| 1. |
原尻駿吾, Huang Lei, Nahar Arijun, 堤井君元, ダイヤモンドナノ粒子で修飾したナノウォール構造体の電界放出特性と電界分布シミュレーション, 第70回応用物理学会春季学術講演会, 2023.03. |
| 2. |
原尻駿吾, Huang Lei, 堤井君元, 炭素ナノウォール構造体の電界放出特性と電界分布シミュレーション, 第70回応用物理学会春季学術講演会, 2023.03. |
| 3. |
原尻駿吾, Huang Lei, 堤井君元, ナノウォール構造体からの電界放出における電界シミュレーション, 令和4年度電気・情報関係学会北海道支部連合大会, 2022.11. |
| 4. |
堤井君元, プラズマCVD法による高品位cBN膜の成膜技術と応用展開（招待講演）, 表面技術協会関西支部令和4年度第2回表面物性研究会, 2022.10. |
| 5. |
原尻駿吾, Huang Lei, 堤井君元, 電界シミュレーションを用いたナノウォール構造体の電界放出特性に関する研究, 2022年度(第75回)電気・情報関係学会九州支部連合大会, 2022.09. |
| 6. |
K. Teii, J. H. C. Yang, S. Matsumoto, Plasma Deposition of High-Quality Cubic Boron Nitride Films for Applications to Ultrahard Coatings and Electronic Devices (INVITED), 7th International Symposium on Advanced Ceramics and Technology for Sustainable Energy Applications toward a Low Carbon Society, 2021.11. |
| 7. |
L. Huang, S. Harajiri, R. Hijiya, K. Teii, Control of Self-Assembly Seeding of Diamond Nanoparticles on Nanowall Structures for Enhancing Field Emission, International Thin Film Conference (TACT) 2021, 2021.11. |
| 8. |
J. H. C. Yang, K. Teii, S. Matsumoto, Wetting Behavior of Plasma-Treated Ultrahard Boron Nitride Films, International Thin Film Conference (TACT) 2021, 2021.11. |
| 9. |
Z. Sun, M. Cho, R. Hijiya, L. Huang, K. Teii, Electrical Characterization of Metal Contacts to Nitrogen-Incorporated Nanowall Structures, International Thin Film Conference (TACT) 2021, 2021.11. |
| 10. |
H. Ikematsu, T. Nakakuma, K. Teii, S. Matsumoto, Lowering of the Substrate Bias Voltage for Formation of Cubic Boron Nitride Films in Microwave Plasma, International Thin Film Conference (TACT) 2021, 2021.11. |
| 11. |
堤井君元, プラズマCVDでつくる高品質立方晶窒化ホウ素とその応用（招待講演）, 第75回CVD研究会, 2021.10. |
| 12. |
堤井君元, 低エネルギーイオン衝撃下でのプラズマCVDを用いたエレクトロニクス材料の合成と機能物性評価（招待講演）, 電気学会プラズマ材料表面処理技術の動向調査専門委員会第４回研究会, 2021.05. |
| 13. |
泥谷亮太, 黄磊, 堤井君元, 均一なナノダイヤモンド膜形成のための基板への堆積前処理, 日本セラミックス協会2021年年会, 2021.03. |
| 14. |
泥谷亮太, 太田洸輝, 堤井君元, ナノダイヤモンド膜の微細加工と電界放出特性の評価, 日本セラミックス協会2021年年会, 2021.03. |
| 15. |
泥谷亮太, 伊藤隆太, 山本世翔, 神村勇馬, 堤井君元, 松本精一郎, 表面波プラズマCVDを用いた窒化ホウ素膜の合成と絶縁性評価, 電気学会誘電・絶縁材料/放電・プラズマ・パルスパワー/高電圧合同研究会, 2021.01. |
| 16. |
R. Hijiya, K. Ota, K. Teii, Field Emission Characteristics of Nanocrystalline Diamond Cones Prepared by Reactive Ion Etching in Microwave Plasma, 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2019.12. |
| 17. |
T. Matsuura, Y. Kamimura, M. Torigoe, K. Teii, S. Matsumoto, Structure and Electrical Properties of Boron Nitride Films Deposited by Surface Wave Plasma Enhanced Chemical Vapor Deposition, 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2019.12. |
| 18. |
R. Ito, R. Hijiya, S. Yamamoto K. Teii, S. Matsumoto, Field Emission Characteristics of Nanostructured Boron Nitride Films Deposited by Plasma Chemical Vapor Deposition, 21st Cross Straits Symposium on Energy and Environmental Science and Technology, 2019.11. |
| 19. |
Y. Kaneko, K. Terada, Y. Kato, K. Teii, Field Emission Characteristics of Metal Nanoparticle-Coated Carbon Nanostructures, International Thin Film Conference (TACT) 2019, 2019.11. |
| 20. |
M. Torigoe, Y. Kamimura, K. Teii, S. Matsumoto, Effect of Low-Energy Ion impact on Structure and Electrical Properties of Boron Nitride Thin Films Studied in Surface-Wave Plasma, International Thin Film Conference (TACT) 2019, 2019.11. |
| 21. |
K. Teii, S. Matsumoto, Impact of Low-Energy Ions on Plasma Deposition of Cubic Boron Nitride Films for Electronic Applications, International Thin Film Conference (TACT) 2019, 2019.11. |
| 22. |
H. Zhu, Y. Kato, K. Teii, Rapid Thermal Annealing on Si Film and pn-Junction Formation by Si Paste, International Thin Film Conference (TACT) 2019, 2019.11. |
| 23. |
Y. Kamimura, T. Matsuura, M. Torigoe, K. Teii, S. Matsumoto, Effect of Low-Energy Ion Impact on the Structure of Boron Nitride Films Studied in Surface-Wave Plasma, 40th International Symposium on Dry Process, 2018.11. |
| 24. |
神村勇馬, 松浦貴志, 鳥越雅敬, 堤井君元, 松本精一郎, 表面波プラズマCVDを用いた窒化ホウ素膜の合成と構造および電気特性評価, 電気学会プラズマ/パルスパワー/放電合同研究会, 2018.10. |
| 25. |
K. Teii, S. Kawakami, S. Matsumoto, Enhanced Wettability of Cubic Boron Nitride Films for Biomedical Applications, 69th Annual Meeting of the International Society of Electrochemistry, 2018.09. |
| 26. |
高橋 里奈, 堤井 君元, 松本 精一郎, フッ素支援プラズマCVD法を用いた立方晶窒化ホウ素膜の島成長と電界放出特性評価, 平成30年電気学会全国大会, 2018.03. |
| 27. |
K. Teii, S. Matsumoto, Plasma Deposition of Cubic Boron Nitride Films for Hard Coatings and Electronic Devices (INVITED), 10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2017.12. |
| 28. |
R.-C. Hsiao, Z.-J. Li, C.-Y. Lai, P.-K. Tang, K.-Y. Hsiao, T.-L. Sung, S. Teii, K. Teii, Decolorization and Kinetic Effect of Azo Dyes Aqueous Solution by Ozone, 10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2017.12. |
| 29. |
K. Teii, M, Ishida, R. Takahashi, S. Matsumoto, Rectification Properties of Boron Nitride Heterojunctions to Silicon, 11th International Symposium on Atomic Level Characterizations for New Materials and Devices, 2017.12. |
| 30. |
Y. Kamimura, M, Torigoe, K. Teii, S. Matsumoto, Plasma Deposition of Boron Nitride Films using Low-Energy Ion Bombardment, 11th International Symposium on Atomic Level Characterizations for New Materials and Devices, 2017.12. |
| 31. |
神村 勇馬, 鳥越 雅敬, 石田 学, 高橋 里奈, 堤井 君元, 松本 精一郎, 表面波プラズマCVDを用いた窒化ホウ素膜の合成と物性評価, 電気学会プラズマ/パルスパワー/放電合同研究会, 2017.10. |
| 32. |
村田 一磨, 石田 学, 堤井 君元, 松本 精一郎, 立方晶窒化ホウ素膜のプラズマ堆積に及ぼす低エネルギーイオンの影響, 第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム, 2017.01. |
| 33. |
原崎 俊栄, 加藤 喜峰, 梶原 隆司, 田中 悟, 堤井 君元, エチレン(C2H4)を用いたSi(100)基板表面の炭化, 応用物理学会九州支部学術講演会, 2016.12. |
| 34. |
堤井 君元, フッ素プラズマCVDを用いた高品質立方晶窒化ホウ素の合成（依頼講演）, 日本フッ素化学会第10回フッ素化学セミナー, 2016.09. |
| 35. |
K. Teii, H. Ito, N. Katayama, S. Matsumoto, Rectification Properties of Boron Nitride/Silicon Heterostructure Diodes, 7th Pacific Rim Meeting on Electrochemical and Solid-State Science, 2016.10. |
| 36. |
K. Murata, M. Torigoe, K. Teii, S. Matsumoto, Role of Low-Energy Ion Impact in Plasma Deposition of Cubic Boron Nitride Films, 7th Pacific Rim Meeting on Electrochemical and Solid-State Science, 2016.10. |
| 37. |
堤井 君元, 新しい立方晶窒化ホウ素が拓く産業応用：超硬コーティングとパワー半導体（依頼講演）, 平成２７年度九州大学高等研究院・九州先端科学技術研究所研究交流会, 2016.01. |
| 38. |
Y. Kaneko, K. Terada, K. Teii, Plasma Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for High-Efficiency Field Emitters, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, 2015.12. |
| 39. |
R. C. Hsiao, T. L. Sung, C. M. Liu, S. Teii, H.-P. Jhou, S. Ono, K. Ebihara, K. Teii, Double Probe Method to Form a Simple Ozone Detector Using the Effect of Catalytic Ozone Dissociation on Metal Surface, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, 2015.12. |
| 40. |
S. Fukui, M. Torigoe, K. Teii, S. Matsumoto, Plasma Deposition of Cubic Boron Nitride Films for High-Power Electronic Devices, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, 2015.12. |
| 41. |
堤井 君元, プラズマ技術がつくる新しい立方晶窒化ホウ素―超硬コーティングと半導体への応用―（依頼講演）, 名古屋産業振興公社プラズマ技術産業応用センター第54回プラズマが拓くものづくり研究会（プラズマ技術講演会）「革新的プラズマコーティング技術とその産業応用」, 2015.10. |
| 42. |
J. Yang, 金子 祐太, 堤井 君元, プラズマ曝露処理による親水性硬質コーティングの作製, 電気学会プラズマ研究会, 2015.10. |
| 43. |
K. Teii, Y. Kaneko, K. Terada, A.T.H. Chuang, Plasma-Enhanced Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for Field Emitters, 68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, 2015.10. |
| 44. |
M. Torigoe, S. Fukui, K. Teii, S. Matsumoto, Effect of Low-Energy Ions on Plasma-Enhanced Deposition of Cubic Boron Nitride, 68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, 2015.10. |
| 45. |
鳥越 雅敬, 福井 慎吾, 堤井 君元, 松本 精一郎, 立方晶窒化ホウ素のプラズマCVDに及ぼす低エネルギーイオン衝撃の影響, 電気学会プラズマ研究会, 2015.06. |
| 46. |
坂井 寿光, 山本 直嗣, 大川 恭志, 堤井 君元, 船木 一幸, 森田 太智, 中島 秀紀, 立方晶窒化ホウ素を用いた電界放出カソードの開発, 第58回宇宙科学技術連合講演会, 2014.11. |
| 47. |
堤井 君元, 松本 精一郎, 触媒金属含有基板上への硬質窒化ホウ素コーティング, 日本鉄鋼協会第168回秋季講演大会, 2014.09. |
| 48. |
K. Teii, Plasma Deposition and Applications of Nanodiamond Films (INVITED), 2014 International Workshop on Plasma Applications in Nanocarbon Materials and Devices, 2014.02. |
| 49. |
堤井 君元, 立方晶窒化ホウ素膜のプラズマCVD合成と電気電子応用（依頼講演）, 第80回表面科学研究会「窒化ホウ素：電子デバイス材料としての課題と展望」, 2014.01. |
| 50. |
K. Teii, S. Matsumoto, Plasma Deposition and Electrical Applications of High-Quality Cubic Boron Nitride Films (INVITED), 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2013.12. |
| 51. |
J. H.C. Yang, T. Ikeda, K. Teii, Electrical and Thermal Transport Properties of Nanocystal-Embedded Films Deposited by Plasma-Enhanced Chemical Vapor Deposition, 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2013.12. |
| 52. |
下田 尚考, 加藤 喜峰, 堤井 君元, ナノクリスタルダイヤモンド薄膜の各種オーミック電極, SiC及び関連半導体研究第22回講演会, 2013.12. |
| 53. |
J. H.C. Yang, S. Kawakami, K. Teii, S. Matsumoto, Enhanced Wettability of Cubic Boron Nitride Films by Plasma Treatment, 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), 2013.12. |
| 54. |
K. Teii, J. H.C. Yang, S. Matsumoto, Electron Field Emission from Semiconducting Carbon Nanowalls and Boron Nitride Films (INVITED), 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), 2013.12. |
| 55. |
K. Teii, S. Kawamoto, H. Ito, S. Matsumoto, Structure and Electrical Properties of Wide-Gap Boron Nitride Films , 9th International Symposium on Atomic Level Characterizations for New Materials and Devices, 2013.12. |
| 56. |
K. Teii, Development of Next Generation Wide Band-Gap Materials for High Temperature Electronics (KEYNOTE), 15th Cross Straits Symposium on Energy and Environmental Science and Technology, 2013.11. |
| 57. |
加藤 喜峰, 堤井 君元, ナノダイヤモンド膜のプラズマCVD合成と電気電子応用（依頼講演）, 第15回応用物理学会プラズマエレクトロニクス分科会新領域研究会/電気学会プラズマ研究会「ダイヤモンドおよびグラフェン関連物質のプラズマプロセシングと先進応用」, 2013.11. |
| 58. |
青木 智宏, 山口 亮太, 堤井 君元, 炭素ナノウォールのプラズマCVD合成と電界放出特性評価, 電気学会プラズマ研究会, 2013.09. |
| 59. |
K. Teii, S. Kawamoto, H. Ito, S. Matsumoto, Electron Emission Properties of Boron Nitride Layered Films on Silicon, 24th International Conference on Diamond and Carbon Materials, 2013.09. |
| 60. |
J. H.C. Yang, K. Teii, Plasma Treatment of Nanocrystalline Diamond Films for Biocoating Applications, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 2013.01. |
| 61. |
S. Kawamoto, N. Katayama, K. Teii, S. Matsumoto, Plasma Deposition and Electronic Applications of Nanostructured Wide-Gap Materials, 第30回プラズマプロセシング研究会, 2013.01. |
| 62. |
J. H.C. Yang, R. Yamaguchi, K. Teii, Mechanism of Enhanced Wettability of Nanostructured Diamond-Like Films by Plasma Treatment, 第30回プラズマプロセシング研究会, 2013.01. |
| 63. |
K. Teii, J. H.C. Yang, S. Matsumoto, Plasma Deposition and Applications of Cubic Boron Nitride Films (INVITED), IUMRS-International Conference on Electronic Materials 2012, 2012.09. |
| 64. |
C.Y. Cheng, R. Yamaguchi, K. Teii, Field Emission Properties of Nanocrystalline Diamond/Carbon Nanowall Composite Films, 7th International Conference on Surfaces, Coatings, and Nanostructured Materials, 2012.09. |
| 65. |
K. Teii, C.Y. Cheng, R. Yamaguchi, Enhanced Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films, 23rd International Conference on Diamond and Carbon Materials, 2012.09. |
| 66. |
Y. Kato, M. Goto, R. Amano, N. Shimoda, K. Teii, Electrical Characteristics of 4H-SiC/Nanocrystalline Diamond pn Junctions, 23rd International Conference on Diamond and Carbon Materials, 2012.09. |
| 67. |
J. H. C. Yang, S. Kawakami, K. Teii, Enhanced Wettability of Nanocrystalline Diamond and Boron Nitride Films for Biocoating Applications, 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2012.04. |
| 68. |
K. Teii, Plasma Deposition and Electrical Characterization of Wide-Gap Materials for High-Temperature Condition (INVITED), 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2012.04. |
| 69. |
K. Teii, Plasma Deposition of Wide-Gap Materials for High-Temperature Condition (INVITED), 14th International Workshop of Advanced Plasma Processing and Diagnostics/2nd Workshop for Nagoya University-Sungkyunkwan University Joint Institute for Plasma-Nano Materials, 2012.01. |
| 70. |
堤井 君元, 中隈 俊就, 松本 精一郎, 立方晶窒化ホウ素膜のプラズマ合成と電界放出特性, 電気学会プラズマ・パルスパワー合同研究会, 2011.12. |
| 71. |
C.Y. Cheng, M. Nakashima, K. Teii, Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films Deposited on Scratched Substrates, Materials Research Society Fall Meeting, 2011.11. |
| 72. |
K. Teii and T. Ikeda, Control of Thermal and Electrical Conduction Properties of Nanocrystalline Diamond Films, Materials Research Society Fall Meeting, 2011.11. |
| 73. |
J. H.C. Yang and K. Teii, Enhanced Wettability of Nanocrystalline Diamond Films for Biocoating Applications, Materials Research Society Fall Meeting, 2011.11. |
| 74. |
M. Goto, R. Amano, Y. Kato, K. Teii, Fabrication and Characterization of Si/ and SiC/Nanocrystalline Diamond pn Junctions, 14th International Conference on Silicon Carbide and Related Materials, 2011.09. |
| 75. |
K. Teii, J. H.C. Yang, T. Ikeda, Synthesis and Thermal Transport Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films, 22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, 2011.09. |
| 76. |
J. Yang, K. Teii, S. Matsumoto, Deposition of Thick Cubic Boron Nitride Films on Si and Cemented Carbide under Low-Energy Ion Bombardment, 5th International Conference on New Diamond and Nano Carbons, 2011.05. |
| 77. |
C.Y. Cheng, M. Nakashima, S. Shimada, K. Teii, Enhanced Field Emission from Nitrogen-Incorporated Carbon Nanowalls, 5th International Conference on New Diamond and Nano Carbons, 2011.05. |
| 78. |
K. Teii and S. Matsumoto, Synthesis and Electrical Properties of Cubic Boron Nitride Films by Low-Energy Ion-Assisted Deposition, 5th International Conference on New Diamond and Nano Carbons, 2011.05. |
| 79. |
堤井 君元, 立方晶窒化ホウ素膜のプラズマCVD合成と応用 (依頼講演), 日本真空協会スパッタリングおよびプラズマプロセス技術部会第122回定例研究会「ハードマテリアルに関する最近の動向」 , 2011.03. |
| 80. |
J. Yang, M. Nakashima, C.-Y. Cheng, K. Teii, Surface Modification of Nanocrystalline Diamond Films by Plasma Exposure Treatments, 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 2011.03. |
| 81. |
K. Teii, Synthesis and Electrical Properties of Nanodiamond and Nanowall Films by Microwave Plasma-Enhanced Chemical Vapor Deposition (INVITED), 3rd International Workshop on Plasma Scientech for All Something, 2011.01. |
| 82. |
K. Teii, Y. Utoda, R. Yamao, S. Matsumoto, Growth and Field Emission Properties of Boron Nitride Island Films by Low-Energy Ion-Assisted Deposition, Materials Research Society Fall Meeting, 2010.11. |
| 83. |
K. Teii and T. Ikeda, Thermal and Electrical Conduction Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films, Materials Research Society Fall Meeting, 2010.11. |
| 84. |
堤井 君元、池田 知弘, アルミ基板上のナノダイヤモンド被膜の熱および電気伝導特性, 軽金属学会講演大会, 2010.11. |
| 85. |
K. Teii and T. Ikeda, Synthesis and Electrical Characterization of n-Type Nanocrystalline Diamond Films by Microwave Plasma-Enhanced Chemical Vapor Deposition, 63rd Gaseous Electronics Conference/7th International Conference on Reactive Plasmas, 2010.10. |
| 86. |
川上 真司、堤井 君元, プラズマ曝露による窒化ホウ素膜の表面改質, 応用物理学会学術講演会, 2010.09. |
| 87. |
中島 誠宏、堤井 君元, ナノダイヤモンド／炭素ナノウォール複合膜のプラズマCVD合成と電界放出特性, 応用物理学会学術講演会, 2010.09. |
| 88. |
中島 誠宏、嶋田 翔三郎、堤井 君元, マイクロ波プラズマCVD法による炭素ナノウォールの形成と電界放出機構, 応用物理学会学術講演会, 2010.09. |
| 89. |
中島 誠宏, 嶋田 翔三郎, 堤井 君元, ナノカーボン膜のプラズマ合成と電界放出特性, 電気学会プラズマ研究会, 2010.05. |
| 90. |
A. S. M. Miah, A. Koga, K. Teii, Y. Kato, Growth and Characterization of Epitaxial 3C-SiC Films by Microwave Plasma-Enhanced Chemical Vapor Deposition, 2nd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 2010.03. |
| 91. |
K. Teii and S. Matsumoto, Synthesis and Electrical Properties of Cubic Boron Nitride Films by Plasma-Enhanced Chemical Vapor Deposition under Low-Energy Ion Bombardment (INVITED), 6th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2009.12. |
| 92. |
Y. Kato, T. Horikawa, T. Ikeda, K. Teii, SiC and Nanocrystalline Diamond Coating on Si Substrates Fabricated by Microwave Plasma CVD, 16th International Conference on Surface Modification of Materials by Ion Beams, 2009.09. |
| 93. |
K. Teii and S. Matsumoto, Growth and Characterization of Hard Cubic Boron Nitride Films by Plasma-Assisted Deposition using Fluorine Chemistry, 16th International Conference on Surface Modification of Materials by Ion Beams, 2009.09. |
| 94. |
T. Hori, Y. Mizusako, R. Yamao, K. Teii, S. Matsumoto, Structural Evolution of Cubic Boron Nitride Islands in a High-Density Fluorine-Containing Plasma, 16th International Conference on Surface Modification of Materials by Ion Beams, 2009.09. |
| 95. |
K. Teii, M. Nakashima, T. Ikeda, Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanodiamond Films, 20th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, 2009.09. |
| 96. |
K. Teii, R. Yamao, S. Matsumoto, Effect of Low-Energy Ion Irradiation on the Growth and Properties of Cubic Boron Nitride Films, 15th International Symposium "Radiation Effects in Insulator", 2009.09. |
| 97. |
古閑 彰, 池田 知弘, 堤井 君元, ｎ型ナノダイヤモンド膜の形成とダイオードへの応用, 電気学会プラズマ・放電・パルスパワー合同研究会, 2009.08. |
| 98. |
中島 誠宏, 嶋田 翔三郎, Alfred T. H. Chuang, 堤井 君元, 異方性ナノカーボン膜のプラズマCVD法による合成と電界放出特性評価, 電気学会プラズマ研究会, 2009.06. |
| 99. |
嶋田 翔三郎, 中島 誠宏, 池田 知弘, 堤井 君元, プラズマCVD法により形成したナノカーボン膜の電気特性の評価, 電気学会全国大会, 2009.03. |
| 100. |
嶋田 翔三郎, 中島 誠宏, 堤井 君元, マイクロ波C2リッチプラズマを用いたナノカーボン膜の合成, 電気学会全国大会, 2009.03. |
| 101. |
池田 知弘, 堤井 君元, ｎ型ナノダイヤモンド膜の形成と電気特性評価, プラズマ科学シンポジウム／プラズマプロセシング研究会, 2009.02. |
| 102. |
嶋田 翔三郎, 中島 誠宏, 池田 知弘, 堤井 君元, 異方性ナノカーボン膜のプラズマCVD法による合成と電気特性評価, 電気学会プラズマ研究会, 2008.12. |
| 103. |
池田 知弘, 堤井 君元, ナノダイヤモンド膜の形成機構と電気伝導特性, 電気学会プラズマ研究会, 2008.10. |
| 104. |
T. Ikeda and K. Teii, Optimization of Electron Transport Properties for Fabrication of pn Diodes using n-Type Nanodiamond Films, 19th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, 2008.09. |
| 105. |
堤井 君元、水迫 優晴、松本 精一郎, 低エネルギーイオン衝撃下における立方晶窒化ホウ素の三次元島成長, 応用物理学会学術講演会, 2008.09. |
| 106. |
池田 知弘, 堤井 君元, ナノダイヤモンド／シリコンヘテロ接合ダイオードの電気特性評価, 応用物理学会学術講演会, 2008.09. |
| 107. |
K. Teii and S. Matsumoto, Plasma Enhanced Deposition of Cubic Boron Nitride Films under Ultralow-Energy Ion Impact: Structural Evolution and Electrical Properties (INVITED), 35th International Conference on Metallurgical Coatings and Thin Films, 2008.05. |
| 108. |
池田 知弘, 堤井 君元, ナノダイヤモンド薄膜の成長機構とｎ型伝導特性, プラズマプロセシング研究会, 2008.01. |
| 109. |
堤井 君元, 松本 精一郎, 超低エネルギーイオン照射を用いたナノダイヤモンド成膜のための基板前処理, プラズマプロセシング研究会, 2008.01. |
| 110. |
K. Teii, S. Shimada, S. Matsumoto, Lower Threshold of Ion Energy for Growing cBN Films in a Fluorine-Containing Plasma, 5th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2007.12. |
| 111. |
T. Ikeda and K. Teii, Transition from Semiconducting to Quasimetallic Behaviour in Nitrogen-Doped Nanodiamond Films, 18th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, 2007.09. |
| 112. |
K. Teii, R. Yamao, S. Matsumoto, Phase and Morphology Evolution of Cubic Boron Nitride Films Grown in a High-Density Fluorine-Containing Plasma
, 6th Asian-European International Conference on Plasma Surface Engineering, 2007.09. |
| 113. |
T. Ikeda, H. O. Li, K. Teii, J. S. Chang, Discharge Characteristics of Titanium Electrode Eccentric Pulsed Arc Electrohydraulic Discharge Reactor, 6th Asian-European International Conference on Plasma Surface Engineering, 2007.09. |
| 114. |
T. Ikeda and K. Teii, Effect of sp2 Carbon Phase on Electrical Properties of Nitrogen-Doped Nanodiamond Films, 6th Asian-European International Conference on Plasma Surface Engineering, 2007.09. |
| 115. |
堤井 君元、山尾 亮太、松本 精一郎, 極低イオンエネルギー照射下におけるcBN薄膜のプラズマ合成 , 応用物理学会学術講演会, 2007.09. |
| 116. |
池田 知弘、堤井 君元, ナノダイヤモンド薄膜のn 型伝導性に及ぼすsp2 アモルファスカーボン相の影響, 応用物理学会学術講演会, 2007.09. |
| 117. |
池田 知弘、堤井 君元, C2ラジカル 成長化学の促進による ナノダイヤモンド薄膜の相制御, 応用物理学会学術講演会, 2007.09. |
| 118. |
T. Ikeda, H. O. Li, K. Teii, J. S. Chang, Analyses of Fine Particle Formations by Pulsed Arc Electrohydraulic Discharges in Water with Fe and Ti Electrodes, 18th International Symposium on Plasma Chemistry, 2007.08. |
| 119. |
T. Ikeda, K. Takeguchi, K. Teii, Phase Control and Electrical Properties of Undoped and Nitrogen-Doped Nanodiamond Films Deposited from Ar-Rich Microwave Plasmas, 18th International Symposium on Plasma Chemistry, 2007.08. |
| 120. |
T. Ikeda and K. Teii, Effect of Phase Purity and Composition on Electrical Properties in Nanocrystalline Diamond Films, 17th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, 2006.09. |
| 121. |
T. Ikeda and K. Teii, Phase Composition and Electrical Properties of Nanocrystalline Diamond Films Deposited by Microwave Plasma Chemical Vapor Deposition, 6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing, 2006.01. |
| 122. |
K. Teii, K. Uchino, M. Hori, T. Goto, Study on Surface Reaction Kinetics during Diamond Growth and Nucleation in Low-Pressure Plasmas, 6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing, 2006.01. |
| 123. |
T. Ikeda and K. Teii, Phase Composition and Electrical Properties of Nanocrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition, 4th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2005.12. |
| 124. |
池田 知弘, 堤井 君元, ナノダイヤモンド薄膜の相制御と電気特性評価, 第19回ダイヤモンドシンポジウム, 2005.11. |
| 125. |
堤井 君元、溝部 俊一、福富 篤、高妻 豊、内野 喜一郎、村岡 克紀, マイクロ波CH4/H2プラズマCVDによる微結晶ダイヤモンドの合成, 応用物理学会学術講演会, 2004.03. |
| 126. |
堤井 君元、高妻 豊、溝部 俊一、内野 喜一郎、村岡 克紀, 低圧イオン支援プラズマ堆積におけるダイヤモンド核発生初期過程の制御, プラズマプロセシング研究会, 2004.01. |
| 127. |
S. Mizobe, K. Teii, Y. Kouzuma, K. Uchino, K. Muraoka, Temporal Variation of Nucleation Density and Crystallinity of Diamond Prepared in Electron Cyclotron Resonance Plasma, 3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2003.12. |
| 128. |
K. Teii, M. Hori, T. Goto, A Low-Pressure Limit of Diamond Chemical-Vapor Deposition Studied by Plasma Diagnostics, 3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2003.12. |
| 129. |
K. Teii, H. Funakoshi, S. Takashima, M. Hori, T. Goto, Detection of H, CH3, and Ionic Species in a Low-Pressure Inductively Coupled Plasma for Diamond
Chemical-Vapor Deposition, 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, 2002.07. |
| 130. |
S. Narishige, S. Kitamura, K. Teii, K. Uchino, K. Muraoka, Thomson Scattering Measurement of Electron Density and Temperature in a Microwave Plasma for Diamond Deposition, 54th Annual Gaseous Electronics Conference, 2001.10. |
| 131. |
M. Hori, K. Teii, T. Goto, Diagnostics of Radicals and Formation of Microcrystalline Diamond in a Low-Pressure Inductively Coupled Plasma (INVITED), 9th International Symposium on Advanced Materials, 2002.03. |
| 132. |
H. Ito, K. Teii, M. Ito, M. Hori, T. Takeo, T. Goto, Diamond Formation Using a Low-Pressure Inductively Coupled Plasma, 46th American Vacuum Society International Symposium, 1999.10. |
| 133. |
M. Nakamura, K. Teii, S. Takashima, M. Hori, T. Goto, N. Ishii, Correlation between Gas Phase and Substrate Surface on Fabrication of Low-k Films in ECR Plasma with G4F8 and Perfluorocarbon-Replacement Gases, 53rd Annual Gaseous Electronics Conference, 1999.10. |
| 134. |
H. Ito, K. Teii, H. Funakoshi, M. Hori, T. Goto, M. Ito, T. Takeo, Loss Kinetics of Carbon Atoms in Diamond Depositon Employing Low-Pressure Inductively Coupled Plasma, 53rd Annual Gaseous Electronics Conference, 1999.10. |
| 135. |
K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii, Observation of Polymeric Species Produced in High-Density Fluorocarbon Plasmas, 24th International Conference on Phenomena in Ionized Gases, 1999.07. |
| 136. |
K. Teii, H. Ito, M. Ishikawa, M. Ito, M. Hori, T. Takeo, T. Kato, T. Goto, Optical Diagnostics of Low-Pressure Inductively Coupled Plasma for Nanocrystalline Diamond Growth, 24th International Conference on Phenomena in Ionized Gases, 1999.07. |
| 137. |
堤井 君元, 低圧誘導結合型プラズマを用いたダイヤモンド薄膜の形成, 第3回名古屋大学VBLセミナー, 1999.02. |
| 138. |
K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii, Behaviors of CFx (x=1-3) and Polymeric Species in Electron Cyclotron Resonance Fluorocarbon Plasmas, 4th International Conference on Reactive Plasmas/16th Symposium on Plasma Processing, 1998.10. |
| 139. |
K. Teii and T. Yoshida, Positive Bias Effects on the Growth of Diamond at Pressures below 100 mTorr, 第10回プラズマ材料科学シンポジウム, 1997.06. |
| 140. |
K. Teii and T. Yoshida, Inductively Coupled Plasma Deposition of Diamond at Pressures below 100 mTorr, 13th International Symposium on Plasma Chemistry, 1997.08. |
| 141. |
堤井 君元, 吉田 豊信, 低圧誘導結合プラズマを用いた100mTorr以下におけるダイヤモンド成長, 電気学会プラズマ研究会, 1998.06. |
