Faculty Profiles - KONDO HIROKI

Information

写真a

KONDO HIROKI

Organization

Faculty of Information Science and Electrical Engineering Department of Electronics Professor
Center of Plasma Nono-interface Engineering （Concurrent）
School of Engineering Department of Electrical Engineering and Computer Science（Concurrent）
Graduate School of Information Science and Electrical Engineering Department of Electrical and Electronic Engineering（Concurrent）

Contact information

Tel

0928023628

Profile

岐阜大学プラズマ応用研究センター・特別講義「X線光電子分光の基礎と実践」（2023年6月22日）岐阜大学プラズマ応用研究センター・特別講義「X線光電子分光の基礎と実践」（2024年7月25日）

External link

Degree

Ph. D

Research History

Nagoya University Center for Low-temperature Plasma Sciences (cLPS) Associate Professor

2019.4 - 2023.10

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Associate Professor Associate Professor

2011.10 - 2023.10

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Country：Japan

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Nagoya University Center for Low-temperature Plasma Sciences (cLPS) Guest professor

2024.1 - Present

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Nagoya University Graduate School of Engineering Department of Crystalline Materials Science Assistant

2007.3

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富士通株式会社・富士通研究所

富士通株式会社・富士通研究所
Nagoya University

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Research Interests・Research Keywords

Research theme：Reliability physics in nanosheet electronics - Device degradation mechanism and lifetime prediction from the perspective of atoms and molecules -

Keyword：Nanoelectronics, atomic force microscope, scanning probe microscope, hard X-ray photoelectron spectroscopy, operando analysis

Research period： 1999.4
Research theme：Research and development of advanced nano-plasma process technology contributing to next-generation nanoelectronics

Keyword：Nano-electronics, plasma processes, atomic layer deposition, atomic layer etching, high-k/metal gate stacks

Research period： 1993.4

Papers

In situ atom-resolved observation of Si (111) 7x7 surface with F radical and Ar ion irradiation simulated atomic layer etching

Tsutsumi, T; Asano, A; Kondo, H; Ishikawa, K; Sekine, M; Hori, M

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 42 ( 3 ) 2024.5 （ ISSN:0734-2101 eISSN:1520-8559 ）

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Publisher：Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Ar ions with controlled energy and doses, along with radicals in CF4 plasma, were irradiated separately onto a Si (111) 7 × 7 surface by using a plasma beam reactor. The crystal structure and the chemical bonds on the surface were analyzed by scanning tunneling microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy without air exposure of the samples. The SiF layer formed by F radical irradiation was completely removed by a desorption reaction induced by heating at 600 °C, resulting in an atomically flat surface that maintained the crystal structure. The 7 × 7 structure, which was reconstructed by each irradiation process alone, was not reconstructed because of the synergistic effects of F radicals and Ar ions in the cyclic CF4/Ar plasma used to simulate an atomic layer etching process. The cyclic CF4/Ar plasma process inhibited the reconstruction of the crystal structure by forming a mixture region that included Si, F, and C atoms.

DOI： 10.1116/6.0003432

Web of Science

Scopus
Hydrogen peroxide sensing with nitrogen-doped carbon nanowalls Reviewed International journal

Rakhymzhan Ye. Zhumadilov, Yerassyl Yerlanuly, Hiroki Kondo, Renata R. Nemkayeva, Tlekkabul S. Ramazanov, Masaru Hori, Maratbek T. Gabdullin

Sensing and Bio-Sensing Research 43 100614 2024.2

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Language：English Publishing type：Research paper (scientific journal)

DOI： 10.1111/odi.14827
Deposition of carbon-based materials directly on copper foil and nickel foam as 2D and 3D-networked metal substrates by in-liquid plasma Reviewed International journal

Ma. Shanlene D.C. Dela Vega, Thi-Thuy-Nga Nguyen, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

Plasma Processes and Polymers 20 ( 11 ) 2300036 2023.8

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Language：English Publishing type：Research paper (scientific journal)

DOI： 10.1002/ppap.202300036
Cancer-specific cytotoxicity of Ringer’s acetate solution irradiated by cold atmospheric pressure plasma Invited Reviewed International journal

57 ( 1 ) 91 - 104 2023.4

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Language：English Publishing type：Research paper (scientific journal)

DOI： 10.1080/10715762.2023.2201390
Creation of unique shapes by coordination of alumina nanopores and carbon nanowalls Reviewed International journal

Yerassyl Yerlanuly, Dennis Christy, Ngo Van Nong, Hiroki Kondo, Balaussa Ye. Alpysbayeva, Rakhymzhan Zhumadilov, Renata R. Nemkayeva, Tlekkabul S. Ramazanov, Masaru Hori, Maratbek T. Gabdullin

Fullerenes Nanotubes and Carbon Nanostructures 31 ( 4 ) 295 - 301 2023.4

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Language：English Publishing type：Research paper (scientific journal)

DOI： 10.1080/1536383X.2022.2146672
Biocompatibility of conformal silicon carbide on carbon nanowall scaffolds Reviewed International journal

Koki Ono, Takashi Koide, Kenji Ishikawa, Hiromasa Tanaka, Hiroki Kondo, Ayae Sugawara-Narutaki, Yong Jin, Shigeno Yasuhara, Masaru Hori, Wakana Takeuchi

Japanese Journal of Applied Physics 62 ( SA ) SA1017 2023.2

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Language：English Publishing type：Research paper (scientific journal)

DOI： 10.35848/1347-4065/ac9319
Effects of High-Quality Carbon Nanowalls Ionization-Assisting Substrates on Surface-Assisted Laser Desorption/Ionization Mass Spectrometry Performance

Ryusei Sakai, Hiroki Kondo, Kenji Ishikawa, Takayuki Ohta, Mineo Hiramatsu, Hiromasa Tanaka, Masaru Hori

Nanomaterials 13 ( 1 ) 63 - 63 2022.12 （ eISSN:2079-4991 ）

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Language：Others Publishing type：Research paper (scientific journal) Publisher：MDPI AG

Surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) is performed using carbon nanowalls (CNWs) for ionization-assisting substrates. The CNWs (referred to as high-quality CNWs) in the present study were grown using a radical-injection plasma-enhanced chemical vapor deposition (RI-PECVD) system with the addition of oxygen in a mixture of CH4 and H2 gases. High-quality CNWs were different with respect to crystallinity and C–OH groups, while showing similar wall-to-wall distances and a wettability comparable to CNWs (referred to as normal CNWs) grown without O2. The efficiency of SALDI was tested with both parameters of ion intensity and fragmental efficiency (survival yield (SY)) using N-benzylpyridinuim chloride (N-BP-CI). At a laser fluence of 4 mJ/cm2, normal CNWs had an SY of 0.97 and an ion intensity of 0.13, while 5-sccm-O2– high-quality CNWs had an SY of 0.89 and an ion intensity of 2.55. As a result, the sensitivity for the detection of low-molecular-weight analytes was improved with the high-quality CNWs compared to the normal CNWs, while an SY of 0.89 was maintained at a low laser fluence of 4 mJ/cm2. SALDI-MS measurements available with the high-quality CNWs ionization-assisting substrate provided high ionization and SY values.

DOI： 10.3390/nano13010063

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Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis Reviewed International journal

Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Vacuum 205 111351 2022.11

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DOI： 10.1016/j.vacuum.2022.111351
Power Generation Characteristics of Polymer Electrolyte Fuel Cells Using Carbon Nanowalls as Catalyst Support Material

Takayuki Ohta, Hiroaki Iwata, Mineo Hiramatsu, Hiroki Kondo, Masaru Hori

C 8 ( 3 ) 44 - 44 2022.8 （ eISSN:2311-5629 ）

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Language：Others Publishing type：Research paper (scientific journal) Publisher：MDPI AG

We evaluated the power generation characteristics of a polymer electrolyte fuel cell (PEFC) composed of Pt-supported carbon nanowalls (CNWs) and a microporous layer (MPL) of carbon black on carbon paper (CP) as catalyst support materials. CNWs, standing vertically on highly crystallizing graphene sheets, were synthesized on an MPL/CP by plasma-enhanced chemical vapor deposition (PECVD) using inductively coupled plasma (ICP). Pt nanoparticles were supported on the CNW surface using the liquid-phase reduction method. The three types of voltage loss, namely those due to activated polarization, resistance polarization, and diffusion polarization, are discussed for the power generation characteristics of the PEFC using the Pt/CNWs/MPL/CP. The relationship between the height or gap area of the CNWs and the voltage loss of the PEFC is demonstrated, whereby the CNW height increased with the extension of growth time. The three-phase interface area increased with the increase in the CNW height, resulting in mitigation of the loss due to activated polarization. The gap area of the CNWs varied when changing the CH4/H2 gas ratio. The loss due to diffusion polarization was reduced by enlarging the gap area, due to the increased diffusion of fuel gas and discharge of water. The secondary growth of the CNWs caused the three-phase interface area to decrease as a result of platinum aggregation, impedance of the supply of ionomer dispersion solution to the bottom of the CNWs, and inhibition of fuel gas and water diffusion, which led to the loss of activated and diffuse polarizations. The voltage losses can be mitigated by increasing the height of CNWs while avoiding secondary growth.

DOI： 10.3390/c8030044

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In-liquid plasma synthesis of iron–nitrogen-doped carbon nanoflakes with high catalytic activity Reviewed International journal

Hiroki Kondo, Ryo Hamaji, Tomoki Amano, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

Plasma Processes and Polymers 19 ( 8 ) 2100203 2022.4 （ ISSN:1612-8850 eISSN:1612-8869 ）

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Flake-shaped carbon nanomaterials with nitrogen (N) and iron (Fe) addition, so-called carbon nanoflakes (CNFLs), were synthesized by the in-liquid plasma using two different kinds of additive agents, such as hemin and iron (II) phthalocyanine (FePc). According to scanning electron microscopy images and Raman spectra, CNFLs with a size of at least 100 nm order were formed regardless of types of additive agents, and crystallinity of six-membered ring structures was improved as additive agents increased. Photoelectron spectra showed that pyridinic N contents increased from 1.05% to 2.02% with increasing FePc, while those decreased from 0.34% to 0.14% with hemin. In the oxygen reduction reaction, onset potential values also increased from 0.71 to 0.79 eV with increasing FePc, while those decreased from 0.60 to 0.47 eV with hemin. These results suggested that the catalytic activity of CNFLs was effectively improved by the increase of pyridinic N by the in-liquid plasma synthesis with FePc. In contrast, the electron transfer numbers reached 3.81 when hemin increased, although those were less than 2.88 in the cases using FePc. These results mean that the in-liquid plasma synthesis method of CNFLs using FePc has the potential to further improve its catalytic activity.

DOI： 10.1002/ppap.202100203

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Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS)

Sakai Ryusei, Ichikawa Tomonori, Kondo Hiroki, Ishikawa Kenji, Shimizu Naohiro, Ohta Takayuki, Hiramatsu Mineo, Hori Masaru

NANOMATERIALS 11 ( 2 ) 1 - 11 2021.2

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Effects of Carbon Nanowalls (CNWs) Substrates on Soft Ionization of Low-Molecular-Weight Organic Compounds in Surface-Assisted Laser Desorption/Ionization Mass Spectrometry (SALDI-MS)
Carbon nanowalls (CNWs), which are vertically oriented multi-layer graphene sheets, were employed in surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) measurements to detect low-molecular-weight organic compounds. CNWs substrates with widely different wall-to-wall distances from 142 to 467 nm were synthesized using a radical-injection plasma-enhanced chemical vapor deposition (RI-PECVD) system with nanosecond pulse biasing to a sample stage. When survival yield (SY) values of N-benzylpyridinium chloride (N-BP-Cl) were examined, which is commonly used to evaluate desorption/ionization efficiency, a narrower wall-to-wall distance presented a higher SY value. The highest SY value of 0.97 was realized at 4 mJ/cm(2) for the highest-density CNWs with a wall-to-wall distance of 142 nm. The laser desorption/ionization effect of arginine, an amino acid, was also investigated. When CNWs with a narrower wall-to-wall distance were used, the signal-to-noise (SN) ratios of the arginine signals were increased, while the intensity ratios of fragment ions to arginine signals were suppressed. Therefore, the CNWs nanostructures are a powerful tool when used as a SALDI substrate for the highly efficient desorption/ionization of low-molecular-weight biomolecules.

DOI： 10.3390/nano11020262
Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature

Sugiura, H., Kondo, H., Higuchi, K., Arai, S., Hamaji, R., Tsutsumi, T., Ishikawa, K., Hori, M.

Carbon 170 93 - 99 2020.12

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DOI： 10.1016/j.carbon.2020.07.052
Measurements of nitrogen atom density in a microwave-excited plasma jet produced under moderate pressures

Kim J

IEEJ Transactions on Electrical and Electronic Engineering 15 ( 9 ) 1281 - 1287 2020.9

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Measurements of nitrogen atom density in a microwave-excited plasma jet produced under moderate pressures
Using a microwave-excited plasma source based on a microstrip line, we have generated a nitrogen plasma jet at a moderate pressure in the range from 1 to 10 kPa. The densities of nitrogen (N) atoms produced by the plasma jet were measured with a vacuum ultraviolet absorption spectroscopy. The results show that the plasma jet is able to provide a high density of N atoms at least 4.5 x 10(14) cm(-3)at 1.5 kPa. The N atom densities vary widely with the change in gas flow rate and substrate placement. We expect that this plasma source will provide a high performance as an advanced N radical source in various applications. (c) 2020 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.

DOI： 10.1002/tee.23194
Synthesis of carbon nanowalls on the surface of nanoporous alumina membranes by RI-PECVD method

Yerlanuly, Y., Christy, D., Van Nong, N., Kondo, H., Alpysbayeva, B., Nemkayeva, R., Kadyr, M., Ramazanov, T., Gabdullin, M., Batryshev, D., Hori, M.

Applied Surface Science 523 2020.9

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DOI： 10.1016/j.apsusc.2020.146533
In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar⁺ions and Cl radicals

Hasegawa, M., Tsutsumi, T., Tanide, A., Nakamura, S., Kondo, H., Ishikawa, K., Sekine, M., Hori, M.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 38 ( 4 ) 2020.7

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DOI： 10.1116/6.0000124
In-plane modification of hexagonal boron nitride particles via plasma in solution

Tsuyohito Ito, Taku Goto, Kenichi Inoue, Kenji Ishikawa, Hiroki Kondo, Masaru Hori, Yoshiki Shimizu, Yukiya Hakuta, Kazuo Terashima

Applied Physics Express 13 ( 6 ) 2020.6

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DOI： 10.35848/1882-0786/ab916c
Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp(2) carbon structures

Sugiura Hirotsugu, Ohashi Yasuyuki, Ishikawa Kenji, Kondo Hiroki, Kato Toshiaki, Kaneko Toshiro, Takeda Keigo, Tsutsumi Takayoshi, Hayashi Toshio, Sekine Makoto, Hori Masaru

DIAMOND AND RELATED MATERIALS 104 2020.4

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Gas-phase and film analysis of hydrogenated amorphous carbon films: Effect of ion bombardment energy flux on sp² carbon structures
Hydrogenated amorphous carbon (a-C:H) films comprise nanoclustering graphites (nc-G), fused aromatic rings (nR), and olefinic chain clusters (nC) of sp(2)-bonded carbons in an sp a matrix. In this study, the sp(2) composition of the nc-G, nR and nC in a-C:H films is found to be determined by the ion bombardment energy flux (Gamma(Ei)), which can be estimated as the product of ion bombardment energy and ion flux onto the deposited surface, in plasma-enhanced chemical vapor deposition using a plasma mixture of H-2 and CH4 gases with the H radical injection method. The sp(2) composition is analyzed using Raman spectroscopy and near-edge X-ray absorption structure spectroscopy. a-C:H becomes increasingly graphitized with increasing Gamma(Ei). The precise control of the sp(2) C structure composition can be achieved by controlling the very-high-frequency input power and radio frequency input bias power via the ion flux and ion bombardment energy.

DOI： 10.1016/j.diamond.2019.107651
In-Liquid Plasma Synthesis of Nanographene with a Mixture of Methanol and 1-Butanol Reviewed

Atsushi Ando, Kenji Ishikawa, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Hiroki Kondo, Makoto Sekine, Masaru Hori

ChemNanoMat 6 ( 4 ) 604 - 609 2020.4

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DOI： 10.1002/cnma.201900676
N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence

M. Santhosh, N., Filipi?, G., Kovacevic, E., Jagodar, A., Berndt, J., Strunskus, T., Kondo, H., Hori, M., Tatarova, E., Cvelbar, U.

Nano-Micro Letters 12 ( 1 ) 2020.2

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DOI： 10.1007/s40820-020-0395-5
Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study

Fukunaga, Y., Longo, R.C., Ventzek, P.L.G., Lane, B., Ranjan, A., Hwang, G.S., Hartmann, G., Tsutsumi, T., Ishikawa, K., Kondo, H., Sekine, M., Hori, M.

Journal of Applied Physics 127 ( 2 ) 2020.1

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DOI： 10.1063/1.5127863
Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate

Isobe, Y., Sakai, T., Suguro, K., Miyashita, N., Kondo, H., Ishikawa, K., Wilson, A.F., Shimizu, N., Oda, O., Sekine, M., Hori, M.

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics 37 ( 6 ) 2019.11

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DOI： 10.1116/1.5114831
Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions Reviewed International journal

Tanaka Hiromasa, Mizuno Masaaki, Katsumata Yuko, Ishikawa Kenji, Kondo Hiroki, Hashizume Hiroshi, Okazaki Yasumasa, Toyokuni Shinya, Nakamura Kae, Yoshikawa Nobuhisa, Kajiyama Hiroaki, Kikkawa Fumitaka, Hori Masaru

SCIENTIFIC REPORTS 9 ( 1 ) 13657 - 13657 2019.9

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Oxidative stress-dependent and -independent death of glioblastoma cells induced by non-thermal plasma-exposed solutions
Non-thermal atmospheric pressure plasma has been widely used for preclinical studies in areas such as wound healing, blood coagulation, and cancer therapy. We previously developed plasma-activated medium (PAM) and plasma-activated Ringer's lactate solutions (PAL) for cancer treatments. Many in vitro and in vivo experiments demonstrated that both PAM and PAL exhibit anti-tumor effects in several types of cancer cells such as ovarian, gastric, and pancreatic cancer cells as well as glioblastoma cells. However, interestingly, PAM induces more intracellular reactive oxygen species in glioblastoma cells than PAL. To investigate the differences in intracellular molecular mechanisms of the effects of PAM and PAL in glioblastoma cells, we measured gene expression levels of antioxidant genes such as CAT, SOD2, and GPX1. Microarray and quantitative real-time PCR analyses revealed that PAM elevated stress-inducible genes that induce apoptosis such as GADD45α signaling molecules. PAL suppressed genes downstream of the survival and proliferation signaling network such as YAP/TEAD signaling molecules. These data reveal that PAM and PAL induce apoptosis in glioblastoma cells by different intracellular molecular mechanisms.

DOI： 10.1038/s41598-019-50136-w
Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS) Reviewed

Takayuki Ohta, Hironori Ito, Kenji Ishikawa, Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

Special Issue "Plasma Processing for Carbon-based Materials 5 ( 3 ) 2019.7

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Atmospheric Pressure Plasma-Treated Carbon Nanowalls' Surface-Assisted Laser Desorption/Ionization Time-of-Flight Mass Spectrometry (CNW-SALDI-MS)
Carbon nanowalls (CNWs), vertically standing highly crystallizing graphene sheets, were used in the application of a surface-assisted laser desorption/ionization time-of-flight mass spectrometry (SALDI-TOF-MS). The CNW substrates solved the issues on interferences of matrix molecules and alkali metal addition ions in low-weight molecule detection. Before SALDI sample preparations, the hydrophobic CNW was treated by atmospheric pressure plasma for exposing hydrophilicity to the CNWs' surface. Detection of water soluble amino acids, arginine, was demonstrated.

DOI： 10.3390/c5030040
Gene Expression of Osteoblast-like Cells on Carbon-Nanowall as Scaffolds during Incubation with Electrical Stimulation Reviewed

Ichikawa, T., Kondo, H., Ishikawa, K., Tsutsumi, T., Tanaka, H., Sekine, M., Hori, M.

ACS Applied Bio Materials 2 ( 7 ) 2019.6

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DOI： 10.1021/acsabm.9b00178
Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy Reviewed

Sotaro Yamaoka, Hiroki Kondo, Hiroshi Hashizume, Kenji Ishikawa, Hiromasa Tanaka, Masaru Hori

Applied Physics Express 12 ( 6 ) 2019.5

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Plasma-activated solution alters the morphological dynamics of supported lipid bilayers observed by high-speed atomic force microscopy
The effects of plasma-activated Ringer's lactate solution (PAL) on supported lipid bilayers (SLBs) as a cell membrane model were investigated. PAL has selective killing effects on cancer cells. High-speed atomic force microscopy revealed alterations in the morphological dynamics of SLBs in PAL. SLB islands decreased approximately 20-fold faster in the presence of PAL compared to Ringer's lactate solution without plasma treatment. The effect of plasma treatment on the Ringer's lactate solution produced PAL components that account for the observed effects on cell membranes, such as removal of lipid molecules from the edges of SLBs and the following SLBs shrinkage. (C) 2019 The Japan Society of Applied Physics

DOI： 10.7567/1882-0786/ab1a58
A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome

Niitsu Kiichi, Nakanishi Taiki, Murakami Shunya, Matsunaga Maya, Kobayashi Atsuki, Karim Nissar Mohammad, Ito Jun, Ozawa Naoya, Hase Tetsunari, Tanaka Hiromasa, Sato Mitsuo, Kondo Hiroki, Ishikawa Kenji, Odaka Hidefumi, Hasegawa Yoshinori, Hori Masaru, Nakazato Kazuo

IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS 13 ( 2 ) 470-479 - 479 2019.4

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A 65-nm CMOS Fully Integrated Analysis Platform Using an On-Chip Vector Network Analyzer and a Transmission-Line-Based Detection Window for Analyzing Circulating Tumor Cell and Exosome

DOI： 10.1109/TBCAS.2018.2882472
Facile synthesis of SnO <inf>2</inf> -graphene composites employing nonthermal plasma and SnO <inf>2</inf> nanoparticles-dispersed ethanol

Borude, R.R., Sugiura, H., Ishikawa, K., Tsutsumi, T., Kondo, H., Hori, M.

Journal of Physics D: Applied Physics 15 ( 17 ) 2019.4

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DOI： 10.1088/1361-6463/ab03c4
Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition Reviewed

Isobe, Y., Sakai, T., Sugiyama, N., Mizushima, I., Suguro, K., Miyashita, N., Lu, Y., Wilson, A.F., Kumar, D.A., Ikarashi, N., Kondo, H., Ishikawa, K., Shimizu, N., Oda, O., Sekine, M., Hori, M.

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics 37 ( 3 ) 2019.4

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DOI： 10.1116/1.5083970
Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

Imai Shun, Naito Kenichi, Kondo Hiroki, Cho Hyung Jun, Ishikawa Kenji, Tsutsumi Takayoshi, Sekine Makoto, Hiramatsu Mineo, Hori Masaru

JOURNAL OF PHYSICS D-APPLIED PHYSICS 52 ( 10 ) 105503 - 105503 2019.3

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Effects of 3D structure on electrochemical oxygen reduction characteristics of Pt- nanoparticle-supported carbon nanowalls

DOI： 10.1088/1361-6463/aaf8e0
Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition Reviewed

Hirotsugu Sugiura, Lingyun Jia, Yasuyuki Ohashi, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 58 ( 3 ) 2019.2

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Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition
Amorphous carbon (a-C) thin films were deposited under the control of C-2 radical density using radical-injection plasma-enhanced chemical vapor deposition (RI-PECVD) with CH4/H-2 plasma. By actinometric monitoring of C-2 emission intensities, the plasma parameters were precisely controlled by changing in CH4-containing plasma excitation power independent of H-2 plasma excitation. The control of the incorporation of sp2-C clusters in the a-C films during the a-C film depositions is demonstrated by tailoring Raman positions vs. full widths at half maxima for the G band around 1580 cm(-1) to the RI-PECVD parameters. (C) 2019 The Japan Society of Applied Physics

DOI： 10.7567/1347-4065/aafd49
Single-Step, Low-Temperature Simultaneous Formations and in Situ Binding of Tin Oxide Nanoparticles to Graphene Nanosheets by In-Liquid Plasma for Potential Applications in Gas Sensing and Lithium-Ion Batteries Reviewed

Borude, R.R., Sugiura, H., Ishikawa, K., Tsutsumi, T., Kondo, H., Ikarashi, N., Hori, M.

ACS Applied Nano Materials 2 ( 2 ) 649-654 2019.2

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DOI： 10.1021/acsanm.8b02201
Real-time control of a wafer temperature for uniform plasma process

T. Tsutsumi, Y. Fuknaga, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

2018 International Symposium on Semiconductor Manufacturing (ISSM) 2019.2

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Real-time control of a wafer temperature for uniform plasma process

DOI： 10.1109/ISSM.2018.8651183
Narrow free-standing features fabricated by top-down self-limited trimming of organic materials using precisely temperature-controlled plasma etching system

Fukunaga, Y., Tsutsumi, T., Kondo, H., Ishikawa, K., Sekine, M., Hori, M.

Japanese Journal of Applied Physics 58 ( 2 ) 2019.2

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DOI： 10.7567/1347-4065/aaf92a
Effect of electrical stimulation on proliferation and bone-formation by osteoblast-like cells cultured on carbon nanowalls scaffolds Reviewed

Ichikawa, T., Tanaka, S., Kondo, H., Ishikawa, K., Tsutsumi, T., Sekine, M., Hori, M.

Applied Physics Express 12 ( 2 ) 2019.1

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DOI： 10.7567/1882-0786/aaf469
Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas Reviewed

Zhang, Y., Ishikawa, K., Mozeti?, M., Tsutsumi, T., Kondo, H., Sekine, M., Hori, M.

Plasma Processes and Polymers 16 ( 6 ) 2019.1

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DOI： 10.1002/ppap.201800175
Modifications of surface and bulk properties of magnetron-sputtered carbon films employing a post-treatment of atmospheric pressure plasma Reviewed

Borude, R.R., Sugiura, H., Ishikawa, K., Tsutsumi, T., Kondo, H., Han, J.G., Hori, M.

Japanese Journal of Applied Physics 58 ( SA ) 2019.1

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DOI： 10.7567/1347-4065/aaec87
Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition Reviewed

Masakazu Tomatsu, Mineo Hiramatsu, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori

Journal of Carbon Research 5 ( 1 ) 2019.1

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Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition

DOI： 10.3390/c5010007
Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

Hirotsugu Sugiura, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori

C-Journal of Carbon Research 5 ( 1 ) 2019.1

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Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition

DOI： 10.3390/c5010008
Liquid dynamics in response to an impinging low-temperature plasma jet Reviewed

Timothy R. Brubaker, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilen, Masaru Hori

Journal of Physics D: Applied Physics 52 ( 7 ) 2018.12

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Liquid dynamics in response to an impinging low-temperature plasma jet

DOI： 10.1088/1361-6463/aaf460
Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H2 plasma-enhanced chemical vapor deposition Reviewed

Shun Imai, Hiroki Kondo, Cho Hyungjun, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

Applied Physics Express 12 ( 1 ) 2018.12

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Pt nanoparticle-supported carbon nanowalls electrode with improved durability for fuel cell applications using C2F6/H2 plasma-enhanced chemical vapor deposition
The electrochemical durability of Pt nanoparticles-supported carbon nanowalls (Pt/CNWs) determined from potential cycle tests was 88% performance after 20 000 cycles and 50% performance around 140 000 cycles when the CNWs were fabricated by the C2F6/H-2 plasma-enhanced chemical vapor deposition system (C2F6-CNWs). Even after the extended start/stop-simulation tests of fuel cell Pt/C2F6-CNWs, Pt was aggregated; however, the morphological structure of the CNWs was maintained and no corrosion was evident from scanning electron microscopy observations and Raman analysis. For graphene-based catalyst supports, i.e., the Pt/C2F6-CNWs, graphene crystallinity is essential to extend electrochemical durability by inhibiting corrosion during fuel cell operation. (C) 2018 The Japan Society of Applied Physics

DOI： 10.7567/1882-0786/aaf0ab
Effect of N<inf>2</inf>/H<inf>2</inf> plasma on GaN substrate cleaning for homoepitaxial GaN growth by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) Reviewed

Amalraj, F.W., Dhasiyan, A.K., Lu, Y., Shimizu, N., Oda, O., Ishikawa, K., Kondo, H., Sekine, M., Ikarashi, N., Hori, M.

AIP Advances 8 ( 11 ) 2018.11

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DOI： 10.1063/1.5050819
Oriented carbon nanostructures by Plasma processing: Recent advances and future challenges

Santhosh, N.M., Filipi?, G., Tatarova, E., Baranov, O., Kondo, H., Sekine, M., Hori, M., (Ken) Ostrikov, K., Cvelbar, U.

Micromachines 9 ( 11 ) 2018.11

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DOI： 10.3390/mi9110565
Time Evolution Of Reactive Oxygen Nitrogen Species in Plasma-Activated Essential Media and Water

Brubaker Timothy, Ishikawa Kenji, Takeda Keigo, Hashizume Hiroshi, Tanaka Hiromasa, Kondo Hiroki, Sekine Makoto, Hori Masaru

2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS) 2018.10

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Time Evolution Of Reactive Oxygen Nitrogen Species in Plasma-Activated Essential Media and Water

DOI： 10.1109/PLASMA.2017.8496057
Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching Reviewed

Zhang, Y., Imamura, M., Ishikawa, K., Tsutsumi, T., Kondo, H., Sekine, M., Hori, M.

Japanese Journal of Applied Physics 57 ( 10 ) 2018.8

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DOI： 10.7567/JJAP.57.106502
Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H2 at 300-500°C Reviewed

156 219-223 2018.7

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DOI： 10.1016/j.vacuum.2018.07.040
Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons Reviewed

Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 57 ( 2 ) 2018.2

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DOI： 10.7567/JJAP.57.026201
Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol Reviewed

Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Applied Physics Express 11 ( 1 ) 2018.1

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DOI： 10.7567/APEX.11.015102
Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy Reviewed

Timothy R. Brubaker, Kenji Ishikawa, Keigo Takeda, Jun-Seok Oh, Hiroki Kondo, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilen, Masaru Hori

JOURNAL OF APPLIED PHYSICS 122 ( 21 ) 2017.12

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DOI： 10.1063/1.4999256
Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium Reviewed

Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

PLASMA PROCESSES AND POLYMERS 14 ( 11 ) 2017.11

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DOI： 10.1002/ppap.201700123
Surface roughening of photoresist after change of the photon/radical and ion treatment sequence Reviewed

Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 35 ( 6 ) 2017.11

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DOI： 10.1116/1.4994218
High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition Reviewed

Shun Imai, Hiroki Kondo, Hyungjun Cho, Hiroyuki Kano, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masafumi Ito, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 50 ( 40 ) 2017.10

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DOI： 10.1088/1361-6463/aa8131
Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy Reviewed

Ryo Furuta, Naoyuki Kurake, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

BIOINTERPHASES 12 ( 3 ) 2017.9

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DOI： 10.1116/1.4997170
Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation Reviewed

Zecheng Liu, Masato Imamura, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 10 ( 8 ) 2017.8

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DOI： 10.7567/APEX.10.086502
Temperature dependence of protection layer formation on organic trench sidewall in H-2/N-2 plasma etching with control of substrate temperature Reviewed

Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 56 ( 7 ) 2017.7

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DOI： 10.7567/JJAP.56.076202
Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 degrees C Reviewed

Shinnosuke Takai, Yi Lu, Osamu Oda, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 56 ( 6 ) 2017.6

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DOI： 10.7567/JJAP.56.06HE08
Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy Reviewed

Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

PHYSICAL CHEMISTRY CHEMICAL PHYSICS 19 ( 21 ) 13438 - 13442 2017.6

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DOI： 10.1039/c7cp00489c
A CONCRETE APPROACH TO DIAGONAL SHORT TIME ASYMPTOTICS OF HEAT KERNELS ASSOCIATED WITH SUB-LAPLACIAN ON CR MANIFOLDS Reviewed

Hiroki Kondo

KYUSHU JOURNAL OF MATHEMATICS 71 ( 1 ) 65 - 84 2017.3

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DOI： 10.2206/kyushujm.71.65
Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas Reviewed

Yoshinobu Ohya, Kenji Ishikawa, Tatsuya Komuro, Tsuyoshi Yamaguchi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 50 ( 15 ) 2017.3

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DOI： 10.1088/1361-6463/aa60f7
Protein Nanoparticle Formation Using a Circularly Permuted alpha-Helix Rich Trimeric Protein Reviewed

Norifumi Kawakami, Hiroki Kondo, Masayuki Muramatsu, Kenji Miyamoto

BIOCONJUGATE CHEMISTRY 28 ( 2 ) 336 - 340 2017.2

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DOI： 10.1021/acs.bioconjchem.6b00735
Absolute density of precursor SiH3 radicals and H atoms in H-2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films Reviewed

Yusuke Abe, Kenji Ishikawa, Keigo Takeda, Takayoshi Tsutsumi, Atsushi Fukushima, Hiroki Kondo, Makoto Sekine, Masaru Hori

APPLIED PHYSICS LETTERS 110 ( 4 ) 2017.1

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DOI： 10.1063/1.4974821
Atomic layer etching of SiO2 by alternating an O-2 plasma with fluorocarbon film deposition Reviewed

Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 35 ( 1 ) 2017.1

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DOI： 10.1116/1.4971171
Microfluidic Transport Through Microsized Holes Treated by Nonequilibrium Atmospheric-Pressure Plasma Reviewed

Takumi Ito, Kenji Ishikawa, Daisuke Onoshima, Naoto Kihara, Kentaro Tatsukoshi, Hidefumi Odaka, Hiroshi Hashizume, Hiromasa Tanaka, Hiroshi Yukawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Yoshinobu Baba, Masaru Hori

IEEE TRANSACTIONS ON PLASMA SCIENCE 44 ( 12 ) 3060 - 3065 2016.12

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DOI： 10.1109/TPS.2016.2571721
Effects of Radical Species on Structural and Electronic Properties of Amorphous Carbon Films Deposited by Radical-Injection Plasma-Enhanced Chemical Vapor Deposition Reviewed

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

PLASMA PROCESSES AND POLYMERS 13 ( 7 ) 730 - 736 2016.7

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DOI： 10.1002/ppap.201500229
Effect of gas residence time on near-edge X-ray absorption fine structures of hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition Reviewed

Lingyun Jia, Hirotsugu Sugiura, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Osamu Oda, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 55 ( 4 ) 2016.4

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DOI： 10.7567/JJAP.55.040305
Advanced Plasma Science and Its Applications for Nitride and Nanomaterials FOREWORD Reviewed

Akihiro Wakahara, Osamu Nakatsuka, Minoru Sasaki, Kazuo Terashima, Hiroshi Amano, Takashi Egawa, Yasufumi Fujiwara, Mineo Hiramatsu, Ryoichi Ichino, Yasushi Inoue, Masafumi Ito, Makoto Kasu, Hiroki Kondo, Seiichi Miyazaki, Kazuaki Sawada, Makoto Sekine, Yuichi Setsuhara, Masaharu Shiratani, Hirofumi Takikawa, Yoshimi Watanabe

JAPANESE JOURNAL OF APPLIED PHYSICS 55 ( 1 ) 2016.1

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DOI： 10.7567/JJAP.55.01A001
Real-time temperature monitoring of Si substrate during plasma processing and its heat-flux analysis Reviewed

Takayoshi Tsutsumi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 55 ( 1 ) 2016.1

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DOI： 10.7567/JJAP.55.01AB04
Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching Reviewed

Takayoshi Tsutsumi, Yusuke Fukunaga, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 28 ( 4 ) 515 - 520 2015.11

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DOI： 10.1109/TSM.2015.2470554
Development of Microelectrode Arrays Using Electroless Plating for CMOS-Based Direct Counting of Bacterial and HeLa Cells Reviewed

Kiichi Niitsu, Shoko Ota, Kohei Gamo, Hiroki Kondo, Masaru Hori, Kazuo Nakazato

IEEE TRANSACTIONS ON BIOMEDICAL CIRCUITS AND SYSTEMS 9 ( 5 ) 607 - 619 2015.10

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DOI： 10.1109/TBCAS.2015.2479656
High sensitivity of a carbon nanowall-based sensor for detection of organic vapours Reviewed

RSC Advances 5 ( 110 ) 90515 - 90520 2015.10

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DOI： 10.1039/c5ra12000d
Suppression of plasma-induced damage on GaN etched by a Cl-2 plasma at high temperatures Reviewed

Zecheng Liu, Jialin Pan, Takashi Kako, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 54 ( 6 ) 2015.6

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DOI： 10.7567/JJAP.54.06GB04
CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase Reviewed

Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 54 ( 4 ) 2015.4

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DOI： 10.7567/JJAP.54.040301
Silicon nitride etching performance of CH2F2 plasma diluted with argon or krypton Reviewed

Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 54 ( 4 ) 2015.4

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DOI： 10.7567/JJAP.54.040303
Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions Reviewed

Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 48 ( 4 ) 2015.2

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DOI： 10.1088/0022-3727/48/4/045202
Robust characteristics of semiconductor-substrate temperature measurement by autocorrelation-type frequency-domain low-coherence interferometry Reviewed

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito

JAPANESE JOURNAL OF APPLIED PHYSICS 54 ( 1 ) 2015.1

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DOI： 10.7567/JJAP.54.01AB03
Carbon nanowall scaffold to control culturing of cervical cancer cells Reviewed

Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Mineo Hiramatsu, Makoto Sekine, Yoshinobu Baba, Masaru Hori

APPLIED PHYSICS LETTERS 105 ( 24 ) 2014.12

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DOI： 10.1063/1.4902054
Recovery of atom density drift caused by change in reactor wall conditions by real-time autonomous control Reviewed

Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 47 ( 42 ) 2014.10

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DOI： 10.1088/0022-3727/47/42/422002
Temporal changes in absolute atom densities in H-2 and N-2 mixture gas plasmas by surface modifications of reactor wall Reviewed

Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Honi

JAPANESE JOURNAL OF APPLIED PHYSICS 53 ( 5 ) 2014.5

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DOI： 10.7567/JJAP.53.050301
Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls Reviewed

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Maseru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 53 ( 4 ) 040307 2014.4

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DOI： 10.7567/JJAP.53.040307
Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O-2 non-equilibrium atmospheric-pressure plasma jet

Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine, Masaru Hori

PLASMA SOURCES SCIENCE & TECHNOLOGY 23 ( 2 ) 2014.4

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DOI： 10.1088/0963-0252/23/2/025004
Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution Reviewed

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 53 ( 4 ) 040305:1-4 2014.4

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DOI： 10.7567/JJAP.53.040305
Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls Reviewed

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 7 ( 4 ) 046201 2014.4

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DOI： 10.7567/APEX.7.046201
Epitaxial growth of GaN by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) in the downflow of a very high frequency (VHF) N-2/H-2 excited plasma - effect of TMG flow rate and VHF power Reviewed

Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, Masaru Hori

JOURNAL OF CRYSTAL GROWTH 391 97 - 103 2014.4

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DOI： 10.1016/j.jcrysgro.2014.01.014
Density control of carbon nanowalls grown by CH4/H-2 plasma and their electrical properties Reviewed

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hirarnatsu, Masaru Hori

CARBON 68 380 - 388 2014.3

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DOI： 10.1016/j.carbon.2013.11.014
Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C Reviewed

53 ( 1 ) 010305:1-4 2014.1

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DOI： 10.7567/JJAP.53.010305
Effect of indirect nonequilibrium atmospheric pressure plasma on anti-proliferative activity against chronic chemo-resistant ovarian cancer cells in vitro and in vivo

Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, Fumitaka Kikkawa

PLoS ONE 8 ( 12 ) 2013.12

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DOI： 10.1371/journal.pone.0081576
Field Emissions from Organic Nanorods Armored with Metal Nanoparticles

Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 12 ) 1-4 2013.12

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DOI： 10.7567/JJAP.52.120203
High H radical density produced by 1-m-long atmospheric pressure microwave plasma system

Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, Masaru Hori

Japanese Journal of Applied Physics 52 ( 11 ) 2013.11

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DOI： 10.7567/JJAP.52.11NE01
Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito

APPLIED PHYSICS LETTERS 103 ( 18 ) 2013.10

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DOI： 10.1063/1.4827426
Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 6 ( 9 ) 2013.9

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DOI： 10.7567/APEX.6.095201
Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability

Hitoshi Watanabe, Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Shailesh Kumar, Kostya Ostrikov, Masaru Hori

PLASMA PROCESSES AND POLYMERS 10 ( 7 ) 582 - 592 2013.7

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DOI： 10.1002/ppap.201200141
Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability Reviewed

Hitoshi Watanabe, Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Shailesh Kumar, Kostya Ostrikov, Masaru Hori

PLASMA PROCESSES AND POLYMERS 10 ( 7 ) 582 - 592 2013.7

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DOI： 10.1002/ppap.201200141
Low-Temperature Single-Walled Carbon Nanotube Growth from Pt Catalyst Using Alcohol Gas Source Method in High Vacuum Reviewed

Hiroki Kondo, Naoya Fukuoka, Ranajit Ghosh, Shigeya Naritsuka, Takahiro Maruyama, Sumio Iijima

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 6 ) 2013.6

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DOI： 10.7567/JJAP.52.06GD02
Surface morphology on high-temperature plasma-etched gallium nitride

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

Trans. Mater. Res. Soc. Jpn. 38 (2) 38 ( 2 ) 325-328 - 328 2013.6

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Surface morphology on high-temperature plasma-etched gallium nitride
We report the surface morphology of gallium nitride (GaN) films during the argon and nitrogen plasma etching at elevated temperatures up to 800°C. For Ar plasma at high substrate temperatures above 600°C, Ar⁺ ion bombardment dissociates Ga-N bonds by the preferential removal of nitrogen, which promotes roughness of the GaN surface by the aggregation of gallium atoms. In N₂ plasma exposure, the N/Ga remains stoichiometric with higher values above 0.85, and the surface is not significantly roughened, even higher at 600°C. Therefore, the aggregation of metallic Ga induces surface roughening during ion-enhanced etching of GaN with elevated substrate temperatures.

DOI： 10.14723/tmrsj.38.325
A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 6 ( 5 ) 1-4 2013.5

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DOI： 10.7567/APEX.6.056201
Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes Reviewed

Masanaga Fukasawa, Hiroyasu Matsugai, Takahiro Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 5 ) 2013.5

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DOI： 10.7567/JJAP.52.05ED01
Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO2 on Carbon Nanowalls

Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

APPLIED PHYSICS EXPRESS 6 ( 4 ) 1-4 2013.4

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DOI： 10.7567/APEX.6.045103
Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma Reviewed

Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 46 ( 10 ) pp. 102001:1-5 2013.3

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DOI： 10.1088/0022-3727/46/10/102001
Characterization of Nb hydrides synthesized in high-pressure supercritical water by micro-beam hard X-ray photoelectron spectroscopy Reviewed

Kazuo Soda, Hiroki Kondo, Masahiko Kato, Tatsuhito Shiraki, Ken Niwa, Keiji Kusaba, Masashi Hasegawa, Eiji Ikenaga

Journal of Electron Spectroscopy and Related Phenomena 186 ( 1 ) 54 - 57 2013.2

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DOI： 10.1016/j.elspec.2013.02.006
Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma Reviewed

Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 2 ) pp.020204:1-4 2013.2

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DOI： 10.7567/JJAP.52.020204
Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma Reviewed

Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 2 ) pp.020204:1-4 2013.2

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DOI： 10.7567/JJAP.52.020204
Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy Reviewed

Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 2 ) 2013.2

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DOI： 10.7567/JJAP.52.021001
Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy

Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 2 ) pp.021001-1:5 2013.2

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DOI： 10.7567/JJAP.52.021001
Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment

Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 113 ( 1 ) P.014306:1-6 2013.1

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DOI： 10.1063/1.4772996
Surface loss probability of H radicals on silicon thin films in SiH4/H-2 plasma Reviewed

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 113 ( 1 ) 2013.1

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DOI： 10.1063/1.4773104
Surface loss probability of H radicals on silicon thin films in SiH4/H-2 plasma

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 113 ( 1 ) 2013.1

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DOI： 10.1063/1.4773104
Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition Reviewed

Mineo Hiramatsu, Yuki Nihashi, Hiroki Kondo, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 1 ) 2013.1

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DOI： 10.7567/JJAP.52.01AK05
Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells Reviewed

Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 113 ( 3 ) 2013.1

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DOI： 10.1063/1.4778608
Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells

Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 113 ( 3 ) pp.033304:1-6 2013.1

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DOI： 10.1063/1.4778608
Highly selective etching of SiO2 over Si3N 4 and Si in capacitively coupled plasma employing C 5HF7 gas Reviewed

Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Atsuyo Yamazaki, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

Japanese Journal of Applied Physics 52 ( 1 ) 1-9 2013.1

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DOI： 10.7567/JJAP.52.016201
Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition Reviewed

Mineo Hiramatsu, Masateru Naito, Hiroki Kondo, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 1 ) 2013.1

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DOI： 10.7567/JJAP.52.01AK04
Fabrication of Carbon Nanowalls on Carbon Fiber Paper for Fuel Cell Application Reviewed

Mineo Hiramatsu, Shinji Mitsuguchi, Takeyoshi Horibe, Hiroki Kondo, Masaru Hori, Hiroyuki Kano

JAPANESE JOURNAL OF APPLIED PHYSICS 52 ( 1 ) 2013.1

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DOI： 10.7567/JJAP.52.01AK03
Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment Reviewed

Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 113 ( 1 ) 2013.1

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DOI： 10.1063/1.4772996
Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

R. L. Puurunen, T. Suni, O. M.E. Ylivaara, H. Kondo, M. Ammar, T. Ishida, H. Fujita, A. Bosseboeuf, S. Zaima, H. Kattelus

Sensors and Actuators, A: Physical 188 268 - 276 2012.12

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DOI： 10.1016/j.sna.2012.05.006
Individual Roles of Atoms and Ions during Hydrogen Plasma Passivation of Surface Defects on GaN Created by Plasma Etching Reviewed

Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 51 ( 11 ) 111002-1:5 2012.11

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DOI： 10.1143/JJAP.51.111002
Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells Reviewed

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

APPLIED PHYSICS LETTERS 101 ( 17 ) pp.172109-1:4 2012.10

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DOI： 10.1063/1.4764065
Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas Reviewed

Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

APPLIED PHYSICS LETTERS 101 ( 1 ) 2012.7

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DOI： 10.1063/1.4733387
Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas Reviewed

Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

APPLIED PHYSICS LETTERS 101 ( 1 ) 2012.7

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DOI： 10.1063/1.4733387
Genetic Characterization of Human Influenza Viruses in the Pandemic (2009-2010) and Post-Pandemic (2010-2011) Periods in Japan Reviewed

Isolde C. Dapat, Clyde Dapat, Tatiana Baranovich, Yasushi Suzuki, Hiroki Kondo, Yugo Shobugawa, Reiko Saito, Hiroshi Suzuki

PLOS ONE 7 ( 6 ) 2012.6

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DOI： 10.1371/journal.pone.0036455
Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature Reviewed

Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, Masaru Hori

AIP ADVANCES 2 ( 2 ) 2012.6

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DOI： 10.1063/1.4729448
Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, Masaru Hori

AIP ADVANCES 2 ( 2 ) pp.022149-1:6 2012.6

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DOI： 10.1063/1.4729448
Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiromasa Tanaka, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

APPLIED PHYSICS LETTERS 100 ( 11 ) 10.1063/1.3694928 2012.3

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DOI： 10.1063/1.3694928
Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma Reviewed

Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 5 ( 3 ) pp. 035101-1:3 2012.3

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DOI： 10.1143/APEX.5.035101
Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma Reviewed

Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiromasa Tanaka, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

APPLIED PHYSICS LETTERS 100 ( 11 ) 2012.3

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DOI： 10.1063/1.3694928
Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation Reviewed

Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

JAPANESE JOURNAL OF APPLIED PHYSICS 51 ( 2 ) 2012.2

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DOI： 10.1143/JJAP.51.026201
Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation Reviewed

Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minami, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

JAPANESE JOURNAL OF APPLIED PHYSICS 51 ( 2 ) 2012.2

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DOI： 10.1143/JJAP.51.026201
Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments Reviewed

Hitoshi Watanabe, Hiroki Kondo, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 51 ( 1 ) 2012.1

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DOI： 10.1143/JJAP.51.01AJ07
Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature Reviewed

Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 51 ( 1 ) 2012.1

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DOI： 10.1143/JJAP.51.016202
Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC Reviewed

Tsuyoshi Yamaguchi, Tatsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 45 ( 2 ) 2012.1

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DOI： 10.1088/0022-3727/45/2/025203
Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments Reviewed

Hitoshi Watanabe, Hiroki Kondo, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 51 ( 1 ) 2012.1

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DOI： 10.1143/JJAP.51.01AJ07
Chemical bond modification in porous SiOCH films by H-2 and H-2/N-2 plasmas investigated by in situ infrared reflection absorption spectroscopy Reviewed

Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, Masaru Hori

JOURNAL OF APPLIED PHYSICS 110 ( 12 ) 2011.12

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DOI： 10.1063/1.3671547
Synchrotron x-ray analyses of crystalline and electronic structures of carbon nanowalls Reviewed

Hiroki Kondo, Wakana Takeuchi, Masaru Hori, Shigeru Kimura, Yukako Kato, Takayuki Muro, Toyohiko Kinoshita, Osami Sakata, Hiroo Tajiri, Mineo Hiramatsu

APPLIED PHYSICS LETTERS 99 ( 21 ) 2011.11

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DOI： 10.1063/1.3659470
Control of Interfacial Properties of Al2O3/Ge Gate Stack Structure Using Radical Nitridation Technique Reviewed

Kimihiko Kato, Shinya Kyogoku, Mitsuo Sakashita, Wakana Takeuchi, Hiroki Kondo, Shotaro Takeuchi, Osamu Nakatsuka, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 10 ) 2011.10

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DOI： 10.1143/JJAP.50.10PE02
Impacts of CF+, CF

Takeuchi Takuya, Amasaki Shinpei, Kondo Hiroki, Ishikawa Kenji, Toyoda Hirotaka, Sekine Makoto, Kang Song-Yun, Sawada Ikuo, Hori Masaru

Jpn J Appl Phys 50 ( 8 ) 08JE05 - 08JE05-5 2011.8

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Impacts of CF+, CF
Photoresists used in advanced ArF-excimer laser lithography are not tolerant enough for plasma etching processes. Degradation of photoresists during etching processes might cause not only low selectivity, but also line edge roughness (LER) on the sidewalls of etched patterns. For a highly accurate processing, it is necessary to understand the mechanisms of etching photoresists and to construct a new plasma chemistry that realizes a nano scale precise pattern definition. In this study, the modified layers formed on the surface of a photoresist by the bombardment of fluorocarbon ions of CF+, CF₂+, and CF₃+, and argon (Ar) ions were analyzed by X-ray photoelectron spectroscopy (XPS). The etching yield of the modified steady-state surface was almost dependent on the mass of incident ion species. The surface composition was modified with increasing dosage of each ion species, and reached a specific steady state that was dependent on the ion species. The bombardment of F-rich ion species such as CF₂+ and CF₃+ resulted in the formation of not only fluorocarbon layers, but also graphite like structures on the surface. On the basis of these results, the surface reaction for the ion-beam-induced modification was discussed.

DOI： 10.1143/JJAP.50.08JE05
Impacts of CF+, CF2+, CF3+, and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist Reviewed

Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 8 ) 2011.8

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DOI： 10.1143/JJAP.50.08JE05
Reactive Ion Etching of Carbon Nanowalls Reviewed

Shingo Kondo, Hiroki Kondo, Yudai Miyawaki, Hajime Sasaki, Hiroyuki Kano, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 7 ) 2011.7

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DOI： 10.1143/JJAP.50.075101
Control of interfacial properties of Pr-oxide/Ge gate stack structure by introduction of nitrogen Reviewed

Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima

SOLID-STATE ELECTRONICS 60 ( 1 ) 70 - 74 2011.6

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DOI： 10.1016/j.sse.2011.01.029
Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen: A Real-Time In Situ Electron Spin Resonance Study Reviewed

Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICAL CHEMISTRY LETTERS 2 ( 11 ) 1278 - 1281 2011.6

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DOI： 10.1021/jz2002937
Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen: A Real-Time In Situ Electron Spin Resonance Study Reviewed

Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICAL CHEMISTRY LETTERS 2 ( 11 ) 1278 - 1281 2011.6

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DOI： 10.1021/jz2002937
Control of interfacial properties of Pr-oxide/Ge gate stack structure by introduction of nitrogen Reviewed

Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima

SOLID-STATE ELECTRONICS 60 ( 1 ) 70 - 74 2011.6

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DOI： 10.1016/j.sse.2011.01.029
Formation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition Reviewed

Kota Mase, Hiroki Kondo, Shingo Kondo, Masaru Hori, Mineo Hiramatsu, Hiroyuki Kano

APPLIED PHYSICS LETTERS 98 ( 19 ) 2011.5

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DOI： 10.1063/1.3583672
Spatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N-2/Ar Gas Reviewed

Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 5 ) 2011.5

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DOI： 10.1143/JJAP.50.056101
Radical-controlled plasma processing for nanofabrication Reviewed

Masaru Hori, Hiroki Kondo, Mineo Hiramatsu

JOURNAL OF PHYSICS D-APPLIED PHYSICS 44 ( 17 ) 2011.5

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DOI： 10.1088/0022-3727/44/17/174027
Radical-controlled plasma processing for nanofabrication Reviewed

Masaru Hori, Hiroki Kondo, Mineo Hiramatsu

JOURNAL OF PHYSICS D-APPLIED PHYSICS 44 ( 17 ) 2011.5

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DOI： 10.1088/0022-3727/44/17/174027
Formation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition Reviewed

Kota Mase, Hiroki Kondo, Shingo Kondo, Masaru Hori, Mineo Hiramatsu, Hiroyuki Kano

APPLIED PHYSICS LETTERS 98 ( 19 ) 2011.5

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DOI： 10.1063/1.3583672
Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy

Masaki Adachi, Yuzo Kato, Kimihiko Kato, Mitsuo Sakashita, Hiroki Kondo, Wakana Takeuchi, Osamu Nakatsuka, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 4 ) 2011.4

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DOI： 10.1143/JJAP.50.04DA08
Spontaneous formation of highly regular superlattice structure in InGaN epilayers grown by molecular beam epitaxy Reviewed

Z. H. Wu, Y. Kawai, Y. -Y. Fang, C. Q. Chen, H. Kondo, M. Hori, Y. Honda, M. Yamaguchi, H. Amano

APPLIED PHYSICS LETTERS 98 ( 14 ) 2011.4

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DOI： 10.1063/1.3574607
Effect of Pr Valence State on Interfacial Structure and Electrical Properties of Pr Oxide/PrON/Ge Gate Stack Structure Reviewed

Kimihiko Kato, Mitsuo Sakashita, Wakana Takeuchi, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 4 ) 2011.4

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DOI： 10.1143/JJAP.50.04DA17
Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy Reviewed

Masaki Adachi, Yuzo Kato, Kimihiko Kato, Mitsuo Sakashita, Hiroki Kondo, Wakana Takeuchi, Osamu Nakatsuka, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 4 ) 2011.4

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DOI： 10.1143/JJAP.50.04DA08
Electron field emission enhancement of carbon nanowalls by plasma surface nitridation

Wakana Takeuchi, Hiroki Kondo, Tomomi Obayashi, Mineo Hiramatsu, Masaru Hori

APPLIED PHYSICS LETTERS 98 ( 12 ) 2011.3

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DOI： 10.1063/1.3532114
Electron field emission enhancement of carbon nanowalls by plasma surface nitridation Reviewed

Wakana Takeuchi, Hiroki Kondo, Tomomi Obayashi, Mineo Hiramatsu, Masaru Hori

APPLIED PHYSICS LETTERS 98 ( 12 ) 2011.3

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DOI： 10.1063/1.3532114
Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet Reviewed

Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, Masaru Hori

APPLIED PHYSICS EXPRESS 4 ( 2 ) 026101 2011.2

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DOI： 10.1143/APEX.4.026101
Pr(EtCp)_3を用いた原子層成長法によるPr酸化膜の作製とその電気的特性 Reviewed

近藤博基, 坂下満男, 財満鎭明

真空 54 ( 2 ) 110 - 113 2011.2

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  Growth properties and electrical properties of Pr oxide films by an atomic layer deposition (ALD) technique using Pr(EtCp)₃ are discussed in this paper. Slef-limiting growth of Pr oxide films at a rate of 0.07 nm/cycle and a thickness variation of less than 2% on 3-in. Si wafers were obtained. Polycrystalline cubic Pr₂O₃ films were grown on Si(001) substrates, while epitaxial growth of the cubic Pr₂O₃ film was found on a Si(111) substrate. Relatively fine capacitance-voltage curves were obtained for the Al/ALD-Pr oxide/Si(001) capacitors. The interface state density between the 130°C-grown ALD-Pr oxide film and the Si(001) substrate is about 1×10¹¹ cm^−2 eV^−1. The dielectric constant of the ALD-Pr oxide film grown at 250°C was determined to be about 18, assuming that the dielectric constant of the interlayer is similar to that of SiO₂.

DOI： 10.3131/jvsj2.54.110
Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet Reviewed

Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, Masaru Hori

APPLIED PHYSICS EXPRESS 4 ( 2 ) 2011.2

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DOI： 10.1143/APEX.4.026101
Al2O3界面層およびラジカル窒化法によるHigh-k/Ge界面構造および電気的特性の制御

加藤公彦, 京極真也, 坂下満男, 竹内和歌奈, 近藤博基, 中塚理, 財満鎭明

特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”（第16回研究会 55-58 2011.1

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電流検出型原子間力顕微鏡を用いた欠陥に起因するPr酸化膜のリーク電流機構の解明

足立正樹, 加藤雄三, 坂下満男, 竹内和歌奈, 近藤博基, 中塚理, 財満鎭明

特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”（第16回研究会 123-126 2011.1

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Pr酸化膜/Si構造へのAl導入による界面反応抑制効果

古田和也, 竹内和歌奈, 加藤公彦, 坂下満男, 近藤博基, 中塚理, 財満鎭明

特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”（第16回研究会 51-54 2011.1

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Pr酸化膜/PrON/Ge構造におけるPrの化学結合状態が電気的特性に及ぼす影響

加藤公彦, 坂下満男, 竹内和歌奈, 近藤博基, 中塚理, 財満鎭明

特別研究会研究報告“ゲートスタック研究会 -材料・プロセス・評価の物理-”（第16回研究会 99-102 2011.1

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Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N-2-H-2 Mixture Plasmas Reviewed

Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 1 ) 2011.1

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DOI： 10.1143/JJAP.50.01AE03
Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N-2-H-2 Mixture Plasmas Reviewed

Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 50 ( 1 ) 01AE03 2011.1

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DOI： 10.1143/JJAP.50.01AE03
Optical Properties of Evolutionary Grown Layers of Carbon Nanowalls Analyzed by Spectroscopic Ellipsometry Reviewed

Shinji Kawai, Shingo Kondo, Wakana Takeuchi, Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 49 ( 6 ) 060220 2010.6

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DOI： 10.1143/JJAP.49.060220
Formation processes of Ge3N4 films by radical nitridation and their electrical properties Reviewed

Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Shigeaki Zaima

THIN SOLID FILMS 518 ( 6 ) S226 - S230 2010.1

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DOI： 10.1016/j.tsf.2009.10.094
Metal-organic chemical vapor deposition of high-dielectric-constant praseodymium oxide films using a cyclopentadienyl precursor Reviewed

Hiroki Kondo, Shinnya Sakurai, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

APPLIED PHYSICS LETTERS 96 ( 1 ) 012105 2010.1

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DOI： 10.1063/1.3275706
Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units Reviewed

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Akinori Ebe, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

THIN SOLID FILMS 518 ( 3 ) 1006 - 1011 2009.12

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DOI： 10.1016/j.tsf.2009.07.161
Novel method to introduce uniaxial tensile strain in Ge by microfabrication of Ge/Si1-xGex structures on Si(001) substrates Reviewed

Takuya Mizutani, Osamu Nakatsuka, Akira Sakai, Hiroki Kondo, Masaki Ogawa, Shigeaki Zaima

SOLID-STATE ELECTRONICS 53 ( 11 ) 1198 - 1201 2009.11

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DOI： 10.1016/j.sse.2009.08.001
Novel method to introduce uniaxial tensile strain in Ge by microfabrication of Ge/Si1-xGex structures on Si(001) substrates Reviewed

Takuya Mizutani, Osamu Nakatsuka, Akira Sakai, Hiroki Kondo, Masaki Ogawa, Shigeaki Zaima

SOLID-STATE ELECTRONICS 53 ( 11 ) 1198 - 1201 2009.11

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DOI： 10.1016/j.sse.2009.08.001
*Effects of Atomic Layer Deposition-Al2O3 Interface Layers on Interfacial Properties of Ge Metal–Oxide–Semiconductor Capacitors Reviewed

48 ( 5 ) 05DA04 2009.5

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DOI： 10.1143/JJAP.48.05DA04
Nitrogen-Content Dependence of Crystalline Structures and Resistivity of Hf-Si-N Gate Electrodes for Metal-Oxide-Semiconductor Field-Effect Transistors Reviewed

Kazuaki Miyamoto, Kouhei Furumai, Ben E. Urban, Hiroki Kondo, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 48 ( 4 ) 045505 2009.4

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DOI： 10.1143/JJAP.48.045505
Thermal Stability and Scalability of Mictamict Ti-Si-N Metal-Oxide-Semiconductor Gate Electrodes Reviewed

Hiroki Kondo, Kouhei Furumai, Mitsuo Sakashita, Akira Sakai, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 48 ( 4 ) 04C012 2009.4

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DOI： 10.1143/JJAP.48.04C012
Formation of high-density Si nanodots by agglomeration of ultra-thin amorphous Si films Reviewed

Hiroki Kondo, Tomonori Ueyama, Eiji Ikenaga, Keisuke Kobayashi, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

THIN SOLID FILMS 517 ( 1 ) 297 - 299 2008.11

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DOI： 10.1016/j.tsf.2008.08.079
Silicide and germanide technology for contacts and gates in MOSFET applications Invited Reviewed

Shigeaki Zaima, Osamu Nakatsuka, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa

THIN SOLID FILMS 517 ( 1 ) 80 - 83 2008.11

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DOI： 10.1016/j.tsf.2008.08.097
Analysis of Uniaxial Tensile Strain in Microfabricated Ge/Si1-x Gex Structures on Si(001) Substrates

T. Mizutani, O. Nakatsuka, A. Sakai, H. Kondo, S. Zaima

4th International WorkShop on New Group IV Semiconductor Nanoelectronics 2008.9

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Analysis of Uniaxial Tensile Strain in Microfabricated Ge/Si1-x Gex Structures on Si(001) Substrates
MOCVD法によるPr酸化膜の作製およびその電気的特性評価 Invited Reviewed

近藤博基, 櫻井晋也, 酒井朗, 小川正毅, 財満鎭明

信学技報 108 ( 80 ) 71-75 2008.6

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Crystalline and electrical properties of mictamict TiSiN gate metal-oxcide-semiconductor capacitors Reviewed

Kouhei Furumai, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 47 ( 4 ) 2420 - 2424 2008.4

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DOI： 10.1143/JJAP.47.2420
Crystalline and electrical properties of mictamict TiSiN gate metal-oxcide-semiconductor capacitors Reviewed

Kouhei Furumai, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 47 ( 4 ) 2420 - 2424 2008.4

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DOI： 10.1143/JJAP.47.2420
Development of high-density radical source for radical nitridation process in ULSI technology development of high-density radical source for radical nitridation process in ULSI technology Reviewed

H. Kondo, S. Oda, S. Takashima, A. Sakai, M. Ogawa, S. Zaima, M. Hori, S. Den, H. Kano

The International Conference on Plasma-NanoTechnology and Science 2008.3

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Development of high-density radical source for radical nitridation process in ULSI technology development of high-density radical source for radical nitridation process in ULSI technology
Ge基板上に作製したPr酸化膜の評価 Reviewed

坂下満男, 鬼頭伸幸, 加藤亮祐, 近藤博基, 中塚理, 酒井朗, 小川正毅, 財満鎭明

ゲートスタック研究会 -材料・プロセス・評価の物理-（第13回研究会） 2008.1

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窒素ラジカル暴露によるGe(001)表面処理 Reviewed

近藤博基, 藤田美里, 酒井朗, 小川正毅, 財満鎭明

ゲートスタック研究会 -材料・プロセス・評価の物理-（第13回研究会） 2008.1

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ミクタミクトTiSiNゲートMOSキャパシタの結晶構造及び電気的特性の評価 Reviewed

古米孝平, 近藤博基, 坂下満男, 酒井朗, 小川正毅, 財満鎭明

ゲートスタック研究会 -材料・プロセス・評価の物理-（第13回研究会） 2008.1

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Structural and Electrical Properties of Metal-germanide MOS Gate Electrodes Reviewed

H. Kondo, D. Ikeno, Y. Kaneko, M. Sakashita, A. Sakai, M. Ogawa, S. Zaima

The Sixth Pacific Rim Inernational Conference on Advanced Materials and Processing 2007.11

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Structural and Electrical Properties of Metal-germanide MOS Gate Electrodes
シリコン表面の窒化初期過程とエネルギーバンドギャップの形成 Invited Reviewed

近藤博基, 財満鎭明, 堀勝, 酒井朗, 小川正毅

真空 50 ( 11 ) 665 - 671 2007.11

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  Initial stage of processes and energy bandgap formation in nitridation of silicon surfaces using nitrogen radicals have been studied. According to scanning tunneling microscopy observations and scanning tunneling spectroscopy measurements, at the initial stage of nitridation, linear defects perpendicular to dimmer rows were formed to coincide with an initial nitridation reaction preferentially at backbonds of surface Si atoms. After the nitride formation, the surface roughness depends only on substrate temperature regardless of radio frequency (RF) power, which means that the growth mode of nitrides is attributed to the surface migration. Contrary, the energy bandgap of silicon nitrides is significantly affected by not only substrate temperature but also RF power. Absorption and emission spectroscopy results suggest that the contribution of the excited-state nitrogen atoms to the nitridation increases with increasing the RF power. Control of surface migration and radical species is crucial to form the monolayer-thick nitride layer with both an atomically flat surface and a wide energy bandgap.

DOI： 10.3131/jvsj.50.665
Pr-oxide-based dielectric films on Ge substrates Reviewed

M. Sakashita, N. Kito, A. Sakai, H. Kondo, O. Nakatsuka, M. Ogawa, S. Zaima

Extended Abstracts of the 2007 International Conference on Solid State Device and Materials 2007 ( 85 ) 330 - 331 2007.9

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Pr-oxide-based dielectric films on Ge substrates
Surface treatment of Ge(001) surface by radical nitridation Reviewed

H. Kondo, M. Fujita, A. Sakai, M. Ogawa, S. Zaima

Extended Abstracts of the 2007 International Conference on Solid State Device and Materials 2007.9

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Surface treatment of Ge(001) surface by radical nitridation
Development of new high-density radical sources and its application to radical nitridation of Ge surfaces

H. Kondo, S. Oda, S. Takashima, A. Sakai, M. Ogawa, S. Zaima, M. Hori, S. Den, H. Kano

The 20th Symposium on Plasma Science for Materials 2007.6

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Development of new high-density radical sources and its application to radical nitridation of Ge surfaces
Composition dependence of work function in metal (Ni,Pt)-germanide gate electrodes Reviewed

Daisuke Ikeno, Yukihiro Kaneko, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 46 ( 4B ) 1865 - 1869 2007.4

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DOI： 10.1143/JJAP.46.1865
Growth and energy bandgap formation of silicon nitride films in radical nitridation Reviewed

Hiroki Kondo, Keigo Kawaai, Akira Sakai, Masaru Hori, Shigeaki Zaima, Yukio Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 46 ( 1 ) 71 - 75 2007.1

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DOI： 10.1143/JJAP.46.71
パルスレーザー蒸着法によるGe基板上へのPr酸化膜の作製とその構造及び電気的特性評価

鬼頭伸幸, 坂下満男, 酒井朗, 中塚理, 近藤博基, 小川正毅, 財満鎭明

特別研究会研究報告“ゲートスタック研究会 –材料・プロセス・評価の物理-”（第12回研究会） 2007.1

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Strain relaxation of patterned Ge and SiGe layers on Si(001) substrates Reviewed

Shogo Mochizuki, Akira Sakai, Osamu Nakatsuka, Hiroki Kondo, Katsunori Yukawa, Koji Izunome, Takeshi Senda, Eiji Toyoda, Masaki Ogawa, Shigeaki Zaima

SEMICONDUCTOR SCIENCE AND TECHNOLOGY 22 ( 1 ) S132 - S136 2007.1

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DOI： 10.1088/0268-1242/22/1/S31
Pt-germanideゲート電極の結晶構造及び電気的特性の評価”

池野大輔, 古米孝平, 近藤博基, 坂下満男, 酒井朗, 小川正毅, 財満鎭明

特別研究会研究報告“ゲートスタック研究会 –材料・プロセス・評価の物理-”（第12回研究会） 2007.1

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Dislocation structure and strain relaxation of SiGe and Ge sub-micron stripe lines on Si(001) substrates

O. Nakatsuka, S. Mochizuki, A. Sakai, H. Kondo, K. Yukawa, M. Ogawa, S. Zaima

2006.10

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Dislocation structure and strain relaxation of SiGe and Ge sub-micron stripe lines on Si(001) substrates
Interfacial structure of HfON/SiN/Si gate stacks

O. Nakatsuka, M. Sakashita, H. Kondo, E. Ikenaga, M. Kobata, J.-J. Kim, H. Nohira, T. Hattori, A. Sakai, M. Ogawa, S. Zaima

The 2nd International Workshop on Hard X-ray Photoelectron Spectroscopy 2006.9

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Interfacial structure of HfON/SiN/Si gate stacks
Systematic characterization of Ni full silicide in sub-100 nm gate regions

D. Ito, A. Sakai, O. Nakatsuka, H. Kondo, Y. Akasaka, M. Ogawa, S. Zaima

2006.4

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Systematic characterization of Ni full silicide in sub-100 nm gate regions
Study of the gate insulator/silicon interface utilizing soft and hard X-ray photoelectron spectroscopy at Spring-8 Reviewed

T. Hattori, H. Nohira, K. Azuma, K. W. Sakai, K. Nakajima, M. Suzuki, K. Kimura, Y. Sugita, E. Ikenaga, K. Kobayashi, Y. Takata, H. Kondo, S. Zaima

International Journal of High Speed Electronics and Systems 16 ( 1 ) 353 - 364 2006.3

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DOI： 10.1142/S0129156406003680
Initial growth process of TiN films in ultrahigh-vacuum rapid thermal chemical vapor deposition Reviewed

Y Okuda, S Naito, O Nakatsuka, H Kondo, T Okuhara, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 45 ( 1A ) 49 - 53 2006.1

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DOI： 10.1143/JJAP.45.49
Analysis of local breakdown process in stressed gate SiO2 films by conductive atomic force microscopy Reviewed

A Seko, Y Watanabe, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 44 ( 10 ) 7582 - 7587 2005.10

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DOI： 10.1143/JJAP.44.7582
Nanoscale Observations for Degradation Phenomena in SiO_2 and High-k Gate Insulators Using Conductive-Atomic Force Microscopy Reviewed

ZAIMA Shigeaki, SEKO Akiyoshi, WATANABE Yukihiko, SAGO Toshifumi, SAKASHITA Mitsuo, KONDO Hiroki, SAKAI Akira, OGAWA Masaki

Extended abstracts of the ... Conference on Solid State Devices and Materials 2005 236 - 237 2005.9

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Nanoscale Observations for Degradation Phenomena in SiO_2 and High-k Gate Insulators Using Conductive-Atomic Force Microscopy
Fabrication and evaluation of floating gate memories with surface-nitrided Si nanocrystals Reviewed

S Naito, T Ueyama, H Kondo, M Sakashita, A Sakai, M Ogawa, S Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 44 ( 7B ) 5687 - 5691 2005.7

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DOI： 10.1143/JJAP.44.5687
Behavior of local current leakage in stressed gate SiO2 films analyzed by conductive atomic force microscopy Reviewed

A Seko, Y Watanabe, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 43 ( 7B ) 4683 - 4686 2004.7

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DOI： 10.1143/JJAP.43.4683
Detection and characterization of stress-induced defects in gate SiO2 films by conductive atomic force microscopy Reviewed

Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 43 ( 7B ) 4679 - 4682 2004.7

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DOI： 10.1143/JJAP.43.4679
Growth of silicon nanocrystal dots with high number density by ultra-high-vacuum chemical vapor deposition Reviewed

S Naito, M Satake, H Kondo, M Sakashita, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 43 ( 6B ) 3779 - 3783 2004.6

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DOI： 10.1143/JJAP.43.3779
Nanoscale analysis of degradation phenomena in MOS gate insulators using conductive atomic force microscopy

S. Zaima, H. Kondo, M. Sakashita, A. Sakai, Y. Yasuda

2004.6

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Nanoscale analysis of degradation phenomena in MOS gate insulators using conductive atomic force microscopy
Thickness dependence of microscopic current-voltage characteristics in stressed SiO2 films Reviewed

Y. Watanabe, A. Seko, H. Kondo, A. Sakai, S. Zaima, Y. Yasuda

2004.5

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Thickness dependence of microscopic current-voltage characteristics in stressed SiO2 films
Conductive atomic force microscopy analysis for local electrical characteristics in stressed SiO2 gate films Reviewed

Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 43 ( 4B ) 1843 - 1847 2004.4

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DOI： 10.1143/JJAP.43.1843
Microscopic analysis of stress-induced leakage current in stressed gate SiO2 films using conductive atomic force microscopy Reviewed

Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 43 ( 2A ) L144 - L147 2004.2

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DOI： 10.1143/JJAP.43.L144
Local discharging of carriers at nanometer scale defects in gate SiO2 thin films observed by conducting atomic force microscopy

A. Seko, Y. Watanabe, H. Kondo, A. Sakai, S. Zaima, Y. Yasuda

2003.12

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Local discharging of carriers at nanometer scale defects in gate SiO2 thin films observed by conducting atomic force microscopy
Coulomb blockade phenomena in Si metal-oxide-semiconductor field-effect transistors with nano-scale channels fabricated using focused-ion beam implantation Reviewed

H Kondo, K Izumikawa, M Sakurai, S Baba, H Iwano, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 38 ( 12B ) 7222 - 7226 1999.12

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DOI： 10.1143/JJAP.38.7222
Conductance oscillations in low-dimensional ion implanted regions annealed by rapid thermal annealing Reviewed

H Kondo, K Kaga, S Baba, H Iwano, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 38 ( 4A ) 1843 - 1846 1999.4

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DOI： 10.1143/JJAP.38.1843

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Books

New Progress on Graphene Research/Graphene Nanowalls

Mineo Hiramatsu, Hiroki Kondo, Masaru Hori（ Role： Joint author）

InTech 2013.3

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Responsible for pages：担当ページ数：10.5772/3358,Chapter9 Language：English

New Progress on Graphene Research/Graphene Nanowalls
Nucleation and Vertical Growth of Nano-Graphene Sheets

Hiroki Kondo, Masaru Hori, Mineo Hiramatsu（ Role： Joint author）

Intech 2011.9

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Responsible for pages：担当ページ数：21-36 Language：English

Nucleation and Vertical Growth of Nano-Graphene Sheets

Presentations

超高密度60Hz大気圧非平衡プラズマを用いた表面処理技術の開発 International conference

竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

平成22年度成果報告会 2011.3

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Venue：名古屋工業大学 Country：Other
配列カーボンナノウォールの作製 International conference

神田貴幸, 近藤博基, 山川晃司, 竹田圭吾, 石川健治, 平松美根男, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
酸素プラズマによるポーラスSiOCH膜の構造変化機構 International conference

浅野高平, 山本洋, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
非平衡大気圧H2/Arプラズマによる酸化銅還元メカニズム International conference

竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Country：Other
非平衡大気圧プラズマを用いたミドリカビ殺菌におけるテラヘルツ分光センシング International conference

平岡丈弘, 海老塚昇, 竹田圭吾, 太田貴之, 近藤博基, 伊藤昌文, 川瀬晃道, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
非平衡大気圧プラズマにおける活性種の3次元気相反応解析

加藤正規, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
高密度60Hz大気圧プラズマ生成酸素原子絶対密度の空間分布 International conference

Fendong Jia, 竹田圭吾, 石川健治, 加納浩之, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
高温における窒化ガリウム（GaN）のエッチング機構 International conference

米谷亮祐, 陳尚, 蘆翌, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 江川孝志, 天野浩, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
高温エッチングにおける窒化ガリウム（GaN）の表面変性：角度分解X線光電子解析 International conference

盧翌, 陳尚, 米谷亮祐, 石川健治, 近藤博基, 竹田圭吾, 関根誠, 江川孝志, 天野浩, 堀勝

第72回応用物理学会学術講演会 2011.8

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Control of crystalline and electronic structures of carbon nanowalls for their device applications

Kondo H

IEEE Region 10 Annual International Conference, Proceedings/TENCON 2010.12

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Control of crystalline and electronic structures of carbon nanowalls for their device applications
Development and Application of Electron Beam-Excited Plasma System using Hollow Cathode Electron Source

K.Yamakawa, S.Den, S.Takahashi, H.Yamamoto, M.Hori, H.Kondo

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 2010.3

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Development and Application of Electron Beam-Excited Plasma System using Hollow Cathode Electron Source
Dispersive Optical Elements for TMT

N. Ebizuka, K. Ishikawa, H. Kondo, M. Hori, Y. Hirahara, S. Sato, M. Iye

2010.10

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Dispersive Optical Elements for TMT
Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation

Cho K

Ceramic Transactions 2010.9

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Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation
Ni suicide and germanide technology for contacts and metal gates in MOSFET applications

Zaima S

ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings 2007.8

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Ni suicide and germanide technology for contacts and metal gates in MOSFET applications
Electrical properties and bonding structures of germanium nitride/Ge(100) structures formed by radical nitridation

Kondo H

ECS Transactions 2006.12

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Electrical properties and bonding structures of germanium nitride/Ge(100) structures formed by radical nitridation
Strain relaxation of patterned Ge and SiGe layers on Si(001) substrates

Mochizuki S

Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest 2006.12

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Strain relaxation of patterned Ge and SiGe layers on Si(001) substrates
Preparation and evaluation of NiGe gate electrodes for metal-oxide- semiconductor devices

Kaneko Y

Proceedings - Electrochemical Society 2004.12

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Preparation and evaluation of NiGe gate electrodes for metal-oxide- semiconductor devices
超臨界流体を用いた酸化チタン微粒子のカーボン材料への担持 International conference

堀部剛良, 三ツ口真司, 平松美根男, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
Study on mechanism of ultrahigh speed synthesis of high crystallinity nanographene employing in-liquid plasma

H. Kondo, T. Hagino, K. Ishikawa, H. Kano, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Study on mechanism of ultrahigh speed synthesis of high crystallinity nanographene employing in-liquid plasma
Study on precursor adsorption and reaction within SiO2 growth cycle of low temperature plasma-enhanced atomic layer deposition using in-situ ATR-FTIR

Y. Lu, A. Kobayashi, Y. Kim, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Study on precursor adsorption and reaction within SiO2 growth cycle of low temperature plasma-enhanced atomic layer deposition using in-situ ATR-FTIR
Subsequent temporal change of gaseous H and N radical density in H2/N2 plasma after air exposure and its control

T. Suzuki, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Subsequent temporal change of gaseous H and N radical density in H2/N2 plasma after air exposure and its control
Superior properties of carbon nanowalls as cell scaffolds

Y. Okamoto, H. Watanabe, K. Kubo, H. Kondo, N. Kaji, M. Tokeshi, M. Hori, Y. Baba

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Superior properties of carbon nanowalls as cell scaffolds
Surface Analysis of GaN at Elevated Substrate Temperature

Kenji Ishikawa, Ryosuke Kometani, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

10th International Conference on Nitride Semiconductors (ICNS10) 2013.8

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Surface Analysis of GaN at Elevated Substrate Temperature
Temperature measurement of carbon nanowall / silicon substrateusing super-continuum light source on low-coherence interferometry

T. Hiraoka, H. Kato, T. Tsutsumi, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Hori

The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013) 2013.2

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Temperature measurement of carbon nanowall / silicon substrateusing super-continuum light source on low-coherence interferometry
The atmospheric pressure plasmas

H. Kano, K. Takeda, H. Kondo, S. Den, Y. Higashijima, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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The atmospheric pressure plasmas
カーボンナノウォールの核発生制御に関する研究 International conference

塚田僚介, 平松美根男, 近藤博基, 堀勝

応用物理学会ＳＣ東海地区学術講演会２０１３ 2013.11

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カーボンナノウォールの表面化学修飾とナノバイオ応用 International conference

近藤博基, 渡邊均, 石川健治, 関根誠,堀勝, 平松美根男

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
カーボンナノウォールに対する酸素原子及びアルゴンイオンの同時照射効果 International conference

下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
カーボンナノウォールの結晶構造に対するラジカル酸化効果(Ⅱ) International conference

下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
ガスデザインに基づいた高選択絶縁膜エッチングの検討 International conference

宮脇雄大, 浅野高平, 近藤祐介, 竹田圭吾, 田嶋聡美, 近藤博基, 石川健治, 林俊雄, 関根誠, 伊東安曇, 松本裕一, 堀勝

第156回シリコンテクノロジー研究集会 2013.2

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Venue：東京大学本郷キャンパス Country：Other
ナノグラフェン合成中の液中プラズマの分光診断 International conference

安藤睦, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 太田貴之, 伊藤昌文, 平松美根男, 加納浩之, 堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
ハイドロフルオロカーボンプラズマによるArFフォトレジストの低ラフネスエッチング機構 International conference

浅野高平, 宮脇雄大, 石川健治, 関根誠, 伊東安曇, 松本裕一, 竹田圭吾, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
ハイドロフルオロカーボンプラズマによるArFフォトレジストの低ラフネスエッチング機構 International conference

浅野高平, 宮脇雄大, 石川健治, 関根誠, 伊東安曇, 松本裕一, 竹田圭吾, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマCVDを用いて作製したカーボンナノウォールのバイオセンサ特性 International conference

永島三千弥, 渡邊均, 平松美根男, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマCVDを用いて作製したカーボンナノウォールのバイオセンサ特性 International conference

永島三千弥, 渡邊均, 平松美根男, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマによるHとNラジカルの表面損失確率の変化 International conference

鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴（ESR）解析（5） International conference

王浩然, 石川健治, 堀邉英夫, 竹田圭吾, 近藤博基, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
プラズマプロセスによるArFフォトレジスト表面凹凸の解析 International conference

竹内拓也, 石川健治, 節原裕一, 竹田圭吾, 近藤博基, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴（ESR）解析（4） International conference

石川健治, 堀邉英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝, 王浩然

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
プラズマ励気ミスト化学気相成長法を用いた絶縁膜合成 International conference

孫昿達, 竹田圭吾, 近藤博基, 田嶋聡美, 石川健治, 関根誠, 堀勝, 伊藤仁

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマ励気ミスト化学気相成長法を用いた絶縁膜合成 International conference

孫昿達, 竹田圭吾, 近藤博基, 田嶋聡美, 石川健治, 関根誠, 堀勝, 伊藤仁

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の膜構造に対する基板バイアス印加効果 International conference

中村将之, 賈凌雲, 徐達, 近藤博基, 石川健治, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
プラズマ化学気相堆積法を用いたナノグラフェンの核発生によるカーボンナノウォールの選択成長 International conference

塚田僚介, 平松美根男, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマ化学気相堆積法を用いたナノグラフェンの核発生によるカーボンナノウォールの選択成長 International conference

塚田僚介, 平松美根男, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマ医療科学の創成とその展望 International conference

堀勝, 井関紗千子, 田中昌弘, 石川健治, 近藤博基, 竹田圭吾, 関根誠, 中村香江, 林萌美, 梶山広明, 加納浩之, 吉川史隆

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
プラズマ医療科学の創成とその展望 International conference

堀勝, 井関紗千子, 田中昌弘, 石川健治, 近藤博基, 竹田圭吾, 関根誠, 中村香江, 林萌美, 梶山広明, 加納浩之, 吉川史隆

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センターS会場 Country：Other
プラズマ－表面相互作用の実時間その場電子スピン共鳴分光研究 International conference

石川健治, 記念講演, 鷲見直也, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

プラズマエレクトロニクス賞受賞記念講演、平成25年秋季第74回応用物理学会学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
プラズマ－表面相互作用の実時間その場電子スピン共鳴分光研究 International conference

石川健治, 記念講演, 鷲見直也, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

プラズマエレクトロニクス賞受賞記念講演、平成25年秋季第74回応用物理学会学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
プリンタブルエレクトロニクスに向けたプラズマ励起ミスト化学気相堆積技術に関する研究 International conference

孫昿達, 竹田圭吾, 伊藤仁, 近藤博基, 石川健治, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
マイクロ波励起表面波プラズマCVD法を用いたカーボン膜の作製 International conference

加島洋平, 平松美根男, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
マイクロ波励起表面波プラズマCVD法を用いたカーボン膜の作製 International conference

加島洋平, 平松美根男, 近藤博基, 堀勝

第30回プラズマプロセシング研究会 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
ミドリカビ胞子からの実時間その場ESR信号観察 International conference

石川健治, 水野寛子, 田中宏昌, 橋爪博司, 太田貴之, 伊藤昌文, 竹田圭吾, 近藤博基, 関根誠, 堀勝

第66回日本酸化ストレス学会学術集会 2013.6

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Venue：WINCあいち，名古屋 Country：Other
ラジカル注入型プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の結晶構造及びラジカル密度に対するガス流量効果 International conference

徐達,賈凌雲, 中村将之, 近藤博基, 石川健治, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
ラジカル注入型プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の結晶構造及び電気特性に対するボロン注入効果 International conference

賈凌雲, 九鬼淳, 于楽泳, 近藤博基, 石川健治, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
先進プラズマ技術による産業イノベーション International conference

堀勝, 関根誠, 近藤博基, 竹田圭吾

テクノ・フェア名大2013 －工学が挑む新時代の科学・技術－ 2013.9

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Venue：名古屋大学豊田講堂・シンポジオンホール Country：Other
卵巣癌細胞におけるプラズマの抗腫瘍効果とROSの関与 International conference

中村香江, 梶山広明, 内海史, 田中宏昌, 水野正明, 石川健治, 近藤博基, 加納浩之, 堀勝, 吉川史隆

第66回日本酸化ストレス学会学術集会 2013.6

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Venue：WINCあいち，名古屋 Country：Other
塩素ガスプラズマによるGaNエッチングにおける窒素ガス添加の効果 International conference

劉沢セイ, 朴鐘胤, 曹佳棟, 加古隆, 石川健治, 小田修, 竹田圭吾, 近藤博基, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
塩素ガスプラズマによる窒素ガリウムの高温エッチング International conference

米谷亮祐, 陳尚, 曹佳棟, 劉沢せい, 石川健治, 竹田圭吾, 近藤博基, 関根誠, 天野浩, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
塩素ガスプラズマによる窒素ガリウムの高温エッチング International conference

米谷亮祐, 陳尚, 曹佳棟, 劉沢せい, 石川健治, 竹田圭吾, 近藤博基, 関根誠, 天野浩, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
大気圧プラズマを用いたミスト化学気相堆積法によるシリコン酸化膜の低温形成 International conference

孫昿達, 竹田圭吾, 伊藤仁, 近藤博基, 石川健治, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
水素ラジカル注入型プラズマCVDによる微結晶シリコン膜の特性解析 International conference

阿部祐介, 三輪佳大, 福島敦史, 陸雅, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
液中プラズマで合成したナノグラフェンを用いた燃料電池用白金触媒電極の特性評価 International conference

天野智貴, 加納浩之, 竹田圭吾, 近藤博基, 太田貴之, 伊藤昌文, 平松美根男, 石川健治, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
混合ガスプラズマ培養液によるグリオーマ脳腫瘍培養細胞に対する抗腫瘍効果の解析

権田亮, 田中宏昌, 竹田圭吾, 田嶋聡美, 近藤博樹, 石川健治, 関根誠, 加納浩之, 水野正明, 堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
窒化ガリウム（GaN）向けたサファイア基板の周波数領域型低コヒーレンス干渉計による温度計測(Ⅱ) International conference

堤隆嘉, 竹田圭吾, 石川健治, 近藤博基, 太田貴之, 伊藤昌文, 関根誠, 堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
窒素プラズマを用いた化学修飾によるカーボンナノウォールの構造および電気的特性の制御 International conference

趙亨峻, 近藤博基, 石川健治, 関根誠, 平松美根男, 堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
超臨界流体を用いた2 段階担持プロセスによるカーボンナノウォールへのPtナノ微粒子の超高密度担持および粒径分布制御 International conference

堀部剛良, 近藤博基, 加納浩之, 石川健治, 関根誠, 平松美根男, 堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
超臨界流体を用いた２段階担持法によるカーボンナノウォールへの超高密度Pt-Auナノ微粒子担持 International conference

堀部剛良, 近藤博基, 加納浩之, 石川健治, 平松美根男, 関根誠, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
超臨界流体を用いた２段階担持法によるカーボンナノウォールへの超高密度Pt-Auナノ微粒子担持 International conference

堀部剛良, 近藤博基, 加納浩之, 石川健治, 平松美根男, 関根誠, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
電気二重層キャパシタに用いるカーボンナノウォール電極の電気化学評価 International conference

吉田圭祐, 平松美根男, 近藤博基, 堀勝

第30回プラズマプロセシング研究会（SPP-30） 2013.1

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Venue：アクトシティ浜松・研修交流センター S会場 Country：Other
非平衡大気圧プラズマによる先端グリーン・ライフイノベーション International conference

豊田浩孝, 石川健治, 堀勝, 関根誠, 近藤博基, 竹田圭吾

テクノ・フェア名大2013 －工学が挑む新時代の科学・技術－ 2013.9

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Venue：名古屋大学豊田講堂・シンポジオンホール Country：Other
A High Temperature Plasma Etching of GaN and Its Reaction Mechanism

R. Kometani, S. Chen, M. Liu, K. Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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A High Temperature Plasma Etching of GaN and Its Reaction Mechanism
A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism

K. Asano, Y. Miyawaki, K. Ishikawa, M. Sekine, K. Takeda, A. Ito, H. Matsumoto, H. Kondo, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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A reduction of degradation on ArF photoresist by C5HF7 plasma etching and its mechanism
AC励起大気圧プラズマを用いた下水モニタリング装置の開発

J.S KULARATNE, 加納浩之, 伊藤昌文, 太田貴之, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

第５回プラズマ技術産業応用センター（PLACIA）＆プラズマが拓くものづくり研究会(PLAM）国際シンポジウム 2012.10

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Venue：なごやサイエンスパーク、サイエンス交流プラザ大会議室 Country：Other
Advanced Plasma Science and Technologies for Nanostructure Control of Carbon Nanomaterials

Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012 2012.9

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Advanced Plasma Science and Technologies for Nanostructure Control of Carbon Nanomaterials
An in-situ sequential H and N radical exposure process for recovery of plasma-damaged GaN

H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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An in-situ sequential H and N radical exposure process for recovery of plasma-damaged GaN
Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals

Makoto Sekine, Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Toshio Hayashi, Masaru Hori

International Conference on Plasma Science 2012.7

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Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals
Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals

Makoto Sekine, Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Toshio Hayashi, Masaru Hori

International Conference on Plasma Science 2012.7

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Analysis of Photoresist Surface Modified by Fluorocarbon lons and Radicals
Atmospheric Pressure Plasma Processes and their Diagnostics for Life Sciences

Masasu Hori (Plenary, Masahiro Tanaka, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Fumitaka Kikkawa, Kae Nakamura, Moemi Hayashi, Hiroaki Kajiyama, Masaaki Mizuno, Hiroyuki Ohta, Masafumi Ito, Hiroyuki Kano

The 2nd International Symposium for Plasma Biosciences 2012.8

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Atmospheric Pressure Plasma Processes and their Diagnostics for Life Sciences
C5HF7ガスプラズマによるArFフォトレジストの表面ラフネス形成の低減機構 International conference

浅野高平, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 伊東安曇, 松本裕一, 関根誠, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
Change of GaAs Surface Properties by Irradiation of Cl2 Ions

Jongyun Park, Takuya Takeuchi, Jiadong Cao, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Change of GaAs Surface Properties by Irradiation of Cl2 Ions
Comprehensive study of atmospheric pressure plasma

M. Hori, K. Ishikawa, H. Kondo, K. Takeda, M. Tanaka, S. Makoto, T. Ohta, M. Ito

69th IUVSTA Workshop on Oxidation of Organic Materials by Excited Radicals Created in Non-equilibrium Gaseous Plasma 2012.12

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Comprehensive study of atmospheric pressure plasma
Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN)

R. Kometani, S. Chen, J. Park, J. Cao, Y. Lu, K.Ishikawa, K. Takeda, H. Kondo, H. Amano, M. Sekine, M. Hori

59th AVS International Symposium and Exhibition 2012.10

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Control of Surface Properties on Plasma-Etched Gallium Nitride (GaN)
Critical Factors of Synthesis Rate and Crystallinity of Nanographene in Ultrahigh-Speed Nanographene Synthesis Employing Alcohol Plasma

H. Kondo, T. Hagino, K. Ishikawa, H. Kano, M. Sekine, M. Hori

The 4th International Conference on Microelectronics and Plasma Technology 2012.7

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Critical Factors of Synthesis Rate and Crystallinity of Nanographene in Ultrahigh-Speed Nanographene Synthesis Employing Alcohol Plasma
Crystalline and Electrical Properties of Vertically-Laminated Carbon Nanowalls formed by Two-Step Growth Method

H. Kondo, T. Kanda, M. Hiramatsu, K. Ishikawa, M. Sekine, M. Hori

59th AVS International Symposium and Exhibition 2012.10

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Crystalline and Electrical Properties of Vertically-Laminated Carbon Nanowalls formed by Two-Step Growth Method
Edge Termination on Electrical Properties of Vertically-grown Graphene Sheets Employing N2/H2 Mixture Plasma

H. J. Cho, H. Kondo, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

2012 International Conference on Solid State Devices and Materials (SSDM 2012) 2012.9

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Edge Termination on Electrical Properties of Vertically-grown Graphene Sheets Employing N2/H2 Mixture Plasma
Edge and Surface Modification of Nanographenes in Carbon Nanowalls by Hydrogen Peroxide Treatments

H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

The 4th International Conference on Microelectronics and Plasma Technology 2012.7

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Edge and Surface Modification of Nanographenes in Carbon Nanowalls by Hydrogen Peroxide Treatments
Effect of Nitrogen Doping on Photoconductivity of Amorphous Carbon Films Grown by Radical-injection Plasma-enhanced Chemical Vapor Deposition

Leyong Yu, Jun Kuki, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Effect of Nitrogen Doping on Photoconductivity of Amorphous Carbon Films Grown by Radical-injection Plasma-enhanced Chemical Vapor Deposition
Effect of nitrogen doping on photoconductivity of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition International conference

Leyong Yu, Jun Kuki, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

2012.9

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Effect of nitrogen doping on photoconductivity of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition
Effects of Carbon Nanowall Scaffold on HeLa Cell Culture

Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Makoto Sekine, Mineo Hiramatsu, Yoshinobu Baba, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Effects of Carbon Nanowall Scaffold on HeLa Cell Culture
Effects of Edge Termination on Crystalline and Electronic Structures of Carbon Nanowalls by Post-growth Nitrogen Plasma Treatment

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition (E-MRS 2012 FALL MEETING) 2012.9

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Effects of Edge Termination on Crystalline and Electronic Structures of Carbon Nanowalls by Post-growth Nitrogen Plasma Treatment
Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012 2012.9

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Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls
Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

the International Union of Materials Research Society-International Conference in Asia-2012 (IUMRS-ICA-2012) 2012.8

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Effects of Hydrogen Peroxide Treatment on Nanostructures in Carbon Nanowalls
Effects of Hydroxyl Radical on Nanographene Surfaces in Carbon Nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Effects of Hydroxyl Radical on Nanographene Surfaces in Carbon Nanowalls
Effects of Pulse Bias on Crystallographic Properties of Amorphous Carbon Films Grown by Plasma-enhanced Chemical Vapor Deposition

Jun Kuki, Leyong Yu, Hiroki Kondo, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Effects of Pulse Bias on Crystallographic Properties of Amorphous Carbon Films Grown by Plasma-enhanced Chemical Vapor Deposition
Electron Spin Resonance (ESR) observation of radicals on biological organism interacted with plasmas

Ishikawa K

Materials Research Society Symposium Proceedings 2012.12

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Electron Spin Resonance (ESR) observation of radicals on biological organism interacted with plasmas
Electron Spin Resonance (ESR) study of Radicals on Biological Organism Created by Interaction with Plasma

Kenji Ishikawa, Hiromasa Tanaka, Hiroko Moriyama, Sachiko Iseki, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Masaru Hori, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiroyuki Kano

International Conference on Plasma Science 2012.7

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Electron Spin Resonance (ESR) study of Radicals on Biological Organism Created by Interaction with Plasma
Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas, WW-2.6

K. Ishikawa, S. Iseki, H. Moriyama, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

2012 MRS Spring Meeting & Exhibit, Moscone West California 2012.4

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Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas, WW-2.6
Evaluation of Relationship between μC-Si Film Property and Flux Ratio of H Radicals to Film Precursors

2012.10

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Venue：Kyoto University ROHM Plaza, Kyoto, Japan, Country：Other
Fabrication of graphene-based films using remote plasma CVD

Mineo Hiramatsu, Ryosuke Tsukada, Yohei Kashima, Masateru Naito, Hiroki Kondo, Masaru Hori

65th Annual Gaseous Electronics Conference 2012.10

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Fabrication of graphene-based films using remote plasma CVD
Field Electron Emitter Fabricated by Plasma Etching of Organic Material

Toshiya Suzuki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Yuichi Setsuhara, Seiji Shiratani, Makoto Sekine, Masaru Hori

International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012 2012.9

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Field Electron Emitter Fabricated by Plasma Etching of Organic Material
Field Electron Emitter Fabricated by Plasma Etching of Organic Material

Toshiya Suzuki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Yuichi Setsuhara, Seiji Shiratani, Makoto Sekine, Masaru Hori

the International Union of Materials Research Society-International Conference in Asia-2012 (IUMRS-ICA-2012) 2012.8

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Field Electron Emitter Fabricated by Plasma Etching of Organic Material
Formation of 10-nm Organic Pillars by Plasma Etch with Pt particle masks and their Field Emission Properties.

Makoto Sekine, Toshiya Suzuki, Keigo Takeda, Hiroki Kondoi, Kenji Ishikawa, Yuichi Setsuhara, Masaharu Shiratani, Masaru Hori

The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop) 2012.6

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Formation of 10-nm Organic Pillars by Plasma Etch with Pt particle masks and their Field Emission Properties.
GaNにおけるプラズマダメージのラジカル修復（３） International conference

Zecheng Liu, 陳尚, 盧翌, 米谷亮祐, 石川健治, 加納浩之, 竹田圭吾, 近藤博基, 関根誠, 江川孝志, 堀勝, 天野浩

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
Generation Mechanism of Ions and Radicals in CHxFy Etching Plasmas

Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Generation Mechanism of Ions and Radicals in CHxFy Etching Plasmas
Gradual transition of chemical structures at initial growth stage of carbon nanowalls

Hiroki Kondo, Koji Yasuda, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition (E-MRS 2012 FALL MEETING) 2012.9

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Gradual transition of chemical structures at initial growth stage of carbon nanowalls
Healing Process of Plasma-damaged Gallium Nitride (GaN)

Kenji Ishikawa(invite, Shang Chen, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

the 1st International Conference on Emerging Advanced Nanomaterials (ICEAN), 2012.10

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Healing Process of Plasma-damaged Gallium Nitride (GaN)
High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer

Tsutsumi Takayoshi, M. Hori, M. Sekine, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito

The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop) 2012.6

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High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer
High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer

Tsutsumi Takayoshi, M. Hori, M. Sekine, K. Ishikawa, K. Takeda, H. Kondo, T. Ohta, M. Ito

The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop) 2012.6

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High Resolution Temperature Monitoring System of Semiconductor Substrate Using Fourier Domain Low Coherence Interferometer
High performances of microcrystalline Si thin film formation for a solar cell by measurement and control of hydrogen radicals in the SiH4/H2 plasma

Y. Abe, A. Fukushima, Y. Lu, Y. Kim, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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High performances of microcrystalline Si thin film formation for a solar cell by measurement and control of hydrogen radicals in the SiH4/H2 plasma
High-speed synthesis and crystalinity control of nanographene using inliquid plasma in alcohol

M.Hori, H.Kondo, T.Hagino, K.Ishikawa, K.Takeda, H.Kano, M.Sekine

XXI Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases 2012.7

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High-speed synthesis and crystalinity control of nanographene using inliquid plasma in alcohol
Highly Selective Etching of Dielectrics over SiC Film by DC Superposed Dual-Frequency CCP

T. Komuro, K. Takeda, K. Ishikawa, M. Sekine, Y. Ohya, H. Kondo, M. Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Highly Selective Etching of Dielectrics over SiC Film by DC Superposed Dual-Frequency CCP
Highly selective etching of gap-fill dielectrics over SiC and SiN by the dc-bias superposed dual-frequency CCP

T. Komuro, K. Takeda, K. Ishikawa, M. Sekine, Y. Ohya, H. Kondo, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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Highly selective etching of gap-fill dielectrics over SiC and SiN by the dc-bias superposed dual-frequency CCP
Identification of ESR signals arisen from Penicillium digitatum spores-2 International conference

Hiroko Mizuno, Hiroshi Hashizume, Hiromasa Tanaka, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

2012.9

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Identification of ESR signals arisen from Penicillium digitatum spores-2
Impact of Last Reactor Condition to Radical Density in Subsequent H2/N2 plasma and its Control International conference

Toshiya Suzuki, Arkadiusz Malinowski, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yuiti Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

2012.9

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Impact of Last Reactor Condition to Radical Density in Subsequent H2/N2 plasma and its Control
In Situ XPS Analysis of ArF Photoresist Modification Caused by Fluorocarbon Ions and Radicals

T. Takeuchi, S. Amasaki, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012 2012.9

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In Situ XPS Analysis of ArF Photoresist Modification Caused by Fluorocarbon Ions and Radicals
Influence of Last Condition in Plasma Reactor on Gaseous Radical Density

Toshiya Suzuki, Arkadiusz Malinowski, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Influence of Last Condition in Plasma Reactor on Gaseous Radical Density
Interface Trap Generation by VUV/UV Radiation from Fluorocarbon Plasma

M. Fukasawa, Y.Miyawaki, Y. Kondo, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, H. Matsugai, T. Honda, M. Minami, F. Uesawa, M. Hori, T. Tatsumi

59th AVS International Symposium and Exhibition 2012.10

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Interface Trap Generation by VUV/UV Radiation from Fluorocarbon Plasma
Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development

Arkadiusz Malinowski, Makoto Sekine, Masaru Hori, Kenji Ishikawa, Hiroki Kondo, Takuya Takeuchi, Toshiya Suzuki, Andrzej Jakubowski, Lidia Lukasiak

International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012 2012.9

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Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development
Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development

Arkadiusz Malinowski, Makoto Sekine, Masaru Hori, Kenji Ishikawa, Hiroki Kondo, Takuya Takeuchi, Toshiya Suzuki, Andrzej Jakubowski, Lidia Lukasiak

the International Union of Materials Research Society-International Conference in Asia-2012 (IUMRS-ICA-2012) 2012.8

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Investigation of Hydrogen Radical Kinetics during ArF 193nm Photoresist Processing for Ultimate CMOS Technology Development
Investigation of Plasma-Surface Interactions Between Hydrogen Radical and Chemically Amplified Photoresist

A.Malinowski, M. Sekine, M. Hori, K. Ishikawa, H. Kondo, T. Takeuchi, T. Suzuki, A. Jakubowski, L. Lukasiak, D.Tomaszewski

59th AVS International Symposium and Exhibition 2012.10

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Investigation of Plasma-Surface Interactions Between Hydrogen Radical and Chemically Amplified Photoresist
Investigation of modification of ArF photoresist during plasma etching processes

K.Takeuchi, M.Sekine, K.Ishikawa, H.Kondo, K.Takeda, M.Hori

14th Annual TECHCON Conference Technology&Talent for the 21st Century 2012.9

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Investigation of modification of ArF photoresist during plasma etching processes
Low Temperature Deposition and Characteristics of GaN Thin Film by HF-PECVD

Youn Joon Kim, Yi Lu, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Low Temperature Deposition and Characteristics of GaN Thin Film by HF-PECVD
Measurement of SiH3 Radicals in SiH4/H2 Plasma for Silicon Thin-Film Solar Cells International conference

Yusuke Abe, Atsushi Fukushima, Ya Lu, Youn Joon Kim, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

2012.9

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Measuring Metal Elements in Food Products Using Ar Atmospheric Pressure Plasma International conference

Jagath Kularatne, Hiroyuki Kano, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

2012.9

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Measuring Metal Elements in Food Products Using Ar Atmospheric Pressure Plasma
Mechanism and Control of Roughness Formation on ArF Photoresist by C5HF7 Etching Plasma

Kohei Asano, Yudai Miyawaki, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Azumi Ito, Hirokazu Matsumoto, Hiroki Kondo, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Mechanism and Control of Roughness Formation on ArF Photoresist by C5HF7 Etching Plasma
Mechanism of Etching and Generating Active Species in CHxFy Plasma International conference

Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Masaru Hori

2012.9

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Mechanism of Etching and Generating Active Species in CHxFy Plasma
Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis

Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

59th AVS International Symposium and Exhibition 2012.10

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Mechanism of Generating Ions and Radicals in Fluorocarbon Plasma Investigated by Reaction Model Analysis
Mechanism of Generating Ions and Radicals in C3F6O Plasma

Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M.Sekine, M. Hori

The 14th International Workshop on Advanced Plasma Processing and Diagnostics, The 2nd Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2012.1

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Mechanism of Generating Ions and Radicals in C3F6O Plasma
Microcrystal Orientation of Silicon Thin Film Deposited with Hydrogen Radical Injection Plasma Enhanced CVD

Lu Ya, Astushi Fukushima, Yusuke Abe, Youn J. Kim, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Microcrystal Orientation of Silicon Thin Film Deposited with Hydrogen Radical Injection Plasma Enhanced CVD
Modification of ArF Photoresist Caused by Irradiation of Fluorocarbon Plasma-beam

T. Takeuchi, S. Amasaki, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

The 14th International Workshop on Advanced Plasma Processing and Diagnostics, The 2nd Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2012.1

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Modification of ArF Photoresist Caused by Irradiation of Fluorocarbon Plasma-beam
Non-Contact Temperature Measurement of Sapphire Substrate for GaN using Frequency Domain Low Coherence Interferometry

Takayoshi Tsutsumi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Non-Contact Temperature Measurement of Sapphire Substrate for GaN using Frequency Domain Low Coherence Interferometry
Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition

Mineo Hiramatsu, Yuki Nihashi, Hiroki Kondo, Masaru Hori

The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition (E-MRS 2012 FALL MEETING) 2012.9

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Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition
Nucleation mechanism of self-organized vertical nano-graphenes grown using inductively coupled plasma enhanced chemical vapor deposition

R. Tsukada, Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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Nucleation mechanism of self-organized vertical nano-graphenes grown using inductively coupled plasma enhanced chemical vapor deposition
Observation of Plasma-Exposed GaN Surface at High Temperature

Ryosuke Kometani, Shang Chen, Yi Lu, David Cao, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Takashi Egawa, Horishi Amano, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Observation of Plasma-Exposed GaN Surface at High Temperature
Optical Properties of Carbon Nano Walls in Terahertz Frequencies Region

Takehiro Hiraoka, Keigo Takeda, Takayuki Ohta, Noboru Ebitsuka, Hiroki Kondo, Kenji Ishikawa, Kodo Kawase, Masafumi Ito, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Optical Properties of Carbon Nano Walls in Terahertz Frequencies Region
Photon-stimulated surface reaction and generation of damage to hydrogenated silicon nitride in fluorocarbon plasma

M. Fukasawa, H. Matsugai, T. Honda, Y. Miyawaki, Y. Kondo, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, K. Nagahata, F. Uesawa, M. Hori, T. Tatsumi

34th International Symposium on Dry Process (DPS2012) 2012.11

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Photon-stimulated surface reaction and generation of damage to hydrogenated silicon nitride in fluorocarbon plasma
Plasma surface modification of carbon nanowalls for biosensor application

M. Nagashima, T. Maeda, M. Hiramatsu, H. Watanabe, H. Kondo, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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Plasma surface modification of carbon nanowalls for biosensor application
Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ Electron Spin Resonance Measurements

K. Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Taked, H. Kondo, M. Sekine, M. Hori

34th International Symposium on Dry Process (DPS2012) 2012.11

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Plasma-Biological Surface Interaction for Food Hygiene: Real-time in situ Electron Spin Resonance Measurements
Properties of GaAs surface by ion irradiation of chlorine International conference

Jongyun Park, Takuya Takeuchi, Jiadong Cao, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

2012.9

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Properties of GaAs surface by ion irradiation of chlorine
Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas

Kondo yusuke, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, Masaru Hori

The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop) 2012.6

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Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas
Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas

Kondo yusuke, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Keigo Takeda, Hiroki Kondo, Masaru Hori

The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop) 2012.6

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Reaction mechanism of plasma etching using hydrogen-containing fluorocarbon gas
Real time in situ Electron Spin Resonance (ESR) study of Surface Reaction on Polymer Interacted with Plasma

Masaru Hori, Kenji Ishikawa, Naoya Sumi, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Akihiko Kono, Hideo Horibe

International Conference on Plasma Science 2012.7

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Real time in situ Electron Spin Resonance (ESR) study of Surface Reaction on Polymer Interacted with Plasma
Real-time / In-situ Electron Spin Resonance Analysis of Surface Reactions on Organic / Biological Materials Interacted with Plasmas

K. Ishikawa, H. Moriyama, N. Sumi, K. Tamiya, H. Hashizume, T. Ohta, M. Ito, A. Kono, H. Horibe, H. Tanaka, K. Takeda, H. Kondo, M. Sekine, M. Hori

International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012 2012.9

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Real-time / In-situ Electron Spin Resonance Analysis of Surface Reactions on Organic / Biological Materials Interacted with Plasmas
Reconsideration on Effects of H Radicals on Thin Film Surfaces in Plasma Enhanced Chemical Vapor Deposition employing SiH4/H2 Gases

Masaru Hori, Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Young Joon Kim, Makoto Sekine

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Reconsideration on Effects of H Radicals on Thin Film Surfaces in Plasma Enhanced Chemical Vapor Deposition employing SiH4/H2 Gases
Recovery of Plasma-Damaged GaN by Employing Exposure of Radicals

Z. Liu, S. Chen, Y. Lu, R. Kometani, K. Ishikawa, Hiroyuki Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, M. Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Recovery of Plasma-Damaged GaN by Employing Exposure of Radicals
Relationship between Ion Energy and Highly Selective SiO2 Etching Characteristics using C5HF7 Gas International conference

Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Ishikawa Kenji, Azumi Ito, Hirikazu Matsumoto, Makoto Sekine, Masaru Hori

2012.9

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Relationship between Ion Energy and Highly Selective SiO2 Etching Characteristics using C5HF7 Gas
Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma (NEAPP)

S. Iseki, K. Nakamura, M. Hayashi, H. Tanaka, H. Kondo, H. Kajiyama, H. Kano, F. Kikkawa, M. Hori

4th International Conference on Plasma Medicine 2012.6

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Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma (NEAPP)
Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma, WW-2.4

H. Tanaka, S. Iseki, K. Nakamura, M. Hayashi, H. Kondo, H. Kajiyama, H. Kano, F. Kikkawa, M.Hori

2012 MRS Spring Meeting & Exhibit, Moscone West California 2012.4

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Selective Killing of Ovarian Cancer Cells through Induction of Apoptosis by a Nonequilibrium Atmospheric Pressure Plasma, WW-2.4
Selective killing of ovarian cancer cells through induction of apoptosis by a nonequilibrium atmospheric pressure plasma

Tanaka H

Materials Research Society Symposium Proceedings 2012.12

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Selective killing of ovarian cancer cells through induction of apoptosis by a nonequilibrium atmospheric pressure plasma
Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

Tanaka Hiromasa, Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop) 2012.6

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Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma
Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

Tanaka Hiromasa, Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

The 15th Korea-Japan Workshop for Advanced Plasma Processing and Diagnostics (15th K-J Workshop) 2012.6

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Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma
SiH4/H2プラズマ化学気相堆積法におけるHラジカル・成膜前駆体フラックス比とシリコン薄膜膜質の関係性 International conference

福島敦史, 阿部祐介, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝, 陸雅

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

Puurunen R

Sensors and Actuators, A: Physical 2012.12

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Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films
Spectroscopic Determination of Radical Densities in SiH4/H2 Plasma

Yusuke Abe, Atsushi Fukushima, Ya Lu, Youn Joon Kim, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Spectroscopic Determination of Radical Densities in SiH4/H2 Plasma
Studies on Plasma Etching of Si3N4 Employing New Alternative Gas, C5HF7

Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Azumi Ito, Hirokazu Matsumoto, M. Sekine, M. Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Studies on Plasma Etching of Si3N4 Employing New Alternative Gas, C5HF7
Study on reaction mechanism of plasma-enhanced atomic layer deposition of SiO2 using in-situ ATR-FTIR International conference

Yi Lu, Akiko Kobayashi, Youn Joon Kim, Kenji Ishikawa, Hiroki Kond, Makoto Sekine, Masaru Hori

2012.9

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Study on reaction mechanism of plasma-enhanced atomic layer deposition of SiO2 using in-situ ATR-FTIR
Study on synthesis mechanisms of nano-graphene materials employing alcohol in-liquid plasma International conference

2012.9

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Study on synthesis mechanisms of nano-graphene materials employing alcohol in-liquid plasma
Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes

T. Suzuki, A. Malinowski, K. Takeda, H. Kondo, K. Ishikawa, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori

59th AVS International Symposium and Exhibition 2012.10

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Subsequent Temporal Change of Gaseous H and N Radical Density in Plasma after Different Processes
Surface Roughness on Plasma-Etched Gallium Nitride (GaN)

Kenji Ishiwaka, Ryosuke Kometani, Shang Chen, Yi Lu, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

International Union of Materials Research Societies - Internet Conference on Electronic Materials 2012 2012.9

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Surface Roughness on Plasma-Etched Gallium Nitride (GaN)
Temperature measurement of substrate with a thin film using low-coherence interference

Takayoshi Tsutsumi, Takehiro Hiraoka, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

65th Annual Gaseous Electronics Conference 2012.10

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Temperature measurement of substrate with a thin film using low-coherence interference
The Formation of the Insulating Film with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition by Hexamethyldisiloxan Mist

Kuangda Sun, Keigo Takeda, Hiroki Kondo, Satomi Tajima, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Hitoshi Itoh

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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The Formation of the Insulating Film with Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition by Hexamethyldisiloxan Mist
Two-Step Supporting of High-Density Metal Nanoparticle Catalysts on Carbon Nanowalls using Supercritical Fluid

Takeyoshi Horibe, Hiroki Kondo, Hiroyuki Kano, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

the 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) 2012.10

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Two-Step Supporting of High-Density Metal Nanoparticle Catalysts on Carbon Nanowalls using Supercritical Fluid
Vibrational Sum-Frequency-Generation (SFG))Spectroscopic study-2 International conference

Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

2012.9

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Vibrational Sum-Frequency-Generation (SFG))Spectroscopic study-2
「講演奨励賞受賞記念講演」有機材料エッチングによる電界電子放出ナノピラーの作成(II) International conference

Arkadiusz Malinowski, 竹田圭吾, 近藤博基, 石川健治, 節原裕一, 白谷正治, 関根誠, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
カーボンナノウォールのテラヘルツ時間領域分光計測による光学特性評価 International conference

平岡丈弘, 竹田圭吾, 太田貴之, 海老塚昇, 近藤博基, 石川健治, 伊藤昌文, 川瀬晃道, 関根誠, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
カーボンナノウォールの結晶構造に対するラジカル酸化効果 International conference

下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
プラズマからの紫外線照射によるSiNx:H/Si界面準位生成 International conference

深沢正永, 松谷弘康, 本多孝好, 宮脇雄大, 近藤祐介, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 南正樹, 上澤史且, 堀勝, 辰巳哲也

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の膜構造に対するパルスバイアス印加効果 International conference

九鬼淳, 于楽泳, 近藤博基, 関根誠, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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プリンタブルエレクトロニクスに向けた大気圧ミスト化学気相堆積技術の構築 International conference

孫昿達, 竹田圭吾, 近藤博基, 田嶋聡美, 石川健治, 関根誠, 堀勝, 伊藤仁

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
二周波容量結合型プラズマへのDCバイアス重畳によるSiC膜に対する高選択比絶縁膜エッチング International conference

古室達也, 竹田圭吾, 石川健治, 関根誠, 大矢欣伸, 近藤博基, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
次世代天文学観測装置用の新しい回折格子 International conference

海老塚昇, 佐々木実, 青木和光, Andrea Bianco

第37回光学シンポジウム 2012.6

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Venue：東京大学生産技術研究所 An棟コンベンションホール Country：Other
水素ラジカル注入型プラズマ源を用いた微結晶シリコン成膜のRFパワーによる膜質変化 International conference

陸雅, 福島敦史, 阿部祐介, 金淵俊, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
窒化ガリウム（GaN）向けサファイア基板の周波数領域型低コヒーレンス干渉計による温度計 International conference

堤隆嘉, 竹田圭吾, 石川健治, 近藤博基, 太田貴之, 伊藤昌文, 関根誠, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
窒素/水素混合ガスプラズマを用いたグラフェンエッジ化学修飾によるカーボンナノウォールの電気的特性制御 International conference

趙亨峻, 近藤博基, 石川健治, 関根誠, 平松美根男, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Language：Japanese

Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
細胞培養に対するカーボンナノウォール足場の効果 International conference

渡邊均, 近藤博基, 岡本行広, 関根誠, 平松美根男, 堀勝, 馬場嘉信

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
超臨界流体を用いたカーボンナノウォール(CNWs)へのPt, Au微粒子の2段階担持における微粒子相互作用 International conference

堀部剛良, 近藤博基, 加納浩之, 石川健治, 関根誠, 平松美根男, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
高温における窒化ガリウム（GaN）のエッチング機構（3） International conference

米谷亮祐, 陳尚, 曹佳棟, Michael Liu, 石川健冶, 竹田圭吾, 近藤博基, 関根誠, 江川孝志, 天野浩, 堀勝

平成24年秋季第73回応用物理学会学術講演会 2012.9

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Venue：愛媛大学城北地区・松山大学文京キャンパス Country：Other
10 GHzマイクロ波スロット励起大気圧プラズマにおけるプラズマ生成と活性種の挙動に関する研究 International conference

加藤正規, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝, 三好秀典, 久保田雄介, 伊藤仁

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
Advanced Plasma Nanotechnology fir Control Synthesis and Biomedical Applications of Carbon Nanomaterials

HirokiKondo(Invite

NanoMedicine-2011 2011.11

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Advanced Plasma Nanotechnology fir Control Synthesis and Biomedical Applications of Carbon Nanomaterials
Affection of Hydrophilic and Hydrophobic of Carbon Nanowalla Using Plasma Surface Trearment

H.Watanabe, K.Takeda, H.Kondo, M.Hiramatsu, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 2011.3

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Affection of Hydrophilic and Hydrophobic of Carbon Nanowalla Using Plasma Surface Trearment
Ar Flow Rate Dependence of Emission Intensity of Metal Atoms in Atmospheric Pressure Atomization Plasma International conference

2011.8

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Ar Flow Rate Dependence of Emission Intensity of Metal Atoms in Atmospheric Pressure Atomization Plasma
Area-selective of Carbon Nanowalls by Using Catalyzed Substrate

Y.Nihashi, M.Hiramatsu, H.Kondo, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Area-selective of Carbon Nanowalls by Using Catalyzed Substrate
Atom Behaivior of Ultrahigh Density 60 Hz Atmospheric Pressure Plasma under Ar ambient Conditions International conference

F.Jia, K.Takeda, K.Ishikawa, H.Kano.H.Kondo, M.sekine, M.Hori

2011.10

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Atom Behaivior of Ultrahigh Density 60 Hz Atmospheric Pressure Plasma under Ar ambient Conditions
Behavior of radicals in SiH4/H2 plasma for fabrication of solar cell using silicon thin film

Y.Abe,A.Fukushima, Y.Lu, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

64thAnnualGaseouselectronicsConference 2011.11

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Behavior of radicals in SiH4/H2 plasma for fabrication of solar cell using silicon thin film
C3F6/O2プラズマ中のイオン・ラジカルの生成機構 International conference

近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 林俊雄, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
C3F6O代替ガスを用いた絶縁膜の高速エッチングとその機構解明(II) International conference

近藤祐介, 宮脇雄大, 竹田圭吾, 石川健治, 近藤博基, 林俊雄, 関根誠, 岡本秀一, 堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
C5HF7 Chemistry for Highly Selective Etch of SiO2 over Si

Y.Miyawaki, Y.Kondo, H.yamamoto, K.Takeda, K.Ishikawa, A.yamazaki, A.Ito, H.Matsumoto, M.sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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C5HF7 Chemistry for Highly Selective Etch of SiO2 over Si
C5HF7/O2/ArプラズマによるArfレジスト表面ラフネス発生抑制機構 (II) International conference

浅野高平, 山本洋, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝, 山崎敦代, 伊藤安曇, 松本裕一

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
CH4/H2プラズマを用いて成長したカーボンナノウォールの結晶構造及び電気的特徴 International conference

趙亨峻, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

2011.11

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Venue：石川県立音楽堂 Country：Other
CH4/H2プラズマを用いて成長したカーボンナノウォールにおける電気伝導度の温度依存性 International conference

趙亨峻, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
CH4/H2プラズマを用いて成長したカーボンナノウォールにおける電気的特性 International conference

趙亨峻, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
Carbon nanowalls: growth mechanism and nucleation control

Invited, M. Hiramatsu, H. Kondo, M. Hori

International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2011) 2011.8

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Carbon nanowalls: growth mechanism and nucleation control
Carbon nanowalls:synthesis and application

Mineo Hiramatsu, Hiroki Kondo, Masaru Hori(Invited

4th International conference on advanced plasma technologies, 2011.9

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Carbon nanowalls:synthesis and application
Chemical Modeling of Etch Process Using C3F6O Alternative Gas

Y. Kondo, Y. Miyawaki, K. Takeda, K. Ishikawa, H. Kondo, T. Hayashi, H. Okamoto, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Chemical Modeling of Etch Process Using C3F6O Alternative Gas
Chemical Modeling of Etch Process Using C3F6O Alternative Gas

Y. Kondo, Y. Miyawaki, K. Takeda, K. Ishikawa, H. Kondo, T. Hayashi, H. Okamoto, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Chemical Modeling of Etch Process Using C3F6O Alternative Gas
Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy International conference

K. Yasuda, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori

2011.7

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Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy
Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy International conference

K. Yasuda, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori

2011.7

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Chemical structures of initial growth surfaces of carbon nanowalls by angle-resolved X-ray photoelectron spectroscopy
Control of Bridging Growth and Electrical properties of Single Carbon Nanowalls

T. Kanda, H. Kondo, K. Yamakawa, M. Hiramatsu, K. Takeda, K. Ishikawa, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science, 2011.3

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Control of Bridging Growth and Electrical properties of Single Carbon Nanowalls
Controlled Synthesis of Carbon Nanowalls and their Characterization Employing Synchrotron X-ray

HirokiKondo

BIT's1stAnnual World Congress of Nano-S&T, 2011.10

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Controlled Synthesis of Carbon Nanowalls and their Characterization Employing Synchrotron X-ray
Controlled Synthesis of Carbon Nanowalls for Functional Device Applications

Hiroki Kondo, Masaru Hori, Makoto Sekine, Mineo Hiramatsu(Invited

4th International conference on advanced plasma technologies, 2011.9

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Controlled Synthesis of Carbon Nanowalls for Functional Device Applications
Crystallinity Control of Microcrystalline Silicon film Employing Hydrogen Radical-injection Plasma-enhanced Chemical Vapor Deposition

S.Kawashima, Y.Abe, K.Takeda, K.ishikawa, H.Kondo, M.sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Crystallinity Control of Microcrystalline Silicon film Employing Hydrogen Radical-injection Plasma-enhanced Chemical Vapor Deposition
Crystallographic Analysis of Amorphous Carbon Films Synthesized by Radical-injection Plasma-enhanced Chemical Vapor Deposition International conference

L.Yu,J.Kuki, K.Takeda, H.Kondo, K.ishikawa, M.Sekine, M.Hori

2011.10

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Crystallographic Analysis of Amorphous Carbon Films Synthesized by Radical-injection Plasma-enhanced Chemical Vapor Deposition
Crystallographic and Electrical Properties of Semiconducting Graphene Nanoribbon Grown Employing CH4/H2 plasma

H.J.Cho, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

2011SSDM 2011.9

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Crystallographic and Electrical Properties of Semiconducting Graphene Nanoribbon Grown Employing CH4/H2 plasma
DCバイアス重畳二周波容量結合型プラズマの電子密度空間分布計測 International conference

古室達也, 竹田圭吾, 石川健治, 関根誠, 大矢欣伸, 近藤博基, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
Deep Level Defect in GaN after Plasma Beam Etching

S.Chen,R.Kometani, K.Ishikawa, H.Kondo, K.Takeda, H.Kano, Y.Tokuda, M.sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Deep Level Defect in GaN after Plasma Beam Etching
Determination of C Atom Density in Microwave Plasma with Carbon-Containing Gases by Vacuum Ultraviolet Absorption Spectroscopy

K.Murata, M.Naito, M.Hiramatsu, S.Takashima, H.Kondo, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Determination of C Atom Density in Microwave Plasma with Carbon-Containing Gases by Vacuum Ultraviolet Absorption Spectroscopy
Development of radical kinetic behaivour investigation method and its application for sticking coefficient estimation

A.Malinowski, M.Hori, M.Sekine, K.Ishikawa, H.Kondo, K.Takeda

ESSDERC2011 2011.9

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Development of radical kinetic behaivour investigation method and its application for sticking coefficient estimation
Diagnostics and Surface Reaction Analysis on RF Sputtering Process for Co Nanoparticles Formation

I-S Bae, K. Kuno, M. Ito, H. Kondo, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science, 2011.3

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Diagnostics and Surface Reaction Analysis on RF Sputtering Process for Co Nanoparticles Formation
Effect of Hydrogen Radical Injection on Growth Property and Crystallinity of Microcrystalline Silicon Thin Film

Y.Abe,A.Fukushima, Y.Lu, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

2011SSDM 2011.9

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Effect of Hydrogen Radical Injection on Growth Property and Crystallinity of Microcrystalline Silicon Thin Film
Effects of Argon Flow Rate on the Atomic Emission Process of Cu Solution in Atmospheric Pressure Plasma

J.Kularatne, H.Kano, M.Ito, T.Ohta, K.Takeda, H.Kondo, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Effects of Argon Flow Rate on the Atomic Emission Process of Cu Solution in Atmospheric Pressure Plasma
Effects of Oxgen Radical Irradiation on Crystalline Structures of Carbon Nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Hiramatsu Mineo, Makoto Sekine, Masaru Hori

the 13 th international workshop on Advanced Plasma Processing and Diagnostics 2011.7

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Effects of Oxgen Radical Irradiation on Crystalline Structures of Carbon Nanowalls
Effects of RF Bias on Structural Properties of Amorphous Carbon Films Grown by Plasma-Enhanced Chemical Vapor Deposition

J.Kuki, L.Yu.H.Kondo, K.Ishikawa, M.Sekine, M.Hori

ICTF-15 2011.11

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Effects of RF Bias on Structural Properties of Amorphous Carbon Films Grown by Plasma-Enhanced Chemical Vapor Deposition
Effects of Substrate Temperatures on Crystallographic Changes of Carbon Nanowalls Induced by radical Irradiation

H.Shimoeda, H.Kondo, K.Taakeda, K.Ishikawa, M.Hiramatsu, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Effects of Substrate Temperatures on Crystallographic Changes of Carbon Nanowalls Induced by radical Irradiation
Electric and Crystallographic Structures of Carbon Nanowalls

HirokiKondo,HyungJunCho, TakayukiKanda, MasaruHori,MineoHiramatsu

2011MRS Fall Meeting 2011.11

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Electric and Crystallographic Structures of Carbon Nanowalls
Electrical and Chemical Structures of Nanographene Nucleated at Initial Growth Processes of Carbon Nanowalls

K. Yasuda, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Electrical and Chemical Structures of Nanographene Nucleated at Initial Growth Processes of Carbon Nanowalls
Electron-SpinResonance(ESR)Analyisis of Plasma-SurfaceInteraction International conference

Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

The 24th Symposium on PlasmaSciencefor Materials(SPSM-4) 2011.7

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Electron-SpinResonance(ESR)Analyisis of Plasma-SurfaceInteraction
Evalutaion of Penicillium digitatum sterilization using non-equilibrium atmospheric pressure plasma by terahertz time-domain spectroscopy

T.Hiraoka, N.Ebizuka, K.Takeda, T.Ohta, H.Kondo, K.Ishikawa, K.Kawase, M.Ito, M.Sekine, M.Hori

64thAnnualGaseouselectronicsConference 2011.11

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Evalutaion of Penicillium digitatum sterilization using non-equilibrium atmospheric pressure plasma by terahertz time-domain spectroscopy
Fabrication and Electrical Conductivity Measurements of Single Carbon Nanowall Bridging between Metal Eectrodes

T.Kanda, K.Yamakawa, H.Kondo, M.Hiramatsu, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Fabrication and Electrical Conductivity Measurements of Single Carbon Nanowall Bridging between Metal Eectrodes
Fabrication of Carbon Nanowalls on Carbon Fiber Paper

S.Mitsuguchi, M.Hiramatsu, H.Kondo, M.Hori, H.Kano

2011SSDM 2011.9

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Fabrication of Carbon Nanowalls on Carbon Fiber Paper
Fabrication of High-Crystallinity and low-Defect-Density Microcrystalline Silicon Thin Film Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition International conference

Yusuke Abe, Sho Kawashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

The 24th Symposium on PlasmaSciencefor Materials(SPSM-4) 2011.7

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Fabrication of High-Crystallinity and low-Defect-Density Microcrystalline Silicon Thin Film Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition
Fabrication of carbon nanotubes from camphor using atmospheric pressure plasma-enhanced CVD

K. Murata, M. Hiramatsu, K. Yamakawa, H. Kondo, M. Hori

22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides (Diamond 2011) 2011.9

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Fabrication of carbon nanotubes from camphor using atmospheric pressure plasma-enhanced CVD
Field Emission Properties of 10-nm Pillars of Organic Fabricated by Pt particles and Plasma Etching

T.Suzuki, K.Takeda, H.Kondo, K.Ishikawa, Y.Setsuhara, M.Shiratani, M.Sekine, M.Hori

2011SSDM 2011.9

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Field Emission Properties of 10-nm Pillars of Organic Fabricated by Pt particles and Plasma Etching
Formation of Ultrahigh Density TiO2 Nanoparticles Supporting on Carbon Nanowalls Employing Supercritical Fluid Chemical Fluid Deposition

T.Horibe, S.Mitsuguchi, M.Hiramatsu, H.Kondo, M.Sekine, M.Hori

ICTF-15 2011.11

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Formation of Ultrahigh Density TiO2 Nanoparticles Supporting on Carbon Nanowalls Employing Supercritical Fluid Chemical Fluid Deposition
GaNにおけるプラズマダメージの水素ラジカル修復 International conference

陳尚盧, 翌, 米谷亮祐, 竹田圭吾, 石川健治, 近藤博基, 加納浩之, 徳田豊関根誠, 江川孝志, 天野浩, 堀勝

第72回応用物理学会学術講演会 2011.8

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Gas Phase Reaction of Activated Species in O2/Ar Nonequilibrium Atmospheric Pressure Plasma

M. Kato, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science, 2011.3

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Gas Phase Reaction of Activated Species in O2/Ar Nonequilibrium Atmospheric Pressure Plasma
Gas phase and surface reactions of radicals in plasma-enhanced chemical vapor deposition processes for thin-film silicon solar cell

H.Kondo(in

2nd International Workshop on Plasma Nano-Interfaces and Plasma Characterization 2011.3

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Gas phase and surface reactions of radicals in plasma-enhanced chemical vapor deposition processes for thin-film silicon solar cell
Growth of Carbon Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition Employing Camphor International conference

Yuki Nihashi, Mineo Hiramatsu, HirokiKondo, MasaruHori

The 24th Symposium on PlasmaSciencefor Materials(SPSM-4) 2011.7

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Growth of Carbon Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition Employing Camphor
Growth of Carbon Nanowalls using Inductively Coupled Plasma-Enhanced Cheemical Vapor Deposition on Carbon Fiber Paper International conference

Shinji Mitsuguchi, Mineo Hiramatsu, Hiroki Kondo, Masaru Hori

The 24th Symposium on PlasmaSciencefor Materials(SPSM-4) 2011.7

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Growth of Carbon Nanowalls using Inductively Coupled Plasma-Enhanced Cheemical Vapor Deposition on Carbon Fiber Paper
Growth of carbon nanowalls on carbon paper for fuel cell electrode

S. Mitsuguchi, Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides (Diamond 2011) 2011.9

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Growth of carbon nanowalls on carbon paper for fuel cell electrode
Growth of two-dimensional carbon nanostructures using plasma-enhanced chemical vapor deposition employing camphor

Y. Nihashi, T. Maeda, M. Hiramatsu, H. Kondo, M. Hori

22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides (Diamond 2011) 2011.9

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Growth of two-dimensional carbon nanostructures using plasma-enhanced chemical vapor deposition employing camphor
Growth processes and crystallographic properties of nanographenes synthesized employing in-liquid plasma

HirokiKondo

ICMAP2011 2011.7

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Growth processes and crystallographic properties of nanographenes synthesized employing in-liquid plasma
High Performance of 60-Hz Atmospheric Pressure Plasma: Basic Characteristics and Applications

F.Jia, K.Takeda, K.Ishikawa, H.Inui, S.Iseki, H.Kano, H.Kondo, M.Sekine, M.Hori

AVS58thINternationalSymposium&Exhibition 2011.10

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High Performance of 60-Hz Atmospheric Pressure Plasma: Basic Characteristics and Applications
High Temprerature N2 Plasma Induced Stoichiometric Modification In Etched GaN Surface Using Angle-resolved XPS Depth Profiling Analysis International conference

Y.Lu, S.Chen, R.Kometani, K.Ishikawa, H.Kondo, K.Takeda, M.Sekine, T.Egawa, H.Amano, M.Hori

2011.10

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High Temprerature N2 Plasma Induced Stoichiometric Modification In Etched GaN Surface Using Angle-resolved XPS Depth Profiling Analysis
Higly Spatial Mapping of Atomic Oxgen Dentisy in a 60-Hz Atmospheric Pressure Plasmas Using Clibrated two-Photon Laser-Induced Fluorescence

Fengdong Jia, Keigo Takeda, Kenji Ishikawa, Hiroyuki Kano, Hiroki Kondo, Makoto Sekine, Masaru Hori

AEPSE2011 2011.9

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Higly Spatial Mapping of Atomic Oxgen Dentisy in a 60-Hz Atmospheric Pressure Plasmas Using Clibrated two-Photon Laser-Induced Fluorescence
In Situ Analysis of Plasma-Induced Modification on Porous SiOCH Films

H.Yamamoto, K.Asano, K.Ishikawa, K.Takeda, H.Kondo, M.Sekine, M.Hori

2011SSDM 2011.9

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In Situ Analysis of Plasma-Induced Modification on Porous SiOCH Films
In situ ESR Masurements for revealing Plasma-Surface Interactions

KenjiIshikawa,NaoyaSumi, AkihikoKono, HideoHoribe, KeigoTakeda, HirokiKondo, MakotoSekine, MasaruHori

AEPSE2011 2011.9

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In situ ESR Masurements for revealing Plasma-Surface Interactions
In situ XPS Analysis of Surface Modification on ArF Photoresist by Fluorocarbon Plasma Beams

T.Takeuchi, S.Amasaki, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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In situ XPS Analysis of Surface Modification on ArF Photoresist by Fluorocarbon Plasma Beams
In-situ Analysis of Modification on Porous SiOCH During and After O2 Plasmas

K.Asano, H.Yamamoto, K.Ishikawa, K.Takeda, H.Kondo, M.Sekine, M.Hori

ADMETA Plus 2011 2011.9

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In-situ Analysis of Modification on Porous SiOCH During and After O2 Plasmas
In-situ FTIR Analysis of Porous Low-k Film Exposed to O2 Plasma

K.Asano, H.yamamoto, K.Takeda, K.ishikawa, H.Kondo, M.sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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In-situ FTIR Analysis of Porous Low-k Film Exposed to O2 Plasma
In-situ FTIRを用いたプラズマ曝露および大気曝露によるポーラスSiOCH low-k膜の化学組成変化解析 International conference

山本洋, 浅野高平, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
In-situX線光電子分光法によるGaNをプラズマビームの相互作用解明 International conference

米谷亮祐, 陳尚, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 節原裕一, 江川孝志, 天野浩, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Inhibition of roughness formation on 193 nm photoresist during C5HF7/O2/Ar plasma etching

K.Asano, H.Yamamoto, Y.Miyawaki, K.Takeda, H.Kondo, K.Ishikawa, A.Yamazaki, A.Ito, H.Matsumoto, M.Sekine, M.Hori

DPS2011 2011.11

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Inhibition of roughness formation on 193 nm photoresist during C5HF7/O2/Ar plasma etching
Interaction of Gallium Nitride(GaN)Surface with chlorine Plasma Beams Analyzed by In-situ XPS

R.Kometani, S.Chen, K.ishikawa, H.Kondo, K.takeda, M.Sekine, H.Amano, Y.Setsuhara, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Interaction of Gallium Nitride(GaN)Surface with chlorine Plasma Beams Analyzed by In-situ XPS
Investigation of GaN Exposed to Plasma at High Temperature

R.Kometani, S.Chen.Y.Lu, K.Ishikawa, K.Takeda, H.Kondo, T.egawa, H.Amano, M.Sekine, M.Hori

DPS2011 2011.11

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Investigation of GaN Exposed to Plasma at High Temperature
Investigation of Si Etch Reaction with F and O Radicals Using SF6/O2 Plasma

S. Amasaki, T. Takeuchi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori, N. Sakurai, H. Hayashi, I. Sakai, T. Ohiwa

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Investigation of Si Etch Reaction with F and O Radicals Using SF6/O2 Plasma
Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis

A. Malinowski, M. Sekine, M. Hori, K. Ishikawa, H. Kondo, T. Suzuki, T. Takeuchi, H. Yamamoto, A. Jakubowski, L. Lukasiak

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis
Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis

A. Malinowski, M. Sekine, M. Hori, K. Ishikawa, H. Kondo, T. Suzuki, T. Takeuchi, H. Yamamoto, A. Jakubowski, L. Lukasiak

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Investigation of Surface Reactions in ArF Photoresist by Using Parallel Plate Structure in Conjunction with Numerical Analysis
Investigation of mechanism at sidewall of through Si via(TSV)etching induced by SF6/O2plasma

S.Amasaki, T.Takeuchi, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori, N.Sakurai, H.Hayashi, I.Sakai, T.Ohiwa

DPS2011 2011.11

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Investigation of mechanism at sidewall of through Si via(TSV)etching induced by SF6/O2plasma
Measurement of Atomic Oxygen in Ultrahigh Density 60 Hz Atmospheric Pressure Plasma by Two Photon Absorption Laser Induced Fluorescence

F. Jia, K. Takeda, K. Ishikawa, H. Inui, S. Iseki, H. Kano, H. Kondo, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Measurement of Atomic Oxygen in Ultrahigh Density 60 Hz Atmospheric Pressure Plasma by Two Photon Absorption Laser Induced Fluorescence
Measurement of Optical Properties of Carbon-based Material Using Terahertz Time domain Spectroscopy

T.Hiraoka, K.Takeda, K.Ishikawa, H.Kondo, M.Ito, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Measurement of Optical Properties of Carbon-based Material Using Terahertz Time domain Spectroscopy
Measurement of the Electron Temperature and Density of 60 Hz Nonequikibrium Atmospheric Pressure Plasma Jet by Laser Thomson Scattering

F.Jia, N.Sumi, K.Ishikawa, H.Kano, H.Inui, K.Takeda, H.Kondo, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Measurement of the Electron Temperature and Density of 60 Hz Nonequikibrium Atmospheric Pressure Plasma Jet by Laser Thomson Scattering
Measuring Metal Elements in Wastewater Using Ar Atmospheric Pressure Plasma International conference

2011.3

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Mechanism of highly Selective SiO2 Etching over Si using New Alternative Gas,C5HF7

Y.Miyawaki, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori, A.Yamazaki, A.Ito, H.Matsumoto

64thAnnualGaseouselectronicsConference 2011.11

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Mechanism of highly Selective SiO2 Etching over Si using New Alternative Gas,C5HF7
Modeling of C3F6O/Ar Plasma Chemical for SiO2 Etching Processes

Y.Kondo, Y.Miyawaki, K.Takeda, K.Ishikawa, H.Kondo, T.Hayashi, M.Sekine, M.Hori

DPS2011 2011.11

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Modeling of C3F6O/Ar Plasma Chemical for SiO2 Etching Processes
Modeling of C3F6O/Ar Plasma Chemistry for SiO2 Etching Processes

Yusuke Kondo, Yudai Miyawaki, Keigo Takeda, KenjiIshikawa, ToshioHayashi

AEPSE2011 2011.9

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Modeling of C3F6O/Ar Plasma Chemistry for SiO2 Etching Processes
Nitogen Radical Annealing recovery of Etch-Induced-Damage on GaN

K.Ishikawa, S.Chen, R.Kometani, H.Kondo, K.Takeda, H.Kano, Y.Tokuda, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Nitogen Radical Annealing recovery of Etch-Induced-Damage on GaN
Novel Gratings for Subaru Telescope, TMT and E-ELT

N. Ebizuka, K. Ishikawa, H. Kondo, M. Hori

2011.1

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Novel Gratings for Subaru Telescope, TMT and E-ELT
Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD

Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD
Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD

Y. Nihashi, M. Hiramatsu, H. Kondo, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Nucleation Control of Carbon Nanowalls Grown Using Inductively Coupled Plasmaenhanced CVD
O Radical Measurement in Penicillum Digitatum Inactivation Using Non-equilibrium Atmospheric O2/Ar Plasma

S.Iseki, T.Ohta, M.Ito, H.Kano, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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O Radical Measurement in Penicillum Digitatum Inactivation Using Non-equilibrium Atmospheric O2/Ar Plasma
Passivation of Plasma Damaged GaN with Hydrogen Radical Anneal

Sh. Chen, Y. Lu, R. Kometani, K. Takeda, K. Ishikawa, H. Kondo, H. Kano, Y. Tokuda, M. Sekine, Y. Setsuhara, T. Egawa, H. Amano, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Passivation of Plasma Damaged GaN with Hydrogen Radical Anneal
Plasma Nano-Technologies for Fabrications of VPH Grating,Quasi-Bragg Grating and Novel Immersion Grating

N.Ebizuka, H.Kondo, K.Ishikawa, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Plasma Nano-Technologies for Fabrications of VPH Grating,Quasi-Bragg Grating and Novel Immersion Grating
Plasma-Induced Damage of GaN and Its Recovery by Atomic Hydrogens at a Room Temperature

Y.Lu, S.Chen, R.Kometani, K.Takeda, H.Kondo, T.Egawa, K.Ishikawa, H.Amano, M.Sekine, M.Hori

2011SSDM 2011.9

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Plasma-Induced Damage of GaN and Its Recovery by Atomic Hydrogens at a Room Temperature
PolymerSurfaceModification:Real-time In Situ Electron Spin Resonance Study for Plasma Processes

K.Ishikawa, N.Sumi, A.Kono, H.Horibe, K.Takeda, H.Kondo, M.Sekine, M.Hori

AVS58thINternationalSymposium&Exhibition 2011.10

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PolymerSurfaceModification:Real-time In Situ Electron Spin Resonance Study for Plasma Processes
Radical Flux Modeling and Analysis for Sticking Coefficient Evaluation

Mailnowski, M.Hori, M.Sekine, K.Ishikawa, H.Kondo, H.yamamoto, T.Takeuchi, T.Suzuki, A.jakubowski, L.Lukasiak

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Radical Flux Modeling and Analysis for Sticking Coefficient Evaluation
Radical density measurements in microwave plasma with carbon-containing gases used for carbon nanotube and nanocrystalline diamond film growth

M. Hiramatsu, H. Kondo, M. Hori

20th International Symposium on Plasma Chemistry 2011.7

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Radical density measurements in microwave plasma with carbon-containing gases used for carbon nanotube and nanocrystalline diamond film growth
Real-time Electron-Spin-Resonance Study of Plasma-Surface interaction

Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

the 13 th international workshop on Advanced Plasma Processing and Diagnostics 2011.7

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Real-time Electron-Spin-Resonance Study of Plasma-Surface interaction
Real-time/In-situ Electron-Spin-Resonance Analysis of Surface Reactions on Organic Materials in Plasma Processes

N. Sumi, K. Ishikawa, A. Kono, H. Horibe, K. Takeda, H. Kondo, M. Sekine, M.Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Real-time/In-situ Electron-Spin-Resonance Analysis of Surface Reactions on Organic Materials in Plasma Processes
Real-time/In-situ electron spin resonance analysis of surface reactions on organic materials with atomic hydrogen irradiation

N.Sumi, K.Ishikawa, A.Kono, H.HOribe, K.Takeda, H.Kondo, M.sekine, M.Hori

DPS2011 2011.11

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Real-time/In-situ electron spin resonance analysis of surface reactions on organic materials with atomic hydrogen irradiation
Recovery of plasma-damaged GaN by atomic nitrogen hiydrogen

Shang Chen,Yi Lu, Ryousuke Kome, Konji,Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Masaru Hori

the 13 th international workshop on Advanced Plasma Processing and Diagnostics 2011.7

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Recovery of plasma-damaged GaN by atomic nitrogen hiydrogen
Relationship between aradicals in Gas Phase and film Property of Silicon Thin Films in SiH4/H2PlasmaCVD

A.Fukushima, Y.Abe, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

ICTF-15 2011.11

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Relationship between aradicals in Gas Phase and film Property of Silicon Thin Films in SiH4/H2PlasmaCVD
Room Temperature Radical Annealing of Plasma Damaged

S.Chen,Y.Lu, K.Takeda, K.Ishikawa, H.Kondo, H.Kano, H.Amano, Y.Tokuda, T.Egawa, M.sekine, M.Hori

AVS58thINternationalSymposium&Exhibition 2011.10

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Room Temperature Radical Annealing of Plasma Damaged
SF6/O2プラズマを用いたSiエッチング機構 International conference

尼崎新平, 竹内拓也, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
SF6/O2プラズマを用いたSiエッチング機構III International conference

尼崎新平, 竹内拓也, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝, 櫻井典子, 林久貴, 酒井伊都子, 大岩徳久

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
SF6/O2プラズマを用いたSiエッチング機構II International conference

尼崎新平, 竹内拓也, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝, 櫻井典子, 林久貴, 酒井伊都子, 大岩徳久

2011年春季第58回応用物理学関係連合講演会 2011.3

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STS Observation of Local Density of States on Growth Surface at an Initial Stage of Carbon Nanowall Synthesis

K.Yasuda, H.Kondo, M.Hiramatsu, M.sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 2011.3

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STS Observation of Local Density of States on Growth Surface at an Initial Stage of Carbon Nanowall Synthesis
SiH4/H2プラズマ化学気相堆積法における気相ラジカルとシリコン薄膜の膜質との関係性 International conference

福島敦史, 阿部佑介, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

第３回薄膜太陽電池セミナー 2011.10

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SiH4/H2プラズマにおける水素多事狩る表面損失確率 International conference

阿部祐介, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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SiH4/H2プラズマ化学気相堆積法における気相ラジカルとシリコン薄膜結晶性の関係性 International conference

福島敦史, 阿部祐介, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
SiNx:H膜エッチングに及ぼす紫外線の影響 International conference

深沢正永, 宮脇雄大, 近藤祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 南正樹, 上澤史且, 堀勝, 辰巳哲也

第72回応用物理学会学術講演会 2011.8

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SiO2 Plasma Etching Process Using Alternative Gas,C3F6O

Y.Kondo, Y.MIyawaki, K.Takeda, K.Ishikawa, H.Kondo, T.hayashi, H.Okamoto, M.Sekine,M.hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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SiO2 Plasma Etching Process Using Alternative Gas,C3F6O
Spatial Distribution of Electron Density on DC-Superposed Dual-frequency Capacitively Coupled Plasma(DS-CCP)

T.Komuro, K.Takeda, K.Ishikawa, M.Sekine, Y.Ohya, H.Kondo, M.Hori

DPS2011, 2011.11

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Spatial Distribution of Electron Density on DC-Superposed Dual-frequency Capacitively Coupled Plasma(DS-CCP)
Sticking coefficient of hydrogen radicals on ArF photoresist estimated by parallel plate structure in conjunction with numerical analysis

Malinowski A

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2011.11

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Sticking coefficient of hydrogen radicals on ArF photoresist estimated by parallel plate structure in conjunction with numerical analysis
Sticking coefficient of hydrogen radicals on ArF phtotoresist estimated by parallel plate structure in conjunction with numerical analysis

A.Malinowski, M.Sekine, M.Hori, K.Ishikawa, H.Kondo, T.Suzuki, T.Takeuchi, H.Yamamoto, A.Jakubowski, L.Lukasiak, Tomaszewski

SISPAD2011 2011.9

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Sticking coefficient of hydrogen radicals on ArF phtotoresist estimated by parallel plate structure in conjunction with numerical analysis
Study of Etch Reaction with F and O radicals using SF6/O2 Plasma

S.Amasaki, T.Takeuchi, K.takeda, K.ishikawa, H.Kondo, M.sekine, M.Hori, N.Sakurai, H.Hayashi, I.Sakai, T.Ohiwa

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Study of Etch Reaction with F and O radicals using SF6/O2 Plasma
Study on modification process of photoresist by fluorocarbon and radicals

T.Takeuchi, S.Amasaki, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori

64thAnnualGaseouselectronicsConference 2011.11

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Study on modification process of photoresist by fluorocarbon and radicals
Study on photoresist surface modification induced by fluorocarbon etch species

T.Takeuchi, S.Amasaki, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

DPS2011 2011.11

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Study on photoresist surface modification induced by fluorocarbon etch species
Sub-nm Scale Control of Etched-Profile-Fluctuations in Organic Low-k Film Etch

T.Suzuki, K.Takeda, H.Kondo, K.Ishikawa, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Sub-nm Scale Control of Etched-Profile-Fluctuations in Organic Low-k Film Etch
Subnanometer-scale control of feature size and shape in organic low-k film etch

Toshiya. Suzuki, Shinji Mitsuguti, Arkadiusz Malinowski, Keigo Takeda, HirokiKondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

2011 ICMAP 2011.7

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Subnanometer-scale control of feature size and shape in organic low-k film etch
Surface Analysis of GaN Irradiated by Cl2 Plasma Beam

Y. Lu, S. Chen, R. Kometani, K. Ishikawa, H. Kondo, K. Takeda, M. Sekine, T. Egawa, H. Amano, Y. Setsuhara, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Surface Analysis of GaN Irradiated by Cl2 Plasma Beam
Surface Loss Probability of Hydrogen Radical in SiH4/H2Plasma

Y.Abe, K.Takeda, K.Ishikawa, H.Kondo, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Surface Loss Probability of Hydrogen Radical in SiH4/H2Plasma
Synthesis of Amorphous Carbon Films Employing radical-injection Plasma-Enhanced Chemical Vapor Deposition system for Solar Cell

T.Kino, H.Kondo, K.ishikawa, M.sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Synthesis of Amorphous Carbon Films Employing radical-injection Plasma-Enhanced Chemical Vapor Deposition system for Solar Cell
Synthesis of Nano-graphene by Plasma in Liquid Ethanol

T. Hagino, H. Kano, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori

The 4th International Conference on PLAsma-Nano Technology & Science 2011.3

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Synthesis of Nano-graphene by Plasma in Liquid Ethanol
Synthesis of Platinum Nanoparticles on Carbon Nanowall Surface by Supercritical Fluid Chemical Deposition

S.Mitsuguchi, H.Kano, M.Hiramatsu, H.Kondo, M.Sekine, M.Hori

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Synthesis of Platinum Nanoparticles on Carbon Nanowall Surface by Supercritical Fluid Chemical Deposition
Three Dimensional Distribution of Atomic Radical in Nonequilibrium Atmospheric Pressure Plasma

M.kato, K.Takede, K.Ishikawa, H.Kondo, M.Skine,M.Hor

3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2011.3

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Three Dimensional Distribution of Atomic Radical in Nonequilibrium Atmospheric Pressure Plasma
Time-dependent Radical Flux Analysis in ArF Photoresist Plasma Etching using Parallel Plate Structure International conference

2011.8

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Time-dependent Radical Flux Analysis in ArF Photoresist Plasma Etching using Parallel Plate Structure
Ultrafast Synthesis of Nanographen Employing an Ultrahigh-density In-liquid Al-cohol Plasma

T.Hagino, H.Kondo, H.Kano, K.Ishikawa, M.Sekine, M.Hori

2011SSDM 2011.9

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Ultrafast Synthesis of Nanographen Employing an Ultrahigh-density In-liquid Al-cohol Plasma
すばる望遠鏡および次世代巨大望遠鏡用の新しい回折格子 International conference

海老塚昇, 石川健治, 近藤博基, 堀勝、AndreaBianco,FilippoMariaZerbi

2011年度光学シンポジウム 2011.7

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Venue：東京大学 Country：Other
アモルファスカーボン膜の工学的特性に対する成長温度の効果 International conference

九鬼淳, 近藤博基, 関根誠, 堀勝

第３回薄膜太陽電池セミナー 2011.10

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アルコール気液プラズマ生成するナノカーボンの電子スピン共鳴法によるその場観察 International conference

石川健治, 萩野達也, 鷲見直也, 加納浩之, 竹田圭吾, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
アルコール気液プラズマを用いたナノグラフェンの合成 International conference

萩野達也, 乾裕俊, 加納浩之, 石川健治, 竹田圭吾, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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アルコール液中プラズマを用いたナノグラフェンの制御合成 International conference

荻野達也, 加納浩司, 石川健治, 竹田圭吾, 近藤博基, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
アルコール液中プラズマを用いたナノグラフェンの合成メカニズム International conference

萩野達也, 加納浩之, 石川健治, 竹田圭吾, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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アルモファスカーボン膜の結晶構造及び血管密度に対するRFバイアス印加効果 International conference

九鬼淳, 于楽泳, 近藤博基, 石川健治, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
カビ胞子とプラズマの相互作用の電子スピン共鳴法による観察 International conference

石川健治, 井関紗千子, 太田貴之, 伊藤昌文, 加納浩之, 竹田圭吾, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
カーボンナノウォールの初期成長表面における化学構造の変化に関する研究 International conference

安田幸司, 近藤博基, 平松美根男, 関根誠, 堀勝

2011.11

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Venue：石川県立音楽堂 Country：Other
カーボンナノウォールの結晶構造に対する酸素ラジカル照射効果 International conference

下枝弘尚, 近藤弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
カーボンナノウォール初期成長過程における結晶構造変化 International conference

安田幸司, 近藤博基, 平松美根男, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
カーボンナノウォールの配向成長 International conference

神田貴幸, 近藤博基, 山川晃司, 竹田圭吾, 石川健冶, 平松美根男, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
カーボンナノウォールの初期成長過程における表面元素組成および化学結合状態の変化 International conference

安田幸司, 近藤博基, 平松美根男, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
カーボンナノウォールの初期成長過程におけるナノグラフェン核発生の観察 International conference

安田幸司, 近藤博基, 平松美根男, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
カーボンナノウォールの超親水化と機能性バイオテンプレートへの応用 International conference

井関紗千子, 堀勝, 渡辺均, 太田貴之, 近藤博基, 石川健治, 竹田圭吾, 関根誠, 伊藤昌文

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
テラヘルツ時間領域分光法を用いた非平衡大気圧プラズマによるミドリカビ殺菌の評価 International conference

平岡丈弘, 海老塚昇, 竹田圭吾, 大田貴之, 近藤博基, 石川健治, 川瀬晃道, 伊藤昌文, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
バイオ応用に向けた60Hz大気圧プラズマ源の生成酸素原子の空間分布 International conference

賈鳳東, 竹田圭吾, 石川健治, 乾裕俊, 井関紗千子, 加納浩之, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
フルオロカーボン系エッチング種によるArFフォトレジスト表面改質過程の解明 International conference

竹内拓也, 尼崎新平, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
フルオロカーボン系エッチング種によるArFフォトレジスト表面改質の解明 (2) International conference

竹内拓也, 尼崎新平, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
フルオロカーボン系エッチング種によるArFフォトレジスト表面改質の解明 International conference

竹内拓也, 尼崎新平, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴（ESR）解析（2） International conference

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴（ESR）解析 International conference

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
プラズマプロセス中材料の表面反応の機構解析 International conference

石川健治, 竹内拓也, 尼崎新平, 浅野高平, 山本洋, 鈴木俊哉, 竹田圭吾, 近藤博基, 関根誠,堀勝

応用物理学会シリコンテクノロジー研究会第133 回研究集会 2011.2

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プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の欠陥密度に対するRFバイアス印加の効果 International conference

九鬼淳, 于楽泳, 近藤博基, 石川健治, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
プラズマ励起化学気相堆積法で成長したアモルファスカーボン膜の結晶構造に対するRFバイアス印加の効果 International conference

近藤博基, 木野徳重, 石川健治, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
プラズマ励起気相堆積法で合成したアモルファスカーボン結晶構造解析 International conference

于楽泳, 九鬼淳, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
プラズマ化学気相堆積法によって成長したカーボンナノウォールの微細構造解析 International conference

近藤博基, 下枝弘尚, 石川健治, 関根誠, 堀勝, 平松美根男

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
プラズマ化学気相堆積法によって成長したカーボンナノウォールの結晶構造に対する酸素ガス添加効果 International conference

下枝弘尚, 近藤博基, 石川健治, 平松美根男, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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ラジカル注入型プラズマ化学気相堆積法を用いた高結晶性・低欠陥密度微結晶シリコン薄膜の作製 International conference

第24回プラズマ材料科学シンポジウム(SPSM24) 2011.7

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リアルタイム計測によるラジカルと固体表面相互反応プロセスの体系化 International conference

堀勝(招待講演, 関根誠, 石川健治, 近藤博基, 竹田圭吾, 河野昭彦, 堀邊英夫

Cat-CVD研究会 2011.6

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Venue：金沢工業大学扇が丘キャンパス多目的ホール Country：Other
低損傷GaNエッチングのための塩素プラズマビーム表面相互作用と角度分解ＸＰＳによるその場解析 International conference

盧翌,陳尚, 米谷亮祐, 石川健治, 近藤博基, 竹田圭吾, 関根誠, 江川孝志, 天野浩, 節原裕一, 堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
単一カーボンナノウォールの架橋成長制御およびその電気的特性評価 International conference

神田貴幸, 近藤博基, 山川晃治, 竹田圭吾, 石川健冶, 平松美根男, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
吸収分光法を用いた炭素含有ガスによるマイクロ波プラズマ中のラジカルの計測 International conference

村田健一, 内藤全晃, 平松美根男, 高島成剛, 近藤博基, 堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
大気圧プラズマ表面処理によるカーボンナノウォール表面の超親水・超撥水性出現機構 International conference

渡邊均, 近藤博基, 関根誠, 平松美根男, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
大気圧プラズマ処理によるカーボンナノウォール表面の超親水・超撥水発生機構 International conference

渡邊均, 近藤博基, 関根誠, 堀勝, 平松美根男

表面技術協会第124回講演大会 2011.9

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Venue：名古屋大学 Country：Other
大気圧プラズマ表面処理によるカーボンナノウォール表面の超親水性・超撥水性発現機構 International conference

渡邊均, 近藤博基, 平松美根男, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
実時間・その場観察電子スピン共鳴（ESR）を用いた水素原子照射による有機薄膜表面処理メカニズムの解析 International conference

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
微結晶シリコン成膜における水素ラジカル注入型プラズマ源の特性 International conference

陸雅, 福島敦史, 阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
有機材料の超微細エッチングにおける白金微粒子の側壁保護作用に関する研究 International conference

鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 節原裕一, 白谷正治, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
水素ラジカルによるGaN中プラズマ誘導欠陥の不活性化 International conference

陳尚, 盧翌, 米谷亮祐, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
水素ラジカル注入型プラズマ源を用いた微結晶シリコン成膜における欠陥密度の抑制効果 International conference

陸雅, 福島敦史, 阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
水素ラジカル照射による有機薄膜表面処理の実時間・その場観察電子スピン共鳴（ESR）解析 International conference

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

Cat-CDV研究会 2011.6

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Venue：金沢工業大学扇が丘キャンパス多目的ホール Country：Other
燃料電池応用に向けたカーボンナノウォールの作製 International conference

ミツ口真司, 堀部剛良, 平松美根男, 近藤博基, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
白金微粒子の側壁保護作用を用いた有機材料の超微細エッチング International conference

鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 節原裕一, 白谷正治, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
真空一貫プロセスによるGaNプラズマビームエッチング及び水素ラジカルダメージ層除去とその表界面反応機構の解明 International conference

陳尚,盧翌, 米谷亮祐, 江川孝志, 石川健治, 近藤博基, 加納浩之, 徳田豊, 関根誠, 節原裕一, 竹田圭吾, 天野浩,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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Venue：神奈川工科大学 Country：Other
真空紫外吸収分光法を持ちたマイクロ波プラズマ中のC原子の密度計測 International conference

村田健一, 内藤全晃, 平松美根男, 高島成剛, 近藤博基, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
薄膜シリコン太陽電池プラズマプロセスにおけ水素ラジカル表面反応 International conference

阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 堀勝

第72回応用物理学会学術講演会 2011.8

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Venue：山形大学 Country：Other
薄膜太陽電池製造装置開発に向けたSiH4/H2プラズマにおける水素ラジカル表面損失確率計測 International conference

阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

2011年春季第58回応用物理学関係連合講演会 2011.3

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超臨界流体を用いたカーボンナノウォール（CNWｓ）へのTiO2微粒子担持 International conference

堀部剛良, ミツ口真司, 加納浩司, 近藤博基, 石川健治, 平松美根男, 関根誠, 堀勝

応用物理学会プラズマエレクトロニクス分科会20周年記念特別シンポジウム 2011.10

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Venue：名古屋大学 Country：Other
Study on mechanism of gallium nitride growth employing a plasma-enhanced metal-organic chemical vapor deposition International conference

2013.3

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Study on mechanism of gallium nitride growth employing a plasma-enhanced metal-organic chemical vapor deposition
Real-time control of a wafer temperature for uniform plasma process

Tsutsumi T

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings 2019.2

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Real-time control of a wafer temperature for uniform plasma process
Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

Ueyama T

Japanese Journal of Applied Physics 2017.6

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Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas
Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 °c

2017.6

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Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

Tomatsu M

Japanese Journal of Applied Physics 2017.6

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Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition
Electrocatalytic Characteristic of Pt Nanoparticles-Supported Carbon Nanowalls for Fuel Cell Applications

Hiroki Kondo

2015 MRS Spring Meeting & Exhibit 2015.4

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Electrocatalytic Property and Durability of Pt Nanoparticles-Supported Nanographene Synthesized by In-Liquid Plasma

Hiroki Kondo

2015 MRS Spring Meeting and Exhibit 2015.4

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High-density nitrogen plasma source for growing high In content InGaN by plasma-assisted MBE

Hiroki Kondo, Masaru Hori, Hirosi Amano, Nagoya Univ

CONFERENCE 9363 2015.2

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High-density nitrogen plasma source for growing high In content InGaN by plasma-assisted MBE
Selective and oriented growth of carbon nanowalls by plasma-enhanced chemical vapor deposition

H.Kondo

The 75th IUVSTA Workshop on Sheath Phenomena in Plasma Processing of Advanced Materials(19th-23rd 2015,Slovenia) 2015.1

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Selective and oriented growth of carbon nanowalls by plasma-enhanced chemical vapor deposition
カーボンナノウォールの構造制御とナノバイオ応用 International conference

近藤博基, 堀勝, 平松美根男, 名古屋大学大学院工学研究科付属プラズマナノ工学研究センター, 名城大学理工

仙台“プラズマフォーラム’’ 2015.2

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Venue：東北大学大学院工学研究科電子情報システム・応物系 1号館別館 451・453会議室 Country：Other
ラジカル励起MOCVD法によるGaNホモエピタキシャル成長に関する研究 International conference

岩本一希, 盧翌, 小田修, 近藤博基, 石川健治, 関根誠, 勝

ゲートスタック研究会ー材料・プロセス・評価の物理ー（第20回） 2015.1

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Venue：東レ研修センター Country：Other
半導体ディバイス・プロセスの信頼性工学 International conference

近藤博基

第１０回日本安全学教育研究会 2015.8

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地域イノベーションプラットフォーム概略紹介 International conference

近藤博基

大気圧プラズマによる超高速・超機能化異種材料接合オープンプラットフォーム 2015.1

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次世代窒化ガリウム系デバイスのためのラジカル励起MOCVDによるGaN-ヘテロエピタキシャル成長に関する研究 International conference

盧翌, 岩本一希, 小田修, 石川健治, 近藤博基, 関根誠, 勝

ゲートスタック研究会ー材料・プロセス・評価の物理ー（第20回） 2015.1

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Venue：東レ研修センター Country：Other
A high temperature etching of GaN employing CH4/H2 gases, 06aP02

T. Kako, Z. Liu, K. Ishikawa, K. Takeda, H. Kondo, O. Oda, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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A high temperature etching of GaN employing CH4/H2 gases, 06aP02
AC 励起大気圧非平衡 Ar プラズマ生成における大気ガス巻込みの影響 International conference

梁思潔, 竹田圭吾, 近藤博基, 加納浩之, 石川健治, 関根誠, 堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
AC励起アルコール液中プラズマにおけるナノグラフェン合成機構の解析 International conference

安藤睦, 小島和晃, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 太田貴之, 伊藤昌文, 平松美根男, 加納浩之, 堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
Advanced plasma-nano processes for controls of crystallographic and electrical properties of carbon nanomaterials

Hiroki Kondo

The International Symposium on Plasma-Nano Materials and Processes 2014.4

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Advanced plasma-nano processes for controls of crystallographic and electrical properties of carbon nanomaterials
Anisotropic etching and structural modification of carbon nanowalls by oxygen-related radicals

HIROKI KONDO, Hironao Shimoeda, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

14th International Conference on Plasma Surface Engineering 2014.9

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Anisotropic etching and structural modification of carbon nanowalls by oxygen-related radicals
Behaviors of activated species in SiH4/H2 plasma for µc-Si:H thin film deposition

2014.2

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Venue：Fukuoka, Japan Country：Other
Biosensing properties of carbon nanowalls grown using plasma enhanced CVD, 03pP51LN

M. Tomatsu, R. Tsukada, M. Nagashima, M. Hiramastu, H. Kondo, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Biosensing properties of carbon nanowalls grown using plasma enhanced CVD, 03pP51LN
CH4/H2プラズマによるGaNの高温エッチング International conference

加古隆, 劉沢セイ, 石川健治, 小田修, 竹田圭吾, 近藤博基, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
CHxFyプラズマにおける活性種生成過程とエッチング機構の解明(IV) International conference

近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 田嶋聡美, 石川健治, 林俊雄, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
Carbon nanowalls: plasma synthesis and applications, 3C-WS-07

M. Hiramatsu, H. Kondo, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Carbon nanowalls: plasma synthesis and applications, 3C-WS-07
Charactaristics of AC excited Non-equilibrium Atomospheric Pressure Helium Plasma Jet for Medical Application

K. Takeda, T. Kumakura, K. Ishikawa, H. Tanaka, H. Kondo, H. Kano, Y. Nakai, M. Sekine, M. Hori

5th International Conference on Plasma Medicine 2014.5

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Charactaristics of AC excited Non-equilibrium Atomospheric Pressure Helium Plasma Jet for Medical Application
Chemical analyses of edible meat irradiated atmospherics-pressure-plasmas, 5A-PM-01

K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Chemical analyses of edible meat irradiated atmospherics-pressure-plasmas, 5A-PM-01
Chemical analysis of plasma-activated-medium for understanding mechanism of its antitumor effect

Naoyuki Kurake, Hiromasa Tanaka, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Fumiaki Kikkawa, Takashi Kondo, Masaaki Mizuno, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2014.7

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Chemical analysis of plasma-activated-medium for understanding mechanism of its antitumor effect
Control of Edge and Surface Oxidation of Carbon Nanowalls by Argon Ion Irradiation, 03pD08O

H. Shimoeda, H. Kondo, K. Takeda, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Control of Edge and Surface Oxidation of Carbon Nanowalls by Argon Ion Irradiation, 03pD08O
Controlled Synthesis of Carbon Nanomaterials Employing Plasma-Enhanced Chemical Vapor Deposition for Future Green Energy Applications

Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

IUMRS-ICA 2014 2014.8

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Controlled Synthesis of Carbon Nanomaterials Employing Plasma-Enhanced Chemical Vapor Deposition for Future Green Energy Applications
Controlled synthesis and electrocatalytic characteristics of Pt nanoparticles-supported nanographene synthesized by in-liquid plasma

Hiroki Kondo, Tomoki Amano, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Mineo Hiramatsu

67th Annual Gaseous Electronics Conference 2014.11

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Controlled synthesis and electrocatalytic characteristics of Pt nanoparticles-supported nanographene synthesized by in-liquid plasma
Dawning of Plasma Life Sciences ~ Diagnostics and Control of Reactive Species in Plasma Bio Processing ~

Masaru Hori, Masahiro Tanaka, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Fumitaka Kikkawa, Kae Nakamura, Hiroaki Kajiyama, Masaaki Mizuno, Hiroyuki Ohta, Masafumi Ito, Hiroyuki Kano

The 4th International Symposium for Plasma Biosciences (ISPB 2014) 2014.8

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Dawning of Plasma Life Sciences ~ Diagnostics and Control of Reactive Species in Plasma Bio Processing ~
Diagnostic studies for synthesis of Al doped ZnO film by magnetron sputtering

Jun Suck Lee, JayBum Kim, Su B. Jin, B.B. Sahu, Jeon G. Han, H. Kondo, M. Hori

14th International Conference on Plasma Surface Engineering 2014.9

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Diagnostic studies for synthesis of Al doped ZnO film by magnetron sputtering
Diagnostics of Non-equilibrium Atmospheric Pressure Plasma for Agricultural Applications

Takumi Kumakura, Keigo Takeda, Kenji Ishikawa, Hiromasa Tanaka, Hiroki Kondo, Hiroyuki Kano, Yoshihiro Nakai, Makoto Sekine, Masaru Hori

19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2014.7

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Diagnostics of Non-equilibrium Atmospheric Pressure Plasma for Agricultural Applications
Diagnostics of SiH4/H2 Plasma and Surface Reaction in Microcrystalline Silicon Deposition

Kenji Ishikawa, Yusuke Abe, Atsushi Fukushima, Ya Lu, Sho Kawashima, Keita Miwa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

The International Conference on Metallurgical Coatings and Thin Films (ICMCTF) 2014.4

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Diagnostics of SiH4/H2 Plasma and Surface Reaction in Microcrystalline Silicon Deposition
Effect of Ambient Air Engulfment on Generation of Activated Species in 60 Hz Non-Equilibrium Atmospheric Pressure Ar Plasma Jet (Poster), 03pP15

S. Liang, T. Tsutsumi, A. Ando, K. Sun, K. Takeda, H. Kondo, K. Ishikawa, H. Kano, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Effect of Ambient Air Engulfment on Generation of Activated Species in 60 Hz Non-Equilibrium Atmospheric Pressure Ar Plasma Jet (Poster), 03pP15
Effect of Ar flow rate on the synthesis of nanographene produced from in-liquid plasma, 06aP12

J. Jolibois, J. Kularatne, H. Kondo, M. Ito, H. Kano, K. Ishikawa, M. Hiramatsu, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Effect of Ar flow rate on the synthesis of nanographene produced from in-liquid plasma, 06aP12
Effect of Gas Flow Rate on Crystalline Structures of Amorphous Carbon Films Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition, 05pP34

D. Xu, L. Jia, M. Nakamura, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Effect of Gas Flow Rate on Crystalline Structures of Amorphous Carbon Films Employing Radical-Injection Plasma-Enhanced Chemical Vapor Deposition, 05pP34
Effect of HBr plasma cure for reduction of roughness formation on ArF photoresist surface during plasma etching process, 4B-PM-03

M. Sekine, Y. ZhangTakeuchi, H. Nagano, K. Ishikawa, K. Takeda, H. Kondo, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Effect of HBr plasma cure for reduction of roughness formation on ArF photoresist surface during plasma etching process, 4B-PM-03
Effect of Power supply on metal emission intensity induced by non-equilibium atmospheric pressure plasma, 6P-PM-S09-P12

J. Kularatne, J. Jolibois, Ohta, M. Ito, H. Kano, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Effect of Power supply on metal emission intensity induced by non-equilibium atmospheric pressure plasma, 6P-PM-S09-P12
Effect of spiral microwave antenna configuration on the production of nano-crystalline film by chemical sputtering in ECR plasma, 4P-PM-SPD-P05

H. Kondo, L. Jia, D. Xu, M. Nakamura, K. Ishikawa, M. Sekine, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Effect of spiral microwave antenna configuration on the production of nano-crystalline film by chemical sputtering in ECR plasma, 4P-PM-SPD-P05
Effects of Low RF Bias Power on Optoelectrical Properties of Amorphous Carbon Films Grown byPlasma-Enhanced Chemical Vapor Deposition, 05pP71

M. Nakamura, L. Jia, D. Xu, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Effects of Low RF Bias Power on Optoelectrical Properties of Amorphous Carbon Films Grown byPlasma-Enhanced Chemical Vapor Deposition, 05pP71
Effects of residence time on electronic and electricalthe optical properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition, 05pP72

L. Jia, D. Xu, M. Nakamura, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Effects of residence time on electronic and electricalthe optical properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition, 05pP72
Electro catalytic properties of Pt-supported nanographene synthesis using in-liquid plasma, 05aB06O

T. Amano, K. Takeda, H. Kondo, K. Ishikawa, T. Ohta, M. Ito, H. Kano, M. Hiramatsu, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Electro catalytic properties of Pt-supported nanographene synthesis using in-liquid plasma, 05aB06O
Electron Spin Resonance Study of Plasma-Activated-Medium

K. Ishikawa, N. Kurake, H. Tanaka, T. Kondo, K. Nakamura, H. Kajiyama, F. Kikkawa, M. Mizuno, K. Takeda, H. Kondo, M. Sekine, M. Hori

The 5th International Conference on Plasma Medicine (ICPM5) 2014.5

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Electron Spin Resonance Study of Plasma-Activated-Medium
Electron Spin Resonance Study of Plasma-Biological Surface Interactions under Atmospheric Pressure Plasmas

K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

5th International Conference on Plasma Medicine 2014.5

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Electron Spin Resonance Study of Plasma-Biological Surface Interactions under Atmospheric Pressure Plasmas
Electron spin Resonance Study of Plasma-Activated-Media (PAM)

Masaru Hori, Naoyuki Kurake, Kenji Ishikawa, Hiromasa Tanaka, Takashi Kondo, Kae Nakamura, Hiroaki Kajiyama, Fumitaka Kikkawa, Masaaki Mizuno, Keigo Takeda, Hiroki Kondo, Makoto Sekine

2014 MRS Fall Meeting & Exhibit 2014.11

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Electron spin Resonance Study of Plasma-Activated-Media (PAM)
Electron spin resonance study of radical generation during non-thermal plasma blood coagulation

Kenji Ishikawa, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiromasa Tanaka, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Masaru Hori

The 17th Biennial Meeting for the Society for Free Radical Research International (SFRRI 2014) 2014.3

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Electron spin resonance study of radical generation during non-thermal plasma blood coagulation
Electron spin resonance analysis of plasma-biological material interactions in atmospheric pressure plasma, 3B-WS-07

K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

International workshop on control of fluctuation of plasma processes -Joint International Workshop between "Frontier science of interactions between plasmas and nano-interfaces" and "Plasma medical innovation" 2014.2

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Electron spin resonance analysis of plasma-biological material interactions in atmospheric pressure plasma, 3B-WS-07
Electron spin resonance analyses of plasma-biological material interactions in atmospheric pressure plasmas, 3B-WS-07

K. Ishikawa, H. Hashizume, T. Ohta, M. Ito, H. Tanaka, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Electron spin resonance analyses of plasma-biological material interactions in atmospheric pressure plasmas, 3B-WS-07
Emission charateristics of metallic elements in solution using non-equilibrium atmospheric pressure microplasma, 04pP07

J. Kularatne, T. Ohta, J. Jolibois, M. Ito, H. Takemura, H. Kano, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Emission charateristics of metallic elements in solution using non-equilibrium atmospheric pressure microplasma, 04pP07
Fabrication of graphene films on Ni layer by microwave plasma-enhanced CVD, 03pP38

Y. Kashima, M. Hiramatsu, H. Kondo, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Fabrication of graphene films on Ni layer by microwave plasma-enhanced CVD, 03pP38
Fabrication of graphene films using microwave plasma-enhanced CVD in surface wave mode, 6P-AM-S08-P28

Y. Kashima, M. Hiramatsu, H. Kondo, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Fabrication of graphene films using microwave plasma-enhanced CVD in surface wave mode, 6P-AM-S08-P28
GaN etching at high temperature employing N2 added Cl2 Plasma, 06aP04

Z. Liu, T. Kako, K. Ishikawa, O. Oda, K. Takeda, H. Kondo, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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GaN etching at high temperature employing N2 added Cl2 Plasma, 06aP04
Growth Mechanism of Single-Walled Carbon Nanotubes from Pt Catalysts by Alcohol Catalytic CVD

Takahiro Maruyama, Hiroki Kondo, Akinari Kozawa, Takahiro Saida, Shigeya Naritsuka, Sumio Iijima

2014 MRS Fall Meeting & Exhibit 2014.11

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Growth Mechanism of Single-Walled Carbon Nanotubes from Pt Catalysts by Alcohol Catalytic CVD
Growth of graphene-based films using aftergrow of inductively coupled plasma

Mineo Hiramatsu, Masakazu Tomatsu, Hiroki Kondo, Masaru Hori

67th Annual Gaseous Electronics Conference 2014.11

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Growth of graphene-based films using aftergrow of inductively coupled plasma
High Density Radical Source

Y. Kiheda, H. Kano, H. Kondo, M. Hori, H. Amano, M. Hiramatsu

19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2014.7

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High Density Radical Source
In situ analysis of the surface reactions in PE-ALD SiO2 films for advanced litho applications

Masaru Hori, Hiroki Kondo

14th International Conference on Atomic Layer Deposition (ALD 2014) 2014.6

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In situ analysis of the surface reactions in PE-ALD SiO2 films for advanced litho applications
Interactions between Plasma and Biological Material: Analysis by Electron spin resonance (ESR) technique

Hiromasa Tanaka, Keigo Takeda, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiroki Kondo, Makoto Sekine, Masaru Hori

Plasma Processing Science, Gordon Research Conference 2014.7

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Interactions between Plasma and Biological Material: Analysis by Electron spin resonance (ESR) technique
Large-scale synthesis of nanographene using in-liquid plasma and chemical reduction process, 6P-PM-S09-P11

J. Jolibois, J. Kularatne, H. Kano, M. Ito, M. Hiramatsu, H. Kondo, K. Ishikawa, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Large-scale synthesis of nanographene using in-liquid plasma and chemical reduction process, 6P-PM-S09-P11
Live demonstration: A CMOS sensor platform with 1.2 μm × 2.05 μm electroless-plated 1024 × 1024 microelectrode array for high-sensitivity rapid direct bacteria counting

2014.12

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Measurement of Heat Fluxes of Si Substrate from Plasma by Using Frequency Low CoherenceInterferometer, 03pP29

T. Tsutsu, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Measurement of Heat Fluxes of Si Substrate from Plasma by Using Frequency Low CoherenceInterferometer, 03pP29
Mechanism of Generating Active Species and Etch Reaction in CHxFy Plasma, 06aP03

Y. Kondo, Y. Miyawaki, K. Takeda, S. Tajima, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Mechanism of Generating Active Species and Etch Reaction in CHxFy Plasma, 06aP03
Mechanism of Surface Roughness of ArF Photoresist During HBr PlasmaEtching Processes (2) International conference

2014.3

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Mechanism of Surface Roughness of ArF Photoresist During HBr PlasmaEtching Processes (2)
Modifications of Photoresists Surface on Photon Irradiations in HBr Plasmas

Yan Zhang, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2014.7

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Modifications of Photoresists Surface on Photon Irradiations in HBr Plasmas
Nano-Bio applications of carbon-nano materials synthesized and modified by plasma

Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 6th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2014.7

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Nano-Bio applications of carbon-nano materials synthesized and modified by plasma
Nucleation control of carbon nanowalls using plasma-enhanced CVD with re-duced ion bombardment, 03pP42

R. Tsukada, M. Hiramatsu, H. Kondo, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Nucleation control of carbon nanowalls using plasma-enhanced CVD with re-duced ion bombardment, 03pP42
Nucleation control of carbon nanowalls for device application, 5P-PM-S08-P09

R. Tsukada, M. Hiramatsu, H. Kondo, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Nucleation control of carbon nanowalls for device application, 5P-PM-S08-P09
Observation of Dangling Bonds in Silicon Nitride Films during Exposure of F Atoms At Down-Flow of CF4 Plsmas Using Real-time / in-situ Electron Spin Resonance, 06aB02O

Y. Miyawaki, K. Ishikawa, Y. Kondo, K. Takeda, S. Tajima, H. Kondo, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Observation of Dangling Bonds in Silicon Nitride Films during Exposure of F Atoms At Down-Flow of CF4 Plsmas Using Real-time / in-situ Electron Spin Resonance, 06aB02O
Plasma Induced Surface Roughness of Polymeric Materials

K. Ishikawa, T. Takeuchi, Y. Zhang, Y. Setsuhara, K. Takeda, H. Kondo, M. Sekine, M. Hori

18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics 2014.2

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Plasma Induced Surface Roughness of Polymeric Materials
Plasma nano-interface with organic materials for surface-roughness formation

M. Sekine, Y. Zhang, K. Ishikawa, K. Takeda, H. Kondo, M. Hori

The 9th EU-Japan Joint Symposium on Plasma Processing 2014.1

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Plasma nano-interface with organic materials for surface-roughness formation
Plasma-Biological Material Interactions Studied by Employing Electron Spin Resonance (ESR) Technique

Kenji Ishikawa, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Hiromasa Tanaka, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Makoto Sekine, Masaru Hori

The XXII Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG) 2014.7

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Plasma-Biological Material Interactions Studied by Employing Electron Spin Resonance (ESR) Technique
Plasma-Enhanced Synthesis and Edge-Modification of Carbon Nanowalls for Nano-Bio Applications

Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

2014 MRS Fall Meeting & Exhibit 2014.11

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Plasma-Enhanced Synthesis and Edge-Modification of Carbon Nanowalls for Nano-Bio Applications
Rapid non-contact measurements of heat fluxes to substrate in nitorogen plasmas, 5B-PM-02

T. Tsutsumi, K. Ishikawa, K. Takeda, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori

8th International Conference on Reactive Plasmas 31st Symposium on Plasma Processing,Fukuoka Convention Center 2014.2

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Rapid non-contact measurements of heat fluxes to substrate in nitorogen plasmas, 5B-PM-02
Recovery of Plasma-induced Damage in GaN by In situ Radical Exposure , 6P-AM-S06-P18

M. Sekine, Z. Liu, S. Chen, Y. Lu, R. Kometani, K. Ishikawa, H. Kano, K. Takeda, H. Kondo, M. Hori

8th International Conference on Reactive Plasmas 2014.2

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Recovery of Plasma-induced Damage in GaN by In situ Radical Exposure , 6P-AM-S06-P18
Silicon thin film solar cells fabricated by H radical injection plasma, 05pP49

K. Miwa, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Silicon thin film solar cells fabricated by H radical injection plasma, 05pP49
Spectroscopic analysis of gas-liquid plasma for nanographene synthesis, 06aD03O

A. Ando, T. Takeda, H. Kondo, K. Ishikawa, M. Sekine, T. Ohta, M. Ito, M. Hiramatsu, H. Kano, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Spectroscopic analysis of gas-liquid plasma for nanographene synthesis, 06aD03O
Study on Reaction Mechanism of Plasma-Enhanced Atomic Layer Deposition of SiO2 Films by In-Situ Fourier Transform Infrared Spectroscopy

Yi Lu, Akiko Kobayashi, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

14th International Conference on Atomic Layer Deposition (ALD 2014) 2014.6

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Study on Reaction Mechanism of Plasma-Enhanced Atomic Layer Deposition of SiO2 Films by In-Situ Fourier Transform Infrared Spectroscopy
Study on a novel radical-enhanced metalorganic chemical vapor deposition (REMOCVD) for GaN epitaxial growth, 03pC12O

Y. Lu, K. Ishikawa, H. Kondo, O. Oda, M. Sekine, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Study on a novel radical-enhanced metalorganic chemical vapor deposition (REMOCVD) for GaN epitaxial growth, 03pC12O
Surface modification of carbon nanowalls for their nano-bio applications

Masaru Hori, HIROKI KONDO, Mineo Hiramatsu

14th International Conference on Plasma Surface Engineering 2014.9

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Surface modification of carbon nanowalls for their nano-bio applications
Synthesis and electrocatalytic properties of Pt nanoparticles-supported nanographene synthesized employing in-liquid plasma

Hiroki Kondo, Tomoaki Amano, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Masafumi Ito, Mineo Hiramatsu

International Conference on Microelectronics and Plasma Technology 2014 (ICMAP 2014) 2014.7

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Synthesis and electrocatalytic properties of Pt nanoparticles-supported nanographene synthesized employing in-liquid plasma
Synthesis of nanographene/Pt composite using alcohol in-liquid plasma, 04pP72LN

K. Yoshida, M. Ito, M. Hiramatsu, T. Saida, H. Kano, H. Kondo, M. Hori

6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2014.3

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Synthesis of nanographene/Pt composite using alcohol in-liquid plasma, 04pP72LN
Temporal Changes in H and N Atom Densities in Plasmas Caused by Reactor Surface Modifications

Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

The XXII Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG) 2014.7

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Temporal Changes in H and N Atom Densities in Plasmas Caused by Reactor Surface Modifications
カーボンナノウォールの結晶構造に対するラジカル酸化効果(Ⅲ) International conference

近藤博基, 下枝弘尚, 石川健治, 平松美根男, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
プラズマCVDによって形成したカーボンナノウォールを用いた燃料電池の作製

大慶亮佑, 岩本翔太, 太田貴之, 伊藤昌文, 平松美根男, 近藤博基, 堀勝

第75回秋季応用物理学会学術講演会 2014.9

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Venue：北海道大学 Country：Other
プラズマプロセス中のポリメタクリル酸メチル（PMMA）表面の実時間・その場電子スピン共鳴法による反応解析 International conference

宮脇雄大, 王浩然, 石川健治, 近藤祐介, 竹田圭吾, 近藤博基, 堀邊英夫, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
プラズマ光と表面の相互作用の解明 International conference

張彦, 石川健治, 関根誠, 深沢正永, 長畑和典, 冨谷茂隆, 辰巳哲也, 竹田圭吾, 近藤博基, 堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
プラズマ照射した食肉血液成分の電子スピン共鳴解析 International conference

坂倉崚亮, 石川健治, 田中宏昌, 橋爪博司, 太田貴之, 伊藤昌文, 竹田圭吾, 近藤博基, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
プラズマ誘起ナノプロセスの進展と放射光実験への期待 International conference

近藤博基, 堀勝

平成26年度前期短期研究会「真空紫外・軟Ｘ戦放射光物性研究のパラダイムシフトに向けて」 2014.9

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Venue：東京大学物性研究所 Country：Other
プロセス履歴のチャンバー壁表面損失確率への影響とH2/N2プラズマ中のラジカル密度の時間変化 International conference

鈴木俊哉, 福永裕介, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
医療・バイオ用AC励起大気圧非平衡プラズマジェットの気相診断 International conference

熊倉匠, 竹田圭吾, 石川健治, 田中宏昌, 近藤博基, 加納浩之, 中井義浩, 関根誠, 堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
大気圧プラズマ化学気相堆積法による超撥水薄膜の形成 International conference

孫昿達, 竹田圭吾, 石川健治, 近藤博基, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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大気圧プラズマ照射培養液の電子スピン共鳴(ESR)による解析 International conference

倉家尚之, 田中宏昌, 石川健治, 中村香江, 梶山広明, 吉川史隆, 近藤隆, 水野正明, 竹田圭吾, 近藤博基, 関根誠, 堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
液中プラズマで合成したナノグラフェンを用いた燃料電池用電極の安定性 International conference

天野智貴, 近藤博基, 竹田圭吾, 石川健治, 太田貴之, 伊藤昌文, 平松美根男, 加納浩之, 関根誠,堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
非接触基板温度計測システムを用いたプラズマプロセス中の基板温度および熱流速計測 International conference

堤隆嘉, 竹田圭吾, 石川健治, 近藤博基, 太田貴之, 伊藤昌文, 関根誠, 堀勝

第61回応用物理学会春季学術講演会 2014.3

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高密度窒素ラジカル源を用いたRF-MBE法による(111)Si基板上GaNナノワイヤ高速成長 International conference

堤裕理, 水谷駿介, 木津良祐, 近藤博基, 堀勝, 本田善央, 天野浩

日本結晶成長学会ナノ構造・エピタキシャル成長分科会 2014春季講演会第6回窒化物半導体結晶成長講演会 2014.7

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Venue：名城大学天白キャンパス Country：Other
高温における窒化ガリウム(GaN)のエッチング機構(4) International conference

劉沢セイ,加古隆, 石川健治, 小田修, 竹田圭吾, 近藤博基, 関根誠, 堀勝

第61回応用物理学会春季学術講演会 2014.3

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Venue：青山学院大学相模原キャンパス Country：Other
AC励起非平衡大気圧プラズマの放電機構の解明に向けた時空間計測 International conference

梁思潔, 孫昿達, 竹田圭吾, 近藤博基, 加納浩之, 石川健治, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
Absolute density of fluorine atom in capacitively coupled plasma employing hydro-fluorocarbon gases for highly selective SiO2 etching

T. Komuro, K. Takeda, K. Ishikawa, M. Sekine, H. Kondo, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Absolute density of fluorine atom in capacitively coupled plasma employing hydro-fluorocarbon gases for highly selective SiO2 etching
Advanced Surface Engineering on Material Processing Employing Ultrahigh Density Atmospheric Pressure Plasma

Masaru Hori, K. Takeda, H. Kondo, K. Ishikawa, M.Sekine

The 1st International Conference on Surface Engineering (ICSE2013) 2013.11

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Advanced Surface Engineering on Material Processing Employing Ultrahigh Density Atmospheric Pressure Plasma
AlGaNのプラズマエッチング機構に関する研究 International conference

曹佳棟, 米谷亮佑, 盧翌, 朴鐘胤, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.3

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Venue：神奈川工科大学 Country：Other
An Inhibition Mechanism for Surface Roughening of Photoresist During Plasma Etching Process with Plasma Cure International conference

2013.9

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An Inhibition Mechanism for Surface Roughening of Photoresist During Plasma Etching Process with Plasma Cure
Analysis of Fluorocarbon Gas Plasma Surface Interactions Using Real-time/In-situ Electron Spin Resonance

Y. Miyawaki, H. Wang, Y. Kondo, K. Ishikawa, K. Takeda, S. Tajima, H. Kondo, M. Sekine, H. Horibe, M. Hori

Dry Process Symposium 2013 (DPS2013) 2013.8

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Analysis of Fluorocarbon Gas Plasma Surface Interactions Using Real-time/In-situ Electron Spin Resonance
Application of atmospheric pressure plasma in element analysis of agricultural products

J. Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Application of atmospheric pressure plasma in element analysis of agricultural products
CH4 /H2 plasma etching on gallium nitride at high temperature International conference

Takashi Kako, Ze-cheng Liu, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

2013.9

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CH4 /H2 plasma etching on gallium nitride at high temperature
CHxFyプラズマにおける活性種生成過程とエッチング機構の解明(III) International conference

近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 林俊雄, 関根誠,堀勝

第74回応用物理学会秋季学術講演会 2013.9

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Venue：同志社大学京田辺キャンパス Country：Other
CHxFyプラズマにおける活性種生成過程とエッチング機構の解明(II) International conference

近藤祐介, 宮脇雄大, 竹田圭吾, 近藤博基, 石川健治, 林俊雄, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.3

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Carbon Nanowalls: Growth Control and their Clean Applications

M. Hiramatsu, H. Kondo, M. Hori

8th Asia-Pacfic International Symposium on the Basics and Applications of Plasma Technology 2013.12

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Carbon Nanowalls: Growth Control and their Clean Applications
Carbon nanowalls: synthesis and application

M. Hiramatsu, H. Kondo, M. Hori

The 1st International Conference on Surface Engineering (ICSE2013) 2013.11

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Carbon nanowalls: synthesis and application
Cavity ring down measurements of SiH3-behavior in SiH4/H2 plasma

Y. Abe, A. Fukushima, Y. Kim, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Cavity ring down measurements of SiH3-behavior in SiH4/H2 plasma
Cell-culturing scaffold application of carbon nanowall(CNW)

M. Hori, H. Watanabe, H. Kondo, Y. Okamoto, M. Hiramatsu, M. Sekine, Y. Baba

XXXI International Conference on Phenomena in Ionized Gases 2013.7

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Cell-culturing scaffold application of carbon nanowall(CNW)
Chemical modification and nano-bio applications of carbon nanowalls

Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2013.5

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Chemical modification and nano-bio applications of carbon nanowalls
Chlorine plasma etching of GaN at high temperature

R. Kometani, L.Michael, K. Ishikawa, K. Takeda, H. Kondo, H. Amano, M. Sekine, M.Hori

The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013) 2013.2

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Chlorine plasma etching of GaN at high temperature
Construction of atmospheric pressure mist chemical vapor deposition technology for the all-printed electronic technology

K. Sun, K. Takeda, S. Tajima, H. Kondo, K. Ishikawa, M. Sekine, M. Hori, H. Itoh

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Construction of atmospheric pressure mist chemical vapor deposition technology for the all-printed electronic technology
Control of Gas Phase Reaction in Etching Plasmas Employing Hydro-fluorocarbon Gases

Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

Dry Process Symposium 2013 (DPS2013) 2013.8

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Control of Gas Phase Reaction in Etching Plasmas Employing Hydro-fluorocarbon Gases
Crystallographic and chemical modification of carbon nanowalls by radical oxidation

H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

The 12th Asia Pacific Physics Conference of AAPPS (AAPC12) 2013.7

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Crystallographic and chemical modification of carbon nanowalls by radical oxidation
Crystallographic and electrical properties of vertically-grown graphene sheets by CH4/H2 plasma

H. Cho, H. Kondo, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Crystallographic and electrical properties of vertically-grown graphene sheets by CH4/H2 plasma
Detection of metal elements in soil using atmospheric pressure plasma

J. Kularatne, J. Jolibois, H. Kano, M. Ito, T. Ohta, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

The 12th Asia Pacific Physics Conference of AAPPS (AAPC12) 2013.7

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Detection of metal elements in soil using atmospheric pressure plasma
Effect of Ar gas addition on photoconductive characteristics of amorphous carbon films synthesized by plasma-enhanced chemicalvapor deposition

L. Yu, J. Kuki, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Effect of Ar gas addition on photoconductive characteristics of amorphous carbon films synthesized by plasma-enhanced chemicalvapor deposition
Effect of Hexane on the synthesis of nanographene using liquid plasma

J. Jolibois, J. Kularatne, H. Kano, M. Ito, H. Kondo, K. Ishikawa, M. Hori

The 12th Asia Pacific Physics Conference of AAPPS (AAPC12) 2013.7

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Effect of Hexane on the synthesis of nanographene using liquid plasma
Effect of Hydrogen Peroxide on Carbon Materials Produced by Gas-liquid Plasma

J. Jolibois, J. Kularatne, H. Kano, M. Ito, H. Kondo, K. Ishikawa, M. Hori

Dry Process Symposium 2013 (DPS2013) 2013.8

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Effect of Hydrogen Peroxide on Carbon Materials Produced by Gas-liquid Plasma
Effect of boron doping on amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

Lingyun Jia, Jun Kuki, Leyong Yu, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2013.5

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Effect of boron doping on amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition
Effect of boron doping on crystalline structures and electrical properties of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition

J. Kuki, L. Yu, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Effect of boron doping on crystalline structures and electrical properties of amorphous carbon films grown by radical-injection plasma-enhanced chemical vapor deposition
Effect of thin films on wafer temperature during plasma processes investigated by non-contact temperature measurement technique

T. Tsutsumi, K Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M.Hori

XXXI International Conference on Phenomena in Ionized Gases 2013.7

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Effect of thin films on wafer temperature during plasma processes investigated by non-contact temperature measurement technique
Effects of Hydroxyl Radicals on Crystallographic and Electrinic Structures of Carbon Nanowalls

H. Shimoeda, H. Kondo, K. Ishikawa, M. Hiramatsu, M.Sekine, M. Hori

The 16th International Workshop on Advanced Plasma Processing and Diagnostics 2013.1

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Effects of Hydroxyl Radicals on Crystallographic and Electrinic Structures of Carbon Nanowalls
Effects of carbon nanowall scaffold and their chemical termination on cell culturing

H. Watanabe, H. Kondo, Y. Okamoto, M. Sekine, M. Hiramatsu, Y. Baba, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Effects of carbon nanowall scaffold and their chemical termination on cell culturing
Effects of hydrogen contained in fluorocarbon gas molecules fordielectric film etching process

Y. Kondo, Y. Miyawaki, K. Takeda, K.Ishikawa, H. Kondo, T. Hayashi, M. Sekine, M. Hori

The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013) 2013.2

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Effects of hydrogen contained in fluorocarbon gas molecules fordielectric film etching process
Effects of morphological changes induced by hydrogen peroxide treatment on electrical properties of carbon nanowalls

H. Shimoeda, H. Kondo, K. Takeda, K. Ishikawa, M. Hiramatsu, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Effects of morphological changes induced by hydrogen peroxide treatment on electrical properties of carbon nanowalls
Electrical properties of microcrystalline silicon thin films deposited by employing hydrogen radical-injection plasma-enhanced CVD method International conference

Keita Miwa, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

2013.9

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Electrical properties of microcrystalline silicon thin films deposited by employing hydrogen radical-injection plasma-enhanced CVD method
Electron spin resonance study of plasma-biological surface interaction for food hygiene

K. Ishikawa, H. Mizuno, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Electron spin resonance study of plasma-biological surface interaction for food hygiene
Etching Characteristics of Gallium Nitride based compound semiconductors with Inductively Coupled Cl2 Plasma International conference

Jia-dong Cao, Yi Lu, Jong-yun Park, Ze-cheng Liu, Takashi Kako, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

2013.9

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Etching Characteristics of Gallium Nitride based compound semiconductors with Inductively Coupled Cl2 Plasma
Etching Characterristics of AlGaN and GaN in Inductively Coupled Cl2 Prasma

D. Cao, Y. Lu, R. Kometani, J. Park, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori

AVS 60th International Symposium & Exhibition 2013.10

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Etching Characterristics of AlGaN and GaN in Inductively Coupled Cl2 Prasma
Etching characteristics of AlGaN in inductively coupled Cl2 plasmas

J.-D. Cao, Y. Lu, R. Kometani, J. -Y. Park, K. Ishikawa, K. Takeda, H. Kondo, M, Sekine, M. Hori

The 16th International Workshop on Advanced Plasma Processing and Diagnostics 2013.1

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Etching characteristics of AlGaN in inductively coupled Cl2 plasmas
Formation and characteristics of Pt-Au nanoparticles supported on carbon nanowalls (CNWs) employing a supercritical fluid

T. Horibe, H. Kondo, H. Kano, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Formation and characteristics of Pt-Au nanoparticles supported on carbon nanowalls (CNWs) employing a supercritical fluid
Gas-phase reaction model of Ar-diluted CHxFy plasmas

Y. Kondo, Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Gas-phase reaction model of Ar-diluted CHxFy plasmas
Gradual transition of chemical structures at initial growth stage of carbon nanowalls

H. Kondo, K. Yasuda, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori

The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition 2013.9

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Gradual transition of chemical structures at initial growth stage of carbon nanowalls
H2/N2プラズマ中のラジカル密度へ前のプロセスが与える影響とその制御 International conference

鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.3

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H2/N2プラズマ中のラジカル密度へ前のプロセスが与える影響とその制御 International conference

鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 関根誠,堀勝

第60回応用物理学会春季学術講演会 2013.1

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Venue：神奈川工科大学 Country：Other
High H radical density produced by 1-m-length atmospheric pressure microwave plasma system

H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, H. Toyoda, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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High H radical density produced by 1-m-length atmospheric pressure microwave plasma system
High Temperature Etching of GaN Preserving Smooth and Stoichiometric GaN Surface

R. Kometani, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori

AVS 60th International Symposium & Exhibition 2013.10

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High Temperature Etching of GaN Preserving Smooth and Stoichiometric GaN Surface
High temperature plasma etching of GaN

R. Kometani, S. Chen, M. Liu, K. Ishikawa, H. Kondo, K. Takeda, T. Egawa, H. Amano, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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High temperature plasma etching of GaN
Hydrogen radical injection plasma deposition of (110)-preferentially oriented microcrystalline silicon films

L. Ya, A. Fukushima, Y. Abe, Y. Kim, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Hydrogen radical injection plasma deposition of (110)-preferentially oriented microcrystalline silicon films
Hydrogen radical-injection plasma fabricated microcrystalline silicon thin film for solar cells

Masaru Hori, Yusuke Abe, Atsushi Fukushima, Ya Lu, Sho Kawashima, Keita Miwa, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine

21th International Symposium on Plasma Chemistry (ISPC) 2013.8

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Hydrogen radical-injection plasma fabricated microcrystalline silicon thin film for solar cells
Identification of ESR signals arisen from Penicillium digitatum spores-3 International conference

H Mizuno, K Ishikawa, H Tanaka, H Hashizume, T Ohta, M Ito, K Takeda, H Kondo, M Sekine, M Hori

2013.3

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Identification of ESR signals arisen from Penicillium digitatum spores-3
In situ Surface analysis of GaAs irradiated by Cl plasma beams International conference

2013.3

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In situ Surface analysis of GaAs irradiated by Cl plasma beams
In-situ ESR Measurements for Plasma Materials Interactions

Kenji ISHIKAWA, Hiromasa TANAKA, Hiroshi HASHIZUME, Takayuki OHTA, Masafumi ITO, Keigo TAKEDA, Hiroki KONDO, Makoto SEKINE, Masaru HORI

The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013) 2013.8

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In-situ ESR Measurements for Plasma Materials Interactions
In-situ ESR measurements for Plasma Materials Interractions

Kenji Ishikawa, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

9th Asian-european International Conference On Plasma Surface Enginnering, Conference and Exhibition 2013.8

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In-situ ESR measurements for Plasma Materials Interractions
Influence of N2 inclusion to Ar AP plasma in atomization

J. S.Kularatne, H. Kano, M. Ito, T. Ohta, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

The 6th International Conference on PLAsma Nanotechnology & Science (IC-PLANTS 2013) 2013.2

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Influence of N2 inclusion to Ar AP plasma in atomization
Investigation of Si etch reaction with F and O radicals using SF6/O2 plasma

M. Sekine, S. Amasaki, T. Takeuchi, K. Ishikawa, K. Takeda, H. Kondo, M.Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Investigation of Si etch reaction with F and O radicals using SF6/O2 plasma
Low-damage, high-accuracy plasma etching of Ga-compound semiconductors

J. Cao, R. Kometani, J. Park, K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Low-damage, high-accuracy plasma etching of Ga-compound semiconductors
Low-temperature Insulating Film Formation with Plasma Enhanced Mist Chemical Vapor Deposition

K. Sun, K. Takeda, H. Itoh, H. Kondo, K. Ishikawa, M. Sekine, M. Hori

Dry Process Symposium 2013 (DPS2013) 2013.8

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Low-temperature Insulating Film Formation with Plasma Enhanced Mist Chemical Vapor Deposition
Measurement of carbon nanowalls / silicon substrate temperature by fourier-domain low-coherence interferometry

T. Hiraoka, T. Tsutsumi, H. Kato, K. Takeda, T. Ohta, H. Kondo, K. Ishikawa, M. Ito, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Measurement of carbon nanowalls / silicon substrate temperature by fourier-domain low-coherence interferometry
Mechanism for degradation of porous SiOCH low-K films by O2 plasma

K. Asano, K. Ishikawa, M. Sekine, K. Takeda, H. Kondo, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Mechanism for degradation of porous SiOCH low-K films by O2 plasma
Non-contact Temperature Monitoring of Substrates Using Optical Interferometry on Plasma Processing

T. Ohta, T. Takayoshi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori, M. Ito

Dry Process Symposium 2013 (DPS2013) 2013.8

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Non-contact Temperature Monitoring of Substrates Using Optical Interferometry on Plasma Processing
Non-contact measurements of substrate-temperature by frequency-domain low coherence interferometry

T. Tsutsumi, T. Ohta, K. Ishikawa, K Takeda, H. Kondo, M. Sekine, M. Hori, M. Ito

AVS 60th International Symposium & Exhibition 2013.10

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Non-contact measurements of substrate-temperature by frequency-domain low coherence interferometry
Nonequilibrium atmospheric pressure plasma selectively killed ovarian cancer cells and induced apoptosis

H. Tanaka, S. Iseki, K. Nakamura, M. Hayashi, H. Kondo, H. Kajiyama, H. Kano, F. Kikkawa, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Nonequilibrium atmospheric pressure plasma selectively killed ovarian cancer cells and induced apoptosis
Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition

M. Hiramatsu, Y. Nihashi, H. Kondo, M. Hori

The European Materials Conference European Materials Research Society Fall Meeting Scientific/Technical Symposia & Exhibition 2013.9

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Nucleation control of self-organized vertical nano-graphenes using inductively coupled plasma enhanced chemical vapor deposition
Plasma Etching of Ga-based Compound Semiconductor

J. Park, J. Cao, Z. Liu, T. Kako, K. Ishikawa, Y. Setsuhara, K. Takeda, H. Kondo, M. Sekine, M. Hori

Dry Process Symposium 2013 (DPS2013) 2013.8

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Plasma Etching of Ga-based Compound Semiconductor
Plasma-biological surface interaction investigated by electron spin resonance

H. Mizuno, K. Ishikawa, H. Tanaka, H. Hashizume, T. Ohta, M. Ito, K. Takeda, H. Kondo, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Plasma-biological surface interaction investigated by electron spin resonance
Plasma-mediated modulation of element distribution in skin and skin cancer

I. Yajima, M. Iida, K. Nakagawa, H. Kondo, M. Kumasaka, K. Takeda, M. Hori, H. Kano, M. Kato

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Plasma-mediated modulation of element distribution in skin and skin cancer
Plasma-surface intertactions in plasma etching of future device fabrication

K. Ishikawa, Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T.Hayashi, M. Sekine, M. Hori

The 16th International Workshop on Advanced Plasma Processing and Diagnostics 2013.1

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Plasma-surface intertactions in plasma etching of future device fabrication
Plasma-surface intertactions in plasma etching of future device fabrication

K. Ishikawa, Y. Miyawaki, T. Takeuchi, K. Takeda, S. Tajima, H. Kondo, T.Hayashi, M. Sekine, M. Hori

The 16th International Workshop on Advanced Plasma Processing and Diagnostics 2013.1

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Plasma-surface intertactions in plasma etching of future device fabrication
PlasmaInduced Surface Roughness of ArF Photoresist Examined by Plasma-Beam Processes

T. Takeuchi, Y. Zhang, K. Ishikawa, M. Sekine, Y. Setsuhara, K. Takeda, H. Kondo, M. Hori

AVS 60th International Symposium & Exhibition 2013.10

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PlasmaInduced Surface Roughness of ArF Photoresist Examined by Plasma-Beam Processes
Radical Density Control in H2/N2 Plasma Based on In-situ Monitoring with Vacuum Ultra Violet Absorption Spectroscopy

T. Suzuki, K. Takeda, K. Ishikawa, H. Kondo, M, Sekine, M. Hori

The 16th International Workshop on Advanced Plasma Processing and Diagnostics 2013.1

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Radical Density Control in H2/N2 Plasma Based on In-situ Monitoring with Vacuum Ultra Violet Absorption Spectroscopy
Rapid precise measurements of film-covered-substrate temperatures during plasma processes

M. Ito, T. Tsutsumi, T. Ohta, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori

The 1st International Conference on Surface Engineering (ICSE2013) 2013.11

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Rapid precise measurements of film-covered-substrate temperatures during plasma processes
Reaction Mechanism at the Sidewall of Through Si via (TSV) Etching by SF6/O2/SiF4 Plasma

I. Sakai, S. Amasaki, T. Takeuchi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, N. Sakurai, H. Hayashi, T. Ohiwa, M. Hori

AVS 60th International Symposium & Exhibition 2013.10

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Reaction Mechanism at the Sidewall of Through Si via (TSV) Etching by SF6/O2/SiF4 Plasma
Real time temperature measurements of film-covered-substrate employing fourier domain low coherence interferometer during plasma processes

T. Tsutsumi, T. Hiraoka, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, H. Kondo, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Real time temperature measurements of film-covered-substrate employing fourier domain low coherence interferometer during plasma processes
Real-time / In-situ Electron Spin Resonance Analysis of Chemical Reactions on Silicon-Nitride with CF4 Gas Plasma International conference

2013.9

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Real-time / In-situ Electron Spin Resonance Analysis of Chemical Reactions on Silicon-Nitride with CF4 Gas Plasma
Real-time / in-situ electron spin resonance analysis of plasma surface interactions

H. Wang, K. Ishikawa, H. Horibe, K. Takeda, H. Kondo, M, Sekine, M. Hori

The 16th International Workshop on Advanced Plasma Processing and Diagnostics 2013.1

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Real-time / in-situ electron spin resonance analysis of plasma surface interactions
Real-time variation of sputtering yield of Ar ion for ArF photoresist during Ar plasma exposure

T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. Keudell, K. Ishikawa, H. Kondo, K. Takeda, M. Sekine, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Real-time variation of sputtering yield of Ar ion for ArF photoresist during Ar plasma exposure
Recovery of Plasma-Damaged GaN by in situ Radical Exposure

Makoto Sekine, Zecheng Liu, Shang Chen, Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Masaru Hori

10th International Conference on Nitride Semiconductors (ICNS10) 2013.8

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Recovery of Plasma-Damaged GaN by in situ Radical Exposure
Reduction of Mechanism of Surface Roughness on ArF-Photoresist Using C5HF7 Gas Plasma

Y. Miyawaki, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, A. Ito, H. Matsumoto, M. Hori

66th Annual Gaseous Electronic Conference (GEC2013) 2013.9

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Reduction of Mechanism of Surface Roughness on ArF-Photoresist Using C5HF7 Gas Plasma
Reduction of surface roughness on ArF-photoresist by C5HF7 gas plasma

Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Satomi Tajima, Hiroki Kondo, Kenji Ishikawa, Toshio Hayashi, Makoto Sekine, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & 4th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials 2013.5

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Reduction of surface roughness on ArF-photoresist by C5HF7 gas plasma
Relation between gaseous radicals and μc-Si film property in SiH4/H2 plasma CVD

2013.1

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Venue：Nagoya University, Japan Country：Other
Sequential exposure of N and H atoms for recovery of plasma-damaged GaN

Z. Liu, S. Chen, Y. Lu, R. Kometani, K. Ishikawa, H. Kano, K. Takeda, H. Kondo, M. Sekine, T. Egawa, H. Amano, M. Hori

5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013) 2013.1

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Sequential exposure of N and H atoms for recovery of plasma-damaged GaN

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Surface potential control of carbon nanowalls template for highly efficient exosome analysis

橋本拓海, 近藤博基, 田中宏昌, 石川健治, 堤隆嘉, 関根誠, 安井隆雄, 馬場嘉信, 平松美根男, 堀勝

応用物理学会春季学術講演会講演予稿集(CD-ROM) 69th 2022 （ ISSN:2436-7613 ）

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大気圧プラズマ処理による異種材料接合

近藤博基, 堤隆嘉, 石川健治, 関根誠, 堀勝

化学工学（公益社団法人化学工学会） 2018.9

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Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma Reviewed

Zecheng Liu, Kenji Ishikawa, Masato Imamura, Takayoshi Tsutsumi, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 2018.6

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DOI： 10.7567/JJAP.57.06JD01
Effects of gas residence time of CH4/H2 on sp2 fraction of amorphous carbon films and dissociated methyl density during radical-injection plasma-enhanced chemical vapor deposition Reviewed

Hirotsugu Sugiura, Lingyun Jia, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Toshio Hayashi, Keigo Takeda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 2018.6

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DOI： 10.7567/JJAP.57.06JE03
Impact of helium pressure in arc plasma synthesis on crystallinity of single-walled carbon nanotubes Reviewed

Atsushi Ando, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Tomoko Suzuki, Sakae Inoue, Yoshinori Ando, Masaru Hori

Japanese Journal of Applied Physics 2018.6

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DOI： 10.7567/JJAP.57.06JF01
Oxygen reduction reaction properties of nitrogen-incorporated nanographenes synthesized using in-liquid plasma from mixture of ethanol and iron phthalocyanine

Tomoki Amano, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 2018.4

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DOI： 10.7567/JJAP.57.040303
Nanographene synthesized in triple-phase plasmas as a highly durable support of catalysts for polymer electrolyte fuel cells

Tomoki Amano, Hiroki Kondo, Keigo Takeda, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 2018.4

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DOI： 10.7567/JJAP.57.045101
Similarities And Differences In The Cellular Resposnses Between Plasma-Activated Medium-Treated Glioblastomas And Plasma-Activated Ringer's Lactate Solution-Treated Glioblastomas Reviewed

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Hiroshi Hashizume, Kae Nakamura, Hiroaki Kajiyama, Yasumasa Okazaki, Shinya Toyokuni, Shinichi Akiyama, Shoichi Maruyama, Fumitaka Kikkawa, Masaru Hori

Clinical Plasma Medicine 2018.2

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Similarities And Differences In The Cellular Resposnses Between Plasma-Activated Medium-Treated Glioblastomas And Plasma-Activated Ringer's Lactate Solution-Treated Glioblastomas

DOI： 10.1016/j.cpme.2017.12.066
Nanographene synthesis employing in-liquid plasmas with alcohols or hydrocarbons

Atsushi Ando, Kenji Ishikawa, Hiroki Kondo, Takayoshi Tsutsumi, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 2018.2

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DOI： 10.7567/JJAP.57.026201
Rapid growth of micron-sized graphene flakes using in-liquid plasma employing iron phthalocyanine-added ethanol

Tomoki Amano, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Keigo Takeda, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

Applied Physics Express 2018.1

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DOI： 10.7567/APEX.11.015102
Dynamic analysis of reactive oxygen nitrogen species in plasma-activated culture medium by UV absorption spectroscopy

Timothy R. Brubaker, Kenji Ishikawa, Keigo Takeda, Jun-Seok Oh, Hiroki Kondo, Hiroshi Hashizume, Hiromasa Tanaka, Sean D. Knecht, Sven G. Bilen, Masaru Hori

JOURNAL OF APPLIED PHYSICS 2017.12

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DOI： 10.1063/1.4999256
Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2017.11

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DOI： 10.1116/1.4994218
Intracellular responses to reactive oxygen and nitrogen species, and lipid peroxidation in apoptotic cells cultivated in plasma-activated medium

Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

PLASMA PROCESSES AND POLYMERS 2017.11

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DOI： 10.1002/ppap.201700123
High-durability catalytic electrode composed of Pt nanoparticle-supported carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition

Shun Imai, Hiroki Kondo, Hyungjun Cho, Hiroyuki Kano, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Masafumi Ito, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 2017.10

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DOI： 10.1088/1361-6463/aa8131
Lipid droplets exhaustion with caspases activation in HeLa cells cultured in plasma-activated medium observed by multiplex coherent anti-Stokes Raman scattering microscopy

Ryo Furuta, Naoyuki Kurake, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, Hiroshi Hashizume, Hiromasa Tanaka, Hiroki Kondo, Makoto Sekine, Masaru Hori

BIOINTERPHASES 2017.9

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DOI： 10.1116/1.4997170
Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

Zecheng Liu, Masato Imamura, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 2017.8

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DOI： 10.7567/APEX.10.086502
Temperature dependence of protection layer formation on organic trench sidewall in H-2/N-2 plasma etching with control of substrate temperature

Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2017.7

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DOI： 10.7567/JJAP.56.076202
Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy

Ryo Furuta, Naoyuki Kurake, Kenji Ishikawa, Keigo Takeda, Hiroshi Hashizume, Hiroki Kondo, Takayuki Ohta, Masafumi Ito, Makoto Sekine, Masaru Hori

PHYSICAL CHEMISTRY CHEMICAL PHYSICS 2017.6

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DOI： 10.1039/c7cp00489c
Electron behaviors in afterglow of synchronized dc-imposed pulsed fluorocarbon-based plasmas

Toshinari Ueyama, Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Manabu Iwata, Yoshinobu Ohya, Hideo Sugai, Masaru Hori

Japanese Journal of Applied Physics 2017.6

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DOI： 10.7567/JJAP.56.06HC03
Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 degrees C

Shinnosuke Takai, Yi Lu, Osamu Oda, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2017.6

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DOI： 10.7567/JJAP.56.06HE08
Hydrogen peroxide sensor based on carbon nanowalls grown by plasma-enhanced chemical vapor deposition

Masakazu Tomatsu, Mineo Hiramatsu, John S. Foord, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Keigo Takeda, Masaru Hori

Japanese Journal of Applied Physics 2017.6

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DOI： 10.7567/JJAP.56.06HF03
電子スピン共鳴法を活用したプラズマバイオ反応プロセスの診断

石川健治, 近藤隆, 竹田圭吾, 呉準席, 橋爪博司, 田中宏昌, 近藤博基, 太田貴之, 伊藤昌文, 関根誠堀勝

プラズマ・核融合学会誌 2017.5

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Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas

Yoshinobu Ohya, Kenji Ishikawa, Tatsuya Komuro, Tsuyoshi Yamaguchi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 2017.3

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DOI： 10.1088/1361-6463/aa60f7
Characteristics of optical emissions of arc plasma processing for high-rate synthesis of highly crystalline single-walled carbon nanotubes

Atsushi Ando, Keigo Takeda, Takayuki Ohta, Masafumi Ito, Mineo Hiramatsu, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Tomoko Suzuki, Sakae Inoue, Yoshinori Ando, Masaru Hori

Japanese Journal of Applied Physics 2017.3

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DOI： 10.7567/JJAP.56.035101
Investigation of effects of ion energies on both plasma-induced damage and surface morphologies and optimization of high-temperature Cl2 plasma etching of GaN

Zecheng Liu, Jialin Pan, Atsuki Asano, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Osamu Oda, Makoto Sekine, Masaru Hori

Japanese Journal of Applied Physics 2017.2

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DOI： 10.7567/JJAP.56.026502
Atomic layer etching of SiO2 by alternating an O-2 plasma with fluorocarbon film deposition

Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, Nobuyoshi Kobayashi

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2017.1

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DOI： 10.1116/1.4971171
Absolute density of precursor SiH3 radicals and H atoms in H-2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

Yusuke Abe, Kenji Ishikawa, Keigo Takeda, Takayoshi Tsutsumi, Atsushi Fukushima, Hiroki Kondo, Makoto Sekine, Masaru Hori

APPLIED PHYSICS LETTERS 2017.1

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DOI： 10.1063/1.4974821
ラジカル支援原子層制御ナノプロセス (小特集原子を積んで膜をつくる : ALDプロセスの化学工学的展開)

石川健治, 小林明子, 盧翌, 竹田圭吾, 近藤博基, 関根誠, 堀勝

化学工学 2016.7

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Plasma with high electron density and plasma-activated medium for cancer treatment

Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroshi Hashizume, Kae Nakamura, Fumi Utsumi, Hiroaki Kajiyama, Hiroyuki Kano, Yasumasa Okazaki, Shinya Toyokuni, Shin'ichi Akiyama, Shoichi Maruyama, Suguru Yamada, Yasuhiro Kodera, Hiroki Kaneko, Hiroko Terasaki, Hirokazu Hara, Tetsuo Adachi, Machiko Iida, Ichiro Yajima, Masashi Kato, Fumitaka Kikkawa, Masaru Hori

Clinical Plasma Medicine 2015.12

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DOI： 10.1016/j.cpme.2015.09.001
フォトリソグラフィとUVキュア処理によるナノギャップ電極形成

粂内真子, 熊谷慎也, 趙享峻, 今井駿, 近藤博基, 石川健治, 堀勝, 佐々木実

「センサ・マイクロマシンと応用システム」シンポジウム論文集電気学会センサ・マイクロマシン部門 [編] 2015.10

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シリコン薄膜形成プロセスにおけるプラズマ中の水素原子の計測とその挙動

堀勝, 阿部祐介, 竹田圭吾, 石川健治, 近藤博基, 関根誠, 韓銓建

プラズマ・核融合学会誌 2015.5

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Carbon nanowall scaffold to control culturing of cervical cancer cells Reviewed

Hitoshi Watanabe, Hiroki Kondo, Yukihiro Okamoto, Mineo Hiramatsu, Makoto Sekine, Yoshinobu Baba, Masaru Hori

APPLIED PHYSICS LETTERS 2014.12

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DOI： 10.1063/1.4902054
Recovery of atom density drift caused by change in reactor wall conditions by real-time autonomous control Reviewed

Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 2014.10

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DOI： 10.1088/0022-3727/47/42/422002
Temporal changes in absolute atom densities in H-2 and N-2 mixture gas plasmas by surface modifications of reactor wall Reviewed

Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Honi

JAPANESE JOURNAL OF APPLIED PHYSICS 2014.5

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DOI： 10.7567/JJAP.53.050301
Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O-2 non-equilibrium atmospheric-pressure plasma jet

Fengdong Jia, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Jagath Kularatne, Hiroki Kondo, Makoto Sekine, Masaru Hori

PLASMA SOURCES SCIENCE & TECHNOLOGY 2014.4

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DOI： 10.1088/0963-0252/23/2/025004
Effects of Different Chamber-Wall Conditions on Temporal Changes of H and N Radicals Densities in H2 and N2 Mixture Gas Plasma

Toshiya Suzuki, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

Jpn. J. Appl. Phys. 53 (5) (Apr 7, 2014) 050301 2014.4

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Effects of Different Chamber-Wall Conditions on Temporal Changes of H and N Radicals Densities in H2 and N2 Mixture Gas Plasma

DOI： 10.7567/JJAP.53.050301
Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls Reviewed

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu, Maseru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2014.4

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DOI： 10.7567/JJAP.53.040307
Epitaxial growth of GaN by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) in the downflow of a very high frequency (VHF) N-2/H-2 excited plasma - effect of TMG flow rate and VHF power Reviewed

Yi Lu, Hiroki Kondo, Kenji Ishikawa, Osamu Oda, Keigo Takeda, Makoto Sekine, Hiroshi Amano, Masaru Hori

JOURNAL OF CRYSTAL GROWTH 2014.4

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DOI： 10.1016/j.jcrysgro.2014.01.014
Hierarchical regrowth of flowerlike nanographene sheets on oxygen-plasma-treated carbon nanowalls Reviewed

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 2014.4

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DOI： 10.7567/APEX.7.046201
Nanostructure modification to carbon nanowall surface employing hydrogen peroxide solution Reviewed

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2014.4

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DOI： 10.7567/JJAP.53.040305
Density control of carbon nanowalls grown by CH4/H-2 plasma and their electrical properties Reviewed

Hyung Jun Cho, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hirarnatsu, Masaru Hori

CARBON 2014.3

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DOI： 10.1016/j.carbon.2013.11.014
Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C Reviewed

2014.1

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DOI： 10.7567/JJAP.53.010305
Field Emissions from Organic Nanorods Armored with Metal Nanoparticles

Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2013.12

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DOI： 10.7567/JJAP.52.120203
Effect of indirect nonequilibrium atmospheric pressure plasma on anti-proliferative activity against chronic chemo-resistant ovarian cancer cells in vitro and in vivo

Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, Fumitaka Kikkawa

PLoS ONE 2013.12

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DOI： 10.1371/journal.pone.0081576
High H radical density produced by 1-m-long atmospheric pressure microwave plasma system

Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, Masaru Hori

Japanese Journal of Applied Physics 2013.11

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DOI： 10.7567/JJAP.52.11NE01
Rapid measurement of substrate temperatures by frequency-domain low-coherence interferometry

Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, Masafumi Ito

APPLIED PHYSICS LETTERS 2013.10

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DOI： 10.1063/1.4827426
Atomic Oxygen Etching from the Top Edges of Carbon Nanowalls

Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 2013.9

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DOI： 10.7567/APEX.6.095201
Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability

Hitoshi Watanabe, Hiroki Kondo, Mineo Hiramatsu, Makoto Sekine, Shailesh Kumar, Kostya Ostrikov, Masaru Hori

PLASMA PROCESSES AND POLYMERS 2013.7

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DOI： 10.1002/ppap.201200141
Surface morphology on high-temperature plasma-etched gallium nitride

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

Trans. Mater. Res. Soc. Jpn. 38 (2) 2013.6

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Surface morphology on high-temperature plasma-etched gallium nitride
We report the surface morphology of gallium nitride (GaN) films during the argon and nitrogen plasma etching at elevated temperatures up to 800°C. For Ar plasma at high substrate temperatures above 600°C, Ar⁺ ion bombardment dissociates Ga-N bonds by the preferential removal of nitrogen, which promotes roughness of the GaN surface by the aggregation of gallium atoms. In N₂ plasma exposure, the N/Ga remains stoichiometric with higher values above 0.85, and the surface is not significantly roughened, even higher at 600°C. Therefore, the aggregation of metallic Ga induces surface roughening during ion-enhanced etching of GaN with elevated substrate temperatures.

DOI： 10.14723/tmrsj.38.325
A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 2013.5

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DOI： 10.7567/APEX.6.056201
Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO2 on Carbon Nanowalls

Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

APPLIED PHYSICS EXPRESS 2013.4

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DOI： 10.7567/APEX.6.045103
Surface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma

Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 2013.3

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DOI： 10.1088/0022-3727/46/10/102001
Graphene Nanowalls

Mineo Hiramatsu, Hiroki Kondo, Masaru Hori

Chapter 9 in Book "New Progress on Graphene Research" 2013.3

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Graphene Nanowalls

DOI： 10.5772/3358
I-1-2 高密度ラジカル源を用いた分子線エピタキシー法によるIII族窒化物エピタキシャル成長(窒化物半導体デバイスの精密加工プロセス-窒化物LEDに関わる先端デバイスプロセシング-,口頭発表)

河合洋次郎, 本田善央, 山口雅史, 天野浩, 近藤博基, 平松美根男, 加納浩之, 山川晃司, 田昭治, 堀勝

IIP情報・知能・精密機器部門講演会講演論文集 2013.3

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Although plasma-assisted molecular beam epitaxy(PA-MBE) is a promising technique for GaN growth,the growth rate obtained by this technique is lower than that obtained by metal organic vapor phase epitaxy(MOVPE).In order to improve the growth rate of the technique,high density radical source(HDRS) was developed.By vacuum ultraviolet absorption spectroscopy(VUVAS) measurement,two orders of magnitude higher radical density was confirmed in a comparison of the HDRS and a conventional radical source(CRS).While faster growth rate of 1.4μm/h in GaN homoepitaxy was achieved,better crystalline quality of InxGa_<(1-x)>N(x=0.03～0.16) epilayers with approximately 1.4μm thickness were also achieved by introducing the HDRS in PA-MBE.
Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma

Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2013.2

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DOI： 10.7567/JJAP.52.020204
Development of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy

Shang Chen, Yohjiro Kawai, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Hiroyuki Kano, Makoto Sekine, Hiroshi Amano, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2013.2

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DOI： 10.7567/JJAP.52.021001
Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma

Yudai Miyawaki, Emi Shibata, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Hidekazu Okamoto, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2013.2

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DOI： 10.7567/JJAP.52.020204
Surface loss probability of H radicals on silicon thin films in SiH4/H-2 plasma

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 2013.1

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DOI： 10.1063/1.4773104
Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment

Takuya Takeuchi, Carles Corbella, Simon Grosse-Kreul, Achim von Keudell, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 2013.1

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DOI： 10.1063/1.4772996
Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition

Mineo Hiramatsu, Masateru Naito, Hiroki Kondo, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2013.1

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DOI： 10.7567/JJAP.52.01AK04
Highly selective etching of SiO2 over Si3N 4 and Si in capacitively coupled plasma employing C 5HF7 gas

Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Atsuyo Yamazaki, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

Japanese Journal of Applied Physics 2013.1

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DOI： 10.7567/JJAP.52.016201
Highly selective etching of SiO2 over Si3N 4 and Si in capacitively coupled plasma employing C 5HF7 gas

Yudai Miyawaki, Yusuke Kondo, Makoto Sekine, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Atsuyo Yamazaki, Azumi Ito, Hirokazu Matsumoto, Masaru Hori

Japanese Journal of Applied Physics 2013.1

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DOI： 10.7567/JJAP.52.016201
Impact of hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells

Yusuke Abe, Sho Kawashima, Atsushi Fukushima, Ya Lu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF APPLIED PHYSICS 2013.1

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DOI： 10.1063/1.4778608
Nucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition

Mineo Hiramatsu, Yuki Nihashi, Hiroki Kondo, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2013.1

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DOI： 10.7567/JJAP.52.01AK05
Individual Roles of Atoms and Ions during Hydrogen Plasma Passivation of Surface Defects on GaN Created by Plasma Etching

Shang Chen, Kenji Ishikawa, Yi Lu, Ryosuke Kometani, Hiroki Kondo, Yutaka Tokuda, Takashi Egawa, Hiroshi Amano, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2012.11

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DOI： 10.1143/JJAP.51.111002
GRAPHENE FOREST DEVICES AS CELL SCAFFOLDS FOR STEM CELLS Reviewed

Yukihiro Okamoto, Hitoshi Watanabe, Kazutoshi Kubo, Hiroki Kondo, Noritada Kaji, Manabu Tokeshi, Masaru Hori, Yoshinobu Baba

Micro Total Analysis Systems 2012 2012.10

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GRAPHENE FOREST DEVICES AS CELL SCAFFOLDS FOR STEM CELLS
We developed carbon nanowalls devices (CNWs), on which graphenes vertically stand in the nanometer spacing like "graphene forest", with different wettability. CNWs permitted cell adhesion and proliferation, and especially super hydrophobic CNWs enabled easy and less invasive cell collection. Furthermore, collagen coated CNWs successfully enhanced the differential ability of the human mesenchymal stem cells (hMSC) to osteoblast cells compared to collagen coated polystyrene culture dishes. Thus, CNWs have superior many properties as cells scaffolds and are expected to be useful for regenerative medicine.
Critical flux ratio of hydrogen radical to film precursor in microcrystalline silicon deposition for solar cells

Yusuke Abe, Atsushi Fukushima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

APPLIED PHYSICS LETTERS 2012.10

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DOI： 10.1063/1.4764065
プラズマナノテクノロジーによる10mmサイズ、超高アスペクト比有機ナノピラーの室温近傍形成とフレキシブルディスプレイへの応用

堀勝, 鈴木俊哉, 竹田圭吾, 近藤博基, 石川健治, 関根誠

名古屋大学ベンチャー・ビジネス・ラボラトリーニュース/2012, Summer, No.33 2012.8

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Real-time in situ electron spin resonance measurements on fungal spores of Penicillium digitatum during exposure of oxygen plasmas

Kenji Ishikawa, Hiroko Mizuno, Hiromasa Tanaka, Kazuhiro Tamiya, Hiroshi Hashizume, Takayuki Ohta, Masafumi Ito, Sachiko Iseki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

APPLIED PHYSICS LETTERS 2012.7

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DOI： 10.1063/1.4733387
Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

Shang Chen, Yi Lu, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Yutaka Tokuda, Makoto Sekine, Masaru Hori

AIP ADVANCES 2012.6

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DOI： 10.1063/1.4729448
Ultrahigh-Speed Synthesis of Nanographene Using Alcohol In-Liquid Plasma

Tatsuya Hagino, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Masaru Hori

APPLIED PHYSICS EXPRESS 2012.3

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DOI： 10.1143/APEX.5.035101
Selective killing of ovarian cancer cells through induction of apoptosis by nonequilibrium atmospheric pressure plasma

Sachiko Iseki, Kae Nakamura, Moemi Hayashi, Hiromasa Tanaka, Hiroki Kondo, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, Masaru Hori

APPLIED PHYSICS LETTERS 2012.3

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DOI： 10.1063/1.3694928
プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析(3)

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 竹田圭吾, 近藤博基, 関根誠, 関根誠, 堀勝, 堀勝

応用物理学関係連合講演会講演予稿集(CD-ROM) 2012.2

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Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation

Masanaga Fukasawa, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Hiroyasu Matsugai, Takayoshi Honda, Masaki Minam, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi

Jpn. J. Appl. Phys. 51 (2012) 026201 2012.1

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Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect of Hydrogenated Silicon Nitride Etching: Surface Reaction Enhancement and Damage Generation
Control of Super Hydrophobic and Super Hydrophilic Surfaces of Carbon Nanowalls Using Atmospheric Pressure Plasma Treatments

Hitoshi Watanabe, Hiroki Kondo, Makoto Sekine, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2012.1

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DOI： 10.1143/JJAP.51.01AJ07
Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

Tsuyoshi Yamaguchi, Tatsuya Komuro, Chishio Koshimizu, Seigo Takashima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

JOURNAL OF PHYSICS D-APPLIED PHYSICS 2012.1

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DOI： 10.1088/0022-3727/45/2/025203
Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature

Hiroshi Yamamoto, Hiroki Kuroda, Masafumi Ito, Takayuki Ohta, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2012.1

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DOI： 10.1143/JJAP.51.016202
Synchrotron x-ray analyses of crystalline and electronic structures of carbon nanowalls

Hiroki Kondo, Wakana Takeuchi, Masaru Hori, Shigeru Kimura, Yukako Kato, Takayuki Muro, Toyohiko Kinoshita, Osami Sakata, Hiroo Tajiri, Mineo Hiramatsu

APPLIED PHYSICS LETTERS 2011.11

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DOI： 10.1063/1.3659470
Nucleation and Vertical Growth of Nano-Graphene Sheets

Hiroki Kondo, Masaru Hori, Mineo Hiramatsu

Graphene - Synthesis, Characterization, Properties and Applications 2011.9

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Nucleation and Vertical Growth of Nano-Graphene Sheets

DOI： 10.5772/23703
プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析(2)

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 竹田圭吾, 近藤博基, 関根誠, 関根誠, 堀勝, 堀勝

応用物理学会学術講演会講演予稿集(CD-ROM) 2011.8

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Impacts of CF+, CF2+, CF3+, and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist

Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2011.8

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DOI： 10.1143/JJAP.50.08JE05
Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen :A Real-time In Situ Electron Spin Resonance Study

Kenji Ishikwa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

Physical Chemistry 2011.7

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Synergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen :A Real-time In Situ Electron Spin Resonance Study
Reactive Ion Etching of Carbon Nanowalls

Shingo Kondo, Hiroki Kondo, Yudai Miyawaki, Hajime Sasaki, Hiroyuki Kano, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2011.7

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DOI： 10.1143/JJAP.50.075101
Control of interfacial properties of Pr-oxide/Ge gate stack structure by introduction of nitrogen

Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima

SOLID-STATE ELECTRONICS 2011.6

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DOI： 10.1016/j.sse.2011.01.029
液中プラズマを用いたナノグラフェンの高速合成技術 (特集「グラフェン」の実務的な視点での開発トレンド)

近藤博基, 加納浩之, 堀勝

マテリアルステージ 11(2) 2011.5

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Formation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition

Kota Mase, Hiroki Kondo, Shingo Kondo, Masaru Hori, Mineo Hiramatsu, Hiroyuki Kano

APPLIED PHYSICS LETTERS 2011.5

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DOI： 10.1063/1.3583672
Radical-controlled plasma processing for nanofabrication

Masaru Hori, Hiroki Kondo, Mineo Hiramatsu

JOURNAL OF PHYSICS D-APPLIED PHYSICS 2011.5

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DOI： 10.1088/0022-3727/44/17/174027
プラズマCVD法によるカーボンナノウォールの制御合成

近藤博基, 平松美根男, 堀勝

マテリアルステージ 11(2) 2011.5

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Spontaneous formation of highly regular superlattice structure in InGaN epilayers grown by molecular beam epitaxy

Z. H. Wu, Y. Kawai, Y. -Y. Fang, C. Q. Chen, H. Kondo, M. Hori, Y. Honda, M. Yamaguchi, H. Amano

APPLIED PHYSICS LETTERS 2011.4

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DOI： 10.1063/1.3574607
Analysis of Local Leakage Current of Pr-Oxide Thin Films with Conductive Atomic Force Microscopy

Masaki Adachi, Yuzo Kato, Kimihiko Kato, Mitsuo Sakashita, Hiroki Kondo, Wakana Takeuchi, Osamu Nakatsuka, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 2011.4

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DOI： 10.1143/JJAP.50.04DA08
Effect of Pr Valence State on Interfacial Structure and Electrical Properties of Pr Oxide/PrON/Ge Gate Stack Structure

Kimihiko Kato, Mitsuo Sakashita, Wakana Takeuchi, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 2011.4

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DOI： 10.1143/JJAP.50.04DA17
プラズマプロセス中における有機薄膜表面反応の実時間・その場観察電子スピン共鳴(ESR)解析

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 竹田圭吾, 近藤博基, 関根誠, 関根誠, 堀勝, 堀勝

応用物理学関係連合講演会講演予稿集(CD-ROM) 2011.3

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Electron field emission enhancement of carbon nanowalls by plasma surface nitridation

Wakana Takeuchi, Hiroki Kondo, Tomomi Obayashi, Mineo Hiramatsu, Masaru Hori

APPLIED PHYSICS LETTERS 2011.3

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DOI： 10.1063/1.3532114
Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet

Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, Masaru Hori

Applied Physics 2011.1

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Laser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet
Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N-2-H-2 Mixture Plasmas

Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2011.1

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DOI： 10.1143/JJAP.50.01AE03
Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N-2-H-2 Mixture Plasmas

Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2011.1

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DOI： 10.1143/JJAP.50.01AE03
In Situ Electron Spin Resonance Study for Plasma Surface Interactions

K. Ishikawa, N. Sumi, A. Kono, HORIBE,HIDEO, K. Takeda, H. Kondo, M. Sekine, M. Hori

7th International Conference on Reactive Plasmas 2010.10

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和周波振動分光(SFG)によるポリフッ化ビニリデンの分極配向特性評価

石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 堀勝

応用物理学会学術講演会講演予稿集(CD-ROM) 2010.8

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リアルタイム電子スピン共鳴によるプラズマ誘起表面反応の解析

鷲見直也, 石川健治, 河野昭彦, 堀邊英夫, 竹田圭吾, 近藤博基, 関根誠, 関根誠, 堀勝, 堀勝

応用物理学会学術講演会講演予稿集(CD-ROM) 2010.8

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原子層堆積法により形成したPrAlOの結晶構造および電気的特性

古田和也, 竹内和歌奈, 坂下満男, 近藤博基, 中塚理, 財満鎭明

電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス 2010.6

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本研究ではSi基板上にPr(EtCp)_3,トリメチルアルミニウム(TMA)およびH_2Oを用いた原子層堆積(ALD)法を用いてPrAlO(PAO)膜を形成し,その電気的特性を明らかにした.X線光電子分光(XPS)法から,膜中に界面反応を引き起こしたSiが表面付近に偏析していることが分かり,Al導入によってそれが減少していることが分かった.このことは,Al導入によって界面反応が抑制されていることを示唆している.一方,Deep level transient spectroscopy (DLTS)の結果,Al導入によって浅い準位において界面準位密度が減少した.従って,浅い準位の界面準位密度は,界面反応に起因していると推測される.Alの導入によって界面反応の制御が可能であることを明らかにした.
Optical Properties of Evolutionary Grown Layers of Carbon Nanowalls Analyzed by Spectroscopic Ellipsometry Reviewed

Shinji Kawai, Shingo Kondo, Wakana Takeuchi, Hiroki Kondo, Mineo Hiramatsu, Masaru Hori

JAPANESE JOURNAL OF APPLIED PHYSICS 2010.6

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DOI： 10.1143/JJAP.49.060220
Metal-organic chemical vapor deposition of high-dielectric-constant praseodymium oxide films using a cyclopentadienyl precursor Reviewed

Hiroki Kondo, Shinnya Sakurai, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

APPLIED PHYSICS LETTERS 2010.1

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DOI： 10.1063/1.3275706
Formation processes of Ge3N4 films by radical nitridation and their electrical properties Reviewed

Kimihiko Kato, Hiroki Kondo, Mitsuo Sakashita, Shigeaki Zaima

THIN SOLID FILMS 2010.1

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DOI： 10.1016/j.tsf.2009.10.094
Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Akinori Ebe, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

THIN SOLID FILMS 2009.12

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DOI： 10.1016/j.tsf.2009.07.161
Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units Reviewed

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Akinori Ebe, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

THIN SOLID FILMS 2009.12

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DOI： 10.1016/j.tsf.2009.07.161
Novel Method to Introduce Uniaxial Tensile Strain in Ge by Microfabrication of Ge/Si1-xGex Structures on Si(001) Substrates Reviewed

T. Mizutani, O. Nakatsuka, A. Sakai, H. Kondo, M. Ogawa, S. Zaima

Solid-State Electronics 2009.9

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Novel Method to Introduce Uniaxial Tensile Strain in Ge by Microfabrication of Ge/Si1-xGex Structures on Si(001) Substrates
We have proposed a novel method to form by microfabrication a uniaxial tensile strained Ge layer due to the elastic strain relaxation of a Si1-xGex buffer layer on a Si(0 0 1) substrate. A fully strain-relaxed Ge layer on a compressive strained Si0.60Ge0.40 was epitaxially grown on Si(0 0 1) substrate and striped mesa lines were fabricated with a line width of 250 nm along the [1 1 0] direction. The strain of the Si0.60Ge0.40 layer was found to be elastically relaxed only along the direction perpendicular to the lines and a uniaxial tensile strained Ge layer was thus formed. The value of tensile strain of the Ge layer is estimated to be 0.25%.
ラジカル窒化法による High-k/Ge 界面構造制御

加藤公彦, 近藤博基, 坂下満男, 財満鎭明

電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス 2009.6

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高移動度Geチャネルを有するmetal-oxide-semiconductor(MOS)型トランジスタの実現に向け、熱処理や溶液処理に対してロバストな高誘電率金属酸化膜/Ge構造の構築が求められている。本研究では、高誘電率金属酸化膜/Ge構造における界面層として期待されるGe_3N_4膜に関し、ラジカル窒化法による形成過程を明らかにし、更にPr酸化膜/Ge_3N_4/Ge構造の電気的特性を評価した。ラジカル窒化法では、50-600℃の広い温度範囲でStoichiometryなGe_3N_4が形成された。一方、飽和膜厚の窒化温度依存性は窒化温度によって異なり、Ge_3N_4形成に支配的な拡散種が異なると考えられる。またAu/Ge_3N_4/Ge構造におけるリーク電流密度は、窒化温度300℃において最も小さいことがわかった。ラジカル窒化法と原子層堆積法によってPr酸化膜/Ge_3N_4/Ge構造を作製した場合、Pr酸化膜/Ge界面にはPr酸窒化膜が形成される。またAl/Pr酸化膜/Ge_3N_4/Ge MOSキャパシタでは、H_2およびN_2雰囲気での熱処理によって界面準位密度が大幅に減少することが分かった。
LaAlO/Ge構造へのALD-Al_2O_3界面制御層挿入の効果

坂下満男, 加藤亮祐, 京極真也, 近藤博基, 財満鎭明

電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス 2009.6

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GeチャネルMOSFETは高速動作および低電圧動作デバイスとして期待され、また一方で、high-k材料によるゲート絶縁膜はEOTの低減に有効であり、high-k/Ge構造のMOSFETは次世代デバイスとして有望視されている。しかしながら、high-kゲート絶縁膜とGe基板との界面反応によって、ゲート絶縁膜の誘電率は低下し、また、界面準位密度は増加する。そこで、high-kゲート絶縁膜とGe基板との界面にALD法によって形成した極薄のAl_2O_3界面制御層を挿入し、その効果について検討した。なお、本研究ではhigh-kゲート絶縁膜としてLaAlO膜を用いた。厚さ1nm以下のAl_2O_3界面制御層によってGe界面での界面反応は効果的に抑制でき、界面反応によって形成されたGe-oxide層はAl_2O_3界面制御層の厚さの増加とともに減少することが分かった。また、0.4nm程度の厚さのAl_2O_3界面制御層において界面準位密度の低減効果を確認した。さらに、600℃の熱処理に対しても構造は変化せず、熱的にも安定であることが分かった。
Pr(EtCp)_3を用いた原子層堆積法によるPr酸化膜の形成

近藤博基, 古田和也, 松井裕高, 坂下満男, 財満鎭明

電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス 2009.6

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Pr(EtCp)_3を用いた原子層堆積法(ALD)によるPr酸化膜の成長手法について研究を行い,ウェハー面内での膜厚ばらつきが2%以下であるPr酸化膜のALD成長を実現した.同ALDでは主として立方晶のPr_2O_3が形成したが,Si(100)基板上のPr_2O_3膜が多結晶構造であるのに対し,Si(111)基板上では立方晶Pr_2O_3がエピタキシャル成長することがわかった.一方,Al/ALD-Pr_2O_3/Si(100)およびAl/ALD-Pr_2O_3/Si(111)MOSキャパシタの容量-電圧特性によれば,ALDによって成長した立方晶Pr_2O_3の比誘電率は12.3～16.8であった.電子銃蒸着法や化学気相蒸着法(CVD)で成長したPr酸化膜の結晶構造および成長条件との比較から,ALDプロセスにおいてH_2O分圧を最適化することにより,Pr酸化膜の結晶構造が制御可能であると考えられる。
*Effects of Atomic Layer Deposition-Al2O3 Interface Layers on Interfacial Properties of Ge Metal–Oxide–Semiconductor Capacitors Reviewed

2009.5

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DOI： 10.1143/JJAP.48.05DA04
Thermal Stability and Scalability of Mictamict Ti-Si-N Metal-Oxide-Semiconductor Gate Electrodes Reviewed

Hiroki Kondo, Kouhei Furumai, Mitsuo Sakashita, Akira Sakai, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 2009.4

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DOI： 10.1143/JJAP.48.04C012
Nitrogen-Content Dependence of Crystalline Structures and Resistivity of Hf-Si-N Gate Electrodes for Metal-Oxide-Semiconductor Field-Effect Transistors Reviewed

Kazuaki Miyamoto, Kouhei Furumai, Ben E. Urban, Hiroki Kondo, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 2009.4

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DOI： 10.1143/JJAP.48.045505
Silicide and germanide technology for contacts and gates in MOSFET applications Reviewed

Shigeaki Zaima, Osamu Nakatsuka, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa

THIN SOLID FILMS 2008.11

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DOI： 10.1016/j.tsf.2008.08.097
Formation of high-density Si nanodots by agglomeration of ultra-thin amorphous Si films Reviewed

Hiroki Kondo, Tomonori Ueyama, Eiji Ikenaga, Keisuke Kobayashi, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

THIN SOLID FILMS 2008.11

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DOI： 10.1016/j.tsf.2008.08.079
MOCVD法によるPr酸化膜の作製およびその電気的特性評価

近藤博基, 櫻井晋也, 酒井朗, 小川正毅, 財満鎭明

信学技報 2008.6

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Ge表面酸化および窒化処理と High-k ゲートスタック構造形成プロセス

近藤博基, 坂下満男, 中塚理, 小川正毅, 財満鎭明

電気学会研究会資料. EFM, 電子材料研究会 2008.5

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Crystalline and electrical properties of mictamict TiSiN gate metal-oxcide-semiconductor capacitors Reviewed

Kouhei Furumai, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS 2008.4

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DOI： 10.1143/JJAP.47.2420
シリコン表面の窒化初期過程とエネルギーバンドキャップの形成 Reviewed

近藤博基, 財満鎭明, 堀勝, 酒井朗, 小川正毅

真空 2007.11

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Initial stage of processes and energy bandgap formation in nitridation of silicon surfaces using nitrogen radicals have been studied. 
According to scanning tunneling microscopy observations and scanning tunneling spectroscopy measurements, at the initial stage of 
nitridation, linear defects perpendicular to dimmer rows were formed to coincide with an initial nitridation reaction preferentially at 
backbonds of surface Si atoms. After the nitride formation, the surface roughness depends only on substrate temperature regardless of 
radio frequency (RF) power, which means that the growth mode of nitrides is attributed to the surface migration. Contrary, the energy 
bandgap of silicon nitrides is signiˆcantly aŠected by not only substrate temperature but also RF power. Absorption and emission 
spectroscopy results suggest that the contribution of the excited-state nitrogen atoms to the nitridation increases with increasing the 
RF power. Control of surface migration and radical species is crucial to form the monolayer-thick nitride layer with both an atomically 
‰at surface and a wide energy bandgap.
Crystalline and electrical properties of mictamict TiSiN gate MOS capacitors

FURUMAI Kouhei, KONDO Hiroki, SAKASHITA Mitsuo, SAKAI Akira, OGAWA Masaki, ZAIMA Shigeaki

Extended abstracts of the ... Conference on Solid State Devices and Materials 2007.9

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Crystalline and electrical properties of mictamict TiSiN gate MOS capacitors
CS-5-2 Si_<1-X>Ge_X/Si(001)構造における転位および歪の評価と制御技術(CS-5.異種材料融合デバイス技術,シンポジウム)

中塚理, 酒井朗, 近藤博基, 小川正毅, 財満鎭明

電子情報通信学会ソサイエティ大会講演論文集 2007.8

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Composition dependence of work function in metal (Ni,Pt)-germanide gate electrodes Reviewed

Daisuke Ikeno, Yukihiro Kaneko, Hiroki Kondo, Mitsuo Sakashita, Akira Sakai, Masaki Ogawa, Shigeaki Zaima

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2007.4

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DOI： 10.1143/JJAP.46.1865
Strain relaxation of patterned Ge and SiGe layers on Si(001) substrates Reviewed

Shogo Mochizuki, Akira Sakai, Osamu Nakatsuka, Hiroki Kondo, Katsunori Yukawa, Koji Izunome, Takeshi Senda, Eiji Toyoda, Masaki Ogawa, Shigeaki Zaima

SEMICONDUCTOR SCIENCE AND TECHNOLOGY 2007.1

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DOI： 10.1088/0268-1242/22/1/S31
Growth and energy bandgap formation of silicon nitride films in radical nitridation Reviewed

Hiroki Kondo, Keigo Kawaai, Akira Sakai, Masaru Hori, Shigeaki Zaima, Yukio Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2007.1

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DOI： 10.1143/JJAP.46.71
Composition Dependence of Work Function in Metal (Ni, Pt)-Germanide Gate Electrodes

IKENO Daisuke, FURUMAI Kouhei, KONDO Hiroki, SAKASHITA Mitsuo, SAKAI Akira, OGAWA Masaki, ZAIMA Shigeaki

Extended abstracts of the ... Conference on Solid State Devices and Materials 2006.9

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Composition Dependence of Work Function in Metal (Ni, Pt)-Germanide Gate Electrodes
Sub‐100nmゲート領域におけるNiシリサイド形成反応の観察

伊東大介, 酒井朗, 中塚理, 近藤博基, 赤坂泰志, 奈良安雄, 小川正毅, 財満鎮明

応用物理学関係連合講演会講演予稿集 2006.3

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Initial growth process of TiN films in ultrahigh-vacuum rapid thermal chemical vapor deposition Reviewed

Y Okuda, S Naito, O Nakatsuka, H Kondo, T Okuhara, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2006.1

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DOI： 10.1143/JJAP.45.49
Analysis of local breakdown process in stressed gate SiO2 films by conductive atomic force microscopy

A Seko, Y Watanabe, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2005.10

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DOI： 10.1143/JJAP.44.7582
Analysis of local breakdown process in stressed gate SiO2 films by conductive atomic force microscopy Reviewed

A Seko, Y Watanabe, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2005.10

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DOI： 10.1143/JJAP.44.7582
超高密度・極微細シリコンナノドットの形成技術とメモリ特性 (特集1 次世代不揮発メモリーの開発・高集積化とその市場)

財満鎭明, 内藤慎哉, 近藤博基

マテリアルステージ 2005.6

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電流注入ストレスを加えたゲート酸化膜の電流検出型原子間力顕微鏡による解析 Reviewed

世古明義, 渡辺行彦, 近藤博基, 酒井朗, 財満鎭明, 安田幸夫

電子情報通信学会論文誌 2004.10

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Detection and characterization of stress-induced defects in gate SiO2 films by conductive atomic force microscopy Reviewed

Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2004.7

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DOI： 10.1143/JJAP.43.4679
Behavior of local current leakage in stressed gate SiO2 films analyzed by conductive atomic force microscopy

A Seko, Y Watanabe, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2004.7

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DOI： 10.1143/JJAP.43.4683
電流検出型原子間力顕微鏡を用いたゲート絶縁膜の局所リーク電流評価

世古明義, 渡辺行彦, 近藤博基, 酒井朗, 財満鎭明, 安田幸夫

電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス 2004.6

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電流検出型原子間力顕微鏡法(Conductive Atomic Force Microscopy : C-AFM)を用いて、ゲート絶縁膜における局所リ-ク電流をナノスケール観察し、絶縁膜の信頼性劣化機構を解明した。MOSキャパシタにおいてストレス印加したゲートSiO_2膜をC-AFM観察したところ、電流像に局所なりーク電流スポットを観測がされ、その電流-電圧特性の解析などからストレス誘起欠陥に起因する局所リーク電流であることがわかった。更に、ストレス誘起欠陥における電荷充放電現象とマクロなデバイス特性劣化との相関、局所リーク電流と絶縁破壊現象との関連が明らかになった。また、高誘電率絶縁膜において、電流リークパスと結晶構造との相関を明らかにした。
Growth of silicon nanocrystal dots with high number density by ultra-high-vacuum chemical vapor deposition Reviewed

S Naito, M Satake, H Kondo, M Sakashita, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2004.6

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DOI： 10.1143/JJAP.43.3779
ラジカル窒化過程におけるエネルギーバンドギャップ形成機構のSTM/STS解析

近藤博基, 河合圭吾, 宮崎香代子, 酒井朗, 財満鎭明, 安田幸夫

電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス 2004.6

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次世代ゲート絶縁膜として期待されるシリコン窒化膜について、ラジカル窒化法における初期成膜過程をSTMならびにSTSによって解析した。ラジカル窒化過程では、成膜様式(層状成長または島状成長)は窒化種に依存せず、成膜温度のみに依存するが、エネルギーバンドギャップはラジカルガンの高周波電源電力の変化に伴う窒化種の変化に強く依存することがわかった。原子レベルで平坦で、大きなエネルギーバンドギャップを持つラジカル窒化膜の形成には、窒化種の制御が重要であることがわかった。
Conductive atomic force microscopy analysis for local electrical characteristics in stressed SiO2 gate films Reviewed

Y Watanabe, A Seko, H Kondo, A Sakai, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2004.4

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DOI： 10.1143/JJAP.43.1843
Microscopic Analysis of Stress-Induced Leakage Current in Stressed Gate SiO2Films Using Conductive Atomic Force Microscopy Reviewed

Watanabe Yukihiko, Seko Akiyoshi, Kondo Hiroki, Sakai Akira, Zaima Shigeaki, Yasuda Yukio

Japanese Journal of Applied Physics 2004.1

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Microscopic Analysis of Stress-Induced Leakage Current in Stressed Gate SiO2Films Using Conductive Atomic Force Microscopy
We have developed a method of microscopically analyzing the degradation of gate SiO2 films in actual metal-oxide-semiconductor (MOS) devices by conductive atomic force microscopy (C-AFM). In C-AFM images of electrically stressed SiO2 films, leakage current spots on a nanometer scale were successfully observed. The observed current spots show characteristic behaviors similar to the transient stress-induced leakage current which can be detected by macroscopic electrical measurements using MOS capacitors. The appearance of the current spots is discussed on the basis of the mechanism by which holes are trapped and detrapped by stress-induced defects in SiO2 films.

DOI： 10.1143/jjap.43.l144
電子注入ストレスを加えたゲート酸化膜の電流検出型原子間力顕微鏡による解析 : ゲート絶縁膜劣化機構の微視的評価

世古明義, 渡辺行彦, 近藤博基, 酒井朗, 財満鎭明, 安田幸夫

電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス 2003.6

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電流検出型原子間力顕微鏡法(Conducting Atomic Force Microscopy :C-AFM)を用いて、Metal-Oxide-Semiconductor(MOS)キャパシタで観測される絶縁膜劣化を、ナノスケールで直接観察する手法を開発した。定電流ストレスを印加したシリコン酸化膜を本手法によって観察した結果、Transient Stress-Induced Leakage Current (Transient-SILC)と考えられる局所リーク電流スポットが観測された。これにより、ストレス誘起される膜中欠陥の局所性と分布、それらに起因した局所的なリーク伝導機構が実験的に明らかになった。
Coulomb blockade phenomena in Si metal-oxide-semiconductor field-effect transistors with nano-scale channels fabricated using focused-ion beam implantation Reviewed

H Kondo, K Izumikawa, M Sakurai, S Baba, H Iwano, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 1999.12

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DOI： 10.1143/JJAP.38.7222
Conductance oscillations in low-dimensional ion implanted regions annealed by rapid thermal annealing Reviewed

H Kondo, K Kaga, S Baba, H Iwano, S Zaima, Y Yasuda

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 1999.4

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Language：English

DOI： 10.1143/JJAP.38.1843
Conductance Oscillations in Hopping Conduction Systems Fabricated by Focused Ion Beam Implantation Reviewed

Hiroki Kondo, Hirotaka Iwano, Osamu Nakatsuka, Kazutaka Kaga, Shigeaki Zaima, Yukio Yasuda

Japanese Journal of Applied Physics 1997.6

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DOI： 10.1143/jjap.36.4046

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Works

名大、プラズマの医療応用研究拠点を設置

2013.8

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名大など、窒化物半導体の結晶成長を五倍高速化―HDRS新開発

2013.5

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次世代有機フレキシブルデバイスに向けたソフト材料の超高精度・超高アスペクト比加工～自律型プラズマナノ製造装置による超微細有機膜エッチングを実現～

2011.7

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新規グラフェン材料であるカーボンナノウォールを用いた次世代デバイスの創製～カーボンナノウォールのバンド構造および電子物性の解明に成功～

2010.5

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Professional Memberships

The Surface Science Society of Japan
the Japan Society of Applied Physics
Electrochemical society

Committee Memberships

Electrochemical society Steering committee member Foreign country

2023.4 - 2024.4
Electrochemical society Associate board member, Dielectric division Foreign country

2023.4 - 2024.4
シリコンテクノロジー分科会・ナノマイクロファブリケーション研究委員会・委員長委員長 Domestic

2019.4 - 2023.12
応用物理学会シリコンテクノロジー分科会ナノ・マイクロファブリケーション研究委員会委員長

2019.4 - 2023.12

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Organizer Domestic

2018.4 - 2021.3
応用物理学会東海支部役員会幹事

2014.4 - Present

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Organizer Domestic

2013.4 - 2024.4
応用物理学会シリコンテクノロジー分科会幹事

2013.4

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Academic Activities

実行委員 International contribution

（名古屋大学） 2025.3 - 2024.3

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Type：Competition, symposium, etc.

Number of participants：300
Program committee International contribution

PRiME 2024 （ Hawaii Convention Center & Hilton Hawaiian Village UnitedStatesofAmerica ） 2024.10

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Type：Competition, symposium, etc.

Number of participants：7,000
Program committee International contribution

245th, Electrochemical society (ECS), meeting （ San Francisco, CA UnitedStatesofAmerica ） 2024.5

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Type：Competition, symposium, etc.

Number of participants：6,500
実行委員 International contribution

（名古屋大学） 2024.3

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Type：Competition, symposium, etc.

Number of participants：300
Associated program committee International contribution

244th, Electrochemical society (ECS), Fall meeting （ Gothenburg Sweden ） 2023.10

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Type：Competition, symposium, etc.

Number of participants：6,500

Research Projects

プラズマ支援CVD法におけるアモルファスカーボンの成膜機構の情報学援用解析

2024.10

共同研究

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Authorship：Principal investigator Grant type：Other funds from industry-academia collaboration
基板間ハイブリッド接合に資するカーボンキャップ層の選択成長技術の開発

2024

名古屋大学低温プラズマ科学研究センター共同利用・共同研究

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Authorship：Principal investigator Grant type：Contract research
Smart process for plasma surface processing of the inner surface of small holes

Grant number：23K22659 2022.4 - 2026.3

Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B)

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Grant type：Scientific research funding

CiNii Research
細穴内面プラズマ表面加工のスマートプロセス化

Grant number：22H01388 2022 - 2025

日本学術振興会科学研究費助成事業基盤研究(B)

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Authorship：Coinvestigator(s) Grant type：Scientific research funding
超グラフェン新機能材料の創生

2020 - 2021

JSPS 国際交流事業・二国間交流事業（スロベニア(MESS)との共同研究）

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Authorship：Principal investigator Grant type：Contract research
非平衡大気圧プラズマによるナノ複合材料の合成と表面機能化

2019 - 2024

戦略的国際共同研究プログラム（ＳＩＣＯＲＰ）「日本－中国国際共同研究イノベーション拠点共同研究」（環境／エネルギー分野）

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Authorship：Principal investigator Grant type：Contract research
高移動度InNチャネルに向けた高密度ラジカル照射下における初期成長機構の解明

Grant number：18H01890 2018 - 2020

日本学術振興会科学研究費助成事業基盤研究(B)

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カーボンナノウォールシートエッジエレクトロニクスの創成と単一細胞の分化誘導制御

Grant number：15H02032 2015 - 2017

日本学術振興会科学研究費助成事業基盤研究(A)

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Authorship：Coinvestigator(s) Grant type：Scientific research funding
プラズマ微細加工におけるナノ揺らぎ制御に係わるプラズマ科学の創成

Grant number：25286080 2013 - 2015

日本学術振興会科学研究費助成事業基盤研究(B)

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Authorship：Collaborating Investigator(s) (not designated on Grant-in-Aid) Grant type：Scientific research funding
ナノカーボン多層構造物を用いた超小型炭素水素化合物センサーの開発

Grant number：25600123 2013 - 2014

科学研究費助成事業挑戦的萌芽研究

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Authorship：Collaborating Investigator(s) (not designated on Grant-in-Aid) Grant type：Scientific research funding
気液プラズマ照射下におけるバイオマテリアル形態変化のその場電子顕微鏡観察

Grant number：25600122 2013 - 2014

科学研究費助成事業挑戦的萌芽研究

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Authorship：Principal investigator Grant type：Scientific research funding
プラズマ医療のための気相・表界面反応ダイナミクスの計測と体系化

Grant number：24108002 2012 - 2016

日本学術振興会・文部科学省科学研究費助成事業新学術領域研究（研究領域提案型）

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Authorship：Coinvestigator(s) Grant type：Scientific research funding
プラズマ照射下その場原子分解能観察による垂直成長ナノグラフェン成長素過程の解明

Grant number：24360015 2012 - 2014

日本学術振興会科学研究費助成事業基盤研究(B)

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Authorship：Principal investigator Grant type：Scientific research funding
シリコン系エンジニアリングサブストレート実現のための材料・物性・構造制御技術

Grant number：21246009 2009 - 2011

日本学術振興会科学研究費助成事業基盤研究(A)

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Authorship：Coinvestigator(s) Grant type：Scientific research funding
ナノスケールULSIデバイスのためのミクタミクト合金電極・配線の創成

Grant number：19686004 2007 - 2008

科学研究費助成事業若手研究(A)

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Authorship：Principal investigator Grant type：Scientific research funding
ナノシステム機能化High-kゲート/歪制御ゲルマニウムチャネル構造の創成

Grant number：18063012 2006 - 2009

科学研究費助成事業特定領域研究

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Authorship：Coinvestigator(s) Grant type：Scientific research funding
非熱平衡原子固溶プロセスに基づく超高速伸張歪Geチャネルの創成

Grant number：18206005 2006 - 2008

日本学術振興会科学研究費助成事業基盤研究(A)

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Authorship：Coinvestigator(s) Grant type：Scientific research funding
IV族半導体極微細プロセスに向けた固相反応のダイナミクス制御とCエンジニアリング

Grant number：15206004 2003 - 2005

日本学術振興会科学研究費助成事業基盤研究(A)

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Authorship：Coinvestigator(s) Grant type：Scientific research funding
単一電子トラップ直視技術の開発とそれを用いた極薄ゲート絶縁膜の絶縁劣化機構の解明

2001 - 2004

日本学術振興会科学研究費助成事業基盤研究(C)

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Authorship：Principal investigator Grant type：Scientific research funding
単一電子トラップ直視技術の開発とそれを用いた極薄ゲート絶縁膜の劣化機構の解明

Grant number：13305005 2001 - 2004

日本学術振興会科学研究費助成事業基盤研究(A)

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Authorship：Principal investigator Grant type：Scientific research funding

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Class subject

半導体社会実装学特論

2024.10 - 2025.3 Second semester
半導体社会実装学特論

2024.10 - 2025.3 Second semester
(IUPE)Fundamentals of Integrated Circuits B

2024.6 - 2024.8 Summer quarter
電気電子工学読解Ⅰ

2024.4 - 2024.9 First semester
電気電子工学演示Ⅰ

2024.4 - 2024.9 First semester
(IUPE)Fundamentals of Integrated Circuits A

2024.4 - 2024.6 Spring quarter
半導体社会実装概論

2024.4 - 2024.6 Spring quarter
半導体社会実装学特論

2024.10 - 2025.3 Second semester
(IUPE)Fundamentals of Integrated Circuits B

2024.6 - 2024.8 Summer quarter
電気電子工学読解Ⅰ

2024.4 - 2024.9 First semester
電気電子工学演示Ⅰ

2024.4 - 2024.9 First semester
(IUPE)Fundamentals of Integrated Circuits A

2024.4 - 2024.6 Spring quarter

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FD Participation

2023.11 Role：Participation Title：【シス情FD】企業等との共同研究の実施増加に向けて

Organizer：[Undergraduate school/graduate school/graduate faculty]

Visiting, concurrent, or part-time lecturers at other universities, institutions, etc.

2024 岐阜大学プラズマ応用研究センター・特別講義「X線光電子分光の基礎と実践」 Classification:Intensive course Domestic/International Classification:Japan

Semester, Day Time or Duration：2024年7月25日3-4限
2023 名古屋大学低温プラズマ科学研究センター Classification:Affiliate faculty Domestic/International Classification:Japan

Semester, Day Time or Duration：通年
2023 岐阜大学プラズマ応用研究センター・特別講義「X線光電子分光の基礎と実践」 Classification:Intensive course Domestic/International Classification:Japan

Semester, Day Time or Duration：2023年6月22日3-4限

Activities contributing to policy formation, academic promotion, etc.

2023.10 - Present プラズマ・核融合学会

プラズマ医療科学に基づいたソフトマテリアルのプロセス，材料，計測，評価の進化
2023.4 - Present 電気学会

放電・プラズマ・パルスパワーにおける計測技術の現状と将来について調査専門委員会

Travel Abroad

2024.3

Staying countory name 1：United States Staying institution name 1：Micron
2024.3

Staying countory name 1：United States Staying institution name 1：Boise State University
2024.2

Staying countory name 1：India Staying institution name 1：SRM Institute of Science & Technology, Kattankulathur