Kyushu University Academic Staff Educational and Research Activities Database
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KUNGEN TEII TSUTSUI Last modified date:2023.11.27

Graduate School
Undergraduate School

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Ionized Gas Dynamics Laboratory .
Academic Staff Educational and Research Activities Database, Kyushu University .
Electronic Materials & Devices Group .
Academic Degree
Country of degree conferring institution (Overseas)
Field of Specialization
Electronic and Electrical Materials Engineering, Inorganic Materials Engineering
Total Priod of education and research career in the foreign country
Outline Activities
Keywords: Power electronics, Power semiconductor devices, Electronic and electrical materials, Ultrahard material, Biomedical material, Nanostructured material, Plasma engineering, Plasma CVD, Diamond, Nanocarbon, Cubic boron nitride, Cemented carbide, Semiconductor, Dielectric, Mass spectrometry, Electrostatic probe, Electron field emitter, Cutting tool, Implant, Mold
Research Interests
  • Nanostructured carbon materials, Electron emitters
    keyword : Nanocarbon, Nanodiamond, Amorphous carbon, Vacuum microelectronics, Electron source, Ion engine, Tunneling effect, Electron affinity, Composite film, Ultrathin film
    2005.04Synthesis and characterization of nanostructured carbon materials, Fabrication and characterization of advanced electronic devices.
  • Wide-gap semiconductors, Power electronics
    keyword : Diamond, Boron nitride, Silicon Carbide, Crystal growth, Epitaxy, High-temperature devices, Power devices, Doping, Semiconductor processes
    1998.04Plasma processing, Fabrication and device application of diamond and cubic boron nitride, Doping, Diode, Electron emitter.
  • Super hard coatings, Biocoatings
    keyword : Super hard materials, Biomaterials, Implants, Biocompatibility, Nitride, DLC, Cemented carbide, Transition metals, High-speed steels, Cutting tools, Mold, Tribology
    2007.04Deposition of superhard boron nitride films, Characterization of structure and mechanical properties of superhard boron nitride films, DLC.
  • Plasma processing
    keyword : Plasma CVD, Sputtering, Mass spectrometry, Electrostatic probe measurement, Optical spectroscopy
    1998.04Diagnostics of particle species in reactive plasmas, Plasma application by controlling particle behavior.
Academic Activities
1. S. Matsumoto and K. Teii, Kogyo Zairyo "Superhard, high-crystallinity cubic boron nitride films", Vol. 57, No. 1, pp. 42-43(2009)..
1. K. Teii, Plasma Deposition and Electrical Applications of Nanocrystalline Diamond Films, The Journal of The Institute of Electrical Engineers of Japan, Vol. 135, No. 3, pp. 142-144 (2015).
2. K. Teii, Plasma Deposition of Diamond at Low Pressures: A Review, IEEE Trans. Plasma Sci., Vol. 42, pp. 3862-3869, 2014.12.
3. J.-S. Wu, C.-C. Hsu, J. P. Chu, K. Teii, Introduction to the Special Issue on the APSPT 2013, IEEE Trans. Plasma Sci. Vol. 42, pp. 3654-3655, 2014.12.
4. K. Teii, Recent Trends of Moderate-Pressure Microwave Plasma-Enhanced CVD—From Diamond to Nanocarbons—, IEEJ Transactions on Fundamentals and Materials, Vol. 131, No. 1, pp. 11-15 (2011).
5. K. Teii, M. Hori, M. Ito, T. Goto, N. Ishii, Study on Polymeric Neutral Species in High-Density Fluorocarbon Plasmas, J. Vac. Sci. Technol. A, Vol. 18, pp. 1-9, 2000.01.
1. L. Huang, S. Harajiri, S. Wang, X. Wu, K. Teii, Enhanced Field Emission from Ultrananocrystalline Diamond-Decorated Carbon Nanowalls Prepared by a Self-Assembly Seeding Technique, ACS Appl. Mater. Interfaces, Vol. 14, pp. 4389−4398, 2022.01.
2. J. H. C. Yang, K. Teii, C.-C. Chang, S. Matsumoto, M. Rafailovich, Biocompatible Cubic Boron Nitride: A Noncytotoxic Ultrahard Material, Adv. Funct. Mater., Vo. 31, 2005066, 2021.01.
3. Y. Kaneko, K. Terada, K. Teii, Field Emission Characteristics of Metal Nanoparticle-Coated Carbon Nanowalls, Nanotechnology, Vol. 31, 165203, 2020.04.
4. K. Teii, S. Kawamoto, S. Fukui, S. Matsumoto, Electrical Transport and Capacitance Characteristics of Metal-Insulator-Metal Structures using Hexagonal and Cubic Boron Nitride Films as Dielectrics, J. Appl. Phys., Vol. 123, 145701, 2018.04.
5. K. Teii, Y. Mizusako, T. Hori, S. Matsumoto, Thermal Stability of Boron Nitride/Silicon p-n Heterojunction Diodes, J. Appl. Phys., Vol. 118, 155102, 2015.10.
6. M. Goto, R. Amano, N. Shimoda, Y. Kato, K. Teii, Rectification Properties of n-Type Nanocrystalline Diamond Heterojunctions to p-Type Silicon Carbide at High Temperatures, Appl. Phys. Lett., Vol. 104, 153113, 2014.04.
7. K. Teii, S. Matsumoto, Direct Deposition of Cubic Boron Nitride Films on Tungsten Carbide-Cobalt, ACS Appl. Mater. Interfaces, Vol. 4, pp. 5249-5255, 2012.10.
8. K. Teii, S. Shimada, M. Nakashima, A. T. H. Chuang, Synthesis and Electrical Characterization of n-Type Carbon Nanowalls, J. Appl. Phys., Vol. 106, 084303, 2009.10.
9. T. Ikeda and K. Teii, Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanocrystalline Diamond Films, Appl. Phys. Lett., Vol. 94, 143102, 2009.04.
10. T. Ikeda, K. Teii, C. Casiraghi, J. Robertson, A. C. Ferrari, Effect of the Sp2 Carbon Phase on n-Type Conduction in Nanodiamond Films, J. Appl. Phys., Vol. 104, 073720, 2008.10.
11. K. Teii, S. Matsumoto, J. Robertson, Electron Field Emission from Nanostructured Cubic Boron Nitride Islands, Appl. Phys. Lett., Vol. 92, 013115, 2008.01.
12. K. Teii, R. Yamao, T. Yamamura, S. Matsumoto, Synthesis of Cubic Boron Nitride Films with Mean Ion Energies of a Few eV, J. Appl. Phys., Vol. 101, 033301, 2007.02.
1. K. Teii, J. H. C. Yang, S. Matsumoto, Plasma Deposition of High-Quality Cubic Boron Nitride Films for Applications to Ultrahard Coatings and Electronic Devices (INVITED), 7th International Symposium on Advanced Ceramics and Technology for Sustainable Energy Applications toward a Low Carbon Society, 2021.11.
2. K. Teii, S. Matsumoto, Plasma Deposition of Cubic Boron Nitride Films for Hard Coatings and Electronic Devices (INVITED), 10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2017.12.
3. K. Teii, S. Matsumoto, Plasma Deposition and Electrical Applications of High-Quality Cubic Boron Nitride Films (INVITED), 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2013.12.
4. K. Teii, J. H.C. Yang, S. Matsumoto, Electron Field Emission from Semiconducting Carbon Nanowalls and Boron Nitride Films (INVITED), 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), 2013.12.
5. Plasma Deposition and Applications of Cubic Boron Nitride Films (INVITED), K. Teii, J. H.C. Yang, S. Matsumoto, IUMRS-International Conference on Electronic Materials 2012, Japan, 2012..
6. Synthesis and electrical properties of cubic boron nitride films by plasma-enhanced chemical vapor deposition under low-energy ion bombardment (INVITED), K. Teii and S. Matsumoto, 6th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2009..
7. Plasma Enhanced Deposition of Cubic Boron Nitride Films under Ultralow-Energy Ion Impact: Structural Evolution and Electrical Properties (INVITED), K. Teii and S. Matsumoto, 35th International Conference on Metallurgical Coatings and Thin Films, USA, 2008..
Membership in Academic Society
  • Materials Research Society
Other Educational Activities
  • 2021.08.
  • 2017.09.