Updated on 2024/10/01

Information

 

写真a

 
KONDO HIROKI
 
Organization
Faculty of Information Science and Electrical Engineering Department of Electronics Professor
Center of Plasma Nono-interface Engineering (Concurrent)
School of Engineering Department of Electrical Engineering and Computer Science(Concurrent)
Graduate School of Information Science and Electrical Engineering Department of Electrical and Electronic Engineering(Concurrent)
Title
Professor
Contact information
メールアドレス
Tel
0928023628
Profile
岐阜大学プラズマ応用研究センター・特別講義「X線光電子分光の基礎と実践」(2023年6月22日) 岐阜大学プラズマ応用研究センター・特別講義「X線光電子分光の基礎と実践」(2024年7月25日)

Degree

  • Ph. D

Research History

  • Nagoya University Center for Low-temperature Plasma Sciences (cLPS) Associate Professor

    2019.4 - 2023.10

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  • Associate Professor Associate Professor

    2011.10 - 2023.10

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    Country:Japan

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  • Nagoya University Center for Low-temperature Plasma Sciences (cLPS) Guest professor

    2024.1 - Present

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  • Nagoya University Graduate School of Engineering Department of Crystalline Materials Science Assistant

    2007.3

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  • 富士通株式会社・富士通研究所

    富士通株式会社・富士通研究所

  • Nagoya University

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Research Interests・Research Keywords

  • Research theme:Reliability physics in nanosheet electronics - Device degradation mechanism and lifetime prediction from the perspective of atoms and molecules -

    Keyword:Nanoelectronics, atomic force microscope, scanning probe microscope, hard X-ray photoelectron spectroscopy, operando analysis

    Research period: 1999.4

  • Research theme:Research and development of advanced nano-plasma process technology contributing to next-generation nanoelectronics

    Keyword:Nano-electronics, plasma processes, atomic layer deposition, atomic layer etching, high-k/metal gate stacks

    Research period: 1993.4

Papers

  • <i>In situ</i> atom-resolved observation of Si (111) 7x7 surface with F radical and Ar ion irradiation simulated atomic layer etching

    Tsutsumi, T; Asano, A; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   42 ( 3 )   2024.5   ISSN:0734-2101 eISSN:1520-8559

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    Publisher:Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films  

    Ar ions with controlled energy and doses, along with radicals in CF4 plasma, were irradiated separately onto a Si (111) 7 × 7 surface by using a plasma beam reactor. The crystal structure and the chemical bonds on the surface were analyzed by scanning tunneling microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy without air exposure of the samples. The SiF layer formed by F radical irradiation was completely removed by a desorption reaction induced by heating at 600 °C, resulting in an atomically flat surface that maintained the crystal structure. The 7 × 7 structure, which was reconstructed by each irradiation process alone, was not reconstructed because of the synergistic effects of F radicals and Ar ions in the cyclic CF4/Ar plasma used to simulate an atomic layer etching process. The cyclic CF4/Ar plasma process inhibited the reconstruction of the crystal structure by forming a mixture region that included Si, F, and C atoms.

    DOI: 10.1116/6.0003432

    Web of Science

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  • Hydrogen peroxide sensing with nitrogen-doped carbon nanowalls Reviewed International journal

    Rakhymzhan Ye. Zhumadilov, Yerassyl Yerlanuly, Hiroki Kondo, Renata R. Nemkayeva, Tlekkabul S. Ramazanov, Masaru Hori, Maratbek T. Gabdullin

    Sensing and Bio-Sensing Research   43   100614   2024.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1111/odi.14827

  • Deposition of carbon-based materials directly on copper foil and nickel foam as 2D and 3D-networked metal substrates by in-liquid plasma Reviewed International journal

    Ma. Shanlene D.C. Dela Vega, Thi-Thuy-Nga Nguyen, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

    Plasma Processes and Polymers   20 ( 11 )   2300036   2023.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202300036

  • Cancer-specific cytotoxicity of Ringer’s acetate solution irradiated by cold atmospheric pressure plasma Invited Reviewed International journal

    57 ( 1 )   91 - 104   2023.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1080/10715762.2023.2201390

  • Creation of unique shapes by coordination of alumina nanopores and carbon nanowalls Reviewed International journal

    Yerassyl Yerlanuly, Dennis Christy, Ngo Van Nong, Hiroki Kondo, Balaussa Ye. Alpysbayeva, Rakhymzhan Zhumadilov, Renata R. Nemkayeva, Tlekkabul S. Ramazanov, Masaru Hori, Maratbek T. Gabdullin

    Fullerenes Nanotubes and Carbon Nanostructures   31 ( 4 )   295 - 301   2023.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1080/1536383X.2022.2146672

  • Biocompatibility of conformal silicon carbide on carbon nanowall scaffolds Reviewed International journal

    Koki Ono, Takashi Koide, Kenji Ishikawa, Hiromasa Tanaka, Hiroki Kondo, Ayae Sugawara-Narutaki, Yong Jin, Shigeno Yasuhara, Masaru Hori, Wakana Takeuchi

    Japanese Journal of Applied Physics   62 ( SA )   SA1017   2023.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ac9319

  • Effects of High-Quality Carbon Nanowalls Ionization-Assisting Substrates on Surface-Assisted Laser Desorption/Ionization Mass Spectrometry Performance

    Ryusei Sakai, Hiroki Kondo, Kenji Ishikawa, Takayuki Ohta, Mineo Hiramatsu, Hiromasa Tanaka, Masaru Hori

    Nanomaterials   13 ( 1 )   63 - 63   2022.12   eISSN:2079-4991

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    Language:Others   Publishing type:Research paper (scientific journal)   Publisher:MDPI AG  

    Surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) is performed using carbon nanowalls (CNWs) for ionization-assisting substrates. The CNWs (referred to as high-quality CNWs) in the present study were grown using a radical-injection plasma-enhanced chemical vapor deposition (RI-PECVD) system with the addition of oxygen in a mixture of CH4 and H2 gases. High-quality CNWs were different with respect to crystallinity and C–OH groups, while showing similar wall-to-wall distances and a wettability comparable to CNWs (referred to as normal CNWs) grown without O2. The efficiency of SALDI was tested with both parameters of ion intensity and fragmental efficiency (survival yield (SY)) using N-benzylpyridinuim chloride (N-BP-CI). At a laser fluence of 4 mJ/cm2, normal CNWs had an SY of 0.97 and an ion intensity of 0.13, while 5-sccm-O2– high-quality CNWs had an SY of 0.89 and an ion intensity of 2.55. As a result, the sensitivity for the detection of low-molecular-weight analytes was improved with the high-quality CNWs compared to the normal CNWs, while an SY of 0.89 was maintained at a low laser fluence of 4 mJ/cm2. SALDI-MS measurements available with the high-quality CNWs ionization-assisting substrate provided high ionization and SY values.

    DOI: 10.3390/nano13010063

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  • Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis Reviewed International journal

    Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    Vacuum   205   111351   2022.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.vacuum.2022.111351

  • Power Generation Characteristics of Polymer Electrolyte Fuel Cells Using Carbon Nanowalls as Catalyst Support Material

    Takayuki Ohta, Hiroaki Iwata, Mineo Hiramatsu, Hiroki Kondo, Masaru Hori

    C   8 ( 3 )   44 - 44   2022.8   eISSN:2311-5629

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    Language:Others   Publishing type:Research paper (scientific journal)   Publisher:MDPI AG  

    We evaluated the power generation characteristics of a polymer electrolyte fuel cell (PEFC) composed of Pt-supported carbon nanowalls (CNWs) and a microporous layer (MPL) of carbon black on carbon paper (CP) as catalyst support materials. CNWs, standing vertically on highly crystallizing graphene sheets, were synthesized on an MPL/CP by plasma-enhanced chemical vapor deposition (PECVD) using inductively coupled plasma (ICP). Pt nanoparticles were supported on the CNW surface using the liquid-phase reduction method. The three types of voltage loss, namely those due to activated polarization, resistance polarization, and diffusion polarization, are discussed for the power generation characteristics of the PEFC using the Pt/CNWs/MPL/CP. The relationship between the height or gap area of the CNWs and the voltage loss of the PEFC is demonstrated, whereby the CNW height increased with the extension of growth time. The three-phase interface area increased with the increase in the CNW height, resulting in mitigation of the loss due to activated polarization. The gap area of the CNWs varied when changing the CH4/H2 gas ratio. The loss due to diffusion polarization was reduced by enlarging the gap area, due to the increased diffusion of fuel gas and discharge of water. The secondary growth of the CNWs caused the three-phase interface area to decrease as a result of platinum aggregation, impedance of the supply of ionomer dispersion solution to the bottom of the CNWs, and inhibition of fuel gas and water diffusion, which led to the loss of activated and diffuse polarizations. The voltage losses can be mitigated by increasing the height of CNWs while avoiding secondary growth.

    DOI: 10.3390/c8030044

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  • In-liquid plasma synthesis of iron–nitrogen-doped carbon nanoflakes with high catalytic activity Reviewed International journal

    Hiroki Kondo, Ryo Hamaji, Tomoki Amano, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    Plasma Processes and Polymers   19 ( 8 )   2100203   2022.4   ISSN:1612-8850 eISSN:1612-8869

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    Flake-shaped carbon nanomaterials with nitrogen (N) and iron (Fe) addition, so-called carbon nanoflakes (CNFLs), were synthesized by the in-liquid plasma using two different kinds of additive agents, such as hemin and iron (II) phthalocyanine (FePc). According to scanning electron microscopy images and Raman spectra, CNFLs with a size of at least 100 nm order were formed regardless of types of additive agents, and crystallinity of six-membered ring structures was improved as additive agents increased. Photoelectron spectra showed that pyridinic N contents increased from 1.05% to 2.02% with increasing FePc, while those decreased from 0.34% to 0.14% with hemin. In the oxygen reduction reaction, onset potential values also increased from 0.71 to 0.79 eV with increasing FePc, while those decreased from 0.60 to 0.47 eV with hemin. These results suggested that the catalytic activity of CNFLs was effectively improved by the increase of pyridinic N by the in-liquid plasma synthesis with FePc. In contrast, the electron transfer numbers reached 3.81 when hemin increased, although those were less than 2.88 in the cases using FePc. These results mean that the in-liquid plasma synthesis method of CNFLs using FePc has the potential to further improve its catalytic activity.

    DOI: 10.1002/ppap.202100203

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  • Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS)

    Sakai Ryusei, Ichikawa Tomonori, Kondo Hiroki, Ishikawa Kenji, Shimizu Naohiro, Ohta Takayuki, Hiramatsu Mineo, Hori Masaru

    NANOMATERIALS   11 ( 2 )   1 - 11   2021.2

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    Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS)
    Carbon nanowalls (CNWs), which are vertically oriented multi-layer graphene sheets, were employed in surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) measurements to detect low-molecular-weight organic compounds. CNWs substrates with widely different wall-to-wall distances from 142 to 467 nm were synthesized using a radical-injection plasma-enhanced chemical vapor deposition (RI-PECVD) system with nanosecond pulse biasing to a sample stage. When survival yield (SY) values of N-benzylpyridinium chloride (N-BP-Cl) were examined, which is commonly used to evaluate desorption/ionization efficiency, a narrower wall-to-wall distance presented a higher SY value. The highest SY value of 0.97 was realized at 4 mJ/cm(2) for the highest-density CNWs with a wall-to-wall distance of 142 nm. The laser desorption/ionization effect of arginine, an amino acid, was also investigated. When CNWs with a narrower wall-to-wall distance were used, the signal-to-noise (SN) ratios of the arginine signals were increased, while the intensity ratios of fragment ions to arginine signals were suppressed. Therefore, the CNWs nanostructures are a powerful tool when used as a SALDI substrate for the highly efficient desorption/ionization of low-molecular-weight biomolecules.

    DOI: 10.3390/nano11020262

  • Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature

    Sugiura, H., Kondo, H., Higuchi, K., Arai, S., Hamaji, R., Tsutsumi, T., Ishikawa, K., Hori, M.

    Carbon   170   93 - 99   2020.12

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.carbon.2020.07.052

  • Measurements of nitrogen atom density in a microwave-excited plasma jet produced under moderate pressures

    Kim J

    IEEJ Transactions on Electrical and Electronic Engineering   15 ( 9 )   1281 - 1287   2020.9

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    Measurements of nitrogen atom density in a microwave-excited plasma jet produced under moderate pressures
    Using a microwave-excited plasma source based on a microstrip line, we have generated a nitrogen plasma jet at a moderate pressure in the range from 1 to 10 kPa. The densities of nitrogen (N) atoms produced by the plasma jet were measured with a vacuum ultraviolet absorption spectroscopy. The results show that the plasma jet is able to provide a high density of N atoms at least 4.5 x 10(14) cm(-3)at 1.5 kPa. The N atom densities vary widely with the change in gas flow rate and substrate placement. We expect that this plasma source will provide a high performance as an advanced N radical source in various applications. (c) 2020 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.

    DOI: 10.1002/tee.23194

  • Synthesis of carbon nanowalls on the surface of nanoporous alumina membranes by RI-PECVD method

    Yerlanuly, Y., Christy, D., Van Nong, N., Kondo, H., Alpysbayeva, B., Nemkayeva, R., Kadyr, M., Ramazanov, T., Gabdullin, M., Batryshev, D., Hori, M.

    Applied Surface Science   523   2020.9

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.apsusc.2020.146533

  • In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ions and Cl radicals

    Hasegawa, M., Tsutsumi, T., Tanide, A., Nakamura, S., Kondo, H., Ishikawa, K., Sekine, M., Hori, M.

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films   38 ( 4 )   2020.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1116/6.0000124

  • In-plane modification of hexagonal boron nitride particles via plasma in solution

    Tsuyohito Ito, Taku Goto, Kenichi Inoue, Kenji Ishikawa, Hiroki Kondo, Masaru Hori, Yoshiki Shimizu, Yukiya Hakuta, Kazuo Terashima

    Applied Physics Express   13 ( 6 )   2020.6

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    Language:Others   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1882-0786/ab916c

  • Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp(2) carbon structures

    Sugiura Hirotsugu, Ohashi Yasuyuki, Ishikawa Kenji, Kondo Hiroki, Kato Toshiaki, Kaneko Toshiro, Takeda Keigo, Tsutsumi Takayoshi, Hayashi Toshio, Sekine Makoto, Hori Masaru

    DIAMOND AND RELATED MATERIALS   104   2020.4

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    Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp2 carbon structures
    Hydrogenated amorphous carbon (a-C:H) films comprise nanoclustering graphites (nc-G), fused aromatic rings (nR), and olefinic chain clusters (nC) of sp(2)-bonded carbons in an sp a matrix. In this study, the sp(2) composition of the nc-G, nR and nC in a-C:H films is found to be determined by the ion bombardment energy flux (Gamma(Ei)), which can be estimated as the product of ion bombardment energy and ion flux onto the deposited surface, in plasma-enhanced chemical vapor deposition using a plasma mixture of H-2 and CH4 gases with the H radical injection method. The sp(2) composition is analyzed using Raman spectroscopy and near-edge X-ray absorption structure spectroscopy. a-C:H becomes increasingly graphitized with increasing Gamma(Ei). The precise control of the sp(2) C structure composition can be achieved by controlling the very-high-frequency input power and radio frequency input bias power via the ion flux and ion bombardment energy.

    DOI: 10.1016/j.diamond.2019.107651

  • In-Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1-Butanol Reviewed

    Atsushi Ando, Kenji Ishikawa, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Hiroki Kondo, Makoto Sekine, Masaru Hori

    ChemNanoMat   6 ( 4 )   604 - 609   2020.4

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    Language:Others   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/cnma.201900676

  • N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence

    M. Santhosh, N., Filipi?, G., Kovacevic, E., Jagodar, A., Berndt, J., Strunskus, T., Kondo, H., Hori, M., Tatarova, E., Cvelbar, U.

    Nano-Micro Letters   12 ( 1 )   2020.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1007/s40820-020-0395-5

  • Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study

    Fukunaga, Y., Longo, R.C., Ventzek, P.L.G., Lane, B., Ranjan, A., Hwang, G.S., Hartmann, G., Tsutsumi, T., Ishikawa, K., Kondo, H., Sekine, M., Hori, M.

    Journal of Applied Physics   127 ( 2 )   2020.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.5127863

  • Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate

    Isobe, Y., Sakai, T., Suguro, K., Miyashita, N., Kondo, H., Ishikawa, K., Wilson, A.F., Shimizu, N., Oda, O., Sekine, M., Hori, M.

    Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics   37 ( 6 )   2019.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1116/1.5114831

  • Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions Reviewed International journal

    Tanaka Hiromasa, Mizuno Masaaki, Katsumata Yuko, Ishikawa Kenji, Kondo Hiroki, Hashizume Hiroshi, Okazaki Yasumasa, Toyokuni Shinya, Nakamura Kae, Yoshikawa Nobuhisa, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

    SCIENTIFIC REPORTS   9 ( 1 )   13657 - 13657   2019.9

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    Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions
    Non-thermal atmospheric pressure plasma has been widely used for preclinical studies in areas such as wound healing, blood coagulation, and cancer therapy. We previously developed plasma-activated medium (PAM) and plasma-activated Ringer's lactate solutions (PAL) for cancer treatments. Many in vitro and in vivo experiments demonstrated that both PAM and PAL exhibit anti-tumor effects in several types of cancer cells such as ovarian, gastric, and pancreatic cancer cells as well as glioblastoma cells. However, interestingly, PAM induces more intracellular reactive oxygen species in glioblastoma cells than PAL. To investigate the differences in intracellular molecular mechanisms of the effects of PAM and PAL in glioblastoma cells, we measured gene expression levels of antioxidant genes such as CAT, SOD2, and GPX1. Microarray and quantitative real-time PCR analyses revealed that PAM elevated stress-inducible genes that induce apoptosis such as GADD45α signaling molecules. PAL suppressed genes downstream of the survival and proliferation signaling network such as YAP/TEAD signaling molecules. These data reveal that PAM and PAL induce apoptosis in glioblastoma cells by different intracellular molecular mechanisms.

    DOI: 10.1038/s41598-019-50136-w

  • Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS) Reviewed

    Takayuki Ohta, Hironori Ito, Kenji Ishikawa, Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

    Special Issue "Plasma Processing for Carbon-based Materials   5 ( 3 )   2019.7

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    Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS)
    Carbon nanowalls (CNWs), vertically standing highly crystallizing graphene sheets, were used in the application of a surface-assisted laser desorption/ionization time-of-flight mass spectrometry (SALDI-TOF-MS). The CNW substrates solved the issues on interferences of matrix molecules and alkali metal addition ions in low-weight molecule detection. Before SALDI sample preparations, the hydrophobic CNW was treated by atmospheric pressure plasma for exposing hydrophilicity to the CNWs' surface. Detection of water soluble amino acids, arginine, was demonstrated.

    DOI: 10.3390/c5030040

  • Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation Reviewed

    Ichikawa, T., Kondo, H., Ishikawa, K., Tsutsumi, T., Tanaka, H., Sekine, M., Hori, M.

    ACS Applied Bio Materials   2 ( 7 )   2019.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1021/acsabm.9b00178

  • Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy Reviewed

    Sotaro Yamaoka, Hiroki Kondo, Hiroshi Hashizume, Kenji Ishikawa, Hiromasa Tanaka, Masaru Hori

    Applied Physics Express   12 ( 6 )   2019.5

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    Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy
    The effects of plasma-activated Ringer's lactate solution (PAL) on supported lipid bilayers (SLBs) as a cell membrane model were investigated. PAL has selective killing effects on cancer cells. High-speed atomic force microscopy revealed alterations in the morphological dynamics of SLBs in PAL. SLB islands decreased approximately 20-fold faster in the presence of PAL compared to Ringer's lactate solution without plasma treatment. The effect of plasma treatment on the Ringer's lactate solution produced PAL components that account for the observed effects on cell membranes, such as removal of lipid molecules from the edges of SLBs and the following SLBs shrinkage. (C) 2019 The Japan Society of Applied Physics

    DOI: 10.7567/1882-0786/ab1a58

  • A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome

    Niitsu Kiichi, Nakanishi Taiki, Murakami Shunya, Matsunaga Maya, Kobayashi Atsuki, Karim Nissar Mohammad, Ito Jun, Ozawa Naoya, Hase Tetsunari, Tanaka Hiromasa, Sato Mitsuo, Kondo Hiroki, Ishikawa Kenji, Odaka Hidefumi, Hasegawa Yoshinori, Hori Masaru, Nakazato Kazuo

    IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS   13 ( 2 )   470-479 - 479   2019.4

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    A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome

    DOI: 10.1109/TBCAS.2018.2882472

  • Facile synthesis of SnO <inf>2</inf> -graphene composites employing nonthermal plasma and SnO <inf>2</inf> nanoparticles-dispersed ethanol

    Borude, R.R., Sugiura, H., Ishikawa, K., Tsutsumi, T., Kondo, H., Hori, M.

    Journal of Physics D: Applied Physics   15 ( 17 )   2019.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/1361-6463/ab03c4

  • Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition Reviewed

    Isobe, Y., Sakai, T., Sugiyama, N., Mizushima, I., Suguro, K., Miyashita, N., Lu, Y., Wilson, A.F., Kumar, D.A., Ikarashi, N., Kondo, H., Ishikawa, K., Shimizu, N., Oda, O., Sekine, M., Hori, M.

    Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics   37 ( 3 )   2019.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1116/1.5083970

  • Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

    Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   52 ( 10 )   105503 - 105503   2019.3

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    Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

    DOI: 10.1088/1361-6463/aaf8e0

  • Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition Reviewed

    Hirotsugu Sugiura, Lingyun Jia, Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   58 ( 3 )   2019.2

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    Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition
    Amorphous carbon (a-C) thin films were deposited under the control of C-2 radical density using radical-injection plasma-enhanced chemical vapor deposition (RI-PECVD) with CH4/H-2 plasma. By actinometric monitoring of C-2 emission intensities, the plasma parameters were precisely controlled by changing in CH4-containing plasma excitation power independent of H-2 plasma excitation. The control of the incorporation of sp2-C clusters in the a-C films during the a-C film depositions is demonstrated by tailoring Raman positions vs. full widths at half maxima for the G band around 1580 cm(-1) to the RI-PECVD parameters. (C) 2019 The Japan Society of Applied Physics

    DOI: 10.7567/1347-4065/aafd49

  • Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

    Borude, R.R., Sugiura, H., Ishikawa, K., Tsutsumi, T., Kondo, H., Ikarashi, N., Hori, M.

    ACS Applied Nano Materials   2 ( 2 )   649-654   2019.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1021/acsanm.8b02201

  • Real-time control of a wafer temperature for uniform plasma process

    T. Tsutsumi, Y. Fuknaga, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    2018 International Symposium on Semiconductor Manufacturing (ISSM)   2019.2

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    Real-time control of a wafer temperature for uniform plasma process

    DOI: 10.1109/ISSM.2018.8651183

  • Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system

    Fukunaga, Y., Tsutsumi, T., Kondo, H., Ishikawa, K., Sekine, M., Hori, M.

    Japanese Journal of Applied Physics   58 ( 2 )   2019.2

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    DOI: 10.7567/1347-4065/aaf92a

  • Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds Reviewed

    Ichikawa, T., Tanaka, S., Kondo, H., Ishikawa, K., Tsutsumi, T., Sekine, M., Hori, M.

    Applied Physics Express   12 ( 2 )   2019.1

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    DOI: 10.7567/1882-0786/aaf469

  • Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas Reviewed

    Zhang, Y., Ishikawa, K., Mozeti?, M., Tsutsumi, T., Kondo, H., Sekine, M., Hori, M.

    Plasma Processes and Polymers   16 ( 6 )   2019.1

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    DOI: 10.1002/ppap.201800175

  • Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma Reviewed

    Borude, R.R., Sugiura, H., Ishikawa, K., Tsutsumi, T., Kondo, H., Han, J.G., Hori, M.

    Japanese Journal of Applied Physics   58 ( SA )   2019.1

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    DOI: 10.7567/1347-4065/aaec87

  • Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Masakazu Tomatsu, Mineo Hiramatsu, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

    Journal of Carbon Research   5 ( 1 )   2019.1

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    Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition

    DOI: 10.3390/c5010007

  • Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Hirotsugu Sugiura, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

    C-Journal of Carbon Research   5 ( 1 )   2019.1

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    Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition

    DOI: 10.3390/c5010008

  • Liquid dynamics in response to an impinging low-temperature plasma jet Reviewed

    Timothy R. Brubaker, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilen, Masaru Hori

    Journal of Physics D: Applied Physics   52 ( 7 )   2018.12

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    Liquid dynamics in response to an impinging low-temperature plasma jet

    DOI: 10.1088/1361-6463/aaf460

  • Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H2 plasma-enhanced chemical vapor deposition Reviewed

    Shun Imai, Hiroki Kondo, Cho Hyungjun, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    Applied Physics Express   12 ( 1 )   2018.12

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    Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H2 plasma-enhanced chemical vapor deposition
    The electrochemical durability of Pt nanoparticles-supported carbon nanowalls (Pt/CNWs) determined from potential cycle tests was 88&#37; performance after 20 000 cycles and 50&#37; performance around 140 000 cycles when the CNWs were fabricated by the C2F6/H-2 plasma-enhanced chemical vapor deposition system (C2F6-CNWs). Even after the extended start/stop-simulation tests of fuel cell Pt/C2F6-CNWs, Pt was aggregated; however, the morphological structure of the CNWs was maintained and no corrosion was evident from scanning electron microscopy observations and Raman analysis. For graphene-based catalyst supports, i.e., the Pt/C2F6-CNWs, graphene crystallinity is essential to extend electrochemical durability by inhibiting corrosion during fuel cell operation. (C) 2018 The Japan Society of Applied Physics

    DOI: 10.7567/1882-0786/aaf0ab

  • Effect of N<inf>2</inf>/H<inf>2</inf> plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) Reviewed

    Amalraj, F.W., Dhasiyan, A.K., Lu, Y., Shimizu, N., Oda, O., Ishikawa, K., Kondo, H., Sekine, M., Ikarashi, N., Hori, M.

    AIP Advances   8 ( 11 )   2018.11

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    DOI: 10.1063/1.5050819

  • Oriented carbon nanostructures by Plasma processing: Recent advances and future challenges

    Santhosh, N.M., Filipi?, G., Tatarova, E., Baranov, O., Kondo, H., Sekine, M., Hori, M., (Ken) Ostrikov, K., Cvelbar, U.

    Micromachines   9 ( 11 )   2018.11

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    DOI: 10.3390/mi9110565

  • Time Evolution Of Reactive Oxygen Nitrogen Species in Plasma-Activated Essential Media and Water

    Brubaker Timothy, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

    2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS)   2018.10

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    Time Evolution Of Reactive Oxygen Nitrogen Species in Plasma-Activated Essential Media and Water

    DOI: 10.1109/PLASMA.2017.8496057

  • Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching Reviewed

    Zhang, Y., Imamura, M., Ishikawa, K., Tsutsumi, T., Kondo, H., Sekine, M., Hori, M.

    Japanese Journal of Applied Physics   57 ( 10 )   2018.8

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    DOI: 10.7567/JJAP.57.106502

  • Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H2 at 300-500°C Reviewed

    156   219-223   2018.7

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    DOI: 10.1016/j.vacuum.2018.07.040

  • Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons Reviewed

    Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   57 ( 2 )   2018.2

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    DOI: 10.7567/JJAP.57.026201

  • Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol Reviewed

    Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    Applied Physics Express   11 ( 1 )   2018.1

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    DOI: 10.7567/APEX.11.015102

  • Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy Reviewed

    Timothy R. Brubaker, Kenji Ishikawa, Keigo Takeda, Jun-Seok Oh, Hiroki Kondo, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilen, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   122 ( 21 )   2017.12

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    DOI: 10.1063/1.4999256

  • Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium Reviewed

    Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

    PLASMA PROCESSES AND POLYMERS   14 ( 11 )   2017.11

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    DOI: 10.1002/ppap.201700123

  • Surface roughening of photoresist after change of the photon/radical and ion treatment sequence Reviewed

    Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   35 ( 6 )   2017.11

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    DOI: 10.1116/1.4994218

  • High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition Reviewed

    Shun Imai, Hiroki Kondo, Hyungjun Cho, Hiroyuki Kano, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masafumi Ito, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 ( 40 )   2017.10

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    DOI: 10.1088/1361-6463/aa8131

  • Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy Reviewed

    Ryo Furuta, Naoyuki Kurake, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

    BIOINTERPHASES   12 ( 3 )   2017.9

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    DOI: 10.1116/1.4997170

  • Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation Reviewed

    Zecheng Liu, Masato Imamura, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   10 ( 8 )   2017.8

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    DOI: 10.7567/APEX.10.086502

  • Temperature dependence of protection layer formation on organic trench sidewall in H-2/N-2 plasma etching with control of substrate temperature Reviewed

    Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 ( 7 )   2017.7

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    DOI: 10.7567/JJAP.56.076202

  • Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 degrees C Reviewed

    Shinnosuke Takai, Yi Lu, Osamu Oda, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 ( 6 )   2017.6

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    DOI: 10.7567/JJAP.56.06HE08

  • Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy Reviewed

    Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

    PHYSICAL CHEMISTRY CHEMICAL PHYSICS   19 ( 21 )   13438 - 13442   2017.6

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    DOI: 10.1039/c7cp00489c

  • A CONCRETE APPROACH TO DIAGONAL SHORT TIME ASYMPTOTICS OF HEAT KERNELS ASSOCIATED WITH SUB-LAPLACIAN ON CR MANIFOLDS Reviewed

    Hiroki Kondo

    KYUSHU JOURNAL OF MATHEMATICS   71 ( 1 )   65 - 84   2017.3

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    DOI: 10.2206/kyushujm.71.65

  • Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas Reviewed

    Yoshinobu Ohya, Kenji Ishikawa, Tatsuya Komuro, Tsuyoshi Yamaguchi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   50 ( 15 )   2017.3

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    DOI: 10.1088/1361-6463/aa60f7

  • Protein Nanoparticle Formation Using a Circularly Permuted alpha-Helix Rich Trimeric Protein Reviewed

    Norifumi Kawakami, Hiroki Kondo, Masayuki Muramatsu, Kenji Miyamoto

    BIOCONJUGATE CHEMISTRY   28 ( 2 )   336 - 340   2017.2

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    DOI: 10.1021/acs.bioconjchem.6b00735

  • Absolute density of precursor SiH3 radicals and H atoms in H-2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films Reviewed

    Yusuke Abe, Kenji Ishikawa, Keigo Takeda, Takayoshi Tsutsumi, Atsushi Fukushima, Hiroki Kondo, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS LETTERS   110 ( 4 )   2017.1

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    DOI: 10.1063/1.4974821

  • Atomic layer etching of SiO2 by alternating an O-2 plasma with fluorocarbon film deposition Reviewed

    Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   35 ( 1 )   2017.1

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    DOI: 10.1116/1.4971171

  • Microfluidic Transport Through Microsized Holes Treated by Nonequilibrium Atmospheric-Pressure Plasma Reviewed

    Takumi Ito, Kenji Ishikawa, Daisuke Onoshima, Naoto Kihara, Kentaro Tatsukoshi, Hidefumi Odaka, Hiroshi Hashizume, Hiromasa Tanaka, Hiroshi Yukawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Yoshinobu Baba, Masaru Hori

    IEEE TRANSACTIONS ON PLASMA SCIENCE   44 ( 12 )   3060 - 3065   2016.12

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    DOI: 10.1109/TPS.2016.2571721

  • Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    PLASMA PROCESSES AND POLYMERS   13 ( 7 )   730 - 736   2016.7

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    DOI: 10.1002/ppap.201500229

  • Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition Reviewed

    Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   55 ( 4 )   2016.4

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    DOI: 10.7567/JJAP.55.040305

  • Advanced Plasma Science and Its Applications for Nitride and Nanomaterials FOREWORD Reviewed

    Akihiro Wakahara, Osamu Nakatsuka, Minoru Sasaki, Kazuo Terashima, Hiroshi Amano, Takashi Egawa, Yasufumi Fujiwara, Mineo Hiramatsu, Ryoichi Ichino, Yasushi Inoue, Masafumi Ito, Makoto Kasu, Hiroki Kondo, Seiichi Miyazaki, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Hirofumi Takikawa, Yoshimi Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS   55 ( 1 )   2016.1

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    DOI: 10.7567/JJAP.55.01A001

  • Real-time temperature monitoring of Si substrate during plasma processing and its heat-flux analysis Reviewed

    Takayoshi Tsutsumi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   55 ( 1 )   2016.1

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    DOI: 10.7567/JJAP.55.01AB04

  • Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching Reviewed

    Takayoshi Tsutsumi, Yusuke Fukunaga, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING   28 ( 4 )   515 - 520   2015.11

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    DOI: 10.1109/TSM.2015.2470554

  • Development of Microelectrode Arrays Using Electroless Plating for CMOS-Based Direct Counting of Bacterial and HeLa Cells Reviewed

    Kiichi Niitsu, Shoko Ota, Kohei Gamo, Hiroki Kondo, Masaru Hori, Kazuo Nakazato

    IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS   9 ( 5 )   607 - 619   2015.10

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    DOI: 10.1109/TBCAS.2015.2479656

  • High sensitivity of a carbon nanowall-based sensor for detection of organic vapours Reviewed

    RSC Advances   5 ( 110 )   90515 - 90520   2015.10

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    DOI: 10.1039/c5ra12000d

  • Suppression of plasma-induced damage on GaN etched by a Cl-2 plasma at high temperatures Reviewed

    Zecheng Liu, Jialin Pan, Takashi Kako, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 ( 6 )   2015.6

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    DOI: 10.7567/JJAP.54.06GB04

  • CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase Reviewed

    Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 ( 4 )   2015.4

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    DOI: 10.7567/JJAP.54.040301

  • Silicon nitride etching performance of CH2F2 plasma diluted with argon or krypton Reviewed

    Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 ( 4 )   2015.4

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    DOI: 10.7567/JJAP.54.040303

  • Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions Reviewed

    Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   48 ( 4 )   2015.2

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    DOI: 10.1088/0022-3727/48/4/045202

  • Robust characteristics of semiconductor-substrate temperature measurement by autocorrelation-type frequency-domain low-coherence interferometry Reviewed

    Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 ( 1 )   2015.1

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    DOI: 10.7567/JJAP.54.01AB03

  • Carbon nanowall scaffold to control culturing of cervical cancer cells Reviewed

    Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Mineo Hiramatsu, Makoto Sekine, Yoshinobu Baba, Masaru Hori

    APPLIED PHYSICS LETTERS   105 ( 24 )   2014.12

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    DOI: 10.1063/1.4902054

  • Recovery of atom density drift caused by change in reactor wall conditions by real-time autonomous control Reviewed

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   47 ( 42 )   2014.10

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    DOI: 10.1088/0022-3727/47/42/422002

  • Temporal changes in absolute atom densities in H-2 and N-2 mixture gas plasmas by surface modifications of reactor wall Reviewed

    Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Honi

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 5 )   2014.5

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    DOI: 10.7567/JJAP.53.050301

  • Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls Reviewed

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Maseru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 4 )   040307   2014.4

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    DOI: 10.7567/JJAP.53.040307

  • Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O-2 non-equilibrium atmospheric-pressure plasma jet

    Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine, Masaru Hori

    PLASMA SOURCES SCIENCE & TECHNOLOGY   23 ( 2 )   2014.4

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    DOI: 10.1088/0963-0252/23/2/025004

  • Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution Reviewed

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 4 )   040305:1-4   2014.4

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    DOI: 10.7567/JJAP.53.040305

  • Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls Reviewed

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   7 ( 4 )   046201   2014.4

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    DOI: 10.7567/APEX.7.046201

  • Epitaxial growth of GaN by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) in the downflow of a very high frequency (VHF) N-2/H-2 excited plasma - effect of TMG flow rate and VHF power Reviewed

    Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, Masaru Hori

    JOURNAL OF CRYSTAL GROWTH   391   97 - 103   2014.4

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    DOI: 10.1016/j.jcrysgro.2014.01.014

  • Density control of carbon nanowalls grown by CH4/H-2 plasma and their electrical properties Reviewed

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hirarnatsu, Masaru Hori

    CARBON   68   380 - 388   2014.3

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    DOI: 10.1016/j.carbon.2013.11.014

  • Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C Reviewed

    53 ( 1 )   010305:1-4   2014.1

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    DOI: 10.7567/JJAP.53.010305

  • Effect of indirect nonequilibrium atmospheric pressure plasma on anti-proliferative activity against chronic chemo-resistant ovarian cancer cells in vitro and in vivo

    Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, Fumitaka Kikkawa

    PLoS ONE   8 ( 12 )   2013.12

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    DOI: 10.1371/journal.pone.0081576

  • Field Emissions from Organic Nanorods Armored with Metal Nanoparticles

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 12 )   1-4   2013.12

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    DOI: 10.7567/JJAP.52.120203

  • High H radical density produced by 1-m-long atmospheric pressure microwave plasma system

    Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, Masaru Hori

    Japanese Journal of Applied Physics   52 ( 11 )   2013.11

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    DOI: 10.7567/JJAP.52.11NE01

  • Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

    Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito

    APPLIED PHYSICS LETTERS   103 ( 18 )   2013.10

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    DOI: 10.1063/1.4827426

  • Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   6 ( 9 )   2013.9

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    DOI: 10.7567/APEX.6.095201

  • Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability

    Hitoshi Watanabe, Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Shailesh Kumar, Kostya Ostrikov, Masaru Hori

    PLASMA PROCESSES AND POLYMERS   10 ( 7 )   582 - 592   2013.7

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    DOI: 10.1002/ppap.201200141

  • Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability Reviewed

    Hitoshi Watanabe, Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Shailesh Kumar, Kostya Ostrikov, Masaru Hori

    PLASMA PROCESSES AND POLYMERS   10 ( 7 )   582 - 592   2013.7

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    DOI: 10.1002/ppap.201200141

  • Low-Temperature Single-Walled Carbon Nanotube Growth from Pt Catalyst Using Alcohol Gas Source Method in High Vacuum Reviewed

    Hiroki Kondo, Naoya Fukuoka, Ranajit Ghosh, Shigeya Naritsuka, Takahiro Maruyama, Sumio Iijima

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 6 )   2013.6

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    DOI: 10.7567/JJAP.52.06GD02

  • Surface morphology on high-temperature plasma-etched gallium nitride

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    Trans. Mater. Res. Soc. Jpn. 38 (2)   38 ( 2 )   325-328 - 328   2013.6

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    Surface morphology on high-temperature plasma-etched gallium nitride
    We report the surface morphology of gallium nitride (GaN) films during the argon and nitrogen plasma etching at elevated temperatures up to 800°C. For Ar plasma at high substrate temperatures above 600°C, Ar+ ion bombardment dissociates Ga-N bonds by the preferential removal of nitrogen, which promotes roughness of the GaN surface by the aggregation of gallium atoms. In N2 plasma exposure, the N/Ga remains stoichiometric with higher values above 0.85, and the surface is not significantly roughened, even higher at 600°C. Therefore, the aggregation of metallic Ga induces surface roughening during ion-enhanced etching of GaN with elevated substrate temperatures.

    DOI: 10.14723/tmrsj.38.325

  • A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   6 ( 5 )   1-4   2013.5

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    DOI: 10.7567/APEX.6.056201

  • Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes Reviewed

    Masanaga Fukasawa, Hiroyasu Matsugai, Takahiro Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 5 )   2013.5

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    DOI: 10.7567/JJAP.52.05ED01

  • Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO2 on Carbon Nanowalls

    Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    APPLIED PHYSICS EXPRESS   6 ( 4 )   1-4   2013.4

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    DOI: 10.7567/APEX.6.045103

  • Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma Reviewed

    Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   46 ( 10 )   pp. 102001:1-5   2013.3

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    DOI: 10.1088/0022-3727/46/10/102001

  • Characterization of Nb hydrides synthesized in high-pressure supercritical water by micro-beam hard X-ray photoelectron spectroscopy Reviewed

    Kazuo Soda, Hiroki Kondo, Masahiko Kato, Tatsuhito Shiraki, Ken Niwa, Keiji Kusaba, Masashi Hasegawa, Eiji Ikenaga

    Journal of Electron Spectroscopy and Related Phenomena   186 ( 1 )   54 - 57   2013.2

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    DOI: 10.1016/j.elspec.2013.02.006

  • Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma Reviewed

    Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 2 )   pp.020204:1-4   2013.2

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    DOI: 10.7567/JJAP.52.020204

  • Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma Reviewed

    Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 2 )   pp.020204:1-4   2013.2

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    DOI: 10.7567/JJAP.52.020204

  • Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy Reviewed

    Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 2 )   2013.2

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    DOI: 10.7567/JJAP.52.021001

  • Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy

    Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 2 )   pp.021001-1:5   2013.2

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    DOI: 10.7567/JJAP.52.021001

  • Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment

    Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   113 ( 1 )   P.014306:1-6   2013.1

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    DOI: 10.1063/1.4772996

  • Surface loss probability of H radicals on silicon thin films in SiH4/H-2 plasma Reviewed

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   113 ( 1 )   2013.1

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    DOI: 10.1063/1.4773104

  • Surface loss probability of H radicals on silicon thin films in SiH4/H-2 plasma

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   113 ( 1 )   2013.1

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    DOI: 10.1063/1.4773104

  • Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Mineo Hiramatsu, Yuki Nihashi, Hiroki Kondo, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 1 )   2013.1

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    DOI: 10.7567/JJAP.52.01AK05

  • Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells Reviewed

    Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   113 ( 3 )   2013.1

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    DOI: 10.1063/1.4778608

  • Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells

    Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   113 ( 3 )   pp.033304:1-6   2013.1

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    DOI: 10.1063/1.4778608

  • Highly selective etching of SiO2 over Si3N 4 and Si in capacitively coupled plasma employing C 5HF7 gas Reviewed

    Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Atsuyo Yamazaki, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

    Japanese Journal of Applied Physics   52 ( 1 )   1-9   2013.1

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    DOI: 10.7567/JJAP.52.016201

  • Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition Reviewed

    Mineo Hiramatsu, Masateru Naito, Hiroki Kondo, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 1 )   2013.1

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    DOI: 10.7567/JJAP.52.01AK04

  • Fabrication of Carbon Nanowalls on Carbon Fiber Paper for Fuel Cell Application Reviewed

    Mineo Hiramatsu, Shinji Mitsuguchi, Takeyoshi Horibe, Hiroki Kondo, Masaru Hori, Hiroyuki Kano

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 1 )   2013.1

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    DOI: 10.7567/JJAP.52.01AK03

  • Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment Reviewed

    Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   113 ( 1 )   2013.1

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    DOI: 10.1063/1.4772996

  • Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

    R. L. Puurunen, T. Suni, O. M.E. Ylivaara, H. Kondo, M. Ammar, T. Ishida, H. Fujita, A. Bosseboeuf, S. Zaima, H. Kattelus

    Sensors and Actuators, A: Physical   188   268 - 276   2012.12

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    DOI: 10.1016/j.sna.2012.05.006

  • Individual Roles of Atoms and Ions during Hydrogen Plasma Passivation of Surface Defects on GaN Created by Plasma Etching Reviewed

    Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 11 )   111002-1:5   2012.11

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    DOI: 10.1143/JJAP.51.111002

  • Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells Reviewed

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS LETTERS   101 ( 17 )   pp.172109-1:4   2012.10

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    DOI: 10.1063/1.4764065

  • Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas Reviewed

    Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS LETTERS   101 ( 1 )   2012.7

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    DOI: 10.1063/1.4733387

  • Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas Reviewed

    Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS LETTERS   101 ( 1 )   2012.7

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    DOI: 10.1063/1.4733387

  • Genetic Characterization of Human Influenza Viruses in the Pandemic (2009-2010) and Post-Pandemic (2010-2011) Periods in Japan Reviewed

    Isolde C. Dapat, Clyde Dapat, Tatiana Baranovich, Yasushi Suzuki, Hiroki Kondo, Yugo Shobugawa, Reiko Saito, Hiroshi Suzuki

    PLOS ONE   7 ( 6 )   2012.6

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    DOI: 10.1371/journal.pone.0036455

  • Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature Reviewed

    Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, Masaru Hori

    AIP ADVANCES   2 ( 2 )   2012.6

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    DOI: 10.1063/1.4729448

  • Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

    Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, Masaru Hori

    AIP ADVANCES   2 ( 2 )   pp.022149-1:6   2012.6

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    DOI: 10.1063/1.4729448

  • Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

    Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiromasa Tanaka, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

    APPLIED PHYSICS LETTERS   100 ( 11 )   10.1063/1.3694928   2012.3

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    DOI: 10.1063/1.3694928

  • Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma Reviewed

    Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   5 ( 3 )   pp. 035101-1:3   2012.3

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    DOI: 10.1143/APEX.5.035101

  • Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma Reviewed

    Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiromasa Tanaka, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

    APPLIED PHYSICS LETTERS   100 ( 11 )   2012.3

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    DOI: 10.1063/1.3694928

  • Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation Reviewed

    Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 2 )   2012.2

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    DOI: 10.1143/JJAP.51.026201

  • Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation Reviewed

    Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 2 )   2012.2

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    DOI: 10.1143/JJAP.51.026201

  • Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments Reviewed

    Hitoshi Watanabe, Hiroki Kondo, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   2012.1

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    DOI: 10.1143/JJAP.51.01AJ07

  • Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature Reviewed

    Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   2012.1

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    DOI: 10.1143/JJAP.51.016202

  • Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC Reviewed

    Tsuyoshi Yamaguchi, Tatsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   45 ( 2 )   2012.1

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    DOI: 10.1088/0022-3727/45/2/025203

  • Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments Reviewed

    Hitoshi Watanabe, Hiroki Kondo, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   2012.1

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    DOI: 10.1143/JJAP.51.01AJ07

  • Chemical bond modification in porous SiOCH films by H-2 and H-2/N-2 plasmas investigated by in situ infrared reflection absorption spectroscopy Reviewed

    Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   110 ( 12 )   2011.12

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    DOI: 10.1063/1.3671547

  • Synchrotron x-ray analyses of crystalline and electronic structures of carbon nanowalls Reviewed

    Hiroki Kondo, Wakana Takeuchi, Masaru Hori, Shigeru Kimura, Yukako Kato, Takayuki Muro, Toyohiko Kinoshita, Osami Sakata, Hiroo Tajiri, Mineo Hiramatsu

    APPLIED PHYSICS LETTERS   99 ( 21 )   2011.11

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    DOI: 10.1063/1.3659470

  • Control of Interfacial Properties of Al2O3/Ge Gate Stack Structure Using Radical Nitridation Technique Reviewed

    Kimihiko Kato, Shinya Kyogoku, Mitsuo Sakashita, Wakana Takeuchi, Hiroki Kondo, Shotaro Takeuchi, Osamu Nakatsuka, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 10 )   2011.10

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    DOI: 10.1143/JJAP.50.10PE02

  • Impacts of CF+, CF

    Takeuchi Takuya, Amasaki Shinpei, Kondo Hiroki, Ishikawa Kenji, Toyoda Hirotaka, Sekine Makoto, Kang Song-Yun, Sawada Ikuo, Hori Masaru

    Jpn J Appl Phys   50 ( 8 )   08JE05 - 08JE05-5   2011.8

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    Impacts of CF+, CF
    Photoresists used in advanced ArF-excimer laser lithography are not tolerant enough for plasma etching processes. Degradation of photoresists during etching processes might cause not only low selectivity, but also line edge roughness (LER) on the sidewalls of etched patterns. For a highly accurate processing, it is necessary to understand the mechanisms of etching photoresists and to construct a new plasma chemistry that realizes a nano scale precise pattern definition. In this study, the modified layers formed on the surface of a photoresist by the bombardment of fluorocarbon ions of CF+, CF2+, and CF3+, and argon (Ar) ions were analyzed by X-ray photoelectron spectroscopy (XPS). The etching yield of the modified steady-state surface was almost dependent on the mass of incident ion species. The surface composition was modified with increasing dosage of each ion species, and reached a specific steady state that was dependent on the ion species. The bombardment of F-rich ion species such as CF2+ and CF3+ resulted in the formation of not only fluorocarbon layers, but also graphite like structures on the surface. On the basis of these results, the surface reaction for the ion-beam-induced modification was discussed.

    DOI: 10.1143/JJAP.50.08JE05

  • Impacts of CF+, CF2+, CF3+, and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist Reviewed

    Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 8 )   2011.8

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    DOI: 10.1143/JJAP.50.08JE05

  • Reactive Ion Etching of Carbon Nanowalls Reviewed

    Shingo Kondo, Hiroki Kondo, Yudai Miyawaki, Hajime Sasaki, Hiroyuki Kano, Mineo Hiramatsu, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 7 )   2011.7

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    DOI: 10.1143/JJAP.50.075101

  • Control of interfacial properties of Pr-oxide/Ge gate stack structure by introduction of nitrogen Reviewed

    Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima

    SOLID-STATE ELECTRONICS   60 ( 1 )   70 - 74   2011.6

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    DOI: 10.1016/j.sse.2011.01.029

  • Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen: A Real-Time In Situ Electron Spin Resonance Study Reviewed

    Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICAL CHEMISTRY LETTERS   2 ( 11 )   1278 - 1281   2011.6

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    DOI: 10.1021/jz2002937

  • Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen: A Real-Time In Situ Electron Spin Resonance Study Reviewed

    Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICAL CHEMISTRY LETTERS   2 ( 11 )   1278 - 1281   2011.6

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    DOI: 10.1021/jz2002937

  • Control of interfacial properties of Pr-oxide/Ge gate stack structure by introduction of nitrogen Reviewed

    Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima

    SOLID-STATE ELECTRONICS   60 ( 1 )   70 - 74   2011.6

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    DOI: 10.1016/j.sse.2011.01.029

  • Formation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition Reviewed

    Kota Mase, Hiroki Kondo, Shingo Kondo, Masaru Hori, Mineo Hiramatsu, Hiroyuki Kano

    APPLIED PHYSICS LETTERS   98 ( 19 )   2011.5

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    DOI: 10.1063/1.3583672

  • Spatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N-2/Ar Gas Reviewed

    Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 5 )   2011.5

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    DOI: 10.1143/JJAP.50.056101

  • Radical-controlled plasma processing for nanofabrication Reviewed

    Masaru Hori, Hiroki Kondo, Mineo Hiramatsu

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   44 ( 17 )   2011.5

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    DOI: 10.1088/0022-3727/44/17/174027

  • Radical-controlled plasma processing for nanofabrication Reviewed

    Masaru Hori, Hiroki Kondo, Mineo Hiramatsu

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   44 ( 17 )   2011.5

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    DOI: 10.1088/0022-3727/44/17/174027

  • Formation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition Reviewed

    Kota Mase, Hiroki Kondo, Shingo Kondo, Masaru Hori, Mineo Hiramatsu, Hiroyuki Kano

    APPLIED PHYSICS LETTERS   98 ( 19 )   2011.5

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    DOI: 10.1063/1.3583672

  • Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy

    Masaki Adachi, Yuzo Kato, Kimihiko Kato, Mitsuo Sakashita, Hiroki Kondo, Wakana Takeuchi, Osamu Nakatsuka, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 4 )   2011.4

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    DOI: 10.1143/JJAP.50.04DA08

  • Spontaneous formation of highly regular superlattice structure in InGaN epilayers grown by molecular beam epitaxy Reviewed

    Z. H. Wu, Y. Kawai, Y. -Y. Fang, C. Q. Chen, H. Kondo, M. Hori, Y. Honda, M. Yamaguchi, H. Amano

    APPLIED PHYSICS LETTERS   98 ( 14 )   2011.4

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    DOI: 10.1063/1.3574607

  • Effect of Pr Valence State on Interfacial Structure and Electrical Properties of Pr Oxide/PrON/Ge Gate Stack Structure Reviewed

    Kimihiko Kato, Mitsuo Sakashita, Wakana Takeuchi, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 4 )   2011.4

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    DOI: 10.1143/JJAP.50.04DA17

  • Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy Reviewed

    Masaki Adachi, Yuzo Kato, Kimihiko Kato, Mitsuo Sakashita, Hiroki Kondo, Wakana Takeuchi, Osamu Nakatsuka, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 4 )   2011.4

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    DOI: 10.1143/JJAP.50.04DA08

  • Electron field emission enhancement of carbon nanowalls by plasma surface nitridation

    Wakana Takeuchi, Hiroki Kondo, Tomomi Obayashi, Mineo Hiramatsu, Masaru Hori

    APPLIED PHYSICS LETTERS   98 ( 12 )   2011.3

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    DOI: 10.1063/1.3532114

  • Electron field emission enhancement of carbon nanowalls by plasma surface nitridation Reviewed

    Wakana Takeuchi, Hiroki Kondo, Tomomi Obayashi, Mineo Hiramatsu, Masaru Hori

    APPLIED PHYSICS LETTERS   98 ( 12 )   2011.3

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    DOI: 10.1063/1.3532114

  • Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet Reviewed

    Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, Masaru Hori

    APPLIED PHYSICS EXPRESS   4 ( 2 )   026101   2011.2

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    DOI: 10.1143/APEX.4.026101

  • Pr(EtCp)_3を用いた原子層成長法によるPr酸化膜の作製とその電気的特性 Reviewed

    近藤 博基, 坂下 満男, 財満 鎭明

    真空   54 ( 2 )   110 - 113   2011.2

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    &nbsp;&nbsp;Growth properties and electrical properties of Pr oxide films by an atomic layer deposition (ALD) technique using Pr(EtCp)3 are discussed in this paper. Slef-limiting growth of Pr oxide films at a rate of 0.07 nm/cycle and a thickness variation of less than 2&#37; on 3-in. Si wafers were obtained. Polycrystalline cubic Pr2O3 films were grown on Si(001) substrates, while epitaxial growth of the cubic Pr2O3 film was found on a Si(111) substrate. Relatively fine capacitance-voltage curves were obtained for the Al/ALD-Pr oxide/Si(001) capacitors. The interface state density between the 130&deg;C-grown ALD-Pr oxide film and the Si(001) substrate is about 1&times;1011 cm&minus;2 eV&minus;1. The dielectric constant of the ALD-Pr oxide film grown at 250&deg;C was determined to be about 18, assuming that the dielectric constant of the interlayer is similar to that of SiO2.

    DOI: 10.3131/jvsj2.54.110

  • Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet Reviewed

    Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, Masaru Hori

    APPLIED PHYSICS EXPRESS   4 ( 2 )   2011.2

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    DOI: 10.1143/APEX.4.026101

  • Al2O3界 面層およびラジカル窒化法によるHigh-k/Ge界面構造および電気的特性の制御

    加藤公彦, 京極真也, 坂下満男, 竹内和歌奈, 近藤博基, 中塚理, 財満鎭明

    特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”(第16回研究会   55-58   2011.1

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  • 電流検出型原子間力顕微鏡を 用いた欠陥に起因するPr酸化膜のリーク電流機構の解明

    足立正樹, 加藤雄三, 坂下満男, 竹内和歌奈, 近藤博基, 中塚理, 財満鎭明

    特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”(第16回研究会   123-126   2011.1

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  • Pr酸化膜/Si構造へのAl導入による界面反応抑制効果

    古田和也, 竹内和歌奈, 加藤公彦, 坂下満男, 近藤博基, 中塚理, 財満鎭明

    特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”(第16回研究会   51-54   2011.1

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  • Pr酸化膜/PrON/Ge構造におけるPrの化学結合状態が電気的特性に及ぼす影響

    加藤公彦, 坂下満男, 竹内和歌奈, 近藤博基, 中塚理, 財満鎭明

    特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”(第16回研究会   99-102   2011.1

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  • Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N-2-H-2 Mixture Plasmas Reviewed

    Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 1 )   2011.1

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    DOI: 10.1143/JJAP.50.01AE03

  • Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N-2-H-2 Mixture Plasmas Reviewed

    Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 1 )   01AE03   2011.1

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    DOI: 10.1143/JJAP.50.01AE03

  • Optical Properties of Evolutionary Grown Layers of Carbon Nanowalls Analyzed by Spectroscopic Ellipsometry Reviewed

    Shinji Kawai, Shingo Kondo, Wakana Takeuchi, Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   49 ( 6 )   060220   2010.6

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    DOI: 10.1143/JJAP.49.060220

  • Formation processes of Ge3N4 films by radical nitridation and their electrical properties Reviewed

    Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Shigeaki Zaima

    THIN SOLID FILMS   518 ( 6 )   S226 - S230   2010.1

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    DOI: 10.1016/j.tsf.2009.10.094

  • Metal-organic chemical vapor deposition of high-dielectric-constant praseodymium oxide films using a cyclopentadienyl precursor Reviewed

    Hiroki Kondo, Shinnya Sakurai, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

    APPLIED PHYSICS LETTERS   96 ( 1 )   012105   2010.1

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    DOI: 10.1063/1.3275706

  • Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units Reviewed

    Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Akinori Ebe, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

    THIN SOLID FILMS   518 ( 3 )   1006 - 1011   2009.12

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    DOI: 10.1016/j.tsf.2009.07.161

  • Novel method to introduce uniaxial tensile strain in Ge by microfabrication of Ge/Si1-xGex structures on Si(001) substrates Reviewed

    Takuya Mizutani, Osamu Nakatsuka, Akira Sakai, Hiroki Kondo, Masaki Ogawa, Shigeaki Zaima

    SOLID-STATE ELECTRONICS   53 ( 11 )   1198 - 1201   2009.11

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    DOI: 10.1016/j.sse.2009.08.001

  • Novel method to introduce uniaxial tensile strain in Ge by microfabrication of Ge/Si1-xGex structures on Si(001) substrates Reviewed

    Takuya Mizutani, Osamu Nakatsuka, Akira Sakai, Hiroki Kondo, Masaki Ogawa, Shigeaki Zaima

    SOLID-STATE ELECTRONICS   53 ( 11 )   1198 - 1201   2009.11

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    DOI: 10.1016/j.sse.2009.08.001

  • *Effects of Atomic Layer Deposition-Al2O3 Interface Layers on Interfacial Properties of Ge Metal–Oxide–Semiconductor Capacitors Reviewed

    48 ( 5 )   05DA04   2009.5

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    DOI: 10.1143/JJAP.48.05DA04

  • Nitrogen-Content Dependence of Crystalline Structures and Resistivity of Hf-Si-N Gate Electrodes for Metal-Oxide-Semiconductor Field-Effect Transistors Reviewed

    Kazuaki Miyamoto, Kouhei Furumai, Ben E. Urban, Hiroki Kondo, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   48 ( 4 )   045505   2009.4

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    DOI: 10.1143/JJAP.48.045505

  • Thermal Stability and Scalability of Mictamict Ti-Si-N Metal-Oxide-Semiconductor Gate Electrodes Reviewed

    Hiroki Kondo, Kouhei Furumai, Mitsuo Sakashita, Akira Sakai, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   48 ( 4 )   04C012   2009.4

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    DOI: 10.1143/JJAP.48.04C012

  • Formation of high-density Si nanodots by agglomeration of ultra-thin amorphous Si films Reviewed

    Hiroki Kondo, Tomonori Ueyama, Eiji Ikenaga, Keisuke Kobayashi, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

    THIN SOLID FILMS   517 ( 1 )   297 - 299   2008.11

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    DOI: 10.1016/j.tsf.2008.08.079

  • Silicide and germanide technology for contacts and gates in MOSFET applications Invited Reviewed

    Shigeaki Zaima, Osamu Nakatsuka, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa

    THIN SOLID FILMS   517 ( 1 )   80 - 83   2008.11

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    DOI: 10.1016/j.tsf.2008.08.097

  • Analysis of Uniaxial Tensile Strain in Microfabricated Ge/Si1-x Gex Structures on Si(001) Substrates

    T. Mizutani, O. Nakatsuka, A. Sakai, H. Kondo, S. Zaima

    4th International WorkShop on New Group IV Semiconductor Nanoelectronics   2008.9

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    Analysis of Uniaxial Tensile Strain in Microfabricated Ge/Si1-x Gex Structures on Si(001) Substrates

  • MOCVD法によるPr酸化膜の作製およびその電気的特性評価 Invited Reviewed

    近藤博基, 櫻井晋也, 酒井朗, 小川正毅, 財満鎭明

    信学技報   108 ( 80 )   71-75   2008.6

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  • Crystalline and electrical properties of mictamict TiSiN gate metal-oxcide-semiconductor capacitors Reviewed

    Kouhei Furumai, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   47 ( 4 )   2420 - 2424   2008.4

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    DOI: 10.1143/JJAP.47.2420

  • Crystalline and electrical properties of mictamict TiSiN gate metal-oxcide-semiconductor capacitors Reviewed

    Kouhei Furumai, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS   47 ( 4 )   2420 - 2424   2008.4

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    DOI: 10.1143/JJAP.47.2420

  • Development of high-density radical source for radical nitridation process in ULSI technology development of high-density radical source for radical nitridation process in ULSI technology Reviewed

    H. Kondo, S. Oda, S. Takashima, A. Sakai, M. Ogawa, S. Zaima, M. Hori, S. Den, H. Kano

    The International Conference on Plasma-NanoTechnology and Science   2008.3

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    Development of high-density radical source for radical nitridation process in ULSI technology development of high-density radical source for radical nitridation process in ULSI technology

  • Ge基板上に作製したPr酸化膜の評価 Reviewed

    坂下満男, 鬼頭伸幸, 加藤亮祐, 近藤博基, 中塚理, 酒井朗, 小川正毅, 財満鎭明

    ゲートスタック研究会 -材料・プロセス・評価の物理-(第13回研究会)   2008.1

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  • 窒素ラジカル暴露によるGe(001)表面処理 Reviewed

    近藤博基, 藤田美里, 酒井朗, 小川正毅, 財満鎭明

    ゲートスタック研究会 -材料・プロセス・評価の物理-(第13回研究会)   2008.1

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  • ミクタミクトTiSiNゲートMOSキャパシタの結晶構造及び電気的特性の評価 Reviewed

    古米孝平, 近藤博基, 坂下満男, 酒井朗, 小川正毅, 財満鎭明

    ゲートスタック研究会 -材料・プロセス・評価の物理-(第13回研究会)   2008.1

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  • Structural and Electrical Properties of Metal-germanide MOS Gate Electrodes Reviewed

    H. Kondo, D. Ikeno, Y. Kaneko, M. Sakashita, A. Sakai, M. Ogawa, S. Zaima

    The Sixth Pacific Rim Inernational Conference on Advanced Materials and Processing   2007.11

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    Structural and Electrical Properties of Metal-germanide MOS Gate Electrodes

  • シリコン表面の窒化初期過程とエネルギーバンドギャップの形成 Invited Reviewed

    近藤 博基, 財満 鎭明, 堀 勝, 酒井 朗, 小川 正毅

    真空   50 ( 11 )   665 - 671   2007.11

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    &nbsp;&nbsp;Initial stage of processes and energy bandgap formation in nitridation of silicon surfaces using nitrogen radicals have been studied. According to scanning tunneling microscopy observations and scanning tunneling spectroscopy measurements, at the initial stage of nitridation, linear defects perpendicular to dimmer rows were formed to coincide with an initial nitridation reaction preferentially at backbonds of surface Si atoms. After the nitride formation, the surface roughness depends only on substrate temperature regardless of radio frequency (RF) power, which means that the growth mode of nitrides is attributed to the surface migration. Contrary, the energy bandgap of silicon nitrides is significantly affected by not only substrate temperature but also RF power. Absorption and emission spectroscopy results suggest that the contribution of the excited-state nitrogen atoms to the nitridation increases with increasing the RF power. Control of surface migration and radical species is crucial to form the monolayer-thick nitride layer with both an atomically flat surface and a wide energy bandgap.

    DOI: 10.3131/jvsj.50.665

  • Pr-oxide-based dielectric films on Ge substrates Reviewed

    M. Sakashita, N. Kito, A. Sakai, H. Kondo, O. Nakatsuka, M. Ogawa, S. Zaima

    Extended Abstracts of the 2007 International Conference on Solid State Device and Materials   2007 ( 85 )   330 - 331   2007.9

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    Pr-oxide-based dielectric films on Ge substrates

  • Surface treatment of Ge(001) surface by radical nitridation Reviewed

    H. Kondo, M. Fujita, A. Sakai, M. Ogawa, S. Zaima

    Extended Abstracts of the 2007 International Conference on Solid State Device and Materials   2007.9

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    Surface treatment of Ge(001) surface by radical nitridation

  • Development of new high-density radical sources and its application to radical nitridation of Ge surfaces

    H. Kondo, S. Oda, S. Takashima, A. Sakai, M. Ogawa, S. Zaima, M. Hori, S. Den, H. Kano

    The 20th Symposium on Plasma Science for Materials   2007.6

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    Development of new high-density radical sources and its application to radical nitridation of Ge surfaces

  • Composition dependence of work function in metal (Ni,Pt)-germanide gate electrodes Reviewed

    Daisuke Ikeno, Yukihiro Kaneko, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   46 ( 4B )   1865 - 1869   2007.4

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    DOI: 10.1143/JJAP.46.1865

  • Growth and energy bandgap formation of silicon nitride films in radical nitridation Reviewed

    Hiroki Kondo, Keigo Kawaai, Akira Sakai, Masaru Hori, Shigeaki Zaima, Yukio Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   46 ( 1 )   71 - 75   2007.1

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    DOI: 10.1143/JJAP.46.71

  • パルスレーザー蒸着法によるGe基板上へのPr酸化膜の作製とその構造及び電気的特性評価

    鬼頭伸幸, 坂下満男, 酒井朗, 中塚理, 近藤博基, 小川正毅, 財満鎭明

    特別研究会研究報告“ゲートスタック研究会 –材料・プロセス・評価の物理-”(第12回研究会)   2007.1

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  • Strain relaxation of patterned Ge and SiGe layers on Si(001) substrates Reviewed

    Shogo Mochizuki, Akira Sakai, Osamu Nakatsuka, Hiroki Kondo, Katsunori Yukawa, Koji Izunome, Takeshi Senda, Eiji Toyoda, Masaki Ogawa, Shigeaki Zaima

    SEMICONDUCTOR SCIENCE AND TECHNOLOGY   22 ( 1 )   S132 - S136   2007.1

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    DOI: 10.1088/0268-1242/22/1/S31

  • Pt-germanideゲート電極の結晶構造及び電気的特性の評価”

    池野大輔, 古米孝平, 近藤博基, 坂下満男, 酒井朗, 小川正毅, 財満鎭明

    特別研究会研究報告“ゲートスタック研究会 –材料・プロセス・評価の物理-”(第12回研究会)   2007.1

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  • Dislocation structure and strain relaxation of SiGe and Ge sub-micron stripe lines on Si(001) substrates

    O. Nakatsuka, S. Mochizuki, A. Sakai, H. Kondo, K. Yukawa, M. Ogawa, S. Zaima

    2006.10

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    Dislocation structure and strain relaxation of SiGe and Ge sub-micron stripe lines on Si(001) substrates

  • Interfacial structure of HfON/SiN/Si gate stacks

    O. Nakatsuka, M. Sakashita, H. Kondo, E. Ikenaga, M. Kobata, J.-J. Kim, H. Nohira, T. Hattori, A. Sakai, M. Ogawa, S. Zaima

    The 2nd International Workshop on Hard X-ray Photoelectron Spectroscopy   2006.9

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    Interfacial structure of HfON/SiN/Si gate stacks

  • Systematic characterization of Ni full silicide in sub-100 nm gate regions

    D. Ito, A. Sakai, O. Nakatsuka, H. Kondo, Y. Akasaka, M. Ogawa, S. Zaima

    2006.4

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    Systematic characterization of Ni full silicide in sub-100 nm gate regions

  • Study of the gate insulator/silicon interface utilizing soft and hard X-ray photoelectron spectroscopy at Spring-8 Reviewed

    T. Hattori, H. Nohira, K. Azuma, K. W. Sakai, K. Nakajima, M. Suzuki, K. Kimura, Y. Sugita, E. Ikenaga, K. Kobayashi, Y. Takata, H. Kondo, S. Zaima

    International Journal of High Speed Electronics and Systems   16 ( 1 )   353 - 364   2006.3

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    DOI: 10.1142/S0129156406003680

  • Initial growth process of TiN films in ultrahigh-vacuum rapid thermal chemical vapor deposition Reviewed

    Y Okuda, S Naito, O Nakatsuka, H Kondo, T Okuhara, A Sakai, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   45 ( 1A )   49 - 53   2006.1

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    DOI: 10.1143/JJAP.45.49

  • Analysis of local breakdown process in stressed gate SiO2 films by conductive atomic force microscopy Reviewed

    A Seko, Y Watanabe, H Kondo, A Sakai, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   44 ( 10 )   7582 - 7587   2005.10

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    DOI: 10.1143/JJAP.44.7582

  • Nanoscale Observations for Degradation Phenomena in SiO_2 and High-k Gate Insulators Using Conductive-Atomic Force Microscopy Reviewed

    ZAIMA Shigeaki, SEKO Akiyoshi, WATANABE Yukihiko, SAGO Toshifumi, SAKASHITA Mitsuo, KONDO Hiroki, SAKAI Akira, OGAWA Masaki

    Extended abstracts of the ... Conference on Solid State Devices and Materials   2005   236 - 237   2005.9

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    Nanoscale Observations for Degradation Phenomena in SiO_2 and High-k Gate Insulators Using Conductive-Atomic Force Microscopy

  • Fabrication and evaluation of floating gate memories with surface-nitrided Si nanocrystals Reviewed

    S Naito, T Ueyama, H Kondo, M Sakashita, A Sakai, M Ogawa, S Zaima

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   44 ( 7B )   5687 - 5691   2005.7

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    DOI: 10.1143/JJAP.44.5687

  • Behavior of local current leakage in stressed gate SiO2 films analyzed by conductive atomic force microscopy Reviewed

    A Seko, Y Watanabe, H Kondo, A Sakai, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   43 ( 7B )   4683 - 4686   2004.7

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    DOI: 10.1143/JJAP.43.4683

  • Detection and characterization of stress-induced defects in gate SiO2 films by conductive atomic force microscopy Reviewed

    Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   43 ( 7B )   4679 - 4682   2004.7

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    DOI: 10.1143/JJAP.43.4679

  • Growth of silicon nanocrystal dots with high number density by ultra-high-vacuum chemical vapor deposition Reviewed

    S Naito, M Satake, H Kondo, M Sakashita, A Sakai, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   43 ( 6B )   3779 - 3783   2004.6

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    DOI: 10.1143/JJAP.43.3779

  • Nanoscale analysis of degradation phenomena in MOS gate insulators using conductive atomic force microscopy

    S. Zaima, H. Kondo, M. Sakashita, A. Sakai, Y. Yasuda

    2004.6

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    Nanoscale analysis of degradation phenomena in MOS gate insulators using conductive atomic force microscopy

  • Thickness dependence of microscopic current-voltage characteristics in stressed SiO2 films Reviewed

    Y. Watanabe, A. Seko, H. Kondo, A. Sakai, S. Zaima, Y. Yasuda

    2004.5

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    Thickness dependence of microscopic current-voltage characteristics in stressed SiO2 films

  • Conductive atomic force microscopy analysis for local electrical characteristics in stressed SiO2 gate films Reviewed

    Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   43 ( 4B )   1843 - 1847   2004.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1143/JJAP.43.1843

  • Microscopic analysis of stress-induced leakage current in stressed gate SiO2 films using conductive atomic force microscopy Reviewed

    Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS   43 ( 2A )   L144 - L147   2004.2

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    DOI: 10.1143/JJAP.43.L144

  • Local discharging of carriers at nanometer scale defects in gate SiO2 thin films observed by conducting atomic force microscopy

    A. Seko, Y. Watanabe, H. Kondo, A. Sakai, S. Zaima, Y. Yasuda

    2003.12

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    Local discharging of carriers at nanometer scale defects in gate SiO2 thin films observed by conducting atomic force microscopy

  • Coulomb blockade phenomena in Si metal-oxide-semiconductor field-effect transistors with nano-scale channels fabricated using focused-ion beam implantation Reviewed

    H Kondo, K Izumikawa, M Sakurai, S Baba, H Iwano, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   38 ( 12B )   7222 - 7226   1999.12

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    DOI: 10.1143/JJAP.38.7222

  • Conductance oscillations in low-dimensional ion implanted regions annealed by rapid thermal annealing Reviewed

    H Kondo, K Kaga, S Baba, H Iwano, S Zaima, Y Yasuda

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   38 ( 4A )   1843 - 1846   1999.4

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    DOI: 10.1143/JJAP.38.1843

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Books

  • New Progress on Graphene Research/Graphene Nanowalls

    Mineo Hiramatsu, Hiroki Kondo, Masaru Hori( Role: Joint author)

    InTech  2013.3 

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    Responsible for pages:担当ページ数:10.5772/3358,Chapter9   Language:English  

    New Progress on Graphene Research/Graphene Nanowalls

  • Nucleation and Vertical Growth of Nano-Graphene Sheets

    Hiroki Kondo, Masaru Hori, Mineo Hiramatsu( Role: Joint author)

    Intech  2011.9 

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    Responsible for pages:担当ページ数:21-36   Language:English  

    Nucleation and Vertical Growth of Nano-Graphene Sheets

Presentations

  • Evalutaion of Penicillium digitatum sterilization using non-equilibrium atmospheric pressure plasma by terahertz time-domain spectroscopy

    T.Hiraoka, N.Ebizuka, K.Takeda, T.Ohta, H.Kondo, K.Ishikawa, K.Kawase, M.Ito, M.Sekine, M.Hori

    64thAnnualGaseouselectronicsConference  2011.11 

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    Evalutaion of Penicillium digitatum sterilization using non-equilibrium atmospheric pressure plasma by terahertz time-domain spectroscopy

  • Fabrication and Electrical Conductivity Measurements of Single Carbon Nanowall Bridging between Metal Eectrodes

    T.Kanda, K.Yamakawa, H.Kondo, M.Hiramatsu, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Fabrication and Electrical Conductivity Measurements of Single Carbon Nanowall Bridging between Metal Eectrodes

  • Fabrication of Carbon Nanowalls on Carbon Fiber Paper

    S.Mitsuguchi, M.Hiramatsu, H.Kondo, M.Hori, H.Kano

    2011SSDM  2011.9 

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    Fabrication of Carbon Nanowalls on Carbon Fiber Paper

  • Fabrication of High-Crystallinity and low-Defect-Density Microcrystalline Silicon Thin Film Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition International conference

    Yusuke Abe, Sho Kawashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    The 24th Symposium on PlasmaSciencefor Materials(SPSM-4)  2011.7 

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    Fabrication of High-Crystallinity and low-Defect-Density Microcrystalline Silicon Thin Film Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition

  • Fabrication of carbon nanotubes from camphor using atmospheric pressure plasma-enhanced CVD

    K. Murata, M. Hiramatsu, K. Yamakawa, H. Kondo, M. Hori

    22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides (Diamond 2011)  2011.9 

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    Fabrication of carbon nanotubes from camphor using atmospheric pressure plasma-enhanced CVD

  • Field Emission Properties of 10-nm Pillars of Organic Fabricated by Pt particles and Plasma Etching

    T.Suzuki, K.Takeda, H.Kondo, K.Ishikawa, Y.Setsuhara, M.Shiratani, M.Sekine, M.Hori

    2011SSDM  2011.9 

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    Field Emission Properties of 10-nm Pillars of Organic Fabricated by Pt particles and Plasma Etching

  • Formation of Ultrahigh Density TiO2 Nanoparticles Supporting on Carbon Nanowalls Employing Supercritical Fluid Chemical Fluid Deposition

    T.Horibe, S.Mitsuguchi, M.Hiramatsu, H.Kondo, M.Sekine, M.Hori

    ICTF-15  2011.11 

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    Formation of Ultrahigh Density TiO2 Nanoparticles Supporting on Carbon Nanowalls Employing Supercritical Fluid Chemical Fluid Deposition

  • GaNにおけるプラズマダメージの水素ラジカル修復 International conference

    陳 尚 盧, 翌, 米谷亮祐, 竹田圭吾, 石川健治, 近藤博基, 加納浩之, 徳田 豊 関根 誠, 江川孝志, 天野 浩, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • Gas Phase Reaction of Activated Species in O2/Ar Nonequilibrium Atmospheric Pressure Plasma

    M. Kato, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science,  2011.3 

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    Gas Phase Reaction of Activated Species in O2/Ar Nonequilibrium Atmospheric Pressure Plasma

  • Gas phase and surface reactions of radicals in plasma-enhanced chemical vapor deposition processes for thin-film silicon solar cell

    H.Kondo(in

    2nd International Workshop on Plasma Nano-Interfaces and Plasma Characterization  2011.3 

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    Gas phase and surface reactions of radicals in plasma-enhanced chemical vapor deposition processes for thin-film silicon solar cell

  • Growth of Carbon Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition Employing Camphor International conference

    Yuki Nihashi, Mineo Hiramatsu, HirokiKondo, MasaruHori

    The 24th Symposium on PlasmaSciencefor Materials(SPSM-4)  2011.7 

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    Growth of Carbon Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition Employing Camphor

  • Growth of Carbon Nanowalls using Inductively Coupled Plasma-Enhanced Cheemical Vapor Deposition on Carbon Fiber Paper International conference

    Shinji Mitsuguchi, Mineo Hiramatsu, Hiroki Kondo, Masaru Hori

    The 24th Symposium on PlasmaSciencefor Materials(SPSM-4)  2011.7 

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    Growth of Carbon Nanowalls using Inductively Coupled Plasma-Enhanced Cheemical Vapor Deposition on Carbon Fiber Paper

  • Growth of carbon nanowalls on carbon paper for fuel cell electrode

    S. Mitsuguchi, Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

    22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides (Diamond 2011)  2011.9 

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    Growth of carbon nanowalls on carbon paper for fuel cell electrode

  • Growth of two-dimensional carbon nanostructures using plasma-enhanced chemical vapor deposition employing camphor

    Y. Nihashi, T. Maeda, M. Hiramatsu, H. Kondo, M. Hori

    22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides (Diamond 2011)  2011.9 

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    Growth of two-dimensional carbon nanostructures using plasma-enhanced chemical vapor deposition employing camphor

  • Growth processes and crystallographic properties of nanographenes synthesized employing in-liquid plasma

    HirokiKondo

    ICMAP2011  2011.7 

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    Growth processes and crystallographic properties of nanographenes synthesized employing in-liquid plasma

  • High Performance of 60-Hz Atmospheric Pressure Plasma: Basic Characteristics and Applications

    F.Jia, K.Takeda, K.Ishikawa, H.Inui, S.Iseki, H.Kano, H.Kondo, M.Sekine, M.Hori

    AVS58thINternationalSymposium&Exhibition  2011.10 

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    High Performance of 60-Hz Atmospheric Pressure Plasma: Basic Characteristics and Applications

  • High Temprerature N2 Plasma Induced Stoichiometric Modification In Etched GaN Surface Using Angle-resolved XPS Depth Profiling Analysis International conference

    Y.Lu, S.Chen, R.Kometani, K.Ishikawa, H.Kondo, K.Takeda, M.Sekine, T.Egawa, H.Amano, M.Hori

    2011.10 

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    High Temprerature N2 Plasma Induced Stoichiometric Modification In Etched GaN Surface Using Angle-resolved XPS Depth Profiling Analysis

  • Higly Spatial Mapping of Atomic Oxgen Dentisy in a 60-Hz Atmospheric Pressure Plasmas Using Clibrated two-Photon Laser-Induced Fluorescence

    Fengdong Jia, Keigo Takeda, Kenji Ishikawa, Hiroyuki Kano, Hiroki Kondo, Makoto Sekine, Masaru Hori

    AEPSE2011  2011.9 

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    Higly Spatial Mapping of Atomic Oxgen Dentisy in a 60-Hz Atmospheric Pressure Plasmas Using Clibrated two-Photon Laser-Induced Fluorescence

  • In Situ Analysis of Plasma-Induced Modification on Porous SiOCH Films

    H.Yamamoto, K.Asano, K.Ishikawa, K.Takeda, H.Kondo, M.Sekine, M.Hori

    2011SSDM  2011.9 

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    In Situ Analysis of Plasma-Induced Modification on Porous SiOCH Films

  • In situ ESR Masurements for revealing Plasma-Surface Interactions

    KenjiIshikawa,NaoyaSumi, AkihikoKono, HideoHoribe, KeigoTakeda, HirokiKondo, MakotoSekine, MasaruHori

    AEPSE2011  2011.9 

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    In situ ESR Masurements for revealing Plasma-Surface Interactions

  • In situ XPS Analysis of Surface Modification on ArF Photoresist by Fluorocarbon Plasma Beams

    T.Takeuchi, S.Amasaki, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    In situ XPS Analysis of Surface Modification on ArF Photoresist by Fluorocarbon Plasma Beams

  • In-situ Analysis of Modification on Porous SiOCH During and After O2 Plasmas

    K.Asano, H.Yamamoto, K.Ishikawa, K.Takeda, H.Kondo, M.Sekine, M.Hori

    ADMETA Plus 2011  2011.9 

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    In-situ Analysis of Modification on Porous SiOCH During and After O2 Plasmas

  • In-situ FTIR Analysis of Porous Low-k Film Exposed to O2 Plasma

    K.Asano, H.yamamoto, K.Takeda, K.ishikawa, H.Kondo, M.sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    In-situ FTIR Analysis of Porous Low-k Film Exposed to O2 Plasma

  • In-situ FTIRを用いたプラズマ曝露および大気曝露によるポーラスSiOCH low-k膜の化学組成変化解析 International conference

    山本洋, 浅野高平, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • In-situX線光電子分光法によるGaNをプラズマビームの相互作用解明 International conference

    米谷亮祐, 陳尚, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 節原裕一, 江川孝志, 天野浩, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • Inhibition of roughness formation on 193 nm photoresist during C5HF7/O2/Ar plasma etching

    K.Asano, H.Yamamoto, Y.Miyawaki, K.Takeda, H.Kondo, K.Ishikawa, A.Yamazaki, A.Ito, H.Matsumoto, M.Sekine, M.Hori

    DPS2011  2011.11 

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    Inhibition of roughness formation on 193 nm photoresist during C5HF7/O2/Ar plasma etching

  • Interaction of Gallium Nitride(GaN)Surface with chlorine Plasma Beams Analyzed by In-situ XPS

    R.Kometani, S.Chen, K.ishikawa, H.Kondo, K.takeda, M.Sekine, H.Amano, Y.Setsuhara, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Interaction of Gallium Nitride(GaN)Surface with chlorine Plasma Beams Analyzed by In-situ XPS

  • Investigation of GaN Exposed to Plasma at High Temperature

    R.Kometani, S.Chen.Y.Lu, K.Ishikawa, K.Takeda, H.Kondo, T.egawa, H.Amano, M.Sekine, M.Hori

    DPS2011  2011.11 

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    Investigation of GaN Exposed to Plasma at High Temperature

  • Investigation of Si Etch Reaction with F and O Radicals Using SF6/O2 Plasma

    S. Amasaki, T. Takeuchi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori, N. Sakurai, H. Hayashi, I. Sakai, T. Ohiwa

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Investigation of Si Etch Reaction with F and O Radicals Using SF6/O2 Plasma

  • Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis

    A. Malinowski, M. Sekine, M. Hori, K. Ishikawa, H. Kondo, T. Suzuki, T. Takeuchi, H. Yamamoto, A. Jakubowski, L. Lukasiak

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis

  • Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis

    A. Malinowski, M. Sekine, M. Hori, K. Ishikawa, H. Kondo, T. Suzuki, T. Takeuchi, H. Yamamoto, A. Jakubowski, L. Lukasiak

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis

  • Investigation of mechanism at sidewall of through Si via(TSV)etching induced by SF6/O2plasma

    S.Amasaki, T.Takeuchi, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori, N.Sakurai, H.Hayashi, I.Sakai, T.Ohiwa

    DPS2011  2011.11 

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    Investigation of mechanism at sidewall of through Si via(TSV)etching induced by SF6/O2plasma

  • Measurement of Atomic Oxygen in Ultrahigh Density 60 Hz Atmospheric Pressure Plasma by Two Photon Absorption Laser Induced Fluorescence

    F. Jia, K. Takeda, K. Ishikawa, H. Inui, S. Iseki, H. Kano, H. Kondo, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Measurement of Atomic Oxygen in Ultrahigh Density 60 Hz Atmospheric Pressure Plasma by Two Photon Absorption Laser Induced Fluorescence

  • Measurement of Optical Properties of Carbon-based Material Using Terahertz Time domain Spectroscopy

    T.Hiraoka, K.Takeda, K.Ishikawa, H.Kondo, M.Ito, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Measurement of Optical Properties of Carbon-based Material Using Terahertz Time domain Spectroscopy

  • Measurement of the Electron Temperature and Density of 60 Hz Nonequikibrium Atmospheric Pressure Plasma Jet by Laser Thomson Scattering

    F.Jia, N.Sumi, K.Ishikawa, H.Kano, H.Inui, K.Takeda, H.Kondo, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Measurement of the Electron Temperature and Density of 60 Hz Nonequikibrium Atmospheric Pressure Plasma Jet by Laser Thomson Scattering

  • Measuring Metal Elements in Wastewater Using Ar Atmospheric Pressure Plasma International conference

    2011.3 

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  • Mechanism of highly Selective SiO2 Etching over Si using New Alternative Gas,C5HF7

    Y.Miyawaki, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori, A.Yamazaki, A.Ito, H.Matsumoto

    64thAnnualGaseouselectronicsConference  2011.11 

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    Mechanism of highly Selective SiO2 Etching over Si using New Alternative Gas,C5HF7

  • Modeling of C3F6O/Ar Plasma Chemical for SiO2 Etching Processes

    Y.Kondo, Y.Miyawaki, K.Takeda, K.Ishikawa, H.Kondo, T.Hayashi, M.Sekine, M.Hori

    DPS2011  2011.11 

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    Modeling of C3F6O/Ar Plasma Chemical for SiO2 Etching Processes

  • Modeling of C3F6O/Ar Plasma Chemistry for SiO2 Etching Processes

    Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, KenjiIshikawa, ToshioHayashi

    AEPSE2011  2011.9 

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    Modeling of C3F6O/Ar Plasma Chemistry for SiO2 Etching Processes

  • Nitogen Radical Annealing recovery of Etch-Induced-Damage on GaN

    K.Ishikawa, S.Chen, R.Kometani, H.Kondo, K.Takeda, H.Kano, Y.Tokuda, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Nitogen Radical Annealing recovery of Etch-Induced-Damage on GaN

  • Novel Gratings for Subaru Telescope, TMT and E-ELT

    N. Ebizuka, K. Ishikawa, H. Kondo, M. Hori

    2011.1 

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    Novel Gratings for Subaru Telescope, TMT and E-ELT

  • Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD

    Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD

  • Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD

    Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD

  • O Radical Measurement in Penicillum Digitatum Inactivation Using Non-equilibrium Atmospheric O2/Ar Plasma

    S.Iseki, T.Ohta, M.Ito, H.Kano, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    O Radical Measurement in Penicillum Digitatum Inactivation Using Non-equilibrium Atmospheric O2/Ar Plasma

  • Passivation of Plasma Damaged GaN with Hydrogen Radical Anneal

    Sh. Chen, Y. Lu, R. Kometani, K. Takeda, K. Ishikawa, H. Kondo, H. Kano, Y. Tokuda, M. Sekine, Y. Setsuhara, T. Egawa, H. Amano, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Passivation of Plasma Damaged GaN with Hydrogen Radical Anneal

  • Plasma Nano-Technologies for Fabrications of VPH Grating,Quasi-Bragg Grating and Novel Immersion Grating

    N.Ebizuka, H.Kondo, K.Ishikawa, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Plasma Nano-Technologies for Fabrications of VPH Grating,Quasi-Bragg Grating and Novel Immersion Grating

  • Plasma-Induced Damage of GaN and Its Recovery by Atomic Hydrogens at a Room Temperature

    Y.Lu, S.Chen, R.Kometani, K.Takeda, H.Kondo, T.Egawa, K.Ishikawa, H.Amano, M.Sekine, M.Hori

    2011SSDM  2011.9 

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    Plasma-Induced Damage of GaN and Its Recovery by Atomic Hydrogens at a Room Temperature

  • PolymerSurfaceModification:Real-time In Situ Electron Spin Resonance Study for Plasma Processes

    K.Ishikawa, N.Sumi, A.Kono, H.Horibe, K.Takeda, H.Kondo, M.Sekine, M.Hori

    AVS58thINternationalSymposium&Exhibition  2011.10 

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    PolymerSurfaceModification:Real-time In Situ Electron Spin Resonance Study for Plasma Processes

  • Radical Flux Modeling and Analysis for Sticking Coefficient Evaluation

    Mailnowski, M.Hori, M.Sekine, K.Ishikawa, H.Kondo, H.yamamoto, T.Takeuchi, T.Suzuki, A.jakubowski, L.Lukasiak

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Radical Flux Modeling and Analysis for Sticking Coefficient Evaluation

  • Radical density measurements in microwave plasma with carbon-containing gases used for carbon nanotube and nanocrystalline diamond film growth

    M. Hiramatsu, H. Kondo, M. Hori

    20th International Symposium on Plasma Chemistry  2011.7 

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    Radical density measurements in microwave plasma with carbon-containing gases used for carbon nanotube and nanocrystalline diamond film growth

  • Real-time Electron-Spin-Resonance Study of Plasma-Surface interaction

    Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    the 13 th international workshop on Advanced Plasma Processing and Diagnostics  2011.7 

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    Real-time Electron-Spin-Resonance Study of Plasma-Surface interaction

  • Real-time/In-situ Electron-Spin-Resonance Analysis of Surface Reactions on Organic Materials in Plasma Processes

    N. Sumi, K. Ishikawa, A. Kono, H. Horibe, K. Takeda, H. Kondo, M. Sekine, M.Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Real-time/In-situ Electron-Spin-Resonance Analysis of Surface Reactions on Organic Materials in Plasma Processes

  • Real-time/In-situ electron spin resonance analysis of surface reactions on organic materials with atomic hydrogen irradiation

    N.Sumi, K.Ishikawa, A.Kono, H.HOribe, K.Takeda, H.Kondo, M.sekine, M.Hori

    DPS2011  2011.11 

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    Real-time/In-situ electron spin resonance analysis of surface reactions on organic materials with atomic hydrogen irradiation

  • Recovery of plasma-damaged GaN by atomic nitrogen hiydrogen

    Shang Chen,Yi Lu, Ryousuke Kome, Konji,Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Masaru Hori

    the 13 th international workshop on Advanced Plasma Processing and Diagnostics  2011.7 

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    Recovery of plasma-damaged GaN by atomic nitrogen hiydrogen

  • Relationship between aradicals in Gas Phase and film Property of Silicon Thin Films in SiH4/H2PlasmaCVD

    A.Fukushima, Y.Abe, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    ICTF-15  2011.11 

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    Relationship between aradicals in Gas Phase and film Property of Silicon Thin Films in SiH4/H2PlasmaCVD

  • Room Temperature Radical Annealing of Plasma Damaged

    S.Chen,Y.Lu, K.Takeda, K.Ishikawa, H.Kondo, H.Kano, H.Amano, Y.Tokuda, T.Egawa, M.sekine, M.Hori

    AVS58thINternationalSymposium&Exhibition  2011.10 

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    Room Temperature Radical Annealing of Plasma Damaged

  • SF6/O2プラズマを用いたSiエッチング機構 International conference

    尼崎新平, 竹内拓也, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • SF6/O2プラズマを用いたSiエッチング機構III International conference

    尼崎新平, 竹内拓也, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 堀 勝, 櫻井典子, 林 久貴, 酒井伊都子, 大岩徳久

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • SF6/O2プラズマを用いたSiエッチング機構II International conference

    尼崎新平, 竹内拓也, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝, 櫻井典子, 林久貴, 酒井伊都子, 大岩徳久

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • STS Observation of Local Density of States on Growth Surface at an Initial Stage of Carbon Nanowall Synthesis

    K.Yasuda, H.Kondo, M.Hiramatsu, M.sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials,  2011.3 

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    STS Observation of Local Density of States on Growth Surface at an Initial Stage of Carbon Nanowall Synthesis

  • SiH4/H2プ ラズマ化学気相堆積法における気相ラジカルとシリコン薄膜の膜質との関係性 International conference

    福島敦史, 阿部佑介, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

    第3回薄膜太陽電池セミナー  2011.10 

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  • SiH4/H2プラズマにおける水素多事狩る表面損失確率 International conference

    阿部祐介, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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  • SiH4/H2プラズマ化学気相堆積法における気相ラジカルとシリコン薄膜結晶性の関係性 International conference

    福島敦史, 阿部祐介, 竹田圭吾, 近藤博基, 石川健治, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • SiNx:H膜エッチングに及ぼす紫外線の影響 International conference

    深沢正永, 宮脇雄大, 近藤祐介, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 南 正樹, 上澤史且, 堀 勝, 辰巳哲也

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • SiO2 Plasma Etching Process Using Alternative Gas,C3F6O

    Y.Kondo, Y.MIyawaki, K.Takeda, K.Ishikawa, H.Kondo, T.hayashi, H.Okamoto, M.Sekine,M.hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    SiO2 Plasma Etching Process Using Alternative Gas,C3F6O

  • Spatial Distribution of Electron Density on DC-Superposed Dual-frequency Capacitively Coupled Plasma(DS-CCP)

    T.Komuro, K.Takeda, K.Ishikawa, M.Sekine, Y.Ohya, H.Kondo, M.Hori

    DPS2011,  2011.11 

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    Spatial Distribution of Electron Density on DC-Superposed Dual-frequency Capacitively Coupled Plasma(DS-CCP)

  • Sticking coefficient of hydrogen radicals on ArF photoresist estimated by parallel plate structure in conjunction with numerical analysis

    Malinowski A

    International Conference on Simulation of Semiconductor Processes and Devices, SISPAD  2011.11 

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    Sticking coefficient of hydrogen radicals on ArF photoresist estimated by parallel plate structure in conjunction with numerical analysis

  • Sticking coefficient of hydrogen radicals on ArF phtotoresist estimated by parallel plate structure in conjunction with numerical analysis

    A.Malinowski, M.Sekine, M.Hori, K.Ishikawa, H.Kondo, T.Suzuki, T.Takeuchi, H.Yamamoto, A.Jakubowski, L.Lukasiak, Tomaszewski

    SISPAD2011  2011.9 

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    Sticking coefficient of hydrogen radicals on ArF phtotoresist estimated by parallel plate structure in conjunction with numerical analysis

  • Study of Etch Reaction with F and O radicals using SF6/O2 Plasma

    S.Amasaki, T.Takeuchi, K.takeda, K.ishikawa, H.Kondo, M.sekine, M.Hori, N.Sakurai, H.Hayashi, I.Sakai, T.Ohiwa

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Study of Etch Reaction with F and O radicals using SF6/O2 Plasma

  • Study on modification process of photoresist by fluorocarbon and radicals

    T.Takeuchi, S.Amasaki, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori

    64thAnnualGaseouselectronicsConference  2011.11 

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    Study on modification process of photoresist by fluorocarbon and radicals

  • Study on photoresist surface modification induced by fluorocarbon etch species

    T.Takeuchi, S.Amasaki, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    DPS2011  2011.11 

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    Study on photoresist surface modification induced by fluorocarbon etch species

  • Sub-nm Scale Control of Etched-Profile-Fluctuations in Organic Low-k Film Etch

    T.Suzuki, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Sub-nm Scale Control of Etched-Profile-Fluctuations in Organic Low-k Film Etch

  • Subnanometer-scale control of feature size and shape in organic low-k film etch

    Toshiya. Suzuki, Shinji Mitsuguti, Arkadiusz Malinowski, Keigo Takeda, HirokiKondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    2011 ICMAP  2011.7 

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    Subnanometer-scale control of feature size and shape in organic low-k film etch

  • Surface Analysis of GaN Irradiated by Cl2 Plasma Beam

    Y. Lu, S. Chen, R. Kometani, K. Ishikawa, H. Kondo, K. Takeda, M. Sekine, T. Egawa, H. Amano, Y. Setsuhara, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Surface Analysis of GaN Irradiated by Cl2 Plasma Beam

  • Surface Loss Probability of Hydrogen Radical in SiH4/H2Plasma

    Y.Abe, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Surface Loss Probability of Hydrogen Radical in SiH4/H2Plasma

  • Synthesis of Amorphous Carbon Films Employing radical-injection Plasma-Enhanced Chemical Vapor Deposition system for Solar Cell

    T.Kino, H.Kondo, K.ishikawa, M.sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Synthesis of Amorphous Carbon Films Employing radical-injection Plasma-Enhanced Chemical Vapor Deposition system for Solar Cell

  • Synthesis of Nano-graphene by Plasma in Liquid Ethanol

    T. Hagino, H. Kano, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Synthesis of Nano-graphene by Plasma in Liquid Ethanol

  • Synthesis of Platinum Nanoparticles on Carbon Nanowall Surface by Supercritical Fluid Chemical Deposition

    S.Mitsuguchi, H.Kano, M.Hiramatsu, H.Kondo, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Synthesis of Platinum Nanoparticles on Carbon Nanowall Surface by Supercritical Fluid Chemical Deposition

  • Three Dimensional Distribution of Atomic Radical in Nonequilibrium Atmospheric Pressure Plasma

    M.kato, K.Takede, K.Ishikawa, H.Kondo, M.Skine,M.Hor

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Three Dimensional Distribution of Atomic Radical in Nonequilibrium Atmospheric Pressure Plasma

  • Time-dependent Radical Flux Analysis in ArF Photoresist Plasma Etching using Parallel Plate Structure International conference

    2011.8 

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    Time-dependent Radical Flux Analysis in ArF Photoresist Plasma Etching using Parallel Plate Structure

  • Ultrafast Synthesis of Nanographen Employing an Ultrahigh-density In-liquid Al-cohol Plasma

    T.Hagino, H.Kondo, H.Kano, K.Ishikawa, M.Sekine, M.Hori

    2011SSDM  2011.9 

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    Ultrafast Synthesis of Nanographen Employing an Ultrahigh-density In-liquid Al-cohol Plasma

  • すばる望遠鏡および次世代巨大望遠鏡用の新しい回折格子 International conference

    海老塚昇, 石川健治, 近藤博基, 堀勝、AndreaBianco,FilippoMariaZerbi

    2011年度光学シンポジウム  2011.7 

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    Venue:東京大学   Country:Other  

  • アモルファスカーボン膜の工学的特性に対する成長温度の効果 International conference

    九鬼淳, 近藤博基, 関根誠, 堀勝

    第3回薄膜太陽電池セミナー  2011.10 

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  • アルコール気液プラズマ生成するナノカーボンの電子スピン共鳴法によるその場観察 International conference

    石川健治, 萩野達也, 鷲見直也, 加納浩之, 竹田圭吾, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • アルコール気液プラズマを用いたナノグラフェンの合成 International conference

    萩野達也, 乾裕俊, 加納浩之, 石川健治, 竹田圭吾, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • アルコール液中プラズマを用いたナノグラフェンの制御合成 International conference

    荻野達也, 加納浩司, 石川健治, 竹田圭吾, 近藤博基, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • アルコール液中プラズマを用いたナノグラフェンの合成メカニズム International conference

    萩野達也, 加納浩之, 石川健治, 竹田圭吾, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • アルモファスカーボン膜の結晶構造及び血管密度に対するRFバイアス印加効果 International conference

    九鬼淳, 于楽泳, 近藤博基, 石川健治, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • カビ胞子とプラズマの相互作用の電子スピン共鳴法による観察 International conference

    石川健治, 井関紗千子, 太田貴之, 伊藤昌文, 加納浩之, 竹田圭吾, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • カーボンナノウォールの初期成長表面における化学構造の変化に関する研究 International conference

    安田幸司, 近藤博基, 平松美根男, 関根誠, 堀勝

    2011.11 

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    Venue:石川県立音楽堂   Country:Other  

  • カーボンナノウォールの結晶構造に対する酸素ラジカル照射効果 International conference

    下枝弘尚, 近藤弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • カーボンナノウォール初期成長過程における結晶構造変化 International conference

    安田幸司, 近藤博基, 平松美根男, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • カーボンナノウォールの配向成長 International conference

    神田貴幸, 近藤博基, 山川晃司, 竹田圭吾, 石川健冶, 平松美根男, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • カーボンナノウォールの初期成長過程における表面元素組成および化学結合状態の変化 International conference

    安田幸司, 近藤博基, 平松美根男, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • カーボンナノウォールの初期成長過程におけるナノグラフェン核発生の観察 International conference

    安田幸司, 近藤博基, 平松美根男, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • カーボンナノウォールの超親水化と機能性バイオテンプレートへの応用 International conference

    井関紗千子, 堀勝, 渡辺均, 太田貴之, 近藤博基, 石川健治, 竹田圭吾, 関根誠, 伊藤昌文

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • テラヘルツ時間領域分光法を用いた非平衡大気圧プラズマによるミドリカビ殺菌の評価 International conference

    平岡丈弘, 海老塚昇, 竹田圭吾, 大田貴之, 近藤博基, 石川健治, 川瀬晃道, 伊藤昌文, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • バイオ応用に向けた60Hz大気圧プラズマ源の生成酸素原子の空間分布 International conference

    賈鳳東, 竹田圭吾, 石川健治, 乾裕俊, 井関紗千子, 加納浩之, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • フルオロカーボン系エッチング種によるArFフォトレジスト表面改質過程の解明 International conference

    竹内拓也, 尼崎新平, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • フルオロカーボン系エッチング種によるArFフォトレジスト表面改質の解明 (2) International conference

    竹内拓也, 尼崎新平, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • フルオロカーボン系エッチング種によるArFフォトレジスト表面改質の解明 International conference

    竹内拓也, 尼崎新平, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析(2) International conference

    鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析 International conference

    鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • プラズマプロセス中材料の表面反応の機構解析 International conference

    石川健治, 竹内拓也, 尼崎新平, 浅野高平, 山本洋, 鈴木俊哉, 竹田圭吾, 近藤博基, 関根誠,堀勝

    応用物理学会シリコンテクノロジー研究会第133 回 研究集会  2011.2 

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  • プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の欠陥密度に対するRFバイアス印加の効果 International conference

    九鬼 淳, 于 楽泳, 近藤博基, 石川健治, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の結晶構造に対するRFバイアス印加の効果 International conference

    近藤博基, 木野徳重, 石川健治, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • プラズマ励起気相堆積法で合成したアモルファスカーボン結晶構造解析 International conference

    于 楽泳, 九鬼 淳, 竹田圭吾, 近藤博基, 石川健治, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • プラズマ化学気相堆積法によって成長したカーボンナノウォールの微細構造解析 International conference

    近藤博基, 下枝弘尚, 石川健治, 関根 誠, 堀 勝, 平松美根男

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • プラズマ化学気相堆積法によって成長したカーボンナノウォールの結晶構造に対する酸素ガス添加効果 International conference

    下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • ラジカル注入型プラズマ化学気相堆積法を用いた高結晶性・低欠陥密度微結晶シリコン薄膜の作製 International conference

    第24回プラズマ材料科学シンポジウム(SPSM24)  2011.7 

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  • リアルタイム計測によるラジカルと固体表面相互反応プロセスの体系化 International conference

    堀勝(招待講演, 関根誠, 石川健治, 近藤博基, 竹田圭吾, 河野昭彦, 堀邊英夫

    Cat-CVD研究会  2011.6 

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    Venue:金沢工業大学扇が丘キャンパス多目的ホール   Country:Other  

  • 低損傷GaNエッチングのための塩素プラズマビーム表面相互作用と角度分解XPSによるその場解析 International conference

    盧翌,陳尚, 米谷亮祐, 石川健治, 近藤博基, 竹田圭吾, 関根誠, 江川孝志, 天野浩, 節原裕一, 堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • 単一カーボンナノウォールの架橋成長制御およびその電気的特性評価 International conference

    神田貴幸, 近藤博基, 山川晃治, 竹田圭吾, 石川健冶, 平松美根男, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • 吸収分光法を用いた炭素含有ガスによるマイクロ波プラズマ中のラジカルの計測 International conference

    村田健一, 内藤全晃, 平松美根男, 高島成剛, 近藤博基, 堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • 大気圧プラズマ表面処理によるカーボンナノウォール表面の超親水・超撥水性出現機構 International conference

    渡邊均, 近藤博基, 関根誠, 平松美根男, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 大気圧プラズマ処理によるカーボンナノウォール表面の超親水・超撥水発生機構 International conference

    渡邊均, 近藤博基, 関根誠, 堀勝, 平松美根男

    表面技術協会第124回講演大会  2011.9 

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    Venue:名古屋大学   Country:Other  

  • 大気圧プラズマ表面処理によるカーボンナノウォール表面の超親水性・超撥水性発現機構 International conference

    渡邊 均, 近藤博基, 平松美根男, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 実時間・その場観察電子スピン共鳴(ESR)を用いた水素原子照射による有機薄膜表面処理メカニズムの解析 International conference

    鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 微結晶シリコン成膜における水素ラジカル注入型プラズマ源の特性 International conference

    陸雅, 福島敦史, 阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 有機材料の超微細エッチングにおける白金微粒子の側壁保護作用に関する研究 International conference

    鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 節原裕一, 白谷正治, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 水素ラジカルによるGaN中プラズマ誘導欠陥の不活性化 International conference

    陳尚, 盧翌, 米谷亮祐, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 水素ラジカル注入型プラズマ源を用いた微結晶シリコン成膜における欠陥密度の抑制効果 International conference

    陸 雅, 福島敦史, 阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 水素ラジカル照射による有機薄膜表面処理の実時間・その場観察電子スピン共鳴(ESR)解析 International conference

    鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

    Cat-CDV研究会  2011.6 

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    Venue:金沢工業大学扇が丘キャンパス多目的ホール   Country:Other  

  • 燃料電池応用に向けたカーボンナノウォールの作製 International conference

    ミツ口真司, 堀部剛良, 平松美根男, 近藤博基, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 白金微粒子の側壁保護作用を用いた有機材料の超微細エッチング International conference

    鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 節原裕一, 白谷正治, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 真空一貫プロセスによるGaNプラズマビームエッチング及び水素ラジカルダメージ層除去とその表界面反応機構の解明 International conference

    陳尚,盧翌, 米谷亮祐, 江川孝志, 石川健治, 近藤博基, 加納浩之, 徳田豊, 関根誠, 節原裕一, 竹田圭吾, 天野浩,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • 真空紫外吸収分光法を持ちたマイクロ波プラズマ中のC原子の密度計測 International conference

    村田健一, 内藤全晃, 平松美根男, 高島成剛, 近藤博基, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 薄膜シリコン太陽電池プラズマプロセスにおけ水素ラジカル表面反応 International conference

    阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 薄膜太陽電池製造装置開発に向けたSiH4/H2プラズマにおける水素ラジカル表面損失確率計測 International conference

    阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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  • 超臨界流体を用いたカーボンナノウォール(CNWs)へのTiO2微粒子担持 International conference

    堀部剛良, ミツ口真司, 加納浩司, 近藤博基, 石川健治, 平松美根男, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 超臨界流体を用いた酸化チタン微粒子のカーボン材料への担持 International conference

    堀部剛良, 三ツ口真司, 平松美根男, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 超高密度60Hz大気圧非平衡プラズマを用いた表面処理技術の開発 International conference

    竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀 勝

    平成22年度成果報告会  2011.3 

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    Venue:名古屋工業大学   Country:Other  

  • 配列カーボンナノウォールの作製 International conference

    神田貴幸, 近藤博基, 山川晃司, 竹田圭吾, 石川健治, 平松美根男, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 酸素プラズマによるポーラスSiOCH膜の構造変化機構 International conference

    浅野高平, 山本洋, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • 非平衡大気圧H2/Arプラズマによる酸化銅還元メカニズム International conference

    竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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  • 非平衡大気圧プラズマを用いたミドリカビ殺菌におけるテラヘルツ分光センシング International conference

    平岡丈弘, 海老塚昇, 竹田圭吾, 太田貴之, 近藤博基, 伊藤昌文, 川瀬晃道, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 非平衡大気圧プラズマにおける活性種の3次元気相反応解析

    加藤正規, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • 高密度60Hz大気圧プラズマ生成酸素原子絶対密度の空間分布 International conference

    Fendong Jia, 竹田圭吾, 石川健治, 加納浩之, 近藤博基, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 高温における窒化ガリウム(GaN)のエッチング機構 International conference

    米谷亮祐, 陳 尚, 蘆 翌, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 江川孝志, 天野 浩, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • 高温エッチングにおける窒化ガリウム(GaN)の表面変性:角度分解X線光電子解析 International conference

    盧 翌, 陳 尚, 米谷亮祐, 石川健治, 近藤博基, 竹田圭吾, 関根 誠, 江川孝志, 天野 浩, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • Control of crystalline and electronic structures of carbon nanowalls for their device applications

    Kondo H

    IEEE Region 10 Annual International Conference, Proceedings/TENCON  2010.12 

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    Control of crystalline and electronic structures of carbon nanowalls for their device applications

  • Development and Application of Electron Beam-Excited Plasma System using Hollow Cathode Electron Source

    K.Yamakawa, S.Den, S.Takahashi, H.Yamamoto, M.Hori, H.Kondo

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials,  2010.3 

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    Development and Application of Electron Beam-Excited Plasma System using Hollow Cathode Electron Source

  • Dispersive Optical Elements for TMT

    N. Ebizuka, K. Ishikawa, H. Kondo, M. Hori, Y. Hirahara, S. Sato, M. Iye

    2010.10 

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    Dispersive Optical Elements for TMT

  • Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation

    Cho K

    Ceramic Transactions  2010.9 

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    Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation

  • Ni suicide and germanide technology for contacts and metal gates in MOSFET applications

    Zaima S

    ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings  2007.8 

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    Ni suicide and germanide technology for contacts and metal gates in MOSFET applications

  • Electrical properties and bonding structures of germanium nitride/Ge(100) structures formed by radical nitridation

    Kondo H

    ECS Transactions  2006.12 

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    Electrical properties and bonding structures of germanium nitride/Ge(100) structures formed by radical nitridation

  • Strain relaxation of patterned Ge and SiGe layers on Si(001) substrates

    Mochizuki S

    Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest  2006.12 

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    Strain relaxation of patterned Ge and SiGe layers on Si(001) substrates

  • Preparation and evaluation of NiGe gate electrodes for metal-oxide- semiconductor devices

    Kaneko Y

    Proceedings - Electrochemical Society  2004.12 

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    Preparation and evaluation of NiGe gate electrodes for metal-oxide- semiconductor devices

  • Electron-SpinResonance(ESR)Analyisis of Plasma-SurfaceInteraction International conference

    Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    The 24th Symposium on PlasmaSciencefor Materials(SPSM-4)  2011.7 

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    Electron-SpinResonance(ESR)Analyisis of Plasma-SurfaceInteraction

  • Effect of HBr plasma cure for reduction of roughness formation on ArF photoresist surface during plasma etching process, 4B-PM-03

    M. Sekine, Y. ZhangTakeuchi, H. Nagano, K. Ishikawa, K. Takeda, H. Kondo, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Effect of HBr plasma cure for reduction of roughness formation on ArF photoresist surface during plasma etching process, 4B-PM-03

  • Effect of Power supply on metal emission intensity induced by non-equilibium atmospheric pressure plasma, 6P-PM-S09-P12

    J. Kularatne, J. Jolibois, Ohta, M. Ito, H. Kano, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Effect of Power supply on metal emission intensity induced by non-equilibium atmospheric pressure plasma, 6P-PM-S09-P12

  • Effect of spiral microwave antenna configuration on the production of nano-crystalline film by chemical sputtering in ECR plasma, 4P-PM-SPD-P05

    H. Kondo, L. Jia, D. Xu, M. Nakamura, K. Ishikawa, M. Sekine, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Effect of spiral microwave antenna configuration on the production of nano-crystalline film by chemical sputtering in ECR plasma, 4P-PM-SPD-P05

  • Effects of Low RF Bias Power on Optoelectrical Properties of Amorphous Carbon Films Grown byPlasma-Enhanced Chemical Vapor Deposition, 05pP71

    M. Nakamura, L. Jia, D. Xu, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Effects of Low RF Bias Power on Optoelectrical Properties of Amorphous Carbon Films Grown byPlasma-Enhanced Chemical Vapor Deposition, 05pP71

  • Effects of residence time on electronic and electricalthe optical properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition, 05pP72

    L. Jia, D. Xu, M. Nakamura, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Effects of residence time on electronic and electricalthe optical properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition, 05pP72

  • Electro catalytic properties of Pt-supported nanographene synthesis using in-liquid plasma, 05aB06O

    T. Amano, K. Takeda, H. Kondo, K. Ishikawa, T. Ohta, M. Ito, H. Kano, M. Hiramatsu, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Electro catalytic properties of Pt-supported nanographene synthesis using in-liquid plasma, 05aB06O

  • Electron Spin Resonance Study of Plasma-Activated-Medium

    K. Ishikawa, N. Kurake, H. Tanaka, T. Kondo, K. Nakamura, H. Kajiyama, F. Kikkawa, M. Mizuno, K. Takeda, H. Kondo, M. Sekine, M. Hori

    The 5th International Conference on Plasma Medicine (ICPM5)  2014.5 

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    Electron Spin Resonance Study of Plasma-Activated-Medium

  • Electron Spin Resonance Study of Plasma-Biological Surface Interactions under Atmospheric Pressure Plasmas

    K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

    5th International Conference on Plasma Medicine  2014.5 

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    Electron Spin Resonance Study of Plasma-Biological Surface Interactions under Atmospheric Pressure Plasmas

  • Electron spin Resonance Study of Plasma-Activated-Media (PAM)

    Masaru Hori, Naoyuki Kurake, Kenji Ishikawa, Hiromasa Tanaka, Takashi Kondo, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Keigo Takeda, Hiroki Kondo, Makoto Sekine

    2014 MRS Fall Meeting & Exhibit  2014.11 

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    Electron spin Resonance Study of Plasma-Activated-Media (PAM)

  • Electron spin resonance study of radical generation during non-thermal plasma blood coagulation

    Kenji Ishikawa, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiromasa Tanaka, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Masaru Hori

    The 17th Biennial Meeting for the Society for Free Radical Research International (SFRRI 2014)  2014.3 

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    Electron spin resonance study of radical generation during non-thermal plasma blood coagulation

  • Electron spin resonance analysis of plasma-biological material interactions in atmospheric pressure plasma, 3B-WS-07

    K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

    International workshop on control of fluctuation of plasma processes -Joint International Workshop between "Frontier science of interactions between plasmas and nano-interfaces" and "Plasma medical innovation"  2014.2 

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    Electron spin resonance analysis of plasma-biological material interactions in atmospheric pressure plasma, 3B-WS-07

  • Electron spin resonance analyses of plasma-biological material interactions in atmospheric pressure plasmas, 3B-WS-07

    K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Electron spin resonance analyses of plasma-biological material interactions in atmospheric pressure plasmas, 3B-WS-07

  • Emission charateristics of metallic elements in solution using non-equilibrium atmospheric pressure microplasma, 04pP07

    J. Kularatne, T. Ohta, J. Jolibois, M. Ito, H. Takemura, H. Kano, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Emission charateristics of metallic elements in solution using non-equilibrium atmospheric pressure microplasma, 04pP07

  • Fabrication of graphene films on Ni layer by microwave plasma-enhanced CVD, 03pP38

    Y. Kashima, M. Hiramatsu, H. Kondo, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Fabrication of graphene films on Ni layer by microwave plasma-enhanced CVD, 03pP38

  • Fabrication of graphene films using microwave plasma-enhanced CVD in surface wave mode, 6P-AM-S08-P28

    Y. Kashima, M. Hiramatsu, H. Kondo, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Fabrication of graphene films using microwave plasma-enhanced CVD in surface wave mode, 6P-AM-S08-P28

  • GaN etching at high temperature employing N2 added Cl2 Plasma, 06aP04

    Z. Liu, T. Kako, K. Ishikawa, O. Oda, K. Takeda, H. Kondo, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    GaN etching at high temperature employing N2 added Cl2 Plasma, 06aP04

  • Growth Mechanism of Single-Walled Carbon Nanotubes from Pt Catalysts by Alcohol Catalytic CVD

    Takahiro Maruyama, Hiroki Kondo, Akinari Kozawa, Takahiro Saida, Shigeya Naritsuka, Sumio Iijima

    2014 MRS Fall Meeting & Exhibit  2014.11 

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    Growth Mechanism of Single-Walled Carbon Nanotubes from Pt Catalysts by Alcohol Catalytic CVD

  • Growth of graphene-based films using aftergrow of inductively coupled plasma

    Mineo Hiramatsu, Masakazu Tomatsu, Hiroki Kondo, Masaru Hori

    67th Annual Gaseous Electronics Conference  2014.11 

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    Growth of graphene-based films using aftergrow of inductively coupled plasma

  • High Density Radical Source

    Y. Kiheda, H. Kano, H. Kondo, M. Hori, H. Amano, M. Hiramatsu

    19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2014.7 

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    High Density Radical Source

  • In situ analysis of the surface reactions in PE-ALD SiO2 films for advanced litho applications

    Masaru Hori, Hiroki Kondo

    14th International Conference on Atomic Layer Deposition (ALD 2014)  2014.6 

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    In situ analysis of the surface reactions in PE-ALD SiO2 films for advanced litho applications

  • Interactions between Plasma and Biological Material: Analysis by Electron spin resonance (ESR) technique

    Hiromasa Tanaka, Keigo Takeda, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiroki Kondo, Makoto Sekine, Masaru Hori

    Plasma Processing Science, Gordon Research Conference  2014.7 

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    Interactions between Plasma and Biological Material: Analysis by Electron spin resonance (ESR) technique

  • Large-scale synthesis of nanographene using in-liquid plasma and chemical reduction process, 6P-PM-S09-P11

    J. Jolibois, J. Kularatne, H. Kano, M. Ito, M. Hiramatsu, H. Kondo, K. Ishikawa, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Large-scale synthesis of nanographene using in-liquid plasma and chemical reduction process, 6P-PM-S09-P11

  • Live demonstration: A CMOS sensor platform with 1.2 μm × 2.05 μm electroless-plated 1024 × 1024 microelectrode array for high-sensitivity rapid direct bacteria counting

    2014.12 

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  • Measurement of Heat Fluxes of Si Substrate from Plasma by Using Frequency Low CoherenceInterferometer, 03pP29

    T. Tsutsu, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Measurement of Heat Fluxes of Si Substrate from Plasma by Using Frequency Low CoherenceInterferometer, 03pP29

  • Mechanism of Generating Active Species and Etch Reaction in CHxFy Plasma, 06aP03

    Y. Kondo, Y. Miyawaki, K. Takeda, S. Tajima, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Mechanism of Generating Active Species and Etch Reaction in CHxFy Plasma, 06aP03

  • Mechanism of Surface Roughness of ArF Photoresist During HBr PlasmaEtching Processes (2) International conference

    2014.3 

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    Mechanism of Surface Roughness of ArF Photoresist During HBr PlasmaEtching Processes (2)

  • Modifications of Photoresists Surface on Photon Irradiations in HBr Plasmas

    Yan Zhang, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2014.7 

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    Modifications of Photoresists Surface on Photon Irradiations in HBr Plasmas

  • Nano-Bio applications of carbon-nano materials synthesized and modified by plasma

    Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

    19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2014.7 

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    Nano-Bio applications of carbon-nano materials synthesized and modified by plasma

  • Nucleation control of carbon nanowalls using plasma-enhanced CVD with re-duced ion bombardment, 03pP42

    R. Tsukada, M. Hiramatsu, H. Kondo, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Nucleation control of carbon nanowalls using plasma-enhanced CVD with re-duced ion bombardment, 03pP42

  • Nucleation control of carbon nanowalls for device application, 5P-PM-S08-P09

    R. Tsukada, M. Hiramatsu, H. Kondo, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Nucleation control of carbon nanowalls for device application, 5P-PM-S08-P09

  • Observation of Dangling Bonds in Silicon Nitride Films during Exposure of F Atoms At Down-Flow of CF4 Plsmas Using Real-time / in-situ Electron Spin Resonance, 06aB02O

    Y. Miyawaki, K. Ishikawa, Y. Kondo, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Observation of Dangling Bonds in Silicon Nitride Films during Exposure of F Atoms At Down-Flow of CF4 Plsmas Using Real-time / in-situ Electron Spin Resonance, 06aB02O

  • Plasma Induced Surface Roughness of Polymeric Materials

    K. Ishikawa, T. Takeuchi, Y. Zhang, Y. Setsuhara, K. Takeda, H. Kondo, M. Sekine, M. Hori

    18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics  2014.2 

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    Plasma Induced Surface Roughness of Polymeric Materials

  • Plasma nano-interface with organic materials for surface-roughness formation

    M. Sekine, Y. Zhang, K. Ishikawa, K. Takeda, H. Kondo, M. Hori

    The 9th EU-Japan Joint Symposium on Plasma Processing  2014.1 

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    Plasma nano-interface with organic materials for surface-roughness formation

  • Plasma-Biological Material Interactions Studied by Employing Electron Spin Resonance (ESR) Technique

    Kenji Ishikawa, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiromasa Tanaka, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Masaru Hori

    The XXII Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG)  2014.7 

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    Plasma-Biological Material Interactions Studied by Employing Electron Spin Resonance (ESR) Technique

  • Plasma-Enhanced Synthesis and Edge-Modification of Carbon Nanowalls for Nano-Bio Applications

    Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    2014 MRS Fall Meeting & Exhibit  2014.11 

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    Plasma-Enhanced Synthesis and Edge-Modification of Carbon Nanowalls for Nano-Bio Applications

  • Rapid non-contact measurements of heat fluxes to substrate in nitorogen plasmas, 5B-PM-02

    T. Tsutsumi, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori

    8th International Conference on Reactive Plasmas 31st Symposium on Plasma Processing,Fukuoka Convention Center  2014.2 

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    Rapid non-contact measurements of heat fluxes to substrate in nitorogen plasmas, 5B-PM-02

  • Recovery of Plasma-induced Damage in GaN by In situ Radical Exposure , 6P-AM-S06-P18

    M. Sekine, Z. Liu, S. Chen, Y. Lu, R. Kometani, K. Ishikawa, H. Kano, K. Takeda, H. Kondo, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Recovery of Plasma-induced Damage in GaN by In situ Radical Exposure , 6P-AM-S06-P18

  • Silicon thin film solar cells fabricated by H radical injection plasma, 05pP49

    K. Miwa, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Silicon thin film solar cells fabricated by H radical injection plasma, 05pP49

  • Spectroscopic analysis of gas-liquid plasma for nanographene synthesis, 06aD03O

    A. Ando, T. Takeda, H. Kondo, K. Ishikawa, M. Sekine, T. Ohta, M. Ito, M. Hiramatsu, H. Kano, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Spectroscopic analysis of gas-liquid plasma for nanographene synthesis, 06aD03O

  • Study on Reaction Mechanism of Plasma-Enhanced Atomic Layer Deposition of SiO2 Films by In-Situ Fourier Transform Infrared Spectroscopy

    Yi Lu, Akiko Kobayashi, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    14th International Conference on Atomic Layer Deposition (ALD 2014)  2014.6 

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    Study on Reaction Mechanism of Plasma-Enhanced Atomic Layer Deposition of SiO2 Films by In-Situ Fourier Transform Infrared Spectroscopy

  • Study on a novel radical-enhanced metalorganic chemical vapor deposition (REMOCVD) for GaN epitaxial growth, 03pC12O

    Y. Lu, K. Ishikawa, H. Kondo, O. Oda, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Study on a novel radical-enhanced metalorganic chemical vapor deposition (REMOCVD) for GaN epitaxial growth, 03pC12O

  • Surface modification of carbon nanowalls for their nano-bio applications

    Masaru Hori, HIROKI KONDO, Mineo Hiramatsu

    14th International Conference on Plasma Surface Engineering  2014.9 

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    Surface modification of carbon nanowalls for their nano-bio applications

  • Synthesis and electrocatalytic properties of Pt nanoparticles-supported nanographene synthesized employing in-liquid plasma

    Hiroki Kondo, Tomoaki Amano, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Masafumi Ito, Mineo Hiramatsu

    International Conference on Microelectronics and Plasma Technology 2014 (ICMAP 2014)  2014.7 

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    Synthesis and electrocatalytic properties of Pt nanoparticles-supported nanographene synthesized employing in-liquid plasma

  • Synthesis of nanographene/Pt composite using alcohol in-liquid plasma, 04pP72LN

    K. Yoshida, M. Ito, M. Hiramatsu, T. Saida, H. Kano, H. Kondo, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Synthesis of nanographene/Pt composite using alcohol in-liquid plasma, 04pP72LN

  • Temporal Changes in H and N Atom Densities in Plasmas Caused by Reactor Surface Modifications

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    The XXII Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG)  2014.7 

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    Temporal Changes in H and N Atom Densities in Plasmas Caused by Reactor Surface Modifications

  • カーボンナノウォールの結晶構造に対するラジカル酸化効果(Ⅲ) International conference

    近藤博基, 下枝弘尚, 石川健治, 平松美根男, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • プラズマCVDによって形成したカーボンナノウォールを用いた燃料電池の作製

    大慶 亮佑, 岩本 翔太, 太田 貴之, 伊藤 昌文, 平松 美根男, 近藤 博基, 堀 勝

    第75回秋季応用物理学会学術講演会  2014.9 

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    Venue:北海道大学   Country:Other  

  • プラズマプロセス中のポリメタクリル酸メチル(PMMA)表面の実時間・その場電子スピン共鳴法による反応解析 International conference

    宮脇雄大, 王浩然, 石川健治, 近藤祐介, 竹田圭吾, 近藤博基, 堀邊英夫, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • プラズマ光と表面の相互作用の解明 International conference

    張 彦, 石川 健治, 関根 誠, 深沢 正永, 長畑 和典, 冨谷 茂隆, 辰巳 哲也, 竹田 圭吾, 近藤 博基, 堀 勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • プラズマ照射した食肉血液成分の電子スピン共鳴解析 International conference

    坂倉崚亮, 石川健治, 田中宏昌, 橋爪博司, 太田貴之, 伊藤昌文, 竹田圭吾, 近藤博基, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • プラズマ誘起ナノプロセスの進展と放射光実験への期待 International conference

    近藤博基, 堀勝

    平成26年度前期短期研究会「真空紫外・軟X戦放射光物性研究のパラダイムシフトに向けて」  2014.9 

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    Venue:東京大学物性研究所   Country:Other  

  • プロセス履歴のチャンバー壁表面損失確率への影響とH2/N2プラズマ中のラジカル密度の時間変化 International conference

    鈴木俊哉, 福永裕介, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • 医療・バイオ用AC励起大気圧非平衡プラズマジェットの気相診断 International conference

    熊倉匠, 竹田圭吾, 石川健治, 田中宏昌, 近藤博基, 加納浩之, 中井義浩, 関根誠, 堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • 大気圧プラズマ化学気相堆積法による超撥水薄膜の形成 International conference

    孫昿達, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • 大気圧プラズマ照射培養液の電子スピン共鳴(ESR)による解析 International conference

    倉家尚之, 田中宏昌, 石川健治, 中村香江, 梶山広明, 吉川史隆, 近藤隆, 水野正明, 竹田圭吾, 近藤博基, 関根誠, 堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • 液中プラズマで合成したナノグラフェンを用いた燃料電池用電極の安定性 International conference

    天野智貴, 近藤博基, 竹田圭吾, 石川健治, 太田貴之, 伊藤昌文, 平松美根男, 加納浩之, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • 非接触基板温度計測システムを用いたプラズマプロセス中の基板温度および熱流速計測 International conference

    堤 隆嘉, 竹田 圭吾, 石川 健治, 近藤 博基, 太田 貴之, 伊藤 昌文, 関根 誠, 堀 勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • 高密度窒素ラジカル源を用いたRF-MBE法による(111)Si基板上GaNナノワイヤ高速成長 International conference

    堤裕理, 水谷駿介, 木津良祐, 近藤博基, 堀勝, 本田善央, 天野浩

    日本結晶成長学会 ナノ構造・エピタキシャル成長分科会 2014春季講演会 第6回 窒化物半導体結晶成長講演会  2014.7 

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    Venue:名城大学天白キャンパス   Country:Other  

  • 高温における窒化ガリウム(GaN)のエッチング機構(4) International conference

    劉沢セイ,加古隆, 石川健治, 小田 修, 竹田圭吾, 近藤博基, 関根 誠, 堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • AC励起非平衡大気圧プラズマの放電機構の解明に向けた時空間計測 International conference

    梁思潔, 孫昿達, 竹田圭吾, 近藤博基, 加納浩之, 石川健治, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Language:Japanese  

    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • Absolute density of fluorine atom in capacitively coupled plasma employing hydro-fluorocarbon gases for highly selective SiO2 etching

    T. Komuro, K. Takeda, K. Ishikawa, M. Sekine, H. Kondo, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Absolute density of fluorine atom in capacitively coupled plasma employing hydro-fluorocarbon gases for highly selective SiO2 etching

  • Advanced Surface Engineering on Material Processing Employing Ultrahigh Density Atmospheric Pressure Plasma

    Masaru Hori, K. Takeda, H. Kondo, K. Ishikawa, M.Sekine

    The 1st International Conference on Surface Engineering (ICSE2013)  2013.11 

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    Advanced Surface Engineering on Material Processing Employing Ultrahigh Density Atmospheric Pressure Plasma

  • AlGaNのプラズマエッチング機構に関する研究 International conference

    曹佳棟, 米谷亮佑, 盧翌, 朴鐘胤, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • An Inhibition Mechanism for Surface Roughening of Photoresist During Plasma Etching Process with Plasma Cure International conference

    2013.9 

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    An Inhibition Mechanism for Surface Roughening of Photoresist During Plasma Etching Process with Plasma Cure

  • Analysis of Fluorocarbon Gas Plasma Surface Interactions Using Real-time/In-situ Electron Spin Resonance

    Y. Miyawaki, H. Wang, Y. Kondo, K. Ishikawa, K. Takeda, S. Tajima, H. Kondo, M. Sekine, H. Horibe, M. Hori

    Dry Process Symposium 2013 (DPS2013)  2013.8 

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    Analysis of Fluorocarbon Gas Plasma Surface Interactions Using Real-time/In-situ Electron Spin Resonance

  • Application of atmospheric pressure plasma in element analysis of agricultural products

    J. Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Application of atmospheric pressure plasma in element analysis of agricultural products

  • CH4 /H2 plasma etching on gallium nitride at high temperature International conference

    Takashi Kako, Ze-cheng Liu, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

    2013.9 

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    CH4 /H2 plasma etching on gallium nitride at high temperature

  • CHxFyプラズマにおける活性種生成過程とエッチング機構の解明(III) International conference

    近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 林俊雄, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • CHxFyプラズマにおける活性種生成過程とエッチング機構の解明(II) International conference

    近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 林俊雄, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • Carbon Nanowalls: Growth Control and their Clean Applications

    M. Hiramatsu, H. Kondo, M. Hori

    8th Asia-Pacfic International Symposium on the Basics and Applications of Plasma Technology  2013.12 

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    Carbon Nanowalls: Growth Control and their Clean Applications

  • Carbon nanowalls: synthesis and application

    M. Hiramatsu, H. Kondo, M. Hori

    The 1st International Conference on Surface Engineering (ICSE2013)  2013.11 

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    Carbon nanowalls: synthesis and application

  • Cavity ring down measurements of SiH3-behavior in SiH4/H2 plasma

    Y. Abe, A. Fukushima, Y. Kim, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Cavity ring down measurements of SiH3-behavior in SiH4/H2 plasma

  • Cell-culturing scaffold application of carbon nanowall(CNW)

    M. Hori, H. Watanabe, H. Kondo, Y. Okamoto, M. Hiramatsu, M. Sekine, Y. Baba

    XXXI International Conference on Phenomena in Ionized Gases  2013.7 

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    Cell-culturing scaffold application of carbon nanowall(CNW)

  • Chemical modification and nano-bio applications of carbon nanowalls

    Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2013.5 

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    Chemical modification and nano-bio applications of carbon nanowalls

  • Chlorine plasma etching of GaN at high temperature

    R. Kometani, L.Michael, K. Ishikawa, K. Takeda, H. Kondo, H. Amano, M. Sekine, M.Hori

    The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013)  2013.2 

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    Chlorine plasma etching of GaN at high temperature

  • Construction of atmospheric pressure mist chemical vapor deposition technology for the all-printed electronic technology

    K. Sun, K. Takeda, S. Tajima, H. Kondo, K. Ishikawa, M. Sekine, M. Hori, H. Itoh

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Construction of atmospheric pressure mist chemical vapor deposition technology for the all-printed electronic technology

  • Control of Gas Phase Reaction in Etching Plasmas Employing Hydro-fluorocarbon Gases

    Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

    Dry Process Symposium 2013 (DPS2013)  2013.8 

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    Control of Gas Phase Reaction in Etching Plasmas Employing Hydro-fluorocarbon Gases

  • Crystallographic and chemical modification of carbon nanowalls by radical oxidation

    H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

    The 12th Asia Pacific Physics Conference of AAPPS (AAPC12)  2013.7 

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    Crystallographic and chemical modification of carbon nanowalls by radical oxidation

  • Crystallographic and electrical properties of vertically-grown graphene sheets by CH4/H2 plasma

    H. Cho, H. Kondo, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Crystallographic and electrical properties of vertically-grown graphene sheets by CH4/H2 plasma

  • Detection of metal elements in soil using atmospheric pressure plasma

    J. Kularatne, J. Jolibois, H. Kano, M. Ito, T. Ohta, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    The 12th Asia Pacific Physics Conference of AAPPS (AAPC12)  2013.7 

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    Detection of metal elements in soil using atmospheric pressure plasma

  • Effect of Ar gas addition on photoconductive characteristics of amorphous carbon films synthesized by plasma-enhanced chemicalvapor deposition

    L. Yu, J. Kuki, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Effect of Ar gas addition on photoconductive characteristics of amorphous carbon films synthesized by plasma-enhanced chemicalvapor deposition

  • Effect of Hexane on the synthesis of nanographene using liquid plasma

    J. Jolibois, J. Kularatne, H. Kano, M. Ito, H. Kondo, K. Ishikawa, M. Hori

    The 12th Asia Pacific Physics Conference of AAPPS (AAPC12)  2013.7 

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    Effect of Hexane on the synthesis of nanographene using liquid plasma

  • Effect of Hydrogen Peroxide on Carbon Materials Produced by Gas-liquid Plasma

    J. Jolibois, J. Kularatne, H. Kano, M. Ito, H. Kondo, K. Ishikawa, M. Hori

    Dry Process Symposium 2013 (DPS2013)  2013.8 

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    Effect of Hydrogen Peroxide on Carbon Materials Produced by Gas-liquid Plasma

  • Effect of boron doping on amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

    Lingyun Jia, Jun Kuki, Leyong Yu, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2013.5 

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    Effect of boron doping on amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

  • Effect of boron doping on crystalline structures and electrical properties of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

    J. Kuki, L. Yu, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Effect of boron doping on crystalline structures and electrical properties of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

  • Effect of thin films on wafer temperature during plasma processes investigated by non-contact temperature measurement technique

    T. Tsutsumi, K Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M.Hori

    XXXI International Conference on Phenomena in Ionized Gases  2013.7 

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    Effect of thin films on wafer temperature during plasma processes investigated by non-contact temperature measurement technique

  • Effects of Hydroxyl Radicals on Crystallographic and Electrinic Structures of Carbon Nanowalls

    H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M.Sekine, M. Hori

    The 16th International Workshop on Advanced Plasma Processing and Diagnostics  2013.1 

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    Effects of Hydroxyl Radicals on Crystallographic and Electrinic Structures of Carbon Nanowalls

  • Effects of carbon nanowall scaffold and their chemical termination on cell culturing

    H. Watanabe, H. Kondo, Y. Okamoto, M. Sekine, M. Hiramatsu, Y. Baba, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Effects of carbon nanowall scaffold and their chemical termination on cell culturing

  • Effects of hydrogen contained in fluorocarbon gas molecules fordielectric film etching process

    Y. Kondo, Y. Miyawaki, K. Takeda, K.Ishikawa, H. Kondo, T. Hayashi, M. Sekine, M. Hori

    The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013)  2013.2 

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    Effects of hydrogen contained in fluorocarbon gas molecules fordielectric film etching process

  • Effects of morphological changes induced by hydrogen peroxide treatment on electrical properties of carbon nanowalls

    H. Shimoeda, H. Kondo, K. Takeda, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Effects of morphological changes induced by hydrogen peroxide treatment on electrical properties of carbon nanowalls

  • Electrical properties of microcrystalline silicon thin films deposited by employing hydrogen radical-injection plasma-enhanced CVD method International conference

    Keita Miwa, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

    2013.9 

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    Electrical properties of microcrystalline silicon thin films deposited by employing hydrogen radical-injection plasma-enhanced CVD method

  • Electron spin resonance study of plasma-biological surface interaction for food hygiene

    K. Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Electron spin resonance study of plasma-biological surface interaction for food hygiene

  • Etching Characteristics of Gallium Nitride based compound semiconductors with Inductively Coupled Cl2 Plasma International conference

    Jia-dong Cao, Yi Lu, Jong-yun Park, Ze-cheng Liu, Takashi Kako, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    2013.9 

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    Etching Characteristics of Gallium Nitride based compound semiconductors with Inductively Coupled Cl2 Plasma

  • Etching Characterristics of AlGaN and GaN in Inductively Coupled Cl2 Prasma

    D. Cao, Y. Lu, R. Kometani, J. Park, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori

    AVS 60th International Symposium & Exhibition  2013.10 

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    Etching Characterristics of AlGaN and GaN in Inductively Coupled Cl2 Prasma

  • Etching characteristics of AlGaN in inductively coupled Cl2 plasmas

    J.-D. Cao, Y. Lu, R. Kometani, J. -Y. Park, K. Ishikawa, K. Takeda, H. Kondo, M, Sekine, M. Hori

    The 16th International Workshop on Advanced Plasma Processing and Diagnostics  2013.1 

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    Etching characteristics of AlGaN in inductively coupled Cl2 plasmas

  • Formation and characteristics of Pt-Au nanoparticles supported on carbon nanowalls (CNWs) employing a supercritical fluid

    T. Horibe, H. Kondo, H. Kano, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Formation and characteristics of Pt-Au nanoparticles supported on carbon nanowalls (CNWs) employing a supercritical fluid

  • Gas-phase reaction model of Ar-diluted CHxFy plasmas

    Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Gas-phase reaction model of Ar-diluted CHxFy plasmas

  • Gradual transition of chemical structures at initial growth stage of carbon nanowalls

    H. Kondo, K. Yasuda, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

    The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition  2013.9 

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    Gradual transition of chemical structures at initial growth stage of carbon nanowalls

  • H2/N2プラズマ中のラジカル密度へ前のプロセスが与える影響とその制御 International conference

    鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • H2/N2プラズマ中のラジカル密度へ前のプロセスが与える影響とその制御 International conference

    鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.1 

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    Venue:神奈川工科大学   Country:Other  

  • High H radical density produced by 1-m-length atmospheric pressure microwave plasma system

    H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, H. Toyoda, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    High H radical density produced by 1-m-length atmospheric pressure microwave plasma system

  • High Temperature Etching of GaN Preserving Smooth and Stoichiometric GaN Surface

    R. Kometani, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori

    AVS 60th International Symposium & Exhibition  2013.10 

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    High Temperature Etching of GaN Preserving Smooth and Stoichiometric GaN Surface

  • High temperature plasma etching of GaN

    R. Kometani, S. Chen, M. Liu, K. Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    High temperature plasma etching of GaN

  • Hydrogen radical injection plasma deposition of (110)-preferentially oriented microcrystalline silicon films

    L. Ya, A. Fukushima, Y. Abe, Y. Kim, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Hydrogen radical injection plasma deposition of (110)-preferentially oriented microcrystalline silicon films

  • Hydrogen radical-injection plasma fabricated microcrystalline silicon thin film for solar cells

    Masaru Hori, Yusuke Abe, Atsushi Fukushima, Ya Lu, Sho Kawashima, Keita Miwa, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine

    21th International Symposium on Plasma Chemistry (ISPC)  2013.8 

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    Hydrogen radical-injection plasma fabricated microcrystalline silicon thin film for solar cells

  • Identification of ESR signals arisen from Penicillium digitatum spores-3 International conference

    H Mizuno, K Ishikawa, H Tanaka, H Hashizume, T Ohta, M Ito, K Takeda, H Kondo, M Sekine, M Hori

    2013.3 

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    Identification of ESR signals arisen from Penicillium digitatum spores-3

  • In situ Surface analysis of GaAs irradiated by Cl plasma beams International conference

    2013.3 

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    In situ Surface analysis of GaAs irradiated by Cl plasma beams

  • In-situ ESR Measurements for Plasma Materials Interactions

    Kenji ISHIKAWA, Hiromasa TANAKA, Hiroshi HASHIZUME, Takayuki OHTA, Masafumi ITO, Keigo TAKEDA, Hiroki KONDO, Makoto SEKINE, Masaru HORI

    The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013)  2013.8 

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    In-situ ESR Measurements for Plasma Materials Interactions

  • In-situ ESR measurements for Plasma Materials Interractions

    Kenji Ishikawa, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

    9th Asian-european International Conference On Plasma Surface Enginnering, Conference and Exhibition  2013.8 

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    In-situ ESR measurements for Plasma Materials Interractions

  • Influence of N2 inclusion to Ar AP plasma in atomization

    J. S.Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013)  2013.2 

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    Influence of N2 inclusion to Ar AP plasma in atomization

  • Investigation of Si etch reaction with F and O radicals using SF6/O2 plasma

    M. Sekine, S. Amasaki, T. Takeuchi, K. Ishikawa, K. Takeda, H. Kondo, M.Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Investigation of Si etch reaction with F and O radicals using SF6/O2 plasma

  • Low-damage, high-accuracy plasma etching of Ga-compound semiconductors

    J. Cao, R. Kometani, J. Park, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Low-damage, high-accuracy plasma etching of Ga-compound semiconductors

  • Low-temperature Insulating Film Formation with Plasma Enhanced Mist Chemical Vapor Deposition

    K. Sun, K. Takeda, H. Itoh, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    Dry Process Symposium 2013 (DPS2013)  2013.8 

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    Low-temperature Insulating Film Formation with Plasma Enhanced Mist Chemical Vapor Deposition

  • Measurement of carbon nanowalls / silicon substrate temperature by fourier-domain low-coherence interferometry

    T. Hiraoka, T. Tsutsumi, H. Kato, K. Takeda, T. Ohta, H. Kondo, K. Ishikawa, M. Ito, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Measurement of carbon nanowalls / silicon substrate temperature by fourier-domain low-coherence interferometry

  • Mechanism for degradation of porous SiOCH low-K films by O2 plasma

    K. Asano, K. Ishikawa, M. Sekine, K. Takeda, H. Kondo, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Mechanism for degradation of porous SiOCH low-K films by O2 plasma

  • Non-contact Temperature Monitoring of Substrates Using Optical Interferometry on Plasma Processing

    T. Ohta, T. Takayoshi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori, M. Ito

    Dry Process Symposium 2013 (DPS2013)  2013.8 

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    Non-contact Temperature Monitoring of Substrates Using Optical Interferometry on Plasma Processing

  • Non-contact measurements of substrate-temperature by frequency-domain low coherence interferometry

    T. Tsutsumi, T. Ohta, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito

    AVS 60th International Symposium & Exhibition  2013.10 

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    Non-contact measurements of substrate-temperature by frequency-domain low coherence interferometry

  • Nonequilibrium atmospheric pressure plasma selectively killed ovarian cancer cells and induced apoptosis

    H. Tanaka, S. Iseki, K. Nakamura, M. Hayashi, H. Kondo, H. Kajiyama, H. Kano, F. Kikkawa, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Nonequilibrium atmospheric pressure plasma selectively killed ovarian cancer cells and induced apoptosis

  • Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition

    M. Hiramatsu, Y. Nihashi, H. Kondo, M. Hori

    The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition  2013.9 

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    Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition

  • Plasma Etching of Ga-based Compound Semiconductor

    J. Park, J. Cao, Z. Liu, T. Kako, K. Ishikawa, Y. Setsuhara, K. Takeda, H. Kondo, M. Sekine, M. Hori

    Dry Process Symposium 2013 (DPS2013)  2013.8 

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    Plasma Etching of Ga-based Compound Semiconductor

  • Plasma-biological surface interaction investigated by electron spin resonance

    H. Mizuno, K. Ishikawa, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Plasma-biological surface interaction investigated by electron spin resonance

  • Plasma-mediated modulation of element distribution in skin and skin cancer

    I. Yajima, M. Iida, K. Nakagawa, H. Kondo, M. Kumasaka, K. Takeda, M. Hori, H. Kano, M. Kato

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Plasma-mediated modulation of element distribution in skin and skin cancer

  • Plasma-surface intertactions in plasma etching of future device fabrication

    K. Ishikawa, Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T.Hayashi, M. Sekine, M. Hori

    The 16th International Workshop on Advanced Plasma Processing and Diagnostics  2013.1 

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    Plasma-surface intertactions in plasma etching of future device fabrication

  • Plasma-surface intertactions in plasma etching of future device fabrication

    K. Ishikawa, Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T.Hayashi, M. Sekine, M. Hori

    The 16th International Workshop on Advanced Plasma Processing and Diagnostics  2013.1 

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    Plasma-surface intertactions in plasma etching of future device fabrication

  • PlasmaInduced Surface Roughness of ArF Photoresist Examined by Plasma-Beam Processes

    T. Takeuchi, Y. Zhang, K. Ishikawa, M. Sekine, Y. Setsuhara, K. Takeda, H. Kondo, M. Hori

    AVS 60th International Symposium & Exhibition  2013.10 

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    PlasmaInduced Surface Roughness of ArF Photoresist Examined by Plasma-Beam Processes

  • Radical Density Control in H2/N2 Plasma Based on In-situ Monitoring with Vacuum Ultra Violet Absorption Spectroscopy

    T. Suzuki, K. Takeda, K. Ishikawa, H. Kondo, M, Sekine, M. Hori

    The 16th International Workshop on Advanced Plasma Processing and Diagnostics  2013.1 

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    Radical Density Control in H2/N2 Plasma Based on In-situ Monitoring with Vacuum Ultra Violet Absorption Spectroscopy

  • Rapid precise measurements of film-covered-substrate temperatures during plasma processes

    M. Ito, T. Tsutsumi, T. Ohta, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    The 1st International Conference on Surface Engineering (ICSE2013)  2013.11 

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    Rapid precise measurements of film-covered-substrate temperatures during plasma processes

  • Reaction Mechanism at the Sidewall of Through Si via (TSV) Etching by SF6/O2/SiF4 Plasma

    I. Sakai, S. Amasaki, T. Takeuchi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, N. Sakurai, H. Hayashi, T. Ohiwa, M. Hori

    AVS 60th International Symposium & Exhibition  2013.10 

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    Reaction Mechanism at the Sidewall of Through Si via (TSV) Etching by SF6/O2/SiF4 Plasma

  • Real time temperature measurements of film-covered-substrate employing fourier domain low coherence interferometer during plasma processes

    T. Tsutsumi, T. Hiraoka, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Real time temperature measurements of film-covered-substrate employing fourier domain low coherence interferometer during plasma processes

  • Real-time / In-situ Electron Spin Resonance Analysis of Chemical Reactions on Silicon-Nitride with CF4 Gas Plasma International conference

    2013.9 

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    Real-time / In-situ Electron Spin Resonance Analysis of Chemical Reactions on Silicon-Nitride with CF4 Gas Plasma

  • Real-time / in-situ electron spin resonance analysis of plasma surface interactions

    H. Wang, K. Ishikawa, H. Horibe, K. Takeda, H. Kondo, M, Sekine, M. Hori

    The 16th International Workshop on Advanced Plasma Processing and Diagnostics  2013.1 

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    Real-time / in-situ electron spin resonance analysis of plasma surface interactions

  • Real-time variation of sputtering yield of Ar ion for ArF photoresist during Ar plasma exposure

    T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. Keudell, K. Ishikawa, H. Kondo, K. Takeda, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Real-time variation of sputtering yield of Ar ion for ArF photoresist during Ar plasma exposure

  • Recovery of Plasma-Damaged GaN by in situ Radical Exposure

    Makoto Sekine, Zecheng Liu, Shang Chen, Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Masaru Hori

    10th International Conference on Nitride Semiconductors (ICNS10)  2013.8 

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    Recovery of Plasma-Damaged GaN by in situ Radical Exposure

  • Reduction of Mechanism of Surface Roughness on ArF-Photoresist Using C5HF7 Gas Plasma

    Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, A. Ito, H. Matsumoto, M. Hori

    66th Annual Gaseous Electronic Conference (GEC2013)  2013.9 

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    Reduction of Mechanism of Surface Roughness on ArF-Photoresist Using C5HF7 Gas Plasma

  • Reduction of surface roughness on ArF-photoresist by C5HF7 gas plasma

    Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

    17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2013.5 

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    Reduction of surface roughness on ArF-photoresist by C5HF7 gas plasma

  • Relation between gaseous radicals and μc-Si film property in SiH4/H2 plasma CVD

    2013.1 

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    Venue:Nagoya University, Japan   Country:Other  

  • Sequential exposure of N and H atoms for recovery of plasma-damaged GaN

    Z. Liu, S. Chen, Y. Lu, R. Kometani, K. Ishikawa, H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Sequential exposure of N and H atoms for recovery of plasma-damaged GaN

  • Study on mechanism of gallium nitride growth employing a plasma-enhanced metal-organic chemical vapor deposition International conference

    2013.3 

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    Study on mechanism of gallium nitride growth employing a plasma-enhanced metal-organic chemical vapor deposition

  • Study on mechanism of ultrahigh speed synthesis of high crystallinity nanographene employing in-liquid plasma

    H. Kondo, T. Hagino, K. Ishikawa, H. Kano, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Study on mechanism of ultrahigh speed synthesis of high crystallinity nanographene employing in-liquid plasma

  • Study on precursor adsorption and reaction within SiO2 growth cycle of low temperature plasma-enhanced atomic layer deposition using in-situ ATR-FTIR

    Y. Lu, A. Kobayashi, Y. Kim, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Study on precursor adsorption and reaction within SiO2 growth cycle of low temperature plasma-enhanced atomic layer deposition using in-situ ATR-FTIR

  • Subsequent temporal change of gaseous H and N radical density in H2/N2 plasma after air exposure and its control

    T. Suzuki, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Subsequent temporal change of gaseous H and N radical density in H2/N2 plasma after air exposure and its control

  • Superior properties of carbon nanowalls as cell scaffolds

    Y. Okamoto, H. Watanabe, K. Kubo, H. Kondo, N. Kaji, M. Tokeshi, M. Hori, Y. Baba

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    Superior properties of carbon nanowalls as cell scaffolds

  • Surface Analysis of GaN at Elevated Substrate Temperature

    Kenji Ishikawa, Ryosuke Kometani, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    10th International Conference on Nitride Semiconductors (ICNS10)  2013.8 

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    Surface Analysis of GaN at Elevated Substrate Temperature

  • Temperature measurement of carbon nanowall / silicon substrateusing super-continuum light source on low-coherence interferometry

    T. Hiraoka, H. Kato, T. Tsutsumi, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Hori

    The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013)  2013.2 

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    Temperature measurement of carbon nanowall / silicon substrateusing super-continuum light source on low-coherence interferometry

  • The atmospheric pressure plasmas

    H. Kano, K. Takeda, H. Kondo, S. Den, Y. Higashijima, M. Hori

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013)  2013.1 

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    The atmospheric pressure plasmas

  • カーボンナノウォールの核発生制御に関する研究 International conference

    塚田僚介, 平松美根男, 近藤博基, 堀勝

    応用物理学会SC東海地区学術講演会 2013  2013.11 

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  • カーボンナノウォールの表面化学修飾とナノバイオ応用 International conference

    近藤博基, 渡邊均, 石川健治, 関根誠,堀勝, 平松美根男

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • カーボンナノウォールに対する酸素原子及びアルゴンイオンの同時照射効果 International conference

    下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • カーボンナノウォールの結晶構造に対するラジカル酸化効果(Ⅱ) International conference

    下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • ガスデザインに基づいた高選択絶縁膜エッチングの検討 International conference

    宮脇雄大, 浅野高平, 近藤祐介, 竹田圭吾, 田嶋聡美, 近藤博基, 石川健治, 林俊雄, 関根誠, 伊東安曇, 松本裕一, 堀勝

    第156回シリコンテクノロジー研究集会  2013.2 

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    Venue:東京大学本郷キャンパス   Country:Other  

  • ナノグラフェン合成中の液中プラズマの分光診断 International conference

    安藤睦, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 太田貴之, 伊藤昌文, 平松美根男, 加納浩之, 堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • ハイドロフルオロカーボンプラズマによるArFフォトレジストの低ラフネスエッチング機構 International conference

    浅野 高平, 宮脇 雄大, 石川 健治, 関根 誠, 伊東 安曇, 松本 裕一, 竹田 圭吾, 近藤 博基, 堀 勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • ハイドロフルオロカーボンプラズマによるArFフォトレジストの低ラフネスエッチング機構 International conference

    浅野高平, 宮脇雄大, 石川健治, 関根誠, 伊東安曇, 松本裕一, 竹田圭吾, 近藤博基, 堀勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマCVDを用いて作製したカーボンナノウォールのバイオセンサ特性 International conference

    永島 三千弥, 渡邊 均, 平松 美根男, 近藤 博基, 堀 勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマCVDを用いて作製したカーボンナノウォールのバイオセンサ特性 International conference

    永島三千弥, 渡邊均, 平松美根男, 近藤博基, 堀勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマによるHとNラジカルの表面損失確率の変化 International conference

    鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析(5) International conference

    王浩然, 石川健治, 堀邉英夫, 竹田圭吾, 近藤博基, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • プラズマプロセスによるArFフォトレジスト表面凹凸の解析 International conference

    竹内拓也, 石川健治, 節原裕一, 竹田圭吾, 近藤博基, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析(4) International conference

    石川健治, 堀邉英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝, 王浩然

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • プラズマ励気ミスト化学気相成長法を用いた絶縁膜合成 International conference

    孫 昿達, 竹田 圭吾, 近藤 博基, 田嶋 聡美, 石川 健治, 関根 誠, 堀 勝, 伊藤 仁

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマ励気ミスト化学気相成長法を用いた絶縁膜合成 International conference

    孫昿達, 竹田圭吾, 近藤博基, 田嶋聡美, 石川健治, 関根誠, 堀勝, 伊藤仁

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の膜構造に対する基板バイアス印加効果 International conference

    中村将之, 賈凌雲, 徐達, 近藤博基, 石川健治, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • プラズマ化学気相堆積法を用いたナノグラフェンの核発生によるカーボンナノウォールの選択成長 International conference

    塚田 僚介, 平松 美根男, 近藤 博基, 堀 勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマ化学気相堆積法を用いたナノグラフェンの核発生によるカーボンナノウォールの選択成長 International conference

    塚田僚介, 平松美根男, 近藤博基, 堀勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマ医療科学の創成とその展望 International conference

    堀 勝, 井関 紗千子, 田中 昌弘, 石川 健治, 近藤 博基, 竹田 圭吾, 関根 誠, 中村 香江, 林 萌美, 梶山 広明, 加納 浩之, 吉川 史隆

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • プラズマ医療科学の創成とその展望 International conference

    堀勝, 井関紗千子, 田中昌弘, 石川健治, 近藤博基, 竹田圭吾, 関根誠, 中村香江, 林萌美, 梶山広明, 加納浩之, 吉川史隆

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センターS会場   Country:Other  

  • プラズマ-表面相互作用の実時間その場電子スピン共鳴分光研究 International conference

    石川健治, 記念講演, 鷲見直也, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根 誠, 堀 勝

    プラズマエレクトロニクス賞受賞記念講演、平成25年秋季第74回応用物理学会学術講演会  2013.9 

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    Venue:同志社大学京田辺キャンパス   Country:Other  

  • プラズマ-表面相互作用の実時間その場電子スピン共鳴分光研究 International conference

    石川健治, 記念講演, 鷲見直也, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根 誠, 堀 勝

    プラズマエレクトロニクス賞受賞記念講演、平成25年秋季第74回応用物理学会学術講演会  2013.9 

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    Venue:同志社大学京田辺キャンパス   Country:Other  

  • プリンタブルエレクトロニクスに向けたプラズマ励起ミスト化学気相堆積技術に関する研究 International conference

    孫昿達, 竹田圭吾, 伊藤仁, 近藤博基, 石川健治, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • マイクロ波励起表面波プラズマCVD法を用いたカーボン膜の作製 International conference

    加島 洋平, 平松 美根男, 近藤 博基, 堀 勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • マイクロ波励起表面波プラズマCVD法を用いたカーボン膜の作製 International conference

    加島洋平, 平松美根男, 近藤博基, 堀勝

    第30回プラズマプロセシング研究会  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • ミドリカビ胞子からの実時間その場ESR信号観察 International conference

    石川 健治, 水野 寛子, 田中 宏昌, 橋爪 博司, 太田 貴之, 伊藤 昌文, 竹田 圭吾, 近藤 博基, 関根 誠, 堀 勝

    第66回日本酸化ストレス学会学術集会  2013.6 

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    Venue:WINCあいち,名古屋   Country:Other  

  • ラジカル注入型プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の結晶構造及びラジカル密度に対するガス流量効果 International conference

    徐達,賈凌雲, 中村将之, 近藤博基, 石川健治, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • ラジカル注入型プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の結晶構造及び電気特性に対するボロン注入効果 International conference

    賈凌雲, 九鬼淳, 于楽泳, 近藤博基, 石川健治, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • 先進プラズマ技術による産業イノベーション International conference

    堀勝, 関根誠, 近藤博基, 竹田圭吾

    テクノ・フェア名大2013 -工学が挑む新時代の科学・技術-  2013.9 

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    Venue:名古屋大学豊田講堂・シンポジオンホール   Country:Other  

  • 卵巣癌細胞におけるプラズマの抗腫瘍効果とROSの関与 International conference

    中村 香江, 梶山 広明, 内海史, 田中 宏昌, 水野 正明, 石川 健治, 近藤 博基, 加納 浩之, 堀 勝, 吉川 史隆

    第66回日本酸化ストレス学会学術集会  2013.6 

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    Venue:WINCあいち,名古屋   Country:Other  

  • 塩素ガスプラズマによるGaNエッチングにおける窒素ガス添加の効果 International conference

    劉沢セイ, 朴鐘胤, 曹佳棟, 加古隆, 石川健治, 小田修, 竹田圭吾, 近藤博基, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • 塩素ガスプラズマによる窒素ガリウムの高温エッチング International conference

    米谷亮祐, 陳尚, 曹佳棟, 劉沢せい, 石川健治, 竹田圭吾, 近藤博基, 関根誠, 天野浩, 堀勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • 塩素ガスプラズマによる窒素ガリウムの高温エッチング International conference

    米谷亮祐, 陳尚, 曹佳棟, 劉沢せい, 石川健治, 竹田圭吾, 近藤博基, 関根誠, 天野浩, 堀勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • 大気圧プラズマを用いたミスト化学気相堆積法によるシリコン酸化膜の低温形成 International conference

    孫昿達, 竹田圭吾, 伊藤仁, 近藤博基, 石川健治, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • 水素ラジカル注入型プラズマCVDによる微結晶シリコン膜の特性解析 International conference

    阿部祐介, 三輪佳大, 福島敦史, 陸雅, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • 液中プラズマで合成したナノグラフェンを用いた燃料電池用白金触媒電極の特性評価 International conference

    天野智貴, 加納浩之, 竹田圭吾, 近藤博基, 太田貴之, 伊藤昌文, 平松美根男, 石川健治, 関根誠,堀勝

    第74回応用物理学会秋季学術講演会  2013.9 

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    Venue:同志社大学 京田辺キャンパス   Country:Other  

  • 混合ガスプラズマ培養液によるグリオーマ脳腫瘍培養細胞に対する抗腫瘍効果の解析

    権田亮, 田中宏昌, 竹田圭吾, 田嶋聡美, 近藤博樹, 石川健治, 関根誠, 加納浩之, 水野正明, 堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • 窒化ガリウム(GaN)向けたサファイア基板の周波数領域型低コヒーレンス干渉計による温度計測(Ⅱ) International conference

    堤隆嘉, 竹田圭吾, 石川健治, 近藤博基, 太田貴之, 伊藤昌文, 関根誠, 堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • 窒素プラズマを用いた化学修飾によるカーボンナノウォールの構造および電気的特性の制御 International conference

    趙亨峻, 近藤博基, 石川健治, 関根誠, 平松美根男, 堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • 超臨界流体を用いた2 段階担持プロセスによるカーボンナノウォールへのPtナノ微粒子の超高密度担持および粒径分布制御 International conference

    堀部剛良, 近藤博基, 加納浩之, 石川健治, 関根誠, 平松美根男, 堀勝

    第60回応用物理学会春季学術講演会  2013.3 

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    Venue:神奈川工科大学   Country:Other  

  • 超臨界流体を用いた2段階担持法によるカーボンナノウォールへの超高密度Pt-Auナノ微粒子担持 International conference

    堀部剛良, 近藤博基, 加納浩之, 石川健治, 平松美根男, 関根誠, 堀勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • 超臨界流体を用いた2段階担持法によるカーボンナノウォールへの超高密度Pt-Auナノ微粒子担持 International conference

    堀部剛良, 近藤博基, 加納浩之, 石川健治, 平松美根男, 関根誠, 堀勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • 電気二重層キャパシタに用いるカーボンナノウォール電極の電気化学評価 International conference

    吉田 圭祐, 平松 美根男, 近藤 博基, 堀 勝

    第30回プラズマプロセシング研究会(SPP-30)  2013.1 

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    Venue:アクトシティ浜松・研修交流センター S会場   Country:Other  

  • 非平衡大気圧プラズマによる先端グリーン・ライフイノベーション International conference

    豊田 浩孝, 石川 健治, 堀 勝, 関根 誠, 近藤 博基, 竹田 圭吾

    テクノ・フェア名大2013 -工学が挑む新時代の科学・技術-  2013.9 

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    Venue:名古屋大学豊田講堂・シンポジオンホール   Country:Other  

  • A High Temperature Plasma Etching of GaN and Its Reaction Mechanism

    R. Kometani, S. Chen, M. Liu, K. Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    A High Temperature Plasma Etching of GaN and Its Reaction Mechanism

  • A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism

    K. Asano, Y. Miyawaki, K. Ishikawa, M. Sekine, K. Takeda, A. Ito, H. Matsumoto, H. Kondo, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism

  • AC励起大気圧プラズマを用いた下水モニタリング装置の開発

    J.S KULARATNE, 加納 浩之, 伊藤 昌文, 太田 貴之, 竹田 圭吾, 石川 健治, 近藤 博基, 関根 誠, 堀 勝

    第5回プラズマ技術産業応用センター(PLACIA)&プラズマが拓くものづくり研究会(PLAM)国際シンポジウム  2012.10 

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    Venue:なごやサイエンスパーク、サイエンス交流プラザ大会議室   Country:Other  

  • Advanced Plasma Science and Technologies for Nanostructure Control of Carbon Nanomaterials

    Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

    International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012  2012.9 

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    Advanced Plasma Science and Technologies for Nanostructure Control of Carbon Nanomaterials

  • An in-situ sequential H and N radical exposure process for recovery of plasma-damaged GaN

    H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    An in-situ sequential H and N radical exposure process for recovery of plasma-damaged GaN

  • Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals

    Makoto Sekine, Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Toshio Hayashi, Masaru Hori

    International Conference on Plasma Science  2012.7 

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    Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals

  • Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals

    Makoto Sekine, Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Toshio Hayashi, Masaru Hori

    International Conference on Plasma Science  2012.7 

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    Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals

  • Atmospheric Pressure Plasma Processes and their Diagnostics for Life Sciences

    Masasu Hori (Plenary, Masahiro Tanaka, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Fumitaka Kikkawa, Kae Nakamura, Moemi Hayashi, Hiroaki Kajiyama, Masaaki Mizuno, Hiroyuki Ohta, Masafumi Ito, Hiroyuki Kano

    The 2nd International Symposium for Plasma Biosciences  2012.8 

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    Atmospheric Pressure Plasma Processes and their Diagnostics for Life Sciences

  • C5HF7ガスプラズマによるArFフォトレジストの表面ラフネス形成の低減機構 International conference

    浅野高平, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 伊東安曇, 松本裕一, 関根 誠, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • Change of GaAs Surface Properties by Irradiation of Cl2 Ions

    Jongyun Park, Takuya Takeuchi, Jiadong Cao, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Change of GaAs Surface Properties by Irradiation of Cl2 Ions

  • Comprehensive study of atmospheric pressure plasma

    M. Hori, K. Ishikawa, H. Kondo, K. Takeda, M. Tanaka, S. Makoto, T. Ohta, M. Ito

    69th IUVSTA Workshop on Oxidation of Organic Materials by Excited Radicals Created in Non-equilibrium Gaseous Plasma  2012.12 

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    Comprehensive study of atmospheric pressure plasma

  • Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN)

    R. Kometani, S. Chen, J. Park, J. Cao, Y. Lu, K.Ishikawa, K. Takeda, H. Kondo, H. Amano, M. Sekine, M. Hori

    59th AVS International Symposium and Exhibition  2012.10 

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    Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN)

  • Critical Factors of Synthesis Rate and Crystallinity of Nanographene in Ultrahigh-Speed Nanographene Synthesis Employing Alcohol Plasma

    H. Kondo, T. Hagino, K. Ishikawa, H. Kano, M. Sekine, M. Hori

    The 4th International Conference on Microelectronics and Plasma Technology  2012.7 

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    Critical Factors of Synthesis Rate and Crystallinity of Nanographene in Ultrahigh-Speed Nanographene Synthesis Employing Alcohol Plasma

  • Crystalline and Electrical Properties of Vertically-Laminated Carbon Nanowalls formed by Two-Step Growth Method

    H. Kondo, T. Kanda, M. Hiramatsu, K. Ishikawa, M. Sekine, M. Hori

    59th AVS International Symposium and Exhibition  2012.10 

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    Crystalline and Electrical Properties of Vertically-Laminated Carbon Nanowalls formed by Two-Step Growth Method

  • Edge Termination on Electrical Properties of Vertically-grown Graphene Sheets Employing N2/H2 Mixture Plasma

    H. J. Cho, H. Kondo, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

    2012 International Conference on Solid State Devices and Materials (SSDM 2012)  2012.9 

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    Edge Termination on Electrical Properties of Vertically-grown Graphene Sheets Employing N2/H2 Mixture Plasma

  • Edge and Surface Modification of Nanographenes in Carbon Nanowalls by Hydrogen Peroxide Treatments

    H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

    The 4th International Conference on Microelectronics and Plasma Technology  2012.7 

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    Edge and Surface Modification of Nanographenes in Carbon Nanowalls by Hydrogen Peroxide Treatments

  • Effect of Nitrogen Doping on Photoconductivity of Amorphous Carbon Films Grown by Radical-injection Plasma-enhanced Chemical Vapor Deposition

    Leyong Yu, Jun Kuki, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Effect of Nitrogen Doping on Photoconductivity of Amorphous Carbon Films Grown by Radical-injection Plasma-enhanced Chemical Vapor Deposition

  • Effect of nitrogen doping on photoconductivity of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition International conference

    Leyong Yu, Jun Kuki, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    2012.9 

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    Effect of nitrogen doping on photoconductivity of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

  • Effects of Carbon Nanowall Scaffold on HeLa Cell Culture

    Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Makoto Sekine, Mineo Hiramatsu, Yoshinobu Baba, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Effects of Carbon Nanowall Scaffold on HeLa Cell Culture

  • Effects of Edge Termination on Crystalline and Electronic Structures of Carbon Nanowalls by Post-growth Nitrogen Plasma Treatment

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition (E-MRS 2012 FALL MEETING)  2012.9 

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    Effects of Edge Termination on Crystalline and Electronic Structures of Carbon Nanowalls by Post-growth Nitrogen Plasma Treatment

  • Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012  2012.9 

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    Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls

  • Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    the International Union of Materials Research Society-International Conference in Asia-2012 (IUMRS-ICA-2012)  2012.8 

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    Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls

  • Effects of Hydroxyl Radical on Nanographene Surfaces in Carbon Nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Effects of Hydroxyl Radical on Nanographene Surfaces in Carbon Nanowalls

  • Effects of Pulse Bias on Crystallographic Properties of Amorphous Carbon Films Grown by Plasma-enhanced Chemical Vapor Deposition

    Jun Kuki, Leyong Yu, Hiroki Kondo, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Effects of Pulse Bias on Crystallographic Properties of Amorphous Carbon Films Grown by Plasma-enhanced Chemical Vapor Deposition

  • Electron Spin Resonance (ESR) observation of radicals on biological organism interacted with plasmas

    Ishikawa K

    Materials Research Society Symposium Proceedings  2012.12 

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    Electron Spin Resonance (ESR) observation of radicals on biological organism interacted with plasmas

  • Electron Spin Resonance (ESR) study of Radicals on Biological Organism Created by Interaction with Plasma

    Kenji Ishikawa, Hiromasa Tanaka, Hiroko Moriyama, Sachiko Iseki, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Masaru Hori, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiroyuki Kano

    International Conference on Plasma Science  2012.7 

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    Electron Spin Resonance (ESR) study of Radicals on Biological Organism Created by Interaction with Plasma

  • Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas, WW-2.6

    K. Ishikawa, S. Iseki, H. Moriyama, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

    2012 MRS Spring Meeting & Exhibit, Moscone West California  2012.4 

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    Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas, WW-2.6

  • Evaluation of Relationship between μC-Si Film Property and Flux Ratio of H Radicals to Film Precursors

    2012.10 

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    Venue:Kyoto University ROHM Plaza, Kyoto, Japan,   Country:Other  

  • Fabrication of graphene-based films using remote plasma CVD

    Mineo Hiramatsu, Ryosuke Tsukada, Yohei Kashima, Masateru Naito, Hiroki Kondo, Masaru Hori

    65th Annual Gaseous Electronics Conference  2012.10 

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    Fabrication of graphene-based films using remote plasma CVD

  • Field Electron Emitter Fabricated by Plasma Etching of Organic Material

    Toshiya Suzuki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Yuichi Setsuhara, Seiji Shiratani, Makoto Sekine, Masaru Hori

    International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012  2012.9 

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    Field Electron Emitter Fabricated by Plasma Etching of Organic Material

  • Field Electron Emitter Fabricated by Plasma Etching of Organic Material

    Toshiya Suzuki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Yuichi Setsuhara, Seiji Shiratani, Makoto Sekine, Masaru Hori

    the International Union of Materials Research Society-International Conference in Asia-2012 (IUMRS-ICA-2012)  2012.8 

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    Field Electron Emitter Fabricated by Plasma Etching of Organic Material

  • Formation of 10-nm Organic Pillars by Plasma Etch with Pt particle masks and their Field Emission Properties.

    Makoto Sekine, Toshiya Suzuki, Keigo Takeda, Hiroki Kondoi, Kenji Ishikawa, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

    The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop)  2012.6 

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    Formation of 10-nm Organic Pillars by Plasma Etch with Pt particle masks and their Field Emission Properties.

  • GaNにおけるプラズマダメージのラジカル修復(3) International conference

    Zecheng Liu, 陳 尚, 盧 翌, 米谷亮祐, 石川健治, 加納浩之, 竹田圭吾, 近藤博基, 関根 誠, 江川孝志, 堀 勝, 天野 浩

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • Generation Mechanism of Ions and Radicals in CHxFy Etching Plasmas

    Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Generation Mechanism of Ions and Radicals in CHxFy Etching Plasmas

  • Gradual transition of chemical structures at initial growth stage of carbon nanowalls

    Hiroki Kondo, Koji Yasuda, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition (E-MRS 2012 FALL MEETING)  2012.9 

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    Gradual transition of chemical structures at initial growth stage of carbon nanowalls

  • Healing Process of Plasma-damaged Gallium Nitride (GaN)

    Kenji Ishikawa(invite, Shang Chen, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    the 1st International Conference on Emerging Advanced Nanomaterials (ICEAN),  2012.10 

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    Healing Process of Plasma-damaged Gallium Nitride (GaN)

  • High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer

    Tsutsumi Takayoshi, M. Hori, M. Sekine, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito

    The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop)  2012.6 

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    High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer

  • High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer

    Tsutsumi Takayoshi, M. Hori, M. Sekine, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito

    The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop)  2012.6 

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    High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer

  • High performances of microcrystalline Si thin film formation for a solar cell by measurement and control of hydrogen radicals in the SiH4/H2 plasma

    Y. Abe, A. Fukushima, Y. Lu, Y. Kim, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    High performances of microcrystalline Si thin film formation for a solar cell by measurement and control of hydrogen radicals in the SiH4/H2 plasma

  • High-speed synthesis and crystalinity control of nanographene using inliquid plasma in alcohol

    M.Hori, H.Kondo, T.Hagino, K.Ishikawa, K.Takeda, H.Kano, M.Sekine

    XXI Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases  2012.7 

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    High-speed synthesis and crystalinity control of nanographene using inliquid plasma in alcohol

  • Highly Selective Etching of Dielectrics over SiC Film by DC Superposed Dual-Frequency CCP

    T. Komuro, K. Takeda, K. Ishikawa, M. Sekine, Y. Ohya, H. Kondo, M. Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Highly Selective Etching of Dielectrics over SiC Film by DC Superposed Dual-Frequency CCP

  • Highly selective etching of gap-fill dielectrics over SiC and SiN by the dc-bias superposed dual-frequency CCP

    T. Komuro, K. Takeda, K. Ishikawa, M. Sekine, Y. Ohya, H. Kondo, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    Highly selective etching of gap-fill dielectrics over SiC and SiN by the dc-bias superposed dual-frequency CCP

  • Identification of ESR signals arisen from Penicillium digitatum spores-2 International conference

    Hiroko Mizuno, Hiroshi Hashizume, Hiromasa Tanaka, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    2012.9 

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    Identification of ESR signals arisen from Penicillium digitatum spores-2

  • Impact of Last Reactor Condition to Radical Density in Subsequent H2/N2 plasma and its Control International conference

    Toshiya Suzuki, Arkadiusz Malinowski, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yuiti Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

    2012.9 

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    Impact of Last Reactor Condition to Radical Density in Subsequent H2/N2 plasma and its Control

  • In Situ XPS Analysis of ArF Photoresist Modification Caused by Fluorocarbon Ions and Radicals

    T. Takeuchi, S. Amasaki, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

    International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012  2012.9 

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    In Situ XPS Analysis of ArF Photoresist Modification Caused by Fluorocarbon Ions and Radicals

  • Influence of Last Condition in Plasma Reactor on Gaseous Radical Density

    Toshiya Suzuki, Arkadiusz Malinowski, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Influence of Last Condition in Plasma Reactor on Gaseous Radical Density

  • Interface Trap Generation by VUV/UV Radiation from Fluorocarbon Plasma

    M. Fukasawa, Y.Miyawaki, Y. Kondo, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, H. Matsugai, T. Honda, M. Minami, F. Uesawa, M. Hori, T. Tatsumi

    59th AVS International Symposium and Exhibition  2012.10 

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    Interface Trap Generation by VUV/UV Radiation from Fluorocarbon Plasma

  • Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development

    Arkadiusz Malinowski, Makoto Sekine, Masaru Hori, Kenji Ishikawa, Hiroki Kondo, Takuya Takeuchi, Toshiya Suzuki, Andrzej Jakubowski, Lidia Lukasiak

    International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012  2012.9 

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    Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development

  • Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development

    Arkadiusz Malinowski, Makoto Sekine, Masaru Hori, Kenji Ishikawa, Hiroki Kondo, Takuya Takeuchi, Toshiya Suzuki, Andrzej Jakubowski, Lidia Lukasiak

    the International Union of Materials Research Society-International Conference in Asia-2012 (IUMRS-ICA-2012)  2012.8 

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    Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development

  • Investigation of Plasma-Surface Interactions Between Hydrogen Radical and Chemically Amplified Photoresist

    A.Malinowski, M. Sekine, M. Hori, K. Ishikawa, H. Kondo, T. Takeuchi, T. Suzuki, A. Jakubowski, L. Lukasiak, D.Tomaszewski

    59th AVS International Symposium and Exhibition  2012.10 

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    Investigation of Plasma-Surface Interactions Between Hydrogen Radical and Chemically Amplified Photoresist

  • Investigation of modification of ArF photoresist during plasma etching processes

    K.Takeuchi, M.Sekine, K.Ishikawa, H.Kondo, K.Takeda, M.Hori

    14th Annual TECHCON Conference Technology&Talent for the 21st Century  2012.9 

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    Investigation of modification of ArF photoresist during plasma etching processes

  • Low Temperature Deposition and Characteristics of GaN Thin Film by HF-PECVD

    Youn Joon Kim, Yi Lu, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Low Temperature Deposition and Characteristics of GaN Thin Film by HF-PECVD

  • Measurement of SiH3 Radicals in SiH4/H2 Plasma for Silicon Thin-Film Solar Cells International conference

    Yusuke Abe, Atsushi Fukushima, Ya Lu, Youn Joon Kim, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    2012.9 

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  • Measuring Metal Elements in Food Products Using Ar Atmospheric Pressure Plasma International conference

    Jagath Kularatne, Hiroyuki Kano, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    2012.9 

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    Measuring Metal Elements in Food Products Using Ar Atmospheric Pressure Plasma

  • Mechanism and Control of Roughness Formation on ArF Photoresist by C5HF7 Etching Plasma

    Kohei Asano, Yudai Miyawaki, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Azumi Ito, Hirokazu Matsumoto, Hiroki Kondo, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Mechanism and Control of Roughness Formation on ArF Photoresist by C5HF7 Etching Plasma

  • Mechanism of Etching and Generating Active Species in CHxFy Plasma International conference

    Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Masaru Hori

    2012.9 

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    Mechanism of Etching and Generating Active Species in CHxFy Plasma

  • Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis

    Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

    59th AVS International Symposium and Exhibition  2012.10 

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    Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis

  • Mechanism of Generating Ions and Radicals in C3F6O Plasma

    Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M.Sekine, M. Hori

    The 14th International Workshop on Advanced Plasma Processing and Diagnostics, The 2nd Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2012.1 

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    Mechanism of Generating Ions and Radicals in C3F6O Plasma

  • Microcrystal Orientation of Silicon Thin Film Deposited with Hydrogen Radical Injection Plasma Enhanced CVD

    Lu Ya, Astushi Fukushima, Yusuke Abe, Youn J. Kim, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Microcrystal Orientation of Silicon Thin Film Deposited with Hydrogen Radical Injection Plasma Enhanced CVD

  • Modification of ArF Photoresist Caused by Irradiation of Fluorocarbon Plasma-beam

    T. Takeuchi, S. Amasaki, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    The 14th International Workshop on Advanced Plasma Processing and Diagnostics, The 2nd Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2012.1 

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    Modification of ArF Photoresist Caused by Irradiation of Fluorocarbon Plasma-beam

  • Non-Contact Temperature Measurement of Sapphire Substrate for GaN using Frequency Domain Low Coherence Interferometry

    Takayoshi Tsutsumi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Non-Contact Temperature Measurement of Sapphire Substrate for GaN using Frequency Domain Low Coherence Interferometry

  • Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition

    Mineo Hiramatsu, Yuki Nihashi, Hiroki Kondo, Masaru Hori

    The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition (E-MRS 2012 FALL MEETING)  2012.9 

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    Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition

  • Nucleation mechanism of self-organized vertical nano-graphenes grown using inductively coupled plasma enhanced chemical vapor deposition

    R. Tsukada, Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    Nucleation mechanism of self-organized vertical nano-graphenes grown using inductively coupled plasma enhanced chemical vapor deposition

  • Observation of Plasma-Exposed GaN Surface at High Temperature

    Ryosuke Kometani, Shang Chen, Yi Lu, David Cao, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takashi Egawa, Horishi Amano, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Observation of Plasma-Exposed GaN Surface at High Temperature

  • Optical Properties of Carbon Nano Walls in Terahertz Frequencies Region

    Takehiro Hiraoka, Keigo Takeda, Takayuki Ohta, Noboru Ebitsuka, Hiroki Kondo, Kenji Ishikawa, Kodo Kawase, Masafumi Ito, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Optical Properties of Carbon Nano Walls in Terahertz Frequencies Region

  • Photon-stimulated surface reaction and generation of damage to hydrogenated silicon nitride in fluorocarbon plasma

    M. Fukasawa, H. Matsugai, T. Honda, Y. Miyawaki, Y. Kondo, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, K. Nagahata, F. Uesawa, M. Hori, T. Tatsumi

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    Photon-stimulated surface reaction and generation of damage to hydrogenated silicon nitride in fluorocarbon plasma

  • Plasma surface modification of carbon nanowalls for biosensor application

    M. Nagashima, T. Maeda, M. Hiramatsu, H. Watanabe, H. Kondo, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    Plasma surface modification of carbon nanowalls for biosensor application

  • Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ Electron Spin Resonance Measurements

    K. Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Taked, H. Kondo, M. Sekine, M. Hori

    34th International Symposium on Dry Process (DPS2012)  2012.11 

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    Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ Electron Spin Resonance Measurements

  • Properties of GaAs surface by ion irradiation of chlorine International conference

    Jongyun Park, Takuya Takeuchi, Jiadong Cao, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    2012.9 

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    Properties of GaAs surface by ion irradiation of chlorine

  • Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas

    Kondo yusuke, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, Masaru Hori

    The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop)  2012.6 

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    Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas

  • Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas

    Kondo yusuke, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, Masaru Hori

    The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop)  2012.6 

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    Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas

  • Real time in situ Electron Spin Resonance (ESR) study of Surface Reaction on Polymer Interacted with Plasma

    Masaru Hori, Kenji Ishikawa, Naoya Sumi, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Akihiko Kono, Hideo Horibe

    International Conference on Plasma Science  2012.7 

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    Real time in situ Electron Spin Resonance (ESR) study of Surface Reaction on Polymer Interacted with Plasma

  • Real-time / In-situ Electron Spin Resonance Analysis of Surface Reactions on Organic / Biological Materials Interacted with Plasmas

    K. Ishikawa, H. Moriyama, N. Sumi, K. Tamiya, H. Hashizume, T. Ohta, M. Ito, A. Kono, H. Horibe, H. Tanaka, K. Takeda, H. Kondo, M. Sekine, M. Hori

    International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012  2012.9 

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    Real-time / In-situ Electron Spin Resonance Analysis of Surface Reactions on Organic / Biological Materials Interacted with Plasmas

  • Reconsideration on Effects of H Radicals on Thin Film Surfaces in Plasma Enhanced Chemical Vapor Deposition employing SiH4/H2 Gases

    Masaru Hori, Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Young Joon Kim, Makoto Sekine

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Reconsideration on Effects of H Radicals on Thin Film Surfaces in Plasma Enhanced Chemical Vapor Deposition employing SiH4/H2 Gases

  • Recovery of Plasma-Damaged GaN by Employing Exposure of Radicals

    Z. Liu, S. Chen, Y. Lu, R. Kometani, K. Ishikawa, Hiroyuki Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, M. Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Recovery of Plasma-Damaged GaN by Employing Exposure of Radicals

  • Relationship between Ion Energy and Highly Selective SiO2 Etching Characteristics using C5HF7 Gas International conference

    Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Ishikawa Kenji, Azumi Ito, Hirikazu Matsumoto, Makoto Sekine, Masaru Hori

    2012.9 

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    Relationship between Ion Energy and Highly Selective SiO2 Etching Characteristics using C5HF7 Gas

  • Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma (NEAPP)

    S. Iseki, K. Nakamura, M. Hayashi, H. Tanaka, H. Kondo, H. Kajiyama, H. Kano, F. Kikkawa, M. Hori

    4th International Conference on Plasma Medicine  2012.6 

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    Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma (NEAPP)

  • Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma, WW-2.4

    H. Tanaka, S. Iseki, K. Nakamura, M. Hayashi, H. Kondo, H. Kajiyama, H. Kano, F. Kikkawa, M.Hori

    2012 MRS Spring Meeting & Exhibit, Moscone West California  2012.4 

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    Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma, WW-2.4

  • Selective killing of ovarian cancer cells through induction of apoptosis by a nonequilibrium atmospheric pressure plasma

    Tanaka H

    Materials Research Society Symposium Proceedings  2012.12 

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    Selective killing of ovarian cancer cells through induction of apoptosis by a nonequilibrium atmospheric pressure plasma

  • Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

    Tanaka Hiromasa, Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

    The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop)  2012.6 

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    Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

  • Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

    Tanaka Hiromasa, Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

    The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop)  2012.6 

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    Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

  • SiH4/H2プラズマ化学気相堆積法におけるHラジカル・成膜前駆体フラックス比とシリコン薄膜膜質の関係性 International conference

    福島敦史, 阿部祐介, 竹田圭吾, 近藤博基, 石川健治, 関根 誠, 堀 勝, 陸 雅

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

    Puurunen R

    Sensors and Actuators, A: Physical  2012.12 

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    Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

  • Spectroscopic Determination of Radical Densities in SiH4/H2 Plasma

    Yusuke Abe, Atsushi Fukushima, Ya Lu, Youn Joon Kim, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Spectroscopic Determination of Radical Densities in SiH4/H2 Plasma

  • Studies on Plasma Etching of Si3N4 Employing New Alternative Gas, C5HF7

    Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Azumi Ito, Hirokazu Matsumoto, M. Sekine, M. Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Studies on Plasma Etching of Si3N4 Employing New Alternative Gas, C5HF7

  • Study on reaction mechanism of plasma-enhanced atomic layer deposition of SiO2 using in-situ ATR-FTIR International conference

    Yi Lu, Akiko Kobayashi, Youn Joon Kim, Kenji Ishikawa, Hiroki Kond, Makoto Sekine, Masaru Hori

    2012.9 

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    Study on reaction mechanism of plasma-enhanced atomic layer deposition of SiO2 using in-situ ATR-FTIR

  • Study on synthesis mechanisms of nano-graphene materials employing alcohol in-liquid plasma International conference

    2012.9 

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    Study on synthesis mechanisms of nano-graphene materials employing alcohol in-liquid plasma

  • Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes

    T. Suzuki, A. Malinowski, K. Takeda, H. Kondo, K. Ishikawa, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori

    59th AVS International Symposium and Exhibition  2012.10 

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    Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes

  • Surface Roughness on Plasma-Etched Gallium Nitride (GaN)

    Kenji Ishiwaka, Ryosuke Kometani, Shang Chen, Yi Lu, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012  2012.9 

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    Surface Roughness on Plasma-Etched Gallium Nitride (GaN)

  • Temperature measurement of substrate with a thin film using low-coherence interference

    Takayoshi Tsutsumi, Takehiro Hiraoka, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

    65th Annual Gaseous Electronics Conference  2012.10 

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    Temperature measurement of substrate with a thin film using low-coherence interference

  • The Formation of the Insulating Film with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition by Hexamethyldisiloxan Mist

    Kuangda Sun, Keigo Takeda, Hiroki Kondo, Satomi Tajima, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Hitoshi Itoh

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    The Formation of the Insulating Film with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition by Hexamethyldisiloxan Mist

  • Two-Step Supporting of High-Density Metal Nanoparticle Catalysts on Carbon Nanowalls using Supercritical Fluid

    Takeyoshi Horibe, Hiroki Kondo, Hiroyuki Kano, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)  2012.10 

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    Two-Step Supporting of High-Density Metal Nanoparticle Catalysts on Carbon Nanowalls using Supercritical Fluid

  • Vibrational Sum-Frequency-Generation (SFG))Spectroscopic study-2 International conference

    Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    2012.9 

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    Vibrational Sum-Frequency-Generation (SFG))Spectroscopic study-2

  • 「講演奨励賞受賞記念講演」有機材料エッチングによる電界電子放出ナノピラーの作成(II) International conference

    Arkadiusz Malinowski, 竹田圭吾, 近藤博基, 石川健治, 節原裕一, 白谷正治, 関根 誠, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • カーボンナノウォールのテラヘルツ時間領域分光計測による光学特性評価 International conference

    平岡丈弘, 竹田圭吾, 太田貴之, 海老塚昇, 近藤博基, 石川健治, 伊藤昌文, 川瀬晃道, 関根 誠, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • カーボンナノウォールの結晶構造に対するラジカル酸化効果 International conference

    下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根 誠, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • プラズマからの紫外線照射によるSiNx:H/Si界面準位生成 International conference

    深沢正永, 松谷弘康, 本多孝好, 宮脇雄大, 近藤祐介, 竹田圭吾, 近藤博基, 石川健治, 関根 誠, 南 正樹, 上澤史且, 堀 勝, 辰巳哲也

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の膜構造に対するパルスバイアス印加効果 International conference

    九鬼 淳, 于 楽泳, 近藤博基, 関根 誠, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • プリンタブルエレクトロニクスに向けた大気圧ミスト化学気相堆積技術の構築 International conference

    孫 昿達, 竹田圭吾, 近藤博基, 田嶋聡美, 石川健治, 関根 誠, 堀 勝, 伊藤 仁

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 二周波容量結合型プラズマへのDCバイアス重畳によるSiC膜に対する高選択比絶縁膜エッチング International conference

    古室達也, 竹田圭吾, 石川健治, 関根 誠, 大矢欣伸, 近藤博基, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 次世代天文学観測装置用の新しい回折格子 International conference

    海老塚 昇, 佐々木 実, 青木 和光, Andrea Bianco

    第37回 光学シンポジウム  2012.6 

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    Venue:東京大学 生産技術研究所 An棟 コンベンションホール   Country:Other  

  • 水素ラジカル注入型プラズマ源を用いた微結晶シリコン成膜のRFパワーによる膜質変化 International conference

    陸 雅, 福島敦史, 阿部祐介, 金 淵俊, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 窒化ガリウム(GaN)向けサファイア基板の周波数領域型低コヒーレンス干渉計による温度計 International conference

    堤 隆嘉, 竹田圭吾, 石川健治, 近藤博基, 太田貴之, 伊藤昌文, 関根 誠, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 窒素/水素混合ガスプラズマを用いたグラフェンエッジ化学修飾によるカーボンナノウォールの電気的特性制御 International conference

    趙 亨峻, 近藤博基, 石川健治, 関根 誠, 平松美根男, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 細胞培養に対するカーボンナノウォール足場の効果 International conference

    渡邊 均, 近藤博基, 岡本行広, 関根 誠, 平松美根男, 堀 勝, 馬場嘉信

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 超臨界流体を用いたカーボンナノウォール(CNWs)へのPt, Au微粒子の2段階担持における微粒子相互作用 International conference

    堀部剛良, 近藤博基, 加納浩之, 石川健治, 関根 誠, 平松美根男, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 高温における窒化ガリウム(GaN)のエッチング機構(3) International conference

    米谷亮祐, 陳 尚, 曹 佳棟, Michael Liu, 石川健冶, 竹田圭吾, 近藤博基, 関根 誠, 江川孝志, 天野 浩, 堀 勝

    平成24年秋季第73回応用物理学会学術講演会  2012.9 

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    Venue:愛媛大学城北地区・松山大学文京キャンパス   Country:Other  

  • 10 GHzマイクロ波スロット励起大気圧プラズマにおけるプラズマ生成と活性種の挙動に関する研究 International conference

    加藤正規, 竹田圭吾, 石川健治, 近藤博基, 関根 誠, 堀 勝, 三好秀典, 久保田雄介, 伊藤 仁

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • Advanced Plasma Nanotechnology fir Control Synthesis and Biomedical Applications of Carbon Nanomaterials

    HirokiKondo(Invite

    NanoMedicine-2011  2011.11 

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    Advanced Plasma Nanotechnology fir Control Synthesis and Biomedical Applications of Carbon Nanomaterials

  • Affection of Hydrophilic and Hydrophobic of Carbon Nanowalla Using Plasma Surface Trearment

    H.Watanabe, K.Takeda, H.Kondo, M.Hiramatsu, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials,  2011.3 

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    Affection of Hydrophilic and Hydrophobic of Carbon Nanowalla Using Plasma Surface Trearment

  • Ar Flow Rate Dependence of Emission Intensity of Metal Atoms in Atmospheric Pressure Atomization Plasma International conference

    2011.8 

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    Ar Flow Rate Dependence of Emission Intensity of Metal Atoms in Atmospheric Pressure Atomization Plasma

  • Area-selective of Carbon Nanowalls by Using Catalyzed Substrate

    Y.Nihashi, M.Hiramatsu, H.Kondo, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Area-selective of Carbon Nanowalls by Using Catalyzed Substrate

  • Atom Behaivior of Ultrahigh Density 60 Hz Atmospheric Pressure Plasma under Ar ambient Conditions International conference

    F.Jia, K.Takeda, K.Ishikawa, H.Kano.H.Kondo, M.sekine, M.Hori

    2011.10 

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    Atom Behaivior of Ultrahigh Density 60 Hz Atmospheric Pressure Plasma under Ar ambient Conditions

  • Behavior of radicals in SiH4/H2 plasma for fabrication of solar cell using silicon thin film

    Y.Abe,A.Fukushima, Y.Lu, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    64thAnnualGaseouselectronicsConference  2011.11 

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    Behavior of radicals in SiH4/H2 plasma for fabrication of solar cell using silicon thin film

  • C3F6/O2プラズマ中のイオン・ラジカルの生成機構 International conference

    近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 林俊雄, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • C3F6O代替ガスを用いた絶縁膜の高速エッチングとその機構解明(II) International conference

    近藤祐介, 宮脇雄大, 竹田圭吾, 石川健治, 近藤博基, 林俊雄, 関根誠, 岡本秀一, 堀勝

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Venue:神奈川工科大学   Country:Other  

  • C5HF7 Chemistry for Highly Selective Etch of SiO2 over Si

    Y.Miyawaki, Y.Kondo, H.yamamoto, K.Takeda, K.Ishikawa, A.yamazaki, A.Ito, H.Matsumoto, M.sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    C5HF7 Chemistry for Highly Selective Etch of SiO2 over Si

  • C5HF7/O2/ArプラズマによるArfレジスト表面ラフネス発生抑制機構 (II) International conference

    浅野高平, 山本 洋, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 関根 誠, 堀 勝, 山崎敦代, 伊藤安曇, 松本裕一

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • CH4/H2プラズマを用いて成長したカーボンナノウォールの結晶構造及び電気的特徴 International conference

    趙 亨峻, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

    2011.11 

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    Venue:石川県立音楽堂   Country:Other  

  • CH4/H2プラズマを用いて成長したカーボンナノウォールにおける電気伝導度の温度依存性 International conference

    趙亨峻, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

    応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム  2011.10 

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    Venue:名古屋大学   Country:Other  

  • CH4/H2プラズマを用いて成長したカーボンナノウォールにおける電気的特性 International conference

    趙 亨峻, 竹田圭吾, 近藤博基, 石川健治, 関根 誠, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • Carbon nanowalls: growth mechanism and nucleation control

    Invited, M. Hiramatsu, H. Kondo, M. Hori

    International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2011)  2011.8 

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    Carbon nanowalls: growth mechanism and nucleation control

  • Carbon nanowalls:synthesis and application

    Mineo Hiramatsu, Hiroki Kondo, Masaru Hori(Invited

    4th International conference on advanced plasma technologies,  2011.9 

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    Carbon nanowalls:synthesis and application

  • Chemical Modeling of Etch Process Using C3F6O Alternative Gas

    Y. Kondo, Y. Miyawaki, K. Takeda, K. Ishikawa, H. Kondo, T. Hayashi, H. Okamoto, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Chemical Modeling of Etch Process Using C3F6O Alternative Gas

  • Chemical Modeling of Etch Process Using C3F6O Alternative Gas

    Y. Kondo, Y. Miyawaki, K. Takeda, K. Ishikawa, H. Kondo, T. Hayashi, H. Okamoto, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Chemical Modeling of Etch Process Using C3F6O Alternative Gas

  • Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy International conference

    K. Yasuda, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori

    2011.7 

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    Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy

  • Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy International conference

    K. Yasuda, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori

    2011.7 

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    Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy

  • Control of Bridging Growth and Electrical properties of Single Carbon Nanowalls

    T. Kanda, H. Kondo, K. Yamakawa, M. Hiramatsu, K. Takeda, K. Ishikawa, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science,  2011.3 

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    Control of Bridging Growth and Electrical properties of Single Carbon Nanowalls

  • Controlled Synthesis of Carbon Nanowalls and their Characterization Employing Synchrotron X-ray

    HirokiKondo

    BIT's1stAnnual World Congress of Nano-S&T,  2011.10 

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    Controlled Synthesis of Carbon Nanowalls and their Characterization Employing Synchrotron X-ray

  • Controlled Synthesis of Carbon Nanowalls for Functional Device Applications

    Hiroki Kondo, Masaru Hori, Makoto Sekine, Mineo Hiramatsu(Invited

    4th International conference on advanced plasma technologies,  2011.9 

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    Controlled Synthesis of Carbon Nanowalls for Functional Device Applications

  • Crystallinity Control of Microcrystalline Silicon film Employing Hydrogen Radical-injection Plasma-enhanced Chemical Vapor Deposition

    S.Kawashima, Y.Abe, K.Takeda, K.ishikawa, H.Kondo, M.sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Crystallinity Control of Microcrystalline Silicon film Employing Hydrogen Radical-injection Plasma-enhanced Chemical Vapor Deposition

  • Crystallographic Analysis of Amorphous Carbon Films Synthesized by Radical-injection Plasma-enhanced Chemical Vapor Deposition International conference

    L.Yu,J.Kuki, K.Takeda, H.Kondo, K.ishikawa, M.Sekine, M.Hori

    2011.10 

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    Crystallographic Analysis of Amorphous Carbon Films Synthesized by Radical-injection Plasma-enhanced Chemical Vapor Deposition

  • Crystallographic and Electrical Properties of Semiconducting Graphene Nanoribbon Grown Employing CH4/H2 plasma

    H.J.Cho, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    2011SSDM  2011.9 

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    Crystallographic and Electrical Properties of Semiconducting Graphene Nanoribbon Grown Employing CH4/H2 plasma

  • DCバイアス重畳二周波容量結合型プラズマの電子密度空間分布計測 International conference

    古室達也, 竹田圭吾, 石川健治, 関根 誠, 大矢欣伸, 近藤博基, 堀 勝

    第72回応用物理学会学術講演会  2011.8 

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    Venue:山形大学   Country:Other  

  • Deep Level Defect in GaN after Plasma Beam Etching

    S.Chen,R.Kometani, K.Ishikawa, H.Kondo, K.Takeda, H.Kano, Y.Tokuda, M.sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Deep Level Defect in GaN after Plasma Beam Etching

  • Determination of C Atom Density in Microwave Plasma with Carbon-Containing Gases by Vacuum Ultraviolet Absorption Spectroscopy

    K.Murata, M.Naito, M.Hiramatsu, S.Takashima, H.Kondo, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Determination of C Atom Density in Microwave Plasma with Carbon-Containing Gases by Vacuum Ultraviolet Absorption Spectroscopy

  • Development of radical kinetic behaivour investigation method and its application for sticking coefficient estimation

    A.Malinowski, M.Hori, M.Sekine, K.Ishikawa, H.Kondo, K.Takeda

    ESSDERC2011  2011.9 

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    Development of radical kinetic behaivour investigation method and its application for sticking coefficient estimation

  • Diagnostics and Surface Reaction Analysis on RF Sputtering Process for Co Nanoparticles Formation

    I-S Bae, K. Kuno, M. Ito, H. Kondo, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science,  2011.3 

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    Diagnostics and Surface Reaction Analysis on RF Sputtering Process for Co Nanoparticles Formation

  • Effect of Hydrogen Radical Injection on Growth Property and Crystallinity of Microcrystalline Silicon Thin Film

    Y.Abe,A.Fukushima, Y.Lu, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    2011SSDM  2011.9 

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    Effect of Hydrogen Radical Injection on Growth Property and Crystallinity of Microcrystalline Silicon Thin Film

  • Effects of Argon Flow Rate on the Atomic Emission Process of Cu Solution in Atmospheric Pressure Plasma

    J.Kularatne, H.Kano, M.Ito, T.Ohta, K.Takeda, H.Kondo, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Effects of Argon Flow Rate on the Atomic Emission Process of Cu Solution in Atmospheric Pressure Plasma

  • Effects of Oxgen Radical Irradiation on Crystalline Structures of Carbon Nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Hiramatsu Mineo, Makoto Sekine, Masaru Hori

    the 13 th international workshop on Advanced Plasma Processing and Diagnostics  2011.7 

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    Effects of Oxgen Radical Irradiation on Crystalline Structures of Carbon Nanowalls

  • Effects of RF Bias on Structural Properties of Amorphous Carbon Films Grown by Plasma-Enhanced Chemical Vapor Deposition

    J.Kuki, L.Yu.H.Kondo, K.Ishikawa, M.Sekine, M.Hori

    ICTF-15  2011.11 

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    Effects of RF Bias on Structural Properties of Amorphous Carbon Films Grown by Plasma-Enhanced Chemical Vapor Deposition

  • Effects of Substrate Temperatures on Crystallographic Changes of Carbon Nanowalls Induced by radical Irradiation

    H.Shimoeda, H.Kondo, K.Taakeda, K.Ishikawa, M.Hiramatsu, M.Sekine, M.Hori

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Effects of Substrate Temperatures on Crystallographic Changes of Carbon Nanowalls Induced by radical Irradiation

  • Electric and Crystallographic Structures of Carbon Nanowalls

    HirokiKondo,HyungJunCho, TakayukiKanda, MasaruHori,MineoHiramatsu

    2011MRS Fall Meeting  2011.11 

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    Electric and Crystallographic Structures of Carbon Nanowalls

  • Electrical and Chemical Structures of Nanographene Nucleated at Initial Growth Processes of Carbon Nanowalls

    K. Yasuda, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori

    The 4th International Conference on PLAsma-Nano Technology & Science  2011.3 

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    Electrical and Chemical Structures of Nanographene Nucleated at Initial Growth Processes of Carbon Nanowalls

  • Effect of Gas Flow Rate on Crystalline Structures of Amorphous Carbon Films Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition, 05pP34

    D. Xu, L. Jia, M. Nakamura, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Effect of Gas Flow Rate on Crystalline Structures of Amorphous Carbon Films Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition, 05pP34

  • Real-time control of a wafer temperature for uniform plasma process

    Tsutsumi T

    IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings  2019.2 

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    Real-time control of a wafer temperature for uniform plasma process

  • Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

    Ueyama T

    Japanese Journal of Applied Physics  2017.6 

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    Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

  • Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 °c

    2017.6 

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  • Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

    Tomatsu M

    Japanese Journal of Applied Physics  2017.6 

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    Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

  • Electrocatalytic Characteristic of Pt Nanoparticles-Supported Carbon Nanowalls for Fuel Cell Applications

    Hiroki Kondo

    2015 MRS Spring Meeting & Exhibit  2015.4 

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  • Electrocatalytic Property and Durability of Pt Nanoparticles-Supported Nanographene Synthesized by In-Liquid Plasma

    Hiroki Kondo

    2015 MRS Spring Meeting and Exhibit  2015.4 

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  • High-density nitrogen plasma source for growing high In content InGaN by plasma-assisted MBE

    Hiroki Kondo, Masaru Hori, Hirosi Amano, Nagoya Univ

    CONFERENCE 9363  2015.2 

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    High-density nitrogen plasma source for growing high In content InGaN by plasma-assisted MBE

  • Selective and oriented growth of carbon nanowalls by plasma-enhanced chemical vapor deposition

    H.Kondo

    The 75th IUVSTA Workshop on Sheath Phenomena in Plasma Processing of Advanced Materials(19th-23rd 2015,Slovenia)  2015.1 

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    Selective and oriented growth of carbon nanowalls by plasma-enhanced chemical vapor deposition

  • カーボンナノウォールの構造制御とナノバイオ応用 International conference

    近藤博基, 堀勝, 平松美根男, 名古屋大学大学院工学研究科付属プラズマナノ工学研究センター, 名城大学理工

    仙台“プラズマフォーラム’’  2015.2 

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    Language:Japanese  

    Venue:東北大学 大学院工学研究科 電子情報システム・応物系 1号館別館 451・453会議室   Country:Other  

  • ラジカル励起MOCVD法によるGaNホモエピタキシャル成長に関する研究 International conference

    岩本一希, 盧翌, 小田修, 近藤博基, 石川健治, 関根誠, 勝

    ゲートスタック研究会ー材料・プロセス・評価の物理ー (第20回)  2015.1 

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    Venue:東レ研修センター   Country:Other  

  • 半導体ディバイス・プロセスの信頼性工学 International conference

    近藤博基

    第10回日本安全学教育研究会  2015.8 

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  • 地域イノベーションプラットフォーム概略紹介 International conference

    近藤博基

    大気圧プラズマによる超高速・超機能化異種材料接合オープンプラットフォーム  2015.1 

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  • 次世代窒化ガリウム系デバイスのためのラジカル励起MOCVDによるGaN-ヘテロエピタキシャル成長に関する研究 International conference

    盧翌, 岩本一希, 小田修, 石川健治, 近藤博基, 関根誠, 勝

    ゲートスタック研究会ー材料・プロセス・評価の物理ー (第20回)  2015.1 

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    Venue:東レ研修センター   Country:Other  

  • A high temperature etching of GaN employing CH4/H2 gases, 06aP02

    T. Kako, Z. Liu, K. Ishikawa, K. Takeda, H. Kondo, O. Oda, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    A high temperature etching of GaN employing CH4/H2 gases, 06aP02

  • AC 励起大気圧非平衡 Ar プラズマ生成における 大気ガス巻込みの影響 International conference

    梁 思潔, 竹田 圭吾, 近藤 博基, 加納 浩之, 石川 健治, 関根 誠, 堀 勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • AC励起アルコール液中プラズマにおけるナノグラフェン合成機構の解析 International conference

    安藤 睦, 小島 和晃, 竹田 圭吾, 近藤 博基, 石川 健治, 関根 誠, 太田 貴之, 伊藤 昌文, 平松 美根男, 加納 浩之, 堀 勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • Advanced plasma-nano processes for controls of crystallographic and electrical properties of carbon nanomaterials

    Hiroki Kondo

    The International Symposium on Plasma-Nano Materials and Processes  2014.4 

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    Advanced plasma-nano processes for controls of crystallographic and electrical properties of carbon nanomaterials

  • Anisotropic etching and structural modification of carbon nanowalls by oxygen-related radicals

    HIROKI KONDO, Hironao Shimoeda, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    14th International Conference on Plasma Surface Engineering  2014.9 

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    Anisotropic etching and structural modification of carbon nanowalls by oxygen-related radicals

  • Behaviors of activated species in SiH4/H2 plasma for µc-Si:H thin film deposition

    2014.2 

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    Venue:Fukuoka, Japan   Country:Other  

  • Biosensing properties of carbon nanowalls grown using plasma enhanced CVD, 03pP51LN

    M. Tomatsu, R. Tsukada, M. Nagashima, M. Hiramastu, H. Kondo, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Biosensing properties of carbon nanowalls grown using plasma enhanced CVD, 03pP51LN

  • CH4/H2プラズマによるGaNの高温エッチング International conference

    加古隆, 劉沢セイ, 石川健治, 小田修, 竹田圭吾, 近藤博基, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • CHxFyプラズマにおける活性種生成過程とエッチング機構の解明(IV) International conference

    近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 田嶋聡美, 石川健治, 林俊雄, 関根誠,堀勝

    第61回応用物理学会春季学術講演会  2014.3 

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    Venue:青山学院大学相模原キャンパス   Country:Other  

  • Carbon nanowalls: plasma synthesis and applications, 3C-WS-07

    M. Hiramatsu, H. Kondo, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Carbon nanowalls: plasma synthesis and applications, 3C-WS-07

  • Charactaristics of AC excited Non-equilibrium Atomospheric Pressure Helium Plasma Jet for Medical Application

    K. Takeda, T. Kumakura, K. Ishikawa, H. Tanaka, H. Kondo, H. Kano, Y. Nakai, M. Sekine, M. Hori

    5th International Conference on Plasma Medicine  2014.5 

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    Charactaristics of AC excited Non-equilibrium Atomospheric Pressure Helium Plasma Jet for Medical Application

  • Chemical analyses of edible meat irradiated atmospherics-pressure-plasmas, 5A-PM-01

    K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

    8th International Conference on Reactive Plasmas  2014.2 

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    Chemical analyses of edible meat irradiated atmospherics-pressure-plasmas, 5A-PM-01

  • Chemical analysis of plasma-activated-medium for understanding mechanism of its antitumor effect

    Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Fumiaki Kikkawa, Takashi Kondo, Masaaki Mizuno, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2014.7 

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    Chemical analysis of plasma-activated-medium for understanding mechanism of its antitumor effect

  • Control of Edge and Surface Oxidation of Carbon Nanowalls by Argon Ion Irradiation, 03pD08O

    H. Shimoeda, H. Kondo, K. Takeda, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Control of Edge and Surface Oxidation of Carbon Nanowalls by Argon Ion Irradiation, 03pD08O

  • Controlled Synthesis of Carbon Nanomaterials Employing Plasma-Enhanced Chemical Vapor Deposition for Future Green Energy Applications

    Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

    IUMRS-ICA 2014  2014.8 

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    Controlled Synthesis of Carbon Nanomaterials Employing Plasma-Enhanced Chemical Vapor Deposition for Future Green Energy Applications

  • Controlled synthesis and electrocatalytic characteristics of Pt nanoparticles-supported nanographene synthesized by in-liquid plasma

    Hiroki Kondo, Tomoki Amano, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Mineo Hiramatsu

    67th Annual Gaseous Electronics Conference  2014.11 

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    Controlled synthesis and electrocatalytic characteristics of Pt nanoparticles-supported nanographene synthesized by in-liquid plasma

  • Dawning of Plasma Life Sciences ~ Diagnostics and Control of Reactive Species in Plasma Bio Processing ~

    Masaru Hori, Masahiro Tanaka, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Fumitaka Kikkawa, Kae Nakamura, Hiroaki Kajiyama, Masaaki Mizuno, Hiroyuki Ohta, Masafumi Ito, Hiroyuki Kano

    The 4th International Symposium for Plasma Biosciences (ISPB 2014)  2014.8 

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    Dawning of Plasma Life Sciences ~ Diagnostics and Control of Reactive Species in Plasma Bio Processing ~

  • Diagnostic studies for synthesis of Al doped ZnO film by magnetron sputtering

    Jun Suck Lee, JayBum Kim, Su B. Jin, B.B. Sahu, Jeon G. Han, H. Kondo, M. Hori

    14th International Conference on Plasma Surface Engineering  2014.9 

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    Diagnostic studies for synthesis of Al doped ZnO film by magnetron sputtering

  • Diagnostics of Non-equilibrium Atmospheric Pressure Plasma for Agricultural Applications

    Takumi Kumakura, Keigo Takeda, Kenji Ishikawa, Hiromasa Tanaka, Hiroki Kondo, Hiroyuki Kano, Yoshihiro Nakai, Makoto Sekine, Masaru Hori

    19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2014.7 

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    Diagnostics of Non-equilibrium Atmospheric Pressure Plasma for Agricultural Applications

  • Diagnostics of SiH4/H2 Plasma and Surface Reaction in Microcrystalline Silicon Deposition

    Kenji Ishikawa, Yusuke Abe, Atsushi Fukushima, Ya Lu, Sho Kawashima, Keita Miwa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    The International Conference on Metallurgical Coatings and Thin Films (ICMCTF)  2014.4 

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    Diagnostics of SiH4/H2 Plasma and Surface Reaction in Microcrystalline Silicon Deposition

  • Effect of Ambient Air Engulfment on Generation of Activated Species in 60 Hz Non-Equilibrium Atmospheric Pressure Ar Plasma Jet (Poster), 03pP15

    S. Liang, T. Tsutsumi, A. Ando, K. Sun, K. Takeda, H. Kondo, K. Ishikawa, H. Kano, M. Sekine, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Effect of Ambient Air Engulfment on Generation of Activated Species in 60 Hz Non-Equilibrium Atmospheric Pressure Ar Plasma Jet (Poster), 03pP15

  • Effect of Ar flow rate on the synthesis of nanographene produced from in-liquid plasma, 06aP12

    J. Jolibois, J. Kularatne, H. Kondo, M. Ito, H. Kano, K. Ishikawa, M. Hiramatsu, M. Hori

    6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2014.3 

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    Effect of Ar flow rate on the synthesis of nanographene produced from in-liquid plasma, 06aP12

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MISC

  • Surface potential control of carbon nanowalls template for highly efficient exosome analysis

    橋本拓海, 近藤博基, 田中宏昌, 石川健治, 堤隆嘉, 関根誠, 安井隆雄, 馬場嘉信, 平松美根男, 堀勝

    応用物理学会春季学術講演会講演予稿集(CD-ROM)   69th   2022   ISSN:2436-7613

  • 大気圧プラズマ処理による異種材料接合

    近藤博基, 堤隆嘉, 石川健治, 関根 誠, 堀 勝

    化学工学(公益社団法人 化学工学会)   2018.9

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  • Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma Reviewed

    Zecheng Liu, Kenji Ishikawa, Masato Imamura, Takayoshi Tsutsumi, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   2018.6

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    DOI: 10.7567/JJAP.57.06JD01

  • Effects of gas residence time of CH4/H2 on sp2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition Reviewed

    Hirotsugu Sugiura, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   2018.6

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    DOI: 10.7567/JJAP.57.06JE03

  • Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes Reviewed

    Atsushi Ando, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Tomoko Suzuki, Sakae Inoue, Yoshinori Ando, Masaru Hori

    Japanese Journal of Applied Physics   2018.6

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    DOI: 10.7567/JJAP.57.06JF01

  • Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine

    Tomoki Amano, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   2018.4

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    DOI: 10.7567/JJAP.57.040303

  • Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells

    Tomoki Amano, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   2018.4

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    DOI: 10.7567/JJAP.57.045101

  • Similarities And Differences In The Cellular Resposnses Between Plasma-Activated Medium-Treated Glioblastomas And Plasma-Activated Ringer's Lactate Solution-Treated Glioblastomas Reviewed

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Hiroshi Hashizume, Kae Nakamura, Hiroaki Kajiyama, Yasumasa Okazaki, Shinya Toyokuni, Shinichi Akiyama, Shoichi Maruyama, Fumitaka Kikkawa, Masaru Hori

    Clinical Plasma Medicine   2018.2

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    Similarities And Differences In The Cellular Resposnses Between Plasma-Activated Medium-Treated Glioblastomas And Plasma-Activated Ringer's Lactate Solution-Treated Glioblastomas

    DOI: 10.1016/j.cpme.2017.12.066

  • Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons

    Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   2018.2

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    DOI: 10.7567/JJAP.57.026201

  • Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol

    Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    Applied Physics Express   2018.1

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    DOI: 10.7567/APEX.11.015102

  • Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy

    Timothy R. Brubaker, Kenji Ishikawa, Keigo Takeda, Jun-Seok Oh, Hiroki Kondo, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilen, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   2017.12

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    DOI: 10.1063/1.4999256

  • Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

    Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   2017.11

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    DOI: 10.1116/1.4994218

  • Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium

    Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

    PLASMA PROCESSES AND POLYMERS   2017.11

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    DOI: 10.1002/ppap.201700123

  • High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition

    Shun Imai, Hiroki Kondo, Hyungjun Cho, Hiroyuki Kano, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masafumi Ito, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   2017.10

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    DOI: 10.1088/1361-6463/aa8131

  • Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy

    Ryo Furuta, Naoyuki Kurake, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

    BIOINTERPHASES   2017.9

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    DOI: 10.1116/1.4997170

  • Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

    Zecheng Liu, Masato Imamura, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   2017.8

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    DOI: 10.7567/APEX.10.086502

  • Temperature dependence of protection layer formation on organic trench sidewall in H-2/N-2 plasma etching with control of substrate temperature

    Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2017.7

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    DOI: 10.7567/JJAP.56.076202

  • Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy

    Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

    PHYSICAL CHEMISTRY CHEMICAL PHYSICS   2017.6

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    DOI: 10.1039/c7cp00489c

  • Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

    Toshinari Ueyama, Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Manabu Iwata, Yoshinobu Ohya, Hideo Sugai, Masaru Hori

    Japanese Journal of Applied Physics   2017.6

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    DOI: 10.7567/JJAP.56.06HC03

  • Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 degrees C

    Shinnosuke Takai, Yi Lu, Osamu Oda, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2017.6

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    DOI: 10.7567/JJAP.56.06HE08

  • Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

    Masakazu Tomatsu, Mineo Hiramatsu, John S. Foord, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Masaru Hori

    Japanese Journal of Applied Physics   2017.6

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    DOI: 10.7567/JJAP.56.06HF03

  • 電子スピン共鳴法を活用したプラズマバイオ反応プロセスの診断

    石川健治, 近藤隆, 竹田圭吾, 呉準席, 橋爪博司, 田中宏昌, 近藤博基, 太田貴之, 伊藤昌文, 関根誠 堀勝

    プラズマ・核融合学会誌   2017.5

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  • Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas

    Yoshinobu Ohya, Kenji Ishikawa, Tatsuya Komuro, Tsuyoshi Yamaguchi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   2017.3

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    DOI: 10.1088/1361-6463/aa60f7

  • Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes

    Atsushi Ando, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Tomoko Suzuki, Sakae Inoue, Yoshinori Ando, Masaru Hori

    Japanese Journal of Applied Physics   2017.3

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    DOI: 10.7567/JJAP.56.035101

  • Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl2 plasma etching of GaN

    Zecheng Liu, Jialin Pan, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

    Japanese Journal of Applied Physics   2017.2

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    DOI: 10.7567/JJAP.56.026502

  • Atomic layer etching of SiO2 by alternating an O-2 plasma with fluorocarbon film deposition

    Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   2017.1

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    DOI: 10.1116/1.4971171

  • Absolute density of precursor SiH3 radicals and H atoms in H-2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

    Yusuke Abe, Kenji Ishikawa, Keigo Takeda, Takayoshi Tsutsumi, Atsushi Fukushima, Hiroki Kondo, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS LETTERS   2017.1

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    DOI: 10.1063/1.4974821

  • ラジカル支援原子層制御ナノプロセス (小特集 原子を積んで膜をつくる : ALDプロセスの化学工学的展開)

    石川 健治, 小林 明子, 盧 翌, 竹田 圭吾, 近藤 博基, 関根 誠, 堀 勝

    化学工学   2016.7

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  • Plasma with high electron density and plasma-activated medium for cancer treatment

    Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroshi Hashizume, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinya Toyokuni, Shin'ichi Akiyama, Shoichi Maruyama, Suguru Yamada, Yasuhiro Kodera, Hiroki Kaneko, Hiroko Terasaki, Hirokazu Hara, Tetsuo Adachi, Machiko Iida, Ichiro Yajima, Masashi Kato, Fumitaka Kikkawa, Masaru Hori

    Clinical Plasma Medicine   2015.12

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    DOI: 10.1016/j.cpme.2015.09.001

  • フォトリソグラフィとUVキュア処理によるナノギャップ電極形成

    粂内 真子, 熊谷 慎也, 趙 享峻, 今井 駿, 近藤 博基, 石川 健治, 堀 勝, 佐々木 実

    「センサ・マイクロマシンと応用システム」シンポジウム論文集 電気学会センサ・マイクロマシン部門 [編]   2015.10

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  • シリコン薄膜形成プロセスにおけるプラズマ中の水素原子の計測とその挙動

    堀勝, 阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 韓銓建

    プラズマ・核融合学会誌   2015.5

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  • Carbon nanowall scaffold to control culturing of cervical cancer cells Reviewed

    Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Mineo Hiramatsu, Makoto Sekine, Yoshinobu Baba, Masaru Hori

    APPLIED PHYSICS LETTERS   2014.12

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    DOI: 10.1063/1.4902054

  • Recovery of atom density drift caused by change in reactor wall conditions by real-time autonomous control Reviewed

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   2014.10

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    DOI: 10.1088/0022-3727/47/42/422002

  • Temporal changes in absolute atom densities in H-2 and N-2 mixture gas plasmas by surface modifications of reactor wall Reviewed

    Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Honi

    JAPANESE JOURNAL OF APPLIED PHYSICS   2014.5

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    DOI: 10.7567/JJAP.53.050301

  • Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O-2 non-equilibrium atmospheric-pressure plasma jet

    Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine, Masaru Hori

    PLASMA SOURCES SCIENCE & TECHNOLOGY   2014.4

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    DOI: 10.1088/0963-0252/23/2/025004

  • Effects of Different Chamber-Wall Conditions on Temporal Changes of H and N Radicals Densities in H2 and N2 Mixture Gas Plasma

    Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    Jpn. J. Appl. Phys. 53 (5) (Apr 7, 2014) 050301   2014.4

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    Effects of Different Chamber-Wall Conditions on Temporal Changes of H and N Radicals Densities in H2 and N2 Mixture Gas Plasma

    DOI: 10.7567/JJAP.53.050301

  • Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls Reviewed

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Maseru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2014.4

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    DOI: 10.7567/JJAP.53.040307

  • Epitaxial growth of GaN by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) in the downflow of a very high frequency (VHF) N-2/H-2 excited plasma - effect of TMG flow rate and VHF power Reviewed

    Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, Masaru Hori

    JOURNAL OF CRYSTAL GROWTH   2014.4

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    DOI: 10.1016/j.jcrysgro.2014.01.014

  • Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls Reviewed

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   2014.4

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    DOI: 10.7567/APEX.7.046201

  • Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution Reviewed

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2014.4

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    DOI: 10.7567/JJAP.53.040305

  • Density control of carbon nanowalls grown by CH4/H-2 plasma and their electrical properties Reviewed

    Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hirarnatsu, Masaru Hori

    CARBON   2014.3

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    DOI: 10.1016/j.carbon.2013.11.014

  • Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C Reviewed

    2014.1

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    DOI: 10.7567/JJAP.53.010305

  • Field Emissions from Organic Nanorods Armored with Metal Nanoparticles

    Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2013.12

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    DOI: 10.7567/JJAP.52.120203

  • Effect of indirect nonequilibrium atmospheric pressure plasma on anti-proliferative activity against chronic chemo-resistant ovarian cancer cells in vitro and in vivo

    Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, Fumitaka Kikkawa

    PLoS ONE   2013.12

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    DOI: 10.1371/journal.pone.0081576

  • High H radical density produced by 1-m-long atmospheric pressure microwave plasma system

    Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, Masaru Hori

    Japanese Journal of Applied Physics   2013.11

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    DOI: 10.7567/JJAP.52.11NE01

  • Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

    Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito

    APPLIED PHYSICS LETTERS   2013.10

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    DOI: 10.1063/1.4827426

  • Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls

    Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   2013.9

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    DOI: 10.7567/APEX.6.095201

  • Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability

    Hitoshi Watanabe, Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Shailesh Kumar, Kostya Ostrikov, Masaru Hori

    PLASMA PROCESSES AND POLYMERS   2013.7

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    DOI: 10.1002/ppap.201200141

  • Surface morphology on high-temperature plasma-etched gallium nitride

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    Trans. Mater. Res. Soc. Jpn. 38 (2)   2013.6

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    Surface morphology on high-temperature plasma-etched gallium nitride
    We report the surface morphology of gallium nitride (GaN) films during the argon and nitrogen plasma etching at elevated temperatures up to 800°C. For Ar plasma at high substrate temperatures above 600°C, Ar+ ion bombardment dissociates Ga-N bonds by the preferential removal of nitrogen, which promotes roughness of the GaN surface by the aggregation of gallium atoms. In N2 plasma exposure, the N/Ga remains stoichiometric with higher values above 0.85, and the surface is not significantly roughened, even higher at 600°C. Therefore, the aggregation of metallic Ga induces surface roughening during ion-enhanced etching of GaN with elevated substrate temperatures.

    DOI: 10.14723/tmrsj.38.325

  • A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

    Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   2013.5

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    DOI: 10.7567/APEX.6.056201

  • Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO2 on Carbon Nanowalls

    Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    APPLIED PHYSICS EXPRESS   2013.4

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    DOI: 10.7567/APEX.6.045103

  • Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma

    Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   2013.3

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    DOI: 10.1088/0022-3727/46/10/102001

  • Graphene Nanowalls

    Mineo Hiramatsu, Hiroki Kondo, Masaru Hori

    Chapter 9 in Book "New Progress on Graphene Research"   2013.3

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    Graphene Nanowalls

    DOI: 10.5772/3358

  • I-1-2 高密度ラジカル源を用いた分子線エピタキシー法によるIII族窒化物エピタキシャル成長(窒化物半導体デバイスの精密加工プロセス-窒化物LEDに関わる先端デバイスプロセシング-,口頭発表)

    河合 洋次郎, 本田 善央, 山口 雅史, 天野 浩, 近藤 博基, 平松 美根男, 加納 浩之, 山川 晃司, 田 昭治, 堀 勝

    IIP情報・知能・精密機器部門講演会講演論文集   2013.3

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    Although plasma-assisted molecular beam epitaxy(PA-MBE) is a promising technique for GaN growth,the growth rate obtained by this technique is lower than that obtained by metal organic vapor phase epitaxy(MOVPE).In order to improve the growth rate of the technique,high density radical source(HDRS) was developed.By vacuum ultraviolet absorption spectroscopy(VUVAS) measurement,two orders of magnitude higher radical density was confirmed in a comparison of the HDRS and a conventional radical source(CRS).While faster growth rate of 1.4μm/h in GaN homoepitaxy was achieved,better crystalline quality of InxGa_<(1-x)>N(x=0.03~0.16) epilayers with approximately 1.4μm thickness were also achieved by introducing the HDRS in PA-MBE.

  • Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma

    Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2013.2

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    DOI: 10.7567/JJAP.52.020204

  • Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy

    Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2013.2

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    DOI: 10.7567/JJAP.52.021001

  • Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma

    Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2013.2

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    DOI: 10.7567/JJAP.52.020204

  • Surface loss probability of H radicals on silicon thin films in SiH4/H-2 plasma

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   2013.1

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    DOI: 10.1063/1.4773104

  • Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment

    Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   2013.1

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    DOI: 10.1063/1.4772996

  • Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition

    Mineo Hiramatsu, Masateru Naito, Hiroki Kondo, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2013.1

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    DOI: 10.7567/JJAP.52.01AK04

  • Highly selective etching of SiO2 over Si3N 4 and Si in capacitively coupled plasma employing C 5HF7 gas

    Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Atsuyo Yamazaki, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

    Japanese Journal of Applied Physics   2013.1

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    DOI: 10.7567/JJAP.52.016201

  • Highly selective etching of SiO2 over Si3N 4 and Si in capacitively coupled plasma employing C 5HF7 gas

    Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Atsuyo Yamazaki, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

    Japanese Journal of Applied Physics   2013.1

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    DOI: 10.7567/JJAP.52.016201

  • Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells

    Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF APPLIED PHYSICS   2013.1

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    DOI: 10.1063/1.4778608

  • Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition

    Mineo Hiramatsu, Yuki Nihashi, Hiroki Kondo, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2013.1

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    DOI: 10.7567/JJAP.52.01AK05

  • Individual Roles of Atoms and Ions during Hydrogen Plasma Passivation of Surface Defects on GaN Created by Plasma Etching

    Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2012.11

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    DOI: 10.1143/JJAP.51.111002

  • GRAPHENE FOREST DEVICES AS CELL SCAFFOLDS FOR STEM CELLS Reviewed

    Yukihiro Okamoto, Hitoshi Watanabe, Kazutoshi Kubo, Hiroki Kondo, Noritada Kaji, Manabu Tokeshi, Masaru Hori, Yoshinobu Baba

    Micro Total Analysis Systems 2012   2012.10

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    GRAPHENE FOREST DEVICES AS CELL SCAFFOLDS FOR STEM CELLS
    We developed carbon nanowalls devices (CNWs), on which graphenes vertically stand in the nanometer spacing like "graphene forest", with different wettability. CNWs permitted cell adhesion and proliferation, and especially super hydrophobic CNWs enabled easy and less invasive cell collection. Furthermore, collagen coated CNWs successfully enhanced the differential ability of the human mesenchymal stem cells (hMSC) to osteoblast cells compared to collagen coated polystyrene culture dishes. Thus, CNWs have superior many properties as cells scaffolds and are expected to be useful for regenerative medicine.

  • Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells

    Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS LETTERS   2012.10

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    DOI: 10.1063/1.4764065

  • プラズマナノテクノロジーによる10mmサイズ、超高アスペクト比有機ナノピラーの室温近傍形成とフレキシブルディスプレイへの応用

    堀 勝, 鈴木 俊哉, 竹田 圭吾, 近藤 博基, 石川 健治, 関根 誠

    名古屋大学ベンチャー・ビジネス・ラボラトリーニュース/2012, Summer, No.33   2012.8

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  • Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas

    Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS LETTERS   2012.7

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    DOI: 10.1063/1.4733387

  • Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

    Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, Masaru Hori

    AIP ADVANCES   2012.6

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    DOI: 10.1063/1.4729448

  • Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma

    Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori

    APPLIED PHYSICS EXPRESS   2012.3

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    DOI: 10.1143/APEX.5.035101

  • Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

    Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiromasa Tanaka, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

    APPLIED PHYSICS LETTERS   2012.3

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    DOI: 10.1063/1.3694928

  • プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析(3)

    鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 竹田圭吾, 近藤博基, 関根誠, 関根誠, 堀勝, 堀勝

    応用物理学関係連合講演会講演予稿集(CD-ROM)   2012.2

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  • Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation

    Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minam, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

    Jpn. J. Appl. Phys. 51 (2012) 026201   2012.1

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    Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation

  • Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments

    Hitoshi Watanabe, Hiroki Kondo, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2012.1

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    DOI: 10.1143/JJAP.51.01AJ07

  • Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

    Tsuyoshi Yamaguchi, Tatsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   2012.1

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    DOI: 10.1088/0022-3727/45/2/025203

  • Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature

    Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2012.1

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    DOI: 10.1143/JJAP.51.016202

  • Synchrotron x-ray analyses of crystalline and electronic structures of carbon nanowalls

    Hiroki Kondo, Wakana Takeuchi, Masaru Hori, Shigeru Kimura, Yukako Kato, Takayuki Muro, Toyohiko Kinoshita, Osami Sakata, Hiroo Tajiri, Mineo Hiramatsu

    APPLIED PHYSICS LETTERS   2011.11

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    DOI: 10.1063/1.3659470

  • Nucleation and Vertical Growth of Nano-Graphene Sheets

    Hiroki Kondo, Masaru Hori, Mineo Hiramatsu

    Graphene - Synthesis, Characterization, Properties and Applications   2011.9

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    Nucleation and Vertical Growth of Nano-Graphene Sheets

    DOI: 10.5772/23703

  • プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析(2)

    鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 竹田圭吾, 近藤博基, 関根誠, 関根誠, 堀勝, 堀勝

    応用物理学会学術講演会講演予稿集(CD-ROM)   2011.8

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  • Impacts of CF+, CF2+, CF3+, and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist

    Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2011.8

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    DOI: 10.1143/JJAP.50.08JE05

  • Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen :A Real-time In Situ Electron Spin Resonance Study

    Kenji Ishikwa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

    Physical Chemistry   2011.7

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    Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen :A Real-time In Situ Electron Spin Resonance Study

  • Reactive Ion Etching of Carbon Nanowalls

    Shingo Kondo, Hiroki Kondo, Yudai Miyawaki, Hajime Sasaki, Hiroyuki Kano, Mineo Hiramatsu, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   2011.7

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    DOI: 10.1143/JJAP.50.075101

  • Control of interfacial properties of Pr-oxide/Ge gate stack structure by introduction of nitrogen

    Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima

    SOLID-STATE ELECTRONICS   2011.6

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    DOI: 10.1016/j.sse.2011.01.029

  • 液中プラズマを用いたナノグラフェンの高速合成技術 (特集 「グラフェン」の実務的な視点での開発トレンド)

    近藤博基, 加納 浩之, 堀 勝

    マテリアルステージ 11(2)   2011.5

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  • プラズマCVD法によるカーボンナノウォールの制御合成

    近藤博基, 平松美根男, 堀 勝

    マテリアルステージ 11(2)   2011.5

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  • Radical-controlled plasma processing for nanofabrication

    Masaru Hori, Hiroki Kondo, Mineo Hiramatsu

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   2011.5

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    DOI: 10.1088/0022-3727/44/17/174027

  • Formation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition

    Kota Mase, Hiroki Kondo, Shingo Kondo, Masaru Hori, Mineo Hiramatsu, Hiroyuki Kano

    APPLIED PHYSICS LETTERS   2011.5

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    DOI: 10.1063/1.3583672

  • Spontaneous formation of highly regular superlattice structure in InGaN epilayers grown by molecular beam epitaxy

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    Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet

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