次世代型・超高速エキシトニクストランジスタの創成
キーワード：エキシトニクス、トランジスタ
2011.01.
| 板垣 奈穂（いたがき なほ） | データ更新日：2024.04.25 |
主な研究テーマ
レアメタルフリー環境低負荷型電子・光デバイスの創成
キーワード：レアメタル代替、電子デバイス、光デバイス、低環境負荷
2010.04.
キーワード：レアメタル代替、電子デバイス、光デバイス、低環境負荷
2010.04.
高品質酸化物半導体薄膜の新規生成法の開発
キーワード：酸化物半導体
2010.04.
キーワード：酸化物半導体
2010.04.
従事しているプロジェクト研究
励起子トランジスタ用ZnO/ZnMgO ヘテロ構造における時空間分解ルミネッセンス計測
2022.04～2025.03, 代表者：板垣奈穂，秩父重英, 九州大学（日本），東北大学（日本）.
2022.04～2025.03, 代表者：板垣奈穂，秩父重英, 九州大学（日本），東北大学（日本）.
逆SKモードを利用したパワーデバイス用・窒化物半導体薄膜の単結晶成長
2023.04, 代表者：板垣奈穂，Alexander Martin Hinz, 九州大学（日本），フラウンホーファー研究所（独）.
2023.04, 代表者：板垣奈穂，Alexander Martin Hinz, 九州大学（日本），フラウンホーファー研究所（独）.
ポストムーア時代を見据えた超伝導コンピューティング技術の創成と展開
2022.04, 代表者：井上 弘士, 九州大学, 文科省
科研費・基盤研究(S).
2022.04, 代表者：井上 弘士, 九州大学, 文科省
科研費・基盤研究(S).
励起子トランジスタの創成と励起子輸送の学理探求：情報担体へ進化する励起子
2021.04～2025.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費・基盤研究(B).
2021.04～2025.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費・基盤研究(B).
エキシトンが情報を伝達し記憶する革新的古典／量子デバイスの創製
2019.07～2021.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費・挑戦的研究（萌芽).
2019.07～2021.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費・挑戦的研究（萌芽).
新材料(ZnO)x(InN)1-xを用いたSi基板上への小型E/O変換デバイスの創製
2018.10～2019.09, 代表者：板垣奈穂, 九州大学, サムコ科学技術財団
サムコ科学技術財団・薄膜技術に関する研究助成.
2018.10～2019.09, 代表者：板垣奈穂, 九州大学, サムコ科学技術財団
サムコ科学技術財団・薄膜技術に関する研究助成.
スパッタエピタキシーによる革新的エキシトンデバイスの実現と励起子輸送機構の解明の研究
2018.04～2022.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費・基盤B.
2018.04～2022.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費・基盤B.
光電子集積回路を実現する革新的エキシトニクスデバイスの創製
2017.11～2022.03, 代表者：板垣奈穂, 九州大学, NTT
ＮＴＴ-九州大学基礎科学共同研究プログラム.
2017.11～2022.03, 代表者：板垣奈穂, 九州大学, NTT
ＮＴＴ-九州大学基礎科学共同研究プログラム.
フラックス制御スパッタによる高品質酸窒化物の創製と新概念光スイッチへの応用
2015.04～2018.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費若手Ａ.
2015.04～2018.03, 代表者：板垣奈穂, 九州大学, 文科省
科研費若手Ａ.
酸窒化物超格子のピエゾ電界を利用した室温動作エキシトニクスデバイスの創成
2013.04～2015.03, 代表者：板垣奈穂, 九州大学, 日本学術振興会.
2013.04～2015.03, 代表者：板垣奈穂, 九州大学, 日本学術振興会.
スパッタリングプラズマ中の熱フラックス制御による高品質酸化膜の作製
2011.07, 代表者：板垣奈穂, 九州大学, 九州大学（日本），キール大学（独），グライフスヴァルト大（独）.
2011.07, 代表者：板垣奈穂, 九州大学, 九州大学（日本），キール大学（独），グライフスヴァルト大（独）.
高品質ＺｎＯ薄膜の形成とそのキャリア伝導機構の解明
2013.08, 代表者：板垣奈穂, 九州大学, 九州大学（日本），ライト州立大（米国）.
2013.08, 代表者：板垣奈穂, 九州大学, 九州大学（日本），ライト州立大（米国）.
JST 戦略的創造研究推進事業(さきがけ), 研究領域「太陽光と光電変換機能」: 新規酸窒化物を用いたピエゾ電界誘起量子井戸型太陽電池の創製
2011.10～2015.03, 代表者：板垣奈穂, 九州大学, JST.
2011.10～2015.03, 代表者：板垣奈穂, 九州大学, JST.
プラズマナノマテリアル動態学の創成
2012.04～2014.10, 代表者：田中昭代, 九州大学, 日本学術振興会.
2012.04～2014.10, 代表者：田中昭代, 九州大学, 日本学術振興会.
ナノ粒子制御によるa-Siセルの高光安定化に関する研究
2010.10～2012.03, 代表者：白谷正治, 九州大学, ＮＥＤＯ太陽光発電技術組合.
2010.10～2012.03, 代表者：白谷正治, 九州大学, ＮＥＤＯ太陽光発電技術組合.
ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生
2010.04～2013.03, 代表者：白谷正治, 九州大学.
2010.04～2013.03, 代表者：白谷正治, 九州大学.
研究業績
主要著書
| 1. | 板垣 奈穂, 可視領域でバンドギャップチューニング可能な新材料ZIONの開発と太陽電池への応用（太陽光と光電変換機能―異分野融合から生まれる次世代太陽電池―）, シーエムシー出版, 第1章, 2, 2016.02, [URL]. |
主要原著論文
| 1. | Y. Nakamura, N. Yamashita, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, N. Itagaki, Growth of single crystalline ZnO films on 18%-lattice-mismatched sapphire substrates using buffer layers with three-dimensional islands, Cryst. Growth Des., 10.1021/acs.cgd.2c00145, 2022.05, [URL]. |
| 2. | T. E. Putri, F. L. Chawarambwa, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani , Performance comparison of nitrile-based liquid electrolytes on bifacial dye-sensitized solar cells under low-concentrated light, MRS Adv., 10.1557/s43580-022-00270-x, 7, 427-432, 2022.04, [URL]. |
| 3. | F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Effects of Spin-Coating Rate on Surface Roughness, Thickness, and Electrochemical Properties of a Pt Polymer Counter Electrode, Advanced Engineering Forum, 10.4028/p-6l16rl, 45, 1-13, 2022.04, [URL]. |
| 4. | D. Takahashi, N. Yamashita, D. Yamashita, T. Okumura, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of Zn1-xMgxO Films on Sapphire Substrates via Inverted Stranski-Krastanov Mode Using Magnetron Sputtering, MRS Adv., 10.1557/s43580-022-00234-1, 2022.02, [URL]. |
| 5. | G. Uchida, K. Nagai, Y. Habu, J. Hayashi, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara , Nanostructured Ge and GeSn Films by Highpressure He Plasma Sputtering for High-capacity Li ion Battery Anodes, Sci. Rep., 10.1038/s41598-022-05579-z, 12, 1742 (2022), 2022.02, [URL]. |
| 6. | F. L. Chawarambwa, T. E. Putri, A. Pankaj, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Performances of Carbon Black-Titanium nitrate and Carbon Black-Titanium/Triton X-100 Composite Polymer Counter Electrodes for Dye-Sensitized Solar Cells, Adv. Mater. Res., 10.4028/www.scientific.net/AMR.1168.35, 1168, 35-47, 2022.01, [URL]. |
| 7. | F. L. Chawarambwa, T. E. Putri, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, K. Koga, D. Nakamura. M. Shiratani, Improved luminescence performance of Yb3+-Er3+-Zn2+: Y2O3 phosphor and its application to solar cells, Optical Materials, 10.1016/j.optmat.2021.111928, 123, 111928, 2022.01, [URL]. |
| 8. | P. Attri, T. Anan, R. Arita, T. Okumura, H. Tanaka, D. Yamashita, K. Matsuo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, K. Kuchitsu, Y. Ishibashi, Plasma Treatment Effect on the Paramagnetic Species of Barley Seed Radical’s Intensity: An EPR study, Plasma Medicine, 10.1615/PlasmaMed.2020036353, 2021.12, [URL]. |
| 9. | J.Hayashi, K. Nagai, Y.Habu, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara, G. Uchida, Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac2b7b, 61, SA, SA1002, 2021.12, [URL]. |
| 10. | P. Attri, T. Anan, R. Arita, T. Okumura, H. Tanaka, D. Yamashita, K. Matsuo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, K. Kuchitsu, Y. Ishibashi, Plasma Treatment Effect on the Paramagnetic Species of Barley Seed Radical’s Intensity: An EPR study, Plasma Medicine, 10.1615/PlasmaMed.2020036353, 10, 3, 159-168, 2021.12, [URL]. |
| 11. | T. E. Putri, F. L Chawarambwa, M. K. Son, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Performance Characteristics of Bifacial Dye-Sensitized Solar Cells with a V-Shaped Low-Concentrating Light System, ACS Appl. Energy Mater., 10.1021/acsaem.1c02774, 4, 12, 13410-13414, 2021.11, [URL]. |
| 12. | F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of concentrated light on the performance and stability of a quasi-solid electrolyte in dye-sensitized solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2021.138986, 781, 138986, 2021.10, [URL]. |
| 13. | K. Koga, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, Transport of Nanoparticles in Afterglow Region Using Multi-Hollow Discharge Plasma CVD, Bull. Am. Phys. Soc., 66, 7, 2021.10, [URL]. |
| 14. | S. Nunomura, I. Sakata, A. Sato, M. Lozac’h, T. Misawa, N.Itagaki, M.Shiratani, Passivating antireflection coating of crystalline silicon using i/n a-Si:H/SiN trilayer , J Phys Chem Solids, 10.1016/j.jpcs.2021.110127, 156, 11027, 2021.09, [URL]. |
| 15. | S. H. Hwang, R. Iwamoto, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani, Comparison between Ar+CH4 Cathode and Anode Coupled Capacitively Coupled Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Films, Thin Solid Films, 10.1016/j.tsf.2021.138701, 729, 138701, 2021.07, [URL]. |
| 16. | R. Narishige, N. Itagaki, M. Shiratani, Sputtering Growth of Metal Oxynitride Semiconductors for Excitonic Devices, 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM), 10.1109/EDTM50988.2021.9420921, 2021.05, [URL]. |
| 17. | F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Highly efficient and transparent counter electrode for application in bifacial solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2021.138369, 768, 138369, 2021.04, [URL]. |
| 18. | F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura, Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells, J. Mol. Struct., 10.1016/j.molstruc.2020.129479, 1228, 129479, 2021.03, [URL]. |
| 19. | T. E. Putri, Y. Hao, F. L. Chawarambwa, H. Seo, Min-Kyu Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Activated Carbon Counter Electrode On Bifacial Dye Sensitized Solar Cells (DSSCs), Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.1016.863, 1016, 863-868, 2021.01, [URL]. |
| 20. | S. H. Hwang, K. Koga, Y. Hao, P. Attri, T. Okumura, K. Kamataki, N. Itagaki, M. Shiratani, J-S. Oh, S. Takabayashi, T. Nakatani, Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, Processes, 10.3390/pr9010002, 9, 1, 2, 2020.12, [URL]. |
| 21. | F. L. Chawarambwa, T. E. Putri, M. K. Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Graphene-Si3N4 nanocomposite blended polymer counter electrode for low-cost dye-sensitized solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2020.137920, 758, 137920, 2020.11, [URL]. |
| 22. | S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition, Diam Relat Mater, 10.1016/j.diamond.2020.108050, 109, 108050, 2020.11, [URL]. |
| 23. | R. Narishige, K. Kaneshima, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Impact of surface morphologies of substrates on the epitaxial growth of magnetron sputtered (ZnO)x(InN)1-x films, Jpn. J. Appl. Phys., 10.35848/1347-4065/abba0c, 60, SA, 2020.10, [URL]. |
| 24. | S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani, Low stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition, Jpn. J. Appl. Phys. , 59, 10, 100906, 2020.10, [URL]. |
| 25. | N. Itagaki, Y. Nakamura, R. Narishige, K. Takeda, K. Kamataki, K. Koga, M. Hori, M. Shiratani, Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition, Sci. Rep., 10.1038/s41598-020-61596-w, 10, 4669, 2020.03, [URL]. |
| 26. | K. Koga, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene, Impact of radish sprouts seeds coat color on the electron paramagnetic resonance signals after plasma treatment, Jpn. J. Appl. Phys. , 10.35848/1347-4065/ab7698, 59, SH, SHHF01, 2020.03, [URL]. |
| 27. | I. Suhariadi, N. Itagaki, M. Shiratani, Improved Nanoscale Al-doped ZnO with a ZnO Buffer Layer Fabricated by Nitrogen-mediated Crystallization for Flexible Optoelectronic Devices, ACS Appl. Nano Mater., 10.1021/acsanm.9b02571, 3, 2480-2490, 2020.02, [URL]. |
| 28. | K. Tanaka, H. Hara, S. Nagaishi, L. Shi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD, Plasma Fusion Res., 10.1585/pfr.14.4406141, 14, 4406141, 2019.09, [URL]. |
| 29. | L. Shi, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films, Plasma Fusion Res., 10.1585/pfr.14.4406144, 14, 4406144, 2019.09, [URL]. |
| 30. | S. H. Hwang, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition, Plasma Fusion Res., 10.1585/pfr.14.4406115, 14, 4406115, 2019.09, [URL]. |
| 31. | R. Zhou, K. Kamataki, H. Ohtomo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma, Plasma Fusion Res., 10.1585/pfr.14.4406120, 14, 4406120, 2019.09, [URL]. |
| 32. | N. Miyahara, S. Urakawa, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate, MRS Adv., 10.1557/adv.2019.17, 4, 27, 1551-1556, 1551-1556, 2019.01, [URL]. |
| 33. | S. Muraoka, L. Jiahao, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Effects of nitrogen impurity on zno crystal growth on Si substrates, MRS Adv., 10.1557/adv.2019.28, 4, 27, 1557-1563, 1557-1563, 2019.01, [URL]. |
| 34. | N. Miyahara, K. Iwasaki, D. Yamashita, D. Nakamura, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Photoluminescence of (ZnO)0.82 (InN)0.18 films: Incident light angle dependence, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2099, 941, 2099-2103, 2018.12, [URL]. |
| 35. | N. Itagaki, K. Takeuchi, N. Miyahara, K. Imoto, H. Seo, K. Koga, M. Shiratani, Effects of sputtering pressure on (ZnO)x(InN)1-x crystal film growth at 450ºC, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2093, 941, 2093-2098, 2018.12, [URL]. |
| 36. | R. Zhou, K. Mori, H. Ohtomo, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cross-correlation analysis of fluctuations of interactions between nanoparticles and low pressure reactive plasmas, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2104, 941, 2104-2108, 2018.12, [URL]. |
| 37. | T. Fang, K. Yamaki, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka,Y. Setsuhara, The effect of the H2/(H2+Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition, Thin Solid Films, 10.1016/j.tsf.2018.02.035, 660, 891-898, 2018.08, [URL]. |
| 38. | T. Kojima, S. Toko, K. Tanaka, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition, Plasma Fusion Res., 10.1585/pfr.13.1406082, 13, 1406082, 2018.06, [URL]. |
| 39. | H. Seo, D. Sakamoto, H. Chou, N. Itagaki, K. Koga, M. Shiratani , Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction, Progress in Photovoltaics: Research and Applications, 10.1002/pip.2961, 26, 2, 145-150, 2018.02, [URL]. |
| 40. | 徐鉉雄, 板垣奈穂, 古閑一憲, 白谷正治, 色素増感太陽電池のポリマー対向電極における触媒反応の活性化, 信学技報 (IEICE Technical Report), 117, 334, 27-29, 2017.12. |
| 41. | S. Tanami, D. Ichida, S. Hashimoto, H. Seo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition, Thin Solid Films , 10.1016/j.tsf.2017.02.067 , 641, 59-64, 2017.11, [URL]. |
| 42. | S. Toko, K. Keya, Y. Torigoe, T. Kojima, H. Seo, N. Itagaki, K. Koga, M. Shiratani , Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.01.034, 326, Part B, 388-394, 2017.10, [URL]. |
| 43. | H. Seo, C. V.V.M. Gopi, H.-J. Kim, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst, Electrochimica Acta, 10.1016/j.electacta.2017.08.030, 249, 337-342, 2017.09, [URL]. |
| 44. | K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body , ECS Transactions, 10.1149/07703.0017ecst, 77, 3, 17-24, 2017.05, [URL]. |
| 45. | 古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用, 信学技報 (IEICE Technical Report), 117, 8, 5-8, 2017.04. |
| 46. | K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Densities and surface reaction probabilities of oxygen and nitrogen atoms during sputter deposition of ZnInON on ZnO, IEEE Trans. Plasma Science, 10.1109/TPS.2016.2632124, 45, 2, 323-327, 2017.02, [URL]. |
| 47. | K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki , Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization, MRS Adv., 10.1557/adv.2016.617, 2, 5, 265-270, 2016.12, [URL]. |
| 48. | K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Blue Photoluminescence of (ZnO)0.92(InN)0.08, MRS Adv., 10.1557/adv.2016.625, 2, 5, 277-282, 2016.12, [URL]. |
| 49. | M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga , Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication, Materials Science Forum, 10.4028/www.scientific.net/MSF.879.1772, 879, 1772-1777 , 2016.11, [URL]. |
| 50. | S. Toko, Y. Kanemitsu, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.13233, 16, 10, 10753-10757, 2016.10, [URL]. |
| 51. | H. Seo, M. K. Son, S. Hashimoto, T. Takasaki, N. Itagaki, K. Koga, M. Shiratani, Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells, Electrochimica Acta, 10.1016/j.electacta.2016.06.020, 210, 880-887, 2016.08, [URL]. |
| 52. | H. Seo, S. H. Nam, N. Itagaki, K. Koga, M. Shiratani, and J.-H. Boo, Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells, Electron. Mater. Lett., 10.1007/s13391-016-4018-8, 12, 4, 530-536, 2016.07, [URL]. |
| 53. | K. Keya, T. Kojima, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.07LE03, 55, 7S2, 07LE03, 2016.07, [URL]. |
| 54. | T. Onozato, T. Katase, A. Yamamoto, S. Katayama, K. Matsushima, N. Itagaki, H. Yoshida, H. Ohta, Optoelectronic properties of valence-statecontrolled amorphous niobium oxide, J. Phys.: Condens. Matter, 10.1088/0953-8984/28/25/255001 , 28, 25, 255001, 2016.05, [URL]. |
| 55. | H. Seo, D. Ichida, S. Hashimoto, N. Itagaki, K. Koga, M. Shiratani, S. H. Nam and J. H. Boo , Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12210, 16, 5, 4875-4879, 2016.05, [URL]. |
| 56. | H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani , Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition, Sci. Adv. Mater., 10.1166/sam.2016.2520, 8, 3, 636-639, 2016.03, [URL]. |
| 57. | H. Seo, M.-K. Son, N. Itagaki, K. Koga, M. Shiratani, Polymer Counter Electrode of Poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) Containing TiO2 Nano-particles for Dye-sensitized Solar Cells, Journal of Power Sources, 10.1016/j.jpowsour.2015.12.112, 307, 25-30, 2016.03, [URL]. |
| 58. | K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering, MRS Advances, 10.1557/adv.2015.59, 1, 2, 115-119, 2016.01, [URL]. |
| 59. | S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Effects of Gas Flow Rate on Deposition Rate and Amount of Si Clusters Incorporated into a-Si:H Films, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA19, 55, 1S, 01AA19, 2016.01, [URL]. |
| 60. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA11, 55, 1S, 01AA11, 2016.01, [URL]. |
| 61. | K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, N. Hayashi, M. Shiratani, Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.), Appl. Phys. Express, 10.7567/APEX.9.016201, 9, 1, 016201, 2015.12, [URL]. |
| 62. | 白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価, 九州大学超顕微解析研究センター報告, 39, 116-117, 2015.12. |
| 63. | T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka, Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.158, 2015.10, [URL]. |
| 64. | S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.149, 2015.10, [URL]. |
| 65. | H. Seo, S. Hashimoto, D. Ichida, N. Itagaki, K. Koga and M. Shiratani , Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode, Electrochimica Acta, 10.1016/j.electacta.2015.04.105, 179, 206-210, 2015.10, [URL]. |
| 66. | K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.143, 2015.10, [URL]. |
| 67. | K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.132, 2015.10, [URL]. |
| 68. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.145, 2015.10, [URL]. |
| 69. | T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.150, 2015.10, [URL]. |
| 70. | K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.154, 2015.10, [URL]. |
| 71. | T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.155, 2015.10, [URL]. |
| 72. | D. Yamashita, M. Soejima, T. Ito, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Laser trapped single fine particle as a probe of plasma parameters, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.104, 2015.10, [URL]. |
| 73. | S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.133, 2015.10, [URL]. |
| 74. | Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of electrode structure on characteristics of multi-hollow discharges, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.129, 2015.10, [URL]. |
| 75. | T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani, Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.136, 2015.10, [URL]. |
| 76. | R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group, Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.101, 2015.10, [URL]. |
| 77. | T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki, Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.49, 2015.10, [URL]. |
| 78. | S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.152, 2015.10, [URL]. |
| 79. | M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani, Attraction during binary collision of fine particles in Ar plasma, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.18, 2015.10, [URL]. |
| 80. | M. Tateishi, K. Koga, R. Katayama, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experiment Group, Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances, J. Nucl. Mater. , 10.1016/j.jnucmat.2014.10.049, 463, 865–868, 2015.08, [URL]. |
| 81. | K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of ZnInON/ZnO multi-quantum well solar cells, Thin Solid Films, 10.1016/j.tsf.2015.01.012, 587, 106-111, 2015.07, [URL]. |
| 82. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.40.123, 40, 2, 123-128, 2015.07, [URL]. |
| 83. | S. Toko, Y. Torigoe, W. Chen, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability, Thin Solid Films, 10.1016/j.tsf.2015.02.052 , 587, 126-131, 2015.07, [URL]. |
| 84. | K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.248, 1741, aa09-10, 2015.03, [URL]. |
| 85. | N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, ZnO-based semiconductors with tunable band gap for solar sell applications, Proc. SPIE photonics west 2015, 10.1117/12.2078114, 9364, 93640P, 2015.03, [URL]. |
| 86. | T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.87, 1741, aa09-12, 2015.02, [URL]. |
| 87. | H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.01AD02, 54, 1S, 01AD02, 2015.01, [URL]. |
| 88. | N. Itagaki, K. Matsushima, D. Yamashia, H. Seo, K. Koga, M. Shiratani, Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap, Mater. Res. Express, 10.1088/2053-1591/1/3/036405, 1, 3, 036405, 2014.09, [URL]. |
| 89. | H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.39.321, 39, 3, 321-324, 2014.09, [URL]. |
| 90. | I. Suhariadi, M. Shiratani, N. Itagaki, Growth mechanism of ZnO deposited by nitrogen mediated crystallization, Mater. Res. Express, 10.1088/2053-1591/1/3/036403, 1, 3, 036403, 2014.09, [URL]. |
| 91. | N. Itagaki, K. Kuwahara, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method, Opt. Engineering, 10.1117/1.OE.53.8.087109, 53, 8, 087109, 2014.08, [URL]. |
| 92. | M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara, SiC Nanoparticle Composite Anode for Li-Ion Batteries, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2014.742, 1678, n08-58, 2014.07, [URL]. |
| 93. | T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani, Plasma etching of single fine particle trapped in Ar plasma by optical tweezers, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012014, 518, 1, 012014, 2014.06, [URL]. |
| 94. | J. W. Allen, M. S. Allen, D. C. Look, B. R. Wenner, N. Itagaki, K. Matsushima, I. Surhariadi, Infrared Plasmonics via ZnO, J. Nano Res., 10.4028/www.scientific.net/JNanoR.28.109, 28, 109-119, 2014.06, [URL]. |
| 95. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori, Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012010, 518, 1, 012010, 2014.06, [URL]. |
| 96. | Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012007, 518, 1, 012007, 2014.06, [URL]. |
| 97. | D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012002, 518, 1, 012002, 2014.06, [URL]. |
| 98. | S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012008, 518, 1, 012008, 2014.06, [URL]. |
| 99. | M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group, Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012009, 518, 1, 012009, 2014.06, [URL]. |
| 100. | 板垣奈穂、古閑一憲、白谷正治, スパッタリング成膜法による高品質酸化亜鉛薄膜の形成, 応用物理, 83, 5, 385-389, 2014.05. |
| 101. | H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance dependence of Si quantum dot-sensitized solar cells on counter electrode, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FZ01, 53, 5S1, 05FZ01, 2014.05, [URL]. |
| 102. | M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, and K. Kamataki, Nanostructure Control of Si and Ge Quantum Dots Based Solar Cells Using Plasma Processes, Materials Science Forum, 10.4028/www.scientific.net/MSF.783-786.2022, 783-786, 2022-2027, 2014.05, [URL]. |
| 103. | I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, and N. Itagaki, Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015064, 1, 015064, 2014.03, [URL]. |
| 104. | M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015020, 1, 015020, 2014.03, [URL]. |
| 105. | N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization, Proc. SPIE photonics west 2014, 10.1117/12.2041081 , 8987, 89871A, 2014.03, [URL]. |
| 106. | H. Seo, M. Son, S. Park, M. Jeong, H. Kim, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell, Thin Solid Films, 10.1016/j.tsf.2013.08.103, 554, 122-126, 2014.03, [URL]. |
| 107. | G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015082, 1, 015082, 2014.03, [URL]. |
| 108. | S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, and M. Shiratani, Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015069, 1, 015069, 2014.03, [URL]. |
| 109. | X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori, Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015072, 1, 015072, 2014.03, [URL]. |
| 110. | M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga, Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015083, 1, 015083, 2014.03, [URL]. |
| 111. | G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015080, 1, 015080, 2014.03, [URL]. |
| 112. | Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P37, 2014.02. |
| 113. | A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida, Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S2-P35, 2014.02. |
| 114. | I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P05, 2014.02. |
| 115. | R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P03, 2014.02. |
| 116. | T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P19, 2014.02. |
| 117. | M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Spatial profile of flux of dust particles in hydrogen helicon plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P21, 2014.02. |
| 118. | D. Yamashita, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Raman spectroscopy of a fine particle optically trapped in plasma, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P23, 2014.02. |
| 119. | H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Quantum characterization and photovoltaic application of Si nano-particles fabricated by multi-hollow plasma discharge chemical vapor deposition, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S11-P36, 2014.02. |
| 120. | X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori, Pressure dependence of carbon film deposition using H-assisted plasma CVD, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P14, 2014.02. |
| 121. | T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-SPD-P01, 2014.02. |
| 122. | K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P07, 2014.02. |
| 123. | S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P17, 2014.02. |
| 124. | D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P33, 2014.02. |
| 125. | G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani, Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries, Proc. 8th Int. Conf. Reactive Plasmas, 4C-PM-O1, 2014.02. |
| 126. | K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P02, 2014.02. |
| 127. | T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S08-P10, 2014.02. |
| 128. | Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P36, 2014.02. |
| 129. | S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P32, 2014.02. |
| 130. | K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-14, 2014.02. |
| 131. | Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P35, 2014.02. |
| 132. | H. Seo, D. Ichida, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells, Int. J. Precision Eng. Manuf., 10.1007/s12541-014-0343-8, 15, 2, 339-343, 2014.02, [URL]. |
| 133. | Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S02-P10, 2014.02. |
| 134. | M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida, A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 4B-PM-O1, 2014.02. |
| 135. | M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, G. Uchida, H. Seo, and N. Itagaki, Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010201, 53, 1, 010201, 2014.01, [URL]. |
| 136. | H. Seo, Y. Wang, M. Sato, G. Uchida, K. Koga, N. Itagaki, K. Kamataki, M. Shiratani, The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si, Thin Solid Films, 10.1016/j.tsf.2013.04.073, 546, 284-288, 2013.11, [URL]. |
| 137. | H. Seo, Y. Wang, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, S. Nam, J. Boo, Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO2, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM02, 52, 11S, 11NM02, 2013.11, [URL]. |
| 138. | K. Koga, M. Tateishi, K. Nishiyama, G. Uchida, K. Kamataki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, Akiko Sagara, the LHD Experimental Group, Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA08, 52, 11S, 11NA08, 2013.11, [URL]. |
| 139. | K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 eV to 3.3 eV on ZnO Templates, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM06, 52, 11S, 11NM06, 2013.11, [URL]. |
| 140. | I. Suhariadi, K. Oshikawa, K. Kuwahara, K. Matsushima, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NB03, 52, 11S, 11NB03, 2013.11, [URL]. |
| 141. | Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani, Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si and SiH, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA07, 52, 11S, 11NA07, 2013.11, [URL]. |
| 142. | G. Uchida, Y. Wang, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA05, 52, 11S, 11NA05, 2013.11, [URL]. |
| 143. | H. Seo, M. Son, H. Kim, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys., 10.7567/JJAP.52.10MB07, 52, 10S, 10MB07, 2013.10, [URL]. |
| 144. | G. Uchida, M. Sato, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells, Thin Solid Films, 10.1016/j.tsf.2013.04.111, 544, 93-98, 2013.10, [URL]. |
| 145. | 白谷正治, 古閑一憲, 内田儀一郎, Hyunwoong Seo, 板垣奈穂, 岩下伸也, ナノ材料のプラズマプロセシングの研究の現状と将来 , 表面科学, 34, 10, 520, 2013.10, [URL]. |
| 146. | Y. Kim, T. Matsunaga, K. Nakahara, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.04.029, 228, 1, S550–S553, 2013.08, [URL]. |
| 147. | K. Koga, K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.154, 438, S727–S730, 2013.07, [URL]. |
| 148. | K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, and H. Kersten, Discharge power dependence of carbon dust flux in a divertor simulator, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.169, 438, S788–S791, 2013.07, [URL]. |
| 149. | Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Observation of nanoparticle growth process using a high speed camera, ISPC 21 Proceedings, 2013.07, [URL]. |
| 150. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Growth control of ZnO nano-rod with various seeds and photovoltaic application, J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012029, 441, 1, 012029, 2013.06, [URL]. |
| 151. | S. Bornholdt, N. Itagaki, K. Kuwahara, H. Wulff, M. Shiratani and H. Kersten, Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films , Plasma Sources Sci. Technol., 10.1088/0963-0252/22/2/025019, 22 , 2, 025019, 2013.04, [URL]. |
| 152. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells, Electrochimica Acta, 10.1016/j.electacta.2013.02.026, 95, 1, 43-47, 2013.04, [URL]. |
| 153. | D. C. Look, K. D. Leedy, A. Kiefer, B. Claflin, N. Itagaki, K. Matsushima, I. Surhariadi, Model for Thickness dependence of mobility and concentration in highly conductive ZnO, Opt. Engineering, 10.1117/1.OE.52.3.033801, 52, 3, 033801, 2013.03, [URL]. |
| 154. | N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 84-87, 2013.03, [URL]. |
| 155. | M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 100-103, 2013.03, [URL]. |
| 156. | K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Control of Deposition Profile and Properties of Plasma CVD Carbon Films, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 136-139, 2013.03, [URL]. |
| 157. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell, Electrochimica Acta, 10.1016/j.electacta.2012.09.087, 87, 1, 213-217, 2013.01, [URL]. |
| 158. | H. Seo, Y. Wang, M. Sato, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD05, 52, 1S, 01AD05, 2013.01, [URL]. |
| 159. | Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, M. Shiratani, High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD01, 52, 1S, 01AD01, 2013.01, [URL]. |
| 160. | I. Suhariadi, K. Matsushima, K. Kuwahara, K. Oshikawa, D. Yamashita, H. Seo, G. Uchida, K. Kamtaki, K. Koga, M. Shiratani, S. Bornholdt, H. Kersten, Harm Wulff, N. Itagaki, Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AC08, 52, 1S, 01AC08, 2013.01, [URL]. |
| 161. | S. Iwashita, K. Nishiyama, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Dust particle formation due to interaction between graphite and helicon deuterium plasmas, Fusion Engineering and Design, 10.1016/j.fusengdes.2012.10.002, 88, 1, 28-32, 2013.01, [URL]. |
| 162. | N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors (Invited), Proc. International Symposium on Dry Process, 34, 97-98, 2012.11. |
| 163. | Y. Kim, T. Matsunaga, K. Nakahara ,G. Uchida, K. Kamataki , N. Itagaki, H. Seo, K. Koga, M. Shiratani , Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD , Thin Solid Films, 10.1016/j.tsf.2012.06.023, 523, 29-33, 2012.11, [URL]. |
| 164. | K. Kamataki, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage, Thin Solid Films, 10.1016/j.tsf.2012.07.059, 523, 76-79, 2012.11, [URL]. |
| 165. | I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani, ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.37.165, 37, 2, 165-168, 2012.06, [URL]. |
| 166. | K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers, Thin Solid Films, 10.1016/j.tsf.2011.10.136, 520, 14, 4674-4677, 2012.05, [URL]. |
| 167. | H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.890, 1426, 313-318, 2012.04, [URL]. |
| 168. | Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.839, 1426, 307-311, 2012.04, [URL]. |
| 169. | K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki , In situ analysis of size dispersion of nano-particles in reactive plasma using two dimentional laser light scattering method, Journal of Instrumentation, 10.1088/1748-0221/7/04/C04017, 7, 4, C04017, 2012.04, [URL]. |
| 170. | M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.1245, 1426, 377-382, 2012.04, [URL]. |
| 171. | N. Itagaki, K. Kuwahara, K. Matsushima, K. Oshikawa , Novel fabrication method for ZnO films via nitrogen-mediated crystallization (Invited), Proc. of SPIE photonics west 2012, 10.1117/12.911971, 8263, 826306, 2012.01, [URL]. |
| 172. | G. Uchida, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD01, 51, 1, 01AD01, 2012.01, [URL]. |
| 173. | K. Koga, K. Nakahara, Y. Kim, T. Matsunaga, D.Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD03, 51, 1, 01AD03, 2012.01, [URL]. |
| 174. | K. Koga, T. Matsunaga, Y. Kim, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, and M. Shiratani, Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD02, 51, 1, 01AD02, 2012.01, [URL]. |
| 175. | K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers, Proc. PVSEC-21, 4D-2P-11, 2011.11. |
| 176. | N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization, Proc. PVSEC-21, 4D-2P-10, 2011.11. |
| 177. | Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste, Proc. PVSEC-21, 3D-5P-09, 2011.11. |
| 178. | T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films, Proc. PVSEC-21, 4D-2P-16, 2011.11. |
| 179. | K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-20, 2011.11. |
| 180. | Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd, Proc. PVSEC-21, 3D-2P-09, 2011.11. |
| 181. | K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD, Proc. Plasma Conf. 2011, 24P014-O, 2011.11. |
| 182. | K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure, Proc. Plasma Conf. 2011, 23G03, 2011.11. |
| 183. | Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD, Proc. Plasma Conf. 2011, 24P011-O, 2011.11. |
| 184. | Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer, Proc. Intern. Symp. on Dry Process, 33, 133-134, 2011.11, [URL]. |
| 185. | N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering, Proc. Plasma Conf. 2011, 24G16, 2011.11. |
| 186. | T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition, Proc. Plasma Conf. 2011, 24P015-O, 2011.11. |
| 187. | M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD, Proc. Plasma Conf. 2011, 24G06, 2011.11. |
| 188. | K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H., G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films, Proc. Plasma Conf. 2011, 24P008-O, 2011.11. |
| 189. | Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD, Proc. Plasma Conf. 2011, 23P013-O, 2011.11. |
| 190. | K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method, Proc. Plasma Conf. 2011, 24P016-O, 2011.11. |
| 191. | K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free a-Si:H films using cluster eliminating filter, Proc. Plasma Conf. 2011, 24P010-O, 2011.11. |
| 192. | K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten, Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage, Proc. Plasma Conf. 2011, 24P094-O, 2011.11. |
| 193. | G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD, Physica Status Solidi (c), 10.1002/pssc.201001230, 8, 10, 3017-3020, 2011.10, [URL]. |
| 194. | K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, M. Shiratani, Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasma, Appl. Phys. Express, 10.1143/APEX.4.105001, 4, 10, 105001, 2011.10, [URL]. |
| 195. | G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye, Physica Status Solidi (c), 10.1002/pssc.201100166, 8, 10, 3021-3024, 2011.10, [URL]. |
| 196. | K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method, Physica Status Solidi (c), 10.1002/pssc.201100229, 8, 10, 3013-3016, 2011.10, [URL]. |
| 197. | K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma , Proc. of International Conference on Phenomena in Ionized Gases（ICPIG） 2011 Conference, D13-318, 2011.09. |
| 198. | K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film, Thin Solid Films, 10.1016/j.tsf.2011.01.408, 519, 20, 6896-6898, 2011.08, [URL]. |
| 199. | Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry （ISPC20）, POL08, 2011.07. |
| 200. | M. Shiratani, K. Koga, S. Iwashita, G. Uchida, N. Itagaki, K. Kamataki, Nano-factories in plasma: present status and outlook, J. Phys. D: Appl. Phys., 10.1088/0022-3727/44/17/174038 , 44, 17, 174038, 2011.05, [URL]. |
| 201. | N. Itagaki, K. Kuwahara, K. Nakahara, Novel Fabrication Method for Transparent Conducting Oxide Films Utilizing Solid-Phase Crystallized Seed Layers, Proc. Int. Conf. Advances in Condensed and Nano Materials 2011, 10.1063/1.3653599, 1393, 23-26 , 2011.02, [URL]. |
| 202. | K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics, International Conference on Advances in Condensed and Nano Materials (ICACNM), 10.1063/1.3653600, 1393, 27-30, 2011.02, [URL]. |
| 203. | N. Itagaki, K. Kuwahara, Novel fabrication method of ZnO films utilizing solid-phase crystallized seed layers, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2011.709 , 1315, 15-20 , mrsf10-1315-mm02-09 (6 pages) , 2011.01, [URL]. |
| 204. | N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase, Appl. Phys. Express, 10.1143/APEX.4.011101, 4, 1, 011101-011101-3 , 2011.01, [URL]. |
| 205. | N. Itagaki, Novel fabrication method for oxide semiconductors via atomic-additive mediated crystallization , Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686461, 998-1001, 2010.11, [URL]. |
| 206. | M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5685920, XII-XVI , 2010.11, [URL], プラズマナノテクノロジーで最重要課題となっている揺らぎの制御に関する現状と将来を展望した論文。. |
| 207. | G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686704, 2199-2201, 2010.11, [URL]. |
| 208. | K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686456, 1943-1947, 2010.11, [URL]. |
| 209. | T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686679 , 2219-2212, 2010.11, [URL]. |
| 210. | K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686686, 2216-2218, 2010.11, [URL]. |
| 211. | H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles, Proc. of International Symposium on Dry Process, 43-44, P1-A17, 2010.11. |
| 212. | G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges , Proc. of MNC2010, 12D-11-66 , 2010.11. |
| 213. | G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00093, 2010.10. |
| 214. | K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00087, 2010.10. |
| 215. | T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00089, 2010.10. |
| 216. | H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group , Carbon dust particles generated due to H2 plasma-carbon wall interaction, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00114, 2010.10. |
| 217. | Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5617205, 3347-3351, 2010.07, [URL]. |
| 218. | K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616514, 3722-3755, 2010.07, [URL]. |
| 219. | H. Kumomi, S. Yaginuma, H. Omura, A.Goyal, A. Sato, M. Watanabe, M. Shimada, N. Kaji, K. Takahashi, M. Ofuji, T. Watanabe, N. Itagaki, H. Shimizu, K. Abe, Y. Tateishi, H. Yabuta, T. Iwasaki, R. Hayashi, T. Aiba, M. Sano, Materials, Devices, and Circuits of Transparent Amorphous-Oxide Semiconductor, J. Display Technol., 10.1109/JDT.2009.2025521 , 5, 12, 531-540, 2009.12, [URL]. |
| 220. | A. Goyal, T. Iwasaki, N. Itagaki, T. Den, and H. Kumomi, Favorable Elements for an Indium-based Amorphous-oxide TFT Channel: Study of In-X-O (X=B, Mg, Al, Si, Ti, Zn, Ga, Ge, Mo, Sn) Systems, Mat. Res. Soc. Symp. Proc, 1109, 1109-B04-0, 2009.05. |
| 221. | N. Itagaki, T. Iwasaki, H. Kumomi, T. Den, K. Nomura, T. Kamiya, and H. Hosono, Zn-In-O based thin-film transistors: Compositional dependence, Phys. Stat. Sol. (a), 10.1002/pssa.200778909, 205, 8, 1915–1919, 2008.08, [URL]. |
| 222. | T. Iwasaki, N. Itagaki, T. Den, H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono,, Combinatorial approach to thin-film transistors using multicomponent semiconductor channels: An application to amorphous oxide semiconductors in In-Ga-Zn-O system, Appl. Phys. Lett., 10.1063/1.2749177, 90, 24, 242114, 2007.06, [URL]. |
| 223. | C. Niikura, N. Itagaki, Matsuda, Guiding Principles for Obtaining High-Quality Microcrystalline Silicon Growth Rates Using SiH4/H2 Glow-Discharge Plasma, Jpn. J. Appl. Phys., 10.1143/JJAP.46.3052, 46, 5A, 3052-3058, 2007.05, [URL]. |
| 224. | C. Niikura, N. Itagaki, and Matsuda, High rate growth of high-quality microcrystalline silicon films from plasma by interconnected multi-hollow cathode, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.009, 201, 9-11, 5463-5467, 2007.02, [URL]. |
| 225. | C. Niikura, N. Itagaki, and A. Matsuda, Guiding Principles for Preparing High Quality Microcrystalline Silicon at High Growth Rates, Trans. Mater. Res. Soc. Jpn., 31, 2, 503-506, 2006.06. |
| 226. | T. Iwasaki, N. Itagaki, T. Den, H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono, Combinatorial study on In-Ga-Zn-O semiconductor films as active-channel layers for thin-film transistor, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-0928-GG10-04, 928, 80-85, 2006.06, [URL]. |
| 227. | N. Itagaki, K. Sasaki, Y. Kawai, Electron temperature measurement in SiH4/H2 ECR plasma produced by 915 MHz microwaves, Thin Solid Films, 10.1016/j.tsf.2005.08.087, 506, 479-484, 2006.05, [URL]. |
| 228. | D. Ha Thang, K. Sasaki, H. Muta, N. Itagaki, and Y. Kawai, Characteristics of the plasma parameters in the fabrication of microcrystalline silicon thin films using 915 MHz ECR plasma, Thin Solid Films, 10.1016/j.tsf.2005.08.064, 506, 485-488, 2006.05, [URL]. |
| 229. | Y. Kawai, N. Itagaki, M. Koga, and H. Muta, Production of low electron temperature ECR plasma, Surf. Coat. Technol., 10.1016/j.surfcoat.2004.08.141, 193, 1-3, 11-16, 2005.04, [URL]. |
| 230. | N. Itagaki, C. Niikura, A. Matsuda and M. Kondo, Production of high density VHF plasma using a cathode with interconnected multi holes, Proc. Plasma Sci. Symp. 2005 and the 22th Symp. on plasma processing, 163-164, 2005.01. |
| 231. | H. Muta, D. Ha Thang, N. Itagaki, and Y. Kawai, Investigation of the Plasma Parameters in 915 MHz ECR Plasma with SiH4/H2 Mixtures, Proc. Plasma Sci. Symp. 2005 and the 22th Symp. on plasma processing, 521-522, 2005.01. |
| 232. | C. Niikura, N. Itagaki, M. Kondo, Y. Kawai, and Matsuda, High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma, Thin Solid Films, 10.1016/j.tsf.2003.12.041, 457, 1, 84-89, 2004.06, [URL]. |
| 233. | N. Itagaki, K. Muta, N. Ishii and Y. Kawai, Control of the electron temperature by varying the resonance zone width in ECR plasma, Thin Solid Films, 10.1016/j.tsf.2003.12.014, 457, 1, 59-63, 2004.06, [URL]. |
| 234. | H. Muta, N. Itagaki, M. Koga, and Y. Kawai, Generation of a low-electron-temperature ECR plasma using mirror magnetic field, Surf. Coat. Technol., 10.1016/S0257-8972(03)00525-5, 174, 152-156, 2003.09, [URL]. |
| 235. | N. Itagaki, S. Iwata, K. Muta, A. Yonesu, S. Kawakami, N. Ishii and Y. Kawai, Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma, Thin Solid Films, 10.1016/S0040-6090(03)00395-X, 435, 1, 259-263, 2003.07, [URL]. |
| 236. | N. Itagaki, K. Muta, N. Ishii and Y. Kawai, Relationship between the electron temperature and the power absorption profile in ECR plasma, Proc. 16th Intern. Symp. on Plasma Chemistry, Po5.18, 2003.06. |
| 237. | N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai , Electron-temperature control in 915 MHz electron cyclotron resonance plasma, J. Vac. Sci. Technol., A, 10.1116/1.1513791, 20, 6, 1969-1973, 2002.11, [URL]. |
| 238. | N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai, Production of low-electron-temperature electron cyclotron resonance plasma with large area using 915MHz microwave, Vacuum, 10.1016/S0042-207X(02)00138-0, 66, 3-4, 323-328, 2002.08, [URL]. |
| 239. | H. Muta, N. Itagaki, and Y. Kawai, Numerical investigation of the production mechanism of a low-temperature electron cyclotron resonance plasma, Vacuum, 10.1016/S0042-207X(02)00130-6, 66, 3-4, 209-214, 2002.08, [URL]. |
| 240. | H. Muta, M. Koga, N. Itagaki, and Y. Kawai, Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures, Surf. Coat. Technol., 10.1016/S0257-8972(03)00261-5, 171, 1-3, 157-161, 2002.07, [URL]. |
| 241. | N. Itagaki, S. Iwata, K. Muta, A. Yonesu, S. Kawakami, N. Ishii and Y. Kawai, Behavior of the molecular dissociation in 915 MHz ECR nitrogen plasma, Proc. 5th Intern. Conf. Reactive Plasmas, 1, 319-320, 2002.07. |
| 242. | N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai , Production of low electron temperature ECR plasma for thin film deposition, Surf. Coat. Technol., 10.1016/S0257-8972(01)01204-X, 142-144, 546-550, 2001.07, [URL]. |
| 243. | N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai, Production of low electron temperature ECR plasma for plasma application, Proc. XXV Intern. Conf. Phenomena in Ionized Gases, 137-138, 2001.07. |
| 244. | N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai, Production of low electron temperature ECR plasma for plasma processing, Thin Solid Films, 10.1016/S0040-6090(01)00920-8, 390, 1-2, 202-207, 2001.06, [URL]. |
| 245. | N. Itagaki, T. Yoshizawa, Y. Ueda and Y. Kawai, Investigation of ECR plasma uniformity from the point of view of production & confinement, Thin Solid Films, 10.1016/S0040-6090(00)01635-7, 386, 2, 152-159, 2001.05, [URL]. |
| 246. | N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai, Production of low-electron-temperature electron cyclotron resonance plasma using nitrogen gas in the mirror magnetic field, Jpn. J. Appl. Phys., 10.1143/JJAP.40.2489 , 40, 4A, 2489-2494, 2001.04, [URL]. |
| 247. | N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai , Effect of magnetic-mirror confinement on electron temperature control in ECR plasma, J. Plasma Fusion Res., 10.1016/S0257-8972(01)01204-X, 4, 305-308, 2001.02, [URL]. |
| 248. | N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai, Production of low-electron-temperature ECR plasma using 915 MHz microwave, Proc. Plasma Sci. Symp. 2001 and the 18th Symp. on plasma processing, 111-112, 2001.01. |
| 249. | N. Itagaki, A. Fukuda, T. Yoshizawa, M. Shindo, Y. Ueda and Y. Kawai, Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma, Surf. Coat. Technol., 10.1016/S0257-8972(00)00758-1, 131, 1-3, 54-57, 2000.09, [URL]. |
主要総説, 論評, 解説, 書評, 報告書等
| 1. | 板垣 奈穂, 古閑 一憲, 白谷 正治, スパッタリング成膜法による高品質酸化亜鉛薄膜の形成, 応用物理, 2014.05, [URL], スパッタリング法を用いた酸化亜鉛（ZnO）薄膜の結晶成長において，初期核形成を制御する新しい方法「不純物添加結晶化（Impurity Mediated Crystallization: IMC）法」を開発した．本手法により，高格子不整合基板上への原子レベルで平坦なZnO単結晶膜の作製や，ガラス基板上への極薄低抵抗ZnO導電膜の形成が可能となった．本稿では，IMC法について紹介するとともに，これら成果の概要を述べる．. |
主要学会発表等
学会活動
所属学会名
Materials Research Society
Europian Materials Research Society
応用物理学会 プラズマエレクトロニクス分科会
応用物理学会 薄膜・表面物理分科会
応用物理学会
学協会役員等への就任
2022.04～2024.03, 応用物理学会, 機関誌企画・編集委員.
2021.04～2021.08, 日本表面真空学会SP部会, 幹事.
2020.10～2025.03, 日本学術会議, 幹事.
2020.10～2023.03, 日本学術振興会 R025委員会, 委員.
2016.04～2023.03, 日本学術振興会 136委員会, 委員.
2015.04～2019.03, 応用物理学会 プラズマエレクトロニクス分科会, 幹事.
2015.03～2019.03, 応用物理学会, 代議員.
2013.11～2022.03, 日本学術振興会153委員会, 委員.
2012.05～2023.03, 応用物理学会九州支部, 理事.
学会大会・会議・シンポジウム等における役割
2023.11.05～2023.11.08, Asian-Europian International Conference on Plasma Surface Engineering, International Scientific Committee Member.
2024.07～2024.07, International Symposium on Sputtering and Plasma Processes (ISSP), Committee.
2023.01.09～2023.01.12, Advances in Functional Materials (AFM) Conference 2023, Chair, Local Organizing Committee.
2022.09.04～2022.09.08, 9th International Symposium on Control of Semiconductor Interfaces, 国際プログラム委員.
2022.09.11～2022.09.16, International Symposium on Sputtering and Plasma Processes (ISSP), Committee.
2019.09.01～2019.09.05, Asian-Europian International Conference on Plasma Surface Engineering, International Program Committee Member.
2019.09.02～2019.09.05, International Conference on Solid State Devices and Materials (SSDM), Committee member.
2018.09.09～2018.09.13, International Conference on Solid State Devices and Materials (SSDM), Committee member.
2017.09.11～2018.09.15, The 11th Asian-European International Conference on Plasma, International Program Committee.
2017.07.31～2017.08.04, The 29th International Conference on Defects in Semiconductors, Organizing Committee.
2016.10.27～2016.10.31, 9th International Workshop on Zinc Oxide and Related Materials (IWZnO 2016), Organizing Committee.
2016.09.01～2016.09.03, 第10回プラズマエレクトロニクスインキュベーションホール, 企画担当幹事.
2015.09.26～2015.09.27, 平成27年度（第68回）電気 ・情報関係学会九州支部連合大会 , 座長（Chairmanship）.
2015.09.20～2015.09.24, 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015), International Program Committee.
2015.09.01～2016.09.03, 第10回プラズマエレクトロニクスインキュベーションホール, 企画担当幹事.
2015.03.28～2015.03.31, International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials, Program Committee.
2015.03.27～2015.03.31, International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials, Sympojium Chair.
2015.01.09～2015.01.10, 2015 Japan-Korea Joint Symposium on Advanced Solar Cells, 座長（Chairmanship）.
2014.12.07～2014.12.11, Pacific Rim Symposium on Surfaces, Coatings and Interfaces, 座長（Chairmanship）.
2014.10.24～2014.10.27, IUMRS-ICYRAM2014, Inter. Advisory Committee member.
2014.02.04～2014.02.07, 8th International Conference on Reactive Plasmas, 現地実行委員.
2013.09.23～2013.09.24, プラズマ材料科学シンポジウム, 運営委員.
2013.01.01～2014.12.31, The 35rd International Symposium on Dry Process, 論文委員.
2012.11.15～2012.11.16, The 33rd International Symposium on Dry Process (DPS 2011), 座長（Chairmanship）.
2012.09.24～2012.09.25, 電気関係学会九州支部連合大会, 座長（Chairmanship）.
2012.09.24～2012.09.28, International Union of Materials Research Societes-International Conference on Electronic Materials 2012, 座長（Chairmanship）.
2012.09.23～2012.09.28, International Union of Materials Research Societes-International Conference on Electronic Materials 2012, シンポジウムチェア.
2012.04～2013.03, 電気関係学会九州支部連合大会 , プログラム委員長.
2012.03.17～2012.03.17, 応用物理学会2012年春季講演会, 座長（Chairmanship）.
2012.02.01～2013.12.31, The 34rd International Symposium on Dry Process, 論文委員.
2011.11.22～2011.11.25, Plasma Conference 20, 座長（Chairmanship）.
2011.11.10～2011.11.11, The 33rd International Symposium on Dry Process (DPS 2011), 座長（Chairmanship）.
2011.04～2012.03, 電気関係学会九州支部連合大会 , プログラム副委員長.
2011.02.01～2011.12.01, The 33rd International Symposium on Dry Process, プログラム委員.
2011.02～2011.12, The 33rd International Symposium on Dry Process, 論文委員.
2010.11.01～2010.11.01, International technical conference of IEEE Region 10, 座長（Chairmanship）.
2010.07～2010.10.01, 電気関係学会九州支部連合大会 , プログラム編集.
2010.06～2010.06.01, 九州表面・真空研究会2010, 座長（Chairmanship）.
学会誌・雑誌・著書の編集への参加状況
2022.04～2024.03, 応用物理, 国内, 企画編集委員.
2016.02～2025.03, Science and Technology of Advanced Materials (STAM), 国際, 編集委員.
2013.07～2013.10, The Physical Society of Japan. Conference Proceedings , 国際, 編集委員.
2012.08, Transactions of the Materials Research Society of Japan, 国際, 編集委員.
学術論文等の審査
| 年度 | 外国語雑誌査読論文数 | 日本語雑誌査読論文数 | 国際会議録査読論文数 | 国内会議録査読論文数 | 合計 |
|---|---|---|---|---|---|
| 2018年度 | 5 | 70 | 75 | ||
| 2017年度 | 3 | 40 | 43 | ||
| 2016年度 | 3 | 30 | 33 | ||
| 2015年度 | 6 | 30 | 36 | ||
| 2014年度 | 9 | 20 | 29 | ||
| 2013年度 | 6 | 6 | |||
| 2012年度 | 7 | 30 | 7 | ||
| 2011年度 | 6 | 6 | |||
| 2010年度 | 2 | 3 | 5 |
その他の研究活動
受賞
Best Poster Award, 2022 MRS Spring Meeting & Exhibit, Material Research Society, 2022.05.
プラズマ・核融合学会 九州・沖縄・山口支部 第 25 回 （令和3年度）支部大会講演奨励賞, プラズマ・核融合学会, 2021.12.
第45回（2018年秋季）応用物理学会講演奨励賞, 応用物理学会, 2018.09.
第14回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2016.03.
さきがけ「太陽光と光電変換機能」研究領域 総括賞, 独立行政法人科学技術振興機構「太陽光と光電変換機能」研究領域, 2015.01.
プラズマ材料科学賞（奨励部門）, 学振 153委員会, 2013.08.
Outstanding Poster Award, the 9th Asian-European International Conference on Plasma Surface Engineering 2013, 2013.08.
International Symposium on Sputtering and Plasma Processes 2013; Poster Award , International Symposium on Sputtering and Plasma Processes, 2013.07.
Award for Encouragement of Research in Materials Science , IUMRS-ICEM2012, 2012.09.
11th APCPST "Advanced Plasma Application Award", 11th Asia Pacific Conference on Plasma Science adn Technology (APCPST) & 25th Symposium on Plasma Science for Materials (SPSM), 2012.10.
Best Poster Presentation Award, th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials, 2012.03.
IUMRS-ICEM2012 "Young Scientist Awards: Silver Award Winners", 日本MRS, 2012.09.
ISPlasma2012 "Best Presentation Award", ISPlasma2012, 2012.03.
研究資金
科学研究費補助金の採択状況(文部科学省、日本学術振興会)
2023年度～2024年度, 挑戦的研究（萌芽）, 代表, 不均一場中での励起子ドリフトの実証と新概念・励起子デバイスの創製.
2022年度～2026年度, 基盤研究(S), 分担, ポストムーア時代を見据えた超伝導コンピューティング技術の創成と展開.
2021年度～2022年度, 挑戦的研究（萌芽）, 代表, 量子情報を記憶する「明るい」長寿命励起子の創製.
2021年度～2024年度, 基盤研究(B), 代表, 励起子トランジスタの創成と励起子輸送の学理探求：情報担体へ進化する励起子.
2019年度～2020年度, 挑戦的研究（萌芽）, 代表, エキシトンが情報を伝達し記憶する革新的古典／量子デバイスの創製.
2018年度～2021年度, 基盤研究(B), 代表, スパッタエピタキシーによる革新的エキシトンデバイスの実現と励起子輸送機構の解明.
2015年度～2018年度, 若手研究(A), 代表, フラックス制御スパッタによる高品質酸窒化物の創製と新概念光スイッチへの応用.
2012年度～2014年度, 新学術領域研究, 分担, プラズマ・ナノマテリアル動態学の創成と安全安心医療科学の構築.
2013年度～2014年度, 挑戦的萌芽研究, 代表, 酸窒化物量子井戸中のエキシトン流を利用した高速・低消費電力トランジスタの創成.
2011年度～2012年度, 若手研究(B), 代表, 酸窒化物超格子のピエゾ電界を利用した室温動作エキシトニクスデバイスの創成.
2010年度～2013年度, 新学術領域研究, 分担, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生.
競争的資金(受託研究を含む)の採択状況
2011年度～2014年度, 戦略的創造研究推進事業 (文部科学省), 代表, 新規酸窒化物を用いたピエゾ電界誘起量子井戸型太陽電池の創製.
2010年度～2012年度, 産業技術研究助成事業 (経済産業省), 分担, ナノ粒子制御によるa-Siセルの高光安定化に関する研究.
寄附金の受入状況
2022年度, 村田学術振興財団, 村田学術振興財団研究助成／新規II-III-V-VI族化合物半導体による室温動作エキシトントランジスタの開発.
2021年度, 公益財団法人 豊田理化学研究所, 豊田理研スカラー／新規II-III-V-VI 族化合物半導体による長寿命なブライト励起子の創製.
2019年度, サムコ科学技術財団, サムコ科学技術財団・薄膜技術に関する研究助成.
2016年度, 公益財団法人 池谷科学技術振興財団, 新材料ZIONを用いた超小型・高速E/O変換デバイスの創製.
2014年度, 公益財団法人 村田学術振興財団 , 研究助成/2次元エキシトンガスをチャネルとした超高速・超低消費電力トランジスタの創成
.
.
2013年度, 材料科学技術振興財団, 研究助成/高速・低消費電力エキシトニックトランジスタを実現する新材料ZnInON歪量子井戸チャネルの開発.
2012年度, 公益財団法人豊田理化学研究所, 豊田理研スカラー／室温動作型エキシトニックトランジスタを実現する新規酸窒化物半導体材料の創成.
2011年度, 公益財団法人 徳山科学技術振興財団, 国際交流助成 .
2011年度, 財団法人九州大学後援会, 財団法人九州大学後援会 「教員の研究プロジェクト」／エキシトニクス流を用いた超高速・超低消費電力型新概念トランジスタの創
成.
成.
2010年度, 矢崎科学技術振興記念財団, 矢崎科学技術振興記念財団
２０１０（H22）年度『国際交流援助』
High quality ZnO films prepared by solid-phase crystallization of amorphous ZnON films.
２０１０（H22）年度『国際交流援助』
High quality ZnO films prepared by solid-phase crystallization of amorphous ZnON films.
学内資金・基金等への採択状況
2022年度～2022年度, 九州大学研究環境整備事業「最先端設備」, 代表, 量子―古典ハイブリッドコンピューター研究設備置.
2022年度～2026年度, 大学改革活性化制度, 代表, 量子コンピュータ講座の設置.
2019年度～2019年度, 九州大学ルネッサンスプロジェクト 若手研究者研究環境整備, 代表, データ駆動型科学に基づく革新デバイス実現のためのオープンプラットフォーム整備.
2010年度～2010年度, 九州大学女性研究者キャリア開発センター国際学会派遣支援, 代表, Novel Fabrication Method For Transparent Conducting Oxide Films Utilizing Solid-Phase Crystallized Seed Layers .
2010年度～2010年度, 九州大学女性研究者キャリア開発センター国際学会派遣支援, 代表, Solid phase crystallization of ZnO films via nitrogen-atom mediation.
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