロセス2008, 座長(Chairmanship).
2008.03.27~2008.03.30, 2008年春季第55回応用物理学関係連合講演会, 座長(Chairmanship).
2005.09.01~2005.09.01, 応用物理学会2005年秋季講演会, 座長(Chairmanship).
2016.06.20~2016.06.23, 27th Symposium on Plasma Physics and Technology, Programm commitee member.
2015.11.05~2015.11.06, 37th International Dymposium on Dry Process (DPS2015), 論文委員.
2015.10.12~2015.10.16, 9th International Conference on Reactive Plasmas/68th Gaseous Electronics Conference/33rd Symposium on Plasma Processing, Steering Committee.
2015.10.12~2015.10.16, 9th International Conference on Reactive Plasmas/68th Gaseous Electronics Conference/33rd Symposium on Plasma Processing, Publication Committee.
2014.11.27~2014.11.28, 36th International Dymposium on Dry Process (DPS2014), 論文委員.
2014.06.16~2014.06.19, 26th Symposium on Plasma Physics and Technology, Programme commitee member.
2014.02.03~2014.02.07, The 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing, Organizing Committee.
2013.02.02~2013.02.03, The 6th International Conference on Plasma Nanotechnology and Science (IC-PLANTS 2013), Program Committee.
2012.11.27~2012.11.30, プラズマ核融合学会 第29回年会, 現地実行委員 庶務(副).
2010.11~2010.11, IEEE TENCON2010, Track Chair.
2007.09~2008.03, プラズマ表面工学に関するアジア-ヨーロッパ国際会議(AEPSE2007), 実行委員.
2007.04~2008.03, The 5th International Symposium on Advanced Plasma Processes and Diagnostics & The 1st International Symposium on Flexible Electronics Technology, International organizing committee.
2006.11~2007.03, 第33回アモルファスセミナー スタートアップセッション, スタートアップセッション実行委員長.
2006.11~2007.03, 第33回アモルファスセミナー, 実行委員長.
学会誌・雑誌・著書の編集への参加状況
2016.07~2018.07, プラズマ・核融合学会誌, 国内, 編集委員.
2015.04~2017.03, Japanese Journal of Applied Physics ISPlasma2016 Special Issue, 国際, Guest Editor.
2015.04~2017.03, Surface Coatings & Techonol AEPSE2015 Special Issue, 国際, Guest Editor.
2008.09~2009.09, Journal of Plasma and Fusion Research Series, 国際, 編集委員.
学術論文等の審査
年度 外国語雑誌査読論文数 日本語雑誌査読論文数 国際会議録査読論文数 国内会議録査読論文数 合計
2017年度
2016年度
2015年度
2014年度
2013年度
2012年度 10  16 
2011年度
2010年度 12 
2009年度
2008年度
2007年度
2006年度    
2004年度  
その他の研究活動
海外渡航状況, 海外での教育研究歴
Institute for Experimental Physics V: Plasma and Atom Physics, Ruhr-University Bochum, Germany, 2011.10~2012.09.
受賞
第14回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2016.03.
ICMAP2014 Best Poster Presentation Award , International Conference of Microelectronics and Plasma Technology 2014 (ICMAP2014), 2014.07.
ICMAP2014 Best Poster Presentation Award , International Conference of Microelectronics ans Plasma Technology 2014 (ICMAP2014), 2013.08.
The 9th Asian-European International Conference of Plasma Surface Engineering(AEPSE2013)/ Outstanding Poster Award, The 9th Asian-European International Conference on Plasma Surface Engineering , 2013.08.
ISSP2013 Best Poster Award, 12th International Symposium on Sputtering & Plasma Processes, 2013.07.
Advanced Plasma Application Award, 11th Asia Pacific Conference on Plasma Science adn Technology (APCPST) & 25th Symposium on Plasma Science for Materials (SPSM), 2012.10.
IUMRS-ICEM2012 "Young Scientist Awards: Silver Award Winners" , 日本MRS, 2012.09.
Best Presentation Award, ISPlasma2012, 2012.03.
Invited Presentation Award, Interfinish 2008 World Congress and Exposition, 2008.06.
応用物理学会第3回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2005.03.
第10回応用物理学会講演奨励賞, 応用物理学会, 2001.05.
研究資金
科学研究費補助金の採択状況(文部科学省、日本学術振興会)
2016年度~2019年度, 基盤研究(B), 代表, プラズマ照射による植物成長促進の世代間伝搬機構の解明.
2016年度~2018年度, 基盤研究(B), 分担, インジウムナノ粒子の体内吸収と毒性メカニズム.
2014年度~2018年度, 基盤研究(A), 分担, プラズマを用いたナノ粒子精密配置制御の学術基盤創成.
2013年度~2015年度, 挑戦的萌芽研究, 代表, 液中プラズマを用いたミクロンサイズの穴への銅ナノ粒子埋め込みプロセスの創成.
2012年度~2015年度, 基盤研究(B), 代表, コンビナトリアル細胞活性解析を用いた細胞超活性プラズマの創成.
2012年度~2016年度, 新学術領域研究, 分担, プラズマ・ナノマテリアル動態学の創成と安全安心医療科学の構築.
2006年度~2007年度, 若手研究(B), 代表, 重水素プラズマ・カーボン壁相互作用によるナノダストの生成と重水素吸蔵量の評価.
2004年度~2005年度, 若手研究(B), 代表, 水素プラズマ・カーボン壁相互作用によるナノ粒子成長機構の研究.
2009年度~2013年度, 新学術領域研究, 分担, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生(代表者:白谷正治).
2008年度~2010年度, 基盤研究(B), 分担, ナノブロック輸送・配置の学術・技術基盤構築(代表者:白谷正治).
2007年度~2009年度, 基盤研究(B), 分担, インジウム新素材によるインジウム肺発症の実験的研究(代表者:田中昭代).
2006年度~2007年度, 萌芽研究, 分担, プラズマを用いたナノカプセルの創製と物質内包技術の開発(代表者:白谷正治).
2009年度~2013年度, 新学術領域研究, 連携, プラズマとナノ界面の相互作用に関する総括研究(代表者:白谷正治).
競争的資金(受託研究を含む)の採択状況
2017年度~2018年度, JAXA宇宙探査イノベーションハブ, 代表, 穀物増産を実現する種子へのプラズマ大量処理技術開発.
2017年度~2017年度, NIFS 一般共同研究, 代表, 電場を用いた帯電ダストと製膜前駆体イオンの除去 .
2015年度~2016年度, JAXA宇宙探査イノベーションハブ, 分担, プラズマ・触媒ナノ粒子複合反応場によるCO2資源化技術の開発 (代表者:白谷正治).
2010年度~2014年度, NEDO太陽光発電システム次世代高性能技術の開発, 分担, ナノ粒子制御によるアモルファスシリコンセルの高光安定化に関する研究
超高周波プラズマ源の開発
(代表者:白谷正治).
2008年度~2014年度, NEDO 革新的太陽光発電技術研究開発(革新型太陽電池国際研究拠点整備事業), 分担, 高度秩序構造を有する薄膜多接合太陽電池の研究開発(ナノ結晶シリコン)(代表者:白谷正治).
2007年度~2011年度, 戦略的創造研究推進事業 (文部科学省), 分担, CREST 研究領域「ナノ科学を基盤とした革新的製造技術の創成」
プラズマナノ科学創成によるプロセスナビゲーション構築とソフト材料加工(代表者:堀 勝).
2007年度~2009年度, 太陽光発電システム未来技術研究開発, 分担, 大面積/高効率多接合薄膜シリコン太陽電池の高生産製膜技術開発(代表者:白谷正治).
2006年度~2007年度, NEDO再受託, 分担, トップセルの光劣化の基礎現象解明.
2005年度~2007年度, NEDO 平成17年度第2回産業技術研究助成事業, 代表, 低コスト高効率太陽電池のための高光安定水素化アモルファスシリコンの大面積・高速作製技術の開発.
共同研究、受託研究(競争的資金を除く)の受入状況
2008.03~2012.03, 分担, プラズマを用いた次世代LSI用低誘電率層間絶縁膜の作製.
寄附金の受入状況
2010年度, 東京エレクトロン株式会社, 大学院システム情報科学研究院研究資金
部門名(情報エレクトロニクス部門古閑一憲助教).
学内資金・基金等への採択状況
2010年度~2010年度, 平成22年度九州大学宙空環境研究センター「共同研究」, 代表, 電場を用いたダスト収集.
2009年度~2009年度, 平成21年度九州大学宙空環境研究センター「共同研究」, 代表, 電位構造制御によるダストフラックス計測.
2008年度~2008年度, 平成20年度九州大学宙空環境研究センター「共同研究」, 代表, プラズマ中ダストの能動的輸送制御.

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pure2017年10月2日から、「九州大学研究者情報」を補完するデータベースとして、Elsevier社の「Pure」による研究業績の公開を開始しました。
 
 
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