Updated on 2024/07/28

Information

 

写真a

 
TSUTSUI KUNGEN
 
Organization
Faculty of Engineering Sciences Department of Advanced Energy Science and Engineering Associate Professor
School of Engineering (Joint Appointment)
Interdisciplinary Graduate School of Engineering Sciences Department of Interdisciplinary Engineering Sciences(Joint Appointment)
Title
Associate Professor
Contact information
メールアドレス
Profile
Keywords: Power electronics, Power semiconductor devices, Electronic and electrical materials, Ultrahard material, Biomedical material, Nanostructured material, Plasma engineering, Plasma CVD, Diamond, Nanocarbon, Cubic boron nitride, Cemented carbide, Semiconductor, Dielectric, Mass spectrometry, Electrostatic probe, Electron field emitter, Cutting tool, Implant, Mold
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Degree

  • Ph.D.

Research History

  • 名古屋大学ベンチャービジネスラボラトリー、1998-2001年

Research Interests・Research Keywords

  • Research theme:Super hard coatings, Biocoatings

    Keyword:Super hard materials, Biomaterials, Implants, Biocompatibility, Nitride, DLC, Cemented carbide, Transition metals, High-speed steels, Cutting tools, Mold, Tribology

    Research period: 2007.4

  • Research theme:Nanostructured carbon materials, Electron emitters

    Keyword:Nanocarbon, Nanodiamond, Amorphous carbon, Vacuum microelectronics, Electron source, Ion engine, Tunneling effect, Electron affinity, Composite film, Ultrathin film

    Research period: 2005.4

  • Research theme:Wide-gap semiconductors, Power electronics

    Keyword:Diamond, Boron nitride, Silicon Carbide, Crystal growth, Epitaxy, High-temperature devices, Power devices, Doping, Semiconductor processes

    Research period: 1998.4

  • Research theme:Plasma processing

    Keyword:Plasma CVD, Sputtering, Mass spectrometry, Electrostatic probe measurement, Optical spectroscopy

    Research period: 1998.4

Awards

  • 研究活動表彰

    2013.11   九州大学  

  • 研究活動表彰

    2012.11   九州大学  

  • 研究活動表彰

    2011.11   九州大学  

  • 優秀論文発表賞(A賞)

    2008.1   電気学会   電気学会が主催する研究会やシンポジウムにおける優れた研究発表が対象

  • 石井学術奨励賞(優秀賞)

    1998.1   総合研究奨励会   東京大学大学院の博士修了者のうち、優れた博士論文の提出者が対象

  • 優秀論文発表賞(A賞)

    1994.1   電気学会   電気学会が主催する研究会やシンポジウムにおける優れた研究発表が対象

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Papers

  • Enhanced Field Emission from Ultrananocrystalline Diamond-Decorated Carbon Nanowalls Prepared by a Self-Assembly Seeding Technique Reviewed International journal

    #L. Huang, #S. Harajiri, S. Wang, X. Wu, @K. Teii

    ACS Appl. Mater. Interfaces   2022.1

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Biocompatible Cubic Boron Nitride: A Noncytotoxic Ultrahard Material Reviewed International journal

    #J. H. C. Yang, @K. Teii, C.-C. Chang, @S. Matsumoto, M. Rafailovich

    Adv. Funct. Mater.   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Field Emission Characteristics of Metal Nanoparticle-Coated Carbon Nanowalls Reviewed International journal

    #Y. Kaneko, #K. Terada, @K. Teii

    Nanotechnology   2020.4

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Electrical Transport and Capacitance Characteristics of Metal-Insulator-Metal Structures using Hexagonal and Cubic Boron Nitride Films as Dielectrics Reviewed International journal

    @K. Teii, #S. Kawamoto, #S. Fukui, S. Matsumoto

    J. Appl. Phys.   2018.4

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  • Thermal Stability of Boron Nitride/Silicon p-n Heterojunction Diodes Reviewed International journal

    K. Teii, Y. Mizusako, T. Hori, S. Matsumoto

    J. Appl. Phys.   2015.10

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  • Rectification Properties of n-Type Nanocrystalline Diamond Heterojunctions to p-Type Silicon Carbide at High Temperatures Reviewed International journal

    M. Goto, R. Amano, N. Shimoda, Y. Kato, K. Teii

    Appl. Phys. Lett.   2014.4

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  • Direct Deposition of Cubic Boron Nitride Films on Tungsten Carbide-Cobalt Reviewed International journal

    K. Teii, S. Matsumoto

    ACS Appl. Mater. Interfaces   2012.10

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  • Synthesis and Electrical Characterization of n-Type Carbon Nanowalls Reviewed International journal

    K. Teii, S. Shimada, M. Nakashima, A. T. H. Chuang

    J. Appl. Phys.   2009.10

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  • Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanocrystalline Diamond Films Reviewed International journal

    T. Ikeda and K. Teii

    Appl. Phys. Lett.   2009.4

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  • Effect of the Sp2 Carbon Phase on n-Type Conduction in Nanodiamond Films Reviewed International journal

    T. Ikeda, K. Teii, C. Casiraghi, J. Robertson, A. C. Ferrari

    J. Appl. Phys.   2008.10

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  • Electron Field Emission from Nanostructured Cubic Boron Nitride Islands Reviewed International journal

    K. Teii, S. Matsumoto, J. Robertson

    Appl. Phys. Lett.   2008.1

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  • Synthesis of Cubic Boron Nitride Films with Mean Ion Energies of a Few eV Reviewed International journal

    K. Teii, R. Yamao, T. Yamamura, S. Matsumoto

    J. Appl. Phys.   2007.2

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  • Temperature Dependence of Electrical Characteristics of Metal-Carbon Nanowall Contacts Reviewed International journal

    #Z. Sun, #L. Huang, @Y. Kato, @K. Teii

    Mater. Chem. Phys.   2023.8

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  • Measurement of Oxygen Concentration in Atmospheric Air Using Ultrasound Time of Flight with Humidity Compensation Reviewed International journal

    #H. Fukuoka, #M. Taskin @K. Teii, @Y. Kato

    Rev. Sci. Instrum.   2023.3

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  • Effect of Precursor Gas on Growth Temperature and Electrical Conduction of Carbon Nanowalls in Microwave Plasma Enhanced Chemical Vapor Deposition Reviewed International journal

    #L. Huang, #H. Ikematsu, @Y. Kato, @K. Teii

    IEEE Trans. Plasma Sci.   2023.2

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  • Electrical Characteristics of Metal Contacts to Carbon Nanowalls Reviewed International journal

    #Z. Sun, #M. Cho, #L. Huang, #R. Hijiya, @Y. Kato, @K. Teii

    ECS J. Solid State Sci. Technol.   2022.6

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  • Control of Electrostatic Self-Assembly Seeding of Diamond Nanoparticles on Carbon Nanowalls Reviewed International journal

    #L. Huang, X. Wu, #R. Hijiya, @K. Teii

    Nanotechnology   2022.4

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  • Low Temperature Annealing of Nanocrystalline Si Paste for pn Junction Formation Reviewed International journal

    #Y. Kuboki, #H. Zhu, #M. Sakamoto, @H. Matsumoto, @K. Teii, @Y. Kato

    Mater. Sci. Semicond. Process.   2021.7

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  • Electrical Insulation Characteristics of Metal-Insulator-Metal Structures Using Boron Nitride Dielectric Films Deposited with Low-Energy Ion Impact Reviewed International journal

    #Y. Kamimura, #M. Torigoe, @K. Teii, S. Matsumoto

    Mater. Sci. Semicond. Process.   2021.1

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  • Ozone Behavior on Catalytic Probes and Its Application Studied in Gas Flow Downstream of Dielectric Barrier Discharge Ozonizers Reviewed International journal

    T.-L. Sung, C.-M. Liu, S. Ono, S. Teii, @K. Teii , K. Ebihara

    IEEE Trans. Plasma Sci.   2021.1

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  • Rapid Thermal Annealing of Si Paste Film and pn-Junction Formation Reviewed International journal

    #H. Zhu, #M. Sakamoto, #T. Pan, @T. Fujisaki, @H. Matsumoto, @K. Teii, @Y. Kato

    Nanotechnology   2020.9

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  • Effect of the Boron-to-Nitrogen Ratio on Leakage Current Characteristics of Boron Nitride Films Prepared by Surface-Wave Plasma Enhanced Chemical Vapor Deposition Reviewed International journal

    #Y. Kamimura, #T. Matsuura, @K. Teii, S. Matsumoto

    Thin Solid Films   2020.7

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  • Enhanced Field Emission from Metal-Coated Carbon Nanowalls Reviewed International journal

    #Y. Kaneko, #K. Terada, @K. Teii

    Jpn. J. Appl. Phys.   2019.10

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  • Lowering of the Substrate Bias Voltage for Deposition of Cubic Boron Nitride in Microwave Plasma Reviewed International journal

    #T. Nakakuma, @K. Teii, S. Matsumoto

    IEEE Trans. Plasma Sci.   2019.2

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  • Formation of Nanocrystalline Diamond Cones by Reactive Ion Etching in Microwave Plasma for Enhancing Field Emission Reviewed International journal

    #K. Ota, @Y. Kato, @K. Teii

    Jpn. J. Appl. Phys.   2019.1

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  • Effect of Low-Energy Ion Impact on the Structure of Hexagonal Boron Nitride Films Studied in Surface-Wave Plasma Reviewed International journal

    #M. Torigoe, #Y. Kamimura, @K. Teii, S. Matsumoto

    Surf. Interface Anal.   2019.1

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  • Field Emission Characteristics of Metal-Coated Nanocrystalline Diamond Films Reviewed International journal

    #K. Ota, #Y. Kaneko, #K. Terada, @Y. Kato, @K. Teii

    ECS J. Solid State Sci. Technol.   2018.7

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  • Leakage Current Characteristics of Thick Cubic Boron Nitride Films Deposited on Titanium Reviewed International journal

    #S. Kawamoto, #T. Nakakuma, @K. Teii, S. Matsumoto

    J. Appl. Phys.   2017.12

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  • Electrical Contacts to Nanocrystalline Diamond Films Studied at High Temperatures Reviewed International journal

    N. Shimoda, Y. Kato, K. Teii

    J. Appl. Phys.   2016.12

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  • Low-Energy Ion-Assisted Deposition of Boron Nitride Films in Surface-Wave Plasma Reviewed International journal

    M. Torigoe, K. Teii, S. Matsumoto

    IEEE Trans. Plasma Sci.   2016.12

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  • Superhydrophilic Cubic Boron Nitride Films Reviewed International journal

    K. Teii, S. Kawakami, S. Matsumoto

    RSC Adv.   2016.9

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  • Effect of the Hexagonal Phase Interlayer on Rectification Properties of Boron Nitride Heterojunctions to Silicon Reviewed International journal

    K. Teii, H. Ito, N. Katayama, S. Matsumoto

    J. Appl. Phys.   2015.2

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  • Numerical Study on Heat Flow during Catalytic Dissociation of Ozone in a Dielectric Barrier Discharge Ozonizer Reviewed International journal

    R.-C. Hsiao, T.-L. Sung, C.-M. Liu, S. Teii, S. Ono, K. Teii, K. Ebihara

    IEEE Trans. Plasma Sci.   2015.2

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  • Impact of Low-Energy Ions on Plasma Deposition of Cubic Boron Nitride Reviewed International journal

    K. Teii, S. Matsumoto

    Thin Solid Films   2015.2

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  • Plasma Deposition of Diamond at Low Pressures: A Review Reviewed International journal

    K. Teii

    IEEE Trans. Plasma Sci.   2014.12

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  • Hydrophilic Stability of Plastic Surfaces Treated in Low- and Atmospheric-Pressure Radio-Frequency Plasmas Reviewed International journal

    R.-C. Hsiao, T.-L. Sung, C.-M. Liu, S. Teii, T.-C. Chan, S. Ono, K. Teii, C.-C. Yang, S.-C. Zeng

    IEEE Trans. Plasma Sci.   2014.12

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  • Direct Measurement of Metal Surface Temperature during Catalytic Dissociation of Ozone for Sensor Application Reviewed International journal

    T.-L. Sung, R.-C. Hsiao, C.-M. Liu, S. Teii, H.-P. Jhou, K. Teii, S. Ono, K. Ebihara, F. Mitsugi

    IEEE Trans. Plasma Sci.   2014.12

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  • Self-Compensated Standing Wave Probe for Characterization of Radio-Frequency Plasmas Reviewed International journal

    T.-L. Sung, S. Matsumura, K. Teii, S. Teii

    Rev. Sci. Instrum.   2014.6

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  • Enhanced Wettability of Cubic Boron Nitride Films by Plasma Treatment Reviewed International journal

    J. H.C. Yang, S. Kawakami, K. Teii, S. Matsumoto

    Mater. Sci. Forum   2014.5

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  • Surface-Enhanced Ozone Dissociation in Gas Flow Downstream of a Dielectric Barrier Discharge Ozonizer Studied by Using Catalytic Probes Reviewed International journal

    R.-C. Hsiao, T.-L. Sung, C.-M. Liu, H.-T. Tseng, S. Teii, K. Teii, S. Ono, K. Ebihara

    Vacuum   2014.4

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  • Rectification Properties of Nanocrystalline Diamond/Silicon p-n Heterojunction Diodes Reviewed International journal

    K. Teii, T. Ikeda

    J. Appl. Phys.   2013.9

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  • Origin of Rectification in Boron Nitride Heterojunctions to Silicon Reviewed International journal

    K. Teii, T. Hori, Y. Mizusako, S. Matsumoto

    ACS Appl. Mater. Interfaces   2013.4

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  • Effect of Pulse Power Characteristics and Gas Flow Rate on Ozone Production in a Cylindrical Dielectric Barrier Discharge Ozonizer Reviewed International journal

    T.-L. Sung, S. Teii, C.-M. Liu, R.-C. Hsiao, P.-C. Chen, Y.-H. Wu, C.-K. Yang, K. Teii, S. Ono, K. Ebihara

    Vacuum   2013.4

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  • Surface Catalytic Effect of Electrode Materials on Ozone Dissociation in a Cylindrical Dielectric Barrier Discharge Ozonizer Reviewed International journal

    T.-L. Sung, S. Teii, C.-M. Liu, R.-C. Hsiao, P.-C. Chen, Y.-H. Wu, C.-K. Yang, S. Ono, K. Ebihara, K. Teii

    IEEE Trans. Plasma Sci.   2012.10

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  • Mechanisim of Enhanced Wettability of Nanocrystalline Diamond Films by Plasma Treatment Reviewed International journal

    J. H.C. Yang and K. Teii

    Thin Solid Films   2012.8

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  • Wettability of Amorphous Diamond-Like Carbons Deposited on Si and PMMA in Pulse-Modulated Plasmas Reviewed International journal

    T.-L. Sung, J. H.-C. Yang, K. Teii, S. Teii, C.-M. Liu, W.-Y. Tseng, L.-D. Lin, S. Ono

    IEEE Trans. Plasma Sci.   2012.7

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  • Low Threshold Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films Reviewed International journal

    C. Y. Cheng, M. Nakashima, K. Teii

    Diamond Relat. Mater.   2012.7

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  • Control of the Growth Regimes of Nanodiamond and Nanographite in Microwave Plasmas Reviewed International journal

    C. Y. Cheng and K. Teii

    IEEE Trans. Plasma Sci.   2012.7

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  • Low Threshold Field Emission from High-Quality Cubic Boron Nitride Films Reviewed International journal

    K. Teii, S. Matsumoto

    J. Appl. Phys.   2012.5

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  • Fabrication of 4H-SiC/Nanocrystalline Diamond pn Junctions Reviewed International journal

    R. Amano, M. Goto, Y. Kato, K. Teii

    Mater. Sci. Forum   2012.5

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  • Wettability of Plasma-Treated Nanocrystalline Diamond Films Reviewed International journal

    J. H.C. Yang and K. Teii

    Diamond Relat. Mater.   2012.4

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  • Formation of Epitaxial 3C-SiC Layers by Microwave Plasma-Assisted Carbonization Reviewed International journal

    Y. Kato, M. Goto, R. Sato, K. Yamada, A. Koga, K. Teii, C. Srey, S. Tanaka

    Surf. Coat. Technol.   2011.11

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  • Deposition of Amorphous Hydrogenated Carbon Films on Si and PMMA by Pulsed Direct-Current Plasma CVD Reviewed International journal

    T.-L. Sung, Y.-A. Chao, C.-M. Liu, K. Teii, S. Teii, C.-Y. Hsu

    Thin Solid Films   2011.8

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  • Fabrication of n-Type Nanocrystalline Diamond/3C-SiC/p-Si(001) Junctions Reviewed International journal

    M. Goto, A. Koga, K. Yamada, Y. Kato, K. Teii

    Mater. Sci. Forum   2011.3

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  • Growth and Electrical Properties of 3C-SiC/Nanocrystalline Diamond Layered Films Reviewed International journal

    A. Koga, K. Teii, M. Goto, K. Yamada, Y. Kato

    Jpn. J. Appl. Phys.   2011.1

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  • Enhanced Deposition of Cubic Boron Nitride Films on Roughened Silicon and Tungsten Carbide-Cobalt Surfaces Reviewed International journal

    K. Teii, T. Hori, S. Matsumoto

    Thin Solid Films   2011.1

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  • Feasibility Study on Cubic Boron Nitride Coated Glass Press Molds Reviewed International journal

    K. Teii and S. Matsumoto

    Diamond Relat. Mater.   2010.11

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  • Low Threshold Field Emission from Nitrogen-Incorporated Carbon Nanowalls Reviewed International journal

    S. Shimada, K. Teii, M. Nakashima

    Diamond Relat. Mater.   2010.7

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  • Synthesis and Field Emission Properties of Nanocrystalline Diamond/Carbon Nanowall Composite Films Reviewed International journal

    K. Teii and M. Nakashima

    Appl. Phys. Lett.   2010.1

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  • Effect of Cubic Phase Evolution on Field Emission Properties of Boron Nitride Island Films Reviewed International journal

    K. Teii, R. Yamao, S. Matsumoto

    J. Appl. Phys.   2009.12

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  • Role of Hydrogen in Ultrananocrystalline Diamond Deposition from Argon-Rich Microwave Plasmas Reviewed International journal

    C.-M. Liu, K. Teii, T.-L. Sung, K. Ting, S. Teii

    IEEE Trans. Plasma Sci.   2009.7

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  • Origin of Reverse Leakage Current in n-Type Nanocrystalline Diamond/p-Type Silicon Heterojunction Diodes Reviewed International journal

    T. Ikeda and K. Teii

    Appl. Phys. Lett.   2009.2

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  • Conductive and Resistive Nanocrystalline Diamond Films Studied by Raman Spectroscopy Reviewed International journal

    K. Teii and T. Ikeda

    Diamond Relat. Mater.   2007.4

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  • Effect of Enhanced C2 Growth Chemistry on Nanodiamond Film Deposition Reviewed International journal

    K. Teii, T. Ikeda

    Appl. Phys. Lett.   2007.3

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  • Formation of Microcrystalline Diamond using a Low-Pressure Inductively Coupled Plasma Assisted by Thermal Decomposition of di-t-Alkyl Peroxide Reviewed International journal

    H. Ito, K. Teii, M. Ito. M. Hori

    Diamond Relat. Mater.   2007.1

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  • Local Retarding Field for Ions towards a Positively Biased Substrate in Plasma and its Application to Soft Ion-Bombardment Processing Reviewed International journal

    K. Teii and S. Matsumoto

    J. Appl. Phys.   2007.1

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  • Polymerization in Nanocrystalline Diamond Films by Oxygen Incorporation Reviewed International journal

    K. Teii and T. Ikeda

    Plasma Process. Polym.   2006.11

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  • In Vacuo Substrate Pretreatments for Enhancing Nanodiamond Formation in Electron Cyclotron Resonance Plasma Reviewed International journal

    K. Teii, Y. Kouzuma, K. Uchino

    J. Vac. Sci. Technol.   2006.9

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  • Comparative Study on Nanocrystalline Diamond Growth from Acetylene and Methane Reviewed International journal

    T. Ikeda and K. Teii

    Diamond Relat. Mater.   2006.4

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  • Effect of Hydrogen Plasma Exposure on the Amount of trans-Polyacetylene in Nanocrystalline Diamond Films Reviewed International journal

    K. Teii, T. Ikeda, A. Fukutomi, K. Uchino

    J. Vac. Sci. Technol.   2006.1

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  • Time Dependence of Nucleation Density and Crystallinity of Diamond in Low-Pressure, Ion-Enhanced Deposition Reviewed International journal

    Y. Kouzuma, K. Teii, S. Mizobe, K. Uchino, K. Muraoka

    Diamond Relat. Mater.   13 ( 4-8 )   656 - 660   2004.5

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    DOI: 10.1016/j.diamond.2003.10.071

  • Prediction of a Threshold Density of Atomic Hydrogen for Nanocrystalline Diamond Growth at Low Pressures Reviewed International journal

    K. Teii

    Chem. Phys. Lett.   389 ( 4-6 )   251 - 254   2004.5

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    DOI: 10.1016/j.cplett.2004.03.096

  • Diagnostic and Analytical Study on a Low-Pressure Limit of Diamond Chemical Vapor Deposition in Inductively Coupled CO-CH4-H2 Plasmas Reviewed International journal

    K. Teii, M. Hori, T. Goto

    J. Appl. Phys.   95 ( 8 )   4463 - 4470   2004.5

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    DOI: 10.1063/1.1686900

  • Diamond Nucleation Density as a Function of Ion-Bombardment Energy in Electron Cyclotron Resonance Plasma Reviewed International journal

    Y. Kouzuma, K. Teii, K. Uchino, K. Muraoka

    Phys. Rev. B   68 ( 6 )   064104   2003.8

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    DOI: 10.1103/PhysRevB.68.064104

  • Argon Dilution Effects on Diamond Deposition in Electron Cyclotron Resonance Plasma: A Double Probe Study Reviewed International journal

    K. Teii, H. Yoshioka, S. Ono, S. Teii

    Thin Solid Films   437 ( 1-2 )   63 - 67   2003.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/S0040-6090(03)00669-2

  • Time- and Space-Resolved Electric Potentials in a Parallel-Plate Radio-Frequency Plasma Reviewed International journal

    K. Teii, M. Mizumura, S. Matsumura, S. Teii

    J. Appl. Phys.   2003.5

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.1568158

  • Ion-to-CH3 Flux Ratio in Diamond Chemical-Vapor Deposition Reviewed International journal

    K. Teii, M. Hori, T. Goto

    J. Appl. Phys.   92 ( 7 )   4103 - 4108   2002.10

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    DOI: 10.1063/1.1506384

  • Diamond Nucleation Enhancement on Si by Controlling Ion-Bombardment Eneragy in Electron Cyclotron Resonance Plasma Reviewed International journal

    Y. Kouzuma, K. Teii, K. Uchino, K. Muraoka

    Jpn. J. Appl. Phys.   41 ( 9 )   5749 - 5750   2002.9

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    DOI: 10.1143/JJAP.41.5749

  • Soft Ion Impact for Surface Activation during Diamond Chemical-Vapor Deposition on Diamond and Silicon Reviewed International journal

    K. Teii

    Phys. Rev. B   64 ( 12 )   125327   2001.9

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Dual-Electrode Biasing for Controlling Ion-to-Adatom Flux Ratio during Ion-Assisted Deposition of Diamond Reviewed International journal

    K. Teii, M. Hori, T. Goto

    J. Appl. Phys.   89 ( 9 )   4714 - 4718   2001.5

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.1359159

  • Negative Bias Dependence of Sulfur and Fluorine Incorporation in Diamond Films Etched by an SF6 Plasma Reviewed International journal

    K. Teii, M. Hori, T. Goto

    J. Electrochem. Soc.   2001.2

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Codeposition on Diamond Film Surface during Reactive Ion Etching in SF6 and O2 Plasmas Reviewed International journal

    K. Teii, M. Hori, T. Goto

    J. Vac. Sci. Technol.   2000.11

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Loss Kinetics of Carbon Atoms in Low-Pressure High-Density Plasmas Reviewed International journal

    H. Ito, K. Teii, H. Funakoshi, M. Hori, T. Goto, M. Ito, T. Takeo

    J. Appl. Phys.   2000.10

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Precursors of Fluorocarbon Film Growth Studied by Mass Spectrometry Reviewed International journal

    K. Teii, M. Hori, T. Goto, N. Ishii

    J. Appl. Phys.   2000.5

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  • Kinetics and Role of C, O, and OH in Low-Pressure Nanocrystalline Diamond Growth Reviewed International journal

    K. Teii, H. Ito, M. Hori, T. Takeo, T. Goto

    J. Appl. Phys.   2000.5

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  • Study on Polymeric Neutral Species in High-Density Fluorocarbon Plasmas Reviewed International journal

    K. Teii, M. Hori, M. Ito, T. Goto, N. Ishii

    J. Vac. Sci. Technol.   2000.1

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  • Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma Reviewed International journal

    H. Ito, K. Teii, M. Ishikawa, M. Ito, M. Hori, T. Takeo, T. Kato, T, Goto

    Jpn. J. Appl. Phys.   1999.7

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Independent Control of Ion Energy and Flux in Plasma-Enhanced Diamond Growth Reviewed International journal

    K. Teii

    Appl. Phys. Lett.   1999.6

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Lower Pressure Limit of Diamond Growth in Inductively Coupled Plasma Reviewed International journal

    K. Teii and T. Yoshida

    J. Appl. Phys.   1999.2

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Diagnostics of the Diamond-Depositing Inductively Coupled Plasma by Electrostatic Probes and Optical Emission Spectroscopy Reviewed International journal

    K. Teii

    J. Vac. Sci. Technol.   1999.1

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  • Structure Changes in a-C:H Films in Inductive CH4/Ar Plasma Deposition Reviewed International journal

    K. Teii and T. Yoshida

    Thin Solid Films   1998.11

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    Language:English   Publishing type:Research paper (scientific journal)  

  • ダイヤモンド合成用低圧誘導結合プラズマのプローブ測定 Reviewed

    堤井 君元、吉田 豊信

    電気学会論文誌   1998.7

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

  • Positive Bias Effects on the Growth of Diamond at Pressures below 100 mTorr Reviewed International journal

    K. Teii and T. Yoshida

    Thin Solid Films   1998.3

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▼display all

Books

  • 工業材料「超硬質高結晶性立方晶窒化ホウ素膜」

    松本精一郎, 堤井君元( Role: Joint author)

    日刊工業新聞社  2009.1 

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    Responsible for pages:Vol. 57, No. 1, 42-43頁(2009)   Language:Japanese   Book type:General book, introductory book for general audience

Presentations

  • Plasma Deposition of Boron Nitride Films and Nanodiamond-Nanowall Hybrids for Electronic and Optoelectronic Applications Invited International conference

    @K. Teii

    Diamond Jubilee Lecture on Materials for Optoelectronic Devices  2023.11 

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    Event date: 2023.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:India  

    Plasma Deposition of Boron Nitride Films and Nanodiamond-Nanowall Hybrids for Electronic and Optoelectronic Applications, K. Teii, Diamond Jubilee Lecture on Materials for Optoelectronic Devices, Bhubanesvar (online), 2023.

  • プラズマCVD法による高品位cBN膜の成膜技術と応用展開(招待講演) Invited

    @堤井君元

    表面技術協会関西支部令和4年度第2回表面物性研究会  2022.10 

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    Event date: 2022.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大阪   Country:Japan  

  • プラズマCVDでつくる高品質立方晶窒化ホウ素とその応用(招待講演) Invited

    @堤井君元

    第75回CVD研究会  2021.10 

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    Event date: 2021.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Plasma Deposition of Cubic Boron Nitride Films for Hard Coatings and Electronic Devices (INVITED) International conference

    K. Teii, S. Matsumoto

    10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Plasma Deposition of Cubic Boron Nitride Films for Hard Coatings and Electronic Devices (INVITED), K. Teii, S. Matsumoto, 10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2017.

  • プラズマ技術がつくる新しい立方晶窒化ホウ素―超硬コーティングと半導体への応用―(依頼講演) Invited

    堤井 君元

    名古屋産業振興公社プラズマ技術産業応用センター第54回プラズマが拓くものづくり研究会(プラズマ技術講演会)「革新的プラズマコーティング技術とその産業応用」  2015.10 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋   Country:Japan  

  • Plasma Deposition and Electrical Applications of High-Quality Cubic Boron Nitride Films (INVITED) Invited International conference

    K. Teii, S. Matsumoto

    8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2013.12 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Plasma Deposition and Electrical Applications of High-Quality Cubic Boron Nitride Films (INVITED), K. Teii, S. Matsumoto, 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2013.

  • Electron Field Emission from Semiconducting Carbon Nanowalls and Boron Nitride Films (INVITED) International conference

    K. Teii, J. H.C. Yang, S. Matsumoto

    8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013)  2013.12 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Electron Field Emission from Semiconducting Carbon Nanowalls and Boron Nitride Films (INVITED), K. Teii, J. H.C. Yang, S. Matsumoto, 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), USA, 2013.

  • Plasma Deposition and Applications of Cubic Boron Nitride Films (INVITED) Invited International conference

    K. Teii, J. H.C. Yang, S. Matsumoto

    IUMRS-International Conference on Electronic Materials 2012  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Country:Japan  

    Plasma Deposition and Applications of Cubic Boron Nitride Films (INVITED), K. Teii, J. H.C. Yang, S. Matsumoto, IUMRS-International Conference on Electronic Materials 2012, Japan, 2012.

  • 立方晶窒化ホウ素膜のプラズマCVD合成と電気電子応用(依頼講演) Invited

    堤井 君元

    第80回表面科学研究会「窒化ホウ素:電子デバイス材料としての課題と展望」  2014.1 

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜   Country:Japan  

  • Plasma Enhanced Deposition of Cubic Boron Nitride Films under Ultralow-Energy Ion Impact: Structural Evolution and Electrical Properties (INVITED) Invited International conference

    K. Teii and S. Matsumoto

    35th International Conference on Metallurgical Coatings and Thin Films  2008.5 

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    Presentation type:Oral presentation (general)  

    Country:United States  

    Plasma Enhanced Deposition of Cubic Boron Nitride Films under Ultralow-Energy Ion Impact: Structural Evolution and Electrical Properties (INVITED), K. Teii and S. Matsumoto, 35th International Conference on Metallurgical Coatings and Thin Films, USA, 2008.

  • Synthesis and Electrical Properties of Cubic Boron Nitride Films by Plasma-Enhanced Chemical Vapor Deposition under Low-Energy Ion Bombardment (INVITED) Invited International conference

    K. Teii and S. Matsumoto

    6th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2009.12 

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    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Synthesis and electrical properties of cubic boron nitride films by plasma-enhanced chemical vapor deposition under low-energy ion bombardment (INVITED), K. Teii and S. Matsumoto, 6th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2009.

  • 立方晶窒化ホウ素膜のプラズマCVD合成と応用 (依頼講演) Invited

    堤井 君元

    日本真空協会スパッタリングおよびプラズマプロセス技術部会第122回定例研究会「ハードマテリアルに関する最近の動向」  2011.3 

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    Presentation type:Symposium, workshop panel (public)  

    Venue:東京   Country:Japan  

  • マイクロ波プラズマCVDによるナノウォール構造体の生成条件と電気特性に関する研究

    #Sun Zewen, #大寳正太, #Nahar Arijun, @加藤喜峰, @堤井君元

    電気学会誘電・絶縁材料/放電・プラズマ・パルスパワー/高電圧合同研究会  2024.1 

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    Event date: 2024.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大分、オンライン   Country:Japan  

  • ダイヤモンドナノ粒子で修飾したナノウォール構造体の電界放出特性と電界分布シミュレーション

    #原尻駿吾, #Huang Lei, #Nahar Arijun, @堤井君元

    第70回応用物理学会春季学術講演会  2023.3 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 炭素ナノウォール構造体の電界放出特性と電界分布シミュレーション

    #原尻駿吾, #Huang Lei, @堤井君元

    第70回応用物理学会春季学術講演会  2023.3 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • ナノウォール構造体からの電界放出における電界シミュレーション

    #原尻駿吾, #Huang Lei, @堤井君元

    令和4年度電気・情報関係学会北海道支部連合大会  2022.11 

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    Event date: 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 電界シミュレーションを用いたナノウォール構造体の電界放出特性に関する研究

    #原尻駿吾, #Huang Lei, @堤井君元

    2022年度(第75回)電気・情報関係学会九州支部連合大会  2022.9 

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    Event date: 2022.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Control of Self-Assembly Seeding of Diamond Nanoparticles on Nanowall Structures for Enhancing Field Emission International conference

    #L. Huang, #S. Harajiri, #R. Hijiya, @K. Teii

    International Thin Film Conference (TACT) 2021  2021.11 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Control of Self-Assembly Seeding of Diamond Nanoparticles on Nanowall Structures for Enhancing Field Emission, L. Huang, S. Harajiri, R. Hijiya, K. Teii, International Thin Film Conference (TACT) 2021, Taiwan (online), 2021.

  • Lowering of the Substrate Bias Voltage for Formation of Cubic Boron Nitride Films in Microwave Plasma International conference

    #H. Ikematsu, #T. Nakakuma, @K. Teii, S. Matsumoto

    International Thin Film Conference (TACT) 2021  2021.11 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Lowering of the Substrate Bias Voltage for Formation of Cubic Boron Nitride Films in Microwave Plasma, H. Ikematsu, T. Nakakuma, K. Teii, S. Matsumoto, International Thin Film Conference (TACT) 2021, Taiwan (online), 2021.

  • Electrical Characterization of Metal Contacts to Nitrogen-Incorporated Nanowall Structures International conference

    #Z. Sun, #M. Cho, #R. Hijiya, #L. Huang, @K. Teii

    International Thin Film Conference (TACT) 2021  2021.11 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Electrical Characterization of Metal Contacts to Nitrogen-Incorporated Nanowall Structures, Z. Sun, M. Cho, R. Hijiya, L. Huang, K. Teii, International Thin Film Conference (TACT) 2021, Taiwan (online), 2021.

  • Wetting Behavior of Plasma-Treated Ultrahard Boron Nitride Films International conference

    J. H. C. Yang, @K. Teii, S. Matsumoto

    International Thin Film Conference (TACT) 2021  2021.11 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Wetting Behavior of Plasma-Treated Ultrahard Boron Nitride Films, J. H. C. Yang, K. Teii, S. Matsumoto, International Thin Film Conference (TACT) 2021, Taiwan (online), 2021.

  • Plasma Deposition of High-Quality Cubic Boron Nitride Films for Applications to Ultrahard Coatings and Electronic Devices (INVITED) Invited International conference

    @K. Teii, J. H. C. Yang, S. Matsumoto

    7th International Symposium on Advanced Ceramics and Technology for Sustainable Energy Applications toward a Low Carbon Society  2021.11 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Plasma Deposition of High-Quality Cubic Boron Nitride Films for Applications to Ultrahard Coatings and Electronic Devices (INVITED), K. Teii, J. H. C. Yang, S. Matsumoto, 7th International Symposium on Advanced Ceramics and Technology for Sustainable Energy Applications toward a Low Carbon Society, Taiwan (online), 2021.

  • 低エネルギーイオン衝撃下でのプラズマCVDを用いたエレクトロニクス材料の合成と機能物性評価(招待講演) Invited

    @堤井君元

    電気学会プラズマ材料表面処理技術の動向調査専門委員会第4回研究会  2021.5 

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    Event date: 2021.5

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 均一なナノダイヤモンド膜形成のための基板への堆積前処理

    #泥谷亮太, #黄磊, @堤井君元

    日本セラミックス協会2021年年会  2021.3 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • ナノダイヤモンド膜の微細加工と電界放出特性の評価

    #泥谷亮太, #太田洸輝, @堤井君元

    日本セラミックス協会2021年年会  2021.3 

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    Event date: 2021.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 表面波プラズマCVDを用いた窒化ホウ素膜の合成と絶縁性評価

    #泥谷亮太, #伊藤隆太, #山本世翔, #神村勇馬, @堤井君元, 松本精一郎

    電気学会誘電・絶縁材料/放電・プラズマ・パルスパワー/高電圧合同研究会  2021.1 

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    Event date: 2021.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Field Emission Characteristics of Nanocrystalline Diamond Cones Prepared by Reactive Ion Etching in Microwave Plasma International conference

    #R. Hijiya, #K. Ota, @K. Teii

    11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2019.12 

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    Event date: 2019.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    Field Emission Characteristics of Nanocrystalline Diamond Cones Prepared by Reactive Ion Etching in Microwave Plasma, R. Hijiya, K. Ota, K. Teii, 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Kanazawa, 2019.

  • Structure and Electrical Properties of Boron Nitride Films Deposited by Surface Wave Plasma Enhanced Chemical Vapor Deposition International conference

    #T. Matsuura, #Y. Kamimura, #M. Torigoe, @K. Teii, S. Matsumoto

    11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2019.12 

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    Event date: 2019.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    Structure and Electrical Properties of Boron Nitride Films Deposited by Surface Wave Plasma Enhanced Chemical Vapor Deposition, T. Matsuura, Y. Kamimura, M. Torigoe, K. Teii, S. Matsumoto, 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Kanazawa, 2019.

  • Field Emission Characteristics of Nanostructured Boron Nitride Films Deposited by Plasma Chemical Vapor Deposition International conference

    #R. Ito, #R. Hijiya, #S. Yamamoto @K. Teii, S. Matsumoto

    21st Cross Straits Symposium on Energy and Environmental Science and Technology  2019.11 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:China  

    Field Emission Characteristics of Nanostructured Boron Nitride Films Deposited by Plasma Chemical Vapor Deposition, R. Ito, R. Hijiya, S. Yamamoto K. Teii, S. Matsumoto, 21st Cross Straits Symposium on Energy and Environmental Science and Technology, Shanghai, 2019.

  • Field Emission Characteristics of Metal Nanoparticle-Coated Carbon Nanostructures International conference

    Y. Kaneko, K. Terada, @Y. Kato, @K. Teii

    International Thin Film Conference (TACT) 2019  2019.11 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Field Emission Characteristics of Metal Nanoparticle-Coated Carbon Nanostructures, Y. Kaneko, K. Terada, Y. Kato, K. Teii, International Thin Film Conference (TACT) 2019, Taiwan, 2019.

  • Rapid Thermal Annealing on Si Film and pn-Junction Formation by Si Paste International conference

    #H. Zhu, @Y. Kato, @K. Teii

    International Thin Film Conference (TACT) 2019  2019.11 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Rapid Thermal Annealing on Si Film and pn-Junction Formation by Si Paste, H. Zhu, Y. Kato, K. Teii, International Thin Film Conference (TACT) 2019, Taiwan, 2019.

  • Impact of Low-Energy Ions on Plasma Deposition of Cubic Boron Nitride Films for Electronic Applications International conference

    @K. Teii, S. Matsumoto

    International Thin Film Conference (TACT) 2019  2019.11 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Impact of Low-Energy Ions on Plasma Deposition of Cubic Boron Nitride Films for Electronic Applications, K. Teii, S. Matsumoto, International Thin Film Conference (TACT) 2019, Taiwan, 2019.

  • Effect of Low-Energy Ion impact on Structure and Electrical Properties of Boron Nitride Thin Films Studied in Surface-Wave Plasma International conference

    #M. Torigoe, #Y. Kamimura, @K. Teii, S. Matsumoto

    International Thin Film Conference (TACT) 2019  2019.11 

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    Event date: 2019.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Effect of Low-Energy Ion impact on Structure and Electrical Properties of Boron Nitride Thin Films Studied in Surface-Wave Plasma, M. Torigoe, Y. Kamimura, K. Teii, S. Matsumoto, International Thin Film Conference (TACT) 2019, Taiwan, 2019.

  • Effect of Low-Energy Ion Impact on the Structure of Boron Nitride Films Studied in Surface-Wave Plasma International conference

    #Y. Kamimura, #T. Matsuura, #M. Torigoe, @K. Teii, S. Matsumoto

    40th International Symposium on Dry Process  2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    Effect of Low-Energy Ion Impact on the Structure of Boron Nitride Films Studied in Surface-Wave Plasma, Y. Kamimura, T. Matsuura, M. Torigoe, K. Teii, S. Matsumoto, 40th International Symposium on Dry Process, Japan, 2018.

  • 表面波プラズマCVDを用いた窒化ホウ素膜の合成と構造および電気特性評価

    神村勇馬, 松浦貴志, 鳥越雅敬, 堤井君元, 松本精一郎

    電気学会プラズマ/パルスパワー/放電合同研究会  2018.10 

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    Event date: 2018.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大分大学(大分市)   Country:Japan  

  • Enhanced Wettability of Cubic Boron Nitride Films for Biomedical Applications International conference

    K. Teii, S. Kawakami, S. Matsumoto

    69th Annual Meeting of the International Society of Electrochemistry  2018.9 

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    Event date: 2018.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Italy  

    Enhanced Wettability of Cubic Boron Nitride Films for Biomedical Applications, K. Teii, S. Kawakami, S. Matsumoto, 69th Annual Meeting of the International Society of Electrochemistry, Italy, 2018.

  • フッ素支援プラズマCVD法を用いた立方晶窒化ホウ素膜の島成長と電界放出特性評価

    高橋 里奈, 堤井 君元, 松本 精一郎

    平成30年電気学会全国大会  2018.3 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡   Country:Japan  

  • Decolorization and Kinetic Effect of Azo Dyes Aqueous Solution by Ozone International conference

    R.-C. Hsiao, Z.-J. Li, C.-Y. Lai, P.-K. Tang, K.-Y. Hsiao, T.-L. Sung, S. Teii, K. Teii

    10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Decolorization and Kinetic Effect of Azo Dyes Aqueous Solution by Ozone, R.-C. Hsiao, Z.-J. Li, C.-Y. Lai, P.-K. Tang, K.-Y. Hsiao, T.-L. Sung, S. Teii, K. Teii, 10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2017.

  • Rectification Properties of Boron Nitride Heterojunctions to Silicon International conference

    K. Teii, M, Ishida, R. Takahashi, S. Matsumoto

    11th International Symposium on Atomic Level Characterizations for New Materials and Devices  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Rectification Properties of Boron Nitride Heterojunctions to Silicon, K. Teii, M, Ishida, R. Takahashi, S. Matsumoto, 11th International Symposium on Atomic Level Characterizations for New Materials and Devices, USA, 2017.

  • Plasma Deposition of Boron Nitride Films using Low-Energy Ion Bombardment International conference

    Y. Kamimura, M, Torigoe, K. Teii, S. Matsumoto

    11th International Symposium on Atomic Level Characterizations for New Materials and Devices  2017.12 

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    Event date: 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Plasma Deposition of Boron Nitride Films using Low-Energy Ion Bombardment, Y. Kamimura, M, Torigoe, K. Teii, S. Matsumoto, 11th International Symposium on Atomic Level Characterizations for New Materials and Devices, USA, 2017.

  • 表面波プラズマCVDを用いた窒化ホウ素膜の合成と物性評価

    神村 勇馬, 鳥越 雅敬, 石田 学, 高橋 里奈, 堤井 君元, 松本 精一郎

    電気学会プラズマ/パルスパワー/放電合同研究会  2017.10 

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    Event date: 2017.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:熊本大学(熊本市)   Country:Japan  

  • 立方晶窒化ホウ素膜のプラズマ堆積に及ぼす低エネルギーイオンの影響

    村田 一磨, 石田 学, 堤井 君元, 松本 精一郎

    第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム  2017.1 

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    Event date: 2017.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学(札幌市)   Country:Japan  

  • エチレン(C2H4)を用いたSi(100)基板表面の炭化 Invited

    原崎 俊栄, 加藤 喜峰, 梶原 隆司, 田中 悟, 堤井 君元

    応用物理学会九州支部学術講演会  2016.12 

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    Event date: 2016.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎   Country:Japan  

  • Rectification Properties of Boron Nitride/Silicon Heterostructure Diodes International conference

    K. Teii, H. Ito, N. Katayama, S. Matsumoto

    7th Pacific Rim Meeting on Electrochemical and Solid-State Science  2016.10 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Rectification Properties of Boron Nitride/Silicon Heterostructure Diodes, K. Teii, H. Ito, N. Katayama, S. Matsumoto, 7th Pacific Rim Meeting on Electrochemical and Solid-State Science, USA, 2016.

  • Role of Low-Energy Ion Impact in Plasma Deposition of Cubic Boron Nitride Films International conference

    K. Murata, M. Torigoe, K. Teii, S. Matsumoto

    7th Pacific Rim Meeting on Electrochemical and Solid-State Science  2016.10 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Role of Low-Energy Ion Impact in Plasma Deposition of Cubic Boron Nitride Films, K. Murata, M. Torigoe, K. Teii, S. Matsumoto, 7th Pacific Rim Meeting on Electrochemical and Solid-State Science, USA, 2016.

  • Plasma Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for High-Efficiency Field Emitters International conference

    Y. Kaneko, K. Terada, K. Teii

    9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials  2015.12 

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    Event date: 2015.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    Plasma Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for High-Efficiency Field Emitters, Y. Kaneko, K. Terada, K. Teii, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, Japan, 2015.

  • Plasma Deposition of Cubic Boron Nitride Films for High-Power Electronic Devices International conference

    S. Fukui, M. Torigoe, K. Teii, S. Matsumoto

    9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials  2015.12 

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    Event date: 2015.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    Plasma Deposition of Cubic Boron Nitride Films for High-Power Electronic Devices, S. Fukui, M. Torigoe, K. Teii, S. Matsumoto, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, Japan, 2015.

  • Double Probe Method to Form a Simple Ozone Detector Using the Effect of Catalytic Ozone Dissociation on Metal Surface International conference

    R. C. Hsiao, T. L. Sung, C. M. Liu, S. Teii, H.-P. Jhou, S. Ono, K. Ebihara, K. Teii

    9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials  2015.12 

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    Event date: 2015.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    Double Probe Method to Form a Simple Ozone Detector Using the Effect of Catalytic Ozone Dissociation, R. C. Hsiao, T. L. Sung, C. M. Liu, S. Teii, H.-P. Jhou, S. Ono, K. Ebihara, K. Teii, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, Japan, 2015.

  • プラズマ曝露処理による親水性硬質コーティングの作製

    J. Yang, 金子 祐太, 堤井 君元

    電気学会プラズマ研究会  2015.10 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:宮崎   Country:Japan  

  • Plasma-Enhanced Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for Field Emitters International conference

    K. Teii, Y. Kaneko, K. Terada, A.T.H. Chuang

    68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing  2015.10 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Plasma-Enhanced Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for Field Emitters, K. Teii, Y. Kaneko, K. Terada, A.T.H. Chuang, 68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, USA, 2015.

  • Effect of Low-Energy Ions on Plasma-Enhanced Deposition of Cubic Boron Nitride International conference

    M. Torigoe, S. Fukui, K. Teii, S. Matsumoto

    68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing  2015.10 

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    Event date: 2015.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Effect of Low-Energy Ions on Plasma-Enhanced Deposition of Cubic Boron Nitride, M. Torigoe, S. Fukui, K. Teii, S. Matsumoto, 68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, USA, 2015.

  • 立方晶窒化ホウ素のプラズマCVDに及ぼす低エネルギーイオン衝撃の影響

    鳥越 雅敬, 福井 慎吾, 堤井 君元, 松本 精一郎

    電気学会プラズマ研究会  2015.6 

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    Event date: 2015.6 - 2015.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:札幌   Country:Japan  

  • 立方晶窒化ホウ素を用いた電界放出カソードの開発

    坂井 寿光, 山本 直嗣, 大川 恭志, 堤井 君元, 船木 一幸, 森田 太智, 中島 秀紀

    第58回宇宙科学技術連合講演会  2014.11 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎   Country:Japan  

  • 触媒金属含有基板上への硬質窒化ホウ素コーティング

    堤井 君元, 松本 精一郎

    日本鉄鋼協会第168回秋季講演大会  2014.9 

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    Event date: 2014.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋   Country:Japan  

  • Plasma Deposition and Applications of Nanodiamond Films (INVITED) Invited International conference

    K. Teii

    2014 International Workshop on Plasma Applications in Nanocarbon Materials and Devices  2014.2 

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    Event date: 2014.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

    Plasma Deposition and Applications of Nanodiamond Films (INVITED), K. Teii, 2014 International Workshop on Plasma Applications in Nanocarbon Materials and Devices, Japan, 2014.

  • Electrical and Thermal Transport Properties of Nanocystal-Embedded Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Invited International conference

    J. H.C. Yang, T. Ikeda, K. Teii

    8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2013.12 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Electrical and Thermal Transport Properties of Nanocystal-Embedded Films Deposited by Plasma-Enhanced Chemical Vapor Deposition, J. H.C. Yang, T. Ikeda, K. Teii, 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2013.

  • ナノクリスタルダイヤモンド薄膜の各種オーミック電極

    下田 尚考, 加藤 喜峰, 堤井 君元

    SiC及び関連半導体研究第22回講演会  2013.12 

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    Event date: 2013.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:埼玉   Country:Japan  

  • Enhanced Wettability of Cubic Boron Nitride Films by Plasma Treatment International conference

    J. H.C. Yang, S. Kawakami, K. Teii, S. Matsumoto

    8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013)  2013.12 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Enhanced Wettability of Cubic Boron Nitride Films by Plasma Treatment, J. H.C. Yang, S. Kawakami, K. Teii, S. Matsumoto, 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), USA, 2013.

  • Structure and Electrical Properties of Wide-Gap Boron Nitride Films International conference

    K. Teii, S. Kawamoto, H. Ito, S. Matsumoto

    9th International Symposium on Atomic Level Characterizations for New Materials and Devices  2013.12 

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    Event date: 2013.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

    Structure and Electrical Properties of Wide-Gap Boron Nitride Films, K. Teii, S. Kawamoto, H. Ito, S. Matsumoto, 9th International Symposium on Atomic Level Characterizations for New Materials and Devices, USA, 2013.

  • Development of Next Generation Wide Band-Gap Materials for High Temperature Electronics (KEYNOTE) International conference

    K. Teii

    15th Cross Straits Symposium on Energy and Environmental Science and Technology  2013.11 

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    Event date: 2013.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:China  

    Development of Next Generation Wide Band-Gap Materials for High Temperature Electronics (KEYNOTE), K. Teii, 15th Cross Straits Symposium on Energy and Environmental Science and Technology, China, 2013.

  • 炭素ナノウォールのプラズマCVD合成と電界放出特性評価

    青木 智宏, 山口 亮太, 堤井 君元

    電気学会プラズマ研究会  2013.9 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎   Country:Japan  

  • Electron Emission Properties of Boron Nitride Layered Films on Silicon International conference

    K. Teii, S. Kawamoto, H. Ito, S. Matsumoto

    24th International Conference on Diamond and Carbon Materials  2013.9 

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    Event date: 2013.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Italy  

    Electron Emission Properties of Boron Nitride Layered Films on Silicon, K. Teii, S. Kawamoto, H. Ito, and S. Matsumoto, 24th International Conference on Diamond and Carbon Materials, Italy, 2013.

  • Plasma Treatment of Nanocrystalline Diamond Films for Biocoating Applications International conference

    J. H.C. Yang, K. Teii

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2013.1 

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    Event date: 2013.1 - 2013.2

    Presentation type:Oral presentation (general)  

    Country:Japan  

    Plasma Treatment of Nanocrystalline Diamond Films for Biocoating Applications, J. Yang, K. Teii, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Nagoya, 2013.

  • Plasma Deposition and Electronic Applications of Nanostructured Wide-Gap Materials

    S. Kawamoto, N. Katayama, K. Teii, S. Matsumoto

    2013.1 

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    Event date: 2013.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Mechanism of Enhanced Wettability of Nanostructured Diamond-Like Films by Plasma Treatment

    J. H.C. Yang, R. Yamaguchi, K. Teii

    2013.1 

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    Event date: 2013.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Field Emission Properties of Nanocrystalline Diamond/Carbon Nanowall Composite Films International conference

    C.Y. Cheng, R. Yamaguchi, K. Teii

    7th International Conference on Surfaces, Coatings, and Nanostructured Materials  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Country:Czech Republic  

    Field Emission Properties of Nanocrystalline Diamond/Carbon Nanowall Composite Films, C.Y. Cheng, R. Yamaguchi, K. Teii, 7th International Conference on Surfaces, Coatings, and Nanostructured Materials, Czech Republic, 2012.

  • Enhanced Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films International conference

    K. Teii, C.Y. Cheng, R. Yamaguchi

    23rd International Conference on Diamond and Carbon Materials  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Country:Spain  

    Enhanced Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films, K. Teii, C.Y. Cheng, R. Yamaguchi, 23rd International Conference on Diamond and Carbon Materials, Spain, 2012.

  • Electrical Characteristics of 4H-SiC/Nanocrystalline Diamond pn Junctions International conference

    Y. Kato, M. Goto, R. Amano, N. Shimoda, K. Teii

    23rd International Conference on Diamond and Carbon Materials  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Country:Spain  

    Electrical Characteristics of 4H-SiC/Nanocrystalline Diamond pn Junctions, Y. Kato, M. Goto, R. Amano, N. Shimoda, K. Teii, 23rd International Conference on Diamond and Carbon Materials, Spain, 2012.

  • Deposition of Thick Cubic Boron Nitride Films on Si and Cemented Carbide under Low-Energy Ion Bombardment International conference

    J. Yang, K. Teii, S. Matsumoto

    5th International Conference on New Diamond and Nano Carbons  2011.5 

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    Event date: 2011.5

    Presentation type:Oral presentation (general)  

    Country:Japan  

    Deposition of Thick Cubic Boron Nitride Films on Si and Cemented Carbide under Low-Energy Ion Bombardment, J. Yang, K. Teii, S. Matsumoto, 5th International Conference on New Diamond and Nano Carbons, Shimane, 2011.

  • Synthesis and Electrical Properties of Cubic Boron Nitride Films by Low-Energy Ion-Assisted Deposition International conference

    K. Teii and S. Matsumoto

    5th International Conference on New Diamond and Nano Carbons  2011.5 

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    Event date: 2011.5

    Presentation type:Oral presentation (general)  

    Country:Japan  

    Synthesis and Electrical Properties of Cubic Boron Nitride Films by Low-Energy Ion-Assisted Deposition, K. Teii and S. Matsumoto, 5th International Conference on New Diamond and Nano Carbons, Shimane, 2011.

  • Enhanced Field Emission from Nitrogen-Incorporated Carbon Nanowalls International conference

    C.Y. Cheng, M. Nakashima, S. Shimada, K. Teii

    5th International Conference on New Diamond and Nano Carbons  2011.5 

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    Event date: 2011.5

    Presentation type:Oral presentation (general)  

    Country:Japan  

    Enhanced Field Emission from Nitrogen-Incorporated Carbon Nanowalls, C.Y. Cheng, M. Nakashima, S. Shimada, K. Teii, 5th International Conference on New Diamond and Nano Carbons, Shimane, 2011.

  • Surface Modification of Nanocrystalline Diamond Films by Plasma Exposure Treatments International conference

    J. Yang, M. Nakashima, C.-Y. Cheng, K. Teii

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Event date: 2011.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

    Surface Modification of Nanocrystalline Diamond Films by Plasma Exposure Treatments, J. Yang, M. NAKASHIMA, C.-Y. Cheng, K. Teii, 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Nagoya, 2011.

  • ナノダイヤモンド薄膜の相制御と電気特性評価

    池田 知弘, 堤井 君元

    第19回ダイヤモンドシンポジウム  2005.11 

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    Event date: 2005.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大阪   Country:Japan  

  • Diamond Formation Using a Low-Pressure Inductively Coupled Plasma International conference

    H. Ito, K. Teii, M. Ito, M. Hori, T. Takeo, T. Goto

    46th American Vacuum Society International Symposium  1999.10 

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    Event date: 1999.10

    Presentation type:Oral presentation (general)  

    Country:United States  

    Diamond Formation Using a Low-Pressure Inductively Coupled Plasma, H. Ito, K. Teii, M. Ito, M. Hori, T. Takeo, T. Goto, 46th American Vacuum Society International Symposium, USA, 1999.

  • Correlation between Gas Phase and Substrate Surface on Fabrication of Low-k Films in ECR Plasma with G4F8 and Perfluorocarbon-Replacement Gases International conference

    M. Nakamura, K. Teii, S. Takashima, M. Hori, T. Goto, N. Ishii

    53rd Annual Gaseous Electronics Conference  1999.10 

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    Event date: 1999.10

    Presentation type:Oral presentation (general)  

    Country:United States  

    Correlation between Gas Phase and Substrate Surface on Fabrication of Low-k Films in ECR Plasma with G4F8 and Perfluorocarbon-Replacement Gases, M. Nakamura, K. Teii, S. Takashima, M. Hori, T. Goto, N. Ishii, 53rd Annual Gaseous Electronics Conference, USA, 1999.

  • Loss Kinetics of Carbon Atoms in Diamond Depositon Employing Low-Pressure Inductively Coupled Plasma International conference

    H. Ito, K. Teii, H. Funakoshi, M. Hori, T. Goto, M. Ito, T. Takeo

    53rd Annual Gaseous Electronics Conference  1999.10 

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    Event date: 1999.10

    Presentation type:Oral presentation (general)  

    Country:United States  

    Loss Kinetics of Carbon Atoms in Diamond Depositon Employing Low-Pressure Inductively Coupled Plasma, H. Ito, K. Teii, H. Funakoshi, M. Hori, T. Goto, M. Ito, T. Takeo, 53rd Annual Gaseous Electronics Conference, USA, 1999.

  • 低圧誘導結合型プラズマを用いたダイヤモンド薄膜の形成

    堤井 君元

    第3回名古屋大学VBLセミナー  1999.2 

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    Event date: 1999.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知   Country:Japan  

  • 低圧誘導結合プラズマを用いた100mTorr以下におけるダイヤモンド成長

    堤井 君元, 吉田 豊信

    電気学会プラズマ研究会  1998.6 

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    Event date: 1998.6

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:茨城   Country:Japan  

  • Positive Bias Effects on the Growth of Diamond at Pressures below 100 mTorr

    K. Teii and T. Yoshida

    1997.6 

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    Event date: 1997.6

    Presentation type:Oral presentation (general)  

    Country:Japan  

    Positive Bias Effects on the Growth of Diamond at Pressures below 100 mTorr, K. Teii and T. Yoshida, 10th Symposium on Plasma Science for Materials, Japan, 1997.

  • Inductively Coupled Plasma Deposition of Diamond at Pressures below 100 mTorr International conference

    K. Teii and T. Yoshida

    13th International Symposium on Plasma Chemistry  1997.8 

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    Presentation type:Oral presentation (general)  

    Country:China  

    Inductively Coupled Plasma Deposition of Diamond at Pressures below 100 mTorr, K. Teii and T. Yoshida, 13th International Symposium on Plasma Chemistry, China, 1997.

  • Behaviors of CFx (x=1-3) and Polymeric Species in Electron Cyclotron Resonance Fluorocarbon Plasmas International conference

    K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii

    4th International Conference on Reactive Plasmas/16th Symposium on Plasma Processing  1998.10 

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    Presentation type:Oral presentation (general)  

    Country:United States  

    Behaviors of CFx(x=1-3) and Polymeric Species in Electron Cyclotron Resonance Fluorocarbon Plasmas, K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii, 4th International Conference on Reactive Plasmas/16th Symposium on Plasma Processing, USA, 1998.

  • Optical Diagnostics of Low-Pressure Inductively Coupled Plasma for Nanocrystalline Diamond Growth International conference

    K. Teii, H. Ito, M. Ishikawa, M. Ito, M. Hori, T. Takeo, T. Kato, T. Goto

    24th International Conference on Phenomena in Ionized Gases  1999.7 

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    Presentation type:Oral presentation (general)  

    Country:Poland  

    Optical Diagnostics of Low-Pressure Inductively Coupled Plasma for Nanocrystalline Diamond Growth, K. Teii, H. Ito, M. Ishikawa, M. Ito, M. Hori, T. Takeo, T. Kato, T. Goto, 24th International Conference on Phenomena in Ionized Gases, Poland, 1999.

  • Observation of Polymeric Species Produced in High-Density Fluorocarbon Plasmas International conference

    K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii

    24th International Conference on Phenomena in Ionized Gases  1999.7 

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    Presentation type:Oral presentation (general)  

    Country:Poland  

    Observation of Polymeric Species Produced in High-Density Fluorocarbon Plasmas, K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii, 24th International Conference on Phenomena in Ionized Gases, Poland, 1999.

  • Diagnostics of Radicals and Formation of Microcrystalline Diamond in a Low-Pressure Inductively Coupled Plasma (INVITED) Invited International conference

    M. Hori, K. Teii, T. Goto

    9th International Symposium on Advanced Materials  2002.3 

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    Country:Japan  

    Diagnostics of Radicals and Formation of Microcrystalline Diamond in a Low-Pressure Inductively Coupled Plasma (INVITED), M. Hori, K. Teii, T. Goto, 9th International Symposium on Advanced Materials, Japan, 2002.

  • Thomson Scattering Measurement of Electron Density and Temperature in a Microwave Plasma for Diamond Deposition International conference

    S. Narishige, S. Kitamura, K. Teii, K. Uchino, K. Muraoka

    54th Annual Gaseous Electronics Conference  2001.10 

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    Presentation type:Oral presentation (general)  

    Country:United States  

    Thomson Scattering Measurement of Electron Density and Temperature in a Microwave Plasma for Diamond Deposition, S. Narishige, S. Kitamura, K. Teii, K. Uchino, K. Muraoka, 54th Annual Gaseous Electronics Conference, USA, 2001.

  • Detection of H, CH3, and Ionic Species in a Low-Pressure Inductively Coupled Plasma for Diamond Chemical-Vapor Deposition International conference

    K. Teii, H. Funakoshi, S. Takashima, M. Hori, T. Goto

    16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas  2002.7 

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    Presentation type:Oral presentation (general)  

    Country:France  

    Detection of H, CH3, and Ionic Species in a Low-Pressure Inductively Coupled Plasma for Diamond
    Chemical-Vapor Deposition, K. Teii, H. Funakoshi, S. Takashima, M. Hori, T. Goto, 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, France, 2002.

  • A Low-Pressure Limit of Diamond Chemical-Vapor Deposition Studied by Plasma Diagnostics International conference

    K. Teii, M. Hori, T. Goto

    3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2003.12 

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    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    A Low-Pressure Limit of Diamond Chemical-Vapor Deposition Studied by Plasma Diagnostics, K. Teii, M. Hori, T. Goto, 3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2003.

  • Temporal Variation of Nucleation Density and Crystallinity of Diamond Prepared in Electron Cyclotron Resonance Plasma International conference

    S. Mizobe, K. Teii, Y. Kouzuma, K. Uchino, K. Muraoka

    3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2003.12 

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    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Temporal Variation of Nucleation Density and Crystallinity of Diamond Prepared in Electron Cyclotron Resonance Plasma, S. Mizobe, K. Teii, Y. Kouzuma, K. Uchino, K. Muraoka, 3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2003.

  • 低圧イオン支援プラズマ堆積におけるダイヤモンド核発生初期過程の制御

    堤井 君元、高妻 豊、溝部 俊一、内野 喜一郎、村岡 克紀

    プラズマプロセシング研究会  2004.1 

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    Venue:北海道   Country:Japan  

  • マイクロ波CH4/H2プラズマCVDによる微結晶ダイヤモンドの合成

    堤井 君元、溝部 俊一、福富 篤、高妻 豊、内野 喜一郎、村岡 克紀

    応用物理学会学術講演会  2004.3 

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    Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  • Phase Composition and Electrical Properties of Nanocrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition International conference

    T. Ikeda and K. Teii

    4th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2005.12 

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    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Phase composition and electrical properties of nanocrystalline diamond films grown by microwave plasma chemical vapor deposition, T. Ikeda and K. Teii, 4th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2005.

  • Study on Surface Reaction Kinetics during Diamond Growth and Nucleation in Low-Pressure Plasmas International conference

    K. Teii, K. Uchino, M. Hori, T. Goto

    6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing  2006.1 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Study on Surface Reaction Kinetics during Diamond Growth and Nucleation in Low-Pressure Plasmas, K. Teii, K. Uchino, M. Hori, T. Goto, 6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing, Japan, 2006.

  • Phase Composition and Electrical Properties of Nanocrystalline Diamond Films Deposited by Microwave Plasma Chemical Vapor Deposition International conference

    T. Ikeda and K. Teii

    6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing  2006.1 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Phase Composition and Electrical Properties of Nanocrystalline Diamond Films Deposited by Microwave Plasma Chemical Vapor Deposition, T. Ikeda and K. Teii, 6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing, Japan, 2006.

  • Effect of Phase Purity and Composition on Electrical Properties in Nanocrystalline Diamond Films International conference

    T. Ikeda and K. Teii

    17th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides  2006.9 

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    Presentation type:Oral presentation (general)  

    Country:Portugal  

    Effect of Phase Purity and Composition on Electrical Properties in Nanocrystalline Diamond Films, T. Ikeda and K. Teii, 17th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Portugal, 2006.

  • Phase Control and Electrical Properties of Undoped and Nitrogen-Doped Nanodiamond Films Deposited from Ar-Rich Microwave Plasmas International conference

    T. Ikeda, K. Takeguchi, K. Teii

    18th International Symposium on Plasma Chemistry  2007.8 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Phase Control and Electrical Properties of Undoped and Nitrogen-Doped Nanodiamond Films Deposited from Ar-Rich Microwave Plasmas, T. Ikeda, K. Takeguchi, K. Teii, 18th International Symposium on Plasma Chemistry, Japan, 2007.

  • Analyses of Fine Particle Formations by Pulsed Arc Electrohydraulic Discharges in Water with Fe and Ti Electrodes International conference

    T. Ikeda, H. O. Li, K. Teii, J. S. Chang

    18th International Symposium on Plasma Chemistry  2007.8 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Analyses of Fine Particle Formations by Pulsed Arc Electrohydraulic Discharges in Water with Fe and Ti Electrodes, T. Ikeda, H. O. Li, K. Teii, J. S. Chang, 18th International Symposium on Plasma Chemistry, Japan, 2007.

  • C2ラジカル 成長化学の促進による ナノダイヤモンド薄膜の相制御

    池田 知弘、堤井 君元

    応用物理学会学術講演会  2007.9 

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    Presentation type:Oral presentation (general)  

    Venue:札幌   Country:Japan  

  • ナノダイヤモンド薄膜のn 型伝導性に及ぼすsp2 アモルファスカーボン相の影響

    池田 知弘、堤井 君元

    応用物理学会学術講演会  2007.9 

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    Presentation type:Oral presentation (general)  

    Venue:札幌   Country:Japan  

  • 極低イオンエネルギー照射下におけるcBN薄膜のプラズマ合成

    堤井 君元、山尾 亮太、松本 精一郎

    応用物理学会学術講演会  2007.9 

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    Presentation type:Oral presentation (general)  

    Venue:札幌   Country:Japan  

  • Effect of sp2 Carbon Phase on Electrical Properties of Nitrogen-Doped Nanodiamond Films International conference

    T. Ikeda and K. Teii

    6th Asian-European International Conference on Plasma Surface Engineering  2007.9 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Effect of sp2 Carbon Phase on Electrical Properties of Nitrogen-Doped Nanodiamond Films, T. Ikeda and K. Teii, 6th Asian-European International Conference on Plasma Surface Engineering, Japan, 2007.

  • Discharge Characteristics of Titanium Electrode Eccentric Pulsed Arc Electrohydraulic Discharge Reactor International conference

    T. Ikeda, H. O. Li, K. Teii, J. S. Chang

    6th Asian-European International Conference on Plasma Surface Engineering  2007.9 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Discharge Characteristics of Titanium Electrode Eccentric Pulsed Arc Electrohydraulic Discharge Reactor, T. Ikeda, H. O. Li, K. Teii, J. S. Chang6th Asian-European International Conference on Plasma Surface Engineering, Japan, 2007.

  • Phase and Morphology Evolution of Cubic Boron Nitride Films Grown in a High-Density Fluorine-Containing Plasma International conference

    K. Teii, R. Yamao, S. Matsumoto

    6th Asian-European International Conference on Plasma Surface Engineering  2007.9 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Phase and Morphology Evolution of Cubic Boron Nitride Films Grown in a High-Density Fluorine-Containing Plasma, K. Teii, R. Yamao, S. Matsumoto, 6th Asian-European International Conference on Plasma Surface Engineering, Japan, 2007.

  • Transition from Semiconducting to Quasimetallic Behaviour in Nitrogen-Doped Nanodiamond Films International conference

    T. Ikeda and K. Teii

    18th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides  2007.9 

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    Presentation type:Oral presentation (general)  

    Country:Germany  

    Transition from Semiconducting to Quasimetallic Behaviour in Nitrogen-Doped Nanodiamond Films, T. Ikeda and K. Teii, 18th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Germany, 2007.

  • Lower Threshold of Ion Energy for Growing cBN Films in a Fluorine-Containing Plasma International conference

    K. Teii, S. Shimada, S. Matsumoto

    5th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2007.12 

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    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Lower Threshold of Ion Energy for Growing cBN Films in a Fluorine-Containing Plasma, K. Teii, S. Shimada, S. Matsumoto, 5th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2007.

  • 超低エネルギーイオン照射を用いたナノダイヤモンド成膜のための基板前処理

    堤井 君元, 松本 精一郎

    プラズマプロセシング研究会  2008.1 

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    Venue:山口   Country:Japan  

  • ナノダイヤモンド薄膜の成長機構とn型伝導特性

    池田 知弘, 堤井 君元

    プラズマプロセシング研究会  2008.1 

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    Venue:山口   Country:Japan  

  • ナノダイヤモンド/シリコンヘテロ接合ダイオードの電気特性評価

    池田 知弘, 堤井 君元

    応用物理学会学術講演会  2008.9 

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    Presentation type:Oral presentation (general)  

    Venue:愛知   Country:Japan  

  • 低エネルギーイオン衝撃下における立方晶窒化ホウ素の三次元島成長

    堤井 君元、水迫 優晴、松本 精一郎

    応用物理学会学術講演会  2008.9 

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    Venue:愛知   Country:Japan  

  • Optimization of Electron Transport Properties for Fabrication of pn Diodes using n-Type Nanodiamond Films International conference

    T. Ikeda and K. Teii

    19th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides  2008.9 

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    Presentation type:Oral presentation (general)  

    Country:Spain  

    Optimization of Electron Transport Properties for Fabrication of pn Diodes using n-Type Nanodiamond Films, T. Ikeda and K. Teii, 19th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Spain, 2008.

  • ナノダイヤモンド膜の形成機構と電気伝導特性

    池田 知弘, 堤井 君元

    電気学会プラズマ研究会  2008.10 

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    Venue:宮城   Country:Japan  

  • 異方性ナノカーボン膜のプラズマCVD法による合成と電気特性評価

    嶋田 翔三郎, 中島 誠宏, 池田 知弘, 堤井 君元

    電気学会プラズマ研究会  2008.12 

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    Presentation type:Oral presentation (general)  

    Venue:京都   Country:Japan  

  • n型ナノダイヤモンド膜の形成と電気特性評価

    池田 知弘, 堤井 君元

    プラズマ科学シンポジウム/プラズマプロセシング研究会  2009.2 

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    Venue:愛知   Country:Japan  

  • マイクロ波C2リッチプラズマを用いたナノカーボン膜の合成

    嶋田 翔三郎, 中島 誠宏, 堤井 君元

    電気学会全国大会  2009.3 

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    Venue:北海道   Country:Japan  

  • プラズマCVD法により形成したナノカーボン膜の電気特性の評価

    嶋田 翔三郎, 中島 誠宏, 池田 知弘, 堤井 君元

    電気学会全国大会  2009.3 

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    Venue:北海道   Country:Japan  

  • 異方性ナノカーボン膜のプラズマCVD法による合成と電界放出特性評価

    中島 誠宏, 嶋田 翔三郎, Alfred T. H. Chuang, 堤井 君元

    電気学会プラズマ研究会  2009.6 

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    Venue:佐賀   Country:Japan  

  • n型ナノダイヤモンド膜の形成とダイオードへの応用

    古閑 彰, 池田 知弘, 堤井 君元

    電気学会プラズマ・放電・パルスパワー合同研究会  2009.8 

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    Venue:京都   Country:Japan  

  • Effect of Low-Energy Ion Irradiation on the Growth and Properties of Cubic Boron Nitride Films International conference

    K. Teii, R. Yamao, S. Matsumoto

    15th International Symposium "Radiation Effects in Insulator"  2009.9 

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    Country:Italy  

    Effect of low-energy ion irradiation on the growth and properties of cubic boron nitride films, K. Teii, R. Yamao, S. Matsumoto, 15th International Symposium "Radiation Effects in Insulator", Italy, 2009.

  • Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanodiamond Films International conference

    K. Teii, M. Nakashima, T. Ikeda

    20th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides  2009.9 

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    Presentation type:Oral presentation (general)  

    Country:Greece  

    Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanodiamond Films, K. Teii, M. Nakashima, T. Ikeda, 20th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Greece, 2009.

  • Structural Evolution of Cubic Boron Nitride Islands in a High-Density Fluorine-Containing Plasma International conference

    T. Hori, Y. Mizusako, R. Yamao, K. Teii, S. Matsumoto

    16th International Conference on Surface Modification of Materials by Ion Beams  2009.9 

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    Country:Japan  

    Structural evolution of cubic boron nitride islands in a high-density fluorine-containing plasma, T. Hori, Y. Mizusako, R. Yamao, K. Teii, S. Matsumoto, 16th International Conference on Surface Modification of Materials by Ion Beams, Japan, 2009.

  • Growth and Characterization of Hard Cubic Boron Nitride Films by Plasma-Assisted Deposition using Fluorine Chemistry International conference

    K. Teii and S. Matsumoto

    16th International Conference on Surface Modification of Materials by Ion Beams  2009.9 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Growth and characterization of hard cubic boron nitride films by plasma-assisted deposition using fluorine chemistry, K. Teii and S. Matsumoto, 16th International Conference on Surface Modification of Materials by Ion Beams, Japan, 2009.

  • SiC and Nanocrystalline Diamond Coating on Si Substrates Fabricated by Microwave Plasma CVD International conference

    Y. Kato, T. Horikawa, T. Ikeda, K. Teii

    16th International Conference on Surface Modification of Materials by Ion Beams  2009.9 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    SiC and nanocrystalline diamond coating on Si substrates fabricated by microwave plasma CVD, Y. Kato, T. Horikawa, T. Ikeda, K. Teii, 16th International Conference on Surface Modification of Materials by Ion Beams, Japan, 2009.

  • Growth and Characterization of Epitaxial 3C-SiC Films by Microwave Plasma-Enhanced Chemical Vapor Deposition International conference

    A. S. M. Miah, A. Koga, K. Teii, Y. Kato

    2nd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2010.3 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Growth and characterization of epitaxial 3C-SiC films by microwave plasma-enhanced chemical vapor deposition, A. S. M. Miah, A. Koga, K. Teii, Y. Kato, 2nd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Japan, 2010.

  • ナノカーボン膜のプラズマ合成と電界放出特性

    中島 誠宏, 嶋田 翔三郎, 堤井 君元

    電気学会プラズマ研究会  2010.5 

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    Venue:兵庫   Country:Japan  

  • マイクロ波プラズマCVD法による炭素ナノウォールの形成と電界放出機構

    中島 誠宏、嶋田 翔三郎、堤井 君元

    応用物理学会学術講演会  2010.9 

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    Presentation type:Oral presentation (general)  

    Venue:長崎   Country:Japan  

  • ナノダイヤモンド/炭素ナノウォール複合膜のプラズマCVD合成と電界放出特性

    中島 誠宏、堤井 君元

    応用物理学会学術講演会  2010.9 

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    Venue:長崎   Country:Japan  

  • プラズマ曝露による窒化ホウ素膜の表面改質

    川上 真司、堤井 君元

    応用物理学会学術講演会  2010.9 

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    Venue:長崎   Country:Japan  

  • Synthesis and Electrical Characterization of n-Type Nanocrystalline Diamond Films by Microwave Plasma-Enhanced Chemical Vapor Deposition International conference

    K. Teii and T. Ikeda

    63rd Gaseous Electronics Conference/7th International Conference on Reactive Plasmas  2010.10 

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    Presentation type:Oral presentation (general)  

    Country:France  

    Synthesis and Electrical Characterization of n-Type Nanocrystalline Diamond Films by Microwave Plasma-Enhanced Chemical Vapor Deposition, K. Teii, T. Ikeda, 63rd Gaseous Electronics Conference/7th International Conference on Reactive Plasmas, France, 2010.

  • アルミ基板上のナノダイヤモンド被膜の熱および電気伝導特性

    堤井 君元、池田 知弘

    軽金属学会講演大会  2010.11 

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    Venue:新潟   Country:Japan  

  • Thermal and Electrical Conduction Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films International conference

    K. Teii and T. Ikeda

    Materials Research Society Fall Meeting  2010.11 

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    Presentation type:Oral presentation (general)  

    Country:United States  

    Thermal and Electrical Conduction Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films, K. Teii and T. Ikeda, Materials Research Society Fall Meeting, Boston, 2010.

  • Growth and Field Emission Properties of Boron Nitride Island Films by Low-Energy Ion-Assisted Deposition International conference

    K. Teii, Y. Utoda, R. Yamao, S. Matsumoto

    Materials Research Society Fall Meeting  2010.11 

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    Country:United States  

    Growth and Field Emission Properties of Boron Nitride Island Films by Low-Energy Ion-Assisted Deposition, K. Teii, Y. Utoda, R. Yamao, and S. Matsumoto, Materials Research Society Fall Meeting, Boston, 2010.

  • Synthesis and Electrical Properties of Nanodiamond and Nanowall Films by Microwave Plasma-Enhanced Chemical Vapor Deposition (INVITED) Invited International conference

    K. Teii

    3rd International Workshop on Plasma Scientech for All Something  2011.1 

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    Country:Japan  

    Synthesis and Electrical Properties of Nanodiamond and Nanowall Films by Microwave Plasma-Enhanced Chemical Vapor Deposition (INVITED), K. Teii, 3rd International Workshop on Plasma Scientech for All Something, Nagoya, 2011.

  • Synthesis and Thermal Transport Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films International conference

    K. Teii, J. H.C. Yang, T. Ikeda

    22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides  2011.9 

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    Presentation type:Oral presentation (general)  

    Country:Germany  

    Synthesis and Thermal Transport Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films, K. Teii, J. H.C. Yang, T. Ikeda, 22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Germany, 2011.

  • Fabrication and Characterization of Si/ and SiC/Nanocrystalline Diamond pn Junctions International conference

    M. Goto, R. Amano, Y. Kato, K. Teii

    14th International Conference on Silicon Carbide and Related Materials  2011.9 

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    Country:United States  

    Fabrication and Characterization of Si/ and SiC/Nanocrystalline Diamond pn Junctions, M. Goto, R. Amano, Y. Kato, K. Teii, 14th International Conference on Silicon Carbide and Related Materials, USA, 2011.

  • Enhanced Wettability of Nanocrystalline Diamond Films for Biocoating Applications International conference

    J. H.C. Yang and K. Teii

    Materials Research Society Fall Meeting  2011.11 

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    Presentation type:Oral presentation (general)  

    Country:United States  

    Enhanced Wettability of Nanocrystalline Diamond Films for Biocoating Applications, J. H.C. Yang and K. Teii, Materials Research Society Fall Meeting, Boston, 2011.

  • Control of Thermal and Electrical Conduction Properties of Nanocrystalline Diamond Films International conference

    K. Teii and T. Ikeda

    Materials Research Society Fall Meeting  2011.11 

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    Presentation type:Oral presentation (general)  

    Country:United States  

    Control of Thermal and Electrical Conduction Properties of Nanocrystalline Diamond Films, K. Teii and T. Ikeda, Materials Research Society Fall Meeting, Boston, 2011.

  • Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films Deposited on Scratched Substrates International conference

    C.Y. Cheng, M. Nakashima, K. Teii

    Materials Research Society Fall Meeting  2011.11 

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    Country:United States  

    Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films Deposited on Scratched Substrates, C.Y. Cheng, M. Nakashima, and K. Teii, Materials Research Society Fall Meeting, Boston, 2011.

  • 立方晶窒化ホウ素膜のプラズマ合成と電界放出特性

    堤井 君元, 中隈 俊就, 松本 精一郎

    電気学会プラズマ・パルスパワー合同研究会  2011.12 

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    Presentation type:Oral presentation (general)  

    Venue:神奈川   Country:Japan  

  • Plasma Deposition of Wide-Gap Materials for High-Temperature Condition (INVITED) Invited International conference

    K. Teii

    14th International Workshop of Advanced Plasma Processing and Diagnostics/2nd Workshop for Nagoya University-Sungkyunkwan University Joint Institute for Plasma-Nano Materials  2012.1 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

    Plasma Deposition of Wide-Gap Materials for High-Temperature Condition (INVITED), K. Teii, 14th International Workshop of Advanced Plasma Processing and Diagnostics/2nd Workshop for NU- SKKU Joint Institute for Plasma-Nano Materials, Fukuoka, 2012.

  • Plasma Deposition and Electrical Characterization of Wide-Gap Materials for High-Temperature Condition (INVITED) Invited International conference

    K. Teii

    7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2012.4 

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    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Plasma Deposition and Electrical Characterization of Wide-Gap Materials for High-Temperature Condition (INVITED), K. Teii, 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2012.

  • Enhanced Wettability of Nanocrystalline Diamond and Boron Nitride Films for Biocoating Applications Invited International conference

    J. H. C. Yang, S. Kawakami, K. Teii

    7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  2012.4 

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    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

    Enhanced Wettability of Nanocrystalline Diamond and Boron Nitride Films for Biocoating Applications, J. H. C. Yang, S. Kawakami, K. Teii, 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2012.

  • ナノダイヤモンド膜のプラズマCVD合成と電気電子応用(依頼講演) Invited

    加藤 喜峰, 堤井 君元

    第15回応用物理学会プラズマエレクトロニクス分科会新領域研究会/電気学会プラズマ研究会「ダイヤモンドおよびグラフェン関連物質のプラズマプロセシングと先進応用」  2013.11 

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋   Country:Japan  

  • 新しい立方晶窒化ホウ素が拓く産業応用:超硬コーティングとパワー半導体(依頼講演) Invited

    堤井 君元

    平成27年度九州大学高等研究院・九州先端科学技術研究所研究交流会  2016.1 

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡   Country:Japan  

  • フッ素プラズマCVDを用いた高品質立方晶窒化ホウ素の合成(依頼講演) Invited

    堤井 君元

    日本フッ素化学会第10回フッ素化学セミナー  2016.9 

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    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:佐賀   Country:Japan  

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MISC

  • ナノダイヤモンド膜のプラズマ合成と電気・電子応用

    堤井 君元

    電気学会誌 Vol. 135, No. 3, 142-144頁   2015.3

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

  • Plasma Deposition of Diamond at Low Pressures: A Review

    K. Teii

    IEEE Trans. Plasma Sci., Vol. 42, pp. 3862-3869   2014.12

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    Language:English   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

    K. Teii, "Plasma Deposition of Diamond at Low Pressures: A Review", IEEE Trans. Plasma Sci., Vol. 42, pp. 3862-3869

  • Introduction to the Special Issue on the APSPT 2013

    J.-S. Wu, C.-C. Hsu, J. P. Chu, K. Teii

    IEEE Trans. Plasma Sci. Vol. 42, pp. 3654-3655   2014.12

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    Language:English  

    Introduction to the Special Issue on the APSPT 2013

  • 中間気圧マイクロ波プラズマCVDの最新動向―ダイヤモンドからナノカーボンへの展開―

    堤井 君元

    電気学会論文誌A, Vol. 131, No. 1, 11-15頁   2011.1

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

  • Study on Polymeric Neutral Species in High-Density Fluorocarbon Plasmas

    K. Teii, M. Hori, M. Ito, T. Goto, N. Ishii

    J. Vac. Sci. Technol. A, Vol. 18, pp. 1-9   2000.1

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    Language:English   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

    K. Teii, M. Hori, M. Ito, T. Goto, N. Ishii, "Study on Polymeric Neutral Species in High-Density Fluorocarbon Plasmas", J. Vac. Sci. Technol. A, Vol. 18, pp. 1-9

  • 低エネルギーイオン照射下の プラズマ成膜技術

    堤井 君元

    プラズマ材料表面処理技術の最新動向(電気学会プラズマ材料表面処理技術の動向調査専門委員会)   2023.2

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    Language:Japanese   Publishing type:Internal/External technical report, pre-print, etc.  

  • Guest Editorial Introduction to the Special Issue on the 10th Asia-Pacific Symposium on Plasma Technology (APSPT 2017)

    C.-C. Hsu, T.-C. Wei, Y.-H. Liao, Y. Tanaka, K. Teii

    IEEE Trans. Plasma Sci. Vol. 47, pp. 1035-1036   2019.2

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    Language:English  

    Guest Editorial Introduction to the Special Issue on the 10th Asia-Pacific Symposium on Plasma Technology (APSPT 2017)

  • Introduction to the Special Issue on The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28)

    H. Akatsuka, J.-S. Wu, K. Teii, K. Takaki

    IEEE Trans. Plasma Sci. Vol. 44, pp. 3050-3051   2016.12

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    Language:English  

    Introduction to the Special Issue on The 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9), and The 28th Symposium on Plasma Science for Materials (SPSM-28)

  • ”酸化に強い被膜法開発”

    堤井 君元

    日刊工業新聞平成28年10月12日号   2016.10

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    Language:Japanese  

  • 第15回プラズマ新領域研究会

    堤井君元

    応用物理学会プラズマエレクトロニクス分科会会報, No. 60, 43頁   2014.6

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    Language:Japanese   Publishing type:Internal/External technical report, pre-print, etc.  

  • Special Issue on Basics and Applications of Plasma Technology

    J.-S. Wu, K. Teii, J. P. Chu, C.-C. Hsu

    IEEE Trans. Plasma Sci. Vol. 41, pp. 3190-3191   2013.11

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    Language:English  

    Special Issue on Basics and Applications of Plasma Technology

  • Special Issue on Basics and Applications of Plasma Technology

    J.-S. Wu, K. Teii, J. P. Chu, C.-C. Hsu

    IEEE Trans. Plasma Sci. Vol. 41, pp. 2574-2575   2013.9

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    Language:English  

    Special Issue on Basics and Applications of Plasma Technology

  • High Performance Field Emission from Carbon Nanowalls and Carbon Nanowall/Nanocrystalline Diamond Composites

    K. Teii

    2011.11

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    Language:English   Publishing type:Article, review, commentary, editorial, etc. (scientific journal)  

    High Performance Field Emission from Carbon Nanowalls and Carbon Nanowall/Nanocrystalline Diamond Composites

  • 硬質窒化ホウ素薄膜の平坦化とガラス成型用モールドへの応用

    堤井君元

    KITEC INFORMATION, 九州産業技術センター, No. 252, 69-74頁   2009.10

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    Language:Japanese   Publishing type:Internal/External technical report, pre-print, etc.  

  • 立方晶窒化ホウ素厚膜ウルトラハードコーティングの実用化研究

    堤井君元

    KITEC INFORMATION, 九州産業技術センター, No. 250, 23-27頁   2009.4

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    Language:Japanese   Publishing type:Internal/External technical report, pre-print, etc.  

  • 第5回APSPT開催報告

    堤井君元

    電気学会論文誌A, Vol. 128, No. 7, 502頁(2008)   2008.7

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    Language:Japanese   Publishing type:Internal/External technical report, pre-print, etc.  

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Industrial property rights

Patent   Number of applications: 11   Number of registrations: 11
Utility model   Number of applications: 0   Number of registrations: 0
Design   Number of applications: 0   Number of registrations: 0
Trademark   Number of applications: 0   Number of registrations: 0

Professional Memberships

  • Materials Research Society

  • 応用物理学会

  • 電気学会

Committee Memberships

  • Steering committee member   Domestic

    2024.4 - 2027.3   

  • Steering committee member   Domestic

    2019.1 - 2021.12   

  • Steering committee member   Domestic

    2019.1 - 2021.3   

  • Steering committee member   Domestic

    2018.1 - 2018.12   

  • Steering committee member   Domestic

    2014.6 - 2017.12   

  • Organizer   Domestic

    2012.4 - 2014.3   

  • Steering committee member   Domestic

    2010.4 - Present   

  • Steering committee member   Domestic

    2010.4 - 2013.3   

  • Organizer   Domestic

    2009.8 - 2011.3   

  • Organizer   Domestic

    2008.4 - 2010.3   

  • 電気学会プラズマ技術委員会   幹事補佐   Domestic

    2005.11 - 2008.3   

  • 電気学会   活動推進員   Domestic

    2001.4 - 2026.3   

  • 電気学会   九州支部連合大会プログラム委員   Domestic

    2001.4 - 2024.3   

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Academic Activities

  • Screening of academic papers

    Role(s): Peer review

    2023

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:6

  • Screening of academic papers

    Role(s): Peer review

    2022

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:6

  • IEEE Transactions on Plasma Science International contribution

    2021.6 - 2023.2

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    Type:Academic society, research group, etc. 

  • Screening of academic papers

    Role(s): Peer review

    2021

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:7

  • Screening of academic papers

    Role(s): Peer review

    2020

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:7

  • 座長(Chairmanship) International contribution

    ( 金沢大学 ) 2019.12

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    Type:Competition, symposium, etc. 

    Number of participants:250

  • International Organizing Committee International contribution

    11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  ( Japan ) 2019.12

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    Type:Competition, symposium, etc. 

    Number of participants:250

  • IEEE Transactions on Plasma Science International contribution

    2019.5 - 2021.1

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    Type:Academic society, research group, etc. 

  • Screening of academic papers

    Role(s): Peer review

    2019

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:7

  • Screening of academic papers

    Role(s): Peer review

    2018

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:6

    Number of peer-reviewed articles in Japanese journals:2

  • 座長(Chairmanship) International contribution

    ( 中原大学 ) 2017.12

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • International Organizing Committee International contribution

    10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  ( Taiwan ) 2017.12

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • IEEE Transactions on Plasma Science International contribution

    2017.12 - 2018.12

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    Type:Academic society, research group, etc. 

  • Screening of academic papers

    Role(s): Peer review

    2017

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:6

  • International Scientific Committee International contribution

    22nd International Conference on Advanced Oxidation Technologies for Treatment of Water, Air and Soil  ( Holiday Inn Atlanta UnitedStatesofAmerica ) 2016.11

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    Type:Competition, symposium, etc. 

    Number of participants:150

  • Organizing Committee International contribution

    21st International Conference on Gas Discharges and Their Applications  ( Japan ) 2016.9

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    Type:Competition, symposium, etc. 

    Number of participants:500

  • Screening of academic papers

    Role(s): Peer review

    2016

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:8

  • International Organizing Committee International contribution

    9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials  ( Japan ) 2015.12

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    Type:Competition, symposium, etc. 

    Number of participants:300

  • Executive Committee International contribution

    8th International Conference on Reactive Plasmas/31th Symposium on Plasma Processing  ( Japan ) 2014.2

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    Type:Competition, symposium, etc. 

    Number of participants:800

  • 座長(Chairmanship) International contribution

    ( 国立交通大学 ) 2013.12

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    Type:Competition, symposium, etc. 

    Number of participants:300

  • International Organizing Committee International contribution

    8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  ( Taiwan ) 2013.12

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    Type:Competition, symposium, etc. 

    Number of participants:150

  • Organizing Committee International contribution

    15th Cross Straits Symposium on Energy and Environmental Science and Technology  ( China ) 2013.11

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship)

    第15回応用物理学会プラズマエレクトロニクス分科会新領域研究会/電気学会プラズマ研究会  ( 名城大学名駅サテライト ) 2013.11

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    Type:Competition, symposium, etc. 

  • 組織委員

    第26回プラズマ材料科学シンポジウム  ( 九州大学・百年講堂 ) 2013.9

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    Type:Competition, symposium, etc. 

    Number of participants:150

  • Local Organizing Committee International contribution

    14th Cross Straits Symposium on Energy and Environmental Science and Technology  ( Japan ) 2013.2

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    Type:Competition, symposium, etc. 

  • 実行委員

    第30回応用物理学会プラズマプロセシング研究会  ( アクトシティ浜松・研修センター ) 2013.1

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    Type:Competition, symposium, etc. 

    Number of participants:400

  • 座長(Chairmanship)

    第30回応用物理学会プラズマプロセシング研究会  ( アクトシティ浜松 ) 2013.1

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    Type:Competition, symposium, etc. 

  • International Organizing Committee International contribution

    7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  ( Taiwan ) 2012.4

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    Type:Competition, symposium, etc. 

    Number of participants:150

  • 座長(Chairmanship) International contribution

    ( 台北医科大学 ) 2012.4

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • 座長(Chairmanship)

    電気学会プラズマ・パルスパワー合同研究会  ( 東京工業大学 ) 2011.12

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    Type:Competition, symposium, etc. 

  • Local Organizing Committee International contribution

    13th Cross Straits Symposium on Materials, Energy, and Environmental Engineering  ( Japan ) 2011.11

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    Type:Competition, symposium, etc. 

  • プログラム委員

    平成22年電気学会基礎・材料・共通部門大会  ( 琉球大学 ) 2010.9

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    Type:Competition, symposium, etc. 

    Number of participants:500

  • International Organizing Committee International contribution

    6th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology  ( Taiwan ) 2009.12

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    Type:Competition, symposium, etc. 

    Number of participants:150

  • 座長(Chairmanship)

    電気学会プラズマ研究会  ( 東京都市大学 ) 2009.11

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship)

    電気学会プラズマ研究会  ( 佐賀大学 ) 2009.6

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship)

    電気学会プラズマ研究会  ( 同志社大学 ) 2008.12

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    Type:Competition, symposium, etc. 

  • Local Organizing Committee International contribution

    10th Cross Straits Symposium on Materials, Energy, and Environmental Engineering  ( Japan ) 2008.11

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    Type:Competition, symposium, etc. 

    Number of participants:150

  • Local Organizing Committee International contribution

    14th International Congress on Plasma Physics  ( Japan ) 2008.9

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    Type:Competition, symposium, etc. 

    Number of participants:500

  • 座長(Chairmanship)

    応用物理学会学術講演会  ( 中部大学 ) 2008.9

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship)

    電気学会プラズマ研究会  ( 名古屋工業大学 ) 2008.5

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship)

    電気学会プラズマ研究会  ( 呼子ロッジ ) 2008.1

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    Type:Competition, symposium, etc. 

  • International Organizing Committee International contribution

    5th Asia-Pacific International Symposium on the Basic and Application of Plasma Technology  ( Taiwan ) 2007.12

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    Type:Competition, symposium, etc. 

    Number of participants:150

  • 座長(Chairmanship)

    電気学会プラズマ研究会  ( 同志社大学 ) 2007.12

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship) International contribution

    ( 高雄科技大学 ) 2007.12

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship) International contribution

    ( 浦項工科大学 ) 2007.11

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    Type:Competition, symposium, etc. 

  • Local Organizing Committee International contribution

    6th Asian-European International Conference on Plasma Surface Engineering  ( Japan ) 2007.9

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    Type:Competition, symposium, etc. 

    Number of participants:300

  • 座長(Chairmanship)

    電気学会プラズマ研究会  ( 武蔵工業大学 ) 2006.5

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship) International contribution

    ( 雲林科技大学 ) 2005.12

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    Type:Competition, symposium, etc. 

  • 座長(Chairmanship)

    電気学会九州支部講演大会  ( 福岡工業大学 ) 2005.9

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    Type:Competition, symposium, etc. 

  • Local Organizing Committee International contribution

    7th Asia-Pacific Conference on Plasma Science and Technology/17th Symposium on Plasma Science for Materials  ( Japan ) 2004.6 - 2004.7

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    Type:Competition, symposium, etc. 

    Number of participants:400

  • 座長(Chairmanship) International contribution

    ( 龍華科技大学 ) 2003.12

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    Type:Competition, symposium, etc. 

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Research Projects

  • ダイヤモンドナノ粒子で修飾したナノウォール階層構造体の作製と電界放出源への応用

    2024

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    Grant type:Donation

  • 電荷移動ドープ窒化ホウ素半導体を用いた表面伝導素子の開発

    2023

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    Grant type:Donation

  • ナノカーボンハイブリッド電子源の開発 International coauthorship

    2022.10 - 2024.9

    日本学術振興会 

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    Authorship:Principal investigator 

  • ナノ構造ダイヤモンドハイブリッド電子源の開発とオプトエレクトロニクス応用

    2022 - 2024

    日本学術振興会  二国間交流

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    Authorship:Principal investigator  Grant type:Joint research

  • 高品質窒化ホウ素半導体への表面ドーピング

    2018.4 - 2023.3

    日本学術振興会 

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    Authorship:Principal investigator 

  • 高品質窒化ホウ素半導体への表面ドーピング

    Grant number:18H01711  2018 - 2022

    日本学術振興会  科学研究費助成事業  基盤研究(B)

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • 遷移金属上への高品質立方晶窒化ホウ素の直接コーティング

    2018

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    Grant type:Donation

  • 超硬合金基材への超硬質窒化ホウ素の直接コーティング

    2017

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    Grant type:Donation

  • 遷移金属表面の合金化による高密着性硬質窒化ホウ素コーティングの開発

    2017

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    Grant type:Donation

  • 遷移金属上への硬質窒化ホウ素コーティングの直接形成

    2016

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    Grant type:Donation

  • 高品質窒化ホウ素半導体へのin-situドーピング

    2014.4 - 2018.3

    日本学術振興会 

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    Authorship:Principal investigator 

  • 高品質窒化ホウ素半導体へのin-situドーピング

    Grant number:26289241  2014 - 2017

    日本学術振興会  科学研究費助成事業  基盤研究(B)

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • 溶融半導体中パルス放電の生成と結晶成長への応用

    Grant number:26630368  2014 - 2015

    科学研究費助成事業  挑戦的萌芽研究

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • 高品質窒化ホウ素半導体の電気伝導特性制御と高温高出力素子への応用

    Grant number:23360288  2011 - 2013

    日本学術振興会  科学研究費助成事業  基盤研究(B)

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • 溶融半導体中パルス放電の生成と結晶成長への応用

    Grant number:23656467  2011 - 2012

    科学研究費助成事業  挑戦的萌芽研究

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • ダイヤモンドナノ粒子分散膜を用いた高温対応ヒートシンクの開発

    2011

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    Grant type:Donation

  • ナノ結晶ダイヤモンド/アモルファス炭素複合膜の熱および電気特性制御と応用

    2011

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    Grant type:Donation

  • 高品質立方晶窒化ホウ素が拓く高温高出力エレクトロニクス

    2010 - 2013

    日本学術振興会  最先端・次世代研究開発支援プログラム

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    Authorship:Principal investigator  Grant type:Joint research

  • 硬質窒化ホウ素膜の表面機能制御と生体親和性評価

    2010

    科学技術振興機構A-Step探索タイプ

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    Authorship:Principal investigator  Grant type:Contract research

  • 国際研究集会参加助成

    2010

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    Grant type:Donation

  • 海外交流補助金

    2010

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    Grant type:Donation

  • 海外渡航費補助

    2010

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    Grant type:Donation

  • 高品質立方晶窒化ホウ素が拓く高温高出力エレクトロニクス

    2010

    教育研究プログラム・研究拠点形成プロジェクト(P&P)特別枠経費

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    Authorship:Principal investigator  Grant type:On-campus funds, funds, etc.

  • 硬質窒化物皮膜の成膜技術確立

    2009.9 - 2012.3

    共同研究

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    Authorship:Principal investigator  Grant type:Other funds from industry-academia collaboration

  • 硬質膜の緻密化に関する研究

    2009.7 - 2010.3

    共同研究

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    Authorship:Principal investigator  Grant type:Other funds from industry-academia collaboration

  • 半導体素子の宇宙環境プラズマ照射への耐性評価

    2009 - 2010

    宙空環境センター共同研究費

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    Authorship:Principal investigator  Grant type:On-campus funds, funds, etc.

  • ハイス上への超硬質窒化ホウ素コーティング

    2009

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    Grant type:Donation

  • 立方晶窒化ホウ素コーティングを用いた難削材用ワイドユース超硬工具の開発

    2008 - 2012

    新エネルギー・産業技術総合開発機構産業技術研究助成事業(若手研究グラント)

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    Authorship:Principal investigator  Grant type:Contract research

  • ナノダイヤモンド/アモルファスカーボン複合膜の高温用ヒートシンクへの応用

    2008

    科学技術振興機構シーズ発掘試験研究(A)

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    Authorship:Principal investigator  Grant type:Contract research

  • 硬質窒化ホウ素薄膜の平坦化とガラス成型用モールドへの応用

    2008

    九州産業技術センター九州地域戦略産業イノベーション創出事業研究開発委託事業

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    Authorship:Principal investigator  Grant type:Contract research

  • ワイドバンドギャップ立方晶窒化ホウ素薄膜の表面機能制御と電界放出性能評価

    2008

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    Grant type:Donation

  • 窒化ホウ素超硬質薄膜の表面平坦化とガラスプレス加工用モールドへの応用

    2008

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    Grant type:Donation

  • ナノダイヤモンド膜を被覆した高温用アルミ製ヒートシンクの作製と性能評価

    2008

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    Grant type:Donation

  • ダイヤモンドナノ粒子分散膜の熱・電気特性制御と応用

    2008

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    Grant type:Donation

  • 立方晶窒化ホウ素コーティングを用いた高温プレス成形用金型の開発

    2008

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    Grant type:Donation

  • 窒化ホウ素膜の電気絶縁性の探査に関する研究

    2007.11 - 2009.3

    共同研究

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    Authorship:Principal investigator  Grant type:Other funds from industry-academia collaboration

  • 超低損失デバイス用n型ナノダイヤモンド薄膜の粒界伝導制御と性能評価

    2007 - 2008

    日本学術振興会  科学研究費助成事業  基盤研究(C)

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • 立方晶窒化ホウ素厚膜形成法を用いたウルトラハードコーティング技術の開発

    2007 - 2008

    福岡県産業・科学技術振興財団産学官事業

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    Authorship:Principal investigator  Grant type:Contract research

  • 宇宙環境プラズマ照射による高分子材料の物性変化に関する研究

    2007 - 2008

    宙空環境センター共同研究費

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    Authorship:Principal investigator  Grant type:On-campus funds, funds, etc.

  • ガラスのプレス成形金型用超硬度コーティング材の開発

    2007

    福岡県産業・科学技術振興財団研究FS事業

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    Authorship:Principal investigator  Grant type:Contract research

  • 立方晶窒化ホウ素厚膜ウルトラハードコーティングの実用化研究

    2007

    九州産業技術センター九州地域戦略産業イノベーション創出事業研究開発委託事業

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    Authorship:Principal investigator  Grant type:Contract research

  • ナノ結晶ダイヤモンド/アモルファスカーボン複合化による高温用ヒートシンクの開発

    2007

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    Grant type:Donation

  • ナノ結晶/アモルファス複合構造n型ダイヤモンド薄膜の高性能化とデバイス応用

    2007

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    Grant type:Donation

  • 超低損失デバイス開発のためのナノ結晶/アモルファス複合構造n型ダイヤモンド薄膜の高性能化とダイオード性能評価

    2007

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    Grant type:Donation

  • ナノカーボン/窒化ホウ素へテロ構造薄膜電子エミッターの開発

    2007

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    Grant type:Donation

  • 立方晶窒化ホウ素厚膜形成技術を用いた難削材加工用ツールの開発

    2007

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    Grant type:Donation

  • 立方晶窒化ホウ素厚膜形成技術の難削材加工用ツールへの応用

    2007

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    Grant type:Donation

  • ナノダイヤモンド/アモルファスカーボンハイブリッドn型半導体薄膜の相制御と電気特性評価

    2006

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    Grant type:Donation

  • プラズマCVDによって得られるBN膜の電気特性の改善

    2005.4 - 2006.1

    受託研究

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    Authorship:Principal investigator  Grant type:Other funds from industry-academia collaboration

  • プラズマCVD装置にて成膜するBN膜の電気特性改善

    2005.1 - 2005.3

    受託研究

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    Authorship:Principal investigator  Grant type:Other funds from industry-academia collaboration

  • プラズマー容器壁相互作用による中性高次分子発生機構に関する研究

    2005 - 2006

    科学研究費助成事業  若手研究(B)

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • 半導体プロセスにおける高次分子検出用電子付着質量分析法の開発

    2002 - 2003

    科学研究費助成事業  若手研究(B)

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    Authorship:Principal investigator  Grant type:Scientific research funding

  • 高品質へテロエピタキシャルダイヤモンドの大面積堆積

    2002

    科学技術振興事業団FS研究調査

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    Authorship:Principal investigator  Grant type:Contract research

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Class subject

  • 電気エネルギー工学

    2024.6 - 2024.8   Summer quarter

  • 半導体・デバイス工学B

    2024.6 - 2024.8   Summer quarter

  • 電子デバイス基礎

    2024.4 - 2024.6   Spring quarter

  • 機械電気科学実験I

    2024.4 - 2024.6   Spring quarter

  • 電気エネルギー工学

    2023.6 - 2023.8   Summer quarter

  • 機械電気科学実験I

    2023.4 - 2023.6   Spring quarter

  • 電子デバイス基礎

    2023.4 - 2023.6   Spring quarter

  • 電子デバイス基礎

    2022.4 - 2022.6   Spring quarter

  • 熱力学基礎演習

    2021.12 - 2022.2   Winter quarter

  • 電磁気学基礎演習

    2021.10 - 2021.12   Fall quarter

  • 電気工学基礎

    2021.4 - 2021.9   First semester

  • 電子デバイス基礎

    2021.4 - 2021.6   Spring quarter

  • 基幹物理学ⅠB演習

    2020.10 - 2021.3   Second semester

  • 電気工学基礎

    2020.4 - 2020.9   First semester

  • 光エレクトロニクス特論

    2019.10 - 2020.3   Second semester

  • 電気工学基礎

    2019.4 - 2019.9   First semester

  • 基礎電磁気学

    2018.4 - 2018.9   First semester

  • 電気工学基礎

    2018.4 - 2018.9   First semester

  • 電気工学基礎

    2018.4 - 2018.9   First semester

  • 基礎電磁気学

    2018.4 - 2018.6   Spring quarter

  • 基幹物理学ⅠB

    2017.10 - 2018.3   Second semester

  • 基幹物理学IB

    2017.10 - 2018.3   Second semester

  • 光エレクトロニクス特論

    2017.10 - 2018.3   Second semester

  • 基礎電磁気学

    2017.4 - 2017.9   First semester

  • 電気工学基礎

    2017.4 - 2017.9   First semester

  • 一般電気工学第一

    2017.4 - 2017.9   First semester

  • 電気工学大意第一

    2017.4 - 2017.9   First semester

  • 電気工学基礎

    2017.4 - 2017.9   First semester

  • 基礎電磁気学

    2017.4 - 2017.6   Spring quarter

  • 基幹物理学IB

    2016.10 - 2017.3   Second semester

  • 電気工学基礎

    2016.4 - 2016.9   First semester

  • 基礎電磁気学

    2016.4 - 2016.9   First semester

  • 基幹物理学IB

    2015.10 - 2016.3   Second semester

  • 光エレクトロニクス特論

    2015.10 - 2016.3   Second semester

  • 電気工学基礎

    2015.4 - 2015.9   First semester

  • 基礎電磁気学

    2015.4 - 2015.9   First semester

  • 基幹物理学IB演習

    2014.10 - 2015.3   Second semester

  • 基礎電磁気学

    2014.4 - 2014.9   First semester

  • 電気工学基礎

    2013.10 - 2014.3   Second semester

  • 力学基礎・同演習

    2013.4 - 2013.9   First semester

  • 光エレクトロニクス特論

    2013.4 - 2013.9   First semester

  • 基礎電磁気学

    2013.4 - 2013.9   First semester

  • 電気工学基礎

    2012.10 - 2013.3   Second semester

  • 力学基礎・同演習

    2012.4 - 2012.9   First semester

  • 基礎電磁気学

    2012.4 - 2012.9   First semester

  • 電気工学基礎

    2011.10 - 2012.3   Second semester

  • 力学基礎・同演習

    2011.4 - 2011.9   First semester

  • 基礎電磁気学

    2011.4 - 2011.9   First semester

  • 光エレクトロニクス特論

    2011.4 - 2011.9   First semester

  • 一般電気工学第一

    2010.10 - 2011.3   Second semester

  • 基礎電磁気学

    2010.4 - 2010.9   First semester

  • 光エレクトロニクス特論

    2009.4 - 2009.9   First semester

  • 基礎電磁気学

    2009.4 - 2009.9   First semester

  • 一般電気工学第一

    2008.10 - 2009.3   Second semester

  • 基礎電磁気学

    2008.4 - 2008.9   First semester

  • 一般電気工学第一

    2007.10 - 2008.3   Second semester

  • 基礎電磁気学

    2007.4 - 2007.9   First semester

  • 光エレクトロニクス特論

    2007.4 - 2007.9   First semester

  • 基礎電磁気学

    2006.4 - 2006.9   First semester

  • 基礎電磁気学

    2005.4 - 2005.9   First semester

  • プラズマ量子工学特論

    2005.4 - 2005.9   First semester

  • 量子プロセス理工学基礎2

    2004.4 - 2004.9   First semester

  • 電気プロセス工学基礎

    2004.4 - 2004.9   First semester

  • 電気プロセス工学基礎

    2003.4 - 2003.9   First semester

  • 量子プロセス理工学基礎2

    2003.4 - 2003.9   First semester

  • 数学演習

    2002.10 - 2003.3   Second semester

  • 電気プロセス工学基礎

    2002.4 - 2002.9   First semester

  • 量子プロセス理工学基礎2

    2002.4 - 2002.9   First semester

  • 量子プロセス理工学基礎2

    2001.4 - 2001.9   First semester

  • 電気プロセス工学基礎

    2001.4 - 2001.9   First semester

▼display all

FD Participation

  • 2005.5   Role:Participation   Title:e-learningについて

    Organizer:University-wide

Other educational activity and Special note

  • 2024  Class Teacher 

  • 2023  Class Teacher 

  • 2023  Class Teacher 

  • 2023  Special Affairs 

  • 2022  Class Teacher 

  • 2022  Class Teacher 

  • 2021  Special Affairs 

  • 2017  Special Affairs 

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Social Activities

  • 九州大学2017年度総理工セミナー「物質材料研究の最前線」/口頭発表

    九州大学大学院総合理工学府  九州大学筑紫地区  2018.2

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    Audience: General, Scientific, Company, Civic organization, Governmental agency

    Type:Seminar, workshop

  • FIRSTシンポジウム「科学技術が拓く2030 年」/ポスター発表

    FIRSTプログラム公開活動実行委員会(株式会社早稲田総研イニシアティブ)  ベルサール新宿グランド  2014.3

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    Audience: General, Scientific, Company, Civic organization, Governmental agency

    Type:Lecture

  • 九州大学高等研究院若手研究者交流セミナー/口頭発表

    九州大学高等研究院  九州大学筑紫地区  2013.1

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    Audience: General, Scientific, Company, Civic organization, Governmental agency

    Type:Lecture

  • 平成24年度九州大学大学院総合理工学府公開講座/講師

    九州大学大学院総合理工学府  九州大学筑紫地区  2012.8

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    Audience: General, Scientific, Company, Civic organization, Governmental agency

    Type:Lecture

  • Joint public symposium of Scientific Research on Innovative Areas “Frontier science of interactions between plasmas and nano-interfaces”, Funding Program for Next Generation World-Leading Researchers and Center of Plasma Nano-interface Engineering (CPNE), Kyushu University/招待講演

    名古屋大学, 九州大学, 韓国Sungkyunkwan University  九州大学箱崎地区  2012.1

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    Audience: General, Scientific, Company, Civic organization, Governmental agency

    Type:Lecture

  • 平成22年度九州大学大学院総合理工学府セミナー/ポスター発表

    九州大学大学院総合理工学府  九州大学筑紫地区  2010.12

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    Audience: General, Scientific, Company, Civic organization, Governmental agency

    Type:Seminar, workshop

  • 平成14年度九州大学産学連携センター第89回KASTECセミナー/講師

    九州大学産学連携センター  九州大学筑紫地区  2003.1

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    Audience: General, Scientific, Company, Civic organization, Governmental agency

    Type:Seminar, workshop

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Media Coverage

  • 九大、地上で2番目に硬い「立方晶窒化ホウ素」を改質して生体適合性を向上

    マイナビニュース  2020.10

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    九大、地上で2番目に硬い「立方晶窒化ホウ素」を改質して生体適合性を向上

  • ニューリーダーからの1冊

    みらいぶプラス(河合塾)  2017.2

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    ニューリーダーからの1冊

  • 九大、酸化に強い被膜法を開発 Newspaper, magazine

    日刊工業新聞  2016.10

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    九大、酸化に強い被膜法を開発

Activities contributing to policy formation, academic promotion, etc.

  • 2021.6 - 2023.2   IEEE

    IEEE Transactions on Plasma Science, Guest Editor

  • 2019.5 - 2021.1   IEEE

    IEEE Transactions on Plasma Science, Guest Editor

  • 2017.12 - 2019.2   IEEE

    IEEE Transactions on Plasma Science, Guest Editor

  • 2012.8 - 2019.3   文部科学省 科学技術政策研究所 科学技術動向研究センター

    専門調査員

Acceptance of Foreign Researchers, etc.

  • Atomic Energy Comission

    Acceptance period: 2021.10 - 2022.9   (Period):1 month or more

    Nationality:Bangladesh

    Business entity:Ministry of education

  • 湘潭大学

    Acceptance period: 2019.10 - 2020.3   (Period):1 month or more

    Nationality:China

  • National Taiwan University

    Acceptance period: 2010.10 - 2011.3   (Period):1 month or more

    Nationality:Taiwan, Province of China

  • National Taiwan University

    Acceptance period: 2009.9 - 2010.2   (Period):1 month or more

    Nationality:Taiwan, Province of China

    Business entity:On-campus funds

Travel Abroad

  • 2007.3

    Staying countory name 1:Taiwan, Province of China   Staying institution name 1:龍華科技大学

  • 2006.6 - 2007.3

    Staying countory name 1:United Kingdom   Staying institution name 1:ケンブリッジ大学