九州大学-研究者情報 [白谷正治 (教授) システム情報科学研究院情報エレクトロニクス部門]

太陽光発電システム未来技術研究開発
2007.02～2010.03, 代表者：竹内良昭, 三菱重工業, 三菱重工業，九州大学，大阪大学
本研究は，九州大学，三菱重工，大阪大学が共同で行うものであり，全体としては，薄膜シリコン系スタック型太陽電池において、従来トップセル材料として用いられてきたアモルファスシリコンが持つ光劣化の問題を根本的に解決すし、それを用いた低コスト高効率太陽電池製造技術を確立し、モジュールコストを50円/W以下を可能とする指針を得ることを目的としている．
　九州大学の分担内容は，九州大学プラズマ研究室で開発したSiナノ粒子成長制御法と微ナノ観測技術をもとに，上述の薄膜シリコン系スタック型太陽電池を作製する際に必要となるトップセルの光劣化の基礎現象解明を行うことを目的としている．.

革新的次世代太陽光発電システム技術研究開発
2000.06～2003.03, 代表者：松田彰久, 産業技術総合研究所, 産業技術総合研究所，九州大学，凸版印刷，スタンレー電気，日本板硝子
本研究は，九州大学，産業技術総合研究所，凸版印刷，スタンレー電気，日本板硝子が共同で行うものであり，全体としては，薄膜シリコン系スタック型太陽電池において、従来トップセル材料として用いられてきたアモルファスシリコンが持つ光劣化の問題を根本的に解決する革新的材料、ナノ構造制御シリコンを開発し、それを用いた低コスト高効率太陽電池製造技術を確立し、モジュールコストを50円/W以下を可能とする指針を得ることを目的としている．
　九州大学の分担内容は，九州大学プラズマ研究室で開発したSi微粒子成長制御法と微粒子観測技術をもとに，上述のナノ構造制御シリコン太陽電池を作製する際に必要となるナノ構造制御シリコン材料の開発を行うことを目的としている．.

研究業績

主要著書

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1.	Bharti Arora, Eun Ha Choi, Masaharu Shiratani, and Pankaj Attri, Cellulose: A Smart Material for Water Purification (Smart Materials for Waste Water Applications), Scrivener Publishing, 2016.02.
2.	古閑一憲, 白谷正治, 節原裕一, 関根誠, 堀勝, プラズマ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜 (特集革新的プラズマ科学の新潮流), 化学工業, 63,12,908-912, 2012.12.
3.	内田儀一郎, 古閑一憲, 白谷正治, ダブルマルチホロー放電プラズマＣＶＤによる窒化シリコンナノ粒子の生成と量子ドット増感型太陽電池への応用 (高効率太陽電池化合物・集光型・量子ドット型・Ｓｉ・有機系・その他新材料), 株式会社エヌ・ティー・エス, 第3章, 2, 2012.05, [URL].
4.	古閑一憲、内田儀一郎、白谷正治、布村正太、渡辺征夫, プロセスプラズマ中の微粒子の凝集と輸送 (「プラズマと微粒子」研究の諸分野における進展), プラズマ・核融合学会誌, プラズマ・核融合学会誌,87,2,99-104, 2011.02.
5.	Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 20, pp.247-257, 2010.05, [URL].
6.	Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani, Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 31, pp.377-383, 2010.05, [URL].
7.	白谷正治, 節原裕一, 関根誠, 堀勝, 研究開発の効率を飛躍的に高めるコンビナトリアルプラズマ解析装置 (特集プラズマ技術の新しい挑戦), 化学工業, 61,5,371-375, 2010.05.
8.	白谷正治, 古閑一憲, 光劣化しない革新的アモルファスシリコン太陽電池の作製をめざして (次世代シリコン太陽電池製造のためのプラズマ技術), プラズマ・核融合学会誌, プラズマ・核融合学会誌,86,1,33-36, 2010.01.

主要原著論文

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1.	Y. Liu, Y. Nakatsu, H. Tanaka, K. Koga, K. Ishikawa, M. Shiratani, M. Hori , Effects of plasma-activated Ringer’s lactate solution on cancer cells: evaluation of genotoxicity, Genes Environ, 10.1186/s41021-023-00260-x, 45, 1, 1-10, 2023.01, [URL].
2.	P. Attri, K. Koga, H. Kurita, K. Ishikawa, M. Shiratani, Prospects of plasma generated species interaction with organic and inorganic materials, Frontiers in Physics, 10.3389/fphy.2022.1118018, 10, 1396, 2023.01, [URL].
3.	N. Yamashita, R. Mitsuishi, Y. Nakamura, K. Takeda, M. Hori, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, Role of insoluble atoms in the formation of a three-dimensional buffer layer in inverted Stranski–Krastanov mode, J. Mater. Res, 10.1557/s43578-022-00886-7, 1-8, 2023.01, [URL].
4.	D. Sakamoto, M. Shiratani, H. Seo, Near-infrared light harvesting of upconverting Y2O3: Er3+ nanoparticles and their photovoltaic application, Electrochim. Acta, 10.1016/j.electacta.2022.141407, 436, 141407, 2022.12, [URL].
5.	M. Shiratani, J. P. Verboncoeur, J. S. Wu, Guest Editorial: Emerging Plasma Nanotechnologies, IEEE Open Journal of Nanotechnology, 10.1109/OJNANO.2022.3224346, 3, 131-132, 2022.12, [URL].
6.	I. Nagao, K. Kamataki, A. Yamamoto, M. Otaka, Y. Yamamoto, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, One-dimensional particle-in-cell/Monte Carlo collision simulation for investigation of amplitude modulation effects in RF capacitive discharges, MRS Adv., 10.1557/s43580-022-00417-w, 7, 911-917, 2022.12, [URL].
7.	R. Narishige, N. Yamashita, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, H. Yabuta, N. Itagaki , Effects of substrate surface polarity on heteroepitaxial growth of pseudobinary ZnO–InN alloy films on ZnO substrates(Invited), J. Mater. Res., 10.1557/s43578-022-00827-4, 2022.11, [URL].
8.	T. Okumura, T. Anan, P. Attri, Y. Tsukada, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Y. Ishibashi, Plasma irradiation-introduced RONS amount into plant seeds and their response analysis, Bull. Am. Phys. Soc., 2022.10, [URL].
9.	S. Ono, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Process analysis of cracking aC: H/CNP/aC: H sandwich films under stress using nanoindentation, Bull. Am. Phys. Soc., 2022.10, [URL].
10.	M. Shiratani, D. Takahashi, N. Yamashita, N. Itagaki, Sputter epitaxy of Mg-doped ZnO films on sapphire substrates using inverted Stranski-Krastanov mode, Bull. Am. Phys. Soc., 2022.10, [URL].
11.	P. Attri, T. Okumura, K. Koga, K. Kamataki, N. Itagaki, M. Shiratani, N. Takeuchi, Plasma induced conversion of CO2 with water to useful compounds, Bull. Am. Phys. Soc., 2022.10, [URL].
12.	T. Anan, T. Nakao, T. Okumura, P. Attri, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effect of plasma irradiation on germination of lettuce seeds with fluctuating dormancy, Bull. Am. Phys. Soc., 2022.10, [URL].
13.	M. Shiratani, T. Anan, T. Nakao, T. Okumura, P. Attri, K. Koga, Reproducibility in plasma agriculture, Bull. Am. Phys. Soc., 2022.10, [URL].
14.	M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Pressure dependence on spatio-temporal distribution of excitation rates of Ar 2p1 and Ne 2p1 in Ar and Ar/Ne capacitively coupled plasmas, Bull. Am. Phys. Soc., 2022.10, [URL].
15.	A. M. Nurut, N. Yamashita, K. Kamataki, K. Koga, N. Itagaki, M. Shiratani, Control of magnetic transition of ZnO: Co grown by RF-sputter using post-annealing, ICIEE, 10.1109/ICIEE55596.2022.10010108, 2022.10, [URL].
16.	I. Nagao, A. Yamamoto, Y. Yamamoto, K. Kamataki, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulation discharge on behavior of oxygen ions in Ar/O2 capacitively coupled plasma studied by particle-in-cell/Monte Carlo collision model, Bull. Am. Phys. Soc., 2022.10, [URL].
17.	S. Toko, T. Hasegawa, T. Okumura, K. Kamataki, K. Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Relationship between vibrational temperature and CO2 methanation with plasma catalysis, Bull. Am. Phys. Soc., 2022.10, [URL].
18.	K. Kamataki, T. Sato, K. Tomita, P. Yimin, D. Yamashita, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Measurements of strength and fluctuation of 2D electric fields in plasmas using a fine particle trapped with laser tweezers, Bull. Am. Phys. Soc., 2022.10, [URL].
19.	K. Koga, P. Attri, T. Okumura, T. Anan, T. Nakao, K. Kamataki, N. Yamashita, N. Itagaki, M. Shiratani, Role of short-lived nitrogen species generated at low-pressure RF plasma on the germination and seedling growth, Bull. Am. Phys. Soc., 2022.10, [URL].
20.	K. Abe, K. Kamataki, A. Yamamoto, I. Nagao, M. Otaka, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K . Koga, M. Shiratani, Effects of amplitude modulated capacitively coupled discharge Ar plasma on kinetic energy and angular distribution function of ions impinging on electrodes:particle-in-cell/Monte Carlo collision model simulation, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac7626, 61, 10, 106003, 2022.09, [URL].
21.	K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma, AIP Adv., 10.1063/5.0097691, 12, 085220, 2022.08, [URL].
22.	V. Sirgedaitė-Šėžienė, I. Lučinskaitė, V. Mildažienė, A. Ivankov, K. Koga, M. Shiratani, K. Laužikė, V. Baliuckas, Changes in Content of Bioactive Compounds and Antioxidant Activity Induced in Needles of Different Half-Sib Families of Norway Spruce (Picea abies (L.) H. Karst) by Seed Treatment with Cold Plasma, Antioxidants, 10.3390/antiox11081558, 11, 8, 1558, 2022.08, [URL].
23.	K. Kamataki, D. Nagamatsu, T. Yang, K. Abe, A. Yamamoto, I. Nagao, T. Arima, M. Otaka, Y. Yamamoto, D. Yamashita, T. Okumura, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Effects of amplitude modulated discharge on growth of nanoparticles in TEOS/O2/Ar capacitively coupled plasma, AIP Adv, 10.1063/5.0097691, 12, 8, 085220, 2022.08, [URL].
24.	T. Okumura, P. Attri, K. Kamataki, N. Yamashita, Y. Tsukada, N. Itagaki, M. Shiratani, Y. Ishibashi, K. Kuchitsu, K. Koga, Detection of NO3− introduced in plasma-irradiated dry lettuce seeds using liquid chromatography-electrospray ionization quantum mass spectrometry (LC-ESI QMS), Sci. Rep., 10.1038/s41598-022-16641-1, 12, 12525, 2022.07, [URL].
25.	S. Ono, S. H. Hwang, T. Okumura, K. Kamataki, N. Yamashita, N. Itagaki, K. Koga, M. Shiratani, J. S. Oh, S. Takabayashi, T. Nakatani, Raman spectral analysis of the as-deposited aC: H films prepared by CH4+ Ar plasma CVD, MRS Adv., 10.1557/s43580-022-00310-6, 7, 718–722, 2022.07, [URL].
26.	P. Attri, K. Koga, T. Okumura, F. L. Chawarambwa, T. E. Putri, Y. Tsukada, K. Kamataki, N. Itagaki, M. Shiratani, Treatment of organic wastewater by a combination of non-thermal plasma and catalyst: a review, Rev. Mod. Plasma Phys, 10.1007/s41614-022-00077-1, 6, 17, 2022.07, [URL].
27.	M. Otaka, T. Arima, J. Lai, K. Ikeda, K. Kamataki, N. Yamashita, T. Okumura, N. Itagaki, K. Koga, M. Shiratani, Spatio-temporal measurements Ar 2p1 excitation rates and optical emission spectroscopy by capacitively coupled Ar and Ne mixed gas plasma, MRS Adv., 10.1557/s43580-022-00306-2, 2022.07, [URL].
28.	I. Adamovich, S. Agarwal, E. Ahedo, L. L. Alves, S. Baalrud, N. Babaeva, A. Bogaert, A. Bourdon, P. J. Bruggeman, C. Canal, E. H. Choi, S. Coulombe, Z. Donkó, D. B. Graves, S. Hamaguchi, D. Hegemann, M. Hori, H-H. Kim, G. M. W. Kroesen, M. J. Kushner, A. Laricchiuta, X. Li, T. E. Magin, S. Mededovic Thagard, V. Miller, A. B. Murphy, G. S. Oehrlein, N. Puac, R. M. Sankaran, S. Samukawa, M. Shiratani, M. Šimek, N. Tarasenko, K. Terashima, E. Thomas. Jr, J. Trieschmann, S. Tsikata, M. M. Turne, I. J. van der Walt, M C M van de Sanden, T. von Woedtke, The 2022 Plasma Roadmap: low temperature plasma science and technology, J. Phys. D: Appl. Phys., 10.1088/1361-6463/ac5e1c, 55, 373001, 2022.07, [URL].
29.	J. Razzokov, S. Fazliev, A. Kodirov, P. Attri, Z. Chen, M. Shiratani, Mechanistic Insight into Permeation of Plasma-Generated Species from Vacuum into Water Bulk, Int. J. Mol. Sci., 10.3390/ijms23116330, 23, 11, 6330, 2022.06, [URL].
30.	Y. Nakamura, N. Yamashita, K. Kamataki, T. Okumura, K. Koga, M. Shiratani, N. Itagaki, Growth of single crystalline ZnO films on 18%-lattice-mismatched sapphire substrates using buffer layers with three-dimensional islands, Cryst. Growth Des., 10.1021/acs.cgd.2c00145, 2022.05, [URL].
31.	T. E. Putri, F. L. Chawarambwa, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani , Performance comparison of nitrile-based liquid electrolytes on bifacial dye-sensitized solar cells under low-concentrated light, MRS Adv., 10.1557/s43580-022-00270-x, 7, 427-432, 2022.04, [URL].
32.	F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Effects of Spin-Coating Rate on Surface Roughness, Thickness, and Electrochemical Properties of a Pt Polymer Counter Electrode, Advanced Engineering Forum, 10.4028/p-6l16rl, 45, 1-13, 2022.04, [URL].
33.	D. Takahashi, N. Yamashita, D. Yamashita, T. Okumura, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of Zn1-xMgxO Films on Sapphire Substrates via Inverted Stranski-Krastanov Mode Using Magnetron Sputtering, MRS Adv., 10.1557/s43580-022-00234-1, 2022.02, [URL].
34.	P. Attri, T. Okumura, K. Koga, M. Shiratani, D. Wang, K. Takahashi, K. Takaki, Outcomes of Pulsed Electric Fields and Nonthermal Plasma Treatments on Seed Germination and Protein Functions, Agronomy 2022, 10.3390/agronomy12020482, 12, 2, 482, 2022.02, [URL].
35.	G. Uchida, K. Nagai, Y. Habu, J. Hayashi, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara , Nanostructured Ge and GeSn Films by Highpressure He Plasma Sputtering for High-capacity Li ion Battery Anodes, Sci. Rep., 10.1038/s41598-022-05579-z, 12, 1742 (2022), 2022.02, [URL].
36.	白谷正治, 農業応用のための大気圧プラズマ源とその植物への効果 , 化学工業, 73, 2, 124-128, 2022.02, [URL].
37.	S. Toko, M. Ideguchi, T. Hasegawa, T. Okumura, K. Kamataki, K.Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Effect of gas flow rate and discharge volume on CO2 methanation with plasma catalysis, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac4822, 2022.01, [URL].
38.	F. L. Chawarambwa, T. E. Putri, A. Pankaj, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Performances of Carbon Black-Titanium nitrate and Carbon Black-Titanium/Triton X-100 Composite Polymer Counter Electrodes for Dye-Sensitized Solar Cells, Adv. Mater. Res., 10.4028/www.scientific.net/AMR.1168.35, 1168, 35-47, 2022.01, [URL].
39.	F. L. Chawarambwa, T. E. Putri, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, K. Koga, D. Nakamura. M. Shiratani, Improved luminescence performance of Yb3+-Er3+-Zn2+: Y2O3 phosphor and its application to solar cells, Optical Materials, 10.1016/j.optmat.2021.111928, 123, 111928, 2022.01, [URL].
40.	J.Hayashi, K. Nagai, Y.Habu, Y. Ikebe, M. Hiramatsu, R. Narishige, N. Itagaki, M. Shiratani, Y. Setsuhara, G. Uchida, Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries, Jpn. J. Appl. Phys., 10.35848/1347-4065/ac2b7b, 61, SA, SA1002, 2021.12, [URL].
41.	P. Attri, T. Anan, R. Arita, T. Okumura, H. Tanaka, D. Yamashita, K. Matsuo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, K. Kuchitsu, Y. Ishibashi, Plasma Treatment Effect on the Paramagnetic Species of Barley Seed Radical’s Intensity: An EPR study, Plasma Medicine, 10.1615/PlasmaMed.2020036353, 10, 3, 159-168, 2021.12, [URL].
42.	T. E. Putri, F. L Chawarambwa, M. K. Son, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Performance Characteristics of Bifacial Dye-Sensitized Solar Cells with a V-Shaped Low-Concentrating Light System, ACS Appl. Energy Mater., 10.1021/acsaem.1c02774, 4, 12, 13410-13414, 2021.11, [URL].
43.	F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of concentrated light on the performance and stability of a quasi-solid electrolyte in dye-sensitized solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2021.138986, 781, 138986, 2021.10, [URL].
44.	K. Koga, S. H. Hwang, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, Transport of Nanoparticles in Afterglow Region Using Multi-Hollow Discharge Plasma CVD, Bull. Am. Phys. Soc., 66, 7, 2021.10, [URL].
45.	D. Sakamoto, M. Shiratani, H. Seo, Synergetic effect of a polymer and metalloid composite on the electrocatalytic improvement of dye-sensitized solar cells, New J. Chem., 10.1039/D1NJ03643B , 45, 38, 18202-18207, 2021.09, [URL].
46.	P. Attri,H. Kurita, K. Koga, M. Shiratani, Impact of Reactive Oxygen and Nitrogen Species Produced by Plasma on Mdm2–p53 Complex, Int. J. Mol. Sci., 10.3390/ijms22179585, 22, 17, 9585, 2021.09, [URL].
47.	S. Nunomura, I. Sakata, A. Sato, M. Lozac’h, T. Misawa, N.Itagaki, M.Shiratani, Passivating antireflection coating of crystalline silicon using i/n a-Si:H/SiN trilayer , J Phys Chem Solids, 10.1016/j.jpcs.2021.110127, 156, 11027, 2021.09, [URL].
48.	S. Nunomura, I. Sakata, A. Sato, M. Lozac’h, T. Misawa, N.Itagaki, M.Shiratani, Passivating antireflection coating of crystalline silicon using i/n a-Si:H/SiN trilayer , J Phys Chem Solids, 10.1016/j.jpcs.2021.110127, 156, 11027, 2021.09, [URL].
49.	P.Attri, K. Koga, T. Okumura, N. Takeuchi, M. Shiratani, Green route for ammonium nitrate synthesis: fertilizer for plant growth enhancement, RSC Adv., 10.1039/D1RA04441A , 11, 46, 28521-28529, 2021.08, [URL].
50.	S. H. Hwang, R. Iwamoto, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani, Comparison between Ar+CH4 Cathode and Anode Coupled Capacitively Coupled Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Films, Thin Solid Films, 10.1016/j.tsf.2021.138701, 729, 138701, 2021.07, [URL].
51.	P.Attri, N. KumarKaushik, N. Kaushik, D. Hammerschmid, A. Privat-Maldonado, J. Backer, M. Shiratani, E. H. Choi, A. Bogaerts, Plasma treatment causes structural modifications in lysozyme, and increases cytotoxicity towards cancer cells, Int. J. Biol. Macromol., 10.1016/j.ijbiomac.2021.05.146, 182, 1724-1736, 2021.07, [URL].
52.	R. Narishige, N. Itagaki, M. Shiratani, Sputtering Growth of Metal Oxynitride Semiconductors for Excitonic Devices, 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM), 10.1109/EDTM50988.2021.9420921, 2021.05, [URL].
53.	F. L. Chawarambwa, T. E. Putri, P. Attri, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Highly efficient and transparent counter electrode for application in bifacial solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2021.138369, 768, 138369, 2021.04, [URL].
54.	P.Attri, K. Koga, T.Okumura, M. Shiratani, Impact of atmospheric pressure plasma treated seeds on germination, morphology, gene expression and biochemical responses, Jpn. J. Appl. Phys., 10.35848/1347-4065/abe47d, 60, 4, 040502, 2021.03, [URL].
55.	F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura, Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells, J. Mol. Struct., 10.1016/j.molstruc.2020.129479, 1228, 129479, 2021.03, [URL].
56.	C. Suriyasak, K. Hatanaka, H. Tanaka, T. Okumura, D. Yamashita, P. Attri, K. Koga, M. Shiratani, N. Hamaoka, Y. Ishibashi, Alterations of DNA Methylation Caused by Cold Plasma Treatment Restore Delayed Germination of Heat-Stressed Rice (Oryza sativa L.) Seeds, ACS Agric. Sci. Technol., 10.1021/acsagscitech.0c00070, 1, 1, 5-10, 2021.02, [URL], プラズマ照射を用いることによって、悪影響が及んでいる高温障害イネの発芽を促進するメカニズムの解明に成功した。.
57.	P. Attri, K. Ishikawa, T. Okumura, K. Koga, M. Shiratani, V. Mildaziene, Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture, Sci. Rep., 10.1038/s41598-021-81175-x, 11, 1, 1-10, 2021.01, [URL].
58.	P. Attri, K. Koga, M. Shiratani, Possible impact of plasma oxidation on the structure of C-terminal domain of SARS-CoV-2 spike protein: a computational study, Jpn. J. Appl. Phys., 10.35848/1882-0786/abd717, 14, 2, 2021.01, [URL].
59.	T. E. Putri, Y. Hao, F. L. Chawarambwa, H. Seo, Min-Kyu Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Activated Carbon Counter Electrode On Bifacial Dye Sensitized Solar Cells (DSSCs), Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.1016.863, 1016, 863-868, 2021.01, [URL].
60.	V. Sirgedaitė‐Šėžienė , V. Mildažienė,　P. Žemaitis , A. Ivankov , K. Koga, M. Shiratani, V. Baliuckas, Long-term response of Norway spruce to seed treatment with cold plasma: dependence of the effects on the genotype, Plasma Process Polym, 10.1002/ppap.202000159, 2020.12, [URL].
61.	S. H. Hwang, K. Koga, Y. Hao, P. Attri, T. Okumura, K. Kamataki, N. Itagaki, M. Shiratani, J-S. Oh, S. Takabayashi, T. Nakatani, Time of Flight Size Control of Carbon Nanoparticles Using Ar+CH4 Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, Processes, 10.3390/pr9010002, 9, 1, 2, 2020.12, [URL].
62.	P. Attri, J. H. Park, J. D. Backer, M. Kim, J. H. Yun, Y. Heo, S. Dewilde, M. Shiratani, E. H. Choi, W. Lee, A. Bogaerts, Structural modification of NADPH oxidase activator (Noxa 1) by oxidative stress: An experimental and computational study, Int. J. Biol. Macromol., 10.1016/j.ijbiomac.2020.09.120, 163, 2405-2414, 2020.11, [URL].
63.	T. Kawasaki, K. Koga, M. Shiratani, Experimental identification of the reactive oxygen species transported into a liquid by plasma irradiation, Jpn. J. Appl. Phys., 10.35848/1347-4065/abc3a1, 59, 11, 110502, 2020.11, [URL].
64.	F. L. Chawarambwa, T. E. Putri, M. K. Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Graphene-Si3N4 nanocomposite blended polymer counter electrode for low-cost dye-sensitized solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2020.137920, 758, 137920, 2020.11, [URL].
65.	S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition, Diam Relat Mater, 10.1016/j.diamond.2020.108050, 109, 108050, 2020.11, [URL].
66.	R. Narishige, K. Kaneshima, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Impact of surface morphologies of substrates on the epitaxial growth of magnetron sputtered (ZnO)x(InN)1-x films, Jpn. J. Appl. Phys., 10.35848/1347-4065/abba0c, 60, SA, SAAB02, 2020.10, [URL].
67.	S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani, Low stress diamond-like carbon films containing carbon nanoparticles fabricated by combining rf sputtering and plasma chemical vapor deposition, Jpn. J. Appl. Phys. , 10.35848/1347-4065/abbb20, 59, 10, 100906, 2020.10, [URL].
68.	I. Tamošiūnė, D. Gelvonauskienė, P. Haimi, V. Mildažienė, K. Koga, M. Shiratani, D. Baniulis, Cold plasma treatment of sunflower seeds modulates plant-associated microbiome and stimulates root and lateral organ growth, Front. Plant Sci., 10.3389/fpls.2020.568924, 11, 1347, 2020.08, [URL].
69.	P. Attri, K. Ishikawa, T. Okumura, K. Koga, M. Shiratani, Plasma agriculture from laboratory to farm: A review, Processes, 10.3390/pr8081002, 8, 8, 1002, 2020.08, [URL].
70.	S. Nunomura, I. Sakata, H. Sakakita, K. Koga, M. Shiratani, Real-time monitoring of surface passivationof crystalline silicon during growth of amorphous and epitaxial silicon layer, J. Appl. Phys., 10.1063/5.0011563, 128, 3, 2020.07, [URL].
71.	P. Attri, S. Choi, M. Kim, M. Shiratani, A. E. Cho, W. Lee, Influence of alkyl chain substitution of ammonium ionic liquids on the activity and stability of tobacco etch virus protease , International Journal of Biological Macromolecules, 10.7567/1347-4065/ab656c, 155, 439-446, 2020.07, [URL].
72.	I. Tamošiūnė, D. Gelvonauskienė, L. Ragauskaitė, K. Koga, M. Shiratani, D. Baniulis, Cold plasma treatment of Arabidopsis thaliana (L.) seeds modulates plant-associated microbiome composition, Applied Physics Express, 10.35848/1882-0786/ab9712, 13, 076001, 2020.05, [URL].
73.	M.K. Son, H. Seo, M. Watanabe, M. Shiratani, T. Ishihara, Characteristics of crystalline sputtered LaFeO3 thin films as photoelectrochemical water splitting photocathodes, Nanoscale, 10.1039/d0nr01762k, 12, 17, 9653-9660, 2020.05, [URL].
74.	P. Attri, J. Razzokov, M. Yusupov, K. Koga, M. Shiratani, A. Bogaerts, Influence of osmolytes and ionic liquids on the Bacteriorhodopsin structure in the absence and presence of oxidative stress: A combined experimental and computational study, International Journal of Biological Macromolecules, 10.1016/j.ijbiomac.2020.01.179, 148, 657-665, 2020.04, [URL].
75.	N. Itagaki, Y. Nakamura, R. Narishige, K. Takeda, K. Kamataki, K. Koga, M. Hori, M. Shiratani, Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition, Sci. Rep., 10.1038/s41598-020-61596-w, 10, 4669, 2020.03, [URL].
76.	K. Koga, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene, Impact of radish sprouts seeds coat color on the electron paramagnetic resonance signals after plasma treatment, Jpn. J. Appl. Phys. , 10.35848/1347-4065/ab7698, 59, SH, SHHF01, 2020.03, [URL].
77.	T. Kawasaki, K. Nishida, G. Uchida, F. Mitsugi, K. Takenaka, K. Koga, Y. Setsuhara, M. Shiratani, Effects of surrounding gas on plasma-induced downward liquid flow, Jpn. J. Appl. Phys. , 10.35848/1347-4065/ab71dc, 59, SH, SHHF02, 2020.03, [URL].
78.	L. D. Fomins, G. Pauzaite, R. Zukiene, V. Mildaziene, K. Koga, M. Shiratani, Relationship between cold plasma treatment-induced changes in radish seed germination and phytohormone balance, Jpn. J. Appl. Phys. , 10.7567/1347-4065/ab656c, 59, SH1001, 2020.02, [URL].
79.	I. Suhariadi, N. Itagaki, M. Shiratani, Improved Nanoscale Al-doped ZnO with a ZnO Buffer Layer Fabricated by Nitrogen-mediated Crystallization for Flexible Optoelectronic Devices, ACS Appl. Nano Mater., 10.1021/acsanm.9b02571, 3, 2480-2490, 2020.02, [URL].
80.	Y. Kim, K. Koga, M. Shiratani, Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition, Curr. Appl. Phys., 10.1016/j.cap.2019.11.001, 20, 1, 191-195, 2020.01, [URL].
81.	Y. Kim, K. Koga, M. Shiratani, Effect of hydrogen dilution on the silicon cluster volume fraction of a hydrogenated amorphous silicon film prepared using plasma-enhanced chemical vapor deposition, Curr. Appl. Phys., 10.1016/j.cap.2019.11.001, 20, 1, 191-195, 2020.01, [URL].
82.	R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Appl. Phys. Express, 10.7567/1882-0786/ab5491, 12, 12, 126003, 2019.11, [URL].
83.	R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Appl. Phys. Express, 10.7567/1882-0786/ab5491, 12, 12, 126003, 2019.11, [URL].
84.	K. Tanaka, H. Hara, S. Nagaishi, L. Shi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD, Plasma Fusion Res., 10.1585/pfr.14.4406141, 14, 4406141, 2019.09, [URL].
85.	L. Shi, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films, Plasma Fusion Res., 10.1585/pfr.14.4406144, 14, 4406144, 2019.09, [URL].
86.	S. H. Hwang, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition, Plasma Fusion Res., 10.1585/pfr.14.4406115, 14, 4406115, 2019.09, [URL].
87.	R. Zhou, K. Kamataki, H. Ohtomo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma, Plasma Fusion Res., 10.1585/pfr.14.4406120, 14, 4406120, 2019.09, [URL].
88.	S. Nakano, M. Shiratani, Impact of heterointerface properties of crystalline germanium heterojunction solar cells, Thin Solid Films, 10.1016/j.tsf.2019.06.028, 685, 225-233, 2019.09, [URL].
89.	T. Kawasaki, F. Mitsugi, K. Koga, M. Shiratani, Local supply of reactive oxygen species into a tissue model by atmospheric-pressure plasma-jet exposure, J. Appl. Phys., 10.1063/1.5091740, 125, 21, 213303, 2019.06, [URL].
90.	N. Miyahara, S. Urakawa, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate, MRS Adv., 10.1557/adv.2019.17, 4, 27, 1551-1556, 1551-1556, 2019.01, [URL].
91.	S. Muraoka, L. Jiahao, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Effects of nitrogen impurity on zno crystal growth on Si substrates, MRS Adv., 10.1557/adv.2019.28, 4, 27, 1557-1563, 1557-1563, 2019.01, [URL].
92.	N. Miyahara, K. Iwasaki, D. Yamashita, D. Nakamura, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Photoluminescence of (ZnO)0.82 (InN)0.18 films: Incident light angle dependence, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2099, 941, 2099-2103, 2018.12, [URL].
93.	N. Itagaki, K. Takeuchi, N. Miyahara, K. Imoto, H. Seo, K. Koga, M. Shiratani, Effects of sputtering pressure on (ZnO)x(InN)1-x crystal film growth at 450ºC, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2093, 941, 2093-2098, 2018.12, [URL].
94.	R. Zhou, K. Mori, H. Ohtomo, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cross-correlation analysis of fluctuations of interactions between nanoparticles and low pressure reactive plasmas, Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.941.2104, 941, 2104-2108, 2018.12, [URL].
95.	P. Attri, F. Tochikubo, J. H. Park, E. H. Choi, K. Koga, M. Shiratani, Impact of Gamma rays and DBD plasma treatments on wastewater treatment, Scientific reports, 10.1038/s41598-018-21001-z, 8, 1, 2018.12, [URL], The rapid growth in world population brings with it the need for improvement in the current technology for water purification, in order to provide adequate potable water to everyone. Although an advanced oxidation process has been used to purify wastewater, its action mechanism is still not clear. Therefore, in the present study we treat dye-polluted water with gamma rays and dielectric barrier discharge (DBD) plasma. We study the wastewater treatment efficiency of gamma rays and DBD plasma at different absorbed doses, and at different time intervals, respectively. Methyl orange and methylene blue dyes are taken as model dyes. To understand the effects of environment and humidity on the decolorization of these dyes, we use various gas mixtures in the DBD plasma reactor. In the plasma reactor, we use the ambient air and ambient air + other gas (oxygen, nitrogen, and argon) mixtures, respectively, for the treatment of dyes. Additionally, we study the humidity effect on the decolorization of dyes with air plasma. Moreover, we also perform plasma simulation in different environment conditions, to understand which major radicals are generated during the plasma treatments, and determine their probable densities..
96.	Y. Kim, K. Koga, M. Shiratani, Particle behavior and its contribution to film growth in a remote silane plasma, Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 10.1116/1.5037539, 36, 5, 2018.09, [URL].
97.	T. Fang, K. Yamaki, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka,Y. Setsuhara, The effect of the H2/(H2+Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition, Thin Solid Films, 10.1016/j.tsf.2018.02.035, 660, 891-898, 2018.08, [URL].
98.	T. Kojima, S. Toko, K. Tanaka, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition, Plasma Fusion Res., 10.1585/pfr.13.1406082, 13, 1406082, 2018.06, [URL].
99.	S. Toko, R. Katayama, K. Koga, E. Leal-Quiros, M. Shiratani , Dependence of CO2 Conversion to CH4 on CO2 Flow Rate in Helicon Discharge Plasma, Sci. Adv. Mater., 10.1166/sam.2018.3141, 10, 5, 655-659, 2018.05, [URL].
100.	M. Gherardi, N. Puač, M. Shiratani, Special issue: Plasma and agriculture, Plasma Processes & Polymers, 10.1002/ppap.201877002, 15, 2, 1877002, 2018.02, [URL].
101.	N. Puač, M. Gherardi, M. Shiratani, Plasma agriculture: A rapidly emerging field, Plasma Processes & Polymers, 10.1002/ppap.201700174, 15, 2, 1700174, 2018.02, [URL].
102.	M. Ito, Jun-Seok Oh, T. Ohta, M. Shiratani, M. Hori, Current Status and Future Prospect of Agricultural Applications using Atmospheric-Pressure Plasma Technologies, Plasma Processes & Polymers, 10.1002/ppap.201700073, 15, 2, 1700073, 2018.02, [URL].
103.	H. Seo, D. Sakamoto, H. Chou, N. Itagaki, K. Koga, M. Shiratani , Progress in photovoltaic performance of organic/inorganic hybrid solar cell based on optimal resistive Si and solvent modified poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) junction, Progress in Photovoltaics: Research and Applications, 10.1002/pip.2961, 26, 2, 145-150, 2018.02, [URL].
104.	徐鉉雄, 板垣奈穂, 古閑一憲, 白谷正治, 色素増感太陽電池のポリマー対向電極における触媒反応の活性化, 信学技報 (IEICE Technical Report), 117, 334, 27-29, 2017.12.
105.	武田秀俊, 土肥俊郎, 金聖祐, 會田英雄, 白谷正治, プラズマ融合CMPによる大型ダイヤモンド基板の高効率加工とその加工メカニズム, 信学技報 (IEICE Technical Report), 117, 334, 1-6, 2017.12.
106.	T. Kawasaki, G. Kuroeda, R. Sei, M. Yamaguchi, R. Yoshinaga, R. Yamashita, H. Tasaki, K. Koga, M. Shiratani, Transportation of reactive oxygen species in a tissue phantom after plasma irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.57.01AG01, 57, 1S, 01AG01, 2017.11, [URL].
107.	S. Tanami, D. Ichida, S. Hashimoto, H. Seo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Low temperature rapid formation of Au-induced crystalline Ge films using sputtering deposition, Thin Solid Films , 10.1016/j.tsf.2017.02.067 , 641, 59-64, 2017.11, [URL].
108.	S. Toko, K. Keya, Y. Torigoe, T. Kojima, H. Seo, N. Itagaki, K. Koga, M. Shiratani , Hysteresis in volume fraction of clusters incorporated into a-Si:H films deposited by SiH4 plasma chemical vapor deposition, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.01.034, 326, Part B, 388-394, 2017.10, [URL].
109.	J. G. Han, L. Martinu, M. Shiratani, Preface - Surface Engineering at the International Vacuum Congress-20, Surf. Coat. Technol., 10.1016/j.surfcoat.2017.08.029, 326, Part B, 367, 2017.10.
110.	P. Attri, M. Kim, E. H. Choi, A. E. Cho, K. Koga, M. Shiratani, Impact of an ionic liquid on protein thermodynamics in the presence of cold atmospheric plasma and gamma rays, Phys. Chem. Chem. Phys., 10.1039/c7cp04083k, 19, 37, 25277-25288, 2017.10, [URL].
111.	H. Seo, C. V.V.M. Gopi, H.-J. Kim, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of quantum dot-sensitized solar cells based on polymer nano-composite catalyst, Electrochimica Acta, 10.1016/j.electacta.2017.08.030, 249, 337-342, 2017.09, [URL].
112.	P. Attri, M. Kim, T. Sarinont, E. H. Choi, H. Seo, A. E. Cho, K. Koga, M. Shiratani, The protective action of osmolytes on the deleterious effects of gamma rays and atmospheric pressure plasma on protein conformational changes, Scientific Reports, 10.1038/s41598-017-08643-1, 7, 8698, 2017.08, [URL].
113.	K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body , ECS Transactions, 10.1149/07703.0017ecst, 77, 3, 17-24, 2017.05, [URL].
114.	古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用, 信学技報 (IEICE Technical Report), 117, 8, 5-8, 2017.04.
115.	山崎直樹, 土肥俊郎, 曾田英雄, 金聖祐, 大山幸希, 黒河周平, 佐野泰久, 白谷正治, 山西陽子, GaN基板のプラズマ融合CMP技術 : エタノールバブリング・Arプラズマを用いたプラズマ融合CMP特性とその評価, 信学技報 (IEICE Technical Report), 117, 7, 19-23, 2017.04.
116.	H.-J. Kim, G.-C. Xu, C. V.V.M. Gopi, H. Seo, M. Venkata-Haritha, M. Shiratani, Enhanced light harvesting and charge recombination control with TiO2/PbCdS/CdS based quantum dot-sensitized solar cells, Journal of Electroanalytical Chemistry, 10.1016/j.jelechem.2017.02.005, 788, 131-136, 2017.03, [URL].
117.	K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Densities and surface reaction probabilities of oxygen and nitrogen atoms during sputter deposition of ZnInON on ZnO, IEEE Trans. Plasma Science, 10.1109/TPS.2016.2632124, 45, 2, 323-327, 2017.02, [URL].
118.	T. Sarinont, R. Katayama, Y. Wada, K. Koga, M. Shiratani, Plant Growth Enhancement of Seeds Immersed in Plasma Activated Water, MRS Adv., 10.1557/adv.2017.178, 2, 18, 995-1000, 2017.02, [URL].
119.	T. Sarinont, Y. Wada, K. Koga, M. Shiratani, Response of Silkworm Larvae to Atmospheric Pressure Non-thermal Plasma Irradiation, Plasma Medicine, 10.1615/PlasmaMed.2017019137 , 6, 3-4, 2017.01, [URL].
120.	L. P. Lingamdinne, Y. Chang, J.-K. Yang, J. Singh, E. H. Choi, M. Shiratani, J. R. Koduru, P. Attri, Biogenic reductive preparation of magnetic inverse spinel iron oxide nanoparticles for the adsorption removal of heavy metals, Chemical Engineering Journal, 10.1016/j.cej.2016.08.067, 307, 74-84, 2017.01, [URL].
121.	山崎直樹, 土肥俊郎, 曾田英雄, 金聖祐, 大山幸希, 白谷正治, 山西陽子, 難加工材料のプラズマ融合CMPプロセスの開発, 精密工学会学術講演会講演論文集, 2017S, 537-538, 2017.01.
122.	K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki , Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization, MRS Adv., 10.1557/adv.2016.617, 2, 5, 265-270, 2016.12, [URL].
123.	K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Blue Photoluminescence of (ZnO)0.92(InN)0.08, MRS Adv., 10.1557/adv.2016.625, 2, 5, 277-282, 2016.12, [URL].
124.	G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara, Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water, J. Appl. Phys., 10.1063/1.4968568, 120, 20, 203302-1 - 203302-9, 2016.11, [URL].
125.	M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga , Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication, Materials Science Forum, 10.4028/www.scientific.net/MSF.879.1772, 879, 1772-1777 , 2016.11, [URL].
126.	J. H. Park, M. Kim, M. Shiratani, Art. E. Cho, E. Choi & P. Attri, Variation in structure of proteins by adjusting reactive oxygen and nitrogen species generated from dielectric barrier discharge jet, Scientific Reports, 10.1038/srep35883, 6, 35883, 2016.10, [URL].
127.	P. Attri, M. Yusupov, J. H. Park, L. P. Lingamdinne, J. R. Koduru, M. Shiratani, E. Choi & A. Bogaerts, Mechanism and comparison of needle-type non-thermal direct and indirect atmospheric pressure plasma jets on the degradation of dyes, Scientific Reports, 10.1038/srep34419, 6, 34419, 2016.10, [URL].
128.	S. Toko, Y. Kanemitsu, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Optical Bandgap Energy of Si Nanoparticle Composite Films Deposited by a Multi-Hollow Discharge Plasma Chemical Vapor Deposition Method, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.13233, 16, 10, 10753-10757, 2016.10, [URL].
129.	T. Sarinont, T. Amano, P. Attri, K. Koga, N. Hayashi, M. Shiratani, Effects of plasma irradiation using various feeding gases on growth of Raphanus sativus L. , Arch. Biochem. Biophys., 10.1016/j.abb.2016.03.024 , 605, 129-140, 2016.09, [URL].
130.	H. Seo, M. K. Son, S. Hashimoto, T. Takasaki, N. Itagaki, K. Koga, M. Shiratani, Surface Modification of Polymer Counter Electrode for Low Cost Dye-sensitized Solar Cells, Electrochimica Acta, 10.1016/j.electacta.2016.06.020, 210, 880-887, 2016.08, [URL].
131.	H. Seo, S. H. Nam, N. Itagaki, K. Koga, M. Shiratani, and J.-H. Boo, Effect of Sulfur Doped TiO2 on Photovoltaic Properties of Dye-Sensitized Solar Cells, Electron. Mater. Lett., 10.1007/s13391-016-4018-8, 12, 4, 530-536, 2016.07, [URL].
132.	K. Keya, T. Kojima, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Correlation between SiH2/SiH and light-induced degradation of p–i–n hydrogenated amorphous silicon solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.07LE03, 55, 7S2, 07LE03, 2016.07, [URL].
133.	B. B. Sahu, Y. Yin, J. G. Han, M. Shiratani , Low temperature synthesis of silicon quantum dots with plasma chemistry control in dual frequency non-thermal plasmas, Phys. Chem. Chem. Phys., 10.1039/c6cp01856d, 18, 23, 2016.06, [URL].
134.	C. V. V. M. Gopi, M. V. Haritha, H. Seo, S. Singh, S.-K. Kim, M. Shiratani, H. Kim, Improving the performance of quantum dot sensitized solar cells through CdNiS quantum dots with reduced recombination and enhanced electron life time, Dalton Trans., 10.1039/C6DT00283H , 45, 20, 8447-8457, 2016.05, [URL].
135.	H. Seo, D. Ichida, S. Hashimoto, N. Itagaki, K. Koga, M. Shiratani, S. H. Nam and J. H. Boo , Improvement of Charge Transportation in Si Quantum Dot-Sensitized Solar Cells Using Vanadium Doped TiO2, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12210, 16, 5, 4875-4879, 2016.05, [URL].
136.	T. Kawasaki, S. Kusumegi, A. Kudo, T. Sakanoshita, T. Tsurumaru, A. Sato, G. Uchida, K. Koga and M. Shiratani, Effects of irradiation distance on supply of reactive oxygen species to the bottom of a Petri dish filled with liquid by an atmospheric O2/He plasma jet, J. Appl. Phys., 10.1063/1.4948430, 119, 173301, 2016.05, [URL].
137.	D. Punnoose, CH. S. S. P. Kumar, A. E. Reddy, S. S. Rao, C. V. Tulasivarma, S.-K. Kim, H. Seo, M. Shiratani, S.-H. Chung, H. Kim , Reduced recombination with an optimized barrier layer on TiO2 in PbS/CdS core shell quantum dot sensitized solar cells, New J. Chem., 10.1039/C5NJ02947C, 4, 40, 3423-3431, 2016.04, [URL].
138.	H. Seo, M. Shiratani, K. Seneekatima, R. Pornprasertsuk , Catalytic Improvement on Counter Electrode of Dye-Sensitized Solar Cells Using Electrospun Pt Nano-Fibers, J. Nanosci. Nanotechnol., 10.1166/jnn.2016.12294, 16, 4, 3332-3337, 2016.04, [URL].
139.	白谷正治, プラズマ加工の現状と将来動向 (特集プラズマ(加工)とその応用技術の現状と将来動向), 光技術コンタクト = Optical and electro-optical engineering contact, 54, 4, 3-8, 2016.04.
140.	M. Shiratani, T. Sarinont, K. Koga and N. Hayashi, R&D status of agricultural applications of high voltage and plasma in Japan, Proc. Workshop on Application of Advanced Plasma Technologies in CE Agriculture, 29-30, 2016.04.
141.	H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani , Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition, Sci. Adv. Mater., 10.1166/sam.2016.2520, 8, 3, 636-639, 2016.03, [URL].
142.	H. Seo, M.-K. Son, N. Itagaki, K. Koga, M. Shiratani, Polymer Counter Electrode of Poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) Containing TiO2 Nano-particles for Dye-sensitized Solar Cells, Journal of Power Sources, 10.1016/j.jpowsour.2015.12.112, 307, 25-30, 2016.03, [URL].
143.	K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering, MRS Advances, 10.1557/adv.2015.59, 1, 2, 115-119, 2016.01, [URL].
144.	S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Effects of Gas Flow Rate on Deposition Rate and Amount of Si Clusters Incorporated into a-Si:H Films, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA19, 55, 1S, 01AA19, 2016.01, [URL].
145.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method, Jpn. J. Appl. Phys. , 10.7567/JJAP.55.01AA11, 55, 1S, 01AA11, 2016.01, [URL].
146.	T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Production of In, Au, and Pt nanoparticles by discharge plasmas in water for assessment of their bio-compatibility and toxicity, MRS Adv., 10.1557/adv.2016.41, 1, 18, 1301-1306, 2016.01, [URL].
147.	M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga, Plant Growth Response to Atmospheric Air Plasma Treatments of Seeds of 5 Plant Species, MRS Adv., 10.1557/adv.2016.37, 1, 18, 1265-1269, 2016.01, [URL].
148.	K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, N. Hayashi, M. Shiratani, Simple method of improving harvest by nonthermal air plasma irradiation of seeds of Arabidopsis thaliana (L.), Appl. Phys. Express, 10.7567/APEX.9.016201, 9, 1, 016201, 2015.12, [URL].
149.	白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価, 九州大学超顕微解析研究センター報告, 39, 116-117, 2015.12.
150.	P. Attri, T. Sarinont, M. Kim, T. Amano, K. Koga, A. E. Cho, E. Choi, M. Shiratani, Influence of ionic liquid and ionic salt on protein against the reactive species generated using dielectric barrier discharge plasma , Scientific Reports, 10.1038/srep17781, 5, 17781 , 2015.12, [URL].
151.	G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the discharge characteristics of a plasma jet impinging onto the liquid surface, IEEE Trans. Plasma Science, 10.1109/TPS.2015.2488619, 43, 12, 4081-4087, 2015.12, [URL].
152.	T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Synthesis of Indium-Containing Nanoparticles in Aqueous Suspension Using Plasmas in Water for Evaluating Their Kinetics in Living Body, J. Nanosci. Nanotechnol., 10.1166/jnn.2015.11427, 15, 11, 9298-9302, 2015.11, [URL].
153.	T. Amano, K. Koga, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, S. Kitazaki, M. Hirata, Y. Nakatsu, A. Tanaka, Synthesis of indium-containing nanoparticles using plasmas in water to study their effects on living body, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.158, 2015.10, [URL].
154.	S. Tanami, D. Ichida, D. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of Au-induced crystalline Ge film formation using sputtering deposition, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.149, 2015.10, [URL].
155.	H. Seo, S. Hashimoto, D. Ichida, N. Itagaki, K. Koga and M. Shiratani , Structural alternation of tandem dye-sensitized solar cells based on mesh-type of counter electrode, Electrochimica Acta, 10.1016/j.electacta.2015.04.105, 179, 206-210, 2015.10, [URL].
156.	K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.143, 2015.10, [URL].
157.	K. Keya, Y. Torigoe, S. Toko, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.132, 2015.10, [URL].
158.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.145, 2015.10, [URL].
159.	T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.150, 2015.10, [URL].
160.	K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.154, 2015.10, [URL].
161.	T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.155, 2015.10, [URL].
162.	D. Yamashita, M. Soejima, T. Ito, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Laser trapped single fine particle as a probe of plasma parameters, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.104, 2015.10, [URL].
163.	S. Hashimoto, S. Tanami, H. Seo, G. Uchida, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of N2 dilution on fabrication of Ge nanoparticles by rf sputtering, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.133, 2015.10, [URL].
164.	Y. Torigoe, K. Keya, S. Toko, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of electrode structure on characteristics of multi-hollow discharges, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.129, 2015.10, [URL].
165.	T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani, Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.136, 2015.10, [URL].
166.	R. Katayama, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, M. Tokitani, S. Masuzaki, K. Nishimura, A. Sagara, LHD Experimental Group, Deposition rate and etching rate due to neutral radicals and dust particles measured using QCMs together with a dust eliminating filter, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.101, 2015.10, [URL].
167.	T. Ito, M. Soejima, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, T. Kobayashi, S. Inagaki, Cross correlation analysis of plasma perturbation in amplitude modulated reactive dusty plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.49, 2015.10, [URL].
168.	S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Cluster Incorporation into A-Si:H Films Deposited Using H 2 +SiH 4 Discharge Plasmas, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.152, 2015.10, [URL].
169.	M. Soejima, T. Ito, D. Yamashita, N. Itagaki, H. Seo, K. Koga, M. Shiratani, Attraction during binary collision of fine particles in Ar plasma, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.18, 2015.10, [URL].
170.	G. Uchida, A. Nakajima, T. Kawasaki, K. Koga, K. Takenaka, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, TF1.2, 2015.10, [URL].
171.	Y. Setsuhara, G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Discharge characteristics and hydrodynamics behaviors of atmospheric plasma jets produced in various gas flow patterns, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.58, 2015.10, [URL].
172.	M. Tateishi, K. Koga, R. Katayama, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experiment Group, Real-time mass measurement of dust particles deposited on vessel wall in a divertor simulator using quartz crystal microbalances, J. Nucl. Mater. , 10.1016/j.jnucmat.2014.10.049, 463, 865–868, 2015.08, [URL].
173.	K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of ZnInON/ZnO multi-quantum well solar cells, Thin Solid Films, 10.1016/j.tsf.2015.01.012, 587, 106-111, 2015.07, [URL].
174.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of discharge voltage on the characteristics of a-C:H films prepared by H-assisted Plasma CVD method, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.40.123, 40, 2, 123-128, 2015.07, [URL].
175.	S. Toko, Y. Torigoe, W. Chen, D. Yamashita, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability, Thin Solid Films, 10.1016/j.tsf.2015.02.052 , 587, 126-131, 2015.07, [URL].
176.	A. Nakajima, G. Uchida, T. Kawasaki, K. Koga, T. Sarinont, T. Amano, K. Takenaka, M. Shiratani, Y. Setsuhara, Effects of gas flow on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation, J. Appl. Phys., 10.1063/1.4927217, 118, 4, 043301, 2015.07, [URL].
177.	N. Hayashi, R. Ono, M. Shiratani, A. Yonesu, Antioxidative activity and growth regulation of Brassicaceae induced by oxygen radical irradiation, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.06GD01, 54, 6S2, 06GD01, 2015.06, [URL].
178.	K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.248, 1741, aa09-10, 2015.03, [URL].
179.	N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, ZnO-based semiconductors with tunable band gap for solar sell applications, Proc. SPIE photonics west 2015, 10.1117/12.2078114, 9364, 93640P, 2015.03, [URL].
180.	T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.87, 1741, aa09-12, 2015.02, [URL].
181.	A. Tanaka, M. Hirata, N. Matsumura, K. Koga, M. Shiratani, Y. Kiyohara, Comparative Study on the Pulmonary Toxicity of Indium Hydroxide, Indium-Tin Oxide, and Indium Oxide Following Intratracheal Instillations into the Lungs of Rats, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.21, 1723, g02-03, 2015.02, [URL].
182.	T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Air Plasma Irradiation to Seeds of Radish Sprouts on Chlorophyll and Carotenoids Concentrations in their Leaves, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.39, 1723, g02-04, 2015.02, [URL].
183.	T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Multigeneration Effects of Plasma Irradiation to Seeds of Arabidopsis Thaliana and Zinnia on Their Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.12, 1723, g03-04, 2015.01, [URL].
184.	H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Photovoltaic application of Si nanoparticles fabricated by multihollow plasma discharge CVD: Dye and Si co-sensitized solar cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.54.01AD02, 54, 1S, 01AD02, 2015.01, [URL].
185.	内田儀一郎, 市田大樹, 徐鉉雄, 古閑一憲, 白谷正治, 反応性微粒子プラズマプロセスを用いたゲルマニウム結晶ナノ粒子含有膜の堆積と量子ドット太陽電池への応用, スマートプロセス学会誌, 4, 1, 6-11, 2015.01.
186.	N. Itagaki, K. Matsushima, D. Yamashia, H. Seo, K. Koga, M. Shiratani, Synthesis and characterization of ZnInON semiconductor: a ZnO-based compound with tunable band gap, Mater. Res. Express, 10.1088/2053-1591/1/3/036405, 1, 3, 036405, 2014.09, [URL].
187.	H. Seo, D. Ichida, S. Hashimoto, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani, Performance enhancement of dye and Si quantum dot hybrid nanostructured solar cell with TiO2 barrier, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.39.321, 39, 3, 321-324, 2014.09, [URL].
188.	I. Suhariadi, M. Shiratani, N. Itagaki, Growth mechanism of ZnO deposited by nitrogen mediated crystallization, Mater. Res. Express, 10.1088/2053-1591/1/3/036403, 1, 3, 036403, 2014.09, [URL].
189.	N. Itagaki, K. Kuwahara, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates by utilizing nitrogen-mediated crystallization method, Opt. Engineering, 10.1117/1.OE.53.8.087109, 53, 8, 087109, 2014.08, [URL].
190.	S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Dust Hour Glass in a Capacitive RF Discharge , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2343975 , 42, 10, 2672-2673, 2014.08, [URL].
191.	M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara, SiC Nanoparticle Composite Anode for Li-Ion Batteries, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2014.742, 1678, n08-58, 2014.07, [URL].
192.	S. Kitazaki, T. Sarinont, K. Koga, N. Hayashi, M. Shiratani, Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas, Curr. Appl. Phys., 10.1016/j.cap.2013.11.056, 14, 2, S149–S153, 2014.07, [URL].
193.	T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani, Plasma etching of single fine particle trapped in Ar plasma by optical tweezers, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012014, 518, 1, 012014, 2014.06, [URL].
194.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori, Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012010, 518, 1, 012010, 2014.06, [URL].
195.	Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012007, 518, 1, 012007, 2014.06, [URL].
196.	D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012002, 518, 1, 012002, 2014.06, [URL].
197.	S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012008, 518, 1, 012008, 2014.06, [URL].
198.	M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group, Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012009, 518, 1, 012009, 2014.06, [URL].
199.	T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, T. Shimizu, G. Uchida, K. Koga, M. Shiratani, Visualization of the Distribution of Oxidizing Substances in an Atmospheric Pressure Plasma Jet , IEEE Trans. Plasma Science, 10.1109/TPS.2014.2325038, 42, 10, 2482-2483, 2014.06, [URL].
200.	P. Chewchinda, K. Hayashi, D. Ichida, H. Seo, G. Uchida, M. Shiratani, O. Odawara and H. Wada, Preparation of Si nanoparticles by laser ablation in liquid and their application as photovoltaic material in quantum dot sensitized solar cell, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012023, 518, 1, 012023, 2014.06, [URL].
201.	T. Sarinont, T. Amano, S. Kitazaki, K. Koga, G. Uchida, M. Shiratani and N. Hayashi, Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012017, 518, 1, 012017, 2014.06, [URL].
202.	K. Koga, X. Dong, S. Iwashita, U. Czarnetzki and M. Shiratani, Formation of carbon nanoparticle using Ar+CH4 high pressure nanosecond discharges, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012020, 518, 1, 012020, 2014.06, [URL].
203.	I. Yoshida, T. Matsui, H. Sai, T. Suezaki, H. Katayama, M. Matsumoto, S. Sugiyama, T. Masuda, M. Ushijima, S. Nonomura, M. Shiratani, M. Konagai, K. Saito, M. Kondo, M. Tanaka, S. Niki, Development and Progress in Thin Film Si Photovoltaic Technologies by Photovoltaic Power Generation Technology Research Association, Proc. 40th IEEE PVSC, 10.1109/PVSC.2014.6925520 , 2832 - 2835 , 2014.06, [URL].
204.	T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Control of the area irradiated by the sheet-type plasma jet in atmospheric pressure, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012016, 518, 1, 012016, 2014.06, [URL].
205.	板垣奈穂、古閑一憲、白谷正治, スパッタリング成膜法による高品質酸化亜鉛薄膜の形成, 応用物理, 83, 5, 385-389, 2014.05.
206.	H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance dependence of Si quantum dot-sensitized solar cells on counter electrode, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FZ01, 53, 5S1, 05FZ01, 2014.05, [URL].
207.	M. Shiratani, G. Uchida, H. Seo, D. Ichida, K. Koga, N. Itagaki, and K. Kamataki, Nanostructure Control of Si and Ge Quantum Dots Based Solar Cells Using Plasma Processes, Materials Science Forum, 10.4028/www.scientific.net/MSF.783-786.2022, 783-786, 2022-2027, 2014.05, [URL].
208.	N. Hayashi, Y, Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of the surfaces of agricultural products using active oxygen species generated by atmospheric plasma and UV light, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.05FR03 , 53, 5S1, 05FR03 , 2014.05, [URL].
209.	I. Suhariadi, K. Oshikawa, D. Yamashita, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, and N. Itagaki, Study on the Crystal Growth Mechanism of ZnO Films Fabricated Via Nitrogen Mediated Crystallization, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015064, 1, 015064, 2014.03, [URL].
210.	M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Spatial Profile of Flux of Dust Particles Generated due to Interaction between Hydrogen Plasmas and Graphite Target, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015020, 1, 015020, 2014.03, [URL].
211.	N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization, Proc. SPIE photonics west 2014, 10.1117/12.2041081 , 8987, 89871A, 2014.03, [URL].
212.	H. Seo, M. Son, S. Park, M. Jeong, H. Kim, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell, Thin Solid Films, 10.1016/j.tsf.2013.08.103, 554, 122-126, 2014.03, [URL].
213.	G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of H2 Gas Addition on Structure of Ge Nanoparticle Films Deposited by High-pressure RF Magnetron Sputtering Method, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015082, 1, 015082, 2014.03, [URL].
214.	S. Toko, Y. Kim, Y. Hashimoto, Y. Kanemitu, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, and M. Shiratani, Effects of Grid DC Bias on Incorporation of Si Clusters into Amorphous Silicon Thin Films in Multi-Hollow Discharge Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015069, 1, 015069, 2014.03, [URL].
215.	X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, N. Itagaki, Y. Setsuhara, K. Takenaka, M. Sekine, .M. Hori, Deposition of Carbon Films on PMMA Using H-assisted Plasma CVD, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015072, 1, 015072, 2014.03, [URL].
216.	M. Shiratani, Y. Morita, K. Kamataki, H. Seo, G. Uchida, N. Itagaki, K. Koga, Correlation between nanoparticle growth and plasma parameters in low pressure reactive VHF discharge plasmas, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015083, 1, 015083, 2014.03, [URL].
217.	G. Uchida, Y. Kanemitsu, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial Plasma CVD of Si Nanoparticle Composite Films for Band Gap Control, Jpn. Phys. Soc. Conf. Proc (APPC12), 10.7566/JPSCP.1.015080, 1, 015080, 2014.03, [URL].
218.	H. Seo, M. Son, H. Kim, M. Shiratani, The enhancement of dye adsorption in dye-sensitized solar module by an electrical adsorption method, Thin Solid Films, 10.1016/j.tsf.2013.05.153, 554, 118-121, 2014.03, [URL].
219.	T. Sarinont, K. Koga, S. Kitazaki, G. Uchida, N. Hayashi, M. Shiratani, Effects of Atmospheric Air Plasma Irradiation on pH of Water, JPS Conf. Proc., 10.7566/JPSCP.1.015078, 1, 015078, 2014.03, [URL].
220.	Y. Hashimoto, S. Toko, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Substrate temperature dependence of hydrogen content of a-Si:H film deposited with a cluster-eliminating filter, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P37, 2014.02.
221.	A. Tanaka, M. Hirata, K. Koga, N. Itagaki, M. Shiratani, N. Hayashi, G. Uchida, Subacute toxicity of gallium arsenide, indium arsenide and arsenic trioxide following intermittent intrantracheal instillations to the lung of rats, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S2-P35, 2014.02.
222.	I. Suhariadi, K. Oshikawa, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Study on nitrogen desorption behavior of sputtered ZnO for transparent conducting oxide, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P05, 2014.02.
223.	R. Shimizu, K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputtering fabrication of a novel widegap semiconductor ZnGaON for optoelectronic devices with wide bandgap for optical device, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P03, 2014.02.
224.	T. Nakanishi, K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Sputter Deposition of Ga-doped Zinc Oxide (GZO) Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P19, 2014.02.
225.	M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Spatial profile of flux of dust particles in hydrogen helicon plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P21, 2014.02.
226.	D. Yamashita, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Raman spectroscopy of a fine particle optically trapped in plasma, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P23, 2014.02.
227.	H. Seo, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Quantum characterization and photovoltaic application of Si nano-particles fabricated by multi-hollow plasma discharge chemical vapor deposition, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S11-P36, 2014.02.
228.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori, Pressure dependence of carbon film deposition using H-assisted plasma CVD, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P14, 2014.02.
229.	T. Ito, Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Nanoparticle amount in reactive plasmas with amplitude modulation detected by twodimensional laser light scattering method, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-SPD-P01, 2014.02.
230.	K. Oshikawa, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Magnetron sputtering of low-resistive In2O3:Sn films with buffer layers fabricated via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P07, 2014.02.
231.	S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fine response of deposition rate of Si films deposited by multi-hollow discharge plasma CVD with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S05-P17, 2014.02.
232.	D. Ichida, S. Hashimoto, G. Uchida, H. Seo, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Fabrication of size-controlled Ge nanoparticle films varying gas flow rate using high pressure rf magnetron sputtering method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P33, 2014.02.
233.	G. Uchida, K. Kamataki, D. Ichida, Y. Morita, H. Seo, N. Itagaki, K. Koga, T. Ishihara, M. Shiratani, Fabrication of SiC nanoparticles as high capacity electrodes for Li-ion batteries, Proc. 8th Int. Conf. Reactive Plasmas, 4C-PM-O1, 2014.02.
234.	K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Fabrication of In-rich ZnInON filmswith narrow band gap by RF magnetron sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P02, 2014.02.
235.	T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Epitaxial growth of ZnO films on sapphire substrates by magnetron sputtering: Effects of buffer layers prepared via nitrogen mediated crystallization, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S08-P10, 2014.02.
236.	Y. Torigoe, Y. Hashimoto, S. Toko, Y. Kim, D. Yamashita, H. Seo, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, Effects of amplitude modulation on deposition of hydrogenated amorphous silicon films using multi-Hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P36, 2014.02.
237.	S. Hashimoto, D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of Crystalline Ge Nanoparticle Films Varying H2 Dilution Ratio Using High Pressure rf Magnetron Sputtering, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P32, 2014.02.
238.	K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-14, 2014.02.
239.	Y. Kanemitsu, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Combinatorial evaluation of optical properties of crystalline Si nanoparticle embedded Si films deposited by a multi-hollow discharge plasma CVD method, Proc. 8th Int. Conf. Reactive Plasmas, 6P-AM-S08-P35, 2014.02.
240.	H. Seo, D. Ichida, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells, Int. J. Precision Eng. Manuf., 10.1007/s12541-014-0343-8, 15, 2, 339-343, 2014.02, [URL].
241.	Y. Morita, T. Ito, S. Iwashita, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis of fluctuation of Ar metastable density and nanoparticle amount in capacitively coupled discharges with amplitude modulation, Proc. 8th Int. Conf. Reactive Plasmas, 5P-AM-S02-P10, 2014.02.
242.	M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, Y. Morita, H. Seo, N. Itagaki, G. Uchida, A model for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Proc. 8th Int. Conf. Reactive Plasmas, 4B-PM-O1, 2014.02.
243.	T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Visualization of oxidizing substances generated by atmospheric pressure non-thermal plasma jet with water, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S09-P25, 2014.02.
244.	N. Hayashi, Y. Yagyu, A. Yonesu, M. Shiratani, Sterilization characteristics of agricultural products using active oxygen species generated by plasma and UV light (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A2, 2014.02.
245.	K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A4, 2014.02.
246.	T. Amano, T. Sarinont, S. Kitazaki, N. Hayashi, K. Koga, M. Shiratani, Long term growth of radish sprouts after atmospheric pressure DBD plasma irradiation to seeds, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P33, 2014.02.
247.	S. Komatsu and M. Shiratani, Formation of microcones accompanied with ripple patterns in laser-activated plasma CVD of sp(3)-bonded BN films, J. Mater. Res., 10.1557/jmr.2014.7, 29, 4, 485-491, 2014.02, [URL].
248.	M. Shiratani, Fluctuation and Nanotechology, Proc. 8th Int. Conf. Reactive Plasmas, 3B-WS-15, 2014.02.
249.	T. Sarinont, K. Koga, S. Kitazaki, M. Shiratani, N. Hayashi, Effects of growth enhancement by plasma irradiation to seeds in water, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P32, 2014.02.
250.	M. Shiratani, K. Koga, K. Kamataki, S. Iwashita, G. Uchida, H. Seo, and N. Itagaki, Theory for correlation between plasma fluctuation and fluctuation of nanoparticle growth in reactive plasmas, Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010201, 53, 1, 010201, 2014.01, [URL].
251.	S. Komatsu, M. Shiratani, Self-organized formation of hierarchically-ordered structures in laser-activated plasma CVD of sp(3)-bonded BN films , Jpn. J. Appl. Phys. , 10.7567/JJAP.53.010202, 53, 1, 010202 , 2014.01, [URL].
252.	H. Seo, Y. Wang, M. Sato, G. Uchida, K. Koga, N. Itagaki, K. Kamataki, M. Shiratani, The improvement on the performance of quantum dot-sensitized solar cells with functionalized Si, Thin Solid Films, 10.1016/j.tsf.2013.04.073, 546, 284-288, 2013.11, [URL].
253.	H. Seo, Y. Wang, D. Ichida, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, S. Nam, J. Boo, Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO2, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM02, 52, 11S, 11NM02, 2013.11, [URL].
254.	K. Koga, M. Tateishi, K. Nishiyama, G. Uchida, K. Kamataki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, Akiko Sagara, the LHD Experimental Group, Flux Control of Carbon Nanoparticles Generated due to Interactions between Hydrogen Plasmas and Graphite Using DC-Biased Substrates, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA08, 52, 11S, 11NA08, 2013.11, [URL].
255.	K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, G. Uchida, H. Seo, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Epitaxial Growth of ZnInON Films with Tunable Band Gap from 1.7 eV to 3.3 eV on ZnO Templates, Jpn. J. Appl. Phys., 10.7567/JJAP.52.11NM06, 52, 11S, 11NM06, 2013.11, [URL].
256.	I. Suhariadi, K. Oshikawa, K. Kuwahara, K. Matsushima, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, N. Itagaki, Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NB03, 52, 11S, 11NB03, 2013.11, [URL].
257.	Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani, Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si and SiH, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA07, 52, 11S, 11NA07, 2013.11, [URL].
258.	G. Uchida, Y. Wang, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.11NA05, 52, 11S, 11NA05, 2013.11, [URL].
259.	H. Seo, M. Son, H. Kim, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Study on the Fabrication of Paint-Type Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys., 10.7567/JJAP.52.10MB07, 52, 10S, 10MB07, 2013.10, [URL].
260.	G. Uchida, M. Sato, H. Seo, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells, Thin Solid Films, 10.1016/j.tsf.2013.04.111, 544, 93-98, 2013.10, [URL].
261.	白谷正治, 古閑一憲, 内田儀一郎, Hyunwoong Seo, 板垣奈穂, 岩下伸也, ナノ材料のプラズマプロセシングの研究の現状と将来 , 表面科学, 34, 10, 520, 2013.10, [URL].
262.	O. Kaneko, H. Yamada, S. Inagaki, M. Jakubowski, S. Kajita, S. Kitajima, Kobayashi, K. Koga, T. Morisaki, S. Morita, T. Mutoh, S. Sakakibara, Y. Suzuki, H. Takahashi, K. Tanaka, K. Toi, Y. Yoshimura, T. Akiyama, Y. Asahi, N. Ashikawa, H. Chikaraishi, A. Cooper, D.S. Darrow, E. Drapiko, P. Drewelow, X. Du, A. Ejiri, M. Emoto, T. Evans N. Ezumi, K. Fujii, T. Fukuda, H. Funaba, M. Furukawa, D.A. Gates, M. Goto, T. Goto, W. Guttenfelder, S. Hamaguchi, M. Hasuo, T. Hino, Y. Hirooka, K. Ichiguchi, K. Ida, H. Idei, T. Ido, H. Igami, K. Ikeda, S. Imagawa, T. Imai, M. Isobe, M. Itagaki, T. Ito, K. Itoh, S. Itoh, A. Iwamoto, K. Kamiya, T. Kariya, H. Kasahara, N. Kasuya, D. Kato, T. Kato, K. Kawahata, F. Koike, S. Kubo, R. Kumazawa, D. Kuwahara, S. Lazerson, H. Lee, S. Masuzaki, S. Matsuoka, H. Matsuura, A. Matsuyama, C. Michael, D. Mikkelsen, O. Mitarai, T. Mito, J. Miyazawa, G. Motojima, K. Mukai, A. Murakami, I. Murakami, S. Murakami, T. Muroga, S. Muto, K. Nagaoka, K. Nagasaki, Y. Nagayama, N. Nakajima, H. Nakamura, Y. Nakamura, H. Nakanishi, H. Nakano, T. Nakano, K. Narihara, Y. Narushima, K. Nishimura, S. Nishimura, M. Nishiura, Y.M. Nunami, T. Obana, K. Ogawa, S. Ohdachi, N. Ohno, N. Ohyabu, T. Oishi, M. Okamoto, A. Okamoto, M. Osakabe, Y. Oya1, T. Ozaki, N. Pablant, B.J. Peterson, A. Sagara, K. Saito, R. Sakamoto, H. Sakaue, M. Sasao2, K. Sato, M. Sato, K. Sawada, R. Seki, T. Seki, V. Sergeev, S. Sharapov, I. Sharov, A. Shimizu, T. Shimozuma, M. Shiratani, M. Shoji, S. Sudo, H. Sugama, C. Suzuki, K. Takahata, Y. Takeiri, Y. Takemura, M. Takeuchi9, H. Tamura, N. Tamura, H. Tanaka, T. Tanaka, M. Tingfeng, Y. Todo, M. Tokitani, K. Tokunaga, T. Tokuzawa, H. Tsuchiya, K. Tsumori, Y. Ueda, L. Vyacheslavov, K.Y. Watanabe, T. Watanabe, T.H. Watanabe, B. Wieland, I. Yamada, S. Yamada, S. Yamamoto, N. Yanagi, R. Yasuhara, M. Yokoyama, N. Yoshida, S. Yoshimura, T. Yoshinaga, M. Yoshinuma and A. Komori, Extension of operation regimes and investigation of three-dimensional currentless plasmas in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/53/10/104015, 53, 10, 104015, 2013.10, [URL].
263.	白谷正治, 研究生産性の向上 , 表面科学, 34, 10, 519, 2013.10, [URL].
264.	Y. Kim, T. Matsunaga, K. Nakahara, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.04.029, 228, 1, S550–S553, 2013.08, [URL].
265.	T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Mass density control of carbon films deposited by H-assisted plasma CVD method, Surf. Coat. Technol., 10.1016/j.surfcoat.2012.10.002, 228, 1, S15–S18, 2013.08, [URL].
266.	K. Koga, K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Effects of DC Substrate Bias Voltage on Dust Flux in the Large Helical Device, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.154, 438, S727–S730, 2013.07, [URL].
267.	K. Nishiyama, Y. Morita, G. Uchida, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, and H. Kersten, Discharge power dependence of carbon dust flux in a divertor simulator, J. Nucl. Mater. , 10.1016/j.jnucmat.2013.01.169, 438, S788–S791, 2013.07, [URL].
268.	Y. Morita, S. Iwashita, D. Yamashita, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, and M. Shiratani, Observation of nanoparticle growth process using a high speed camera, ISPC 21 Proceedings, 2013.07, [URL].
269.	H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Growth control of ZnO nano-rod with various seeds and photovoltaic application, J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012029, 441, 1, 012029, 2013.06, [URL].
270.	S. Iwashita, E. Schungel, J. Schulze, P. Hartmann, Z. Donko, G. Uchida, K. Koga, M. Shiratani, U. Czarnetzki, Transport control of dust particles via the Electrical Asymmetry Effect: experiment, simulation, and modeling, J. Phys. D: Appl. Phys., 46, 245202, 2013.06, [URL].
271.	K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori, Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine , J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012001, 441, 1, 012001, 2013.06, [URL].
272.	S. Bornholdt, N. Itagaki, K. Kuwahara, H. Wulff, M. Shiratani and H. Kersten, Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films , Plasma Sources Sci. Technol., 10.1088/0963-0252/22/2/025019, 22 , 2, 025019, 2013.04, [URL].
273.	H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells, Electrochimica Acta, 10.1016/j.electacta.2013.02.026, 95, 1, 43-47, 2013.04, [URL].
274.	N. Itagaki, K. Oshikawa, K. Matsushima, I. Suhariadi, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 84-87, 2013.03, [URL].
275.	M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 100-103, 2013.03, [URL].
276.	K. Koga, T. Urakawa, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Control of Deposition Profile and Properties of Plasma CVD Carbon Films, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 136-139, 2013.03, [URL].
277.	Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, Plasma interactions with aminoacid (L-alanine) as a basis of fundamental processes in plasma medicine, Current Applied Physics, 10.1016/j.cap.2013.01.030, 13, 1, S59–S63, 2013.03, [URL].
278.	H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cell, Electrochimica Acta, 10.1016/j.electacta.2012.09.087, 87, 1, 213-217, 2013.01, [URL].
279.	H. Seo, Y. Wang, M. Sato, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD05, 52, 1S, 01AD05, 2013.01, [URL].
280.	Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, M. Shiratani, High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AD01, 52, 1S, 01AD01, 2013.01, [URL].
281.	I. Suhariadi, K. Matsushima, K. Kuwahara, K. Oshikawa, D. Yamashita, H. Seo, G. Uchida, K. Kamtaki, K. Koga, M. Shiratani, S. Bornholdt, H. Kersten, Harm Wulff, N. Itagaki, Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen Mediated Crystallization, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AC08, 52, 1S, 01AC08, 2013.01, [URL].
282.	S. Iwashita, K. Nishiyama, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Dust particle formation due to interaction between graphite and helicon deuterium plasmas, Fusion Engineering and Design, 10.1016/j.fusengdes.2012.10.002, 88, 1, 28-32, 2013.01, [URL].
283.	T. Urakawa, R. Torigoe, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, K. Takeda, M. Sekine, M. Hori, H-2/N-2 plasma etching rate of carbon films deposited by H-assisted plasma CVD, Jpn. J. Appl. Phys. , 10.7567/JJAP.52.01AB01, 52, 1, 01AB01(4pages), 2013.01, [URL].
284.	N. Itagaki, K. Matsushima, T. Hirose, K. Kuwahara, D. Yamashita, H. Seo, K. Kamataki, G. Uchida, K. Koga, M. Shiratani, Sputter deposition of Epitaxial Zinc-Indium Oxynitride Films for Excitonic Transistors (Invited), Proc. International Symposium on Dry Process, 34, 97-98, 2012.11.
285.	Y. Kim, T. Matsunaga, K. Nakahara ,G. Uchida, K. Kamataki , N. Itagaki, H. Seo, K. Koga, M. Shiratani , Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma CVD , Thin Solid Films, 10.1016/j.tsf.2012.06.023, 523, 29-33, 2012.11, [URL].
286.	K. Kamataki, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Control of radial density profile of nano-particle produced in reactive plasma by amplitude modulation of rf discharge voltage, Thin Solid Films, 10.1016/j.tsf.2012.07.059, 523, 76-79, 2012.11, [URL].
287.	H. Seo, Min-Kyu Son, Songyi Park, Hee-Je Kim, M. Shiratani, The Blocking Effect of Charge Recombination by sputtered and acid-treated ZnO Thin Film in Dye-sensitized Solar Cells, J. Photochem. Photobiol., A : Chemistry, 10.1016/j.jphotochem.2012.08.016, 248, 50-54, 2012.11, [URL].
288.	T. Shirafuji, Y. Setsuhara, M. Shiratani, T. Kaneko, T. Watanabe, N. Ohtake, The 24th Symposium on Plasma Science for Materials (SPSM-24) Preface, Thin Solid Films, 10.1016/j.tsf.2012.10.002, 523, 1-1, 2012.11, [URL].
289.	K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation, Thin Solid Films, 10.1016/j.tsf.2012.05.061, 523, 15-19, 2012.11, [URL].
290.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Control of Dry Yeast Using Scalable Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.11PJ02, 51, 11, 11PJ02(5pages), 2012.11, [URL].
291.	H. Seo, M. K. Son, M. Shiratani, H. J. Kim, Improvement on the long-term stability of dye-sensitized solar module by structural alternation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.10NE21, 51, 10, 10NE21(4pages), 2012.10, [URL].
292.	K. Shibata, K. Suenaga, K. Watanabe, F. Horikiri, T. Mishima, M. Shiratani , Evaluation of Crystal Orientation for (K, Na)NbO3 Films Using X-ray Diffraction Reciprocal Space Map and Relationship between Crystal Orientation and Piezoelectric Coefficient, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.075502, 51, 7, 075502(6pages), 2012.07, [URL].
293.	I. Suhariadi, N. Itagaki, K. Kuwahara, K. Oshikawa, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, K. Nakahara, M. Shiratani, ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio, Trans. Mateｒ. Res. Soc. Jpn., 10.14723/tmrsj.37.165, 37, 2, 165-168, 2012.06, [URL].
294.	A. Tanaka, M. Hirata, M. Shiratani, K. Koga, Y. Kiyohara, Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats, Journal of Occupational Health, 10.1539/joh.11-0164-OA, 54, 3, 187-195, 2012.06, [URL].
295.	S. Iwashita, G. Uchida, J. Schulze, E. Sch¨ungel, P. Hartmann, M. Shiratani, Zolt´an Donk´o and U. Czarnetzki, Sheath-to-sheath transport of dust particles in a capacitively coupled discharge, Plasma Sources Sci. Technol., 10.1088/0963-0252/21/3/032001, 21, 3, 032001(5pages), 2012.06, [URL].
296.	K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, High quality epitaxial ZnO films grown on solid-phase crystallized buffer layers, Thin Solid Films, 10.1016/j.tsf.2011.10.136, 520, 14, 4674-4677, 2012.05, [URL].
297.	H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.890, 1426, 313-318, 2012.04, [URL].
298.	Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.839, 1426, 307-311, 2012.04, [URL].
299.	K. Kamataki, Y. Morita, M. Shiratani, K. Koga, G. Uchida, N. Itagaki , In situ analysis of size dispersion of nano-particles in reactive plasma using two dimentional laser light scattering method, Journal of Instrumentation, 10.1088/1748-0221/7/04/C04017, 7, 4, C04017, 2012.04, [URL].
300.	M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.1245, 1426, 377-382, 2012.04, [URL].
301.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.966, 1469, ww02-08, 2012.04, [URL].
302.	Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga and M. Shiratani, Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.970, 1469, ww06-10, 2012.04, [URL].
303.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.969, 1469, ww06-08, 2012.04, [URL].
304.	G. Uchida, K. Yamamoto, M. Sato, Y. Kawashima, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of nitridation of Si nano-particles on the performance of quantum-dot sensitized solar cells, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD01, 51, 1, 01AD01, 2012.01, [URL].
305.	K. Koga, K. Nakahara, Y. Kim, T. Matsunaga, D.Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free B-doped a-Si:H films using SiH4+B10H14 multi-hollow discharge plasma CVD, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD03, 51, 1, 01AD03, 2012.01, [URL].
306.	K. Koga, T. Matsunaga, Y. Kim, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, and M. Shiratani, Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AD02, 51, 1, 01AD02, 2012.01, [URL].
307.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth Enhancement of Radish Sprouts Induced by Low Pressure O2 Radio Frequency Discharge Plasma Irradiation, Jpn. J. Appl. Phys. , 10.1143/JJAP.51.01AE01, 51, 1, 01AE01(4pages), 2012.01, [URL].
308.	S. Komatsu, M. Shiratani, Electron field emission from SP3-bonded bn microcones as a nonlinear cooperative phenomenon, Far East Journal of Dynamical Systems, 18, 1, 33-52, 2012.01, [URL].
309.	K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Irradiations with Ions and Photons in UV-VUV Regions on Nano-Surface of Polymers Exposed to Plasma, Jpn. J. Appl. Phys,, 10.1143/JJAP.51.01AJ02, 51, 1, 01AJ02(5pages), 2012.01, [URL].
310.	K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zno films with buffer layers crystallized via nitrogen mediation: Effects of deposition temperature of buffer layers, Proc. PVSEC-21, 4D-2P-11, 2011.11.
311.	N. Itagaki, K. Kuwahara, D. Yamashita, G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Zinc oxide-based transparent conducting films with buffer layers fabricated via nitrogen-mediated crystallization, Proc. PVSEC-21, 4D-2P-10, 2011.11.
312.	Y. Wang, M. Sato, T. Matsunaga, N. Itagaki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Properties and performance of si quantum dot-sensitized solar cells with low temperature titania paste, Proc. PVSEC-21, 3D-5P-09, 2011.11.
313.	T. Matsunaga, Y. Kim, K. Koga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Effects of nano-particles on (220) crystal orientation of microcrystallite silicon thin films, Proc. PVSEC-21, 4D-2P-16, 2011.11.
314.	K. Nakahara, K. Hatozaki, M. Sato, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Defect density of cluster-free a-si:h films deposited by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-20, 2011.11.
315.	Y. Kim, T. Matsunaga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study on effects of substatrate temperature of silicon film deposition using multi-hollow discharge plasma cvd, Proc. PVSEC-21, 3D-2P-09, 2011.11.
316.	K. Kamataki, K. Koga, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Study of interaction between plasma fluctuation and nucleation of nanoparticle in plasma CVD, Proc. Plasma Conf. 2011, 24P014-O, 2011.11.
317.	K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure, Proc. Plasma Conf. 2011, 23G03, 2011.11.
318.	Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Radical Flux Evaluation to Microcrystalline Silicon Films Deposited by Multi-Hollow Discharge Plasma CVD, Proc. Plasma Conf. 2011, 24P011-O, 2011.11.
319.	Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer, Proc. Intern. Symp. on Dry Process, 33, 133-134, 2011.11, [URL].
320.	N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, K. Kamataki, H. Seo, G. Uchida, K. Koga, M. Shiratani, Low resistive ZnO:Al films with ZnO buffer layers fabricated by Ar/N2 magnetron sputtering, Proc. Plasma Conf. 2011, 24G16, 2011.11.
321.	T. Matsunaga, Y. Kim, K. Koga, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Influence of nano-particles on multi-hollow discharge plasma for microcrystalline silicon thin films deposition, Proc. Plasma Conf. 2011, 24P015-O, 2011.11.
322.	M. Shiratani, Y. Kim, T. Matsunaga, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Effects of nanoparticle incorporation on Si thin films deposited by plasma CVD, Proc. Plasma Conf. 2011, 24G06, 2011.11.
323.	K. Kuwahara, N. Itagaki, K. Nakahara, D. Yamashita, Seo H., G. Uchida, K. Kamataki, K. Koga, M. Shiratani, Effects of N2 gas addition to sputtering plasma on properties of epitaxial ZnO films, Proc. Plasma Conf. 2011, 24P008-O, 2011.11.
324.	Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Effects of electrolyte on performance of quantum dot-sensitized solar cells using Si nanoparticles synthesized by multi-hollow discharge plasma CVD, Proc. Plasma Conf. 2011, 23P013-O, 2011.11.
325.	K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method, Proc. Plasma Conf. 2011, 24P016-O, 2011.11.
326.	K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free a-Si:H films using cluster eliminating filter, Proc. Plasma Conf. 2011, 24P010-O, 2011.11.
327.	K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, S. Bornholdt, H. Kersten, Collection of carbon dust particles formed due to plasma-wall interactions between high density H2 plasma and carbon wall onto substrates by applying local DC bias voltage, Proc. Plasma Conf. 2011, 24P094-O, 2011.11.
328.	趙研, 節原裕一, 竹中弘祐, 白谷正治, 関根誠, 堀勝, フレキシブルデバイス創製に向けたプラズマ—ソフトマテリアル相互作用の解析 , 高温学会誌 , 10.7791/jhts.37.289, 37, 6, 289-297 , 2011.11, [URL].
329.	H. Seo, Min-Kyu Son, M. Shiratani, Hee-Je Kim, The improvement on the long-term stability of dye-sensitized solar module by structural alternation, Proc. PVSEC-21, 3D-5P-03, 2011.11.
330.	K. Hatozaki, K. Nakahara, G. Uchida, K. Koga, M. Shiratani, Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-18, 2011.11.
331.	M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga, M. Shiratani, Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges, Proc. PVSEC-21, 3D-5P-12, 2011.11.
332.	T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon, Proc. Intern. Symp. on Dry Process, 33, 123-124, 2011.11, [URL].
333.	K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Investigation of plasma interactions with organic semiconductors for fabrication of flexible electronics devices, Proc. Intern. Symp. on Dry Process, 33, 69-70 , 2011.11, [URL].
334.	N. Hayashi, Y. Akiyoshi, S. Kitazaki, K. Koga, M. Shiratani, Influence of active oxygen species produced by atmospheric torch plasma on plant growth, Proc. Intern. Symp. on Dry Process, 33, 135-136, 2011.11, [URL].
335.	G. Uchida, S. Iwashita, J. Schungel, M. Shiratani, U. Czarnetzki, Transport of dust particles in multi-frequency capacitively coupled radio frequency discharges, Proc. Plasma Conf. 2011, 25E01, 2011.11.
336.	T. Mieno, K. Koga, M. Shiratani, Production Process of Carbon Nanotube Coagulates, Proc. Plasma Conf. 2011, 24F08, 2011.11.
337.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation, Proc. Plasma Conf. 2011, 23P018-O, 2011.11.
338.	T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor, Proc. Plasma Conf. 2011, 24P007-O, 2011.11.
339.	M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga and M. Shiratani, Deposition of FeSi2 nano-particle film, Proc. Plasma Conf. 2011, 24P009-O, 2011.11.
340.	G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD, Physica Status Solidi (c), 10.1002/pssc.201001230, 8, 10, 3017-3020, 2011.10, [URL].
341.	K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, M. Shiratani, Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasma, Appl. Phys. Express, 10.1143/APEX.4.105001, 4, 10, 105001, 2011.10, [URL].
342.	G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye, Physica Status Solidi (c), 10.1002/pssc.201100166, 8, 10, 3021-3024, 2011.10, [URL].
343.	K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method, Physica Status Solidi (c), 10.1002/pssc.201100229, 8, 10, 3013-3016, 2011.10, [URL].
344.	K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Impacts of Plasma Fluctuations on Growth of Nano-Particles in Reactive Plasma , Proc. of International Conference on Phenomena in Ionized Gases（ICPIG） 2011 Conference, D13-318, 2011.09.
345.	K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film, Thin Solid Films, 10.1016/j.tsf.2011.01.408, 519, 20, 6896-6898, 2011.08, [URL].
346.	N. Hayashi, A. Nakahigashi, M. Goto, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge, Jpn. J. Appl. Phys., 10.1143/JJAP.50.08JF04, 50, 8, 08JF04, 2011.08, [URL].
347.	Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Plasma processing of soft materials for development of flexible devices , Thin Solid Films, 10.1016/j.tsf.2011.04.091, 519, 20, 6721-6726, 2011.08, [URL].
348.	K. Cho, Y. Setsuhara, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers, Thin Solid Films, 10.1016/j.tsf.2011.04.060, 519, 20, 6810-6814, 2011.08, [URL].
349.	Y. Kim, T. Matsunaga, Y. Kawashima, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, K. Koga, M. Shiratani, Combinatorial study of substrate temperature dependence on properties of silicon films deposited using multihollow discharge plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry （ISPC20）, POL08, 2011.07.
350.	Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial analyses of plasma-polymer interactions, Surf. Coat. Technol., 10.1016/j.surfcoat.2011.04.083, 205, 2, S484-S489, 2011.07, [URL].
351.	T. Urakawa, T. Nomura, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry （ISPC20）, POL02, 2011.07.
352.	M. Shiratani, K. Koga, S. Iwashita, G. Uchida, N. Itagaki, K. Kamataki, Nano-factories in plasma: present status and outlook, J. Phys. D: Appl. Phys., 10.1088/0022-3727/44/17/174038 , 44, 17, 174038, 2011.05, [URL].
353.	K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics, International Conference on Advances in Condensed and Nano Materials (ICACNM), 10.1063/1.3653600, 1393, 27-30, 2011.02, [URL].
354.	N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase, Appl. Phys. Express, 10.1143/APEX.4.011101, 4, 1, 011101-011101-3 , 2011.01, [URL].
355.	Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Low-damage plasma processing of polymers for development of organic-inorganic flexible devices, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.08.031, 205, 1, S355-S359, 2010.12, [URL].
356.	W. M. Nakamura, H. Matsuzaki, H. Sato, Y. Kawashima, K. Koga, M. Shiratani, High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells, Surf. Coat. Technol., 10.1016/j.surfcoat.2010.07.081, 205, 1, S241-S245 , 2010.12, [URL].
357.	内田儀一郎, 古閑一憲, 白谷正治, マルチホロー放電プラズマＣＶＤによる量子ドット増感太陽電池用シリコンナノ結晶粒子の作製, ケミカルエンジニヤリング, 55, 12, 947-954, 2010.12, [URL].
358.	M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5685920, XII-XVI , 2010.11, [URL], プラズマナノテクノロジーで最重要課題となっている揺らぎの制御に関する現状と将来を展望した論文。.
359.	G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686704, 2199-2201, 2010.11, [URL].
360.	K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686456, 1943-1947, 2010.11, [URL].
361.	T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686679 , 2219-2212, 2010.11, [URL].
362.	K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686686, 2216-2218, 2010.11, [URL].
363.	H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Substrate Temperature Dependence of Sticking Probability of SiOx-CH3 Nano-Particles, Proc. of International Symposium on Dry Process, 43-44, P1-A17, 2010.11.
364.	G. Uchida, M. Sato, Y. Kawashima, K. Yamamoto, K. Nakahara, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Optical and Electrical Properties of Particle Composite Thin Films deposited in SiH4/H2 and N2 Multi-Hollow Discharges　, Proc. of MNC2010, 12D-11-66　, 2010.11.
365.	T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686688, 2213-2215, 2010.11, [URL].
366.	Y. Akiyoshi, A. Nakahigashi, N. Hayashi, S. Kitazaki, Takuro Iwao, K. Koga, M. Shiratani, Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686467, 1957-1959, 2010.11, [URL].
367.	Y. Kawashima, K. Yamamoto, M. Sato, T. Matsunaga, K. Nakahara, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686677, 2222-2224, 2010.11, [URL].
368.	S. Kitazaki, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Growth Stimulation of Radish Sprouts Using Discharge Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686474, 1960-1963, 2010.11, [URL].
369.	K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photo-Irradiations in VUV and UV Regions on Chemical Bonding States of Polymers during Plasma Exposure, Proc. of International Symposium on Dry Process, 61-62, P1-B5, 2010.11.
370.	Y. Setsuhara, K. Takenaka, K. Cho, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Soft Material Processing, Proc. of International Symposium on Dry Process, 63-64, P1-B6, 2010.11.
371.	G. Uchida, M. Sato, Y. Kawashima, K. Nakahara, K. Yamamoto, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Generation of nitridated silicon particles and their thin film deposition using double multi-hollow discharges, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00093, 2010.10.
372.	K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00087, 2010.10.
373.	T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00089, 2010.10.
374.	H. Miyata, K. Nishiyama, S. Iwashita, H. Matsuzaki, D. Yamashita, G. Uchida, N. Itagaki, K. Kamataki, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD experimental group　, Carbon dust particles generated due to H2 plasma-carbon wall interaction, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00114, 2010.10.
375.	A. Nakahigashi, Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, KWP.00008, 2010.10.
376.	T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Plasma parameter measurements of Ar+H2+C7H8 plasma in H-assisted plasma CVD reactor, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, DTP.00173, 2010.10.
377.	Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Investigation of Plasma Interactions with Soft Materials via Combinatorial Plasma-Process Analyzer for Plasma Nano Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, TF2.00006, 2010.10.
378.	K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Effects of Photoemissions in UV and VUV Regions on Nano-Surface Strucures of Soft Materials during Plasma Processes, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00115, 2010.10.
379.	M. Shiratani, Academic Roadmap of Plasma Process Technologies, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, FT.00004, 2010.10.
380.	Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials, Thin Solid Films, 10.1016/j.tsf.2010.01.057, 518, 22, 6492-6495, 2010.09, [URL].
381.	Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Quantum dot-sensitized solar cells using Si nanoparticles, Trans. Mateｒ. Res. Soc. Jpn., 35, 3, 597-599, 2010.09, [URL].
382.	K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch27, 219, 183-188, 2010.09, [URL].
383.	K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Development of a Combinatorial Plasma Process Analyzer for Advanced R&D of Next Generation Nanodevice Fabrications, Proc. Characterization and Control of Interfaces for high quality advanced materials III, 10.1002/9780470917145.ch40, 219, 279-284, 2010.09, [URL].
384.	Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzer, Thin Solid Films, 10.1016/j.tsf.2010.03.055, 518, 22, 6320-6324, 2010.09, [URL].
385.	白谷正治, プラズマ・プロセス技術, 応用物理, 79, 8, 717-719, 2010.08, [URL].
386.	K. Takenaka, C. Ken, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy, Japanese Journal of Applied Physics, 10.1143/JJAP.49.08JA02, 49, 8, 08JA02, 2010.08, [URL].
387.	Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5617205, 3347-3351, 2010.07, [URL].
388.	K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616514, 3722-3755, 2010.07, [URL].
389.	K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616502, 3718-3721, 2010.07, [URL].
390.	M. C. Sung, Keiko Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Etching characteristics of organic low-k films interpreted by internal parameters employing a combinatorial plasma process in an inductively coupled H2/N2 plasma, J. Appl. Phys. , 10.1063/1.3415535, 107, 11, 113310, 2010.06, [URL].
391.	C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Surface loss probabilities of H and N radicals on different materials in afterglow plasma employing H2 and N2 mixture gases, J. Appl. Phys. , 10.1063/1.3372750, 107, 10, 103310, 2010.05, [URL].
392.	Y. Setsuhara, C. Ken, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasma sustained via RF inductive coupling with low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.038, 518, 13, 3555-3560, 2010.04, [URL].
393.	Y. Setsuhara, C. Ken, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, S. Zaima, Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasma driven by multiple low-inductance antenna units, Thin Solid Films, 10.1016/j.tsf.2009.11.045, 518, 13, 3561-3565, 2010.04, [URL].
394.	A. Tanaka, M. Hirata, Y. Kiyohara, M. Nakano, K. Omae, M. Shiratani, K. Koga, Review of pulmonary toxicity of indium compounds to animals and humans, Thin Solid Films, 10.1016/j.tsf.2009.10.123, 518, 11, 2934-2936, 2010.03, [URL].
395.	C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, High performance of compact radical monitoring probe in H2/N2 mixture plasma, J. Vac. Sci. Technol., B, 10.1116/1.3327926 , 28, 2, 17-20, 2010.03, [URL].
396.	K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, X-Ray Photoelectron Spectroscopy Analysis of Plasma Interactions with Polymers for Development of Low-Damage and Low-Temperature Plasma Processes, Proc. of the 27th symposium on plasma processing, P2-33, 289-290, 2010.02.
397.	Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD, Proc. of the 27th symposium on plasma processing, B5-05, 101-102, 2010.02.
398.	S. Iwashita, H. Miyata, YasuY. Yamada, H. Matsuzaki, K. Koga, M. Shiratani, Observation of nano-particle transport in capacitively coupled radio frequency discharge plasma, Proc. of the 27th symposium on plasma processing, P1-13, 153-154, 2010.02.
399.	H. Sato, Y. Kawashima, K. Nakahara, K. Koga, M. Shiratani, Measurement of electron density in multi-hollow discharges with magnetic field, Proc. of the 27th symposium on plasma processing, A6-01, 105-106, 2010.02.
400.	H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD Experimental Group, In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasma and Inner Wall in LHD, Proc. of the 27th symposium on plasma processing, P1-14, 155-156, 2010.02.
401.	T. Mieno, GuoDong Tan, S. Usuba, K. Koga, M. Shiratani, In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity), Proc. of the 27th symposium on plasma processing, P2-17, 257-258, 2010.02.
402.	K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, Proc. of the 27th symposium on plasma processing, A5-06, 91-92, 2010.02.
403.	T. Nomura, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor, Proc. of the 27th symposium on plasma processing, P1-39, 205-206, 2010.02.
404.	Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori, Combinatorial Analysis of Plasma-Polymer Interactions for Advanced Polymer Nano-Processing with Density-Inclination Plasma, Proc. of the 27th symposium on plasma processing, B5-01, 93-94, 2010.02.
405.	M. Hori, C. S. Moon, M. Sekine, K. Takeda, Y. Setushara, M. Shiratani, A Low Pressure Combinatorial Plasma Process Employing an Integrated Monitoring, Proc. of the 27th symposium on plasma processing, T-02, 7-8, 2010.02.
406.	K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, High rate deposition of cluster-suppressed amorphous silicon films deposited using a multi-hollow discharge plasma CVD, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1210-Q07-10 , 1210, Q07-10, 217-222, 2010.01, [URL].
407.	T. Nomura, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition Profile Control of Carbon Films on Patterned Substrates using a Hydrogen-assited Plasma CVD Method, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-1222-DD05-16, 1222, DD05-16, 203-207 , 2010.01, [URL].
408.	Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, H. Kondo, O. Nakatsukado, S. Zaima, Plasma surface treatment of polymers with inductivity-coupled RF plasma driven by low-inductance antenna units , Thin Solid Films, 10.1016/j.tsf.2009.07.161, 518, 3, 1006-1011 , 2009.12, [URL].
409.	Y. Setsuhara, K. Nagao, M. Shiratani, M. Sekine, M. Hori, Development of density-inclination plasma for analysis of plasma nano-processes via combinatorial method , Thin Solid Films, 10.1016/j.tsf.2009.07.162, 518, 3, 1020-1023, 2009.12, [URL].
410.	A. Komori, H. Yamada, S. Sakakibara, O. Kaneko, K. Kawahata, T. Mutoh, N. Ohyabu, S. Imagawa, K. Ida, Y. Nagayama, T. Shimozuma, K.Y. Watanabe, T. Mito, M. Kobayashi, K. Nagaoka, R. Sakamoto, N. Yoshida, S. Ohdachi, N. Ashikawa, Y. Feng, T. Fukuda, H. Igami, S. Inagaki, H. Kasahara, S. Kubo, R. Kumazawa, O. Mitarai, S. Murakami, Y. Nakamura, M. Nishiura, T. Hino, S. Muzaki, K. Tanaka, K. Toi, A. Weller, M. Yoshinuma, Y. Narushima, N. Ohno, T. Okamura, N. Tamura, K. Saito, T. Seki, S. Sudo, H. Tanaka, T. Tokuzawa, N. Yanagi, M. Yokoyama, Y. Yoshimura, T. Akiyama, H. Chikaraishi, M. Chowdhuri, M. Emoto, N. Ezumi, H. Funaba, L. Garcia, P. Goncharov, M. Goto, K. Ichiguchi, M. Ichimura, H. Idei, T. Ido, S. Iio, K. Ikeda, M. Irie, A. Isayama, T. Ishigooka, M. Isobe, T. Ito, K. Itoh, A. Iwamae, S. Hamaguchi, T. Hamajima, S. Kitajima, S. Kado, D. Kato, T. Kato, S. Kobayashi, K. Kondo, S. Mamune, Y. Matsumoto, N. Matsunami, T. Minami, C. Michael, H. Miura, J. Miyazawa, N. Mizuguchi, T. Morisaki, S. Morita, G. Motojima, I. Murakami, S. Muto, K. Nagasaki, N. Nakajima, Y. Nakamura, H. Nakanishi, H. Nakano, K. Narihara, A. Nishimura, H. Nishimura, K. Nishimura, S. Nishimura, N. Nishino, T. Notake1, T. Obana, K. Ogawa, Y. Oka, T. Ohishi, H. Okada, K. Okuno, K. Ono, M. Osakabe, T. Osako, T. Ozaki, B.J. P.son, H. Sakaue, M. Sasao, S. Satake, K. Sato, M. Sato, A. Shimizu, M. Shiratani, M. Shoji, H. Sugama, C. Suzuki, Y. Suzuki, K. Takahata, H. Takahashi, Y. Takase, Y. Takeiri, H. Takenaga, S. Toda, Y. Todo, M. Tokitani, H. Tsuchiya, K. Tsumori, H. Urano, E. Veshchev, F. Watanabe, T. Watanabe, T.H. Watanabe, I. Yamada, S. Yamada, O. Yamagishi, S. Yamaguchi, S. Yoshimura, T. Yoshinaga and O. Motojima, Development of net-current free heliotron plasma in the Large Helical Device, Nuclear Fusion, 10.1088/0029-5515/49/10/104015, 49, 10, 104015, 2009.10, [URL].
411.	J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches, J. Plasma Fusion Res., 8, 1443-1446, 2009.09, [URL].
412.	W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, J. Umetsu, H. Miyahara, H. Matsuzaki, K. Koga, M. Shiratani, Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition, J. Plasma Fusion Res., 8, 736-739, 2009.09, [URL].
413.	H. Miyahara, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Detection of nano-particles formed in cvd plasma using a two-dimensional photon-counting laser-light-scattering method, J. Plasma Fusion Res., 8, 700-704, 2009.09, [URL].
414.	H. Sato, Y. Kawashima, M. Tanaka, K. Koga, W. M. Nakamura, M. Shiratani , Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method, J. Plasma Fusion Res., 8, 1435-1438, 2009.09, [URL].
415.	S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles, J. Plasma Fusion Res., 8, 582-586, 2009.09, [URL].
416.	C. S. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori, Combinatorial Plasma Etching Process, Applied Physics Express , 10.1143/APEX.2.096001, 2, 9, 096001(3pages), 2009.09, [URL].
417.	S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD experimental group, A comparison of dust particles produced due to interaction between graphite and plasma: LHD vs helicon discharges, J. Plasma Fusion Res., 8, 308-311, 2009.09, [URL].
418.	M. Shiratani, K. Koga, Toward plasma nano-factories, Proc. of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I), 86, 2009.09.
419.	Y. Kawashima, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD, Proc. of 2009 International Symposium on Dry Process, 107, 2009.09.
420.	T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD, Proc. of 2009 International Symposium on Dry Process, 101, 2009.09.
421.	S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation, Proc. of 2009 International Symposium on Dry Process, 99, 2009.09.
422.	H. Sato, Y. Kawashima, K. Koga, M. Shiratani, Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer, Proc. of 2009 International Symposium on Dry Process, 113, 2009.09.
423.	K. Nakahara, Y. Kawashima, H. Sato, K. Koga, M. Shiratani, Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe, Proc. of 2009 International Symposium on Dry Process, 163, 2009.09.
424.	H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, Dust Particles formed owing to interactions between H2 or D2 helicon plasma, graphite, Proc. of 2009 International Symposium on Dry Process, 33, 2009.09.
425.	M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama, Plasma CVD of Nano-particle Composite Porous SiOCH Films, Proc. of 19th International Symposium on Plasma Chemistry, 2009.07, [URL].
426.	K. Koga, S. Iwashita, S. Kiridoshi, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Characterization of Dust Particles Ranging in Size from 1 nm to 10 m Collected in LHD, Plasma and Fusion Research, 10.1585/pfr.4.034 , 4, 034-034, 2009.04, [URL].
427.	S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode, Proc. of PSS2009/SPP26, 2009.02.
428.	K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method, Proc. of PSS2009/SPP26, 2009.02.
429.	Nakamura W. M., Sato H., Koga K., Shiratani M., Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells , Proc. of PSS2009/SPP26, 2009.02.
430.	J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile of toluene plasma CVD carbon films in trenches, Proc. of PSS2009/SPP26, 2009.02.
431.	K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, Proc. of PSS2009/SPP26, 2009.02.
432.	S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, A. Sagara, K. Nisimura , Characteristics of dust particles produced due to interaction between hydrogen plasma, graphite , Proc. of PSS2009/SPP26, 2009.02.
433.	S. I. Krasheninnikov, R. D. Smirnov,Y. Tanaka,T. K. Soboleva, D. A. Mendis, D. L. Rudakov, W. P. West, C. H. Skinner, B. Lipschultz, R. S. Granetz, N. Ohno, S. Muzaki, M. Shiratani, R. Kumazawa, T. Nakano, R. Maqueda, A. Y. Pigarov, M. Rosenberg, D. J. Benson, T. D. Rognlien, B. D. Bray, J. H. Yu, A. L. Roquemore, J. L. Terry, A. Bader, C. S. Pitcher, S. Takamura, N. Ashikawa, M. Tokitani, N. Asakura, A. M. Litnovsky, Recent progress in understanding the behavior of dust in fusion devices, Plasma Physics and Controlled Fusion, 10.1088/0741-3335/50/12/124054, 50, 12, 124054, 2008.12, [URL].
434.	S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa, Proc. of 30th International Symposium on Dry Process, 115, 2008.12.
435.	J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Deposition profile of plasma CVD carbon films in trenches, Proc. of 30th International Symposium on Dry Process, 35, 2008.12.
436.	W. M. Nakamura, H. Miyahara, K. Koga, M. Shiratani, Two dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD, IEEE Trans. Plasma Science, 10.1109/TPS.2008.923830, 36, 4, 888-889, 2008.08, [URL].
437.	S. Iwashita, Michihito Morita, H. Matsuzaki, K. Koga, and M. Shiratani, Temperature dependence of dielectric constant of nano-particle composite porous low-k films fabricated by pulse rf discharges with amplitude modulation, Jpn. J. Appl. Phys., 10.1143/JJAP.47.6875, 47, 8, 6875-6878, 2008.08, [URL].
438.	S. Iwashita, K. Koga, M. Morita, M. Shiratani, Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062006, 100, 6, p. 062006, 2008.08, [URL].
439.	J. Umetsu, K. Koga, K. Inoue, M. Shiratani, Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062007, 100, 6, p. 062007, 2008.08, [URL].
440.	S. Nunomura, K. Koga, Y. Watanabe, M. Shiratani, M. Kondo, Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasma, Phys. Plasma, 10.1063/1.2972162, 15, 8, p. 080703, 2008.08, [URL].
441.	J. Umetsu, K. Koga, K. Inoue, H. Matzuzaki, K. Takenaka, M. Shiratani, Discharge power dependence of Ha intensity asn electron density of Ar+H2 discharges in H-assisted plasma CVD reactor, Surf. Coat. Technol., 10.1016/j.surfcoat.2008.06.108, 202, 22-23, 5659-5662, 2008.08, [URL].
442.	W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani, Cluster incorporation control for a-Si:H film deposition, J. Phys. : Conference Series, 10.1088/1742-6596/100/8/082018, 100, 8, p. 082018, 2008.08, [URL].
443.	M. Shiratani, W. M. Nakamura, H. Miyahara, K. Koga, Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films, Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08), 69, 2008.07.
444.	M. Shiratani, S. Iwashita, K. Koga, S. Nunomura, Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage, Faraday Discussions, 10.1039/B704910B , 137, 127-138, 2008.01, [URL].
445.	K. Koga, W. M. Nakamura, and M. Shiratani, VHF discharge sustained in a small hole, Proc. 28th Intern. Conf. on Phenomena in Ionized Gases , 1987-1989, 2007.07.
446.	K. Koga, S. Iwashita, M. Shiratani, Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage, J. Phys. D: Appl. Phys., 10.1088/0022-3727/40/8/S05, 40, 8, 2267-2271, 2007.04, [URL].
447.	M. Shiratani, K. Koga, S. Ando, T. Inoue, Y. Watanabe, S. Nunomura, M. Kondo, Single step process to deposit Si quantum dot films using H2+SiH4 VHF discharges and electron mobility in a Si quantum dot solar cell, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.012, 201, 9-11, 5468-5471, 2007.02, [URL].
448.	S. Iwashita, K. Koga, M. Shiratani, A device for trapping nano-particles formed in processing plasma for reduction of nano-waste, Surf. Coat. Technol., 10.1016/j.surfcoat.2006.07.060, 201, 9-11, 5701-5704, 2007.02, [URL].
449.	S. Iwashita, K. Koga, M. Shiratani, Transport of nano-particles in pulsed AM RF discharges, Proc. the 24th Symp. on Plasma Processing, 103-104, 2007.01.
450.	K. Koga, W. M. Nakamura, D. Shimokawa, M. Shiratani, Stability of a-Si:H deposited using multi-hollow plasma CVD, Proc. the 24th Symp. on Plasma Processing, 189-190, 2007.01.
451.	M. Shiratani, S. Kiridoshi, K. Koga, S. Iwashita, N. Ashikawa, K. NIshimura, A. Sagara, A. Komori, LHD Experimental Group, In-situ sampling of dust generated in LHD and its analysis, Proc. the 24th Symp. on Plasma Processing, 371-372, 2007.01.
452.	M. Shiratani, K. Koga, N. Kaguchi, K. Bando,and Y. Watanabe, Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.015, 506-507, 17-21, 2006.05, [URL].
453.	T. Kakeya, K. Koga, M. Shiratani, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-clusters using pulsed H2+SiH4 VHF discharges, Thin Solid Films, 10.1016/j.tsf.2005.08.090, 506-507, 288-291, 2006.05, [URL].
454.	K. Koga, Y. Kitaura, M. Shiratani, Y. Watanabe, and A. Komori, Nano-particle formation due to interaction between H2 plasma and carbon wall, Thin Solid Films, 10.1016/j.tsf.2005.08.062, 506-507, 656-659, 2006.05, [URL].
455.	K. Takenaka, K. Koga, M. Shiratani, Y. Watanabe, and T. Shingen, Mechanism of Cu deposition from Cu(EDMDD)2 using H-assisted plasma CVD, Thin Solid Films, 10.1016/j.tsf.2005.08.028, 506-507, 197-201, 2006.05, [URL].
456.	S. Nunomura, M. Kita,, K. Koga, M. Shiratani, and Y. Watanabe, In situ simple method for measuring size and density of nanoparticles in reactive plasma, J. Appl. Phys., 10.1063/1.2189951 , 99, 8, 083302(7pages), 2006.04, [URL].
457.	S. Komatsu, D. Kazami, Norihoro Tanaka, Y. Moriyoshi, M. Shiratani, KatsuY. Okada, BN micro-fibers grown by plasma-assisted laser chemical vapor deposition without a metal catalyst, Appl. Phys. Express, 10.1063/1.2188381, 88, 151914(3pages), 2006.04, [URL].
458.	S. Nunomura, K. Koga, M. Shiratani, Y. Watanabe, Y. Morisada, N. Matsuki, and S. Ikeda, Fabrication of nanoparticle composite porous films having ultra-low dielectric constant, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1509, 44, 50, L1509-L1511, 2005.12, [URL].
459.	K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1430, 44, 48, L1430-L1432, 2005.11, [URL].
460.	K. Koga, N. Kaguchi, K. Bando, and M. Shiratani, Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma CVD, Rev. Sci. Instrum. , 10.1063/1.2126572, 76, 11, 113501(4pages), 2005.11, [URL].
461.	M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-particles using VHF discharges and their properties, Trans. Mateｒ. Res. Soc. Jpn., 30, 1, 307-310, 2005.03.
462.	Y. Watanabe, M. Shiratani, and K. Koga, Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects, Trans. Mateｒ. Res. Soc. Jpn., 30, 1, 267-272, 2005.03.
463.	K. Takenaka, M. Shiratani, M. Takeshita, M. Kita, K. Koga, and Y. Watanabe, Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition, Pure Appl. Chem. , 10.1351/pac200577020391, 77, 2, 391-398, 2005.01, [URL].
464.	S. Komatsu, A. Okudo, D. Kazami, D. Golberg, Y. Li, Y. Moriyoshi, M. Shiratani, K. Okada, Electron field emission from self-organized microemitters of sp3-bonded 5H boron nitride with very high current density at low electric field, J. Phys. Chem. B, 10.1021/jp0493475, 108, 17, 5182-5184, 2004.10, [URL].
465.	K. Koga, N. Kaguchi, M. Shiratani, and Y. Watanabe, Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H2 bonds in the films, J. Vac. Sci. Technol., A, 10.1116/1.1763905 , 22, 4, 1536-1539, 2004.07, [URL].
466.	K. Takenaka, M. Kita,, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition, J. Vac. Sci. Technol., A, 10.1116/1.1738663, 22, 4, 1903-1907, 2004.07, [URL].
467.	K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori, Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall, IEEE Trans. Plasma Science, 10.1109/TPS.2004.828129 , 32, 2, 405-409, 2004.02, [URL].
468.	S, Komatsu, K. Kurashima, Y.shimizu, Y. Moriyoshi, M. Shiratani, K. Okada, Condensation of sp 3-Bonded Boron Nitride through a Highly Nonequilibrium Fluid State, J. Phys. Chem. B, 10.1021/jp0364452, 108, 1, 205-211, 2004.01, [URL].
469.	M. Shiratani, K. Koga, A. Harikai, T. Ogata, and Y. Watanabe, Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges, MRS Symp. Proc., 10.1557/PROC-762-A9.5, 762, A9.5.1-9.5.6, 2003.04, [URL].
470.	K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches, MRS Symp. Proc., 10.1557/PROC-766-E3.8, 766, E3.8.1-3.8.6, 2003.04, [URL].
471.	白谷正治, 古閑一憲, 尾形隆則, 掛谷知秀, 鹿口直斗, 渡辺征夫, シランプラズマ中のクラスタ成長と薄膜形成, 信学技報, 103, 6, 35-39, 2003.04, [URL].
472.	KS Kim, DJ Kim, JH Yoon, JY Park, Y Watanabe, M Shiratani, The changes of particle charge distribution during rapid growth of partilcles in the plasma reactor, J. Colloid Interface Sci., 10.1016/S0021-9797(02)00049-8, 257, 2, 195-207, 2003.02, [URL].
473.	K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe, Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition, Matr. Sci. Semiconductor Processing, 10.1016/S1369-8001(02)00108-7, 5, 2, 301-304, 2003.02, [URL].
474.	M. Shiratani, M. Kai, K. Koga, and Y. Watanabe, Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films, Thin Solid Films, 10.1016/S0040-6090(02)01171-9, 427, 1-2, 1-5, 2003.01, [URL].
475.	S. Komatsu, K. Kurashima, H. Kanada, K. Okada, M. Mitomo, Y. Moriyoshi, Y. Shimizu, M. Shiratani, T. Nakano, S. Samukawa, Highly crystalline 5H-polytype of sp3-bonded boron nitride prepared by plasma-packets-assisted pulsed-laser deposition: an ultraviolet light-emitter at 225nm, Appl. Phys. Lett., 10.1063/1.1527987, 81, 24, 4547-4549, 2002.12, [URL].
476.	白谷正治, 古閑一憲, 渡辺征夫, ナノクラスタ制御プラズマCVDと高品質，光安定a-Si:H太陽電池への応用, アモルファスセミナーテキスト, 95-100, 2002.11.
477.	M. Shiratani, K. Koga, Y. Watanabe, Formation of nano-particles in microgravity plasma, Journal of Japan Society of Microgravity Application, 19, 69, 2002.10, [URL].
478.	K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of copper by plasma CVD method, Proc. Intern. Symp. on Dry Process, 221-226, 2002.10.
479.	Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited lecture paper), Plasma Sources Sci. Technol., 10.1088/0963-0252/11/3A/334, 11, A229-A233, 2002.08, [URL].
480.	白谷正治, 反応性プラズマと材料プロセスの基礎, プラズマ・核融合学会サマースクールテキスト, 50-62, 2002.07.
481.	M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films, Proc. ESCANPIG16/ICRP5 Joint Meeting, II323--II324, 2002.07.
482.	K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2, Proc. ESCANPIG16/ICRP5 Joint Meeting, II173--II174, 2002.07.
483.	K. Koga, R. Uehara, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasma and carbon wall, Proc. ESCANPIG16/ICRP5 Joint Meeting, I173--I174, 2002.07.
484.	K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of Cu with H-assisted plasma CVD, Proc. ESCANPIG16/ICRP5 Joint Meeting, II199--II200, 2002.07.
485.	K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 238-243, 2002.05.
486.	K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 227-232, 2002.05.
487.	Y. Watanabe, A. Harikai, K. Koga, M. Shiratani, Clustering phenomena in low-pressure reactive plasma: basis and applications (invited lecture paper), Pure Appl. Chem. , 10.1351/pac200274030483, 74, 3, 483-487, 2002.03, [URL].
488.	K. Koga, M. Kai, M. Shiratani, Y. Watanabe, N. Shikatani, Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films, Jpn. J. Appl. Phys., 10.1143/JJAP.41.L168, 41, 2B, L168-L170, 2002.02, [URL].
489.	K. Koga, M. Shiratani, Y. Watanabe, In-situ measurement of size and density of particles in sub-nm to nm size range, Proc. Nano-technology Workshop, 13-20, 2002.02.
490.	M. Shiratani, K. Koga, Y. Watanabe, Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges, Proc. Nano-technology Workshop, 7-12, 2002.02.
491.	白谷正治, 古閑一憲, 渡辺征夫, プロセスプラズマ中のクラスタ - アモルファスシリコン太陽電池製造用プラズマ中のクラスター, Bulletin of Cluster Sci. Technol., 5, 13-18, 2002.01.
492.	白谷正治, CVDにおける今後の動向を考える, 応用物理, 71, 1, 106-107, 2002.01.
493.	渡辺征夫, 古閑一憲, 白谷正治, クラスタ制御プラズマCVD法によるSi薄膜の高品質化, シリコンテクノロジー, 37, 21-26, 2002.01.
494.	K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2, Proc. Intern. Symp. on Dry Process, 169-174, 2001.11.
495.	M. Shiratani, K. Koga, Y. Watanabe, Cluster-less plasma CVD reactor and its application to a-Si:H film deposition, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-664-A5.6, A5.6.1-A5.6.6, 2001.07, [URL].
496.	Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited), Proc. Intern. Conf. on Phenomena in Ionized Gases, 15-16, 2001.07.
497.	M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, Development of H-assisted plasma CVD reactor for Cu interconnects, Proc. Intern. Conf. on Phenomena in Ionized Gases, 147-148, 2001.07.
498.	K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, Proc. Intern. Conf. on Phenomena in Ionized Gases, 39-40, 2001.07.
499.	Y. Watanabe, M. Shiratani, K. Koga, Clustering phenomena in low-pressure reactive plasma: base and applications (invited), Proc. Intern. Symp. on Plasma Chemistry, 726-730, 2001.07.
500.	M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 153-154, 2001.07.
501.	Y. Watanabe, M. Shiratani, T. Fukuzawa, H. Kawasaki, Y. Ueda, S. Singh, H. Ohkura, Contribution of short lifetime radicals to growth of particles in SiH4 HF discharges and effects of particles on deposited films, J. Vac. Sci. Technol., A, 10.1116/1.580069, 14, 3, 995-1001, 2001.05, [URL].
502.	M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration, Sci. Technol. Adv. Mater., 10.1016/S1468-6996(01)00131-0, 2, 3-4, 505-515, 2001.04, [URL].
503.	M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, In-situ polarization-sensitive laser-light scattering method for simultaneous measurements of two dimensional spatial size and density distributions of particles in plasma, J. Vac. Sci. Technol., A, 10.1116/1.580152, 14, 2, 603-607, 2001.03, [URL].
504.	Y. Watanabe, M. Shiratani, H. Kawasaki, S. Singh, T. Fukuzawa, Y. Ueda, H. Ohkura, Growth processes of particles in high frequency silane plasma, J. Vac. Sci. Technol., A, 10.1116/1.580141, 14, 2, 540-545, 2001.03, [URL].
505.	J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, J. Guillon, Surface reaction probabilities and kinetics of H, SiH3, Si2H5, CH3 and C2H5 during deposition of a-Si:H and a-C:H from H2, SiH4 and CH4 discharges, J. Vac. Sci. Technol., A, 10.1116/1.580983, 16, 1, 278-289, 2001.01, [URL].
506.	Y. Watanabe, M. Shiratani, K. Koga, Formation kinetics and control of dust particles in capacitively-coupled reactive plasma (invited), Phys. Scripta, 10.1238/Physica.Topical.089a00029, T89, 29-32, 2001.01, [URL].
507.	M. Shiratani, K. Koga, Y. Watanabe, Plasma CVD method for Cu interconnects in ULSI (invited), Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 751-754, 2001.01.
508.	M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Measurements of surface reaction probability of SiH3, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 419-420, 2001.01.
509.	M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H assisted control of quality and conformality in Cu film deposition using plasma CVD method, Proc. Advanced Metallization Conf. 2000, 271-278, 2001.01.
510.	K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasma, Proc. Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 385-386, 2001.01.
511.	M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe, Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 421-422, 2001.01.
512.	M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 393-394, 2001.01.
513.	M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, Methods of suppressing cluster growth in silane rf discharges, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-609-A5.6, A5.6.1-A5.6.6, 2000.07, [URL].
514.	K. Koga, Y. Matsuoka, M. Shiratani, Y. Watanabe, In situ observation of nucleation and subsequent growth of clusters in silane rf discharges, Appl. Phys. Lett., 77, 2, 196-198, 2000.07.
515.	H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-612-D9.2.1, D9.2.1-D9.2.6, 2000.07, [URL].
516.	H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source, Res. Rep. ISEE Kyushu Univ., 5, 1, 57-61, 2000.03.
517.	Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga, Growth processes of particles up to nanometer size in high-frequency SiH4 plasma, Jour. Technical Phys., 41, 1, 505-519, 2000.01.
518.	M. Shiratani, S. Maeda, K. Koga, Y. Watanabe, Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.39.287, 39, 1, 287-293, 2000.01, [URL].
519.	T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth of Particles in Cluster-size Range in Low Pressure and Low Power SiH4 RF Discharges, J. Appl. Phys., 10.1063/1.371256, 86, 7, 3543-3549, 1999.10, [URL].
520.	M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle Growth Kinetics in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4542, 38, 7B, 4542-4549, 1999.07, [URL].
521.	Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of Gas Flow on Particle Growth in Silane RF Discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4556, 38, 7B, 4556-4560, 1999.07, [URL].
522.	H. Jin, M. Shiratani, Y. Nakatake, T. Fukuzawa, T. Kinoshita, Y. Watanabe, M. Toyofuku, Conformal Deposition of High-Purity Copper Using Plasma Reactor, Jpn. J. Appl. Phys., 10.1143/JJAP.38.4492, 38, 7B, 4492-4495, 1999.07, [URL].
523.	白谷正治, 渡辺征夫, フォトンカウンティングレーザ散乱法によるプラズマ中の微粒子計測, 応用物理, 68, 5, 553-554, 1999.05.
524.	白谷正治, 渡辺征夫, 水素ラジカル源付プラズマCVD装置による高品質銅薄膜の形成, 応用物理, 68, 3, 299-303, 1999.03, [URL].
525.	渡辺征夫, 白谷正治, CVDプラズマにおけるクラスター成長, プラズマ材料科学第153委員会第42回研究会テキスト, 1-7, 1999.03.
526.	H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Transition of particle growth region in SiH4 rf discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.5757, 37, 10, 5757-5762, 1998.10, [URL].
527.	H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on initial growth of particles in low-pressure and low-power GeH4 rf discharges using the high-sensitivity photon-counting laser-light-scattering method, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L1264, 37, 10B, L1264-1267, 1998.10, [URL].
528.	H. J. Jin, M. Shiratani, T. Fukuzawa, Y. Watanabe, Trench filling and deposition of high quality Cu thin films using CVD plasma reactor with H radical source, Proc. 4th Intern. Conf. on Reactive Plasma, 95-96, 1998.10.
529.	Y. Watanabe, A. Hatae, T. Fukuzawa, M. Shiratani, Trajectory of particle injected from plasma reactor wall, Proc. 4th Intern. Conf. on Reactive Plasma, 63-64, 1998.10.
530.	H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on particle formation in germane rf discharges by photon-counting laser-light-scattering method, Proc. 4th Intern. Conf. on Reactive Plasma, 59-60, 1998.10.
531.	M. Shiratani, T. Fukuzawa, Y. Watanabe, Particle formation in rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 169-170, 1998.10.
532.	T. Fukuzawa, S. Kushima, Y. Matsuoka, M. Shiratani, Y. Watanabe, Growth mechanism of particles in cluster-size range in SiH4 rf discharges using threshold photoemission method, Proc. 4th Intern. Conf. on Reactive Plasma, 67-68, 1998.10.
533.	Y. Matsuoka, M. Shiratani, T. Fukuzawa, Y. Watanabe, K. Kim, Effects of gas flow on particle growth in silane rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 61-62, 1998.10.
534.	S. Maeda, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for size and density measurements of nano-particles in processing plasma, Proc. 4th Intern. Conf. on Reactive Plasma, 69-70, 1998.10.
535.	M. Shiratani, A. Minemoto, T. Fukuzawa, Y. Watanabe, Density profile of SiH3 in SiH4 rf discharges, Proc. 4th Intern. Conf. on Reactive Plasma, 197-198, 1998.10.
536.	M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, A study on the time evolution of SiH3 surface loss probability on hydrogenated amorphous silicon films in SiH4 rf discharges using infrared diode-laser absorption spectroscopy, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/31/7/004, 31, 7, 776-780, 1998.07, [URL].
537.	H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Study on growth processes of particles in germane radio frequency discharges using laser light scattering and scanning electron microscopic methods, J. Appl. Phys. , 10.1063/1.36742, 83, 11, 5665-5669, 1998.06, [URL].
538.	M. Shiratani, Y. Watanabe, Development of photon-counting laser-light-scatter- ing method for detection of nano-particles fromed in CVD plasma, Rev. Laser Eng., 10.2184/lsj.26.449, 26, 6, 449-452, 1998.06, [URL].
539.	H. Kawasaki, J. Kida, K. Sakamoto, T. Fukuzawa, M. Shiratani, Y. Watanabe, Similarities in spatial distributions of absolute GeH2 density, radical producition rate and particle amount in GeH4 discharges, Jpn. J. Appl. Phys., 10.1143/JJAP.37.L475, 37, 4B, L457-L477, 1998.04, [URL].
540.	福澤剛, 宮原弘臣, 串間真二, 川崎仁晴, 白谷正治, 渡辺征夫, シラン高周波放電中の微小微粒子のサイズと密度その場測定法の開発, システム情報科学研究科報告, 3, 1, 117-124, 1998.03, [URL].
541.	白谷正治, 渡辺征夫, 小特集　ダストプラズマの現状と課題　5.プラズマプロセスにおける微粒子現象, プラズマ・核融合学会, 73, 11, 1240-1245, 1997.11.
542.	M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface Reaction Kinetics of CH3 in CH4 RF Discharge Studied by Time-Resolved Threshold Ionization Mass Spectrometry, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4752, 36, 7B, 4752-4755, 1997.07, [URL].
543.	H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Roles of SiH3 and SiH2 radicals in particle growth in rf silane plasma, Jpn. J. Appl. Phys., 10.1143/JJAP.36.4985, 36, 7B, 4985-4988, 1997.07, [URL].
544.	H. Videlot, M. Shiratani, J. Jolly, J. Perrin, Effects of H2 dilution on surface loss probability of CH3 on a-C:H in CH4+H2 rf discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 3, 293-294, 1997.02.
545.	M. Shiratani, J. Jolly, H. Videlot, J. Perrin, Surface reaction kinetics of CH3 in CH4 RF discharges studied by time-resolved Ms spectroscopy, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 293-294, 1997.01.
546.	H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, T. Goto, Study on growth processes of particles in rf SiH4 plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 351-352, 1997.01.
547.	Y. Watanabe, T. Fukuzawa, H. Kawasaki, M. Shiratani, Particle Formation in High Frequency CVD Plasma, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 225-226, 1997.01.
548.	T. Fukuzawa, H. Miyahara, K. Nishimura, H. Kawasaki, M. Shiratani, Y. Watanabe, Growth and behavior of particles below nanometer in size in silane plasma using threshold photoemission method, Proc. 3rd Intern. Conf. on Reactive Plasma, 3, 349-350, 1997.01.
549.	M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Diagnostic of plasma for metal-organic chemical vapour deposition of Cu and fabrication of Cu thin films using the plasma, J. Phys. D: Appl. Phys. , 10.1088/0022-3727/29/11/005, 29, 1, 2754-2758, 1996.11, [URL].
550.	T. Fukuzawa, K. Obata, H. Kawasaki, M. Shiratani, Y. Watanabe, Detection of particles in rf silane plasma using photoemission method, J. Appl. Phys. , 10.1063/1.363273, 80, 6, 3202-3207, 1996.09, [URL].
551.	M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Production of size-controlled Si fine particules using pulsed rf dischange, Surf. Rev. Lett., 10.1142/S0218625X96000176 , 3, 1, 75-78, 1996.08, [URL].
552.	M. Shiratani, N. Kishigaki, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Two-dimensional spatial profiles of size and density of particulates grown in RF silane plasmas, IEEE Trans. Plasma Science, 10.1109/27.491731, 24, 1, 99-100, 1996.02, [URL].
553.	M. Shiratani, H. Kawasaki, T. Fukuzawa, T. Yoshioka, Y. Ueda, S. Singh, Y. Watanabe, Simultaneous in-situ measurements of properties of particulates in rf silane plasma using a polarization-sensitive laser-light-scattering method, J. Appl. Phys. , 10.1063/1.360916, 79, 1, 104-109, 1996.01, [URL].
554.	M. Shiratani, T. Fukuzawa, K. Eto, Y. Watanabe, Detection of Negative Ions in a Helium-Silane RF Plasma, Jpn. J. Appl. Phys. Pt. 2, Letters, 10.1143/JJAP.31.L1791, 31, 12, 1791-1793, 1992.12, [URL].

主要総説, 論評, 解説, 書評, 報告書等

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主要学会発表等

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1.	白谷正治, プラズマ成膜の革新を目指して (招待講演), Global Plasma Forum, 2023.03.
2.	白谷正治, 鎌滝晋礼, 機械学習・量子アニーリングを活用したプラズマプロセスの解析と制御 (招待講演), 第70回応用物理学会春季学術講演会, 2023.03.
3.	M. Shiratani, Tuning Deposition Profiles and Stress of Plasma CVD Carbon Films (Award Commemorative Speech), ISPlasma2023/IC-PLANTS2023, 2023.03.
4.	白谷正治, Si系プラズマＣＶＤ研究の現状と展望 (招待講演), 学振１５３プラズマ材料科学委員会第161回研究会, 2023.01.
5.	白谷正治, Plasma deposition of nanostructure tuning films (Invited), 15th International Conference on Plasma Science and Applications, 2022.12.
6.	M. Shiratani, Plasma Agriculture: An Emerging Field (Invited), ICPP 2022, 2022.11.
7.	M. Shiratani, T. Sato, K. Kamataki, Electric Field Vector Deduced from Balance of Forces Exerted on a Fine Particle Immersed in Discharge Plasma(Invited), iPlasmaNano-XI 2022, 2022.09.
8.	M. shiratani, Identification of key plasma process parameters using support vector machine(Invited), Second Meeting of the NTC Technical Committee on Emerging Plasma Nanotechnologies, 2022.05.
9.	M. Shiratani, Dusty Plasma: Scientific and Technological Impacts(Invited), 5th Asia-Pacific Conference on Plasma Physics, 2021.09.
10.	白谷正治, プラズマ農業の現在と将来(招待講演), 名古屋大学プラズマ研究会60周年記念シンポジウム, 2021.09.
11.	M. Shiratani, Novel methods for tuning film properties using nanostructures(Invited), Plathinium 2021, 2021.09.
12.	M. Shiratani, F. L. Chawarambwa, T. E. Putri, K. Koga, K. Kamataki, M. Son, H. Seo, Ambient radiant energy source for powering IoT devices(Invited), Thermec2021, 2021.06.
13.	M. Shiratani, Sputtering Growth of Metal Oxynitride Semiconductors for Excitonic Devices(Invited), EDTM2021, 2021.04.
14.	白谷正治, c-Si表面パッシベーションにおけるプラズマ誘起欠陥とバンド構造(招待講演), 第68回応用物理学会春季学術講演会, 2021.03.
15.	白谷正治, プラズマナノテクノロジーの学術変革(招待講演), 応用物理学会プラズマエレクトロニクス分科会３０周年記念シンポジウム, 2021.03.
16.	M. Shiratani, P.Attri, T. Okumura, K. Koga, Applications of Low Temperature Plasma to Agriculture in Preharvest Stage (Invited), ICMAP 2020 & ISFM 2020, 2021.01.
17.	M. Shiratani, 低温低圧プラズマ触媒法による二酸化炭素の資源化(招待講演）, 第1回低温プラズマ科学研究センター（cLPS）公開シンポジウム, 2020.12.
18.	白谷正治, Materials processing with low pressure plasma：present issues and possible solutions (Invited), SPIG2020, 2020.08.
19.	白谷正治, ESR Measurements of Plasma Irradiated Seed (Invited), the 1st international symposium on applied plasma science and engineering for agro and bio applications, 2020.01.
20.	M. Shiratani, M. Ideguchi, A. Yamamoto, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, Methane production for energy storage using low temperature plasma (Invited), 7th Korea-Japan Joint Symposium on Advanced Solar Cells 2020, 4th International Symposium on Energy Research and Application, 2020.01.
21.	古閑一憲, 佐藤僚哉, 吉田知晃, 有田涼, 田中颯, 廣松真弥, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマ照射した種籾の圃場栽培試験, 第36回プラズマ・核融合学会年会, 2019.12.
22.	K. Koga, M. Shiratani, V. Mildaziene, Metabolomics Approach for Studying Effects of Atmospheric Air Plasma Irradiation to Seeds (Keynote), 29th Annual Meeting of MRS-J, 2019.11.
23.	K. Koga, M. Shiratani, Impact of Atmospheric Pressure Plasma Irradiation to Seeds on Agricultural Productivity, 3rd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2019), 2019.11.
24.	K. Koga, A. Yamamoto, K. Kamataki, N. Itagaki, M. Shiratani, Rate Limiting Factors of Low Pressure Plasma-catalytic CO2 Methanation Process, AVS 66th International Symposium & Exhibition, 2019.10.
25.	K. Koga, M. Shiratani, Non-equilibrium nanoparticle composite film process using reactive plasmas (Invited), Advanced Metallization Conference 2019: 29th Asian Session (ADMETA Plus 2019), 2019.10.
26.	古閑一憲, Sung Hwa Hwang, 鎌滝晋礼, 板垣奈穂, 白谷正治, Ar+CH4プラズマCVDを用いて堆積した水素化アモルファスカーボン薄膜の堆積特性に対する電極基板間距離依存性, 2019年度（第72回）電気・情報関係学会九州支部連合大会, 2019.09.
27.	K. Koga, M. Shiratani, Plasmas - from Laboratory to Table - (Invited), The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019), 2019.09.
28.	K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, M. Shiratani, Synthesis and deposition of a-C:H nanoparticles using reactive plasmas with a fast gas flow, The Korea-Japan Workshop on Dust Particles in Plasmas, 2019.08.
29.	S. Urakawa, N. Miyahara, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Sputter deposition of wide bandgap (ZnO)x(AlN)1-x alloys: a new material system with tunable bandgap, XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10), 2019.07.
30.	K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki M. Shiratani, Growth Mechanism of Carbon Nanoparticles In Multi-Hollow Discharge Plasma Chemical Vapor Deposition (Invited), XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10), 2019.07.
31.	永石翔大, 佐々木勇輔, 鎌滝晋礼, 板垣奈穂, 古閑一憲, 白谷正治, マルチホロー放電プラズマCVD法による高品質SiN膜の低温(100度)形成, 令和元年度日本表面真空学会九州支部学術講演会（九州表面・真空研究会2019）, 2019.06.
32.	K. Koga, S. H. Hwang, T. Nakatani, J. S. Oh, K. Kamataki, N. Itagaki, M.Shiratani, Deposition of Carbon Nanoparticles Using Multi-Hollow Discharge Plasma CVD for Synthesis of Carbon Nanoparticle Composite Films, 46th International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2019), 2019.05.
33.	古閑一憲, 大友洋, 真銅雅子, 鎌滝晋礼, 板垣奈穂, 白谷正治, 微粒子プラズマにおける2体衝突運動の顕微高速観察, 日本物理学会第74回年次大会（2019年）, 2019.03.
34.	K. Koga, Y. Wada, R. Sato, R. Shimada, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, T. Kawasaki , Spatial Profile of RONS Dose Supplied by a Scalable DBD Device, The 3rd Asian Applied Physics Conference, 2018.12.
35.	古閑一憲, 嶋田凌太郎, 和田陽介, 佐藤僚哉, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治, Vida Mildaziene, カイワレ大根種皮の色素に対するプラズマ照射の効果, 第35回プラズマ・核融合学会年会, 2018.12.
36.	K. Koga, M. Shiratani, Innovative Agricultural Productivity Improvement Using Atmospheric Pressure Plasmas (Invited), 2018 MRS Fall Meeting & Exhibit, 2018.11.
37.	K. Koga, Y. Wada, R. Sato, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, Evaluation of Amount of RONS Transport and Absorption of Seeds, 2018 MRS Fall Meeting & Exhibit, 2018.11.
38.	古閑一憲, 反応性プラズマとナノ粒子相互作用ゆらぎネットワーク解析, 第34回九州･山口プラズマ研究会, 2018.11.
39.	K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, T. Nakatani, M. Shiratani, Synthesis of Hydrogenated Amorphous Carbon Nanoparticles using High-Pressure CH4+Ar Plasmas and Their Deposition, AVS 65th International Symposium & Exhibition, 2018.10.
40.	古閑一憲, 大友洋, 周靭, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマ中二体微粒子の衝突解析による相互作用揺らぎの研究, 2018年第79回応用物理学会秋季学術講演会, 2018.09.
41.	古閑一憲, 田中和真, 原尚志, 石榴, 中野慎也, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治, Siネットワーク秩序性に対する製膜前駆体の効果, 2018年第79回応用物理学会秋季学術講演会, 2018.09.
42.	K. Koga, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, Effects of cluster deposition on spatial profile of Si-Hx bond density in a-Si:H films, 2018 International Conference on Solid State Devices and Materials (SSDM2018), 2018.09.
43.	K. Koga, M. Shiratani, Challenge to precise control of chemical bond configuration in plasma CVD films, RUB Japan Science Days 2018, 2018.07.
44.	K. Koga, M. Shiratani, Control of synthesis and deposition of nanoparticles using a multi-hollow discharge plasma CVD , Workshop "Plasma surface interaction for technological applications" , 2018.06.
45.	K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, High energy leverage method on growth enhancement of bio-mass plants using plasma seed treatment, 7th International Conference on Plasma Medicine (ICPM-7), 2018.06.
46.	K. Koga, K. Kamataki, N. Itagaki, M. Shiratani, A deep insight of plasma-nanoparticle interaction, 19th International Congress on Plasma Physics, 2018.06.
47.	古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 水素原子源付プラズマCVD法に任意電圧波形を併用したa-C:H薄膜の堆積, 第65回応用物理学会春季学術講演会, 2018.03.
48.	古閑一憲, 和田陽介, 佐藤僚哉, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 大気圧空気誘電体バリア放電プラズマを照射したカイワレ種子の電子スピン共鳴分光, 第65回応用物理学会春季学術講演会, 2018.03.
49.	古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 任意電圧波形を用いたC7H8+Ar+H2プラズマ生成, 平成30年電気学会全国大会, 2018.03.
50.	K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of RONS Dose on Plasma Induced Growth Enhancement of Radish Sprout, 2nd International Workshop On Plasma Agriculture (IWOPA2), 2018.03.
51.	K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Plasma Enhanced Carbon Recycling for Large-Scale Introduction of Solar Cells to Energy Supply Chain, 5th Korea-Japan Joint Symposium on Advanced Solar Cells 2018, 2nd International Symposium on Energy Research and Application, 2018.02.
52.	K. Koga, G. Uchida, M. Shiratani, Towards ultra-high capacity batteries, Joint workshop btw SKKU and Kyushu University Emerging materials and devices, 2018.01.
53.	K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, A new insight into nanoparticle-plasma interactions (Invited), JP-KO dust workshop, 2017.12.
54.	K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, Evaluation of coupling among interaction fluctuations in nanoparticle growth in reactive plasmas, 18th Workshop on Fine Particle Plasmas, 2017.12.
55.	K. Koga, T. Kojima, S. Toko, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Deposition of High Quality Silicon Thin Films Utilizing Nanoparticles Trapped in Plasmas, 27th annual meeting of MRS-J, 2017.12.
56.	K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Number Density of Seeds on Plasma Induced Plant Growth Enhancement, 27th annual meeting of MRS-J, 2017.12.
57.	K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Gas Flow Velocity on Plant Growth of Radish Sprout, The 2nd Asian Applied Physics Conference (Asian-APC), 2017.12.
58.	古閑一憲, 白谷正治, 植物種子へのプラズマ照射効果による成長促進とその機序（シンポジウム講演）, Plasma Conference 2017, 2017.11.
59.	K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Development of a fine particle transport analyzer for processing plasmas, The 39th International Symposium on Dry Process (DPS 2017), 2017.11.
60.	古閑一憲, 反応性プラズマを用いた物質機能の初期階層形成, 第33回九州･山口プラズマ研究会, 2017.11.
61.	K. Koga, S. Toko, S. Tanida, M. Shiratani, Surface-driven CH4 generation from CO2 in Low-pressure Non-thermal Plasma, American Vacuum Society 64th International Symposium and Exhibition (AVS64), 2017.10.
62.	古閑一憲, 都甲将, 谷田知史, 白谷正治, 細田聡史, 星野健, 火星上CO2のCH4資源化のための低温低圧プラズマ触媒プロセス, 第61回宇宙科学技術連合講演会, 2017.10.
63.	古閑一憲, 和田陽介, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, スケーラブルDBDプラズマのRONS照射量に対する空気流れの効果, 平成29年度（第70回）電気・情報関係学会九州支部連合大会, 2017.09.
64.	K. Koga, S. Toko, M. Shiratani , Hysteresis in Plasma CVD: a new path for high quality film deposition, 11th Asian-European International Conference on Plasma Surface Engineering (AEPSE2017) , 2017.09.
65.	古閑一憲, 和田陽介, 徐鉉雄, 板垣奈穂, 白谷正治, 橋本昌隆, 小島昌治, プラズマ照射した種籾への催芽処理の効果, 第78回応用物理学会秋季学術講演会, 2017.09.
66.	K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles Using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body (Invited), 231st Meeting of Electrochemical Society (ECS), 2017.05.
67.	古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用 , 電子情報通信学会有機エレクトロニクス研究会, 2017.04.
68.	K. Koga, K. Mori, H. Seo, N. Itagaki, M. Shiratani, Corrational study of fluctuation of coupling between plasmas and nanoparticles, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
69.	K. Koga, P. Attri, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Comparision of Gamma irradation and scalable DBD on the declorization of Dyes, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
70.	K. Koga, A. Tanaka, M. Hirata, T. Amano, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Long-term evaluation of In nanoparticle transport in living body, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
71.	古閑一憲, 九州大学における反応性プラズマ精密制御CVD法の紹介（招待講演）, 第1回産学共同研究検討会, 2017.01.
72.	K. Koga, K. Mori, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Time evolution of cross-correlation between two fluctuations of couplings between plasmas and nanoparticles in amplitude modulated discharges , 17th Workshop on Fine Particle Plasmas and JAPAN-KOREA Workshop on Dust Particles 2016, 2016.12.
73.	K. Koga, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, Dependence of amount of plasma activated water on growth enhancement of radish sprout, 26th annual meeting of MRS-J, 2016.12.
74.	K. Koga, T. Amano, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, A. Tanaka, Y. Nakatsu, T. Kondo, Comparative study on death of cells irradiated by non-thermal plasma, X-ray, and UV, The 1st Asian Applied Physics Conference (Asian-APC), 2016.12.
75.	古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, 小型ダスト飛跡分析装置を用いたミラー上ダスト堆積抑制の検討, 第33回プラズマ・核融合学会年会, 2016.12.
76.	古閑一憲, 森研人, 徐鉉雄, 板垣奈穂, 白谷正治 , プラズマとナノ粒子の相互作用ゆらぎの２次元空間構造の時間発展, 第33回プラズマ・核融合学会年会, 2016.11.
77.	古閑一憲 , プラズマCVDを用いた高効率低劣化Si薄膜太陽電池の作製（招待講演）, 第33回プラズマ・核融合学会年会, 2016.11.
78.	古閑一憲, プラズマ計測・診断－反応性プラズマ中微粒子を中心として－（招待講演）, 第2７回プラズマエレクトロニクス講習会, 2016.11.
79.	K. Koga, T. Sarinont, M. Shiratani, Control of Plant Growth by RONS Produced Using Nonthermal Atmospheric Air Plasma , American Vacuum Society 63rd International Symposium and Exhibition (AVS63), 2016.11.
80.	K. Koga, R. Katayama, T. Sarinont, H. Seo, N. Itagaki, P. Attri, E. L. Quiros, .A. Tanaka, M. Shiratani, Comparative study of non-thermal atmospheric pressure discharge plasmas for life science applications, 69th Annual Gaseous Electronics Conference (GEC2016), 2016.10.
81.	K. Koga, T. Amano, Y. Nakatsu, H. Seo, N. Itagaki, A. Tanaka, T. Kondo, M. Shiratani, Time development of response of cells irradiated by non-thermal atmospheric air plasma, 6th International Conference on Plasma Medicine (ICPM6), 2016.09.
82.	古閑一憲, 都甲将, 白谷正治, 火星上でのロケット燃料生成を目的とした低温低圧放電プラズマによるサバティエ反応, 第60回宇宙科学技術連合講演会, 2016.09.
83.	K. Koga, T. Sarinont, P. Attri, M. Shiratani, Nitrite concentration of plants grown from seeds irradiated by air dielectric barrier discharge plasmas, 20th International Vacuum Congress (IVC-20), 2016.08.
84.	古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, LHD実験グループ, QCMを用いたLHD内ダスト堆積量のその場測定, 第11回核融合エネルギー連合講演会, 2016.07.
85.	古閑一憲, 添島雅大, 伊藤鉄平, 徐鉉雄, 板垣奈穂, 白谷正治, プラズマ中微粒子を用いたプラズマポテンシャルゆらぎの評価, 日本物理学会第71回年次大会, 2016.03.
86.	古閑一憲, 「プラズマ材料科学の未来を語る」（低圧非平衡プラズマプロセス） (招待講演), 第125回研究会　APSPT9-SPSM28サテライトミーティング『プラズマ材料科学の未来を語る』, 2016.02.
87.	古閑一憲, 振幅変調反応性高周波放電中のナノ粒子量のバイスペクトル解析, 応用力学研究所共同研究報告会, 2016.02.
88.	古閑一憲, 大気圧非平衡プラズマの基礎 (招待講演), プラズマ・核融合学会第28回専門講習会「プラズマ医療の現状と展望」, 2016.01.
89.	K. Koga and M. Shiratani, Potential fluctuation evaluation using binary collision of fine particles suspended in plasmas (Invited), 第16回微粒子プラズマ研究会, 2015.12.
90.	古閑一憲, 天野孝昭, Thapanut Sarinont, 徐鉉雄, 板垣奈穂, 白谷正治, 中津可道, 平田美由紀, 田中昭代, 液中プラズマを用いたAuとPtナノ粒子の簡易作製法, 平成27年度応用物理学会九州支部学術講演会, 2015.12.
91.	古閑一憲,添島雅大,伊東鉄平,山下大輔,徐鉉雄,板垣奈穂,白谷正治,野口将之,内田誠一, プラズマ中のクーロン衝突微粒子間引力, 第32回プラズマ・核融合学会年会, 2015.11.
92.	古閑一憲, 田浪荘汰, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 新しいプラズマプロセス技術を用いた薄膜堆積, 接合科学共同利用・共同研究拠点大阪大学接合科学研究所平成２７年度共同研究成果発表会, 2015.11.
93.	K. Koga, X. Dong, K. Yamaki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka ,Y. Setsuhara, Effects of Ion Energy on Chemical Bond Configuration in a-C:H Deposited using Ar + H2+ C7H8 Plasma CVD, 37th International Symposium on Dry Process (DPS2015), 2015.11.
94.	K. Koga, T. Amano, T. Sarinont, T. Kondo, S. Kitazaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Interactions between spin trapping reagents and non-thermal air DBD plasmas, 37th International Symposium on Dry Process (DPS2015), 2015.11.
95.	古閑一憲, プラズマ照射に対する生体応答の研究, 第31回九州･山口プラズマ研究会, 2015.11.
96.	K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, M. Shiratani, Improving of Harvest Period and Crop Yield of Arabidopsis Thaliana L. using Nonthermal Atmospheric Air Plasma, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
97.	K. Koga, T. Amano, T. Sarinont, T. Kawasaki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Y. Nakatsu, A. Tanaka, Two Dimentional Visualization of Oxidation Effect of Scalable DBD Plasma Irradiation using KI-starch Solution, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
98.	K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, ICRP9/GEC68/SPP33, 2015.10.
99.	K. Koga, T. Amano, M. Hirata, A. Tanaka, M. Shiratani, In vivo kinetics of nanoparticles synthesized by plasma in water (Invited), The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, 2015.10.
100.	K. Koga, M. Soejima, K. Tomita, T. Ito, H. Seo, N. Itagaki, M. Shiratani, In-situ laser Raman spectroscopy of an optically trapped fine particle, 17th International Symposium on Laser-Aided Plasma Diagnostics (LAPD17) , 2015.09.
101.	K. Koga and M. Shiratani, Control Of Nanoprticle Transport And Their Deposition For Porous Low-k Films By Using Plasma Pertubation (Invited), The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015), 2015.09.
102.	古閑一憲, 添島雅大, 徐鉉雄, 板垣奈穂, 白谷正治, 内田誠一, アルゴンプラズマ中微粒子運動の画像解析によるプラズマパラメータ評価, 日本物理学会　2015年秋季大会, 2015.09.
103.	古閑一憲, 伊東鉄平, 徐鉉雄, 板垣奈穂, 白谷正治, 反応性プラズマ中ナノ粒子とラジカルの非線形結合成分の時空間解析, 日本物理学会　2015年秋季大会, 2015.09.
104.	古閑一憲, 大気圧非平衡プラズマ照射による液中ラジカル生成の相関解析（招待講演）, 新学術領域研究プラズマ・ナノマテリアル動態学の創成と安全安心医療科学の構築第21回医工連携ゼミ, 2015.04.
105.	古閑一憲, 市田大樹, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 非平衡プラズマスパッタリングによる高速低温層交換結晶成長 , 日本物理学会第70回年次大会, 2015.03.
106.	古閑一憲, 市田大樹, 橋本慎史, 徐鉉雄, 山下大輔, 板垣奈穂, 白谷正治, スパッタを用いた低温高速層交換Ge結晶成長に対する基板温度の効果, 第62回応用物理学会春季学術講演会, 2015.03.
107.	古閑一憲, 都甲将, 鳥越祥宏, 毛屋公孝, 徐鉉雄, 板垣奈穂, 白谷正治, 水素化アモルファスシリコン薄膜中Si-H2結合生成に対するクラスタ混入とラジカル表面反応の寄与, 第62回応用物理学会春季学術講演会, 2015.03.
108.	古閑一憲, 天野孝昭, 平田美由紀, 田中昭代, 白谷正治, ラットに皮下投与したInナノ粒子の体内輸送, 第62回応用物理学会春季学術講演会, 2015.03.
109.	古閑一憲, 内田儀一郎, 徐鉉雄, 白谷正治, プロセシングプラズマを用いたIV族半導体ナノ粒子の作製と太陽電池への応用（招待講演）, 平成26年度　東北大学電気通信研究所共同プロジェクト研究会「プラズマナノバイオ・医療の基礎研究」, 2015.02.
110.	K. Koga, T. Ito, H. Seo, N. Itagaki, and M. Shiratani, Temporal development of nonlinear coupling between radicals and nanoparticles in reactive plasmas (Invited), The 75th IUVSTA Workshop on Sheath Phenomena in Plasma Processing of Advanced Materials, 2015.01.
111.	K. Koga, S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, M. Shiratani, Cluster suppressed deposition of a-Si:H films by employing non-linear phenomena in reactive plasmas (Invited), 2015 Japan-Korea Joint Symposium on Advanced Solar Cells, 2015.01.
112.	古閑一憲, サリノントタパナット, 天野孝昭, 白谷正治, 大気圧空気プラズマを照射したカイコの成長, 第24回日本MRS年次大会, 2014.12.
113.	古閑一憲, プラズマ技術の生体・環境分野への応用研究, 九州大学テクノロジーフォーラム2014, 2014.12.
114.	古閑一憲, サリノントタパナット, 北﨑訓, 林信哉, 白谷正治, プラズマ照射によるシロイヌナズナの植物成長促進の世代間伝搬, 第30回　九州・山口プラズマ研究会, 2014.11.
115.	K. Koga, T. Ito, H. Seo, N. Itagaki, M. Shiratani, Analysis of coupling between nanoparticles and radicals using perturbation of radical density in reactive plasmas, Plasma Conference 2014, 2014.11.
116.	K. Koga, T. Ito, K. Kamataki, H. Seo, N. Itagaki, and M. Shiratani, Effects of amplitude modulated VHF discharge on coupling between plasmas and nanoparticles, 24th International Toki Conference, 2014.11.
117.	K. Koga, Y. Morita, T. Ito, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Spatiotemporal Analysis of Nanoparticle Growth in Amplitude Modulated Reactive Plasmas for Understanding Interactions between Plasmas and Nanomaterials (Invited), 15th IUMRS-International Conference in Asia, 2014.08.
118.	古閑一憲, 太陽電池開発の最前線, 2014年度先端サマーセミナー（第6回研究活動交流会）, 2014.08.
119.	K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Quartz crystal microbalance measurements for in-situ evaluation of dust inventory in fusion devices, 26th Symposium on Plasma Physics and Technology, 2014.06.
120.	K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Real time mass measurement of dust particles deposited on vessel wall using quartz crystal microbalances in a divertor simulator, 21th International Conference on Plasma Surface Interactions (PSI2014), 2014.05.
121.	K. Koga, T. Sarinont, T. Amano, and M. Shiratani, Effects of non-thermal air plasma irradiation to plant seeds on glucose concentration of plants, International Workshop on Diagnostics and Modelling for Plasma Medicine (DMPM2014), 2014.05.
122.	古閑一憲, コンビナトリアル細胞活性解析を用いた細胞超活性プラズマの創成 (招待講演), 第8回レーザー学会「レーザーバイオ医療」技術専門委員会, 2014.03.
123.	古閑一憲, プラズマプロセス技術の最近の応用展開 (招待講演), プラズマ・核融合学会九州・沖縄・山口支部　平成25年度第3回特別講演会, 2014.02.
124.	K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida and M. Shiratani, Coupling between radicals in plasmas and nanoparticle growth in initial growth phase in reactive plasmas with amplitude modulation, 18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics, 2014.02.
125.	K. Koga, Y. Hashimoto, S. Toko, D. Yamashita, Y. Torigoe, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Fabrication of highly stable a-Si:H solar cells by suppressing cluster incorporation (Invited), 2014 Japan-Korea Joint Symposium on Advanced Solar Cells, 2014.02.
126.	K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
127.	K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
128.	古閑一憲, プラズマ技術およびその応用可能性について (招待講演), 平成25年度次世代テクノロジーセミナー, 2014.01.
129.	K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Correlation between Plasma Fluctuation and Nanoparticle Amount in Initial Growth Phase in Reactive Plasmas with Amplitude Modulation, 14th Workshop on Fine Particle Plasmas, 2013.12.
130.	K. Koga, G. Uchida, D. Ichida, S. Hashimoto, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Quantum dot sensitized solar cells using group IV semiconductor nanoparticles (Invited), 2013 EMN Fall Meeting , 2013.12.
131.	古閑一憲, 森田康彦, 岩下伸也, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, ナノ粒子成長に対するプラズマ摂動周波数の効果, プラズマ・核融合学会　第30回年会, 2013.12.
132.	K. Koga, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Deposition of Ge Nanoparticle Films and Their Application to Ge Quantum-dot Sensitized Solar Cells, The 23rd International Photovoltaic Science and Engineering Conference, 2013.11.
133.	K. Koga, S. Iwashita, G. Uchida, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, U. Czarnetzki, Carbon Nanostructure formed by high pressure methane plasmas, The 26th Symposium on Plasma Science for Materials (SPSM-26), 2013.09.
134.	K. Koga, A. Tanaka, M. Hirata, N. Hayashi, N. Itagaki and G. Uchida, Comparative Acute Pulmonary Toxicity of Different Types of Indium-Tin Oxide Following Intermittent Intratracheal Instillation to the Lung of Rats, 2013 JSAP-MRS Joint Symposia, 2013.09.
135.	古閑一憲, 橋本優史, 金淵元, 都甲将, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, クラスタ抑制法を用いた高光安定アモルファスシリコンPIN太陽電池の作製, プラズマ研究会, 2013.09.
136.	K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, H. Seo, M. Shiratani and U. Czarnetzki, Formation of self-organized nanostructures using high pressure CH4+Ar plasmas, The 9th Asian-European International Conference on Plasma Surface Engineering　(AEPSE2013), 2013.08.
137.	K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, K. Kamataki, M. Shiratani, U. Czarnetzki, High Pressure Nonthermal Methane Plasmas for Nanoparticle Production, The 12th Asia Pacific Physics Conference (APPC12), 2013.07.
138.	古閑一憲, 森田康彦, 内田儀一郎, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 白谷正治, 振幅変調放電プラズマ中のナノ粒子成長初期におけるナノ粒子量の時空間分布, 2013年第60回応用物理学会春季学術講演会, 2013.03.
139.	K. Koga, D. Yamashita, G. Uchida, M. Shiratani, U. Czarnetzki, Characteristics of high pressure Ar+CH4 nanosecond discharge plasmas for producing nanoparticles, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.02.
140.	K. Koga, D. Yamashita, G. Uchida, M. Shiratani, Single particle trapping in plasmas using laser for studying interaction between a fine particle and palsams, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.01.
141.	K. Koga, Time and space profiles of laser-light scattering intensity from nano-particles and optical emission intensity in amplitude modurated high frequency discharge plasmas, The International LIGLR Workshop on Plasma Science & Technology, 2013.01.
142.	古閑一憲, 西山雄士, 立石瑞樹, 白谷正治, H. Wulff, S. Bornholdt, H. Kersten, プラズマ-壁相互作用によるナノ粒子生成に対する壁へのプラズマ流入角度の効果, 第30回プラズマプロセシング研究会(SPP-30), 2013.01.
143.	古閑一憲, 岩下伸也, 西山雄士, 立石瑞樹, 森田康彦, 山下大輔, 鎌滝晋礼, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 重水素ヘリコンプラズマとグラファイト壁の相互作用により発生したダストの捕集, プラズマ・核融合学会　九州・沖縄・山口支部第16回支部大会, 2012.12.
144.	K. Koga, Y. Wang, D. Ichida, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Deposition of Si nanoparticle composite films for C-Si/Si QDs/organic Solar Cells, 第13回微粒子プラズマ研究会, 2012.12.
145.	古閑一憲, 岩下伸也, 西山雄士, 山下大輔, 鎌滝晋礼, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, グラファイトと重水素プラズマの相互作用で発生したダスト捕集, プラズマ・核融合学会　第29回年会, 2012.11.
146.	古閑一憲, 岩下伸也, 山下大輔, 内田儀一郎, 白谷正治, Czarnetzki U., 高気圧Ar+CH4ナノ秒放電を用いた薄膜堆積とナノ粒子生成, プラズマ・核融合学会　第29回年会, 2012.11.
147.	K. Koga, Plasma Chemical Vapor Deposition for Solar Cells (Invited), 2012 Workshop on Advanced Surface and Material Technologies, 2012.11.
148.	古閑一憲, 岩下伸也, 内田儀一郎, J. Schulze, E. Schungel, P. Hartmann, 白谷正治, Z. Donko, U. Czarnetzki, Electrical Asymmetry Effectを用いた微粒子のシース間輸送, 九州山口プラズマ研究会、応物新領域研究会, 2012.11.
149.	K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Control of Dust Flux in LHD and in a Divertor Simulator, 24th Fusion Energy Conference (IAEA) , 2012.10.
150.	K. Koga, S. Iwashita, M. Shiratani, U. Czarnetzki, Formation of Nanoparticles in High Pressure Reactive Nanosecond Discharges, Asia-Pacific Conference on Plasma Science and Technology　(11th APCPST), 2012.10.
151.	K. Koga, D. Yamashita, S. Kitazaki, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Optical Trapping of Single Fine Particle in Plasmas for study of interactions between a fine particle and plasmas, NANOSMAT 2012, 2012.09.
152.	K. Koga, T. Urakawa, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile and properties of plasma CVD carbon films, 13th International Conference on Plasma Surface Engineering (PSE2012), 2012.09.
153.	K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Effects of Substrate DC Bias Voltage on Dust Collection Efficiency in Large Helical Device, 20th International Conference on Plasma Surface Interactions 2012 (PSI2012), 2012.05.
154.	K. Koga, K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Effects of incorporation of clusters generated in the plasma ignition phase on Schottky cell performance of amorphous silicon films, The Fourth International Workshop on Thin-Film Silicon Solar Cells (IWTFSSC-4), 2012.03.
155.	K. Koga, K. Kamataki, S. Nunomura, S. Iwashita, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, U. Czarnetzki, Three growth modes of nanoparticles generated in reactive plasmas, DPG Spring Meeting of the Section AMOP (SAMOP), 2012.03.
156.	古閑一憲, 浦川達也, 内田儀一郎, 徐鉉雄, 鎌滝晋礼, 板垣奈穂, 白谷正治, 節原裕一, 関根誠, 堀勝, 低温プラズマ異方性CVDを用いた微細トレンチ上面への自己組織カーボンマスク形成, Plasma Conference 2011 (PLASMA2011) , 2011.11.
157.	古閑一憲, プロセスプラズマ中の微粒子挙動研究とその応用（特別講演）, プラズマ科学のフロンティア2011研究会, 2011.09.
158.	古閑一憲, CVDプラズマ中ナノ粒子の制御とその応用 (招待講演), AIST計測・診断システム研究協議会　第８回プラズマ技術研究会, 2011.08.
159.	古閑一憲, 基板バイアスによるダスト捕集の検討, 第9回ＬＨＤにおけるPWI共同研究・検討会, 2011.07.
160.	K. Koga, G. Uchida, M. Sato, Y. Wang, K. Nakahara, K. Kamataki, N. Itagaki, M. Shiratani, Effects of surface treatment on performance of Si nano-particle quantum dot solar cells, The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011), 2011.07.
161.	古閑一憲, 野村卓也, 浦川達也, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, 節原裕一, 関根誠, 堀勝, Deposition of carbon films on top surface of fine trenches at 100℃ using a plasma anisotropic CVD method, 第58回応用物理学関係連合講演会, 2011.03.
162.	古閑一憲、西山雄士、白谷正治, Transport Control of Carbon Nanoparticles in H2 Helicon Discharges by Biasing Wall, ＮＩＦＳダスト研「次世代核融合装置に向けたダスト問題に関する研究会」, 2011.03.
163.	K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics (Invited), Ｉnternational Conference on Advances in Condensed and Nano Materials-2011(ICACNM-2011), 2011.02.
164.	K. Koga, T. Matsunaga, Y. Kawashima, Y. Kim, K. Nakahara, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Radical flux evaluation of high pressure silane plasma CVD using multi-hollow discharges (Invited), The 12th International Workshop on Advanced Plasma Processing and Diagnostics, 2011.01.
165.	古閑一憲, 宮田大嗣, 西山雄士, 岩下伸也, 山下大輔, 松崎秀文, 内田儀一郎, 板垣奈穂, 鎌滝晋礼, 白谷正治, 微細パターン基板へのSiOx-CH3ナノ粒子堆積, 第27回プラズマ・核融合学会年会, 2010.12.
166.	古閑一憲, 宮田大嗣, 西山雄士, 岩下伸也, 山下大輔, 松崎秀文, 内田儀一郎, 板垣奈穂, 鎌滝晋礼, 白谷正治, 芦川直子, 増﨑貴, 西村清彦, 相良明男, LHD実験グループ, プラズマ－カーボン壁相互作用で発生したカーボン微粒子の基板へのフラックス評価, 第27回プラズマ・核融合学会年会, 2010.11.
167.	K. Koga, T. Nomura, G. Uchida, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on the surface of fine structures using plasma CVD (Invited), The 1st Korean-Japan Symposium on Surface Technology, 2010.11.
168.	K. Koga, H. Miyata, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD Experimental Group, Deposition of Nanoparticles using Substrate Bias Voltage, 第23回マイクロプロセス・ナノテクノロジー国際会議（MNC 2010), 2010.11.
169.	古閑一憲, 北﨑訓, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマ-細胞相互作用による細胞活性制御, 第26回九州・山口プラズマ研究会, 2010.11.
170.	K. Koga, K. Nakahara, T. Matsunaga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, High speed deposition of highly stable a-Si:H films using pure silane multi-hollow discharges, Third International Workshop on Thin Film Silicon Solar Cells (IWTFSSC3) , 2010.10.
171.	K. Koga, G. Uchida, Y. Kawashima, M. Sato, K. Yamamoto, K. Nakahara, T. Matsunaga, K. Kamataki, N. Itagaki, M. Shiratani, Si quantum dot-sensitized solar cells using Si nanoparticles produced by multi-hollow discharge, 3rd International Symposium on Innovative Solar Cells, 2010.10.
172.	K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between Si thin films with and without incorporating nanoparticles into the film, 10th Asia Pacific Conference on Plasma Science and Technology (APCPST), 2010.07.
173.	K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for a-Si:H film deposition, 35th IEEE Photovoltaic Specialists Conference (PVSC), 2010.06.
174.	古閑一憲, 宮田大嗣, 白谷正治, へリコンプラズマーカーボン壁相互作用で発生したカーボンダストの電場による収集, 第8回ＬＨＤにおけるＰＷＩ共同研究・検討会, 2010.06.
175.	K. Koga, Plasma CVD for Si thin film solar cells, 2010 International Workshop on Plasma Applications, 2010.06.
176.	K. Koga, S. Iwashita, H. Miyata, M. Shiratani, 振幅変調パルス放電による部分帯電ナノ粒子雲の輸送, 日本地球惑星科学連合年会, 2010.05.
177.	K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, 第27回プラズマプロセシング研究会（SPP-27）, 2010.02.
178.	古閑一憲, 岩下伸也, 宮田大嗣, 山田泰之, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, LHDの第一壁へのダストフラックスの評価, 第2回PWI合同研究会, 2009.12.
179.	古閑一憲, 佐藤宙, 中村ウィリアム誠, 宮原弘臣, 松崎秀文, 白谷正治, シランホロ―放電に対する水素希釈の効果, プラズマ・核融合学会　九州・沖縄・山口支部　第１２回支部大会, 2009.12.
180.	K. Koga, H. Sato, Y. Kawashima, M. Shiratani, High Rate Deposition of Cluster-suppressed Amorphous Silicon Films Deposited Using a Multi-hollow Discharge Plasma CVD, 2009 MRS Fall Meeting, 2009.12.
181.	K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma Treatment of Indium Compounds to Reduce Their Adverse Health Effects, 2009 MRS Fall Meeting, 2009.12.
182.	古閑一憲, 川嶋勇毅, 佐藤宙, 白谷正治, マルチホロ―放電を用いたa-Si:H製膜中の基板温度, 19th Academic Symposium of MRS-Japan 2009, 2009.12.
183.	K. Koga, Y. Kawashima, K. Nakahara, H. Sato, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for third generation solar cells (Invited), 10th Workshop on Fine Particle Plasmas, 2009.11.
184.	古閑一憲, 佐藤　宙, 川嶋勇毅, 白谷正治, マイクロ波共振プローブを用いたH2+SiH4マルチホロー放電の電子密度計測, 第70回応用物理学会学術講演会, 2009.09.
185.	K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma treatment of CIGS to reduce toxicity, Seventh Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), 2009.09.
186.	古閑一憲, 白谷正治, プラズマCVDを用いた微細構造への製膜形状制御（招待講演）, 西日本放電懇談会, 2009.08.
187.	古閑一憲, プラズマCVDの基礎 (Invited), TEL University, 2009.07.
188.	古閑一憲, 岩下伸也, 宮田大嗣, 白谷正治、芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, LHDとモデル実験装置のダストの比較, 第７回ＬＨＤにおけるＰＷＩ共同研究・検討会, 2009.06.
189.	古閑一憲、佐藤宙、川嶋勇毅、中村誠ウィリアム、白谷正治, 高品質光安定a-Si:H薄膜作製用マルチホロー放電における電子密度の空間分布, 電気学会プラズマ研究会, 2009.06.
190.	K. Koga, T. Nomura, M. Shiratani, M. Sekine, Y. Setsuhara, M. Hori, Anisotropic deposition in narrow trenches using hydrogen assisted plasma CVD method, Memorial Symposium for the Retirement of Professor Tachibana “Toward the Next Generation of Plasma Science, Technology”, 2009.05.
191.	K. Koga, Deposition profile control of carbon films in trenches using a plasma CVD method (Invited), The 7th EU-Japan Joint Symposium on Plasma Processing, 2009.04.
192.	古閑一憲, 高品質a-Si堆積用マルチホロー放電プラズマ, 太陽電池製造用新規プラズマ源に関する研究会, 2009.03.
193.	K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani,, M. Kondo, Conductivity of nc-Si films depsited　using multi-hollow discharge plasma CVD method, プラズマ科学シンポジウム２００９／第２６回プラズマプロセシング研究会, 2009.02.
194.	K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara,, M. Shiratani , High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method , プラズマ科学シンポジウム２００９／第２６回プラズマプロセシング研究会, 2009.02.
195.	古閑一憲, プラズマプロセスにおける揺らぎの抑制と増幅 (招待講演), プラズマ・核融合学会「プラズマ－バイオ融合科学への新展開」第２回専門委員会, 2009.01.
196.	古閑一憲, 佐藤宙, 中村ウィリアム誠, 宮原弘臣, 松崎秀文, 白谷正治, シランホロー放電に対する水素希釈の効果, プラズマ・核融合学会　第１２回九州・沖縄・山口支部大会, 2008.12.
197.	K. Koga, S. Iwashita, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Dust Particles in Size Range from 1 nm to 10 μm Sampled in LHD, 9th Workshop on Fine Particle Plasmas, 2008.12.
198.	K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Improvement in deposition rate of a-Si:H films using a low pressure multi-hollow discharge plasma CVD method, ICPP2008 Satellite Meeting on Plasma Physics, Advanced Applications in Aso, 2008.09.
199.	古閑一憲, 中村ウィリアム誠, 佐藤宙, 宮原弘臣, 白谷正治, 水素希釈シラン有磁場マルチホロー放電を用いた高光安定a-Si:H膜の堆積, 2008年秋季第69回応用物理学会学術講演会, 2008.09.
200.	古閑一憲, プラズマCVDを用いたナノ粒子含有多孔質低誘電率膜の作製, 平成２０年度西日本放電懇談会, 2008.08.
201.	K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki,, M. Shiratani , Deposition of highly stable a-Si:H films using hydrogen diluted silane hollow discharge, The 3rd International School of Advanced Plasma Technology, 2008.07.
202.	K. Kｏｇａ, Nano-structure formation using Plasma (Invited), レノバセミナー, 2008.04.
203.	K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Effects of hydrogen dilution on a-Si:H deposition using silane hollow discharges, 第25回プラズマプロセシング研究会, 2008.01.
204.	K. Koga, M. Shiratani, Control of deposition profile of Cu in trenches using ion-enhanced surface reaction (Invited), The 5th International Symposium on Advanced Plasma Processing, Diagnostics, The 1st International Symposium on Flexible Electronics Technology, 2007.04.
205.	K. Koga, M. Shiratani, Y. Watanabe, Cluster-suppressed plasma CVD method employing VHF discharges, Fine Particle Plasmas: Basis, Applications - Third Workshop on Fine Particle Plasmas, 2002.12.
206.	古閑一憲, 甲斐幹英, 白谷正治, 渡辺征夫, プラズマスパッタリングによるSiナノ構造の自己組織的形成, 電気学会　プラズマ研究会, 2002.12.
207.	K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Correlation between cluster amount, qualities of a-Si:H films for SiH4 plasma CVD, American Vaccum Society 49th International Symposium, 2002.11.
208.	古閑一憲, 白谷正治, 古閑一憲, 渡辺征夫, クラスター抑制プラズマCVD法による高品質a-Si:H堆積, 第18回九州・山口プラズマ研究会, 2002.11.
209.	古閑一憲, 今別府謙吾, 白谷正治, 渡辺　征夫, クラスタ抑制プラズマCVD法を用いて堆積したa-Si:H膜の膜質に及ぼす放電周波数の影響, 平成14年度応用物理学会九州支部講演会, 2002.11.
210.	古閑一憲, 甲斐幹英, 白谷正治, 渡辺征夫, シラン高周波放電を用いたナノ結晶シリコンクラスタの生成, 第62回応用物理学学術講演会, 2002.09.
211.	古閑一憲, 白谷正治, 渡辺征夫, アモルファスシリコン作製になぜ放電周波数を高周波化するか？, 西日本放電懇談会, 2002.08.
212.	K. Koga, R. Ueharaa, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasmas, carbon wall, Joint Meeting of 16th European Conference on Atomic, Molecular Physics of Ionized Gases, 5th International Conference on Reactive Plasmas, 2002.07.
213.	K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges, their application to deposition of super high quality a-Si:H films, International Workshop on Information, Electrical Engineering　(IWIE2002), 2002.05.
214.	古閑一憲, 甲斐幹英, 今別府謙吾, 白谷正治, 渡辺征夫, クラスタ抑制ＰＥＣＶＤ法により作製したa-Si:H薄膜の膜質とクラスタ量の相関, 第49回応用物理学関係連合講演会, 2002.03.
215.	古閑一憲, 針貝篤史, 白谷正治, 渡辺征夫, シランプラズマ中のクラスタ量と電子エネルギー分布への放電周波数の影響, 第49回応用物理学関係連合講演会, 2002.03.
216.	古閑一憲, 上原龍児, 白谷正治, 渡辺征夫, 小森彰夫, 水素プラズマとカーボン壁の相互作用による微粒子形成, 第49回応用物理学関係連合講演会, 2002.03.
217.	K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in sub-nm size range, Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
218.	K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in subnm size range (Invited), The Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
219.	K. Koga, M. Shiratani, Y. Watanabe, Preliminary experiments on dust particles formation due to interaction between plasma, graphite wall, Fine Particle Plasmas: Basis, Applications - Second Workshop on Fine Particle Plasmas, 2001.12.
220.	古閑一憲, 白谷正治, 古閑一憲, 渡辺征夫, LSI内微細銅配線形用プラズマCVD, 第17回九州・山口プラズマ研究会, 2001.11.
221.	古閑一憲, 徳安達郎, 上原龍児, 白谷正治, 渡辺征夫, ダイバータ壁とプラズマの相互作用による微粒子形成機構研究用装置の試作, 第18回プラズマ・核融合学会年会, 2001.11.
222.	古閑一憲, 針貝篤史, 白谷正治, 渡辺征夫, 渡邉剛, シラン高周波放電中のクラスタ成長に関する水素希釈と励起周波数の効果, 第62回応用物理学学術講演会, 2001.09.
223.	K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, International Conference on Phenomena in Ionized Gases, 2001.07.
224.	古閑一憲, 園田剛士, 鹿谷昇, 白谷正治, 渡辺征夫, クラスタ抑制プラズマCVD装置による高品質a-Si:H作製, 第48回応用物理学関係連合講演会, 2001.03.
225.	古閑一憲, 田中健一, 白谷正治, 渡辺征夫, 水素希釈シラン高周波放電中の電子密度及びイオン密度, 第48回応用物理学関係連合講演会, 2001.03.
226.	K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution, excitation frequency on initial growth of clusters in silane plasmas, Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
227.	古閑一憲, 徳安　達郎, 白谷正治, 渡辺征夫, シランプラズマ中に発生する微粒子の表面付着確率, 平成12年度応用物理学会九州支部講演会, 2000.12.
228.	古閑一憲, 田中健一, 徳安達郎, 白谷正治, 渡辺征夫, シランプラズマ中のSinHxクラスタ核のその場計測と成長制御, プラズマ・核融合学会九州地区第4回研究発表講演会, 2000.12.
229.	K. Koga, K. Tanaka, T. Tokuyasu, M. Shiratani, Y. Watanabe, Initial growth of clusters in silane rf discharges, 53rd Annual Gaseous Electronics Conference, 2000.10.
230.	古閑一憲, 田中健一, 白谷正治, 渡辺征夫, シランプラズマ中のクラスタ成長に対する水素希釈・放電周波数の効果, 第61回応用物理学学術講演会, 2000.09.
231.	古閑一憲, 徳安達郎, 白谷正治, 渡辺征夫, シラン高周波放電中クラスタの表面付着確率, 第61回応用物理学学術講演会, 2000.09.
232.	古閑一憲, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, シラン高周波放電中のクラスタのサイズ・密度測定, 第47回応用物理学関係連合講演会, 2000.03.
233.	古閑一憲, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, プラズマ中のクラスタの新計測法, 第17回プラズマプロセシング研究会, 2000.01.
234.	古閑一憲, 前田真一, 白谷正治, 渡辺征夫, シランプラズマ中の微粒子成長の基板材料依存性, 平成11年度応用物理学会九州支部講演会, 1999.12.
235.	古閑一憲, 前田真一, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, 反応性プラズマにおける微粒子発生, プラズマ・核融合学会九州地区第3回研究発表講演会, 1999.12.
236.	古閑一憲, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, 水素希釈によるシラン高周波放電中微小微粒子の抑制効果, 第60回応用物理学学術講演会, 1999.09.
237.	古閑一憲, シラン高周波放電における微小微粒子の抑制, 西日本放電懇談会, 1999.08.
238.	K. Koga, H. Naitou, Y. Kawai, Characteristics of Asymmetric Ion Sheath in a Negative Ion Plasma, 2nd International Conference on the Physics of Dusty Plasmas, 1999.05.
239.	古閑一憲, 内藤裕志, 河合良信, イオンシース不安定性と非対称イオンシース構造, プラズマ・核融合学会九州地区第2回研究発表講演会, 1999.02.

特許出願・取得

特許出願件数 10件

特許登録件数 7件

その他の優れた研究業績

2012.03, Best Presentation Award of ISplasma 2012.

2012.03, 平成23年度高温学会論文賞.

2010.11, プラズマナノ界面工学センターのセンター長としてフランスのジョセフ・フーリエ大学名誉教授と国際共同研究を推進.

2009.01, プラズマナノ界面工学センターのセンター長としてドイツのルール大学教授と国際共同研究を推進.

学会活動

所属学会名

日本MRS

Materials Research Society

American Vacuum Society

応用物理学会

物理学会

電気学会

プラズマ・核融合学会

学協会役員等への就任

2022.06～2024.06, 日本表面真空学会, 理事.

2019.07～2023.06, International Conference on Phenomena in Ionized Gases, International Organizing Committee Chair.

2017.04～2021.03, Association of Asia Pacific Physical Societies, Division of Plasma Physics, 副会長.

2019.06～2021.05, 日本MRS, 会長.

2016.04～2018.03, IUMRS-ICA, ｾｯｼｮﾝｵｰｶﾞﾅｲｻﾞｰ.

2016.04～2018.03, 日本MRS, ｾｯｼｮﾝｵｰｶﾞﾅｲｻﾞｰ.

2016.04～2018.03, Asian-European International Conference on Plasma Surface Engineering Asian Joint Committee, Vice Chair.

2017.06～2019.06, 日本MRS, 理事.

2017.04～2018.03, 日本表面科学会, 九州支部　平成29年度支部監査.

2016.04～2018.03, プラズマ・核融合学会, 九州・山口支部監事.

2016.04～2018.03, 応用物理学会, プラズマエレクトロニクス分科会諮問委員.

2016.12～2017.11, 日本学術振興会, 科学研究費専門委員.

2016.04～2017.03, 応用物理学会, 業績賞選考委員.

2016.04～2018.03, 応用物理学会, 九州支部貢献賞選考委員長.

2016.04～2018.03, 日本MRS, 講演奨励賞選考委員長.

2016.04～2018.03, プラズマ材料科学, 賞選考委員長.

2014.06～2017.03, 応用物理学会, 九州支部貢献賞委員会委員長.

2011.04～2022.03, 応用物理学会, プラズマエレクトロニクス分科会諮問委員.

2016.04～2018.03, 応用物理学会, 九州支部監事.

2014.04～2018.03, 九州・山口ﾌﾟﾗｽﾞﾏ研究会, 代表.

2012.04～2015.03, 西日本放電懇談会, 会長.

2012.04～2018.03, 日本学術振興会第153委員会, 副委員長・学界委員・運営委員.

2013.01～2018.05, Plasma Physics under Asia Pacific Physical Societies, The Vice Chair of Division.

2016.06～2018.06, プラズマ・核融合学会, 副会長.

2013.01～2023.05, Plasma Physics under Asia Pacific Physical Societies, The Vice Chair of Division.

2009.05～2011.11, American Vacuum Society PSTD , Executive Committee.

2008.04～2018.03, 微粒子ﾌﾟﾗｽﾞﾏ研究会, 幹事.

2012.05～2012.11, Gaseous Electronics Conference Executive Committee, 委員.

2012.05～2015.05, American Physical Society, Division of Plasma Physics, Program Committee, 委員.

2012.04～2015.03, 日本学術振興会第153委員会, 学界委員.

2012.04～2015.03, 西日本放電懇談会, 会長.

2012.04～2014.03, 応用物理学会, 九州支部副支部長.

2011.04～2015.03, 応用物理学会, プラズマエレクトロニクス分科会諮問委員.

2014.06～2015.03, 応用物理学会, 九州支部貢献賞委員会委員長.

2015.08～2022.07, International Scientific Committee of ICPIG , 委員会委員.

2015.06～2015.07, 熊本大学外部評価委員会, 情報電気電子工学専攻テニュア外部評価委員.

2015.06～2015.11, 大阪大学接合科学研究所, 外部評価委員.

2015.05～2016.06, ISO/TC107, WG member.

2013.12～2016.05, オーストラリア, 科学研究費評価委員.

2013.12～2014.05, Netherlands Organisation for Scientific Research (NWO), オランダ科学研究費評価委員.

2011.06～2011.11, 大阪大学接合科学研究所, 外部評価委員.

2011.06～2012.05, National Research Foundation Grant Proposal, Singaporeの研究費審査委員.

2011.12～2012.11, 文部科学省, 科学研究費補助金審査委員.

2009.12～2010.11, 文部科学省, 科学研究費補助金審査委員.

2008.12～2009.03, 応用物理学会, プラズマエレクトロニクス賞審査副委員長.

2009.12～2010.11, Times Higher Education World University Rankings, 評価者.

2007.12～2008.11, 太陽光発電技術研究組合（PVTEC）, 薄膜シリコン先導研究技術分科会委員.

2007.12～2009.11, 核融合科学研究所, 共同研究委員会委員.

2014.03～2016.06, Association of Asia Pacific Physical Societies-division of plasma physics(AAPPS-DPP), Vice Chair.

2012.06～2016.06, プラズマ・核融合学会, 九州支部長.

2014.04～2016.03, 応用物理学会, 九州支部長.

2014.04～2016.03, 応用物理学会, 理事.

2012.06～2016.06, プラズマ・核融合学会, 理事.

2011.10～2013.10, American Physical Society, Gaseous Electronics Conference Executive Committee.

2011.05～2013.03, マス・フォア・インダストリ研究所, サイエンス・アドバイザリー.

2011.05～2014.03, 応用物理学会プラズマエレクトロニクス分科会, 諮問委員.

2011.04～2013.03, 応用物理学会, 論文賞委員会委員.

2011.03～2011.11, Plasma Conference 2011 (略称: PLASMA2011)/プラズマ・核融合学会第28回年会/応用物理学会第29回プラズマプロセシング研究会/日本物理学会（領域2）2011年秋季大会, 組織委員, プログラム委員長.

2010.12～2012.03, Australian Research Council Assessor(オーストラリア学術会議評価者), 評価者.

2010.04～2014.03, 応用物理学会, 評議員.

2009.12～2011.03, 応用物理学会, プラズマエレクトロニクス賞審査委員.

2009.10～2011.11, AVS Plasma Science and Technology Division, Executive Committee.

2009.01～2011.03, プラズマ関連学協会連合組織, 運営委員.

2008.04～2012.03, プラズマ核融合学会, 九州支部理事.

2008.04～2011.03, 応用物理学会, 九州支部理事.

2008.03～2010.02, 応用物理学会, プラズマエレクトロニクス分科会幹事長.

2008.01～2012.03, QS World University Rankings 2011, 評価者.

2007.04～2016.03, 科学技術動向研究センター, 専門調査委員.

2006.04～2012.03, 物質・材料研究機構物質研究所, リサーチアドバイザー.

2006.04～2016.03, 核融合科学研究所, 共同研究員.

2005.04～2012.03, 応用物理学会, リフレッシュ理科教室実行委員.

2005.04～2016.03, 大阪大学接合科学研究所, 共同研究員.

2004.07～2012.03, プラズマ・核融合学会, 広報委員.

2004.04～2012.03, 応用物理学会, 幹事.

2003.04～2004.03, 応用物理学会, 代議員.

2002.04～2004.03, 応用物理学会, プラズマエレクトロニクス分科会副幹事長.

2001.12～2012.03, 微粒子プラズマ研究会, 世話役.

2001.01～2006.03, ドライプロセス国際シンポジウム, 論文委員.

2001.01～2012.03, 応用物理学会, 講演会世話人.

2000.04～2002.03, 応用物理学会, 編集委員会委員.

2000.04～2002.03, 応用物理学会, プラズマエレクトロニクス分科会幹事.

2000.01～2002.03, 電気学会, 編集専門第３部会委員.

2000.01～2002.03, 電気学会, 編集専門第２部会委員.

1999.01～2002.03, 電気学会, 活動推進委員.

1999.01～2001.03, 電気学会, ホームページ運用委員会委員.

1999.01～1999.12, 応用物理学会, 第17回プラズマプロセシング研究会現地実行委員.

1999.01～2002.03, 電気学会, 九州支部総務幹事.

1998.04～2012.03, フロンティアプロセス研究会, 幹事.

1998.04～2012.03, 微粒子プラズマ研究会, 幹事.

1993.04～1994.03, 応用物理学会, プラズマエレクトロニクス分科会サマースクール企画担当幹事.

1992.04～1994.03, 応用物理学会, プラズマエレクトロニクス分科会幹事.

1992.04～1992.12, 応用物理学会, 第9回プラズマプロセシング研究会現地実行委員.

学会大会・会議・シンポジウム等における役割

2017.09.18～2017.09.23, 1st Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2017), 座長（Chairmanship）.

2017.07.09～2017.07.14, International Conference on Phenomena in Ionized Gases (ICPIG 2017), 座長（Chairmanship）.

2017.01.16～2017.01.18, 第34回プラズマプロセシング研究会(SPP34)／第29回プラズマ材料科学シンポジウム(SPSM29), 座長（Chairmanship）.

2016.12.17～2016.12.18, プラズマ・核融合学会九州・沖縄・山口支部第20回支部大会, 座長（Chairmanship）.

2016.10.21～2016.10.24, The First International Conference on Hybridized Agriculture, 座長（Chairmanship）.

2016.09.04～2016.09.09, 6th International Conference on Plasma Medicine (ICPM6), 座長（Chairmanship）.

2016.03.19～2016.03.22, 第63回応用物理学会春季学術講演会, 座長（Chairmanship）.

2015.09.13～2015.09.16, 第76回応用物理学会秋季学術講演会, 座長（Chairmanship）.

2015.06.24～2015.06.26, 2015 International Forum on Functional Materials (IFFM2015), 座長（Chairmanship）.

2015.04.20～2015.04.24, The International Conference on Metallurgical Coatings and Thin Films (ICMCTF2015), 座長（Chairmanship）.

2014.11.30～2014.12.05, 2014 MRS Fall Meeting, 座長（Chairmanship）.

2014.11.02～2014.11.07, 67th Annual Gaseous Electronics Conference, 座長（Chairmanship）.

2014.05.18～2014.05.23, 5th International Conference on Plasma Medicine (ICPM5), 座長（Chairmanship）.

2014.03.17～2014.03.20, 2014年第61回応用物理学会春季学術講演会, 座長（Chairmanship）.

2013.12.21～2013.12.22, プラズマ・核融合学会　九州・沖縄・山口支部第17回支部大会, 座長（Chairmanship）.

2013.12.09～2013.12.11, 23rd Annual Meeting of MRS-JAPAN 2013, 座長（Chairmanship）.

2012.11～2012.11.16, The 34th International Symposium on Dry Process , 座長（Chairmanship）.

2012.10～2012.10.26, 65th Annual Gaseous Electronics Conference, 座長（Chairmanship）.

2012.10～2012.10.05, Asia-Pacific Conference on Plasma Science and Technology, 座長（Chairmanship）.

2012.09～2012.09.28, IUMRS‐ICEM 2012 , 座長（Chairmanship）.

2012.08～2012.08.14, The 2nd International Symposium for Plasma Biosciences-2012, 座長（Chairmanship）.

2012.01.16～2012.01.18, 第８回日欧プラズマプロセス共同シンポジウム, 司会（Moderator）.

2011.12.19～2011.12.21, 第21回日本MRS学術シンポジウム, 座長（Chairmanship）.

2011.12.17～2011.12.18, プラズマ・核融合学会第15回九州・沖縄・山口支部大会, 座長（Chairmanship）.

2011.11.14～2011.11.18, 64th Gaseous Electronics Conference , 座長（Chairmanship）.

2011.11.08～2011.11.11, (ICTF-15)第15回薄膜国際会議, 座長（Chairmanship）.

2010.12.18～2010.12.19, プラズマ・核融合学会九州・沖縄・山口支部　第14回支部大会, 座長（Chairmanship）.

2010.11.05～2010.11.06, 第26 回九州・山口プラズマ研究会, 座長（Chairmanship）.

2008.11.29～2008.11.30, 応用物理学会九州支部学術講演会, 座長（Chairmanship）.

2008.06, Interfinish 2008, 座長（Chairmanship）.

2006.11.28～2006.12.01, 第23回プラズマ・核融合学会年会, 座長（Chairmanship）.

2005.08, International Symposium on EcoTopia Science2005 (ISETS05), 座長（Chairmanship）.

2004.07, The 7th Asia Pacific Conference on Plasma Sicence and Technology and the 17th Symposium on Plasma Science for Materials, 座長（Chairmanship）.

2017.09.14～2017.09.16, 1st global plasma life fair, Organizing committee member.

2017.09.11～2017.09.15, AEPSE 2017, International Program Committee.

2017.09.05～2017.09.08, 応用物理学会秋季学術講演会, 現地実行委員.

2016.10.21～2016.10.24, First International Conference on Hybridized Agriculture, nternational Advisory Committee Member.

2017.03.01～2017.03.05, ISPlasma2017, 組織委員・編集委員.

2016.11.21～2016.11.22, 38th International Dry Process Symposium(DPS2016), プログラム委員・出版委員.

2016.11.17～2016.11.18, 第7回薄膜太陽電池セミナー, 組織委員.

2015.11.05～2015.11.06, 37th International Symposium on Dry Process(DPS 2015）, プログラム委員.

2015.12.02～2015.12.15, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9) and 28th Symposium on Plasma Science for Materials (SPSM-28), 現地実行委員.

2013.08.29～2013.08.30, 35th International Symposium on Dry Process(DPS2013), プログラム委員.

2014.11.27～2014.11.28, 36th International Symposium on Dry Process (DPS2014), プログラム委員・出版委員.

2015.09.20～2015.09.24, (AEPSE 2015)Asian-European International Conference on Plasma Surface Engineering, プログラム委員長.

2012.11.15～2012.11.16, 34th International Symposium on Dry Process(DPS2012), プログラム委員・出版委員.

2012.03.09～2012.03.10, (IC-PLANTS 2012)The 5th International Conference on Plasma-Nanotechnology & Science, 共同組織委員長.

2011.11.22～2011.11.25, Plasma Conference 2011 (PLASMA2011), 組織委員, プログラム委員長.

2011.11.10～2011.11.11, (DPS2011)33rd International Symposium on Dry Process , プログラム委員、出版委員.

2009.09.24～2009.09.25, International Dry Process Symposium 2009, 実行委員長・出版副委員長.

2011.10.24～2011.10.25, 第３回薄膜太陽電池セミナー, 組織委員.

2008.11.26～2008.11.28, International Dry Process SYmposium 2008, 副出版委員長.

2011.09.19～2011.09.22, (AEPSE 2011)Asian-European International Conference on Plasma Surface Engineering, 組織委員.

2007.11.13～2007.11.14, International Dry Process SYmposium 2007, 出版委員長.

2011.07.19～2011.07.20, (SPSM-24）第24回プラズマ材料科学シンポジウム, 運営委員会委員.

2007.12.07～2007.12.09, 2007 MRS-J, セッションチェア.

2011.07.04～2011.07.07, (ICMAP-2011)The 3rd International Conference on Microelectronics and Plasma Technology, International Organizing Committee.

2014.12.10～2014.12.12, 2014MRS-J , Session orgnizer.

2013.12.09～2013.12.11, 2013MRS-J, Session orgnizer.

2012.03.04～2012.03.08, ISPlasma2012(4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials), 委員（組織委員会、プログラム委員会）.

2008.12.09～2008.12.13, IUMRS-ICA2008, セッションチェア.

2011.03.10～2011.03.12, (IC-PLANTS 2011)The 4th International Conference on Plasma-Nanotechnology & Science, 共同組織委員長.

2008.12.19～2008.12.20, AFI/TFI2008, 組織委員.

2011.03.06～2011.03.09, ISPlasma2011(3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials), 委員（組織委員会、プログラム委員会、編集委員会）.

2013.12～2013.12, 14th Workshop on Fine Particle Plasma, Orgnizer.

2010.12.10～2010.12.10, 20th MRS-Japan Academic Symposium, Contact Chairperson（sessionA).

2010.09.14～2010.09.17, 2010応用物理学会秋季講演会, 現地実行委員.

2010.11.11～2010.11.12, (DPS2010)32rd International Symposium on Dry Process , 組織委員、出版委員.

2014.11.30～2014.12.05, 2014 MRS-Fall Meeting, Leading Orgnizer.

2010.10.17～2010.10.22, AVS 57th International Symposium & Exhibition , Executive Committee.

2014.02.03～2014.02.07, 8th International Conference on Reactive Plasmas（ICRP-8), 組織委員長.

2010.10.11～2010.10.14, (IWTFSSC-3)Third International Workshop on Thin Film Silicon Solar Cells, General Chair Person.

2015.04.20～2015.04.24, ICMCTF2015 , Session orgnizer.

2010.10.04～2010.10.08, (ICRP)63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas , 出版委員.

2013.02.02～2013.02.03, IC-PLANTS2013, 副組織委員長.

2010.01.08～2010.01.10, The 10th International Workshop of Advanced Plasma Processing and Diagnostics, Organizing Chairperson.

2010.11.21～2010.11.24, IEEE TENCON2010, 実行委員.

2009.12.07～2009.12.09, 2009 MRS-J Symposium, Contact Chairperson.

2008.09.08～2008.09.12, International Congress on Plasma Physics（ICPP2008）, プログラム委員、現地実行委員.

2005.11, 5th International Symposium on Dry Process, Program Committee.

2010.03.07～2010.03.10, ISPlasma2010, プログラム委員.

2004.12～2005.11, The 15th Symposium of the Materials Research Society of Japan, Chairperson.

2013.01.28～2013.02.01, ISPlasma2013, 組織委員・プログラム委員・編集委員.

2004.11, 4th International Symposium on Dry Process, Program Committee.

2014.03.02～2014.03.06, ISPlasma2014, 組織委員・プログラム委員・編集委員.

2004.07, The 7th Asia Pacific Conference on Plasma Sicence and Technology and the 17th Symposium on Plasma Science for Materials, Local Organizing Commitee.

2015.03.26～2015.03.31, ISPlasma2015/IC-PLANTS2015, 組織委員・プログラム委員・編集委員.

2003.08～2004.07, フロンティアプロセス2003, 組織委員.

2016.03.06～2016.03.10, ISPlasma2016/IC-PLANTS2016, 組織委員.

2002.07～2003.06, フロンティアプロセス2002, 組織委員.

2014.08.24～2014.08.30, IUMRS-ICA2014 , Session orgnizer・シンポジウム現地実行委員.

2012.09.23～2012.09.28, IUMRS-ICEM2012, 組織委員.

2012.04.09～2012.04.13, 2012MRS-Spring Meeting Session WW orgnizer, Session WW orgnizer.

2012.10.02～2012.10.05, The 11th Asia Pacific Conference on Plasma Science and Technology(APCPST), Program Committee.

2013.07.14～2013.07.19, The 12th Asia-Pacific Physics Conference(APPC12), Program Committee.

2012.11.27～2012.11.30, プラズマ・核融合学会第29回年会, 実行委員長.

2013.09.23～2013.09.24, 第26回プラズマ材料科学シンポジウム(SPSM26）, 運営委員長.

2016.08.22～2016.08.25, IEEE Nano 2016, 組織委員.

学会誌・雑誌・著書の編集への参加状況

2016.04～2018.03, Plasma Processes and Polymers特集号, 国際, 編集委員長.

2016.04～2018.03, Surface Coatings and Technology 特集号, 国際, 編集委員.

2016.04～2018.03, Journal of Physics D 特集号, 国内, 編集委員.

2016.04～2018.03, Plasma Medicine特集号, 国内, 編集委員.

2016.04～2018.03, Transaction of MRS-J特集号, 国内, 編集委員.

2016.04～2018.03, Japanese Journal Applied Physics特集号, 国内, 編集委員.

2016.04～2018.03, Reviews of Modern Plasma Physics, 国際, 編集委員.

2012.04～2014.03, Transactions of Materials Research Society of Japan, 国内, 編集委員.

2012.04～2014.03, Japanese Journal of Applied Physics　特集号, 国内, 編集委員.

2007.04～2011.03, Japanese Journal of Applied Physicst　特集号, 国内, 編集委員.

2005.04～2008.03, Japanese Journal of Applied Physics, 国内, 編集委員.

2000.04～2001.03, 電気学会誌, 国内, 編集委員.

2000.04～2002.03, 応用物理, 国内, 編集委員.

学術論文等の審査

年度	外国語雑誌査読論文数	合計
2016年度	1	1
2015年度	9	9
2014年度	12	12
2013年度	11	11
2012年度	7	7
2004年度	20	20

その他の研究活動

海外渡航状況, 海外での教育研究歴

Mount Holyoke College, UnitedStatesofAmerica, 2006.07～2006.07.

Institute of Physics, Belgrade, , 2007.03～2007.03.

PRIAM/ONERA, France, 1996.03～1997.01.

外国人研究者等の受入れ状況

2017.02～2017.05, 1ヶ月以上, University of Kiel, Germany, 学内資金.

2017.02～2017.02, 2週間未満, University of Kiel, Germany, 学内資金.

2016.11～2016.11, 2週間未満, Sungkyunkwan University（Korea）, Korea, Sungkyunkwan University.

2016.05～2016.07, 1ヶ月以上, California State University, Fresno, UnitedStatesofAmerica, 学内資金.

2016.01～2016.11, 1ヶ月以上, Kwangwoon University, India, 日本学術振興会.

2015.09～2015.09, 2週間未満, University of Kiel, Germany, 学内資金.

2015.01～2015.01, 2週間未満, Sungkyunkwan University（Korea）, Korea, 学内資金.

2014.08～2014.08, 2週間未満, University of Kiel, Germany, 学内資金.

2014.07～2014.08, 1ヶ月以上, Kwangwoon University（Korea）, Korea, 学内資金.

2014.03～2014.03, 2週間以上1ヶ月未満, Indian Institute of Technology Madras, India, 日本学術振興会.

2011.08～2011.09, 2週間以上1ヶ月未満, University of Kiel, Germany, 学内資金.

2010.11～2010.12, 2週間未満, Université Joseph Fourier, France, 学内資金.

2010.08～2010.08, 2週間未満, Sungkyunkwan University（Korea）, Korea, 文部科学省.

2004.07～2004.08, 1ヶ月以上, オルレアン大学（フランス）, Algeria, 学内資金.

1998.01～1998.03, 2週間未満, Universidade Federal do Parana（ブラジル）, Russia, 日本学術振興会.

1994.09～1996.10, 1ヶ月以上, インド国立プラズマ研究所, India, 日本学術振興会.

受賞

大阪大学接合科学共同利用・共同研究賞, 大阪大学接合科学研究所, 2017.06.

TOP DOWNLOADED ARTICLE 2017-2018, Plasma Processes and Polymers, 2019.06.

MRS-J貢献賞, 日本MRS, 2019.11.

2023 Plasma Materials Science Hall of Fame Prize, 名古屋大学低温プラズマ科学研究センター, 2023.03.

ICRP Most Cited Paper Award, 応用物理学会プラズマエレクトロニクス分科会, 2022.10.

第12回シリコンテクノロジー分科会論文賞, 応用物理学会シリコンテクノロジー分科会, 2021.03.

応用物理学会支部貢献賞, 応用物理学会九州支部, 2018.12.

第14回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2016.03.

第17回プラズマ材料科学賞基礎部門賞, 日本学術振興会プラズマ材料科学第153委員会, 2015.12.

ICMAP2014 Best Poster Presentation Award , International Conference of Microelectronics ans Plasma Technology 2014 (ICMAP2014), 2014.07.

第7回（2013年度）応用物理学会フェロー表彰, 応用物理学会, 2013.09.

The 9th Asian-European International Conference of Plasma Surface Engineering（AEPSE2013）/ Outstanding Poster Award, The 9th Asian-European International Conference on Plasma Surface Engineering , 2013.08.

平成２４年度九州大学研究活動表彰, 九州大学, 2012.11.

Advanced Plasma Application Award, 11th Asia Pacific Conference on Plasma Science adn Technology (APCPST) & 25th Symposium on Plasma Science for Materials (SPSM), 2012.10.

ISPlasma2012 "Best Presentation Award", ISPlasma2012, 2012.03.

平成２３年度高温学会論文賞, 社団法人高温学会, 2011.03.

平成２２年九州大学研究活動表彰, 九州大学, 2010.05.

応用物理学会第8回APEX/JJAP編集貢献賞, 応用物理学会, 2010.04.

平成２１年九州大学産学連携活動表彰, 九州大学, 2009.05.

Invited Presentation Award at Interfinish 2008, Interfinish 2008 World Congress and Exposition, 2008.06.

応用物理学会第３回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2005.03.

応用物理学会第２回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2004.03.

日本学術振興会第１回プラズマ材料科学賞, 日本学術振興会, 1998.01.

平成７年度電気学会論文発表賞A, 電気学会, 1996.03.

平成３年度電気学会論文発表賞B, 電気学会, 1992.04.

九州大学工学部電気工学教室宮崎賞 , 九州大学, 1983.03.

研究資金

科学研究費補助金の採択状況(文部科学省、日本学術振興会)

2020年度～2023年度, 基盤研究(A), 代表, プラズマ中光捕捉微粒子を用いたシース電場の時空間構造揺らぎ形成機構の解明.

2018年度～2021年度, 基盤研究(B), 分担, スパッタエピタキシーによる革新的エキシトンデバイスの実現と励起子輸送機構の解明.

2016年度～2017年度, 挑戦的萌芽研究, 代表, 圧力可変マイクロプラズマによる異方性プラズマCVD.

2014年度～2018年度, 基盤研究(A), 代表, プラズマを用いたナノ粒子精密配置制御の学術基盤創成.

2014年度～2015年度, 挑戦的萌芽研究, 代表, コンパクトドリフトチューブ型ナノ粒子検出法の創成.

2014年度～2014年度, 新学術領域研究, 代表, プラズマとナノ界面の相互作用に関する学術統合研究.

2010年度～2011年度, 挑戦的萌芽研究, 代表, 細胞周期同期パルスプラズマ照射による細胞増殖加速.

2009年度～2013年度, 新学術領域研究, 代表, プラズマとナノ界面の相互作用に関する総括研究.

2009年度～2013年度, 新学術領域研究, 代表, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生.

2008年度～2010年度, 基盤研究(B), 代表, ナノブロック輸送・配置の学術・技術基盤構築.

2007年度～2009年度, 基盤研究(B), 分担, 微粒子プラズマによる臨界現象.

2007年度～2009年度, 基盤研究(B), 分担, インジウム新素材によるインジウム肺症の実験的研究.

2007年度～2008年度, 基盤研究(C), 分担, 炭素クラスターのアーク合成におけるクラスター径と密度の空間分布測定.

2006年度～2007年度, 萌芽研究, 代表, プラズマを用いたナノカプセルの創製と物質内包技術の開発.

2004年度～2006年度, 基盤研究(B), 代表, ナノ構造の新作製法としてのプラズマ異方性CVD.

2003年度～2004年度, 萌芽研究, 代表, 微重力反応性プラズマ中の微粒子成長.

1999年度～2000年度, 基盤研究(B), 分担, シランプラズマ中のSiクラスタの成長機構に関する研究.

1996年度～1997年度, 試験研究(B), 代表, 気相中微粒子の粒径・密度・屈折率の超高感度レーザ偏光散乱その場計測法の開発.

1995年度～1995年度, 奨励研究(A), 代表, プラズマCVD法による銅薄膜の選択形成に関する研究.

1994年度～1994年度, 奨励研究(A), 代表, プラズマCVDによる銅薄膜形成に関する研究.

1992年度～1992年度, 奨励研究(A), 代表, 微粒子プラズマに関する実験的研究.

1989年度～1989年度, 奨励研究(A), 代表, シランプラズマ中における微粒子発生機構に関する研究.

日本学術振興会への採択状況(科学研究費補助金以外)

2019年度～2020年度, 二国間交流, 代表, ナノ構造デラフォス陰極と両面受光型光電デバイスの結合型無バイアス太陽燃料高効率化.

2000年度～2002年度, 二国間交流, 分担, プラズマCVD装置中のクラスタの成長と抑制.

1997年度～1999年度, 二国間交流, 分担, 反応性プラズマ中の微粒子成長機構に関する研究.

競争的資金(受託研究を含む)の採択状況

2018年度～2020年度, 戦略的基盤技術高度化支援事業, 分担, 植物成長促進による植物工場の生産性向上を実現する照射環境制御型プラズマ援用種子処理装置開発.

2015年度～2016年度, JST「太陽系フロンティア開拓による人類の生存圏・活動領域拡大に向けたオープンイノベーションハブ」, 分担, プラズマ・触媒ナノ粒子複合反応場によるCO2資源化技術の開発.

2013年度～2014年度, NEDO, 分担, 高度秩序構造を有する薄膜多接合太陽電池の研究開発ー新概念新材料の検討ー(継続).

2012年度～2012年度, 地域イノベーション戦略支援プログラム（都市エリア型）可能性試験, 代表, リチウムイオン電池用Si系ナノ粒子含有ポーラス負極に関する研究開発.

2010年度～2010年度, 核融合科学研究所一般共同研究, 代表, LHD第一壁へのダストフラックスに対する壁電位の効果.

2010年度～2010年度, 核融合科学研究所一般共同研究, 代表, 微粒子プラズマのフロンティア.

2010年度～2014年度, NEDO, 分担, ナノ粒子制御によるアモルファスシリコンセルの高光安定化に関する研究.

2009年度～2009年度, 核融合科学研究所一般共同研究, 代表, LHD内壁へのダスト付着量の壁電位依存性に関する研究.

2008年度～2014年度, NEDO, 分担, 高度秩序構造を有する薄膜多接合太陽電池の研究開発ー新概念新材料の検討ー.

2008年度～2008年度, 核融合科学研究所一般共同研究, 代表, LHDダストとモデル実験装置ダストの比較.

2007年度～2011年度, 戦略的創造研究推進事業 (文部科学省), 分担, プラズマナノ科学創成によるプロセスナビゲーション構築とソフト材料加工.

2006年度～2007年度, 核融合科学研究所一般共同研究, 代表, LHDにおけるダストのその場サンプリングと分析.

2004年度～2005年度, NEDO, 代表, ナノ結晶シリコントップセル化技術開発.

共同研究、受託研究(競争的資金を除く)の受入状況

2022.10～2023.03, 代表, 実験とシミュレーションの機械学習連携によるプラズマCVD における一般則の導出.

2018.04～2023.09, 代表, Tailored waveformを用いたナノクラスタ制御PECVD技術の研究.

2020.10～2022.09, 代表, プラズマCVDにおけるプラズマ変調による成膜機構の研究.

2013.06～2014.03, 代表, 高光安定a-Si太陽電池製作のためのガス流動・ナノ粒子制御技術に関する共同研究.

2012.05～2013.03, 代表, 高光安定a-Si太陽電池製作のためのガス流動・ナノ粒子制御技術に関する共同研究.

2007.01～2007.03, 分担, CIGSの経気道性曝露による生体影響に関する研究.

2007.02～2010.03, 代表, トップセルの光劣化の基礎現象解明.

2006.12～2009.03, 代表, シランプラズマ中のクラスタ量の制御法の開発.

2004.10～2005.03, 分担, 集積回路内配線形成に関する研究.

2004.10～2005.03, 分担, 多孔質低誘電率絶縁膜に関する研究.

寄附金の受入状況

2007年度, 高柳記念財団, 電子デバイス工学研究資金.

2003年度, 村田学術振興財団, ２段プラズマCVD法による超低誘電率層間絶縁膜に関する研究.

九大関連コンテンツ

pure2017年10月2日から、「九州大学研究者情報」を補完するデータベースとして、Elsevier社の「Pure」による研究業績の公開を開始しました。

QIR　九州大学学術情報リポジトリシステム情報科学研究院

システム情報科学研究院


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