Updated on 2024/10/04

Information

 

写真a

 
KANGAWA YOSHIHIRO
 
Organization
Research Institute for Applied Mechanics Division of Renewable Energy Dynamics Professor
Interdisciplinary Graduate School of Engineering Sciences Department of Interdisciplinary Engineering Sciences(Joint Appointment)
Semiconductors and Devices Ecosystem Research and Education Center (Joint Appointment)
Kyushu University Platform of Inter/Transdisciplinary Energy Research (Joint Appointment)
Title
Professor
Contact information
メールアドレス
Profile
1) Process informatics for new material development, 2) ab initio-based approach for vapor phase epitaxy of semiconductors, 3) development of deep UV LEDs & LDs and next generation power devices, etc.
Homepage

Research Areas

  • Nanotechnology/Materials / Thin film/surface and interfacial physical properties

  • Nanotechnology/Materials / Crystal engineering

  • Nanotechnology/Materials / Applied physical properties

Degree

  • Dr. Engineering

Research History

  • 学習院大学計算機センター/助手(2000.04-2002.03) 東京農工大学工学部応用分子化学科/助手(2002.04-2004.12) 九州大学応用力学研究所/助教授・准教授(2005.01-2017.05) [クロスアポイントメント]名古屋大学 未来材料・システム研究所/特任准教授(2016.08-2017.05)特任教授(2017.06-2021.03)

Research Interests・Research Keywords

  • Research theme:Science in Semiconductor Chemical Vapor Deposition

    Keyword:Chemical Vapor Deposition

    Research period: 2024.4 - 2028.3

  • Research theme:Surface Science

    Keyword:Surface Science

    Research period: 2024

  • Research theme:crystal growth

    Keyword:crystal growth

    Research period: 2024

  • Research theme:Compound Semiconductor

    Keyword:Compound Semiconductor

    Research period: 2024

  • Research theme:Process Informatics

    Keyword:Process Informatics

    Research period: 2024

  • Research theme:Atomic-level control of AlGaN hetero-interfaces for deep-UV LED

    Keyword:deep UV LED

    Research period: 2023.4 - 2026.3

  • Research theme:Quantum-Theory-Based Multiscale Simulations toward the Development of Next-Generation Energy-Saving Semiconductor Devices

    Keyword:Quantum-Theory-Based Multiscale Simulations

    Research period: 2020.4 - 2023.3

  • Research theme:Innovation Reliable Nitride based Power Devices and Applications

    Keyword:Power Device

    Research period: 2016.10 - 2020.11

  • Research theme:Realization of deep UV semiconductor lasers and the study of ultra-high-concentration impurity and polarization semiconductors

    Keyword:Deep UV Laser

    Research period: 2016.4 - 2022.3

  • Research theme:Materials Science and Advanced Electronics Created by Singularity

    Keyword:Singularity Structure

    Research period: 2016.4 - 2021.3

  • Research theme:Research and development of next-generation semiconductors for realization of energy-saving society

    Keyword:Power device

    Research period: 2016.4 - 2021.3

  • Research theme:Surface phase diagram of InN grown by pressurized reactor MOVPE: An ab initio based-approach

    Keyword:cubic InN、ab initio calculation、free energy of vapor phase

    Research period: 2012.4 - 2017.3

  • Research theme:Growth mechanisms of graphene on vicinal SiC

    Keyword:Graphene

    Research period: 2009.4 - 2021.3

  • Research theme:Control of composition of GaNAs for multi-junction solar cell

    Keyword:multi-junction solar cell, control of composition, GaNAs

    Research period: 2008.10 - 2017.3

  • Research theme:Solid source solution growth (3SG) of bulk AlN

    Keyword:Solution growth, AlN

    Research period: 2006.4 - 2020.11

  • Research theme:Investigation of growth mechanisms of cubic-GaN

    Keyword:cubic GaN、ab initio calculation、free energy of vapor phase

    Research period: 2005.1 - 2014.3

  • Research theme:Control of composition of coherently grown InGaN thin films

    Keyword:InGaN, lattice constraint, compositional instability

    Research period: 2000.4 - 2014.3

Awards

  • APEX/JJAP Editorial Contribution Award

    2018.3   The Japan Society of Applied Physics  

  • 第31回 論文賞

    2014.11   日本結晶成長学会   寒川義裕(九州大学)、秋山 亨(三重大学)、伊藤智徳(三重大学)、白石賢二(名古屋大学)、中山隆史(千葉大学) 「化合物半導体エピタキシーにおける量子計算科学の展開」

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    【受賞理由】 寒川義裕氏らは量子論に基づく原子レベルの第一原理解析とマクロレベルの統計的解析を結合した手法を開発し、結晶成長の根幹に関わる現象を解明している。近年、化合物半導体の成長技術は飛躍的に進展しており、現在では原子レベルでその成長機構・膜構造を制御する段階に入っている。材料開発を更に加速するためには、材料設計・成膜における「羅針盤」とも言うべき表面構造状態図が必要となるが、成膜中の成長表面の原子配列(再構成構造)を実験的に解明することが困難である。表面再構成構造を解析する手法として量子論に基づく第一原理計算が有効と思われるが、従来法は絶対零度における静的構造安定性の解析に限られたものであった。候補者らは第一原理計算と量子統計化学に基づく計算手法を融合させた計算技術を開拓し、半導体成膜環境下における表面構造状態図の解析手法を確立した。また本計算技術を用いて窒化物半導体の非極性・半極性面における表面構造状態図を創成し、不純物取込やファセット形成等の成長機構の議論に展開した。本候補論文に記述されている知見は半導体材料開発、特に緑・赤色LED用材料の開発プロセスを加速する上で有用であり、本会論文賞にふさわしいと判断した。

  • Certificate of Appreciation

    2011.12   American Chemical Society  

  • 研究活動表彰

    2011.11   九州大学  

  • 研究活動表彰

    2010.11   九州大学  

  • 研究・産学連携活動表彰

    2009.5   九州大学  

  • EMS賞

    2005.7   本シンポジウムでは、平成9年(第16回)から優れた研究発表をなされた、あるいは討論等によりこの会議を盛り上げてくれた若手研究者を対象としたEMS賞を授与しています。

  • 日本結晶成長学会 第2回奨励賞

    2004.8   日本結晶成長学会   受賞論文:Y. Kangawa, T. Ito, Y. S. Hiraoka, A. Taguchi, K. Shiraishi, T. Ohachi, “Theoretical approach to influence of As2 pressure on GaAs growth kinetics”, Surf. Sci. 507-510(2002)285-289

  • 放談賞

    2003.8   日本結晶成長学会  

  • 学生優秀発表賞

    1999.1   日本金属学会九州支部 日本鉄鋼協会九州支部   寒川義裕、桑野範之、沖憲典、“InGaAs/(110)InP混晶におけるCuAu-I型規則化メカニズムの原子間ポテンシャルによる解析”

  • 講演奨励賞

    1996.1   応用物理学会   寒川義裕、桑野範之、沖憲典、“III-V族半導体混晶におけるTP-A型規則化のモンテカルロ法による解析”

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Papers

  • Progress in Modeling Compound Semiconductor Epitaxy: Unintentional Doping in GaN MOVPE Reviewed International journal

    Crystal Growth & Design   21 ( 3 )   1878 - 1890   2021.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1021/acs.cgd.0c01564

  • Evolution of the free energy of the GaN (0001) surface based on first-principles phonon calculations Reviewed International journal

    Pawel Kempisty, Yoshihiro Kangawa

    PHYSICAL REVIEW B   100   085304-1 - 12   2019.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1103/PhysRevB.100.085304

  • DFT modeling of carbon incorporation in GaN(0001) and GaN(000 1 ) metalorganic vapor phase epitaxy Reviewed

    Pawel Kempisty, Yoshihiro Kangawa, Akira Kusaba, Kenji Shiraishi, Stanislaw Krukowski, Michal Bockowski, Koichi Kakimoto, Hiroshi Amano

    Applied Physics Letters   111 ( 14 )   2017.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/1.4991608

  • Progress in theoretical approach to InGaN and InN epitaxy: In incorporation efficiency and structural stability Invited Reviewed International journal

    Y. Kangawa, T. Ito, A. Koukitu, K. Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 10 )   100202-1 - 11   2014.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/JJAP.53.100202

  • Surface Stability and Growth Kinetics of Compound Semiconductors: An Ab Initio-Based Approach Invited Reviewed International journal

    Yoshihiro KANGAWA, Toru Akiyama, Tomonori Ito, Kenji Shiraishi, Takashi Nakayama

    MATERIALS   6 ( 8 )   3309 - 3360   2013.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/ma6083309

    Other Link: http://www.mdpi.com/1996-1944/6/8/3309

  • Adiabatic Potential for Conformational Change of VGa–VN Complex Defects in GaN Reviewed International journal

    Jota Nakamura, Masato Oda, Yoshihiro Kangawa

    physica status solidi (b)   2024   2400026   2024.3   ISSN:0370-1972 eISSN:1521-3951

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  • First-principles calculations of α-Ga2O3/Al2O3 superlattice band structures Reviewed International journal

    626 ( 15 )   127477   2024.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2023.127477

  • Advances in process informatics: AI-assisted exploration of material manufacturing process Invited Reviewed International journal

    Yoshihiro Kangawa

    JSAP Review   2023   230215   2023.10

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:The Japan Society of Applied Physics  

    DOI: https://doi.org/10.11470/jsaprev.230215

  • Polar GaN Surfaces under Gallium Rich Conditions: Revised Thermodynamic Insights from Ab Initio Calculations Reviewed International journal

    Pawel Kempisty, Karol Kawka, Akira Kusaba, Yoshihiro Kangawa

    Materials   16 ( 17 )   5982   2023.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/ma16175982

  • Progress in Surface Science in III-Nitride MOCVD Invited Reviewed

    Yoshihiro Kangawa, Akira Kusaba

    Vacuum & Surface Science   66 ( 4 )   227 - 232   2023.4

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    Authorship:Lead author   Language:Japanese  

  • Bandgap Change in Short‐Period InN/AlN Superlattices Induced by Lattice Strain Reviewed International journal

    2023   2200549   2023.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/pssb.202200549

  • Polarization Doping in a GaN-InN System—Ab Initio Simulation Reviewed International journal

    16 ( 3 )   1227   2023.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/ma16031227

    Other Link: https://doi.org/10.3390/ma16031227

  • Beyond <i>ab initio</i> reaction simulator: An application to GaN metalorganic vapor phase epitaxy

    Kusaba, A; Nitta, S; Shiraishi, K; Kuboyama, T; Kangawa, Y

    APPLIED PHYSICS LETTERS   121 ( 16 )   2022.10   ISSN:0003-6951 eISSN:1077-3118

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    Publisher:Applied Physics Letters  

    To develop a quantitative reaction simulator, data assimilation was performed using high-resolution time-of-flight mass spectrometry (TOF-MS) data applied to a GaN metalorganic vapor phase epitaxy system. Incorporating ab initio knowledge into the optimization enables it to reproduce not only the concentration of CH4 (an impurity precursor) as an objective variable but also known reaction pathways. The simulation results show significant production of GaH3, a precursor of GaN, which has been difficult to detect in TOF-MS experiments. Our proposed approach is expected to be applicable to other applied physics fields that require quantitative prediction that goes beyond ab initio reaction rates.

    DOI: 10.1063/5.0119783

    Web of Science

    Scopus

  • Polarization doping—Ab initio verification of the concept: Charge conservation and nonlocality Reviewed International journal

    132 ( 6 )   064301   2022.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: DOI: 10.1063/5.0098909

  • An atomistic insight into reactions and free-energy profiles of NH3 and Ga on GaN surfaces during the epitaxial growth Reviewed International journal

    Mauro Boero, Kieu My Bui, Kenji Shiraishi, Kana Ishisone, Yoshihiro Kangawa, Atsushi Oshiyama

    Applied Surface Science   599   153935   2022.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: DOI: 10.1016/j.apsusc.2022.153935

  • DFT Modeling of Unintentional Oxygen Incorporation Enhanced by Magnesium in GaN (0001) and AlN (0001) Growth Surfaces during Metal‐Organic Vapor‐Phase Epitaxy Reviewed International journal

    2100430   2022.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/pssb.202100430

  • Exploration of a large-scale reconstructed structure on GaN(0001) surface by Bayesian optimization Reviewed International journal

    A. Kusaba, Y. Kangawa, T. Kuboyama, A. Oshiyama

    Applied Physics Letters   120 ( 2 )   021602   2022.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0078660

  • Crystal growth and process informatics:

    Kangawa Yoshihiro

    Journal of the Japanese Association for Crystal Growth   49 ( 1 )   n/a   2022   ISSN:03856275 eISSN:21878366

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    Language:Japanese   Publisher:The Japanese Association for Crystal Growth  

    <p>  This tutorial provides an overview of the research trends to date in the field of crystal growth theory of semiconductors. Furthermore, a future outlook is discussed based on the research trends to date. In the research field, the major trend to date was to analyze and understand the experimental results and phenomena theoretically. As a number of physical models have already been developed in the research field, it is expected that these models will be used to construct “digital twins” of chemical reaction system and apply them to “process informatics” to predict optimum growth condition of new materials.</p>

    DOI: 10.19009/jjacg.49-1-04

    CiNii Research

  • Al coverage of AlN(0001) surface and Al vapor pressure – Thermodynamic assessment based on ab initio calculations Reviewed International journal

    Pawel Strak, Ashfaq Ahmad, Pawel Kempisty, Jacek Piechota, Konrad Sakowski, Grzegorz Nowak, Yoshihiro Kangawa, Jan Łażewski, Stanislaw Krukowski

    203 ( 15 )   111159   2021.12

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.commatsci.2021.111159

  • Effects of Mg dopant in Al-composition-graded Al x Ga1− x N (0.45≤ x) on vertical electrical conductivity of ultrawide bandgap AlGaN p–n junction Reviewed International journal

    14 ( 9 )   096503   2021.8

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1882-0786/ac1d64

  • Adsorption of nitrogen at AlN (000-1) surface–decisive role of structural and electronic factors Reviewed International journal

    713   121891   2021.6

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.susc.2021.121891

  • Band gap tuning in InxGa1-xN/InyGa1-yN short period superlattices Reviewed International journal

    I. Gorczyca, G. Staszczak, G. Targowski, E. Grzanka, J. Smalc-Koziorowska, T. Suski, T. Kawamura, Y. Kangawa

    Superlattices and Microstructures   155   106907   2021.5

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.spmi.2021.106907

  • Theoretical study on the effect of H2 and NH3 on trimethylgallium decomposition process in GaN MOVPE Reviewed International journal

    Soma Sakakibara, Kenta Chokawa, Masaaki Araidai, Akira Kusaba, Yoshihiro Kangawa, Kenji Shiraishi

    Japanese Journal of Applied Physics   60 ( 4 )   045507   2021.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/abf089

  • Facet stability of GaN during tri-halide vapor phase epitaxy: an ab initio-based approach Reviewed International journal

    Daichi Yosho, Yuriko Matsuo, Akira Kusaba, Pawel Kempisty, Yoshihiro Kangawa, Hisashi Murakami, Akinori Koukitu

    CrystEngComm   23 ( 6 )   1423 - 1428   2021.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1039/D0CE01683G

  • Absolute surface energies of oxygen-adsorbed GaN surfaces Reviewed

    Takahiro Kawamura, Toru Akiyama, Akira Kitamoto, Masayuki Imanishi, Masashi Yoshimura, Yusuke Mori, Yoshitada Morikawa, Yoshihiro Kangawa, Koichi Kakimoto

    Journal of Crystal Growth   549   125868   2020.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2020.125868

  • Self-formed compositional superlattices triggered by cation orderings in m-plane Al1−xInxN on GaN Reviewed International journal

    10   18570-1 - 11   2020.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1038/s41598-020-75380-3

  • Ab initio and thermodynamic picture of Al adsorption of AlN (0001) surface–Role of bond creation and electron transition contributions Reviewed International journal

    532   147419-1 - 12   2020.8

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  • Thermodynamic analysis of the gas phase reaction of Mg-doped GaN growth by HVPE using MgO Reviewed

    Tomoya Kimura, Kazuki Ohnishi, Yuki Amano, Naoki Fujimoto, Masaaki Araidai, Shugo Nitta, Yoshio Honda, Hiroshi Amano, Yoshihiro Kangawa, Kenji Shiraishi

    Japanese Journal of Applied Physics   59 ( 8 )   088001   2020.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/aba0d5

  • Screw dislocation that converts p-type GaN to n-type: Microscopic study on Mg condensation and leakage current in p–n diodes Reviewed

    Takashi Nakano, Yosuke Harashima, Kenta Chokawa, Kenji Shiraishi, Atsushi Oshiyama, Yoshihiro Kangawa, Shigeyoshi Usami, Norihito Mayama, Kazuya Toda, Atsushi Tanaka, Yoshio Honda, Hiroshi Amano

    Applied Physics Letters   117 ( 1 )   012105   2020.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1063/5.0010664

  • Oxygen Incorporation Kinetics in Vicinal m(10−10) Gallium Nitride Growth by Metal-Organic Vapor Phase Epitaxy Reviewed

    14 ( 6 )   2020.6

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    The oxygen incorporation kinetics of vicinal m(10−10) gallium nitride (GaN) growth during metal-organic vapor phase epitaxy is clarified using a diffusion equation-based approach that incorporates diffusion potentials obtained by large-scale density functional theory (DFT) calculations. A diffusion model based on the Burton, Cabrera and Frank (BCF) theory is proposed, and then, the oxygen concentration in the epitaxial films is calculated quantitatively. The calculation results agree with the experimental tendency that the oxygen concentration in the −c 5° off m-GaN epilayers is lower than that in the +c 5° off m-GaN epilayers. Then, the off-angle dependence of oxygen incorporation in vicinal m-GaN growth is predicted.

    DOI: 10.1002/pssr.202000142

  • First-Principles Calculation of Bandgaps of Al1−xInxN Alloys and Short-Period Al1−xInxN/Al1−yInyN Superlattices Reviewed International journal

    Takahiro Kawamura, Yuma Fujita, Yuya Hamaji, Toru Akiyama, Yoshihiro Kangawa, Izabela Gorczyca, Tadeusz Suski, Małgorzata Wierzbowska, Stanisław Krukowski

    257 ( 4 )   1900530-1 - 5   2020.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1002/pssb.201900530

  • Computational study of oxygen stability in vicinal m(10−10)-GaN growth by MOVPE Reviewed International journal

    13   055507-1 - 4   2020.4

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1882-0786/ab8723

    Repository Public URL: https://hdl.handle.net/2324/7173479

  • Modeling carbon coverage on polar GaN surfaces during MOVPE Reviewed International journal

    #Daichi Yosho, #Yuya Inatomi, Yoshihiro Kangawa

    Japanese Journal of Applied Physics   59   048002-1 - 5   2020.4

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    DOI: 10.35848/1347-4065/ab80e2

  • Theoretical study of adatom stability on polar GaN surfaces during MBE and MOVPE Reviewed International journal

    Y. Inatomi, Y. Kangawa

    Applied Surface Science   502   144205-1 - 8   2020.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.apsusc.2019.144205

  • Thermodynamic analysis for nonpolar III-nitride surfaces under metalorganic vapor-phase epitaxy conditions Reviewed International journal

    Tsunashi Shimizu, Yuki Seta, Toru Akiyama, Abdul Muizz Pradipto, Kohji Nakamura, Tomonori Ito, Akira Kusaba, @Yoshihiro Kangawa

    Japanese Journal of Applied Physics   59   028003-1 - 4   2020.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.35848/1347-4065/ab68af

  • Chemical vapor deposition condition dependence of reconstructed surfaces on 4H-SiC (0001), (000-1), and (1-100) surfaces Reviewed International journal

    Kenta Chokawa, Emi Makino, Norikazu Hosokawa, Shoichi Onda, Yoshihiro Kangawa, and Kenji Shiraishi

    Japanese Journal of Applied Physics   58   115501-1 - 7   2019.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: DOI: 10.7567/1347-4065/ab4c21

  • Thermodynamic analysis of semipolar GaN and AlN under metalorganic vapor phase epitaxy growth conditions Reviewed International journal

    Yuki Seta, Abdul Muizz Pradipto, Toru Akiyama, Kohji Nakamura, Tomonori Ito, Akira Kusaba, @Yoshihiro Kangawa

    Japanese Journal of Applied Physics   58   SC1014-1 - 9   2019.5

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/1347-4065/ab040a

  • Electronic structure analysis of core structures of threading dislocations in GaN Reviewed International journal

    Takashi Nakano, Kenta Chokawa, Masaaki Araidai, Kenji Shiraishi, Atsushi Oshiyama, Akira Kusaba, Yoshihiro Kangawa, Atsushi Tanaka, Yoshio Honda, Hiroshi Amano

    2019 Compound Semiconductor Week, CSW 2019 2019 Compound Semiconductor Week, CSW 2019 - Proceedings   2019.5

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    Language:English   Publishing type:Research paper (international conference proceedings)  

    DOI: 10.1109/ICIPRM.2019.8819270

  • CH4 Adsorption Probability on GaN(0001) and (000-1) during Metalorganic Vapor Phase Epitaxy and Its Relationship to Carbon Contamination in the Films Reviewed

    Akira Kusaba, Guanchen Li, Pawel Kempisty, Michael R. von Spakovsky, Yoshihiro Kangawa

    Materials   12 ( 6 )   972-1 - 14   2019.3

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.3390/ma12060972

  • First-principle study of ammonia decomposition and nitrogen incorporation on the GaN surface in metal organic vapor phase epitaxy Reviewed

    Kieu My Bui, Jun Ichi Iwata, Yoshihiro Kangawa, Kenji Shiraishi, Yasuteru Shigeta, Atsushi Oshiyama

    Journal of Crystal Growth   507   421 - 424   2019.2

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.jcrysgro.2018.11.031

  • Kinetic-thermodynamic model for carbon incorporation during step-flow growth of GaN by metalorganic vapor phase epitaxy Reviewed International journal

    Y. Inatomi, Yoshihiro Kangawa, A. Pimpinelli, T. L. Einstein

    Physical Review Materials   3 ( 1 )   013401-1 - 8   2019.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1103/PhysRevMaterials.3.013401

  • Chemical vapor deposition condition dependence of reconstructed surfaces on 4H-SiC (0001), (0001), and (1100) surfaces Reviewed

    Kenta Chokawa, Emi Makino, Norikazu Hosokawa, Shoichi Onda, Yoshihiro Kangawa, Kenji Shiraishi

    Japanese Journal of Applied Physics   58 ( 11 )   2019.1

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/1347-4065/ab4c21

  • First-principles study of polar, nonpolar, and semipolar GaN surfaces during oxide vapor phase epitaxy growth Reviewed International journal

    Takahiro Kawamura, Akira Kitamoto, Mamoru Imade, Masashi Yoshimura, Yusuke Mori, Yoshitada Morikawa, Yoshihiro Kangawa, Koichi Kakimoto, Toru Akiyama

    Japanese Journal of Applied Physics   57 ( 11 )   115504-1 - 7   2018.11

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  • Reaction Pathway of Surface-Catalyzed Ammonia Decomposition and Nitrogen Incorporation in Epitaxial Growth of Gallium Nitride Reviewed International journal

    Kieu My Bui, Jun Ichi Iwata, Yoshihiro Kangawa, Kenji Shiraishi, Yasuteru Shigeta, Atsushi Oshiyama

    Journal of Physical Chemistry C   122 ( 43 )   24665 - 24671   2018.11

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    DOI: 10.1021/acs.jpcc.8b05682

  • Thermodynamic analysis of trimethylgallium decomposition during GaN metal organic vapor phase epitaxy Reviewed International journal

    Kazuki Sekiguchi, Hiroki Shirakawa, Kenta Chokawa, Masaaki Araidai, @Yoshihiro Kangawa, @Koichi Kakimoto, Kenji Shiraishi

    Japanese Journal of Applied Physics   57 ( 4S )   04FJ03-1 - 4   2018.3

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    DOI: 10.7567/JJAP.57.04FJ03

  • First-principles study of the surface phase diagrams of GaN(0001) and (000-1) under oxide vapor phase epitaxy growth conditions Reviewed International journal

    T. Kawamura, A. Kitamoto, M. Imade, M. Yoshimura, Y. Mori, Y. Morikawa, Y. Kangawa, K. Kakimoto

    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS   254 ( 8 )   1600706-1 - 6   2017.8

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    DOI: 10.1002/pssb.201600706

  • Modeling the non-equilibrium process of the chemical adsorption of ammonia on GaN(0001) reconstructed surfaces based on steepest-entropy-ascent quantum thermodynamics Reviewed International journal

    Akira Kusaba, Guanchen Li, Michael R. von Spakovsky, Yoshihiro Kangawa, Koichi Kakimoto

    Materials   10 ( 8 )   948-1 - 13   2017.8

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    DOI: 10.3390/ma10080948

  • First Principles and Themodynamical Studies on Matel Organic Vaper Phase Epitaxy of GaN Invited Reviewed International journal

    Kenji Shiraishi, Kazuki Sekiguchi, Hiroki Shirakawa, Kenta Chokawa, Masaaki Araidai, @Yoshihiro Kangawa, @Koichi Kakimoto

    ECS Transactions   80 ( 1 )   295 - 301   2017.8

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    DOI: 10.1149/08001.0295ecst

  • Thermodynamic analysis of (0001) and (000(1)over-bar) GaN metalorganic vapor phase epitaxy Reviewed International journal

    A. Kusaba, Y. Kangawa, P. Kempisty, H. Valencia, K. Shiraishi, Y. Kumagai, K. Kakimoto, A. Koukitu

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 ( 7 )   070304-1 - 4   2017.7

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    DOI: 10.7567/JJAP.56.070304

  • Theoretical study of the composition pulling effect in InGaN metalorganic vapor-phase epitaxy growth Reviewed International journal

    Y. Inatomi, Y. Kangawa, T. Ito, T. Suski, Y. Kumagai, K. Kakimoto, A. Koukitu

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 ( 7 )   078003-1 - 3   2017.7

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  • Chemical beam epitaxy of GaAs1-xNx using MMHy and DMHy precursors, modeled by ab initio study of GaAs(100) surfaces stability over As-2, H-2 and N-2 Reviewed International journal

    H. VALENCIA, Y. Kangawa, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   468   557 - 561   2017.6

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    DOI: 10.1016/j.jcrysgro.2016.11.056

  • Ab initio model for GaAs1%xNx chemical beam epitaxy using GaAs(100) surface stability over As2, H2, and N2 Reviewed International journal

    Hubert Valencia, Yoshihiro Kangawa, Koichi Kakimoto

    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes   56 ( 6 )   060306-1 - 3   2017.6

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    DOI: 10.7567/JJAP.56.060306

  • First-principles and thermodynamic analysis of trimethylgallium (TMG) decomposition during MOVPE growth of GaN Reviewed International journal

    K. Sekiguchi, H. Shirakawa, Y. Yamamoto, M. Araidai, Y. Kangawa, K. Kakimoto, K. Shiraishi

    JOURNAL OF CRYSTAL GROWTH   468   950 - 953   2017.6

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    DOI: 10.1016/j.jcrysgro.2016.12.044

  • Thermodynamic considerations of the vapor phase reactions in III-nitride metal organic vapor phase epitaxy Reviewed International journal

    K. Sekiguchi, H. Shirakawa, K. Chokawa, M. Araidai, Y. Kangawa, K. Kakimoto, K.Shiraishi

    JAPANESE JOURNAL OF APPLIED PHYSICS   56 ( 4 )   04CJ04-1 - 4   2017.4

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    DOI: 10.7567/JJAP.56.04CJ04

  • Improved thermodynamic analysis of gas reactions for compound semiconductor growth by vapor-phase epitaxy Reviewed International journal

    Yuya Inatomi, Yoshihiro Kangawa, Koichi Kakimoto, Akinori Koukitu

    Japanese Journal of Applied Physics   56 ( 3 )   038002-1 - 3   2017.3

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    DOI: 10.7567/JJAP.56.038002

  • Thermodynamic foundations of applications of Ab initio methods for determination of the adsorbate equilibria: Hydrogen at the GaN(0001) surface Reviewed International journal

    Physical Chemistry Chemical Physics   19 ( 43 )   29676 - 29684   2017.1

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    DOI: 10.1039/c7cp05214f

  • Advances in modeling semiconductor epitaxy: Contributions of growth orientation and surface reconstruction to InN metalorganic vapor phase epitaxy Reviewed International journal

    A. Kusaba, Y. Kangawa, P. Kempisty, K. Kakimoto, A. Koukitu

    APPLIED PHYSICS EXPRESS   9 ( 12 )   125601-1 - 4   2016.12

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    DOI: 10.7567/APEX.9.125601

  • Theoretical approach to surface reconstruction of InN(0001) during raised-pressure metalorganic vapor-phase epitaxy Reviewed International journal

    Akira Kusaba, Yoshihiro Kangawa, Yoshio Honda, Hiroshi Amano, Koichi Kakimoto

    Japanese Journal of Applied Physics   55 ( 5 )   05FM01-1 - 4   2016.5

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    DOI: 10.7567/JJAP.55.05FM01

  • Strain energy analysis of screw dislocations in 4H-SiC by molecular dynamics Reviewed International journal

    Takahiro Kawamura, Mitsutoshi Mizutani, Yasuyuki Suzuki, Yoshihiro Kangawa, Koichi Kakimoto

    Japanese Journal of Applied Physics   55 ( 3 )   031301-1 - 5   2016.3

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    DOI: 10.7567/JJAP.55.031301

  • Ab initio study of GaAs(100) surface stability over AS(2), H-2 and N-2 as a model for vapor-phase epitaxy of GaAs1-xNx Reviewed International journal

    H. Valencia, Y. Kangawa, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   432   6 - 14   2015.12

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    DOI: 10.1016/j.jcrysgro.2015.09.005

  • Structural and optical properties of AlN grown by solid source solution growth method Reviewed International journal

    Y. Kangawa, H. Suetsugu, M. Knetzger, E. Meissner, K. Hazu, S. F. Chichibu, T. Kajiwara, S. Tanaka, Y. Iwasaki, K. Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   54 ( 8 )   085501-1 - 5   2015.8

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    DOI: 10.7567/JJAP.54.085501

  • Real-time observation system development for high-temperature liquid/solid interfaces and its application to solid-source solution growth of AlN Reviewed International journal

    Y. Kangawa, A. Kusaba, H. Sumiyoshi, H. Miyake, M. Bockowski, K. Kakimoto

    APPLIED PHYSICS EXPRESS   8 ( 6 )   065601-1 - 3   2015.6

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    DOI: 10.7567/APEX.8.065601

  • Role of the Surface N-H Molecular Layer in High Quality In-RICH InGaN Growth by MOVPE Reviewed International journal

    T. Yayama, Y. Kangawa, K. Kakimoto

    JOURNAL OF CHEMICAL ENGINEERING OF JAPAN   47 ( 7 )   2014.7

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    DOI: 10.1252/jcej.13we309

  • Molecular dynamics simulation of graphene growth by surface decomposition of 6H-SiC(0001) and (000(1)over-bar) Reviewed International journal

    R. Iguchi, T. Kawamura, Y. Suzuki, M. Inoue, Y. Kangawa, K. Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 6 )   065601-1 - 4   2014.6

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    DOI: 10.7567/JJAP.53.065601

  • Molecular beam epitaxy growth of GaN under Ga-rich conditions investigated by molecular dynamics simulation Reviewed International journal

    T. Kawamura, H. Hayashi, T. Miki, Y. Suzuki, Y. Kangawa, K. Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   53 ( 5 )   05FL08-1 - 5   2014.5

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    DOI: 10.7567/JJAP.53.05FL08

  • First principles approach to C aggregation process during 0th graphene growth on SiC (0001) Reviewed International journal

    M. Inoue, H. Kageshima, Y. Kangawa, K. Kakimoto

    AIP Conf. Proc.   1566   129 - 130   2013.12

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  • InSb Mid-Infrared Photon Detector for Room-Temperature Operation Reviewed International journal

    Koichi Ueno, Edson Gomes Camargo, Takashi Katsumata, Hiromasa Goto, Naohiro Kuze, Yoshihiro KANGAWA, Koichi Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 9 )   092202-1 - 092202-6   2013.9

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    DOI: 10.7567/JJAP.52.092202

  • Theoretical Investigation of the Effect of Growth Orientation on Indium Incorporation Efficiency during InGaN Thin Film Growth by Metal-Organic Vapor Phase Epitaxy Reviewed International journal

    Tomoe Yayama, Yoshihiro KANGAWA, Koichi Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 8 )   08JC02-1 - 08JC02-3   2013.8

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    DOI: 10.7567/JJAP.52.08JC02

  • Numerical Analysis of the Dislocation Density in Multicrystalline Silicon for Solar Cells by the Vertical Bridgman Process Reviewed International journal

    Makoto Inoue, Satoshi Nakano, Hirofumi Harada, Yoshiji Miyamura, BING GAO, Yoshihiro KANGAWA, Koichi Kakimoto

    INTERNATIONAL JOURNAL OF PHOTOENERGY   706923   2013.6

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    DOI: 10.1155/2013/706923

  • Thermodynamic Analysis of Coherently Grown GaAsN/Ge: Effects of Different Gaseous Sources Reviewed International journal

    J. Kawano, Y. Kangawa, T. Yayama, K. Kakimoto, A. Koukitu

    JAPANESE JOURNAL OF APPLIED PHYSICS   52 ( 4 )   045601-1 - 045601-5   2013.4

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    DOI: 10.7567/JJAP.52.045601

  • First principles approach to C aggregation process during 0th graphene growth on SiC(0001) Reviewed International journal

    Masato Inoue, Hiroyuki Kageshima, Yoshihiro Kangawa, Koichi Kakimoto

    31st International Conference on the Physics of Semiconductors, ICPS 2012 Physics of Semiconductors - Proceedings of the 31st International Conference on the Physics of Semiconductors, ICPS 2012   1566   129 - 130   2013.1

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    DOI: 10.1063/1.4848319

  • N Substitution in GaAs(001) Surface under an Atmosphere of Hydrogen Reviewed International journal

    J. Kawano, Y. Kangawa, K. Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 10 )   10ND17-1 - 10ND17-4   2012.10

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  • First-principles calculation of 0th-layer graphene-like growth of C on SiC(0001) Reviewed International journal

    M. Inoue, H. Kageshima, Y. Kangawa, K. Kakimoto

    PHYSICAL REVIEW B   86 ( 8 )   085417-1 - 085417-7   2012.8

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    DOI: 10.1103/PhysRevB.86.085417

  • Thermodynamical analysis of polytype stability during PVT growth of SiC using 2D nucleation theory Reviewed International journal

    T. Shiramomo, B. Gao, F. Mercier, S. Nishizawa, Y. Kangawa, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   352 ( 1 )   2012.8

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    DOI: 10.1016/j.jcrysgro.2012.01.023

  • Molecular dynamics simulation of diffusion behavior of N atoms on the growth surface in GaN solution growth Reviewed International journal

    T. Kawamura, Y. Kangawa, K. Kakimoto, Y. Suzuki

    JOURNAL OF CRYSTAL GROWTH   351 ( 1 )   2012.7

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    DOI: 10.1016/j.jcrysgro.2012.04.022

  • Thermodynamic analysis of vapor-phase epitaxial growth of GaAsN on Ge Reviewed International journal

    J. Kawano, Y. Kangawa, T. Ito, K. Kakimoto, A. Koukitu

    JOURNAL OF CRYSTAL GROWTH   343 ( 1 )   2012.3

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    DOI: 10.1016/j.jcrysgro.2011.12.079

  • Investigation of GaN Solution Growth Processes on Ga- and N-Faces by Molecular Dynamics Simulation Reviewed International journal

    T. Kawamura, Y. Kangawa, K. Kakimoto, S. Kotake, Y. Suzuki

    JAPANESE JOURNAL OF APPLIED PHYSICS   51 ( 1 )   01AF06-1 - 01AF06-4   2012.1

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  • 固体原料を用いたAlN溶液成長法に関する研究 Invited Reviewed

    寒川 義裕, B. M. Eelbaum, 桑野範之, 柿本 浩一

    日本結晶成長学会誌   38   2011.12

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  • Thermodynamic analysis for the prediction of N composition in coherently grown GaAsN for a multi-junction solar cell Reviewed International journal

    Jun Kawano, Yoshihiro Kangawa, Tomoe Yayama, Tomonori Ito, Koichi Kakimoto, Akinori Koukitu

    37th IEEE Photovoltaic Specialists Conference, PVSC 2011, Program - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011   496 - 500   2011.12

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    DOI: 10.1109/PVSC.2011.6186002

  • Microstructure of Bulk AlN Grown by A New Solution Growth Method Reviewed International journal

    Y. Kangawa, N. Kuwano, B. M. Epelbaum, K. Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 12 )   120202-1 - 120202-3   2011.12

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    DOI: 10.1143/JJAP.50.120202

  • Novel Solution Growth Method of Bulk AlN Using Al and Li3N Solid Sources Reviewed International journal

    Yoshihiro KANGAWA, Ryutaro Toki, Tomoe Yayama, Boris M. Epelbaum, Koichi Kakimoto

    APPLIED PHYSICS EXPRESS   4 ( 9 )   095501-1 - 095501-3   2011.9

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    DOI: 10.1143/APEX.4.095501

  • Calculation of phase diagrams of the Li3N-Al system for AlN growth Reviewed International journal

    T. Yayama, Yoshihiro KANGAWA, Koichi Kakimoto

    PHYSICA STATUS SOLIDI C   8 ( 5 )   1581 - 1584   2011.5

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    DOI: 10.1002/pssc.201000888

  • Tight-Binding Approach to Initial Stage of the Graphitization Process on a Vicinal SiC Surface Reviewed International journal

    M. Inoue, Yoshihiro KANGAWA, K. Wakabayashi, H. Kageshima, Koichi Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   50 ( 3 )   038003-1 - 038003-2   2011.3

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  • 半導体バルク結晶成長における熱と物質の輸送と成長速度との関係 Invited Reviewed

    柿本浩一、Gao Bing、中野 智、寒川義裕

    日本結晶成長学会誌   38   2011.1

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  • GaAsN気相エピキタシーにおける混晶組成の理論的検討 Invited Reviewed

    川野 潤、寒川義裕、屋山 巴、伊藤智徳、柿本浩一、纐纈明伯

    日本結晶成長学会誌   38   2011.1

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  • Possibility of AlN growth using Li-Al-N solvent Reviewed International journal

    Y. Kangawa, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   312 ( 18 )   2010.9

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    DOI: 10.1016/j.jcrysgro.2010.04.014

  • Theoretical analyses of In incorporation and compositional instability in coherently grown InGaN thin films Reviewed International journal

    T. Yayama, Y. Kangawa, K. Kakimoto, A. Koukitu

    PHYSICA STATUS SOLIDI C   7 ( 7-8 )   2249 - 2251   2010.7

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    DOI: 10.1002/pssc.200983475

  • AlN synthesis on AlN/SiC template using Li-Al-N solvent Reviewed International journal

    Y. Kangawa, K. Kakimoto

    PHYSICA STATUS SOLIDI A   207 ( 6 )   2010.6

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    DOI: 10.1002/pssa.200983566

  • Distributions of light elements and their precipitations grown by unidirectional solidification method in multicrystalline silicon for solar cells Reviewed International journal

    H. Matsuo, S. Hisamatsu, Yoshihiro Kangawa, Koichi Kakimoto

    ISTC/CSTIC 2009 (CISTC), ECS Transactions - ISTC/CSTIC 2009 (CISTC)   18   1037 - 1042   2009.12

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    DOI: 10.1149/1.3096569

  • Heat and impurity transfer mechanisms of Czochralski and directional solidification processes Reviewed International journal

    Koichi Kakimoto, X. J. Chen, L. J. Liu, H. Miyazawa, H. Matsuo, S. Nakano, S. Hisamatsu, Yoshihiro Kangawa

    ISTC/CSTIC 2009 (CISTC), ECS Transactions - ISTC/CSTIC 2009 (CISTC)   925 - 933   2009.12

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    DOI: 10.1149/1.3096556

  • Numerical Analysis of mc-Si Crystal Growth Reviewed International journal

    K. Kakimoto, H. Matsuo, S. Hisamatsu, B. Ganesh, B. Gao, X. J. Chen, L. J. Liu, Y. Kangawa

    Solid State Phenomena   156-158   2009.10

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  • Method for Theoretical Prediction of Indium Composition in Coherently Grown InGaN Thin Films Reviewed International journal

    T. Yayama, Y. Kangawa, K. Kakimoto, A. Koukitu

    JAPANESE JOURNAL OF APPLIED PHYSICS   48 ( 8 )   088004 - 088005   2009.8

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    DOI: 10.1143/JJAP.48.088004

  • Influence of compositional changes of source materials on AlN synthesis using Li-Al-N solvent Reviewed International journal

    T. Nagano, Y. Kangawa, K. Kakimoto

    PHYSICA STATUS SOLIDI C   6   2009.6

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    DOI: 10.1002/pssc.200880908

  • Theoretical approach to structural stability of GaN: How to grow cubic GaN Reviewed International journal

    Yoshihiro Kangawa, T. Akiyama, T. Ito, K. Shiraishi, Koichi Kakimoto

    Journal of Crystal Growth   311 ( 10 )   3106 - 3109   2009.5

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    DOI: 10.1016/j.jcrysgro.2009.01.117

  • Possibility of AlN vapor phase epitaxy using Li(3)N as a nitrogen source Reviewed International journal

    Y. Kangawa, T. Nagano, K. Kakimoto

    PHYSICA STATUS SOLIDI C   6   2009.1

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    DOI: 10.1002/pssc.200880910

  • Numerical analysis of Mc-Si crystal growth Reviewed International journal

    Koichi Kakimoto, Hitoshi Matsuo, Syo Hisamatsu, Birava Ganesh, Gao Bing, X. J. Chen, Lijun Liu, Hiroaki Miyazawa, Yoshihiro Kangawa

    13th International Autumn Meeting - Gettering and Defect Engineering in Semiconductor Technology, GADEST 2009, Gettering and Defect Engineering in Semiconductor Technology XIII, GADEST 2009   193 - 198   2009.1

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    DOI: 10.4028/www.scientific.net/SSP.156-158.193

  • Monte Carlo simulation of atomic arrangement in InGaN thin film grown by MOVPE Reviewed International journal

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    JOURNAL OF CRYSTAL GROWTH   311 ( 3 )   2009.1

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    DOI: 10.1016/j.jcrysgro.2008.09.014

  • Distribution of Light Elements in Multicrystalline Silicon for Solar Cells Grown by Directional Solidification Reviewed International journal

    H. Matsuo, S. Hisamatsu, Y. Kangawa, K. Kakimoto

    JOURNAL OF THE ELECTROCHEMICAL SOCIETY   156 ( 9 )   2009.1

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    DOI: 10.1149/1.3155433

  • Thermal Conductivity of SiC Calculated by Molecular Dynamics Reviewed International journal

    T. Kawamura, D. Hori, Y. Kangawa, K. Kakimoto, M. Yoshimura, Y. Mori

    JAPANESE JOURNAL OF APPLIED PHYSICS   47 ( 12 )   8898 - 8901   2008.12

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    DOI: 10.1143/JJAP.47.8898

  • Thermodynamical analysis of oxygen incorporation from a quartz crucible during solidification of multicrystalline silicon for solar cell Reviewed International journal

    H. Matsuo, R. B. Ganesh, S. Nakano, L. J. Liu, Y. Kangawa, K. Arafune, Y. Oshita, M. Yamaguchi, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   310 ( 22 )   4666 - 4671   2008.11

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    DOI: 10.1016/j.jcrysgro.2008.08.045

  • Directional solidification of multicrystalline silicon using the accelerated crucible rotation technique Reviewed International journal

    R. B. Ganesh, H. Matsuo, Y. Kangawa, K. Arafune, Y. Ohshita, M. Yamaguchi, K. Kakimoto

    CRYSTAL GROWTH & DESIGN   8 ( 7 )   2008.7

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    DOI: 10.1021/cg800160g

  • Estimation of growth rate in unidirectionally solidified multicrystalline silicon by the growth-induced striation method Reviewed International journal

    R. B. Ganesh, H. Matsuo, T. Kawamura, Y. Kangawa, K. Arafune, Y. Ohshita, M. Yamaguchi, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   310 ( 11 )   2697 - 2701   2008.5

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    DOI: 10.1016/j.jcrysgro.2008.01.049

  • Synthesis of AlN from Li3N and Al: Application to vapor phase epitaxy Reviewed International journal

    T. Wakigawa, T. Nagano, Y. Kangawa, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   310 ( 11 )   2827 - 2831   2008.5

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    DOI: 10.1016/j.jcrysgro.2008.02.016

  • Investigation of the thermal conductivity of a fullerene peapod by molecular dynamics simulation Reviewed International journal

    T. Kawamura, Y. Kangawa, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   310 ( 7-9 )   2008.4

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    DOI: 10.1016/j.jcrysgro.2007.11.041

  • Global analysis of GaN growth using a solution technique Reviewed International journal

    D. Kashiwagi, R. Gejo, Y. Kangawa, L. J. Liu, F. Kawamura, Y. Mori, T. Sasaki, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   310 ( 7-9 )   2008.4

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    DOI: 10.1016/j.jcrysgro.2007.10.061

  • Numerical investigation of crystal growth process of bulk Si and nitrides - A review Invited Reviewed International journal

    Koichi Kakimoto, L. Liu, H. Miyazawa, S. Nakano, D. Kashiwagi, X. J. Chen, Yoshihiro Kangawa

    Crystal Research and Technology   42 ( 12 )   1185 - 1189   2007.12

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    DOI: 10.1002/crat.200711004

  • c-GaN分子線エピタキシーにおける成長初期過程の理論解析 Invited Reviewed

    寒川 義裕, 松尾有里子, 秋山亨, 伊藤智徳, 白石賢二, 柿本 浩一

    クリスタルレターズ   36   2007.9

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  • Possibility of AlN solution growth using Al and Li3N Reviewed International journal

    Y. Kangawa, T. Wakigawa, K. Kakimoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   46 ( 9A )   2007.9

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    DOI: 10.1143/JJAP.46.5785

  • Numerical study of the relationship between growth condition and atomic arrangement of InGaN Reviewed International journal

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    PHYSICA STATUS SOLIDI B   244 ( 6 )   2007.6

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    DOI: 10.1002/pssb.200674742

  • Molecular dynamics simulation of thermal conductivity of GaN/AlN quantum dot superlattices Reviewed International journal

    T. Kawamura, Y. Kangawa, K. Kakimoto

    Physica Status Solidi C   4 ( 7 )   2007.6

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    DOI: 10.1002/pssc.200674784

  • InGaN混晶半導体における原子配列の理論的検討 Invited Reviewed

    寒川義裕・柿本浩一・伊藤智徳・纐纈明伯

    応用物理   2007.5

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  • Ab initio-based approach on initial growth kinetics of GaN on GaN (001) Reviewed International journal

    Y. Kangawa, Y. Matsuo, T. Akiyama, T. Ito, K. Shiraishi, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   301   2007.4

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    DOI: 10.1016/j.jcrysgro.2006.11.110

  • Theoretical approach to initial growth kinetics of GaN on GaN(001) Reviewed International journal

    Y. Kangawa, Y. Matsuo, T. Akiyama, T. Ito, K. Shiraishi, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   300 ( 1 )   2007.3

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    DOI: 10.1016/j.jcrysgro.2006.10.203

  • Influence of hydrogen coverage on Si(1 1 1) substrate on the growth of GaN buffer layer Reviewed International journal

    Yuriko Matsuo, Yoshihiro Kangawa, Rie Togashi, Koichi Kakimoto, Akinori Koukitu

    Journal of Crystal Growth   300 ( 1 )   66 - 69   2007.3

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    DOI: 10.1016/j.jcrysgro.2006.10.204

  • Analysis of compositional instability of InGaN by Monte Carlo simulation Reviewed International journal

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    JOURNAL OF CRYSTAL GROWTH   298   2007.1

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    DOI: 10.1016/j.jcrysgro.2006.10.017

  • An investigation of thermal conductivity of nitride-semiconductor nanostructures by molecular dynamics simulation Reviewed International journal

    Takahiro Kawamura, Yoshihiro Kangawa, Koichi Kakimoto

    Journal of Crystal Growth   298 ( SPEC. ISS )   251 - 253   2007.1

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    DOI: 10.1016/j.jcrysgro.2006.10.025

  • Thermodynamic stability of In1-x-yGaxAlyN on GaN and InN Reviewed International journal

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    Physica Status Solidi C   3 ( 6 )   2006.6

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    DOI: 10.1002/pssc.200565106

  • Investigation of thermal conductivity of nitride mixed crystals and superlattices by molecular dynamics Reviewed International journal

    T. Kawamura, Y. Kangawa, K. Kakimoto

    Physica Status Solidi C   3 ( 6 )   2006.6

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    DOI: 10.1002/pssc.200565107

  • Growth of GaN directly on Si(111) substrate by controlling atomic configuration of Si surface by metalorganic vapor phase epitaxy Reviewed International journal

    K. Takemoto, H. Murakami, T. Iwamoto, Y. Matsuo, Y. Kangawa, Y. Kumagai, A. Koukitu

    JAPANESE JOURNAL OF APPLIED PHYSICS   45 ( 17-19 )   2006.5

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    DOI: 10.1143/JJAP.45.L478

  • Enhancement of the diffusion of oxygen and boron in silicon crystals under irradiation of infrared laser light Reviewed International journal

    L. J. Liu, K. Tanahashi, H. Yamada-Kaneta, Y. Kangawa, K. Kakimoto

    JOURNAL OF APPLIED PHYSICS   99 ( 7 )   073103-1 - 073103-4   2006.4

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    DOI: 10.1063/1.2189022

  • MBE growth of a novel chalcopyrite-type ternary compound MnGeP2 Reviewed International journal

    K. Sato, T. Ishibashi, K. Minami, H. Yuasa, J. Jogo, T. Nagatsuka, A. Mizusawa, Y. Kangawa, A. Koukitu

    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS   66 ( 11 )   2005.11

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    DOI: 10.1016/j.jpcs.2005.09.098

  • Investigation of thermal conductivity of GaN by molecular dynamics Reviewed International journal

    T. Kawamura, Y. Kangawa, K. Kakimoto

    JOURNAL OF CRYSTAL GROWTH   284 ( 1-2 )   197 - 202   2005.10

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    DOI: 10.1016/j.jcrysgro.2005.07.018

  • Thermodynamic analysis of AlGaN HVPE growth Reviewed International journal

    Akinori Koukitu, Jun Kikuchi, Yoshihiro Kangawa, Yoshinao Kumagai

    The Internbational Workshop on Bulk Nitride Semiconductors III Journal of Crystal Growth   281 ( 1 )   47 - 54   2005.7

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    DOI: 10.1016/j.jcrysgro.2005.03.010

  • Growth of MnGeP2 thin films by molecular beam epitaxy Reviewed International journal

    Kazuyuki Minami, Jumpei Jogo, Valery Smirnov, Hideki Yuasa, Toshikazu Nagatsuka, Takayuki Ishibashi, Yoshitaka Morishita, Yuriko Matsuo, Yoshihiro Kangawa, Akinori Koukitu, Katsuaki Sato

    Japanese Journal of Applied Physics, Part 2: Letters   44 ( 8-11 )   L265 - L267   2005.6

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    DOI: 10.1143/JJAP.44.L265

  • MnGeP2 thin films grown by molecular beam epitaxy Reviewed International journal

    T. Ishibashi, K. Minami, J. Jogo, T. Nagatsuka, H. Yuasa, V. Smirnov, Y. Kangawa, A. Koukitu, K. Sato

    JOURNAL OF SUPERCONDUCTIVITY   18 ( 1 )   2005.2

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    DOI: 10.1007/s10948-005-2154-8

  • GaN growth process using GaP(111)A and (111)B surfaces as an initial substrate Reviewed International journal

    Y. Matsuo, N. Kawaguchi, M. Fujino, Y. Kangawa, Y. Kumagai, T. Irisawa, A. Koukitu

    JOURNAL OF CRYSTAL GROWTH   275 ( 1-2 )   2005.2

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    DOI: 10.1016/j.jcrysgro.2004.11.215

  • Impact of crystallization manner of the buffer layer on the crystalline quality of GaN epitaxial layers on GaAs (111)A substrate Reviewed International journal

    H. Murakami, N. Kawaguchi, Y. Kangawa, Y. Kumagai, A. Koukitu

    JOURNAL OF CRYSTAL GROWTH   275 ( 1-2 )   2005.2

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    DOI: 10.1016/j.jcrysgro.2004.11.197

  • 化合物半導体気相成長の熱力学 Reviewed

    纐纈 明伯、寒川 義裕、熊谷 義直、関 壽

    応用物理   2005.1

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  • Growth of thick AlN layer on sapphire (0001) substrate using hydride vapor phase epitaxy Reviewed International journal

    T. Yamane, H. Murakami, Y. Kangawa, Y. Kumagai, A. Koukitu

    Physica Status Solidi C   2 ( 7 )   2005.1

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    DOI: 10.1002/pssc.200461551

  • Growth and characterization of thick GaN layers with high Fe doping Reviewed International journal

    Y. Kumagai, H. Murakami, Y. Kangawa, A. Koukitu

    Physica Status Solidi C   2 ( 7 )   2005.1

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    DOI: 10.1002/pssc.200461410

  • Influence of laser power on crystalline quality of InGaN with high indium content grown by pulse laser-assisted MOVPE Reviewed International journal

    Yoshihiro Kangawa, Norihito Kawaguchi, Yoshinao Kumagai, Akinori Koukitu

    Journal of Crystal Growth   272 ( 1-4 SPEC. ISS. )   444 - 448   2004.12

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    DOI: 10.1016/j.jcrysgro.2004.08.095

  • Thermodynamic analysis of InN and InxGa1-xN MOVPE using various nitrogen sources Reviewed International journal

    Yoshinao Kumagai, Jun Kikuchi, Yuriko Matsuo, Yoshihiro Kangawa, Ken Tanaka, Akinori Koukitu

    Journal of Crystal Growth   272 ( 1-4 SPEC. ISS. )   341 - 347   2004.12

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    DOI: 10.1016/j.jcrysgro.2004.08.090

  • Systematic theoretical investigations of adsorption behavior on the GaAs(0 0 l)-c(4 × 4) surfaces Reviewed International journal

    237 ( 1-4 )   194 - 199   2004.10

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    DOI: 10.1016/j.apsusc.2004.06.125

  • Theoretical investigations of adatom behavior on non-planar surfaces with GaAs(n 1 1)A Reviewed International journal

    Koichi Asano, Yoshihiro Kangawa, Hirotoshi Ishizaki, Toru Akiyama, Kohji Nakamura, Tomononori Ito

    Applied Surface Science   237 ( 1-4 )   206 - 212   2004.10

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    DOI: 10.1016/j.apsusc.2004.06.126

  • Pulse laser assisted MOVPE for InGaN with high indium content Reviewed International journal

    Norihito Kawaguchi, Ken Nosuke Hida, Yoshihiro Kangawa, Yoshinao Kumagai, Akinori Koukitu

    Physica Status Solidi (A) Applied Research   201 ( 12 )   2846 - 2849   2004.9

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    DOI: 10.1002/pssa.200405067

  • Study of pulse laser assisted metalorganic vapor phase epitaxy of InGaN with large indium mole fraction Reviewed International journal

    Yoshihiro Kangawa, Norihito Kawaguchi, Ken Nosuke Hida, Yoshinao Kumagai, Akinori Koukitu

    Japanese Journal of Applied Physics, Part 2: Letters   43 ( 8A )   L1026 - L1028   2004.8

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    DOI: 10.1143/JJAP.43.L1026

  • Trade-off between thickness and temperature ramping rate of GaN buffer layer studied for high quality GaN growth on GaAs (1 1 1)A substrate Reviewed International journal

    Hisashi Murakami, Yoshihiro Kangawa, Yoshinao Kumagai, Akinori Koukitu

    Journal of Crystal Growth   268 ( 1-2 )   1 - 7   2004.7

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    DOI: 10.1016/j.jcrysgro.2004.04.107

  • IV族混晶半導体の熱力学的安定性 Reviewed

    伊藤智徳、寒川義裕

    日本結晶成長学会誌   2004.1

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  • Hydride vapor phase epitaxy of AlN: Thermodynamic analysis of aluminum source and its application to growth Reviewed International journal

    Y. Kumagai, T. Yamane, T. Miyaji, H. Murakami, Yoshihiro Kangawa, A. Koukitu

    5th International Conference on Nitride Semiconductors, ICNS 2003, Physica Status Solidi C: Conferences   ( 7 )   2498 - 2501   2003.12

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    DOI: 10.1002/pssc.200303360

  • Superlattice stacking structure in InGaN thin film pseudomorphic to GaN (0001) substrate: Semigrand canonical Monte Carlo simulation Reviewed International journal

    Atsushi Mori, Tomonori Ito, Yoshihiro Kangawa, Akinori Koukitu

    5th International Conference on Nitride Semiconductors, ICNS 2003, Physica Status Solidi C: Conferences   ( 7 )   2486 - 2489   2003.12

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    DOI: 10.1002/pssc.200303347

  • Influence of lattice constraint from InN and GaN substrate on relationship between input mole ratio and solid composition of InGaN during MOVPE Reviewed International journal

    Yoshihiro Kangawa, T. Ito, Y. Kumagai, A. Koukitu

    5th International Conference on Nitride Semiconductors, ICNS 2003 Physica Status Solidi C: Conferences   ( 7 )   2575 - 2579   2003.12

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    DOI: 10.1002/pssc.200303538

  • Improvements in crystalline quality of thick GaN layers on GaAs (111)A by periodic insertion of low-temperature GaN buffer layers Reviewed International journal

    H. Murakami, N. Kawaguchi, Yoshihiro Kangawa, Y. Kumagai, A. Koukitu

    5th International Conference on Nitride Semiconductors, ICNS 2003 Physica Status Solidi C: Conferences   ( 7 )   2141 - 2144   2003.12

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    DOI: 10.1002/pssc.200303503

  • An empirical potential approach to structural stability of GaNxAs<>sub1-x#DR Reviewed International journal

    Takashi Suda, Yoshihiro Kangawa, Kohji Nakamura, Tomonori Ito

    Journal of Crystal Growth   258 ( 3-4 )   277 - 282   2003.11

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    DOI: 10.1016/S0022-0248(03)01556-2

  • Semigrand canonical Monte Carlo simulation with the Gibbs-Duhem integration technique: Formulation for alloy phase diagrams and attempt on InxGa1-xN/GaN Reviewed International journal

    A. Mori, B. B. Laird, Yoshihiro Kangawa, T. Ito, A. Koukitu

    Russian Journal of Physical Chemistry A   77 ( SUPPL. 1 )   S21   2003.7

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  • Effect of Ni-Cu substrates on phase selection of hexagonal and cubic boron nitride thin films Reviewed International journal

    Shigeo Kotake, Takaya Hasegawa, Kazutaka Kamiya, Yasuyuki Suzuki, Takami Masui, Yoshihiro Kangawa, Kohji Nakamura, Tomonori Ito

    Applied Surface Science   216 ( 1-4 SPEC. )   72 - 77   2003.6

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    DOI: 10.1016/S0169-4332(03)00514-2

  • Thermodynamic study on compositional instability of InGaN/GaN and InGaN/InN during MBE Reviewed International journal

    Yoshihiro Kangawa, Tomonori Ito, Yoshinao Kumagai, Akinori Koukitu

    Applied Surface Science   216 ( 1-4 SPEC. )   453 - 457   2003.6

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    DOI: 10.1016/S0169-4332(03)00396-9

  • Systematic theoretical investigations of miscibility in Si1-x-yGexCy thin films Reviewed International journal

    Tomonori Ito, Kohji Nakamura, Yoshihiro Kangawa, Kenji Shiraishi, Akihito Taguchi, Hiroyuki Kageshima

    Applied Surface Science   216 ( 1-4 SPEC. )   458 - 462   2003.6

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    DOI: 10.1016/S0169-4332(03)00398-2

  • High temperature ramping rate for GaAs (111)A substrate covered with a thin GaN buffer layer for thick GaN growth at 1000°C Reviewed International journal

    42 ( 5B )   L526 - L528   2003.5

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  • Theoretical investigation of arsenic desorption from GaAs(001) surfaces under an atmosphere of hydrogen Reviewed International journal

    Yuriko Matsuo, Yoshihiro Kangawa, Yoshinao Kumagai, Toshiharu Irisawa, Akinori Koukitu

    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes   42 ( 5 A )   2578 - 2581   2003.5

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  • Semigrand canonical Monte Carlo simulation with Gibbs-Duhem integration technique for alloy phase diagrams Reviewed International journal

    Atsushi Mori, Brian B. Laird, Yoshihiro Kangawa, Tomonori Ito, Akinori Koukitu

    Materials Physics and Mechanics   6 ( 1 )   49 - 57   2003.3

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  • Influence of lattice constraint from InN and GaN substrate on relationship between solid composition of InxGa1-xN film and input mole ratio during molecular beam epitaxy Reviewed International journal

    Yoshihiro Kangawa, Tomonori Ito, Yoshinao Kumagai, Akinori Koukitu, Norihito Kawaguchi

    Japanese Journal of Applied Physics, Part 2: Letters   42 ( 2 A )   L95 - L98   2003.2

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    DOI: 10.1143/JJAP.42.L95

  • GaAs表面構造の安定性に対する量子論的アプローチ Invited Reviewed

    寒川義裕,伊藤智徳,白石賢二,大鉢忠,纐纈明伯

    表面科学   2003.1

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  • Improvements in crystalline quality of thick GaN layers on GaAs(111)A by periodic insertion of low-temperature GaN buffer layers Reviewed International journal

    H. Murakami, N. Kawaguchi, Y. Kangawa, Y. Kumagai and A. Koukitu

    Phys. Stat. Sol. (c)   2003.1

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  • Influence of lattice constraint from InN and GaN substrate on relationship between input mole ratio and solid composition of InGaN during MOVPE Reviewed International journal

    Y. Kangawa, T. Ito, Y. Kumagai and A. Koukitu

    Phys. Stat. Sol. (c)   2003.1

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  • InGaN気相成長における気相-固相関係に対する基板拘束の影響 Reviewed

    寒川義裕,伊藤智徳,熊谷義直,纐纈明伯

    日本結晶成長学会誌   2003.1

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  • Theoretical approach to influence of As2 pressure on GaAs growth kinetics Reviewed International journal

    Yoshihiro Kangawa, T. Ito, Y. S. Hiraoka, A. Taguchi, K. Shiraishi, T. Ohachi

    Surface Science   507-510   285 - 289   2002.6

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    DOI: 10.1016/S0039-6028(02)01259-1

  • Monte Carlo simulation for temperature dependence of Ga diffusion length on GaAs(0 0 1) Reviewed International journal

    Yoshihiro Kangawa, T. Ito, A. Taguchi, K. Shiraishi, T. Irisawa, T. Ohachi

    Applied Surface Science   190 ( 1-4 )   517 - 520   2002.5

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    DOI: 10.1016/S0169-4332(01)00930-8

  • An empirical potential approach to wurtzite-zinc blende structural stability of semiconductors Reviewed International journal

    Tomonori Ito, Yoshihiro Kangawa

    Journal of Crystal Growth   235 ( 1-4 )   149 - 153   2002.2

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    DOI: 10.1016/S0022-0248(01)01902-9

  • Empirical interatomic potential calculations for relative stability of Ga adatom on GaAs(1 0 0) and (n11)A surfaces Reviewed International journal

    Yoshihiro Kangawa, T. Ito, A. Taguchi, K. Shiraishi, T. Ohachi

    Journal of Crystal Growth   237-239 ( 1 4 I )   223 - 226   2002.1

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    DOI: 10.1016/S0022-0248(01)01910-8

  • Theoretical investigations of thermodynamic stability for Si1-x-yGexCy Reviewed International journal

    Tomonori Ito, Yoshihiro Kangawa

    Journal of Crystal Growth   237-239 ( 1 4I )   116 - 120   2002.1

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    DOI: 10.1016/S0022-0248(01)01867-X

  • A new theoretical approach to adsorption-desorption behavior of Ga on GaAs surfaces Reviewed International journal

    Yoshihiro Kangawa, T. Ito, A. Taguchi, K. Shiraishi, T. Ohachi

    Surface Science   493 ( 1-3 )   178 - 181   2001.11

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    DOI: 10.1016/S0039-6028(01)01210-9

  • Theoretical investigations of adatom adsorptions on the As-stabilized GaAs(1 1 1)A surface Reviewed International journal

    A. Taguchi, K. Shiraishi, T. Ito, Yoshihiro Kangawa

    Surface Science   493 ( 1-3 )   173 - 177   2001.11

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    DOI: 10.1016/S0039-6028(01)01209-2

  • Formation mechanism of Al-segregated region in InAlAs/(110)InP Reviewed International journal

    Y. Kangawa, K. Wakizono, N. Kuwano, K. Oki, T. Ito

    J. Cryst. Growth   229 ( 1 )   164 - 168   2001.1

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    DOI: 10.1016/S0022-0248(01)01113-7

  • Empirical Interatomic potential calculation for compositional instability of III-V nitride alloys in lattice mismatch systems Reviewed International journal

    Y. Kangawa, T. Ito, A. Mori, A. Koukitu

    Proc. Int. Workshop on Nitride Semiconductors   2000.1

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  • Anomalous behavior of excess energy curves of InxGa1-xN grown on GaN and InN Reviewed International journal

    Yoshihiro Kangawa, T. Ito, A. Mori, A. Koukitu

    Journal of Crystal Growth   220 ( 4 )   401 - 404   2000.1

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    DOI: 10.1016/S0022-0248(00)00845-9

  • Numerical calculation with empirical interatomic potential for formation mechanism of CuAu-I type ordered structure in InGaAs/(110)InP Reviewed International journal

    Y. Kangawa, N. Kuwano, K. Oki, T. Ito

    Appl. Surf. Sci.   159   368 - 373   2000.1

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    DOI: 10.1016/S0169-4332(00)00109-4

  • A new empirical interatomic potential for compound semiconductors and its application to thermodynamic stability Reviewed International journal

    Y. Kangawa and T. Ito

    Proc. 27th International Symposium on Compound Semiconductors   2000.1

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  • 原子間ポテンシャルを用いたInGaAs/(110)InP混晶中に出現するCuAu-I型規則構造形成機構の理論的解析 Reviewed

    寒川義裕、桑野範之、沖憲典、伊藤智徳

    日本金属学会誌   1999.1

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  • Theoretical investigation for the formation mechanism of CuAu-I type ordered structure in InGaAs/(110)InP alloy semiconductor using an empirical interatomic potential Reviewed

    Yoshihiro Kangawa, Noriyuki Kuwano, Kensuke Oki, Tomonori Ito

    63 ( 6 )   741 - 746   1999.1

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    DOI: 10.2320/jinstmet1952.63.6_741

  • Formation mechanism of antiphase boundary structure in molecular beam epitaxy grown InGaAs/(110)InP Reviewed International journal

    Y. Kangawa, N. Kuwano, K. Oki

    Jpn. J. Appl. Phys.   38 ( 1A )   40 - 41   1999.1

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    DOI: 10.1143/JJAP.38.40

  • Numerical calculation with empirical interatomic potential for ordering mechanism of InGaAs/(110)InP Reviewed International journal

    Y. Kangawa, M. Suenaga, N. Kuwano, K. Oki

    661 - 664   1999.1

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Books

  • Epitaxial Growth of III-Nitride Compounds: Computational Approach

    T. Matsuoka, @Y. Kangawa( Role: Edit)

    Springer  2018.5 

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    Language:English   Book type:Scholarly book

    DOI: 10.1007/978-3-319-76641-6

  • Ab initio-Based Approach to Crystal Growth Chemical Potential Analysis

    Tomonori Ito, Yoshihiro Kangawa( Role: Joint author)

    Elsevier Inc.  2014.12 

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    Responsible for pages:1, 477-520   Language:English   Book type:Scholarly book

    DOI: 10.1016/B978-0-444-56369-9.00011-3

  • Atomic Structures and Electronic Properties of Semiconductor Interfaces

    Takashi Nakayama, Yoshihiro Kangawa, Kenji Shiraishi( Role: Joint author)

    Elsevier Inc.  2011.1 

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    Responsible for pages:1, 113-174   Language:English   Book type:Scholarly book

  • Thermodynamic approach to InN epitaxy

    Yoshihiro Kangawa( Role: Sole author)

    Springer Verlag  2018.1 

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    Responsible for pages:95-108   Language:English   Book type:Scholarly book

    DOI: 10.1007/978-3-319-76641-6_5

  • Atomic arrangement and In composition in InGaN quantum wells

    Yoshihiro Kangawa( Role: Sole author)

    Springer Verlag  2018.1 

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    Responsible for pages:109-124   Language:English   Book type:Scholarly book

    DOI: 10.1007/978-3-319-76641-6_6

  • 第3編、第3章; 固体ソース溶液成長法~AlN単結晶成膜を事例として~

    寒川 義裕( Role: Joint author)

    (株)NTS  2013.6 

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    Responsible for pages:ポストシリコン半導体 -ナノ成膜ダイナミクスと基板・界面効果-, pp. 379-390   Language:Japanese   Book type:Scholarly book

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Presentations

  • 成長表面・界面の動的挙動と原子スケールシミュレーション2024 Invited

    寒川義裕

    10th CIRFE symposium  2024.9  名古屋大学CIRFE

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    Event date: 2024.9

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:名古屋   Country:Japan  

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  • 半導体化学気相成長のプロセスモデリング Invited

    寒川義裕

    日本金属学会九州支部 日本鉄鋼協会九州支部 2024年度春季講演会(湯川記念講演会)  2024.4 

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    Event date: 2024.4

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:オンライン   Country:Japan  

  • GaN MOCVDにおけるプロセスインフォマティクスの進展 Invited

    寒川義裕

    化学工学会CVD反応分科会第37回シンポジウム「CVDと薄膜の計算科学」  2023.3 

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    Event date: 2023.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京 / Online   Country:Japan  

    本講演では、窒化ガリウム有機金属化学気相成長(MOCVD)のプロセスインフォマティクスにおけるシミュレーション技術(デジタルツイン)の進展について、最近の研究事例を用いて詳細に解説する。

  • Process Informatics − 半導体化学気相成長の科学 Invited

    寒川義裕

    学習院桜友会寄付講座(生命情報社会学)シンポジウム X–informatics 〜巡り会うデータサイエンス〜  2023.2 

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    Event date: 2023.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:学習院大学 / Online   Country:Japan  

    本講演では、半導体化学気相成長のプロセス探索に関する最近の進展について、一般市民向けにわかりやすく紹介する。

  • 窒化物半導体プロセスインフォマティクスの開拓 Invited

    寒川義裕

    日本材料学会 ナノ材料部門委員会・ 半導体エレクトロニクス部門委員会 合同研究会  2022.11 

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    Event date: 2022.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:京都大学(ハイブリッド)   Country:Japan  

    半導体テクノロジーの根幹を成す化学気相成⻑は、①気相反応、②表⾯プロセス、③固相拡散が絡み合う複雑系であり、プロセス・インフォマティクスの核⼼となるシミュレーション技術は未だ確⽴されていない。本講演では、化学気相成長条件(説明変数)から残留不純物濃度(⽬的変数)をダイレクトに計算予測するシミュレーション技術(量⼦⼒学と統計熱⼒学に⽴脚したマルチフィジックス結晶成⻑シミュレーション技術)を紹介する。また、データ同化により①気相反応の速度定数をチューニングした事例、ベイズ最適化により②⼤規模表⾯再構成モデルを構築した事例を紹介する。

  • 半導体材料開発の新機軸~プロセス・インフォマティクス~ Invited

    @寒川義裕

    ワイドギャップ半導体学会第8回研究会  2022.10 

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    Event date: 2022.10

    Language:Japanese  

    Venue:名古屋   Country:Japan  

    近年のプロセス・インフォマティクス技術の開発状況を外観し、最近の研究事例:省エネルギー次世代半導体デバイス(GaNパワーデバイス)開発を目的とした適用事例を紹介する。

  • 第一原理計算によるGaN の極性反転界面構造の解析

    河村貴宏, 秋山亨, 三宅秀人, 寒川義裕, 池田和久, 谷川智之

    第85回応用物理学会秋季学術講演会  2024.9 

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    Event date: 2024.9

    Language:Japanese  

    Venue:新潟   Country:Japan  

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  • Determination of Local Electron Counting Rule Satisfaction by SAT Solver International conference

    Akira Kusaba, Tetsuji Kuboyama, Yoshihiro Kangawa

    The 9th Asian Conference on Crystal Growth and Crystal Technology (CGCT-9)  2024.6 

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    Event date: 2024.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • 結晶成長プロセスインフォマティクス Invited

    寒川義裕

    第7回結晶成⻑基礎セミナー: 化合物半導体のエピタキシャル成⻑〜基礎理論から産業分野への展開  2024.6 

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    Event date: 2024.6

    Language:Japanese  

    Venue:大阪大学   Country:Japan  

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  • KPZカイネティック・ラフニングとしての2次元多数核成長

    阿久津典子, 寒川義裕

    第16回ナノ構造・エピタキシャル成長講演会  2024.5 

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    Event date: 2024.5 - 2024.6

    Language:Japanese  

    Venue:高知   Country:Japan  

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  • Electronic structures of κ Ga2O3/Al2O3 superlattices International conference

    2024.4 

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    Event date: 2024.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  • Vacancies in III-Nitrides (II): Diffusion near Hetero Interfaces International conference

    R. Shimauchi, Y. Kangawa, A. Kusaba

    10th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA 2024)  2024.4 

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    Event date: 2024.4

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Vacancies in III-Nitrides (I): Formation under Reconstructed Surfaces International conference

    K. Tateyama, Y. Kangawa, A. Kusaba, T. Kawamura

    10th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA 2024)  2024.4 

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    Event date: 2024.4

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • First-Principles Calculations of Bandgap Control of κ-Ga2O3 by Uniaxial Strain International conference

    2024.4 

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    Event date: 2024.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  • 窒化ガリウム中におけるVGa-VN周りの欠陥反応解析

    中村城太、小田将人、寒川義裕

    第71回応用物理学会春季学術講演会  2024.3 

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    Event date: 2024.3

    Language:Japanese  

    Venue:東京都市大学   Country:Japan  

  • 化学気相成長におけるプロセスインフォマティクス〜現状と将来展望〜 Invited

    寒川義裕

    (独)日本学術振興会 R031ハイブリッド量子ナノ技術委員会第15回研究会(特別企画)「AIと科学技術・社会」  2024.3 

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    Event date: 2024.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京大学   Country:Japan  

    半導体テクノロジーの根幹である化学気相成長(CVD)は、①気相反応、②表面反応、③固相拡散の素過程が絡み合う複雑系である。本研究では、CVDプロセスをそのまま丸ごと仮想空間に再現する技術(eXtensible Simulator Suite for Chemical Vapor Deposition: eXS2-CVD)の開発を行っている。本講演では、人工知能を活用した材料開発(プロセスインフォマティクス)の核心となるeXS2-CVDについて、その現状と将来展望を紹介する。

  • III族窒化物MOVPEにおける表面再構成と点欠陥安定性の相関解析 Invited

    寒川義裕

    一般社団法人GaNコンソーシアム2023年度結晶・評価WG研究会(第1回)  2023.12 

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    Event date: 2023.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  • Ab initio thermodynamic study of the metallic surface wetting layer during MBE (In)GaN growth and its consequences for dopants incorporation International conference

    Pawel Kempisty, Karol Kawka, Akira Kusaba, Yoshihiro Kangawa

    The 14th International Conference on Nitride Semiconductors  2023.11 

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    Event date: 2023.11

    Language:English  

    Country:Japan  

  • Computational investigation of GaN growth for power electronics applications International conference

    Kana Ishisone, Mauro Boero, Kieu My Bui, Atsushi Oshiyama, Yoshihiro Kangawa, Kenji Shiraishi

    The 14th International Conference on Nitride Semiconductors  2023.11 

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    Event date: 2023.11

    Language:English  

    Country:Japan  

  • Adiabatic potential for conformational change of VGa-VN complex defects in GaN International conference

    Jota Nakamura, Masato Oda, Yoshihiro Kangawa

    The 14th International Conference on Nitride Semiconductors  2023.11 

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    Event date: 2023.11

    Language:English  

    Country:Japan  

  • First-principles calculations on the decomposition reaction pathway of trimethylindium in InN MOVPE International conference

    Yuya Nagashima, Hirotaka Watanabe, Syugo Nitta, Akira Kusaba, Yoshihiro Kangawa, Kenji Shiraishi

    The 14th International Conference on Nitride Semiconductors  2023.11 

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    Event date: 2023.11

    Language:English  

    Country:Japan  

  • A numerical study of UV AlGaN heterostructures with polarization doping International conference

    Konrad Sakowski, Ashfaq Ahmad, Pawel Strak, Pawel Kempisty, Yoshihiro Kangawa, Jacek Piechota, Stanislaw Krukowski

    The 14th International Conference on Nitride Semiconductors  2023.11 

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    Event date: 2023.11

    Language:English  

    Country:Japan  

  • Correlation between Surface Reconstruction and Impurity Incorporation in III-Nitride MOCVD: Surface Phase Diagram

    K. Tateyama, F. Kihara, A. Kusaba, Y. Kangawa, T. Kawamura

    The 42nd Electronic Materials Symposium (EMS-42)  2023.10 

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    Event date: 2023.10

    Language:Japanese  

    Country:Japan  

  • First-principles calculation of band structure of alpha-Ga2O3/Al2O3 superlattices International conference

    T. Kawamura, T. Akiyama, Y. Kangawa

    The 20th International Conference on Crystal Growth and Epitaxy  2023.7 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Italy  

  • Theoretical exploration of widegap materials with the corundum structure for heteroepitaxy on alpha−Ga2O3 International conference

    2023.7 

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    Event date: 2023.7 - 2023.8

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Naples   Country:Italy  

  • スパッタAlN膜の高温アニールプロセスにおけるスパースモデリング

    原太一、草場彰、寒川義裕、三宅秀人

    第15回ナノ構造エピタキシャル成長講演会  2023.6 

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    Event date: 2023.6

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:山形   Country:Japan  

  • Numerical simulations of AlGaN heterostructures with polarization-doping

    Konrad Sakowski, Ashfaq Ahmad, Pawel Strak, Kosuke Sato, Kazuki Yamada, Motoaki Iwaya, Pawel Kempisty, Yoshihiro Kangawa, Jacek Piechota, Stanislaw Krukowski

    The 6th International Workshop on Ultraviolet Materials and Devices  2023.6 

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    Event date: 2023.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:France  

  • Modelling interlayer diffusion in III-nitride hetero interface

    #Koyo Miyamoto, @Akira Kusaba, @Yoshihiro Kangawa

    41st Electronic Materials Symposium  2022.10 

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    Event date: 2022.10

    Language:Japanese  

    Country:Japan  

  • Ab Initio Studies on TMA and TMI Decomposition during MOVPE Growth

    Yuya Nagashima, Daichi Akaishi, Shugo Nitta, Akira Kusaba, Yoshihiro Kangawa, Kenji Shiraishi

    41st Electronic Materials Symposium  2022.10 

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    Event date: 2022.10

    Language:Japanese  

    Country:Japan  

  • Growth Simulation of GaN MOVPE Based on Rate Equation Analysis

    Masaki Sano, Yuya Nagashima, Akira Kusaba, Yoshihiro Kangawa, Kenji Shiraishi

    41st Electronic Materials Symposium  2022.10 

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    Event date: 2022.10

    Language:Japanese  

    Country:Japan  

  • Estimation of optimal conditions for semiconductor nanowires by MBE growth using machine learning

    Taichi Hara, Yuichiro Maeda, Akira Kusaba, Yoshihiro Kangawa, Fumitaro Ishikawa, Tetsuya Okuyama

    41st Electronic Materials Symposium  2022.10 

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    Event date: 2022.10

    Language:Japanese  

    Country:Japan  

  • Tuning of ab-initio reaction rate in GaN metal-organic vapor phase epitaxy by Multiobjective Genetic Algorithm with High-Resolution Mass Spectrometry Data International conference

    A. Kusaba, Z. Ye, S. Nitta, K. Shiraishi, T. Kuboyama, Y. Kangawa

    International Workshop on Nitride Semiconductors (IWN 2022)  2022.10 

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    Event date: 2022.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • Polarization-doping of AlGaN laser diodes in numerical simulations International conference

    Konrad Sakowski, Kosuke Sato, Kazuki Yamada, Pawel Kempisty, Motoaki Iwaya, Pawel Strak, Yoshihiro Kangawa, Grzegorz Muziol, Jacek Piechota, Stanislaw Krukowski

    European Materials Research Society, 2022 Fall Meeting  2022.9 

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    Event date: 2022.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Innovations in the materials development process: process informatics Invited International conference

    Yoshihiro Kangawa

    Campus Asia EEST 2022 Summer School  2022.8 

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    Event date: 2022.8

    Language:English   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Country:Korea, Republic of  

  • p型GaNのHVPE成長におけるH₂キャリアガス導入の影響

    @長嶋佑哉、@木村友哉、@洗平昌晃、@長川健太、草場彰、寒川義裕、@白石賢二

    第69回応用物理学会春季学術講演会  2022.3 

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    Event date: 2022.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京/オンライン   Country:Japan  

  • 窒化物半導体エピタキシーにおける不純物混入機構の理論解析 Invited

    寒川義裕

    第35期コンピュータによる材料開発・物質設計を考える会(Computer aided Materials and Moleculer Desgin Forum: CAMM)フォーラム本例会  2022.2 

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    Event date: 2022.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • First-principles calculation of optical properties of III-V nitride semiconductors Invited International conference

    Takahiro Kawamura, Kouhei Basaki, Satoshi Ohata, Toru Akiyama, and Yoshihiro Kangawa

    IWSingularity 2022 / ISWGPDs 2022  2022.1 

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    Event date: 2022.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Computics driven methods and applications to innovative materials for next-generation devices Invited International conference

    Mauro Boero, Kana Ishisone, Kieu My Bui, Atsushi Oshiyama, Yoshihiro Kangawa, Kenji Shiraishi

    IWSingularity 2022 / ISWGPDs 2022  2022.1 

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    Event date: 2022.1

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  • 窒化物半導体ヘテロ界面における相互拡散メカニズムの理論検討

    #宮本滉庸、草場彰、寒川義裕

    第13回ナノ構造エピタキシャル成長講演会  2021.12 

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    Event date: 2021.12

    Language:Japanese  

    Venue:松山/オンライン   Country:Japan  

  • 窒化物半導体の薄膜成長におけるプロセスインフォマティクス Invited

    寒川義裕

    第26回結晶工学セミナー、第3回インフォマティクス応用研究グループ研究会「結晶工学×インフォマティクス」  2021.11 

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    Event date: 2021.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 窒化物半導体の薄膜成長におけるプロセスインフォマティクス Invited

    寒川義裕

    結晶工学×インフォマティクスセミナー(第26回結晶工学セミナー、第3回インフォマティクス応用研究グループ研究会)  2021.11 

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    Event date: 2021.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Tuning of Reaction Rate Constants for Trimethylgallium Decomposition by Multiobjective Genetic Algorithm with High-Resolution Mass Spectrometry Data International conference

    A. Kusaba, Y. Kangawa, Z. Ye, S. Nitta, K. Shiraishi

    International Conference on Materials and Systems for Sustainability 2021 (ICMaSS 2021)  2021.11 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Theoretical approach to unintentional oxygen doping during MOVPE of GaN:Mg and AlN:Mg International conference

    Y. Kangawa, A. Kusaba, P. Kempisty

    International Conference on Materials and Systems for Sustainability 2021 (ICMaSS 2021)  2021.11 

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    Event date: 2021.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 結晶成長デジタルツイン―AIと計算科学からのアプローチ Invited

    草場彰、久保山哲二、寒川義裕

    第50回結晶成長国内会議  2021.10 

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    Event date: 2021.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • プロセス・インフォマティクスの新機軸:窒化物半導体MOVPEにおける取り組み Invited

    寒川義裕

    日本学術振興会R032委員会第2回研究会  2021.8 

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    Event date: 2021.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • First-principles study of Mg and O co-doping mechanism in the growth surface during GaN(0001) and AlN(0001) metalorganic vapor phase epitaxy International conference

    A. Kusaba, P. Kempisty, Y. Kangawa

    32nd IUPAP Conference on Computational Physics (CCP 2021)  2021.8 

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    Event date: 2021.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:United Kingdom  

  • Surface coverage of impurities during GaN and AlN MOVPE International conference

    Daichi Yosho, Yoshihiro Kangawa

    13th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials / 14th International Conference on Plasma-Nano Technology & Science  2021.3 

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    Event date: 2021.3

    Language:English  

    Country:Japan  

  • Impurity incorporation mechanism in GaN MOVPE: ab initio-based approach Invited International conference

    Yoshihiro Kangawa

    SPIE Photonic West OPTO  2021.3 

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    Event date: 2021.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • Quantitative compatibility of ab initio thermodynamics with real growth processes of III nitrides semiconductors Invited International conference

    Pawel Kempisty, Konrad Sakowski, Akira Kusaba, and Yoshihiro Kangawa

    The 8th Asian Conference on Crystal Growth and Crystal Technology  2021.3 

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    Event date: 2021.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Structures, electron states and reactions on growing surfaces and at device interfaces of SiC and GaN Invited International conference

    Kieu My Bui, Yu-ichiro Matsushita, Kenta Chokawa, Mauro Boero, Yoshihiro Kangawa, Kenji Shiraishi, and Atsushi Oshiyama

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs2021)  2021.1 

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    Event date: 2021.1

    Language:English  

    Country:Japan  

  • Ab initio-based approach to GaN HVPE and THVPE processes: p-type doping and facet stability International conference

    Daichi Yosho, Yuriko Matsuo, Pawel Kempisty, Akira Kusaba, Yoshihiro Kangawa

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021  2021.1 

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    Event date: 2021.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • On numerical simulations of polarization-doped AlGaN UV laser diodes Invited International conference

    Konrad Sakowski, Kosuke Sato, Kazuki Yamada, Pawel Kempisty, Motoaki Iwaya, Pawel Strak, Yoshihiro Kangawa, Stanislaw Krukowski

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs2021)  2021.1 

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    Event date: 2021.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Change of the effective bandgaps of InN/AlN superlattices due to lattice distortion Invited International conference

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs2021)  2021.1 

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    Event date: 2021.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • More quantitative prediction of III-nitride growth: theoretical and data-driven approaches Invited International conference

    Akira Kusaba and Yoshihiro Kangawa

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs2021)  2021.1 

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    Event date: 2021.1

    Language:English  

    Country:Japan  

  • Ab initio atomistic thermodynamics of pseudo-hot surfaces in the context of GaN growth and doping Invited International conference

    Pawel Kempisty, Stanislaw Krukowski, and Yoshihiro Kangawa

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs2021)  2021.1 

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    Event date: 2021.1

    Language:English  

    Country:Japan  

  • First principles molecular dynamics as a tool to explore complex chemical reactions in GaN Invited International conference

    Mauro Boero, Kieu My Bui, Atsushi Oshiyama, Yoshihiro Kangawa, Kenji Shiraishi

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs2021)  2021.1 

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    Event date: 2021.1

    Language:English  

    Country:Japan  

  • Modeling semiconductor epitaxy for next generation power device application Invited International conference

    Yoshihiro Kangawa

    IMI Workshop on Fiber Topology Meets Applications  2021.1 

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    Event date: 2021.1

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 窒化物半導体プロセス・インフォマティクス:不純物混入の抑制 Invited

    寒川義裕

    第49回薄膜・表面物理基礎講座  2020.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:オンライン   Country:Japan  

  • GaN MOVPE成長におけるTMG分解のH2とNH3による効果の理論的考察

    榊原聡真, 長川健太, 洗平昌晃, 草場彰, 寒川善裕, 白石賢二

    第49回結晶成長国内会議  2020.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 微傾斜m-GaN MOVPEにおける酸素混入機構:量子論に立脚したBCFモデル

    用正大地, 新宅史哉, 稲富悠也, 寒川義裕, 岩田潤一, 押山淳, 白石賢二, 田中敦之, 天野浩

    第49回結晶成長国内会議  2020.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 機械学習によるスパッタAlN膜の高温アニール最適プロセス探索

    草場彰, 寒川義裕, 則松研二, 三宅秀人

    第49回結晶成長国内会議  2020.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Influence of surface reconstruction on impurity incorporation in GaN MOVPE: ab initio calculation

    2020.11 

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    Event date: 2020.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  • A theoretical model for carbon coverage on GaN polar surfaces during MOVPE

    D. Yosho, Y. Inatomi, and Y. Kangawa

    37th Electronic Materials Symposium  2020.10 

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    Event date: 2020.10

    Language:English  

    Country:Japan  

  • Data Analysis for Sputtering and High-Temperature Annealing in AlN Templates Fabrication

    A. Kusaba, Y. Kangawa, K. Norimatsu, and H. Miyake

    37th Electronic Materials Symposium  2020.10 

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    Event date: 2020.10

    Language:English  

    Country:Japan  

  • Computics Approach toward Clarification of Atomic Reactions during Epitaxial Growth of GaN Invited International conference

    Atsushi Oshiyama, Kieu My Bui, Mauro Boero, Yoshihiro Kangawa, and Kenji Shiraishi

    2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)  2020.9 

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    Event date: 2020.9 - 2020.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • p型からn型へ変えるGaN中のらせん転位とMgの複合体: 第一原理計算と3次元アトムプローブ解析によるアプローチ

    原嶋庸介、中野崇志、長川健太、白石賢二、押山淳、寒川義裕、宇佐美茂佳、間山憲仁、戸田一也、田中敦之、本田善央、天野 浩

    第81回応用物理学会秋季学術講演会  2020.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • 不純物混入と深紫外デバイス特性の相関 Invited

    寒川義裕

    第81回応用物理学会秋季学術講演会  2020.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • MOVPE成長m面AlInN/GaNヘテロ構造における特異構造(4)

    秩父重英, 嶋紘平, 稲富悠也, 小島一信, 寒川義裕

    第81回応用物理学会秋季学術講演会  2020.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • UV-B LDにおける分極ドーピングp型AlGaNクラッド層のAl組成およびMg濃度依存性

    山田和輝、佐藤恒輔、安江信次、田中隼也、手良村昌平、荻野雄矢、大森智也、石塚彩花、岩山章、岩谷素顕、竹内哲也、上山智、赤﨑勇、三宅秀人、寒川義裕、Sakowski Konrad

    第81回応用物理学会秋季学術講演会  2020.9 

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    Event date: 2020.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:オンライン   Country:Japan  

  • Al組成傾斜p型AlGaNクラッド層の電気的特性のAl組成及びMg濃度依存性

    山田和輝,佐藤恒輔,安江信次,田中隼也,手良村昌平,荻野雄矢,大森智也,石塚彩花,岩山章,岩谷素顕,竹内哲也,上山智,赤﨑勇,三宅秀人, 寒川義裕, K. Sakowski

    第12回ナノ構造エピタキシャル成長講演会  2020.7 

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    Event date: 2020.7

    Language:Japanese  

    Venue:オンライン   Country:Japan  

  • 微傾斜m(101-0)面GaN-MOVPEにおける酸素混入のモデリング

    用正大地,新宅史哉,稲富悠也,寒川義裕,岩田潤一,押山淳,白石賢二,田中敦之,天野浩

    第12回ナノ構造エピタキシャル成長講演会  2020.7 

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    Event date: 2020.7

    Language:Japanese  

    Venue:オンライン   Country:Japan  

  • MgOを用いたMgドープGaNのHVPE成長における気相反応の熱力学的解析

    木村友哉,大西一生,天野裕己,藤元直樹,洗平昌晃,新田州吾,本田善央,天野浩,寒川義裕,白石賢二

    第12回ナノ構造エピタキシャル成長講演会  2020.7 

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    Event date: 2020.7

    Language:Japanese  

    Venue:オンライン   Country:Japan  

  • Theoretical model for oxygen incorporation during step flow growth of GaN on vicinal m-GaN by MOVPE International conference

    Daichi Yosho, Fumiya Shintaku, Yoshihiro Kangawa, Jun-Ichi Iwata, Atsushi Oshiyama, Kenji Shiraishi, Atsushi Tanaka, Hiroshi Amano

    The 8th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA 2020)  2020.4 

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    Event date: 2020.4

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Theoretical approach to carbon concentration on GaN(0001) and (000-1) surfaces during MOVPE International conference

    Daichi Yosho, Yuya Inatomi, Yoshihiro Kangawa

    The 8th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA 2020)  2020.4 

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    Event date: 2020.4

    Language:English  

    Country:Japan  

  • らせん転位とMg不純物との複合体を含む GaNの第一原理電子構造解析 Invited

    中野崇志,原嶋庸介,長川健太,洗平昌晃,白石賢二,押山淳,草場彰,@寒川義裕,田中敦之,本田善央,天野浩

    第67回応用物理学会春季学術講演会  2020.3 

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    Event date: 2020.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:上智大学   Country:Japan  

    GaN薄膜中のMgはp型不純物(アクセプター)として知られているが、らせん転位との複合体を形成することによりn型(ドナー)に成り得ることを明らかにした。

  • GaN薄膜におけるらせん転位およびMg不純物と電子物性の相関:第一原理計算に基づく理論解析

    中野崇志、原嶋庸介、大河内勇斗、長川健太、洗平昌晃、白石賢二、押山淳、草場彰、寒川義裕、田中敦之、本田善央、天野浩

    応用物理学会薄膜・表面物理分科会、シリコンテクノロジー分科会共催「電子デバイス界面テクノロジー研究会 -材料・プロセス・デバイス特性の物理-」(第25回)  2020.1 

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    Event date: 2020.1 - 2020.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:三島   Country:Japan  

  • First-principles phonon calculations as a method of improving the atomistic thermodynamics of III-nitrides surfaces International conference

    Pawel Kempisty, @Yoshihiro Kangawa

    5th Workshop on ab initio phonon calculations  2019.12 

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    Event date: 2019.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • 窒化物半導体におけるステップバンチング発生機構の解明

    稲富悠也、寒川義裕

    第48回結晶成長国内会議  2019.10 

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    Event date: 2019.10 - 2019.11

    Language:Japanese  

    Venue:大阪大学   Country:Japan  

  • 未来材料開拓に向けた相界面制御 Invited

    @寒川義裕

    第48回結晶成長国内会議  2019.10 

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    Event date: 2019.10 - 2019.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:大阪大学   Country:Japan  

  • Theoretical approach to impurity incorporation mechanism in GaN MOVPE Invited

    @Yoshihiro Kangawa, @Pawel Kempisty, Kenji Shiraishi

    The 38th Electronic Materials Symposium (EMS-38)  2019.10 

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    Event date: 2019.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  • MOVPE成長中の極性面AlN表面における吸着原子の安定性解析

    稲富悠也, 寒川義裕, 岩谷素顕, 三宅秀人

    第80回応用物理学会秋季学術講演会  2019.9 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • MOVPE条件下におけるIII族窒化物半導体無極性面の熱力学解析

    清水紀志,秋山亨, アブドルムィッツプラディプト,中村浩次, 伊藤智徳,草場彰, 寒川義裕

    第80回応用物理学会秋季学術講演会  2019.9 

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    Event date: 2019.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • Theoretical approach to oxygen incorporation mechanism in vicinal m-GaN MOVPE International conference

    Fumiya Shintaku, Yoshihiro Kangawa, Jun-Ichi Iwata, Atsushi Oshiyama, Kenji Shiraishi, Atsushi Tanaka, and Hiroshi Amano

    2019 International Conference on Solid State Devices and Materials  2019.9 

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    Event date: 2019.9

    Language:English  

    Country:Japan  

  • 吸着原子の拡散距離が表面モフォロジーに与える影響

    稲富悠也、寒川義裕

    第42回結晶成長討論会  2019.8 

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    Event date: 2019.8

    Language:Japanese  

    Venue:大阪大学   Country:Japan  

  • Theoretical approach of oxygen incorporation into GaN grown on vicinal GaN(10-10) International conference

    Fumiya Shintaku, Yoshihiro Kangawa, Jun-Ichi Iwata, Atsushi Oshiyama, Kenji Shiraishi, Atsushi Tanaka, Hiroshi Amano

    1st International Workshop on AlGaN based UV-Laserdiodes  2019.8 

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    Event date: 2019.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • Numerical simulations of the electrical properties of AlGaN luminescent heterostructures Invited International conference

    Konrad Sakowski

    1st International Workshop on AlGaN based UV-Laserdiodes  2019.8 

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    Event date: 2019.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • Unintentional doping in GaN MOVPE: A new theoretical model Invited International conference

    Yoshihiro Kangawa

    1st International Workshop on AlGaN based UV-Laserdiodes  2019.8 

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    Event date: 2019.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • Thermodynamics of vapor-surface equilibria in ab initio modelling of semiconductor growth processes International conference

    19th International Conference on Crystal Growth and Epitaxy (ICCGE-19)  2019.7 

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    Event date: 2019.7 - 2019.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • Study of the origins of carbon impurities on GaN MOVPE from a gas phase reaction perspective International conference

    Yuto Okawachi, Kenta Chokawa, Masaaki Araidai, Akira Kusaba, Yoshihiro Kangawa, Koichi Kakimoto, Sheng Yo, Yoshio Honda, Shugo Nitta, Hiroshi Amano, Kenji Shiraishi

    19th International Conference on Crystal Growth and Epitaxy (ICCGE-19)  2019.7 

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    Event date: 2019.7 - 2019.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • Electronic Properties of GaN Nanopipe Threading Dislocation with m-plane Surface International conference

    Takashi Nakano, Kenta Chokawa, Masaaki Araidai, Kenji Shiraishi, Atsushi Oshiyama, Shigeyoshi Usami, Akira Kusaba, Yoshihiro Kangawa, Atsushi Tanaka, Yoshio Honda, Hiroshi Amano

    13th International Conference on Nitride Semiconductors 2019 (ICNS-13)  2019.7 

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    Event date: 2019.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • A new theoretical approach to nitride crystal growth: impurity incorporation mechanism Invited International conference

    13th International Conference on Nitride Semiconductors 2019 (ICNS-13)  2019.7 

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    Event date: 2019.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • First-Principles Calculation of Band Gaps of Al1-xInxN alloys and short period Al1-xInxN/Al1-yInyN superlattices International conference

    13th International Conference on Nitride Semiconductors 2019 (ICNS-13)  2019.7 

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    Event date: 2019.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • Theoretical study on step bunching instability during nitride semiconductor growth International conference

    Yuya Inatomi, and Yoshihiro Kangawa

    13th International Conference on Nitride Semiconductors 2019 (ICNS-13)  2019.7 

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    Event date: 2019.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • m面GaN-MOVPEにおける酸素混入量の基板傾斜方向依存性の理論解析

    新宅史哉、寒川義裕、岩田潤一、押山淳、白石賢二、田中敦之、天野浩

    第11回ナノ構造・エピタキシャル成長講演会  2019.6 

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    Event date: 2019.6

    Language:Japanese  

    Venue:広島   Country:Japan  

  • Electronic structure analysis of the core structures of threading dislocations in GaN International conference

    Takashi Nakano, Kenta Chokawa, Masaaki Araidai, Kenji Shiraishi, Atsushi Oshiyama, Akira Kusaba, Yoshihiro Kangawa, Atsushi Tanaka, Yoshio Honda, Hiroshi Amano

    Compound Semiconductor Week 2019  2019.5 

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    Event date: 2019.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Monte Carlo simulation of GaN MOVPE process: carbon incorporation mechanism International conference

    S. Yamamoto, Y. Okawachi, P. Kempisty, Y. Kangawa, K. Shiraishi

    The 7th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA2019)  2019.4 

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    Event date: 2019.4

    Language:English  

    Country:Japan  

  • Step bunching stability – instability diagram for nitride semiconductor growth International conference

    2019.4 

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    Event date: 2019.4

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Yokohama   Country:Japan  

  • Adatom Density on Polar GaN Surfaces During MOVPE International conference

    Y. Inatomi, Y. Kangawa

    The 7th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA2019)  2019.4 

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    Event date: 2019.4

    Language:English  

    Country:Japan  

  • 化学反応を含むGaN結晶成長流体シミュレーョン手法の開発

    榊原聡真, 川上賢人, 高村昴, 洗平昌晃, 草場彰, 岡本直也, 芳松克則, 寒川義裕, 柿本浩一, 白石賢二

    第66回応用物理学会春季学術講演会  2019.3 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京工業大学   Country:Japan  

  • MOVPE法のGaN結晶成長3次元マルチフィジックスシミュレーション

    川上賢人,高村昴,草場彰,芳松克則,岡本直也,寒川義裕,柿本浩一,白石賢二

    第66回応用物理学会春季学術講演会  2019.3 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京工業大学   Country:Japan  

  • GaN薄膜における貫通転位およびナノパイプm壁面の第一原理計算に基づく電子状態解析

    中野崇志,長川健太,洗平昌晃,白石賢二,押山淳,宇佐美茂佳,草場彰,寒川義裕,田中敦之,本田善央,天野浩

    第66回応用物理学会春季学術講演会  2019.3 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京工業大学   Country:Japan  

  • 縦型結晶成長装置におけるGaN MOVPEシミュレーョン

    富澤巧, 川上賢人, 櫻井照夫, 草場彰, 岡本直也, 芳松克則, 醍醐佳明, 水島一郎, 依田孝, 寒川義裕, 柿本浩一, 白石賢二

    第66回応用物理学会春季学術講演会  2019.3 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京工業大学   Country:Japan  

  • 気相反応から考えるGaN MOVPEにおける炭素混入起源の解明

    大河内勇斗, 長川健太, 洗平昌晃, 草場彰, 寒川義裕, 柿本浩一, 白石賢二

    第66回応用物理学会春季学術講演会  2019.3 

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    Event date: 2019.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京工業大学   Country:Japan  

  • 窒化物半導体成長モデリングの進展:不純物混入機構の考察 Invited

    寒川義裕

    第11回九大2D物質研究会「2D物質の形成と構造・物性評価」  2019.2 

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    Event date: 2019.2

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡   Country:Japan  

  • GaN薄膜における転位芯構造と電子物性の相関:第一原理計算に基づく論解析

    中野崇志, 長川健太, 大河内勇斗, 洗平昌晃, 白石賢二, 押山淳, 草場彰, 寒川義裕, 田中敦之, 本田善央, 天野浩

    第24回電子デバイス界面テクノロジー研究会  2019.1 

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    Event date: 2019.1

    Language:Japanese  

    Venue:三島市   Country:Japan  

  • Ab initio-based approach to crystal growth of nitride semiconductors: alloy composition and impurity concentration Invited International conference

    4th Intensive Discussion on Growth of Nitride Semiconductors (IDGN-4)  2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Surface adatom density and lifetime on polar GaN surfaces during MBE and MOVPE: a theoretical approach International conference

    Y. Inatomi, Y. Kangawa, A. Pimpinelli, and T. L. Einstein

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Modelling of Band Gaps in Short Period In(Ga)N/GaN Superlattices with Different Sequences of Barrier and Quantum Wells International conference

    Izabela Gorczyca, Grzegorz Staszczak, Ewa Grzanka, Grzegorz Targowski, Tadek Suski, Niels Eged Christensen, Takahiro Kawamura, and Yoshikiro Kangawa

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English  

    Country:Japan  

  • Multiphysics simulation of GaN MOVPE: Flow influence on GaN growthorientation International conference

    Subaru Komura, Kento Kawakami, Akira Kusaba, Katsunori Yoshimatsu, Naoya Okamoto, Yoshihiro Kangawa, Koichi Kakimoto, and Kenji Shiraishi

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English  

    Country:Japan  

  • First-Principle Study of Nitrogen substitution on the GaN Surface in Metal Organic Vapor Phase Epitaxy International conference

    Kieu My Bui, Jun-Ichi Iwata, Yoshihiro Kangawa, Kenji Shiraishi, Yasuteru Shigeta, and Atsushi Oshiyama

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English  

    Country:Japan  

  • First-principles analysis of oxygen adsorption on kinked GaN(0001) surface International conference

    Hiroki Takeda, Takahiro Kawamura, Akira Kitamoto, Masayuki Imanishi, Masashi Yoshimura, Yusuke Mori, Yoshitada Morikawa, Yoshihiro Kangawa, and Koichi Kakimoto

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English  

    Country:Japan  

  • First-Principles Investigation of Compositional Dependence of Band Gaps in AlN/InN and InN/GaN Superlattices International conference

    Yuma Fujita, Yuya Hamaji, Takahiro Kawamura, Toru Akiyama, Yoshihiro Kangawa, Izabela Gorczyca, Tadeusz Suski, Malgorzata Wierzbowska, and Stanislaw Krukowski

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English  

    Country:Japan  

  • Monte Carlo study of influence of MOVPE growth condition on carbon concentration in GaN epi-layer International conference

    Satoshi Yamamoto, Yuya Inatomi, Akira Kusaba, Pawel Kempisty, Kenji Shiraishi, and Yoshihiro Kangawa

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English  

    Country:Japan  

  • Thermodynamic analysis of semipolar GaN and AlN under metalorganic vapor phase epitaxy growth condition International conference

    Yuki Seta, Abdul Muizz Pradipto, Toru Akiyama, Kohji Nakamura, Tomonori Ito, Akira Kusaba, and Yoshihiro Kangawa

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Non-equilibrium analysis of CH4 adsorption on GaN(0001) and (000−1): the growth orientation dependence of the C impurity concentration International conference

    2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Kanazawa   Country:Japan  

  • Systematic improvement of III-nitrides surface thermodynamics by including first principles phonon calculations International conference

    Pawel Kempisty, and Yoshihiro Kangawa

    The International Workshop on Nitride Semiconductors 2018 (IWN 2018)  2018.11 

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    Event date: 2018.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • GaN結晶成長過程における炭素混入メカニズムの理論的解明

    大河内勇斗、長川健太、洗平昌晃、草場彰、寒川義裕、柿本浩一、白石賢二

    第47回結晶成長国内会議(JCCG47)  2018.10 

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    Event date: 2018.10 - 2018.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • 量子力学と流体力学の融合によるGaNマルチフィジックス気相成長シミュレーション Invited

    白石賢二、川上賢人、関口一樹、高村昴、大河内勇斗、長川健太、洗平昌晃、岡本直也、芳松克則、寒川義裕、柿本浩一

    第47回結晶成長国内会議(JCCG47)  2018.10 

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    Event date: 2018.10 - 2018.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • 表面再構成構造を考慮したGaN MOVPEのマルチフィジックス流動シミュレーション

    川上賢人、高村昴、草場彰、芳松克則、岡本直也、寒川義裕、柿本浩一、白石賢二

    第47回結晶成長国内会議(JCCG47)  2018.10 

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    Event date: 2018.10 - 2018.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • GaN MOVPEにおける炭素取込み機構の考察 Invited

    寒川義裕

    第47回結晶成長国内会議(JCCG47)  2018.10 

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    Event date: 2018.10 - 2018.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • Ab initio based-approach to impurity incorporation mechanism in GaN MOVPE Invited International conference

    The 6th Japan-China Symposium on Crystal Growth and Crystal Technology  2018.10 

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    Event date: 2018.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Methodology for multiphysics flow simulation in GaN MOVPE using thermodynamic analysis and first principles calculation for GaN deposition International conference

    K. Kawakami, S. Komura, Y. Yamamoto, A. Kusaba, K. Yoshimatsu, N. Okamoto, Y. Kangawa, K. Kakimoto, K. Shiraishi

    9th International Workshop on Modeling in Crystal Growth  2018.10 

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    Event date: 2018.10

    Language:English  

    Country:United States  

  • Flow Influence on GaN MOVPE Growth-orientation International conference

    S. Komura, K. Kawakami, Y. Yamamoto, A. Kusaba, K. Yoshimatsu, N. Okamoto, Y. Kangawa, K. Kakimoto, and K. Shiraishi

    9th International Workshop on Modeling in Crystal Growth  2018.10 

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    Event date: 2018.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • First Principles and Thermodynamic Studies on GaN MOVPE Processes International conference

    Y. Okawachi, K. Chokawa, M. Araidai, Y. Kangawa, K. Kakimoto, and K. Shiraishi

    9th International Workshop on Modeling in Crystal Growth  2018.10 

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    Event date: 2018.10

    Language:English  

    Country:United States  

  • Influence of surface reconstruction on the impurity incorporation in GaN MOVPE Invited International conference

    Yoshihiro Kangawa

    Mathematical Aspects ofSurface and Interface Dynamics 16  2018.10 

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    Event date: 2018.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • A new theoretical model for adatom density and lifetime on polar GaN surfaces during MBE and MOVPE

    Y. Inatomi, Y. Kangawa, A. Pimpinelli, and T. L. Einstein

    2018.10 

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    Event date: 2018.10

    Language:Japanese  

    Country:Japan  

  • A kinetic – thermodynamic modeling of carbon incorporation during step flow growth of GaN by metalorganic vapor phase epitaxy

    第37回電子材料シンポジウム(EMS 37)  2018.10 

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    Event date: 2018.10

    Language:Japanese  

    Venue:長浜   Country:Japan  

  • Power module concepts for innovative reliable nitride based power devices and applications - The EU public funded project ‘InRel-NPower‘- International conference

    Martin Rittner, Ulrich Kessler, Samuel Araujo, Sebastian Mansfeld, Jörg Naundorf, Kai Kriegel, Martin Schulz, Hideto Miyake, Yoshihiro Kangawa, Gaudenzio Meneghesso

    2018.1 

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    Event date: 2018.9 - 2018.10

    Language:English  

    Venue:Kobe City   Country:Japan  

  • Multi-physics simulations of high-temperature CVD of SiC International conference

    S. Komura, R. Oshima, K. Kawakami, K. Chokawa, Y. Yamamoto, K. Yoshimatsu, N. Okamoto, E. Makino, N. Hosokawa, S. Onda, Y. Kangawa, K. Kakimoto, K. Shiraishi

    European Conference on Silicon Carbide and Related Materials (ECSCRM 2018)  2018.9 

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    Event date: 2018.9

    Language:English  

    Country:United Kingdom  

  • Thermodynamics analysis of high-temperature CVD of SiC International conference

    K. Chokawa, E. Makino, N. Hosokawa, S. Onda, Y. Kangawa, and K. Shiraishi

    European Conference on Silicon Carbide and Related Materials (ECSCRM 2018)  2018.9 

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    Event date: 2018.9

    Language:English  

    Country:United Kingdom  

  • Theoretical study: Impurity incorporation in GaN MOVPE Invited International conference

    @Yoshihiro Kangawa, Pawel Kempisty, and Kenji Shiraishi

    The 7th International Symposium on Growth of III-Nitrides  2018.8 

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    Event date: 2018.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • Relationship between the CH4 Adsorption Probability and the C Impurity Concentration in the Polar-GaN MOVPE System International conference

    #A. Kusaba, G. Li, M. R. von Spakovsky, P. Kempisty, @Y. Kangawa

    The 7th International Symposium on Growth of III-Nitrides  2018.8 

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    Event date: 2018.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • First Principles and Thermodynamic Studies on GaN MOVPE Processes International conference

    Yuto Okawachi, Kazuki Sekiguchi, Kenta Chokawa, Masaaki Araidai, Mitsuo Shoji, Yasuteru Shigeta, @Yoshihiro Kangawa, @Koichi Kakimoto, and Kenji Shiraishi

    The 7th International Symposium on Growth of III-Nitrides  2018.8 

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    Event date: 2018.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • Contribution of first principles phonon calculations to thermodynamics analysis of GaN surfaces International conference

    Pawel Kempisty, @Yoshihiro Kangawa, Stanislaw Krukowski

    The 7th International Symposium on Growth of III-Nitrides  2018.8 

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    Event date: 2018.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • A theoretical model for carbon incorporation during step-flow growth of GaN by MOVPE International conference

    #Y. Inatomi, @Y. Kangawa

    The 7th International Symposium on Growth of III-Nitrides  2018.8 

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    Event date: 2018.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • Monte Carlo simulation of carbon incorporation in GaN MOVPE International conference

    #S. Yamamoto, #Y. Inatomi, #A. Kusaba, P. Kempisty, @Y. Kangawa

    The 7th International Symposium on Growth of III-Nitrides  2018.8 

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    Event date: 2018.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • Compositional Dependence of Band Gaps in III-Nitride Semiconductor Superlattices International conference

    T. Kawamura, T. Akiyama, @Y. Kangawa

    The 7th International Symposium on Growth of III-Nitrides  2018.8 

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    Event date: 2018.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • GaN-MOVPE成長におけるCH4吸着確率とC不純物濃度の面方位依存性

    草場彰,李冠辰,Pawel Kempisty,Michael R. von Spakovsky,寒川義裕

    第10回ナノ構造・エピタキシャル成長講演会  2018.7 

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    Event date: 2018.7

    Language:Japanese  

    Venue:名古屋   Country:Japan  

  • Surface reconstruction and impurity incorporation in GaN MOVPE: Ab initio-based modeling Invited International conference

    Y. Kangawa, P. Kempisty, S. Krukowski, K. Shiraishi, K. Kakimoto

    The 19th International Conference on MOVPE (ICMOVPE-XIX)  2018.6 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • First-Principles Calculations of GaN Surface Structures under OVPE Growth Conditions and Desorption Energies of Oxygen Impurities International conference

    Takahiro Kawamura, Akira Kitamoto, Mamoru Imade, Masashi Yoshimura, Yusuke Mori, Yoshitada Morikawa, @Yoshihiro Kangawa, @Koichi Kakimoto

    The 19th International Conference on MOVPE (ICMOVPE-XIX)  2018.6 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Multi-Physics Simulations of GaN MOVPE Invited International conference

    Kenji Shiraishi, Katsunori Yoshimatsu, Naoya Okamoto, @Yoshihiro Kangawa, @Koichi Kakimoto

    The 19th International Conference on MOVPE (ICMOVPE-XIX)  2018.6 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • First-principle study of ammonia decomposition and nitrogen incorporation on the GaN surface in Metal Organic Vapor Phase Epitaxy International conference

    Thi Kieu My Bui, Jun-Ichi Iwata, @Yoshihiro Kangawa, Kenji Shiraishi, Yasuteru Shigeta, and Atsushi Oshiyama

    The 19th International Conference on MOVPE (ICMOVPE-XIX)  2018.6 

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    Event date: 2018.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 電子材料開発における計算科学の進展 Invited

    寒川義裕

    佐賀大学シンクロトロン光応用研究センター講演会  2018.6 

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    Event date: 2018.6

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:佐賀   Country:Japan  

  • Formation mechanism of singular structure in AlInN layer grown on m-GaN substrate by MOVPE Invited International conference

    #Y. Inatomi, #A. Kusaba, @Y. Kangawa, K. Kojima, S. F. Chichibu

    The 6th International Conference on Light-Emitting Devices and Their Industrial Applications  2018.4 

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    Event date: 2018.4

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Modeling and process design of III-nitride MOVPE Invited International conference

    @Y. Kangawa, P. Kempisty, K. Shiraishi

    The 6th International Conference on Light-Emitting Devices and Their Industrial Applications  2018.4 

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    Event date: 2018.4

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Japan  

  • Impurity incorporation mechanism in GaN MOVPE: ab initio based−approach Invited International conference

    2018.3 

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    Event date: 2018.3

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Jeddah   Country:Saudi Arabia  

  • 気相原子-吸着原子の平衡を考慮した新規結晶成長モデルの提案:GaN MOVPEにおける不純物取り込み機構の理論解析

    #稲富悠也, @寒川義裕, @柿本浩一

    日本物理学会第73回年次大会  2018.3 

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    Event date: 2018.3

    Language:Japanese  

    Venue:東京理科大学   Country:Japan  

  • MOVPE成長m面AlInN/GaNヘテロ構造における特異構造(2)

    #稲富悠也,#草場 彰,@柿本浩一,@寒川義裕,小島一信,秩父重英

    第65回応用物理学会春季学術講演会  2018.3 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • マルチフィジックスシミュレーションに基づくSiCガス成長の研究

    大島亮祐、高村昴、川上賢人、山本芳裕、長川健太、芳松克則、岡本直也、牧野恵美、細川徳一、恩田正一、寒川義裕、柿本浩一、白石賢二

    第65回応用物理学会春季学術講演会  2018.3 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • SiCガス成長における気相反応と表面再構成構造の予測

    長川健太, 寒川義裕, 牧野英美, 細川徳一, 恩田正一, 白石賢二

    第65回応用物理学会春季学術講演会  2018.3 

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    Event date: 2018.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • Driving force for m-plane GaN MOVPE: a new thermodynamic modeling International conference

    #Akira Kusaba, @Yoshihiro Kangawa, Kenji Shiraishi

    ISPlasma2018/IC-PLANTS2018  2018.3 

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    Event date: 2018.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Theory of GaN MOVPE process considering surface reconstruction Invited International conference

    Y. Kangawa, P. Kempisty, K. Shiraishi, K. Kakimoto

    SPIE Photonics Wese OPTO  2018.1 

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    Event date: 2018.1 - 2018.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • GaN(0001)におけるNH3吸着過程の非平衡量子熱力学モデリング:付着係数の理論解析

    草場 彰, G. Li, M. R. von Spakovsky, 寒川義裕, 柿本浩一

    第46回結晶成長国内会議(JCCG-46)  2017.11 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:浜松   Country:Japan  

  • MOVPE GaN成長における駆動力への流れの影響

    山本芳裕, 川上賢人, 芳松克則, 岡本直也, 寒川義裕, 柿本浩一, 白石賢二

    第46回結晶成長国内会議(JCCG-46)  2017.11 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:浜松   Country:Japan  

  • GaN MOVPE法における基板面方位依存性を考慮した流れの影響II

    高村昴, 川上賢人, 山本芳裕, 草場 彰, 芳松克則, 岡本直也, 寒川義裕, 柿本浩一, 白石賢二

    第46回結晶成長国内会議(JCCG-46)  2017.11 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:浜松   Country:Japan  

  • GaN MOVPE法における基板面方位依存性を考慮した流れの影響I

    川上賢人, 高村昴, 山本芳裕, 草場 彰, 芳松克則, 岡本直也, 寒川義裕, 柿本浩一, 白石賢二

    第46回結晶成長国内会議(JCCG-46)  2017.11 

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    Event date: 2017.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:浜松   Country:Japan  

  • Thermodynamic Analysis of the TMG Decomposition Process in GaN MOVPE International conference

    K. Sekiguchi, H. Shirakawa, K. Chokawa, M. Araidai, Y. Kangawa, K. Kakimoto, K. Shiraishi

    2017 MRS Fall Meeting  2017.11 

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    Event date: 2017.11 - 2017.12

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • Theoretical study of composition pulling effect in AlGaN and AlInN MOVPE International conference

    Y. Inatomi, Y. Kangawa, S. F. Chichibu, K. Kakimoto

    International Workshop on UV Materials and Devices 2017 (IWUMD 2017)  2017.11 

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    Event date: 2017.11

    Language:English  

    Country:Japan  

  • Adsorption of ammonia in III-nitrides vapor phase epitaxy: theoretical approach based on steepest-entropy-ascent quantum thermodynamics International conference

    A. Kusaba, G. Li, M. R. von Spakovsky, Y. Kangawa, K. Kakimoto

    International Workshop on UV Materials and Devices 2017 (IWUMD 2017)  2017.11 

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    Event date: 2017.11

    Language:English  

    Country:Japan  

  • Influence of lattice constraint on In incorporation in InGaN MOVPE

    Y. Inatomi, Y. Kangawa, K. Kakimoto

    The 36th Electronic Materials Symposium  2017.11 

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    Event date: 2017.11

    Language:Japanese  

    Country:Japan  

  • A kinetic−thermodynamic theory in step−flow growth of compound semiconductor: Application to impurity incorporation in GaN MOVPE International conference

    大阪電気通信大学国際ワークショップ  2017.10 

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    Event date: 2017.10

    Language:English  

    Venue:寝屋川市   Country:Japan  

  • GaN MOVPEにおける結晶成長プロセスの理論解析 Invited

    寒川義裕, 芳松克則, 白石賢二, 柿本浩一

    日本学術振興会第162委員会第105回研究会  2017.10 

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    Event date: 2017.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:四ツ谷   Country:Japan  

  • Thermodynamic Modeling of GaN MOVPE: Contribution of Surface State International conference

    A. Kusaba, Y. Kangawa, P. Kempisty, K. Shiraishi, K. Kakimoto, A. Koukitu

    International Conference on Materials and Systems for Sustainability 2017  2017.9 

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    Event date: 2017.9 - 2017.10

    Language:English  

    Country:Japan  

  • Multiphysics Flow Simulation with Appropriate Conditions Predicted by Thermodynamic Analysis of Driving Force of GaN Crystal Growth International conference

    Y. Yamamoto, K. Kawakami, K. Yoshimatsu, N. Okamoto, Y. Kangawa, K. Kakimoto, K. Shiraishi

    International Conference on Materials and Systems for Sustainability 2017  2017.9 

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    Event date: 2017.9 - 2017.10

    Language:English  

    Country:Japan  

  • A Methodology for Multiphysics Simulation of Gallium Nitride MOVPE Method using Thermodynamic Analysis of Driving Force of Gallium Nitride Crystal Growth International conference

    K. Kawakami, Y. Yamamoto, K. Yoshimatsu, N. Okamoto, Y. Kangawa, K. Kakimoto, K. Shiraishi

    International Conference on Materials and Systems for Sustainability 2017  2017.9 

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    Event date: 2017.9 - 2017.10

    Language:English  

    Country:Japan  

  • Stability of the carbon and oxygen impurities in the subsurface layer near the polar GaN surface International conference

    P. Kempisty, Y. Kangawa, K. Shiraishi, S. Krukowski, M. Bockowski, K. Kakimoto, H. Amano

    International Conference on Materials and Systems for Sustainability 2017  2017.9 

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    Event date: 2017.9 - 2017.10

    Language:English  

    Country:Japan  

  • Thermodynamic Analysis of the Surface Reactions in GaN MOVPE International conference

    K. Sekiguchi, H. Shirakawa, K. Chokawa, M. Araidai, Y. Kangawa, K. Kakimoto, K. Shiraishi

    2017 International Conference on Solid State Devices and Materials  2017.9 

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    Event date: 2017.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Steepest-entropy-ascent quantum thermodynamic modeling of NH3 chemical adsorption on GaN(0001) reconstructed surfaces under metalorganic vapor phase epitaxy conditions International conference

    A. Kusaba, Guanchen Li, Michael R. von Spakovsky, Y. Kangawa, K. Kakimoto

    E-MRS  2017.9 

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    Event date: 2017.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • GaN MOVPEにおける気相中および基板上での反応プロセス解明

    関口一樹, 白川裕規, 長川健太, 洗平昌晃, 寒川義裕, 柿本浩一, 白石賢二

    第78回 応用物理学会 秋季学術講演会  2017.9 

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    Event date: 2017.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:福岡   Country:Japan  

  • Multi-physics flow simulation satisfying appropriate conditions on GaN deposition predicted by a thermodynamic analysis of the deposition driving force International conference

    Y. Yamamoto, K. Kawakami, K. Yoshimatsu, N. Okamoto, Y. Kangawa, K. Kakimoto, K. Shiraishi

    12th International Conference on Nitride Semiconductors (ICNS-12)  2017.7 

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    Event date: 2017.7

    Language:English  

    Country:France  

  • Density Functional Theory study on stability of carbon and oxygen at GaN(0001) and GaN(000-1) surfaces International conference

    P. Kempisty, Y. Kangawa, K. Shiraishi, S. Krukowski, M. Bockowski, K. Kakimoto, H. Amano

    12th International Conference on Nitride Semiconductors (ICNS-12)  2017.7 

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    Event date: 2017.7

    Language:English  

    Country:France  

  • Thermodynamic analysis of InGaN MOVPE: influence of lattice constraint International conference

    Y. Inatomi, Y. Kangawa, T. Ito, T. Suski, K. Kakimoto, A. Koukitu

    12th International Conference on Nitride Semiconductors (ICNS-12)  2017.7 

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    Event date: 2017.7

    Language:English  

    Country:France  

  • Thermodynamic Analysis of the TMG Decomposition Process Considering the Activation Energy International conference

    K. Sekiguchi, H. Shirakawa, K. Chokawa, M. Araidai, Y. Kangawa, K. Kakimoto, K. Shiraishi

    12th International Conference on Nitride Semiconductors (ICNS-12)  2017.7 

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    Event date: 2017.7

    Language:English  

    Country:France  

  • A methodology for multiphysics simulation of GaN MOVPE using thermodynamic analysis of driving force for the deposition of GaN International conference

    K. Kawakami, Y. Yamamoto, K. Yoshimatsu, N. Okamoto, Y. Kangawa, K. Kakimoto, K. Shiraishi

    12th International Conference on Nitride Semiconductors (ICNS-12)  2017.7 

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    Event date: 2017.7

    Language:English  

    Country:France  

  • 窒化物半導体結晶成長モデリングの現状と課題 Invited

    寒川義裕, 白石賢二, 柿本浩一

    第9回ナノ構造・エピタキシャル成長講演会  2017.7 

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    Event date: 2017.7

    Language:Japanese   Presentation type:Oral presentation (invited, special)  

    Venue:北海道大学   Country:Japan  

  • GaN MOVPE法における結晶成長マルチフィジックスシミュレーション

    川上賢人, 山本芳裕, 芳松克則, 岡本直也, 寒川義裕, 柿本浩一, 白石賢二

    第9回ナノ構造・エピタキシャル成長講演会  2017.7 

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    Event date: 2017.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • GaN MOVPEにおけるTMG分解反応プロセスの理論的考察

    関口一樹, 白川裕規, 長川健太, 洗平昌晃, 寒川義裕, 柿本浩一, 白石賢二

    第9回ナノ構造・エピタキシャル成長講演会  2017.7 

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    Event date: 2017.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • AlInN薄膜成長における格子不整合と組成取り込み効率の相関

    稲富悠也, 寒川義裕, 伊藤智徳, 柿本浩一

    第9回ナノ構造・エピタキシャル成長講演会  2017.7 

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    Event date: 2017.7

    Language:Japanese  

    Venue:北海道大学   Country:Japan  

  • NH3化学吸着の非平衡状態発展:最急エントロピー勾配量子熱力学モデリング

    草場 彰, Guanchen Li, Michael R. von Spakovsky, 寒川義裕, 柿本浩一

    第9回ナノ構造・エピタキシャル成長講演会  2017.7 

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    Event date: 2017.7

    Language:Japanese  

    Venue:北海道大学   Country:Japan  

  • InGaN薄膜成長における格子不整合とIn組成の相関

    稲富悠也, 寒川義裕, 伊藤智徳, 柿本 浩一

    第64回応用物理学会春季学術講演会  2017.3 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜   Country:Japan  

  • OVPE成長条件下におけるGaN 非極性表面構造の第一原理計算

    河村貴宏, 北本啓, 今出完, 吉村政志, 森勇介, 森川良忠, 寒川義裕, 柿本浩一

    第64回応用物理学会春季学術講演会  2017.3 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜   Country:Japan  

  • エピタキシャル成長のマルチフィジックスシミュレーションの現状 Invited

    白石賢二, 関口一樹, 長川健太, 白川裕規, 川上賢人, 山本芳裕, 洗平昌晃, 永松謙太郎, 新田州吾, 岡本直也, 芳松克則, 寒川義裕, 柿本浩一, 天野浩

    第64回応用物理学会春季学術講演会  2017.3 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜   Country:Japan  

  • GaN MOVPEにおける結晶成長マルチフィジックス流動シミュレーション

    川上賢人, 山本芳裕, 芳松克則, 岡本直也, 寒川義裕, 柿本 浩一, 白石賢二

    第64回応用物理学会春季学術講演会  2017.3 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜   Country:Japan  

  • 活性化エネルギーを考慮したTMG分解プロセスの理論的考察

    関口一樹, 白川裕規, 長川健太, 洗平昌晃, 寒川義裕, 柿本 浩一, 白石賢二

    第64回応用物理学会春季学術講演会  2017.3 

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    Event date: 2017.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:横浜   Country:Japan  

  • Innovation of AlN solution growth technique Invited International conference

    Y. Kangawa

    Workshop on Ultra-Precision Processing for Wide Bandgap Semiconductors (WUPP 2016)  2016.10 

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    Event date: 2016.10 - 2016.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

  • Ab Initio-Based Approach to Crystal Growth of Nitride Semiconductors: Contribution of Growth Orientation and Surface Reconstruction Invited International conference

    Y. Kangawa

    International Workshop on Nitride Semiconductors 2016  2016.10 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • Consideration of MOVPE Growth Process of GaN by First Principles Calculations and Thermodynamic Analysis International conference

    K. Sekiguchi, H. Shirakawa, Y. Yamamoto, M. Araidai, Y. Kangawa, K. Kakimoto, K. Shiraishi

    International Workshop on Nitride Semiconductors 2016  2016.10 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • Influence of Growth Orientation on Driving Force for InN Deposition by MOVPE International conference

    A. Kusaba, Y. Kangawa, M. R. von Spakovsky, K. Shiraishi, K. Kakimoto, A. Koukitu

    International Workshop on Nitride Semiconductors 2016  2016.10 

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    Event date: 2016.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • First Principle and Thermodynamic Analysis of MOVPE Growth of GaN and AlN International conference

    K. Sekiguchi, H. Shirakawa, K. Chokawa, Y. Yamamoto, M. Araidai, Y. Kangawa, K. Kakimoto, K. Shiraishi

    2016 International Conference on Solid State devices and Materials (SSDM2016)  2016.9 

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    Event date: 2016.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • First Principles Based Simulation for Compound Semiconductor Growth Processes Invited International conference

    Y. Kangawa

    2016 International Conference on Solid State devices and Materials (SSDM 2016) Short Course  2016.9 

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    Event date: 2016.9

    Language:English   Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Country:Japan  

  • 窒化物半導体成長メカニズムの熱力学的考察

    関口 一樹, 白川 裕規, 長川 健太, 洗平 昌晃, 寒川 義裕, 柿本 浩一, 白石 賢二

    第77会応用物理学会秋季学術講演会  2016.9 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:新潟   Country:Japan  

  • GaN結晶成長シミュレーションの新展開: 第一原理計算に基づくアプローチ Invited

    寒川 義裕, 白石 賢二, 柿本 浩一

    第77会応用物理学会秋季学術講演会  2016.9 

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    Event date: 2016.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:新潟   Country:Japan  

  • Computational fluid dynamic approach coupled with thermodynamic analysis of driving force for deposition in GaN MOVPE International conference

    K. Yoshimatsu, N. Okamoto, Y. Kangawa, K. Kakimoto, K. Shiraishi

    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE18)  2016.8 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • MOCDV and CBE of GaAs1-xNx modeled by ab initio stabilities of (100) surfaces under As2, H2, and N2 International conference

    H. VALENCIA, Y. Kangawa, K. Kakimoto

    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE18)  2016.8 

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    Event date: 2016.8

    Language:English  

    Country:Japan  

  • Thermodynamic analysis of InN metalorganic vapor phase epitaxy: influence of growth orientation and surface reconstruction International conference

    A. Kusaba, Y. Kangawa, K. Kakimoto, K. Shiraishi, H. Amano, A. Koukitu

    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE18)  2016.8 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Contribution of lattice constraint to indium incorporation during coherent growth of InGaN International conference

    T. Tamura, A. Kusaba, Y. Kangawa, T. Ito, T. Suski, K. Kakimoto, A. Koukitu

    The 18th International Conference on Crystal Growth and Epitaxy (ICCGE18)  2016.8 

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    Event date: 2016.8

    Language:English  

    Country:Japan  

  • Thermodynamic analysis of In- and N-polar InN growth by metalorganic vapor phase epitaxy

    A. Kusaba, Y. Kangawa, K. Kakimoto, K. Shiraishi, A. Koukitu

    35th Electronic Materials Symposium  2016.7 

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    Event date: 2016.7

    Language:Japanese  

    Country:Japan  

  • 4H-SiC再構成表面における初期酸化過程に関する研究

    平山楓, 中村拓人, 村岡幸輔, 石井純子, 寒川 義裕, 黒木伸一郎, 内藤正路, 碇智徳

    平成 28 年度九州表面・真空研究会 2016  2016.6 

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    Event date: 2016.6

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • InN(0001)面および(000−1)面MOVPE成長の熱力学解析

    草場 彰, 寒川 義裕, 白石 賢二, 柿本 浩一, 纐纈明伯

    第8回窒化物半導体結晶成長講演会  2016.5 

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    Event date: 2016.5

    Language:Japanese  

    Venue:京都大学   Country:Japan  

  • 半導体材料の結晶成長~表面反応に関して第一原理計算と熱力学解析の視点から~ Invited

    寒川 義裕

    第29期CAMMフォーラム本例会  2016.1 

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    Event date: 2016.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:表参道アイビーホール   Country:Japan  

  • Ab initio-based approach to surface reconstruction on InN(0001) during induced-pressure MOVPE International conference

    A. Kusaba, Y. Kangawa, Y. Honda, H. Amano, K. Kakimoto

    The 6th International Symposium on Growth of III-Nitrides (ISGN-6)  2015.11 

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    Event date: 2015.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • InN加圧MOVPEにおけるファセット面制御によるポリタイプ制御 Invited

    寒川 義裕, 柿本 浩一

    第45回結晶成長国内会議  2015.10 

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    Event date: 2015.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • Relationship between stability of facet surfaces and incorporation of zinc-blende phase in InN during pressurized reactor MOVPE: A theoretical approach International conference

    A. Kusaba, Y. Kangawa, S. Krukowski, K. Kakimoto

    Fifth European Conference on Crystal Growth (ECCG-5)  2015.9 

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    Event date: 2015.9

    Language:English  

    Country:Italy  

  • Development of in-situ observation system for high-temperature liquid/solid interfaces: application to solid-source solution growth of AlN International conference

    Y. Kangawa, H. Miyake, M. Bockowski, K. Kakimoto

    Fifth European Conference on Crystal Growth (ECCG-5)  2015.9 

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    Event date: 2015.9

    Language:English  

    Country:Italy  

  • Development of in situ observation system for liquid/solid interface during solution growth of AlN Invited International conference

    Y. Kangawa, H. Miyake, M. Bockowski, K. Kakimoto

    Workshop on Ultra-Precision Processing for Wide Bandgap Semiconductors (WUPP2015)  2015.8 

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    Event date: 2015.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 窒化物半導体結晶成長用基板表面の第一原理計算による考察 Invited

    寒川 義裕

    日本学術振興会「ワイドギャップ半導体光・電子デバイス第162委員会」第94回研究会  2015.7 

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    Event date: 2015.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東京   Country:Japan  

  • Surface Energy and Facet Formation in InN films grown by Pressurized-Reactor MOVPE

    A. Kusaba, Y. Kangawa, S. Krukowski, T. Kimura, T. Tanikawa, R. Katayama, T. Matsuoka, K. Kakimoto

    34th Electronic Materials Symposium (EMS-34)  2015.7 

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    Event date: 2015.7

    Language:Japanese  

    Country:Japan  

  • InN加圧MOVPE成長における成長形と異相混入:表面エネルギーの理論解析

    草場 彰, 寒川 義裕, 柿本 浩一

    第7回窒化物半導体結晶成長講演会  2015.5 

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    Event date: 2015.5

    Language:Japanese  

    Venue:東北大学   Country:Japan  

  • AlN固体ソース溶液成長における固‐液界面形状のその場観察

    草場 彰, 住吉 央朗, 寒川 義裕, 三宅 秀人, 柿本 浩一

    第7回窒化物半導体結晶成長講演会  2015.5 

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    Event date: 2015.5

    Language:Japanese  

    Venue:東北大学   Country:Japan  

  • シードを用いた太陽電池用シリコンの結晶成長 Invited

    柿本 浩一, GAO BING, LIU XIN, 中野 智, 原田 博文, 宮村 佳児, 関口 隆史, 寒川 義裕

    第62回応用物理学会春季学術講演会  2015.3 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  • パワーデバイス用単結晶の結晶成長 Invited

    柿本 浩一, GAO BING, LIU XIN, 中野 智, 西澤 伸一, 原田 博文, 宮村 佳児, 関口 隆史, 寒川 義裕

    第62回応用物理学会春季学術講演会  2015.3 

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    Event date: 2015.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  • Theoretical aspects in growth of In-rich InGaN Invited International conference

    Y. Kangawa, K. Kakimoto

    SPIE 2015 Photonics West  2015.2 

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    Event date: 2015.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:United States  

  • SiC表面分解法によるステップ端近傍のグラフェン成長シミュレーション

    土井 優太, 井口 綾佑, 河村 貴宏, 鈴木 泰之, 寒川 義裕, 柿本 浩一

    第44回結晶成長国内会議(NCCG-44)  2014.11 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:学習院大学   Country:Japan  

  • 化合物半導体エピタキシーにおける量子計算科学の展開 Invited

    寒川義裕, 秋山 亨, 伊藤智徳, 白石賢二, 中山隆史

    第44回結晶成長国内会議(NCCG-44)  2014.11 

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    Event date: 2014.11

    Language:Japanese  

    Venue:学習院大学   Country:Japan  

  • 分子動力学法によるらせん転位を含む4H-SiCの歪エネルギー解析

    水谷充利, 河村 貴宏, 鈴木 泰之, 寒川 義裕, 柿本 浩一

    第44回結晶成長国内会議(NCCG-44)  2014.11 

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    Event date: 2014.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:学習院大学   Country:Japan  

  • Theoretical approach to growth mechanisms of InN by vapor phase epitaxy Invited International conference

    Y. Kangawa, K. Kakimoto

    2nd Intensive Discussion on Growth of Nitride Semiconductors (IDGN-2)  2014.10 

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    Event date: 2014.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • CL studies of AlN/AlN(0001) grown by solid source solution growth method International conference

    H. Sumiyoshi, Y. Kangawa, S. F. Chichibu, M. Knetzger, E. Meissner, Y. Iwasaki, K. Kakimoto

    International Workshop on Nitride Semiconductors 2014 (IWN2014)  2014.8 

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    Event date: 2014.8

    Language:English  

    Country:Poland  

  • 固体ソース溶液成長におけるAlN成長機構の解析

    住吉央朗, 寒川義裕, 秩父重英, M. Knetzger, E. Meissner, 岩崎洋介, 柿本 浩一

    第6回窒化物半導体結晶成長講演会  2014.7 

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    Event date: 2014.7

    Language:Japanese  

    Venue:名城大学   Country:Japan  

  • Theoretical study on structural stability of InN grown by pressurized-reactor MOVPE

    Y. Kangawa, T. Hamada, T. Kimura, R. Katayama, T. Matsuoka, K. Kakimoto

    33rd Electronic Materials Symposium  2014.7 

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    Event date: 2014.7

    Language:English  

    Country:Japan  

  • Structural Phase Diagram of InN by Pressurized-Reactor MOVPE: A Theoretical Study International conference

    Y. Kangawa, T. Hamada, T. Kimura, R. Katayama, T. Matsuoka, K. Kakimoto

    The 5th International Conference on White LEDs and Solid State Lighting (WLED-5)  2014.6 

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    Event date: 2014.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Korea, Republic of  

  • InN 加圧MOVPE 成長における立方晶混入メカニズム

    寒川 義裕, 濱田 達郎, 木村 健司, 片山 竜二, 松岡 隆志, 柿本 浩一

    2014年 第61回 応用物理学会春季学術講演会  2014.3 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:青山学院大学   Country:Japan  

  • 電力変換の高効率化に向けた次世代パワーデバイス用AlN結晶の開発 Invited

    寒川 義裕

    九州大学共進化社会システム創成拠点フォーラム  2014.3 

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    Event date: 2014.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:市ヶ谷   Country:Japan  

  • 固体ソース溶液成長法により作製したAlN の光学測定

    寒川 義裕, 石川陽一, 田代公則, 古澤健太郎, 秩父重英, 柿本 浩一

    第13回 東北大学多元物質科学研究所 研究発表会  2013.12 

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    Event date: 2013.12

    Language:Japanese  

    Venue:仙台   Country:Japan  

  • InN高圧MOVPE成長における構造多形の制御に関する理論検討

    濱田 達郎, 屋山 巴, 寒川 義裕, 柿本 浩一

    平成25年度応用物理学会九州支部学術講演会  2013.11 

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    Event date: 2013.11 - 2013.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  • Influence of growth direction on threading dislocation annihilation process in AlN grown by 3SG method International conference

    H. Suetsugu, Y. Kangawa, S. Nagata, K. Kakimoto

    6th KAIST-Kyushu University Symposium on Aerospace Engineering  2013.11 

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    Event date: 2013.11

    Language:English  

    Country:Korea, Republic of  

  • Stabilities of GaAs(100) Surfaces under As2, H2, and N2 Conditions as a Model for Vapor-Phase Epitaxy of GaAs1-xNx: a First-Principles Study

    2013.11 

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    Event date: 2013.11

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Microstructure of AlN/AlN(0001) grown by solid-source solution growth (3SG) method Invited International conference

    Y. Kangawa, S. Nagata, K. Kakimoto

    8th International Workshop on Bulk Nitride Semiconductors (IWBNS-VIII)  2013.10 

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    Event date: 2013.9 - 2013.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Germany  

  • Designing vicinal direction of SiC(0001) for epitaxial graphene growth International conference

    M. Inoue, Y. Kangawa, H. Kageshima, S. Tanaka, K. Kakimoto

    2013.9 

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    Event date: 2013.9 - 2013.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Dislocation propagation behavior in AlN grown by solid-source solution growth (3SG) method Invited International conference

    Y. Kangawa, S. Nagata, B. M. Epelbaum, K. Kakimoto

    JSAP-MRS Joint Symposia  2013.9 

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    Event date: 2013.9

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • The orientation dependence of In incorporation of InGaN: The role of N-H layer International conference

    T. Yayama, Y. Kangawa, K. Kakimoto

    JSAP-MRS Joint Symposia  2013.9 

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    Event date: 2013.9

    Language:English  

    Country:Japan  

  • Investigation of growth process of MBE growth of GaN under Ga-rich conditions by molecular dynamics International conference

    T. Kawamura, H. Hayashi, M. Amekawa, Y. Suzuki, Y. Kangawa, K. Kakimoto

    JSAP-MRS Joint Symposia  2013.9 

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    Event date: 2013.9

    Language:English  

    Country:Japan  

  • Structural control of C clustering at SiC(0001) steps International conference

    M. Inoue, Y. Kangawa, H. Kageshima, K. Kakimoto

    JSAP-MRS Joint Symposia  2013.9 

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    Event date: 2013.9

    Language:English  

    Country:Japan  

  • The role of N-H molecular layer on the surface for high quality In-rich InGaN growth by MOVPE International conference

    T. Yayama, Y. Kangawa, K. Kakimoto

    International Symposium on Innovative Materials for Processes in Energy Systems 2013 (IMPRES2013)  2013.9 

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    Event date: 2013.9

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • SiC表面分解法によるグラフェン成長の分子動力学シミュレーション

    井口綾佑, 河村貴宏, 鈴木泰之, 井上仁人, 寒川義裕, 柿本 浩一

    第74回応用物理学会秋季学術講演会  2013.9 

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    Event date: 2013.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:同志社大学   Country:Japan  

  • Structural controllability of C clusters by template effect of SiC step Invited International conference

    M. Inoue, Y. Kangawa, H. Kageshima, K. Kakimoto

    17th International Conference on Crystal Growth and Epitaxy (ICCGE-17)  2013.8 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • Influence of growth orientation on microstructure of AlN grown by solid-source solution growth (3SG) method International conference

    Y. Kangawa, S. Nagata, B. M. Epelbaum, K. Kakimoto

    17th International Conference on Crystal Growth and Epitaxy (ICCGE-17)  2013.8 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • Ab initio Study of GaAs(100) Surfaces Under As2, H2, and N2 Influence, as a Model for Vapor-Phase Epitaxy of GaAs1-xNx International conference

    H. Valencia, Y. Kangawa, K. Kakimoto

    17th International Conference on Crystal Growth and Epitaxy (ICCGE-17)  2013.8 

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    Event date: 2013.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Poland  

  • Innovation on Solution Growth Technique of Bulk AlN Invited International conference

    Y. Kangawa

    Colloquium in Fraunhofer IISB  2013.4 

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    Event date: 2013.4

    Language:English   Presentation type:Oral presentation (invited, special)  

    Country:Germany  

  • 固体窒素原料を用いたAlN溶液成長法の開発 Invited

    寒川義裕

    平成25年度資源素材学会春季大会  2013.3 

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    Event date: 2013.3

    Presentation type:Oral presentation (general)  

    Venue:千葉工業大学   Country:Japan  

  • GaN薄膜成長におけるN原子取り込み過程の分子動力学シミュレーション

    河村貴宏, 三木貴文, 鈴木泰之, 寒川 義裕, 柿本 浩一

    第60回応用物理学会春季学術講演会  2013.3 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工業大学   Country:Japan  

  • C凝集過程におけるSiC(0001)ステップのテンプレート効果

    井上仁人, 寒川 義裕, 影島博之, 柿本 浩一

    第60回応用物理学会春季学術講演会  2013.3 

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    Event date: 2013.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:神奈川工業大学   Country:Japan  

  • 太陽電池用III族窒化物半導体の成膜プロセスの理論検討 Invited

    寒川義裕

    第5回半導体デバイス若手ワークショップ  2013.3 

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    Event date: 2013.3

    Presentation type:Oral presentation (general)  

    Venue:宮崎市   Country:Japan  

  • Tight-binding approach to C clustering at a step of SiC(0001) International conference

    M. Inoue, Y. Kangawa, H. Kageshima, K. Kakimoto

    5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomatarials (ISPlasma2013)  2013.1 

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    Event date: 2013.1 - 2013.2

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • エピタキシャルグラフェン成長初期のC凝集課程-SiC表面構造とCクラスター構造の相関- Invited

    井上仁人、寒川義裕

    第5回九大グラフェン研究会「グラフェンナノ構造の形成と物性」  2013.1 

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    Event date: 2013.1

    Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • 創エネ・省エネに向けた窒化物半導体材料開発 Invited

    寒川義裕

    第28回太陽光発電プロジェクト講演会  2013.1 

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    Event date: 2013.1

    Presentation type:Oral presentation (general)  

    Venue:宮崎大学   Country:Japan  

  • Theoretical analysis for N incorporation in GaAsN grown by vapor phase epitaxy Invited International conference

    J. Kawano, Y. Kangawa, K. Kakimoto, A. Koukitu

    Collaborative Conference on Crystal Growth (3CG) 2012  2012.12 

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    Event date: 2012.12

    Presentation type:Oral presentation (general)  

    Country:United States  

  • The influence of the topmost nitrogen atoms on In incoporation efficiency during InGaN MOVPE growth Invited International conference

    T. Yayama, Y. Kangawa, K. Kakimoto

    Collaborative Conference on Crystal Growth (3CG) 2012  2012.12 

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    Event date: 2012.12

    Presentation type:Oral presentation (general)  

    Country:United States  

  • AlN溶液成長に向けたAlN(0001)基板前処理~水素ガスエッチング条件の最適化~

    末次 弘茂, 梶原 隆司, 寒川 義裕, 永田 俊郎, 田中 悟, 柿本 浩一

    平成24年度応用物理学会九州支部講演会  2012.12 

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    Event date: 2012.12

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:佐賀大学   Country:Japan  

  • 太陽電池用窒化物エピタキシャル成長機構の理論検討 Invited

    寒川義裕、川野潤、Hubert Valencia、柿本浩一

    第42回結晶成長国内会議  2012.11 

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    Event date: 2012.11

    Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • SiCステップにおけるC原子グラフェン化過程への理論的アプローチ

    井上仁人、寒川義裕、影島博之、若林克法、柿本浩一

    第42回結晶成長国内会議(NCCG-42)  2012.11 

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    Event date: 2012.11

    Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • MOVPE成長条件下におけるInN(10-1-1)面の表面構造に関する理論検討

    屋山 巴、寒川義裕、柿本浩一

    第42回結晶成長国内会議(NCCG-42)  2012.11 

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    Event date: 2012.11

    Presentation type:Symposium, workshop panel (public)  

    Venue:九州大学   Country:Japan  

  • SiC結晶成長の分子動力学シミュレーション

    速水義之, 河村貴宏, 鈴木泰之, 寒川義裕, 柿本 浩一

    第42回結晶成長国内会議(NCCG-42)  2012.11 

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    Event date: 2012.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • Applicability of solid-source solution growth (3CG) method to the AlN bulk growth Invited International conference

    Y. Kangawa, B. M. Epelbaum, K. Kakimoto

    Intensive Discussion on Growth of Nitride Semiconductors  2012.10 

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    Event date: 2012.10

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • TEM analysis of bulk AlN grown by solid source solution growth method International conference

    Y. Kangawa, N. Kuwano, B. M. Epelbaum, K. Kakimoto

    International Workshop on Nitride Semiconductors 2012  2012.10 

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    Event date: 2012.10

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Theoretical investigation of the influence of growth orientation of indium incorporation efficiency during InGaN thin film growth by MOVPE International conference

    T. Yayama, Y. Kangawa, K. Kakimoto

    International Workshop on Nitride Semiconductors 2012  2012.10 

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    Event date: 2012.10

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Development of molecular dynamics simulation for molecular beam epitaxy of GaN under Ga-rich conditios International conference

    T. Kawamura, T. Miki, Y. Suzuki, Y. Kangawa, K. Kakimoto

    International Workshop on Nitride Semiconductors (IWN2012)  2012.10 

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    Event date: 2012.10

    Language:English  

    Country:Japan  

  • 量子論的アプローチによる表面状態図の作成 Invited

    寒川義裕、柿本浩一

    第36回結晶成長討論会  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Venue:唐津市   Country:Japan  

  • 極性・半極性面上InGaN MOVPEにおけるIn取り込み効率の理論検討

    屋山 巴、寒川義裕、柿本浩一

    第36回結晶成長討論会  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Venue:唐津市   Country:Japan  

  • SiCステップによるクラスタリングCのグラフェン化作用

    井上仁人、寒川義裕、影島博之、柿本浩一

    第36回結晶成長討論会  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Venue:唐津市   Country:Japan  

  • SiC(0001)ステップにおける C 原子凝集過程の理論検討

    井上仁人、寒川義裕、影島博之、若林克法、柿本浩一

    第73回応用物理学会学術講演会  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Venue:愛媛大学・松山大学   Country:Japan  

  • 過剰Ga条件下におけるGaNのMBE成長シミュレーションの開発

    三木貴文, 河村貴宏, 鈴木泰之, 寒川 義裕, 柿本 浩一

    第73回応用物理学会学術講演会  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Venue:愛媛大学・松山大学   Country:Japan  

  • MOVPE法によるInGaN薄膜成長におけるIn取り込み量の面方位依存性

    屋山 巴、寒川義裕、柿本浩一

    第73回応用物理学会学術講演会  2012.9 

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    Event date: 2012.9

    Presentation type:Oral presentation (general)  

    Venue:愛媛大学・松山大学   Country:Japan  

  • First principles approach to C aggregation process during 0th graphene growth on SiC(0001) International conference

    M. Inoue, H. Kageshima, Y. Kangawa, K. Kakimoto

    International Conference on the Physics of Semiconductors (ICPS 2012)  2012.7 

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    Event date: 2012.7 - 2012.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Switzerland  

  • Solid-source solution growth (3SG) method for bulk AlN growth International conference

    Y. Kangawa, N. Kuwano, B. M. Epelbaum, K. Kakimoto

    4th International Symposium on Growth of III-Nitrides (ISGN-4)  2012.7 

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    Event date: 2012.7

    Presentation type:Oral presentation (general)  

    Country:Russian Federation  

  • Theoretical investigation of the influence of growth orientation on indium incorporation efficiency during InGaN growth by MOVPE

    T. Yayama, Y. Kangawa, K. Kakimoto

    2012.7 

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    Event date: 2012.7

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Influence of substrate orientation on In incorporation efficiency of InGaN grown by MOVPE -Theoretical approach on growth process/kinetics of InGaN- Invited International conference

    Y. Kangawa

    16th International Conference on MetalOrganic Vapor Phase Epitaxy (ICMOVPE-16)  2012.5 

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    Event date: 2012.5

    Language:English   Presentation type:Symposium, workshop panel (public)  

    Country:Korea, Republic of  

  • AlN 厚膜成長技術の提案~固体ソース溶液成長法~ Invited

    寒川義裕、柿本浩一

    第4回窒化物半導体結晶成長講演会  2012.4 

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    Event date: 2012.4

    Presentation type:Oral presentation (general)  

    Venue:東京大学   Country:Japan  

  • InGaN薄膜におけるIn取り込み量の面方位依存性に関する新規モデルの提案

    屋山巴,寒川義裕、柿本浩一

    第4回窒化物半導体結晶成長講演会  2012.4 

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    Event date: 2012.4

    Venue:東京大学   Country:Japan  

  • InGaN薄膜成長におけるIn取り込み量の面方位依存性に関する理論検討

    屋山 巴,寒川 義裕, 柿本 浩一

    第59回応用物理学関係連合講演会  2012.3 

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    Event date: 2012.3

    Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • オンチップ光配線用窒化物基板の創製とシステム熱設計支援-固体ソース溶液成長法によるAlN 単結晶の作製- Invited

    寒川義裕

    第59回応用物理学関係連合講演会  2012.3 

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    Event date: 2012.3

    Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • SiC(0001)上グラフェン成長初期 C 凝集過程の第一原理計算による検討

    井上 仁人,影島 愽之,寒川 義裕,柿本 浩一

    第59回応用物理学関係連合講演会  2012.3 

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    Event date: 2012.3

    Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • 数値解析を用いた太陽電池用多結晶シリコン育成中における

    中野 智, 高 冰, 原田 博文,関口 隆史,李 維東,寒川 義裕,柿本 浩一

    第59回応用物理学関係連合講演会  2012.3 

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    Event date: 2012.3

    Presentation type:Oral presentation (general)  

    Venue:早稲田大学   Country:Japan  

  • 高効率多接合太陽電池材料の作製指針に関する理論検討 Invited

    寒川義裕

    H23年度(第20回)太陽光発電プロジェクト講演会  2012.3 

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    Event date: 2012.3

    Presentation type:Oral presentation (general)  

    Venue:宮崎市   Country:Japan  

  • Surface model of impurity incorporation in III-V-N semiconductors for multi-junction solar cell Invited International conference

    Y. Kangawa, J. Kawano, K. Kakimoto

    International Symposium on Innovative Solar Cells 2012  2012.3 

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    Event date: 2012.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • 分子動力学法によるSiC結晶中の点欠陥の拡散挙動解析

    速水義之, 河村貴宏, 鈴木泰之, 寒川義裕, 柿本 浩一

    第59回応用物理学会春季学術講演会  2012.3 

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    Event date: 2012.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:早稲田   Country:Japan  

  • SiC熱分解によるグラフェン成長の初期過程-C凝集過程の基板傾斜方向依存性- Invited

    井上 仁人, 寒川 義裕,柿本 浩一

    結晶成長:実験と理論の最新の展開 (低温研ワークショップ)  2012.2 

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    Event date: 2012.2

    Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • 固体ソース溶液成長法により作製したAlN厚膜中の微細組織 Invited

    寒川義裕、柿本浩一

    阪大産研 若手セミナー  2012.2 

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    Event date: 2012.2

    Presentation type:Oral presentation (general)  

    Venue:大阪大学   Country:Japan  

  • Dependence of Graphene growth mechanism on SiC(0001) surface orientation Invited International conference

    Masato Inoue, Yoshihiro Kangawa, Koichi Kakimoto

    2012.1 

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    Event date: 2012.1

    Country:Japan  

  • 固体ソースAlN溶液成長技術の提案 Invited

    寒川義裕、柿本浩一

    第154回KASTECセミナー  2012.1 

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    Event date: 2012.1

    Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • N substitution in GaAs(001) surface under an atomosphere of hydrogen International conference

    Jun Kawano, Yoshihiro Kangawa, Koichi Kakimoro

    21th International Photovoltaic Science and Engineering Conference  2011.12 

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    Event date: 2011.11 - 2011.12

    Country:Japan  

  • 固体原料を用いたAlN 溶液成長法の提案 Invited

    寒川義裕、柿本浩一

    第41回結晶成長国内会議  2011.11 

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    Event date: 2011.11

    Presentation type:Oral presentation (general)  

    Venue:つくば国際会議場   Country:Japan  

  • 水素吸着GaAs表面におけるN取り込み過程の第一原理計算による考察

    川野潤、寒川義裕、柿本浩一

    第41回結晶成長国内会議  2011.11 

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    Event date: 2011.11

    Presentation type:Oral presentation (general)  

    Venue:つくば国際会議場   Country:Japan  

  • N原子の拡散を制御したGaN溶液成長シミュレーション

    河村貴宏, 寒川義裕, 柿本 浩一, 小竹茂夫, 鈴木泰之

    第41回結晶成長国内会議(NCCG-41)  2011.11 

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    Event date: 2011.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:つくば国際会議場   Country:Japan  

  • Theoretical approach to anisotropic growth mechanism of graphene on a vicinal SiC (0001) surface International conference

    M. Inoue, Y. Kangawa, H. Kageshima, K. Wakabayashi, K. Kakimoto

    22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides 2011  2011.9 

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    Event date: 2011.9

    Country:Germany  

  • Growth of AlN using Li-Ga-N solution International conference

    R. Toki, Y. Kangawa, K. Kakimoto

    22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes and Nitrides 2011  2011.9 

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    Event date: 2011.9

    Country:Germany  

  • [1100]方向微傾斜SiC(0001)面における0層グラフェンの異方成長機構

    井上 仁人,寒川 義裕,影島 愽之,若林 克法,柿本 浩一

    第72回応用物理学会学術講演会  2011.9 

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    Event date: 2011.8 - 2011.9

    Presentation type:Oral presentation (general)  

    Venue:山形大学   Country:Japan  

  • 水素吸着GaAs表面におけるN取り込み過程の第一原理計算による考察

    川野 潤,寒川 義裕,柿本 浩一

    第72回応用物理学会学術講演会  2011.8 

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    Event date: 2011.8 - 2011.9

    Presentation type:Oral presentation (general)  

    Venue:山形大学   Country:Japan  

  • 表面ヘキサゴナリティと二次元核生成理論に基づいたSiC結晶多形の圧力温度依存性の解析

    白桃 拓哉,高 冰,中野 智,西澤 伸一,寒川 義裕,柿本 浩一

    第72回応用物理学会学術講演会  2011.9 

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    Event date: 2011.8 - 2011.9

    Presentation type:Oral presentation (general)  

    Venue:山形大学   Country:Japan  

  • GaN溶液成長におけるN原子の拡散挙動の数値解析

    河村貴宏, 寒川義裕, 柿本 浩一, 小竹茂夫, 鈴木泰之

    第72回応用物理学会秋季学術講演会  2011.8 

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    Event date: 2011.8

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:山形大学   Country:Japan  

  • Thermodynamical analysis of polytype stability during PVT growth of SiC using 2D nucleation theory International conference

    Takuya SHIRAMOMO, Bing GAO, Frederic MERCIER, Shin-ichi NISHIZAWA, Satoshi NAKANO, Yoshihiro KANGAWA, Koichi KAKIMOTO

    The 18th American Conference on Crystal Growth and Epitaxy  2011.8 

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    Event date: 2011.7 - 2011.8

    Country:United States  

  • Theoretical approach to anisotropic growth process of graphene on vicinal SiC(0001) surfaces tilting toward [1100]

    M. Inoue, Y. Kangawa, H. Kageshima, K. Wakabayashi, K. Kakimoto

    2011.6 

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    Event date: 2011.6

    Country:Japan  

  • THERMODYNAMIC ANALYSIS FOR THE PREDICTION OF N COMPOSITION IN COHERENTLY GROWN GaAsN FOR A MULTI- International conference

    Jun Kawano, Yoshihiro Kangawa, Tomoe Yayama, Tomonori Ito, Koichi Kakimoto, Akinori Koukitu

    THE 37th IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE  2011.6 

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    Event date: 2011.6

    Country:United States  

  • Li-Al-N系溶液を用いたAlN結晶成長

    土岐隆太郎,寒川義裕,屋山 巴,柿本 浩一

    第3回窒化物半導体結晶成長講演会  2011.6 

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    Event date: 2011.6

    Venue:九州大学   Country:Japan  

  • InGaN薄膜作製におけるIn取り込み量の面方位依存性に関する理論検討

    屋山 巴,川野 潤,寒川 義裕,柿本 浩一,纐纈 明伯

    第3回窒化物半導体結晶成長講演会  2011.6 

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    Event date: 2011.6

    Venue:九州大学   Country:Japan  

  • 太陽電池用多結晶シリコン中の軽元素濃度の制御

    柿本浩一,Bing Gao,中野 智,寒川義裕

    2011年春季第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3 - 2011.4

    Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  • GaN 溶液成長初期過程の分子動力学シミュレーション

    河村貴宏,寒川義裕,柿本浩一,小竹茂夫,鈴木泰之

    2011年春季第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3 - 2011.4

    Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  • SiC溶液成長における炉内温度分布が結晶成長速度へ与える影響

    乾 史憲,高 冰,中野 智,寒川義裕,柿本浩一

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Venue:神奈川工大   Country:Japan  

  • 2 次元核生成に基づいた SiC 結晶多形の圧力温度依存性の解析

    白桃拓哉,柿本浩一,高 冰,中野 智,寒川義裕,西澤伸一

    2011年春季第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Presentation type:Oral presentation (general)  

    Venue:神奈川工科大学   Country:Japan  

  • PVT を用いたSiC 結晶成長における結晶多型の安定性解析

    柿本浩一,白桃拓哉,高 冰,中野 智,寒川義裕,西澤伸一

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Venue:神奈川工大   Country:Japan  

  • 水素吸着したGaAs(N)表面における窒素取り込み

    川野 潤,寒川 義裕,柿本 浩一

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Venue:神奈川工大   Country:Japan  

  • 熱力学解析によるGaAsN成長における原料ガスの違いによる影響の検討

    川野 潤,寒川 義裕,屋山 巴,柿本 浩一, 纐纈 明伯

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Venue:神奈川工大   Country:Japan  

  • InGaN成長におけるIn取り込み量の面方位依存性に関する理論検討

    屋山 巴,川野 潤,寒川義裕,柿本浩一, 纐纈明伯

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Venue:神奈川工大   Country:Japan  

  • AlN バルク成長に向けた2相溶液成長法の提案

    寒川義裕、土岐隆太郎、屋山巴、柿本浩一

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Venue:神奈川工大   Country:Japan  

  • [1100]方向微傾斜SiC 表面におけるグラフェンの異方成長機構

    井上仁人,寒川義裕,影島愽之,若林克法,柿本浩一

    2011年春季 第58回応用物理学関係連合講演会  2011.3 

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    Event date: 2011.3

    Venue:神奈川工大   Country:Japan  

  • Two-phase-solution growth of AlN on self-nucleated AlN crystal Invited International conference

    Y. Kangawa, B. M. Epelbaum, K. Kakimoto

    IWBNS-7 (7th International Workshop on Bulk Nitrides Semiconductors)  2011.3 

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    Event date: 2011.3

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Molecular Dynamics Simulation of Solution Growth of GaN International conference

    T. Kawamura, Y. Kangawa, K. Kakimoto, S. Kotake, Y. Suzuki

    3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  2011.3 

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    Event date: 2011.3

    Country:Japan  

  • 微傾斜SiC(0001)面におけるグラフェン核形成機構の傾斜方向依存性

    井上仁人,寒川義裕,柿本浩一

    第3回九大グラフェン研究会  2011.2 

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    Event date: 2011.2

    Presentation type:Oral presentation (general)  

    Venue:九大 筑紫キャンパス   Country:Japan  

  • SiC結晶成長の最近の発展

    柿本浩一、Gao Bing、X. J. Chen, 白桃拓哉、中野 智、寒川義裕、西澤伸一

    パワーデバイス用シリコンおよび関連半導体材料に関する研究会  2011.1 

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    Event date: 2011.1

    Presentation type:Oral presentation (general)  

    Venue:新潟大学   Country:Japan  

  • 分子動力学法によるGaNの溶液成長シミュレーション

    河村 貴宏,小竹 茂夫,鈴木 泰之,寒川 義裕,柿本 浩一

    窒化物・ナノエレクトロニクス材料研究センター講演会  2010.11 

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    Event date: 2010.11

    Venue:東北大学   Country:Japan  

  • Effect of heater transfer rate on maximum dislocation density in multicrystalline silicon grown by the travelling heater method (THM) International conference

    S. Hisamatsu, S. Nakano, X. J. Chen, Y. Kangawa, K. Kakimoto

    The 4th International Workshop on Science and Technology of Crystalline Si Solar Cells (CSSC4)  2010.10 

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    Event date: 2010.10

    Presentation type:Oral presentation (general)  

    Country:Taiwan, Province of China  

  • SiC溶液成長における低周波電磁撹拌の影響

    乾 史憲,高 冰,中野 智,寒川 義裕,柿本 浩一

    第19回SiC及び関連ワイドギャップ半導体研究会  2010.10 

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    Event date: 2010.10

    Venue:筑波国際会議場   Country:Japan  

  • Theoretical analysis of N composition in epitaxially grown GaAsN for multi-junction solar cell International conference

    J. Kawano, K. Ikeda, Y. Kangawa, K. Kakimoto

    3rd International Symposium on Innovative Solar Cells  2010.10 

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    Event date: 2010.10

    Country:Japan  

  • Prediction of N composition in coherently grown GaAsN thin films for multi-junction solar cell International conference

    J. Kawano, Y. Kangawa, K. Kakimoto

    3rd Super High Efficiency Solar Cell Workshop  2010.10 

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    Event date: 2010.10

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • SiC溶液成長における低周波電磁撹拌の影響

    乾 史憲,高 冰,中野 智,寒川義裕,柿本浩一

    2010年秋季第71回応用物理学会学術講演会  2010.9 

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    Event date: 2010.9

    Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  • 熱力学解析によるGaAsN成長における基盤拘束の寄与の検討

    川野 潤, 池田和磨, 寒川義裕, 柿本浩一, 纐纈明伯

    2010年秋季第71回応用物理学会学術講演会  2010.9 

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    Event date: 2010.9

    Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  • SiC表面におけるグラフェン成長の初期過程

    井上仁人, 寒川義裕, 若林克法,影島博之,柿本浩一

    2010年秋季第71回応用物理学会学術講演会  2010.9 

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    Event date: 2010.9

    Presentation type:Oral presentation (general)  

    Venue:長崎大学   Country:Japan  

  • Differential thermal analysis of Li3N-Al pseudobinary system for AlN growth International conference

    T. Yayama, Y. Kangawa, K. Kakimoto

    The 16th. International Conference on Crystal Growth (ICCG-16)  2010.8 

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    Event date: 2010.8

    Country:China  

  • III-V-N系半導体成長シミュレーターの研究開発

    川野 潤, 池田和磨, 寒川義裕, 柿本浩一

    NEDO新エネルギー技術成果報告会2010  2010.7 

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    Event date: 2010.7

    Venue:東京国際フォーラム   Country:Japan  

  • Tight-binding approach to initial stage of graphitization on SiC surface

    2010.7 

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    Event date: 2010.7

    Country:Japan  

  • AlN成長に向けたLi3N-Al擬二元系状態図

    屋山 巴, 寒川 義裕,柿本 浩一

    第29回電子材料シンポジウム  2010.7 

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    Event date: 2010.7

    Venue:伊豆修善寺   Country:Japan  

  • Calculation of Phase Diagrams of Li3N-Al pseudo binary system for AlN Growth International conference

    T. Yayama, Y. Kangawa, K. Kakimoto

    The 3rd International Symposium on Growth of III-Nitride 2010 (ISGN-3)  2010.7 

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    Event date: 2010.7

    Country:France  

  • AlN溶液成長に向けたLi3N-Al擬二元系状態図解析

    屋山 巴, 寒川 義裕, 柿本 浩一

    2010年第2回窒化物半導体結晶成長講演会  2010.5 

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    Event date: 2010.5

    Venue:三重大学   Country:Japan  

  • AlN溶液成長に向けたLi-Al-N三元系状態図解析

    屋山 巴, 寒川 義裕, 柿本 浩一

    2010年春季第57回応用物理学会学術講演会  2010.3 

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    Event date: 2010.3

    Presentation type:Oral presentation (general)  

    Venue:東海大学   Country:Japan  

  • Calculation of phase diagram for the growth of III-V-N semiconductors in multi-junction solar cell International conference

    K. Ikeda, Y. Kangawa, K. Kakimoto

    2nd International Symposium on Innovative Solar Cells  2009.12 

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    Event date: 2009.12

    Country:Japan  

  • Structural stability of strained GaAsN layer in multi-junction solar cell International conference

    K. Ikeda, Y. Kangawa, K. Kakimoto

    2nd Super High Efficiency Solar Cell Workshop  2009.12 

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    Event date: 2009.12

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Theoritical analyses of In incorporation and compositionalinstability in coherently grown InGaN thin films International conference

    T. Yayama, Y. Kangawa, K. Kakimoto, A. Koukitu

    8th International Conference on Nitride Semiconductors  2009.10 

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    Event date: 2009.10

    Country:Korea, Republic of  

  • AlN synthesis on AlN/SiC template using Li-Al-N solvent International conference

    Y. Kangawa, K. Kakimoto

    8th International Conference on Nitride Semiconductors  2009.10 

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    Event date: 2009.10

    Country:Korea, Republic of  

  • Numerical investigation of heat and mass transfer during a unidirectional solidification process in crystalline silicon for solar cells International conference

    Koichi KAKIMOTO, Lijun Liu, X. J. Chen, Hitoshi Matsuo, Hiroaki Miyazawa, Sho Hisamatsu, Satoshi Nakano and Yoshihiro Kangawa

    216th ECS Meeting  2009.10 

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    Event date: 2009.10

    Presentation type:Oral presentation (general)  

    Country:Austria  

  • Numerical analysis of mc-Si crystal growth International conference

    K. Kakimoto, H. Matsuo, S. Hisamatsu, B. Ganesh, G. Bing, X.J. Chen, L. Liu, H. Miyazawa and Y. Kangawa

    GADEST 2009  2009.9 

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    Event date: 2009.9 - 2009.10

    Presentation type:Oral presentation (general)  

    Country:Germany  

  • Li-Al-N 溶液を用いたAlN/SiC テンプレート上へのAlN 成長

    寒川義裕、柿本浩一

    2009年秋季第70回応用物理学会学術講演会  2009.9 

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    Event date: 2009.9

    Presentation type:Oral presentation (general)  

    Venue:富山大学   Country:Japan  

  • Possibility of AlN growth using Li-Al-N solvent Invited International conference

    Y. Kangawa, K. Kakimoto

    6th International Workshop on Bulk Nitride Semiconductors (IWBNS-VI)  2009.8 

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    Event date: 2009.8

    Presentation type:Oral presentation (general)  

    Country:Poland  

  • 炉内ガス反応を考慮した太陽電池用シリコン結晶中の軽元素の分布解析 Invited

    久松翔,Bing Gao,X. J. Chen,中野智,寒川義裕,柿本浩一

    日本学術振興会第145委員会 第118回研究会  2009.7 

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    Event date: 2009.7

    Presentation type:Oral presentation (general)  

    Venue:九州大学C-CUBE筑紫ホール   Country:Japan  

  • Microstructures in AlN/sapphire grown by vapor phase epitaxy using Al and Li3N

    Y. Kangawa, N. Kuwano and K. Kakimoto

    28th Electronic Materials Symposium  2009.7 

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    Event date: 2009.7

    Country:Japan  

  • Control of indium composition in coherently grown InGaN thin films

    T. Yayama, Y. Kangawa, K. Kakimoto and A. Koukitu

    28th Electronic Materials Symposium  2009.7 

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    Event date: 2009.7

    Country:Japan  

  • 基板拘束を受けたInGaN薄膜におけるIn取り込み量の予測

    2009年第1回窒化物半導体結晶成長講演会  2009.5 

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    Event date: 2009.5

    Venue:東京農工大学   Country:Japan  

  • 太陽電池用多結晶Si中のSi2N2OとSi3N4の析出に関する数値解析

    久松 翔,松尾 整,中野 智,寒川 義裕,柿本 浩一

    2009年春季第56回応用物理学関係連合講演会  2009.4 

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    Event date: 2009.3 - 2009.4

    Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  • 基板拘束を受けたInGaN薄膜の組成制御に関する理論検討

    屋山 巴,寒川 義裕,柿本 浩一,纐纈明伯

    2009年春季第56回応用物理学関係連合講演会  2009.3 

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    Event date: 2009.3 - 2009.4

    Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  • 太陽電池用多結晶シリコン中の析出物が微結晶形成に及ぼす影響

    松尾 整,久松 翔,寒川 義裕,柿本 浩一

    2009年春季第56回応用物理学関係連合講演会  2009.4 

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    Event date: 2009.3 - 2009.4

    Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  • Li3Nを窒素源とする気相成長により作製したAlN/sapphireの微細組織観察

    寒川義裕、長野利彦、江崎哲也、桑野範之、柿本浩一

    2009年春季第56回応用物理学関係連合講演会  2009.4 

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    Event date: 2009.3 - 2009.4

    Presentation type:Oral presentation (general)  

    Venue:筑波大学   Country:Japan  

  • Distributions of light elements and their precipitations grown by unidirectional solidification in multicrystalline silicon for solar cell International conference

    H. Matsuo, S. Hisamatsu, Y. Kangawa, S. Nakano, K. Arafune, Y. Ohshita, M. Yamaguchi, K. Kakimoto

    ISTC/CSTIC 2009  2009.3 

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    Event date: 2009.3

    Country:China  

  • Control of In composition in InGaN thin films for multi-junction solar cells International conference

    Y. Kangawa, T. Yayama, K. Kakimoto, A. Koukitu

    International Symposium on Innovative Solar Cells 2009  2009.3 

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    Event date: 2009.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Theoretical approach to control of In composition in InGaN for multijunction solar cells Invited International conference

    Y. Kangawa, K. Kakimoto

    Super high efficiency solar cell workshop  2009.2 

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    Event date: 2009.2

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 数値解析による太陽電池用多結晶Si中のSi2N2O析出領域の検討

    久松翔1,松尾整1,中野智2,寒川義裕1,2,柿本浩一1,2

    第38回日本結晶成長学会国内会議  2008.11 

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    Event date: 2008.11

    Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • Li3Nを窒素源とするAlNバルク成長における酸素混入の影響

    長野利彦1,寒川義裕1,2,柿本浩一1,2

    第38回日本結晶成長学会国内会議  2008.11 

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    Event date: 2008.11

    Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • 太陽電池用多結晶シリコン中の軽元素および析出物の分布に関する考察

    松尾整1、久松翔1、寒川義裕1, 2、新船幸二3, 4、大下祥雄3、山口真史3、柿本浩一1, 2

    第38回日本結晶成長学会国内会議  2008.11 

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    Event date: 2008.11

    Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • 立方晶GaNエピ成長における成長形の制御 Invited

    寒川義裕、秋山亨*、伊藤智徳*、白石賢二**、柿本浩一

    第38回日本結晶成長学会国内会議  2008.11 

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    Event date: 2008.11

    Presentation type:Symposium, workshop panel (public)  

    Venue:仙台   Country:Japan  

  • Influence of oxygen incorporation on AlN synthesis using Al and Li3N International conference

    Toshihiko Nagano1, YoshihiroKangawa1, 2, Koichi Kakimoto1, 2

    IWN2008  2008.10 

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    Event date: 2008.10

    Presentation type:Oral presentation (general)  

    Country:Switzerland  

  • Possibility of AlN vapor phase epitaxy using Li3N as a nitrogen source International conference

    YoshihiroKangawa1, 2, Toshihiko Nagano2, Koichi Kakimoto1, 2

    IWN2008  2008.10 

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    Event date: 2008.10

    Presentation type:Oral presentation (general)  

    Country:Switzerland  

  • 一方向性凝固法による多結晶Si育成過程におけるSi2N2O濃度分布解析

    久松 翔1,松尾 整1,中野 智2,劉 立軍2, 3,寒川 義裕1, 2,柿本 浩一1, 2

    2008年秋季第69回応用物理学会学術講演会  2008.9 

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    Event date: 2008.9

    Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  • Li3NとAlを用いたAlN成長における酸素混入の影響

    長野利彦1,寒川義裕1,2,柿本浩一1,2

    2008年秋季第69回応用物理学会学術講演会  2008.9 

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    Event date: 2008.9

    Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  • 太陽電池用多結晶シリコン成長中の坩堝回転が酸素濃度分布に与える影響

    松尾 整1,R. Bairava Ganesh1,中野 智2,劉 立軍2, 3,寒川 義裕1, 2,新船 幸二4, 5,大下 祥雄4,山口 真史4,柿本 浩一1, 2

    2008年秋季第69回応用物理学会学術講演会  2008.9 

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    Event date: 2008.9

    Presentation type:Oral presentation (general)  

    Venue:中部大学   Country:Japan  

  • Crucible rotation dependence of oxygen concentration during solidification of multicrystalline International conference

    Hitoshi Matsuo, R.Bairava Ganesh, Satoshi Nakano, Lijun Liu, Yoshihiro Kangawa, Koji Arafune, Yoshio Ohshita, Masafumi Yamaguchi, Koichi Kakimoto

    21st Congress of the International Union of Crystallography  2008.8 

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    Event date: 2008.8

    Country:Japan  

  • Theoretical study of growth condition of cubic GaN

    EMS27  2008.7 

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    Event date: 2008.7

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Theoretical approach to structural stability of GaN: How to grow cubic GaN International conference

    Yoshihiro Kangawa, Toru Akiyama, Tomonori Ito, Kenji Shiraishi, Koichi Kakimoto

    ISGN-2  2008.7 

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    Event date: 2008.7

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Thermodynamical analysis of oxygen incorporation from a quartz crucible during solidification of  multicrystalline silicon for solar cell International conference

    2008.5 

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    Event date: 2008.5

    Presentation type:Oral presentation (general)  

    Venue:九州大学医学部百年記念講堂   Country:Japan  

  • Monte Carlo simulation of atomic arrangement in InGaN thin film grown by MOVPE International conference

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    the 4th Asian Conference on Crystal Growth and Crystal Technology  2008.5 

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    Event date: 2008.5

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • 一方向性凝固法による太陽電池用多結晶シリコンの酸素混入機構の解明

    松尾 整 、R. Bairava Ganesh、中野 智、劉 立軍、寒川 義裕、 新船 幸二、大下 祥雄、山口 真史、柿本 浩一

    ナノ学会第6回大会  2008.5 

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    Event date: 2008.5

    Presentation type:Oral presentation (general)  

    Venue:九州大学医学部百年記念講堂   Country:Japan  

  • ACRTを用いた太陽電池用多結晶シリコン中の炭素濃度の制御

    R. Bairava Ganesh, 松尾 整,中野 智, 劉 立軍,寒川 義裕,新船 幸二,大下 祥雄,山口 真史, 柿本 浩一

    2008年春季第55回応用物理学会学術講演会  2008.3 

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    Event date: 2008.3

    Presentation type:Oral presentation (general)  

    Venue:日本大学   Country:Japan  

  • 不純物の影響を考慮したSiC の熱伝導率解析

    河村貴宏,寒川義裕,柿本浩一

    2008年春季第55回応用物理学会学術講演会  2008.3 

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    Event date: 2008.3

    Presentation type:Oral presentation (general)  

    Venue:日本大学   Country:Japan  

  • バルクシリコン系の結晶成長とシミュレーターの展望と課題

    柿本浩一,中野 智,宮澤宏章,寒川義裕

    2008年春季第55回応用物理学会学術講演会  2008.3 

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    Event date: 2008.3

    Presentation type:Oral presentation (general)  

    Venue:日本大学   Country:Japan  

  • 太陽電池用多結晶シリコンの熱化学的解析を用いた酸素混入機構の解明

    松尾 整,R. Bairava Ganesh, 中野 智, 劉 立軍,寒川 義裕,新船 幸二,大下 祥雄,山口 真史, 柿本 浩一

    2008年春季第55回応用物理学会学術講演会  2008.3 

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    Event date: 2008.3

    Presentation type:Oral presentation (general)  

    Venue:日本大学   Country:Japan  

  • Al とLi3N を原料とするサファイア基板上AlN 気相成長

    寒川義裕,脇川達人,長野利彦,柿本浩一

    2008年春季第55回応用物理学会学術講演会  2008.3 

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    Event date: 2008.3

    Presentation type:Oral presentation (general)  

    Venue:日本大学   Country:Japan  

  • 窒化物半導体エピ成長の条件最適化に向けた理論予測 Invited

    寒川義裕、伊藤智徳、纐纈明伯、柿本浩一

    日本学術振興会第161委員会(第57回研究会)/第162委員会(第59回研究会)合同研究会  2008.3 

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    Event date: 2008.3

    Presentation type:Oral presentation (general)  

    Venue:主婦会館プラザエフ   Country:Japan  

  • Li3Nを窒素源とするAlN成長における相安定性の解析

    脇川達人、長野利彦、寒川義裕、柿本浩一

    2007年応用物理学会結晶工学分科会年末講演会  2007.12 

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    Event date: 2007.12

    Presentation type:Oral presentation (general)  

    Venue:学習院大学   Country:Japan  

  • Numerical analysis in a unidirectional solidification process for multicrystalline silicon with square crucibles International conference

    H. Miyazawa, L. J. Liu, S. Nakano, Y. Kangawa, K. Kakimoto

    The 2nd International Workshop on Science and Technology of Crystalline Si Solar Cells (CSSC)  2007.12 

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    Event date: 2007.12

    Presentation type:Oral presentation (general)  

    Country:China  

  • GROWTH OF MULTICRYSTALLINE SILICON BY UNIDIRECTIONAL SOLIDIFICATION USING ACCELERATED CRUCIBLE ROTATION TECHNIQUE International conference

    R. Bairava Ganesh, H. Matsuo, Y. Kangawa, K. Arafune, Y. Ohshita, M. Yamaguchi, K. Kakimoto

    The 2nd International Workshop on Science and Technology of Crystalline Si Solar Cells (CSSC)  2007.12 

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    Event date: 2007.12

    Presentation type:Oral presentation (general)  

    Country:China  

  • 3D global analysis in a unidirectional solidification process of multicrystalline silicon for photovoltaic International conference

    H. Miyazawa, L. J. Liu, S. Nakano, Y. Kangawa, K. Kakimoto

    17th International Photovoltaic Science and Engineering Conference (PVSEC-17)  2007.12 

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    Event date: 2007.12 - 2008.12

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • ANALYSIS OF CARBON DISTRIBUTION AND SiC PRECIPITATION USING UNIDIRECTIONAL-SOLIDIFICATION PROCESS FOR MULTI-CRYSTALLINE SILICON International conference

    S. Nakano, L. J. Liu, X. J. Chen, H. Miyazawa, Y. Kangawa, K. Kakimoto

    17th International Photovoltaic Science and Engineering Conference (PVSEC-17)  2007.12 

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    Event date: 2007.12 - 2008.12

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • UNIDIRECTIONAL SOLIDIFICATION GROWTH OF MULTICRYSTALLINE SILICON USING ACCELERATED CRUCIBLE ROTATION TECHNIQUE (ACRT) International conference

    R. Bairava Ganesh, H. Matsuo, Y. Kangawa, K. Arafune, Y. Ohshita, M. Yamaguchi, K. Kakimoto

    17th International Photovoltaic Science and Engineering Conference (PVSEC-17)  2007.12 

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    Event date: 2007.12 - 2008.12

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • OXYGEN INCOPORATION MECHANISM FROM A CRUCIBLE IN MULTICRYSTALLINE SILICON FOR SOLAR CELLS International conference

    Hitoshi Matsuo, R. Bairava Ganesh, Satoshi Nakano, Lijun Liu, Yuriko Matsuo, Yoshihiro Kangawa, Koji Arafune, Yoshio Ohshita, Masafumi Yamaguchi, Koichi Kakimoto

    17th International Photovoltaic Science and Engineering Conference (PVSEC-17)  2007.12 

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    Event date: 2007.12 - 2008.12

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Analysis of oxygen incorporation processin unidirectionally solidified multicrystalline silicon for solar cells

    Hitoshi Matsuo, R. Bairava Ganesh, Satoshi Nakano, Lijun Liu, Yuriko Matsuo, Yoshihiro Kangawa, Koji Arafune, Yoshio Ohshita, Masafumi Yamaguchi, Koichi Kakimoto

    2007.11 

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    Event date: 2007.11

    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Li3Nを窒素源とするAlN溶液成長

    寒川義裕、脇川達人、長野利彦、柿本浩一

    第37回結晶成長国内会議  2007.11 

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    Event date: 2007.11

    Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • SiCにおける結晶構造の不規則性が熱伝導率に及ぼす影響

    河村貴宏、寒川義裕、柿本浩一

    第37回結晶成長国内会議  2007.11 

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    Event date: 2007.11

    Presentation type:Oral presentation (general)  

    Venue:北海道大学   Country:Japan  

  • 一方向性凝固法による多結晶シリコンの酸素混入過程の解析

    松尾 整,R. Bairava Ganesh, 中野 智, 劉 立軍,寒川 義裕,新船 幸二,大下 祥雄,山口 真史, 柿本 浩一

    2007年秋季第68回応用物理学会学術講演会  2007.9 

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    Event date: 2007.9

    Presentation type:Oral presentation (general)  

    Venue:北海道工業大学   Country:Japan  

  • SiCの熱伝導率に対する積層欠陥の影響

    河村貴宏、寒川義裕、柿本浩一

    2007年秋季第68回応用物理学会学術講演会  2007.9 

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    Event date: 2007.9

    Presentation type:Oral presentation (general)  

    Venue:北海道工業大学   Country:Japan  

  • GaN 溶液成長における熱対流と成長速度の関係

    柿本浩一、寒川義裕、劉立軍、川村史朗、森勇介、佐々木孝友

    2007年秋季第68回応用物理学会学術講演会  2007.9 

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    Event date: 2007.9

    Presentation type:Oral presentation (general)  

    Venue:北海道工業大学   Country:Japan  

  • Analysis of oxygen incorporation in unidirectionally solidified multicrystalline silicon for solar cells International conference

    Hitoshi Matsuo, R.Bairava Ganesh, Satoshi Nakano, Lijun Liu, Yoshihiro Kangawa, Koji Arafune, Yoshio Ohshita, Masafumi Yamaguchi, Koichi Kakimoto

    The 15th International Conference on Crystal Growth  2007.8 

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    Event date: 2007.8

    Presentation type:Oral presentation (general)  

    Country:United States  

  • Investigation of thermal conductivity of fullerene peapod by molecular dynamics International conference

    Takahiro Kawamura, Yoshihiro Kangawa, Koichi Kakimoto

    The 15th International Conference on Crystal Growth  2007.8 

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    Event date: 2007.8

    Presentation type:Oral presentation (general)  

    Country:United States  

  • On thermal conductivity of 2H-, 3C-, 4H- and 6H-SiC calculated by molecular dynamics International conference

    Takahiro Kawamura, Daisuke Hori, Yoshihiro Kangawa), Koichi Kakimoto

    The 15th International Conference on Crystal Growth  2007.8 

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    Event date: 2007.8

    Presentation type:Oral presentation (general)  

    Country:United States  

  • Possibility of AlN synthesis using Al and Li3N under an atmospheric pressure International conference

    T. Wakigawa, Y. Kangawa, K. Kakimoto

    The 15th International Conference on Crystal Growth  2007.8 

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    Event date: 2007.8

    Presentation type:Oral presentation (general)  

    Country:United States  

  • AlとLi3Nを用いた常圧AlN溶液成長

    脇川達人, 寒川義裕, 柿本浩一

    第26回電子材料シンポジウム  2007.7 

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    Event date: 2007.7

    Venue:ラフォーレ琵琶湖(滋賀県守山市)   Country:Japan  

  • Ab initio-based approach to adsorption-desorption behavior during GaAs epitaxial growth International conference

    Y. Kangawa, T. Ito, A. Taguchi, K. Shiraishi, Y. S. Hiraoka, T. Irisawa, T. Ohachi

    International Workshop on Atomic-Scale Surface Dynamics of Advanced Materials  2001.11 

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    Event date: 2001.11

    Language:English  

    Country:Japan  

  • 高As圧下におけるGaAs成長速度As圧依存性の理論検討

    寒川義裕, 伊藤智徳, 平岡佳子, 田口明仁, 白石賢二, 大鉢忠

    東北大学電気通信研究所 共同プロジェクト研究会「半導体表面におけるナノプロセスの量子化学」  2001.10 

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    Event date: 2001.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:仙台   Country:Japan  

  • GaAs(001)-(2x4)b2および-(2x4)b1表面におけるGa拡散距離基板温度依存性

    寒川義裕, 伊藤智徳, 田口明仁, 白石賢二, 入澤寿美

    第62回応用物理学会秋季学術講演会  2001.9 

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    Event date: 2001.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知工業大学   Country:Japan  

  • Si1-x-yGexCyにおけるC混合安定性に対する副格子の影響

    伊藤智徳, 寒川義裕

    第62回応用物理学会秋季学術講演会  2001.9 

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    Event date: 2001.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛知工業大学   Country:Japan  

  • Theoretical investigation for As pressure dependence of GaAs growth rate International conference

    Y. Kangawa, T. Ito, Y. S. Hiraoka, A. Taguchi, K. Shiraishi, T. Ohachi

    20th European Conference on Surface Science  2001.9 

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    Event date: 2001.9

    Language:English  

    Country:Poland  

  • Theoretical investigations of thermodynamic stability for Si1-x-yGexCy International conference

    T. Ito, Y. Kangawa, A. Kobayashi

    The 13th International Conference on Crystal Growth  2001.7 

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    Event date: 2001.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Empirical interatomic potential calculations for relative stability of Ga adatom on GaAs(100) and (n11)A surfaces International conference

    Y. Kangawa, T. Ito, A. Taguchi, K. Shiraishi, T. Ohachi

    The 13th International Conference on Crystal Growth  2001.7 

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    Event date: 2001.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • An empirical potential approach to wurtzite-zinc blende structural stability of semiconductors International conference

    T. Ito, Y. Kangawa, K. Tsutsumida

    The 13th International Conference on Crystal Growth  2001.7 

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    Event date: 2001.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Monte Carlo simulation for temperature dependence of Ga diffusion length on GaAs(001) International conference

    Y. Kangawa, T. Ito, A. Taguchi, K. Shiraishi, T. Irisawa, T. Ohachi

    8th International Conference on the Formation of Semiconductor Interfaces  2001.6 

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    Event date: 2001.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Si1-x-yGexCyにおける混合安定性のGe濃度依存性に関する理論検討

    伊藤智徳, 寒川義裕

    第48回応用物理学会春季学術講演会  2001.3 

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    Event date: 2001.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:明治大学   Country:Japan  

  • GaAs(211)Aおよび(411)A表面上におけるGa原資の安定吸着位置と相対的安定性

    寒川義裕, 伊藤智徳, 田口明仁, 白石賢二, 大鉢忠

    第48回応用物理学会春季学術講演会  2001.3 

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    Event date: 2001.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:明治大学   Country:Japan  

  • Empirical potential-based approach for understanding epitaxial growth of aemiconductors Invited International conference

    T. Ito, Y. Kangawa, K. Shiraishi, A. Taguchi

    The 5th Symposium on Atomic-Scale Surface and Interface Dynamics  2001.3 

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    Event date: 2001.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Empirical Interatomic potential calculation for comositional instability of InGaN thin films grown on GaN and InN Invited International conference

    Y. Kangawa, T. Ito, A. Mori, A. Koukitu

    The 5th Symposium on Atomic-Scale Surface and Interface Dynamics  2001.3 

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    Event date: 2001.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • A new empirical interatomic potential for compound semiconductors and its application to thermodynamic stabilities

    Y. Kangawa, T. Ito

    27th International Symposium on Compound Semiconductors  2000.12 

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    Event date: 2000.10

    Language:English  

    Country:United States  

  • Theoretical investigation of adatom adsorption on the As-stabilized GaAs(111)A surface International conference

    A. Taguchi, K. Shiraishi, T. Ito, Y. Kangawa

    International Symposium on Surface and Interface  2000.10 

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    Event date: 2000.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • A new theoretical approach to adsorption-desorption behavior of Ga on GaAs surfaces International conference

    Y. Kangawa, T. Ito, A. Taguchi, K. Shiraishi, T. Ohachi

    International Symposium on Surface and Interface  2000.10 

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    Event date: 2000.10

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • GaAs(411)Aおよび(001)-(4x2)表面上における吸着Ga原子の相対的安定性

    寒川義裕, 伊藤智徳, 田口明仁, 白石賢二, 大鉢忠

    第61回応用物理学会秋季学術講演会  2000.9 

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    Event date: 2000.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道工業大学   Country:Japan  

  • Empirical Interatomic potential calculation for compositional instability of III-V nitride alloys in lattice mismutch systems International conference

    Y. Kangawa, T. Ito, A. Mori, A. Koukitu

    International Workshop on Nitride Semiconductors 2000  2000.9 

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    Event date: 2000.9

    Language:English  

    Country:Japan  

  • 原子間ポテンシャルによるGaAs(111)A表面上Ga原子の安定吸着機構の検討

    伊藤智徳, 寒川義裕, 田口明仁, 白石賢二

    第61回応用物理学会秋季学術講演会  2000.9 

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    Event date: 2000.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:北海道工業大学   Country:Japan  

  • Formation mechanisms of Al-segregated region on InAlAs/(110)InP International conference

    Y. Kangawa, K. Wakizono, Noriyuki Kuwano, K. Oki, T. Ito

    The 1st Asian Conference on Crystal Growth and Crystal Technology  2000.8 

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    Event date: 2000.8

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • InGaNの非混和性に対する基板拘束の寄与

    寒川義裕, 伊藤智徳, 森篤史, 纐纈明伯

    第31回結晶成長国内会議(NCCG-31)  2000.7 

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    Event date: 2000.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:名古屋大学   Country:Japan  

  • Numerical calculation with empirical interatomic potential for formation mechanism of AuAu-I type ordered structure in InGaAs/(110)InP International conference

    Y. Kangawa, Noriyuki Kuwano, K. Oki

    International Symposium on Control of Semiconductor Interfaces  1999.10 

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    Event date: 1999.10

    Language:English  

    Country:Japan  

  • 原子間ポテンシャルを用いたInGaAs/(110)InPにおけるCuAu-I型規則化メカニズムの解析

    寒川義裕, 桑野範之, 沖憲典

    第30回結晶成長国内会議(NCCG-30)  1999.7 

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    Event date: 1999.7

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • InGaAs/(110)InP混晶におけるCuAu-I型規則化メカニズムの原子間ポテンシャルによる解析

    寒川義裕, 桑野範之, 沖憲典

    日本金属学会九州支部 日本鉄鋼協会九州支部 平成11年度合同学術講演会  1999.6 

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    Event date: 1999.6

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州大学   Country:Japan  

  • Theoretical investigation for ordering mechanism of InGaAs/(110)InP using empirical interatomic potential

    Y. Kangawa, N. Kuwano, K. Oki

    18th Electronic Materials Symposyum  1999.6 

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    Event date: 1999.6

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Empirical Interatomic potential calculation for ordering mechanism of InGaAs/(110)InP International conference

    Y. Kangawa, M. Suenaga, N. Kuwano, K. Oki

    International Conference on Solid-Solid Transformation '99  1999.5 

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    Event date: 1999.5

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • 原子間ポテンシャル計算によるInGaAs/(110)InP中に出現するCuAu-I型規則構造の形成機構に関する研究

    寒川義裕, 桑野範之, 沖憲典

    文部科学省研究費補助金特定領域研究(A)「相変態」成果報告会  1998.10 

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    Event date: 1998.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛媛   Country:Japan  

  • 原子間ポテンシャル計算によるInGaAs/(110)InP中に出現するCuAu-I型規則構造安定性の定量解析

    寒川義裕, 桑野範之, 沖憲典

    日本金属学会1998秋季大会  1998.9 

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    Event date: 1998.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:愛媛大学   Country:Japan  

  • Empirical interatomic potential calculation for InGaAs/(110)InP and its application to CuAu-I type ordered structure stability

    Y. Kangawa, N. Kuwano, K. Oki

    17th Electronic Materials Symposium  1998.7 

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    Event date: 1998.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • InAlAs/(110)InP混晶中に出現するL10型規則相ならびにAl偏析領域の形成機構

    寒川義裕, 小島周子, 桑野範之, 沖憲典

    第58回応用物理学会秋季学術講演会  1997.10 

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    Event date: 1997.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:秋田大学   Country:Japan  

  • InAlAs/(110)InP混晶中に出現する逆位相境界の形成機構

    小島周子, 寒川義裕, 桑野範之, 沖憲典

    第58回応用物理学会秋季学術講演会  1997.10 

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    Event date: 1997.10

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:秋田大学   Country:Japan  

  • TEM observations for the formation mechanism of microstructures in InAlAs/(110)InP

    Y. Kangawa, C. Kojima, N. Kuwano, K. Oki

    16th Electronic Materials Symposium  1997.7 

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    Event date: 1997.7

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • InAlAs/(110)InP混晶中に出現する微細組織の形成機構

    小島周子, 寒川義裕, 桑野範之, 沖憲典

    日本電子顕微鏡学会 第53回学術講演会  1997.5 

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    Event date: 1997.5

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:尼崎   Country:Japan  

  • TEM observation of microstructures in InAlAs/(110)InP International conference

    C. Kojima, Y. Kangawa, N. Kuwano, K. Oki

    The Asian Science Seminar on New Direction in Transmission Electron Microscopy and Nano-characterization of Materials  1997.3 

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    Event date: 1997.3

    Language:English   Presentation type:Oral presentation (general)  

    Country:Japan  

  • InGaAs/(110)InP混晶におけるCuAu-I型規則構造の形成機構

    寒川義裕, 小島周子, 桑野範之, 沖憲典

    第44回応用物理学会春季学術講演会  1997.3 

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    Event date: 1997.3

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:日本大学(船橋)   Country:Japan  

  • TEM observation for the ordering mechanism of an InGaAs alloy grown on a (110)InP substrate

    Y. Kangawa, N. Kuwano, K. Oki

    1997.1 

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    Event date: 1997.1

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  • (110)Inp基板上にエピタキシャル成長させたInGaAs混晶の規則化機構

    寒川義裕, 小島周子, 桑野範之, 沖憲典

    第38回日本電子顕微鏡学会九州支部会学術講演会  1996.11 

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    Event date: 1996.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:宮崎医科大学   Country:Japan  

  • III-V族半導体混晶におけるTP-A型規則化のモンテカルロ法による解析

    寒川義裕, 桑野範之, 沖憲典

    第57回応用物理学会秋季学術講演会  1996.9 

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    Event date: 1996.9

    Language:Japanese   Presentation type:Oral presentation (general)  

    Venue:九州産業大学   Country:Japan  

  • Si/Ge/Si(001)界面形状とフォノン伝播の関係

    勝谷 匡博,脇川 達人,寒川 義裕,王 萍,福山 敦彦,明石 義人,碇 哲雄,柿本 浩一

    2007年春季第54回応用物理学会学術講演会  2007.3 

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    Presentation type:Oral presentation (general)  

    Venue:青山学院大学   Country:Japan  

  • Empirical potential-based approach to relative stability among tetrahedral clusters in bulk InGaN and InGaN/GaN

    Yoshihiro KANGAWA, Tomonori ITO, Kohichi Nakamura, Yoshinao KUMAGAI and Akinori KOUKITU

    2001.6 

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    Country:Japan  

  • Influence of Buffer Layer Crystallization on the Crystalline Quality of Subsequently Grown GaN Epitaxial Layers on GaAs (111)A Surfaces

    Hisashi Murakami, Yoshinao Kumagai, Yoshihiro Kangawa, Akinori Koukitu

    2001.6 

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    Country:Japan  

  • 常圧H2雰囲気下におけるGaAs(001)面からのAs脱離過程と(2 x 4)再構成面の形成機構

    松尾有里子,寒川義裕,熊谷義直,入澤寿美,纐纈明伯

    第32回結晶成長国内会議(NCCG-32)  2001.8 

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    Presentation type:Oral presentation (general)  

    Venue:若里ホール   Country:Japan  

  • InGaN/GaNおよびInGaN/InN気相成長における気相−固相関係

    寒川義裕、伊藤智徳、熊谷義直、纐纈明伯

    第32回結晶成長国内会議(NCCG-32)  2001.9 

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    Presentation type:Oral presentation (general)  

    Venue:若里ホール   Country:Japan  

  • Thermodynamic study on compositional instability of InGaN/GaN and InGaN/InN during MBE International conference

    Yoshihiro KANGAWA, Tomonori ITO, Yoshinao KUMAGAI and Akinori KOUKITU

    The 4th International Symposium on Control of Semiconductor Interfaces  2001.10 

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    Presentation type:Oral presentation (general)  

    Country:Japan  

  • Empirical potential approach to thermodynamic stability of thin nitride films Invited International conference

    Y. Kangawa, T. Ito, A. Mori and A. Koukitu

    Frontier Science Research Conferences -Science and Technology of Nitride Materials 2001-  2001.10 

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    Presentation type:Oral presentation (general)  

    Country:United States  

  • InGaN気相成長における気相-固相関係に対する基板拘束の影響 Invited

    寒川義裕、伊藤智徳、熊谷義直、纐纈明伯

    第3 回ナノ構造・エピ成長分科会シンポジウム  2002.2 

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    Presentation type:Symposium, workshop panel (public)  

    Venue:東京農工大学   Country:Japan  

  • ハロゲン系気相エピタキシーによるInAs(001)基板上へのInAs1-xSbx三元混晶の成長

    江里口健一、森岡理、寒川義裕、熊谷義直、纐纈明伯

    第50回応用物理学関係連合講演会  2002.3 

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    Presentation type:Oral presentation (general)  

    Venue:神奈川大学   Country:Japan  

  • GaAs(111)基板両面にMOHVPE法で成長させたGaNの微細構造

    桑野範之、園田欣大、村上尚、寒川義裕、熊谷義直、纐纈明伯

    第50回応用物理学関係連合講演会  2002.3 

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    Venue:神奈川大学   Country:Japan  

  • 常圧H2雰囲気下におけるGaAs(111)A-(2x2)As面からGa終端面への相転移過程

    松尾有里子,寒川義裕,熊谷義直,入澤寿美,纐纈明伯

    第50回応用物理学関係連合講演会  2002.3 

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    Venue:神奈川大学   Country:Japan  

  • HVPE法によるSapphire基板上へのAlN成長

    山根貴好、宮地岳広、村上尚、寒川義裕、熊谷義直、纐纈明伯

    第50回応用物理学関係連合講演会  2002.3 

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    Presentation type:Oral presentation (general)  

    Venue:神奈川大学   Country:Japan  

  • MOVPE成長におけるInGaN気相−固相関係に対する基板拘束の寄与

    寒川義裕、伊藤智徳、熊谷義直、纐纈明伯

    第50回応用物理学関係連合講演会  2002.3 

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    Venue:神奈川大学   Country:Japan  

  • 高In組成InGaNナノ薄膜の実現に向けた光励起による成長最表面の制御

    寒川義裕

    21世紀COE“ナノ未来材料”コロキューム -平成15年度 COE 第1回発表会-  2002.3 

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    Presentation type:Oral presentation (general)  

    Venue:東京農工大学   Country:Japan  

  • 気相−固相反応から見たIII-V族化合物半導体エピタキシャル成長”、第27回結晶成長討論会、志賀高原プリンスホテル Invited

    寒川義裕

    第27回結晶成長討論会  2002.8 

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    Venue:志賀高原プリンスホテル   Country:Japan  

  • 常圧H2雰囲気下におけるGaAs(111)A面からのAs脱離過程と(2 x 2)再構成面の形成機構

    松尾有里子,寒川義裕,熊谷義直,入澤寿美,纐纈明伯

    第63回応用物理学会学術講演会  2002.9 

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    Presentation type:Oral presentation (general)  

    Venue:新潟大学   Country:Japan  

  • InGaN MBE成長の気相−固相関係に対する基板拘束の寄与

    寒川義裕、伊藤智徳、熊谷義直、纐纈明伯

    第63回応用物理学会学術講演会  2002.9 

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    Venue:新潟大学   Country:Japan  

  • Influence of lattice constraint from InN and GaN substrate on relationship between input mole ratio and solid composition of InGaN during MOVPE International conference

    Yoshihiro KANGAWA, Tomonori ITO, Yoshinao KUMAGAI and Akinori KOUKITU

    5th International Conference on Nitride Semiconductors (ICNS-5)  2003.5 

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    Presentation type:Symposium, workshop panel (public)  

    Country:Japan  

  • Improvements in crystalline quality of thick GaN layers on GaAs (111)A by periodic insertion of low-temperature GaN buffer layers International conference

    H. Murakami, N. Kawaguchi, Y. Kangawa, Y. Kumagai and A. Koukitu

    5th International Conference on Nitride Semiconductors (ICNS-5)  2003.5 

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    Presentation type:Symposium, workshop panel (public)  

    Country:Japan  

  • GaNナノ薄膜の低温成長における光励起の効果

    寒川義裕

    21世紀COE“ナノ未来材料”コロキューム -平成15年度 COE 第1回若手発表会-  2003.7 

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    Venue:東京農工大学   Country:Japan  

  • Effect of periodic insertion of low-temperature GaN buffer layers during thick GaN layer growth on GaAs (111)A

    N. Kawaguchi, H. Murakami, Y. Kangawa, Y. Kumagai and A. Koukitu

    2003.7 

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    Country:Japan  

  • Growth of InAs1-xSbx Layers on InAs (001) Substrates Using Halide Vapor Phase Epitaxy

    Ken-ichi Eriguchi, Kikurou Takemoto, Yoshihiro Kangawa,Yoshinao Kumagai and Akinori Koukitu

    2003.7 

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    Country:Japan  

  • HVPE法を用いたAlNの成長は可能か?

    纐纈明伯,菊地 潤,寒川 義裕,熊谷 義直

    第33回結晶成長国内会議  2003.8 

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    Venue:大阪大学   Country:Japan  

  • InGaN薄膜における自然超格子構造

    森 篤史,伊藤智徳,寒川 義裕,纐纈明伯

    第33回結晶成長国内会議  2003.8 

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    Venue:大阪大学   Country:Japan  

  • 第一原理計算による常圧H2雰囲気下におけるGaAs(111)A面の表面構造相転移

    松尾 有里子,寒川 義裕,熊谷 義直,入澤 寿美,纐纈 明伯

    第33回結晶成長国内会議  2003.8 

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    Venue:大阪大学   Country:Japan  

  • GaNホモエピタキシャル成長における成長初期過程の理論検討

    寒川 義裕,入澤 寿美、熊谷 義直,纐纈 明伯

    第33回結晶成長国内会議  2003.8 

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    Venue:大阪大学   Country:Japan  

  • Thermodynamic Study on Metalorganic Molecular Beam Epitaxy of CdGeP2

    Yoshihiro Kangawa and Valery M. Smirnov

    2003.8 

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    Country:Japan  

  • Pulse laser assisted metalorganic vapor phase epitaxy of InGaN nano-films with high indium content

    Yoshihiro KANGAWA

    2003.8 

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    Country:Japan  

  • AlN, GaN HVPE成長のための原料部塩化物生成解析

    菊地 潤、熊谷 義直、寒川 義裕、纐纈 明伯

    第64回応用物理学会学術講演会  2003.9 

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    Venue:福岡大学   Country:Japan  

  • InAs(001)基板上へのInAs1-xSbxのハロゲン系気相エピタキシーにおけるV/III比の影響

    江里口 健一、竹本 菊郎、寒川 義裕、熊谷 義直、纐纈 明伯

    第64回応用物理学会学術講演会  2003.9 

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    Venue:福岡大学   Country:Japan  

  • 高品質GaN成長に向けたGaP(111)A基板表面からのP脱離の理論検討

    松尾 有里子,藤野 真理恵,寒川 義裕,熊谷 義直,入澤 寿美,纐纈 明伯

    第64回応用物理学会学術講演会  2003.9 

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    Venue:福岡大学   Country:Japan  

  • モンテカルロシミュレーションによるGaN成長初期過程の理論検討

    寒川義裕,入澤寿美,熊谷義直,纐纈明伯

    第64回応用物理学会学術講演会  2003.9 

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    Presentation type:Oral presentation (general)  

    Venue:福岡大学   Country:Japan  

  • 「低温成長で拡がる半導体混晶の世界 −なぜ無理矢理原子が入るかー」 窒化物混晶における非混和性

    纐纈 明伯, 松本 喜以子, 寒川 義裕, 熊谷 義直, 入澤 寿美

    第51回応用物理学関係連合講演会  2004.3 

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    Venue:東京工科大学   Country:Japan  

  • GaAs(211)A-(001)-(2x4)β2 複合ファセット基板上での吸着Ga原子の振舞い

    浅野 耕一, 寒川 義裕, 白石 賢二, 秋山 亭, 中村 浩次, 伊藤 智徳

    第51回応用物理学関係連合講演会  2004.3 

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    Venue:東京工科大学   Country:Japan  

  • 第一原理計算および統計力学的手法によるIn系窒化物原料の熱力学データ

    松尾 有里子, 菊地 潤, 寒川 義裕, 熊谷 義直, 纐纈 明伯

    第51回応用物理学関係連合講演会  2004.3 

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    Venue:東京工科大学   Country:Japan  

  • GaP(111)基板を用いたGaN成長の面方位依存性

    松尾 有里子, 川口 暢彦, 藤野 真理恵, 寒川 義裕, 熊谷 義直, 入澤 寿美, 纐纈 明伯

    第51回応用物理学関係連合講演会  2004.3 

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    Venue:東京工科大学   Country:Japan  

  • HVPE法によるAlN厚膜成長における成長温度の影響

    山根 貴好, 鹿内 洋志, 村上 尚, 寒川 義裕, 熊谷 義直,纐纈 明伯

    第51回応用物理学関係連合講演会  2004.3 

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    Venue:東京工科大学   Country:Japan  

  • 光励起MOVPEによる高In組成InGaN成長

    寒川 義裕, 比田 剣之輔, 熊谷 義直, 纐纈 明伯,河口 紀仁

    第51回応用物理学関係連合講演会  2004.3 

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    Venue:東京工科大学   Country:Japan  

  • 分子動力学法によるGaN及び窒化物混晶の熱伝導率解析

    河村貴宏、寒川義裕、柿本浩一

    第52回応用物理学関係連合講演会  2005.3 

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    Venue:埼玉大学   Country:Japan  

  • GaNバッファー層を用いたGaN/Si(111)のMOVPE成長

    松尾有里子、寒川義裕、岩本智行、野間かおり、熊谷義直、纐纈明伯

    2005年春季 第52回応用物理学関係連合講演会  2005.3 

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    Venue:埼玉大学   Country:Japan  

  • InAlGaN非混和性に対する基板拘束の影響

    寒川義裕、柿本浩一、伊藤智徳、纐纈明伯

    電子情報通信学会 研究会  2005.5 

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    Venue:三重大学   Country:Japan  

  • Influence of lattice constraint from substrate on compositional instability of InAlGaN thin film

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    24th Electronic Materials Symposium  2005.7 

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    Country:Japan  

  • Analysis of thermal conductivity of nitride alloy by molecular dynamics

    T. Kawamura, Y. Kangawa, K. Kakimoto

    24th Electronic Materials Symposium  2005.7 

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    Country:Japan  

  • 分子動力学法によるAlN/GaN 超格子の熱伝導率解析

    河村貴宏、寒川義裕、柿本浩一

    第35回日本結晶成長学会  2005.8 

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    Venue:広島大学  

  • 分子動力学法による格子欠陥を考慮したGaN の熱伝導率解析

    河村貴宏、寒川義裕、柿本浩一

    第35回日本結晶成長学会  2005.8 

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    Venue:広島大学   Country:Japan  

  • InGaN組成不安定性のモンテカルロ法による解析

    寒川義裕、柿本浩一

    第35回日本結晶成長学会  2005.8 

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    Venue:広島大学   Country:Japan  

  • Thermodynamic stability of In1-x-yGaxAlyN on GaN and InN International conference

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    6th International Conference on Nitride Semiconductor  2005.8 

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    Presentation type:Symposium, workshop panel (public)  

    Country:Germany  

  • Investigation of thermal conductivity of nitride mixed crystal by molecular dynamics International conference

    T. Kawamura, Y. Kangawa, K. Kakimoto

    6th International Conference on Nitride Semiconductor  2005.8 

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    Presentation type:Symposium, workshop panel (public)  

    Country:Germany  

  • AlN/GaN超格子の熱伝導率解析

    河村貴宏、寒川義裕、柿本浩一

    第66回応用物理学会学術講演会  2005.9 

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    Presentation type:Oral presentation (general)  

    Venue:徳島大学   Country:Japan  

  • 格子欠陥を考慮したGaNの熱伝導率解析

    河村貴宏、寒川義裕、柿本浩一

    第66回応用物理学会学術講演会  2005.9 

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    Venue:徳島大学   Country:Japan  

  • モンテカルロ法によるInGaN組成不安定性の理論検討

    寒川義裕、柿本浩一

    第66回応用物理学会学術講演会  2005.9 

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    Venue:徳島大学   Country:Japan  

  • ナノ構造を有する窒化物半導体の熱伝導率解析

    河村貴宏, 寒川義裕, 柿本浩一

    2006年春季第53回応用物理学会学術講演会  2006.3 

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    Venue:武蔵工大   Country:Japan  

  • GaN(001)成長初期過程の原子レベル解析

    寒川義裕,秋山亨,伊藤智徳,白石賢二,柿本浩一

    2006年春季第53回応用物理学会学術講演会  2006.3 

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    Venue:武蔵工大   Country:Japan  

  • Analysis of compositional instability of InGaN by Monte Carlo simulation International conference

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    International Conference on Metalorganic Vapor Phase Epitaxy 13  2006.5 

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    Country:Japan  

  • An investigation of thermal conductivity of nitride-semiconductor nanostructures by molecular dynamics International conference

    Takahiro Kawamura, Yoshihiro Kangawa and Koichi Kakimoto

    International Conference on Metalorganic Vapor Phase Epitaxy 13  2006.5 

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    Country:Japan  

  • Influence of hydrogen coverage on Si(111) substrate on the growth of GaN buffer layer International conference

    Yuriko Matsuo, Yoshihiro Kangawa, Rie Togashi, Koichi Kakimoto, Akinori Koukitu

    First International Symposium on Growth of III-Nitrides  2006.6 

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    Country:Sweden  

  • Theoretical Approach on Initial Growth Kinetics of GaN on GaN(001) International conference

    Y. Kangawa, Y. Matsuo, T. Akiyama, T. Ito, K. Shiraishi, K. Kakimoto

    First International Symposium on Growth of III-Nitrides  2006.6 

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    Country:Sweden  

  • 分子動力学法による カーボンナノチューブの熱伝導率計算

    河村貴宏, 寒川義裕, 柿本浩一

    2006年秋季67回応用物理学会学術講演会  2006.9 

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    Venue:滋賀   Country:Japan  

  • 分子動力学法による GaN/AlN量子ドットの熱伝導率計算

    河村貴宏, 寒川義裕, 柿本浩一

    2006年秋季67回応用物理学会学術講演会  2006.9 

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    Venue:滋賀   Country:Japan  

  • GaNバッファ層成長におけるSi(111)基板表面の水素被覆率の影響

    松尾 有里子,寒川 義裕,富樫 理恵,柿本 浩一,纐纈 明伯

    2006年秋季67回応用物理学会学術講演会  2006.9 

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    Venue:滋賀   Country:Japan  

  • InGaN 中に形成される微細組織の理論検討

    寒川 義裕, 柿本 浩一, 伊藤 智徳, 纐纈 明伯

    2006年秋季67回応用物理学会学術講演会  2006.9 

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    Venue:滋賀   Country:Japan  

  • Ab initio based approach on initial growth kinetics of GaN on GaN(001) International conference

    Y. Kangawa, Y. Matsuo, T. Akiyama, T. Ito, K. Shiraishi, K. Kakimoto

    MBE2006  2006.9 

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  • 分子動力学法による 機能性材料の熱伝導率解析

    河村貴宏, 寒川義裕, 柿本浩一

    第27回熱物性シンポジウム  2006.10 

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    Venue:京都   Country:Japan  

  • Numerical study of relationship between growth condition and atomic arrangement of InGaN International conference

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    International Workshop on Nitride Semiconductors 2006  2006.10 

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    Country:Japan  

  • Molecular dynamics simulation of thermal conductivity of GaN/AlN quantum dot superlattices International conference

    Takahiro Kawamura, Yoshihiro Kangawa and Koichi Kakimoto

    International Workshop on Nitride Semiconductors 2006  2006.10 

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    Country:Japan  

  • 単層及び多層カーボンナノチューブの 熱伝導率解析

    河村貴宏, 寒川義裕, 柿本浩一

    第36回結晶成長国内会議NCCG-36  2006.11 

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    Venue:大阪大学   Country:Japan  

  • GaN/AlN量子ドットの熱伝導率解析

    河村貴宏, 寒川義裕, 柿本浩一

    第36回結晶成長国内会議NCCG-36  2006.11 

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    Venue:大阪大学   Country:Japan  

  • LPE成長法によるGaN単結晶成長過程の数値流動解析

    柏木 大輔,劉 立軍2,寒川 義裕,柿本 浩一

    2006年応用物理学会九州支部学術講演会  2006.11 

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    Venue:大分大学   Country:Japan  

  • 一方向凝固多結晶シリコンの ラマン散乱による応力解析

    松尾整、河村貴宏 、寒川義裕 、柿本浩一、新船幸二、大下祥雄、山口真史

    第36回結晶成長国内会議NCCG-36  2006.11 

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    Presentation type:Oral presentation (general)  

    Venue:大阪大学   Country:Japan  

  • GaN/GaN(001)における成長初期過程の理論検討

    寒川 義裕, 松尾有里子, 秋山 亨, 伊藤 智徳, 白石 賢二, 柿本 浩一

    第36回結晶成長国内会議NCCG-36  2006.11 

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    Venue:大阪大学   Country:Japan  

  • 分子動力学法を用いたSiCの熱伝導率解析

    堀 大輔, 河村 貴宏, 寒川 義裕, 柿本 浩一

    2006年応用物理学会九州支部学術講演会  2006.11 

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    Presentation type:Oral presentation (general)  

    Venue:大分大学   Country:Japan  

  • Si/Ge/Si(001)界面形状と熱物性の関係

    勝谷 匡博,脇川 達人,寒川 義裕,福山 敦彦,明石 義人,碇 哲雄,柿本 浩一

    2006年応用物理学会九州支部学術講演会  2006.11 

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    Venue:大分大学   Country:Japan  

  • 一方向性凝固三次元シミュレータの開発 Invited

    劉 立軍, 中野 智,宮澤 宏章,寒川 義裕, 柿本 浩一

    結晶加工と評価技術第145 委員会 第108 回研究会  2006.11 

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    Venue:九州大学   Country:Japan  

  • 分子動力学法によるC60ピーポッドの 熱伝導率解析

    河村貴宏, 寒川義裕, 柿本浩一

    2007年春季第54回応用物理学会学術講演会  2007.3 

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    Venue:青山学院   Country:Japan  

  • GaN 溶液成長における 熱対流と窒素輸送の数値流動解析

    柏木大輔, 下條 亮平, 寒川 義裕, 劉 立軍, 川村 史朗, 森 勇介, 佐々木 孝友, 柿本 浩一

    2007年春季第54回応用物理学会学術講演会  2007.3 

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    Venue:青山学院   Country:Japan  

  • 一方向凝固多結晶シリコンの ラマン散乱による応力解析

    松尾 整, 河村 貴宏, R. Bairava Ganesh,寒川 義裕, 新船 幸二, 大下 祥雄, 山口 真史, 柿本 浩一

    2007年春季第54回応用物理学会学術講演会  2007.3 

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    Venue:青山学院大学   Country:Japan  

  • Li3Nを用いた常圧AlN溶液成長の可能性

    寒川 義裕, 柿本 浩一

    2007年春季第54回応用物理学会学術講演会  2007.3 

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    Venue:青山学院   Country:Japan  

  • 分子動力学法を用いたSiCの熱伝導率解析

    堀大輔, 河村貴宏, 寒川義裕, 柿本浩一

    2007年春季第54回応用物理学会学術講演会  2007.3 

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    Venue:青山学院   Country:Japan  

▼display all

MISC

  • AIによる材料製造条件の探索『プロセス・インフォマティクス』技術の進展 Reviewed

    寒川義裕

    応用物理, 92, 599   2023.10

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    材料開発の分野では,ノウハウ(経験と勘)による“ものづくり”からの脱却,人工知能(AI)を活用した“ものづくり”への移行が進められている.ここで核心となるのは,現実空間の製造プロセスを仮想空間に再現するデジタルツイン技術,いわゆるシミュレーション技術の開発である.本稿では,ナノテクノロジー推進の根幹である化学気相成長を例に,そのシミュレーション技術の最近の進展について解説する.また,AIによる製造条件探索『プロセス・インフォマティクス』への展開について述べる.

  • 材料開発におけるプロセス・インフォマティクスの最新事情 Reviewed

    寒川義裕

    学士會会報   2021.9

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    材料開発におけるプロセス・インフォマティクス学術分野の開拓を推し進めている。本報告では国内外の研究トレンドから最新の研究事例までを俯瞰的に紹介している。

  • 立方晶GaNの成長過程と構造安定性

    寒川義裕、秋山 亨、伊藤智徳、白石賢二、柿本浩一

    日本結晶成長学会誌   2008.10

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  • InGaN混晶半導体における原子配列の理論的検討

    寒川義裕、柿本浩一、伊藤智徳、纐纈明伯

    応用物理学会誌   2007.2

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  • c-GaN分子線エピタキシーにおける成長初期過程の理論解析

    寒川義裕、松尾有里子、秋山亨、伊藤智徳、白石賢二、柿本浩一

    クリスタルレターズ   2007.2

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  • InGaN気相成長における気相-固相関係に対する基板拘束の影響

    寒川義裕、伊藤智徳、熊谷義直、纐纈明伯

    日本結晶成長学会誌   2003.2

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  • GaAsエピタキシャル成長における吸着-脱離現象への理論的アプローチ

    寒川 義裕, 伊藤智徳, 田口明仁, 白石賢二, 平岡佳子, 入澤寿美, 大鉢 忠

    日本結晶成長学会誌   2002.2

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  • 窒化物半導体の化学気相成長における表面科学の進展 Reviewed

    寒川義裕、草場彰

    2023.4

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    DOI: DOI: 10.1380/vss.66.227

  • GaN有機金属気相成長におけるデジタルツイン開発の現状 Reviewed

    草場彰、寒川義裕、久保山哲二、新田州吾、白石賢二、押山淳

    日本結晶成長学会誌、50-1-05   2023.4

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  • OVPE成長条件下におけるGaN表面構造と点欠陥がGaNの光学特性へ与える影響 Reviewed

    河村貴宏、秋山亨、宇佐美茂佳、今西正幸、吉村政志、森勇介、森川良忠、寒川義裕

    日本結晶成長学会誌、50-1-02   2023.4

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  • 結晶成長とプロセスインフォマティクス 〜理論解析から計算予測へ〜 Reviewed

    寒川義裕

    日本結晶成長学会誌   2022.4

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  • Estimating efficiency of AlGaN light-emitting diodes with numerical simulations Reviewed

    Konrad Sakowski, Kazuki Yamada, Kosuke Sato, Pawel Kempisty, Motoaki Iwaya, Hideto Miyake, Pawel Strak, Akira Kusaba, Yoshihiro Kangawa, Stanislaw Krukowski,

    Journal of the Japanese Association for Crystal Growth   2020.10

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    DOI: 10.19009/jjacg.47-3-05

  • III族窒化物成長における表面・界面の構造および極性の理論解析

    秋山亨、中村浩次、伊藤智徳、#草場彰、@寒川義裕

    日本結晶成長学会誌、45(1)、45-1-03-1-8、2018   2018.4

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  • 窒化物半導体MOVPEの熱力学解析 ~面方位依存性~

    寒川 義裕, 草場 彰, 白石 賢二, 柿本 浩一, 纐纈 明伯

    日本結晶成長学会誌   2017.1

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  • AlN 溶液成長における固-液界面その場観察装置の開発

    寒川 義裕, 三宅 秀人, Michal Bockowski, 柿本 浩一

    日本結晶成長学会誌   2015.10

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  • Theoretical study on structural stability of InN grown by pressurized-reactor MOVPE

    Y. Kangawa, T. Hamada, T. Kimura, R. Katayama, T. Matsuoka, K. Kakimoto

    Extended abstracts of the 33rd Electronic Materials Symposium (EMS30)   2014.7

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  • Theoretical investigation of the influence of growth orientation on indium incorporation efficiency during InGaN growth by MOVPE

    T. Yayama, Y. Kangawa, K. Kakimoto

    Extended abstracts of the 31st Electronic Materials Symposium (EMS30)   2012.7

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  • 固体原料を用いたAlN溶液成長法に関する研究

    寒川義裕、B. M. Epelbaum、桑野範之、柿本浩一

    日本結晶成長学会誌   2012.1

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  • 半導体バルク結晶成長における熱と物質の輸送と成長速度の関係

    柿本浩一、Gao Bing、中野 智、寒川義裕

    日本結晶成長学会誌   2011.10

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  • GaAsN気相エピタキシーにおける混晶組成の理論検討

    川野 潤、寒川義裕、屋山 巴、伊藤智徳、柿本浩一、纐纈明伯

    日本結晶成長学会誌   2011.10

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  • Theoretical approach to anisotropic growth process of graphene on vicinal SiC(0001) surfaces tilting toward [1100]

    M. Inoue, Y. Kangawa, H. Kageshima, K. Wakabayashi, K. Kakimoto,

    Extended abstracts of the 29th Electronic Materials Symposium (EMS29) (ISSN 1343-0343)   2011.7

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  • Phase diagram of Li3N-Al pseudobinary system for AlN growth

    T. Yayama, Y. Kangawa, K. Kakimoto

    Extended abstracts of the 29th Electronic Materials Symposium (EMS29) (ISSN 1343-0343)   2010.7

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  • Tight-binding approach to initial stage of graphitization on SiC surface

    M. Inoue, Y. Kangawa, K. Wakabayash, K. Kakimoto, "

    Extended abstracts of the 29th Electronic Materials Symposium (EMS29) (ISSN 1343-0343)   2010.7

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  • Control of indium composition in coherently grown InGaN thin films

    T. Yayama, Y. Kangawa, K. Kakimoto, A. Koukitu

    Extended abstracts of the 28th Electronic Materials Symposium (EMS28) (ISSN 1343-0343)   2009.7

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  • Microstructures in AlN/sapphire grown by vapor phase epitaxy using Al and Li3N

    Y. Kangawa, N. Kuwano, K. Kakimoto

    Extended abstracts of the 28th Electronic Materials Symposium (EMS28) (ISSN 1343-0343), 2009, H8, 187.   2009.7

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  • Theoretical study of growth condition of cubic GaN

    Y. Kangawa, T. Akiyama, T. Ito, K. Shiraishi, K. Kakimoto

    Extended abstracts of the 27th Electronic Materials Symposium (EMS27) (ISSN 1343-0343)   2008.7

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  • Solution growth of AlN using Al and Li3N under an atmospheric pressure

    T. Wakigawa, Y. Kangawa, K. Kakimoto

    Extended abstracts of the 26th Electronic Materials Symposium (EMS26) (ISSN 1343-0343)   2007.7

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  • 気相の自由エネルギーを考慮した第一原理計算による立方晶GaN 気相成長の成長初期過程解析

    寒川義裕、松尾有里子、秋山亨、伊藤智徳、白石賢二、柿本浩一

    九州大学 応用力学研究所 所報   2007.1

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  • 一方向凝固多結晶シリコンのラマン散乱による応力解析

    松尾整、河村貴宏、寒川義裕、柿本浩一、新船幸二、大下祥雄、山口真史

    日本結晶成長学会誌   2006.1

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  • GaN/GaN(001)における成長初期過程の理論検討

    寒川義裕、松尾有里子、秋山亨、伊藤智徳、白石賢二、柿本浩一

    日本結晶成長学会誌   2006.1

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  • GaN/AlN量子ドットの熱伝導率解析

    河村貴宏、寒川義裕、柿本浩一

    日本結晶成長学会誌   2006.1

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  • 単層及び多層カーボンナノチューブの熱伝導率解析

    河村貴宏、寒川義裕、柿本浩一

    日本結晶成長学会誌   2006.1

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  • Influence of lattice constraint from substrate on compositional instability of InAlGaN thin film

    Y. Kangawa, K. Kakimoto, T. Ito, A. Koukitu

    Extended abstracts of the 24th Electronic Materials Symposium (EMS24) (ISSN 1343-0343)   2005.7

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  • MOVPE growth of GaN buffer layer directly on Si substrate

    A. Koukitu, K. Takemoto, Y. Matsuo, T. Iwamoto, Y. Kangawa, Y. Kumagai

    Extended abstracts of the 24th Electronic Materials Symposium (EMS24) (ISSN 1343-0343)   2005.7

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  • Analysis of thermal conductivity of nitride alloy by molecular dynamics

    T. Kawamura, Y. Kangawa, K. Kakimoto

    Extended abstracts of the 24th Electronic Materials Symposium (EMS24) (ISSN 1343-0343)   2005.7

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  • 化合物半導体気相成長の熱力学

    纐纈明伯、寒川義裕、熊谷義直、関 壽

    応用物理学会誌   2005.2

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  • InGaN組成不安定性のモンテカルロ法による解析

    寒川義裕、柿本浩一

    日本結晶成長学会誌   2005.1

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  • 分子動力学法による格子欠陥を考慮したGaNの熱伝導解析

    河村貴宏、寒川義裕、柿本浩一

    日本結晶成長学会誌   2005.1

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  • 分子動力学法によるAlN/GaN超格子の熱伝導解析

    河村貴宏、寒川義裕、柿本浩一

    日本結晶成長学会誌   2005.1

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  • IV族混晶半導体の熱力学的安定性

    伊藤智徳、寒川義裕

    日本結晶成長学会誌   2004.2

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  • InGaN光励起MOVPEにおける薄膜物性の光強度依存性

    寒川義裕、河口紀仁、岡田安史、熊谷義直、纐纈明伯

    日本結晶成長学会誌   2004.1

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  • 表面反応場制御による窒化物半導体薄膜の高品質化 −表面極性依存性−学、2003、p61

    纐纈明伯、寒川義裕、松尾有里子、熊谷義直

    科研費基盤(C)企画・調査「電子プローブによる光・電子デバイス材料および実装素子のナノ組織解析技術の進展」、桑野範之(Ed.)、九州大   2004.1

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  • Thermodynamic analyses of the MOVPE growth of indium containing nitrides using various nitrogen sources

    J. Kikuchi, Y. Matsuo, Y. Kangawa, Y. Kumagai, A. Koukitu

    Extended abstracts of the 23rd Electronic Materials Symposium (EMS23) (ISSN 1343-0343), 2004, E15.   2004.1

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  • High Fe doping during thick GaN layer growth on sapphire (0001)

    Extended abstracts of the 23rd Electronic Materials Symposium (EMS23) (ISSN 1343-0343)   2004.1

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  • Hydride vapor phase epitaxy of thick AlN layer on sapphire (0001) substrate

    T. Yamane, H. Shikauchi, H. Murakami, Y. Kangawa, Y. Kumagai and A. Koukitu

    Extended abstracts of the 23rd Electronic Materials Symposium (EMS23) (ISSN 1343-0343)   2004.1

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  • 表面光吸収法によるGaAs(111)A面からのAs脱離過程のその場観察

    岩本智行、野間かおり、松尾有里子、寒川義裕、熊谷義直、纐纈明伯

    日本結晶成長学会誌   2004.1

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  • II-IV-V2族磁性半導体薄膜のMBE成長に向けた理論検討

    寒川義裕、石橋隆幸、熊谷義直、纐纈明伯、佐藤勝昭

    日本結晶成長学会誌   2004.1

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  • GaN/GaP ヘテロ成長と基板面方位

    藤野真理恵、富樫理恵、松尾有里子、寒川義裕、熊谷義直、入澤寿美、纐纈明伯、「

    日本結晶成長学会誌   2004.1

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  • 第一原理計算によるIn系窒化物原料の熱力学データ

    松尾有里子、田中健、寒川義裕、熊谷義直、纐纈明伯、「

    日本結晶成長学会誌   2004.1

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  • 様々な窒素源を用いたMOVPE法によるInNおよびInGaNの成長の熱力学解析

    菊地潤、松尾有里子、寒川義裕、田中健、熊谷義直、纐纈明伯

    日本結晶成長学会誌   2004.1

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  • GaAs表面構造の安定性に対する量子論的アプローチ

    寒川義裕、伊藤智徳、白石賢二、大鉢 忠、纐纈明伯

    表面科学   2003.2

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  • GaNホモエピタキシャル成長における成長初期過程の理論検討

    寒川義裕、入澤寿美、熊谷義直、纐纈明伯

    日本結晶成長学会誌   2003.1

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  • Effect of periodic insertion of low-temperature GaN buffer layers during thick GaN layer growth on GaAs(111)A

    Extended abstracts of the 22nd Electronic Materials Symposium (EMS22) (ISSN 1343-0343)   2003.1

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  • Growth of InAs1-xSbx layers on InAs(001) substrates using halide vapor phase epitaxy

    K. Eriguchi, K. Takemoto, Y. Kangawa, Y. Kumagai and A. Koukitu

    Extended abstracts of the 22nd Electronic Materials Symposium (EMS22) (ISSN 1343-0343)   2003.1

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  • 第一原理計算による常圧H2雰囲気下におけるGaAs(111)A面の表面構造相転移

    松尾有里子、寒川義裕、熊谷義直、入澤寿美、纐纈明伯

    日本結晶成長学会誌   2003.1

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  • HVPE法を用いたAlNの成長は可能か?

    纐纈明伯、菊地潤、寒川義裕、熊谷義直

    日本結晶成長学会誌   2003.1

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  • Theoretical approach to control of thickness and composition of III-V semiconductor thin films

    Proc. of the Sixth Symposium on Atomic-Scale Surface and Interface Dynamics, Tokyo   2002.1

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  • Temperature ramping rate dependence of thick GaN growth on GaN buffer/GaAs (111)A substrate

    Y. Kumagai, H. Murakami, Y. Kangawa, H. Seki and A. Koukitu

    Extended abstracts of the 21st Electronic Materials Symposium (EMS21) (ISSN 1343-0343)   2002.1

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  • Empirical potential-based approach to relative stability among tetrahedral clusters in bulk InGaN and InGaN/GaN

    Y. Kangawa, T. Ito, K. Nakamura, Y. Kumagai and A. Koukitu

    Extended abstracts of the 21st Electronic Materials Symposium (EMS21) (ISSN 1343-0343)   2002.1

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  • GaNおよびInN基板上のInGaNの混晶相図作製のモンテカルロシミュレーション

    森篤史、B. B. Laird、寒川義裕、伊藤智徳、纐纈明伯

    日本結晶成長学会誌   2002.1

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  • InGaN/GaNおよびInGaN/InN気相成長における気相−固相関係

    寒川義裕、伊藤智徳、熊谷義直、纐纈明伯

    日本結晶成長学会誌   2002.1

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  • 常圧H2雰囲気下におけるGaAs(001)面からのAs脱離過程と(2x4)再構成面の形成機構

    松尾有里子、寒川義裕、熊谷義直、入澤寿美、纐纈明伯

    日本結晶成長学会誌   2002.1

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  • Monte Carlo simulation study of alloy phase diagrams of InGaN thin film on GaN and InN

    A. Mori, B. B. Laird, Y. Kangawa, T. Ito and A. Koukitu

    Proc. of the Sixth Symposium on Atomic-Scale Surface and Interface Dynamics, Tokyo   2002.1

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  • Empirical potential approach to thermodynamic stability of thin nitride films

    Bulletin of the Stefan University   2001.1

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  • Semigrand canonical Monte Carlo simulation toward the construction of InGaN alloy phase diagram

    N. Kasae, A. Mori, T. Toyama, T. Ito and Y. Kangawa

    Proc. Fifth Symposium on Atomic-Scale Surface and Interface Dynamics, Tokyo, 2001, p425   2001.1

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  • Empirical interatomic potential calculation for compositional instability of InGaN thin films grown on GaN and InN

    Y. Kangawa, T. Ito, A. Mori and A. Koukitu

    Proc. Fifth Symposium on Atomic-Scale Surface and Interface Dynamics, Tokyo   2001.1

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  • Empirical potential-based approach for understanding epitaxial growth of semiconductors

    T. Ito, Y. Kangawa, K. Shiraishi and A. Taguchi

    Proc. Fifth Symposium on Atomic-Scale Surface and Interface Dynamics, Tokyo   2001.1

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  • Relative stability of Ga on the high index GaAs surfaces

    Y. Kangawa, S. Sakaguchi and T. Ito

    Proc. The Fifth International Seminar on Microstructures and Mechanical Properties of New Engineering Materials, Mie   2001.1

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  • ナイトライド半導体の構造安定性への原子間ポテンシャルの適用

    伊藤智徳、寒川義裕

    日本結晶成長学会誌   2000.1

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  • InGaN非混和性に対する基板拘束の寄与

    寒川義裕、伊藤智徳、森篤史、纐纈明伯

    日本結晶成長学会誌   2000.1

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  • 原子間ポテンシャルを用いたInGaAs/(110)InP混晶中に出現するCuAu-I型規則構造形成機構の理論的解析

    寒川義裕、桑野範之、沖憲典、伊藤智徳

    日本金属学会誌   1999.2

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  • 原子間ポテンシャルを用いたInGaAs/(110)InPにおけるCuAu-I型規則化メカニズムの解析

    寒川義裕、桑野範之、沖憲典

    日本結晶成長学会誌   1999.1

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  • Theoretical investigation for ordering mechanism of InGaAs/(110)InP using empirical interatomic potential

    Y. Kangawa, N. Kuwano and K. Oki

    Extended abstracts of the 18th Electronic Materials Symposium (EMS18) (ISSN 1343-0343)   1999.1

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  • TEM observation of microstructures in InAlAs/(110)InP

    C. Kojima, Y. Kangawa, N. Kuwano and K. Oki

    New Direction in Transmission Electron Microscopy and Nono-characterization of Materials, C. Kinoshita, Y. Tomokiyo, S. Matsumura (Eds.), the Research Laboratory for High Voltage Electron Microscopy, Kyushu University, Japan   1997.1

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  • TEM observation for the ordering mechanism of an InGaAs alloy grown on a (110)InP substrate

    Y. Kangawa, N. Kuwano and K. Oki

    Proc. Second Topical Meeting on Structural Dynamics of Epitaxy and Quantum Mechanical Approach, Kobe   1997.1

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  • Ising model approach for the L10-ordering in III-V semiconductor alloys of (A, B)C

    N. Kuwano, Y. Kangawa, M. Ishimaru and K. Oki

    Proc. First Topical Meeting on Structural Dynamics of Epitaxy and Quantum Mechanical Approach, Tokyo   1996.1

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  • Monte Carlo analysis of microstructures in ordered III-V semiconductor alloys: Attempt of simulation for the triple period (TP-A) structure

    Y. Kangawa, N. Kuwano and K. Oki

    Proc. MRS-J Symposium R; Novel Semiconducting Materials, Makuhari Messe, H. Oyanagi (Ed.), MRS-Japan   1996.1

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Industrial property rights

Patent   Number of applications: 2   Number of registrations: 0
Utility model   Number of applications: 0   Number of registrations: 0
Design   Number of applications: 0   Number of registrations: 0
Trademark   Number of applications: 0   Number of registrations: 0

Professional Memberships

  • (一社)ワイドギャップ半導体学会

    2021.5 - Present

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  • 産学協力委員会「R032産業イノベーションのための結晶成長委員会」

    2021.4 - Present

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  • The Japan Society of Applied Physics

    2018.7 - Present

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  • The Japanese Association for Crystal Growth

    2008.4 - Present

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  • JACG

    2000.4 - Present

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  • JSAP

    1996.4 - Present

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  • The Japanese Association for Crystal Growth

  • The Japanese Association for Crystal Growth

  • The Japanese Association for Crystal Growth

  • The Japan Society of Applied Physics

  • The Japan Society of Applied Physics

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Committee Memberships

  • Japanese Association for Crystal Growth   Vice President  

    2022.4 - 2025.3   

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    Committee type:Academic society

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  • 一般社団法人ワイドギャップ半導体学会   総務委員  

    2021.4 - 2023.3   

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  • 日本結晶成長学会ナノエピ分科会   幹事長  

    2019.4 - 2022.3   

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  • International Organization for Crystal Growth (IOCG)   Executive   Foreign country

    2023.1 - Present   

  • Vice-chairman   Domestic

    2022.4 - 2024.3   

  • Organizer   Domestic

    2022.4 - 2024.3   

  • 新エネルギー・産業技術総合開発機構   NEDO技術委員   Domestic

    2022.1   

  • Organizer   Domestic

    2021.4 - 2023.3   

  • 一般社団法人ワイドギャップ半導体学会   総務委員   Domestic

    2021.4 - 2023.3   

  • Executive   Domestic

    2019.4 - 2022.3   

  • 日本結晶成長学会ナノエピ分科会   幹事長   Domestic

    2019.4 - 2022.3   

  • 日本結晶成長学会   理事  

    2019.4 - 2022.3   

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  • Organizer   Domestic

    2019.4 - 2021.3   

  • Executive   Domestic

    2016.4 - 2019.3   

  • Organizer   Domestic

    2016.4 - 2019.3   

  • (公)名古屋産業科学研究所   非常勤所員   Domestic

    2016.4 - 2018.3   

  • ナイトライド基金運営委員会   委員   Domestic

    2015.3 - 2017.3   

  • Organizer   Domestic

    2013.4 - 2016.3   

  • Executive   Domestic

    2013.4 - 2016.3   

  • ナイトライド基金運営委員会   委員   Domestic

    2012.11 - 2015.3   

  • Organizer   Domestic

    2010.4 - 2013.3   

  • Executive   Domestic

    2010.4 - 2013.3   

  • 日本結晶成長学会   ホームページ委員会   Domestic

    2010.4 - 2013.3   

  • Organizer   Domestic

    2008.7 - 2010.3   

  • Organizer   Domestic

    2006.4 - 2008.3   

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Academic Activities

  • Local arrangement committee, chair / Steering committee, vice-chair International contribution

    14th International Conference on Nitride Semiconductors (ICNS-14)  ( Fukuoka Japan ) 2023.11

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    Type:Competition, symposium, etc. 

    Number of participants:1,200

  • 副論文委員長

    第42回電子材料シンポジウム  ( 橿原 ) 2023.10

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • 第42回電子材料シンポジウム

    ( 橿原 Japan ) 2023.10

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    Type:Competition, symposium, etc. 

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  • Jpn. J. Appl. Phys. International contribution

    2023.4 - 2024.3

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    Type:Academic society, research group, etc. 

  • 実行委員長

    第9回講演会(応用物理学会先進パワー半導体分科会)  ( 福岡国際会議場 ) 2022.12

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    Type:Competition, symposium, etc. 

    Number of participants:550

  • 第9回講演会(応用物理学会先進パワー半導体分科会)

    ( 福岡国際会議場 Japan ) 2022.12

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  • 副論文委員長

    第41回電子材料シンポジウム  ( 橿原 ) 2022.10

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • 第41回電子材料シンポジウム

    ( 橿原 Japan ) 2022.10

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    Type:Competition, symposium, etc. 

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  • Program Committee, Member International contribution

    International Workshop on Nitride Semiconductors 2022 (IWN2022)  ( Berlin Germany ) 2022.10

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    Type:Competition, symposium, etc. 

    Number of participants:1,200

  • Jpn. J. Appl. Phys. International contribution

    2022.4 - 2023.3

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    Type:Academic society, research group, etc. 

  • 論文副委員長 International contribution

    2022.3

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    Type:Competition, symposium, etc. 

    Number of participants:400

  • ISPlasma2022/IC-PLANTS2022 International contribution

    ( Nagoya Japan ) 2022.3

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    Type:Competition, symposium, etc. 

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  • 実行委員長 International contribution

    ( 名古屋/オンライン(ハイブリッド) ) 2022.1

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    Type:Competition, symposium, etc. 

    Number of participants:110

  • IWSingularity 2022 / ISWGPDs 2022 International contribution

    ( 名古屋/オンライン(ハイブリッド) Japan ) 2022.1

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    Type:Competition, symposium, etc. 

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  • 論文委員

    第40回電子材料シンポジウム  2021.10

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • 産学協力委員会「R032産業イノベーションのための結晶成長委員会」運営委員

    日本学術振興会  2021.4 - 2026.3

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  • Jpn. J. Appl. Phys. International contribution

    2021.4 - 2022.3

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    Type:Academic society, research group, etc. 

  • 論文委員 International contribution

    2021.3

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    Type:Competition, symposium, etc. 

    Number of participants:400

  • Local Arrangement Committee, Co-chair International contribution

    The 8th Asian Conference on Crystal Growth and Crystal Technology (CGCT-8)  ( online Japan ) 2021.3

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    Type:Competition, symposium, etc. 

    Number of participants:250

  • Steering Committee, Chair International contribution

    International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs2021)  ( online Japan ) 2021.1

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    Type:Competition, symposium, etc. 

    Number of participants:96

  • Screening of academic papers

    Role(s): Peer review

    2021

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:1

  • 論文委員

    第39回電子材料シンポジウム  2020.10

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • Jpn. J. Appl. Phys. International contribution

    2020.4 - 2021.3

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    Type:Academic society, research group, etc. 

  • 論文委員

    第38回電子材料シンポジウム  2019.10

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • 日本学術振興会第162委員会・幹事

    日本学術振興会  2019.10

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  • Session chair International contribution

    13th International Conference on Nitride Semiconductors (ICNS-13)  ( Bellevue, Washington UnitedStatesofAmerica ) 2019.7

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    Type:Competition, symposium, etc. 

    Number of participants:1,200

  • 幹事長

    第11回ナノ構造・エピタキシャル成長講演会  ( 広島 ) 2019.6

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    Type:Competition, symposium, etc. 

    Number of participants:124

  • Steering committee, vice chair International contribution

    The 7th International Conference on Light-Emitting Devices and Their Industrial Applications (LEDIA'19)  ( Yokohama Japan ) 2019.4

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    Type:Competition, symposium, etc. 

    Number of participants:250

  • Jpn. J. Appl. Phys. International contribution

    2019.4 - 2020.3

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    Type:Academic society, research group, etc. 

  • Program Committee/Publication committee, member International contribution

    ISPlasma2019 / IC-PLANTS2019  ( Nagoya Japan ) 2019.3

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    Type:Competition, symposium, etc. 

    Number of participants:400

  • Screening of academic papers

    Role(s): Peer review

    2019

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    Type:Peer review 

    Number of peer-reviewed articles in foreign language journals:2

  • Steering Committee, Member International contribution

    International Workshop on Nitride Semiconductors (IWN2018)  ( Kanazawa Japan ) 2018.11

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    Type:Competition, symposium, etc. 

    Number of participants:800

  • Session chair International contribution

    International Workshop on Nitride Semiconductors (IWN2018)  ( Kanazawa Japan ) 2018.11

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    Type:Competition, symposium, etc. 

    Number of participants:800

  • 座長

    第47回結晶成長国内会議  ( 仙台 ) 2018.10 - 2018.11

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    Type:Competition, symposium, etc. 

    Number of participants:250

  • 座長

    第37回電子材料シンポジウム  ( 滋賀長浜 ) 2018.10

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • 論文委員

    第37回電子材料シンポジウム  ( 滋賀長浜 ) 2018.10

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    Type:Competition, symposium, etc. 

    Number of participants:200

  • Steering Committee, Member International contribution

    19th International Conference on Metalorganic Vapor Phase Epitaxy (ICMOVPE-XIX)  ( Nara Japan ) 2018.6

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    Type:Competition, symposium, etc. 

    Number of participants:500

  • Session chair International contribution

    19th International Conference on Metalorganic Vapor Phase Epitaxy (ICMOVPE-XIX)  ( Nara Japan ) 2018.6

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    Type:Competition, symposium, etc. 

    Number of participants:500

  • Jpn. J. Appl. Phys. International contribution

    2018.4 - 2019.3

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    Type:Academic society, research group, etc. 

  • Program Committee, member International contribution

    ISPlasma2018 / IC-PLANTS2018  ( Nagoya Japan ) 2018.3

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    Type:Competition, symposium, etc. 

    Number of participants:400

  • Screening of academic papers

    Role(s): Peer review

    2018