Kyushu University Academic Staff Educational and Research Activities Database
List of Papers
Yamashita Naoto Last modified date:2023.06.19

Assistant Professor / Department of I&E Visionaries / Faculty of Information Science and Electrical Engineering


Papers
1. M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Spatio-temporal measurements Ar 2p1 excitation rates and optical emission spectroscopy by capacitively coupled Ar and Ne mixed gas plasma, MRS Adv., 10.1557/s43580-022-00306-2, 2022.07.
2. S. Ono, S. H. Hwang, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, J. S. Oh, S. Takabayashi, T. Nakatani, Raman spectral analysis of the as-deposited aC: H films prepared by CH4+ Ar plasma CVD, MRS Adv., 10.1557/s43580-022-00310-6, 7, 718–722, 2022.07.
3. T. Okumura, P. Attri, K. Kamataki, N. Yamashita, Y. Tsukada, N. Itagaki, M. Shiratani, Y. Ishibashi, K. Kuchitsu, K. Koga, Detection of NO3− introduced in plasma-irradiated dry lettuce seeds using liquid chromatography-electrospray ionization quantum mass spectrometry (LC-ESI QMS), Sci. Rep., 10.1038/s41598-022-16641-1, 12, 12525, 2022.07.
4. K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma, AIP Adv, 10.1063/5.0097691, 12, 8, 085220, 2022.08.
5. K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma, AIP Adv., 10.1063/5.0097691, 12, 085220, 2022.08.
6. K. Abe, K. Kamataki, A. Yamamoto, I. Nagao, M. Otaka, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K . Koga, M. Shiratani, Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes:particle-in-cell/Monte Carlo collision model simulation, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac7626, 61, 10, 106003, 2022.09.
7. K. Koga, P. Attri, T. Okumura, T. Anan, T. Nakao, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani, Role of short-lived nitrogen species generated at low-pressure RF plasma on the germination and seedling growth, Bull. Am. Phys. Soc., 2022.10.
8. K. Kamataki, T. Sato, K. Tomita, P. Yimin, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Measurements of strength and fluctuation of 2D electric fields in plasmas using a fine particle trapped with laser tweezers, Bull. Am. Phys. Soc., 2022.10.
9. I. Nagao, A. Yamamoto, Y. Yamamoto, K. Kamataki, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulation discharge on behavior of oxygen ions in Ar/O2 capacitively coupled plasma studied by particle-in-cell/Monte Carlo collision model, Bull. Am. Phys. Soc., 2022.10.
10. A. M. Nurut, N. Yamashita, K. Kamataki, K. Koga, N. Itagaki, M. Shiratani, Control of magnetic transition of ZnO: Co grown by RF-sputter using post-annealing, ICIEE, 10.1109/ICIEE55596.2022.10010108, 2022.10.
11. M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Pressure dependence on spatio-temporal distribution of excitation rates of Ar 2p1 and Ne 2p1 in Ar and Ar/Ne capacitively coupled plasmas, Bull. Am. Phys. Soc., 2022.10.
12. T. Anan, T. Nakao, T. Okumura, P. Attri, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effect of plasma irradiation on germination of lettuce seeds with fluctuating dormancy, Bull. Am. Phys. Soc., 2022.10.
13. M. Shiratani, D. Takahashi, N. Yamashita, N. Itagaki, Sputter epitaxy of Mg-doped ZnO films on sapphire substrates using inverted Stranski-Krastanov mode, Bull. Am. Phys. Soc., 2022.10.
14. S. Ono, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Process analysis of cracking aC: H/CNP/aC: H sandwich films under stress using nanoindentation, Bull. Am. Phys. Soc., 2022.10.
15. T. Okumura, T. Anan, P. Attri, Y. Tsukada, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Y. Ishibashi, Plasma irradiation-introduced RONS amount into plant seeds and their response analysis, Bull. Am. Phys. Soc., 2022.10.
16. R. Narishige, N. Yamashita, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, H. Yabuta, N. Itagaki , Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates(Invited), J. Mater. Res., 10.1557/s43578-022-00827-4, 2022.11.
17. I. Nagao, K. Kamataki, A. Yamamoto, M. Otaka, Y. Yamamoto, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges, MRS Adv., 10.1557/s43580-022-00417-w, 7, 911-917, 2022.12.
18. N. Yamashita, R. Mitsuishi, Y. Nakamura, K. Takeda, M. Hori, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, Role of insoluble atoms in the formation of a three-dimensional buffer layer in inverted Stranski–Krastanov mode, J. Mater. Res, 10.1557/s43578-022-00886-7, 1-8, 2023.01.
19. M. N. Agusutrisno, R. Narishige, K. Kamataki, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, N. Yamashita, Control of Inhomogeneity and Magnetic Properties of ZnO:Co Films Grown by Magnetron Sputtering Using Nitrogen, Mater Sci Semicond Process, 10.1016/j.mssp.2023.107503, 162, 107503, 2023.08.
20. K. Kamataki, Y. Sasaki, I. Nagao, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition, Mater Sci Semicond Process, 10.1016/j.mssp.2023.107613, 164, 107613, 2023.09.
21. Shinjiro Ono, Sung Hwa Hwang, Takamasa Okumura, Kunihiro Kamataki, Naoto Yamashita, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Jun-Seok Oh, Susumu Takabayashi, Tatsuyuki Nakatani, Raman spectral analysis of the as-deposited a-C:H films prepared by CH4+ Ar plasma CVD, MRS ADVANCES, 10.1557/s43580-022-00310-6, 7, 30, 718-722, 2022.11, Applicability of precise Raman spectral analysis of a-C:H films deposited using a plasma chemical vapor deposition (CVD) method has been discussed based on the sensitivity to initial conditions in peak separation. The spectral analysis offers to deconvolute the spectra into five peaks, while the as-deposited films prepared by plasma CVD is difficult to the five-peak separation. We found the peak position and the peak height ratio of the D-band to the G(+)-band can be employed to discuss the structure of the as-deposited films. We examined the structural difference between the films deposited at the powered electrode and that at grounded electrode. We found graphene nanoribbon-like structures may be formed in the films deposited on the grounded substrate. This result suggests that the substrate position is an important factor to form the graphene nanoribbon-like structure..
22. D. Takahashi, N. Yamashita, D. Yamashita, T. Okumura, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of Zn1-xMgxO Films on Sapphire Substrates via Inverted Stranski-Krastanov Mode Using Magnetron Sputtering, MRS Adv., 10.1557/s43580-022-00234-1, 2022.02.