さきがけ「太陽光と光電変換機能」研究領域　総括賞

2015.1   独立行政法人科学技術振興機構「太陽光と光電変換機能」研究領域   さきがけ「太陽光と光電変換機能」領域の研究推進

プラズマ材料科学賞（奨励部門）

2013.8   学振 153委員会   スパッタリングにおけるZnO膜の結晶成長制御とグリーンデバイスへの展開

Outstanding Poster Award

2013.8   the 9th Asian-European International Conference on Plasma Surface Engineering 2013  

International Symposium on Sputtering and Plasma Processes 2013; Poster Award

2013.7   International Symposium on Sputtering and Plasma Processes  

11th APCPST "Advanced Plasma Application Award"

2012.10   11th Asia Pacific Conference on Plasma Science adn Technology (APCPST) & 25th Symposium on Plasma Science for Materials (SPSM)  

Award for Encouragement of Research in Materials Science

2012.9   IUMRS-ICEM2012  

IUMRS-ICEM2012 "Young Scientist Awards: Silver Award Winners"

2012.9  

Best Poster Presentation Award

2012.3   th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials  

ISPlasma2012 "Best Presentation Award"

2012.3   ISPlasma2012  

Epitaxial Growth of Zn1-xMgxO Films on Sapphire Substrates via Inverted Stranski-Krastanov Mode Using Magnetron Sputtering Reviewed International journal

D. Takahashi, N. Yamashita, D. Yamashita, T. Okumura, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

MRS Adv.   7 ( 20 )   415 - 419   2022.2   （ ISSN:2731-5894 eISSN:2059-8521 ）

Nanostructured Ge and GeSn Films by Highpressure He Plasma Sputtering for High-capacity Li ion Battery Anodes Reviewed International journal

G. Uchida, K. Nagai, Y. Habu, J. Hayashi, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara

Sci. Rep.   12 ( 1 )   1742   2022.2   （ ISSN:2045-2322 eISSN:2045-2322 ）

Performances of Carbon Black-Titanium nitrate and Carbon Black-Titanium/Triton X-100 Composite Polymer Counter Electrodes for Dye-Sensitized Solar Cells Reviewed International journal

F. L. Chawarambwa, T. E. Putri, A. Pankaj, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Adv. Mater. Res.   1168   2022.1

Improved luminescence performance of Yb3+-Er3+-Zn2+: Y2O3 phosphor and its application to solar cells Reviewed International journal

F. L. Chawarambwa, T. E. Putri, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, K. Koga, D. Nakamura. M. Shiratani

Optical Materials   123   2022.1   （ ISSN:0925-3467 eISSN:1873-1252 ）

Plasma Treatment Effect on the Paramagnetic Species of Barley Seed Radical’s Intensity: An EPR study Reviewed International journal

2021.12

Plasma Treatment Effect on the Paramagnetic Species of Barley Seed Radical’s Intensity: An EPR study Reviewed International journal

10 ( 3 )   2021.12

Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries Reviewed International journal

J.Hayashi, K. Nagai, Y.Habu, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara, G. Uchida

Jpn. J. Appl. Phys.   61 ( SA )   2021.12   （ ISSN:0021-4922 eISSN:1347-4065 ）

Performance Characteristics of Bifacial Dye-Sensitized Solar Cells with a V-Shaped Low-Concentrating Light System Reviewed International journal

T. E. Putri, F. L Chawarambwa, M. K. Son, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

ACS Appl. Energy Mater.   4 ( 12 )   2021.11

Effects of concentrated light on the performance and stability of a quasi-solid electrolyte in dye-sensitized solar cells Reviewed International journal

F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Chem. Phys. Lett.   781   2021.10

Transport of Nanoparticles in Afterglow Region Using Multi-Hollow Discharge Plasma CVD Reviewed International journal

K. Koga, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani

Bull. Am. Phys. Soc.   66 ( 7 )   2021.10

Passivating antireflection coating of crystalline silicon using i/n a-Si:H/SiN trilayer Reviewed International journal

J Phys Chem Solids   156   2021.9

Comparison between Ar+CH4 Cathode and Anode Coupled Capacitively Coupled Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Films Reviewed International journal

S. H. Hwang, R. Iwamoto, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani

Thin Solid Films   729   2021.7

Sputtering Growth of Metal Oxynitride Semiconductors for Excitonic Devices Reviewed International journal

R. Narishige, N. Itagaki, M. Shiratani

5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)   2021.5

Highly efficient and transparent counter electrode for application in bifacial solar cells Reviewed International journal

F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Chem. Phys. Lett.   768   2021.4

Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells Reviewed International journal

F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura

J. Mol. Struct.   1228   2021.3

Effects of Activated Carbon Counter Electrode On Bifacial Dye Sensitized Solar Cells (DSSCs) Reviewed International journal

T. E. Putri, Y. Hao, F. L. Chawarambwa, H. Seo, Min-Kyu Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Mater. Sci. Forum   1016   2021.1

Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method Reviewed International journal

S. H. Hwang, K. Koga, Y. Hao, P. Attri, T. Okumura, K. Kamataki, N. Itagaki, M. Shiratani, J-S. Oh, S. Takabayashi, T. Nakatani

Processes   9 ( 1 )   2020.12

Graphene-Si3N4 nanocomposite blended polymer counter electrode for low-cost dye-sensitized solar cells Reviewed International journal

F. L. Chawarambwa, T. E. Putri, M. K. Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Chem. Phys. Lett.   758   2020.11

Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition Reviewed International journal

S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Diam Relat Mater   109   2020.11

Impact of surface morphologies of substrates on the epitaxial growth of magnetron sputtered (ZnO)x(InN)1-x films Reviewed International journal

R. Narishige, K. Kaneshima, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

Jpn. J. Appl. Phys.   60 ( SA )   2020.10

Low stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition Reviewed International journal

S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani

Jpn. J. Appl. Phys.   59 ( 10 )   2020.10

Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition Reviewed International journal

N. Itagaki, Y. Nakamura, R. Narishige, K. Takeda, K. Kamataki, K. Koga, M. Hori, M. Shiratani

Sci. Rep.   10   2020.3

Impact of radish sprouts seeds coat color on the electron paramagnetic resonance signals after plasma treatment Reviewed International journal

K. Koga, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene

Jpn. J. Appl. Phys.   59 ( SH )   2020.3

Improved Nanoscale Al-doped ZnO with a ZnO Buffer Layer Fabricated by Nitrogen-mediated Crystallization for Flexible Optoelectronic Devices Reviewed International journal

I. Suhariadi, N. Itagaki, M. Shiratani

ACS Appl. Nano Mater.   3   2020.2

Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD Reviewed International journal

K. Tanaka, H. Hara, S. Nagaishi, L. Shi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Plasma Fusion Res.   14   2019.9

Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma Reviewed International journal

R. Zhou, K. Kamataki, H. Ohtomo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Plasma Fusion Res.   14   2019.9

Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition Reviewed International journal

S. H. Hwang, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Plasma Fusion Res.   14   2019.9

Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films Reviewed International journal

L. Shi, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Plasma Fusion Res.   14   2019.9

Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate Reviewed International journal

N. Miyahara, S. Urakawa, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

MRS Adv.   4 ( 27 )   1551 - 1556   2019.1

Effects of nitrogen impurity on zno crystal growth on Si substrates Reviewed International journal

S. Muraoka, L. Jiahao, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

MRS Adv.   4 ( 27 )   1557 - 1563   2019.1

Photoluminescence of (ZnO)0.82 (InN)0.18 films: Incident light angle dependence Reviewed International journal

N. Miyahara, K. Iwasaki, D. Yamashita, D. Nakamura, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Mater. Sci. Forum   941   2099 - 2103   2018.12

Cross-correlation analysis of fluctuations of interactions between nanoparticles and low pressure reactive plasmas Reviewed International journal

R. Zhou, K. Mori, H. Ohtomo, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Mater. Sci. Forum   941   2104 - 2108   2018.12

Effects of sputtering pressure on (ZnO)x(InN)1-x crystal film growth at 450ºC Reviewed International journal

941   2093 - 2098   2018.12

The effect of the H2/(H2+Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition Reviewed International journal

T. Fang, K. Yamaki, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka,Y. Setsuhara

Thin Solid Films   660   891 - 898   2018.8

Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition Reviewed International journal

T. Kojima, S. Toko, K. Tanaka, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Plasma Fusion Res.   13   1406082   2018.6

Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction Reviewed International journal

H. Seo, D. Sakamoto, H. Chou, N. Itagaki, K. Koga, M. Shiratani

Progress in Photovoltaics: Research and Applications   26 ( 2 )   2018.2

色素増感太陽電池のポリマー対向電極における触媒反応の活性化 Invited

徐鉉雄, 板垣奈穂, 古閑一憲, 白谷正治

信学技報 (IEICE Technical Report)   117 ( 334 )   2017.12

Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition Reviewed International journal

S. Tanami, D. Ichida, S. Hashimoto, H. Seo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Thin Solid Films   641   2017.11

Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition Reviewed International journal

S. Toko, K. Keya, Y. Torigoe, T. Kojima, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Surf. Coat. Technol.   326 ( Part B )   2017.10

Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst Reviewed International journal

H. Seo, C. V.V.M. Gopi, H.-J. Kim, N. Itagaki, K. Koga, M. Shiratani

Electrochimica Acta   249   2017.9

Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body Reviewed International journal

K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani

ECS Transactions   77 ( 3 )   2017.5

低温プラズマによるナノ粒子の合成と太陽電池への応用

古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治

信学技報 (IEICE Technical Report)   117 ( 8 )   2017.4

Densities and surface reaction probabilities of oxygen and nitrogen atoms during sputter deposition of ZnInON on ZnO Reviewed International journal

K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

IEEE Trans. Plasma Science   45 ( 2 )   2017.2

Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization Reviewed International journal

K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

MRS Adv.   2 ( 5 )   2016.12

Blue Photoluminescence of (ZnO)0.92(InN)0.08 Reviewed International journal

K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

MRS Adv.   2 ( 5 )   2016.12

Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication Reviewed International journal

M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga

Materials Science Forum   879   2016.11

Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method Reviewed International journal

S. Toko, Y. Kanemitsu, H. Seo, N. Itagaki, K. Koga, M. Shiratani

J. Nanosci. Nanotechnol.   16 ( 10 )   2016.10

Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells Reviewed International journal

H. Seo, M. K. Son, S. Hashimoto, T. Takasaki, N. Itagaki, K. Koga, M. Shiratani

Electrochimica Acta   210   2016.8

Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells Reviewed International journal

H. Seo, S. H. Nam, N. Itagaki, K. Koga, M. Shiratani, and J.-H. Boo

Electron. Mater. Lett.   12 ( 4 )   2016.7

Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells Reviewed International journal

55 ( 7S2 )   2016.7

Optoelectronic properties of valence-statecontrolled amorphous niobium oxide Reviewed International journal

J. Phys.: Condens. Matter   28 ( 25 )   2016.5

Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2 Reviewed International journal

H. Seo, D. Ichida, S. Hashimoto, N. Itagaki, K. Koga, M. Shiratani, S. H. Nam and J. H. Boo

J. Nanosci. Nanotechnol.   16 ( 5 )   2016.5

Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition Reviewed International journal

H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani

Sci. Adv. Mater.   8 ( 3 )   2016.3

Polymer Counter Electrode of Poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) Containing TiO2 Nano-particles for Dye-sensitized Solar Cells Reviewed International journal

H. Seo, M.-K. Son, N. Itagaki, K. Koga, M. Shiratani

Journal of Power Sources   307   2016.3

Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering Reviewed International journal

K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

MRS Advances   1 ( 2 )   2016.1

Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method Reviewed International journal

X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

Jpn. J. Appl. Phys.   55 ( 1S )   2016.1

Effects of Gas Flow Rate on Deposition Rate and Amount of Si Clusters Incorporated into a-Si:H Films Reviewed International journal

S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, and M. Shiratani

Jpn. J. Appl. Phys.   55 ( 1S )   2016.1

Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.) Reviewed International journal

K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, N. Hayashi, M. Shiratani

Appl. Phys. Express   9 ( 1 )   2015.12

水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価

白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ

九州大学超顕微解析研究センター報告   39   2015.12

Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body Reviewed International journal

T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Attraction during binary collision of fine particles in Ar plasma Reviewed International journal

M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas Reviewed International journal

S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas Reviewed International journal

T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter Reviewed International journal

R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds Reviewed International journal

T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Effects of electrode structure on characteristics of multi-hollow discharges Reviewed International journal

Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering Reviewed International journal

S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Laser trapped single fine particle as a probe of plasma parameters Reviewed International journal

D. Yamashita, M. Soejima, T. Ito, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization Reviewed International journal

T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films Reviewed International journal

K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films Reviewed International journal

T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD Reviewed International journal

X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells Reviewed International journal

K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water Reviewed International journal

K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode Reviewed International journal

H. Seo, S. Hashimoto, D. Ichida, N. Itagaki, K. Koga and M. Shiratani

Electrochimica Acta   179   2015.10

Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition Reviewed International journal

S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 68th GEC/9th ICRP/33rd SPP   60 ( 9 )   2015.10

Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances Reviewed International journal

M. Tateishi, K. Koga, R. Katayama, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experiment Group

J. Nucl. Mater.   463   2015.8

Fabrication of ZnInON/ZnO multi-quantum well solar cells Reviewed International journal

K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Thin Solid Films   587   2015.7

Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability Reviewed International journal

S. Toko, Y. Torigoe, W. Chen, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Thin Solid Films   587   2015.7

Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method Reviewed International journal

X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

40 ( 2 )   2015.7

Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering Reviewed International journal

K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Mat. Res. Soc. Symp. Proc.   1741   2015.3

ZnO-based semiconductors with tunable band gap for solar sell applications Invited Reviewed International journal

N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani

Proc. SPIE photonics west 2015   9364   2015.3

Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering Reviewed International journal

T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Mat. Res. Soc. Symp. Proc.   1741   2015.2

Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells Reviewed International journal

H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani

Jpn. J. Appl. Phys.   54 ( 1S )   2015.1

Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap Reviewed International journal

N. Itagaki, K. Matsushima, D. Yamashia, H. Seo, K. Koga, M. Shiratani

Mater. Res. Express   1 ( 3 )   2014.9

Growth mechanism of ZnO deposited by nitrogen mediated crystallization Reviewed International journal

I. Suhariadi, M. Shiratani, N. Itagaki

Mater. Res. Express   1 ( 3 )   2014.9

Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier Reviewed International journal

H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani

39 ( 3 )   2014.9

Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method Reviewed International journal

N. Itagaki, K. Kuwahara, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani

Opt. Engineering   53 ( 8 )   2014.8

SiC Nanoparticle Composite Anode for Li-Ion Batteries Reviewed International journal

M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara

Mat. Res. Soc. Symp. Proc.   1678   2014.7

Plasma etching of single fine particle trapped in Ar plasma by optical tweezers Reviewed International journal

T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani

J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator Reviewed International journal

M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group

J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD Reviewed International journal

S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani

J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method Reviewed International journal

D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani

J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency Reviewed International journal

Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani

J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence Reviewed International journal

X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori

J. Phys. : Conf. Series (SPSM26)   518 ( 1 )   2014.6

Infrared Plasmonics via ZnO Reviewed International journal

J. W. Allen, M. S. Allen, D. C. Look, B. R. Wenner, N. Itagaki, K. Matsushima, I. Surhariadi

J. Nano Res.   28   2014.6

スパッタリング成膜法による高品質酸化亜鉛薄膜の形成 Reviewed

板垣奈穂、古閑一憲、白谷正治

応用物理   83 ( 5 )   2014.5

Nanostructure Control of Si and Ge Quantum Dots Based Solar Cells Using Plasma Processes Reviewed International journal

M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, and K. Kamataki

Materials Science Forum   783-786   2014.5

Performance dependence of Si quantum dot-sensitized solar cells on counter electrode Reviewed International journal

H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Jpn. J. Appl. Phys.   53 ( 5S1 )   2014.5

Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization Reviewed International journal

I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, and N. Itagaki

Jpn. Phys. Soc. Conf. Proc (APPC12)   1   2014.3

Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control Reviewed International journal

G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Jpn. Phys. Soc. Conf. Proc (APPC12)   1   2014.3

Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas Reviewed International journal

M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga

Jpn. Phys. Soc. Conf. Proc (APPC12)   1   2014.3

Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD Reviewed International journal

X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori

Jpn. Phys. Soc. Conf. Proc (APPC12)   1   2014.3

Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD Reviewed International journal

S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, and M. Shiratani

Jpn. Phys. Soc. Conf. Proc (APPC12)   1   2014.3

Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method Reviewed International journal

G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Jpn. Phys. Soc. Conf. Proc (APPC12)   1   2014.3

Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell Reviewed International journal

H. Seo, M. Son, S. Park, M. Jeong, H. Kim, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Thin Solid Films   554   2014.3

Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization Invited Reviewed International journal

N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani

Proc. SPIE photonics west 2014   8987   2014.3

Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target Reviewed International journal

M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group

Jpn. Phys. Soc. Conf. Proc (APPC12)   1   2014.3

Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter Reviewed International journal

Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas Reviewed International journal

M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation Reviewed International journal

Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells Reviewed International journal

H. Seo, D. Ichida, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Int. J. Precision Eng. Manuf.   15 ( 2 )   2014.2

Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method Reviewed International journal

Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited) Invited Reviewed International journal

K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering Reviewed International journal

S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method Reviewed International journal

Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization Reviewed International journal

T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering Reviewed International journal

K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries Reviewed International journal

G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method Reviewed International journal

D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation Reviewed International journal

S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization Reviewed International journal

K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method Reviewed International journal

T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Pressure dependence of carbon film deposition using H-assisted plasma CVD Reviewed International journal

X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Quantum characterization and photovoltaic application of Si nano-particles fabricated by multi-hollow plasma discharge chemical vapor deposition Reviewed International journal

H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Raman spectroscopy of a fine particle optically trapped in plasma Reviewed International journal

D. Yamashita, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Spatial profile of flux of dust particles in hydrogen helicon plasmas Reviewed International journal

M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization Reviewed International journal

T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device Reviewed International journal

R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide Reviewed International journal

I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats Reviewed International journal

A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida

Proc. 8th Int. Conf. Reactive Plasmas   2014.2

Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas Reviewed International journal

M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, G. Uchida, H. Seo, and N. Itagaki

Jpn. J. Appl. Phys.   53 ( 1 )   2014.1

The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si Reviewed International journal

H. Seo, Y. Wang, M. Sato, G. Uchida, K. Koga, N. Itagaki, K. Kamataki, M. Shiratani

Thin Solid Films   546   2013.11

Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells Reviewed International journal

G. Uchida, Y. Wang, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Jpn. J. Appl. Phys.   52 ( 11S )   2013.11

Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si and SiH Reviewed International journal

Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani

Jpn. J. Appl. Phys.   52 ( 11S )   2013.11

Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide Reviewed International journal

I. Suhariadi, K. Oshikawa, K. Kuwahara, K. Matsushima, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, N. Itagaki

Jpn. J. Appl. Phys.   52 ( 11S )   2013.11

Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 eV to 3.3 eV on ZnO Templates Reviewed International journal

K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki

Jpn. J. Appl. Phys.   52 ( 11S )   2013.11

Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates Reviewed International journal

K. Koga, M. Tateishi, K. Nishiyama, G. Uchida, K. Kamataki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, Akiko Sagara, the LHD Experimental Group

Jpn. J. Appl. Phys.   52 ( 11S )   2013.11

Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO2 Reviewed International journal

H. Seo, Y. Wang, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, S. Nam, J. Boo

Jpn. J. Appl. Phys.   52 ( 11S )   2013.11

Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells Reviewed International journal

H. Seo, M. Son, H. Kim, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Jpn. J. Appl. Phys.   52 ( 10S )   2013.10

ナノ材料のプラズマプロセシングの研究の現状と将来

白谷正治, 古閑一憲, 内田儀一郎, Hyunwoong Seo, 板垣奈穂, 岩下伸也

表面科学   34 ( 10 )   2013.10

Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells Reviewed International journal

G. Uchida, M. Sato, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Thin Solid Films   544   2013.10

Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD Reviewed International journal

Y. Kim, T. Matsunaga, K. Nakahara, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Surf. Coat. Technol.   228 ( 1 )   2013.8

Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device Reviewed International journal

K. Koga, K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group

J. Nucl. Mater.   438   2013.7

Observation of nanoparticle growth process using a high speed camera International journal

Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, and M. Shiratani

ISPC 21 Proceedings   2013.7

Discharge power dependence of carbon dust flux in a divertor simulator Reviewed International journal

K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, and H. Kersten

J. Nucl. Mater.   438   2013.7

Growth control of ZnO nano-rod with various seeds and photovoltaic application Reviewed International journal

H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

J. Phys. : Conference Series (11th APCPST)   441 ( 1 )   2013.6

Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films Reviewed International journal

S. Bornholdt, N. Itagaki, K. Kuwahara, H. Wulff, M. Shiratani and H. Kersten

Plasma Sources Sci. Technol.   22 ( 2 )   2013.4

Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells Reviewed International journal

H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Electrochimica Acta   95 ( 1 )   2013.4

Model for Thickness dependence of mobility and concentration in highly conductive ZnO Invited Reviewed International journal

D. C. Look, K. D. Leedy, A. Kiefer, B. Claflin, N. Itagaki, K. Matsushima, I. Surhariadi

Opt. Engineering   52 ( 3 )   2013.3

Control of Deposition Profile and Properties of Plasma CVD Carbon Films Reviewed International journal

K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani

Proc. 13th International Conference on Plasma Surface Engineering   2 ( 26 )   2013.3

Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices Invited Reviewed International journal

M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga

Proc. 13th International Conference on Plasma Surface Engineering   2 ( 26 )   2013.3

Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate Reviewed International journal

N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani

Proc. 13th International Conference on Plasma Surface Engineering   2 ( 26 )   2013.3

The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell Reviewed International journal

H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Electrochimica Acta   87 ( 1 )   2013.1

Dust particle formation due to interaction between graphite and helicon deuterium plasmas Reviewed International journal

S. Iwashita, K. Nishiyama, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Fusion Engineering and Design   88 ( 1 )   2013.1

Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization Reviewed International journal

I. Suhariadi, K. Matsushima, K. Kuwahara, K. Oshikawa, D. Yamashita, H. Seo, G. Uchida, K. Kamtaki, K. Koga, M. Shiratani, S. Bornholdt, H. Kersten, Harm Wulff, N. Itagaki

Jpn. J. Appl. Phys.   52 ( 1S )   2013.1

High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition Reviewed International journal

Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, M. Shiratani

Jpn. J. Appl. Phys.   52 ( 1S )   2013.1

Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells Reviewed International journal

H. Seo, Y. Wang, M. Sato, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Jpn. J. Appl. Phys.   52 ( 1S )   2013.1

Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors (Invited) Invited Reviewed International journal

N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani

Proc. International Symposium on Dry Process   34   2012.11

Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage Reviewed International journal

K. Kamataki, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani

Thin Solid Films   523   2012.11

Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD Reviewed International journal

Y. Kim, T. Matsunaga, K. Nakahara ,G. Uchida, K. Kamataki , N. Itagaki, H. Seo, K. Koga, M. Shiratani

Thin Solid Films   523   2012.11

ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio Reviewed International journal

I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani

37 ( 2 )   2012.6

High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers Reviewed International journal

K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani

Thin Solid Films   520 ( 14 )   2012.5

The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition Reviewed International journal

H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Mat. Res. Soc. Symp. Proc.   1426   2012.4

Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition Reviewed International journal

M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga

Mat. Res. Soc. Symp. Proc.   1426   2012.4

In situ analysis of size dispersion of nano-particles in reactive plasma using two dimentional laser light scattering method Reviewed International journal

K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki

Journal of Instrumentation   7 ( 4 )   2012.4

In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances Reviewed International journal

Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Mat. Res. Soc. Symp. Proc.   1426   2012.4

Novel fabrication method for ZnO films via nitrogen-mediated crystallization (Invited) Invited Reviewed International journal

N. Itagaki, K. Kuwahara, K. Matsushima, K. Oshikawa

Proc. of SPIE photonics west 2012   8263   2012.1

Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition Reviewed International journal

K. Koga, T. Matsunaga, Y. Kim, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, and M. Shiratani

Jpn. J. Appl. Phys.   51 ( 1 )   2012.1

Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD Reviewed International journal

K. Koga, K. Nakahara, Y. Kim, T. Matsunaga, D.Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani

Jpn. J. Appl. Phys.   51 ( 1 )   2012.1

Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells Reviewed International journal

G. Uchida, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Jpn. J. Appl. Phys.   51 ( 1 )   2012.1

Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers Reviewed International journal

K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani

Proc. PVSEC-21   2011.11

Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage International journal

K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten

Proc. Plasma Conf. 2011   2011.11

Deposition of cluster-free a-Si:H films using cluster eliminating filter International journal

K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method International journal

K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD International journal

Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films International journal

K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H., G. Uchida, K. Kamataki, K. Koga, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD International journal

M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga

Proc. Plasma Conf. 2011   2011.11

Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition International journal

T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering International journal

N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer International journal

Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. Intern. Symp. on Dry Process   33   2011.11

Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD International journal

Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure International journal

K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori

Proc. Plasma Conf. 2011   2011.11

Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD International journal

K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani

Proc. Plasma Conf. 2011   2011.11

Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd Reviewed International journal

Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani

Proc. PVSEC-21   2011.11

Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD Reviewed International journal

K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. PVSEC-21   2011.11

Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films Reviewed International journal

T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

Proc. PVSEC-21   2011.11

Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste Reviewed International journal

Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani

Proc. PVSEC-21   2011.11

Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization Reviewed International journal

N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani

Proc. PVSEC-21   2011.11

Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD Reviewed International journal

G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani

Physica Status Solidi (c)   8 ( 10 )   2011.10

Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method Reviewed International journal

K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani

Physica Status Solidi (c)   8 ( 10 )   2011.10

Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye Reviewed International journal

G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani

Physica Status Solidi (c)   8 ( 10 )   2011.10

Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasma Reviewed International journal

K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, M. Shiratani

Appl. Phys. Express   4 ( 10 )   2011.10

Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma International journal

K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani

2011.9

Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film Reviewed International journal

K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

Thin Solid Films   519 ( 20 )   2011.8

Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD International journal

Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani

2011.7

Nano-factories in plasma: present status and outlook Reviewed International journal

M. Shiratani, K. Koga, S. Iwashita, G. Uchida, N. Itagaki, K. Kamataki

J. Phys. D: Appl. Phys.   44 ( 17 )   2011.5

Novel Fabrication Method for Transparent Conducting Oxide Films Utilizing Solid-Phase Crystallized Seed Layers Invited Reviewed International journal

N. Itagaki, K. Kuwahara, K. Nakahara

Proc. Int. Conf. Advances in Condensed and Nano Materials 2011   1393   2011.2

Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics Invited Reviewed International journal

K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani

International Conference on Advances in Condensed and Nano Materials (ICACNM)   1393   2011.2

Novel fabrication method of ZnO films utilizing solid-phase crystallized seed layers Reviewed International journal

N. Itagaki, K. Kuwahara

Mat. Res. Soc. Symp. Proc.   1315   2011.1

Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase Reviewed International journal

N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani

Appl. Phys. Express   4 ( 1 )   2011.1

Novel fabrication method for oxide semiconductors via atomic-additive mediated crystallization Invited Reviewed International journal

N. Itagaki

Proc. IEEE TENCON 2010   2010.11

Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges International journal

G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo

Proc. of MNC2010   2010.11

Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles International journal

H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. of International Symposium on Dry Process   2010.11

Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges Reviewed International journal

K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani

Proc. IEEE TENCON 2010   2010.11

Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD Reviewed International journal

T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani

Proc. IEEE TENCON 2010   2010.11

Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma Reviewed International journal

K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani

Proc. IEEE TENCON 2010   2010.11

Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge Reviewed International journal

G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. IEEE TENCON 2010   2010.11

Fluctuation Control for Plasma Nanotechnologies Reviewed International journal

M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki

Proc. IEEE TENCON 2010   2010.11

Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges International journal

G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

Carbon dust particles generated due to H2 plasma-carbon wall interaction International journal

H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group

Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD International journal

T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani

Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method International journal

K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma   55 ( 7 )   2010.10

Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD Reviewed International journal

Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo

Proc. 35th IEEE Photovoltaic Specialists Conf.   2010.7

Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method Reviewed International journal

K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani

Proc. 35th IEEE Photovoltaic Specialists Conf.   2010.7

Materials, Devices, and Circuits of Transparent Amorphous-Oxide Semiconductor Reviewed International journal

H. Kumomi, S. Yaginuma, H. Omura, A.Goyal, A. Sato, M. Watanabe, M. Shimada, N. Kaji, K. Takahashi, M. Ofuji, T. Watanabe, N. Itagaki, H. Shimizu, K. Abe, Y. Tateishi, H. Yabuta, T. Iwasaki, R. Hayashi, T. Aiba, M. Sano

J. Display Technol.   5 ( 12 )   2009.12

Favorable Elements for an Indium-based Amorphous-oxide TFT Channel: Study of In-X-O (X=B, Mg, Al, Si, Ti, Zn, Ga, Ge, Mo, Sn) Systems Reviewed International journal

A. Goyal, T. Iwasaki, N. Itagaki, T. Den, and H. Kumomi

Mat. Res. Soc. Symp. Proc   1109   2009.5

Zn-In-O based thin-film transistors: Compositional dependence Reviewed International journal

N. Itagaki, T. Iwasaki, H. Kumomi, T. Den, K. Nomura, T. Kamiya, and H. Hosono

Phys. Stat. Sol. (a)   205 ( 8 )   2008.8

Combinatorial approach to thin-film transistors using multicomponent semiconductor channels: An application to amorphous oxide semiconductors in In-Ga-Zn-O system Reviewed International journal

T. Iwasaki, N. Itagaki, T. Den, H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono,

Appl. Phys. Lett.   90 ( 24 )   2007.6

Guiding Principles for Obtaining High-Quality Microcrystalline Silicon Growth Rates Using SiH4/H2 Glow-Discharge Plasma Reviewed International journal

C. Niikura, N. Itagaki, Matsuda

Jpn. J. Appl. Phys.   46 ( 5A )   2007.5

High rate growth of high-quality microcrystalline silicon films from plasma by interconnected multi-hollow cathode Reviewed International journal

C. Niikura, N. Itagaki, and Matsuda

Surf. Coat. Technol.   201 ( 9-11 )   2007.2

Guiding Principles for Preparing High Quality Microcrystalline Silicon at High Growth Rates Reviewed International journal

C. Niikura, N. Itagaki, and A. Matsuda

Trans. Mater. Res. Soc. Jpn.   31 ( 2 )   2006.6

Combinatorial study on In-Ga-Zn-O semiconductor films as active-channel layers for thin-film transistor Reviewed International journal

T. Iwasaki, N. Itagaki, T. Den, H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono

Mat. Res. Soc. Symp. Proc.   928   2006.6

Electron temperature measurement in SiH4/H2 ECR plasma produced by 915 MHz microwaves Reviewed International journal

N. Itagaki, K. Sasaki, Y. Kawai

Thin Solid Films   506   2006.5

Characteristics of the plasma parameters in the fabrication of microcrystalline silicon thin films using 915 MHz ECR plasma Reviewed International journal

D. Ha Thang, K. Sasaki, H. Muta, N. Itagaki, and Y. Kawai

Thin Solid Films   506   2006.5

Production of low electron temperature ECR plasma Reviewed International journal

Y. Kawai, N. Itagaki, M. Koga, and H. Muta

Surf. Coat. Technol.   193 ( 1-3 )   2005.4

Production of high density VHF plasma using a cathode with interconnected multi holes Reviewed International journal

N. Itagaki, C. Niikura, A. Matsuda and M. Kondo

Proc. Plasma Sci. Symp. 2005 and the 22th Symp. on plasma processing   2005.1

Investigation of the Plasma Parameters in 915 MHz ECR Plasma with SiH4/H2 Mixtures Reviewed International journal

H. Muta, D. Ha Thang, N. Itagaki, and Y. Kawai

Proc. Plasma Sci. Symp. 2005 and the 22th Symp. on plasma processing   2005.1

High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma Reviewed International journal

C. Niikura, N. Itagaki, M. Kondo, Y. Kawai, and Matsuda

Thin Solid Films   457 ( 1 )   2004.6

Control of the electron temperature by varying the resonance zone width in ECR plasma Reviewed International journal

N. Itagaki, K. Muta, N. Ishii and Y. Kawai

Thin Solid Films   457 ( 1 )   2004.6

Generation of a low-electron-temperature ECR plasma using mirror magnetic field Reviewed International journal

H. Muta, N. Itagaki, M. Koga, and Y. Kawai

Surf. Coat. Technol.   174   2003.9

Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma Reviewed International journal

N. Itagaki, S. Iwata, K. Muta, A. Yonesu, S. Kawakami, N. Ishii and Y. Kawai

Thin Solid Films   435 ( 1 )   2003.7

Relationship between the electron temperature and the power absorption profile in ECR plasma Reviewed International journal

N. Itagaki, K. Muta, N. Ishii and Y. Kawai

Proc. 16th Intern. Symp. on Plasma Chemistry   2003.6

Electron-temperature control in 915 MHz electron cyclotron resonance plasma Reviewed International journal

N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai

J. Vac. Sci. Technol., A   20 ( 6 )   2002.11

Production of low-electron-temperature electron cyclotron resonance plasma with large area using 915MHz microwave Reviewed International journal

N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai

Vacuum   66 ( 3-4 )   2002.8

Numerical investigation of the production mechanism of a low-temperature electron cyclotron resonance plasma Reviewed International journal

H. Muta, N. Itagaki, and Y. Kawai

Vacuum   66 ( 3-4 )   2002.8

Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures Reviewed International journal

H. Muta, M. Koga, N. Itagaki, and Y. Kawai

Surf. Coat. Technol.   171 ( 1-3 )   2002.7

Behavior of the molecular dissociation in 915 MHz ECR nitrogen plasma Reviewed International journal

N. Itagaki, S. Iwata, K. Muta, A. Yonesu, S. Kawakami, N. Ishii and Y. Kawai

Proc. 5th Intern. Conf. Reactive Plasmas   1   2002.7

Production of low electron temperature ECR plasma for thin film deposition Reviewed International journal

N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai

Surf. Coat. Technol.   142-144   2001.7

Production of low electron temperature ECR plasma for plasma application Reviewed International journal

N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai

Proc. XXV Intern. Conf. Phenomena in Ionized Gases   2001.7

Production of low electron temperature ECR plasma for plasma processing Reviewed International journal

N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai

Thin Solid Films   390 ( 1-2 )   2001.6

Investigation of ECR plasma uniformity from the point of view of production & confinement Reviewed International journal

N. Itagaki, T. Yoshizawa, Y. Ueda and Y. Kawai

Thin Solid Films   386 ( 2 )   2001.5

Production of low-electron-temperature electron cyclotron resonance plasma using nitrogen gas in the mirror magnetic field Reviewed International journal

N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai

Jpn. J. Appl. Phys.   40 ( 4A )   2001.4

Effect of magnetic-mirror confinement on electron temperature control in ECR plasma Reviewed International journal

N. Itagaki, Y. Ueda, N. Ishii and Y. Kawai

J. Plasma Fusion Res.   4   2001.2

Production of low-electron-temperature ECR plasma using 915 MHz microwave Reviewed International journal

N. Itagaki, S. Kawakami, N. Ishii and Y. Kawai

Proc. Plasma Sci. Symp. 2001 and the 18th Symp. on plasma processing   2001.1

Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma Reviewed International journal

N. Itagaki, A. Fukuda, T. Yoshizawa, M. Shindo, Y. Ueda and Y. Kawai

Surf. Coat. Technol.   131 ( 1-3 )   2000.9

Effect of nanoscale inhomogeneity on blocking temperature of ZnO:Co films fabricated by using nitrogen-mediated crystallization

Marlis N. Agusutrisno, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoto Yamashita

MRS Advances   2024.7   （ ISSN:2731-5894 eISSN:2059-8521 ）

Large-scale fabrication of thulium iron garnet film with perpendicular magnetic anisotropy using RF magnetron sputtering

Marlis N. Agusutrisno, Sora Obinata, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Naoto Yamashita

Japanese Journal of Applied Physics   63 ( 7 )   07SP06 - 07SP06   2024.7   （ ISSN:0021-4922 eISSN:1347-4065 ）

Response of lettuce seeds undergoing dormancy break and early senescence to plasma irradiation

Okumura, T; Anan, T; Shi, HP; Attri, P; Kamataki, K; Yamashita, N; Itagaki, N; Shiratani, M; Ishibashi, Y; Koga, K; Mildaziene, V

APPLIED PHYSICS EXPRESS   17 ( 5 )   2024.5   （ ISSN:1882-0778 eISSN:1882-0786 ）

On-axis sputtering fabrication of Tm3Fe5O12 film with perpendicular magnetic anisotropy Reviewed International journal

M. N. Agusutrisno, C. H. Marrows, K. Kamataki, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, N. Yamashita

Thin Solid Films   788 ( 15 )   140176 - 140176   2024.1   （ ISSN:0040-6090 eISSN:1879-2731 ）

Prediction by a hybrid machine learning model for highmobility amorphous In2O3: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method Reviewed International journal

K. Kamataki, H. Ohtomo, N. Itagaki, C. F. Lesly, D. Yamashita, T. Okumura, N. Yamashita, K. Koga, M. Shiratani

J. Appl. Phys.   134 ( 16 )   2023.10   （ ISSN:0021-8979 eISSN:1089-7550 ）

Evaluation of Interaction Between Substrate and Nanoparticles Deposited by Plasma Chemical Vapor Deposition Reviewed

K. Koga, S. Ono, M. Eri, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani

Bull. Am. Phys. Soc.   2023.10

Health assessment of rice cultivated and harvested from plasma-irradiated seeds Reviewed International journal

T. Okumura, H. Tanaka, T. Nakao, T. Anan, R. Arita, M. Shiraki, K. Shiraki, T. Miyabe, D. Yamashita, K. Matsuo, P. Attri, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani, S. Hosoda, A. Tanaka, Y. Ishibashi, K. Koga

Sci. Rep.   13 ( 1 )   17450   2023.10   （ ISSN:2045-2322 eISSN:2045-2322 ）

Evaluation of Interaction Between Substrate and Nanoparticles Deposited by Plasma Chemical Vapor Deposition Reviewed

K. Koga, S. Ono, M. Eri, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani

Bull. Am. Phys. Soc.   2023.10

Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition Reviewed International journal

K. Kamataki, Y. Sasaki, I. Nagao, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Mater Sci Semicond Process   164   2023.9   （ ISSN:1369-8001 eISSN:1873-4081 ）

Control of Inhomogeneity and Magnetic Properties of ZnO:Co Films Grown by Magnetron Sputtering Using Nitrogen Reviewed International journal

M. N. Agusutrisno, R. Narishige, K. Kamataki, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, N. Yamashita

Mater Sci Semicond Process   162   2023.8   （ ISSN:1369-8001 eISSN:1873-4081 ）

Stress reduction of a-C:H films with inserting submonolayer of carbon nanoparticles

Shiratani Masaharu, Ono Shinjiro, Eri Manato, Okumura Takamasa, Kamataki Kunihiro, Yamashita Naoto, Kiyama Haruki, Itagaki Naho, Koga Kazunori

Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science   2023 ( 0 )   1Ga06   2023   （ eISSN:24348589 ）

One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges Reviewed International journal

I. Nagao, K. Kamataki, A. Yamamoto, M. Otaka, Y. Yamamoto, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani

MRS Adv.   7 ( 31 )   911 - 917   2022.12   （ ISSN:2731-5894 eISSN:2059-8521 ）

Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates Reviewed International journal

R. Narishige, N. Yamashita, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, H. Yabuta, N. Itagaki

J. Mater. Res.   38 ( 7 )   1803 - 1812   2022.11   （ ISSN:0884-2914 eISSN:2044-5326 ）

Amorphous In-Ga-Mg-O Thin Films Formed by RF Magnetron Sputtering: Optical, Electrical Properties and Thin-Film-Transistor Characteristics Reviewed International journal

H. Yabuta, N. Itagaki, T. Ekino, Y. Shigesato

IEEE Open Journal of Nanotechnology   3   149 - 152   2022.11   （ eISSN:2644-1292 ）

Plasma irradiation-introduced RONS amount into plant seeds and their response analysis Reviewed International journal

T. Okumura, T. Anan, P. Attri, Y. Tsukada, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Y. Ishibashi

Bull. Am. Phys. Soc.   2022.10

Role of short-lived nitrogen species generated at low-pressure RF plasma on the germination and seedling growth Reviewed International journal

K. Koga, P. Attri, T. Okumura, T. Anan, T. Nakao, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Measurements of strength and fluctuation of 2D electric fields in plasmas using a fine particle trapped with laser tweezers Reviewed International journal

K. Kamataki, T. Sato, K. Tomita, P. Yimin, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Effects of amplitude modulation discharge on behavior of oxygen ions in Ar/O2 capacitively coupled plasma studied by particle-in-cell/Monte Carlo collision model Reviewed International journal

I. Nagao, A. Yamamoto, Y. Yamamoto, K. Kamataki, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Control of magnetic transition of ZnO: Co grown by RF-sputter using post-annealing Reviewed International journal

A. M. Nurut, N. Yamashita, K. Kamataki, K. Koga, N. Itagaki, M. Shiratani

ICIEE   2022.10   （ ISBN:9781665486224 ）

Pressure dependence on spatio-temporal distribution of excitation rates of Ar 2p1 and Ne 2p1 in Ar and Ar/Ne capacitively coupled plasmas Reviewed International journal

M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Effect of plasma irradiation on germination of lettuce seeds with fluctuating dormancy Reviewed International journal

T. Anan, T. Nakao, T. Okumura, P. Attri, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Plasma induced conversion of CO2 with water to useful compounds Reviewed International journal

P. Attri, T. Okumura, K. Koga, K. Kamataki, N. Itagaki, M. Shiratani, N. Takeuchi

Bull. Am. Phys. Soc.   2022.10

Sputter epitaxy of Mg-doped ZnO films on sapphire substrates using inverted Stranski-Krastanov mode Reviewed International journal

M. Shiratani, D. Takahashi, N. Yamashita, N. Itagaki

Bull. Am. Phys. Soc.   2022.10

Process analysis of cracking aC: H/CNP/aC: H sandwich films under stress using nanoindentation Reviewed International journal

S. Ono, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Sputter epitaxy of Mg-doped ZnO films on sapphire substrates using inverted Stranski-Krastanov mode Reviewed International journal

M. Shiratani, D. Takahashi, N. Yamashita, N. Itagaki

Bull. Am. Phys. Soc.   2022.10

Role of short-lived nitrogen species generated at low-pressure RF plasma on the germination and seedling growth Reviewed International journal

K. Koga, P. Attri, T. Okumura, T. Anan, T. Nakao, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Process analysis of cracking aC: H/CNP/aC: H sandwich films under stress using nanoindentation Reviewed International journal

S. Ono, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Pressure dependence on spatio-temporal distribution of excitation rates of Ar 2p1 and Ne 2p1 in Ar and Ar/Ne capacitively coupled plasmas Reviewed International journal

M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Plasma irradiation-introduced RONS amount into plant seeds and their response analysis Reviewed International journal

T. Okumura, T. Anan, P. Attri, Y. Tsukada, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Y. Ishibashi

Bull. Am. Phys. Soc.   2022.10

Plasma induced conversion of CO2 with water to useful compounds Reviewed International journal

P. Attri, T. Okumura, K. Koga, K. Kamataki, N. Itagaki, M. Shiratani, N. Takeuchi

Bull. Am. Phys. Soc.   2022.10

Measurements of strength and fluctuation of 2D electric fields in plasmas using a fine particle trapped with laser tweezers Reviewed International journal

K. Kamataki, T. Sato, K. Tomita, P. Yimin, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Effects of amplitude modulation discharge on behavior of oxygen ions in Ar/O2 capacitively coupled plasma studied by particle-in-cell/Monte Carlo collision model Reviewed International journal

I. Nagao, A. Yamamoto, Y. Yamamoto, K. Kamataki, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Effect of plasma irradiation on germination of lettuce seeds with fluctuating dormancy Reviewed International journal

T. Anan, T. Nakao, T. Okumura, P. Attri, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

Bull. Am. Phys. Soc.   2022.10

Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes:particle-in-cell/Monte Carlo collision model simulation Reviewed International journal

K. Abe, K. Kamataki, A. Yamamoto, I. Nagao, M. Otaka, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K . Koga, M. Shiratani

Jpn. J. Appl. Phys.   61 ( 10 )   106003 - 106003   2022.9   （ ISSN:0021-4922 eISSN:1347-4065 ）

Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma

Kamataki Kunihiro, Nagamatsu Daiki, Yang Tao, Abe Kohei, Yamamoto Akihiro, Nagao Iori, Arima Toshiaki, Otaka Michihiro, Yamamoto Yuma, Yamashita Daisuke, Okumura Takamasa, Yamashita Naoto, Itagaki Naho, Koga Kazunori, Shiratani Masaharu

AIP Advances   12 ( 8 )   2022.8   （ eISSN:21583226 ）

Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma Reviewed International journal

K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

AIP Adv.   12   2022.8

Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma Reviewed International journal

K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani

AIP Adv   12   2022.8

Spatio-temporal measurements Ar 2p1 excitation rates and optical emission spectroscopy by capacitively coupled Ar and Ne mixed gas plasma Reviewed International journal

M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani

MRS Adv.   7 ( 31 )   918 - 922   2022.7   （ ISSN:2731-5894 eISSN:2059-8521 ）

Treatment of organic wastewater by a combination of non-thermal plasma and catalyst: a review Reviewed International journal

P. Attri, K. Koga, T. Okumura, F. L. Chawarambwa, T. E. Putri, Y. Tsukada, K. Kamataki, N. Itagaki, M. Shiratani

Rev. Mod. Plasma Phys   6 ( 1 )   2022.7   （ ISSN:2367-3192 eISSN:2367-3192 ）

Raman spectral analysis of the as-deposited aC: H films prepared by CH4+ Ar plasma CVD Reviewed International journal

S. Ono, S. H. Hwang, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, J. S. Oh, S. Takabayashi, T. Nakatani

MRS Adv.   7 ( 30 )   718 - 722   2022.7   （ ISSN:2731-5894 eISSN:2059-8521 ）

Detection of NO3− introduced in plasma-irradiated dry lettuce seeds using liquid chromatography-electrospray ionization quantum mass spectrometry (LC-ESI QMS) Reviewed International journal

T. Okumura, P. Attri, K. Kamataki, N. Yamashita, Y. Tsukada, N. Itagaki, M. Shiratani, Y. Ishibashi, K. Kuchitsu, K. Koga

Sci. Rep.   12 ( 1 )   12525   2022.7   （ ISSN:2045-2322 eISSN:20452322 ）

The effect of visual cognition on the fear caused by pain recall

Itagaki, N; Iramina, K; Nakada, Y

2022 14TH BIOMEDICAL ENGINEERING INTERNATIONAL CONFERENCE (BMEICON 2022)   2022   （ ISSN:2334-3052 ISBN:978-1-6654-8903-4 ）

スパッタだからできる薄膜の結晶性・モフォロジー制御 Invited

板垣奈穂

化学工学会第54回秋季大会  2023.9 

Structural Control of Sputter Deposited Films Using Impurities Invited International conference

N. Itagaki

International C+Nano Convergence Technology Symposium (ICTS)  2023.1 

Structural Control of Sputter Deposited Films Using Impurities Invited International conference

N. Itagaki

International C+Nano Convergence Technology Symposium (ICTS)  2023.1 

不純物でスパッタ膜のモフォロジーを制御する～アモルファスからエピ膜まで～ (招待講演) Invited

板垣奈穂

第78回CVD研究会  2022.12 

不純物でスパッタ膜のモフォロジーを制御する～アモルファスからエピ膜まで～ (招待講演) Invited

板垣奈穂

第78回CVD研究会  2022.12 

Sputtering Growth of Single-Crystalline ZnO Based Semiconducting Films on Large Lattice-Mismatched Substrates (Invited) Invited International conference

N. Itagaki

International Workshop on Magnetron Sputter Epitaxy (IWMSE)  2022.11 

Sputtering Growth of Single-Crystalline ZnO Based Semiconducting Films on Large Lattice-Mismatched Substrates (Invited) Invited International conference

N. Itagaki

International Workshop on Magnetron Sputter Epitaxy (IWMSE)  2022.11 

Structural Control of Sputter Deposited Films beyond the Thornton Diagram Using Impurities (keynote) Invited International conference

N. Itagaki

AAPPS-DPP 2022  2022.10 

Structural Control of Sputter Deposited Films beyond the Thornton Diagram Using Impurities (keynote) Invited International conference

N. Itagaki

AAPPS-DPP 2022  2022.10 

Fabrication of Low-Resistive Amorphous In2O3 :Sn Films at 600°C by Magnetron Sputtering Using Nitrogen International conference

2022.9 

Fabrication of Low-Resistive Amorphous In2O3 :Sn Films at 600°C by Magnetron Sputtering Using Nitrogen International conference

N. Itagaki, Y. Mido, Z. Shen, N. Yamashita, T. Okumura, K. Kamataki, K. Koga, M. Shiratani

9th International Symposium on Control of Semiconductor Interfaces  2022.9 

不純物で薄膜モフォロジーを制御する～アモルファスからエピ膜まで～ (招待講演) Invited

板垣奈穂

日本学術振興会 R025先進薄膜界面機能創成委員会　リトリート学習会 2022  2022.7 

不純物で薄膜モフォロジーを制御する～アモルファスからエピ膜まで～ (招待講演) Invited

板垣奈穂

日本学術振興会 R025先進薄膜界面機能創成委員会 リトリート学習会 2022  2022.7 

Development of New Oxynitride Semiconductors with Tunable Band Gaps Using Magnetron Sputtering(Invited) Invited International conference

N. Itagaki

2021.12 

Inverted Stranski-Krastanov Growth of ZnO Based Semiconductors for Excitonic Devices(Invited) Invited International conference

N. Itagaki

2021.12 

Sputtering Deposition with Impurities: Another Key Parameter to Control Film Structures(Invited) Invited International conference

N. Itagaki

MRS fall meeting 2021  2021.12 

Sputter epitaxy of ZnO based oxide/oxynitride semiconductors for excitonic transistors(Invited) Invited International conference

5th Asia-Pacific Conference on Plasma Physics  2021.10 

非晶質ZnON膜からの固相結晶化ZnO膜の形成とシード層としての効果(招待講演) Invited

板垣奈穂, 沈志遠, 御堂雄大, 薮田久人

第82回応用物理学会秋季学術講演会  2021.9 

スパッタエピタキシー法を駆使したZnO系新材料の開発(招待講演) Invited

板垣奈穂

第68回応用物理学会春季学術講演会  2021.3 

Sputter epitaxy through “inverse” SK mode for a new class of excitonic devices (Invited) Invited International conference

2020.10 

A novel semiconductor ZION for excitonic devices (Invited) Invited

N. Itagaki

2020.8 

Sputtering Deposition with Impurities: Another Key Parameter to Control Film Structures (Invited) Invited International conference

N. Itagaki, K. Kamataki, K. Koga, M. Shiratani

2019.12 

ZnO Based Semiconductors for Excitonic Devices (Invited) Invited International conference

N. Itagaki, K. Kamataki, K. Koga, M. Shiratani

2019.12 

Inverse Stranski-Krastanov growth: a method for growth of single crystalline films beyond lattice-matching condition (Invited) Invited International conference

N. Itagaki

Satellite Workshop of XXXIV ICPIG & ICRP-10 "New trends of plasma processes for thin films and related materials for the deep discussion on new trends of plasma processes"  2019.7 

Sputter Epitaxy of ZnO Based Compounds for Excitonic Devices Invited International conference

N. Itagaki, K. Imoto, N. Miyahara, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani

28th Annual Meeting of MRS-Japan 2018  2018.12 

Sputter Epitaxy of compound semiconductors via inverse Stranski-Krastanov mode: A method of single crystalline film growth beyond lattice matchins condition Invited International conference

N. Itagaki, K. Imoto, N. Miyahara, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani

28th Annual Meeting of MRS-Japan 2018  2018.12 

Sputter Epitaxy via Inverse Stranski-Krastanov Growth Mode: A Method of Single Crystal Growth beyond Lattice Matching Condition International conference

N. Itagki, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani

AVS Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2018)  2018.12 

Sputter epitaxy of high quality (ZnO)x(InN)1-x: a new semiconducting material for excitonic devices (Invited) Invited International conference

N. Itagki, N. Miyahara, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani

2nd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2018)  2018.11 

Inverse Stranski-Krastanov Growth of Single Crystalline Films: A New Mode of Heteroepitaxy for Large Lattice Mismatched System (Invited) Invited International conference

N. Itagaki, M. Shiratani

10th International Conference on Processing & Manufacturing of Advanced Materials Processing, Fabrication, Properties, Applications (THERMEC 2018)  2018.7 

格子整合条件を超えて原子平坦表面を実現する新規スパッタエピタキシー技術の開発～ZnO on sapphireを例に～（招待講演） Invited

板垣奈穂, 岩崎和也, 古閑一憲, 白谷正治

第65回応用物理学会春季学術講演会  2018.3 

Excitonic devices for on-chip optical interconnects International conference

N. Itagaki

Joint workshop btw SKKU and Kyushu University Emerging materials and devices  2018.1 

Fabrication of High-Mobility Nanocrystal-Free a-In2O3:Sn Films by Magnetron Sputtering with Impurity-Mediated Amorphization Method Invited International conference

N. Itagaki, H. Wang, D. Yamashita, H. Seo, K. Koga, M. Shiratani

27th annual meeting of MRS-J  2017.12 

逆SKモードを利用した超高品質スパッタエピタキシー（招待講演） Invited

板垣奈穂

2017.11 

不純物添加スパッタリング法による高移動度・ナノ結晶フリー a-In2O3:Sn薄膜の作製

板垣奈穂, 山下大輔, 徐鉉雄, 古閑一憲, 白谷正治

第78回応用物理学会秋季学術講演会  2017.9 

Fabrication of High-Mobility Amorphous In2O3:Sn Films by RF Magnetron Sputtering with Impurity-Mediated Amorphization Method (Keynote) Invited International conference

N. Itagaki, T. Takasaki, H. Wang, D. Yamashita, H. Seo, K. Koga, M. Shiratani

International Union of Materials Research Societies - The 15th International Conference on Advanced Materials (IUMRS-ICAM 2017)  2017.8 

Inverse Stranski-Krastanov Growth of Single Crystalline ZnO-Based Semiconductors on Lattice Mismatched Substrates (Invited) Invited International conference

N. Itagaki, K. Iwasaki, D. Yamashita, H. Seo, K. Koga, M. Shiratani

International Union of Materials Research Societies - The 15th International Conference on Advanced Materials (IUMRS-ICAM 2017)  2017.8 

Inverse Stranski-Krastanov Growth of Pit-Free Single Crystalline ZnO Films on Lattice Mismatched Substrates International conference

N. Itagaki, K. Iwasaki, D. Yamashita, H. Seo, K. Koga, M. Shiratani

29th International Conference on Defects in Semiconductors (ICDS2017)  2017.8 

不純物添加スパッタリングによる高移動度アモルファスITOの作製（招待講演） Invited

板垣奈穂

プラズマ材料科学第 153委員会　第130回研究会　プラズマを用いた新奇プロセス・新規材料創製  2017.4 

スパッタエピタキシー法を用いた高品質単結晶薄膜の形成（招待講演） Invited

板垣奈穂

プラズマ核融合学会第29回専門講習会「スパッタ技術の現状と展望」  2017.1 

Sputtering growth of (ZnO)x(InN)1-x semiconductor: a ZnO-based compound with bandgap tunability over the entire visible spectrum (Invited) Invited International conference

N. Itagaki, K. Matsushima, D. Ymashita, H. Seo, K. Koga, M. Shiratani

26th annual meeting of MRS-J  2016.12 

バンドギャップチューニング可能なZnO系新半導体材料の開発（プラズマエレクトロニクス賞受賞記念講演） Invited

板垣奈穂, 松島宏一, 山下大輔, 徐鉉雄, 古閑一憲, 白谷 正治

第77回応用物理学会秋季学術講演会  2016.9 

Plasma surface interactions of single crystal ZnO during sputtering in Ar+O2+N2 International conference

N. Itagaki and M. Shiratani

Workshop on Plasma surface interaction for technological applications  2016.7 

Inverse SK mode of epitaxial film growth and its application to solar cells (Invited) Invited International conference

N. Itagaki

The 3rd Korea-Japan Joint Symposium on Advanced Solar Cells  2016.2 

可視領域でバンドギャップチューニング可能な新材料ZIONの開発（招待講演） Invited

板垣奈穂

固体化学の新しい指針を探る研究会第78回定例研究会  2015.10 

Single Crystal Growth On Large Lattice-Mismatched Substrates By Using Buffer Layers With Fine Grains (Invited) Invited International conference

N. Itagaki

The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015)  2015.9 

Sputtering growth of single-crystalline ZnO films on c-sapphire substrates by using impurity-mediated crystallization method: Effects of surface morphology of buffer layers International conference

N. Itagaki, T. Ide, K. Matsushima, T. Takasaki, D. Yamashita, H. Seo, K. Koga, Masaharu Shiratani

2015 E-MRS Spring Meeting and Exhibit  2015.5 

High-mobility amorphous In2O3:Sn films prepared by sputter deposition with nitrogen-mediated amorphization method International conference

N. Itagaki, T. Takasaki, T. Nakanishi, D. Yamashita, H. Seo, K. Koga, M. Shiratani

7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterial/8th International Conference on Plasma Nanotechnology and Science (ISPlasma2015/IC-PLANTS2015)  2015.3 

可視領域でバンドギャップチューニング可能なZnO系新材料の開発（招待講演） Invited

板垣奈穂, 松島宏一, 井手智章, 山下大輔, 徐鉉雄, 古閑一憲, 白谷正治

第62回応用物理学会春季学術講演会  2015.3 

ZnO-based semiconductors with tunable band gap for 3rd generation solar sells (Invited) Invited International conference

N. Itagaki

International Society for Optics and Photonics, Photonics West 2015  2015.2 

不純物添加結晶化法による高品質ZnO薄膜の形成（招待講演） Invited

板垣奈穂

学振166委員会　第66回研究会  2015.1 

ZnO-based semiconductors with tunable band gap for solar cell application (Invited) Invited International conference

Naho Itagaki

2015 Japan-Korea Joint Symposium on Advanced Solar Cells  2015.1 

Sputtering Growth of ZnO-based semiconductors with Band Gap Tunability over the Entire Visible Spectrum (Invited) Invited International conference

N. Itagaki

Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2014)  2014.12 

Sputtering Growth of Pseudobinary ZnO-InN Alloys with Tunable Band Gap for Application in Multi-Quantum Well Solar Cells International conference

N. Itagaki, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani

2014 MRS Fall Meeting  2014.12 

スパッタリング成膜法による高品質酸化亜鉛薄膜の形成

板垣奈穂, 古閑一憲, 白谷正治

第30回　九州・山口プラズマ研究会  2014.11 

Synthesize of ZnO-based Semiconductor with Tunable Band Gap and Its Application in Multi-Quantum-Well Solar Cells International conference

N. Itagaki, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, and M. Shiratani

6th World Conferenceon Photovoltaic Energy Conversion  2014.11 

Non-Equilibrium and Extreme State -High-mobility amorphous In2O3:Sn films prepared via nitrogen-mediated amorphization- International conference

N. Itagaki, T. Nakanishi, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani

Plasma Conference 2014  2014.11 

Sputteing Growth of High-Quality ZnO-based Semiconductors for Optoelectronic Applications (Invited) Invited International conference

N. Itagaki

American Vacuum Society 61st International Symposium and Exhibition (AVS)  2014.11 

超高効率太陽電池への挑戦 ～量子効果を利用した新型太陽電池の実現に向けて～（招待講演） Invited

板垣奈穂

第25回精密加工プロセス研究会講演会  2014.10 

c面サファイア基板上への単結晶ZnO膜の形成 : 格子不整合系ヘテロエピタキシーにおける成長初期過程の表面形態の影響

板垣奈穂, 井出智章, 松島宏一, 山下大輔, 徐鉉雄, 古閑一憲, 白谷正治

第75回応用物理学会秋季学術講演会  2014.9 

Fabrication of Pseudo-binary ZnO-InN Alloys with Tunable Bandgap by Low-Temperature Magnetron Sputtering (Invited) Invited International conference

N. Itagaki

15th IUMRS-International Conference in Asia  2014.8 

Crystal Growth Control of Sputter-Deposited ZnO Films by Nitrogen-Mediated Crystallization Method International conference

N. Itagaki, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani

15th IUMRS-International Conference in Asia  2014.8 

Sputter-Deposition of Pseudobinary ZnO-InN Alloys with Tunable Bandgap for Photovoltaic Application (Invited) Invited International conference

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