| KUNGEN TEII | Last modified date：2012.12.13 |
Associate Professor /
Electrical Engineering
Department of Electrical and Materials Science
Faculty of Engineering Sciences
Department of Electrical and Materials Science
Faculty of Engineering Sciences
Graduate School
Undergraduate School
E-Mail
Homepage
http://hyoka.ofc.kyushu-u.ac.jp/search/details/K001514/index.html.
Academic Degree
Ph. D
Field of Specialization
Plasma Processing, Materials Engineering
Outline Activities
Keywords: Electrical and electronic materials, Ultrahard materials, Biomaterials, Nanostructured materials, Plasma engineering, Reactive plasmas, Diamond, Nanocarbon, Cubic boron nitride, Cemented carbide, Semiconductor processing, High-temperature device, Mass spectrometry, Electrostatic probe, Electron field emitter, Cutting tool, Mold
Research
Research Interests
Membership in Academic Society
- Nanostructured carbon materials, Electron emitters
keyword : Nanocarbon, Nanodiamond, Amorphous carbon, Vacuum microelectronics, Electron source, Tunneling effect, Heterostructure, Electron affinity, Composite film, Ultrathin film
2005.04. - Wide-gap semiconductors, Power electronics
keyword : Diamond, Boron nitride, Silicon Carbide, Crystal growth, Epitaxy, High-temperature devices, Power devices, Doping, Semiconductor processes
1998.04. - Super hard coatings, Biocoatings
keyword : Super hard materials, Biomaterials, Implants, Biocompatibility, Nitride, DLC, Cemented carbide, Transition metals, High-speed steels, Cutting tools, Mold, Tribology
2007.04. - Plasma processing
keyword : Plasma CVD, Sputtering, Mass spectrometry, Electrostatic probe measurement, Optical spectroscopy
1998.04.
Books
| 1. | S. Matsumoto and K. Teii, Kogyo Zairyo "Superhard, high-crystallinity cubic boron nitride films", Vol. 57, No. 1, pp. 42-43(2009).. |
Reports
| 1. | K. Teii,High Performance Field Emission from Carbon Nanowalls and Carbon Nanowall/Nanocrystalline Diamond Composites,IEEJ Electrical Insulation News in Asia, No. 18, 43-44頁(2011),2011.11. |
| 2. | K. Teii, M. Hori, M. Ito, T. Goto, N. Ishii,Study on Polymeric Neutral Species in High-Density Fluorocarbon Plasmas,J. Vac. Sci. Technol. A, Vol. 18, pp. 1-9,2000.01. |
Papers
| 1. | K. Teii and S. Matsumoto,Direct Deposition of Cubic Boron Nitride Films on Tungsten Carbide-Cobalt,ACS Appl. Mater. Interfaces,Vol. 4, pp. 5249-5255,2012.10. |
| 2. | K. Teii and S. Matsumoto,Low Threshold Field Emission from High-Quality Cubic Boron Nitride Films,J. Appl. Phys.,Vol. 111, 093728,2012.05. |
| 3. | K. Teii, S. Shimada, M. Nakashima, A. T. H. Chuang,Synthesis and Electrical Characterization of n-Type Carbon Nanowalls,J. Appl. Phys.,Vol. 106, 084303,2009.10. |
| 4. | T. Ikeda and K. Teii,Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanocrystalline Diamond Films,Appl. Phys. Lett.,Vol. 94, 143102,2009.04. |
| 5. | T. Ikeda and K. Teii,Origin of Reverse Leakage Current in n-Type Nanocrystalline Diamond/p-Type Silicon Heterojunction Diodes,Appl. Phys. Lett.,Vol. 94, 072104,2009.02. |
| 6. | T. Ikeda, K. Teii, C. Casiraghi, J. Robertson, A. C. Ferrari,Effect of the Sp2 Carbon Phase on n-Type Conduction in Nanodiamond Films,J. Appl. Phys.,Vol. 104, 073720,2008.10. |
| 7. | K. Teii, S. Matsumoto, J. Robertson,Electron Field Emission from Nanostructured Cubic Boron Nitride Islands,Appl. Phys. Lett.,Vol. 92, 013115,2008.01. |
| 8. | K. Teii and T. Ikeda,Effect of Enhanced C2 Growth Chemistry on Nanodiamond Film Deposition,Appl. Phys. Lett.,Vol. 90, 111504,2007.03. |
| 9. | K. Teii, R. Yamao, T. Yamamura, S. Matsumoto,Synthesis of Cubic Boron Nitride Films with Mean Ion Energies of a Few eV,J. Appl. Phys.,Vol. 101, 033301,2007.02. |
| 10. | K. Teii, M. Hori, T. Goto,Diagnostic and Analytical Study on a Low-Pressure Limit of Diamond Chemical Vapor Deposition in Inductively Coupled CO-CH4-H2 Plasmas,J. Appl. Phys.,Vol. 95, pp. 4463-4470.,2004.05. |
| 11. | Y. Kouzuma, K. Teii, K. Uchino, K. Muraoka,Diamond Nucleation Density as a Function of Ion-Bombardment Energy in Electron Cyclotron Resonance Plasma,Phys. Rev.,B Vol. 68, 064104,2003.08. |
Presentations
| 1. | Plasma Deposition and Applications of Cubic Boron Nitride Films (INVITED), K. Teii, J. H.C. Yang, S. Matsumoto, IUMRS-International Conference on Electronic Materials 2012, Japan, 2012.. |
| 2. | Plasma Deposition and Electrical Characterization of Wide-Gap Materials for High-Temperature Condition (INVITED), K. Teii, 7th Asia-Pacific International Symposium on the Basic and Application of Plasma Technology, Taiwan, 2012.. |
| 3. | Plasma Deposition of Wide-Gap Materials for High-Temperature Condition (INVITED), K. Teii, 14th International Workshop of Advanced Plasma Processing and Diagnostics/2nd Workshop for NU- SKKU Joint Institute for Plasma-Nano Materials, Fukuoka, 2012.. |
| 4. | Synthesis and Electrical Properties of Cubic Boron Nitride Films by Low-Energy Ion-Assisted Deposition, K. Teii and S. Matsumoto, 5th International Conference on New Diamond and Nano Carbons, Shimane, 2011.. |
| 5. | Growth and Field Emission Properties of Boron Nitride Island Films by Low-Energy Ion-Assisted Deposition, K. Teii, Y. Utoda, R. Yamao, and S. Matsumoto, Materials Research Society Fall Meeting, Boston, 2010.. |
| 6. | Synthesis and electrical properties of cubic boron nitride films by plasma-enhanced chemical vapor deposition under low-energy ion bombardment (INVITED), K. Teii and S. Matsumoto, 6th Asia-Pacific International Symposium on the Basic and Application of Plasma Technology, Taiwan, 2009.. |
| 7. | Plasma Enhanced Deposition of Cubic Boron Nitride Films under Ultralow-Energy Ion Impact: Structural Evolution and Electrical Properties (INVITED), K. Teii and S. Matsumoto, 35th International Conference on Metallurgical Coatings and Thin Films, USA, 2008.. |
| 8. | Phase Control and Electrical Properties of Undoped and Nitrogen-Doped Nanodiamond Films Deposited from Ar-Rich Microwave Plasmas, T. Ikeda, K. Takeguchi, K. Teii, 18th International Symposium on Plasma Chemistry, Japan, 2007.. |
| 9. | Diagnostics of Radicals and Formation of Microcrystalline Diamond in a Low-Pressure Inductively Coupled Plasma (INVITED), M. Hori, K. Teii, T. Goto, 9th International Symposium on Advanced Materials, Japan, 2002.. |
- Materials Research Society
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