Kyushu University [Akihiko Takahashi (Associate Professor) Faculty of Medical Sciences, Department of Health Sciences]

Fundamental Radiological Sciences
School of Medicine

092-642-6725

092-642-6674

Ph.D of Engineering

Quantum Electronics

Research Interests

Study on application to nuclear medicine of the Monte Carlo simulation
keyword : 　 nuclear medicine　 Monte-Carlo simulation　PET
2011.06.
Computer simulation of optometrics of tissue
keyword : computer simulation, Monte-Calro theory, optometrics
2009.10.
Development of high-intensity short-wavelength light source using laser-produced plasma, and the application
keyword : extra-ultraviolet, vacuum-ultraviolet, laser-produced plasma, transparent materials, micromachining
2002.04.
Fundamental researches of laser heated plasma in high atmospheric pressure rare gas
keyword : laser-heated plasma, vacuum ultra violet
1998.04～2002.03.

Current and Past Project

"Leading project for EUV lithography source developement"
Ministry of Education,Culture,Science and Technology,Japan

Academic Activities

Papers

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1.	Development of a micromachining system for irradiation with narrow band soft X-ray at high power density and micromachining of silicone rubber.
2.	T. Makimura, S. Torii, Kota Okazaki, D. Nakamura; A. Takahashi, H. Niino, K. Murakami,Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining,SPIE Proceedings,Vol.vol.8077,pp.80770F,2011.04.
3.	S. Torii, T. Makimura, K. Okazaki, D. Nakamura, A. Takahashi, T. Okada, H. Niino,Micromachining of polydimethylsiloxane induced by laser plasma EUV light, SPIE Proceedings 2011,Vol.vol.8077,pp.807714,2011.04.
4.	Akihiko Takahashi, Shuichi Torii, Tetsuya Makimura, Kouichi Murakami, Kota Okazaki, Daisuke Nakamura,Tatsuo Okada, Hiroyuki Niino ,Micromachining of silica glass using EUV radiation of laser-produced plasma,電気学会論文誌C,Vol.130,No.10,pp.1779,2010.10.
5.	Shuichi Torii, Tetsuya Makimura, KoutaOkazaki1, Daisuke Nakamura1, Akihiko Takahashi, Tatsuo Okada, Hiroyuki　Niino,Direct Etching of Polymethylmethacrylate (PMMA) Using Laser Plasma Soft X-Rays,Applied Physics Express,Vol.３,pp.066502,2010.06.
6.	K.Okazaki, D.Nakamura, T.Akiyama, K.Toya, A.Takahashi, T.Okada,Dynamics of debris from laser-irradiated Sn droplet for EUV lithography light source,SPIE Photonics West 2009,72010T,2009.01.
7.	D.Nakamura, T.Akiyama, K.Okazaki,　A.Takahashi, T.Okada,Ablation Dynamics of Tin Micro-Droplet Irradiated　by Double Pulse Laser used for Extreme Ultraviolet　Lithography Source,Journal of Physics D:　Applied Physics,Vol.Vol.41,pp.245210,Vol.41,　p. 245210,2008.12.
8.	Emission Characteristics of Debris from Laser-Produced Plasma EUV Light Source using Tin Target.
9.	D.Nakamura, T.Akiyama, A.Takahashi,　T.Okada,Imaging Diagnostics of Debris from Laser-Produced Tin Plasma with Droplet Target for EUV Light Source,Journal of Laser　Micro/Nanoengineering,Vol.3, No.3, pp. 196–200,2008.10.
10.	D.Nakamura, K.Tamaru, T.Akiyama, A.Takahashi, T.Okada ,Investigation of Debris Dynamics from Laser-Produced Tin Plasma for EUV Lithography Light Source,Applied Physics A,Vol.92, No.4, pp. 767–772,2008.09.
11.	A.Takahashi, D.Nakamura, K.Tamaru, T.Akiyama, T.Okada,Emission Characteristics of Debris from CO2 and　Nd:YAG Laser-Produced Tin Plasmas for Extreme　Ultraviolet Lithography Light Source,Applied Physics B,Vol.92, No.1, pp. 73–77,2008.07.
12.	D. Nakamura, K. Tamaru, Y. Hashimoto, T. Okada, H. Tanaka, A. Takahashi,Mitigation of fast ions generated from laser-produced Sn plasma for extreme ultraviolet light source by H2 gas,Journal of Applied Physics ,Vol.102,pp.1213310,Vol.102, 123310,2007.11.
13.	Daisuke Nakamura, Hiroki Tanaka, Yuki Hashimoto, Koji Tamaru, Akihiko Takahashi and Tatsuo Okada,Laser-Imaging Diagnostics of Debris Behavior from Laser-Produced Tin Plasma for EUV Light Sources,Photonics West 2007, 6458A-07 (2007) ,2007.05.
14.	H. Tanaka, A. Matsumoto, A. Takahashi, T. Okada,Development of visualization system of neutral particles generated from laser-produced plasma for EUV light source,Journal of Physics : Conerence Series,2007.04.
15.	D. Nakamura, T. Hiroki, Y. Hashimoto, K. Tamaru, A. Takahashia, T. Okada,Laser-Imaging Diagnostics of Debris Behavior from Laser-Produced Tin Plasma for EUV Light Sources,Proc. SPIE,2007.01.
16.	Characteristics of Extreme Ultraviolet Emission from CO2 Laser-Produced Plasma.
17.	Hirroki Tanaka,Yuki Hasshimoto, Kouji Tamaru, Akihiko Takahashi, Tatsuo Okada,Behavior of debris from laser-produced plasma for extreme ultraviolet light source measure by laser imaging technique,Applied Physics Letters,Vol.89 181109,2006.11.
18.	Hiroki Tanaka, Atsushi Matsumoto, Koji Akinaga, Akihiko Takahashi, T. Okada,Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas,Applied Physics Letters,Vol.87, 041503-1,2005.06.
19.	Y. Hashimoto, H. Tanaka, K. Tamaru, A. Takahashi, T. Okada,Emission characteristics of fast neutral particles an ions from　Laser-Produced Plasma for EUV light source with Sn target,Technical Digest of The 4th International Congress on Laser Advanced Materials Processing,353ページ,2006.05.
20.	Characteristics of Extreme Ultraviolet Emission from CO2 Laser-Produced Plasma.
21.	Hiroki Tanaka, Kouji Akinaga, Akihiko Takahashi, Tatsuo Okada,Development of EUV light source by CO2 laser-produced Xe plasma,Proceedings of SPIE,Vol. 5662 pp361-366,2004.06.
22.	Hiroki Tanaka, Kouji Akinaga, Akihiko Takahashi, Tatsuo Okada,Development of EUV light source by CO2 laser-produced plasma with nano-structured SnO2 targets,Proceedings of SPIE,vol. 5662 pp313-318,2004.06.
23.	Hiroki Tanaka, Kouji Akinaga, Akihiko Takahashi, Tatsuo Okada,Development of target for laser-produced plasma EUV light source using Sn nano-particle,Applied Physics A,Vol.79 pp.1493-1495,2004.06.
24.	Hiroki Tanaka, Kouji Akinaga, Akihiko Takahashi, Tatsuo Okada,Emission characteristics of extreme ultraviolet radiation from CO2 laser-produced xenon plasma,Japanese Journal of Applied Physics,Vol.43, No.4B,2004.04.
25.	Hiroki Tanaka, Akihiko Takahashi, Tatsuo Okada, T.Ariga, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi,Spectral dynamics of narrow-band F2 laser for optical lithography,Applied Physics B,Vol.74 pp.735-740,2003.01.
26.	Hiroki Tanaka, Akihiko Takahashi, Tatuo Okada, Mitsuo Maeda, Kiichiro Uchino, Toshihiro Nishisaka, Akira Sumitani, Hakaru Mizoguchi,Production of laser-heated plasma in high-pressure Ar gas and emission characteristics of vacuum ultraviolet radiation from Ar2 excimers,Applied Physics B,Vol.74 pp.323-326,2002.04.
27.	Akihiko Takahashi, Tatsuo Okada, Mitsuo Maeda, Kiichiro Uchino,Ar2 excimer emission from laser-heated plasma,The 4th Pacific Rim Conference on Laser and Electro-Optics Tecnical Digest,Volume-I pp.I-218 - 219,2001.05.
28.	Akihiko Takahashi, Tatsuo Okada, Takashi Hiyama, Mitsuo Maeda, Kiichiro Uchino, Ryoichi Nohdomi, Hakaru Mizoguchi,Ar2 excimer emission from a laser-heated plasma in a high-pressure argon gas,Appled Physics Latters,Vol.77 No.25 pp.4115-4117,2000.12.
29.	Shinji Nagai, Kiwamu Takehisa, Tatsuo Enami, Toshihiro Nishisaka, Junichi Fujimoto, Osamu Wakabayashi, Hakaru Mizoguchi, Akihiko Takahashi,Development of a 2kHz F2 Laser for 157 nm Lithography,Japanese Journal of Applied Physics,Vol.38 No.12B pp.7013-7016,1999.12.
30.	Naoki Kataoka, Motoya Igarashi, Kiichiro Uchino, Katsunori Muraoka, Akihiko Takahashi, Tatsuo Okada, Mitsuo Maeda, Tsukasa Hori, Katsumoto Terashima, Akira Sumitani, Tatsuo Enami, Hakaru Mizoguchi,Performance Improvement of a Discharge-Pumped ArF Excimer Laser by Xenon Gas Addition,Japanese Journal of Applied Physics,Vol.38 No.12A pp.6735-6738,1999.12.

Presentations

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1.	Monte-Carlo simulation of the 90Y-PET imaging.
2.	Development of the Monte-Carlo simulation cord of PET scanner.
3.	Micromachining using EUV radiation from laser produced plasma.
4.	Micromachining of Poly(methyl methacrylate) Using Laser Plasma Soft X-Rays.
5.	Characteristics of micromachining of Silicon Rubber Using Laser Plasma Soft X-rays.
6.	Influence of Light Scattering on Retinal Vessel Oxymetry.
7.	Monte Carlo Simulation of Retinal Vessel Image.
8.	Monte Carlo Simulation of Retinal Vessel Oxymetry.
9.	Micromachining of Silicon Rubber Using Laser Plasma Soft X-rays.
10.	Micromachining of transparent materials using laser plasma x-rays.
11.	Micromachining of transparent materials using Fresnel diffraction of infrared radiation.
12.	Micromachining of SiO2 by TEA CO2 laser Fresnel diffraction light through the metal mask.
13.	Micromachining of SiO2 by near-field ablation using 10.6μm TEA CO2 laser..
14.	Micromachining of SiO2 by Fresnel diffraction of TEA CO2 laser light with the metal mas.
15.	Micromachining of SiO2 by TEA CO2 laser near-field light.
16.	Direct micromachining of transparent materials using EUV radiation from laser produced plasma.
17.	Development of Laser-Produced Plasma Extreme Ultraviolet Light Source for Micromachining of Transparent Materials.
18.	Study on Micromachining of Transparent Materials Using Laser Plasma Soft X-rays.
19.	Micromachining of transparent materials using EUV radiation from CO2 laser produced plasma.
20.	Micromachining of transparent materials using EUV radiation from CO2 laser produced plasma.
21.	Development of Extra-ultraviolet Lithography Light Source.
22.	Comparative study on emission characteristics of debris from CO2 and Nd: YAG laser-produced plasmas.
23.	CO2 laser-produced Sn plasma for optical lithography.
24.	The Triggering Effect on Discharge of Laser-Produced Plasma with Tin Target.
25.	Visualization of Particle Behavior from Laser-Produced Plasma.
26.	Measurement of ion energy generated in laser-produced plasma.
27.	Development of Extreme Ultraviolet Light Source in Kyushu University.
28.	Ar2 dimer production by laser-heated plasma pumping.

Membership in Academic Society

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Awards

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