Kyushu University Academic Staff Educational and Research Activities Database
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TEII KUNGEN Last modified date:2017.04.07

Graduate School
Undergraduate School

Academic Degree
Ph. D
Field of Specialization
Electrical and Electronic Engineering, Materials Engineering
Outline Activities
Keywords: Power electronics, Power devices, Electrical and electronic materials, Ultrahard materials, Biomedical materials, Nanostructured materials, Plasma engineering, Diamond, Nanocarbon, Cubic boron nitride, Cemented carbide, Semiconductor processing, High-temperature device, Mass spectrometry, Electrostatic probe, Electron field emitter, Cutting tool, Implant, Mold
Research Interests
  • Nanostructured carbon materials, Electron emitters
    keyword : Nanocarbon, Nanodiamond, Amorphous carbon, Vacuum microelectronics, Electron source, Ion engine, Tunneling effect, Electron affinity, Composite film, Ultrathin film
    2005.04Synthesis and characterization of nanostructured carbon materials, Fabrication and characterization of advanced electronic devices.
  • Wide-gap semiconductors, Power electronics
    keyword : Diamond, Boron nitride, Silicon Carbide, Crystal growth, Epitaxy, High-temperature devices, Power devices, Doping, Semiconductor processes
    1998.04Plasma processing, Fabrication and device application of diamond and cubic boron nitride, Doping, Diode, Electron emitter.
  • Super hard coatings, Biocoatings
    keyword : Super hard materials, Biomaterials, Implants, Biocompatibility, Nitride, DLC, Cemented carbide, Transition metals, High-speed steels, Cutting tools, Mold, Tribology
    2007.04Deposition of superhard boron nitride films, Characterization of structure and mechanical properties of superhard boron nitride films, DLC.
  • Plasma processing
    keyword : Plasma CVD, Sputtering, Mass spectrometry, Electrostatic probe measurement, Optical spectroscopy
    1998.04Diagnostics of particle species in reactive plasmas, Plasma application by controlling particle behavior.
Academic Activities
1. S. Matsumoto and K. Teii, Kogyo Zairyo "Superhard, high-crystallinity cubic boron nitride films", Vol. 57, No. 1, pp. 42-43(2009)..
1. K. Teii, Plasma Deposition and Electrical Applications of Nanocrystalline Diamond Films, The Journal of The Institute of Electrical Engineers of Japan, Vol. 135, No. 3, pp. 142-144 (2015).
2. K. Teii, Plasma Deposition of Diamond at Low Pressures: A Review, IEEE Trans. Plasma Sci., Vol. 42, pp. 3862-3869, 2014.12.
3. J.-S. Wu, C.-C. Hsu, J. P. Chu, K. Teii, Introduction to the Special Issue on the APSPT 2013, IEEE Trans. Plasma Sci. Vol. 42, pp. 3654-3655, 2014.12.
4. K. Teii, Recent Trends of Moderate-Pressure Microwave Plasma-Enhanced CVD—From Diamond to Nanocarbons—, IEEJ Transactions on Fundamentals and Materials, Vol. 131, No. 1, pp. 11-15 (2011).
5. K. Teii, M. Hori, M. Ito, T. Goto, N. Ishii, Study on Polymeric Neutral Species in High-Density Fluorocarbon Plasmas, J. Vac. Sci. Technol. A, Vol. 18, pp. 1-9, 2000.01.
1. K. Teii, S. Kawakami, S. Matsumoto, Superhydrophilic Cubic Boron Nitride Films, RSC Adv., Vol. 6, pp. 87905-87909, 2016.09.
2. K. Teii, Y. Mizusako, T. Hori, S. Matsumoto, Thermal Stability of Boron Nitride/Silicon p-n Heterojunction Diodes, J. Appl. Phys., Vol. 118, 155102, 2015.10.
3. M. Goto, R. Amano, N. Shimoda, Y. Kato, K. Teii, Rectification Properties of n-Type Nanocrystalline Diamond Heterojunctions to p-Type Silicon Carbide at High Temperatures, Appl. Phys. Lett., Vol. 104, 153113, 2014.04.
4. K. Teii, T. Hori, Y. Mizusako, S. Matsumoto, Origin of Rectification in Boron Nitride Heterojunctions to Silicon, ACS Appl. Mater. Interfaces, Vol. 5, pp. 2535-2539, 2013.04.
5. K. Teii, S. Matsumoto, Direct Deposition of Cubic Boron Nitride Films on Tungsten Carbide-Cobalt, ACS Appl. Mater. Interfaces, Vol. 4, pp. 5249-5255, 2012.10.
6. K. Teii, S. Matsumoto, Low Threshold Field Emission from High-Quality Cubic Boron Nitride Films, J. Appl. Phys., Vol. 111, 093728, 2012.05.
7. K. Teii, S. Shimada, M. Nakashima, A. T. H. Chuang, Synthesis and Electrical Characterization of n-Type Carbon Nanowalls, J. Appl. Phys., Vol. 106, 084303, 2009.10.
8. T. Ikeda and K. Teii, Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanocrystalline Diamond Films, Appl. Phys. Lett., Vol. 94, 143102, 2009.04.
9. T. Ikeda, K. Teii, C. Casiraghi, J. Robertson, A. C. Ferrari, Effect of the Sp2 Carbon Phase on n-Type Conduction in Nanodiamond Films, J. Appl. Phys., Vol. 104, 073720, 2008.10.
10. K. Teii, S. Matsumoto, J. Robertson, Electron Field Emission from Nanostructured Cubic Boron Nitride Islands, Appl. Phys. Lett., Vol. 92, 013115, 2008.01.
11. K. Teii, R. Yamao, T. Yamamura, S. Matsumoto, Synthesis of Cubic Boron Nitride Films with Mean Ion Energies of a Few eV, J. Appl. Phys., Vol. 101, 033301, 2007.02.
12. K. Teii, M. Hori, T. Goto, Diagnostic and Analytical Study on a Low-Pressure Limit of Diamond Chemical Vapor Deposition in Inductively Coupled CO-CH4-H2 Plasmas, J. Appl. Phys., 95, 8, 2004.05.
1. K. Teii, Plasma Deposition and Applications of Nanodiamond Films (INVITED), 2014 International Workshop on Plasma Applications in Nanocarbon Materials and Devices, 2014.02.03.
2. K. Teii, S. Matsumoto, Plasma Deposition and Electrical Applications of High-Quality Cubic Boron Nitride Films (INVITED), 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2013.12.22.
3. K. Teii, J. H.C. Yang, S. Matsumoto, Electron Field Emission from Semiconducting Carbon Nanowalls and Boron Nitride Films (INVITED), 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), 2013.12.03.
4. Plasma Deposition and Applications of Cubic Boron Nitride Films (INVITED), K. Teii, J. H.C. Yang, S. Matsumoto, IUMRS-International Conference on Electronic Materials 2012, Japan, 2012..
5. Growth and Field Emission Properties of Boron Nitride Island Films by Low-Energy Ion-Assisted Deposition, K. Teii, Y. Utoda, R. Yamao, and S. Matsumoto, Materials Research Society Fall Meeting, Boston, 2010..
6. Synthesis and electrical properties of cubic boron nitride films by plasma-enhanced chemical vapor deposition under low-energy ion bombardment (INVITED), K. Teii and S. Matsumoto, 6th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2009..
7. Plasma Enhanced Deposition of Cubic Boron Nitride Films under Ultralow-Energy Ion Impact: Structural Evolution and Electrical Properties (INVITED), K. Teii and S. Matsumoto, 35th International Conference on Metallurgical Coatings and Thin Films, USA, 2008..
8. Diagnostics of Radicals and Formation of Microcrystalline Diamond in a Low-Pressure Inductively Coupled Plasma (INVITED), M. Hori, K. Teii, T. Goto, 9th International Symposium on Advanced Materials, Japan, 2002..
Membership in Academic Society
  • Materials Research Society