Kyushu University Academic Staff Educational and Research Activities Database
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Masaharu Shiratani Last modified date:2020.08.04



Graduate School
Undergraduate School
Other Organization
Administration Post
Dean of the Graduate School of Information Science and Electrical Engineering
Other


E-Mail *Since the e-mail address is not displayed in Internet Explorer, please use another web browser:Google Chrome, safari.
Homepage
https://kyushu-u.pure.elsevier.com/en/persons/masaharu-shiratani
 Reseacher Profiling Tool Kyushu University Pure
http://plasma.ed.kyushu-u.ac.jp/index-e.html
Phone
092-802-3734
Fax
092-802-3734
Academic Degree
Doctor of Engineering
Country of degree conferring institution (Overseas)
No
Field of Specialization
plasma engineering
ORCID(Open Researcher and Contributor ID)
0000-0002-4103-3939
Total Priod of education and research career in the foreign country
01years00months
Research
Research Interests
  • plasma agriculture
    keyword : low temperature plasma, germination rate enhancement, growth enhancement
    2010.04~2028.06.
  • Research on third generation photovoltaics
    keyword : third generation photovoltaics, multiple exciton generation
    2008.10.
  • Development of deposition of low-k dielectrics for next generation LSI
    keyword : low-k dielectrics
    2002.01.
  • Development of Cu interconnect in next generation LSI
    keyword : Cu interconnect
    1998.01.
  • Study on particle formation mechanism due to interaction between plasma and carbon wall
    keyword : plasma wall interactionl, nuclear fusion
    2001.01.
  • Study on formation mechanism and control of particles in processing plasmas
    keyword : processing plasma, particle
    1987.01.
  • Study on high rate deposition of high quality materials for solar cells
    keyword : amorphous silicon
    1987.01.
Academic Activities
Books
1. Bharti Arora, Eun Ha Choi, Masaharu Shiratani, and Pankaj Attri, Cellulose: A Smart Material for Water Purification (Smart Materials for Waste Water Applications), Scrivener Publishing, 2016.02.
2. Low Temperature Deposition of Hard Carbon Thin Films Using Plasma Anisotropic Chemical Vapor Deposition Method.
3. Coagulation and Transport of Fine Particles in Processing Plasmas.
4. Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 20, pp.247-257, 2010.05.
5. Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani, Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 31, pp.377-383, 2010.05.
6. Combinatorial plasma process analyzer for highly efficient research and development.
7. Towards Revolutionary Amorphous Silicon Solar Cells without Light-Induced Degradation.
Papers
1. P. Attri, S. Choi, M. Kim, M. Shiratani, A. E. Cho, W. Lee, Influence of alkyl chain substitution of ammonium ionic liquids on the activity and stability of tobacco etch virus protease , International Journal of Biological Macromolecules, 10.7567/1347-4065/ab656c, 155, 439-446, 2020.07.
2. I. Tamošiūnė, D. Gelvonauskienė, L. Ragauskaitė, K. Koga, M. Shiratani, D. Baniulis, Cold plasma treatment of Arabidopsis thaliana (L.) seeds modulates plant-associated microbiome composition, Applied Physics Express, 10.35848/1882-0786/ab9712, 13, 076001, 2020.05.
3. M.K. Son, H. Seo, M. Watanabe, M. Shiratani, T. Ishihara, Characteristics of crystalline sputtered LaFeO3 thin films as photoelectrochemical water splitting photocathodes, Nanoscale, 10.1039/d0nr01762k, 12, 17, 9653-9660, 2020.05.
4. P. Attri, J. Razzokov, M. Yusupov, K. Koga, M. Shiratani, A. Bogaerts, Influence of osmolytes and ionic liquids on the Bacteriorhodopsin structure in the absence and presence of oxidative stress: A combined experimental and computational study, International Journal of Biological Macromolecules, 10.1016/j.ijbiomac.2020.01.179, 148, 657-665, 2020.04.
5. N. Itagaki, Y. Nakamura, R. Narishige, K. Takeda, K. Kamataki, K. Koga, M. Hori, M. Shiratani, Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition, Sci. Rep., 10.1038/s41598-020-61596-w, 10, 4669, 2020.03.
6. K. Koga, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene, Impact of radish sprouts seeds coat color on the electron paramagnetic resonance signals after plasma treatment, Jpn. J. Appl. Phys. , 10.35848/1347-4065/ab7698, 59, SH, SHHF01, 2020.03.
7. T. Kawasaki, K. Nishida, G. Uchida, F. Mitsugi, K. Takenaka, K. Koga, Y. Setsuhara, M. Shiratani, Effects of surrounding gas on plasma-induced downward liquid flow, Jpn. J. Appl. Phys. , 10.35848/1347-4065/ab71dc, 59, SH, SHHF02, 2020.03.
8. L. D. Fomins, G. Pauzaite, R. Zukiene, V. Mildaziene, K. Koga, M. Shiratani, Relationship between cold plasma treatment-induced changes in radish seed germination and phytohormone balance, Jpn. J. Appl. Phys. , 10.7567/1347-4065/ab656c, 59, SH1001, 2020.02.
9. I. Suhariadi, N. Itagaki, M. Shiratani, Improved Nanoscale Al-doped ZnO with a ZnO Buffer Layer Fabricated by Nitrogen-mediated Crystallization for Flexible Optoelectronic Devices, ACS Appl. Nano Mater., 10.1021/acsanm.9b02571, 3, 2480-2490, 2020.02.
10. Y. Kim, K. Koga, M. Shiratani, Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition, Curr. Appl. Phys., 10.1016/j.cap.2019.11.001, 20, 1, 191-195, 2020.01.
11. Y. Kim, K. Koga, M. Shiratani, Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition, Curr. Appl. Phys., 10.1016/j.cap.2019.11.001, 20, 1, 191-195, 2020.01.
12. R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Appl. Phys. Express, 10.7567/1882-0786/ab5491, 12, 12, 126003, 2019.11.
13. R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Appl. Phys. Express, 10.7567/1882-0786/ab5491, 12, 12, 126003, 2019.11.
14. K. Tanaka, H. Hara, S. Nagaishi, L. Shi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD, Plasma Fusion Res., 10.1585/pfr.14.4406141, 14, 4406141, 2019.09.
15. L. Shi, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films, Plasma Fusion Res., 10.1585/pfr.14.4406144, 14, 4406144, 2019.09.
16. S. H. Hwang, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition, Plasma Fusion Res., 10.1585/pfr.14.4406115, 14, 4406115, 2019.09.
17. R. Zhou, K. Kamataki, H. Ohtomo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma, Plasma Fusion Res., 10.1585/pfr.14.4406120, 14, 4406120, 2019.09.
18. S. Nakano, M. Shiratani, Impact of heterointerface properties of crystalline germanium heterojunction solar cells, Thin Solid Films, 10.1016/j.tsf.2019.06.028, 685, 225-233, 2019.09.
19. T. Kawasaki, F. Mitsugi, K. Koga, M. Shiratani, Local supply of reactive oxygen species into a tissue model by atmospheric-pressure plasma-jet exposure, J. Appl. Phys., 10.1063/1.5091740, 125, 21, 213303, 2019.06.
20. N. Miyahara, S. Urakawa, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate, MRS Adv., 10.1557/adv.2019.17, 4, 27, 1551-1556, 1551-1556, 2019.01.
21. S. Muraoka, L. Jiahao, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Effects of nitrogen impurity on zno crystal growth on Si substrates, MRS Adv., 10.1557/adv.2019.28, 4, 27, 1557-1563, 1557-1563, 2019.01.
22. N. Miyahara, K. Iwasaki, D. Yamashita, D. Nakamura, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Photoluminescence of (ZnO)0.82 (InN)0.18 films: Incident light angle dependence, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2099, 941, 2099-2103, 2018.12.
23. N. Itagaki, K. Takeuchi, N. Miyahara, K. Imoto, H. Seo, K. Koga, M. Shiratani, Effects of sputtering pressure on (ZnO)x(InN)1-x crystal film growth at 450ºC, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2093, 941, 2093-2098, 2018.12.
24. R. Zhou, K. Mori, H. Ohtomo, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cross-correlation analysis of fluctuations of interactions between nanoparticles and low pressure reactive plasmas, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2104, 941, 2104-2108, 2018.12.
25. P. Attri, F. Tochikubo, J. H. Park, E. H. Choi, K. Koga, M. Shiratani, Impact of Gamma rays and DBD plasma treatments on wastewater treatment, Scientific reports, 10.1038/s41598-018-21001-z, 8, 1, 2018.12, The rapid growth in world population brings with it the need for improvement in the current technology for water purification, in order to provide adequate potable water to everyone. Although an advanced oxidation process has been used to purify wastewater, its action mechanism is still not clear. Therefore, in the present study we treat dye-polluted water with gamma rays and dielectric barrier discharge (DBD) plasma. We study the wastewater treatment efficiency of gamma rays and DBD plasma at different absorbed doses, and at different time intervals, respectively. Methyl orange and methylene blue dyes are taken as model dyes. To understand the effects of environment and humidity on the decolorization of these dyes, we use various gas mixtures in the DBD plasma reactor. In the plasma reactor, we use the ambient air and ambient air + other gas (oxygen, nitrogen, and argon) mixtures, respectively, for the treatment of dyes. Additionally, we study the humidity effect on the decolorization of dyes with air plasma. Moreover, we also perform plasma simulation in different environment conditions, to understand which major radicals are generated during the plasma treatments, and determine their probable densities..
26. Y. Kim, K. Koga, M. Shiratani, Particle behavior and its contribution to film growth in a remote silane plasma, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 10.1116/1.5037539, 36, 5, 2018.09.
27. T. Fang, K. Yamaki, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka,Y. Setsuhara, The effect of the H2/(H2+Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition, Thin Solid Films, 10.1016/j.tsf.2018.02.035, 660, 891-898, 2018.08.
28. T. Kojima, S. Toko, K. Tanaka, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition, Plasma Fusion Res., 10.1585/pfr.13.1406082, 13, 1406082, 2018.06.
29. S. Toko, R. Katayama, K. Koga, E. Leal-Quiros, M. Shiratani , Dependence of CO2 Conversion to CH4 on CO2 Flow Rate in Helicon Discharge Plasma, Sci. Adv. Mater., 10.1166/sam.2018.3141, 10, 5, 655-659, 2018.05.
30. M. Gherardi, N. Puač, M. Shiratani, Special issue: Plasma and agriculture, Plasma Processes & Polymers, 10.1002/ppap.201877002, 15, 2, 1877002, 2018.02.
31. N. Puač, M. Gherardi, M. Shiratani, Plasma agriculture: A rapidly emerging field, Plasma Processes & Polymers, 10.1002/ppap.201700174, 15, 2, 1700174, 2018.02.
32. M. Ito, Jun-Seok Oh, T. Ohta, M. Shiratani, M. Hori, Current Status and Future Prospect of Agricultural Applications using Atmospheric-Pressure Plasma Technologies, Plasma Processes & Polymers, 10.1002/ppap.201700073, 15, 2, 1700073, 2018.02.
33. H. Seo, D. Sakamoto, H. Chou, N. Itagaki, K. Koga, M. Shiratani , Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction, Progress in Photovoltaics: Research and Applications, 10.1002/pip.2961, 26, 2, 145-150, 2018.02.
34. T. Kawasaki, G. Kuroeda, R. Sei, M. Yamaguchi, R. Yoshinaga, R. Yamashita, H. Tasaki, K. Koga, M. Shiratani, Transportation of reactive oxygen species in a tissue phantom after plasma irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.57.01AG01, 57, 1S, 01AG01, 2017.11.
35. S. Tanami, D. Ichida, S. Hashimoto, H. Seo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition, Thin Solid Films , 10.1016/j.tsf.2017.02.067 , 641, 59-64, 2017.11.
36. S. Toko, K. Keya, Y. Torigoe, T. Kojima, H. Seo, N. Itagaki, K. Koga, M. Shiratani , Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.01.034, 326, Part B, 388-394, 2017.10.
37. J. G. Han, L. Martinu, M. Shiratani, Preface - Surface Engineering at the International Vacuum Congress-20, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.08.029, 326, Part B, 367, 2017.10.
38. P. Attri, M. Kim, E. H. Choi, A. E. Cho, K. Koga, M. Shiratani, Impact of an ionic liquid on protein thermodynamics in the presence of cold atmospheric plasma and gamma rays, Phys. Chem. Chem. Phys., 10.1039/c7cp04083k, 19, 37, 25277-25288, 2017.10.
39. H. Seo, C. V.V.M. Gopi, H.-J. Kim, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst, Electrochimica Acta, 10.1016/j.electacta.2017.08.030, 249, 337-342, 2017.09.
40. P. Attri, M. Kim, T. Sarinont, E. H. Choi, H. Seo, A. E. Cho, K. Koga, M. Shiratani, The protective action of osmolytes on the deleterious effects of gamma rays and atmospheric pressure plasma on protein conformational changes, Scientific Reports, 10.1038/s41598-017-08643-1, 7, 8698, 2017.08.
41. K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body , ECS Transactions, 10.1149/07703.0017ecst, 77, 3, 17-24, 2017.05.
42. H.-J. Kim, G.-C. Xu, C. V.V.M. Gopi, H. Seo, M. Venkata-Haritha, M. Shiratani, Enhanced light harvesting and charge recombination control with TiO2/PbCdS/CdS based quantum dot-sensitized solar cells, Journal of Electroanalytical Chemistry, 10.1016/j.jelechem.2017.02.005, 788, 131-136, 2017.03.
43. K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Densities and surface reaction probabilities of oxygen and nitrogen atoms during sputter deposition of ZnInON on ZnO, IEEE Trans. Plasma Science, 10.1109/TPS.2016.2632124, 45, 2, 323-327, 2017.02.
44. T. Sarinont, R. Katayama, Y. Wada, K. Koga, M. Shiratani, Plant Growth Enhancement of Seeds Immersed in Plasma Activated Water, MRS Adv., 10.1557/adv.2017.178, 2, 18, 995-1000, 2017.02.
45. T. Sarinont, Y. Wada, K. Koga, M. Shiratani, Response of Silkworm Larvae to Atmospheric Pressure Non-thermal Plasma Irradiation, Plasma Medicine, 10.1615/PlasmaMed.2017019137 , 6, 3-4, 2017.01.
46. L. P. Lingamdinne, Y. Chang, J.-K. Yang, J. Singh, E. H. Choi, M. Shiratani, J. R. Koduru, P. Attri, Biogenic reductive preparation of magnetic inverse spinel iron oxide nanoparticles for the adsorption removal of heavy metals, Chemical Engineering Journal, 10.1016/j.cej.2016.08.067, 307, 74-84, 2017.01.
47. K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki , Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization, MRS Adv., 10.1557/adv.2016.617, 2, 5, 265-270, 2016.12.
48. K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Blue Photoluminescence of (ZnO)0.92(InN)0.08, MRS Adv., 10.1557/adv.2016.625, 2, 5, 277-282, 2016.12.
49. G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara, Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water, J. Appl. Phys., 10.1063/1.4968568, 120, 20, 203302-1 - 203302-9, 2016.11.
50. M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga , Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication, Materials Science Forum, 10.4028/www.scientific.net/MSF.879.1772, 879, 1772-1777 , 2016.11.
51. J. H. Park, M. Kim, M. Shiratani, Art. E. Cho, E. Choi & P. Attri, Variation in structure of proteins by adjusting reactive oxygen and nitrogen species generated from dielectric barrier discharge jet, Scientific Reports, 10.1038/srep35883, 6, 35883, 2016.10.
52. P. Attri, M. Yusupov, J. H. Park, L. P. Lingamdinne, J. R. Koduru, M. Shiratani, E. Choi & A. Bogaerts, Mechanism and comparison of needle-type non-thermal direct and indirect atmospheric pressure plasma jets on the degradation of dyes, Scientific Reports, 10.1038/srep34419, 6, 34419, 2016.10.
53. S. Toko, Y. Kanemitsu, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.13233, 16, 10, 10753-10757, 2016.10.
54. T. Sarinont, T. Amano, P. Attri, K. Koga, N. Hayashi, M. Shiratani, Effects of plasma irradiation using various feeding gases on growth of Raphanus sativus L. , Arch. Biochem. Biophys., 10.1016/j.abb.2016.03.024 , 605, 129-140, 2016.09.
55. H. Seo, M. K. Son, S. Hashimoto, T. Takasaki, N. Itagaki, K. Koga, M. Shiratani, Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells, Electrochimica Acta, 10.1016/j.electacta.2016.06.020, 210, 880-887, 2016.08.
56. H. Seo, S. H. Nam, N. Itagaki, K. Koga, M. Shiratani, and J.-H. Boo, Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells, Electron. Mater. Lett., 10.1007/s13391-016-4018-8, 12, 4, 530-536, 2016.07.
57. K. Keya, T. Kojima, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.07LE03, 55, 7S2, 07LE03, 2016.07.
58. B. B. Sahu, Y. Yin, J. G. Han, M. Shiratani , Low temperature synthesis of silicon quantum dots with plasma chemistry control in dual frequency non-thermal plasmas, Phys. Chem. Chem. Phys., 10.1039/c6cp01856d, 18, 23, 2016.06.
59. C. V. V. M. Gopi, M. V. Haritha, H. Seo, S. Singh, S.-K. Kim, M. Shiratani, H. Kim, Improving the performance of quantum dot sensitized solar cells through CdNiS quantum dots with reduced recombination and enhanced electron life time, Dalton Trans., 10.1039/C6DT00283H , 45, 20, 8447-8457, 2016.05.
60. H. Seo, D. Ichida, S. Hashimoto, N. Itagaki, K. Koga, M. Shiratani, S. H. Nam and J. H. Boo , Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12210, 16, 5, 4875-4879, 2016.05.
61. T. Kawasaki, S. Kusumegi, A. Kudo, T. Sakanoshita, T. Tsurumaru, A. Sato, G. Uchida, K. Koga and M. Shiratani, Effects of irradiation distance on supply of reactive oxygen species to the bottom of a Petri dish filled with liquid by an atmospheric O2/He plasma jet, J. Appl. Phys., 10.1063/1.4948430, 119, 173301, 2016.05.
62. D. Punnoose, CH. S. S. P. Kumar, A. E. Reddy, S. S. Rao, C. V. Tulasivarma, S.-K. Kim, H. Seo, M. Shiratani, S.-H. Chung, H. Kim , Reduced recombination with an optimized barrier layer on TiO2 in PbS/CdS core shell quantum dot sensitized solar cells, New J. Chem., 10.1039/C5NJ02947C, 4, 40, 3423-3431, 2016.04.
63. H. Seo, M. Shiratani, K. Seneekatima, R. Pornprasertsuk , Catalytic Improvement on Counter Electrode of Dye-Sensitized Solar Cells Using Electrospun Pt Nano-Fibers, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12294, 16, 4, 3332-3337, 2016.04.
64. M. Shiratani, T. Sarinont, K. Koga and N. Hayashi, R&D status of agricultural applications of high voltage and plasma in Japan, Proc. Workshop on Application of Advanced Plasma Technologies in CE Agriculture, 29-30, 2016.04.
65. H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani , Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition, Sci. Adv. Mater., 10.1166/sam.2016.2520, 8, 3, 636-639, 2016.03.
66. H. Seo, M.-K. Son, N. Itagaki, K. Koga, M. Shiratani, Polymer Counter Electrode of Poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) Containing TiO2 Nano-particles for Dye-sensitized Solar Cells, Journal of Power Sources, 10.1016/j.jpowsour.2015.12.112, 307, 25-30, 2016.03.
67. K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering, MRS Advances, 10.1557/adv.2015.59, 1, 2, 115-119, 2016.01.
68. S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Effects of Gas Flow Rate on Deposition Rate and Amount of Si Clusters Incorporated into a-Si:H Films, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA19, 55, 1S, 01AA19, 2016.01.
69. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA11, 55, 1S, 01AA11, 2016.01.
70. T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Production of In, Au, and Pt nanoparticles by discharge plasmas in water for assessment of their bio-compatibility and toxicity, MRS Adv., 10.1557/adv.2016.41, 1, 18, 1301-1306, 2016.01.
71. M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga, Plant Growth Response to Atmospheric Air Plasma Treatments of Seeds of 5 Plant Species, MRS Adv., 10.1557/adv.2016.37, 1, 18, 1265-1269, 2016.01.
72. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, N. Hayashi, M. Shiratani, Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.), Appl. Phys. Express, 10.7567/APEX.9.016201, 9, 1, 016201, 2015.12.
73. P. Attri, T. Sarinont, M. Kim, T. Amano, K. Koga, A. E. Cho, E. Choi, M. Shiratani, Influence of ionic liquid and ionic salt on protein against the reactive species generated using dielectric barrier discharge plasma , Scientific Reports, 10.1038/srep17781, 5, 17781 , 2015.12.
74. G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the discharge characteristics of a plasma jet impinging onto the liquid surface, IEEE Trans. Plasma Science, 10.1109/TPS.2015.2488619, 43, 12, 4081-4087, 2015.12.
75. T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Synthesis of Indium-Containing Nanoparticles in Aqueous Suspension Using Plasmas in Water for Evaluating Their Kinetics in Living Body, J. Nanosci. Nanotechnol., 10.1166/jnn.2015.11427, 15, 11, 9298-9302, 2015.11.
76. T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka, Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.158, 2015.10.
77. S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.149, 2015.10.
78. H. Seo, S. Hashimoto, D. Ichida, N. Itagaki, K. Koga and M. Shiratani , Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode, Electrochimica Acta, 10.1016/j.electacta.2015.04.105, 179, 206-210, 2015.10.
79. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.143, 2015.10.
80. K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.132, 2015.10.
81. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.145, 2015.10.
82. T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.150, 2015.10.
83. K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.154, 2015.10.
84. T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.155, 2015.10.
85. D. Yamashita, M. Soejima, T. Ito, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Laser trapped single fine particle as a probe of plasma parameters, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.104, 2015.10.
86. S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.133, 2015.10.
87. Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of electrode structure on characteristics of multi-hollow discharges, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.129, 2015.10.
88. T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani, Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.136, 2015.10.
89. R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group, Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.101, 2015.10.
90. T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki, Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.49, 2015.10.
91. S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.152, 2015.10.
92. M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani, Attraction during binary collision of fine particles in Ar plasma, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.18, 2015.10.
93. G. Uchida, A. Nakajima, T. Kawasaki, K. Koga, K. Takenaka, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, TF1.2, 2015.10.
94. Y. Setsuhara, G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Discharge characteristics and hydrodynamics behaviors of atmospheric plasma jets produced in various gas flow patterns, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.58, 2015.10.
95. M. Tateishi, K. Koga, R. Katayama, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experiment Group, Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances, J. Nucl. Mater. , 10.1016/j.jnucmat.2014.10.049, 463, 865–868, 2015.08.
96. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of ZnInON/ZnO multi-quantum well solar cells, Thin Solid Films, 10.1016/j.tsf.2015.01.012, 587, 106-111, 2015.07.
97. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.40.123, 40, 2, 123-128, 2015.07.
98. S. Toko, Y. Torigoe, W. Chen, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability, Thin Solid Films, 10.1016/j.tsf.2015.02.052 , 587, 126-131, 2015.07.
99. A. Nakajima, G. Uchida, T. Kawasaki, K. Koga, T. Sarinont, T. Amano, K. Takenaka, M. Shiratani, Y. Setsuhara, Effects of gas flow on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation, J. Appl. Phys., 10.1063/1.4927217, 118, 4, 043301, 2015.07.
100. N. Hayashi, R. Ono, M. Shiratani, A. Yonesu, Antioxidative activity and growth regulation of Brassicaceae induced by oxygen radical irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.06GD01, 54, 6S2, 06GD01, 2015.06.
101. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.248, 1741, aa09-10, 2015.03.
102. N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, ZnO-based semiconductors with tunable band gap for solar sell applications, Proc. SPIE photonics west 2015, 10.1117/12.2078114, 9364, 93640P, 2015.03.
103. T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.87, 1741, aa09-12, 2015.02.
104. A. Tanaka, M. Hirata, N. Matsumura, K. Koga, M. Shiratani, Y. Kiyohara, Comparative Study on the Pulmonary Toxicity of Indium Hydroxide, Indium-Tin Oxide, and Indium Oxide Following Intratracheal Instillations into the Lungs of Rats, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.21, 1723, g02-03, 2015.02.
105. T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Air Plasma Irradiation to Seeds of Radish Sprouts on Chlorophyll and Carotenoids Concentrations in their Leaves, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.39, 1723, g02-04, 2015.02.
106. T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Multigeneration Effects of Plasma Irradiation to Seeds of Arabidopsis Thaliana and Zinnia on Their Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.12, 1723, g03-04, 2015.01.
107. H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.01AD02, 54, 1S, 01AD02, 2015.01.
108. N. Itagaki, K. Matsushima, D. Yamashia, H. Seo, K. Koga, M. Shiratani, Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap, Mater. Res. Express, 10.1088/2053-1591/1/3/036405, 1, 3, 036405, 2014.09.
109. H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.39.321, 39, 3, 321-324, 2014.09.
110. I. Suhariadi, M. Shiratani, N. Itagaki, Growth mechanism of ZnO deposited by nitrogen mediated crystallization, Mater. Res. Express, 10.1088/2053-1591/1/3/036403, 1, 3, 036403, 2014.09.
111. N. Itagaki, K. Kuwahara, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method, Opt. Engineering, 10.1117/1.OE.53.8.087109, 53, 8, 087109, 2014.08.
112. S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Dust Hour Glass in a Capacitive RF Discharge , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2343975 , 42, 10, 2672-2673, 2014.08.
113. M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara, SiC Nanoparticle Composite Anode for Li-Ion Batteries, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2014.742, 1678, n08-58, 2014.07.
114. S. Kitazaki, T. Sarinont, K. Koga, N. Hayashi, M. Shiratani, Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas, Curr. Appl. Phys., 10.1016/j.cap.2013.11.056, 14, 2, S149–S153, 2014.07.
115. T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani, Plasma etching of single fine particle trapped in Ar plasma by optical tweezers, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012014, 518, 1, 012014, 2014.06.
116. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori, Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012010, 518, 1, 012010, 2014.06.
117. Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012007, 518, 1, 012007, 2014.06.
118. D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012002, 518, 1, 012002, 2014.06.
119. S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012008, 518, 1, 012008, 2014.06.
120. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group, Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012009, 518, 1, 012009, 2014.06.
121. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, T. Shimizu, G. Uchida, K. Koga, M. Shiratani, Visualization of the Distribution of Oxidizing Substances in an Atmospheric Pressure Plasma Jet , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2325038, 42, 10, 2482-2483, 2014.06.
122. P. Chewchinda, K. Hayashi, D. Ichida, H. Seo, G. Uchida, M. Shiratani, O. Odawara and H. Wada, Preparation of Si nanoparticles by laser ablation in liquid and their application as photovoltaic material in quantum dot sensitized solar cell, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012023, 518, 1, 012023, 2014.06.
123. T. Sarinont, T. Amano, S. Kitazaki, K. Koga, G. Uchida, M. Shiratani and N. Hayashi, Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012017, 518, 1, 012017, 2014.06.
124. K. Koga, X. Dong, S. Iwashita, U. Czarnetzki and M. Shiratani, Formation of carbon nanoparticle using Ar+CH4 high pressure nanosecond discharges, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012020, 518, 1, 012020, 2014.06.
125. I. Yoshida, T. Matsui, H. Sai, T. Suezaki, H. Katayama, M. Matsumoto, S. Sugiyama, T. Masuda, M. Ushijima, S. Nonomura, M. Shiratani, M. Konagai, K. Saito, M. Kondo, M. Tanaka, S. Niki, Development and Progress in Thin Film Si Photovoltaic Technologies by Photovoltaic Power Generation Technology Research Association, Proc. 40th IEEE PVSC, 10.1109/PVSC.2014.6925520 , 2832 - 2835 , 2014.06.
126. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Control of the area irradiated by the sheet-type plasma jet in atmospheric pressure, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012016, 518, 1, 012016, 2014.06.
127. H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance dependence of Si quantum dot-sensitized solar cells on counter electrode, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FZ01, 53, 5S1, 05FZ01, 2014.05.
128. M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, and K. Kamataki, Nanostructure Control of Si and Ge Quantum Dots Based Solar Cells Using Plasma Processes, Materials Science Forum, 10.4028/www.scientific.net/MSF.783-786.2022, 783-786, 2022-2027, 2014.05.
129. N. Hayashi, Y, Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of the surfaces of agricultural products using active oxygen species generated by atmospheric plasma and UV light, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FR03 , 53, 5S1, 05FR03 , 2014.05.
130. I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, and N. Itagaki, Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015064, 1, 015064, 2014.03.
131. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015020, 1, 015020, 2014.03.
132. N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization, Proc. SPIE photonics west 2014, 10.1117/12.2041081 , 8987, 89871A, 2014.03.
133. H. Seo, M. Son, S. Park, M. Jeong, H. Kim, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell, Thin Solid Films, 10.1016/j.tsf.2013.08.103, 554, 122-126, 2014.03.
134. G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015082, 1, 015082, 2014.03.
135. S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, and M. Shiratani, Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015069, 1, 015069, 2014.03.
136. X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori, Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015072, 1, 015072, 2014.03.
137. M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga, Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015083, 1, 015083, 2014.03.
138. G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015080, 1, 015080, 2014.03.
139. H. Seo, M. Son, H. Kim, M. Shiratani, The enhancement of dye adsorption in dye-sensitized solar module by an electrical adsorption method, Thin Solid Films, 10.1016/j.tsf.2013.05.153, 554, 118-121, 2014.03.
140. T. Sarinont, K. Koga, S. Kitazaki, G. Uchida, N. Hayashi, M. Shiratani, Effects of Atmospheric Air Plasma Irradiation on pH of Water, JPS Conf. Proc., 10.7566/JPSCP.1.015078, 1, 015078, 2014.03.
141. Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P37, 2014.02.
142. A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida, Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S2-P35, 2014.02.
143. I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P05, 2014.02.
144. R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P03, 2014.02.
145. T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P19, 2014.02.
146. M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Spatial profile of flux of dust particles in hydrogen helicon plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P21, 2014.02.
147. D. Yamashita, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Raman spectroscopy of a fine particle optically trapped in plasma, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P23, 2014.02.
148. H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Quantum characterization and photovoltaic application of Si nano-particles fabricated by multi-hollow plasma discharge chemical vapor deposition, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S11-P36, 2014.02.
149. X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori, Pressure dependence of carbon film deposition using H-assisted plasma CVD, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P14, 2014.02.
150. T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-SPD-P01, 2014.02.
151. K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P07, 2014.02.
152. S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P17, 2014.02.
153. D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P33, 2014.02.
154. G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani, Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries, Proc. 8th Int. Conf. Reactive Plasmas, 4C-PM-O1, 2014.02.
155. K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P02, 2014.02.
156. T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S08-P10, 2014.02.
157. Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P36, 2014.02.
158. S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P32, 2014.02.
159. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-14, 2014.02.
160. Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P35, 2014.02.
161. H. Seo, D. Ichida, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells, Int. J. Precision Eng. Manuf., 10.1007/s12541-014-0343-8, 15, 2, 339-343, 2014.02.
162. Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S02-P10, 2014.02.
163. M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida, A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 4B-PM-O1, 2014.02.
164. T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Visualization of oxidizing substances generated by atmospheric pressure non-thermal plasma jet with water, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S09-P25, 2014.02.
165. N. Hayashi, Y. Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of agricultural products using active oxygen species generated by plasma and UV light (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A2, 2014.02.
166. K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A4, 2014.02.
167. T. Amano, T. Sarinont, S. Kitazaki, N. Hayashi, K. Koga, M. Shiratani, Long term growth of radish sprouts after atmospheric pressure DBD plasma irradiation to seeds, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P33, 2014.02.
168. S. Komatsu and M. Shiratani, Formation of microcones accompanied with ripple patterns in laser-activated plasma CVD of sp(3)-bonded BN films, J. Mater. Res., 10.1557/jmr.2014.7, 29, 4, 485-491, 2014.02.
169. M. Shiratani, Fluctuation and Nanotechology, Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-15, 2014.02.
170. T. Sarinont, K. Koga, S. Kitazaki, M. Shiratani, N. Hayashi, Effects of growth enhancement by plasma irradiation to seeds in water, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P32, 2014.02.
171. M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, G. Uchida, H. Seo, and N. Itagaki, Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010201, 53, 1, 010201, 2014.01.
172. S. Komatsu, M. Shiratani, Self-organized formation of hierarchically-ordered structures in laser-activated plasma CVD of sp(3)-bonded BN films , Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010202, 53, 1, 010202 , 2014.01.
173. H. Seo, Y. Wang, M. Sato, G. Uchida, K. Koga, N. Itagaki, K. Kamataki, M. Shiratani, The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si, Thin Solid Films, 10.1016/j.tsf.2013.04.073, 546, 284-288, 2013.11.
174. H. Seo, Y. Wang, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, S. Nam, J. Boo, Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO2, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM02, 52, 11S, 11NM02, 2013.11.
175. K. Koga, M. Tateishi, K. Nishiyama, G. Uchida, K. Kamataki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, Akiko Sagara, the LHD Experimental Group, Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA08, 52, 11S, 11NA08, 2013.11.
176. K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 eV to 3.3 eV on ZnO Templates, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM06, 52, 11S, 11NM06, 2013.11.
177. I. Suhariadi, K. Oshikawa, K. Kuwahara, K. Matsushima, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NB03, 52, 11S, 11NB03, 2013.11.
178. Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani, Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si and SiH, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA07, 52, 11S, 11NA07, 2013.11.
179. G. Uchida, Y. Wang, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA05, 52, 11S, 11NA05, 2013.11.
180. H. Seo, M. Son, H. Kim, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys., 10.7567/JJAP.52.10MB07, 52, 10S, 10MB07, 2013.10.
181. G. Uchida, M. Sato, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells, Thin Solid Films, 10.1016/j.tsf.2013.04.111, 544, 93-98, 2013.10.
182. O. Kaneko, H. Yamada, S. Inagaki, M. Jakubowski, S. Kajita, S. Kitajima, Kobayashi, K. Koga, T. Morisaki, S. Morita, T. Mutoh, S. Sakakibara, Y. Suzuki, H. Takahashi, K. Tanaka, K. Toi, Y. Yoshimura, T. Akiyama, Y. Asahi, N. Ashikawa, H. Chikaraishi, A. Cooper, D.S. Darrow, E. Drapiko, P. Drewelow, X. Du, A. Ejiri, M. Emoto, T. Evans N. Ezumi, K. Fujii, T. Fukuda, H. Funaba, M. Furukawa, D.A. Gates, M. Goto, T. Goto, W. Guttenfelder, S. Hamaguchi, M. Hasuo, T. Hino, Y. Hirooka, K. Ichiguchi, K. Ida, H. Idei, T. Ido, H. Igami, K. Ikeda, S. Imagawa, T. Imai, M. Isobe, M. Itagaki, T. Ito, K. Itoh, S. Itoh, A. Iwamoto, K. Kamiya, T. Kariya, H. Kasahara, N. Kasuya, D. Kato, T. Kato, K. Kawahata, F. Koike, S. Kubo, R. Kumazawa, D. Kuwahara, S. Lazerson, H. Lee, S. Masuzaki, S. Matsuoka, H. Matsuura, A. Matsuyama, C. Michael, D. Mikkelsen, O. Mitarai, T. Mito, J. Miyazawa, G. Motojima, K. Mukai, A. Murakami, I. Murakami, S. Murakami, T. Muroga, S. Muto, K. Nagaoka, K. Nagasaki, Y. Nagayama, N. Nakajima, H. Nakamura, Y. Nakamura, H. Nakanishi, H. Nakano, T. Nakano, K. Narihara, Y. Narushima, K. Nishimura, S. Nishimura, M. Nishiura, Y.M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, N. Ohno, N. Ohyabu, T. Oishi, M. Okamoto, A. Okamoto, M. Osakabe, Y. Oya1, T. Ozaki, N. Pablant, B.J. Peterson, A. Sagara, K. Saito, R. Sakamoto, H. Sakaue, M. Sasao2, K. Sato, M. Sato, K. Sawada, R. Seki, T. Seki, V. Sergeev, S. Sharapov, I. Sharov, A. Shimizu, T. Shimozuma, M. Shiratani, M. Shoji, S. Sudo, H. Sugama, C. Suzuki, K. Takahata, Y. Takeiri, Y. Takemura, M. Takeuchi9, H. Tamura, N. Tamura, H. Tanaka, T. Tanaka, M. Tingfeng, Y. Todo, M. Tokitani, K. Tokunaga, T. Tokuzawa, H. Tsuchiya, K. Tsumori, Y. Ueda, L. Vyacheslavov, K.Y. Watanabe, T. Watanabe, T.H. Watanabe, B. Wieland, I. Yamada, S. Yamada, S. Yamamoto, N. Yanagi, R. Yasuhara, M. Yokoyama, N. Yoshida, S. Yoshimura, T. Yoshinaga, M. Yoshinuma and A. Komori, Extension of operation regimes and investigation of three-dimensional currentless plasmas in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/53/10/104015, 53, 10, 104015, 2013.10.
183. Y. Kim, T. Matsunaga, K. Nakahara, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.04.029, 228, 1, S550–S553, 2013.08.
184. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Mass density control of carbon films deposited by H-assisted plasma CVD method, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.10.002, 228, 1, S15–S18, 2013.08.
185. K. Koga, K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.154, 438, S727–S730, 2013.07.
186. K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, and H. Kersten, Discharge power dependence of carbon dust flux in a divertor simulator, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.169, 438, S788–S791, 2013.07.
187. Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Observation of nanoparticle growth process using a high speed camera, ISPC 21 Proceedings, 2013.07.
188. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Growth control of ZnO nano-rod with various seeds and photovoltaic application, J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012029, 441, 1, 012029, 2013.06.
189. S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Transport control of dust particles via the Electrical Asymmetry Effect: experiment, simulation, and modeling, J. Phys. D: Appl. Phys., 46, 245202, 2013.06.
190. K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori, Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine , J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012001, 441, 1, 012001, 2013.06.
191. S. Bornholdt, N. Itagaki, K. Kuwahara, H. Wulff, M. Shiratani and H. Kersten, Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films , Plasma Sources Sci. Technol., 10.1088/0963-0252/22/2/025019, 22 , 2, 025019, 2013.04.
192. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells, Electrochimica Acta, 10.1016/j.electacta.2013.02.026, 95, 1, 43-47, 2013.04.
193. N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 84-87, 2013.03.
194. M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 100-103, 2013.03.
195. K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Control of Deposition Profile and Properties of Plasma CVD Carbon Films, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 136-139, 2013.03.
196. Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, Plasma interactions with aminoacid (L-alanine) as a basis of fundamental processes in plasma medicine, Current Applied Physics, 10.1016/j.cap.2013.01.030, 13, 1, S59–S63, 2013.03.
197. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell, Electrochimica Acta, 10.1016/j.electacta.2012.09.087, 87, 1, 213-217, 2013.01.
198. H. Seo, Y. Wang, M. Sato, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD05, 52, 1S, 01AD05, 2013.01.
199. Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, M. Shiratani, High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD01, 52, 1S, 01AD01, 2013.01.
200. I. Suhariadi, K. Matsushima, K. Kuwahara, K. Oshikawa, D. Yamashita, H. Seo, G. Uchida, K. Kamtaki, K. Koga, M. Shiratani, S. Bornholdt, H. Kersten, Harm Wulff, N. Itagaki, Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AC08, 52, 1S, 01AC08, 2013.01.
201. S. Iwashita, K. Nishiyama, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Dust particle formation due to interaction between graphite and helicon deuterium plasmas, Fusion Engineering and Design, 10.1016/j.fusengdes.2012.10.002, 88, 1, 28-32, 2013.01.
202. T. Urakawa, R. Torigoe, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, K. Takeda, M. Sekine, M. Hori, H-2/N-2 plasma etching rate of carbon films deposited by H-assisted plasma CVD, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AB01, 52, 1, 01AB01(4pages), 2013.01.
203. N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors (Invited), Proc. International Symposium on Dry Process, 34, 97-98, 2012.11.
204. Y. Kim, T. Matsunaga, K. Nakahara ,G. Uchida, K. Kamataki , N. Itagaki, H. Seo, K. Koga, M. Shiratani , Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD , Thin Solid Films, 10.1016/j.tsf.2012.06.023, 523, 29-33, 2012.11.
205. K. Kamataki, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage, Thin Solid Films, 10.1016/j.tsf.2012.07.059, 523, 76-79, 2012.11.
206. H. Seo, Min-Kyu Son, Songyi Park, Hee-Je Kim, M. Shiratani, The Blocking Effect of Charge Recombination by sputtered and acid-treated ZnO Thin Film in Dye-sensitized Solar Cells, J. Photochem. Photobiol., A : Chemistry, 10.1016/j.jphotochem.2012.08.016, 248, 50-54, 2012.11.
207. T. Shirafuji, Y. Setsuhara, M. Shiratani, T. Kaneko, T. Watanabe, N. Ohtake, The 24th Symposium on Plasma Science for Materials (SPSM-24) Preface, Thin Solid Films, 10.1016/j.tsf.2012.10.002, 523, 1-1, 2012.11.
208. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation, Thin Solid Films, 10.1016/j.tsf.2012.05.061, 523, 15-19, 2012.11.
209. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Control of Dry Yeast Using Scalable Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.11PJ02, 51, 11, 11PJ02(5pages), 2012.11.
210. H. Seo, M. K. Son, M. Shiratani, H. J. Kim, Improvement on the long-term stability of dye-sensitized solar module by structural alternation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.10NE21, 51, 10, 10NE21(4pages), 2012.10.
211. K. Shibata, K. Suenaga, K. Watanabe, F. Horikiri, T. Mishima, M. Shiratani , Evaluation of Crystal Orientation for (K, Na)NbO3 Films Using X-ray Diffraction Reciprocal Space Map and Relationship between Crystal Orientation and Piezoelectric Coefficient, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.075502, 51, 7, 075502(6pages), 2012.07.
212. I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani, ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio, Trans. Mater. Res. Soc. Jpn., 10.14723/tmrsj.37.165, 37, 2, 165-168, 2012.06.
213. A. Tanaka, M. Hirata, M. Shiratani, K. Koga, Y. Kiyohara, Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats, Journal of Occupational Health, 10.1539/joh.11-0164-OA, 54, 3, 187-195, 2012.06.
214. S. Iwashita, G. Uchida, J. Schulze, E. Sch¨ungel, P. Hartmann, M. Shiratani, Zolt´an Donk´o and U. Czarnetzki, Sheath-to-sheath transport of dust particles in a capacitively coupled discharge, Plasma Sources Sci. Technol., 10.1088/0963-0252/21/3/032001, 21, 3, 032001(5pages), 2012.06.
215. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers, Thin Solid Films, 10.1016/j.tsf.2011.10.136, 520, 14, 4674-4677, 2012.05.
216. H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.890, 1426, 313-318, 2012.04.
217. Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.839, 1426, 307-311, 2012.04.
218. K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki , In situ analysis of size dispersion of nano-particles in reactive plasma using two dimentional laser light scattering method, Journal of Instrumentation, 10.1088/1748-0221/7/04/C04017, 7, 4, C04017, 2012.04.
219. M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.1245, 1426, 377-382, 2012.04.
220. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.966, 1469, ww02-08, 2012.04.
221. Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga and M. Shiratani, Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.970, 1469, ww06-10, 2012.04.
222. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.969, 1469, ww06-08, 2012.04.
223. G. Uchida, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD01, 51, 1, 01AD01, 2012.01.
224. K. Koga, K. Nakahara, Y. Kim, T. Matsunaga, D.Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD03, 51, 1, 01AD03, 2012.01.
225. K. Koga, T. Matsunaga, Y. Kim, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, and M. Shiratani, Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD02, 51, 1, 01AD02, 2012.01.
226. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Enhancement of Radish Sprouts Induced by Low Pressure O2 Radio Frequency Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AE01, 51, 1, 01AE01(4pages), 2012.01.
227. S. Komatsu, M. Shiratani, Electron field emission from SP3-bonded bn microcones as a nonlinear cooperative phenomenon, Far East Journal of Dynamical Systems, 18, 1, 33-52, 2012.01.
228. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Irradiations with Ions and Photons in UV-VUV Regions on Nano-Surface of Polymers Exposed to Plasma, Jpn. J. Appl. Phys,, 10.1143/JJAP.51.01AJ02, 51, 1, 01AJ02(5pages), 2012.01.
229. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers, Proc. PVSEC-21, 4D-2P-11, 2011.11.
230. N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization, Proc. PVSEC-21, 4D-2P-10, 2011.11.
231. Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste, Proc. PVSEC-21, 3D-5P-09, 2011.11.
232. T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films, Proc. PVSEC-21, 4D-2P-16, 2011.11.
233. K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-20, 2011.11.
234. Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd, Proc. PVSEC-21, 3D-2P-09, 2011.11.
235. K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD, Proc. Plasma Conf. 2011, 24P014-O, 2011.11.
236. K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure, Proc. Plasma Conf. 2011, 23G03, 2011.11.
237. Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD, Proc. Plasma Conf. 2011, 24P011-O, 2011.11.
238. Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer, Proc. Intern. Symp. on Dry Process, 33, 133-134, 2011.11.
239. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering, Proc. Plasma Conf. 2011, 24G16, 2011.11.
240. T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition, Proc. Plasma Conf. 2011, 24P015-O, 2011.11.
241. M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD, Proc. Plasma Conf. 2011, 24G06, 2011.11.
242. K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H., G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films, Proc. Plasma Conf. 2011, 24P008-O, 2011.11.
243. Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD, Proc. Plasma Conf. 2011, 23P013-O, 2011.11.
244. K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method, Proc. Plasma Conf. 2011, 24P016-O, 2011.11.
245. K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free a-Si:H films using cluster eliminating filter, Proc. Plasma Conf. 2011, 24P010-O, 2011.11.
246. K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten, Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage, Proc. Plasma Conf. 2011, 24P094-O, 2011.11.
247. 趙研, 節原裕一, 竹中弘祐, 白谷正治, 関根誠, 堀勝, フレキシブルデバイス創製に向けたプラズマ—ソフトマテリアル相互作用の解析 , 高温学会誌 , 10.7791/jhts.37.289, 37, 6, 289-297 , 2011.11.
248. H. Seo, Min-Kyu Son, M. Shiratani, Hee-Je Kim, The improvement on the long-term stability of dye-sensitized solar module by structural alternation, Proc. PVSEC-21, 3D-5P-03, 2011.11.
249. K. Hatozaki, K. Nakahara, G. Uchida, K. Koga, M. Shiratani, Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-18, 2011.11.
250. M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga, M. Shiratani, Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges, Proc. PVSEC-21, 3D-5P-12, 2011.11.
251. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon, Proc. Intern. Symp. on Dry Process, 33, 123-124, 2011.11.
252. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of plasma interactions with organic semiconductors for fabrication of flexible electronics devices, Proc. Intern. Symp. on Dry Process, 33, 69-70 , 2011.11.
253. N. Hayashi, Y. Akiyoshi, S. Kitazaki, K. Koga, M. Shiratani, Influence of active oxygen species produced by atmospheric torch plasma on plant growth, Proc. Intern. Symp. on Dry Process, 33, 135-136, 2011.11.
254. G. Uchida, S. Iwashita, J. Schungel, M. Shiratani, U. Czarnetzki, Transport of dust particles in multi-frequency capacitively coupled radio frequency discharges, Proc. Plasma Conf. 2011, 25E01, 2011.11.
255. T. Mieno, K. Koga, M. Shiratani, Production Process of Carbon Nanotube Coagulates, Proc. Plasma Conf. 2011, 24F08, 2011.11.
256. S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation, Proc. Plasma Conf. 2011, 23P018-O, 2011.11.
257. T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor, Proc. Plasma Conf. 2011, 24P007-O, 2011.11.
258. M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga and M. Shiratani, Deposition of FeSi2 nano-particle film, Proc. Plasma Conf. 2011, 24P009-O, 2011.11.
259. G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD, Physica Status Solidi (c), 10.1002/pssc.201001230, 8, 10, 3017-3020, 2011.10.
260. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, M. Shiratani, Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasma, Appl. Phys. Express, 10.1143/APEX.4.105001, 4, 10, 105001, 2011.10.
261. G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye, Physica Status Solidi (c), 10.1002/pssc.201100166, 8, 10, 3021-3024, 2011.10.
262. K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method, Physica Status Solidi (c), 10.1002/pssc.201100229, 8, 10, 3013-3016, 2011.10.
263. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma , Proc. of International Conference on Phenomena in Ionized Gases(ICPIG) 2011 Conference, D13-318, 2011.09.
264. K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film, Thin Solid Films, 10.1016/j.tsf.2011.01.408, 519, 20, 6896-6898, 2011.08.
265. N. Hayashi, A. Nakahigashi, M. Goto, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge, Jpn. J. Appl. Phys., 10.1143/JJAP.50.08JF04, 50, 8, 08JF04, 2011.08.
266. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Plasma processing of soft materials for development of flexible devices , Thin Solid Films, 10.1016/j.tsf.2011.04.091, 519, 20, 6721-6726, 2011.08.
267. K. Cho, Y. Setsuhara, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers, Thin Solid Films, 10.1016/j.tsf.2011.04.060, 519, 20, 6810-6814, 2011.08.
268. Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry (ISPC20), POL08, 2011.07.
269. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial analyses of plasma-polymer interactions, Surf. Coat. Technol., 10.1016/j.surfcoat.2011.04.083, 205, 2, S484-S489, 2011.07.
270. T. Urakawa, T. Nomura, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry (ISPC20), POL02, 2011.07.
271. M. Shiratani, K. Koga, S. Iwashita, G. Uchida, N. Itagaki, K. Kamataki, Nano-factories in plasma: present status and outlook, J. Phys. D: Appl. Phys., 10.1088/0022-3727/44/17/174038 , 44, 17, 174038, 2011.05.
272. K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics, International Conference on Advances in Condensed and Nano Materials (ICACNM), 10.1063/1.3653600, 1393, 27-30, 2011.02.
273. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase, Appl. Phys. Express, 10.1143/APEX.4.011101, 4, 1, 011101-011101-3 , 2011.01.
274. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Low-damage plasma processing of polymers for development of organic-inorganic flexible devices, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.08.031, 205, 1, S355-S359, 2010.12.
275. W. M. Nakamura, H. Matsuzaki, H. Sato, Y. Kawashima, K. Koga, M. Shiratani, High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.07.081, 205, 1, S241-S245 , 2010.12.
276. M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5685920, XII-XVI , 2010.11, プラズマナノテクノロジーで最重要課題となっている揺らぎの制御に関する現状と将来を展望した論文。.
277. G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686704, 2199-2201, 2010.11.
278. K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686456, 1943-1947, 2010.11.
279. T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686679 , 2219-2212, 2010.11.
280. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686686, 2216-2218, 2010.11.
281. H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles, Proc. of International Symposium on Dry Process, 43-44, P1-A17, 2010.11.
282. G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges , Proc. of MNC2010, 12D-11-66 , 2010.11.
283. T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686688, 2213-2215, 2010.11.
284. Y. Akiyoshi, A. Nakahigashi, N. Hayashi, S. Kitazaki, Takuro Iwao, K. Koga, M. Shiratani, Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686467, 1957-1959, 2010.11.
285. Y. Kawashima, K. Yamamoto, M. Sato, T. Matsunaga, K. Nakahara, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686677, 2222-2224, 2010.11.
286. S. Kitazaki, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Growth Stimulation of Radish Sprouts Using Discharge Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686474, 1960-1963, 2010.11.
287. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photo-Irradiations in VUV and UV Regions on Chemical Bonding States of Polymers during Plasma Exposure, Proc. of International Symposium on Dry Process, 61-62, P1-B5, 2010.11.
288. Y. Setsuhara, K. Takenaka, K. Cho, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Soft Material Processing, Proc. of International Symposium on Dry Process, 63-64, P1-B6, 2010.11.
289. G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00093, 2010.10.
290. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00087, 2010.10.
291. T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00089, 2010.10.
292. H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group , Carbon dust particles generated due to H2 plasma-carbon wall interaction, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00114, 2010.10.
293. A. Nakahigashi, Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, KWP.00008, 2010.10.
294. T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Plasma parameter measurements of Ar+H2+C7H8 plasma in H-assisted plasma CVD reactor, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, DTP.00173, 2010.10.
295. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Investigation of Plasma Interactions with Soft Materials via Combinatorial Plasma-Process Analyzer for Plasma Nano Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, TF2.00006, 2010.10.
296. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photoemissions in UV and VUV Regions on Nano-Surface Strucures of Soft Materials during Plasma Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00115, 2010.10.
297. M. Shiratani, Academic Roadmap of Plasma Process Technologies, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, FT.00004, 2010.10.
298. Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials, Thin Solid Films, 10.1016/j.tsf.2010.01.057, 518, 22, 6492-6495, 2010.09.
299. Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Quantum dot-sensitized solar cells using Si nanoparticles, Trans. Mater. Res. Soc. Jpn., 35, 3, 597-599, 2010.09.
300. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch27, 219, 183-188, 2010.09.
301. K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Development of a Combinatorial Plasma Process Analyzer for Advanced R&D of Next Generation Nanodevice Fabrications, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch40, 219, 279-284, 2010.09.
302. Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzer, Thin Solid Films, 10.1016/j.tsf.2010.03.055, 518, 22, 6320-6324, 2010.09.
303. 白谷正治, プラズマ・プロセス技術, 応用物理, 79, 8, 717-719, 2010.08.
304. K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy, Japanese Journal of Applied Physics, 10.1143/JJAP.49.08JA02, 49, 8, 08JA02, 2010.08.
305. Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5617205, 3347-3351, 2010.07.
306. K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616514, 3722-3755, 2010.07.
307. K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616502, 3718-3721, 2010.07.
308. M. C. Sung, Keiko Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Etching characteristics of organic low-k films interpreted by internal parameters employing a combinatorial plasma process in an inductively coupled H2/N2 plasma, J. Appl. Phys. , 10.1063/1.3415535, 107, 11, 113310, 2010.06.
309. C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Surface loss probabilities of H and N radicals on different materials in afterglow plasma employing H2 and N2 mixture gases, J. Appl. Phys. , 10.1063/1.3372750, 107, 10, 103310, 2010.05.
310. Y. Setsuhara, C. Ken, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasma sustained via RF inductive coupling with low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.038, 518, 13, 3555-3560, 2010.04.
311. Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasma driven by multiple low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.045, 518, 13, 3561-3565, 2010.04.
312. A. Tanaka, M. Hirata, Y. Kiyohara, M. Nakano, K. Omae, M. Shiratani, K. Koga, Review of pulmonary toxicity of indium compounds to animals and humans, Thin Solid Films, 10.1016/j.tsf.2009.10.123, 518, 11, 2934-2936, 2010.03.
313. C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, High performance of compact radical monitoring probe in H2/N2 mixture plasma, J. Vac. Sci. Technol., B, 10.1116/1.3327926 , 28, 2, 17-20, 2010.03.
314. K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, X-Ray Photoelectron Spectroscopy Analysis of Plasma Interactions with Polymers for Development of Low-Damage and Low-Temperature Plasma Processes, Proc. of the 27th symposium on plasma processing, P2-33, 289-290, 2010.02.
315. Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD, Proc. of the 27th symposium on plasma processing, B5-05, 101-102, 2010.02.
316. S. Iwashita, H. Miyata, YasuY. Yamada, H. Matsuzaki, K. Koga, M. Shiratani, Observation of nano-particle transport in capacitively coupled radio frequency discharge plasma, Proc. of the 27th symposium on plasma processing, P1-13, 153-154, 2010.02.
317. H. Sato, Y. Kawashima, K. Nakahara, K. Koga, M. Shiratani, Measurement of electron density in multi-hollow discharges with magnetic field, Proc. of the 27th symposium on plasma processing, A6-01, 105-106, 2010.02.
318. H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD Experimental Group, In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasma and Inner Wall in LHD, Proc. of the 27th symposium on plasma processing, P1-14, 155-156, 2010.02.
319. T. Mieno, GuoDong Tan, S. Usuba, K. Koga, M. Shiratani, In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity), Proc. of the 27th symposium on plasma processing, P2-17, 257-258, 2010.02.
320. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, Proc. of the 27th symposium on plasma processing, A5-06, 91-92, 2010.02.
321. T. Nomura, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor, Proc. of the 27th symposium on plasma processing, P1-39, 205-206, 2010.02.
322. Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Advanced Polymer Nano-Processing with Density-Inclination Plasma, Proc. of the 27th symposium on plasma processing, B5-01, 93-94, 2010.02.
323. M. Hori, C. S. Moon, M. Sekine, K. Takeda, Y. Setushara, M. Shiratani, A Low Pressure Combinatorial Plasma Process Employing an Integrated Monitoring, Proc. of the 27th symposium on plasma processing, T-02, 7-8, 2010.02.
324. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1210-Q07-10 , 1210, Q07-10, 217-222, 2010.01.
325. T. Nomura, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition Profile Control of Carbon Films on Patterned Substrates using a Hydrogen-assited Plasma CVD Method, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1222-DD05-16, 1222, DD05-16, 203-207 , 2010.01.
326. Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Plasma surface treatment of polymers with inductivity-coupled RF plasma driven by low-inductance antenna units , Thin Solid Films, 10.1016/j.tsf.2009.07.161, 518, 3, 1006-1011 , 2009.12.
327. Y. Setsuhara, K. Nagao, M. Shiratani, M. Sekine, M. Hori, Development of density-inclination plasma for analysis of plasma nano-processes via combinatorial method , Thin Solid Films, 10.1016/j.tsf.2009.07.162, 518, 3, 1020-1023, 2009.12.
328. A. Komori, H. Yamada, S. Sakakibara, O. Kaneko, K. Kawahata, T. Mutoh, N. Ohyabu, S. Imagawa, K. Ida, Y. Nagayama, T. Shimozuma, K.Y. Watanabe, T. Mito, M. Kobayashi, K. Nagaoka, R. Sakamoto, N. Yoshida, S. Ohdachi, N. Ashikawa, Y. Feng, T. Fukuda, H. Igami, S. Inagaki, H. Kasahara, S. Kubo, R. Kumazawa, O. Mitarai, S. Murakami, Y. Nakamura, M. Nishiura, T. Hino, S. Muzaki, K. Tanaka, K. Toi, A. Weller, M. Yoshinuma, Y. Narushima, N. Ohno, T. Okamura, N. Tamura, K. Saito, T. Seki, S. Sudo, H. Tanaka, T. Tokuzawa, N. Yanagi, M. Yokoyama, Y. Yoshimura, T. Akiyama, H. Chikaraishi, M. Chowdhuri, M. Emoto, N. Ezumi, H. Funaba, L. Garcia, P. Goncharov, M. Goto, K. Ichiguchi, M. Ichimura, H. Idei, T. Ido, S. Iio, K. Ikeda, M. Irie, A. Isayama, T. Ishigooka, M. Isobe, T. Ito, K. Itoh, A. Iwamae, S. Hamaguchi, T. Hamajima, S. Kitajima, S. Kado, D. Kato, T. Kato, S. Kobayashi, K. Kondo, S. Mamune, Y. Matsumoto, N. Matsunami, T. Minami, C. Michael, H. Miura, J. Miyazawa, N. Mizuguchi, T. Morisaki, S. Morita, G. Motojima, I. Murakami, S. Muto, K. Nagasaki, N. Nakajima, Y. Nakamura, H. Nakanishi, H. Nakano, K. Narihara, A. Nishimura, H. Nishimura, K. Nishimura, S. Nishimura, N. Nishino, T. Notake1, T. Obana, K. Ogawa, Y. Oka, T. Ohishi, H. Okada, K. Okuno, K. Ono, M. Osakabe, T. Osako, T. Ozaki, B.J. P.son, H. Sakaue, M. Sasao, S. Satake, K. Sato, M. Sato, A. Shimizu, M. Shiratani, M. Shoji, H. Sugama, C. Suzuki, Y. Suzuki, K. Takahata, H. Takahashi, Y. Takase, Y. Takeiri, H. Takenaga, S. Toda, Y. Todo, M. Tokitani, H. Tsuchiya, K. Tsumori, H. Urano, E. Veshchev, F. Watanabe, T. Watanabe, T.H. Watanabe, I. Yamada, S. Yamada, O. Yamagishi, S. Yamaguchi, S. Yoshimura, T. Yoshinaga and O. Motojima, Development of net-current free heliotron plasma in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/49/10/104015, 49, 10, 104015, 2009.10.
329. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches, J. Plasma Fusion Res., 8, 1443-1446, 2009.09.
330. W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, J. Umetsu, H. Miyahara, H. Matsuzaki, K. Koga, M. Shiratani, Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition, J. Plasma Fusion Res., 8, 736-739, 2009.09.
331. H. Miyahara, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Detection of nano-particles formed in cvd plasma using a two-dimensional photon-counting laser-light-scattering method, J. Plasma Fusion Res., 8, 700-704, 2009.09.
332. H. Sato, Y. Kawashima, M. Tanaka, K. Koga, W. M. Nakamura, M. Shiratani , Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method, J. Plasma Fusion Res., 8, 1435-1438, 2009.09.
333. S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles, J. Plasma Fusion Res., 8, 582-586, 2009.09.
334. C. S. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Combinatorial Plasma Etching Process, Applied Physics Express , 10.1143/APEX.2.096001, 2, 9, 096001(3pages), 2009.09.
335. S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD experimental group, A comparison of dust particles produced due to interaction between graphite and plasma: LHD vs helicon discharges, J. Plasma Fusion Res., 8, 308-311, 2009.09.
336. M. Shiratani, K. Koga, Toward plasma nano-factories, Proc. of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I), 86, 2009.09.
337. Y. Kawashima, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD, Proc. of 2009 International Symposium on Dry Process, 107, 2009.09.
338. T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD, Proc. of 2009 International Symposium on Dry Process, 101, 2009.09.
339. S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation, Proc. of 2009 International Symposium on Dry Process, 99, 2009.09.
340. H. Sato, Y. Kawashima, K. Koga, M. Shiratani, Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer, Proc. of 2009 International Symposium on Dry Process, 113, 2009.09.
341. K. Nakahara, Y. Kawashima, H. Sato, K. Koga, M. Shiratani, Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe, Proc. of 2009 International Symposium on Dry Process, 163, 2009.09.
342. H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, Dust Particles formed owing to interactions between H2 or D2 helicon plasma, graphite, Proc. of 2009 International Symposium on Dry Process, 33, 2009.09.
343. M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama, Plasma CVD of Nano-particle Composite Porous SiOCH Films, Proc. of 19th International Symposium on Plasma Chemistry, 2009.07.
344. K. Koga, S. Iwashita, S. Kiridoshi, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Characterization of Dust Particles Ranging in Size from 1 nm to 10 m Collected in LHD, Plasma and Fusion Research, 10.1585/pfr.4.034 , 4, 034-034, 2009.04.
345. S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode, Proc. of PSS2009/SPP26, 2009.02.
346. K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method, Proc. of PSS2009/SPP26, 2009.02.
347. Nakamura W. M., Sato H., Koga K., Shiratani M., Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells
, Proc. of PSS2009/SPP26, 2009.02.
348. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile of toluene plasma CVD carbon films in trenches, Proc. of PSS2009/SPP26, 2009.02.
349. K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, Proc. of PSS2009/SPP26, 2009.02.
350. S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, A. Sagara, K. Nisimura , Characteristics of dust particles produced due to interaction between hydrogen plasma, graphite
, Proc. of PSS2009/SPP26, 2009.02.
351. S. I. Krasheninnikov, R. D. Smirnov,Y. Tanaka,T. K. Soboleva, D. A. Mendis, D. L. Rudakov, W. P. West, C. H. Skinner, B. Lipschultz, R. S. Granetz, N. Ohno, S. Muzaki, M. Shiratani, R. Kumazawa, T. Nakano, R. Maqueda, A. Y. Pigarov, M. Rosenberg, D. J. Benson, T. D. Rognlien, B. D. Bray, J. H. Yu, A. L. Roquemore, J. L. Terry, A. Bader, C. S. Pitcher, S. Takamura, N. Ashikawa, M. Tokitani, N. Asakura, A. M. Litnovsky, Recent progress in understanding the behavior of dust in fusion devices, Plasma Physics and Controlled Fusion, 10.1088/0741-3335/50/12/124054, 50, 12, 124054, 2008.12.
352. S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa, Proc. of 30th International Symposium on Dry Process, 115, 2008.12.
353. J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Deposition profile of plasma CVD carbon films in trenches, Proc. of 30th International Symposium on Dry Process, 35, 2008.12.
354. W. M. Nakamura, H. Miyahara, K. Koga, M. Shiratani, Two dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD, IEEE Trans. Plasma Science, 10.1109/TPS.2008.923830, 36, 4, 888-889, 2008.08.
355. S. Iwashita, Michihito Morita, H. Matsuzaki, K. Koga, and M. Shiratani, Temperature dependence of dielectric constant of nano-particle composite porous low-k films fabricated by pulse rf discharges with amplitude modulation, Jpn. J. Appl. Phys., 10.1143/JJAP.47.6875, 47, 8, 6875-6878, 2008.08.
356. S. Iwashita, K. Koga, M. Morita, M. Shiratani, Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062006, 100, 6, p. 062006, 2008.08.
357. J. Umetsu, K. Koga, K. Inoue, M. Shiratani, Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062007, 100, 6, p. 062007, 2008.08.
358. S. Nunomura, K. Koga, Y. Watanabe, M. Shiratani, M. Kondo, Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasma, Phys. Plasma, 10.1063/1.2972162, 15, 8, p. 080703, 2008.08.
359. J. Umetsu, K. Koga, K. Inoue, H. Matzuzaki, K. Takenaka, M. Shiratani, Discharge power dependence of Ha intensity asn electron density of Ar+H2 discharges in H-assisted plasma CVD reactor, Surf. Coat. Technol., 10.1016/j.surfcoat.2008.06.108, 202, 22-23, 5659-5662, 2008.08.
360. W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani, Cluster incorporation control for a-Si:H film deposition, J. Phys. : Conference Series, 10.1088/1742-6596/100/8/082018, 100, 8, p. 082018, 2008.08.
361. M. Shiratani, W. M. Nakamura, H. Miyahara, K. Koga, Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films, Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08), 69, 2008.07.
362. M. Shiratani, S. Iwashita, K. Koga, S. Nunomura, Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage, Faraday Discussions, 10.1039/B704910B , 137, 127-138, 2008.01.
363. K. Koga, W. M. Nakamura, and M. Shiratani, VHF discharge sustained in a small hole, Proc. 28th Intern. Conf. on Phenomena in Ionized Gases , 1987-1989, 2007.07.
364. K. Koga, S. Iwashita, M. Shiratani, Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage, J. Phys. D: Appl. Phys., 10.1088/0022-3727/40/8/S05, 40, 8, 2267-2271, 2007.04.
365. M. Shiratani, K. Koga, S. Ando, T. Inoue, Y. Watanabe, S. Nunomura, M. Kondo, Single step process to deposit Si quantum dot films using H2+SiH4 VHF discharges and electron mobility in a Si quantum dot solar cell, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.012, 201, 9-11, 5468-5471, 2007.02.
366. S. Iwashita, K. Koga, M. Shiratani, A device for trapping nano-particles formed in processing plasma for reduction of nano-waste, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.060, 201, 9-11, 5701-5704, 2007.02.
367. S. Iwashita, K. Koga, M. Shiratani, Transport of nano-particles in pulsed AM RF discharges, Proc. the 24th Symp. on Plasma Processing, 103-104, 2007.01.
368. K. Koga, W. M. Nakamura, D. Shimokawa, M. Shiratani, Stability of a-Si:H deposited using multi-hollow plasma CVD, Proc. the 24th Symp. on Plasma Processing, 189-190, 2007.01.
369. M. Shiratani, S. Kiridoshi, K. Koga, S. Iwashita, N. Ashikawa, K. NIshimura, A. Sagara, A. Komori, LHD Experimental Group, In-situ sampling of dust generated in LHD and its analysis, Proc. the 24th Symp. on Plasma Processing, 371-372, 2007.01.
370. M. Shiratani, K. Koga, N. Kaguchi, K. Bando,and Y. Watanabe, Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.015, 506-507, 17-21, 2006.05.
371. T. Kakeya, K. Koga, M. Shiratani, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-clusters using pulsed H2+SiH4 VHF discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.090, 506-507, 288-291, 2006.05.
372. K. Koga, Y. Kitaura, M. Shiratani, Y. Watanabe, and A. Komori, Nano-particle formation due to interaction between H2 plasma and carbon wall, Thin Solid Films, 10.1016/j.tsf.2005.08.062, 506-507, 656-659, 2006.05.
373. K. Takenaka, K. Koga, M. Shiratani, Y. Watanabe, and T. Shingen, Mechanism of Cu deposition from Cu(EDMDD)2 using H-assisted plasma CVD, Thin Solid Films, 10.1016/j.tsf.2005.08.028, 506-507, 197-201, 2006.05.
374. S. Nunomura, M. Kita,, K. Koga, M. Shiratani, and Y. Watanabe, In situ simple method for measuring size and density of nanoparticles in reactive plasma, J. Appl. Phys., 10.1063/1.2189951 , 99, 8, 083302(7pages), 2006.04.
375. S. Komatsu, D. Kazami, Norihoro Tanaka, Y. Moriyoshi, M. Shiratani, KatsuY. Okada, BN micro-fibers grown by plasma-assisted laser chemical vapor deposition without a metal catalyst, Appl. Phys. Express, 10.1063/1.2188381, 88, 151914(3pages), 2006.04.
376. S. Nunomura, K. Koga, M. Shiratani, Y. Watanabe, Y. Morisada, N. Matsuki, and S. Ikeda, Fabrication of nanoparticle composite porous films having ultra-low dielectric constant, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1509, 44, 50, L1509-L1511, 2005.12.
377. K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1430, 44, 48, L1430-L1432, 2005.11.
378. K. Koga, N. Kaguchi, K. Bando, and M. Shiratani, Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma CVD, Rev. Sci. Instrum. , 10.1063/1.2126572, 76, 11, 113501(4pages), 2005.11.
379. M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-particles using VHF discharges and their properties, Trans. Mater. Res. Soc. Jpn., 30, 1, 307-310, 2005.03.
380. Y. Watanabe, M. Shiratani, and K. Koga, Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects, Trans. Mater. Res. Soc. Jpn., 30, 1, 267-272, 2005.03.
381. K. Takenaka, M. Shiratani, M. Takeshita, M. Kita, K. Koga, and Y. Watanabe, Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition, Pure Appl. Chem. , 10.1351/pac200577020391, 77, 2, 391-398, 2005.01.
382. S. Komatsu, A. Okudo, D. Kazami, D. Golberg, Y. Li, Y. Moriyoshi, M. Shiratani, K. Okada, Electron field emission from self-organized microemitters of sp3-bonded 5H boron nitride with very high current density at low electric field, J. Phys. Chem. B, 10.1021/jp0493475, 108, 17, 5182-5184, 2004.10.
383. K. Koga, N. Kaguchi, M. Shiratani, and Y. Watanabe, Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H2 bonds in the films, J. Vac. Sci. Technol., A, 10.1116/1.1763905 , 22, 4, 1536-1539, 2004.07.
384. K. Takenaka, M. Kita,, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition, J. Vac. Sci. Technol., A, 10.1116/1.1738663, 22, 4, 1903-1907, 2004.07.
385. K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori, Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall, IEEE Trans. Plasma Science, 10.1109/TPS.2004.828129 , 32, 2, 405-409, 2004.02.
386. S, Komatsu, K. Kurashima, Y.shimizu, Y. Moriyoshi, M. Shiratani, K. Okada, Condensation of sp 3-Bonded Boron Nitride through a Highly Nonequilibrium Fluid State, J. Phys. Chem. B, 10.1021/jp0364452, 108, 1, 205-211, 2004.01.
387. M. Shiratani, K. Koga, A. Harikai, T. Ogata, and Y. Watanabe, Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges, MRS Symp. Proc., 10.1557/PROC-762-A9.5, 762, A9.5.1-9.5.6, 2003.04.
388. K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches, MRS Symp. Proc., 10.1557/PROC-766-E3.8, 766, E3.8.1-3.8.6, 2003.04.
389. Growth of Clusters in Silane Plasma and Their Relation to Deposition of Thin Films.
390. KS Kim, DJ Kim, JH Yoon, JY Park, Y Watanabe, M Shiratani, The changes of particle charge distribution during rapid growth of partilcles in the plasma reactor, J. Colloid Interface Sci., 10.1016/S0021-9797(02)00049-8, 257, 2, 195-207, 2003.02.
391. K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe, Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition, Matr. Sci. Semiconductor Processing, 10.1016/S1369-8001(02)00108-7, 5, 2, 301-304, 2003.02.
392. M. Shiratani, M. Kai, K. Koga, and Y. Watanabe, Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films, Thin Solid Films, 10.1016/S0040-6090(02)01171-9, 427, 1-2, 1-5, 2003.01.
393. S. Komatsu, K. Kurashima, H. Kanada, K. Okada, M. Mitomo, Y. Moriyoshi, Y. Shimizu, M. Shiratani, T. Nakano, S. Samukawa, Highly crystalline 5H-polytype of sp3-bonded boron nitride prepared by plasma-packets-assisted pulsed-laser deposition: an ultraviolet light-emitter at 225nm, Appl. Phys. Lett., 10.1063/1.1527987, 81, 24, 4547-4549, 2002.12.
394. M. Shiratani, K. Koga, Y. Watanabe, Formation of nano-particles in microgravity plasma, Journal of Japan Society of Microgravity Application, 19, 69, 2002.10.
395. K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of copper by plasma CVD method, Proc. Intern. Symp. on Dry Process, 221-226, 2002.10.
396. Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited lecture paper), Plasma Sources Sci. Technol., 10.1088/0963-0252/11/3A/334, 11, A229-A233, 2002.08.
397. M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films, Proc. ESCANPIG16/ICRP5 Joint Meeting, II323--II324, 2002.07.
398. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2, Proc. ESCANPIG16/ICRP5 Joint Meeting, II173--II174, 2002.07.
399. K. Koga, R. Uehara, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasma and carbon wall, Proc. ESCANPIG16/ICRP5 Joint Meeting, I173--I174, 2002.07.
400. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of Cu with H-assisted plasma CVD, Proc. ESCANPIG16/ICRP5 Joint Meeting, II199--II200, 2002.07.
401. K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 238-243, 2002.05.
402. K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 227-232, 2002.05.
403. Y. Watanabe, A. Harikai, K. Koga, M. Shiratani, Clustering phenomena in low-pressure reactive plasma: basis and applications (invited lecture paper), Pure Appl. Chem. , 10.1351/pac200274030483, 74, 3, 483-487, 2002.03.
404. K. Koga, M. Kai, M. Shiratani, Y. Watanabe, N. Shikatani, Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films, Jpn. J. Appl. Phys., 10.1143/JJAP.41.L168, 41, 2B, L168-L170, 2002.02.
405. K. Koga, M. Shiratani, Y. Watanabe, In-situ measurement of size and density of particles in sub-nm to nm size range, Proc. Nano-technology Workshop, 13-20, 2002.02.
406. M. Shiratani, K. Koga, Y. Watanabe, Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges, Proc. Nano-technology Workshop, 7-12, 2002.02.
407. K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2, Proc. Intern. Symp. on Dry Process, 169-174, 2001.11.
408. M. Shiratani, K. Koga, Y. Watanabe, Cluster-less plasma CVD reactor and its application to a-Si:H film deposition, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-664-A5.6, A5.6.1-A5.6.6, 2001.07.
409. Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited), Proc. Intern. Conf. on Phenomena in Ionized Gases, 15-16, 2001.07.
410. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, Development of H-assisted plasma CVD reactor for Cu interconnects, Proc. Intern. Conf. on Phenomena in Ionized Gases, 147-148, 2001.07.
411. K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, Proc. Intern. Conf. on Phenomena in Ionized Gases, 39-40, 2001.07.
412. Y. Watanabe, M. Shiratani, K. Koga, Clustering phenomena in low-pressure reactive plasma: base and applications (invited), Proc. Intern. Symp. on Plasma Chemistry, 726-730, 2001.07.
413. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 153-154, 2001.07.
414. Y. Watanabe, M. Shiratani, T. Fukuzawa, H. Kawasaki, Y. Ueda, S. Singh, H. Ohkura, Contribution of short lifetime radicals to growth of particles in SiH4 HF discharges and effects of particles on deposited films, J. Vac. Sci. Technol., A, 10.1116/1.580069, 14, 3, 995-1001, 2001.05.
415. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration, Sci. Technol. Adv. Mater., 10.1016/S1468-6996(01)00131-0, 2, 3-4, 505-515, 2001.04.
416. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, In-situ polarization-sensitive laser-light scattering method for simultaneous measurements of two dimensional spatial size and density distributions of particles in plasma, J. Vac. Sci. Technol., A, 10.1116/1.580152, 14, 2, 603-607, 2001.03.
417. Y. Watanabe, M. Shiratani, H. Kawasaki, S. Singh, T. Fukuzawa, Y. Ueda, H. Ohkura, Growth processes of particles in high frequency silane plasma, J. Vac. Sci. Technol., A, 10.1116/1.580141, 14, 2, 540-545, 2001.03.
418. J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, J. Guillon, Surface reaction probabilities and kinetics of H, SiH3, Si2H5, CH3 and C2H5 during deposition of a-Si:H and a-C:H from H2, SiH4 and CH4 discharges, J. Vac. Sci. Technol., A, 10.1116/1.580983, 16, 1, 278-289, 2001.01.
419. Y. Watanabe, M. Shiratani, K. Koga, Formation kinetics and control of dust particles in capacitively-coupled reactive plasma (invited), Phys. Scripta, 10.1238/Physica.Topical.089a00029, T89, 29-32, 2001.01.
420. M. Shiratani, K. Koga, Y. Watanabe, Plasma CVD method for Cu interconnects in ULSI (invited), Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 751-754, 2001.01.
421. M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Measurements of surface reaction probability of SiH3, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 419-420, 2001.01.
422. M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H assisted control of quality and conformality in Cu film deposition using plasma CVD method, Proc. Advanced Metallization Conf. 2000, 271-278, 2001.01.
423. K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasma, Proc. Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 385-386, 2001.01.
424. M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe, Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 421-422, 2001.01.
425. M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 393-394, 2001.01.
426. M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, Methods of suppressing cluster growth in silane rf discharges, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-609-A5.6, A5.6.1-A5.6.6, 2000.07.
427. K. Koga, Y. Matsuoka, M. Shiratani, Y. Watanabe, In situ observation of nucleation and subsequent growth of clusters in silane rf discharges, Appl. Phys. Lett., 77, 2, 196-198, 2000.07.
428. H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-612-D9.2.1, D9.2.1-D9.2.6, 2000.07.
429. H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source, Res. Rep. ISEE Kyushu Univ., 5, 1, 57-61, 2000.03.
430. Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga, Growth processes of particles up to nanometer size in high-frequency SiH4 plasma, Jour. Technical Phys., 41, 1, 505-519, 2000.01.
431. M. Shiratani, S. Maeda, K. Koga, Y. Watanabe, Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.39.287, 39, 1, 287-293, 2000.01.
432. T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth of Particles in Cluster-size Range in Low Pressure and Low Power SiH4 RF Discharges, J. Appl. Phys., 10.1063/1.371256, 86, 7, 3543-3549, 1999.10.
433. M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle Growth Kinetics in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4542, 38, 7B, 4542-4549, 1999.07.
434. Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of Gas Flow on Particle Growth in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4556, 38, 7B, 4556-4560, 1999.07.
435. H. Jin, M. Shiratani, Y. Nakatake, T. Fukuzawa, T. Kinoshita, Y. Watanabe, M. Toyofuku, Conformal Deposition of High-Purity Copper Using Plasma Reactor, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4492, 38, 7B, 4492-4495, 1999.07.
436. Deposition of high-quality Cu thin films using plasma CVD reactor with H-radical source.
437. H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Transition of particle growth region in SiH4 rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.5757, 37, 10, 5757-5762, 1998.10.
438. H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on initial growth of particles in low-pressure and low-power GeH4 rf discharges using the high-sensitivity photon-counting laser-light-scattering method, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L1264, 37, 10B, L1264-1267, 1998.10.
439. H. J. Jin, M. Shiratani, T. Fukuzawa, Y. Watanabe, Trench filling and deposition of high quality Cu thin films using CVD plasma reactor with H radical source, Proc. 4th Intern. Conf. on Reactive Plasma, 95-96, 1998.10.
440. Y. Watanabe, A. Hatae, T. Fukuzawa, M. Shiratani, Trajectory of particle injected from plasma reactor wall, Proc. 4th Intern. Conf. on Reactive Plasma, 63-64, 1998.10.
441. H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on particle formation in germane rf discharges by photon-counting laser-light-scattering method, Proc. 4th Intern. Conf. on Reactive Plasma, 59-60, 1998.10.
442. M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle formation in rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 169-170, 1998.10.
443. T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth mechanism of particles in cluster-size range in SiH4 rf discharges using threshold photoemission method, Proc. 4th Intern. Conf. on Reactive Plasma, 67-68, 1998.10.
444. Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of gas flow on particle growth in silane rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 61-62, 1998.10.
445. S. Maeda, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for size and density measurements of nano-particles in processing plasma, Proc. 4th Intern. Conf. on Reactive Plasma, 69-70, 1998.10.
446. M. Shiratani, A. Minemoto, T. Fukuzawa, Y. Watanabe, Density profile of SiH3 in SiH4 rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 197-198, 1998.10.
447. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, A study on the time evolution of SiH3 surface loss probability on hydrogenated amorphous silicon films in SiH4 rf discharges using infrared diode-laser absorption spectroscopy, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/31/7/004, 31, 7, 776-780, 1998.07.
448. H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on growth processes of particles in germane radio frequency discharges using laser light scattering and scanning electron microscopic methods, J. Appl. Phys. , 10.1063/1.36742, 83, 11, 5665-5669, 1998.06.
449. M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for detection of nano-particles fromed in CVD plasma, Rev. Laser Eng., 10.2184/lsj.26.449, 26, 6, 449-452, 1998.06.
450. H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Similarities in spatial distributions of absolute GeH2 density, radical producition rate and particle amount in GeH4 discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L475, 37, 4B, L457-L477, 1998.04.
451. M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface Reaction Kinetics of CH3 in CH4 RF Discharge Studied by Time-Resolved Threshold Ionization Mass Spectrometry, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4752, 36, 7B, 4752-4755, 1997.07.
452. H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Roles of SiH3 and SiH2 radicals in particle growth in rf silane plasma, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4985, 36, 7B, 4985-4988, 1997.07.
453. H. Videlot, M. Shiratani, J. Jolly, J. Perrin, Effects of H2 dilution on surface loss probability of CH3 on a-C:H in CH4+H2 rf discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 3, 293-294, 1997.02.
454. M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface reaction kinetics of CH3 in CH4 RF discharges studied by time-resolved Ms spectroscopy, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 293-294, 1997.01.
455. H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Study on growth processes of particles in rf SiH4 plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 351-352, 1997.01.
456. Y. Watanabe, T. Fukuzawa, H. Kawasaki, M. Shiratani, Particle Formation in High Frequency CVD Plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 225-226, 1997.01.
457. T. Fukuzawa, H. Miyahara, K. Nishimura, H. Kawasaki, M. Shiratani, Y. Watanabe, Growth and behavior of particles below nanometer in size in silane plasma using threshold photoemission method, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 349-350, 1997.01.
458. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Diagnostic of plasma for metal-organic chemical vapour deposition of Cu and fabrication of Cu thin films using the plasma, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/29/11/005, 29, 1, 2754-2758, 1996.11.
459. T. Fukuzawa, K. Obata, H. Kawasaki, M. Shiratani, Y. Watanabe, Detection of particles in rf silane plasma using photoemission method, J. Appl. Phys. , 10.1063/1.363273, 80, 6, 3202-3207, 1996.09.
460. M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Production of size-controlled Si fine particules using pulsed rf dischange, Surf. Rev. Lett., 10.1142/S0218625X96000176 , 3, 1, 75-78, 1996.08.
461. M. Shiratani, N. Kishigaki, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Two-dimensional spatial profiles of size and density of particulates grown in RF silane plasmas, IEEE Trans. Plasma Science, 10.1109/27.491731, 24, 1, 99-100, 1996.02.
462. M. Shiratani, H. Kawasaki, T. Fukuzawa, T. Yoshioka, Y. Ueda, S. Singh, Y. Watanabe, Simultaneous in-situ measurements of properties of particulates in rf silane plasma using a polarization-sensitive laser-light-scattering method, J. Appl. Phys. , 10.1063/1.360916, 79, 1, 104-109, 1996.01.
463. M. Shiratani, T. Fukuzawa, K. Eto, Y. Watanabe, Detection of Negative Ions in a Helium-Silane RF Plasma, Jpn. J. Appl. Phys. Pt. 2, Letters, 10.1143/JJAP.31.L1791, 31, 12, 1791-1793, 1992.12.
Presentations
1. Field Test of Cultivation of Plasma Irradiated Rice Seeds.
2. K. Koga, M. Shiratani, V. Mildaziene, Metabolomics Approach for Studying Effects of Atmospheric Air Plasma Irradiation to Seeds (Keynote), 29th Annual Meeting of MRS-J, 2019.11.
3. K. Koga, M. Shiratani, Impact of Atmospheric Pressure Plasma Irradiation to Seeds on Agricultural Productivity, 3rd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2019), 2019.11.
4. K. Koga, A. Yamamoto, K. Kamataki, N. Itagaki, M. Shiratani, Rate Limiting Factors of Low Pressure Plasma-catalytic CO2 Methanation Process, AVS 66th International Symposium & Exhibition, 2019.10.
5. K. Koga, M. Shiratani, Non-equilibrium nanoparticle composite film process using reactive plasmas (Invited), Advanced Metallization Conference 2019: 29th Asian Session (ADMETA Plus 2019), 2019.10.
6. K. Koga, M. Shiratani, Plasmas - from Laboratory to Table - (Invited), The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019), 2019.09.
7. K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, M. Shiratani, Synthesis and deposition of a-C:H nanoparticles using reactive plasmas with a fast gas flow, The Korea-Japan Workshop on Dust Particles in Plasmas, 2019.08.
8. S. Urakawa, N. Miyahara, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Sputter deposition of wide bandgap (ZnO)x(AlN)1-x alloys: a new material system with tunable bandgap, XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10), 2019.07.
9. K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki M. Shiratani, Growth Mechanism of Carbon Nanoparticles In Multi-Hollow Discharge Plasma Chemical Vapor Deposition (Invited), XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10), 2019.07.
10. K. Koga, S. H. Hwang, T. Nakatani, J. S. Oh, K. Kamataki, N. Itagaki, M.Shiratani, Deposition of Carbon Nanoparticles Using Multi-Hollow Discharge Plasma CVD for Synthesis of Carbon Nanoparticle Composite Films, 46th International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2019), 2019.05.
11. K. Koga, Y. Wada, R. Sato, R. Shimada, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, T. Kawasaki , Spatial Profile of RONS Dose Supplied by a Scalable DBD Device, The 3rd Asian Applied Physics Conference, 2018.12.
12. K. Koga, M. Shiratani, Innovative Agricultural Productivity Improvement Using Atmospheric Pressure Plasmas (Invited), 2018 MRS Fall Meeting & Exhibit, 2018.11.
13. K. Koga, Y. Wada, R. Sato, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, Evaluation of Amount of RONS Transport and Absorption of Seeds, 2018 MRS Fall Meeting & Exhibit, 2018.11.
14. K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, T. Nakatani, M. Shiratani, Synthesis of Hydrogenated Amorphous Carbon Nanoparticles using High-Pressure CH4+Ar Plasmas and Their Deposition, AVS 65th International Symposium & Exhibition, 2018.10.
15. Study on interaction fluctuation by collision analysis of two fine particles in plasmas.
16. Effects of deposition precursors on Si network orderliness.
17. K. Koga, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, Effects of cluster deposition on spatial profile of Si-Hx bond density in a-Si:H films, 2018 International Conference on Solid State Devices and Materials (SSDM2018), 2018.09.
18. K. Koga, M. Shiratani, Challenge to precise control of chemical bond configuration in plasma CVD films, RUB Japan Science Days 2018, 2018.07.
19. K. Koga, M. Shiratani, Control of synthesis and deposition of nanoparticles using a multi-hollow discharge plasma CVD , Workshop "Plasma surface interaction for technological applications" , 2018.06.
20. K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, High energy leverage method on growth enhancement of bio-mass plants using plasma seed treatment, 7th International Conference on Plasma Medicine (ICPM-7), 2018.06.
21. K. Koga, K. Kamataki, N. Itagaki, M. Shiratani, A deep insight of plasma-nanoparticle interaction, 19th International Congress on Plasma Physics, 2018.06.
22. Deposition of a-C:H films using H-assisted plasma CVD method together with tailored voltage waveforms.
23. Electron spin resonance spectroscopy of radish sprout seeds irradiated using atmospheric air dielectric barrier discharge plasmas.
24. K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of RONS Dose on Plasma Induced Growth Enhancement of Radish Sprout, 2nd International Workshop On Plasma Agriculture (IWOPA2), 2018.03.
25. K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Plasma Enhanced Carbon Recycling for Large-Scale Introduction of Solar Cells to Energy Supply Chain, 5th Korea-Japan Joint Symposium on Advanced Solar Cells 2018, 2nd International Symposium on Energy Research and Application, 2018.02.
26. K. Koga, G. Uchida, M. Shiratani, Towards ultra-high capacity batteries, Joint workshop btw SKKU and Kyushu University Emerging materials and devices, 2018.01.
27. K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, A new insight into nanoparticle-plasma interactions (Invited), JP-KO dust workshop, 2017.12.
28. K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, Evaluation of coupling among interaction fluctuations in nanoparticle growth in reactive plasmas, 18th Workshop on Fine Particle Plasmas, 2017.12.
29. K. Koga, T. Kojima, S. Toko, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Deposition of High Quality Silicon Thin Films Utilizing Nanoparticles Trapped in Plasmas, 27th annual meeting of MRS-J, 2017.12.
30. K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Number Density of Seeds on Plasma Induced Plant Growth Enhancement, 27th annual meeting of MRS-J, 2017.12.
31. K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Gas Flow Velocity on Plant Growth of Radish Sprout, The 2nd Asian Applied Physics Conference (Asian-APC), 2017.12.
32. K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Development of a fine particle transport analyzer for processing plasmas, The 39th International Symposium on Dry Process (DPS 2017), 2017.11.
33. K. Koga, S. Toko, S. Tanida, M. Shiratani, Surface-driven CH4 generation from CO2 in Low-pressure Non-thermal Plasma, American Vacuum Society 64th International Symposium and Exhibition (AVS64), 2017.10.
34. K. Koga, S. Toko, M. Shiratani , Hysteresis in Plasma CVD: a new path for high quality film deposition, 11th Asian-European International Conference on Plasma Surface Engineering (AEPSE2017) , 2017.09.
35. K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles Using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body (Invited), 231st Meeting of Electrochemical Society (ECS), 2017.05.
36. K. Koga, K. Mori, H. Seo, N. Itagaki, M. Shiratani, Corrational study of fluctuation of coupling between plasmas and nanoparticles, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
37. K. Koga, P. Attri, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Comparision of Gamma irradation and scalable DBD on the declorization of Dyes, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
38. K. Koga, A. Tanaka, M. Hirata, T. Amano, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Long-term evaluation of In nanoparticle transport in living body, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
39. K. Koga, K. Mori, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Time evolution of cross-correlation between two fluctuations of couplings between plasmas and nanoparticles in amplitude modulated discharges , 17th Workshop on Fine Particle Plasmas and JAPAN-KOREA Workshop on Dust Particles 2016, 2016.12.
40. K. Koga, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, Dependence of amount of plasma activated water on growth enhancement of radish sprout, 26th annual meeting of MRS-J, 2016.12.
41. K. Koga, T. Amano, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, A. Tanaka, Y. Nakatsu, T. Kondo, Comparative study on death of cells irradiated by non-thermal plasma, X-ray, and UV, The 1st Asian Applied Physics Conference (Asian-APC), 2016.12.
42. Study on suppression of dust deposition on mirror using a compact dust trajectory analyzer .
43. Temporal development of two dimensional structure of fluctuation of interaction between plasmas and nanoparticles.
44. Fabrication of a-Si Thin Film Solar Cells with High Efficiency and Low Light Induced Degradation using Plasma CVD .
45. K. Koga, T. Sarinont, M. Shiratani, Control of Plant Growth by RONS Produced Using Nonthermal Atmospheric Air Plasma , American Vacuum Society 63rd International Symposium and Exhibition (AVS63), 2016.11.
46. K. Koga, R. Katayama, T. Sarinont, H. Seo, N. Itagaki, P. Attri, E. L. Quiros, .A. Tanaka, M. Shiratani, Comparative study of non-thermal atmospheric pressure discharge plasmas for life science applications, 69th Annual Gaseous Electronics Conference (GEC2016), 2016.10.
47. K. Koga, T. Amano, Y. Nakatsu, H. Seo, N. Itagaki, A. Tanaka, T. Kondo, M. Shiratani, Time development of response of cells irradiated by non-thermal atmospheric air plasma, 6th International Conference on Plasma Medicine (ICPM6), 2016.09.
48. K. Koga, T. Sarinont, P. Attri, M. Shiratani, Nitrite concentration of plants grown from seeds irradiated by air dielectric barrier discharge plasmas, 20th International Vacuum Congress (IVC-20), 2016.08.
49. K. Koga and M. Shiratani, Potential fluctuation evaluation using binary collision of fine particles suspended in plasmas (Invited), 第16回微粒子プラズマ研究会, 2015.12.
50. K. Koga, X. Dong, K. Yamaki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka ,Y. Setsuhara, Effects of Ion Energy on Chemical Bond Configuration in a-C:H Deposited using Ar + H2+ C7H8 Plasma CVD, 37th International Symposium on Dry Process (DPS2015), 2015.11.
51. K. Koga, T. Amano, T. Sarinont, T. Kondo, S. Kitazaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Interactions between spin trapping reagents and non-thermal air DBD plasmas, 37th International Symposium on Dry Process (DPS2015), 2015.11.
52. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, M. Shiratani, Improving of Harvest Period and Crop Yield of Arabidopsis Thaliana L. using Nonthermal Atmospheric Air Plasma, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
53. K. Koga, T. Amano, T. Sarinont, T. Kawasaki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Y. Nakatsu, A. Tanaka, Two Dimentional Visualization of Oxidation Effect of Scalable DBD Plasma Irradiation using KI-starch Solution, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
54. K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, ICRP9/GEC68/SPP33, 2015.10.
55. K. Koga, T. Amano, M. Hirata, A. Tanaka, M. Shiratani, In vivo kinetics of nanoparticles synthesized by plasma in water (Invited), The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, 2015.10.
56. K. Koga, M. Soejima, K. Tomita, T. Ito, H. Seo, N. Itagaki, M. Shiratani, In-situ laser Raman spectroscopy of an optically trapped fine particle, 17th International Symposium on Laser-Aided Plasma Diagnostics (LAPD17) , 2015.09.
57. K. Koga and M. Shiratani, Control Of Nanoprticle Transport And Their Deposition For Porous Low-k Films By Using Plasma Pertubation (Invited), The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015), 2015.09.
58. K. Koga, T. Ito, H. Seo, N. Itagaki, and M. Shiratani, Temporal development of nonlinear coupling between radicals and nanoparticles in reactive plasmas (Invited), The 75th IUVSTA Workshop on Sheath Phenomena in Plasma Processing of Advanced Materials, 2015.01.
59. K. Koga, S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, M. Shiratani, Cluster suppressed deposition of a-Si:H films by employing non-linear phenomena in reactive plasmas (Invited), 2015 Japan-Korea Joint Symposium on Advanced Solar Cells, 2015.01.
60. Growth of Silkworms Irradiated by Atmospheric Pressure Air Plasmas.
61. Inter generation transport of Plasma Growth Enhancement to Arabidopsis Thaliana.
62. K. Koga, T. Ito, H. Seo, N. Itagaki, M. Shiratani, Analysis of coupling between nanoparticles and radicals using perturbation of radical density in reactive plasmas, Plasma Conference 2014, 2014.11.
63. K. Koga, T. Ito, K. Kamataki, H. Seo, N. Itagaki, and M. Shiratani, Effects of amplitude modulated VHF discharge on coupling between plasmas and nanoparticles, 24th International Toki Conference, 2014.11.
64. K. Koga, Y. Morita, T. Ito, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Spatiotemporal Analysis of Nanoparticle Growth in Amplitude Modulated Reactive Plasmas for Understanding Interactions between Plasmas and Nanomaterials (Invited), 15th IUMRS-International Conference in Asia, 2014.08.
65. K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Quartz crystal microbalance measurements for in-situ evaluation of dust inventory in fusion devices, 26th Symposium on Plasma Physics and Technology, 2014.06.
66. K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Real time mass measurement of dust particles deposited on vessel wall using quartz crystal microbalances in a divertor simulator, 21th International Conference on Plasma Surface Interactions (PSI2014), 2014.05.
67. K. Koga, T. Sarinont, T. Amano, and M. Shiratani, Effects of non-thermal air plasma irradiation to plant seeds on glucose concentration of plants, International Workshop on Diagnostics and Modelling for Plasma Medicine (DMPM2014), 2014.05.
68. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida and M. Shiratani, Coupling between radicals in plasmas and nanoparticle growth in initial growth phase in reactive plasmas with amplitude modulation, 18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics, 2014.02.
69. K. Koga, Y. Hashimoto, S. Toko, D. Yamashita, Y. Torigoe, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Fabrication of highly stable a-Si:H solar cells by suppressing cluster incorporation (Invited), 2014 Japan-Korea Joint Symposium on Advanced Solar Cells, 2014.02.
70. K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
71. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
72. K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Correlation between Plasma Fluctuation and Nanoparticle Amount in Initial Growth Phase in Reactive Plasmas with Amplitude Modulation, 14th Workshop on Fine Particle Plasmas, 2013.12.
73. K. Koga, G. Uchida, D. Ichida, S. Hashimoto, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Quantum dot sensitized solar cells using group IV semiconductor nanoparticles (Invited), 2013 EMN Fall Meeting , 2013.12.
74. K. Koga, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Deposition of Ge Nanoparticle Films and Their Application to Ge Quantum-dot Sensitized Solar Cells, The 23rd International Photovoltaic Science and Engineering Conference, 2013.11.
75. K. Koga, S. Iwashita, G. Uchida, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, U. Czarnetzki, Carbon Nanostructure formed by high pressure methane plasmas, The 26th Symposium on Plasma Science for Materials (SPSM-26), 2013.09.
76. K. Koga, A. Tanaka, M. Hirata, N. Hayashi, N. Itagaki and G. Uchida, Comparative Acute Pulmonary Toxicity of Different Types of Indium-Tin Oxide Following Intermittent Intratracheal Instillation to the Lung of Rats, 2013 JSAP-MRS Joint Symposia, 2013.09.
77. Fabrication of highly stable a-Si:H PIN solar cells using cluster suppression method.
78. K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, H. Seo, M. Shiratani and U. Czarnetzki, Formation of self-organized nanostructures using high pressure CH4+Ar plasmas, The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013), 2013.08.
79. K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, K. Kamataki, M. Shiratani, U. Czarnetzki, High Pressure Nonthermal Methane Plasmas for Nanoparticle Production, The 12th Asia Pacific Physics Conference (APPC12), 2013.07.
80. K. Koga, D. Yamashita, G. Uchida, M. Shiratani, U. Czarnetzki, Characteristics of high pressure Ar+CH4 nanosecond discharge plasmas for producing nanoparticles, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.02.
81. K. Koga, D. Yamashita, G. Uchida, M. Shiratani, Single particle trapping in plasmas using laser for studying interaction between a fine particle and palsams, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.01.
82. K. Koga, Time and space profiles of laser-light scattering intensity from nano-particles and optical emission intensity in amplitude modurated high frequency discharge plasmas, The International LIGLR Workshop on Plasma Science & Technology, 2013.01.
83. K. Koga, Y. Wang, D. Ichida, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Deposition of Si nanoparticle composite films for C-Si/Si QDs/organic Solar Cells, 第13回微粒子プラズマ研究会, 2012.12.
84. K. Koga, Plasma Chemical Vapor Deposition for Solar Cells (Invited), 2012 Workshop on Advanced Surface and Material Technologies, 2012.11.
85. 古閑一憲, 岩下伸也, 内田儀一郎, J. Schulze, E. Schungel, P. Hartmann, 白谷正治, Z. Donko, U. Czarnetzki, Electrical Asymmetry Effectを用いた微粒子のシース間輸送, 九州山口プラズマ研究会、応物新領域研究会, 2012.11.
86. K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Control of Dust Flux in LHD and in a Divertor Simulator, 24th Fusion Energy Conference (IAEA) , 2012.10.
87. K. Koga, S. Iwashita, M. Shiratani, U. Czarnetzki, Formation of Nanoparticles in High Pressure Reactive Nanosecond Discharges, Asia-Pacific Conference on Plasma Science and Technology (11th APCPST), 2012.10.
88. K. Koga, D. Yamashita, S. Kitazaki, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Optical Trapping of Single Fine Particle in Plasmas for study of interactions between a fine particle and plasmas, NANOSMAT 2012, 2012.09.
89. K. Koga, T. Urakawa, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile and properties of plasma CVD carbon films, 13th International Conference on Plasma Surface Engineering (PSE2012), 2012.09.
90. K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Effects of Substrate DC Bias Voltage on Dust Collection Efficiency in Large Helical Device, 20th International Conference on Plasma Surface Interactions 2012 (PSI2012), 2012.05.
91. K. Koga, K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Effects of incorporation of clusters generated in the plasma ignition phase on Schottky cell performance of amorphous silicon films, The Fourth International Workshop on Thin-Film Silicon Solar Cells (IWTFSSC-4), 2012.03.
92. K. Koga, K. Kamataki, S. Nunomura, S. Iwashita, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, U. Czarnetzki, Three growth modes of nanoparticles generated in reactive plasmas, DPG Spring Meeting of the Section AMOP (SAMOP), 2012.03.
93. K. Koga, G. Uchida, M. Sato, Y. Wang, K. Nakahara, K. Kamataki, N. Itagaki, M. Shiratani, Effects of surface treatment on performance of Si nano-particle quantum dot solar cells, The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011), 2011.07.
94. K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics (Invited), International Conference on Advances in Condensed and Nano Materials-2011(ICACNM-2011), 2011.02.
95. K. Koga, T. Matsunaga, Y. Kawashima, Y. Kim, K. Nakahara, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Radical flux evaluation of high pressure silane plasma CVD using multi-hollow discharges (Invited), The 12th International Workshop on Advanced Plasma Processing and Diagnostics, 2011.01.
96. Deposition of SiOx-CH3 nano-particles on fine pattern substrate.
97. Evaluation of the flux of carbon particles generated plasma-carbon wall interaction to substrates.
98. K. Koga, T. Nomura, G. Uchida, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on the surface of fine structures using plasma CVD (Invited), The 1st Korean-Japan Symposium on Surface Technology, 2010.11.
99. K. Koga, H. Miyata, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD Experimental Group, Deposition of Nanoparticles using Substrate Bias Voltage, 第23回マイクロプロセス・ナノテクノロジー国際会議(MNC 2010), 2010.11.
100. K. Koga, K. Nakahara, T. Matsunaga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, High speed deposition of highly stable a-Si:H films using pure silane multi-hollow discharges, Third International Workshop on Thin Film Silicon Solar Cells (IWTFSSC3) , 2010.10.
101. K. Koga, G. Uchida, Y. Kawashima, M. Sato, K. Yamamoto, K. Nakahara, T. Matsunaga, K. Kamataki, N. Itagaki, M. Shiratani, Si quantum dot-sensitized solar cells using Si nanoparticles produced by multi-hollow discharge, 3rd International Symposium on Innovative Solar Cells, 2010.10.
102. K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between Si thin films with and without incorporating nanoparticles into the film, 10th Asia Pacific Conference on Plasma Science and Technology (APCPST), 2010.07.
103. K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for a-Si:H film deposition, 35th IEEE Photovoltaic Specialists Conference (PVSC), 2010.06.
104. K. Koga, Plasma CVD for Si thin film solar cells, 2010 International Workshop on Plasma Applications, 2010.06.
105. Transport of nanoparticlecloud having a fractional elementary charge by amplitude modulating pulse discharges.
106. K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, 第27回プラズマプロセシング研究会(SPP-27), 2010.02.
107. K. Koga, H. Sato, Y. Kawashima, M. Shiratani, High Rate Deposition of Cluster-suppressed Amorphous Silicon Films Deposited Using a Multi-hollow Discharge Plasma CVD, 2009 MRS Fall Meeting, 2009.12.
108. K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma Treatment of Indium Compounds to Reduce Their Adverse Health Effects, 2009 MRS Fall Meeting, 2009.12.
109. K. Koga, Y. Kawashima, K. Nakahara, H. Sato, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for third generation solar cells (Invited), 10th Workshop on Fine Particle Plasmas, 2009.11.
110. K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma treatment of CIGS to reduce toxicity, Seventh Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), 2009.09.
111. K. Koga, T. Nomura, M. Shiratani, M. Sekine, Y. Setsuhara, M. Hori, Anisotropic deposition in narrow trenches using hydrogen assisted plasma CVD method, Memorial Symposium for the Retirement of Professor Tachibana “Toward the Next Generation of Plasma Science, Technology”, 2009.05.
112. K. Koga, Deposition profile control of carbon films in trenches using a plasma CVD method (Invited), The 7th EU-Japan Joint Symposium on Plasma Processing, 2009.04.
113. K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani,, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会, 2009.02.
114. K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara,, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method
, プラズマ科学シンポジウム2009/第26回プラズマプロセシング研究会, 2009.02.
115. K. Koga, S. Iwashita, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Dust Particles in Size Range from 1 nm to 10 μm Sampled in LHD, 9th Workshop on Fine Particle Plasmas, 2008.12.
116. K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Improvement in deposition rate of a-Si:H films using a low pressure multi-hollow discharge plasma CVD method, ICPP2008 Satellite Meeting on Plasma Physics, Advanced Applications in Aso, 2008.09.
117. K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki,, M. Shiratani , Deposition of highly stable a-Si:H films using hydrogen diluted silane hollow discharge, The 3rd International School of Advanced Plasma Technology, 2008.07.
118. K. Koga, Nano-structure formation using Plasma (Invited), レノバセミナー, 2008.04.
119. K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Effects of hydrogen dilution on a-Si:H deposition using silane hollow discharges, 第25回プラズマプロセシング研究会, 2008.01.
120. K. Koga, M. Shiratani, Control of deposition profile of Cu in trenches using ion-enhanced surface reaction (Invited), The 5th International Symposium on Advanced Plasma Processing, Diagnostics, The 1st International Symposium on Flexible Electronics Technology, 2007.04.
121. K. Koga, M. Shiratani, Y. Watanabe, Cluster-suppressed plasma CVD method employing VHF discharges, Fine Particle Plasmas: Basis, Applications - Third Workshop on Fine Particle Plasmas, 2002.12.
122. K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Correlation between cluster amount, qualities of a-Si:H films for SiH4 plasma CVD, American Vaccum Society 49th International Symposium, 2002.11.
123. K. Koga, R. Ueharaa, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasmas, carbon wall, Joint Meeting of 16th European Conference on Atomic, Molecular Physics of Ionized Gases, 5th International Conference on Reactive Plasmas, 2002.07.
124. K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges, their application to deposition of super high quality a-Si:H films, International Workshop on Information, Electrical Engineering (IWIE2002), 2002.05.
125. K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in sub-nm size range, Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
126. K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in subnm size range (Invited), The Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
127. K. Koga, M. Shiratani, Y. Watanabe, Preliminary experiments on dust particles formation due to interaction between plasma, graphite wall, Fine Particle Plasmas: Basis, Applications - Second Workshop on Fine Particle Plasmas, 2001.12.
128. K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, International Conference on Phenomena in Ionized Gases, 2001.07.
129. K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution, excitation frequency on initial growth of clusters in silane plasmas, Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
130. K. Koga, K. Tanaka, T. Tokuyasu, M. Shiratani, Y. Watanabe, Initial growth of clusters in silane rf discharges, 53rd Annual Gaseous Electronics Conference, 2000.10.
131. K. Koga, H. Naitou, Y. Kawai, Characteristics of Asymmetric Ion Sheath in a Negative Ion Plasma, 2nd International Conference on the Physics of Dusty Plasmas, 1999.05.
Membership in Academic Society
  • 学外
  • 学外
  • 学外
  • 学外
Awards
  • JSAP Fellow
  • Investigations on Plasma Interactions with Soft Materials for Fabrication of Flexible Devices
  • The Japan Society of Applied Physics presents the APEX/JJAP Editorial Contribution Award to Masaharu Shiratani in recognition of distinguished and valuable contributions as an editor and/or a reviewer of the articles for Applied Physics Express (APEX) and Japanese Journal of Applied Physics (JJAP).
  • In recognition of your distinguished invited presentation entitled "Deposition profile control of plasma CVD films on nano-patterned substrates", the Intefinish 2008 Committee presents you with this Invited Presentation Award.
Educational
Other Educational Activities
  • 2019.08.
  • 2010.08.
  • 2009.03.