Updated on 2024/10/08

Information

 

写真a

 
KOGA KAZUNORI
 
Organization
Faculty of Information Science and Electrical Engineering Department of Electronics Professor
Center of Plasma Nono-interface Engineering (Concurrent)
School of Engineering Department of Electrical Engineering and Computer Science(Concurrent)
Graduate School of Information Science and Electrical Engineering Department of Electrical and Electronic Engineering(Concurrent)
Joint Graduate School of Mathematics for Innovation (Concurrent)
Title
Professor
Contact information
メールアドレス
Profile
1)研究活動概要  半導体産業などの先端産業を支える基盤技術の中にプラズマプロセスがある。プラズマプロセスの発展が半導体産業の発展つながる事から、プラズマプロセスの高精度化が様々角度から進められている。当研究室ではプラズマプロセスの高精度技術の開発と新たな応用展開の開拓を主な課題として、次のような研究を行っている. ・高品質半導体/炭素薄膜プロセスの創成 ・プラズマのバイオ応用研究 ・高品質半導体/炭素薄膜プロセスの創成  ドライプロセスであるプラズマは、不純物の少ない薄膜堆積法として、現在半導体デバイスや太陽光発電をはじめとする様々な分野で活用されている。次世代デバイスの実現にはプラズマプロセスの高性能化は必須であり、当研究室では、プラズマプロセスの基礎研究と製造技術の開発に世界に先駆けて取り組んでいる。  その関連研究として、プラズマ応用計測技術の開発やプラズマで発生するナノ粒子用いたナノ構造デバイスの創製などを行っている。 ・プラズマのバイオ応用研究  プラズマで発生する化学的活性な分子をもちいて生体応答を制御する研究が世界中で活発に研究されている。当研究室では、植物を対象にプラズマ照射による成長促進機構の解明と農業応用を検討している。種子への短時間照射による、成長促進を発見ししている。  その他、プラズマプロセスやプラズマエッチングに深く関与するプラズマシースに励起される非線形現象の研究や、プラズマプロセスの情報学的検討なども行っている。 2)教育活動概要  学部講義・演習と大学院生向け講義を担当している。
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Research Areas

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electric and electronic materials

  • Nanotechnology/Materials / Thin film/surface and interfacial physical properties

  • Energy Engineering / Fundamental plasma

  • Energy Engineering / Applied plasma science

Degree

  • Doctor of Science

Research History

  • - Kyushu University, Research Associate.

    1999

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  • - 九州大学 助手

    1999

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Education

  • Kyushu University   Graduate School, Division of Integrated Science and Engineering

    - 1999

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  • Kyushu University

    - 1999

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    Country: Japan

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  • Kyushu University   Faculty of Science

    - 1994

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  • Kyushu University   School of Sciences

    - 1994

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    Country: Japan

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Research Interests・Research Keywords

  • Research theme:plasma physics

    Keyword:plasma physics

    Research period: 2024

  • Research theme:plasma process

    Keyword:plasma process

    Research period: 2024

  • Research theme:plasma nanotechnology

    Keyword:plasma nanotechnology

    Research period: 2024

  • Research theme:plasma agriculture

    Keyword:plasma agriculture

    Research period: 2024

  • Research theme:Forth generation plasma-bio technology

    Keyword:cell activation control

    Research period: 2009.4

  • Research theme:Development of deposition of low-k dielectrics for next generation LSI

    Keyword:low-k dielectrics

    Research period: 2002.1

  • Research theme:Study on particle formation mechanism due to interaction between plasma and carbon wall

    Keyword:plasma wall interaction, nuclear fusion

    Research period: 2001.1

  • Research theme:Control of Film Characteristics of a-C:H using Nanoparticles

    Keyword:amorphous carbon

    Research period: 1999.4

  • Research theme:Development of Cu interconnect in next generation LSI

    Keyword:Cu interconnect

    Research period: 1999.4

  • Research theme:Study on high rate deposition of high quality materials for solar cells

    Keyword:amorphous silicon

    Research period: 1999.4

  • Research theme:Study on formation mechanism and control of particles in processing plasmas

    Keyword:processing plasma, particle

    Research period: 1999.4

Awards

  • 第21回プラズマ材料科学賞奨励部門賞

    2020.2   プラズマ材料科学賞選考委員会  

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    反応性プラズマにおけるナノ粒子成長揺らぎの制御に関する研究

  • 第14回プラズマエレクトロニクス賞

    2016.3   応用物理学会プラズマエレクトロニクス分科会  

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    "Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap" N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani

  • ICMAP2014 Best Poster Presentation Award

    2014.7   International Conference of Microelectronics and Plasma Technology 2014 (ICMAP2014)  

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    "Atmospheric Pressure DBD Plasma Irradiation to Seeds of Glycine max (L.)Merrill and Vigna radiata" T. Amano, T. Sarinont, K. Koga, and M. Shiratani

  • ICMAP2014 Best Poster Presentation Award

    2013.8   International Conference of Microelectronics ans Plasma Technology 2014 (ICMAP2014)  

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    "Atmospheric Pressure DBD Plasma Irradiation to Seeds of Glycine max (L.)Merrill and Vigna radiata" T. Amano, T. Sarinont, K. Koga, and M. Shiratani

  • The 9th Asian-European International Conference of Plasma Surface Engineering(AEPSE2013)/ Outstanding Poster Award

    2013.8  

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    "Time evolution of spatial profile of nanoparticle amount in reactive plasmas" Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga and M. Shiratani

  • ISSP2013 Best Poster Award

    2013.7   12th International Symposium on Sputtering & Plasma Processes  

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    "Sputter Deposition of Single Crystal ZnO Films on 18% Lattice mismatched c-Al2O3 Substrates via Nitrogen Mediated Crystallization" N. Itagaki, K. Kuwahara, I. Suhariadi, K. Oshikawa, K. Matsushima, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, and M. Shiratani

  • Advanced Plasma Application Award

    2012.10   11th Asia Pacific Conference on Plasma Science adn Technology (APCPST) & 25th Symposium on Plasma Science for Materials (SPSM)  

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    Zinc-Indium Oxynitride Thin Films for Multiple-Quantum–Well Solar Cells
    N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani

  • IUMRS-ICEM2012 "Young Scientist Awards: Silver Award Winners"

    2012.9  

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    "High Capacity Li Ion Battery Anodes Using Silicon Carbide Nanoparticles Produced by Double Multi-Hollow Discharge Plasma CVD"
    K. Kamataki, M. Shiratani, T. Ishihara, H. Nagano, Y. Morita, K. Kuwahara, G. Uchida, H. Seo, N. Itagaki, K. Koga

  • Best Presentation Award

    2012.3   ISPlasma2012  

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    Interaction between amplitude modulated reactive plasmas and nanoparitcles grown in the plasmas
    KUNIHIRO KAMATAKI, KAZUNORI KOGA, GIICHIRO UCHIDA, NAHO ITAGAKI, HYUNWOONG SEO AND MASAHARU SHIRATANI

  • Invited Presentation Award

    2008.6   Interfinish 2008 World Congress and Exposition  

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    "Deposition profile control of plasma CVD films on nano-patterned substrates" M. Shiratani, K. Koga

  • 応用物理学会第3回プラズマエレクトロニクス賞

    2005.3   応用物理学会プラズマエレクトロニクス分科会  

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    対象論文 “Cluster-suppressed plasma chemical vapor deposition method for high quality hydrgenated amorphous silicon films”, K. Koga, M. Kai, M. Shiratani, Y. Watanabe, and N. Shikatani, Japanese Journal of Applied Physics, Vol.41, pp. L168-170 (2002).

  • 第10回応用物理学会講演奨励賞

    2001.5   応用物理学会  

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    対象講演「クラスタ抑制プラズマCVD装置による高品質a-Si : H作製」
    (古閑一憲, 園田剛士,鹿谷昇,白谷正治,渡辺征夫)

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Papers

  • Comparison between Ar+CH4 Cathode and Anode Coupled Capacitively Coupled Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Films Reviewed International journal

    S. H. Hwang, R. Iwamoto, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani

    Thin Solid Films   729   2021.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.tsf.2021.138701

  • Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells Reviewed International journal

    F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura

    J. Mol. Struct.   1228   2021.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.molstruc.2020.129479

  • Alterations of DNA Methylation Caused by Cold Plasma Treatment Restore Delayed Germination of Heat-Stressed Rice (Oryza sativa L.) Seeds Reviewed International journal

    C. Suriyasak, K. Hatanaka, H. Tanaka, T. Okumura, D. Yamashita, P. Attri, K. Koga, M. Shiratani, N. Hamaoka, Y. Ishibashi

    ACS Agric. Sci. Technol.   1 ( 1 )   2021.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1021/acsagscitech.0c00070

  • Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture Reviewed International journal

    P. Attri, K. Ishikawa, T. Okumura, K. Koga, M. Shiratani, V. Mildaziene

    Sci. Rep.   11 ( 1 )   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41598-021-81175-x

  • Effects of Activated Carbon Counter Electrode On Bifacial Dye Sensitized Solar Cells (DSSCs) Reviewed International journal

    T. E. Putri, Y. Hao, F. L. Chawarambwa, H. Seo, Min-Kyu Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Mater. Sci. Forum   1016   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.4028/www.scientific.net/MSF.1016.863

  • Possible impact of plasma oxidation on the structure of C-terminal domain of SARS-CoV-2 spike protein: a computational study Reviewed International journal

    P. Attri, K. Koga, M. Shiratani

    Jpn. J. Appl. Phys.   14 ( 2 )   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1882-0786/abd717

  • Long-term response of Norway spruce to seed treatment with cold plasma: dependence of the effects on the genotype Reviewed International journal

    Plasma Process Polym   2020.12

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/ppap.202000159

  • Experimental identification of the reactive oxygen species transported into a liquid by plasma irradiation Reviewed International journal

    T. Kawasaki, K. Koga, M. Shiratani

    Jpn. J. Appl. Phys.   59 ( 11 )   2020.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abc3a1

  • Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition Reviewed International journal

    S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Diam Relat Mater   109   2020.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.diamond.2020.108050

  • Graphene-Si3N4 nanocomposite blended polymer counter electrode for low-cost dye-sensitized solar cells Reviewed International journal

    F. L. Chawarambwa, T. E. Putri, M. K. Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Chem. Phys. Lett.   758   2020.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.cplett.2020.137920

  • Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells Reviewed International journal

    F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura

    J. Mol. Struct.   2020.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.molstruc.2020.129479

  • Impact of surface morphologies of substrates on the epitaxial growth of magnetron sputtered (ZnO)x(InN)1-x films Reviewed International journal

    R. Narishige, K. Kaneshima, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

    Jpn. J. Appl. Phys.   60 ( SA )   2020.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abba0c

  • Cold plasma treatment of sunflower seeds modulates plant-associated microbiome and stimulates root and lateral organ growth Reviewed International journal

    Front. Plant Sci.   11   2020.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3389/fpls.2020.568924

  • Real-time monitoring of surface passivationof crystalline silicon during growth of amorphous and epitaxial silicon layer Reviewed International journal

    S. Nunomura, I. Sakata, H. Sakakita, K. Koga, M. Shiratani

    J. Appl. Phys.   128 ( 3 )   2020.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0011563

  • Cold plasma treatment of Arabidopsis thaliana (L.) seeds modulates plant-associated microbiome composition Reviewed International journal

    Applied Physics Express   13   2020.5

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    Language:English  

    DOI: 10.35848/1882-0786/ab9712

  • Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition Reviewed International journal

    N. Itagaki, Y. Nakamura, R. Narishige, K. Takeda, K. Kamataki, K. Koga, M. Hori, M. Shiratani

    Sci. Rep.   10 ( 1 )   2020.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41598-020-61596-w

  • Effects of surrounding gas on plasma-induced downward liquid flow Reviewed International journal

    T. Kawasaki, K. Nishida, G. Uchida, F. Mitsugi, K. Takenaka, K. Koga, Y. Setsuhara, M. Shiratani

    Jpn. J. Appl. Phys.   59 ( SH )   2020.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ab71dc

  • Impact of radish sprouts seeds coat color on the electron paramagnetic resonance signals after plasma treatment Reviewed International journal

    K. Koga, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene

    Jpn. J. Appl. Phys.   59 ( SH )   2020.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ab7698

  • Relationship between cold plasma treatment-induced changes in radish seed germination and phytohormone balance Reviewed International journal

    L. D. Fomins, G. Pauzaite, R. Zukiene, V. Mildaziene, K. Koga, M. Shiratani

    Jpn. J. Appl. Phys.   59   2020.2

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    Language:English  

    DOI: 10.7567/1347-4065/ab656c

  • Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth Reviewed International journal

    R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani

    Appl. Phys. Express   12 ( 12 )   2019.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/1882-0786/ab5491

  • Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD Reviewed International journal

    K. Tanaka, H. Hara, S. Nagaishi, L. Shi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Plasma Fusion Res.   14   2019.9

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    Language:English  

    DOI: 10.1585/pfr.14.4406141

  • Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma Reviewed International journal

    R. Zhou, K. Kamataki, H. Ohtomo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani

    Plasma Fusion Res.   14   2019.9

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    Language:English  

    DOI: 10.1585/pfr.14.4406120

  • Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition Reviewed International journal

    S. H. Hwang, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Plasma Fusion Res.   14   2019.9

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    Language:English  

    DOI: 10.1585/pfr.14.4406115

  • Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films Reviewed International journal

    L. Shi, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Plasma Fusion Res.   14   2019.9

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    Language:English  

    DOI: 10.1585/pfr.14.4406144

  • Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes? Reviewed International journal

    T. Iwase, Y. Kamaji, S. Y. Kang, K. Koga, N. Kuboi, M. Nakamura, N. Negishi, T. Nozaki, S. Nunomura, D. Ogawa, M. Omura, T. Shimizu, K. Shinoda, Y. Sonoda, H. Suzuki, K. Takahashi, T. Tsutsumi, K. Yoshikawa, T. Ishijima, K. Ishikawa

    Jpn. J. Appl. Phys.   58   2019.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/1347-4065/ab163a

  • Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition Reviewed International journal

    T. Kojima, S. Toko, K. Tanaka, H. Seo, N. Itagaki, K. Koga, M. Shiratani

    Plasma Fusion Res.   13   1406082   2018.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1585/pfr.13.1406082

  • Dependence of CO2 Conversion to CH4 on CO2 Flow Rate in Helicon Discharge Plasma Reviewed International journal

    S. Toko, R. Katayama, K. Koga, E. Leal-Quiros, M. Shiratani

    Sci. Adv. Mater.   10 ( 5 )   2018.5

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    Language:English  

    DOI: 10.1166/sam.2018.3141

  • Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body Reviewed International journal

    K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani

    ECS Transactions   77 ( 3 )   2017.5

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1149/07703.0017ecst

  • Plant Growth Enhancement of Seeds Immersed in Plasma Activated Water Reviewed International journal

    T. Sarinont, R. Katayama, Y. Wada, K. Koga, M. Shiratani

    MRS Adv.   2 ( 18 )   2017.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1557/adv.2017.178

  • Response of Silkworm Larvae to Atmospheric Pressure Non-thermal Plasma Irradiation Reviewed International journal

    T. Sarinont, Y. Wada, K. Koga, M. Shiratani

    Plasma Medicine   6 ( 3-4 )   2017.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1615/PlasmaMed.2017019137

  • Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization Reviewed International journal

    K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    MRS Adv.   2 ( 5 )   2016.12

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1557/adv.2016.617

  • Blue Photoluminescence of (ZnO)0.92(InN)0.08 Reviewed International journal

    K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    MRS Adv.   2 ( 5 )   2016.12

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1557/adv.2016.625

  • Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication Reviewed International journal

    M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga

    Materials Science Forum   879   2016.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.4028/www.scientific.net/MSF.879.1772

  • R&D status of agricultural applications of high voltage and plasma in Japan Invited International journal

    M. Shiratani, T. Sarinont, K. Koga and N. Hayashi

    Proc. Workshop on Application of Advanced Plasma Technologies in CE Agriculture   2016.4

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  • Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition Reviewed International journal

    H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani

    Sci. Adv. Mater.   8 ( 3 )   2016.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1166/sam.2016.2520

  • Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering Reviewed International journal

    K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    MRS Advances   1 ( 2 )   2016.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1557/adv.2015.59

  • Plant Growth Response to Atmospheric Air Plasma Treatments of Seeds of 5 Plant Species Reviewed International journal

    M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga

    MRS Adv.   1 ( 18 )   2016.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1557/adv.2016.37

  • Production of In, Au, and Pt nanoparticles by discharge plasmas in water for assessment of their bio-compatibility and toxicity Reviewed International journal

    T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani

    MRS Adv.   1 ( 18 )   2016.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1557/adv.2016.41

  • 水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価

    白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ

    九州大学超顕微解析研究センター報告   39   2015.12

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    Language:Japanese  

  • Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD Reviewed International journal

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

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    Language:English   Publishing type:Research paper (international conference proceedings)  

  • Discharge characteristics and hydrodynamics behaviors of atmospheric plasma jets produced in various gas flow patterns Reviewed International journal

    Y. Setsuhara, G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

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    Language:English  

  • Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation Reviewed International journal

    G. Uchida, A. Nakajima, T. Kawasaki, K. Koga, K. Takenaka, M. Shiratani, Y. Setsuhara

    Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

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  • Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds Reviewed International journal

    T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

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  • Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization Reviewed International journal

    T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

    Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

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  • Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films Reviewed International journal

    K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

    Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

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  • Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films Reviewed International journal

    T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

    Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

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  • Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering Reviewed International journal

    K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    Mat. Res. Soc. Symp. Proc.   1741   2015.3

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    DOI: 10.1557/opl.2015.248

  • ZnO-based semiconductors with tunable band gap for solar sell applications Invited Reviewed International journal

    N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani

    Proc. SPIE photonics west 2015   9364   2015.3

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    DOI: 10.1117/12.2078114

  • Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering Reviewed International journal

    T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    Mat. Res. Soc. Symp. Proc.   1741   2015.2

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    DOI: 10.1557/opl.2015.87

  • Effects of Atmospheric Air Plasma Irradiation to Seeds of Radish Sprouts on Chlorophyll and Carotenoids Concentrations in their Leaves Reviewed International journal

    T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi

    Mat. Res. Soc. Symp. Proc.   1723   2015.2

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    DOI: 10.1557/opl.2015.39

  • Comparative Study on the Pulmonary Toxicity of Indium Hydroxide, Indium-Tin Oxide, and Indium Oxide Following Intratracheal Instillations into the Lungs of Rats Reviewed International journal

    A. Tanaka, M. Hirata, N. Matsumura, K. Koga, M. Shiratani, Y. Kiyohara

    Mat. Res. Soc. Symp. Proc.   1723   2015.2

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    DOI: 10.1557/opl.2015.21

  • Multigeneration Effects of Plasma Irradiation to Seeds of Arabidopsis Thaliana and Zinnia on Their Growth Reviewed International journal

    T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi

    Mat. Res. Soc. Symp. Proc.   1723   2015.1

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    DOI: 10.1557/opl.2015.12

  • 反応性微粒子プラズマプロセスを用いたゲルマニウム結晶ナノ粒子含有膜の堆積と量子ドット太陽電池への応用 Reviewed

    内田儀一郎, 市田大樹, 徐鉉雄, 古閑一憲, 白谷正治

    スマートプロセス学会誌   4 ( 1 )   2015.1

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  • SiC Nanoparticle Composite Anode for Li-Ion Batteries Reviewed International journal

    M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara

    Mat. Res. Soc. Symp. Proc.   1678   2014.7

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    DOI: 10.1557/opl.2014.742

  • Control of the area irradiated by the sheet-type plasma jet in atmospheric pressure Reviewed International journal

    T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012016

  • Formation of carbon nanoparticle using Ar+CH4 high pressure nanosecond discharges Reviewed International journal

    K. Koga, X. Dong, S. Iwashita, U. Czarnetzki and M. Shiratani

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012020

  • Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock Reviewed International journal

    T. Sarinont, T. Amano, S. Kitazaki, K. Koga, G. Uchida, M. Shiratani and N. Hayashi

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012017

  • Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator Reviewed International journal

    M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012009

  • Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD Reviewed International journal

    S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012008

  • Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method Reviewed International journal

    D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012002

  • Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency Reviewed International journal

    Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012007

  • Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence Reviewed International journal

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012010

  • Plasma etching of single fine particle trapped in Ar plasma by optical tweezers Reviewed International journal

    T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani

    J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

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    DOI: 10.1088/1742-6596/518/1/012014

  • Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization Invited Reviewed International journal

    N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani

    Proc. SPIE photonics west 2014   8987   2014.3

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    DOI: 10.1117/12.2041081

  • Effects of Atmospheric Air Plasma Irradiation on pH of Water Reviewed International journal

    T. Sarinont, K. Koga, S. Kitazaki, G. Uchida, N. Hayashi, M. Shiratani

    JPS Conf. Proc.   1   2014.3

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    DOI: 10.7566/JPSCP.1.015078

  • Pressure dependence of carbon film deposition using H-assisted plasma CVD Reviewed International journal

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori

    Proc. 8th Int. Conf. Reactive Plasmas   2014.2

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  • Effects of growth enhancement by plasma irradiation to seeds in water Reviewed International journal

    T. Sarinont, K. Koga, S. Kitazaki, M. Shiratani, N. Hayashi

    Proc. 8th Int. Conf. Reactive Plasmas   2014.2

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  • Long term growth of radish sprouts after atmospheric pressure DBD plasma irradiation to seeds Reviewed International journal

    T. Amano, T. Sarinont, S. Kitazaki, N. Hayashi, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   2014.2

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  • Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited) Invited Reviewed International journal

    K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   2014.2

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  • Visualization of oxidizing substances generated by atmospheric pressure non-thermal plasma jet with water Reviewed International journal

    T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   2014.2

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  • Growth control of ZnO nano-rod with various seeds and photovoltaic application Reviewed International journal

    H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    J. Phys. : Conference Series (11th APCPST)   441 ( 1 )   2013.6

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    DOI: 10.1088/1742-6596/441/1/012029

  • Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices Invited Reviewed International journal

    M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga

    Proc. 13th International Conference on Plasma Surface Engineering   2 ( 26 )   2013.3

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  • Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats Reviewed International journal

    A. Tanaka, M. Hirata, M. Shiratani, K. Koga, Y. Kiyohara

    Journal of Occupational Health   54 ( 3 )   2012.6

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    DOI: 10.1539/joh.11-0164-OA

  • The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition Reviewed International journal

    H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Mat. Res. Soc. Symp. Proc.   1426   2012.4

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    DOI: 10.1557/opl.2012.890

  • Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth Reviewed International journal

    S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi

    Mat. Res. Soc. Symp. Proc.   1469   2012.4

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    DOI: 10.1557/opl.2012.969

  • Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth Reviewed International journal

    Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga and M. Shiratani

    Mat. Res. Soc. Symp. Proc.   1469   2012.4

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    DOI: 10.1557/opl.2012.970

  • Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation Reviewed International journal

    S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi

    Mat. Res. Soc. Symp. Proc.   1469   2012.4

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    DOI: 10.1557/opl.2012.966

  • Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition Reviewed International journal

    M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga

    Mat. Res. Soc. Symp. Proc.   1426   2012.4

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    DOI: 10.1557/opl.2012.1245

  • In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances Reviewed International journal

    Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Mat. Res. Soc. Symp. Proc.   1426   2012.4

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    DOI: 10.1557/opl.2012.839

  • Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure International journal

    K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. Plasma Conf. 2011   2011.11

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  • Deposition of FeSi2 nano-particle film International journal

    M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga and M. Shiratani

    Proc. Plasma Conf. 2011   2011.11

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  • Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor International journal

    T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. Plasma Conf. 2011   2011.11

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  • Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation International journal

    S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi

    Proc. Plasma Conf. 2011   2011.11

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  • Production Process of Carbon Nanotube Coagulates International journal

    T. Mieno, K. Koga, M. Shiratani

    Proc. Plasma Conf. 2011   2011.11

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  • Influence of active oxygen species produced by atmospheric torch plasma on plant growth Reviewed International journal

    N. Hayashi, Y. Akiyoshi, S. Kitazaki, K. Koga, M. Shiratani

    Proc. Intern. Symp. on Dry Process   33   2011.11

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  • Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon Reviewed International journal

    T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. Intern. Symp. on Dry Process   33   2011.11

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  • Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges Reviewed International journal

    M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga, M. Shiratani

    Proc. PVSEC-21   2011.11

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  • Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD Reviewed International journal

    K. Hatozaki, K. Nakahara, G. Uchida, K. Koga, M. Shiratani

    Proc. PVSEC-21   2011.11

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  • Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method International journal

    K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani

    Proc. Plasma Conf. 2011   2011.11

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  • Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer International journal

    Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Proc. Intern. Symp. on Dry Process   33   2011.11

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  • Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD Reviewed International journal

    G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani

    Physica Status Solidi (c)   8 ( 10 )   2011.10

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    DOI: 10.1002/pssc.201001230

  • Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method Reviewed International journal

    K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani

    Physica Status Solidi (c)   8 ( 10 )   2011.10

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    DOI: 10.1002/pssc.201100229

  • Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye Reviewed International journal

    G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani

    Physica Status Solidi (c)   8 ( 10 )   2011.10

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    DOI: 10.1002/pssc.201100166

  • Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD International journal

    T. Urakawa, T. Nomura, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    2011.7

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  • Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics Invited Reviewed International journal

    K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani

    International Conference on Advances in Condensed and Nano Materials (ICACNM)   1393   2011.2

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    DOI: 10.1063/1.3653600

  • マルチホロー放電プラズマCVDによる量子ドット増感太陽電池用シリコンナノ結晶粒子の作製

    内田儀一郎, 古閑一憲, 白谷正治

    ケミカルエンジニヤリング   55 ( 12 )   947 - 954   2010.12

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  • Fluctuation Control for Plasma Nanotechnologies Reviewed International journal

    M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5685920

  • Growth Stimulation of Radish Sprouts Using Discharge Plasma Reviewed International journal

    S. Kitazaki, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686474

  • Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD Reviewed International journal

    Y. Kawashima, K. Yamamoto, M. Sato, T. Matsunaga, K. Nakahara, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686677

  • Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma Reviewed International journal

    Y. Akiyoshi, A. Nakahigashi, N. Hayashi, S. Kitazaki, Takuro Iwao, K. Koga, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686467

  • Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches Reviewed International journal

    T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686688

  • Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges Reviewed International journal

    K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686686

  • Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD Reviewed International journal

    T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686679

  • Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma Reviewed International journal

    K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686456

  • Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge Reviewed International journal

    G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. IEEE TENCON 2010   2010.11

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    DOI: 10.1109/TENCON.2010.5686704

  • Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method International journal

    K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

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  • Plasma parameter measurements of Ar+H2+C7H8 plasma in H-assisted plasma CVD reactor International journal

    T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

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  • Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge International journal

    A. Nakahigashi, Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, M. Shiratani

    Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

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  • Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD International journal

    T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

    Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

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  • Quantum dot-sensitized solar cells using Si nanoparticles Reviewed International journal

    Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo

    35 ( 3 )   2010.9

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  • Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD Reviewed International journal

    Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo

    Proc. 35th IEEE Photovoltaic Specialists Conf.   2010.7

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    DOI: 10.1109/PVSC.2010.5617205

  • Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition Reviewed International journal

    K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani

    Proc. 35th IEEE Photovoltaic Specialists Conf.   2010.7

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    DOI: 10.1109/PVSC.2010.5616502

  • Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method Reviewed International journal

    K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 35th IEEE Photovoltaic Specialists Conf.   2010.7

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    DOI: 10.1109/PVSC.2010.5616514

  • Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD International journal

    Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo

    Proc. of the 27th symposium on plasma processing   ( B5-05 )   2010.2

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  • Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor International journal

    T. Nomura, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. of the 27th symposium on plasma processing   ( P1-39 )   2010.2

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  • Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2 International journal

    K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani

    Proc. of the 27th symposium on plasma processing   ( A5-06 )   2010.2

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  • In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity) International journal

    T. Mieno, GuoDong Tan, S. Usuba, K. Koga, M. Shiratani

    Proc. of the 27th symposium on plasma processing   ( P2-17 )   2010.2

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  • In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasma and Inner Wall in LHD International journal

    H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD Experimental Group

    Proc. of the 27th symposium on plasma processing   ( P1-14 )   2010.2

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  • Measurement of electron density in multi-hollow discharges with magnetic field International journal

    H. Sato, Y. Kawashima, K. Nakahara, K. Koga, M. Shiratani

    Proc. of the 27th symposium on plasma processing   ( A6-01 )   2010.2

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  • Observation of nano-particle transport in capacitively coupled radio frequency discharge plasma International journal

    S. Iwashita, H. Miyata, YasuY. Yamada, H. Matsuzaki, K. Koga, M. Shiratani

    Proc. of the 27th symposium on plasma processing   ( P1-13 )   2010.2

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  • Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches Reviewed International journal

    J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    J. Plasma Fusion Res.   8   2009.9

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  • Dust Particles formed owing to interactions between H2 or D2 helicon plasma, graphite International journal

    H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani

    Proc. of 2009 International Symposium on Dry Process   2009.9

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  • Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe International journal

    K. Nakahara, Y. Kawashima, H. Sato, K. Koga, M. Shiratani

    Proc. of 2009 International Symposium on Dry Process   2009.9

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  • Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer International journal

    H. Sato, Y. Kawashima, K. Koga, M. Shiratani

    Proc. of 2009 International Symposium on Dry Process   2009.9

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  • Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation International journal

    S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama

    Proc. of 2009 International Symposium on Dry Process   2009.9

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  • Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD International journal

    T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. of 2009 International Symposium on Dry Process   2009.9

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  • Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD International journal

    Y. Kawashima, H. Sato, K. Koga, M. Shiratani, M. Kondo

    Proc. of 2009 International Symposium on Dry Process   2009.9

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  • Toward plasma nano-factories International journal

    M. Shiratani, K. Koga

    Proc. of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I)   2009.9

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  • A comparison of dust particles produced due to interaction between graphite and plasma: LHD vs helicon discharges Reviewed International journal

    S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD experimental group

    J. Plasma Fusion Res.   8   2009.9

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  • Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles Reviewed International journal

    S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani

    J. Plasma Fusion Res.   8   2009.9

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  • Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method Reviewed International journal

    H. Sato, Y. Kawashima, M. Tanaka, K. Koga, W. M. Nakamura, M. Shiratani

    J. Plasma Fusion Res.   8   2009.9

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  • Detection of nano-particles formed in cvd plasma using a two-dimensional photon-counting laser-light-scattering method Reviewed International journal

    H. Miyahara, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani

    J. Plasma Fusion Res.   8   2009.9

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  • Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition Reviewed International journal

    W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, J. Umetsu, H. Miyahara, H. Matsuzaki, K. Koga, M. Shiratani

    J. Plasma Fusion Res.   8   2009.9

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  • Plasma CVD of Nano-particle Composite Porous SiOCH Films International journal

    M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama

    Proc. of 19th International Symposium on Plasma Chemistry   2009.7

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  • Characterization of Dust Particles Ranging in Size from 1 nm to 10 µm Collected in the LHD Reviewed International journal

    4   34 - 34   2009.4

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    We collected dust particles ranging in size from 1 nm to 10 µm from the Large Helical Device employing two methods: an ex-situ filtered vacuum collection method and an in-situ dust collection method. The size distribution from 1 nm to 10 µm is well expressed by the Junge distribution. Dust particles are classified into three kinds: small spherical dust particles below 1 µm in size, agglomerates consisting of primary particles of 10 nm, and large dust particles above 1 µm in size and irregular in shape; this suggests three formation mechanisms of dust particles: chemical vapor deposition growth, agglomeration, and peeling from walls. In-situ collection shows that agglomeration between dust particles takes place in main discharges. The primary dust particles in agglomerates are around 10 nm in size, suggesting agglomeration between a negatively charged large agglomerate and a positively charged dust particle 10 nm in size. We have also confirmed the important fact that a large number of dust particles move during vacuum vent. Therefore, the in-situ dust collection method is needed to reveal the generation-time and -processes of dust particles and their deposition position during discharges.

    DOI: 10.1585/pfr.4.034

  • Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode

    S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani

    Proc. of PSS2009/SPP26   2009.2

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  • Characteristics of dust particles produced due to interaction between hydrogen plasma, graphite

    S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, A. Sagara, K. Nisimura

    Proc. of PSS2009/SPP26   2009.2

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  • Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method

    K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo

    Proc. of PSS2009/SPP26   2009.2

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  • Deposition profile of toluene plasma CVD carbon films in trenches

    J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Proc. of PSS2009/SPP26   2009.2

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  • Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells

    Nakamura W. M., Sato H., Koga K., Shiratani M.

    Proc. of PSS2009/SPP26   2009.2

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  • High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method

    K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani

    Proc. of PSS2009/SPP26   2009.2

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  • Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa Reviewed International journal

    2008.12

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  • Deposition profile of plasma CVD carbon films in trenches Reviewed International journal

    J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori

    Proc. of 30th International Symposium on Dry Process   2008.12

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  • Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films Reviewed International journal

    S. Iwashita, K. Koga, M. Morita, M. Shiratani

    J. Phys. : Conference Series   100 ( 6 )   2008.8

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    DOI: 10.1088/1742-6596/100/6/062006

  • Cluster incorporation control for a-Si:H film deposition Reviewed International journal

    W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani

    J. Phys. : Conference Series   100 ( 8 )   2008.8

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    DOI: 10.1088/1742-6596/100/8/082018

  • Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films Reviewed International journal

    J. Umetsu, K. Koga, K. Inoue, M. Shiratani

    J. Phys. : Conference Series   100 ( 6 )   2008.8

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    DOI: 10.1088/1742-6596/100/6/062007

  • Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films Reviewed International journal

    M. Shiratani, W. M. Nakamura, H. Miyahara, K. Koga

    Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08)   2008.7

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  • Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage Invited Reviewed International journal

    M. Shiratani, S. Iwashita, K. Koga, S. Nunomura

    Faraday Discussions   137   2008.1

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    DOI: 10.1039/B704910B

  • VHF discharge sustained in a small hole Reviewed International journal

    K. Koga, W. M. Nakamura, and M. Shiratani

    Proc. 28th Intern. Conf. on Phenomena in Ionized Gases   2007.7

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  • Transport of nano-particles in pulsed AM RF discharges

    S. Iwashita, K. Koga, M. Shiratani

    Proc. the 24th Symp. on Plasma Processing   2007.1

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  • In-situ sampling of dust generated in LHD and its analysis

    M. Shiratani, S. Kiridoshi, K. Koga, S. Iwashita, N. Ashikawa, K. NIshimura, A. Sagara, A. Komori, LHD Experimental Group

    Proc. the 24th Symp. on Plasma Processing   2007.1

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  • Stability of a-Si:H deposited using multi-hollow plasma CVD

    K. Koga, W. M. Nakamura, D. Shimokawa, M. Shiratani

    Proc. the 24th Symp. on Plasma Processing   2007.1

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  • Fabrication of nanoparticle composite porous films having ultra-low dielectric constant Reviewed International journal

    S. Nunomura, K. Koga, M. Shiratani, Y. Watanabe, Y. Morisada, N. Matsuki, and S. Ikeda

    Jpn. J. Appl. Phys.   44 ( 50 )   2005.12

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    DOI: 10.1143/JJAP.44.L1509

  • Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition Reviewed International journal

    K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe

    Jpn. J. Appl. Phys.   44 ( 48 )   2005.11

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    DOI: 10.1143/JJAP.44.L1430

  • Production of crystalline Si nano-particles using VHF discharges and their properties Reviewed International journal

    M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo

    30 ( 1 )   2005.3

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  • Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects Invited Reviewed International journal

    Y. Watanabe, M. Shiratani, K. Koga

    30 ( 1 )   2005.3

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  • Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall Reviewed International journal

    K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori

    IEEE Trans. Plasma Science   32 ( 2 )   2004.2

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    DOI: 10.1109/TPS.2004.828129

  • Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges Reviewed International journal

    M. Shiratani, K. Koga, A. Harikai, T. Ogata, and Y. Watanabe

    MRS Symp. Proc.   762   2003.4

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    DOI: 10.1557/PROC-762-A9.5

  • シランプラズマ中のクラスタ成長と薄膜形成

    白谷正治, 古閑一憲, 尾形隆則, 掛谷知秀, 鹿口直斗, 渡辺征夫

    信学技報   103 ( 6 )   2003.4

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  • Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches Reviewed International journal

    K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe

    MRS Symp. Proc.   766   2003.4

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    DOI: 10.1557/PROC-766-E3.8

  • Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition Reviewed International journal

    K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe

    Matr. Sci. Semiconductor Processing   5 ( 2 )   2003.2

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    DOI: 10.1016/S1369-8001(02)00108-7

  • ナノクラスタ制御プラズマCVDと高品質,光安定a-Si:H太陽電池への応用

    白谷正治, 古閑一憲, 渡辺征夫

    アモルファスセミナーテキスト   2002.11

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  • Formation of nano-particles in microgravity plasma Reviewed International journal

    M. Shiratani, K. Koga, Y. Watanabe

    Journal of Japan Society of Microgravity Application   19   2002.10

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  • Anisotropic deposition of copper by plasma CVD method International journal

    K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe

    Proc. Intern. Symp. on Dry Process   2002.10

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  • Nucleation and subsequent growth of clusters in reactive plasma (invited lecture paper) Reviewed International journal

    Y. Watanabe, M. Shiratani, K. Koga

    Plasma Sources Sci. Technol.   11   2002.8

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    DOI: 10.1088/0963-0252/11/3A/334

  • Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films International journal

    M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe

    Proc. ESCANPIG16/ICRP5 Joint Meeting   2002.7

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  • Anisotropic deposition of Cu with H-assisted plasma CVD International journal

    K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe

    Proc. ESCANPIG16/ICRP5 Joint Meeting   2002.7

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  • Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2 International journal

    K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen

    Proc. ESCANPIG16/ICRP5 Joint Meeting   2002.7

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  • Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films International journal

    K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe

    Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002)   2002.5

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  • Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method International journal

    K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen

    Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002)   2002.5

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  • Clustering phenomena in low-pressure reactive plasma: basis and applications (invited lecture paper) Reviewed International journal

    Y. Watanabe, A. Harikai, K. Koga, M. Shiratani

    Pure Appl. Chem.   74 ( 3 )   2002.3

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    DOI: 10.1351/pac200274030483

  • In-situ measurement of size and density of particles in sub-nm to nm size range International journal

    K. Koga, M. Shiratani, Y. Watanabe

    Proc. Nano-technology Workshop   2002.2

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  • Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges International journal

    M. Shiratani, K. Koga, Y. Watanabe

    Proc. Nano-technology Workshop   2002.2

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  • プロセスプラズマ中のクラスタ - アモルファスシリコン太陽電池製造用プラズマ中のクラスター Reviewed

    白谷正治, 古閑一憲, 渡辺征夫

    ( 5 )   2002.1

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  • クラスタ制御プラズマCVD法によるSi薄膜の高品質化

    渡辺征夫, 古閑一憲, 白谷正治

    シリコンテクノロジー   ( 37 )   2002.1

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  • Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2 International journal

    K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe

    Proc. Intern. Symp. on Dry Process   2001.11

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  • Cluster-less plasma CVD reactor and its application to a-Si:H film deposition Reviewed International journal

    M. Shiratani, K. Koga, Y. Watanabe

    Mat. Res. Soc. Symp. Proc.   2001.7

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    DOI: 10.1557/PROC-664-A5.6

  • Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges International journal

    M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe

    Proc. Intern. Conf. on Phenomena in Ionized Gases   2001.7

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  • Clustering phenomena in low-pressure reactive plasma: base and applications (invited) International journal

    Y. Watanabe, M. Shiratani, K. Koga

    Proc. Intern. Symp. on Plasma Chemistry   2001.7

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  • Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor International journal

    K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe

    Proc. Intern. Conf. on Phenomena in Ionized Gases   2001.7

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  • Development of H-assisted plasma CVD reactor for Cu interconnects International journal

    M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe

    Proc. Intern. Conf. on Phenomena in Ionized Gases   2001.7

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  • Nucleation and subsequent growth of clusters in reactive plasma (invited) International journal

    Y. Watanabe, M. Shiratani, K. Koga

    Proc. Intern. Conf. on Phenomena in Ionized Gases   2001.7

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  • Formation kinetics and control of dust particles in capacitively-coupled reactive plasma (invited) Reviewed International journal

    Y. Watanabe, M. Shiratani, K. Koga

    Phys. Scripta   T89   2001.1

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    DOI: 10.1238/Physica.Topical.089a00029

  • Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasma International journal

    K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe

    Proc. Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing   2001.1

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  • H assisted control of quality and conformality in Cu film deposition using plasma CVD method International journal

    M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe

    Proc. Advanced Metallization Conf. 2000   2001.1

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  • Measurements of surface reaction probability of SiH3 International journal

    M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe

    Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing   2001.1

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  • Plasma CVD method for Cu interconnects in ULSI (invited) International journal

    M. Shiratani, K. Koga, Y. Watanabe

    Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing   2001.1

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  • Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition International journal

    M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe

    Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing   2001.1

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  • Behavior of a particle injected in ion sheath International journal

    M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe

    Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing   2001.1

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  • Methods of suppressing cluster growth in silane rf discharges Reviewed International journal

    M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe

    Mat. Res. Soc. Symp. Proc.   2000.7

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    DOI: 10.1557/PROC-609-A5.6

  • Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source Reviewed International journal

    H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe

    Mat. Res. Soc. Symp. Proc.   2000.7

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    DOI: 10.1557/PROC-612-D9.2.1

  • Propagation characteristics of ion acoustic waves in an Ar/SF6 plasma Reviewed International journal

    R. Ichiki, M. Shindo, S. Yoshimura, K. Koga, Y. Kawai

    J. Phys. Soc. Jpn.   69 ( 6 )   2000.6

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    DOI: 10.1143/JPSJ.69.1925

  • Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source Reviewed

    H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe

    Res. Rep. ISEE Kyushu Univ.   5 ( 1 )   2000.3

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  • Growth processes of particles up to nanometer size in high-frequency SiH4 plasma Reviewed International journal

    Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga

    Jour. Technical Phys.   41 ( 1 )   2000.1

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  • Observation of Asymmetric Sheath Structure in Multi-Component Plasma Containing Negative Ions Reviewed International journal

    K. Koga, H. Naitou, Y. Kawai

    J. Plasma Fusion Res.   2   1999.12

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  • Observation of Local Structures in Asymmetric Ion Sheath Reviewed International journal

    K. Koga, H. Naitou, Y. Kawai

    J. Phys. Soc. Jpn.   68 ( 5 )   1999.5

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  • Behavior of the Ion Sheath Instability in a Negative Ion Plasma Reviewed International journal

    K. Koga, Y. Kawai

    Jpn. J. Appl. Phys.   38 ( 3A )   1999.3

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    DOI: 10.1143/JJAP.38.1553

  • Capture and Conversion of CO2 from Ambient Air Using Ionic Liquid-Plasma Combination

    Sukma Wahyu Fitriani, Takamasa Okumura, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Pankaj Attri

    Plasma Chemistry and Plasma Processing   2024.8   ISSN:0272-4324 eISSN:1572-8986

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  • Capture and Conversion of CO<sub>2</sub> from Ambient Air Using Ionic Liquid-Plasma Combination

    Fitriani, SW; Okumura, T; Kamataki, K; Koga, K; Shiratani, M; Attri, P

    PLASMA CHEMISTRY AND PLASMA PROCESSING   2024.8   ISSN:0272-4324 eISSN:1572-8986

  • Effects of Supplied Gas on Plasma-Induced Liquid Flows

    Shen, KC; Shi, HP; Koga, K; Shiratani, M; Kawasaki, T

    IEEE TRANSACTIONS ON PLASMA SCIENCE   2024.8   ISSN:0093-3813 eISSN:1939-9375

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    Koga, K

    JAPANESE JOURNAL OF APPLIED PHYSICS   63 ( 8 )   2024.8   ISSN:0021-4922 eISSN:1347-4065

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    DOI: 10.35848/1347-4065/ad5d78

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  • Fundamental Study on Novel Biological Indicator Using DNA-Labeled Microbeads for Evaluating Nonthermal Plasma Sterilization

    Nakano, M; Okumura, T; Inaba, M; Attri, P; Koga, K; Shiratani, M; Suehiro, J

    IEEE SENSORS LETTERS   8 ( 8 )   2024.8   ISSN:2475-1472

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    Nonthermal atmospheric-pressure discharge plasma is considered important for sterilization. Reactive species, such as active oxygen species, radicals, and nitrate ions, generated by the discharge plasma damage the target bacterial cell wall/membrane and DNA. Several plasma sterilization methods have been proposed, including dielectric barrier discharge (DBD). To achieve effective sterilization, it is necessary to evaluate their characteristics using many parameters. This letter aims to demonstrate a proof-of-concept of a novel biological indicator for plasma sterilization. A biological indicator is used to verify sterilization outcomes. We employ DNA-labeled microbeads as biological indicators for the rapid visualization of plasma sterilization. This is based on our recently developed method for visual detection of DNA molecules. If plasma-derived factors cause the degradation of the DNA attached to the microbeads, this can be confirmed by visualization. Herein, we present the correlation between sterilization and visualization in the case of DBD. This method offers a rapid evaluation of plasma sterilization because it easily and quickly determines the sterilization capability of the plasma.

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  • Effect of nanoscale inhomogeneity on blocking temperature of ZnO:Co films fabricated by using nitrogen-mediated crystallization

    Marlis N. Agusutrisno, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoto Yamashita

    MRS Advances   2024.7   ISSN:2731-5894 eISSN:2059-8521

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  • Deposition of hydrogenated amorphous carbon films by CH<sub>4</sub>/Ar capacitively coupled plasma using tailored voltage waveform discharges

    Otaka, M; Otomo, H; Ikeda, K; Lai, JS; Wakita, D; Kamataki, K; Koga, K; Shiratani, M; Nagamatsu, D; Shindo, T; Matsudo, T

    JAPANESE JOURNAL OF APPLIED PHYSICS   63 ( 7 )   2024.7   ISSN:0021-4922 eISSN:1347-4065

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    We investigated the effects of tailored voltage waveform (TVW) discharges on the deposition of hydrogenated amorphous carbon (a-C:H) films in CH4/Ar capacitively coupled plasma. TVW discharges employ two driving radio frequencies (13.56 MHz and 27.12 MHz) and control their phase shifts to independently regulate ion bombardment energy (IBE) and ion flux. In this study, a-C:H films were deposited by changing DC-self bias with phase shift and constant applied voltage peak-to-peak. Additionally, we investigated phase-resolved optical emission spectroscopy (PROES) for plasma characterization. As a result, plasma-enhanced CVD (PECVD) for a-C:H films using TVW discharges realize control of film properties such as mass density, sp3 fraction, and H content, while keeping the deposition rate constant. Thus, it is suggested that TVW discharges realize the independent control of IBE and ion flux with high accuracy, highlighting its utility in a-C:H film depositions.

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  • Large-scale fabrication of thulium iron garnet film with perpendicular magnetic anisotropy using RF magnetron sputtering

    Marlis N. Agusutrisno, Sora Obinata, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoto Yamashita

    Japanese Journal of Applied Physics   63 ( 7 )   07SP06 - 07SP06   2024.7   ISSN:0021-4922 eISSN:1347-4065

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    Large-scale fabrication of thulium iron garnet (TmIG) films on gadolinium gallium garnet (GGG) substrates, with a total area of 25 cm<sup>2</sup>, has been demonstrated by rotating substrate holders during on-axis sputtering. By optimizing the growth parameters based on the pressure and flow rate of the oxygen ratio, a Tm/Fe ratio of 0.65 was obtained, which is close to the stoichiometry of TmIG. The increase in post-annealing temperature has induced the growth of the TmIG structure by the strain of the lattice constant mechanism. At the highest post-annealing temperature, the crystal structure of TmIG (444) and the perpendicular magnetic anisotropy (PMA) were obtained. This result demonstrates the potential method for large-scale fabrication of TmIG film with PMA.

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  • Sputtering deposition of dense and low-resistive amorphous In2O3: Sn films under ZONE-T conditions of Thornton's structural diagram

    Yoshiharu Wada, Wafaa Magdy, Keigo Takeda, Yuta Mido, Naoto Yamashita, Takamasa Okumura, Kunihiro Kamataki, Kazunori Koga, Masaru Hori, Masaharu Shiratani, Naho Itagaki

    Applied Physics Letters   124 ( 24 )   2024.6   ISSN:0003-6951 eISSN:1077-3118

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    We have fabricated smooth-surfaced amorphous In2O3:Sn (a-ITO) films at a high temperature of 550 °C, far above the typical crystallization threshold of 150 °C for ITO films. This achievement has been made possible by intentionally introducing N2 into the sputtering atmosphere, which maintains a low N atom incorporation of only a few atomic percent within the films. Positioned within ZONE-T of the Thornton diagram (higher-temperature region characterized by high film density), our method allows the preparation of films with superior film density about 6.96 g/cm3, substantially exceeding the density of 6.58 g/cm3 for conventional a-ITO films fabricated under ZONE-1 (low-temperature region) and approaching the bulk crystal density of In2O3 at 7.12 g/cm3. The films also feature a high carrier density of 5 × 1020 cm−3 and a remarkably low resistivity of 3.5 × 10−4 Ω cm, comparable to those of polycrystalline films. The analysis via vacuum-ultraviolet absorption spectroscopy on N and O atom densities in the plasma suggests that amorphization is primarily caused not by N atoms incorporated in the films but by those temporally adsorbed on the film surface, inhibiting crystal nucleation before eventually desorbing. Our findings will pave the way not only for broader applications of a-ITO films but also for the design of other amorphous materials at temperatures beyond their crystallization points.

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  • Sputter deposition of ZnO-AlN pseudo-binary amorphous alloys with tunable band gaps in the deep ultraviolet region

    Urakawa, S; Magdy, W; Wada, Y; Narishige, R; Kaneshima, K; Yamashita, N; Okumura, T; Kamataki, K; Koga, K; Shiratani, M; Itagaki, N

    MATERIALS RESEARCH EXPRESS   11 ( 6 )   2024.6   eISSN:2053-1591

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    ZnO-AlN pseudo-binary amorphous alloys (a-ZAON hereinafter) with tunable band gaps in the deep ultraviolet (DUV) region have been synthesized using magnetron sputtering. The miscibility gap between ZnO and AlN has been overcome using room-temperature sputtering deposition, leveraging the rapid quenching abilities of sputtered particles to fabricate metastable but single-phase alloys. X-ray diffraction patterns and optical transmittance spectra revealed that the synthesized films with chemical composition ratios of [Zn]/([Zn] + [Al]) = 0.24-0.79 likely manifested as single-phase of a-ZAON films. Despite their amorphous structures, these films presented direct band gaps of 3.4-5.8 eV and thus high optical absorption coefficients (105 cm−1). Notably, the observed values adhered to Vegard’s law for crystalline ZnO-AlN systems, implying that the a-ZAON films were solid solution alloys with atomic-level mixing. Furthermore, atomic force microscopy analyses revealed smooth film surfaces with root-mean-square roughness of 0.8-0.9 nm. Overall, the wide-ranging band gap tunability, high absorption coefficients, amorphous structures, surface smoothness, and low synthesis temperatures of a-ZAON films position them as promising materials for use in DUV optoelectronic devices and power devices fabricated using large-scale glass and flexible substrates.

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  • Response of lettuce seeds undergoing dormancy break and early senescence to plasma irradiation

    Okumura, T; Anan, T; Shi, HP; Attri, P; Kamataki, K; Yamashita, N; Itagaki, N; Shiratani, M; Ishibashi, Y; Koga, K; Mildaziene, V

    APPLIED PHYSICS EXPRESS   17 ( 5 )   2024.5   ISSN:1882-0778 eISSN:1882-0786

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    This study reports the response of lettuce seeds undergoing dormancy breaking and early senescence to DBD plasma irradiation. A heat map of germination percentages at 12 h reveals that dormancy has broken at 39 days' storage, and that one minute of plasma irradiation enhances germination in dormant seeds. Plasma irradiation does not affect those seeds where dormancy has already broken. Early senescence via storage was estimated using ESR measurements and the molecular modification of quercetin. This study reveals that lettuce seed susceptibility to plasma irradiation depends on storage duration and conditions, with dormancy state as a critical variable modulating the impact of plasma irradiation.

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  • Plasma–ionic liquid-assisted CO2 capture and conversion: A novel technology

    Pankaj Attri, Kazunori Koga, Jamoliddin Razzokov, Takamasa Okumura, Kunihiro Kamataki, Tomohiro Nozaki, Masaharu Shiratani

    Applied Physics Express   17 ( 4 )   2024.4   ISSN:1882-0778 eISSN:1882-0786

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  • Heavy fuel oil-contaminated soil remediation by individual and bioaugmentation-assisted phytoremediation with Medicago sativa and with cold plasma-treated M. sativa

    Žaltauskaitė J., Meištininkas R., Dikšaitytė A., Degutytė-Fomins L., Mildažienė V., Naučienė Z., Žūkienė R., Koga K.

    Environmental Science and Pollution Research   31 ( 20 )   30026 - 30038   2024.4   ISSN:09441344

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    Developing an optimal environmentally friendly bioremediation strategy for petroleum products is of high interest. This study investigated heavy fuel oil (HFO)-contaminated soil (4 and 6 g kg−1) remediation by individual and combined bioaugmentation-assisted phytoremediation with alfalfa (Medicago sativa L.) and with cold plasma (CP)-treated M. sativa. After 14 weeks of remediation, HFO removal efficiency was in the range between 61 and 80% depending on HFO concentration and remediation technique. Natural attenuation had the lowest HFO removal rate. As demonstrated by growth rate and biomass acquisition, M. sativa showed good tolerance to HFO contamination. Cultivation of M. sativa enhanced HFO degradation and soil quality improvement. Bioaugmentation-assisted phytoremediation was up to 18% more efficient in HFO removal through alleviated HFO stress to plants, stimulated plant growth, and biomass acquisition. Cold plasma seed treatment enhanced HFO removal by M. sativa at low HFO contamination and in combination with bioaugmentation it resulted in up to 14% better HFO removal compared to remediation with CP non-treated and non-bioaugmented M. sativa. Our results show that the combination of different remediation techniques is an effective soil rehabilitation strategy to remove HFO and improve soil quality. CP plant seed treatment could be a promising option in soil clean-up and valorization.

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  • Plasma-Driven Sciences: Exploring Complex Interactions at Plasma Boundaries

    Ishikawa, K; Koga, K; Ohno, N

    PLASMA   7 ( 1 )   160 - 177   2024.3   ISSN:2571-6182

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    Plasma-driven science is defined as the artificial control of physical plasma-driven phenomena based on complex interactions between nonequilibrium open systems. Recently, peculiar phenomena related to physical plasma have been discovered in plasma boundary regions, either naturally or artificially. Because laboratory plasma can be produced under nominal conditions around atmospheric pressure and room temperature, phenomena related to the interaction of plasma with liquid solutions and living organisms at the plasma boundaries are emerging. Currently, the relationships between these complex interactions should be solved using science-based data-driven approaches; these approaches require a reliable and comprehensive database of dynamic changes in the chemical networks of elementary reactions. Consequently, the elucidation of the mechanisms governing plasma-driven phenomena and the discovery of the latent actions behind these plasma-driven phenomena will be realized through plasma-driven science.

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  • Growth control of Marchantia polymorpha gemmae using nonthermal plasma irradiation

    Shoko Tsuboyama, Takamasa Okumura, Pankaj Attri, Kazunori Koga, Masaharu Shiratani, Kazuyuki Kuchitsu

    Scientific Reports   14 ( 1 )   3172   2024.2   ISSN:2045-2322 eISSN:2045-2322

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    Several studies have documented that treatment by cold atmospheric pressure plasma (CAPP) on plants foster seed germination and growth in recent years. However, the molecular processes that underlie the action of CAPP on the seeds and plants remain mostly enigmatic. We here introduce gemmae of Marchantia polymorpha, a basal liverwort, as a novel model plant material suitable for CAPP research. Treating the gemmae with CAPP for a constant time interval at low power resulted in consistent growth enhancement, while growth inhibition at higher power in a dose-dependent manner. These results distinctly demonstrate that CAPP irradiation can positively and negatively regulate plant growth depending on the plasma intensity of irradiation, offering a suitable experimental system for understanding the molecular mechanisms underlying the action of CAPP in plants.

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  • Improving the efficiency of CO2 methanation using a combination of plasma and molecular sieves

    Susumu Toko, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

    Results in Surfaces and Interfaces   14   100204 - 100204   2024.2   ISSN:2666-8459

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  • Influence of humidity on the plasma-assisted CO<inf>2</inf> conversion

    Pankaj Attri, Takamasa Okumura, Nozomi Takeuchi, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani

    Plasma Processes and Polymers   21 ( 1 )   2024.1   ISSN:1612-8850 eISSN:1612-8869

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    The current research focuses on carbon dioxide (CO2) conversion at ambient conditions using streamer plasma. In this study, treatment time and humidity have been found to influence CO2 conversion. Our findings reveal a maximum CO2 conversion rate of 35.2%, achieved with a remarkably high energy efficiency of CO2 conversion at 135% and a low energy cost of 2.17 eV/molecule. We employed optical emission and fourier-transform infrared spectroscopy spectroscopy to analyze the different dissociation products of CO2 and determine the percentage of CO2 conversion. Furthermore, we utilized a two-dimensional (2D) fluid dynamics model and a zero-dimensional (0D) chemistry model to gain insights into the reactor mechanism.

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  • Fundamental Study of Carbon Dioxide Reduction Reaction with Plasma Catalysis

    Susumu TOKO, Takamasa OKUMURA, Kunihiro KAMATAKI, Kosuke TAKENAKA, Kazunori KOGA, Masaharu SHIRATANI, Yuichi SETSUHARA

    Journal of Smart Processing   13 ( 1 )   31 - 36   2024.1   ISSN:2186702X eISSN:21871337

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     Carbon dioxide reduction is one of the key technologies for achieving a sustainable society. In this study, plasma catalysis were used to hydrogenate carbon dioxide to produce methane. Plasma catalysis have attracted attention in recent years as a technology promoting a reaction at lower temperatures by various synergistic effects between plasma and catalysts. In this study, molecular sieve with a pore diameter of 3 Å was used as a catalyst and its role was investigated. The results showed that: 1. molecular and atomic adsorption functions of molecular sieves are useful to inhibit reverse reactions; 2. the influence of molecular sieves becomes stronger at higher pressures, resulting in higher methane production; 3. energetic reactive particles derived from hydrogen deactivate molecular sieves; 4. molecules adsorbed on molecular sieve can be recycled by hydrogen plasma irradiation.

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  • On-axis sputtering fabrication of Tm3Fe5O12 film with perpendicular magnetic anisotropy

    Marlis Nurut Agusutrisno, Christopher H. Marrows, Kunihiro Kamataki, Takamasa Okumura, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoto Yamashita

    Thin Solid Films   788   140176 - 140176   2024.1   ISSN:0040-6090 eISSN:1879-2731

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  • Subchronic toxicity study of indium-tin oxide nanoparticles following intratracheal administration into the lungs of rats

    Matsumura Nagisa, Tanaka Yu-ki, Ogra Yasumitsu, Koga Kazunori, Shiratani Masaharu, Nagano Kasuke, Tanaka Akiyo

    Journal of Occupational Health   66 ( 1 )   n/a   2024   ISSN:13419145 eISSN:13489585

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    <p><b>Objectives:</b> We aimed to analyze the subchronic toxicity and tissue distribution of indium after the intratracheal administration of indium-tin oxide nanoparticles (ITO NPs) to the lungs of rats.</p><p><b>Methods:</b> Male Wistar rats were administered a single intratracheal dose of 10 or 20 mg In/kg body weight (BW) of ITO NPs. The control rats received only an intratracheal dose of distilled water. A subset of rats was periodically euthanized throughout the study from 1 to 20 weeks after administration. Indium concentrations in the serum, lungs, mediastinal lymph nodes, kidneys, liver, and spleen as well as pathological changes in the lungs and kidneys were determined. Additionally, the distribution of ionic indium and indium NPs in the kidneys was analyzed using laser ablation-inductively coupled plasma mass spectrometry.</p><p><b>Results:</b> Indium concentrations in the lungs of the 2 ITO NP groups gradually decreased over the 20-week observation period. Conversely, the indium concentrations in the mediastinal lymph nodes of the 2 ITO groups increased and were several hundred times higher than those in the kidneys, spleen, and liver. Pulmonary and renal toxicities were observed histopathologically in both the ITO groups. Both indium NPs and ionic indium were detected in the kidneys, and their distributions were similar to the strong indium signals detected at the sites of inflammatory cell infiltration and tubular epithelial cells.</p><p><b>Conclusions:</b> Our results demonstrate that intratracheal administration of 10 or 20 mg In/kg BW of ITO NPs in male rats produces pulmonary and renal toxicities.</p>

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  • Capture and Conversion of CO<inf>2</inf> from Ambient Air Using Ionic Liquid-Plasma Combination

    Fitriani S.W., Okumura T., Kamataki K., Koga K., Shiratani M., Attri P.

    Plasma Chemistry and Plasma Processing   2024   ISSN:02724324

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    Climate change is considered one of the main challenges in this century, and CO2 emissions significantly cause it. Integrating CO2 capture, storage, and conversion is proposed to solve this problem. 1-Butyl-3-methylimidazolium chloride ([Bmim]Cl) ionic liquid was employed to capture and store CO2 from the air and subsequently converted into CO using non-thermal plasma. Moreover, we also tested the CO2 capture and storage capacity of water from different sources, e.g., Milli-Q, deionized water, and tap water. [Bmim]Cl solution captured CO2 from the air and then converted to CO after 24 h using plasma. In comparison with water (Milli-Q water, deionized water, and tap water), CO production was increased by 28.31% in the presence of water (Milli-Q water, deionized water, and tap water) + [Bmim]Cl. It suggests that this method could be a promising way to capture, store, and convert CO2 from air at atmospheric pressure and room temperature as an effort to reduce carbon emission.

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  • Health assessment of rice cultivated and harvested from plasma-irradiated seeds

    Takamasa Okumura, Hayate Tanaka, Takumi Nakao, Teruki Anan, Ryo Arita, Masaki Shiraki, Kayo Shiraki, Tomoyuki Miyabe, Daisuke Yamashita, Kayo Matsuo, Pankaj Attri, Kunihiro Kamataki, Naoto Yamashita, Naho Itagaki, Masaharu Shiratani, Satoshi Hosoda, Akiyo Tanaka, Yushi Ishibashi, Kazunori Koga

    Scientific Reports   13 ( 1 )   17450   2023.12   ISSN:2045-2322 eISSN:2045-2322

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    This study provides the health effects assessment of rice cultivated from plasma-irradiated seeds. The rice (Oryza sativa L.) cultivated from seeds with plasma irradiation showed a growth improvement (slope-ratios of with plasma to without plasma were 1.066, 1.042, and 1.255 for tiller, and earing, and ripening periods, respectively) and an 4% increase in yield. The cultivated rice was used for repeated oral administrations to mice for 4-week period. Distilled water and rice cultivated from seeds without plasma irradiation were also used as control. The weights of the lung, kidney, liver, and spleen, with corresponding average values of 0.22 g, 0.72 g, 2.1 g, and 0.17 g for w/ plasma group and 0.22 g, 0.68 g, 2.16 g, and 0.14 g for w/o plasma group, respectively, showing no effect due to the administration of rice cultivated from plasma-irradiated seeds. Nutritional status, liver function, kidney function, and lipid, neutral fat profiles, and glucose metabolism have no significant difference between with and without plasma groups. These results show no obvious subacute effects were observed on rice grains cultivated and harvested from the mother plant that experienced growth improvement by plasma irradiation. This study provides a new finding that there is no apparent adverse health effect on the grains harvested from the plasma-irradiated seeds.

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  • Highly selective Si<sub>3</sub>N<sub>4</sub> etching on Si using pulsed-microwave CH<sub>3</sub>F/O<sub>2</sub>/Ar plasma

    Morimoto, M; Matsui, M; Ikeda, N; Koga, K; Shiratani, M

    JAPANESE JOURNAL OF APPLIED PHYSICS   62 ( SN )   2023.11   ISSN:0021-4922 eISSN:1347-4065

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    Highly selective Si3N4 etching on Si was achieved in a CH3F/O2/Ar plasma using pulsed-microwave plasma and time-modulation bias. The Si3N4/Si selectivity reached infinity at a peak-to-peak voltage (V pp) of 240 V. The effect of pulsed-microwave on CH3F gas dissociation for highly selective Si3N4 etching was investigated by deposited film analysis, optical emission spectroscopy, and ion current flux measurements. As the duty cycle of the pulsed-microwave was decreased, the plasma density during the pulse on period decreased and the CH/H ratio increased. The pulsed-microwave plasma produced low-dissociation radicals by providing a low plasma density. The low-dissociation radicals in the CH3F plasma formed a fluorine (F)-rich hydrofluorocarbon (HFC) layer on the Si3N4 wafer surface. The F-rich HFC layer promotes Si3N4 etching even at low ion energy, where Si etching does not proceed, and enables highly selective Si3N4 etching on Si.

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  • Reaction kinetics studies for phenol degradation under the impact of different gas bubbles and pH using gas-liquid discharge plasma

    A. El-Tayeb, Takamasa Okumura, Pankaj Attri, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani

    Japanese Journal of Applied Physics   62 ( SN )   2023.11   ISSN:0021-4922 eISSN:1347-4065

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    A gas-liquid discharge plasma (GLDP) reactor is used to degrade organic pollutants such as phenol. GLDP contains a 7-pin plate system used to enhance phenol degradation in the presence of various pH, and gas bubbles produced from air, O2, O3, CO2, and Ar gases. Experimental outcomes show the impact of solution pH, as phenol degradation efficiencies of 85%, 90%, 96%, and 98% were obtained for pH of 12, 9, 3, and 1, respectively, after 60 min of treatment. This shows that the optimum pH for phenol degradation lies between 1 and 3. Moreover, we explored the influence of gas bubbles generated using various gases, such as air, O2, O3, CO2, and Ar, on phenol degradation. In the presence of O3 gas bubbles, the rate and degree of phenol degradation were significantly increased compared to gas bubbles produced from other gases (O2, CO2, Ar, and air). The degradation competence of phenol by added oxygen remained higher than argon. The performance of the GLDP system at various pH values and gas bubbles was evaluated using kinetic models. Pseudo-zero, first and second reaction kinetics models were used to examine the degradation of phenol. The rate of degradation at different pH and in the presence of gas bubbles follows pseudo-zero-order kinetics. Our GLDP reactor consumed energy of 127.5 J l-1 for phenol degradation under the influence of air bubbles and pH 5. The outcome of this research can help in the design of new reactors for industrial wastewater treatment.

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  • Prediction by a hybrid machine learning model for high-mobility amorphous In<sub>2</sub>O<sub>3</sub>: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method

    Kamataki, K; Ohtomo, H; Itagaki, N; Lesly, CF; Yamashita, D; Okumura, T; Yamashita, N; Koga, K; Shiratani, M

    JOURNAL OF APPLIED PHYSICS   134 ( 16 )   2023.10   ISSN:0021-8979 eISSN:1089-7550

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    In this study, we developed a hybrid machine learning technique by combining appropriate classification and regression models to address challenges in producing high-mobility amorphous In2O3:Sn (a-ITO) films, which were fabricated by radio-frequency magnetron sputtering with a nitrogen-mediated amorphization method. To overcome this challenge, this hybrid model that was consisted of a support vector machine as a classification model and a gradient boosting regression tree as a regression model predicted the boundary conditions of crystallinity and experimental conditions with high mobility for a-ITO films. Based on this model, we were able to identify the boundary conditions between amorphous and crystalline crystallinity and thin film deposition conditions that resulted in a-ITO films with 27% higher mobility near the boundary than previous research results. Thus, this prediction model identified key parameters and optimal sputtering conditions necessary for producing high-mobility a-ITO films. The identification of such boundary conditions through machine learning is crucial in the exploration of thin film properties and enables the development of high-throughput experimental designs.

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  • Silicon surface passivation with a-Si:H by PECVD: growth temperature effects on defects and band offset

    Nunomura, S; Sakata, I; Misawa, T; Kawai, S; Kamataki, K; Koga, K; Shiratani, M

    JAPANESE JOURNAL OF APPLIED PHYSICS   62 ( SL )   2023.9   ISSN:0021-4922 eISSN:1347-4065

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    The surface passivation of crystalline silicon (c-Si) is studied during growth of hydrogenated amorphous silicon (a-Si:H) by means of plasma-enhanced CVD. The surface passivation is characterized by an in situ method of the photocurrent measurement of c-Si during the growth of an a-Si:H passivation layer at various growth temperatures. The passivation is also characterized by an ex situ method of the carrier lifetime measurement performed at RT in air. According to both the in situ and ex situ characterization results, the surface passivation is optimized around a growth temperate of 200 °C, where the defect reduction and the band offset formation at the a-Si:H/c-Si interface play important roles.

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  • Contribution of active species generated in plasma to CO<inf>2</inf> methanation

    Susumu Toko, Taiki Hasegawa, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

    Japanese Journal of Applied Physics   62 ( SL )   2023.9   ISSN:0021-4922 eISSN:1347-4065

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    CO2 methanation is an effective technology for CO2 reduction. Generally, methanation reactions are accelerated using thermal catalysts. However, the temperature control is difficult because CO2 methanation is an exothermic reaction, and the catalyst is deactivated by overheating. Plasma catalysis can solve this problem by driving this reaction at lower temperatures. Therefore, in this study, we investigated the contribution of the active species generated in the plasma to CO2 methanation. We found that the density of active species is linearly related to the power density, and in particular, the CH4 generation rate is determined by the CO-derived active species, not the H-derived active species. Furthermore, with an increase in the catalyst temperature, a new reaction pathway for CH4 production is added. The results of this study contribute to the understanding of the relationship between the active species produced in plasma and CO2 methanation.

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  • Single-step fabrication of fibrous Si/Sn composite nanowire anodes by high-pressure He plasma sputtering for high-capacity Li-ion batteries Reviewed

    Giichiro Uchida, Kodai Masumoto, Mikito Sakakibara, Yumiko Ikebe, Shinjiro Ono, Kazunori Koga, Takahiro Kozawa

    Scientific Reports   13 ( 1 )   14280   2023.9   ISSN:2045-2322 eISSN:2045-2322

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    Single-step fabrication of fibrous Si/Sn composite nanowire anodes by high-pressure He plasma sputtering for high-capacity Li-ion batteries
    Abstract

    To realize high-capacity Si anodes for next-generation Li-ion batteries, Si/Sn nanowires were fabricated in a single-step procedure using He plasma sputtering at a high pressure of 100–500 mTorr without substrate heating. The Si/Sn nanowires consisted of an amorphous Si core and a crystalline Sn shell. Si/Sn composite nanowire films formed a spider-web-like network structure, a rod-like structure, or an aggregated structure of nanowires and nanoparticles depending on the conditions used in the plasma process. Anodes prepared with Si/Sn nanowire films with the spider-web-like network structure and the aggregated structure of nanowires and nanoparticles showed a high Li-storage capacity of 1219 and 977 mAh/g, respectively, for the initial 54 cycles at a C-rate of 0.01, and a capacity of 644 and 580 mAh/g, respectively, after 135 cycles at a C-rate of 0.1. The developed plasma sputtering process enabled us to form a binder-free high-capacity Si/Sn-nanowire anode via a simple single-step procedure.

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  • Influence of electric potential-induced by atmospheric pressure plasma on cell response

    Takamasa Okumura, Chia-Hsing Chang, Kazunori Koga, Masaharu Shiratani, Takehiko Sato

    Scientific Reports   13 ( 1 )   15960   2023.9   ISSN:2045-2322 eISSN:2045-2322

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    Plasma irradiation leads not only active species, but also reactive chemical species, ultraviolet light, electric fields, magnetic fields, and shock waves. To date the effects of reactive chemical species have been mainly discussed. To understand the biological effect caused by an electric potential induced with an atmospheric-pressure plasma, the behavior of cell stimulated by electric potential was investigated using HeLa cell. The cell concentration assay revealed that less than 20% of cells inactivated by potential stimulation and the remained cells proliferate afterward. Fluorescent microscopic observation revealed that potential stimulation is appreciable to transport the molecules through membrane. These results show that potential stimulation induces intracellular and extracellular molecular transport, while the stimulation has a low lethal effect. A possible mechanism for this molecular transport by potential stimulation was also shown using numerical simulation based on an equivalent circuit of the experimental system including adhered HeLa cell. The potential formation caused by plasma generation is decisive in the contribution of plasma science to molecular biology and the elucidation of the mechanism underlying a biological response induction by plasma irradiation.

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  • Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition

    Kamataki, K; Sasaki, Y; Nagao, I; Yamashita, D; Okumura, T; Yamashita, N; Itagaki, N; Koga, K; Shiratani, M

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   164   2023.9   ISSN:1369-8001 eISSN:1873-4081

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    High-quality amorphous silicon nitride (SiNx) thin films were fabricated by the controlled growth of nanoparticles during SiH4+N2 multi-hollow remote plasma chemical vapor deposition (CVD) at low substrate temperature 100 °C. Measurements from quartz crystal microbalances showed that a higher amount of nanoparticle incorporation in the SiNx film corresponded to a higher ratio of N/Si in the film, implying that the nanoparticles were nitrided in the plasma phase. We controlled the size of the nanoparticles by tuning the gas flow ratio of N2/SiH4 and the total gas flow rate. Transmission electron microscopy and energy-dispersive X-ray spectroscopy showed that smaller nanoparticles in the plasma led to a higher ratio of N/Si in the film and a lower hydrogen content. We attribute these results to the low heat capacity and large specific surface area of the nanoparticles, which enabled active chemical reactions on their surface in the plasma.

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  • Control of inhomogeneity and magnetic properties of ZnO:Co films grown by magnetron sputtering using nitrogen

    Agusutrisno, MN; Narishige, R; Kamataki, K; Okumura, T; Itagaki, N; Koga, K; Shiratani, M; Yamashita, N

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   162   2023.8   ISSN:1369-8001 eISSN:1873-4081

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    We experimentally report the control of structural inhomogeneity and magnetic properties of Co-doped ZnO films using nitrogen mediated-crystallization. The ZnO:CoN were grown on a silicon substrate at room temperature by RF-magnetron sputtering using nitrogen and followed by a post-annealing treatment for 3 hours at 400 °C, 600 °C, 800 °C and 1000 °C in the air. This method induces changes in inhomogeneity properties comprised by microstructure and stoichiometry of each film, which are confirmed by X-ray diffraction, thermal desorption, and X-ray fluorescence measurements. The difference in inhomogeneity has led to the transformation in the magnetic properties. Films annealed at 400 °C, which showed the highest inhomogeneity, exhibited superparamagnetic-ferromagnetic properties. In contrast, all the other films exhibited diamagnetic properties. Increasing the post-annealing temperature above 400 °C reduces inhomogeneities indicated by improved grain size, decreased impurities, and lattice parameters and stoichiometry of ZnO:CoN films approached those of pure ZnO. Our present results will contribute to control the inhomogeneity of ZnO:Co films to improve magnetic properties at room temperature.

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  • Improving the efficiency of Sabatier reaction through H2O removal with low-pressure plasma catalysis

    Taiki Hasegawa, Susumu Toko, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani

    Japanese Journal of Applied Physics   62 ( SL )   SL1028 - SL1028   2023.8   ISSN:0021-4922 eISSN:1347-4065

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    This study aimed to realize in situ resource utilization in deep-space missions. The Sabatier reaction is used to generate CH<sub>4</sub> from CO<sub>2</sub>, which accounts for 95% of the Martian atmosphere, and H<sub>2</sub> from H<sub>2</sub>O on Mars. In general, thermal catalysis at temperatures above 250 °C drives the process. This high-temperature process, however, causes catalyst deactivation due to overheating. Plasma catalysis drives low-temperature reactions by excitation and decomposition of source gases via electron impact. We investigated the effect of removing H<sub>2</sub>O from gas phase in the reaction with Cu and Ni catalysts using molecular sieves in this study. The reverse reaction can be aided by OH radicals derived from H<sub>2</sub>O. Therefore, CO<sub>2</sub> conversion increased from 49.4% to 69.1% for Cu catalysts with molecular sieves, and CH<sub>4</sub> selectivity increased from 3.49% to 6.33%. These findings imply that removing H<sub>2</sub>O can suppress the reverse reactions.

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  • Plasma-assisted CO<inf>2</inf> and N<inf>2</inf> conversion to plant nutrient

    Pankaj Attri, Takamasa Okumura, Nozomi Takeuchi, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani

    Frontiers in Physics   11   2023.7   ISSN:2296-424X eISSN:2296-424X

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    Colossal research on CO2 and N2 conversion using non-thermal plasma (NTP) technology has been ongoing since many years. The primary focus is on CO and NH3 production through CO2 and N2 conversion, respectively, with high conversion efficiency and low energy consumption with or without catalysts. Although in the present study, we propose that the NTP can assist in converting CO2 and N2 to plant nutrients in the form of plasma-treated/activated water. We used a homemade streamer plasma device and produced plasma-activated water (PAW) using CO2 and N2 feed gas, CO2-activated water (CAW) and N2-activated water (NAW). Later, we used CAW and NAW to treat the radish seeds and evaluate the germination rate, germination percentage, and seeding growth. To understand the chemical changes in PAW after the NTP treatment, we performed a chemical analysis to detect NO2¯, NO3¯, NH4+, and H2O2 along with the PAW pH and temperature shift. Additionally, to understand the other species produced in the gas phase, we simulated chemical reactions using COMSOL Multiphysics® software. Our results show that NOx and NHx species are less produced in CAW than in NAW, but CO2-generated PAW offers a significantly more substantial effect on enhancing the germination rate and seeding growth than NAW. Therefore, we suggested that CO and H2O2 formed during CAW production trigger early germination and growth enhancement. Furthermore, the total plasma reactor energy consumption, NO3¯ and NH4+ selective production percentage, and N2 conversion percentage were calculated. To our best knowledge, this is the first study that uses plasma-assisted CO2 conversion as a nutrient for plant growth.

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  • Effect of time-modulation bias on polysilicon gate etching

    Morimoto, M; Tanaka, M; Koga, K; Shiratani, M

    JAPANESE JOURNAL OF APPLIED PHYSICS   62 ( SI )   2023.7   ISSN:0021-4922 eISSN:1347-4065

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    The etching characteristics were studied via time-modulation bias (bias pulsing) by varying the pulsing parameters. The etch profiles were verified using polysilicon gate structures with dense and isolated patterns. Ion energy was defined as the peak-to-peak voltage (V pp) controlled by the RF bias power. The durations of the on period and off period (off time) of bias pulsing were adjusted by the pulse frequency and duty cycle. Profile evolution was observed in the variations in V pp and off time. Increasing the ion energy induced vertical profiles of dense patterns and the tapered profiles of isolated patterns. Extending the off time of bias pulsing induced tapered profiles of dense patterns and vertical profiles of isolated patterns. These results indicated that increasing the ion energy and pulse off time simultaneously was the direction to achieve anisotropic etch profiles for both the isolated and dense patterns.

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  • Optical emission spectroscopy study in CO<inf>2</inf> methanation with plasma

    Susumu Toko, Taiki Hasegawa, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

    Japanese Journal of Applied Physics   62 ( SI )   2023.7   ISSN:0021-4922 eISSN:1347-4065

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    Methanation of CO2 is a key technology to realize a sustainable society. The reactions should be driven at a lower temperatures from the viewpoint of catalyst stability. Methanation with plasma catalysis can drive reactions at lower temperature than thermal catalysis. However, the reaction mechanism is little understood due to the complexity of the interactions. In this study, we investigated the power and pressure dependence of the methanation efficiency when only plasma is used as a fundamental research. We discuss how these parameters change the vibrational temperature and active species density and affect the methanation efficiency using optical emission spectroscopy.

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  • Instant switching control between two types of plasma-driven liquid flows Reviewed

    Toshiyuki Kawasaki, Kecheng Shen, Heping Shi, Kazunori Koga, Masaharu Shiratani

    Japanese Journal of Applied Physics_Rapid Communication   62 ( 6 )   060904-1 - 060904-4   2023.6   ISSN:0021-4922 eISSN:1347-4065

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  • Cold Plasma-Induced Changes in <i>Stevia rebaudiana</i> Morphometric and Biochemical Parameter Correlations

    Judickaite, A; Venckus, J; Koga, K; Shiratani, M; Mildaziene, V; Zukiene, R

    PLANTS-BASEL   12 ( 8 )   2023.4   ISSN:2223-7747

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    Stevia rebaudiana Bertoni is an economically important source of natural low-calorie sweeteners, steviol glycosides (SGs), with stevioside (Stev) and rebaudioside A (RebA) being the most abundant. Pre-sowing seed treatment with cold plasma (CP) was shown to stimulate SGs biosynthesis/accumulation up to several fold. This study aimed to evaluate the possibility to predict CP-induced biochemical changes in plants from morphometric parameters. Principle component analysis (PCA) was applied to two different sets of data: morphometric parameters versus SGs concentrations and ratio, and morphometric parameters versus other secondary metabolites (total phenolic content (TPC), total flavonoid content (TFC)) and antioxidant activity (AA). Seeds were treated for 2, 5 and 7 min with CP (CP2, CP5 and CP7 groups) before sowing. CP treatment stimulated SGs production. CP5 induced the highest increase of RebA, Stev and RebA+Stev concentrations (2.5-, 1.6-, and 1.8-fold, respectively). CP did not affect TPC, TFC or AA and had a duration-dependent tendency to decrease leaf dry mass and plant height. The correlation analysis of individual plant traits revealed that at least one morphometric parameter negatively correlates with Stev orRebA+Stev concentration after CP treatment.

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  • Effects of plasma-activated Ringer's lactate solution on cancer cells: evaluation of genotoxicity

    Liu, Y; Nakatsu, Y; Tanaka, H; Koga, K; Ishikawa, K; Shiratani, M; Hori, M

    GENES AND ENVIRONMENT   45 ( 1 )   3   2023.1   ISSN:1880-7046 eISSN:1880-7062

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    Background: Non-thermal atmospheric pressure plasma technologies form the core of many scientific advances, including in the electronic, industrial, and biotechnological fields. The use of plasma as a cancer therapy has recently attracted significant attention due to its cancer cell killing activity. Plasma-activated Ringer’s lactate solution (PAL) exhibits such activity. In addition to ROS, PAL contains active compounds or species that cause cancer cell death, but the potential mutagenic risks of PAL have not been studied. Results: PAL has a low pH value and a high concentration of H2O2. H2O2 was removed from PAL using catalase and catalase-treated PAL with a pH of 5.9 retained a killing effect on HeLa cells whereas this effect was not observed if the PAL was adjusted to pH 7.2. Catalase-treated PAL at pH 5.9 had no significant effect on mutation frequency, the expression of γH2AX, or G2 arrest in HeLa cells. Conclusion: PAL contains one or more active compounds or species in addition to H2O2 that have a killing effect on HeLa cells. The compound(s) is active at lower pH conditions and apparently exhibits no genotoxicity. This study suggested that identification of the active compound(s) in PAL could lead to the development of novel anticancer drugs for future cancer therapy.

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  • Editorial: Prospects of plasma generated species interaction with organic and inorganic materials

    Pankaj Attri, Kazunori Koga, Hirofumi Kurita, Kenji Ishikawa, Masaharu Shiratani

    Frontiers in Physics   10   2023.1   ISSN:2296-424X eISSN:2296-424X

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  • Role of insoluble atoms in the formation of a three-dimensional buffer layer in inverted Stranski–Krastanov mode

    Naoto Yamashita, Ryo Mitsuishi, Yuta Nakamura, Keigo Takeda, Masaru Hori, Kunihiro Kamataki, Takamasa Okumura, Kazunori Koga, Masaharu Shiratani

    Journal of Materials Research   38 ( 5 )   1178 - 1185   2023.1   ISSN:0884-2914 eISSN:2044-5326

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  • プラズマ活性化乳酸リンゲル液が癌細胞に及ぼす影響 遺伝毒性の評価(Effects of plasma-activated Ringer's lactate solution on cancer cells: evaluation of genotoxicity)

    Liu Yang, Nakatsu Yoshimichi, Tanaka Hiromasa, Koga Kazunori, Ishikawa Kenji, Shiratani Masaharu, Hori Masaru

    Genes and Environment   45   1 of 10 - 10 of 10   2023.1   ISSN:1880-7046

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    プラズマ活性化乳酸リンゲル液(PAL)の細胞障害性と遺伝毒性について検討した。pHが低く高濃度のH2O2を含有するPALから、カタラーゼを用いてH2O2を除去した。その結果、PALのpHは5.6以下から5.9に上昇し、これらのカタラーゼ処理したPALではHeLa細胞に対する殺細胞効果が保持されていたが、カタラーゼ処理したPALのpHを7.2に調整すると効果が消失した。だが、カタラーゼ処理したpH5.9のPALには、HeLa細胞における変異頻度やγH2AX発現およびG2期停止に対し有意な作用を観察されなかった。以上より、今回の実験結果から、PALはH2O2以外にもHeLa細胞に対し殺細胞効果をもたらす1種類以上の活性化合物や活性種が含有されていることが明らかにされた。また、これらの物質は低pH条件下で活性化し遺伝毒性は有さないことから、PAL中の活性物質を同定することにより、抗癌剤の新薬開発に繋がることが期待された。

  • Stress reduction of a-C:H films with inserting submonolayer of carbon nanoparticles

    Shiratani Masaharu, Ono Shinjiro, Eri Manato, Okumura Takamasa, Kamataki Kunihiro, Yamashita Naoto, Kiyama Haruki, Itagaki Naho, Koga Kazunori

    Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science   2023 ( 0 )   1Ga06   2023   eISSN:24348589

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    <p>Amorphous carbon (a-C(:H)) thin films have been studied in a wide range of fields as protective films for automotive parts, hard masks for semiconductor device fabrication, and biocompatible films for medical devices due to their excellent characteristics. In particular, mechanical properties (film stress and fracture toughness) related to film delamination are important because they are related to the durability of the films, which in turn are related to film stress and adhesion strength. Recently, we have shown that the introduction of carbon nanoparticles (CNPs) between two layers of a-C:H thin films reduces film stress[1]. In this study, we evaluated other properties of the CNP-inserted sample and examined the effect of CNPs on the mechanical properties of the film toward the practical stage.</p><p>Sandwich structure films were fabricated using a capacitively coupled plasma-enhanced chemical vapor deposition (PECVD) system [1]. Ar and CH4 gases were introduced from the top at 19 sccm and 2.6 sccm, respectively. The thickness of the first and second layers was 154 nm. For the nanoindentation test, a nanoindentation tester (ENT-1100a) was employed and a Berkovich indenter was used.</p><p></p><p>The load-unloading curve by nano-indentation showed a typical curve at 5 mN, and a step in the curve occurred at over 8 mN, and SEM images of the indentation showed that the membrane peeled off in a circular shape when the step occurred. EDS analysis of the peel scar revealed that the peel occurred at the interface between the first and second layers. In addition, the fracture toughness of the film was determined from the SEM images of the delamination traces and the load-unloading curve at the time of step generation, and it decreased with increasing Cp in the region where the film stress was constant for the CNP coverage. These results suggest that CNP coverage has a negative correlation with fracture toughness and that there is an optimum value for improving mechanical properties. Other properties will be discussed in detail in the presentation.</p><p></p><p>[1] S.H. Hwang et al., Jpn. J. Appl. Phys. 59 100906, (2020).</p>

    DOI: 10.14886/jvss.2023.0_1ga06

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  • Role of Direct Plasma Irradiation, Plasma-Activated Liquid, and Plasma-Treated Soil in Plasma Agriculture

    Attri P., Okumura T., Takeuchi N., Razzokov J., Zhang Q., Kamataki K., Shiratani M., Koga K.

    Plasma Medicine   13 ( 3 )   33 - 52   2023   ISSN:19475764

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    Seed treatment with non-thermal plasma has seen a tremendous increase in both direct and indirect applications recently. In this review, we examined the effects of direct plasma irradiation, plasma-activated water (PAW), plasma-activated Ringer’s lactate solution, and plasma-treated soil on seeds, resulting in positive, negative, and neutral changes. Furthermore, we will compare the impact of pressure and feed gases on seed germination and seedling growth. Addition-ally, we focused on the types of reactive oxygen and nitrogen species (RONS) and their concentrations produced in the gas and liquid phases, as these play a crucial role in germination percentage and seedling growth. In conclusion, we find that plasma agriculture’s success is contingent on seed morphology, the types and concentrations of reactive species, and specific plasma characteristics.

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  • One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges

    Iori Nagao, Kunihiro Kamataki, Akihiro Yamamoto, Michihiro Otaka, Yuma Yamamoto, Daisuke Yamashita, Naoto Yamashita, Takamasa Okumura, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    MRS Advances   7 ( 31 )   911 - 917   2022.12   ISSN:2731-5894 eISSN:2059-8521

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    DOI: 10.1557/s43580-022-00417-w

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  • Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates

    Ryota Narishige, Naoto Yamashita, Kunihiro Kamataki, Takamasa Okumura, Kazunori Koga, Masaharu Shiratani, Hisato Yabuta, Naho Itagaki

    Journal of Materials Research   38 ( 7 )   1803 - 1812   2022.11   ISSN:0884-2914 eISSN:2044-5326

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    DOI: 10.1557/s43578-022-00827-4

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  • Raman spectral analysis of the as-deposited a-C:H films prepared by CH4+ Ar plasma CVD

    Shinjiro Ono, Sung Hwa Hwang, Takamasa Okumura, Kunihiro Kamataki, Naoto Yamashita, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Jun-Seok Oh, Susumu Takabayashi, Tatsuyuki Nakatani

    MRS ADVANCES   7 ( 30 )   718 - 722   2022.11   ISSN:2731-5894 eISSN:2059-8521

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    Applicability of precise Raman spectral analysis of a-C:H films deposited using a plasma chemical vapor deposition (CVD) method has been discussed based on the sensitivity to initial conditions in peak separation. The spectral analysis offers to deconvolute the spectra into five peaks, while the as-deposited films prepared by plasma CVD is difficult to the five-peak separation. We found the peak position and the peak height ratio of the D-band to the G(+)-band can be employed to discuss the structure of the as-deposited films. We examined the structural difference between the films deposited at the powered electrode and that at grounded electrode. We found graphene nanoribbon-like structures may be formed in the films deposited on the grounded substrate. This result suggests that the substrate position is an important factor to form the graphene nanoribbon-like structure.

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  • Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes: particle-in-cell/Monte Carlo collision model simulation

    Kohei Abe, Kunihiro Kamataki, Akihiro Yamamoto, Iori Nagao, Michihiro Otaka, Daisuke Yamashita, Takamasa Okumura, Naoto Yamashita, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    Japanese Journal of Applied Physics   61 ( 10 )   106003 - 106003   2022.9   ISSN:0021-4922 eISSN:1347-4065

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    We investigated the effects of amplitude modulated (AM) capacitively coupled Ar discharge plasma on the ion energy distribution function (IEDF) and the ion angular distribution function (IADF) incident on electrodes using the particle-in-cell/Monte Carlo collision model. For AM discharge, the electron density and electron temperature and the kinetic energy and angle of ions incident on the ground electrode change periodically with AM frequency, whereas ones for continuous wave discharge are almost constant. For AM discharge, the plasma had hysteresis characteristics. The peak energy of IEDF varies from 53 to 135 eV and the FWHM of IADF varies from 1.82 to 3.34 degrees for gas pressure 10mTorr, the peak-to-peak input voltage 400 V and AM level of 50%. The variation width of the peak energy of IEDF and FWHM of IADF increases with the AM level. These effects of AM method discharge are more noticeable at lower pressures. Thus, the AM discharge offers a way to control simultaneously IEDF and IADF, which opens a new avenue for plasma processes such as an ALD-like PECVD.

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  • Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O<sub>2</sub>/Ar capacitively coupled plasma

    Kamataki, K; Nagamatsu, D; Yang, T; Abe, K; Yamamoto, A; Nagao, I; Arima, T; Otaka, M; Yamamoto, Y; Yamashita, D; Okumura, T; Yamashita, N; Itagaki, N; Koga, K; Shiratani, M

    AIP ADVANCES   12 ( 8 )   2022.8   eISSN:2158-3226

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    We investigate the effects of the amplitude modulation (AM) discharge method on the growth of nanoparticles and the relation between growth of nanoparticles and plasma generation in tetraethylorthosilicate (TEOS)/O2/Ar plasma. The laser-light scattering (LLS) intensity, which is proportional to the density and the sixth power of the size of nanoparticles in the Rayleigh scattering regime, decreases by 18% at an AM level of 10% and by 60% at an AM level of 50%. On the other hand, the ArI emission intensity, which is roughly proportional to plasma density, is higher than that for the continuous wave discharge. Thus, AM discharges suppress growth of nanoparticles in TEOS plasma. We have shown oscillations of the axial electric field Ez with the AM frequency for AM discharge by electric field measurement using an electro-optic probe. We have discussed that these fluctuations of Ez mainly lead to the vertical oscillation of the levitation position of nanoparticles trapped in the plasma sheath boundary region by taking into account the force balance equation in the axial direction on these negatively charged nanoparticles.

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  • Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma

    Kamataki Kunihiro, Nagamatsu Daiki, Yang Tao, Abe Kohei, Yamamoto Akihiro, Nagao Iori, Arima Toshiaki, Otaka Michihiro, Yamamoto Yuma, Yamashita Daisuke, Okumura Takamasa, Yamashita Naoto, Itagaki Naho, Koga Kazunori, Shiratani Masaharu

    AIP Advances   12 ( 8 )   2022.8   eISSN:21583226

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  • Changes in Content of Bioactive Compounds and Antioxidant Activity Induced in Needles of Different Half-Sib Families of Norway Spruce (<i>Picea abies</i> (L.) H. Karst) by Seed Treatment with Cold Plasma

    Sirgedaite-Seziene, V; Lucinskaite, I; Mildaziene, V; Ivankov, A; Koga, K; Shiratani, M; Lauzike, K; Baliuckas, V

    ANTIOXIDANTS   11 ( 8 )   2022.8   ISSN:2076-3921 eISSN:2076-3921

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    In order to ensure sufficient food resources for a constantly growing human population, new technologies (e.g., cold plasma technologies) are being developed for increasing the germination and seedling growth without negative effects on the environment. Pinaceae species are considered a natural source of antioxidant compounds and are valued for their pharmaceutical and nutraceutical properties. In this study, the seeds of seven different Norway spruce half-sib families were processed for one or two minutes with cold plasma (CP) using dielectric barrier discharge (DBD) plasma equipment. At the end of the second vegetation season, the total flavonoid content (TFC), DPPH (2,2- diphenyl-1-picryl-hydrazyl-hydrate), and ABTS (2,2’-azino-bis (3-ethylbenzothiazoline-6-sulfonic acid)) antioxidant activity, and the amounts of six organic acids (folic, malic, citric, oxalic, succinic, and ascorbic) were determined in the needles of different half-sib families of Norway spruce seedlings. The results show that the TFC, antioxidant activity, and amounts of organic acids in the seedling needles depended on both the treatment duration and the genetic family. The strongest positive effect on the TFC was determined in the seedlings of the 477, 599, and 541 half-sib families after seed treatment with CP for 1 min (CP1). The TFC in these families increased from 118.06 mg g−1 to 312.6 mg g−1 compared to the control. Moreover, seed treatment with CP1 resulted in the strongest increase in the antioxidant activity of the needles of the 541 half-sib family seedlings; the antioxidant activity, determined by DPPH and ABTS tests, increased by 30 and 23%, respectively, compared to the control. The obtained results indicate that the CP effect on the amount of organic acids in the needles was dependent on the half-sib family. It was determined that treatment with CP1 increased the amount of five organic acids in the needles of the 541 half-sib family seedlings. The presented results show future possibilities for using cold plasma seed treatment in the food and pharmacy industries.

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  • Detection of NO3− introduced in plasma-irradiated dry lettuce seeds using liquid chromatography-electrospray ionization quantum mass spectrometry (LC-ESI QMS)

    Takamasa Okumura, Pankaj Attri, Kunihiro Kamataki, Naoto Yamashita, Yuichi Tsukada, Naho Itagaki, Masaharu Shiratani, Yushi Ishibashi, Kazuyuki Kuchitsu, Kazunori Koga

    Scientific Reports   12 ( 1 )   12525   2022.7   ISSN:2045-2322 eISSN:20452322

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    Discharge plasma irradiates seeds with reactive oxygen and nitrogen species (RONS). However, RONS introduced in seeds by plasma irradiation have not been successfully detected thus far. This study provides experimental evidence that nitrate ion NO<sub>3</sub><sup>−</sup> is introduced in lettuce seeds as RONS upon irradiation with atmospheric-pressure air dielectric barrier discharge plasma. Plasma irradiation for 5 min promotes seed germination. The components of the plasma-irradiated seeds were examined using electrospray ionization quantum mass spectrometry (ESI QMS), which revealed that the plasma irradiation introduced an ion with a mass of 62 m/z in detectable amounts. This ion was identified as NO<sub>3</sub><sup>−</sup> by liquid chromatography (LC), multiple wavelength detector (MWD), and LC-ESI QMS. A one-dimensional simulation at electron temperature T<sub>e</sub> = 1 eV, electron density N<sub>e</sub> = 10<sup>13</sup>/m<sup>3</sup>, and gas temperature T<sub>g</sub> = 300 K indicated the introduction of NO<sub>3</sub><sup>−</sup>, involving nitric oxide NO. NO<sub>3</sub><sup>−</sup> is one of the most important ions that trigger signal transduction for germination when introduced in seeds. The scanning electron microscopy (SEM) images revealed that there was no change on the surface of the seeds after plasma irradiation. Plasma irradiation is an effective method of introducing NO<sub>3</sub><sup>−</sup> in seeds in a dry process without causing damage.

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  • Treatment of organic wastewater by a combination of non-thermal plasma and catalyst: a review

    Pankaj Attri, Kazunori Koga, Takamasa Okumura, Fadzai L. Chawarambwa, Tika E. Putri, Yuichi Tsukada, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

    Reviews of Modern Plasma Physics   6 ( 1 )   2022.7   ISSN:2367-3192 eISSN:2367-3192

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    DOI: 10.1007/s41614-022-00077-1

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  • Spatio-temporal measurements Ar 2p1 excitation rates and optical emission spectroscopy by capacitively coupled Ar and Ne mixed gas plasma

    Michihiro Otaka, Toshiaki Arima, Jiansyun Lai, Kizuki Ikeda, Kunihiro Kamataki, Naoto Yamashita, Takamasa Okumura, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    MRS Advances   7 ( 31 )   918 - 922   2022.7   ISSN:2731-5894 eISSN:2059-8521

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    DOI: 10.1557/s43580-022-00306-2

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  • Cold plasma-induced stimulation of natural sweeteners biosynthesis in <i>Stevia rebaudiana</i> Bertoni

    Zukiene, R; Judickaite, A; Mildaziene, V; Koga, K; Shiratani, M

    FEBS OPEN BIO   12   301 - 301   2022.7   ISSN:2211-5463

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  • Growth of Single-Crystalline ZnO Films on 18%-Lattice-Mismatched Sapphire Substrates Using Buffer Layers with Three-Dimensional Islands

    Yuta Nakamura, Naoto Yamashita, Kunihiro Kamataki, Takamasa Okumura, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    Crystal Growth & Design   22 ( 6 )   3770 - 3777   2022.6   ISSN:1528-7483 eISSN:1528-7505

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  • Performance comparison of nitrile-based liquid electrolytes on bifacial dye-sensitized solar cells under low-concentrated light

    Tika E. Putri, Fadzai L. Chawarambwa, Pankaj Attri, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    MRS Advances   7 ( 21 )   427 - 432   2022.5   ISSN:2731-5894 eISSN:2059-8521

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    Abstract: Dye-sensitized solar cell (DSSC) has low power output and efficiency. Even though the low-concentrated light can increase the POUT and power conversion efficiency (PCE) of DSSC, the effect of increase in the cell temperature, particularly electrolyte evaporation, becomes a major concern. In this study, we compared and investigated the performance of acetonitrile (AN-50), propionitrile (PN-50), and 3-metoxy propionitrile (Z-100) as nitrile-based electrolyte under low-concentrated light. The results showed 4–8 times increase in JSC and POUT in all electrolytes. AN-50 demonstrated an improved performance under influence of 2 cm distance concave mirror concentrated light with the highest JSC = 74.21 mA/cm2, POUT = 24.53 mW/cm2, and η = 7.99%. However, the performance of cell with AN-50 and PN-50 started to degrade within 3 h of measurement. In contrast, Z-100 displayed performance stability during 4 days measurement even with the lowest JSC= 49.98 mA/cm2, POUT = 19.50 mW/cm2, and η = 6.35%. Graphical abstract: [Figure not available: see fulltext.]

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  • Epitaxial growth of Zn1−xMgxO films on sapphire substrates via inverted Stranski-Krastanov mode using magnetron sputtering

    Daichi Takahashi, Naoto Yamashita, Daisuke Yamashita, Takamasa Okumura, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    MRS Advances   7 ( 20 )   415 - 419   2022.2   ISSN:2731-5894 eISSN:2059-8521

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    DOI: 10.1557/s43580-022-00234-1

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  • Outcomes of Pulsed Electric Fields and Nonthermal Plasma Treatments on Seed Germination and Protein Functions

    Pankaj Attri, Takamasa Okumura, Kazunori Koga, Masaharu Shiratani, Douyan Wang, Katsuyuki Takahashi, Koichi Takaki

    Agronomy   12 ( 2 )   2022.2   eISSN:2073-4395

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    To meet the needs of the hungry population, it is critical to boost agricultural product production while minimizing contaminated waste. The use of two nonthermal technologies, pulsed electric field (PEF) and nonthermal plasma (NTP), is increasing every day. As both PEF and NTP are relatively newer areas, there is limited knowledge about these two technologies and their modes of action. Studies showed that PEF treatment on the plant seeds helps germination and seedling growth. The positive impact of PEF intensity is highly dependent on the seed coat type and plant species. Another nonthermal technology, NTP, affects seed germination, seedling growth, yield, and resilience to abiotic stress when generated at varying pressures with and without different feed gases. Early germination, germination rate, and germination percentage were all improved when the seedlings were treated with NTP. Similarly to the PEF treatment, NTP had a negative or no effect on germination. This review examined the effects of PEF and NTP on seed germination and ana-lyzed the situation and mechanism behind the positive or negative effect. Deactivation of proteins and enzymes to extend the shelf life of beverages is another prominent application of PEF and NTP. The interaction of PEF and NTP with proteins aids in understanding the microscopic mechanism of these technologies. Therefore, we covered in this review the potential structural and functional changes in proteins/enzymes as a result of PEF and NTP, as well as a comparison of the benefits and drawbacks of these two technologies.

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  • Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems

    Toshiro Kaneko, Hiromitsu Kato, Hideaki Yamada, Muneaki Yamamoto, Tomoko Yoshida, Pankaj Attri, Kazunori Koga, Tomoyuki Murakami, Kazuyuki Kuchitsu, Sugihiro Ando, Yasuhiro Nishikawa, Kentaro Tomita, Ryo Ono, Tsuyohito Ito, Atsushi M. Ito, Koji Eriguchi, Tomohiro Nozaki, Takayoshi Tsutsumi, Kenji Ishikawa

    Japanese Journal of Applied Physics   61 ( SA )   SA0805 - SA0805   2022.1   ISSN:0021-4922 eISSN:1347-4065

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    Nitrogen is a very common element, comprising approximately 78% of Earth’s atmosphere, and is an important component of various electronic devices while also being essential for life. However, it is challenging to directly utilize dinitrogen because of the highly stable triple bond in this molecule. The present review examines the use of non-equilibrium plasmas to generate controlled electron impacts as a means of generating reactive nitrogen species (RNS) with high internal energy values and extremely short lifetimes. These species include ground state nitrogen atoms, excited nitrogen atoms, etc. RNS can subsequently react with oxygen and/or hydrogen to generate new highly reactive compounds and can also be used to control various cell functions and create new functional materials. Herein, plasma-processing methods intended to provide RNS serving as short-lived precursors for a range of applications are examined in detail.

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  • Effect of gas flow rate and discharge volume on CO2 methanation with plasma catalysis Reviewed

    Susumu Toko, Masashi Ideguchi, Taiki Haseagawa, Takamasa Okumura, Kunihiro Kamataki, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

    Japanese Journal of Applied Physics   61 ( SI )   2022.1   ISSN:0021-4922 eISSN:1347-4065

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  • Improved luminescence performance of Yb3+-Er3+-Zn2+: Y<inf>2</inf>O<inf>3</inf> phosphor and its application to solar cells

    Fadzai Lesley Chawarambwa, Tika Erna Putri, Sung Hwa Hwang, Pankaj Attri, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Daisuke Nakamura, Masaharu Shiratani

    Optical Materials   123   2022.1   ISSN:0925-3467 eISSN:1873-1252

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    Upconversion materials (UC) can convert low-energy photons into visible light and, therefore, can be incorporated in solar cells to increase the absorption of visible light. This study synthesized UC nanophosphors Yb3+, Er3+: Y2O3 and Yb3+, Er3+, Zn2+: Y2O3 by a simple co-precipitation method for application in dye-sensitized solar cells (DSSCs). The impact of the enhancement in the concentration of Zn2+ on the photoluminescence (PL) and color point of the synthesized nanophosphors was also investigated. The synthesized nanophosphors emitted intense red and weaker green emissions upon excitation at 980 nm. The incorporation of Zn2+ to the Yb3+, Er3+: Y2O3 nanophosphors leads to color tunability in the red and yellow regions. Furthermore, the synthesized nanophosphors were incorporated into the DSSC photoanode to form a TiO2-UC-based DSSC for converting near-infrared (NIR) into visible light. We observed that the TiO2-UC-based DSSC showed an enhancement ratio in current density and power conversion efficiency of 17.4% and 16.6%, respectively, compared to the bare TiO2-based DSSC. These results reveal that UC-based Yb3+, Er3+, Zn2+: Y2O3 nanophosphors are useful in improving the efficiency of DSSCs and in color tunability applications.

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  • Plasma Synthesis of Silicon Nanoparticles: From Molecules to Clusters and Nanoparticle Growth

    Shota Nunomura, Kunihiro Kamataki, Takehiko Nagai, Tatsuya Misawa, Shinji Kawai, Kosuke Takenaka, Giichiro Uchida, Kazunori Koga

    IEEE Open Journal of Nanotechnology   3   94 - 100   2022   eISSN:2644-1292

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    Plasma nanotechnology is widely used for nanoscale etching, dopant implantation and thin-film deposition for state-of-the-art semiconductor devices. Such a plasma nanotechnology has another interesting aspect of synthesizing nanoparticles, in a controlled manner of atomic composition, structure and those size. Here, we present the polymerization and growth of silicon nanoparticles from a molecular level to 10 nm-particles in hydrogen diluted silane plasmas. The polymerization and growth are experimentally studied using various plasma diagnostic tools. The results indicate that nanoparticles are rapidly formed via gas-phase reactions in a low-density plasma comprising high-energy electrons. The growth kinetics and the modification of plasma properties are discussed in terms of gas-phase reactions, charging and coagulation of nanoparticles.

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  • Control of magnetic transition of ZnO:Co grown by RF-sputter using post-Annealing

    Nurut A.M., Yamashita N., Kamataki K., Koga K., Itagaki N., Shiratani M.

    2022 International Conference on Informatics Electrical and Electronics, ICIEE 2022 - Proceedings   2022   ISBN:9781665486224

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    Ferromagnetic semiconductor has attracted much attention for the application of spintronic devices, which will bring next generation of the information technology. Cobalt-doped Zinc Oxides (ZnO: Co) is strong candidate of this material group. The ZnO: Co films were grown on a silicon substrate (100) at room temperature by radio-frequency (rf) sputtering deposition and followed by post-Annealing treatment for 3 hours at 400°C and 800°C in the air. The transition from paramagnetic to ferromagnetic occurs after annealing at 400°C, and the properties return to paramagnetic like as-deposition when the temperature rises to 800°C. The XRD measurement of ZnO: Co films exhibited a wurtzite structure in the (002) plane and was free from secondary phases. Then, post-Annealing at 400°C due to shift peak and decrease oxygen element, meanwhile the crystallinity significantly up to 800°C.

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  • A Plasma Enhanced CVD Technology for Solving Issues on Sidewall Deposition in Trenches and Holes

    Shiratani, M; Kamataki, K; Koga, K

    2022 17TH INTERNATIONAL MICROSYSTEMS, PACKAGING, ASSEMBLY AND CIRCUITS TECHNOLOGY CONFERENCE (IMPACT)   2022-October   2022   ISSN:2150-5934 ISBN:978-1-6654-5221-2

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    EUV lithography drives the miniaturization of semiconductors for higher integration, and semiconductor manufacturing is in transition from two-dimensional (2D) to three-dimensional (3D) structures [1], which plays a crucial role in supporting packaging for edge computing such as Internet-of-Things (loT). 3D power scaling enables higher integration without reducing the size of transistors by arranging them vertically instead of horizontally. One of the important processes in manufacturing 3D structured semiconductors is the formation of films on sidewalls of trenches and holes. Such films are often deposited by plasma enhanced chemical vapor deposition (PECVD) [2]. Due to the gas decomposition by plasma, PECVD method archives a high deposition rate of good quality films at low temperature, which is an advantage over other deposition methods such as atomic layer deposition (ALD) [3]. However, this does not fully meet the actual manufacturing requirements. For instance, SiO2 dielectric films deposited by PECVD usually have low coverage and poor film quality on sidewall of trenches and holes compared to films on surface. Ion impact is one of the most important factors contributing to improving step coverage and film quality in trenches and holes. One parameter that characterized ion impact is the ion energy distribution function (IEDF) and ion angular distribution (IADF) [4], [5]. There are strong needs for low temperature deposition in trenches and holes.

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  • Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture

    Pankaj Attri, Kenji Ishikawa, Takamasa Okumura, Kazunori Koga, Masaharu Shiratani, Vida Mildaziene

    Scientific Reports   11 ( 1 )   2021.12

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    DOI: 10.1038/s41598-021-81175-x

  • Performance Characteristics of Bifacial Dye-Sensitized Solar Cells with a V-Shaped Low-Concentrating Light System

    Tika E. Putri, Fadzai L. Chawarambwa, Min Kyu Son, Pankaj Attri, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    ACS Applied Energy Materials   4 ( 12 )   13410 - 13414   2021.12

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    DOI: 10.1021/acsaem.1c02774

  • Impact of Reactive Oxygen and Nitrogen Species Produced by Plasma on Mdm2–p53 Complex

    22 ( 17 )   9585 - 9585   2021.9

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    The study of protein–protein interactions is of great interest. Several early studies focused on the murine double minute 2 (Mdm2)–tumor suppressor protein p53 interactions. However, the effect of plasma treatment on Mdm2 and p53 is still absent from the literature. This study investigated the structural changes in Mdm2, p53, and the Mdm2–p53 complex before and after possible plasma oxidation through molecular dynamic (MD) simulations. MD calculation revealed that the oxidized Mdm2 bounded or unbounded showed high flexibility that might increase the availability of tumor suppressor protein p53 in plasma-treated cells. This study provides insight into Mdm2 and p53 for a better understanding of plasma oncology.

    DOI: 10.3390/ijms22179585

  • Comparison between Ar+CH4 Cathode and Anode Coupled Capacitively Coupled Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Films Reviewed International journal

    S. H. Hwang, R. Iwamoto, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani

    Thin Solid Films   729   2021.7

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    DOI: 10.1016/j.tsf.2021.138701

  • Highly efficient and transparent counter electrode for application in bifacial solar cells

    Fadzai Lesley Chawarambwa, Tika Erna Putri, Pankaj Attri, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    Chemical Physics Letters   768   2021.4

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    DOI: 10.1016/j.cplett.2021.138369

  • Impact of atmospheric pressure plasma treated seeds on germination, morphology, gene expression and biochemical responses

    Pankaj Attri, Kazunori Koga, Takamasa Okumura, Masaharu Shiratani

    Japanese Journal of Applied Physics   60 ( 4 )   2021.4

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    DOI: 10.35848/1347-4065/abe47d

  • Possible impact of plasma oxidation on the structure of the C-terminal domain of SARS-CoV-2 spike protein: A computational study

    Pankaj Attri, Kazunori Koga, Masaharu Shiratani

    Applied Physics Express   14 ( 2 )   2021.2

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    DOI: 10.35848/1882-0786/abd717

  • Alterations of DNA Methylation Caused by Cold Plasma Treatment Restore Delayed Germination of Heat-Stressed Rice (Oryza sativa L.) Seeds Reviewed International journal

    C. Suriyasak, K. Hatanaka, H. Tanaka, T. Okumura, D. Yamashita, P. Attri, K. Koga, M. Shiratani, N. Hamaoka, Y. Ishibashi

    ACS Agric. Sci. Technol.   1 ( 1 )   2021.2

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    DOI: 10.1021/acsagscitech.0c00070

  • Impact of surface morphologies of substrates on the epitaxial growth of magnetron-sputtered (ZnO) x (InN)1-x films

    Ryota Narishige, Kentaro Kaneshima, Daisuke Yamashita, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    Japanese Journal of Applied Physics   60 ( SA )   SAAB02 - SAAB02   2021.1

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    DOI: 10.35848/1347-4065/abba0c

  • Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method

    Sung Hwa Hwang, Kazunori Koga, Yuan Hao, Pankaj Attri, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani, Jun-Seok Oh, Susumu Takabayashi, Tatsuyuki Nakatani

    Processes   9 ( 1 )   2 - 2   2020.12

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    DOI: 10.3390/pr9010002

  • Experimental identification of the reactive oxygen species transported into a liquid by plasma irradiation

    Toshiyuki Kawasaki, Kazunori Koga, Masaharu Shiratani

    Japanese Journal of Applied Physics   59 ( 11 )   110502 - 110502   2020.11

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    DOI: 10.35848/1347-4065/abc3a1

  • Low-stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition

    Sung-Hwa Hwang, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Tatsuyuki Nakatani, Masaharu Shiratani

    Japanese Journal of Applied Physics   59 ( 10 )   100906 - 100906   2020.10

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    DOI: 10.35848/1347-4065/abbb20

  • Plasma agriculture from laboratory to farm: A review

    Pankaj Attri, Kenji Ishikawa, Takamasa Okumura, Kazunori Koga, Masaharu Shiratani

    Processes   8 ( 8 )   2020.8

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    DOI: 10.3390/PR8081002

  • Influence of osmolytes and ionic liquids on the Bacteriorhodopsin structure in the absence and presence of oxidative stress: A combined experimental and computational study Reviewed

    Pankaj Attri, Jamoliddin Razzokov, Maksudbek Yusupov, Kazunori Koga, Masaharu Shiratani, Annemie Bogaerts

    International Journal of Biological Macromolecules   148   657 - 665   2020.4

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    DOI: 10.1016/j.ijbiomac.2020.01.179

  • Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction

    Hyunwoong Seo, Daisuke Sakamoto, Hakutatsu Chou, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    Progress in Photovoltaics: Research and Applications   26 ( 2 )   145 - 150   2020.2

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    DOI: 10.1002/pip.2961

  • Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition Reviewed

    Yeonwon Kim, Kazunori Koga, Masaharu Shiratani

    Current Applied Physics   20 ( 1 )   191 - 195   2020.1

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    DOI: 10.1016/j.cap.2019.11.001

  • Local supply of reactive oxygen species into a tissue model by atmospheric-pressure plasma-jet exposure Reviewed

    Toshiyuki Kawasaki, Fumiaki Mitsugi, Kazunori Koga, Masaharu Shiratani

    Journal of Applied Physics   125   2019.6

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    Local supply of reactive oxygen species into a tissue model by atmospheric-pressure plasma-jet exposure
    © 2019 Author(s). The supply of reactive oxygen species (ROSs) into a tissue by plasmas must be controlled for the safe and effective use of plasma technologies in biomedical applications. In this study, the two-dimensional distributions of ROSs after passing through an agarose tissue model by the plasma-jet exposures were visualized using a KI-starch gel reagent to evaluate the local ROS supply. Partial ROS supply on the tissue model surface induced the local ROS supply in a pointlike shape just under the plasma-exposed spot. The O3-containing gas exposure without direct plasma contact could not induce the local ROS supply. Therefore, the local ROS supply was assumed to be induced by plasma-specific effects. However, the results also indicated that the plasma jet coming in direct contact with the tissue model surface did not necessarily induce the local ROS supply. The effects of the tissue model thickness on the local ROS supply were also studied; the local ROS supply could penetrate to a depth of 2 mm in the tissue model under the given experimental conditions.

    DOI: 10.1063/1.5091740

  • Controlling feeding gas temperature of plasma jet with Peltier device for experiments with fission yeast Reviewed

    Shinji Yoshimura, Mitsutoshi Aramaki, Yoko Otsubo, Akira Yamashita, Kazunori Koga

    Japanese Journal of Applied Physics   58 ( SE )   SEEG03 - SEEG03   2019.6

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    DOI: 10.7567/1347-4065/ab1473

  • Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development Reviewed

    Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, Kenji Ishikawa

    Japanese Journal of Applied Physics   58 ( SE )   SE0804 - SE0804   2019.6

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    DOI: 10.7567/1347-4065/ab163b

  • Progress and perspectives in dry processes for nanoscale feature fabrication: toward intelligent processes and virtual product development Reviewed

    Taku Iwase, Yoshito Kamaji, Song Yun Kang, Kazunori Koga, Nobuyuki Kuboi, Moritaka Nakamura, Nobuyuki Negishi, Tomohiro Nozaki, Shota Nunomura, Daisuke Ogawa, Mitsuhiro Omura, Tetsuji Shimizu, Kazunori Shinoda, Yasushi Sonoda, Haruka Suzuki, Kazuo Takahashi, Takayoshi Tsutsumi, Kenichi Yoshikawa, Tatsuo Ishijima, Kenji Ishikawa

    Japanese Journal of Physics   Vol. 58   pp. SE0804(21pp)   2019.5

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    Progress and perspectives in dry processes for nanoscale feature fabrication: toward intelligent processes and virtual product development

  • 大気圧非平衡He プラズマジェットと溶液との相互作用に関する可視化研究 Invited

    内田 儀一郎, 竹中 弘祐, 川崎 敏之, 古閑 一憲, 白谷 正治, 節原 裕一

    スマートプロセス学会誌   8 ( 2 )   58 - 63   2019.3

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  • Spatial correlation between density fluctuations of high energy electrons and nanoparticles in amplitude modulated capactively coupled plasma Reviewed

    R. Zhou, K. Mori, H. Ohtomo, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani

    J. Phys.: Conf. Ser.   2019.1

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    Spatial correlation between density fluctuations of high energy electrons and nanoparticles in amplitude modulated capactively coupled plasma

  • Room-temperature fabrication of amorphous In2O3:Sn films with high electron mobility via nitrogen mediated amorphization Reviewed

    K. Imoto, H. Wang, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    J. Phys.: Conf. Ser.   2019.1

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    Room-temperature fabrication of amorphous In2O3:Sn films with high electron mobility via nitrogen mediated amorphization

  • Effects of nitrogen impurity on zno crystal growth on Si substrates Reviewed

    Soichiro Muraoka, Lyu Jiahao, Daisuke Yamashita, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    MRS Advances   2019.1

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    Effects of nitrogen impurity on zno crystal growth on Si substrates
    Effects of nitrogen impurity on ZnO crystal growth on Si substrates have been investigated. The quantitative analysis on the surface morphology deriving height-height correlation function indicates that adsorbed nitrogen atoms suppress the secondary nucleation and enhance adatom migration. The resultant films have smooth surface as well as large grain size up to 24 nm even for small thickness of 10 nm. ZnO films fabricated by using such films as buffer layers possess high crystal quality, where the full width at half maximum of (002) rocking curve is 0.68°, one-fourth of that for films fabricated without nitrogen.

    DOI: 10.1557/adv.2019.28

  • Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate Reviewed

    Nanoka Miyahara, Seichi Urakawa, Daisuke Yamashita, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    MRS Advances   2019.1

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    Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate
    We have recently developed a novel semiconductor, (ZnO)x(InN)1-x (abbreviated to ZION). In this study, we have succeeded in direct epitaxial growth of ZION films on 19?21&#37;-lattice-mismatched c-plane sapphire by radio-frequency (RF) magnetron sputtering. X-ray diffraction analysis showed that there is no epitaxial relationship between ZION films fabricated at room-temperature (RT) and the sapphire substrates, while the films fabricated at 450oC grow epitaxially on the sapphire substrates. From the analysis of time evolution of the surface morphology, the process for the epitaxial growth of ZION on sapphire is found to consist of three stages. They are (i) initial nucleation of ZION crystallites with crystal axis aligned to the sapphire substrate, (ii) island growth from the initially formed nuclei and subsequent nucleation (secondary nucleation) of ZION crystallites, and (iii) lateral growth of ZION islands originated from initially formed nuclei. On the other hand, non-epitaxial ZION films fabricated at RT just grow in 3D mode. From these results, we conclude that the substrate temperature is the key to control of nucleation and subsequent epitaxial growth of ZION films on the lattice-mismatched substrate.

    DOI: 10.1557/adv.2019.17

  • Photoluminescence of (ZnO)0.82(InN)0.18 films -Incident light angle dependence- Reviewed

    N. Miyahara, K. Iwasaki, D. Yamashita, D. Nakamura, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    Mater. Sci. Forum   941   2099 - 2103   2018.12

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    Photoluminescence of (ZnO)0.82(InN)0.18 films -Incident light angle dependence-
    We have fabricated a new semiconducting material, (ZnO)x(InN)1-x (called ZION hereafter), which is a pseudo-binary alloy of wurtzite ZnO (band gap: 3.4 eV) and wurtzite InN (band gap: 0.7 eV). We have succeeded in fabricating epitaxial (ZnO)0.82(InN)0.18 films on ZnO templates by RF magnetron sputtering. XRD measurements show that the full width at half maximum of the rocking curves from (101) plane and (002) plane are significantly small of 0.11 ? and 0.16 ?, respectively, indicating good in-plane and out-of-plane crystal alignment. High crystal quality of the films was also proved by deducing the defect density from XRD analysis showing that the edge type dislocation density is low of 8.2×108 cm-2. Furthermore, we observed room temperature photoluminescence from ZION films as a parameter of incident angle of He-Cd laser light. The results indicate that an emission peak of 2.79 eV is originated from ZION.

    DOI: 10.4028/www.scientific.net/MSF.941.2099

  • Impact of Gamma rays and DBD plasma treatments on wastewater treatment

    Pankaj Attri, Fumiyoshi Tochikubo, Ji Hoon Park, Eun Ha Choi, Kazunori Koga, Masaharu Shiratani

    Scientific Reports   8 ( 1 )   2018.12

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    DOI: 10.1038/s41598-018-21001-z

  • Cross correlation analysis of fluctuation of interactions between nanoparticles and low pressure reactive plasmas Reviewed

    R. Zhou, K. Mori, H. Ohtomo, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani

    Mater. Sci. Forum   941   2104 - 2108   2018.12

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    Cross correlation analysis of fluctuation of interactions between nanoparticles and low pressure reactive plasmas
    We analyzed fluctuations of interactions between low pressure reactive plasmas and nanoparticles formed in the plasmas, to shed light on origins of fluctuations of interactions and to control fluctuations in plasma processes. Spatiotemporal fluctuations of nanoparticle density develop not only in a linear way but also in a nonlinear way. The results suggest nonlinear interactions potentially induce spatial and temporal process fluctuations.

    DOI: 10.4028/www.scientific.net/MSF.941.2104

  • Effects of sputtering pressure on (ZnO)<inf>x</inf>(InN)<inf>1-x</inf> crystal film growth at 450?C Reviewed

    N. Itagaki, K. Takeuchi, N. Miyahara, K. Imoto, H. Seo, K. Koga, M. Shiratani

    Mater. Sci. Forum   941   2093 - 2098   2018.12

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    Effects of sputtering pressure on (ZnO)<inf>x</inf>(InN)<inf>1-x</inf> crystal film growth at 450?C
    We studied effects of sputtering pressure on growth of (ZnO)x(InN)1-x crystal films deposited at 450°C by rf magnetron sputtering. Epitaxial growth of (ZnO)x(InN)1-x films was realized on single-crystalline ZnO template. X-ray diffraction measurements show that full width at half maximum of the rocking curves from the (101) plane of the films reaches minimum value of 0.11? at 0.5 Pa. The sputtering gas pressure is a key tuning knob for controlling the crystal quality of ZION films.

    DOI: 10.4028/www.scientific.net/MSF.941.2093

  • Particle behavior and its contribution to film growth in a remote silane plasma

    Yeonwon Kim, Kazunori Koga, Masaharu Shiratani

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films   36 ( 5 )   2018.9

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    DOI: 10.1116/1.5037539

  • The effect of the H<inf>2</inf>/(H<inf>2</inf> + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H<inf>2</inf>/C<inf>7</inf>H<inf>8</inf>plasma chemical vapor deposition

    660   891 - 898   2018.8

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    © 2018 Elsevier B.V. To produce hydrogenated amorphous carbon (a-C:H) films with high mass density at a high deposition rate and low substrate bias voltage, we deposited these films on a Si substrate by plasma chemical vapor deposition, using toluene as a source compound and varying the gas flow-rate ratio of H2/(H2+ Ar). By decreasing the gas flow-rate ratio from 55&#37; to 11&#37;, the hydrogen content in the films decreased, and the density of sp3carbon atoms in the films increased, whereas their surface roughness increased. At the gas flow-rate ratio of 11&#37;, we produced a-C:H films with a high bulk density of 1830 kg/m3at a high deposition rate of 81.1 nm/min.

    DOI: 10.1016/j.tsf.2018.02.035

  • Low-Pressure Methanation of CO2 Using a Plasma–Catalyst System

    10 ( 8 )   1087 - 1090   2018.8

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    DOI: 10.1166/sam.2018.3303

  • Transportation of reactive oxygen species in a tissue phantom after plasma irradiation

    Toshiyuki Kawasaki, Gouya Kuroeda, Ryuhei Sei, Masaaki Yamaguchi, Reishi Yoshinaga, Riho Yamashita, Hikaru Tasaki, Kazunori Koga, Masaharu Shiratani

    Japanese Journal of Applied Physics   57 ( 1 )   2018.1

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    DOI: 10.7567/JJAP.57.01AG01

  • 低温プラズマによるナノ粒子の合成と太陽電池への応用 Reviewed

    古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治

    信学技報   117   5 - 8   2017.11

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    我々は、マルチホロー放電プラズマCVD法を開発し、サイズ・構造制御した結晶Siナノ粒子の連続作製に成功した。この方法では、サイズ・構造制御の重要パラメタはガス圧力とSiH4ガスに対するH2希釈率であることを明らかにした。結晶Siナノ粒子を用いて作製したショットキセルの量子効率がバンドギャップの3倍以上の光子エネルギー入射で100&#37;以上を示し、多重励起子生成型太陽電池の原理検証に成功した。また、結晶Siナノ粒子増感太陽電池として世界最高性能の太陽電池を実現した。加えてPtに代わる低コストポリマー対向電極材料の特性改善にSiナノ粒子が有効であることを明らかにした。

  • Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition

    Sota Tanami, Daiki Ichida, Shinji Hashimoto, Hyunwoong Seo, Daisuke Yamashita, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    THIN SOLID FILMS   641   59 - 64   2017.11

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    DOI: 10.1016/j.tsf.2017.02.067

  • 色素増感太陽電池のポリマー対向電極における触媒反応の活性化 Reviewed

    徐鉉雄, 板垣奈穂, 古閑一憲, 白谷正治

    信学技報   117   27 - 29   2017.11

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    色素増感太陽電池の対向電極は電解液との酸化還元反応の触媒として務め、太陽電池の性能に(特に、充填率に)重要な役割を果たす。カーボン、グラフェン、カーボンナノチューブ、遷移金属及びその化合物、ポリマーなど多くの材料が色素増感太陽電池の白金対向電極を代替するため、研究されているが、高価な白金は依然としてドミナントな対向電極材料として使われている。本研究では低価のポリマーを用いた色素増感太陽電池の対向電極を研究した。ここではPoly(3、4-ethylenedioxythiophene):poly(4-styrenesulfonate)(PEDOT:PSS)を対向電極材料として使用した。以前研究と同様に、PEDOT:PSS対向電極を用いた色素増感太陽電池の最初効率は低かった。特に、相対的に不十分な触媒反応のため、充填率が大きく低下された結果を示した。PEDOT:PSS対向電極の触媒反応の向上のため、本研究はナノ粒子を導入した。ナノ粒子による対向電極の表面積の増加は触媒反応の活性化とともに色素増感太陽電池の効率を向上させた。結果的に、ナノ粒子を含めたポリマーナノコンポジット対向電極は白金対向電極以上の触媒反応とともに、さらに高い効率を示した。

  • Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH 4 plasma chemical vapor deposition

    Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Takashi Kojima, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    Surface and Coatings Technology   326   388 - 394   2017.10

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    DOI: 10.1016/j.surfcoat.2017.01.034

  • Extension of the operational regime of the LHD towards a deuterium experiment

    Y. Takeiri, T. Morisaki, M. Osakabe, M. Yokoyama, S. Sakakibara, H. Takahashi, Y. Nakamura, T. Oishi, G. Motojima, S. Murakami, K. Ito, A. Ejiri, S. Imagawa, S. Inagaki, M. Isobe, S. Kubo, S. Masamune, T. Mito, I. Murakami, K. Nagaoka, K. Nagasaki, K. Nishimura, M. Sakamoto, R. Sakamoto, T. Shimozuma, K. Shinohara, H. Sugama, K. Y. Watanabe, J. W. Ahn, N. Akata, T. Akiyama, N. Ashikawa, J. Baldzuhn, T. Bando, E. Bernard, F. Castejon, H. Chikaraishi, M. Emoto, T. Evans, N. Ezumi, K. Fujii, H. Funaba, M. Goto, T. Goto, D. Gradic, Y. Gunsu, S. Hamaguchi, H. Hasegawa, Y. Hayashi, C. Hidalgo, T. Higashiguchi, Y. Hirooka, Y. Hishinuma, R. Horiuchi, K. Ichiguchi, K. Ida, T. Ido, H. Igami, K. Ikeda, S. Ishiguro, R. Ishizaki, A. Ishizawa, A. Ito, Y. Ito, A. Iwamoto, S. Kamio, K. Kamiya, O. Kaneko, R. Kanno, H. Kasahara, D. Kato, T. Kato, K. Kawahata, G. Kawamura, M. Kisaki, S. Kitajima, W. H. Ko, M. Kobayashi, S. Kobayashi, T. Kobayashi, K. Koga, A. Kohyama, R. Kumazawa, J. H. Lee, D. Lopez-Bruna, R. Makino, S. Masuzaki, Y. Matsumoto, H. Matsuura, O. Mitarai, H. Miura, J. Miyazawa, N. Mizuguchi, C. Moon, S. Morita, T. Moritaka, K. Mukai, T. Muroga, S. Muto, T. Mutoh, T. Nagasaka, Y. Nagayama, N. Nakajima, Y. Nakamura, H. Nakanishi, H. Nakano, M. Nakata, Y. Narushima, D. Nishijima, A. Nishimura, S. Nishimura, T. Nishitani, M. Nishiura, Y. Nobuta, H. Noto, M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, M. Ohno, N. Ohno, H. Ohtani, M. Okamoto, Y. Oya, T. Ozaki, B. J. Peterson, M. Preynas, S. Sagara, K. Saito, H. Sakaue, A. Sanpei, S. Satake, M. Sato, T. Saze, O. Schmitz, R. Seki, T. Seki, I. Sharov, A. Shimizu, M. Shiratani, M. Shoji, C. Skinner, R. Soga, T. Stange, C. Suzuki, Y. Suzuki, S. Takada, K. Takahata, A. Takayama, S. Takayama, Y. Takemura, Y. Takeuchi, H. Tamura, N. Tamura, H. Tanaka, K. Tanaka, M. Tanaka, T. Tanaka, Y. Tanaka, S. Toda, Y. Todo, K. Toi, M. Toida, M. Tokitani, T. Tokuzawa, H. Tsuchiya, T. Tsujimura, K. Tsumori, S. Usami, J. L. Velasco, H. Wang, T. -H. Watanabe, T. Watanabe, J. Yagi, M. Yajima, H. Yamada, I. Yamada, O. Yamagishi, N. Yamaguchi, Y. Yamamoto, N. Yanagi, R. Yasuhara, E. Yatsuka, N. Yoshida, M. Yoshinuma, S. Yoshimura, Y. Yoshimura

    NUCLEAR FUSION   57 ( 10 )   2017.10

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    DOI: 10.1088/1741-4326/aa7fc2

  • Impact of an ionic liquid on protein thermodynamics in the presence of cold atmospheric plasma and gamma rays

    Pankaj Attri, Minsup Kim, Eun Ha Choi, Art E. Cho, Kazunori Koga, Masaharu Shiratani

    PHYSICAL CHEMISTRY CHEMICAL PHYSICS   19 ( 37 )   25277 - 25288   2017.10

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    DOI: 10.1039/c7cp04083k

  • Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst

    Hyunwoong Seo, Chandu V. V. M. Gopi, Hee-Je Kim, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    ELECTROCHIMICA ACTA   249   337 - 342   2017.9

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    DOI: 10.1016/j.electacta.2017.08.030

  • The protective action of osmolytes on the deleterious effects of gamma rays and atmospheric pressure plasma on protein conformational changes

    Pankaj Attri, Minsup Kim, Thapanut Sarinont, Eun Ha Choi, Hyunwoong Seo, Art E. Cho, Kazunori Koga, Masaharu Shiratani

    SCIENTIFIC REPORTS   7   2017.8

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    DOI: 10.1038/s41598-017-08643-1

  • 低温プラズマによるナノ粒子の合成と太陽電池への応用 (有機エレクトロニクス)

    古閑 一憲, 徐 鉉雄, 板垣 奈穂, 白谷 正治

    電子情報通信学会技術研究報告 = IEICE technical report : 信学技報   117 ( 8 )   5 - 8   2017.4

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  • Densities and Surface Reaction Probabilities of Oxygen and Nitrogen Atoms During Sputter Deposition of ZnInON on ZnO

    Koichi Matsushima, Tomoaki Ide, Keigo Takeda, Masaru Hori, Daisuke Yamashita, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    IEEE TRANSACTIONS ON PLASMA SCIENCE   45 ( 2 )   323 - 327   2017.3

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    DOI: 10.1109/TPS.2016.2632124

  • Influence of plasma irradiation on silkworm

    Akira Yonesu, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi

    Plasma Medicine   7   313 - 320   2017.1

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    Influence of plasma irradiation on silkworm
    © 2017 by Begell House, Inc. Silkworms have recently been proposed as an animal model for safety testing in basic research. We propose using silkworms for in vivo trials of direct plasma treatment. In this study, the influence of plasma irradiation on silkworms was investigated using a non-thermal atmospheric pressure plasma. Silkworm survival rate decreased with increasing low-frequency voltage and plasma irradiation period. Further investigation of the plasma-generated agents (oxygen related radicals, UV light, and charged particles), revealed that the contribution of charged particles significantly increases silkworm mortality.

  • ホッとひといき プラズマのほどよい刺激で植物がスクスク育つ

    古閑 一憲

    応用物理   86 ( 1 )   55 - 58   2017.1

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  • Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water

    Giichiro Uchida, Atsushi Nakajima, Taiki Ito, Kosuke Takenaka, Toshiyuki Kawasaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

    JOURNAL OF APPLIED PHYSICS   120 ( 20 )   2016.11

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    DOI: 10.1063/1.4968568

  • Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method

    Susumu Toko, Yoshinori Kanemitsu, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY   16 ( 10 )   10753 - 10757   2016.10

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    DOI: 10.1166/jnn.2016.13233

  • Effects of plasma irradiation using various feeding gases on growth of Raphanus sativus L.

    Thapanut Sarinont, Takaaki Amano, Pankaj Attri, Kazunori Koga, Nobuya Hayashi, Masaharu Shiratani

    ARCHIVES OF BIOCHEMISTRY AND BIOPHYSICS   605   129 - 140   2016.9

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    DOI: 10.1016/j.abb.2016.03.024

  • Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells

    Hyunwoong Seo, Min-Kyu Son, Shinji Hashimoto, Toshiyuki Takasaki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    ELECTROCHIMICA ACTA   210   880 - 887   2016.8

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    DOI: 10.1016/j.electacta.2016.06.020

  • Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells

    Hyunwoong Seo, Sang-Hun Nam, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Jin-Hyo Boo

    ELECTRONIC MATERIALS LETTERS   12 ( 4 )   530 - 536   2016.7

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    DOI: 10.1007/s13391-016-4018-8

  • Two-dimensional concentration distribution of reactive oxygen species transported through a tissue phantom by atmospheric-pressure plasma-jet irradiation

    Toshiyuki Kawasaki, Akihiro Sato, Shota Kusumegi, Akihiro Kudo, Tomohiro Sakanoshita, Takuya Tsurumaru, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani

    APPLIED PHYSICS EXPRESS   9 ( 7 )   2016.7

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    DOI: 10.7567/APEX.9.076202

  • Correlation between SiH2/SiH and light-induced degradation of p-i-n hydrogenated amorphous silicon solar cells Reviewed

    Kimitaka Keya, Takashi Kojima, Yoshihiro Torigoe, Susumu Toko, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   55 ( 7 )   2016.7

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    DOI: 10.7567/JJAP.55.07LE03

  • Correlation between SiH

    Keya Kimitaka, Kojima Takashi, Torigoe Yoshihiro, Toko Susumu, Yamashita Daisuke, Seo Hyunwoong, Itagaki Naho, Koga Kazunori, Shiratani Masaharu

    Jpn. J. Appl. Phys.   55 ( 7 )   07LE03   2016.6

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    Correlation between SiH
    We have measured the hydrogen content ratio I<inf>SiH2</inf>/I<inf>SiH</inf>associated with Si–H<inf>2</inf>and Si–H bonds in p–i–n (PIN) a-Si:H solar cells by Raman spectroscopy. With decreasing I<inf>SiH2</inf>/I<inf>SiH</inf>, the efficiency, short-circuit current density, open-circuit voltage, and fill factor of PIN a-Si:H solar cells after light soaking tend to increase. Namely, I<inf>SiH2</inf>/I<inf>SiH</inf>correlates well with light-induced degradation of the cells. While a single I-layer has a low I<inf>SiH2</inf>/I<inf>SiH</inf>of 0.03–0.09, a PIN cell has I<inf>SiH2</inf>/I<inf>SiH</inf>= 0.18 because many Si–H<inf>2</inf>bonds exist in the P-layer and at the P/I interface of the PIN solar cells. To realize PIN solar cells with higher stability, we must suppress Si–H<inf>2</inf>bond formation in the P-layer and at the P/I interface.

    DOI: 10.7567/JJAP.55.07LE03

  • Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2

    Hyunwoong Seo, Daiki Ichida, Shinji Hashimoto, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Sang-Hun Nam, Jin-Hyo Boo

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY   16 ( 5 )   4875 - 4879   2016.5

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    DOI: 10.1166/jnn.2016.12210

  • Effects of irradiation distance on supply of reactive oxygen species to the bottom of a Petri dish filled with liquid by an atmospheric O-2/He plasma jet

    Toshiyuki Kawasaki, Shota Kusumegi, Akihiro Kudo, Tomohiro Sakanoshita, Takuya Tsurumaru, Akihiro Sato, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani

    JOURNAL OF APPLIED PHYSICS   119 ( 17 )   2016.5

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    DOI: 10.1063/1.4948430

  • Polymer counter electrode of poly(3,4-ethylenedioxythiophene):Poly(4-styrenesulfonate) containing TiO2 nano-particles for dye-sensitized solar cells

    Hyunwoong Seo, Min-Kyu Son, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JOURNAL OF POWER SOURCES   307   25 - 30   2016.3

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    DOI: 10.1016/j.jpowsour.2015.12.112

  • Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition

    Hyunwoong Seo, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    SCIENCE OF ADVANCED MATERIALS   8 ( 3 )   636 - 639   2016.3

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    DOI: 10.1166/sam.2016.2520

  • Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.)

    Kazunori Koga, Sarinont Thapanut, Takaaki Amano, Hyunwoong Seo, Naho Itagaki, Nobuya Hayashi, Masaharu Shiratani

    APPLIED PHYSICS EXPRESS   9 ( 1 )   2016.1

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    DOI: 10.7567/APEX.9.016201

  • Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method

    Xiao Dong, Kazunori Koga, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   55 ( 1 )   2016.1

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    DOI: 10.7567/JJAP.55.01AA11

  • Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si:H films

    Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   55 ( 1 )   2016.1

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    DOI: 10.7567/JJAP.55.01AA19

  • Influence of ionic liquid and ionic salt on protein against the reactive species generated using dielectric barrier discharge plasma

    Pankaj Attri, Thapanut Sarinont, Minsup Kim, Takaaki Amano, Kazunori Koga, Art E. Cho, Eun Ha Choi, Masaharu Shiratani

    SCIENTIFIC REPORTS   5   2015.12

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    DOI: 10.1038/srep17781

  • Gas Flow Rate Dependence of the Discharge Characteristics of a Plasma Jet Impinging Onto the Liquid Surface

    Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara

    IEEE TRANSACTIONS ON PLASMA SCIENCE   43 ( 12 )   4081 - 4087   2015.12

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    DOI: 10.1109/TPS.2015.2488619

  • Synthesis of Indium-Containing Nanoparticles in Aqueous Suspension Using Plasmas in Water for Evaluating Their Kinetics in Living Body

    Takaaki Amano, Thapanut Sarinont, Kazunori Koga, Miyuki Hirata, Akiyo Tanaka, Masaharu Shiratani

    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY   15 ( 11 )   9298 - 9302   2015.11

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    DOI: 10.1166/jnn.2015.11427

  • Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode

    Hyunwoong Seo, Shinji Hashimoto, Daiki Ichida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    ELECTROCHIMICA ACTA   179   206 - 210   2015.10

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    DOI: 10.1016/j.electacta.2015.04.105

  • Attraction during binary collision of fine particles in Ar plasma Reviewed

    M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP609   GT1.018   2015.9

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    Attraction during binary collision of fine particles in Ar plasma
    Forces exerted on fine particles in plasmas play central roles in their transport, agglomeration, as well as Coulomb crystals and liquids. The forces are complicated because of charge fluctuation of fine particles, charge screening in plasma, anisotropy of plasma flow, and so on. Various formulas of such forces have been theoretically predicted but many of them have not been supported by experimental results yet. Here we carried out experiments on binary collision of fine particles using Ar rf-discharge plasmas. PMMA fine particles of 10 μm diameter were injected into the plasma and they were levitated around the plasma sheath boundary. The number of fine particles levitated was so small that we can observe non-collective pair interaction. We observed binary collisions of fine particles with a high speed and high resolution camera. We found that repulsion of two fine particles takes place in short distances, whereas attraction takes place in middle distances. These results indicate that inter-molecular like potential exists between them. The attraction corresponds to non-collective fine-particle attraction due to shadow effects.

  • Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas Reviewed

    S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP609   GT1.152   2015.9

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    Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas
    Light-induced degradation is the most important issue for hydrogenated amorphous silicon (a-Si:H) solar cells. Our previous results have suggested that incorporation of clusters into films is responsible for the light-induced degradation. Therefore, it is important to control the incorporation of clusters. Recently, we have developed multi-hollow discharge plasma CVD method, by which clusters are driven toward the downstream region and high quality a-Si:H films can be deposited in the upstream region. Here, we report effects of H2 dilution on cluster incorporation. Cluster size was measured by TEM, and the incorporation amount of clusters was measured with quartz crystal microbalances. H2 dilution leads to smaller clusters and the cluster incorporation in the upstream region increases with H2 dilution because the diffusion velocity of such small clusters much surpasses gas flow velocity.

  • Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas Reviewed

    T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki

    Proc. 68th GEC/9th ICRP/33rd SPP609   GT1.049   2015.9

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    Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas
    Interactions between plasmas and nano-interface are one of the most important issues in plasma processing. We have studied effects of plasma perturbation on growth of nanoparticles in amplitude modulated reactive dusty plasmas and have clarified that amplitude modulation (AM) leads to suppression of growth of nanoparticles [1]. Here we report results of cross correlation analysis of time evolution of laser light scattering intensity from nanoparticles in reactive plasmas. Experiments were carried out using a capacitively-coupled rf discharge reactor with a two-dimensional laser light scattering (LLS) system. We employed Ar +DM-DMOS discharge plasmas to generate nanoparticles. The peaks at higher harmonics and subharmonics in spectra of laser light scattering intensity were detected, suggesting nonlinear coupling between plasma and nanoparticle amount. We found high cross correlation t between waves at AM frequency and its higher harmonics. Namely, perturbation at fAM closely correlates with those at higher harmonics.

  • Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter Reviewed

    R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group

    Proc. 68th GEC/9th ICRP/33rd SPP609   LW1.101   2015.9

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    Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter
    We have developed an in-situ method for measuring deposition rate of radicals and dust particles using quartz crystal microbalances (QCMs) together with a dust eliminating filter. The QCMs have three channels of quartz crystals. Channel 1 was used to measure total deposition rate due to radicals and dust particles. Channel 2 was covered with a dust eliminating filter. Channel 3 was covered with a stainless-steel plate. Moreover, all QCMs are covered with a grounded stainless steel mesh for suppressing influx of charged particles. The measurements were conducted in the Large Helical Device in the National Institute for Fusion Science, Japan. Although the deposition measurements during the discharges were difficult, we obtained deposition rate and etching rate by comparing the data before and after each discharge. The frequency difference for channel 1 changes from 0.1 Hz (etching) to -0.5 Hz (deposition), while those for channels 2 and 3 are within a range of +/-0.1 Hz and +/-0.05 Hz, respectively. The QCM method gives information on deposition rate and etching rate due to neutral radicals and dust particles.

  • Effects of electrode structure on characteristics of multi-hollow discharges Reviewed

    Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP609   LW1.129   2015.9

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    Effects of electrode structure on characteristics of multi-hollow discharges
    Silane plasmas are widely employed for hydrogenated amorphous silicon (a-Si:H) film deposition. Amorphous silicon nanoparticles below 10 nm in size (clusters) are formed in silane plasmas and some of them are incorporated into a-Si:H films, leading to the light induced degradation which is the most important issue for a-Si:H solar cells. To suppress cluster incorporation, a multi-hollow discharge plasma CVD method has been developed and succeeded in depositing highly stable a-Si:H films. For further improvement of the film qualities, we have employed a thicker grounded electrode to suppress plasma expansion toward the deposition region. From optical images of the discharge plasmas, the expansion was significantly suppressed using 10 mm thick grounded electrode. For the 10 mm thick electrode, optical emission intensity ratio of Si* (288 nm) and SiH* (414 nm) ISi*/ISiH*, which shows a ratio of cluster generation ratio and radical ones, was 20&#37; of that for 1mm thick electrode. These results suggest that the generation of clusters was also suppressed using the 10 mm thick grounded electrode.

  • Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering Reviewed

    S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP609   LW1.133   2015.9

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    Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering
    Multiple exciton generation (MEG) in QDs is expected to enhance significantly the energy conversion efficiency of solar cells. Although there are several reports on MEG characteristics from various QD materials such as PbS, CdSe, CdS ZnS, and Ag2S, such materials have disadvantages of their toxicity and limited resources. Here we have developed quantum-dots (QDs) solar cells using Ge nanoparticles fabricated by rf sputtering method under high pressure. We fabricated Ge nanoparticles by rf sputtering at a pressure of 1.5 Torr. Since the mean free path of Ge atoms is an order of micrometer, and Ge nanoparticles are formed in gas phase. We fabricated Ge nanoparticles using Ar and N2 to terminate surface defects by N. Ge and Ar emission intensities decrease significantly with increasing N2 partial pressure. The electron density was measured with a plasma absorption probe. The electron density decreases with increasing N2 partial pressure.

  • Laser trapped single fine particle as a probe of plasma parameters” Reviewed

    LW1.104   2015.9

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    Here we report evaluation of electron density and temperature using optically trapped single fine particle. Experiments were carried out with a radio frequency low pressure plasma reactor, where we set two quartz windows as top and bottom flanges to irradiate an infrared laser light of 1064 nm wavelength from the bottom side. Ar plasmas were generated between a powered ring-electrode set at the bottom of the reactor and a grounded mesh placed at the center of the reactor at 100 Pa by applying 13.56 MHz voltage. The particles injected into the plasmas were monodisperse methyl methacrylate-polymer spheres of 10 μm in diameter. A negatively charged particle, which is suspended plasma sheath boundary, was trapped at the focal point of the irradiated laser light due to the transfer of momentum from the scattering of incident photons. At the beginning of the trapping, particle of 10 μm in size was trapped above 505 μm from the bottom window. After 230 min, the size and position were 9.56 μm and 520 μm, respectively. From the results, the electron density and temperature are deduced to be 1.7×109 cm-3 and 1.9 eV.

  • Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells Reviewed

    K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP609   LW1.132   2015.9

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    Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells
    Light-induced degradation of hydrogenated amorphous silicon (a-Si:H) is a key issue for enhancing competitiveness in solar cell market. A-Si:H films with a lower density of Si-H2 bonds shows higher stability. Here we identified Si-H2 bonds in PIN a-Si:H solar cells fabricated by plasma CVD using Raman spectroscopy. A-Si:H solar cell has a structure of B-doped μc-SiC:H (12.5 nm)/ non-doped a-Si:H (250nm)/ P-doped μc-Si:H (40 nm) on glass substrates (Asahi-VU). By irradiating HeNe laser light from N-layer, peaks correspond to Si-H2 bonds (2100 cm-1) and Si-H bonds (2000 cm-1) have been identified in Raman scattering spectra. The intensity ratio of Si-H2 and Si-H ISiH2/ISiH is found to correlate well to light induced degradation of the cells Therefore, Raman spectroscopy is a promising method for studying origin of light-induced degradation of PIN solar cells.

  • Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water Reviewed

    K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP609   LW1.143   2015.9

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    Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water
    Atmospheric discharge plasmas are promising for agricultural productivity improvements and novel medical therapies, because plasma provides high flux of short-lifetime reactive species at low temperature, leading to low damage to living body. For the plasma-bio applications, various kinds of plasma systems are employed, thus common evaluation methods are needed to compare plasma irradiation dose quantitatively among the systems. Here we offer simple evaluation method of plasma irradiation dose using pH of water. Experiments were carried out with a scalable DBD device. 300 μl of deionized water was prepared into the quartz 96 microwell plate at 3 mm below electrode. The pH value has been measured just after 10 minutes irradiation. The pH value was evaluated as a function of plasma irradiation dose. Atmospheric air plasma irradiation decreases pH of water with increasing the dose. We also measured concentrations of chemical species such as nitrites, nitrates and H2O2. The results indicate our method is promising to evaluate plasma irradiation dose quantitatively.

  • Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition Reviewed

    S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 68th GEC/9th ICRP/33rd SPP609   GT1.149   2015.9

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    Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition
    We are developing Au-induced crystalline Ge film formation using sputtering deposition. For the method, very thin Au films were deposited on SiO2 substrates and then Ge atoms were irradiated to the Au films by sputtering. We found two kinds of Ge film growth: one is Ge film formation on Au films, and the other is Ge film formed between Au films and SiO2. The latter film formation, however, takes place in a narrow temperature range around 140°C. Here we report two kinds of substrate temperature dependence of Ge film formation: one is annealing temperature of Au films, and the other is the substrate temperature dependence during Ge sputtering. 30nm-thick Au films were deposited quartz glass as a catalyst at room temperature by sputtering. Then the Au films were annealed in a temperature range from room temperature to 190 °C in a vacuum. Au grain grows and crystal orientation shows better alignment as the annealing temperature rises. We found that the smaller grain size with random orientation is better for Ge film formed between Au films and SiO2.

  • Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body Reviewed

    T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka

    Proc. 68th GEC/9th ICRP/33rd SPP609   LW1.158   2015.9

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    Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body
    Nanoparticles can be employed for biomedical applications such as biomarkers, drug delivery systems, and cancer therapies. They are, however, pointed out their adverse effects on human body. Here, we synthesed indium-containing nanoparticles using discharge plasmas with indium electrodes immersed in DI water and administrated nanoparticles to rats to analyze their kinetics in living body. The discharge power was 5.1 W. The electron density is 5x1017/cm3 deduced from Stark broadening of hydrogen lines. TEM observation shows the mean size of primary nanoparticles is 7 nm. The nanoparticles are indium crystalline and indium hydroxide crystalline. The synthesized nanoparticles and purchased nanoparticles (In2O3, <100nm) were administrated to rats using subcutaneous injection. Indium of 166.7 g/day (synthesized) and of 27.8 g/day (purchased) are detected from the urine at 12 weeks after the administration. Synthesized nanoparticles dispersed in water are useful for analyzing kinetics of nanoparticles in living body. Work partly supported by KAKENHI.

  • Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances

    Mizuki Tateishi, Kazunori Koga, Ryu Katayama, Daisuke Yamashita, Kunihiro Kamataki, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara

    JOURNAL OF NUCLEAR MATERIALS   463   865 - 868   2015.8

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    DOI: 10.1016/j.jnucmat.2014.10.049

  • Fabrication of ZnInON/ZnO multi-quantum well solar cells

    Koichi Matsushima, Ryota Shimizu, Tomoaki Ide, Daisuke Yamashita, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    THIN SOLID FILMS   587   106 - 111   2015.7

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    DOI: 10.1016/j.tsf.2015.01.012

  • Effects of gas flow on oxidation reaction in liquid induced by He/O-2 plasma-jet irradiation

    Atsushi Nakajima, Giichiro Uchida, Toshiyuki Kawasaki, Kazunori Koga, Thapanut Sarinont, Takaaki Amano, Kosuke Takenaka, Masaharu Shiratani, Yuichi Setsuhara

    JOURNAL OF APPLIED PHYSICS   118 ( 4 )   2015.7

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    DOI: 10.1063/1.4927217

  • Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability

    Susumu Toko, Yoshihiro Torigoe, Weiting Chen, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    THIN SOLID FILMS   587   126 - 131   2015.7

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    DOI: 10.1016/j.tsf.2015.02.052

  • Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method Reviewed

    X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

    Trans. Mater. Res. Soc. Jpn.   40 ( 2 )   123-128 - 128   2015.7

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    Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method
    Hydrogen bonding configurations and hydrogen content of a-C:H films deposited by H-assisted plasma CVD were investigated by Fourier transform infrared spectroscopy. Plasma parameters related to deposition rate were derived using optical emission spectroscopy. The a-C:H films contain a large number of sp3 configurations (93&#37;) and a few sp2 configurations (7&#37;). Most of the hydrogen is bonded in methyl groups which shows the structure of deposited a-C:H films is polymer-like carbon. The mass density has nearly linear decreases with increasing the hydrogen atom density, indicating that control of hydrogen content is crucial to obtain a-C:H films of high mass density. A slight increase in radical generation rate and significant increases in etching rate by hydrogen atoms lead to decrease the deposition rate when the discharge voltage increases from 170 V to 180 V.

    DOI: 10.14723/tmrsj.40.123

  • Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD Reviewed

    X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, M. Hori

    Jpn. Phys. Soc. Conf. Proc (APPC12)   1   015072   2015.3

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    Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD

    DOI: 10.7566/JPSCP.1.015072

  • Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells

    Hyunwoong Seo, Daiki Ichida, Shinji Hashimoto, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 ( 1 )   2015.1

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    DOI: 10.7567/JJAP.54.01AD02

  • Dust Hour Glass in a Capacitive RF Discharge

    Shinya Iwashita, Edmund Schuengel, Julian Schulze, Peter Hartmann, Zoltan Donko, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Uwe Czarnetzki

    IEEE TRANSACTIONS ON PLASMA SCIENCE   42 ( 10 )   2672 - 2673   2014.10

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    DOI: 10.1109/TPS.2014.2343975

  • Visualization of the Distribution of Oxidizing Substances in an Atmospheric Pressure Plasma Jet

    Toshiyuki Kawasaki, Kota Kawano, Hiroshi Mizoguchi, Yuto Yano, Keisuke Yamashita, Miho Sakai, Takako Shimizu, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani

    IEEE TRANSACTIONS ON PLASMA SCIENCE   42 ( 10 )   2482 - 2483   2014.10

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    DOI: 10.1109/TPS.2014.2325038

  • Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap

    N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani

    MATERIALS RESEARCH EXPRESS   1 ( 3 )   2014.9

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    DOI: 10.1088/2053-1591/1/3/036405

  • Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method Reviewed

    Naho Itagaki, Kazunari Kuwahara, Koichi Matsushima, Daisuke Yamashita, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

    OPTICAL ENGINEERING   53 ( 8 )   87109   2014.8

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    DOI: 10.1117/1.OE.53.8.087109

  • Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas

    Satoshi Kitazaki, Thapanut Sarinont, Kazunori Koga, Nobuya Hayashi, Masaharu Shiratani

    CURRENT APPLIED PHYSICS   14   S149 - S153   2014.7

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    DOI: 10.1016/j.cap.2013.11.056

  • Performance dependence of Si quantum dot-sensitized solar cells on counter electrode

    Hyunwoong Seo, Daiki Ichida, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 5 )   2014.5

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    DOI: 10.7567/JJAP.53.05FZ01

  • Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell

    Hyunwoong Seo, Min-Kyu Son, Songyi Park, Myeongsoo Jeong, Hee-Je Kim, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    THIN SOLID FILMS   554   122 - 126   2014.3

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    DOI: 10.1016/j.tsf.2013.08.103

  • Analysis on the Photovoltaic Property of Si Quantum Dot-Sensitized Solar Cells

    Hyunwoong Seo, Daiki Ichida, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING   15 ( 2 )   339 - 343   2014.2

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    DOI: 10.1007/s12541-014-0343-8

  • Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier Reviewed

    H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Trans. Mater. Res. Soc. Jpn.   39 ( 3 )   321 - 324   2014.1

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    Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier
    Dye and quantum dot (QD) are representative sensitizers of the photochemical solar cells. Dye has the highest efficiency in the whole sensitizers. QDs have relatively low performance but their multiple exciton generation enhanced theoretical efficiency from 33 to 44&#37; and expected to achieve high efficiency. This work tried to enhance the photovoltaic performance with the co-sensitization of N719 dye and Si QD. The performance of dye and QD co-sensitized solar cell was not much enhanced because of electron loss of charge recombination. Therefore, TiO2 barrier layer was introduced on TiO2 and Si QD. It blocked the charge recombination with redox electrolyte. It also helped better electron injection from excited dye to TiO2 with strengthened dye adsorption. Consequently, the performance of co-sensitized solar cell was enhanced with reduced charge recombination and increased dye adsorption.

    DOI: 10.14723/tmrsj.39.321

  • Nanostructure control of Si and Ge quantum dots based solar cells using plasma processes

    Masaharu Shiratani, Giichiro Uchida, Hyun Woong Seo, Daiki Ichida, Kazunori Koga, Naho Itagaki, Kunihiro Kamataki

    Materials Science Forum   783-786   2022 - 2027   2014.1

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    Nanostructure control of Si and Ge quantum dots based solar cells using plasma processes
    We report characteristics of quantum dot (QD) sensitized solar cells using Si nanoparticles and Ge nanoparticles. Si nanoparticles were synthesized by multi-hollow discharge plasma chemical vapor deposition, whereas Ge nanoparticles were done by a radio frequency magnetron sputtering using Ar+H2 under high pressure conditions. The electrical power generation from Si QDs and Ge QDs was confirmed. Si QD sensitized solar cells show an efficiency of 0.024&#37;, fill factor of 0.32, short-circuit current of 0.75 mA/cm2 and open-circuit voltage of 0.10 V, while Ge QD sensitized solar cells show an efficiency of 0.036&#37;, fill factor of 0.38, short-circuit current of 0.64 mA/cm2 and open-circuit voltage of 0.15 V. © (2014) Trans Tech Publications, Switzerland.

    DOI: 10.4028/www.scientific.net/MSF.783-786.2022

  • スパッタリング成膜法による高品質酸化亜鉛薄膜の形成 Invited Reviewed

    板垣奈穂, 古閑一憲, 白谷正治

    応用物理   83   385 - 389   2014.1

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    スパッタリング成膜法を用いた酸化亜鉛(ZnO)薄膜の結晶成長において,初期核形成を制御する新しい方法「不純物添加結晶化(Impurity Mediated Crystallization: IMC)法」を開発した.本手法により,高格子不整合基板上への原子レベルで平坦なZnO単結晶膜の作製や,ガラス基板上への極薄低抵抗ZnO導電膜の形成が可能となった.本稿では,IMC法について紹介するとともに,これら成果の概要を述べる.

  • Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization Reviewed

    I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki

    JPS Conf. Proc   1   15064   2014.1

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    Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization
    Effects of nitrogen addition to the sputtering atmosphere on crystal growth of ZnO films have been studied. The AFM characterization shows that the nitrogen suppresses the nucleation in the early stage of the crystal growth leading to a non-continue film structure with sparsely distributed grains. As the deposition time increases, the physical properties of the ZnO films are modified by enhancement of adatoms migration at the growing surface, thus homogenous and dense films with larger grain size are obtained. Utilizing these ZnO films as buffer layers with film thickness greater than 4?nm, the electrical resistivity of ZnO:Al films have been significantly decreased from 7.8 × 10?3?Ω?cm to 6.7 × 10?4?Ω?cm.

    DOI: 10.7566/JPSCP.1.015064

  • Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas

    Masaharu Shiratani, Kazunori Koga, Kunihiro Kamataki, Shinya Iwashita, Giichiro Uchida, Hyunwoong Seo, Naho Itagaki

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 1 )   2014.1

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    DOI: 10.7567/JJAP.53.010201

  • A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas Reviewed

    M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida

    Proc. 8th Int. Conf. Reactive Plasmas   4B-PM-O1   2014.1

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    A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas

  • Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation Reviewed

    Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   5P-AM-S02-P1   2014.1

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    Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation

  • Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method Reviewed

    Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   6P-AM-S08-P35   2014.1

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    Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method

  • Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation Reviewed

    K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   3B-WS-14   2014.1

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    Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation

  • Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering Reviewed

    S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   6P-AM-S08-P32   2014.1

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    Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering

  • Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method Reviewed

    Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   6P-AM-S08-P36   2014.1

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    Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method

  • Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization Reviewed

    T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    Proc. 8th Int. Conf. Reactive Plasmas   4P-PM-S08-P10   2014.1

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    Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization

  • Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering Reviewed

    K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

    Proc. 8th Int. Conf. Reactive Plasmas   5P-PM-S08-P02   2014.1

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    Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering

  • Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries Reviewed

    G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   4C-PM-O1   2014.1

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    Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries

  • Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method Reviewed

    D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   6P-AM-S08-P33   2014.1

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    Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method

  • Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation Reviewed

    S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   5P-AM-S05-P17   2014.1

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    Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation

  • Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization Reviewed

    K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki

    Proc. 8th Int. Conf. Reactive Plasmas   5P-PM-S08-P07   2014.1

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    Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization

  • Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method Reviewed

    T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   5P-AM-SPD-P01   2014.1

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    Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method

  • Raman spectroscopy of a fine particle optically trapped in plasma”, Proc. 8th Int. Conf. Reactive Plasmas Reviewed

    5P-AM-S05-P23   2014.1

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  • Spatial profile of flux of dust particles in hydrogen helicon plasmas”, Proc. 8th Int. Conf. Reactive Plasmas Reviewed

    5P-AM-S05-P21   2014.1

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  • Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization Reviewed

    T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    Proc. 8th Int. Conf. Reactive Plasmas   5P-AM-S05-P19   2014.1

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    Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization

  • Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device Reviewed

    R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    Proc. 8th Int. Conf. Reactive Plasmas   5P-PM-S08-P03   2014.1

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    Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device

  • Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide Reviewed

    I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

    Proc. 8th Int. Conf. Reactive Plasmas   5P-PM-S08-P05   2014.1

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    Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide

  • Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats Reviewed

    A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida

    Proc. 8th Int. Conf. Reactive Plasmas   5P-AM-S2-P35   2014.1

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    Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats

  • Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter Reviewed

    Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. 8th Int. Conf. Reactive Plasmas   6P-AM-S08-P37   2014.1

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    Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter

  • Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control Reviewed

    G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    JPS Conf. Proc   1   15080   2014.1

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    Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control
    Crystalline Si nanoparticles were successfully fabricated by a multi-hollow discharge plasma CVD method. Optical band gap of Si-nanoparticle composite films was controlled in a range of 1.6?1.9?eV by the volume fraction of Si nanoparticles in the films. SiN nanoparticle composite films were also successfully produced using a double multi-hollow discharge plasma CVD method in SiH4/H2 and N2 gas mixture. High optical band gap of 2.1?2.2?eV was achieved by adding N atoms to the Si naoparticles.

    DOI: 10.7566/JPSCP.1.015080

  • Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas Reviewed

    M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga

    JPS Conf. Proc   1   15083   2014.1

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    Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas
    We report experimental results on correlation between plasma parameters and growth of nanoparticles in capacitively-coupled VHF discharges with amplitude modulation (AM) obtained using two dimensional laser light scattering (LLS) method. Power spectra of floating potential, Ar 810.27?nm emission intensity, and LLS intensity have peaks at the modulation frequency of 100?Hz and its second harmonics, indicating linear correlation between plasma parameters and growth of nanoparticles, that is, their size and/or density. The power spectrum of LLS intensity has another peak at 60?Hz, which coincides with our theoretical prediction of plasma fluctuation induceed nonlinear response of nanoparticle growth.

    DOI: 10.7566/JPSCP.1.015083

  • Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD Reviewed

    S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    JPS Conf. Proc   1   15069   2014.1

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    Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD
    Si clusters formed in silane discharge plasmas are mainly responsible for light induced degradation of hydrogenated amorphous Si (a-Si:H) thin films deposited by the plasmas. Here we have investigated effects of grid DC bias on incorporation amount of Si clusters into a-Si:H films in multi-hollow discharge plasma CVD reactor using quartz crystal microbalances, by which volume fraction of Si clusters in deposited films is quantitatively measured. When the grid potential is lower than plasma potential, the negatively charged clusters are repelled away from the grid by electrostatic force, resulting in lower volume fraction.

    DOI: 10.7566/JPSCP.1.015069

  • Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method Reviewed

    G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    JPS Conf. Proc   1   15082   2014.1

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    Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method
    We have deposited crystalline Ge nanoparticle films using a radio frequency magnetron sputtering method in argon and hydrogen gas mixture under a high pressure condition. Raman spectra and X-ray diffraction pattern of Ge nanoparticle films show a transition from amorphous to crystalline by adding H2 gas.

    DOI: 10.7566/JPSCP.1.015082

  • Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target Reviewed

    M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group

    JPS Conf. Proc   1   15020   2014.1

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    Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target
    We have measured spatial profile of flux of dust particles generated due to interaction between H2 plasmas and graphite target in a divertor simulator to study transport mechanism of dust particles. Dust particles were collected on c-Si substrates and observed with a scanning electron microscope. We have found nanostructure of 10?nm in size on the substrate surface. Dust fluxes of both spherical dust particles and flakes are maximum at a position between 80 and 140?mm from the center of the plasma column. The spatial profile of dust flux is determined by the balance between deposition of nanoparticles and their etching by H atoms.

    DOI: 10.7566/JPSCP.1.015020

  • The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si

    Hyunwoong Seo, Yuting Wang, Muneharu Sato, Giichiro Uchida, Kazunori Koga, Naho Itagaki, Kunihiro Kamataki, Masaharu Shiratani

    THIN SOLID FILMS   546   284 - 288   2013.11

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    DOI: 10.1016/j.tsf.2013.04.073

  • Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells

    Giichiro Uchida, Yuting Wang, Daiki Ichida, Hyunwoong Seo, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 11 )   2013.11

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    DOI: 10.7567/JJAP.52.11NA05

  • Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si* and SiH*

    Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 11 )   2013.11

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    DOI: 10.7567/JJAP.52.11NA07

  • Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide

    Iping Suhariadi, Kouichiro Oshikawa, Kazunari Kuwahara, Kouichi Matsushima, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 11 )   2013.11

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    DOI: 10.7567/JJAP.52.11NB03

  • Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 to 3.3 eV on ZnO Templates

    Koichi Matsushima, Tadafumi Hirose, Kazunari Kuwahara, Daisuke Yamashita, Giichiro Uchida, Hyunwoong Seo, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Naho Itagaki

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 11 )   2013.11

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    DOI: 10.7567/JJAP.52.11NM06

  • Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates

    Kazunori Koga, Mizuki Tateishi, Katsushi Nishiyama, Giichiro Uchida, Kunihiro Kamataki, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 11 )   2013.11

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    DOI: 10.7567/JJAP.52.11NA08

  • Improvement on the electron transfer of dye-sensitized solar cell using vanadium doped TiO2

    Hyunwoong Seo, Yuting Wang, Daiki Ichida, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Sang-Hun Nam, Jin-Hyo Boo

    Japanese Journal of Applied Physics   52 ( 11 )   2013.11

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    DOI: 10.7567/JJAP.52.11NM02

  • Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells

    Hyunwoong Seo, Min-Kyu Son, Hee-Je Kim, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 10 )   2013.10

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    DOI: 10.7567/JJAP.52.10MB07

  • Extension of operation regimes and investigation of three-dimensional currentless plasmas in the Large Helical Device

    O. Kaneko, H. Yamada, S. Inagaki, M. Jakubowski, S. Kajita, S. Kitajima, Kobayashi, K. Koga, T. Morisaki, S. Morita, T. Mutoh, S. Sakakibara, Y. Suzuki, H. Takahashi, K. Tanaka, K. Toi, Y. Yoshimura, T. Akiyama, Y. Asahi, N. Ashikawa, H. Chikaraishi, A. Cooper, D. S. Darrow, E. Drapiko, P. Drewelow, X. Du, A. Ejiri, M. Emoto, T. Evans, N. Ezumi, K. Fujii, T. Fukuda, H. Funaba, M. Furukawa, D. A. Gates, M. Goto, T. Goto, W. Guttenfelder, S. Hamaguchi, M. Hasuo, T. Hino, Y. Hirooka, K. Ichiguchi, K. Ida, H. Idei, T. Ido, H. Igami, K. Ikeda, S. Imagawa, T. Imai, M. Isobe, M. Itagaki, T. Ito, K. Itoh, S. Itoh, A. Iwamoto, K. Kamiya, T. Kariya, H. Kasahara, N. Kasuya, D. Kato, T. Kato, K. Kawahata, F. Koike, S. Kubo, R. Kumazawa, D. Kuwahara, S. Lazerson, H. Lee, S. Masuzaki, S. Matsuoka, H. Matsuura, A. Matsuyama, C. Michael, D. Mikkelsen, O. Mitarai, T. Mito, J. Miyazawa, G. Motojima, K. Mukai, A. Murakami, I. Murakami, S. Murakami, T. Muroga, S. Muto, K. Nagaoka, K. Nagasaki, Y. Nagayama, N. Nakajima, H. Nakamura, Y. Nakamura, H. Nakanishi, H. Nakano, T. Nakano, K. Narihara, Y. Narushima, K. Nishimura, S. Nishimura, M. Nishiura, Y. M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, N. Ohno, N. Ohyabu, T. Oishi, M. Okamoto, A. Okamoto, M. Osakabe, Y. Oya, T. Ozaki, N. Pablant, B. J. Peterson, A. Sagara, K. Saito, R. Sakamoto, H. Sakaue, M. Sasao, K. Sato, M. Sato, K. Sawada, R. Seki, T. Seki, V. Sergeev, S. Sharapov, I. Sharov, A. Shimizu, T. Shimozuma, M. Shiratani, M. Shoji, S. Sudo, H. Sugama, C. Suzuki, K. Takahata, Y. Takeiri, Y. Takemura, M. Takeuchi, H. Tamura, N. Tamura, H. Tanaka, T. Tanaka, M. Tingfeng, Y. Todo, M. Tokitani, K. Tokunaga, T. Tokuzawa, H. Tsuchiya, K. Tsumori, Y. Ueda, L. Vyacheslavov, K. Y. Watanabe, T. Watanabe, T. H. Watanabe, B. Wieland, I. Yamada, S. Yamada, S. Yamamoto, N. Yanagi, R. Yasuhara, M. Yokoyama, N. Yoshida, S. Yoshimura, T. Yoshinaga, M. Yoshinuma, A. Komori

    NUCLEAR FUSION   53 ( 10 )   2013.10

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    DOI: 10.1088/0029-5515/53/10/104015

  • Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells

    Giichiro Uchida, Muneharu Sato, Hyunwoong Seo, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    THIN SOLID FILMS   544   93 - 98   2013.10

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    DOI: 10.1016/j.tsf.2013.04.111

  • Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate

    N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani

    Proc. 13th International Conference on Plasma Surface Engineering   26   84 - 87   2013.9

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    Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate
    High quality ZnO:Al (AZO) films have been obtained by utilizing buffer layers fabricated via nitrogen mediated crystallization (NMC), where sputtering method is employed for preparation of both buffer layers and AZO films. Introduction of small amount of N2 (N2/(Ar+N2) = 16&#37;) to the sputtering atmosphere of NMC-ZnO buffer layers drastically improves the crystallinity of buffer layers and thus AZO films. The most remarkable effect of the buffer layers is a significant reduction in the resistivity at high base pressure of background gases. The resistivity of conventional AZO films increases from 2.0 m??cm to 70.0 m??cm with increasing the base pressure from 3×10-5 Pa to 1×10-3 Pa, while the resistivity of AZO films with NMC buffer layers increases from 0.5 m??cm to 2.0 m??cm, where the thickness of AZO film is 88 nm. Furthermore, AZO films with a sheet resistance of 10 ?/? and an optical transmittance higher than 80&#37; in a wide wavelength range of 400?1100 nm have been obtained.

  • クラスタ抑制法を用いた高光安定アモルファスシリコンPIN太陽電池の作製

    古閑 一憲, 橋本 優史, 金 淵元, 都甲 将, 徐 鉉雄, 板垣 奈穗, 白谷 正治, 内田 儀一郎

    電気学会研究会資料. PST, プラズマ研究会   2013 ( 74 )   13 - 17   2013.9

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  • Control of Deposition Profile and Properties of Plasma CVD Carbon Films

    K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani

    Proc. 13th International Conference on Plasma Surface Engineering   26   136 - 139   2013.9

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    Control of Deposition Profile and Properties of Plasma CVD Carbon Films
    We have succeeded to deposit anisotropic and top surface deposition profile on substrates with trenches using H-assisted plasma CVD of Ar + H2 + C7H8 at a low substrate temperature of 100 oC. For the anisotropic deposition profile, carbon is deposited without being deposited on sidewall of trenches. For the top surface deposition profile, carbon is deposited at only top surface. The optical emission measurements and evaluation of deposition rate have revealed that a high flux of H atmos is the key to the deposition profile control. The mass density of the films and their Raman spectrum have shown that their structure is a-C:H.

  • Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD

    Yeonwon Kim, Takeaki Matsunaga, Kenta Nakahara, Hyunwoong Seo, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    SURFACE & COATINGS TECHNOLOGY   228   S550 - S553   2013.8

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    DOI: 10.1016/j.surfcoat.2012.04.029

  • Observation of nanoparticle growth process using a high speed camera Reviewed

    Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani

    Proceedings of 21st International Symposium on Plasma Chemistry   264   2013.8

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    Observation of nanoparticle growth process using a high speed camera
    Time evolution of spatial profile of nanoparticle amount in low pressure reactive discharge plasmas have been measured to study effects of amplitude modulation of the plasmas on particle growth in the initial growth phase. Amplitude modulation of discharge voltage leads to oscillate nanoparticle amount and their spatial profile. Growth of nanoparticles is suppressed by increasing the AM frequency.

  • Mass density control of carbon films deposited by H-assisted plasma CVD method

    Tatsuya Urakawa, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori

    SURFACE & COATINGS TECHNOLOGY   228   S15 - S18   2013.8

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    DOI: 10.1016/j.surfcoat.2012.10.002

  • Effects of DC substrate bias voltage on dust flux in the Large Helical Device

    Kazunori Koga, Katsushi Nishiyama, Yasuhiko Morita, Giichiro Uchida, Daisuke Yamashita, Kunihiro Kamataki, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara

    JOURNAL OF NUCLEAR MATERIALS   438   S727 - S730   2013.7

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    DOI: 10.1016/j.jnucmat.2013.01.154

  • Discharge power dependence of carbon dust flux in a divertor simulator

    Katsushi Nishiyama, Yasuhiko Morita, Giichiro Uchida, Daisuke Yamashita, Kunihiro Kamataki, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoko Ashikawa, Suguru Masuzaki, Kiyohiko Nishimura, Akio Sagara, Sven Bornholdt, Holger Kersten

    JOURNAL OF NUCLEAR MATERIALS   438   S788 - S791   2013.7

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    DOI: 10.1016/j.jnucmat.2013.01.169

  • Transport control of dust particles via the electrical asymmetry effect: experiment, simulation and modelling

    Shinya Iwashita, Edmund Schuengel, Julian Schulze, Peter Hartmann, Zoltan Donko, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Uwe Czarnetzki

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   46 ( 24 )   2013.6

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    DOI: 10.1088/0022-3727/46/24/245202

  • Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells

    Hyunwoong Seo, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    ELECTROCHIMICA ACTA   95   43 - 47   2013.4

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    DOI: 10.1016/j.electacta.2013.02.026

  • ナノ材料のプラズマプロセシングの研究の現状と将来 Invited Reviewed

    白谷 正治, 古閑 一憲, 内田 儀一郎, Hyunwoong SEO, 板垣 奈穂, 岩下 伸也

    表面科学   34 ( 10 )   520 - 527   2013.1

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    This paper reviews production of nanoparticles using low pressure reactive plasmas and its application to quantum dot sensitized solar cells. For the method, nanoparticles of several nm in size with a small size dispersion are produced in gas phase using reactive plasmas, and then the nanoparticles and radicals are co-deposited on a substrate. This method realizes one-step deposition of nanoparticle composite films in a controllable way.

    DOI: 10.1380/jsssj.34.520

  • H-2/N-2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition

    Tatsuya Urakawa, Ryuhei Torigoe, Hidefumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Keigo Takeda, Makoto Sekine, Masaru Hori

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 1 )   2013.1

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    DOI: 10.7567/JJAP.52.01AB01

  • Dust particle formation due to interaction between graphite and helicon deuterium plasmas

    Shinya Iwashita, Katsushi Nishiyama, Giichiro Uchida, Hyunwoong Seo, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    FUSION ENGINEERING AND DESIGN   88 ( 1 )   28 - 32   2013.1

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    DOI: 10.1016/j.fusengdes.2012.10.002

  • Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen-Mediated Crystallization

    Iping Suhariadi, Koichi Matsushima, Kazunori Kuwahara, Koichi Oshikawa, Daisuke Yamashita, Hyunwoong Seo, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Sven Bornholdt, Holger Kersten, Harm Wulff, Naho Itagaki

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 1 )   2013.1

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    DOI: 10.7567/JJAP.52.01AC08

  • High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition

    Yeonwon Kim, Kosuke Hatozaki, Yuji Hashimoto, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 1 )   2013.1

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    DOI: 10.7567/JJAP.52.01AD01

  • Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells

    Hyunwoong Seo, Yuting Wang, Muneharu Sato, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 1 )   2013.1

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    DOI: 10.7567/JJAP.52.01AD05

  • The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell

    Hyunwoong Seo, Yuting Wang, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    ELECTROCHIMICA ACTA   87   213 - 217   2013.1

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    DOI: 10.1016/j.electacta.2012.09.087

  • Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors Reviewed

    N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani

    Proc. International Symposium on Dry Process   34   97 - 98   2012.11

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    Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors

  • Growth Control of Dry Yeast Using Scalable Atmospheric-Pressure Dielectric Barrier Discharge Plasma Irradiation

    Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 11 )   2012.11

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    DOI: 10.1143/JJAP.51.11PJ02

  • Control of radial density profile of nano-particles produced in reactive plasma by amplitude modulation of radio frequency discharge voltage

    Kunihiro Kamataki, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Daisuke Yamashita, Hidefumi Matsuzaki, Masaharu Shiratani

    THIN SOLID FILMS   523   76 - 79   2012.11

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    DOI: 10.1016/j.tsf.2012.07.059

  • Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma chemical vapor deposition

    Yeonwon Kim, Takeaki Matsunaga, Kenta Nakahara, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Hyunwoong Seo, Kazunori Koga, Masaharu Shiratani

    THIN SOLID FILMS   523   29 - 33   2012.11

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    DOI: 10.1016/j.tsf.2012.06.023

  • High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers

    Kazunari Kuwahara, Naho Itagaki, Kenta Nakahara, Daisuke Yamashita, Giichiro Uchida, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani

    THIN SOLID FILMS   520 ( 14 )   4674 - 4677   2012.5

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    DOI: 10.1016/j.tsf.2011.10.136

  • In situ analysis of size distribution of nano-particles in reactive plasmas using two dimensional laser light scattering method

    K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki

    JOURNAL OF INSTRUMENTATION   7   2012.4

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    DOI: 10.1088/1748-0221/7/04/C04017

  • ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio Reviewed

    I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani

    Trans. Mater. Res. Soc. Jpn.   37 ( 2 )   165 - 168   2012.1

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    ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio
    Effects of N2/Ar gas flow rate ratio on the crystallinity of sputtered ZnO films fabricated via nitrogen mediated crystallization (NMC) have been clarified. Introduction of small amount of N2 (N2/Ar = 4/20.5 sccm) drastically improves the crystal orientation and enlarges grain size of the NMC-ZnO films, where FWHM of XRD patterns for 2θ-ω and ω scan of (002) plane are 0.17° and 2.6°, respectively. A further increase in N2/Ar flow rate ratio deteriorates the crystallinity, since excess N atoms in the films disarrange the crystal structure of ZnO. Furthermore, ZnO:Al (AZO) films with high crystallinity have been successfully fabricated by utilizing the NMC-ZnO films deposited at N2/Ar = 4/20.5 sccm as buffer layers. 100-nm-thick AZO films with a resistivity of 6.8×10-4 Ωcm and an optical transmittance higher than 80&#37; in a wide wavelength range of 500 nm to 1500 nm has been obtained.

    DOI: 10.14723/tmrsj.37.165

  • Pulmonary Toxicity of Indium Tin Oxide and Copper Indium Gallium Diselenide

    Akiyo Tanaka, Miyuki Hirata, Kazunori Koga, Makiko Nakano, Kazuyuki Omae, Yutaka Kiyohara

    MRS Proceedings   1469   2012.1

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    DOI: 10.1557/opl.2012.1074

  • Growth Enhancement of Radish Sprouts Induced by Low Pressure O-2 Radio Frequency Discharge Plasma Irradiation

    Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani, Nobuya Hayashi

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   2012.1

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    DOI: 10.1143/JJAP.51.01AE01

  • Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition

    Kazunori Koga, Takeaki Matsunaga, Yeonwon Kim, Kenta Nakahara, Daisuke Yamashita, Hidefumi Matsuzaki, Kunihiro Kamataki, Giichiro Uchida, Naho Itagaki, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   2012.1

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    DOI: 10.1143/JJAP.51.01AD02

  • Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH4+B10H14 Multi-Hollow Discharge Plasma Chemical Vapor Deposition

    Kazunori Koga, Kenta Nakahara, Yeon-Won Kim, Takeaki Matsunaga, Daisuke Yamashita, Hidefumi Matsuzaki, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   2012.1

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    DOI: 10.1143/JJAP.51.01AD03

  • Effect of Nitridation of Si Nanoparticles on the Performance of Quantum-Dot Sensitized Solar Cells

    Giichiro Uchida, Kosuke Yamamoto, Muneharu Sato, Yuki Kawashima, Kenta Nakahara, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   2012.1

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    DOI: 10.1143/JJAP.51.01AD01

  • Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasmas

    Kunihiro Kamataki, Hiroshi Miyata, Kazunori Koga, Giichiro Uchida, Naho Itagaki, Masaharu Shiratani

    APPLIED PHYSICS EXPRESS   4 ( 10 )   2011.10

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    DOI: 10.1143/APEX.4.105001

  • Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film

    Kazunori Koga, Takeaki Matsunaga, William Makoto Nakamura, Kenta Nakahara, Yuuki Kawashima, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Masaharu Shiratani

    THIN SOLID FILMS   519 ( 20 )   6896 - 6898   2011.8

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    DOI: 10.1016/j.tsf.2011.01.408

  • Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge

    Nobuya Hayashi, Akari Nakahigashi, Masaaki Goto, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 8 )   2011.8

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    DOI: 10.1143/JJAP.50.08JF04

  • Nano-factories in plasma: present status and outlook

    Masaharu Shiratani, Kazunori Koga, Shinya Iwashita, Giichiro Uchida, Naho Itagaki, Kunihiro Kamataki

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   44 ( 17 )   2011.5

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    DOI: 10.1088/0022-3727/44/17/174038

  • Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers

    K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani

    Proc. PVSEC-21   4D-2P-11   2011.1

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    Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers

  • Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase

    Naho Itagaki, Kazunari Kuwahara, Kenta Nakahara, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani

    APPLIED PHYSICS EXPRESS   4 ( 1 )   2011.1

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    DOI: 10.1143/APEX.4.011101

  • Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD Reviewed

    Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani

    POL08   2011.1

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    Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD
    A combinatorial technique using a multi-hollow discharge plasma CVD method has been employed to investigate effects of substrate temperature on hydrogenated microcrystalline silicon (?c-Si:H) film growth. No film is deposited near the discharge region RT to 350°C, whereas the area of no film region decreases with increasing the substrate temperature. This is attributed to competitive reactions between Si etching by H atoms and Si deposition. The area of microcrystalline Si region increases with the substrate temperature due to high surface diffusion rate of Si containing radical. These results show that the process window of μc-Si:H films becomes wider for the higher substrate temperature due to two reasons: 1) the lower Si etching rate and 2) the longer surface migration length of Si containing radicals. The defect density decreases significantly with increasing Ts from 6.24 × 10 16 cm -3 for Ts =100 o C down to 6.26 × 10 15 cm -3 for T s =300 o C.

  • Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma

    K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani

    D13-318   2011.1

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    Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma

  • Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage

    K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten

    Proc. Plasma Conf. 2011   24P094-O   2011.1

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    Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage
    We collected dust particles generated by interaction between a plasma and a carbon target in helicon discharge reactor, by which diverter plasmas in fusion devices are simulated. The dust particles are classified into three kinds: small spherical particles, agglomerates, and large flakes, suggesting three formation mechanisms: chemical vapor deposition (CVD) growth, agglomeration, and peeling from redeposited layer on the reactor wall. The area density and flux towards substrates of dust particles exponentially increase with the substrate bias voltage. The energy influx of plasmas towards the target and ion density were measured to clarify the dust formation mechanisms. They are nearly constant irrespective of the substrate bias voltage suggesting that the production rate of dust particles does not depend on the substrate bias voltage and their collection efficiency does.

  • Deposition of cluster-free a-Si:H films using cluster eliminating filter

    K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Proc. Plasma Conf. 2011   24P010-O   2011.1

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    Deposition of cluster-free a-Si:H films using cluster eliminating filter
    We have succeeded in deposition of highly stable a-Si:H films at a rate of 3 nm/s. To evaluate their performance as an I layer of PIN solar cells, Fill Factor (FF) of N-type c-Si/a-Si:H/Ni Schottky cells with cluster free a-Si:H films were measured. High quality stable a-Si:H films, were deposited with a multi-hollow discharge plasma CVD reactor together with a cluster-eliminating filter. Initial FF of the cell is 0.521, whereas stabilized FF is 0.495 that is 4.99&#37; lower than the initial FF. Our multi-hollow discharge plasma CVD method is useful to fabricate highly stable a-Si:H solar cells.

  • Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD

    Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Proc. Plasma Conf. 2011   23P013-O   2011.1

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    Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD
    Effects of electrolyte on performance of Si QDSCs were investigated. We successfully fabricated an efficient polysulfide electrolyte based on the solvent mixed with water and methanol at a volume ratio of 3:7. The optimal electrolyte contains 1.0M Na2S, 0.5M S and 0.2M KCl. By introducing different ingredients with proper concentration, Jsc, Voc and fill factor are much improved. The efficiency of Si QDSCs using optimized electrolyte is 0.027&#37;

  • Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films

    K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H, G. Uchida, K. Kamataki, K. Koga, M. Shiratani

    Proc. Plasma Conf. 2011   24P008-O   2011.1

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    Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films
    Effects of N2/Ar flow rate ratio on properties of ZnO films fabricated via nitrogen mediated crystallization (NMC) have been studied. NMC-ZnO films are deposited by RF magnetron sputtering using Ar-N2 mixed gas. X-ray diffraction (XRD) analysis shows that the crystallinity of NMC-ZnO films is improved by addition of a small amount of N2 to sputtering atmosphere (N2/(Ar+N2) flow ratio of 8&#37;). By using the NMC-ZnO films as homo-buffer layers, ZnO films with high crystallinity are deposited by RF magnetron sputtering. The full width at half-maximum of XRD patterns for ω scan of (002) plane are 0.061°, being significantly small compared with 0.49° for the films without buffer layers. A further increase in N2/Ar flow rate ratio deteriorates the crystallinity because excess N atoms in the films disarrange the crystal structure of ZnO. The results indicate that utilizing NMC buffer layers deposited at an adequate N2 partial pressure is very promising to obtain epitaxial ZnO films with high crystallinity.

  • Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD

    M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga

    Proc. Plasma Conf. 2011   24G06   2011.1

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    Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD
    We have investigated effects of nanoparticle inclusion on properties of a-Si:H films and mc-Si:H films using the multi-hollow discharge plasma CVD method. Minor deposition species (nanoparticles in this study) modify considerably properties of a-Si:H films and mc-Si:H films

  • Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition

    T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

    Proc. Plasma Conf. 2011   24P015-O   2011.1

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    Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition
    Effects of nano-particles on formation kinetics of microcrystalline silicon films were studied by X-ray diffraction spectroscopy (XRD) and optical emission spectroscopy (OES). Volume fraction of (220) orientation crystals of films without incorporating nano-particles is higher than that of those with nano-particles. The IH?/ISi* value in the region with nano-particles is slightly higher than that in the region without nano-particles. The ISi*/ISiH* value is almost the same as that in the region with and without nano-particles. These results suggest that (220) orientation crystal growth is suppressed by incorporation of nano-particles.

  • Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering

    N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga

    Proc. Plasma Conf. 2011   24G6   2011.1

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    Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering
    Low resistive ZnO:Al (AZO) films with uniform spatial distribution have been obtained by utilizing buffer layers fabricated by Ar/N2 magnetron sputtering. For 100 nm-thick AZO films, the averaged grain size of AZO films with buffer layers is 65 nm, which is 1.8 times larger than that of the films without buffer layers. This increase in the grain size of AZO films is due to the low grain density of buffer layers. As a result, the resistivity is drastically reduced. At the area facing the target erosion, the resistivity reduced from 2.27 m??cm for the films without buffer layers to 0.50 m??cm for our films, consequently, the spatial distribution of the resistivity is significantly improved. These results reveal that our method described here is full of promise for fabrication of ZnO-based TCO materials.

  • Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD

    Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Proc. Plasma Conf. 2011   24P011-O   2011.1

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    Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD
    To evaluate radical fluxes for microcrystalline silicon film deposition, Si films were deposited in a combinatorial way using a multi-hollow discharge plasma CVD method. Film crystallinity varied with the distance from the powered electrode. Based on the film deposition rate and Raman crystallinity, we proposed a method to estimate hydrogen flux. This evaluation of hydrogen flux is one of useful way to understand a process window of ?c-Si:H films.

  • Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD

    K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani

    Proc. Plasma Conf. 2011   24P014-O   2011.1

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    Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD
    We have investigated effects of plasma fluctuation on the growth of nanoparticles in capacitively-coupled rf discharges with amplitude modulation. Nanoparticles grow more slowly for higher AM levels, that is they have 7 times higher density and 23&#37; smaller size. This AM method is useful for the production of a large amount of nanoparticles with a small size

  • Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd

    Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani

    Proc. PVSEC-21   3D-2P-09   2011.1

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    Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd

  • Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD

    K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Proc. PVSEC-21   3D-2P-20   2011.1

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    Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD

  • Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films

    T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

    Proc. PVSEC-21   4D-2P-16   2011.1

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    Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films

  • Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste

    Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani

    Proc. PVSEC-21   3D-5P-09   2011.1

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    Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste

  • Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization

    N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani

    Proc. PVSEC-21   4D-2P-10   2011.1

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    Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization

  • High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells

    William Makoto Nakamura, Hidefumi Matsuzaki, Hiroshi Sato, Yuuki Kawashima, Kazunori Koga, Masaharu Shiratani

    SURFACE & COATINGS TECHNOLOGY   205   S241 - S245   2010.12

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    DOI: 10.1016/j.surfcoat.2010.07.081

  • 低圧プラズマによる酸化還元反応および植物成長への影響

    林 信哉, 中東 朱里, 秋吉 雄介, 北崎 訓, 古閑 一憲, 白谷 正治

    電気学会研究会資料. PST, プラズマ研究会   2010 ( 65 )   33 - 36   2010.12

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  • High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD

    Kazunori Koga, Hiroshi Sato, Yuuki Kawashima, William M. Nakamura, Masaharu Shiratani

    Materials Research Society Symposium Proceedings   1210   217 - 222   2010.12

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    High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD
    We have examined effects of gas velocity and gas pressure on a deposition rate of hydrogenated amorphous silicon (a-Si:H) films and on a volume fraction of clusters in the films using a multi-hollow discharge plasma CVD method. The maximum deposition rate realized for each pressure exponentially increases with decreasing the pressure from 1.0 Torr to 0.1 Torr, whereas the volume fraction of clusters very slightly increases with increasing the deposition rate. Based on the results, we have succeeded in depositing highly stable a-Si:H films of 4.9 × 1015cm-3 in a stabilized defect density at a rate of 3.0nm/s using the method. © 2010 Materials Research Society.

  • Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

    Kazunori Koga, Masaharu Shiratani, Yukio Watanabe

    Industrial Plasma Technology: Applications from Environmental to Energy Technologies   247 - 257   2010.10

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    DOI: 10.1002/9783527629749.ch20

  • Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation

    Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani

    Industrial Plasma Technology: Applications from Environmental to Energy Technologies   377 - 383   2010.10

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    DOI: 10.1002/9783527629749.ch31

  • Deposition profile control of carbon films on patterned substrates using a hydrogen-assisted plasma CVD method

    Takuya Nomura, Kazunori Koga, Kazunori Koga, Masaharu Shiratani, Masaharu Shiratani, Yuichi Setsuhara, Yuichi Setsuhara, Makoto Sekine, Makoto Sekine, Masaru Hori, Masaru Hori

    Materials Research Society Symposium Proceedings   1222   203 - 207   2010.8

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    Deposition profile control of carbon films on patterned substrates using a hydrogen-assisted plasma CVD method
    We have studied effects of H atom source on deposition profiles of carbon films, deposited by H assisted anisotropic plasma CVD method. Deposition rate normalized by that for the aspect ratio of 1 at sidewall and bottom decreases with increasing discharge power of H atom source from 0 W to 500 W, because the incident H atom flux per surface area in a trench increases and H atoms etch carbon films. © 2010 Materials Research Society.

  • Review of pulmonary toxicity of indium compounds to animals and humans

    Akiyo Tanaka, Miyuki Hirata, Yutaka Kiyohara, Makiko Nakano, Kazuyuki Omae, Masaharu Shiratani, Kazunori Koga

    THIN SOLID FILMS   518 ( 11 )   2934 - 2936   2010.3

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    DOI: 10.1016/j.tsf.2009.10.123

  • Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles

    H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

    Proc. of International Symposium on Dry Process   43 - 44   2010.1

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    Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles

  • Carbon dust particles generated due to H2 plasma-carbon wall interaction Reviewed

    H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group

    Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   CTP.00114   2010.1

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    Carbon dust particles generated due to H2 plasma-carbon wall interaction

  • Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges Reviewed

    G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

    Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   CTP.00093   2010.1

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    Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges

  • Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges

    G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo

    Proc. of MNC2010   12D-11-66   2010.1

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    Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges

  • P-type sp(3)-bonded BN/n-type Si heterodiode solar cell fabricated by laser-plasma synchronous CVD method

    Shojiro Komatsu, Yuhei Sato, Daisuke Hirano, Takuya Nakamura, Kazunori Koga, Atsushi Yamamoto, Takahiro Nagata, Toyohiro Chikyo, Takayuki Watanabe, Takeo Takizawa, Katsumitsu Nakamura, Takuya Hashimoto, Masaharu Shiratani

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   42 ( 22 )   2009.11

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    DOI: 10.1088/0022-3727/42/22/225107

  • Two-dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si : H films deposited by plasma CVD

    William Makoto Nakamura, Hiroomi Miyahara, Hiroshi Sato, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani

    IEEE TRANSACTIONS ON PLASMA SCIENCE   36 ( 4 )   888 - 889   2008.8

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    DOI: 10.1109/TPS.2008.923830

  • Discharge power dependence of H<inf>α</inf>intensity and electron density of Ar + H<inf>2</inf>discharges in H-assisted plasma CVD reactor

    202 ( 22-23 )   5659 - 5662   2008.8

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    We have realized anisotropic deposition of Cu, for which Cu is preferentially filled from the bottom of trenches without being deposited on the sidewall of trenches, using H-assisted plasma CVD. To obtain information about a discharge condition to realize a high deposition rate, we have studied dependence of Hα656.3 nm and Ar 811.5 nm intensities and electron density in the main discharge on the main discharge power, Pm, and in the discharge of H atom source on the discharge power of H atom source, PH, as a parameter of a gas flow rate ratio R = H2/(H2+ Ar). The results suggest that a high electron density in the main discharge and high fluxes of ions and H atoms to a substrate, all of which are needed for deposition of high purity Cu at a high deposition rate, are realized for Pm= 45 W, PH= 500 W, and R = 3.3&#37;. © 2008 Elsevier B.V. All rights reserved.

    DOI: 10.1016/j.surfcoat.2008.06.108

  • Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasmas

    Shota Nunomura, Masaharu Shiratani, Kazunori Koga, Michio Kondo, Yukio Watanabe

    PHYSICS OF PLASMAS   15 ( 8 )   2008.8

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    DOI: 10.1063/1.2972162

  • Temperature Dependence of Dielectric Constant of Nanoparticle Composite Porous Low-k Films Fabricated by Pulse Radio Frequency Discharge with Amplitude Modulation

    Shinya Iwashita, Michihito Morita, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani

    JAPANESE JOURNAL OF APPLIED PHYSICS   47 ( 8 )   6875 - 6878   2008.8

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    DOI: 10.1143/JJAP.47.6875

  • Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si: H Film Deposition

    Yukio Watanabe, Masaharu Shiratani, Kazunori Koga

    Advanced Plasma Technology   227 - 242   2008.4

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    DOI: 10.1002/9783527622184.ch12

  • Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage

    Kazunori Koga, Shinya Iwashita, Masaharu Shiratani

    JOURNAL OF PHYSICS D-APPLIED PHYSICS   40 ( 8 )   2267 - 2271   2007.4

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    DOI: 10.1088/0022-3727/40/8/S05

  • Single step method to deposit Si quantum dot films using H-2+SiH4VHF discharges and electron mobility in a Si quantum dot solar cell

    Masaharu Shiratani, Kazunori Koga, Soichiro Ando, Toshihisa Inoue, Yukio Watanabe, Shota Nunomura, Michio Kondo

    SURFACE & COATINGS TECHNOLOGY   201 ( 9-11 )   5468 - 5471   2007.2

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    DOI: 10.1016/j.surfcoat.2006.07.012

  • A device for trapping nano-particles formed in processing plasmas for reduction of nano-waste

    Shinya Iwashita, Kazunori Koga, Masaharu Shiratani

    SURFACE & COATINGS TECHNOLOGY   201 ( 9-11 )   5701 - 5704   2007.2

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    DOI: 10.1016/j.surfcoat.2006.07.060

  • Species responsible for Si-H-2 bond formation in a-Si : H films deposited using silane high frequency discharges

    M Shiratani, K Koga, N Kaguchi, K Bando, Y Watanabe

    THIN SOLID FILMS   506   17 - 21   2006.5

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    DOI: 10.1016/j.tsf.2005.08.015

  • Mechanism of Cu deposition from Cu(EDMDD)(2) using H-assisted plasma CVD

    K Takenaka, K Koga, M Shiratani, Y Watanabe, T Shingen

    THIN SOLID FILMS   506   197 - 201   2006.5

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    DOI: 10.1016/j.tsf.2005.08.028

  • Nano-particle formation due to interaction between H-2 plasma and carbon wall

    K Koga, Y Kitaura, M Shiratani, Y Watanabe, A Komori

    THIN SOLID FILMS   506   656 - 659   2006.5

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    DOI: 10.1016/j.tsf.2005.08.062

  • Production of crystalline Si nano-clusters using pulsed H-2+SiH(4)VHFdischarges

    T Kakeya, K Koga, M Shiratani, Y Watanabe, M Kondo

    THIN SOLID FILMS   506   288 - 291   2006.5

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    DOI: 10.1016/j.tsf.2005.08.090

  • In situ simple method for measuring size and density of nanoparticles in reactive plasmas

    S Nunomura, M Kita, K Koga, M Shiratani, Y Watanabe

    JOURNAL OF APPLIED PHYSICS   99 ( 8 )   2006.4

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    DOI: 10.1063/1.2189951

  • Plasma anisotropic CVD of high purity Cu using Cu(hfac)2 Reviewed

    Masaharu Shiratani, Takao Kaji, Kazunori Koga, Yukio Watanabe, Tomohiro Kubota, Seiji Samukawa

    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing   2006.1

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    Plasma anisotropic CVD of high purity Cu using Cu(hfac)2

  • Cluster-eliminating filter for depositing cluster-free a-Si : H films by plasma chemical vapor deposition

    K Koga, N Kaguchi, K Bando, M Shiratani, Y Watanabe

    REVIEW OF SCIENTIFIC INSTRUMENTS   76 ( 11 )   1 - 4   2005.11

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    DOI: 10.1063/1.2126572

  • Control of deposition profile of copper for large-scale integration (LSI) interconnects by plasma chemical vapor deposition

    K Takenaka, M Shiratani, M Takeshita, M Kita, K Koga, Y Watanabe

    PURE AND APPLIED CHEMISTRY   77 ( 2 )   391 - 398   2005.2

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    DOI: 10.1351/pac200577020391

  • Correlation between volume fraction of clusters incorporated into a-Si : H films and hydrogen content associated with Si-H-2 bonds in the films

    K Koga, N Kaguchi, M Shiratani, Y Watanabe

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   22 ( 4 )   1536 - 1539   2004.7

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    DOI: 10.1116/1.1763905

  • Anisotropic deposition of Cu in trenches by H-assisted plasma chemical vapor deposition

    K Takenaka, M Kita, T Kinoshita, K Koga, M Shiratani, Y Watanabe

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A   22 ( 4 )   1903 - 1907   2004.7

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    DOI: 10.1116/1.1738663

  • Carbon particle formation due to interaction between H-2 plasma and carbon fiber composite wall

    K Koga, R Uehara, Y Kitaura, M Shiratani, Y Watanabe, A Komori

    IEEE TRANSACTIONS ON PLASMA SCIENCE   32 ( 2 )   405 - 409   2004.4

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    DOI: 10.1109/TPS.2004.828129

  • Cluster-suppressed plasma CVD for deposition of high quality a-Si : H films

    M Shiratani, K Koga, Y Watanabe

    THIN SOLID FILMS   427 ( 1-2 )   1 - 5   2003.3

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    DOI: 10.1016/S0040-6090(02)01171-9

  • Cluśter-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films

    41 ( 2B )   L168 - L170   2002.2

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    We have developed a novel plasma chemical vapor deposition (PCVD) method for preparing high quality hydrogenated amorphous silicon (a-Si:H) films, which suppresses effectively growth of clusters by transporting them out of the reactor using gas flow and thermophoresis. By utilizing this cluster-suppressed PCVD method, we have demonstrated deposition of quite high quality a-Si:H films, microstructure parameter Rαof which can be reduced below 0.003. The decrease in Rαvalue is closely related to the decrease in cluster amount. Preliminary evaluation of fill factor (FF) of the a-Si:H Schottky solar cell of the a-Si:H films of Rα= 0.057 shows the high initial value FFi= 0.57 and high stabilized value after-light-soaking FFa= 0.53.

    DOI: 10.1143/JJAP.41.L168

  • H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration

    Masaharu Shiratani, Hong Jie Jin, Kosuke Takenaka, Kazunori Koga, Toshio Kinoshita, Yukio Watanabe

    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS   2 ( 3-4 )   505 - 515   2001.9

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    DOI: 10.1016/S1468-6996(01)00131-0

  • In situ observation of nucleation and subsequent growth of clusters in silane radio frequency discharges

    K Koga, Y Matsuoka, K Tanaka, M Shiratani, Y Watanabe

    APPLIED PHYSICS LETTERS   77 ( 2 )   196 - 198   2000.7

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    DOI: 10.1063/1.126922

  • Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane RF discharges

    M Shiratani, S Maeda, K Koga, Y Watanabe

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS   39 ( 1 )   287 - 293   2000.1

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    DOI: 10.1143/JJAP.39.287

  • 非対称イオンシースにおける局所構造形成の観測

    古閑 一憲, 河合 良信

    九州大学大学院総合理工学報告   20 ( 2 )   157 - 161   1998.9

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    When the ion sheath instability is excited, a local structure in the potential profile is found and the local structure in the ion saturation current profiles is observed near the sheath edge and inside the sheath for almost all bias voltages of the separation grid. The correlation between the local structure and the ion sheath instability is examined. The length between the local structure formed near the sheath edge in the ion saturation current profiles in the both sides is found to be in inverse proportion to the frequency of the instability. Furthermore, the experimental results are also compared with the virtual anode oscillations.

    DOI: 10.15017/17465

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  • High Throughput Deposition of Hydrogenated Amorphous Carbon Films using High-Pressure Ar+CH4 Plasmas International conference

    ICMCTF2021  2021.4 

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    Event date: 2021.4

    Language:English   Presentation type:Oral presentation (general)  

  • プラズマを用いてカーボンナノ粒子層を含むミルフィーユ型 a-C:H 膜の機械的特性

    古閑一憲, 黄成和, Y.Hao, 鎌滝晋礼, 奥村賢直, 板垣奈穂, 白谷正治

    第68回応用物理学会春季学術講演会  2021.3 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • クロージングリマークス(招待講演) Invited

    古閑一憲

    応用物理学会プラズマエレクトロニクス分科会30周年記念シンポジウム  2021.3 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • プラズマCVD中飛行時間によるカーボンナノ粒子サイズ制御

    古閑一憲, S. H. Hwang, Y. Hao, P. Attir, 奥村賢直,鎌滝晋礼,板垣奈穂, 白谷正治

    日本物理学会第76回年次大会  2021.3 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Green Route for Nitrogen-Enriched Organic Manure Synthesis Using Plasma Technology(Invited) Invited International conference

    K. Koga

    ISPlasma2021/IC-PLANTS2021  2021.3 

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    Event date: 2021.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Influences of Plasma Treatment of Seeds on their Molecular Responses(Invited) Invited International conference

    K. Koga

    3rd International Workshop on Plasma Agriculture  2021.3 

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    Event date: 2021.2 - 2021.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • CVDプラズマ中のナノ粒子の成長制御と応用(招待講演) Invited

    古閑一憲

    第72回CVD研究会  2020.12 

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    Event date: 2020.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Impact of Plasma Treatment Time on the Barley Seeds using Electron Paramagnetic Resonance International conference

    K. Koga, P. Attri, T. Anan, R. Arita, H. Tanaka, T. Okumura, D. Yamashita, K. Matsuo, K. Kanataki, N. Itagaki, M. Shiratani, Y. Ishibashi

    2020.12 

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    Event date: 2020.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Role of seed coat color and harvest year on growth enhancement by plasma irradiation to seeds International conference

    K. Koga, P. Attri, K. Ishikawa, T. Okumura, K. Matsuo, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene

    The 73rd Annual Gaseous Electronics Conference  2020.10 

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    Event date: 2020.10

    Language:English   Presentation type:Oral presentation (general)  

  • マルチホロー放電プラズマ CVDを用いて作製したカーボンナノ粒子輸送量に対する電極基板間距離の効果

    古閑一憲, S. H. Hwang, 奥村賢直, Y. Hao, 山下大輔, 松尾かよ, 板垣奈穂, 鎌滝晋礼, 白谷正治

    2020年度(第73回)電気・情報関係学会九州支部連合大会  2020.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • プラズマCVD技術文献のテキストマイニングを用いた単語のインパクトの解析

    古閑一憲, 奥村賢直, 鎌滝晋礼, 板垣奈穂, 白谷正治, 谷口雄太, 池田大輔

    第81回応用物理学会秋季学術講演会  2020.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • プラズマCVDを用いたa-Si:H堆積薄膜中のSi-H/Si-H2結合形成の活性化エネルギー

    古閑一憲, 鎌滝晋礼, 奥村賢直, 板垣奈穂, 白谷正治

    日本物理学会 2020年秋季大会  2020.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • プラズマと薄膜のナノ界面相互作用による結合形成の活性化エネルギー評価

    古閑一憲, 原尚志, 鎌滝晋礼, 板垣奈穂, 白谷正治

    日本物理学会第75回年次大会(2020年)  2020.3 

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    Event date: 2020.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  • ⾮平衡プラズマを⽤いたサイズ制御したカーボンナノ粒⼦の連続作 製と堆積

    古閑⼀憲, 黄成和, 石川健治, P. Attri, 松尾かよ, 山下⼤輔, 板垣奈穂, 鎌滝晋礼, 白谷正治

    第67回応用物理学会春季学術講演会  2020.3 

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    Event date: 2020.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:上智大学   Country:Japan  

  • ⾼温障害を持つイネ種⼦の発芽特性に対するプラズマ照射の効果

    古閑⼀憲, 石橋勇志, S. Chetphilin, 田中颯, 佐藤僚哉, 有田涼, 廣松真弥, 石川健治, P. Attri, 松尾かよ, 山下⼤輔, 板垣奈穂, 鎌滝晋礼, 白谷正治

    第67回応用物理学会春季学術講演会  2020.3 

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    Event date: 2020.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:上智大学   Country:Japan  

  • プラズマ照射種子を用いた圃場実験の結果報告(招待講演) Invited

    古閑⼀憲

    第1回プラズマ農業フィールドテスト研究会  2020.2 

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    Event date: 2020.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:Hotel & Resorts BEPPUWAN, 大分   Country:Japan  

  • プラズマ照射した種籾の圃場栽培試験

    古閑一憲, 佐藤僚哉, 吉田知晃, 有田涼, 田中颯, 廣松真弥, 鎌滝晋礼, 板垣奈穂, 白谷正治

    第36回プラズマ・核融合学会年会  2019.12 

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    Event date: 2019.11 - 2019.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  • Metabolomics Approach for Studying Effects of Atmospheric Air Plasma Irradiation to Seeds (Keynote) Invited International conference

    K. Koga, M. Shiratani, V. Mildaziene

    29th Annual Meeting of MRS-J  2019.11 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Impact of Atmospheric Pressure Plasma Irradiation to Seeds on Agricultural Productivity International conference

    K. Koga, M. Shiratani

    3rd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2019)  2019.11 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:China  

  • Rate Limiting Factors of Low Pressure Plasma-catalytic CO2 Methanation Process International conference

    K. Koga, A. Yamamoto, K. Kamataki, N. Itagaki, M. Shiratani

    AVS 66th International Symposium & Exhibition  2019.10 

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    Event date: 2019.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • Non-equilibrium nanoparticle composite film process using reactive plasmas (Invited) Invited International conference

    K. Koga, M. Shiratani

    Advanced Metallization Conference 2019: 29th Asian Session (ADMETA Plus 2019)  2019.10 

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    Event date: 2019.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Ar+CH4プラズマCVDを用いて堆積した水素化アモルファスカーボン薄膜の堆積特性に対する電極基板間距離依存性

    古閑一憲, Sung Hwa Hwang, 鎌滝晋礼, 板垣奈穂, 白谷正治

    2019年度(第72回)電気・情報関係学会九州支部連合大会  2019.9 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州工業大学   Country:Japan  

  • プラズマ生成前駆体制御による単分散ナノ粒子合成

    古閑 一憲, 鎌滝 晋礼, 白谷 正治

    2019年第80回応用物理学会秋季学術講演会  2019.9 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • Plasmas - from Laboratory to Table - (Invited) Invited International conference

    K. Koga, M. Shiratani

    The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  2019.9 

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    Event date: 2019.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • Synthesis and deposition of a-C:H nanoparticles using reactive plasmas with a fast gas flow International conference

    K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, M. Shiratani

    The Korea-Japan Workshop on Dust Particles in Plasmas  2019.8 

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    Event date: 2019.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • Sputter deposition of wide bandgap (ZnO)x(AlN)1-x alloys: a new material system with tunable bandgap International conference

    S. Urakawa, N. Miyahara, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

    XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10)  2019.7 

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    Event date: 2019.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Growth Mechanism of Carbon Nanoparticles In Multi-Hollow Discharge Plasma Chemical Vapor Deposition (Invited) Invited International conference

    K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki M. Shiratani

    XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10)  2019.7 

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    Event date: 2019.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • マルチホロー放電プラズマCVD法による高品質SiN膜の低温(100度)形成

    永石翔大, 佐々木勇輔, 鎌滝晋礼, 板垣奈穂, 古閑一憲, 白谷正治

    令和元年度日本表面真空学会 九州支部学術講演会(九州表面・真空研究会2019)  2019.6 

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    Event date: 2019.6

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡大学   Country:Japan  

  • Deposition of Carbon Nanoparticles Using Multi-Hollow Discharge Plasma CVD for Synthesis of Carbon Nanoparticle Composite Films International conference

    K. Koga, S. H. Hwang, T. Nakatani, J. S. Oh, K. Kamataki, N. Itagaki, M.Shiratani

    46th International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2019)  2019.5 

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    Event date: 2019.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • 微粒子プラズマにおける2体衝突運動の顕微高速観察

    古閑一憲, 大友洋, 真銅雅子, 鎌滝晋礼, 板垣奈穂, 白谷正治

    日本物理学会第74回年次大会(2019年)  2019.3 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • Spatial Profile of RONS Dose Supplied by a Scalable DBD Device International conference

    K. Koga, Y. Wada, R. Sato, R. Shimada, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, T. Kawasaki

    The 3rd Asian Applied Physics Conference  2018.12 

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    Event date: 2018.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • カイワレ大根種皮の色素に対するプラズマ照射の効果

    古閑一憲, 嶋田凌太郎, 和田陽介, 佐藤僚哉, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治, Vida Mildaziene

    第35回プラズマ・核融合学会年会  2018.12 

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    Event date: 2018.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大阪大学   Country:Japan  

  • Evaluation of Amount of RONS Transport and Absorption of Seeds International conference

    K. Koga, Y. Wada, R. Sato, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani

    2018 MRS Fall Meeting & Exhibit  2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • Innovative Agricultural Productivity Improvement Using Atmospheric Pressure Plasmas (Invited) Invited International conference

    K. Koga, M. Shiratani

    2018 MRS Fall Meeting & Exhibit  2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • 反応性プラズマとナノ粒子相互作用ゆらぎネットワーク解析

    古閑一憲

    第34回九州・山口プラズマ研究会  2018.11 

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    Event date: 2018.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:シーサイドホテル屋久島, 鹿児島   Country:Japan  

  • Synthesis of Hydrogenated Amorphous Carbon Nanoparticles using High-Pressure CH4+Ar Plasmas and Their Deposition International conference

    K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, T. Nakatani, M. Shiratani

    AVS 65th International Symposium & Exhibition  2018.10 

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    Event date: 2018.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • プラズマ中二体微粒子の衝突解析による相互作用揺らぎの研究

    古閑一憲, 大友洋, 周靭, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治

    2018年第79回応用物理学会秋季学術講演会  2018.9 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋国際会議場   Country:Japan  

  • Siネットワーク秩序性に対する製膜前駆体の効果

    古閑一憲, 田中和真, 原尚志, 石榴, 中野慎也, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治

    2018年第79回応用物理学会秋季学術講演会  2018.9 

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    Event date: 2018.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋国際会議場   Country:Japan  

  • Effects of cluster deposition on spatial profile of Si-Hx bond density in a-Si:H films International conference

    K. Koga, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani

    2018 International Conference on Solid State Devices and Materials (SSDM2018)  2018.9 

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    Event date: 2018.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Challenge to precise control of chemical bond configuration in plasma CVD films International conference

    K. Koga, M. Shiratani

    RUB Japan Science Days 2018  2018.7 

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    Event date: 2018.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • Control of synthesis and deposition of nanoparticles using a multi-hollow discharge plasma CVD International conference

    K. Koga, M. Shiratani

    Workshop "Plasma surface interaction for technological applications"  2018.6 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • High energy leverage method on growth enhancement of bio-mass plants using plasma seed treatment International conference

    K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    7th International Conference on Plasma Medicine (ICPM-7)  2018.6 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • A deep insight of plasma-nanoparticle interaction Invited International conference

    K. Koga, K. Kamataki, N. Itagaki, M. Shiratani

    19th International Congress on Plasma Physics  2018.6 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Canada  

  • 水素原子源付プラズマCVD法に任意電圧波形を併用したa-C:H薄膜の堆積

    古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治

    第65回応用物理学会春季学術講演会  2018.3 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • 大気圧空気誘電体バリア放電プラズマを照射したカイワレ種子の電子スピン共鳴分光

    古閑一憲, 和田陽介, 佐藤僚哉, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治

    第65回応用物理学会春季学術講演会  2018.3 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • 任意電圧波形を用いたC7H8+Ar+H2プラズマ生成

    古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治

    平成30年電気学会全国大会  2018.3 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • Effects of RONS Dose on Plasma Induced Growth Enhancement of Radish Sprout International conference

    K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    2nd International Workshop On Plasma Agriculture (IWOPA2)  2018.3 

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    Event date: 2018.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Plasma Enhanced Carbon Recycling for Large-Scale Introduction of Solar Cells to Energy Supply Chain Invited International conference

    K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    5th Korea-Japan Joint Symposium on Advanced Solar Cells 2018, 2nd International Symposium on Energy Research and Application  2018.2 

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    Event date: 2018.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • Towards ultra-high capacity batteries International conference

    K. Koga, G. Uchida, M. Shiratani

    Joint workshop btw SKKU and Kyushu University Emerging materials and devices  2018.1 

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    Event date: 2018.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • A new insight into nanoparticle-plasma interactions (Invited) Invited International conference

    K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani

    JP-KO dust workshop  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • Evaluation of coupling among interaction fluctuations in nanoparticle growth in reactive plasmas International conference

    K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani

    18th Workshop on Fine Particle Plasmas  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Deposition of High Quality Silicon Thin Films Utilizing Nanoparticles Trapped in Plasmas International conference

    K. Koga, T. Kojima, S. Toko, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    27th annual meeting of MRS-J  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Effects of Number Density of Seeds on Plasma Induced Plant Growth Enhancement International conference

    K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    27th annual meeting of MRS-J  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Effects of Gas Flow Velocity on Plant Growth of Radish Sprout International conference

    K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    The 2nd Asian Applied Physics Conference (Asian-APC)  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 植物種子へのプラズマ照射効果による成長促進とその機序(シンポジウム講演) Invited

    古閑一憲, 白谷正治

    2017.11 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:姫路商工会議所   Country:Japan  

  • Development of a fine particle transport analyzer for processing plasmas International conference

    K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    The 39th International Symposium on Dry Process (DPS 2017)  2017.11 

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    Event date: 2017.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 反応性プラズマを用いた物質機能の初期階層形成

    古閑一憲

    第33回九州・山口プラズマ研究会  2017.11 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎にっしょうかん   Country:Japan  

  • Surface-driven CH4 generation from CO2 in Low-pressure Non-thermal Plasma International conference

    K. Koga, S. Toko, S. Tanida, M. Shiratani

    American Vacuum Society 64th International Symposium and Exhibition (AVS64)  2017.10 

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    Event date: 2017.10 - 2017.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • 火星上CO2のCH4資源化のための低温低圧プラズマ触媒プロセス

    古閑一憲, 都甲将, 谷田知史, 白谷正治, 細田聡史, 星野健

    第61回宇宙科学技術連合講演会  2017.10 

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    Event date: 2017.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:朱鷺メッセ, 新潟   Country:Japan  

  • スケーラブルDBDプラズマのRONS照射量に対する空気流れの効果

    古閑一憲, 和田陽介, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治

    平成29年度(第70回)電気・情報関係学会九州支部連合大会  2017.9 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:琉球大学   Country:Japan  

  • Hysteresis in Plasma CVD: a new path for high quality film deposition Invited International conference

    K. Koga, S. Toko, M. Shiratani

    11th Asian-European International Conference on Plasma Surface Engineering (AEPSE2017)  2017.9 

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    Event date: 2017.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • プラズマ照射した種籾への催芽処理の効果

    古閑一憲, 和田陽介, 徐鉉雄, 板垣奈穂, 白谷正治, 橋本昌隆, 小島昌治

    第78回応用物理学会秋季学術講演会  2017.9 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡国際会議場, 福岡国際センター   Country:Japan  

  • Synthesis of Nanoparticles Using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body (Invited) Invited International conference

    K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani

    231st Meeting of Electrochemical Society (ECS)  2017.5 

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    Event date: 2017.5 - 2017.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • 低温プラズマによるナノ粒子の合成と太陽電池への応用

    古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治

    電子情報通信学会有機エレクトロニクス研究会  2017.4 

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    Event date: 2017.4

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:龍郷町生涯学習センター(鹿児島県奄美大島)   Country:Japan  

  • Corrational study of fluctuation of coupling between plasmas and nanoparticles International conference

    K. Koga, K. Mori, H. Seo, N. Itagaki, M. Shiratani

    9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017)  2017.3 

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    Event date: 2017.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Long-term evaluation of In nanoparticle transport in living body International conference

    K. Koga, A. Tanaka, M. Hirata, T. Amano, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani

    9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017)  2017.3 

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    Event date: 2017.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Comparision of Gamma irradation and scalable DBD on the declorization of Dyes International conference

    K. Koga, P. Attri, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani

    9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017)  2017.3 

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    Event date: 2017.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 九州大学における反応性プラズマ精密制御CVD法の紹介(招待講演) Invited

    古閑一憲

    第1回産学共同研究検討会  2017.1 

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    Event date: 2017.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • Time evolution of cross-correlation between two fluctuations of couplings between plasmas and nanoparticles in amplitude modulated discharges International conference

    K. Koga, K. Mori, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani

    17th Workshop on Fine Particle Plasmas and JAPAN-KOREA Workshop on Dust Particles 2016  2016.12 

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    Event date: 2016.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Dependence of amount of plasma activated water on growth enhancement of radish sprout International conference

    K. Koga, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani

    26th annual meeting of MRS-J  2016.12 

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    Event date: 2016.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Comparative study on death of cells irradiated by non-thermal plasma, X-ray, and UV International conference

    K. Koga, T. Amano, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, A. Tanaka, Y. Nakatsu, T. Kondo

    The 1st Asian Applied Physics Conference (Asian-APC)  2016.12 

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    Event date: 2016.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 小型ダスト飛跡分析装置を用いたミラー上ダスト堆積抑制の検討

    古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男

    第33回プラズマ・核融合学会年会  2016.12 

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    Event date: 2016.11 - 2016.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東北大学   Country:Japan  

  • プラズマCVDを用いた高効率低劣化Si薄膜太陽電池の作製(招待講演) Invited

    古閑一憲

    第33回プラズマ・核融合学会年会  2016.11 

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    Event date: 2016.11 - 2016.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東北大学   Country:Japan  

  • プラズマとナノ粒子の相互作用ゆらぎの2次元空間構造の時間発展

    古閑一憲, 森研人, 徐鉉雄, 板垣奈穂, 白谷正治

    第33回プラズマ・核融合学会年会  2016.11 

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    Event date: 2016.11 - 2016.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東北大学   Country:Japan  

  • プラズマ計測・診断 -反応性プラズマ中微粒子を中心として- (招待講演) Invited

    古閑一憲

    第27回プラズマエレクトロニクス講習会  2016.11 

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    Event date: 2016.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京大学   Country:Japan  

  • Control of Plant Growth by RONS Produced Using Nonthermal Atmospheric Air Plasma International conference

    K. Koga, T. Sarinont, M. Shiratani

    American Vacuum Society 63rd International Symposium and Exhibition (AVS63)  2016.11 

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    Event date: 2016.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • Comparative study of non-thermal atmospheric pressure discharge plasmas for life science applications International conference

    K. Koga, R. Katayama, T. Sarinont, H. Seo, N. Itagaki, P. Attri, E. L. Quiros, .A. Tanaka, M. Shiratani

    69th Annual Gaseous Electronics Conference (GEC2016)  2016.10 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • 火星上でのロケット燃料生成を目的とした低温低圧放電プラズマによるサバティエ反応

    古閑一憲, 都甲将, 白谷正治

    第60回宇宙科学技術連合講演会  2016.9 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:函館アリーナ   Country:Japan  

  • Time development of response of cells irradiated by non-thermal atmospheric air plasma International conference

    K. Koga, T. Amano, Y. Nakatsu, H. Seo, N. Itagaki, A. Tanaka, T. Kondo, M. Shiratani

    6th International Conference on Plasma Medicine (ICPM6)  2016.9 

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    Event date: 2016.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • Nitrite concentration of plants grown from seeds irradiated by air dielectric barrier discharge plasmas International conference

    K. Koga, T. Sarinont, P. Attri, M. Shiratani

    20th International Vacuum Congress (IVC-20)  2016.8 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • QCMを用いたLHD内ダスト堆積量のその場測定

    古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, LHD実験グループ

    第11回核融合エネルギー連合講演会  2016.7 

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    Event date: 2016.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • プラズマ中微粒子を用いたプラズマポテンシャルゆらぎの評価

    古閑一憲, 添島雅大, 伊藤鉄平, 徐鉉雄, 板垣奈穂, 白谷正治

    日本物理学会第71回年次大会  2016.3 

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    Event date: 2016.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東北学院大学   Country:Japan  

  • 「プラズマ材料科学の未来を語る」(低圧非平衡プラズマプロセス) (招待講演) Invited

    古閑一憲

    第125回研究会 APSPT9-SPSM28サテライトミーティング『プラズマ材料科学の未来を語る』  2016.2 

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    Event date: 2016.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:JR博多シティ会議室   Country:Japan  

  • 振幅変調反応性高周波放電中のナノ粒子量のバイスペクトル解析

    古閑一憲

    応用力学研究所共同研究報告会  2016.2 

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    Event date: 2016.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学応用力学研究所   Country:Japan  

  • 大気圧非平衡プラズマの基礎 (招待講演) Invited

    古閑一憲

    プラズマ・核融合学会第28回専門講習会「プラズマ医療の現状と展望」  2016.1 

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    Event date: 2016.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • Potential fluctuation evaluation using binary collision of fine particles suspended in plasmas (Invited) Invited

    K. Koga and M. Shiratani

    2015.12 

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    Event date: 2015.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 液中プラズマを用いたAuとPtナノ粒子の簡易作製法

    古閑一憲, 天野孝昭, Thapanut Sarinont, 徐鉉雄, 板垣奈穂, 白谷正治, 中津可道, 平田美由紀, 田中昭代

    平成27年度応用物理学会九州支部学術講演会  2015.12 

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    Event date: 2015.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:琉球大学   Country:Japan  

  • プラズマ中のクーロン衝突微粒子間引力

    古閑一憲, 添島雅大, 伊東鉄平, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 野口将之, 内田誠一

    第32回プラズマ・核融合学会 年会  2015.11 

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    Event date: 2015.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  • 新しいプラズマプロセス技術を用いた薄膜堆積

    古閑一憲, 田浪荘汰, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治

    接合科学共同利用・共同研究拠点 大阪大学接合科学研究所 平成27年度 共同研究成果発表会  2015.11 

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    Event date: 2015.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大阪大学接合科学研究所   Country:Japan  

  • Effects of Ion Energy on Chemical Bond Configuration in a-C:H Deposited using Ar + H2+ C7H8 Plasma CVD International conference

    K. Koga, X. Dong, K. Yamaki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara

    37th International Symposium on Dry Process (DPS2015)  2015.11 

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    Event date: 2015.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Interactions between spin trapping reagents and non-thermal air DBD plasmas International conference

    K. Koga, T. Amano, T. Sarinont, T. Kondo, S. Kitazaki, Y. Nakatsu, A. Tanaka, M. Shiratani

    37th International Symposium on Dry Process (DPS2015)  2015.11 

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    Event date: 2015.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • プラズマ照射に対する生体応答の研究

    古閑一憲

    第31回 九州・山口プラズマ研究会  2015.11 

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    Event date: 2015.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:COCOLAND SPORTS&RESORT, 山口   Country:Japan  

  • Improving of Harvest Period and Crop Yield of Arabidopsis Thaliana L. using Nonthermal Atmospheric Air Plasma International conference

    K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, M. Shiratani

    American Vacuum Society 62nd International Symposium and Exhibition (AVS)  2015.10 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • Two Dimentional Visualization of Oxidation Effect of Scalable DBD Plasma Irradiation using KI-starch Solution International conference

    K. Koga, T. Amano, T. Sarinont, T. Kawasaki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Y. Nakatsu, A. Tanaka

    American Vacuum Society 62nd International Symposium and Exhibition (AVS)  2015.10 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water International conference

    K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani

    ICRP9/GEC68/SPP33  2015.10 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • In vivo kinetics of nanoparticles synthesized by plasma in water (Invited) Invited International conference

    K. Koga, T. Amano, M. Hirata, A. Tanaka, M. Shiratani

    The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials  2015.10 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • In-situ laser Raman spectroscopy of an optically trapped fine particle International conference

    K. Koga, M. Soejima, K. Tomita, T. Ito, H. Seo, N. Itagaki, M. Shiratani

    17th International Symposium on Laser-Aided Plasma Diagnostics (LAPD17)  2015.9 

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    Event date: 2015.9 - 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Control Of Nanoprticle Transport And Their Deposition For Porous Low-k Films By Using Plasma Pertubation (Invited) Invited International conference

    K. Koga and M. Shiratani

    The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015)  2015.9 

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    Event date: 2015.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • アルゴンプラズマ中微粒子運動の画像解析によるプラズマパラメータ評価

    古閑一憲, 添島雅大, 徐鉉雄, 板垣奈穂, 白谷正治, 内田誠一

    日本物理学会 2015年秋季大会  2015.9 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:関西大学   Country:Japan  

  • 反応性プラズマ中ナノ粒子とラジカルの非線形結合成分の時空間解析

    古閑一憲, 伊東鉄平, 徐鉉雄, 板垣奈穂, 白谷正治

    日本物理学会 2015年秋季大会  2015.9 

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    Event date: 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:関西大学   Country:Japan  

  • 大気圧非平衡プラズマ照射による液中ラジカル生成の相関解析(招待講演) Invited

    古閑一憲

    新学術領域研究 プラズマ・ナノマテリアル動態学の創成と安全安心医療科学の構築 第21回医工連携ゼミ  2015.4 

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    Event date: 2015.4

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • 非平衡プラズマスパッタリングによる高速低温層交換結晶成長

    古閑一憲, 市田大樹, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治

    日本物理学会第70回年次大会  2015.3 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • ラットに皮下投与したInナノ粒子の体内輸送

    古閑一憲, 天野孝昭, 平田美由紀, 田中昭代, 白谷正治

    第62回応用物理学会春季学術講演会  2015.3 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  • 水素化アモルファスシリコン薄膜中Si-H2結合生成に対するクラスタ混入とラジカル表面反応の寄与

    古閑一憲, 都甲将, 鳥越祥宏, 毛屋公孝, 徐鉉雄, 板垣奈穂, 白谷 正治

    第62回応用物理学会春季学術講演会  2015.3 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  • スパッタを用いた低温高速層交換Ge結晶成長に対する基板温度の効果

    古閑一憲, 市田大樹, 橋本慎史, 徐鉉雄, 山下大輔, 板垣奈穂, 白谷正治

    第62回応用物理学会春季学術講演会  2015.3 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  • プロセシングプラズマを用いたIV族半導体ナノ粒子の作製と太陽電池への応用(招待講演) Invited

    古閑一憲, 内田儀一郎, 徐鉉雄, 白谷正治

    平成26年度 東北大学電気通信研究所共同プロジェクト研究会「プラズマナノバイオ・医療の基礎研究」  2015.2 

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    Event date: 2015.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東北大学   Country:Japan  

  • Temporal development of nonlinear coupling between radicals and nanoparticles in reactive plasmas (Invited) Invited International conference

    K. Koga, T. Ito, H. Seo, N. Itagaki, and M. Shiratani

    The 75th IUVSTA Workshop on Sheath Phenomena in Plasma Processing of Advanced Materials  2015.1 

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    Event date: 2015.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Slovenia  

  • Cluster suppressed deposition of a-Si:H films by employing non-linear phenomena in reactive plasmas (Invited) Invited International conference

    K. Koga, S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, M. Shiratani

    2015 Japan-Korea Joint Symposium on Advanced Solar Cells  2015.1 

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    Event date: 2015.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 大気圧空気プラズマを照射したカイコの成長

    古閑一憲, サリノントタパナット, 天野孝昭, 白谷正治

    第24回日本MRS年次大会  2014.12 

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    Event date: 2014.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜市開港記念会館   Country:Japan  

  • プラズマ技術の生体・環境分野への応用研究

    古閑一憲

    九州大学テクノロジーフォーラム2014  2014.12 

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    Event date: 2014.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京国際フォーラム   Country:Japan  

  • プラズマ照射によるシロイヌナズナの植物成長促進の世代間伝搬

    古閑一憲, サリノントタパナット, 北﨑訓, 林信哉, 白谷正治

    第30回 九州・山口プラズマ研究会  2014.11 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:ラグナガーデンホテル、沖縄   Country:Japan  

  • Analysis of coupling between nanoparticles and radicals using perturbation of radical density in reactive plasmas International conference

    K. Koga, T. Ito, H. Seo, N. Itagaki, M. Shiratani

    Plasma Conference 2014  2014.11 

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    Event date: 2014.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Effects of amplitude modulated VHF discharge on coupling between plasmas and nanoparticles International conference

    K. Koga, T. Ito, K. Kamataki, H. Seo, N. Itagaki, and M. Shiratani

    24th International Toki Conference  2014.11 

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    Event date: 2014.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Spatiotemporal Analysis of Nanoparticle Growth in Amplitude Modulated Reactive Plasmas for Understanding Interactions between Plasmas and Nanomaterials (Invited) Invited International conference

    K. Koga, Y. Morita, T. Ito, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani

    15th IUMRS-International Conference in Asia  2014.8 

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    Event date: 2014.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 太陽電池開発の最前線

    古閑一憲

    2014年度先端サマーセミナー(第6回研究活動交流会)  2014.8 

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    Event date: 2014.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • Quartz crystal microbalance measurements for in-situ evaluation of dust inventory in fusion devices International conference

    K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group

    26th Symposium on Plasma Physics and Technology  2014.6 

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    Event date: 2014.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • Real time mass measurement of dust particles deposited on vessel wall using quartz crystal microbalances in a divertor simulator International conference

    K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group

    21th International Conference on Plasma Surface Interactions (PSI2014)  2014.5 

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    Event date: 2014.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Effects of non-thermal air plasma irradiation to plant seeds on glucose concentration of plants International conference

    K. Koga, T. Sarinont, T. Amano, and M. Shiratani

    International Workshop on Diagnostics and Modelling for Plasma Medicine (DMPM2014)  2014.5 

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    Event date: 2014.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • コンビナトリアル細胞活性解析を用いた細胞超活性プラズマの創成 (招待講演) Invited

    古閑一憲

    第8回レーザー学会「レーザーバイオ医療」技術専門委員会  2014.3 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:沖縄科学技術大学院大学   Country:Japan  

  • プラズマプロセス技術の最近の応用展開 (招待講演) Invited

    古閑一憲

    プラズマ・核融合学会九州・沖縄・山口支部 平成25年度第3回特別講演会  2014.2 

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    Event date: 2014.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:佐世保工業高等専門学校   Country:Japan  

  • Coupling between radicals in plasmas and nanoparticle growth in initial growth phase in reactive plasmas with amplitude modulation International conference

    K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida and M. Shiratani

    18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics  2014.2 

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    Event date: 2014.2

    Language:English   Presentation type:Symposium, workshop panel (public)  

    Country:Japan  

  • Fabrication of highly stable a-Si:H solar cells by suppressing cluster incorporation (Invited) Invited International conference

    K. Koga, Y. Hashimoto, S. Toko, D. Yamashita, Y. Torigoe, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani

    2014 Japan-Korea Joint Symposium on Advanced Solar Cells  2014.2 

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    Event date: 2014.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited) Invited International conference

    K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani

    8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31)  2014.2 

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    Event date: 2014.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited) Invited International conference

    K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani

    8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31)  2014.2 

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    Event date: 2014.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • プラズマ技術およびその応用可能性について (招待講演) Invited

    古閑一憲

    平成25年度次世代テクノロジーセミナー  2014.1 

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    Event date: 2014.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:リファレンス駅東ビル, 福岡   Country:Japan  

  • Correlation between Plasma Fluctuation and Nanoparticle Amount in Initial Growth Phase in Reactive Plasmas with Amplitude Modulation

    K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani

    14th Workshop on Fine Particle Plasmas  2013.12 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Quantum dot sensitized solar cells using group IV semiconductor nanoparticles (Invited) Invited International conference

    K. Koga, G. Uchida, D. Ichida, S. Hashimoto, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani

    2013 EMN Fall Meeting  2013.12 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Other  

  • ナノ粒子成長に対するプラズマ摂動周波数の効果

    古閑一憲, 森田康彦, 岩下伸也, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治

    プラズマ・核融合学会 第30回年会  2013.12 

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    Event date: 2013.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京工業大学   Country:Japan  

  • Deposition of Ge Nanoparticle Films and Their Application to Ge Quantum-dot Sensitized Solar Cells International conference

    K. Koga, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani

    The 23rd International Photovoltaic Science and Engineering Conference  2013.11 

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    Event date: 2013.10 - 2013.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

  • Carbon Nanostructure formed by high pressure methane plasmas

    K. Koga, S. Iwashita, G. Uchida, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, U. Czarnetzki

    The 26th Symposium on Plasma Science for Materials (SPSM-26)  2013.9