Kyushu University Academic Staff Educational and Research Activities Database
List of Presentations
KUNGEN TEII TSUTSUI Last modified dateļ¼š2023.11.27

Associate Professor / Electrical Engineering / Department of Advanced Energy Science and Engineering / Faculty of Engineering Sciences


Presentations
1. K. Teii, J. H. C. Yang, S. Matsumoto, Plasma Deposition of High-Quality Cubic Boron Nitride Films for Applications to Ultrahard Coatings and Electronic Devices (INVITED), 7th International Symposium on Advanced Ceramics and Technology for Sustainable Energy Applications toward a Low Carbon Society, 2021.11.
2. L. Huang, S. Harajiri, R. Hijiya, K. Teii, Control of Self-Assembly Seeding of Diamond Nanoparticles on Nanowall Structures for Enhancing Field Emission, International Thin Film Conference (TACT) 2021, 2021.11.
3. J. H. C. Yang, K. Teii, S. Matsumoto, Wetting Behavior of Plasma-Treated Ultrahard Boron Nitride Films, International Thin Film Conference (TACT) 2021, 2021.11.
4. Z. Sun, M. Cho, R. Hijiya, L. Huang, K. Teii, Electrical Characterization of Metal Contacts to Nitrogen-Incorporated Nanowall Structures, International Thin Film Conference (TACT) 2021, 2021.11.
5. H. Ikematsu, T. Nakakuma, K. Teii, S. Matsumoto, Lowering of the Substrate Bias Voltage for Formation of Cubic Boron Nitride Films in Microwave Plasma, International Thin Film Conference (TACT) 2021, 2021.11.
6. R. Hijiya, K. Ota, K. Teii, Field Emission Characteristics of Nanocrystalline Diamond Cones Prepared by Reactive Ion Etching in Microwave Plasma, 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2019.12.
7. T. Matsuura, Y. Kamimura, M. Torigoe, K. Teii, S. Matsumoto, Structure and Electrical Properties of Boron Nitride Films Deposited by Surface Wave Plasma Enhanced Chemical Vapor Deposition, 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2019.12.
8. R. Ito, R. Hijiya, S. Yamamoto K. Teii, S. Matsumoto, Field Emission Characteristics of Nanostructured Boron Nitride Films Deposited by Plasma Chemical Vapor Deposition, 21st Cross Straits Symposium on Energy and Environmental Science and Technology, 2019.11.
9. Y. Kaneko, K. Terada, Y. Kato, K. Teii, Field Emission Characteristics of Metal Nanoparticle-Coated Carbon Nanostructures, International Thin Film Conference (TACT) 2019, 2019.11.
10. M. Torigoe, Y. Kamimura, K. Teii, S. Matsumoto, Effect of Low-Energy Ion impact on Structure and Electrical Properties of Boron Nitride Thin Films Studied in Surface-Wave Plasma, International Thin Film Conference (TACT) 2019, 2019.11.
11. K. Teii, S. Matsumoto, Impact of Low-Energy Ions on Plasma Deposition of Cubic Boron Nitride Films for Electronic Applications, International Thin Film Conference (TACT) 2019, 2019.11.
12. H. Zhu, Y. Kato, K. Teii, Rapid Thermal Annealing on Si Film and pn-Junction Formation by Si Paste, International Thin Film Conference (TACT) 2019, 2019.11.
13. Y. Kamimura, T. Matsuura, M. Torigoe, K. Teii, S. Matsumoto, Effect of Low-Energy Ion Impact on the Structure of Boron Nitride Films Studied in Surface-Wave Plasma, 40th International Symposium on Dry Process, 2018.11.
14. K. Teii, S. Kawakami, S. Matsumoto, Enhanced Wettability of Cubic Boron Nitride Films for Biomedical Applications, 69th Annual Meeting of the International Society of Electrochemistry, 2018.09.
15. K. Teii, S. Matsumoto, Plasma Deposition of Cubic Boron Nitride Films for Hard Coatings and Electronic Devices (INVITED), 10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2017.12.
16. R.-C. Hsiao, Z.-J. Li, C.-Y. Lai, P.-K. Tang, K.-Y. Hsiao, T.-L. Sung, S. Teii, K. Teii, Decolorization and Kinetic Effect of Azo Dyes Aqueous Solution by Ozone, 10th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2017.12.
17. K. Teii, M, Ishida, R. Takahashi, S. Matsumoto, Rectification Properties of Boron Nitride Heterojunctions to Silicon, 11th International Symposium on Atomic Level Characterizations for New Materials and Devices, 2017.12.
18. Y. Kamimura, M, Torigoe, K. Teii, S. Matsumoto, Plasma Deposition of Boron Nitride Films using Low-Energy Ion Bombardment, 11th International Symposium on Atomic Level Characterizations for New Materials and Devices, 2017.12.
19. K. Teii, H. Ito, N. Katayama, S. Matsumoto, Rectification Properties of Boron Nitride/Silicon Heterostructure Diodes, 7th Pacific Rim Meeting on Electrochemical and Solid-State Science, 2016.10.
20. K. Murata, M. Torigoe, K. Teii, S. Matsumoto, Role of Low-Energy Ion Impact in Plasma Deposition of Cubic Boron Nitride Films, 7th Pacific Rim Meeting on Electrochemical and Solid-State Science, 2016.10.
21. Y. Kaneko, K. Terada, K. Teii, Plasma Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for High-Efficiency Field Emitters, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, 2015.12.
22. R. C. Hsiao, T. L. Sung, C. M. Liu, S. Teii, H.-P. Jhou, S. Ono, K. Ebihara, K. Teii, Double Probe Method to Form a Simple Ozone Detector Using the Effect of Catalytic Ozone Dissociation on Metal Surface, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, 2015.12.
23. S. Fukui, M. Torigoe, K. Teii, S. Matsumoto, Plasma Deposition of Cubic Boron Nitride Films for High-Power Electronic Devices, 9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology/28th Symposium on Plasma Science for Materials, 2015.12.
24. K. Teii, Y. Kaneko, K. Terada, A.T.H. Chuang, Plasma-Enhanced Deposition of Nanocrystalline Diamond/Carbon Nanowall Composite Films for Field Emitters, 68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, 2015.10.
25. M. Torigoe, S. Fukui, K. Teii, S. Matsumoto, Effect of Low-Energy Ions on Plasma-Enhanced Deposition of Cubic Boron Nitride, 68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, 2015.10.
26. K. Teii, Plasma Deposition and Applications of Nanodiamond Films (INVITED), 2014 International Workshop on Plasma Applications in Nanocarbon Materials and Devices, 2014.02.
27. K. Teii, S. Matsumoto, Plasma Deposition and Electrical Applications of High-Quality Cubic Boron Nitride Films (INVITED), 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2013.12.
28. J. H.C. Yang, T. Ikeda, K. Teii, Electrical and Thermal Transport Properties of Nanocystal-Embedded Films Deposited by Plasma-Enhanced Chemical Vapor Deposition, 8th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, 2013.12.
29. J. H.C. Yang, S. Kawakami, K. Teii, S. Matsumoto, Enhanced Wettability of Cubic Boron Nitride Films by Plasma Treatment, 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), 2013.12.
30. K. Teii, J. H.C. Yang, S. Matsumoto, Electron Field Emission from Semiconducting Carbon Nanowalls and Boron Nitride Films (INVITED), 8th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC 2013), 2013.12.
31. K. Teii, S. Kawamoto, H. Ito, S. Matsumoto, Structure and Electrical Properties of Wide-Gap Boron Nitride Films , 9th International Symposium on Atomic Level Characterizations for New Materials and Devices, 2013.12.
32. K. Teii, Development of Next Generation Wide Band-Gap Materials for High Temperature Electronics (KEYNOTE), 15th Cross Straits Symposium on Energy and Environmental Science and Technology, 2013.11.
33. K. Teii, S. Kawamoto, H. Ito, S. Matsumoto, Electron Emission Properties of Boron Nitride Layered Films on Silicon, 24th International Conference on Diamond and Carbon Materials, 2013.09.
34. Plasma Treatment of Nanocrystalline Diamond Films for Biocoating Applications, J. Yang, K. Teii, 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Nagoya, 2013..
35. Plasma Deposition and Applications of Cubic Boron Nitride Films (INVITED), K. Teii, J. H.C. Yang, S. Matsumoto, IUMRS-International Conference on Electronic Materials 2012, Japan, 2012..
36. Field Emission Properties of Nanocrystalline Diamond/Carbon Nanowall Composite Films, C.Y. Cheng, R. Yamaguchi, K. Teii, 7th International Conference on Surfaces, Coatings, and Nanostructured Materials, Czech Republic, 2012..
37. Enhanced Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films, K. Teii, C.Y. Cheng, R. Yamaguchi, 23rd International Conference on Diamond and Carbon Materials, Spain, 2012..
38. Electrical Characteristics of 4H-SiC/Nanocrystalline Diamond pn Junctions, Y. Kato, M. Goto, R. Amano, N. Shimoda, K. Teii, 23rd International Conference on Diamond and Carbon Materials, Spain, 2012..
39. Enhanced Wettability of Nanocrystalline Diamond and Boron Nitride Films for Biocoating Applications, J. H. C. Yang, S. Kawakami, K. Teii, 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2012..
40. Plasma Deposition and Electrical Characterization of Wide-Gap Materials for High-Temperature Condition (INVITED), K. Teii, 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2012..
41. Plasma Deposition of Wide-Gap Materials for High-Temperature Condition (INVITED), K. Teii, 14th International Workshop of Advanced Plasma Processing and Diagnostics/2nd Workshop for NU- SKKU Joint Institute for Plasma-Nano Materials, Fukuoka, 2012..
42. Field Emission from Nanocrystalline Diamond/Carbon Nanowall Composite Films Deposited on Scratched Substrates, C.Y. Cheng, M. Nakashima, and K. Teii, Materials Research Society Fall Meeting, Boston, 2011..
43. Control of Thermal and Electrical Conduction Properties of Nanocrystalline Diamond Films, K. Teii and T. Ikeda, Materials Research Society Fall Meeting, Boston, 2011..
44. Enhanced Wettability of Nanocrystalline Diamond Films for Biocoating Applications, J. H.C. Yang and K. Teii, Materials Research Society Fall Meeting, Boston, 2011..
45. Fabrication and Characterization of Si/ and SiC/Nanocrystalline Diamond pn Junctions, M. Goto, R. Amano, Y. Kato, K. Teii, 14th International Conference on Silicon Carbide and Related Materials, USA, 2011..
46. Synthesis and Thermal Transport Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films, K. Teii, J. H.C. Yang, T. Ikeda, 22nd European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Germany, 2011..
47. Deposition of Thick Cubic Boron Nitride Films on Si and Cemented Carbide under Low-Energy Ion Bombardment, J. Yang, K. Teii, S. Matsumoto, 5th International Conference on New Diamond and Nano Carbons, Shimane, 2011..
48. Enhanced Field Emission from Nitrogen-Incorporated Carbon Nanowalls, C.Y. Cheng, M. Nakashima, S. Shimada, K. Teii, 5th International Conference on New Diamond and Nano Carbons, Shimane, 2011..
49. Synthesis and Electrical Properties of Cubic Boron Nitride Films by Low-Energy Ion-Assisted Deposition, K. Teii and S. Matsumoto, 5th International Conference on New Diamond and Nano Carbons, Shimane, 2011..
50. Surface Modification of Nanocrystalline Diamond Films by Plasma Exposure Treatments, J. Yang, M. NAKASHIMA, C.-Y. Cheng, K. Teii, 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Nagoya, 2011..
51. Synthesis and Electrical Properties of Nanodiamond and Nanowall Films by Microwave Plasma-Enhanced Chemical Vapor Deposition (INVITED), K. Teii, 3rd International Workshop on Plasma Scientech for All Something, Nagoya, 2011..
52. K. Teii, Y. Utoda, R. Yamao, S. Matsumoto, Growth and Field Emission Properties of Boron Nitride Island Films by Low-Energy Ion-Assisted Deposition, Materials Research Society Fall Meeting, 2010.11.
53. Thermal and Electrical Conduction Properties of Nanocrystalline Diamond/Amorphous Carbon Composite Films, K. Teii and T. Ikeda, Materials Research Society Fall Meeting, Boston, 2010..
54. Synthesis and Electrical Characterization of n-Type Nanocrystalline Diamond Films by Microwave Plasma-Enhanced Chemical Vapor Deposition, K. Teii, T. Ikeda, 63rd Gaseous Electronics Conference/7th International Conference on Reactive Plasmas, France, 2010..
55. Growth and characterization of epitaxial 3C-SiC films by microwave plasma-enhanced chemical vapor deposition, A. S. M. Miah, A. Koga, K. Teii, Y. Kato, 2nd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Japan, 2010..
56. Synthesis and electrical properties of cubic boron nitride films by plasma-enhanced chemical vapor deposition under low-energy ion bombardment (INVITED), K. Teii and S. Matsumoto, 6th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2009..
57. SiC and nanocrystalline diamond coating on Si substrates fabricated by microwave plasma CVD, Y. Kato, T. Horikawa, T. Ikeda, K. Teii, 16th International Conference on Surface Modification of Materials by Ion Beams, Japan, 2009..
58. Growth and characterization of hard cubic boron nitride films by plasma-assisted deposition using fluorine chemistry, K. Teii and S. Matsumoto, 16th International Conference on Surface Modification of Materials by Ion Beams, Japan, 2009..
59. Structural evolution of cubic boron nitride islands in a high-density fluorine-containing plasma, T. Hori, Y. Mizusako, R. Yamao, K. Teii, S. Matsumoto, 16th International Conference on Surface Modification of Materials by Ion Beams, Japan, 2009..
60. Origin of Low Threshold Field Emission from Nitrogen-Incorporated Nanodiamond Films, K. Teii, M. Nakashima, T. Ikeda, 20th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Greece, 2009..
61. Effect of low-energy ion irradiation on the growth and properties of cubic boron nitride films, K. Teii, R. Yamao, S. Matsumoto, 15th International Symposium "Radiation Effects in Insulator", Italy, 2009..
62. Optimization of Electron Transport Properties for Fabrication of pn Diodes using n-Type Nanodiamond Films, T. Ikeda and K. Teii, 19th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Spain, 2008..
63. Plasma Enhanced Deposition of Cubic Boron Nitride Films under Ultralow-Energy Ion Impact: Structural Evolution and Electrical Properties (INVITED), K. Teii and S. Matsumoto, 35th International Conference on Metallurgical Coatings and Thin Films, USA, 2008..
64. Growth Mechanism and n-Type Conduction Properties of Nanodiamond Films, T. Ikeda and K. Teii, 25th Symposium on Plasma Processing, Japan, 2008..
65. Substrate Pretreatment for Nanodiamond Film Deposition by using Ultralow-Energy Ion Irradiation, K. Teii and S. Matsumoto, 25th Symposium on Plasma Processing, Japan, 2008..
66. Lower Threshold of Ion Energy for Growing cBN Films in a Fluorine-Containing Plasma, K. Teii, S. Shimada, S. Matsumoto, 5th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2007..
67. Transition from Semiconducting to Quasimetallic Behaviour in Nitrogen-Doped Nanodiamond Films, T. Ikeda and K. Teii, 18th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Germany, 2007..
68. Phase and Morphology Evolution of Cubic Boron Nitride Films Grown in a High-Density Fluorine-Containing Plasma, K. Teii, R. Yamao, S. Matsumoto, 6th Asian-European International Conference on Plasma Surface Engineering, Japan, 2007..
69. Discharge Characteristics of Titanium Electrode Eccentric Pulsed Arc Electrohydraulic Discharge Reactor, T. Ikeda, H. O. Li, K. Teii, J. S. Chang6th Asian-European International Conference on Plasma Surface Engineering, Japan, 2007..
70. Effect of sp2 Carbon Phase on Electrical Properties of Nitrogen-Doped Nanodiamond Films, T. Ikeda and K. Teii, 6th Asian-European International Conference on Plasma Surface Engineering, Japan, 2007..
71. Analyses of Fine Particle Formations by Pulsed Arc Electrohydraulic Discharges in Water with Fe and Ti Electrodes, T. Ikeda, H. O. Li, K. Teii, J. S. Chang, 18th International Symposium on Plasma Chemistry, Japan, 2007..
72. Phase Control and Electrical Properties of Undoped and Nitrogen-Doped Nanodiamond Films Deposited from Ar-Rich Microwave Plasmas, T. Ikeda, K. Takeguchi, K. Teii, 18th International Symposium on Plasma Chemistry, Japan, 2007..
73. Effect of Phase Purity and Composition on Electrical Properties in Nanocrystalline Diamond Films, T. Ikeda and K. Teii, 17th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Portugal, 2006..
74. Phase Composition and Electrical Properties of Nanocrystalline Diamond Films Deposited by Microwave Plasma Chemical Vapor Deposition, T. Ikeda and K. Teii, 6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing, Japan, 2006..
75. Study on Surface Reaction Kinetics during Diamond Growth and Nucleation in Low-Pressure Plasmas, K. Teii, K. Uchino, M. Hori, T. Goto, 6th International Conference on Reactive Plasmas/23rd Symposium on Plasma Processing, Japan, 2006..
76. Phase composition and electrical properties of nanocrystalline diamond films grown by microwave plasma chemical vapor deposition, T. Ikeda and K. Teii, 4th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2005..
77. Temporal Variation of Nucleation Density and Crystallinity of Diamond Prepared in Electron Cyclotron Resonance Plasma, S. Mizobe, K. Teii, Y. Kouzuma, K. Uchino, K. Muraoka, 3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2003..
78. A Low-Pressure Limit of Diamond Chemical-Vapor Deposition Studied by Plasma Diagnostics, K. Teii, M. Hori, T. Goto, 3rd Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology, Taiwan, 2003..
79. Detection of H, CH3, and Ionic Species in a Low-Pressure Inductively Coupled Plasma for Diamond
Chemical-Vapor Deposition, K. Teii, H. Funakoshi, S. Takashima, M. Hori, T. Goto, 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, France, 2002..
80. Thomson Scattering Measurement of Electron Density and Temperature in a Microwave Plasma for Diamond Deposition, S. Narishige, S. Kitamura, K. Teii, K. Uchino, K. Muraoka, 54th Annual Gaseous Electronics Conference, USA, 2001..
81. M. Hori, K. Teii, T. Goto, Diagnostics of Radicals and Formation of Microcrystalline Diamond in a Low-Pressure Inductively Coupled Plasma (INVITED), 9th International Symposium on Advanced Materials, 2002.03.
82. Diamond Formation Using a Low-Pressure Inductively Coupled Plasma, H. Ito, K. Teii, M. Ito, M. Hori, T. Takeo, T. Goto, 46th American Vacuum Society International Symposium, USA, 1999..
83. Correlation between Gas Phase and Substrate Surface on Fabrication of Low-k Films in ECR Plasma with G4F8 and Perfluorocarbon-Replacement Gases, M. Nakamura, K. Teii, S. Takashima, M. Hori, T. Goto, N. Ishii, 53rd Annual Gaseous Electronics Conference, USA, 1999..
84. Loss Kinetics of Carbon Atoms in Diamond Depositon Employing Low-Pressure Inductively Coupled Plasma, H. Ito, K. Teii, H. Funakoshi, M. Hori, T. Goto, M. Ito, T. Takeo, 53rd Annual Gaseous Electronics Conference, USA, 1999..
85. Observation of Polymeric Species Produced in High-Density Fluorocarbon Plasmas, K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii, 24th International Conference on Phenomena in Ionized Gases, Poland, 1999..
86. Optical Diagnostics of Low-Pressure Inductively Coupled Plasma for Nanocrystalline Diamond Growth, K. Teii, H. Ito, M. Ishikawa, M. Ito, M. Hori, T. Takeo, T. Kato, T. Goto, 24th International Conference on Phenomena in Ionized Gases, Poland, 1999..
87. Behaviors of CFx(x=1-3) and Polymeric Species in Electron Cyclotron Resonance Fluorocarbon Plasmas, K. Teii, M. Ito, M. Hori, T. Goto, N. Ishii, 4th International Conference on Reactive Plasmas/16th Symposium on Plasma Processing, USA, 1998..
88. Positive Bias Effects on the Growth of Diamond at Pressures below 100 mTorr, K. Teii and T. Yoshida, 10th Symposium on Plasma Science for Materials, Japan, 1997..
89. Inductively Coupled Plasma Deposition of Diamond at Pressures below 100 mTorr, K. Teii and T. Yoshida, 13th International Symposium on Plasma Chemistry, China, 1997..