九州大学-研究者情報 [古閑一憲 (教授) システム情報科学研究院情報エレクトロニクス部門]

革新的次世代太陽光発電システム技術研究開発
2000.06～2001.03, 代表者：松田彰久, 産業技術総合研究所, 産業技術総合研究所，九州大学，凸版印刷，スタンレー電気，日本板硝子
本研究は，九州大学，産業技術総合研究所，凸版印刷，スタンレー電気，日本板硝子が共同で行うものであり，全体としては，薄膜シリコン系スタック型太陽電池において、従来トップセル材料として用いられてきたアモルファスシリコンが持つ光劣化の問題を根本的に解決する革新的材料、ナノ構造制御シリコンを開発し、それを用いた低コスト高効率太陽電池製造技術を確立し、モジュールコストを50円/W以下を可能とする指針を得ることを目的としている．
　九州大学の分担内容は，九州大学プラズマ研究室で開発したSi微粒子成長制御法と微粒子観測技術をもとに，上述のナノ構造制御シリコン太陽電池を作製する際に必要となるナノ構造制御シリコン材料の開発を行うことを目的としている．.

研究業績

主要著書

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1.	古閑一憲, 白谷正治, 節原裕一, 関根誠, 堀勝, プラズマ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜 (特集革新的プラズマ科学の新潮流), 化学工業, 63,12,908-912, 2012.12.
2.	内田儀一郎, 古閑一憲, 白谷正治, ダブルマルチホロー放電プラズマＣＶＤによる窒化シリコンナノ粒子の生成と量子ドット増感型太陽電池への応用 (高効率太陽電池化合物・集光型・量子ドット型・Ｓｉ・有機系・その他新材料), 株式会社エヌ・ティー・エス, 第3章, 2, 2012.05, [URL].
3.	芦川直子, 古閑一憲, ダスト（微粒子）を分析する～ミクロン・ナノメータの微細な世界～, 核融合科学研究所, 核融合科学研究所ニュース,2011年10月・2011年11月号,202, 2011.10, [URL].
4.	古閑一憲、内田儀一郎、白谷正治、布村正太、渡辺征夫, プロセスプラズマ中の微粒子の凝集と輸送 (「プラズマと微粒子」研究の諸分野における進展), プラズマ・核融合学会誌, プラズマ・核融合学会誌,87,2,99-104, 2011.02.
5.	Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 20, pp.247-257, 2010.05, [URL].
6.	Shinya Iwashita, Hiroshi Miyata, Kazunori Koga, Masaharu Shiratani, Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation (Industrial Plasma Technology: Applications from Environmental to Energy Technologies), WILEY-VCH Verlag GmbH & Co, 31, pp.377-383, 2010.05, [URL].
7.	白谷正治, 古閑一憲, 光劣化しない革新的アモルファスシリコン太陽電池の作製をめざして (次世代シリコン太陽電池製造のためのプラズマ技術), プラズマ・核融合学会誌, プラズマ・核融合学会誌,86,1,33-36, 2010.01.

主要原著論文

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1.	S. H. Hwang, R. Iwamoto, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, T. Nakatani, M. Shiratani, Comparison between Ar+CH4 Cathode and Anode Coupled Capacitively Coupled Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Films, Thin Solid Films, 10.1016/j.tsf.2021.138701, 729, 138701, 2021.07, [URL].
2.	F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura, Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells, J. Mol. Struct., 10.1016/j.molstruc.2020.129479, 1228, 129479, 2021.03, [URL].
3.	C. Suriyasak, K. Hatanaka, H. Tanaka, T. Okumura, D. Yamashita, P. Attri, K. Koga, M. Shiratani, N. Hamaoka, Y. Ishibashi, Alterations of DNA Methylation Caused by Cold Plasma Treatment Restore Delayed Germination of Heat-Stressed Rice (Oryza sativa L.) Seeds, ACS Agric. Sci. Technol., 10.1021/acsagscitech.0c00070, 1, 1, 5-10, 2021.02, [URL].
4.	P. Attri, K. Ishikawa, T. Okumura, K. Koga, M. Shiratani, V. Mildaziene, Impact of seed color and storage time on the radish seed germination and sprout growth in plasma agriculture, Sci. Rep., 10.1038/s41598-021-81175-x, 11, 1, 1-10, 2021.01, [URL].
5.	P. Attri, K. Koga, M. Shiratani, Possible impact of plasma oxidation on the structure of C-terminal domain of SARS-CoV-2 spike protein: a computational study, Jpn. J. Appl. Phys., 10.35848/1882-0786/abd717, 14, 2, 2021.01, [URL].
6.	T. E. Putri, Y. Hao, F. L. Chawarambwa, H. Seo, Min-Kyu Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Activated Carbon Counter Electrode On Bifacial Dye Sensitized Solar Cells (DSSCs), Mater. Sci. Forum, 10.4028/www.scientific.net/MSF.1016.863, 1016, 863-868, 2021.01, [URL].
7.	V. Sirgedaitė‐Šėžienė , V. Mildažienė,　P. Žemaitis , A. Ivankov , K. Koga, M. Shiratani, V. Baliuckas, Long-term response of Norway spruce to seed treatment with cold plasma: dependence of the effects on the genotype, Plasma Process Polym, 10.1002/ppap.202000159, 2020.12, [URL].
8.	T. Kawasaki, K. Koga, M. Shiratani, Experimental identification of the reactive oxygen species transported into a liquid by plasma irradiation, Jpn. J. Appl. Phys., 10.35848/1347-4065/abc3a1, 59, 11, 110502, 2020.11, [URL].
9.	F. L. Chawarambwa, T. E. Putri, M. K. Son, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Graphene-Si3N4 nanocomposite blended polymer counter electrode for low-cost dye-sensitized solar cells, Chem. Phys. Lett., 10.1016/j.cplett.2020.137920, 758, 137920, 2020.11, [URL].
10.	S. H. Hwang, T. Okumura, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition, Diam Relat Mater, 10.1016/j.diamond.2020.108050, 109, 108050, 2020.11, [URL].
11.	F. L. Chawarambwa, T. E. Putri, K. Kamataki, M. Shiratani, K. Koga, N. Itagaki, D. Nakamura, Synthesis of Yb3+/Ho3+ co-doped Y2O3 nanoparticles and its application to dye sensitized solar cells, J. Mol. Struct., 10.1016/j.molstruc.2020.129479, 129479, 2020.10, [URL].
12.	R. Narishige, K. Kaneshima, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Impact of surface morphologies of substrates on the epitaxial growth of magnetron sputtered (ZnO)x(InN)1-x films, Jpn. J. Appl. Phys., 10.35848/1347-4065/abba0c, 60, SA, SAAB02, 2020.10, [URL].
13.	I. Tamošiūnė, D. Gelvonauskienė, P. Haimi, V. Mildažienė, K. Koga, M. Shiratani, D. Baniulis, Cold plasma treatment of sunflower seeds modulates plant-associated microbiome and stimulates root and lateral organ growth, Front. Plant Sci., 10.3389/fpls.2020.568924, 11, 1347, 2020.08, [URL].
14.	S. Nunomura, I. Sakata, H. Sakakita, K. Koga, M. Shiratani, Real-time monitoring of surface passivationof crystalline silicon during growth of amorphous and epitaxial silicon layer, J. Appl. Phys., 10.1063/5.0011563, 128, 3, 2020.07, [URL].
15.	I. Tamošiūnė, D. Gelvonauskienė, L. Ragauskaitė, K. Koga, M. Shiratani, D. Baniulis, Cold plasma treatment of Arabidopsis thaliana (L.) seeds modulates plant-associated microbiome composition, Applied Physics Express, 10.35848/1882-0786/ab9712, 13, 076001, 2020.05, [URL].
16.	N. Itagaki, Y. Nakamura, R. Narishige, K. Takeda, K. Kamataki, K. Koga, M. Hori, M. Shiratani, Growth of single crystalline films on lattice-mismatched substrates through 3D to 2D mode transition, Sci. Rep., 10.1038/s41598-020-61596-w, 10, 1, 4669, 2020.03, [URL], Regarding crystalline film growth on large lattice-mismatched substrates, there are two primary modes by which thin films grow on a crystal surface or interface. They are Volmer-Weber (VW: island formation) mode and Stranski-Krastanov (SK: layer-plus-island) mode. Since both growth modes end up in the formation of three-dimensional (3D) islands, fabrication of single crystalline films on lattice-mismatched substrates has been challenging. Here, we demonstrate another growth mode, where a buffer layer consisting of 3D islands initially forms and a relaxed two-dimensional (2D) layer subsequently grows on the buffer layer. This 3D-2D mode transition has been realized using impurities. We observed the 3D-2D mode transition for the case of ZnO film growth on 18%-lattice-mismatched sapphire substrates. First, nano-sized 3D islands grow with the help of nitrogen impurities. Then, the islands coalesce to form a 2D layer after cessation of the nitrogen supply, whereupon an increase in the surface energy may provide a driving force for the coalescence. Finally, the films grow in 2D mode, forming atomically flat terraces. We believe that our findings will offer new opportunities for highquality film growth of a wide variety of materials that have no lattice-matched substrates..
17.	K. Koga, P. Attri, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene, Impact of radish sprouts seeds coat color on the electron paramagnetic resonance signals after plasma treatment, Jpn. J. Appl. Phys., 10.35848/1347-4065/ab7698, 59, SH, SHHF01, 2020.03, [URL], Recently, cold atmospheric plasma (CAP) treatment on seed germination has emerged as a useful technique to increase agriculture production, although, the mechanism of the cold plasma in seed germination is still under investigation. In this work, we studied the role of pigments in the seed coat of radish sprouts on the electron spin resonance (ESR) signals before and after CAP treatment. Radish sprouts seeds having gray color show enhanced ESR signals after the CAP treatment, whereas, no increased ESR signals were observed for brown color seeds of radish sprouts as compared to their respective control seeds. These results reveal that seeds from the same harvest year having different seed coat colors show different responses to the plasma treatment. Although ESR signal intensity can vary with the harvest year, the change in ESR signal intensity after plasma treatment depends on the seed coat color. Independently on the harvest year (2017 and 2018), CAP increased ESR signals stronger in the grey seeds in comparison to the brown ones. The results indicated that seed coat color may be an important variable for understanding differences in the extent of CAP effects on seeds. (C) 2020 The Japan Society of Applied Physics..
18.	T. Kawasaki, K. Nishida, G. Uchida, F. Mitsugi, K. Takenaka, K. Koga, Y. Setsuhara, M. Shiratani, Effects of surrounding gas on plasma-induced downward liquid flow, Jpn. J. Appl. Phys., 10.35848/1347-4065/ab71dc, 59, SH, SHHF02, 2020.03, [URL], © 2020 The Japan Society of Applied Physics. Understanding the mechanisms behind plasma-induced liquid flow is important for the transport of reactive species in liquid. In this study, we studied the effects of the surrounding gas compositions of a plasma-jet on the plasma-induced downward liquid flow using particle image velocimetry. Nitrogen (N2) and oxygen (O2) mixtures in different mixing ratios were supplied as surrounding gas around a helium (He) plasma jet at a constant flow rate. The results clearly indicated that O2 in the surrounding gas plays a key role in enhancing the downward flow. Increasing the O2 concentration increased the downward flow in the depth direction. An emission spectroscopy analysis suggested that reactive species related to excited atomic O were considered to be important for inducing downward flows. The relationship between the downward flows and oxidation reactions on a liquid target were discussed to determine the reasons responsible for the driving forces..
19.	L. D. Fomins, G. Pauzaite, R. Zukiene, V. Mildaziene, K. Koga, M. Shiratani, Relationship between cold plasma treatment-induced changes in radish seed germination and phytohormone balance, Jpn. J. Appl. Phys., 10.7567/1347-4065/ab656c, 59, SH1001, 2020.02, [URL].
20.	R. Zukiene, Z. Nauciene, I. Januskaitiene, G. Pauzaite, V. Mildaziene, K. Koga, M. Shiratani, Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth, Appl. Phys. Express, 10.7567/1882-0786/ab5491, 12, 12, 126003, 2019.11, [URL].
21.	K. Tanaka, H. Hara, S. Nagaishi, L. Shi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Identification and Suppression of Si-H2 Bond Formation at P/I Interface in a-Si:H Films Deposited by SiH4 Plasma CVD, Plasma Fusion Res., 10.1585/pfr.14.4406141, 14, 4406141, 2019.09, [URL].
22.	L. Shi, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effect of Higher-Order Silane Deposition on Spatial Profile of Si-H2/Si-H Bond Density Ratio of a-Si:H Films, Plasma Fusion Res., 10.1585/pfr.14.4406144, 14, 4406144, 2019.09, [URL].
23.	S. H. Hwang, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition, Plasma Fusion Res., 10.1585/pfr.14.4406115, 14, 4406115, 2019.09, [URL].
24.	R. Zhou, K. Kamataki, H. Ohtomo, D. Yamashita, N. Itagaki, K. Koga, M. Shiratani, Spatial-Structure of Fluctuation of Amount of Nanoparticles in Amplitude-Modulated VHF Discharge Reactive Plasma, Plasma Fusion Res., 10.1585/pfr.14.4406120, 14, 4406120, 2019.09, [URL].
25.	T. Iwase, Y. Kamaji, S. Y. Kang, K. Koga, N. Kuboi, M. Nakamura, N. Negishi, T. Nozaki, S. Nunomura, D. Ogawa, M. Omura, T. Shimizu, K. Shinoda, Y. Sonoda, H. Suzuki, K. Takahashi, T. Tsutsumi, K. Yoshikawa, T. Ishijima, K. Ishikawa, Progress and perspectives in dry processes for emerging multidisciplinary applications: how can we improve our use of dry processes?, Jpn. J. Appl. Phys. , 10.7567/1347-4065/ab163a, 58, SE0803 , 2019.06, [URL].
26.	T. Kojima, S. Toko, K. Tanaka, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Effects of gas velocity on deposition rate and amount of cluster incorporation into a-Si:H films fabricated by SiH4 plasma chemical vapor deposition, Plasma Fusion Res., 10.1585/pfr.13.1406082, 13, 1406082, 2018.06, [URL].
27.	S. Toko, R. Katayama, K. Koga, E. Leal-Quiros, M. Shiratani, Dependence of CO2 Conversion to CH4 on CO2 Flow Rate in Helicon Discharge Plasma, Sci. Adv. Mater., 10.1166/sam.2018.3141, 10, 5, 655-659, 2018.05, [URL].
28.	K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body , ECS Transactions, 10.1149/07703.0017ecst, 77, 3, 17-24, 2017.05, [URL].
29.	T. Sarinont, R. Katayama, Y. Wada, K. Koga, M. Shiratani, Plant Growth Enhancement of Seeds Immersed in Plasma Activated Water, MRS Adv., 10.1557/adv.2017.178, 2, 18, 995-1000, 2017.02, [URL].
30.	T. Sarinont, Y. Wada, K. Koga, M. Shiratani, Response of Silkworm Larvae to Atmospheric Pressure Non-thermal Plasma Irradiation, Plasma Medicine, 10.1615/PlasmaMed.2017019137 , 6, 3-4, 2017.01, [URL].
31.	K. Iwasaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki , Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization, MRS Adv., 10.1557/adv.2016.617, 2, 5, 265-270, 2016.12, [URL].
32.	K. Matsushima, K. Iwasaki, N. Miyahara, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Blue Photoluminescence of (ZnO)0.92(InN)0.08, MRS Adv., 10.1557/adv.2016.625, 2, 5, 277-282, 2016.12, [URL].
33.	M. Shiratani, M. Soejima, H. Seo, N. Itagaki, K. Koga , Fluctuation of Position and Energy of a Fine Particle in Plasma Nanofabrication, Materials Science Forum, 10.4028/www.scientific.net/MSF.879.1772, 879, 1772-1777 , 2016.11, [URL].
34.	M. Shiratani, T. Sarinont, K. Koga and N. Hayashi, R&D status of agricultural applications of high voltage and plasma in Japan, Proc. Workshop on Application of Advanced Plasma Technologies in CE Agriculture, 29-30, 2016.04.
35.	H. Seo, G. Uchida, N. Itagaki, K. Koga, and M. Shiratani , Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition, Sci. Adv. Mater., 10.1166/sam.2016.2520, 8, 3, 636-639, 2016.03, [URL].
36.	K. Matsushima, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Room Temperature Fabrication of (ZnO)x(InN)1-x films with Step-Terrace Structure by RF Magnetron Sputtering, MRS Advances, 10.1557/adv.2015.59, 1, 2, 115-119, 2016.01, [URL].
37.	T. Amano, T. Sarinont, K. Koga, M. Hirata, A. Tanaka, M. Shiratani, Production of In, Au, and Pt nanoparticles by discharge plasmas in water for assessment of their bio-compatibility and toxicity, MRS Adv., 10.1557/adv.2016.41, 1, 18, 1301-1306, 2016.01, [URL].
38.	M. Shiratani, T. Sarinont, T. Amano, N. Hayashi, K. Koga, Plant Growth Response to Atmospheric Air Plasma Treatments of Seeds of 5 Plant Species, MRS Adv., 10.1557/adv.2016.37, 1, 18, 1265-1269, 2016.01, [URL].
39.	白谷正治, 古閑一憲, 立石瑞樹, 片山龍, 山下大輔, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 芦川直子, 時谷政行, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 水素プラズマとカーボン壁の相互作用で発生したダストに対するダスト除去フィルタのダスト除去性能評価, 九州大学超顕微解析研究センター報告, 39, 116-117, 2015.12.
40.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Raman Spectroscopy of a-C:H Films Deposited Using Ar + H2+ C7H8 Plasma CVD, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.145, 2015.10, [URL].
41.	T. Takasaki, T. Ide, K. Matsushima, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of nitrogen atom density in N2/Ar sputtering plasma for fabrication of high-mobility amorphous In2O3:Sn films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.150, 2015.10, [URL].
42.	K. Matsushima, T. Ide, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurements of absolute densities of nitrogen and oxygen atoms in sputtering plasma for fabrication of ZnInON films, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.154, 2015.10, [URL].
43.	T. Ide, K. Matsushima, T. Takasaki, K. Takeda, M. Hori, D. Yamashita, H. Seo, K. Koga, M, Shiratani, N. Itagaki, Measurement of absolute density of N atom in sputtering plasma for epitaxial growth ZnO films via nitrogen mediated crystallization, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, GT1.155, 2015.10, [URL].
44.	T. Sarinont, T. Amano, K. Koga, S. Kitazaki, N. Hayashi, M. Shiratani, Effects of Ambient Humidity on Plant Growth Enhancement by Atmospheric Air Plasma Irradiation to Plant Seeds, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.136, 2015.10, [URL].
45.	G. Uchida, A. Nakajima, T. Kawasaki, K. Koga, K. Takenaka, M. Shiratani, Y. Setsuhara, Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, TF1.2, 2015.10, [URL].
46.	Y. Setsuhara, G. Uchida, A. Nakajima, K. Takenaka, K. Koga, M. Shiratani, Discharge characteristics and hydrodynamics behaviors of atmospheric plasma jets produced in various gas flow patterns, Proc. 68th GEC/9th ICRP/33rd SPP, 60, 9, LW1.58, 2015.10, [URL].
47.	K. Matsushima, R. Shimizu, T. Ide, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Fabrication of p-i-n solar cells utilizing ZnInON by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.248, 1741, aa09-10, 2015.03, [URL].
48.	N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, ZnO-based semiconductors with tunable band gap for solar sell applications, Proc. SPIE photonics west 2015, 10.1117/12.2078114, 9364, 93640P, 2015.03, [URL].
49.	T. Ide, K. Matsushima, R. Shimizu, D. Yamashita, H. Seo, K. Koga, M. Shiratani, N. Itagaki, Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.87, 1741, aa09-12, 2015.02, [URL].
50.	A. Tanaka, M. Hirata, N. Matsumura, K. Koga, M. Shiratani, Y. Kiyohara, Comparative Study on the Pulmonary Toxicity of Indium Hydroxide, Indium-Tin Oxide, and Indium Oxide Following Intratracheal Instillations into the Lungs of Rats, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.21, 1723, g02-03, 2015.02, [URL].
51.	T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Air Plasma Irradiation to Seeds of Radish Sprouts on Chlorophyll and Carotenoids Concentrations in their Leaves, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.39, 1723, g02-04, 2015.02, [URL].
52.	T. Sarinont, T. Amano, K. Koga, M. Shiratani, N. Hayashi, Multigeneration Effects of Plasma Irradiation to Seeds of Arabidopsis Thaliana and Zinnia on Their Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2015.12, 1723, g03-04, 2015.01, [URL].
53.	内田儀一郎, 市田大樹, 徐鉉雄, 古閑一憲, 白谷正治, 反応性微粒子プラズマプロセスを用いたゲルマニウム結晶ナノ粒子含有膜の堆積と量子ドット太陽電池への応用, スマートプロセス学会誌, 4, 1, 6-11, 2015.01.
54.	M. Shiratani, K. Kamataki, G. Uchida, K. Koga, H. Seo, N. Itagaki, T. Ishihara, SiC Nanoparticle Composite Anode for Li-Ion Batteries, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2014.742, 1678, n08-58, 2014.07, [URL].
55.	T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida and M. Shiratani, Plasma etching of single fine particle trapped in Ar plasma by optical tweezers, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012014, 518, 1, 012014, 2014.06, [URL].
56.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine and M. Hori, Emission spectroscopy of Ar + H-2+ C7H8 plasmas: C7H8 flow rate dependence and pressure dependence, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012010, 518, 1, 012010, 2014.06, [URL].
57.	Y. Hashimoto, S. Toko, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012007, 518, 1, 012007, 2014.06, [URL].
58.	D. Ichida, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012002, 518, 1, 012002, 2014.06, [URL].
59.	S. Toko, Y. Hashimoto, Y. Kanemitu, Y. Torigoe, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga and M. Shiratani, Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012008, 518, 1, 012008, 2014.06, [URL].
60.	M. Tateishi, K. Koga, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura and A. Sagara, the LHD Experimental Group, Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012009, 518, 1, 012009, 2014.06, [URL].
61.	T. Sarinont, T. Amano, S. Kitazaki, K. Koga, G. Uchida, M. Shiratani and N. Hayashi, Growth enhancement effects of radish sprouts: atmospheric pressure plasma irradiation vs. heat shock, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012017, 518, 1, 012017, 2014.06, [URL].
62.	K. Koga, X. Dong, S. Iwashita, U. Czarnetzki and M. Shiratani, Formation of carbon nanoparticle using Ar+CH4 high pressure nanosecond discharges, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012020, 518, 1, 012020, 2014.06, [URL].
63.	T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Control of the area irradiated by the sheet-type plasma jet in atmospheric pressure, J. Phys. : Conf. Series (SPSM26), 10.1088/1742-6596/518/1/012016, 518, 1, 012016, 2014.06, [URL].
64.	N. Itagaki, K. Matsushima, D. Yamashita, H. Seo, K. Koga, M. Shiratani, Off-axis sputter deposition of ZnO films on c-sapphire substrates with buffer layers prepared via nitrogen-mediated crystallization, Proc. SPIE photonics west 2014, 10.1117/12.2041081 , 8987, 89871A, 2014.03, [URL].
65.	T. Sarinont, K. Koga, S. Kitazaki, G. Uchida, N. Hayashi, M. Shiratani, Effects of Atmospheric Air Plasma Irradiation on pH of Water, JPS Conf. Proc., 10.7566/JPSCP.1.015078, 1, 015078, 2014.03, [URL].
66.	X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori, Pressure dependence of carbon film deposition using H-assisted plasma CVD, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S08-P14, 2014.02.
67.	T. Kawasaki, K. Kawano, H. Mizoguchi, Y. Yano, K. Yamashita, M. Sakai, G. Uchida, K. Koga, M. Shiratani, Visualization of oxidizing substances generated by atmospheric pressure non-thermal plasma jet with water, Proc. 8th Int. Conf. Reactive Plasmas, 4P-PM-S09-P25, 2014.02.
68.	K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), Proc. 8th Int. Conf. Reactive Plasmas, 6C-PM-A4, 2014.02.
69.	T. Amano, T. Sarinont, S. Kitazaki, N. Hayashi, K. Koga, M. Shiratani, Long term growth of radish sprouts after atmospheric pressure DBD plasma irradiation to seeds, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P33, 2014.02.
70.	T. Sarinont, K. Koga, S. Kitazaki, M. Shiratani, N. Hayashi, Effects of growth enhancement by plasma irradiation to seeds in water, Proc. 8th Int. Conf. Reactive Plasmas, 5P-PM-S12-P32, 2014.02.
71.	H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Growth control of ZnO nano-rod with various seeds and photovoltaic application, J. Phys. : Conference Series (11th APCPST), 10.1088/1742-6596/441/1/012029, 441, 1, 012029, 2013.06, [URL].
72.	M. Shiratani, G. Uchida, K. Kamataki, H. Seo, N. Itagaki, K. Koga, Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices, Proc. 13th International Conference on Plasma Surface Engineering, 2, 26, 100-103, 2013.03, [URL].
73.	A. Tanaka, M. Hirata, M. Shiratani, K. Koga, Y. Kiyohara, Subacute pulmonary toxicity of copper indium gallium diselenide following intratracheal instillations into the lungs of rats, Journal of Occupational Health, 10.1539/joh.11-0164-OA, 54, 3, 187-195, 2012.06, [URL].
74.	H. Seo, Y. Wang, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.890, 1426, 313-318, 2012.04, [URL].
75.	Y. Kim, K. Hatozaki, Y. Hashimoto, H. Seo, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.839, 1426, 307-311, 2012.04, [URL].
76.	M. Shiratani, K. Hatozaki, Y. Hashimoto, Y. Kim, H. Seo, K. Kamataki, G. Uchida, N. Itagaki, K. Koga, Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.1245, 1426, 377-382, 2012.04, [URL].
77.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.966, 1469, ww02-08, 2012.04, [URL].
78.	Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga and M. Shiratani, Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.970, 1469, ww06-10, 2012.04, [URL].
79.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Effects of Atmospheric Pressure Dielectric Barrier Discharge Plasma Irradiation on Yeast Growth, Mat. Res. Soc. Symp. Proc., 10.1557/opl.2012.969, 1469, ww06-08, 2012.04, [URL].
80.	K. Koga, T. Urakawa, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Self-organized carbon Mk formation on the top surface of fine trenches using a low temperature plasma anisotropic CVD for depositing fine organic structure, Proc. Plasma Conf. 2011, 23G03, 2011.11.
81.	Y. Wang, M. Sato, H. Seo, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Performance enhancement of Si quantum dot-sensitized solar cells by surface modification using ZnO barrier layer, Proc. Intern. Symp. on Dry Process, 33, 133-134, 2011.11, [URL].
82.	K. Hatozaki, K. Nakahara, T. Matsunaga, G. Uchida, H. Seo, N. Itagaki, K. Koga, M. Shiratani, Deposition of highly stable cluster-free a-Si:H films using fast gas flow multi-hollow discharge plasma CVD method, Proc. Plasma Conf. 2011, 24P016-O, 2011.11.
83.	K. Hatozaki, K. Nakahara, G. Uchida, K. Koga, M. Shiratani, Stable schottky solar cells using cluster-free a-si:h prepared by multi-hollow discharge plasma CVD, Proc. PVSEC-21, 3D-2P-18, 2011.11.
84.	M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga, M. Shiratani, Quantum dot-sensitized solar cells using nitridated si nanoparticles produced by double multi-hollow discharges, Proc. PVSEC-21, 3D-5P-12, 2011.11.
85.	T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Optical emission spectroscopy of Ar+H2+ C7H8 discharges for anisotropic plasma CVD of carbon, Proc. Intern. Symp. on Dry Process, 33, 123-124, 2011.11, [URL].
86.	N. Hayashi, Y. Akiyoshi, S. Kitazaki, K. Koga, M. Shiratani, Influence of active oxygen species produced by atmospheric torch plasma on plant growth, Proc. Intern. Symp. on Dry Process, 33, 135-136, 2011.11, [URL].
87.	T. Mieno, K. Koga, M. Shiratani, Production Process of Carbon Nanotube Coagulates, Proc. Plasma Conf. 2011, 24F08, 2011.11.
88.	S. Kitazaki, K. Koga, M. Shiratani, N. Hayashi, Growth promotion characteristics of bread yeast by atmospheric pressure dielectric barrier discharge plasma irradiation, Proc. Plasma Conf. 2011, 23P018-O, 2011.11.
89.	T. Urakawa, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Effects of substrate bias voltage on plasma anisotropic CVD of carbon using H-assisted plasma CVD reactor, Proc. Plasma Conf. 2011, 24P007-O, 2011.11.
90.	M. Sato, Y. Wang, K. Nakahara, T. Matsunaga, H. Seo, G. Uchida, K. Koga and M. Shiratani, Deposition of FeSi2 nano-particle film, Proc. Plasma Conf. 2011, 24P009-O, 2011.11.
91.	G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Nakahara, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Surface nitridation of silicon nano-particles using double multi-hollow discharge plasma CVD, Physica Status Solidi (c), 10.1002/pssc.201001230, 8, 10, 3017-3020, 2011.10, [URL].
92.	G. Uchida, Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Kondo, M. Shiratani, Hybrid sensitized solar cells using Si nanoparticles and ruthenium dye, Physica Status Solidi (c), 10.1002/pssc.201100166, 8, 10, 3021-3024, 2011.10, [URL].
93.	K. Koga, K. Nakahara, Y. Kim, Y. Kawashima, T. Matsunaga, M. Sato, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, and M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD method, Physica Status Solidi (c), 10.1002/pssc.201100229, 8, 10, 3013-3016, 2011.10, [URL].
94.	T. Urakawa, T. Nomura, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on submicron wide trench substrate using H-assisted plasma CVD, Proc. of The 20th International Symposium on Plasma Chemistry （ISPC20）, POL02, 2011.07.
95.	K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics, International Conference on Advances in Condensed and Nano Materials (ICACNM), 10.1063/1.3653600, 1393, 27-30, 2011.02, [URL].
96.	内田儀一郎, 古閑一憲, 白谷正治, マルチホロー放電プラズマＣＶＤによる量子ドット増感太陽電池用シリコンナノ結晶粒子の作製, ケミカルエンジニヤリング, 55, 12, 947-954, 2010.12, [URL].
97.	M. Shiratani, K. Koga, G. Uchida, N. Itagaki, K. Kamataki, Fluctuation Control for Plasma Nanotechnologies, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5685920, XII-XVI , 2010.11, [URL], プラズマナノテクノロジーで最重要課題となっている揺らぎの制御に関する現状と将来を展望した論文。.
98.	G. Uchida, S. Nunomutra, H. Miyata, S. Iwashita, D. Yamashita, H. Matsuzaki, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Effects of Ar addition on breakdown voltage in a Si(CH3)2(OCH3)2 RF discharge, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686704, 2199-2201, 2010.11, [URL].
99.	K. Kamataki, H. Miyata, K. Koga, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Effects of Amplitude Modulation of rf Discharge Voltage on Growth of Nano-Particles in Reactive Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686456, 1943-1947, 2010.11, [URL].
100.	T. Matsunaga, Y. Kawashima, K. Koga, K. Nakahara, W. M. Nakamura, G. Uchida, N. Itagaki, D. Yamashita, H. Matsuzaki, M. Shiratani, Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686679 , 2219-2212, 2010.11, [URL].
101.	K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, N. Itagaki, K. Koga, M. Shiratani, Cluster-Free B-Doped a-Si:H Films Deposited Using SiH4 + B10H14 Multi-Hollow Discharges, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686686, 2216-2218, 2010.11, [URL].
102.	T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686688, 2213-2215, 2010.11, [URL].
103.	Y. Akiyoshi, A. Nakahigashi, N. Hayashi, S. Kitazaki, Takuro Iwao, K. Koga, M. Shiratani, Redox Characteristics of Amino Acids Using Low Pressure Water Vapor RF Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686467, 1957-1959, 2010.11, [URL].
104.	Y. Kawashima, K. Yamamoto, M. Sato, T. Matsunaga, K. Nakahara, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Photoluminescence of Si nanoparticles synthesized using multi-hollow discharge plasma CVD, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686677, 2222-2224, 2010.11, [URL].
105.	S. Kitazaki, D. Yamashita, H. Matsuzaki, G. Uchida, K. Koga, M. Shiratani, Growth Stimulation of Radish Sprouts Using Discharge Plasma, Proc. IEEE TENCON 2010, 10.1109/TENCON.2010.5686474, 1960-1963, 2010.11, [URL].
106.	K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition rate enhancement of cluster-free P-doped a-Si:H films using multi-hollow discharge plasma CVD method, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00087, 2010.10.
107.	T. Matsunaga, Y. Kawashima, K. Koga, W. M. Nakamura, K. Nakahara, H. Matsuzaki, D. Yamashita, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Combinatorial deposition of microcrystalline Si films using multi-hollow discharge plasma CVD, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, CTP.00089, 2010.10.
108.	A. Nakahigashi, Y. Akiyoshi, N. Hayashi, S. Kitazaki, K. Koga, M. Shiratani, Redox Characteristics of Thiol of Plants Using Radicals Produced by RF Discharge, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, KWP.00008, 2010.10.
109.	T. Nomura, T. Urakawa, Y. Korenaga, D. Yamashita, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Plasma parameter measurements of Ar+H2+C7H8 plasma in H-assisted plasma CVD reactor, Proc. of 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasma, 55, 7, DTP.00173, 2010.10.
110.	Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Quantum dot-sensitized solar cells using Si nanoparticles, Trans. Mateｒ. Res. Soc. Jpn., 35, 3, 597-599, 2010.09, [URL].
111.	Y. Kawashima, K. Yamamoto, M. Sato, K. Nakahara, T. Matsunaga, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, M. Kondo, Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5617205, 3347-3351, 2010.07, [URL].
112.	K. Nakahara, Y. Kawashima, M. Sato, T. Matsunaga, K. Yamamoto, W. M. Nakamura, D. Yamashita, H. Matsuzaki, G. Uchida, K. Kamataki, N. Itagaki, K. Koga, M. Shiratani, Deposition of cluster-free P-doped a-Si:H films using a multi-hollow discharge plasma CVD method, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616514, 3722-3755, 2010.07, [URL].
113.	K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for A-Si:H film deposition, Proc. 35th IEEE Photovoltaic Specialists Conf., 10.1109/PVSC.2010.5616502, 3718-3721, 2010.07, [URL].
114.	Y. Kawashima, K. Nakahara, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for Quantum dots-sensitized solar cells using multi-hollow discharge plasma CVD, Proc. of the 27th symposium on plasma processing, B5-05, 101-102, 2010.02.
115.	S. Iwashita, H. Miyata, YasuY. Yamada, H. Matsuzaki, K. Koga, M. Shiratani, Observation of nano-particle transport in capacitively coupled radio frequency discharge plasma, Proc. of the 27th symposium on plasma processing, P1-13, 153-154, 2010.02.
116.	H. Sato, Y. Kawashima, K. Nakahara, K. Koga, M. Shiratani, Measurement of electron density in multi-hollow discharges with magnetic field, Proc. of the 27th symposium on plasma processing, A6-01, 105-106, 2010.02.
117.	H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, N. Ashikawa, S. Muzaki, K. Nishimura, A. Sagara, LHD Experimental Group, In-Situ Sampling of Dust Particles Produced Due to Interaction between Main Discharge Plasma and Inner Wall in LHD, Proc. of the 27th symposium on plasma processing, P1-14, 155-156, 2010.02.
118.	T. Mieno, GuoDong Tan, S. Usuba, K. Koga, M. Shiratani, In-situ Measurement of Production Process of Nanotube-Aggregates by the Laser-Mie Scattering (Dependence of Arc Condition and Gravity), Proc. of the 27th symposium on plasma processing, P2-17, 257-258, 2010.02.
119.	K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, Proc. of the 27th symposium on plasma processing, A5-06, 91-92, 2010.02.
120.	T. Nomura, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile of hard carbon films on trenched substrates using H-assisted plasma CVD reactor, Proc. of the 27th symposium on plasma processing, P1-39, 205-206, 2010.02.
121.	J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Substrate temperature dependence of deposition profile of plasma CVD carbon films in trenches, J. Plasma Fusion Res., 8, 1443-1446, 2009.09, [URL].
122.	W. M. Nakamura, Y. Kawashima, M. Tanaka, H. Sato, J. Umetsu, H. Miyahara, H. Matsuzaki, K. Koga, M. Shiratani, Optical Emission Spectroscopy of a Magnetically Enhanced Multi-hollow Discharge Plasma for a-Si:H Deposition, J. Plasma Fusion Res., 8, 736-739, 2009.09, [URL].
123.	H. Miyahara, S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Detection of nano-particles formed in cvd plasma using a two-dimensional photon-counting laser-light-scattering method, J. Plasma Fusion Res., 8, 700-704, 2009.09, [URL].
124.	H. Sato, Y. Kawashima, M. Tanaka, K. Koga, W. M. Nakamura, M. Shiratani, Dependence of volume fraction of clusters on deposition rate of a-Si:H films deposited using a multi-hollow discharge plasma CVD method, J. Plasma Fusion Res., 8, 1435-1438, 2009.09, [URL].
125.	S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Control of Three Dimensional Transport of Nano-blocks by Amplitude Modulated Pulse RF Discharges using an Electrode with Needles, J. Plasma Fusion Res., 8, 582-586, 2009.09, [URL].
126.	S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD experimental group, A comparison of dust particles produced due to interaction between graphite and plasma: LHD vs helicon discharges, J. Plasma Fusion Res., 8, 308-311, 2009.09, [URL].
127.	M. Shiratani, K. Koga, Toward plasma nano-factories, Proc. of 2nd International Conference on Advanced Plasma Technologies (iCAPT-II) with 1st International Plasma Nanoscience Symposium (iPlasmaNano-I), 86, 2009.09.
128.	Y. Kawashima, H. Sato, K. Koga, M. Shiratani, M. Kondo, Synthesis of Si nanoparticles for multiple exciton generation solar cells using multi-hollow discharge plasma CVD, Proc. of 2009 International Symposium on Dry Process, 107, 2009.09.
129.	T. Nomura, Y. Korenaga, J. Umetsu, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Pressure, aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD, Proc. of 2009 International Symposium on Dry Process, 101, 2009.09.
130.	S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Porosity Control of Nano-Particle Composite Porous Low Dielectric Films using Pulse RF Discharges with Amplitude Modulation, Proc. of 2009 International Symposium on Dry Process, 99, 2009.09.
131.	H. Sato, Y. Kawashima, K. Koga, M. Shiratani, Measurements of Surface Temperature of a-Si:H Films in Silane Multi-Hollow Discharge with IR Thermometer, Proc. of 2009 International Symposium on Dry Process, 113, 2009.09.
132.	K. Nakahara, Y. Kawashima, H. Sato, K. Koga, M. Shiratani, Measurements of electron density in SiH4+H2 multi-hollow discharges using a frequency shift probe, Proc. of 2009 International Symposium on Dry Process, 163, 2009.09.
133.	H. Miyata, S. Iwashita, YasuY. Yamada, K. Koga, M. Shiratani, Dust Particles formed owing to interactions between H2 or D2 helicon plasma, graphite, Proc. of 2009 International Symposium on Dry Process, 33, 2009.09.
134.	M. Shiratani, S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Akiyama, Plasma CVD of Nano-particle Composite Porous SiOCH Films, Proc. of 19th International Symposium on Plasma Chemistry, 2009.07, [URL].
135.	KOGA Kazunori, IWASHITA Shinya, KIRIDOSHI Satoru, SHIRATANI Masaharu, ASHIKAWA Naoko, NISHIMURA Kiyohiko, SAGARA Akio, KOMORI Akio, LHD Experimental Group, Characterization of Dust Particles Ranging in Size from 1 nm to 10 µm Collected in the LHD, Plasma and Fusion Research, 10.1585/pfr.4.034, 4, 34-34, 2009.04, [URL], We collected dust particles ranging in size from 1 nm to 10 µm from the Large Helical Device employing two methods: an ex-situ filtered vacuum collection method and an in-situ dust collection method. The size distribution from 1 nm to 10 µm is well expressed by the Junge distribution. Dust particles are classified into three kinds: small spherical dust particles below 1 µm in size, agglomerates consisting of primary particles of 10 nm, and large dust particles above 1 µm in size and irregular in shape; this suggests three formation mechanisms of dust particles: chemical vapor deposition growth, agglomeration, and peeling from walls. In-situ collection shows that agglomeration between dust particles takes place in main discharges. The primary dust particles in agglomerates are around 10 nm in size, suggesting agglomeration between a negatively charged large agglomerate and a positively charged dust particle 10 nm in size. We have also confirmed the important fact that a large number of dust particles move during vacuum vent. Therefore, the in-situ dust collection method is needed to reveal the generation-time and -processes of dust particles and their deposition position during discharges..
136.	S. Iwashita, H. Miyata, H. Matsuzaki, K. Koga, M. Shiratani, Nano-block manipulation using pulse RF discharges with amplitude modulation combined with a needle electrode, Proc. of PSS2009/SPP26, 2009.02.
137.	K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani, High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method, Proc. of PSS2009/SPP26, 2009.02.
138.	Nakamura W. M., Sato H., Koga K., Shiratani M., Effects of magnetic fields on multi-hollow discharges for thin film silicon solar cells, Proc. of PSS2009/SPP26, 2009.02.
139.	J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile of toluene plasma CVD carbon films in trenches, Proc. of PSS2009/SPP26, 2009.02.
140.	K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, Proc. of PSS2009/SPP26, 2009.02.
141.	S. Iwashita, H. Miyata, K. Koga, M. Shiratani, N. Ashikawa, A. Sagara, K. Nisimura, Characteristics of dust particles produced due to interaction between hydrogen plasma, graphite, Proc. of PSS2009/SPP26, 2009.02.
142.	S. Iwashita, H. Miyata, K. Koga, H. Matsuzaki, M. Shiratani, M. Akiyama, Plasma CVD of Nano-particle Composite Porous Films of k=1.4-2.9, Young’s Modulus above 10 GPa, Proc. of 30th International Symposium on Dry Process, 115, 2008.12.
143.	J. Umetsu, K. Inoue, T. Nomura, H. Matsuzaki, K. Koga, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori, Deposition profile of plasma CVD carbon films in trenches, Proc. of 30th International Symposium on Dry Process, 35, 2008.12.
144.	S. Iwashita, K. Koga, M. Morita, M. Shiratani, Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062006, 100, 6, p. 062006, 2008.08, [URL].
145.	J. Umetsu, K. Koga, K. Inoue, M. Shiratani, Optical emission spectroscopic study on H-assisted plasma for anisotropic deposition of Cu films, J. Phys. : Conference Series, 10.1088/1742-6596/100/6/062007, 100, 6, p. 062007, 2008.08, [URL].
146.	W. M. Nakamura, K. Koga, H. Miyahara, M. Shiratani, Cluster incorporation control for a-Si:H film deposition, J. Phys. : Conference Series, 10.1088/1742-6596/100/8/082018, 100, 8, p. 082018, 2008.08, [URL].
147.	M. Shiratani, W. M. Nakamura, H. Miyahara, K. Koga, Nanoparticle-Suppressed Plasma CVD for Depositing Stable a-Si:H Films, Digest of Technical Papers of the Fifteenth International Workshop on Active-Matrix Flatpanel Displays, Devices (AM-FPD 08), 69, 2008.07.
148.	M. Shiratani, S. Iwashita, K. Koga, S. Nunomura, Rapid transport of nano-particles having a fractional elemental charge on average in capacitively coupled rf discharges by amplitude modulating discharge voltage, Faraday Discussions, 10.1039/B704910B , 137, 127-138, 2008.01, [URL].
149.	K. Koga, W. M. Nakamura, and M. Shiratani, VHF discharge sustained in a small hole, Proc. 28th Intern. Conf. on Phenomena in Ionized Gases, 1987-1989, 2007.07.
150.	S. Iwashita, K. Koga, M. Shiratani, Transport of nano-particles in pulsed AM RF discharges, Proc. the 24th Symp. on Plasma Processing, 103-104, 2007.01.
151.	K. Koga, W. M. Nakamura, D. Shimokawa, M. Shiratani, Stability of a-Si:H deposited using multi-hollow plasma CVD, Proc. the 24th Symp. on Plasma Processing, 189-190, 2007.01.
152.	M. Shiratani, S. Kiridoshi, K. Koga, S. Iwashita, N. Ashikawa, K. NIshimura, A. Sagara, A. Komori, LHD Experimental Group, In-situ sampling of dust generated in LHD and its analysis, Proc. the 24th Symp. on Plasma Processing, 371-372, 2007.01.
153.	S. Nunomura, K. Koga, M. Shiratani, Y. Watanabe, Y. Morisada, N. Matsuki, and S. Ikeda, Fabrication of nanoparticle composite porous films having ultra-low dielectric constant, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1509, 44, 50, L1509-L1511, 2005.12, [URL].
154.	K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition, Jpn. J. Appl. Phys., 10.1143/JJAP.44.L1430, 44, 48, L1430-L1432, 2005.11, [URL].
155.	M. Shiratani, T. Kakeya, K. Koga, Y. Watanabe, and M. Kondo, Production of crystalline Si nano-particles using VHF discharges and their properties, Trans. Mateｒ. Res. Soc. Jpn., 30, 1, 307-310, 2005.03.
156.	Y. Watanabe, M. Shiratani, K. Koga, Preparation of high-quality a-Si:H using cluster-suppressed plasma CVD method and its prospects, Trans. Mateｒ. Res. Soc. Jpn., 30, 1, 267-272, 2005.03.
157.	K. Koga, R. Uehara, Y. Kitaura, M. Shiratani, Y. Watanabe, A. Komori, Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall, IEEE Trans. Plasma Science, 10.1109/TPS.2004.828129 , 32, 2, 405-409, 2004.02, [URL].
158.	M. Shiratani, K. Koga, A. Harikai, T. Ogata, and Y. Watanabe, Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges, MRS Symp. Proc., 10.1557/PROC-762-A9.5, 762, A9.5.1-9.5.6, 2003.04, [URL].
159.	K. Takenaka, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, M. Shiratani, and Y. Watanabe, Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches, MRS Symp. Proc., 10.1557/PROC-766-E3.8, 766, E3.8.1-3.8.6, 2003.04, [URL].
160.	白谷正治, 古閑一憲, 尾形隆則, 掛谷知秀, 鹿口直斗, 渡辺征夫, シランプラズマ中のクラスタ成長と薄膜形成, 信学技報, 103, 6, 35-39, 2003.04, [URL].
161.	K. Takenaka, M. Shiratani, M. Onishi, M. Takeshita, T. Kinoshita, K. Koga, and Y. Watanabe, Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition, Matr. Sci. Semiconductor Processing, 10.1016/S1369-8001(02)00108-7, 5, 2, 301-304, 2003.02, [URL].
162.	白谷正治, 古閑一憲, 渡辺征夫, ナノクラスタ制御プラズマCVDと高品質，光安定a-Si:H太陽電池への応用, アモルファスセミナーテキスト, 95-100, 2002.11.
163.	M. Shiratani, K. Koga, Y. Watanabe, Formation of nano-particles in microgravity plasma, Journal of Japan Society of Microgravity Application, 19, 69, 2002.10, [URL].
164.	K. Takenaka, M. Onishi, M. Takenaka, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of copper by plasma CVD method, Proc. Intern. Symp. on Dry Process, 221-226, 2002.10.
165.	Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited lecture paper), Plasma Sources Sci. Technol., 10.1088/0963-0252/11/3A/334, 11, A229-A233, 2002.08, [URL].
166.	M. Shiratani, M. Kai, K. Imabeppu, K. Koga, Y. Watanabe, Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films, Proc. ESCANPIG16/ICRP5 Joint Meeting, II323--II324, 2002.07.
167.	K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)2, Proc. ESCANPIG16/ICRP5 Joint Meeting, II173--II174, 2002.07.
168.	K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Anisotropic deposition of Cu with H-assisted plasma CVD, Proc. ESCANPIG16/ICRP5 Joint Meeting, II199--II200, 2002.07.
169.	K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 238-243, 2002.05.
170.	K. Takenaka, M. Onishi, T. Kinoshita, K. Koga, M. Shiratani, Y. Watanabe, T. Shingen, Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method, Proc. Intern. Workshop on Information and Electrical Engineering (IWIE2002), 227-232, 2002.05.
171.	Y. Watanabe, A. Harikai, K. Koga, M. Shiratani, Clustering phenomena in low-pressure reactive plasma: basis and applications (invited lecture paper), Pure Appl. Chem. , 10.1351/pac200274030483, 74, 3, 483-487, 2002.03, [URL].
172.	K. Koga, M. Shiratani, Y. Watanabe, In-situ measurement of size and density of particles in sub-nm to nm size range, Proc. Nano-technology Workshop, 13-20, 2002.02.
173.	M. Shiratani, K. Koga, Y. Watanabe, Deposition of high-quality Si films by suppressing cluster growth in SiH4 high-frequency discharges, Proc. Nano-technology Workshop, 7-12, 2002.02.
174.	白谷正治, 古閑一憲, 渡辺征夫, プロセスプラズマ中のクラスタ - アモルファスシリコン太陽電池製造用プラズマ中のクラスター, Bulletin of Cluster Sci. Technol., 5, 13-18, 2002.01.
175.	渡辺征夫, 古閑一憲, 白谷正治, クラスタ制御プラズマCVD法によるSi薄膜の高品質化, シリコンテクノロジー, 37, 21-26, 2002.01.
176.	K. Takenaka, H. J. Jin, M. Onishi, K. Koga, M. Shiratani, Y. Watanabe, Deposition of pure copper thin films by H-assisted plasma CVD using a new Cu complex Cu(EDMDD)2, Proc. Intern. Symp. on Dry Process, 169-174, 2001.11.
177.	M. Shiratani, K. Koga, Y. Watanabe, Cluster-less plasma CVD reactor and its application to a-Si:H film deposition, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-664-A5.6, A5.6.1-A5.6.6, 2001.07, [URL].
178.	Y. Watanabe, M. Shiratani, K. Koga, Nucleation and subsequent growth of clusters in reactive plasma (invited), Proc. Intern. Conf. on Phenomena in Ionized Gases, 15-16, 2001.07.
179.	M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, Development of H-assisted plasma CVD reactor for Cu interconnects, Proc. Intern. Conf. on Phenomena in Ionized Gases, 147-148, 2001.07.
180.	K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, Proc. Intern. Conf. on Phenomena in Ionized Gases, 39-40, 2001.07.
181.	Y. Watanabe, M. Shiratani, K. Koga, Clustering phenomena in low-pressure reactive plasma: base and applications (invited), Proc. Intern. Symp. on Plasma Chemistry, 726-730, 2001.07.
182.	M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath of electropositive and electronegative gas discharges, Proc. Intern. Conf. on Phenomena in Ionized Gases, 153-154, 2001.07.
183.	Y. Watanabe, M. Shiratani, K. Koga, Formation kinetics and control of dust particles in capacitively-coupled reactive plasma (invited), Phys. Scripta, 10.1238/Physica.Topical.089a00029, T89, 29-32, 2001.01, [URL].
184.	M. Shiratani, K. Koga, Y. Watanabe, Plasma CVD method for Cu interconnects in ULSI (invited), Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 751-754, 2001.01.
185.	M. Shiratani, N. Shiraishi, K. Koga, Y. Watanabe, Measurements of surface reaction probability of SiH3, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 419-420, 2001.01.
186.	M. Shiratani, H. J. Jin, K. Takenaka, K. Koga, T. Kinoshita, Y. Watanabe, H assisted control of quality and conformality in Cu film deposition using plasma CVD method, Proc. Advanced Metallization Conf. 2000, 271-278, 2001.01.
187.	K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution and excitation frequency on initial growth of clusters in silane plasma, Proc. Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 385-386, 2001.01.
188.	M. Shiratani, T. Sonoda, N. Shikatani, K. Koga, Y. Watanabe, Development of cluster-suppressed plasma CVD reactor for high quality a-Si:H film deposition, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 421-422, 2001.01.
189.	M. Shiratani, A. Toyozawa, K. Koga, Y. Watanabe, Behavior of a particle injected in ion sheath, Proc. of Plasma Science Symp. 2001/ 18th Symp. on Plasma Processing, 393-394, 2001.01.
190.	M. Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, K. Koga, Y. Watanabe, Methods of suppressing cluster growth in silane rf discharges, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-609-A5.6, A5.6.1-A5.6.6, 2000.07, [URL].
191.	H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Deposition of smooth thin Cu films in deep submicron trench by plasma CVD reactor with H atom source, Mat. Res. Soc. Symp. Proc., 10.1557/PROC-612-D9.2.1, D9.2.1-D9.2.6, 2000.07, [URL].
192.	R. Ichiki, M. Shindo, S. Yoshimura, K. Koga, Y. Kawai, Propagation characteristics of ion acoustic waves in an Ar/SF6 plasma, J. Phys. Soc. Jpn., 10.1143/JPSJ.69.1925, 69, 6, 1925-1926, 2000.06, [URL].
193.	H. J. Jin, M. Shiratani, Y. Nakatake, K. Koga, T. Kinoshita, Y. Watanabe, Filling subquater-micron trench structure with high-purity copper using plasma reactor with H atom source, Res. Rep. ISEE Kyushu Univ., 5, 1, 57-61, 2000.03.
194.	Y. Watanabe, M. Shiratani, T. Fukuzawa, K. Koga, Growth processes of particles up to nanometer size in high-frequency SiH4 plasma, Jour. Technical Phys., 41, 1, 505-519, 2000.01.
195.	K. Koga, H. Naitou, Y. Kawai, Observation of Asymmetric Sheath Structure in Multi-Component Plasma Containing Negative Ions, J. Plasma Fusion Res., 2, 435-438, 1999.12, [URL].
196.	K. Koga, H. Naitou, Y. Kawai, Observation of Local Structures in Asymmetric Ion Sheath, J. Phys. Soc. Jpn., 10.1143/JPSJ.68.1578, 68, 5, 1578-1584, 1999.05, [URL].
197.	K. Koga, Y. Kawai, Behavior of the Ion Sheath Instability in a Negative Ion Plasma, Jpn. J. Appl. Phys., 10.1143/JJAP.38.1553, 38, 3A, 1553-1557, 1999.03, [URL].

主要学会発表等

全てを見る→

1.	K.Koga‚ S. H. Hwang‚ K. Kamataki‚ N. Itagaki‚ M. Shiratani, High Throughput Deposition of Hydrogenated Amorphous Carbon Films using High-Pressure Ar+CH4 Plasmas, ICMCTF2021, 2021.04.
2.	古閑一憲, 黄成和, Y.Hao, 鎌滝晋礼, 奥村賢直, 板垣奈穂, 白谷正治, プラズマを用いてカーボンナノ粒子層を含むミルフィーユ型 a-C:H 膜の機械的特性, 第68回応用物理学会春季学術講演会, 2021.03.
3.	古閑一憲, クロージングリマークス(招待講演), 応用物理学会プラズマエレクトロニクス分科会３０周年記念シンポジウム, 2021.03.
4.	古閑一憲, S. H. Hwang, Y. Hao, P. Attir, 奥村賢直，鎌滝晋礼，板垣奈穂, 白谷正治, プラズマCVD中飛行時間によるカーボンナノ粒子サイズ制御, 日本物理学会第76回年次大会, 2021.03.
5.	K. Koga, Green Route for Nitrogen-Enriched Organic Manure Synthesis Using Plasma Technology(Invited), ISPlasma2021/IC-PLANTS2021, 2021.03.
6.	K. Koga, Influences of Plasma Treatment of Seeds on their Molecular Responses(Invited), 3rd International Workshop on Plasma Agriculture, 2021.03.
7.	古閑一憲, CVDプラズマ中のナノ粒子の成長制御と応用(招待講演), 第72回CVD研究会, 2020.12.
8.	K. Koga, P. Attri, T. Anan, R. Arita, H. Tanaka, T. Okumura, D. Yamashita, K. Matsuo, K. Kanataki, N. Itagaki, M. Shiratani, Y. Ishibashi, Impact of Plasma Treatment Time on the Barley Seeds using Electron Paramagnetic Resonance, 第30回日本MRS年次大会, 2020.12.
9.	K. Koga, P. Attri, K. Ishikawa, T. Okumura, K. Matsuo, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, V. Mildaziene, Role of seed coat color and harvest year on growth enhancement by plasma irradiation to seeds, The 73rd Annual Gaseous Electronics Conference, 2020.10.
10.	古閑一憲,　S. H. Hwang,　奥村賢直,　Y. Hao,　山下大輔,　松尾かよ,　板垣奈穂,　鎌滝晋礼,　白谷正治, マルチホロー放電プラズマ CVDを用いて作製したカーボンナノ粒子輸送量に対する電極基板間距離の効果, 2020年度(第73回)電気・情報関係学会九州支部連合大会, 2020.09.
11.	古閑一憲, 奥村賢直, 鎌滝晋礼, 板垣奈穂, 白谷正治, 谷口雄太, 池田大輔, プラズマCVD技術文献のテキストマイニングを用いた単語のインパクトの解析, 第81回応用物理学会秋季学術講演会, 2020.09.
12.	古閑一憲, 鎌滝晋礼, 奥村賢直, 板垣奈穂, 白谷正治, プラズマCVDを用いたa-Si：H堆積薄膜中のSi-H/Si-H2結合形成の活性化エネルギー, 日本物理学会 2020年秋季大会, 2020.09.
13.	古閑⼀憲, 黄成和, 石川健治, P. Attri, 松尾かよ, 山下⼤輔, 板垣奈穂, 鎌滝晋礼, 白谷正治, ⾮平衡プラズマを⽤いたサイズ制御したカーボンナノ粒⼦の連続作製と堆積, 第67回応用物理学会春季学術講演会, 2020.03.
14.	古閑⼀憲, 石橋勇志, S. Chetphilin, 田中颯, 佐藤僚哉, 有田涼, 廣松真弥, 石川健治, P. Attri, 松尾かよ, 山下⼤輔, 板垣奈穂, 鎌滝晋礼, 白谷正治, ⾼温障害を持つイネ種⼦の発芽特性に対するプラズマ照射の効果, 第67回応用物理学会春季学術講演会, 2020.03.
15.	古閑一憲, 原尚志, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマと薄膜のナノ界面相互作用による結合形成の活性化エネルギー評価, 日本物理学会第75回年次大会(2020年), 2020.03.
16.	古閑⼀憲, プラズマ照射種子を用いた圃場実験の結果報告(招待講演), 第１回プラズマ農業フィールドテスト研究会, 2020.02.
17.	古閑一憲, 佐藤僚哉, 吉田知晃, 有田涼, 田中颯, 廣松真弥, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマ照射した種籾の圃場栽培試験, 第36回プラズマ・核融合学会年会, 2019.12.
18.	K. Koga, M. Shiratani, V. Mildaziene, Metabolomics Approach for Studying Effects of Atmospheric Air Plasma Irradiation to Seeds (Keynote), 29th Annual Meeting of MRS-J, 2019.11.
19.	K. Koga, M. Shiratani, Impact of Atmospheric Pressure Plasma Irradiation to Seeds on Agricultural Productivity, 3rd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP2019), 2019.11.
20.	K. Koga, A. Yamamoto, K. Kamataki, N. Itagaki, M. Shiratani, Rate Limiting Factors of Low Pressure Plasma-catalytic CO2 Methanation Process, AVS 66th International Symposium & Exhibition, 2019.10.
21.	K. Koga, M. Shiratani, Non-equilibrium nanoparticle composite film process using reactive plasmas (Invited), Advanced Metallization Conference 2019: 29th Asian Session (ADMETA Plus 2019), 2019.10.
22.	古閑一憲, 鎌滝晋礼, 白谷正治, プラズマ生成前駆体制御による単分散ナノ粒子合成, 2019年第80回応用物理学会秋季学術講演会, 2019.09.
23.	古閑一憲, Sung Hwa Hwang, 鎌滝晋礼, 板垣奈穂, 白谷正治, Ar+CH4プラズマCVDを用いて堆積した水素化アモルファスカーボン薄膜の堆積特性に対する電極基板間距離依存性, 2019年度（第72回）電気・情報関係学会九州支部連合大会, 2019.09.
24.	K. Koga, M. Shiratani, Plasmas - from Laboratory to Table - (Invited), The 12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019), 2019.09.
25.	K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, M. Shiratani, Synthesis and deposition of a-C:H nanoparticles using reactive plasmas with a fast gas flow, The Korea-Japan Workshop on Dust Particles in Plasmas, 2019.08.
26.	S. Urakawa, N. Miyahara, D. Yamashita, K. Kamataki, K. Koga, M. Shiratani, N. Itagaki, Sputter deposition of wide bandgap (ZnO)x(AlN)1-x alloys: a new material system with tunable bandgap, XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10), 2019.07.
27.	K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki M. Shiratani, Growth Mechanism of Carbon Nanoparticles In Multi-Hollow Discharge Plasma Chemical Vapor Deposition (Invited), XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) & 10th International Conference on Reactive Plasmas (ICRP-10), 2019.07.
28.	永石翔大, 佐々木勇輔, 鎌滝晋礼, 板垣奈穂, 古閑一憲, 白谷正治, マルチホロー放電プラズマCVD法による高品質SiN膜の低温(100度)形成, 令和元年度日本表面真空学会九州支部学術講演会（九州表面・真空研究会2019）, 2019.06.
29.	K. Koga, S. H. Hwang, T. Nakatani, J. S. Oh, K. Kamataki, N. Itagaki, M.Shiratani, Deposition of Carbon Nanoparticles Using Multi-Hollow Discharge Plasma CVD for Synthesis of Carbon Nanoparticle Composite Films, 46th International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2019), 2019.05.
30.	古閑一憲, 大友洋, 真銅雅子, 鎌滝晋礼, 板垣奈穂, 白谷正治, 微粒子プラズマにおける2体衝突運動の顕微高速観察, 日本物理学会第74回年次大会（2019年）, 2019.03.
31.	K. Koga, Y. Wada, R. Sato, R. Shimada, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, T. Kawasaki, Spatial Profile of RONS Dose Supplied by a Scalable DBD Device, The 3rd Asian Applied Physics Conference, 2018.12.
32.	古閑一憲, 嶋田凌太郎, 和田陽介, 佐藤僚哉, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治, Vida Mildaziene, カイワレ大根種皮の色素に対するプラズマ照射の効果, 第35回プラズマ・核融合学会年会, 2018.12.
33.	K. Koga, Y. Wada, R. Sato, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, Evaluation of Amount of RONS Transport and Absorption of Seeds, 2018 MRS Fall Meeting & Exhibit, 2018.11.
34.	K. Koga, M. Shiratani, Innovative Agricultural Productivity Improvement Using Atmospheric Pressure Plasmas (Invited), 2018 MRS Fall Meeting & Exhibit, 2018.11.
35.	古閑一憲, 反応性プラズマとナノ粒子相互作用ゆらぎネットワーク解析, 第34回九州･山口プラズマ研究会, 2018.11.
36.	K. Koga, S. H. Hwang, K. Kamataki, N. Itagaki, T. Nakatani, M. Shiratani, Synthesis of Hydrogenated Amorphous Carbon Nanoparticles using High-Pressure CH4+Ar Plasmas and Their Deposition, AVS 65th International Symposium & Exhibition, 2018.10.
37.	古閑一憲, 大友洋, 周靭, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマ中二体微粒子の衝突解析による相互作用揺らぎの研究, 2018年第79回応用物理学会秋季学術講演会, 2018.09.
38.	古閑一憲, 田中和真, 原尚志, 石榴, 中野慎也, 山下大輔, 鎌滝晋礼, 板垣奈穂, 白谷正治, Siネットワーク秩序性に対する製膜前駆体の効果, 2018年第79回応用物理学会秋季学術講演会, 2018.09.
39.	K. Koga, K. Tanaka, H. Hara, S. Nagaishi, D. Yamashita, K. Kamataki, N. Itagaki, M. Shiratani, Effects of cluster deposition on spatial profile of Si-Hx bond density in a-Si:H films, 2018 International Conference on Solid State Devices and Materials (SSDM2018), 2018.09.
40.	K. Koga, M. Shiratani, Challenge to precise control of chemical bond configuration in plasma CVD films, RUB Japan Science Days 2018, 2018.07.
41.	K. Koga, M. Shiratani, Control of synthesis and deposition of nanoparticles using a multi-hollow discharge plasma CVD, Workshop "Plasma surface interaction for technological applications", 2018.06.
42.	K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, High energy leverage method on growth enhancement of bio-mass plants using plasma seed treatment, 7th International Conference on Plasma Medicine (ICPM-7), 2018.06.
43.	K. Koga, K. Kamataki, N. Itagaki, M. Shiratani, A deep insight of plasma-nanoparticle interaction, 19th International Congress on Plasma Physics, 2018.06.
44.	古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 水素原子源付プラズマCVD法に任意電圧波形を併用したa-C:H薄膜の堆積, 第65回応用物理学会春季学術講演会, 2018.03.
45.	古閑一憲, 和田陽介, 佐藤僚哉, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 大気圧空気誘電体バリア放電プラズマを照射したカイワレ種子の電子スピン共鳴分光, 第65回応用物理学会春季学術講演会, 2018.03.
46.	古閑一憲, 山木健司, 方トウジュン, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 任意電圧波形を用いたC7H8+Ar+H2プラズマ生成, 平成30年電気学会全国大会, 2018.03.
47.	K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of RONS Dose on Plasma Induced Growth Enhancement of Radish Sprout, 2nd International Workshop On Plasma Agriculture (IWOPA2), 2018.03.
48.	K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Plasma Enhanced Carbon Recycling for Large-Scale Introduction of Solar Cells to Energy Supply Chain, 5th Korea-Japan Joint Symposium on Advanced Solar Cells 2018, 2nd International Symposium on Energy Research and Application, 2018.02.
49.	K. Koga, G. Uchida, M. Shiratani, Towards ultra-high capacity batteries, Joint workshop btw SKKU and Kyushu University Emerging materials and devices, 2018.01.
50.	K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, A new insight into nanoparticle-plasma interactions (Invited), JP-KO dust workshop, 2017.12.
51.	K. Koga, K. Mori, R. Zhou, H. Seo, N. Itagaki, M. Shiratani, Evaluation of coupling among interaction fluctuations in nanoparticle growth in reactive plasmas, 18th Workshop on Fine Particle Plasmas, 2017.12.
52.	K. Koga, T. Kojima, S. Toko, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Deposition of High Quality Silicon Thin Films Utilizing Nanoparticles Trapped in Plasmas, 27th annual meeting of MRS-J, 2017.12.
53.	K. Koga, Y. Wada, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Number Density of Seeds on Plasma Induced Plant Growth Enhancement, 27th annual meeting of MRS-J, 2017.12.
54.	K. Koga, Y. Wada, R. Sato, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Effects of Gas Flow Velocity on Plant Growth of Radish Sprout, The 2nd Asian Applied Physics Conference (Asian-APC), 2017.12.
55.	古閑一憲, 白谷正治, 植物種子へのプラズマ照射効果による成長促進とその機序（シンポジウム講演）, Plasma Conference 2017, 2017.11.
56.	K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Development of a fine particle transport analyzer for processing plasmas, The 39th International Symposium on Dry Process (DPS 2017), 2017.11.
57.	古閑一憲, 反応性プラズマを用いた物質機能の初期階層形成, 第33回九州･山口プラズマ研究会, 2017.11.
58.	K. Koga, S. Toko, S. Tanida, M. Shiratani, Surface-driven CH4 generation from CO2 in Low-pressure Non-thermal Plasma, American Vacuum Society 64th International Symposium and Exhibition (AVS64), 2017.10.
59.	古閑一憲, 都甲将, 谷田知史, 白谷正治, 細田聡史, 星野健, 火星上CO2のCH4資源化のための低温低圧プラズマ触媒プロセス, 第61回宇宙科学技術連合講演会, 2017.10.
60.	古閑一憲, 和田陽介, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, スケーラブルDBDプラズマのRONS照射量に対する空気流れの効果, 平成29年度（第70回）電気・情報関係学会九州支部連合大会, 2017.09.
61.	K. Koga, S. Toko, M. Shiratani, Hysteresis in Plasma CVD: a new path for high quality film deposition, 11th Asian-European International Conference on Plasma Surface Engineering (AEPSE2017), 2017.09.
62.	古閑一憲, 和田陽介, 徐鉉雄, 板垣奈穂, 白谷正治, 橋本昌隆, 小島昌治, プラズマ照射した種籾への催芽処理の効果, 第78回応用物理学会秋季学術講演会, 2017.09.
63.	K. Koga, H. Seo, A. Tanaka, N. Itagaki, M. Shiratani, Synthesis of Nanoparticles Using Low Temperature Plasmas and Its Application to Solar Cells and Tracers in Living Body (Invited), 231st Meeting of Electrochemical Society (ECS), 2017.05.
64.	古閑一憲, 徐鉉雄, 板垣奈穂, 白谷正治, 低温プラズマによるナノ粒子の合成と太陽電池への応用, 電子情報通信学会有機エレクトロニクス研究会, 2017.04.
65.	K. Koga, K. Mori, H. Seo, N. Itagaki, M. Shiratani, Corrational study of fluctuation of coupling between plasmas and nanoparticles, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
66.	K. Koga, P. Attri, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Comparision of Gamma irradation and scalable DBD on the declorization of Dyes, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
67.	K. Koga, A. Tanaka, M. Hirata, T. Amano, T. Sarinont, H. Seo, N. Itagaki, M. Shiratani, Long-term evaluation of In nanoparticle transport in living body, 9th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 10th International Conference on Plasma Nanotechnology and Science (ISPlasma2017/IC-PLANTS2017), 2017.03.
68.	古閑一憲, 九州大学における反応性プラズマ精密制御CVD法の紹介（招待講演）, 第1回産学共同研究検討会, 2017.01.
69.	K. Koga, K. Mori, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, Time evolution of cross-correlation between two fluctuations of couplings between plasmas and nanoparticles in amplitude modulated discharges, 17th Workshop on Fine Particle Plasmas and JAPAN-KOREA Workshop on Dust Particles 2016, 2016.12.
70.	K. Koga, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, Dependence of amount of plasma activated water on growth enhancement of radish sprout, 26th annual meeting of MRS-J, 2016.12.
71.	K. Koga, T. Amano, T. Sarinont, R. Katayama, Y. Wada, H. Seo, N. Itagaki, M. Shiratani, A. Tanaka, Y. Nakatsu, T. Kondo, Comparative study on death of cells irradiated by non-thermal plasma, X-ray, and UV, The 1st Asian Applied Physics Conference (Asian-APC), 2016.12.
72.	古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, 小型ダスト飛跡分析装置を用いたミラー上ダスト堆積抑制の検討, 第33回プラズマ・核融合学会年会, 2016.12.
73.	古閑一憲, プラズマCVDを用いた高効率低劣化Si薄膜太陽電池の作製（招待講演）, 第33回プラズマ・核融合学会年会, 2016.11.
74.	古閑一憲, 森研人, 徐鉉雄, 板垣奈穂, 白谷正治, プラズマとナノ粒子の相互作用ゆらぎの２次元空間構造の時間発展, 第33回プラズマ・核融合学会年会, 2016.11.
75.	古閑一憲, プラズマ計測・診断－反応性プラズマ中微粒子を中心として－（招待講演）, 第2７回プラズマエレクトロニクス講習会, 2016.11.
76.	K. Koga, T. Sarinont, M. Shiratani, Control of Plant Growth by RONS Produced Using Nonthermal Atmospheric Air Plasma, American Vacuum Society 63rd International Symposium and Exhibition (AVS63), 2016.11.
77.	K. Koga, R. Katayama, T. Sarinont, H. Seo, N. Itagaki, P. Attri, E. L. Quiros, .A. Tanaka, M. Shiratani, Comparative study of non-thermal atmospheric pressure discharge plasmas for life science applications, 69th Annual Gaseous Electronics Conference (GEC2016), 2016.10.
78.	古閑一憲, 都甲将, 白谷正治, 火星上でのロケット燃料生成を目的とした低温低圧放電プラズマによるサバティエ反応, 第60回宇宙科学技術連合講演会, 2016.09.
79.	K. Koga, T. Amano, Y. Nakatsu, H. Seo, N. Itagaki, A. Tanaka, T. Kondo, M. Shiratani, Time development of response of cells irradiated by non-thermal atmospheric air plasma, 6th International Conference on Plasma Medicine (ICPM6), 2016.09.
80.	K. Koga, T. Sarinont, P. Attri, M. Shiratani, Nitrite concentration of plants grown from seeds irradiated by air dielectric barrier discharge plasmas, 20th International Vacuum Congress (IVC-20), 2016.08.
81.	古閑一憲, 片山龍, 方韜鈞, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 増崎貴, 芦川直子, 時谷政行, 西村清彦, 相良明男, LHD実験グループ, QCMを用いたLHD内ダスト堆積量のその場測定, 第11回核融合エネルギー連合講演会, 2016.07.
82.	古閑一憲, 添島雅大, 伊藤鉄平, 徐鉉雄, 板垣奈穂, 白谷正治, プラズマ中微粒子を用いたプラズマポテンシャルゆらぎの評価, 日本物理学会第71回年次大会, 2016.03.
83.	古閑一憲, 「プラズマ材料科学の未来を語る」（低圧非平衡プラズマプロセス） (招待講演), 第125回研究会 APSPT9-SPSM28サテライトミーティング『プラズマ材料科学の未来を語る』, 2016.02.
84.	古閑一憲, 振幅変調反応性高周波放電中のナノ粒子量のバイスペクトル解析, 応用力学研究所共同研究報告会, 2016.02.
85.	古閑一憲, 大気圧非平衡プラズマの基礎 (招待講演), プラズマ・核融合学会第28回専門講習会「プラズマ医療の現状と展望」, 2016.01.
86.	K. Koga and M. Shiratani, Potential fluctuation evaluation using binary collision of fine particles suspended in plasmas (Invited), 第16回微粒子プラズマ研究会, 2015.12.
87.	古閑一憲, 天野孝昭, Thapanut Sarinont, 徐鉉雄, 板垣奈穂, 白谷正治, 中津可道, 平田美由紀, 田中昭代, 液中プラズマを用いたAuとPtナノ粒子の簡易作製法, 平成27年度応用物理学会九州支部学術講演会, 2015.12.
88.	古閑一憲, 添島雅大, 伊東鉄平, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 野口将之, 内田誠一, プラズマ中のクーロン衝突微粒子間引力, 第32回プラズマ・核融合学会年会, 2015.11.
89.	古閑一憲, 田浪荘汰, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 新しいプラズマプロセス技術を用いた薄膜堆積, 接合科学共同利用・共同研究拠点大阪大学接合科学研究所平成２７年度共同研究成果発表会, 2015.11.
90.	K. Koga, X. Dong, K. Yamaki, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, Effects of Ion Energy on Chemical Bond Configuration in a-C:H Deposited using Ar + H2+ C7H8 Plasma CVD, 37th International Symposium on Dry Process (DPS2015), 2015.11.
91.	K. Koga, T. Amano, T. Sarinont, T. Kondo, S. Kitazaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Interactions between spin trapping reagents and non-thermal air DBD plasmas, 37th International Symposium on Dry Process (DPS2015), 2015.11.
92.	古閑一憲, プラズマ照射に対する生体応答の研究, 第31回九州･山口プラズマ研究会, 2015.11.
93.	K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, M. Shiratani, Improving of Harvest Period and Crop Yield of Arabidopsis Thaliana L. using Nonthermal Atmospheric Air Plasma, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
94.	K. Koga, T. Amano, T. Sarinont, T. Kawasaki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, Y. Nakatsu, A. Tanaka, Two Dimentional Visualization of Oxidation Effect of Scalable DBD Plasma Irradiation using KI-starch Solution, American Vacuum Society 62nd International Symposium and Exhibition (AVS), 2015.10.
95.	K. Koga, T. Sarinont, T. Amano, H. Seo, N. Itagaki, Y. Nakatsu, A. Tanaka, M. Shiratani, Simple Evaluation Method of Atmospheric Plasma Irradiation Dose using pH of Water, ICRP9/GEC68/SPP33, 2015.10.
96.	K. Koga, T. Amano, M. Hirata, A. Tanaka, M. Shiratani, In vivo kinetics of nanoparticles synthesized by plasma in water (Invited), The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials, 2015.10.
97.	K. Koga, M. Soejima, K. Tomita, T. Ito, H. Seo, N. Itagaki, M. Shiratani, In-situ laser Raman spectroscopy of an optically trapped fine particle, 17th International Symposium on Laser-Aided Plasma Diagnostics (LAPD17), 2015.09.
98.	K. Koga and M. Shiratani, Control Of Nanoprticle Transport And Their Deposition For Porous Low-k Films By Using Plasma Pertubation (Invited), The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE2015), 2015.09.
99.	古閑一憲, 添島雅大, 徐鉉雄, 板垣奈穂, 白谷正治, 内田誠一, アルゴンプラズマ中微粒子運動の画像解析によるプラズマパラメータ評価, 日本物理学会 2015年秋季大会, 2015.09.
100.	古閑一憲, 伊東鉄平, 徐鉉雄, 板垣奈穂, 白谷正治, 反応性プラズマ中ナノ粒子とラジカルの非線形結合成分の時空間解析, 日本物理学会 2015年秋季大会, 2015.09.
101.	古閑一憲, 大気圧非平衡プラズマ照射による液中ラジカル生成の相関解析（招待講演）, 新学術領域研究プラズマ・ナノマテリアル動態学の創成と安全安心医療科学の構築第21回医工連携ゼミ, 2015.04.
102.	古閑一憲, 市田大樹, 山下大輔, 徐鉉雄, 板垣奈穂, 白谷正治, 非平衡プラズマスパッタリングによる高速低温層交換結晶成長, 日本物理学会第70回年次大会, 2015.03.
103.	古閑一憲, 天野孝昭, 平田美由紀, 田中昭代, 白谷正治, ラットに皮下投与したInナノ粒子の体内輸送, 第62回応用物理学会春季学術講演会, 2015.03.
104.	古閑一憲, 市田大樹, 橋本慎史, 徐鉉雄, 山下大輔, 板垣奈穂, 白谷正治, スパッタを用いた低温高速層交換Ge結晶成長に対する基板温度の効果, 第62回応用物理学会春季学術講演会, 2015.03.
105.	古閑一憲, 都甲将, 鳥越祥宏, 毛屋公孝, 徐鉉雄, 板垣奈穂, 白谷正治, 水素化アモルファスシリコン薄膜中Si-H2結合生成に対するクラスタ混入とラジカル表面反応の寄与, 第62回応用物理学会春季学術講演会, 2015.03.
106.	古閑一憲, 内田儀一郎, 徐鉉雄, 白谷正治, プロセシングプラズマを用いたIV族半導体ナノ粒子の作製と太陽電池への応用（招待講演）, 平成26年度東北大学電気通信研究所共同プロジェクト研究会「プラズマナノバイオ・医療の基礎研究」, 2015.02.
107.	K. Koga, T. Ito, H. Seo, N. Itagaki, and M. Shiratani, Temporal development of nonlinear coupling between radicals and nanoparticles in reactive plasmas (Invited), The 75th IUVSTA Workshop on Sheath Phenomena in Plasma Processing of Advanced Materials, 2015.01.
108.	K. Koga, S. Toko, Y. Torigoe, K. Keya, H. Seo, N. Itagaki, M. Shiratani, Cluster suppressed deposition of a-Si:H films by employing non-linear phenomena in reactive plasmas (Invited), 2015 Japan-Korea Joint Symposium on Advanced Solar Cells, 2015.01.
109.	古閑一憲, サリノントタパナット, 天野孝昭, 白谷正治, 大気圧空気プラズマを照射したカイコの成長, 第24回日本MRS年次大会, 2014.12.
110.	古閑一憲, プラズマ技術の生体・環境分野への応用研究, 九州大学テクノロジーフォーラム2014, 2014.12.
111.	古閑一憲, サリノントタパナット, 北﨑訓, 林信哉, 白谷正治, プラズマ照射によるシロイヌナズナの植物成長促進の世代間伝搬, 第30回九州・山口プラズマ研究会, 2014.11.
112.	K. Koga, T. Ito, H. Seo, N. Itagaki, M. Shiratani, Analysis of coupling between nanoparticles and radicals using perturbation of radical density in reactive plasmas, Plasma Conference 2014, 2014.11.
113.	K. Koga, T. Ito, K. Kamataki, H. Seo, N. Itagaki, and M. Shiratani, Effects of amplitude modulated VHF discharge on coupling between plasmas and nanoparticles, 24th International Toki Conference, 2014.11.
114.	K. Koga, Y. Morita, T. Ito, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, Spatiotemporal Analysis of Nanoparticle Growth in Amplitude Modulated Reactive Plasmas for Understanding Interactions between Plasmas and Nanomaterials (Invited), 15th IUMRS-International Conference in Asia, 2014.08.
115.	古閑一憲, 太陽電池開発の最前線, 2014年度先端サマーセミナー（第6回研究活動交流会）, 2014.08.
116.	K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Quartz crystal microbalance measurements for in-situ evaluation of dust inventory in fusion devices, 26th Symposium on Plasma Physics and Technology, 2014.06.
117.	K. Koga, M. Tateishi, D. Yamashita, K. Kamataki, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, and the LHD Experimental Group, Real time mass measurement of dust particles deposited on vessel wall using quartz crystal microbalances in a divertor simulator, 21th International Conference on Plasma Surface Interactions (PSI2014), 2014.05.
118.	K. Koga, T. Sarinont, T. Amano, and M. Shiratani, Effects of non-thermal air plasma irradiation to plant seeds on glucose concentration of plants, International Workshop on Diagnostics and Modelling for Plasma Medicine (DMPM2014), 2014.05.
119.	古閑一憲, コンビナトリアル細胞活性解析を用いた細胞超活性プラズマの創成 (招待講演), 第8回レーザー学会「レーザーバイオ医療」技術専門委員会, 2014.03.
120.	古閑一憲, プラズマプロセス技術の最近の応用展開 (招待講演), プラズマ・核融合学会九州・沖縄・山口支部平成25年度第3回特別講演会, 2014.02.
121.	K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida and M. Shiratani, Coupling between radicals in plasmas and nanoparticle growth in initial growth phase in reactive plasmas with amplitude modulation, 18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics, 2014.02.
122.	K. Koga, Y. Hashimoto, S. Toko, D. Yamashita, Y. Torigoe, G. Uchida, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Fabrication of highly stable a-Si:H solar cells by suppressing cluster incorporation (Invited), 2014 Japan-Korea Joint Symposium on Advanced Solar Cells, 2014.02.
123.	K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Coupling between radicals and nanoparticles in initial growth phase in reactive plasmas with amplitude modulation (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
124.	K. Koga, T. Sarinont, S. Kitazaki, N. Hayashi, M. Shiratani, Multi-generation evaluation of plasma growth enhancement to arabidopsis thaliana (Invited), 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing (ICRP-8/SPP-31), 2014.02.
125.	古閑一憲, プラズマ技術およびその応用可能性について (招待講演), 平成25年度次世代テクノロジーセミナー, 2014.01.
126.	K. Koga, Y. Morita, K. Kamataki, D. Yamashita, N. Itagaki, G. Uchida, M. Shiratani, Correlation between Plasma Fluctuation and Nanoparticle Amount in Initial Growth Phase in Reactive Plasmas with Amplitude Modulation, 14th Workshop on Fine Particle Plasmas, 2013.12.
127.	K. Koga, G. Uchida, D. Ichida, S. Hashimoto, H. Seo, K. Kamataki, N. Itagaki, and M. Shiratani, Quantum dot sensitized solar cells using group IV semiconductor nanoparticles (Invited), 2013 EMN Fall Meeting, 2013.12.
128.	古閑一憲, 森田康彦, 岩下伸也, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, ナノ粒子成長に対するプラズマ摂動周波数の効果, プラズマ・核融合学会第30回年会, 2013.12.
129.	K. Koga, G. Uchida, D. Ichida, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, Deposition of Ge Nanoparticle Films and Their Application to Ge Quantum-dot Sensitized Solar Cells, The 23rd International Photovoltaic Science and Engineering Conference, 2013.11.
130.	K. Koga, S. Iwashita, G. Uchida, D. Yamashita, H. Seo, K. Kamataki, N. Itagaki, M. Shiratani, U. Czarnetzki, Carbon Nanostructure formed by high pressure methane plasmas, The 26th Symposium on Plasma Science for Materials (SPSM-26), 2013.09.
131.	K. Koga, A. Tanaka, M. Hirata, N. Hayashi, N. Itagaki and G. Uchida, Comparative Acute Pulmonary Toxicity of Different Types of Indium-Tin Oxide Following Intermittent Intratracheal Instillation to the Lung of Rats, 2013 JSAP-MRS Joint Symposia, 2013.09.
132.	古閑一憲, 橋本優史, 金淵元, 都甲将, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, クラスタ抑制法を用いた高光安定アモルファスシリコンPIN太陽電池の作製, プラズマ研究会, 2013.09.
133.	K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, H. Seo, M. Shiratani and U. Czarnetzki, Formation of self-organized nanostructures using high pressure CH4+Ar plasmas, The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013), 2013.08.
134.	K. Koga, S. Iwashita, G. Uchida, D. Yamashita, N. Itagaki, K. Kamataki, M. Shiratani, U. Czarnetzki, High Pressure Nonthermal Methane Plasmas for Nanoparticle Production, The 12th Asia Pacific Physics Conference (APPC12), 2013.07.
135.	古閑一憲, 森田康彦, 内田儀一郎, 鎌滝晋礼, 徐鉉雄, 板垣奈穂, 白谷正治, 振幅変調放電プラズマ中のナノ粒子成長初期におけるナノ粒子量の時空間分布, 2013年第60回応用物理学会春季学術講演会, 2013.03.
136.	K. Koga, D. Yamashita, G. Uchida, M. Shiratani, U. Czarnetzki, Characteristics of high pressure Ar+CH4 nanosecond discharge plasmas for producing nanoparticles, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.02.
137.	K. Koga, D. Yamashita, G. Uchida, M. Shiratani, Single particle trapping in plasmas using laser for studying interaction between a fine particle and palsams, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2013), 2013.01.
138.	K. Koga, Time and space profiles of laser-light scattering intensity from nano-particles and optical emission intensity in amplitude modurated high frequency discharge plasmas, The International LIGLR Workshop on Plasma Science & Technology, 2013.01.
139.	古閑一憲, 西山雄士, 立石瑞樹, 白谷正治, H. Wulff, S. Bornholdt, H. Kersten, プラズマ-壁相互作用によるナノ粒子生成に対する壁へのプラズマ流入角度の効果, 第30回プラズマプロセシング研究会(SPP-30), 2013.01.
140.	古閑一憲, 岩下伸也, 西山雄士, 立石瑞樹, 森田康彦, 山下大輔, 鎌滝晋礼, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, 重水素ヘリコンプラズマとグラファイト壁の相互作用により発生したダストの捕集, プラズマ・核融合学会九州・沖縄・山口支部第16回支部大会, 2012.12.
141.	K. Koga, Y. Wang, D. Ichida, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Deposition of Si nanoparticle composite films for C-Si/Si QDs/organic Solar Cells, 第13回微粒子プラズマ研究会, 2012.12.
142.	古閑一憲, 岩下伸也, 西山雄士, 山下大輔, 鎌滝晋礼, 内田儀一郎, 徐鉉雄, 板垣奈穂, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, グラファイトと重水素プラズマの相互作用で発生したダスト捕集, プラズマ・核融合学会第29回年会, 2012.11.
143.	古閑一憲, 岩下伸也, 山下大輔, 内田儀一郎, 白谷正治, Czarnetzki U., 高気圧Ar+CH4ナノ秒放電を用いた薄膜堆積とナノ粒子生成, プラズマ・核融合学会第29回年会, 2012.11.
144.	K. Koga, Plasma Chemical Vapor Deposition for Solar Cells (Invited), 2012 Workshop on Advanced Surface and Material Technologies, 2012.11.
145.	古閑一憲, 岩下伸也, 内田儀一郎, J. Schulze, E. Schungel, P. Hartmann, 白谷正治, Z. Donko, U. Czarnetzki, Electrical Asymmetry Effectを用いた微粒子のシース間輸送, 九州山口プラズマ研究会、応物新領域研究会, 2012.11.
146.	K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Control of Dust Flux in LHD and in a Divertor Simulator, 24th Fusion Energy Conference (IAEA), 2012.10.
147.	K. Koga, S. Iwashita, M. Shiratani, U. Czarnetzki, Formation of Nanoparticles in High Pressure Reactive Nanosecond Discharges, Asia-Pacific Conference on Plasma Science and Technology (11th APCPST), 2012.10.
148.	K. Koga, D. Yamashita, S. Kitazaki, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Optical Trapping of Single Fine Particle in Plasmas for study of interactions between a fine particle and plasmas, NANOSMAT 2012, 2012.09.
149.	K. Koga, T. Urakawa, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Control of deposition profile and properties of plasma CVD carbon films, 13th International Conference on Plasma Surface Engineering (PSE2012), 2012.09.
150.	K. Koga, K. Nishiyama, Y. Morita, D. Yamashita, K. Kamataki, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, N. Ashikawa, S. Masuzaki, K. Nishimura, A. Sagara, the LHD Experimental Group, Effects of Substrate DC Bias Voltage on Dust Collection Efficiency in Large Helical Device, 20th International Conference on Plasma Surface Interactions 2012 (PSI2012), 2012.05.
151.	K. Koga, K. Nakahara, K. Hatozaki, Y. Hashimoto, T. Matsunaga, H. Seo, G. Uchida, N. Itagaki, M. Shiratani, Effects of incorporation of clusters generated in the plasma ignition phase on Schottky cell performance of amorphous silicon films, The Fourth International Workshop on Thin-Film Silicon Solar Cells (IWTFSSC-4), 2012.03.
152.	K. Koga, K. Kamataki, S. Nunomura, S. Iwashita, G. Uchida, H. Seo, N. Itagaki, M. Shiratani, U. Czarnetzki, Three growth modes of nanoparticles generated in reactive plasmas, DPG Spring Meeting of the Section AMOP (SAMOP), 2012.03.
153.	古閑一憲, 浦川達也, 内田儀一郎, 徐鉉雄, 鎌滝晋礼, 板垣奈穂, 白谷正治, 節原裕一, 関根誠, 堀勝, 低温プラズマ異方性CVDを用いた微細トレンチ上面への自己組織カーボンマスク形成, Plasma Conference 2011 (PLASMA2011), 2011.11.
154.	古閑一憲, プロセスプラズマ中の微粒子挙動研究とその応用（特別講演）, プラズマ科学のフロンティア2011研究会, 2011.09.
155.	古閑一憲, CVDプラズマ中ナノ粒子の制御とその応用 (招待講演), AIST計測・診断システム研究協議会第８回プラズマ技術研究会, 2011.08.
156.	古閑一憲, 基板バイアスによるダスト捕集の検討, 第9回ＬＨＤにおけるPWI共同研究・検討会, 2011.07.
157.	K. Koga, G. Uchida, M. Sato, Y. Wang, K. Nakahara, K. Kamataki, N. Itagaki, M. Shiratani, Effects of surface treatment on performance of Si nano-particle quantum dot solar cells, The 3rd International Conference on Microelectronics and Plasma Technology (ICMAP-2011), 2011.07.
158.	古閑一憲, 野村卓也, 浦川達也, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, 節原裕一, 関根誠, 堀勝, Deposition of carbon films on top surface of fine trenches at 100℃ using a plasma anisotropic CVD method, 第58回応用物理学関係連合講演会, 2011.03.
159.	古閑一憲, 西山雄士, 白谷正治, Transport Control of Carbon Nanoparticles in H2 Helicon Discharges by Biasing Wall, ＮＩＦＳダスト研「次世代核融合装置に向けたダスト問題に関する研究会」, 2011.03.
160.	K. Koga, G. Uchida, K. Yamamoto, Y. Kawashima, M. Sato, K. Kamataki, N. Itagaki, M. Shiratani, Generation and Surface Modification of Si nano-particles using SiH4/H2 and N2 multi-hollow discharges and their application to the third generation photovoltaics (Invited), Ｉnternational Conference on Advances in Condensed and Nano Materials-2011(ICACNM-2011), 2011.02.
161.	K. Koga, T. Matsunaga, Y. Kawashima, Y. Kim, K. Nakahara, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Radical flux evaluation of high pressure silane plasma CVD using multi-hollow discharges (Invited), The 12th International Workshop on Advanced Plasma Processing and Diagnostics, 2011.01.
162.	古閑一憲, 宮田大嗣, 西山雄士, 岩下伸也, 山下大輔, 松崎秀文, 内田儀一郎, 板垣奈穂, 鎌滝晋礼, 白谷正治, 微細パターン基板へのSiOx-CH3ナノ粒子堆積, 第27回プラズマ・核融合学会年会, 2010.12.
163.	古閑一憲, 宮田大嗣, 西山雄士, 岩下伸也, 山下大輔, 松崎秀文, 内田儀一郎, 板垣奈穂, 鎌滝晋礼, 白谷正治, 芦川直子, 増﨑貴, 西村清彦, 相良明男, LHD実験グループ, プラズマ－カーボン壁相互作用で発生したカーボン微粒子の基板へのフラックス評価, 第27回プラズマ・核融合学会年会, 2010.11.
164.	K. Koga, T. Nomura, G. Uchida, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori, Deposition profile control of carbon films on the surface of fine structures using plasma CVD (Invited), The 1st Korean-Japan Symposium on Surface Technology, 2010.11.
165.	K. Koga, H. Miyata, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, the LHD Experimental Group, Deposition of Nanoparticles using Substrate Bias Voltage, 第23回マイクロプロセス・ナノテクノロジー国際会議（MNC 2010), 2010.11.
166.	古閑一憲, 北﨑訓, 内田儀一郎, 鎌滝晋礼, 板垣奈穂, 白谷正治, プラズマ-細胞相互作用による細胞活性制御, 第26回九州・山口プラズマ研究会, 2010.11.
167.	K. Koga, K. Nakahara, T. Matsunaga, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, High speed deposition of highly stable a-Si:H films using pure silane multi-hollow discharges, Third International Workshop on Thin Film Silicon Solar Cells (IWTFSSC3), 2010.10.
168.	K. Koga, G. Uchida, Y. Kawashima, M. Sato, K. Yamamoto, K. Nakahara, T. Matsunaga, K. Kamataki, N. Itagaki, M. Shiratani, Si quantum dot-sensitized solar cells using Si nanoparticles produced by multi-hollow discharge, 3rd International Symposium on Innovative Solar Cells, 2010.10.
169.	K. Koga, Y. Kawashima, T. Matsunaga, M. Sato, K. Nakahara, W. M. Nakamura, G. Uchida, K. Kamataki, N. Itagaki, M. Shiratani, Comparison between Si thin films with and without incorporating nanoparticles into the film, 10th Asia Pacific Conference on Plasma Science and Technology (APCPST), 2010.07.
170.	K. Koga, Y. Kawashima, K. Nakahara, T. Matsunaga, W. M. Nakamura, M. Shiratani, Effects of hydrogen dilution on electron density in multi-hollow discharges with magnetic field for a-Si:H film deposition, 35th IEEE Photovoltaic Specialists Conference (PVSC), 2010.06.
171.	古閑一憲, 宮田大嗣, 白谷正治, へリコンプラズマーカーボン壁相互作用で発生したカーボンダストの電場による収集, 第8回ＬＨＤにおけるＰＷＩ共同研究・検討会, 2010.06.
172.	K. Koga, Plasma CVD for Si thin film solar cells, 2010 International Workshop on Plasma Applications, 2010.06.
173.	K. Koga, S. Iwashita, H. Miyata, M. Shiratani, 振幅変調パルス放電による部分帯電ナノ粒子雲の輸送, 日本地球惑星科学連合年会, 2010.05.
174.	K. Koga, H. Sato, Y. Kawashima, W. M. Nakamura, M. Shiratani, Effects of gas residence time and H2 dilution on electron density in multi-hollow discharges of SiH4+ H2, 第27回プラズマプロセシング研究会（SPP-27）, 2010.02.
175.	古閑一憲, 岩下伸也, 宮田大嗣, 山田泰之, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, LHDの第一壁へのダストフラックスの評価, 第2回PWI合同研究会, 2009.12.
176.	古閑一憲, 佐藤宙, 中村ウィリアム誠, 宮原弘臣, 松崎秀文, 白谷正治, シランホロ―放電に対する水素希釈の効果, プラズマ・核融合学会九州・沖縄・山口支部第１２回支部大会, 2009.12.
177.	古閑一憲, 川嶋勇毅, 佐藤宙, 白谷正治, マルチホロ―放電を用いたa-Si:H製膜中の基板温度, 19th Academic Symposium of MRS-Japan 2009, 2009.12.
178.	K. Koga, H. Sato, Y. Kawashima, M. Shiratani, High Rate Deposition of Cluster-suppressed Amorphous Silicon Films Deposited Using a Multi-hollow Discharge Plasma CVD, 2009 MRS Fall Meeting, 2009.12.
179.	K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma Treatment of Indium Compounds to Reduce Their Adverse Health Effects, 2009 MRS Fall Meeting, 2009.12.
180.	K. Koga, Y. Kawashima, K. Nakahara, H. Sato, M. Shiratani, M. Kondo, Synthesis of crystalline Si nanoparticles for third generation solar cells (Invited), 10th Workshop on Fine Particle Plasmas, 2009.11.
181.	K. Koga, S. Iwashita, H. Miyata, M. Shiratani, M. Hirata, Y. Kiyohara, A. Tanaka, Plasma treatment of CIGS to reduce toxicity, Seventh Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), 2009.09.
182.	古閑一憲, 佐藤宙, 川嶋勇毅, 白谷正治, マイクロ波共振プローブを用いたH2+SiH4マルチホロー放電の電子密度計測, 第70回応用物理学会学術講演会, 2009.09.
183.	古閑一憲, 白谷正治, プラズマCVDを用いた微細構造への製膜形状制御（招待講演）, 西日本放電懇談会, 2009.08.
184.	古閑一憲, プラズマCVDの基礎 (Invited), TEL University, 2009.07.
185.	古閑一憲, 岩下伸也, 宮田大嗣, 白谷正治, 芦川直子, 増崎貴, 西村清彦, 相良明男, LHD実験グループ, LHDとモデル実験装置のダストの比較, 第７回ＬＨＤにおけるＰＷＩ共同研究・検討会, 2009.06.
186.	古閑一憲, 佐藤宙, 川嶋勇毅, 中村誠ウィリアム, 白谷正治, 高品質光安定a-Si:H薄膜作製用マルチホロー放電における電子密度の空間分布, 電気学会プラズマ研究会, 2009.06.
187.	K. Koga, T. Nomura, M. Shiratani, M. Sekine, Y. Setsuhara, M. Hori, Anisotropic deposition in narrow trenches using hydrogen assisted plasma CVD method, Memorial Symposium for the Retirement of Professor Tachibana “Toward the Next Generation of Plasma Science, Technology”, 2009.05.
188.	K. Koga, Deposition profile control of carbon films in trenches using a plasma CVD method (Invited), The 7th EU-Japan Joint Symposium on Plasma Processing, 2009.04.
189.	古閑一憲, 高品質a-Si堆積用マルチホロー放電プラズマ, 太陽電池製造用新規プラズマ源に関する研究会, 2009.03.
190.	K. Koga, Y. Kawashima, W. M. Nakamura, H. Sato, M. Tanaka, M. Shiratani, M. Kondo, Conductivity of nc-Si films depsited using multi-hollow discharge plasma CVD method, プラズマ科学シンポジウム２００９／第２６回プラズマプロセシング研究会, 2009.02.
191.	K. Koga, W. M. Nakamura, H. Sato, M. Tanaka, H. Miyahara, M. Shiratani, High Rate Deposition of a-Si:H Depositied using a Low Gas Pressure Multi-hollow Discharge Plasma CVD Method, プラズマ科学シンポジウム２００９／第２６回プラズマプロセシング研究会, 2009.02.
192.	古閑一憲, プラズマプロセスにおける揺らぎの抑制と増幅 (招待講演), プラズマ・核融合学会「プラズマ－バイオ融合科学への新展開」第２回専門委員会, 2009.01.
193.	古閑一憲, 佐藤宙, 中村ウィリアム誠, 宮原弘臣, 松崎秀文, 白谷正治, シランホロー放電に対する水素希釈の効果, プラズマ・核融合学会第１２回九州・沖縄・山口支部大会, 2008.12.
194.	K. Koga, S. Iwashita, M. Shiratani, N. Ashikawa, K. Nishimura, A. Sagara, A. Komori, LHD Experimental Group, Dust Particles in Size Range from 1 nm to 10 μm Sampled in LHD, 9th Workshop on Fine Particle Plasmas, 2008.12.
195.	K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Improvement in deposition rate of a-Si:H films using a low pressure multi-hollow discharge plasma CVD method, ICPP2008 Satellite Meeting on Plasma Physics, Advanced Applications in Aso, 2008.09.
196.	古閑一憲, 中村ウィリアム誠, 佐藤宙, 宮原弘臣, 白谷正治, 水素希釈シラン有磁場マルチホロー放電を用いた高光安定a-Si:H膜の堆積, 2008年秋季第69回応用物理学会学術講演会, 2008.09.
197.	古閑一憲, プラズマCVDを用いたナノ粒子含有多孔質低誘電率膜の作製, 平成２０年度西日本放電懇談会, 2008.08.
198.	K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Deposition of highly stable a-Si:H films using hydrogen diluted silane hollow discharge, The 3rd International School of Advanced Plasma Technology, 2008.07.
199.	K. Koga, Nano-structure formation using Plasma (Invited), レノバセミナー, 2008.04.
200.	K. Koga, H. Sato, W. M. Nakamura, H. Miyahara, H. Matsuzaki, M. Shiratani, Effects of hydrogen dilution on a-Si:H deposition using silane hollow discharges, 第25回プラズマプロセシング研究会, 2008.01.
201.	K. Koga, M. Shiratani, Control of deposition profile of Cu in trenches using ion-enhanced surface reaction (Invited), The 5th International Symposium on Advanced Plasma Processing, Diagnostics, The 1st International Symposium on Flexible Electronics Technology, 2007.04.
202.	K. Koga, M. Shiratani, Y. Watanabe, Cluster-suppressed plasma CVD method employing VHF discharges, Fine Particle Plasmas: Basis, Applications - Third Workshop on Fine Particle Plasmas, 2002.12.
203.	古閑一憲, 甲斐幹英, 白谷正治, 渡辺征夫, プラズマスパッタリングによるSiナノ構造の自己組織的形成, 電気学会プラズマ研究会, 2002.12.
204.	K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Correlation between cluster amount, qualities of a-Si:H films for SiH4 plasma CVD, American Vaccum Society 49th International Symposium, 2002.11.
205.	古閑一憲, 白谷正治, 古閑一憲, 渡辺征夫, クラスター抑制プラズマCVD法による高品質a-Si:H堆積, 第18回九州・山口プラズマ研究会, 2002.11.
206.	古閑一憲, 今別府謙吾, 白谷正治, 渡辺征夫, クラスタ抑制プラズマCVD法を用いて堆積したa-Si:H膜の膜質に及ぼす放電周波数の影響, 平成14年度応用物理学会九州支部講演会, 2002.11.
207.	古閑一憲, 甲斐幹英, 白谷正治, 渡辺征夫, シラン高周波放電を用いたナノ結晶シリコンクラスタの生成, 第62回応用物理学学術講演会, 2002.09.
208.	古閑一憲, 白谷正治, 渡辺征夫, アモルファスシリコン作製になぜ放電周波数を高周波化するか？, 西日本放電懇談会, 2002.08.
209.	K. Koga, R. Ueharaa, M. Shiratani, Y. Watanabe, A. Komori, Carbon nano-particles due to interaction between H2 plasmas, carbon wall, Joint Meeting of 16th European Conference on Atomic, Molecular Physics of Ionized Gases, 5th International Conference on Reactive Plasmas, 2002.07.
210.	K. Koga, K. Imabeppu, M. Kai, A. Harikai, M. Shiratani, Y. Watanabe, Suppression methods of cluster growth in silane discharges, their application to deposition of super high quality a-Si:H films, International Workshop on Information, Electrical Engineering (IWIE2002), 2002.05.
211.	古閑一憲, 甲斐幹英, 今別府謙吾, 白谷正治, 渡辺征夫, クラスタ抑制ＰＥＣＶＤ法により作製したa-Si:H薄膜の膜質とクラスタ量の相関, 第49回応用物理学関係連合講演会, 2002.03.
212.	古閑一憲, 針貝篤史, 白谷正治, 渡辺征夫, シランプラズマ中のクラスタ量と電子エネルギー分布への放電周波数の影響, 第49回応用物理学関係連合講演会, 2002.03.
213.	古閑一憲, 上原龍児, 白谷正治, 渡辺征夫, 小森彰夫, 水素プラズマとカーボン壁の相互作用による微粒子形成, 第49回応用物理学関係連合講演会, 2002.03.
214.	K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in sub-nm size range, Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
215.	K. Koga, M. Shiratani, Y. Watanabe, In situ mesurement of size, density of particles in subnm size range (Invited), The Seminar of Particle Technology Division of Korean Chemical Engineering, 2002.02.
216.	K. Koga, M. Shiratani, Y. Watanabe, Preliminary experiments on dust particles formation due to interaction between plasma, graphite wall, Fine Particle Plasmas: Basis, Applications - Second Workshop on Fine Particle Plasmas, 2001.12.
217.	古閑一憲, 白谷正治, 古閑一憲, 渡辺征夫, LSI内微細銅配線形用プラズマCVD, 第17回九州・山口プラズマ研究会, 2001.11.
218.	古閑一憲, 徳安達郎, 上原龍児, 白谷正治, 渡辺征夫, ダイバータ壁とプラズマの相互作用による微粒子形成機構研究用装置の試作, 第18回プラズマ・核融合学会年会, 2001.11.
219.	古閑一憲, 針貝篤史, 白谷正治, 渡辺征夫, 渡邉剛, シラン高周波放電中のクラスタ成長に関する水素希釈と励起周波数の効果, 第62回応用物理学学術講演会, 2001.09.
220.	K. Koga, T. Sonoda, N. Shikatani, M. Shiratani, Y. Watanabe, Deposition of super high quality a-Si:H thin films using cluster-suppressed plasma CVD reactor, International Conference on Phenomena in Ionized Gases, 2001.07.
221.	古閑一憲, 園田剛士, 鹿谷昇, 白谷正治, 渡辺征夫, クラスタ抑制プラズマCVD装置による高品質a-Si:H作製, 第48回応用物理学関係連合講演会, 2001.03.
222.	古閑一憲, 田中健一, 白谷正治, 渡辺征夫, 水素希釈シラン高周波放電中の電子密度及びイオン密度, 第48回応用物理学関係連合講演会, 2001.03.
223.	K. Koga, K. Tanaka, M. Shiratani, Y. Watanabe, Effects of H2 dilution, excitation frequency on initial growth of clusters in silane plasmas, Plasma Science Symposium 2001/ 18th Symposium on Plasma Processing, 2001.01.
224.	古閑一憲, 徳安達郎, 白谷正治, 渡辺征夫, シランプラズマ中に発生する微粒子の表面付着確率, 平成12年度応用物理学会九州支部講演会, 2000.12.
225.	古閑一憲, 田中健一, 徳安達郎, 白谷正治, 渡辺征夫, シランプラズマ中のSinHxクラスタ核のその場計測と成長制御, プラズマ・核融合学会九州地区第4回研究発表講演会, 2000.12.
226.	K. Koga, K. Tanaka, T. Tokuyasu, M. Shiratani, Y. Watanabe, Initial growth of clusters in silane rf discharges, 53rd Annual Gaseous Electronics Conference, 2000.10.
227.	古閑一憲, 田中健一, 白谷正治, 渡辺征夫, シランプラズマ中のクラスタ成長に対する水素希釈・放電周波数の効果, 第61回応用物理学学術講演会, 2000.09.
228.	古閑一憲, 徳安達郎, 白谷正治, 渡辺征夫, シラン高周波放電中クラスタの表面付着確率, 第61回応用物理学学術講演会, 2000.09.
229.	古閑一憲, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, シラン高周波放電中のクラスタのサイズ・密度測定, 第47回応用物理学関係連合講演会, 2000.03.
230.	古閑一憲, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, プラズマ中のクラスタの新計測法, 第17回プラズマプロセシング研究会, 2000.01.
231.	古閑一憲, 前田真一, 白谷正治, 渡辺征夫, シランプラズマ中の微粒子成長の基板材料依存性, 平成11年度応用物理学会九州支部講演会, 1999.12.
232.	古閑一憲, 前田真一, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, 反応性プラズマにおける微粒子発生, プラズマ・核融合学会九州地区第3回研究発表講演会, 1999.12.
233.	古閑一憲, 松岡泰弘, 田中健一, 白谷正治, 渡辺征夫, 水素希釈によるシラン高周波放電中微小微粒子の抑制効果, 第60回応用物理学学術講演会, 1999.09.
234.	古閑一憲, シラン高周波放電における微小微粒子の抑制, 西日本放電懇談会, 1999.08.
235.	K. Koga, H. Naitou, Y. Kawai, Characteristics of Asymmetric Ion Sheath in a Negative Ion Plasma, 2nd International Conference on the Physics of Dusty Plasmas, 1999.05.
236.	古閑一憲, 内藤裕志, 河合良信, イオンシース不安定性と非対称イオンシース構造, プラズマ・核融合学会九州地区第2回研究発表講演会, 1999.02.

特許出願・取得

特許出願件数 11件

特許登録件数 4件

学会活動

所属学会名

応用物理学会

日本生化学会

American Vaccum Society

Materials Research Society

プラズマ・核融合学会

電気学会

応用物理学会プラズマエレクトロニクス分科会

学協会役員等への就任

2024.06～2028.05, プラズマ・核融合学会, 理事.

2022.06～2024.05, プラズマ・核融合学会　九州・山口・沖縄支部, 支部長.

2023.01～2023.12, DryProcessSymposium2023, 出版委員長.

2022.01～2022.12, DryProcessSymposium2022, 副出版委員長.

2022.01～2022.12, DryProcessSymposium2022, 論文委員.

2022.04～2024.03, 応用物理学会, 論文賞委員.

2016.04～2021.03, Symposium on Plasma Physics and Technology, Program Committee.

2020.04～2021.03, 13th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/ 14th International Conference on Plasma Nanotechnology and Science , Program Committee.

2020.04～2021.03, The 29th International Toki Conference on Plasma and Fusion Research, Program Committee.

2019.01～2020.12, Americal Vacuum Society, Plasma Science and Technology Division, Program Committee.

2020.01～2020.12, DryProcessSymposium2020, 論文委員.

2019.01～2020.12, International Conference On Metallurgical Coatings & Thin Films, Session Chair B2.

2019.01～2019.12, DryProcessSymposium2019, 論文委員.

2018.04～2022.03, 応用物理学会　プラズマ・エレクトロニクス分科会, 副幹事長.

2018.01～2018.12, DryProcessSymposium2018, 論文委員.

2017.04～2018.03, DryProcessSymposium2017, 論文委員.

2017.04～2021.03, 応用物理学会, プログラム編集委員.

2017.02～2019.01, 応用物理学会, 代議員.

2017.01～2018.12, Americal Vacuum Society, Plasma Science and Technology Division, Treasurer.

2016.04～2017.03, 4th Japan-Korea Joint Symposium on Advance Solar Cells 2017 and International Symposium on Energy Research and Application 2017, Organizing Committee.

2016.04～2018.12, DPS40周年記念事業委員会, 委員.

2016.04～2017.03, DryProcessSymposium2016, 論文委員.

2015.06～2016.06, 27th Symposium on Plasma Physics and Technology, Czech Republic, Programme committee member.

2013.04～2015.03, プラズマ・核融合学会, 「プラズマ理工学と医学・農学の融合科学」専門委員.

2013.04～2015.03, 応用物理学会プラズマ・エレクトロニクス分科会, 幹事.

2003.04～2005.03, プラズマ・核融合学会, 学会誌モニター.

2006.04～2008.03, 応用物理学会プラズマ・エレクトロニクス分科会, 幹事.

学会大会・会議・シンポジウム等における役割

2017.03.14～2017.03.17, 2017年第６４回応用物理学会春季学術講演会（パシフィコ横浜）, 座長（Chairmanship）.

2015.03.11～2015.03.14, 2015年第６２回応用物理学会春季学術講演会（東海大）, 座長（Chairmanship）.

2013.12.21～2013.12.22, プラズマ・核融合学会　九州・沖縄・山口支部第17回支部大会, 座長（Chairmanship）.

2010.03.17～2008.03.20, 2010年春季第57回応用物理学関係連合講演会（東海大）, 座長（Chairmanship）.

2009.11.21～2009.11.22, 応用物理学会九州支部学術講演会講演会, 座長（Chairmanship）.

2009.09.08～2009.09.11, 第70回応用物理学会学術講演会 , 座長（Chairmanship）.

2008.08.22～2008.08.23, フロンティアプロセス2008, 座長（Chairmanship）.

2008.03.27～2008.03.30, 2008年春季第55回応用物理学関係連合講演会, 座長（Chairmanship）.

2005.09.01～2005.09.01, 応用物理学会２００５年秋季講演会, 座長（Chairmanship）.

2015.11.05～2015.11.06, 37th International Dymposium on Dry Process (DPS2015), 論文委員.

2015.10.12～2015.10.16, 9th International Conference on Reactive Plasmas/68th Gaseous Electronics Conference/33rd Symposium on Plasma Processing, Steering Committee.

2015.10.12～2015.10.16, 9th International Conference on Reactive Plasmas/68th Gaseous Electronics Conference/33rd Symposium on Plasma Processing, Publication Committee.

2014.11.27～2014.11.28, 36th International Dymposium on Dry Process (DPS2014), 論文委員.

2014.06.16～2014.06.19, 26th Symposium on Plasma Physics and Technology, Programme commitee member.

2014.02.03～2014.02.07, The 8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing, Organizing Committee.

2013.02.02～2013.02.03, The 6th International Conference on Plasma Nanotechnology and Science (IC-PLANTS　2013), Program Committee.

2012.11.27～2012.11.30, プラズマ核融合学会　第29回年会, 現地実行委員　庶務（副）.

2010.11～2010.11, IEEE TENCON2010, Track Chair.

2007.09～2008.03, プラズマ表面工学に関するアジア－ヨーロッパ国際会議（ＡＥＰＳＥ２００７）, 実行委員.

2007.04～2008.03, The 5th International Symposium on Advanced Plasma Processes and Diagnostics & The 1st International Symposium on Flexible Electronics Technology, International organizing committee.

2006.11～2007.03, 第３３回アモルファスセミナー　スタートアップセッション, スタートアップセッション実行委員長.

2006.11～2007.03, 第３３回アモルファスセミナー, 実行委員長.

学会誌・雑誌・著書の編集への参加状況

2022.04～2023.03, Japanese Journal of Applied Physics DPS2022 Special Issue, 国際, Guest Editor.

2016.07～2018.07, プラズマ・核融合学会誌, 国内, 編集委員.

2015.04～2017.03, Japanese Journal of Applied Physics ISPlasma2016 Special Issue, 国際, Guest Editor.

2015.04～2017.03, Surface Coatings & Techonol AEPSE2015 Special Issue, 国際, Guest Editor.

2008.09～2009.09, Journal of Plasma and Fusion Research Series, 国際, 編集委員.

学術論文等の審査

年度	外国語雑誌査読論文数	国際会議録査読論文数	国内会議録査読論文数	合計
2017年度	4	0	0	4
2016年度	4	0	0	4
2015年度	3	0	0	3
2014年度	8	0	0	8
2013年度	4	0	0	4
2012年度	6	10	0	16
2011年度	3	0	0	3
2010年度	5	7	0	12
2009年度	1	0	0	1
2008年度	5	0	0	5
2007年度	3	0	0	3
2006年度	2			2
2004年度	1	1		2

その他の研究活動

海外渡航状況, 海外での教育研究歴

Institute for Experimental Physics V: Plasma and Atom Physics, Ruhr-University Bochum, Germany, 2011.10～2012.09.

受賞

第２１回プラズマ材料科学賞奨励部門賞, プラズマ材料科学賞選考委員会, 2020.02.

第14回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2016.03.

ICMAP2014 Best Poster Presentation Award , International Conference of Microelectronics and Plasma Technology 2014 (ICMAP2014), 2014.07.

ICMAP2014 Best Poster Presentation Award , International Conference of Microelectronics ans Plasma Technology 2014 (ICMAP2014), 2013.08.

The 9th Asian-European International Conference of Plasma Surface Engineering（AEPSE2013）/ Outstanding Poster Award, The 9th Asian-European International Conference on Plasma Surface Engineering , 2013.08.

ISSP2013 Best Poster Award, 12th International Symposium on Sputtering & Plasma Processes, 2013.07.

Advanced Plasma Application Award, 11th Asia Pacific Conference on Plasma Science adn Technology (APCPST) & 25th Symposium on Plasma Science for Materials (SPSM), 2012.10.

IUMRS-ICEM2012 "Young Scientist Awards: Silver Award Winners" , 日本MRS, 2012.09.

Best Presentation Award, ISPlasma2012, 2012.03.

Invited Presentation Award, Interfinish 2008 World Congress and Exposition, 2008.06.

応用物理学会第3回プラズマエレクトロニクス賞, 応用物理学会プラズマエレクトロニクス分科会, 2005.03.

第10回応用物理学会講演奨励賞, 応用物理学会, 2001.05.

研究資金

科学研究費補助金の採択状況(文部科学省、日本学術振興会)

2022年度～2026年度, 基盤研究(B), 分担, Plasma-modified peptides/proteins for multi-target anticancer treatment.

2021年度～2023年度, 基盤研究(A), 分担, プラズマ生成フリーラジカル非平衡反応場の液相時空間解析.

2019年度～2022年度, 特別推進研究, 分担, プラズマ誘起生体活性物質による超バイオ機能の展開.

2020年度～2022年度, 基盤研究(B), 代表, 低温プラズマ照射に対する種子の外部情報認識に関する分子メカニズム解明.

2016年度～2019年度, 基盤研究(B), 代表, プラズマ照射による植物成長促進の世代間伝搬機構の解明.

2016年度～2018年度, 基盤研究(B), 分担, インジウムナノ粒子の体内吸収と毒性メカニズム.

2014年度～2018年度, 基盤研究(A), 分担, プラズマを用いたナノ粒子精密配置制御の学術基盤創成.

2013年度～2015年度, 挑戦的萌芽研究, 代表, 液中プラズマを用いたミクロンサイズの穴への銅ナノ粒子埋め込みプロセスの創成.

2012年度～2015年度, 基盤研究(B), 代表, コンビナトリアル細胞活性解析を用いた細胞超活性プラズマの創成.

2012年度～2016年度, 新学術領域研究, 分担, プラズマ・ナノマテリアル動態学の創成と安全安心医療科学の構築.

2006年度～2007年度, 若手研究(B), 代表, 重水素プラズマ・カーボン壁相互作用によるナノダストの生成と重水素吸蔵量の評価.

2004年度～2005年度, 若手研究(B), 代表, 水素プラズマ・カーボン壁相互作用によるナノ粒子成長機構の研究.

2009年度～2013年度, 新学術領域研究, 分担, ナノ粒子含有プラズマによるナノ界面ボンドエンジニアリングの創生(代表者：白谷正治).

2008年度～2010年度, 基盤研究(B), 分担, ナノブロック輸送・配置の学術・技術基盤構築(代表者：白谷正治).

2007年度～2009年度, 基盤研究(B), 分担, インジウム新素材によるインジウム肺発症の実験的研究(代表者：田中昭代).

2006年度～2007年度, 萌芽研究, 分担, プラズマを用いたナノカプセルの創製と物質内包技術の開発(代表者：白谷正治).

2009年度～2013年度, 新学術領域研究, 連携, プラズマとナノ界面の相互作用に関する総括研究(代表者：白谷正治).

日本学術振興会への採択状況(科学研究費補助金以外)

2019年度～2021年度, 二国間交流, 代表, 組成制御低温プラズマを用いた種子処理に対する発芽初期段階のストレス応答.

競争的資金(受託研究を含む)の採択状況

2020年度～2022年度, JST A-STEP　育成型, 代表, 環境に優しい作物収量増加を目指した窒素・炭素肥料作製用その場プラズマシステム開発.

2017年度～2018年度, JAXA宇宙探査イノベーションハブ, 代表, 穀物増産を実現する種子へのプラズマ大量処理技術開発.

2017年度～2017年度, NIFS　一般共同研究, 代表, 電場を用いた帯電ダストと製膜前駆体イオンの除去 .

2015年度～2016年度, JAXA宇宙探査イノベーションハブ, 分担, プラズマ・触媒ナノ粒子複合反応場によるCO2資源化技術の開発 (代表者：白谷正治).

2010年度～2014年度, NEDO太陽光発電システム次世代高性能技術の開発, 分担, ナノ粒子制御によるアモルファスシリコンセルの高光安定化に関する研究
超高周波プラズマ源の開発
(代表者：白谷正治).

2008年度～2014年度, NEDO 革新的太陽光発電技術研究開発（革新型太陽電池国際研究拠点整備事業）, 分担, 高度秩序構造を有する薄膜多接合太陽電池の研究開発（ナノ結晶シリコン）(代表者：白谷正治).

2007年度～2011年度, 戦略的創造研究推進事業 (文部科学省), 分担, CREST　研究領域「ナノ科学を基盤とした革新的製造技術の創成」
プラズマナノ科学創成によるプロセスナビゲーション構築とソフト材料加工（代表者：堀　勝）.

2007年度～2009年度, 太陽光発電システム未来技術研究開発, 分担, 大面積／高効率多接合薄膜シリコン太陽電池の高生産製膜技術開発（代表者：白谷正治）.

2006年度～2007年度, NEDO再受託, 分担, トップセルの光劣化の基礎現象解明.

2005年度～2007年度, NEDO　平成17年度第2回産業技術研究助成事業, 代表, 低コスト高効率太陽電池のための高光安定水素化アモルファスシリコンの大面積・高速作製技術の開発.

共同研究、受託研究(競争的資金を除く)の受入状況

2008.03～2012.03, 分担, プラズマを用いた次世代LSI用低誘電率層間絶縁膜の作製.

寄附金の受入状況

2010年度, 東京エレクトロン株式会社, 大学院システム情報科学研究院研究資金
部門名（情報エレクトロニクス部門古閑一憲助教）.

学内資金・基金等への採択状況

2010年度～2010年度, 平成22年度九州大学宙空環境研究センター「共同研究」, 代表, 電場を用いたダスト収集.

2009年度～2009年度, 平成21年度九州大学宙空環境研究センター「共同研究」, 代表, 電位構造制御によるダストフラックス計測.

2008年度～2008年度, 平成20年度九州大学宙空環境研究センター「共同研究」, 代表, プラズマ中ダストの能動的輸送制御.

九大関連コンテンツ

pure2017年10月2日から、「九州大学研究者情報」を補完するデータベースとして、Elsevier社の「Pure」による研究業績の公開を開始しました。

QIR　九州大学学術情報リポジトリシステム情報科学研究院

システム情報科学研究院


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